JPH0821318B2 - Method for forming electrode for color CRT electron gun - Google Patents
Method for forming electrode for color CRT electron gunInfo
- Publication number
- JPH0821318B2 JPH0821318B2 JP62014020A JP1402087A JPH0821318B2 JP H0821318 B2 JPH0821318 B2 JP H0821318B2 JP 62014020 A JP62014020 A JP 62014020A JP 1402087 A JP1402087 A JP 1402087A JP H0821318 B2 JPH0821318 B2 JP H0821318B2
- Authority
- JP
- Japan
- Prior art keywords
- shaped
- guide
- recess
- hole
- electron beam
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明はインライン形カラーブラウン管の電子銃用電
極の成形方法に係り、特に画面周辺のフオーカスの改善
を図るに好適な電極の成形方法に関する。The present invention relates to a method for forming an electrode for an electron gun of an in-line type color cathode ray tube, and more particularly to an electrode forming method suitable for improving the focus around the screen.
従来、カラーブラウン管の画面周辺のフオーカスの改
善を目的とした電子銃として、例えば特開昭59−157936
号公報に示すものが知られている。この構部は、第3図
に示すように、第2グリツド電極1の電子ビーム通過孔
2の周辺部にスリツト状の凹部3を設け、前記孔2の周
辺部の板厚を垂直偏向方向(y方向)に厚く、水平偏向
方向(x方向)に薄くしてなり、これによつて電子ビー
ムの発散角を垂直偏向方向(y方向)で小さくしてい
る。なお、図中、4はリング状の突起を示す。Conventionally, as an electron gun for the purpose of improving the focus around the screen of a color cathode ray tube, for example, Japanese Patent Application Laid-Open No. 59-157936
The one shown in Japanese Patent Publication is known. As shown in FIG. 3, this structure is provided with a slit-shaped recess 3 in the peripheral portion of the electron beam passage hole 2 of the second grid electrode 1, and the plate thickness of the peripheral portion of the hole 2 is changed in the vertical deflection direction ( It is thicker in the y direction) and thinner in the horizontal deflection direction (x direction), which reduces the divergence angle of the electron beam in the vertical deflection direction (y direction). In the drawing, reference numeral 4 denotes a ring-shaped projection.
前記凹部3を形成するには、一般にプレスによるコイ
ニング加工が用いられている。例えば特公昭40−4550号
公報があげられる。In order to form the recessed portion 3, coining by pressing is generally used. For example, Japanese Examined Patent Publication No. 40-4550 can be cited.
第3図に示す電極1を成形する場合、特公昭40−4550
号公報に示されているように、コイニング加工力低減の
目的から、まず第4図に示すように、電子ビーム通過孔
2の当該部に余肉吸収用下穴5を設けている。次に第5
図に示すように、コイニング加工により余肉吸収用下穴
5の周辺部の凹部形成面6に凹部3を形成する。これに
より前記余肉吸収用下穴5は番号7で示すように小さく
なる。その後余肉吸収用下穴7の部分を所定の電子ビー
ム通過孔2に形成する。When molding the electrode 1 shown in FIG.
As shown in the publication, for the purpose of reducing the coining working force, first, as shown in FIG. 4, a prepared hole 5 for absorbing excess thickness is provided in the corresponding portion of the electron beam passage hole 2. Next is the fifth
As shown in the drawing, the recess 3 is formed on the recess forming surface 6 in the peripheral portion of the excess hole absorbing pilot hole 5 by coining. As a result, the excess hole preparation hole 5 becomes smaller as indicated by numeral 7. After that, a portion of the prepared hole 7 for absorbing excess thickness is formed in a predetermined electron beam passage hole 2.
上記従来技術は、第5図に示すように、凹部3のコイ
ニング加工により必然的に生じる余肉は、下穴5の縮小
方向への流動8と突起4方向への流動9とのそれぞれの
方向へ流動する。この際、突起4方向への流動9は、破
線10で示したような変形で吸収されるが、この流動9の
ために凹部3の開口部11には周囲にわたつて不規則的な
丸み、いわゆるひけを発生させる原因となる。このひけ
は凹部3周囲でその大きさは不規則となり、凹部形状精
度のばらつきとなつてしまう。特に第3図に示す電子ビ
ーム通過孔2の近傍の凹部3の段差を出すため、孔2の
近傍の垂直偏向方向(y方向)の形状が主要である。In the above-mentioned prior art, as shown in FIG. 5, the extra thickness that is inevitably produced by coining the concave portion 3 is in the directions of the flow 8 in the reduction direction of the prepared hole 5 and the flow 9 in the direction of the protrusion 4. Flow to. At this time, the flow 9 in the direction of the projection 4 is absorbed by the deformation as shown by the broken line 10, but due to this flow 9, the opening 11 of the recess 3 has an irregular roundness around the circumference. This causes a so-called sink mark. This sink mark becomes irregular in size around the concave portion 3, resulting in variation in concave shape accuracy. In particular, since a step is formed in the recess 3 near the electron beam passage hole 2 shown in FIG. 3, the shape in the vertical deflection direction (y direction) near the hole 2 is the main shape.
前記したように垂直偏向方向(y方向)の凹部形状精
度のばらつきを招くので、カラーブラウン管のフオーカ
スにおいても一様な性能が得られないという問題があつ
た。As described above, since the accuracy of the concave shape in the vertical deflection direction (y direction) varies, there is a problem that uniform performance cannot be obtained even in the focus of the color CRT.
本発明の目的は、ひけの発生を防止し、凹部形状精度
の一様性の高い電子銃用電極の形成方法を提供すること
にある。An object of the present invention is to provide a method for forming an electrode for an electron gun, which prevents sink marks from occurring and has a highly uniform recess shape accuracy.
上記目的は、凹部形成面の凹部周囲の少なくとも垂直
偏向方向側に溝部を設け、この溝部にガイドを嵌入させ
溝部を拘束することにより達成される。The above object is achieved by providing a groove portion on at least the vertical deflection direction side of the concave portion forming surface around the concave portion, and inserting a guide into the groove portion to restrain the groove portion.
凹部形成面に形成される凹部周囲に対応した少なくと
も垂直偏向方向側にあらかじめ溝部を設けておき、この
溝部にガイドを嵌入させ、この溝部を拘束して凹部をコ
イニング加工すると、この凹部形成時におけるひけ発生
方向への余肉の流動は制限されるので、ひけは発生せ
ず、垂直偏向方向(y方向)の凹部形状精度を均一かつ
高精度に成形できる。When a groove is provided in advance on at least the vertical deflection direction side corresponding to the periphery of the recess formed on the recess forming surface, a guide is fitted into the groove, and the recess is restrained by coining to form the recess. Since the flow of the excess thickness in the sink mark generation direction is limited, sink marks are not generated, and the recess shape accuracy in the vertical deflection direction (y direction) can be formed uniformly and with high accuracy.
以下、本発明の一実施例を第1図により説明する。第
2グリツド電極20は、電子ビーム通過孔21の周辺部にス
リツト状の凹部22を有し、凹部形成面23の凹部22周囲に
は環状溝部24と突起部25が設けられている。An embodiment of the present invention will be described below with reference to FIG. The second grid electrode 20 has a slit-shaped recess 22 around the electron beam passage hole 21, and an annular groove 24 and a projection 25 are provided around the recess 22 on the recess forming surface 23.
かかる形状よりなる第2グリツド電極20は第2図に示
す工程によつて製作される。まず同図(a)に示すよう
に、電子ビーム通過孔21の当該部に余肉吸収用下穴26を
設ける。次に同図(b)に示すように、凹部22の周囲に
対応した部分に環状溝部24を設ける。この環状溝部24
は、その深さが凹部22とほぼ同じであるのが好ましく、
またV字状断面が最も効果的である。次に同図(c)に
示すように、前記半製品をダイ27及びガイド28上に載置
し、上方よりガイド29を下降させて環状溝部24を拘束さ
せる。この状態でポンチ30を下降させて凹部22をコイニ
ング加工する。これにより、前記余肉吸収用下穴26は31
のように小さく変形する。最後に所定の電子ビーム通過
孔21を形成すると、第1図に示す第2グリツド電極20が
得られる。The second grid electrode 20 having such a shape is manufactured by the process shown in FIG. First, as shown in FIG. 3A, a reserve hole absorbing pilot hole 26 is provided in the corresponding portion of the electron beam passage hole 21. Next, as shown in FIG. 3B, an annular groove 24 is provided in a portion corresponding to the periphery of the recess 22. This annular groove 24
Is preferably approximately the same depth as the recess 22,
The V-shaped cross section is most effective. Next, as shown in FIG. 3C, the semi-finished product is placed on the die 27 and the guide 28, and the guide 29 is lowered from above to restrain the annular groove 24. In this state, the punch 30 is lowered to coin the recess 22. As a result, the excess hole absorbing pilot hole 26 is 31
It transforms small like. Finally, when a predetermined electron beam passage hole 21 is formed, the second grid electrode 20 shown in FIG. 1 is obtained.
このように、あらかじめ環状溝部24を設け、この溝部
24を拘束して凹部22をコイニング加工すると、この凹部
形成時におけるひけ発生方向への余肉の流動は著しく制
限でき、下穴縮小方向への流動に余肉を集中できるの
で、ひけの発生を防止し、凹部形状精度を一様かつ高精
度に成形できる。In this way, the annular groove 24 is provided in advance, and this groove
When the recessed portion 22 is constrained by 24 and coined, the flow of the excess thickness in the direction of sink mark formation when forming the recessed portion can be significantly limited, and the excess thickness can be concentrated in the flow in the direction of reduction of the prepared hole. Therefore, it is possible to form the concave portion with uniform and high precision.
なお、上記実施例においては、凹部22の全周にわたつ
て溝部24を設けたが、前記したように凹部22の近傍、即
ち垂直偏向方向(y方向)側の凹部開口部にひけが発生
しないことが重要であるので、前記溝部24は垂直偏向方
向側に部分的に形成してもよい。In the above embodiment, the groove portion 24 is provided over the entire circumference of the concave portion 22, but as described above, the sink mark does not occur near the concave portion 22, that is, in the concave opening portion on the vertical deflection direction (y direction) side. It is important that the groove 24 is partially formed on the vertical deflection direction side.
本発明によれば、凹部周囲に対応した少なくとも垂直
偏向方向側に溝部を設け、この溝部にガイドを嵌入さ
せ、この溝部を拘束して凹部を形成することで、ひけ発
生方向の余肉流動を制限できるので、凹部形状精度が向
上し、カラーブラウン管のフオーカス品質も一様性の高
いものとなる。According to the present invention, a groove portion is provided on at least the vertical deflection direction side corresponding to the periphery of the recess portion, a guide is fitted into the groove portion, and the groove portion is restrained to form the recess portion. Since it can be limited, the precision of the concave shape is improved, and the focus quality of the color CRT becomes highly uniform.
第1図は本発明の一実施例になる第2クリツド電極の電
子ビーム通過孔部分を示し、(a)は拡大正面図、
(b)は断面図、第2図(a)乃至(c)は第1図の第
2グリツド電極の成形方法の一実施例を示す断面図、第
3図は従来の第2グリツド電極を示し、(a)は正面
図、(b)は断面図、第4図及び第5図は従来例の第2
グリツド電極の成形方法を示し、(a)は拡大正面図、
(b)は断面図である。 20……第2グリツド電極、21……電子ビーム通過孔、22
……凹部、23……凹部形成面、24……溝部。FIG. 1 shows an electron beam passage hole portion of a second grid electrode according to an embodiment of the present invention, (a) is an enlarged front view,
2B is a sectional view, FIGS. 2A to 2C are sectional views showing an embodiment of a method for forming the second grid electrode of FIG. 1, and FIG. 3 is a conventional second grid electrode. , (A) is a front view, (b) is a sectional view, and FIG. 4 and FIG.
The method of forming the grid electrode is shown, (a) is an enlarged front view,
(B) is a sectional view. 20: second grid electrode, 21: electron beam passage hole, 22
...... Concave, 23 ...... Concave forming surface, 24 ...... Groove.
Claims (1)
状の凹部(22)を設けたカラーブラウン管電子銃用電極
の成形方法において、 (a)板状の素材にリング状の突起(25)をコイニング
加工により形成する工程と、 (b)次いで前記リング状の突起で囲まれた領域(23)
内の電子ビーム通過孔(21)該当部に余肉吸収用下孔
(26)を形成する工程と、 (c)次いで前記リング状の突起で囲まれた領域(23)
内であって、スリット状の凹部(22)の周囲に対応した
少なくとも垂直偏向方向側に溝(24)を形成する工程
と、 (d)次いで前記板状の素材をダイ(27)及び第1のガ
イド(28)上に、該第1のガイド(28)の突起部が前記
リング状の突起(25)によって形成される溝部に嵌入さ
れるよう載置して、該ダイ(27)及び第1のガイド(2
8)と、前記溝(24)に嵌入される突起部を有する第2
のガイド(29)とで前記板状の素材を挟持した状態で、
ポンチ(30)で前記スリット状の凹部(22)をコイニン
グ形成する工程と、 (e)次いで前記電子ビーム通過孔(21)を打ち抜く工
程と からなることを特徴とするカラーブラウン管電子銃用電
極の成形方法。1. A method for forming an electrode for a color cathode ray tube electron gun, comprising a slit-shaped recess (22) in the periphery of an electron beam passage hole (21), comprising: (a) a plate-shaped material and a ring-shaped projection (25). ) By coining, and (b) then a region (23) surrounded by the ring-shaped protrusions.
A step (c) of forming an excess hole absorbing hole (26) in a corresponding portion of the electron beam passage hole (21) inside, and (c) an area (23) surrounded by the ring-shaped projection.
A step of forming a groove (24) in at least the vertical deflection direction side corresponding to the periphery of the slit-shaped recess (22), and (d) then applying the plate-shaped material to the die (27) and the first On the guide (28) of the first guide (28) so that the protrusion of the first guide (28) is fitted into the groove formed by the ring-shaped protrusion (25). Guide of 1 (2
8) and a second portion having a protrusion fitted into the groove (24)
While holding the plate-shaped material with the guide (29),
An electrode for a color CRT electron gun, comprising the steps of coining the slit-shaped recess (22) with a punch (30), and (e) punching out the electron beam passage hole (21). Molding method.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62014020A JPH0821318B2 (en) | 1987-01-26 | 1987-01-26 | Method for forming electrode for color CRT electron gun |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62014020A JPH0821318B2 (en) | 1987-01-26 | 1987-01-26 | Method for forming electrode for color CRT electron gun |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63184244A JPS63184244A (en) | 1988-07-29 |
| JPH0821318B2 true JPH0821318B2 (en) | 1996-03-04 |
Family
ID=11849507
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62014020A Expired - Fee Related JPH0821318B2 (en) | 1987-01-26 | 1987-01-26 | Method for forming electrode for color CRT electron gun |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0821318B2 (en) |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61147445A (en) * | 1984-12-20 | 1986-07-05 | Mitsubishi Electric Corp | Electron gun |
-
1987
- 1987-01-26 JP JP62014020A patent/JPH0821318B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPS63184244A (en) | 1988-07-29 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |