JPH0821738B2 - Discharge electrode for gas discharge device - Google Patents
Discharge electrode for gas discharge deviceInfo
- Publication number
- JPH0821738B2 JPH0821738B2 JP4327087A JP4327087A JPH0821738B2 JP H0821738 B2 JPH0821738 B2 JP H0821738B2 JP 4327087 A JP4327087 A JP 4327087A JP 4327087 A JP4327087 A JP 4327087A JP H0821738 B2 JPH0821738 B2 JP H0821738B2
- Authority
- JP
- Japan
- Prior art keywords
- discharge
- gas
- electrode
- discharge electrode
- laser
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/038—Electrodes, e.g. special shape, configuration or composition
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Discharge Lamp (AREA)
- Lasers (AREA)
Description
【発明の詳細な説明】 ［発明の技術分野］ この発明は、ガス放電装置の放電電極に関する。Description: TECHNICAL FIELD OF THE INVENTION The present invention relates to a discharge electrode of a gas discharge device.
ガス放電装置を有する装置、例えば３軸直交型のレー
ザ発振装置では、一対の放電電極間にレーザ媒質たるガ
スを通過させ、このガスを介して所定の放電を行ってい
る。In a device having a gas discharge device, for example, a three-axis orthogonal laser oscillation device, a gas that is a laser medium is passed between a pair of discharge electrodes, and a predetermined discharge is performed through this gas.
ここに、この種の放電電極としては、平板状の絶縁基
板に多数のピン状電極を植設したものが良く用いられて
いる。Here, as this type of discharge electrode, a plate-shaped insulating substrate having a large number of pin-shaped electrodes implanted therein is often used.
しかしながら、従来の放電電極は、例えば、２枚の平
板状放電電極を対向配設した形のものであったため、放
電空間における電界Ｅと密度ρとの比E/ρがガス流の入
口と出口とで異なっており、放電効率ηを低下させてい
るという問題があった。However, the conventional discharge electrode has, for example, a configuration in which two flat plate discharge electrodes are arranged so as to face each other. Therefore, the ratio E / ρ of the electric field E to the density ρ in the discharge space is equal to the gas flow inlet and outlet. There is a problem that the discharge efficiency η is reduced.
即ち、周知の通り、放電効率ηは、電界Ｅと密度ρと
の比E/ρに影響されるものである。又、放電空間を流れ
るガスは、空間入口と出口とで大きな温度差（例えば、
100℃）を生じている。従って、ガスは放電空間の入口
と出口とで密度ρ変化を生じており、前記E/ρを変化さ
せている。That is, as is well known, the discharge efficiency η is influenced by the ratio E / ρ of the electric field E and the density ρ. Also, the gas flowing through the discharge space has a large temperature difference between the space inlet and outlet (for example,
100 ℃) has occurred. Therefore, the gas has a density ρ change at the inlet and the outlet of the discharge space, and changes the E / ρ.
よって、従来の放電電極では、放電効率ηは、上流を
100％とすれば下流側が100％より小さな値となり、中間
位置を100％とすれば上流側及び下流側が100より小さな
値となり、全体を100％とすることができなかったので
ある。Therefore, in the conventional discharge electrode, the discharge efficiency η is
If 100% is set, the value on the downstream side becomes smaller than 100%, and if the intermediate position is set to 100%, the value on the upstream side and the downstream side becomes smaller than 100, and the whole cannot be set to 100%.
この発明の目的は放電効率が全体的に良好なガス放電
用の放電電極を提供することである。An object of the present invention is to provide a discharge electrode for gas discharge, which has good discharge efficiency as a whole.
上記目的を達成するため、この発明では、放電空間に
おける電界Ｅとガス密度ρの比E/ρを放電空間の各所に
おいて一定とした。In order to achieve the above object, in the present invention, the ratio E / ρ of the electric field E and the gas density ρ in the discharge space is made constant at various places in the discharge space.
第１図に示すように、レーザ発振装置１は円筒状のレ
ーザ容器３内にレーザ発振要素を内蔵して構成されてい
る。レーザ容器３の右側面には、電源線５、CO2,He,N2
等混合ガスの給気管７及び排気管９、内部冷給用の冷却
排水管11等が接続されている。レーザ容器３の左側面に
はレーザ光線LBの出力窓13が形成されている。As shown in FIG. 1, the laser oscillating device 1 is constructed by incorporating a laser oscillating element in a cylindrical laser container 3. On the right side surface of the laser container 3, a power line 5, CO 2 , He, N 2
An air supply pipe 7 and an exhaust pipe 9 for an equal mixed gas, a cooling drain pipe 11 for internal cold supply, etc. are connected. An output window 13 for the laser beam LB is formed on the left side surface of the laser container 3.
第２図および第３図に示すように、レーザ容器３の内
部上方には多数のピン状電極15を備えた上下一対の平板
状の放電電極17,19が上下に所定間隔をおいて容器３の
長手方向に沿って設けられている。この放電電極17,19
はガス流Ａに対し、第４図に誇張して示したように、所
定の勾配を持って配設されている。即ち、下方の放電電
極19は、上方の放電電極17に対し、角度θだけ開かれて
配設されている。この角度θは、この実施例では、３゜
〜５゜程度とされている。As shown in FIGS. 2 and 3, a pair of upper and lower flat plate-shaped discharge electrodes 17 and 19 provided with a large number of pin-shaped electrodes 15 are provided above the inside of the laser container 3 with a predetermined vertical interval therebetween. Are provided along the longitudinal direction of. This discharge electrode 17,19
Are arranged with a predetermined gradient with respect to the gas flow A, as exaggeratedly shown in FIG. That is, the lower discharge electrode 19 is arranged so as to be opened at an angle θ with respect to the upper discharge electrode 17. The angle θ is about 3 ° to 5 ° in this embodiment.
放電電極17,19の下方には、第２図において反時計方
向回りのガス流Ａを作るブロワー21が設けられている。Below the discharge electrodes 17 and 19, there is provided a blower 21 for producing a gas flow A counterclockwise in FIG.
ブロワー21と、前記上下一対の放電電極17,19が形成
する放電空間Ｂとの間には、ガス冷却用の熱交換器23,2
5が設けられている。又、レーザ容器３の内部にはガス
流Ａを円滑化するための流れ制御板27,29,31が設けられ
ている。Between the blower 21 and the discharge space B formed by the pair of upper and lower discharge electrodes 17, 19, there are heat exchangers 23, 2 for cooling the gas.
Five are provided. Further, inside the laser container 3, flow control plates 27, 29, 31 for smoothing the gas flow A are provided.
第３図に示すように、レーザ容器３の内部の長手方向
両端には、一対のフォールデイングミラー33,35が対向
して配設されている。As shown in FIG. 3, a pair of folding mirrors 33 and 35 are arranged facing each other at both ends in the longitudinal direction inside the laser container 3.
又、電気電源線５は電気系コントローラ37に接続され
ており、ガス給気管７はガス給気コントローラ39に接続
されており、ガス排気管９はガス排気コントローラ41に
それぞれ接続されている。The electric power supply line 5 is connected to an electric system controller 37, the gas supply pipe 7 is connected to a gas supply controller 39, and the gas exhaust pipe 9 is connected to a gas exhaust controller 41.
レーザ容器３内にはガス給気コントローラ39およびガ
ス排気コントローラ41によって、CO2,He,N2ガスが適宜
の割合で、例えば45Torrの圧力で封入されている。そし
て、この混合ガスはブロワー21によってガス流Ａとな
り、レーザ容器３内で強制的に循環されている。CO 2 , He, N 2 gas is enclosed in the laser container 3 by a gas supply controller 39 and a gas exhaust controller 41 at an appropriate ratio, for example, at a pressure of 45 Torr. Then, this mixed gas becomes a gas flow A by the blower 21 and is forcibly circulated in the laser container 3.
ここに、ガス流Ａの方向にＹ軸をとり、これと直交す
る放電方向をＸ軸にとり、これらX,Y軸と直交する方向
（共振方向）をＺ軸にとる。Here, the Y axis is taken in the direction of the gas flow A, the discharge direction orthogonal to this is taken as the X axis, and the direction (resonance direction) orthogonal to these X and Y axes is taken as the Z axis.
第４図において、前記熱交換器23を介して放電空間の
始端位置Y1に到達したガス流Ａは、比較的低い温度（例
えば30℃）となっている。ところが、このガス流Ａは放
電空間Ｂで加熱され、放電空間Ｂの終端位置Y2では相当
高い温度（例えば130℃）となる。従って、ガス密度ρ
（Ｙ）はＹに略比例して低くなる。In FIG. 4, the gas flow A reaching the starting end position Y 1 of the discharge space via the heat exchanger 23 has a relatively low temperature (for example, 30 ° C.). However, this gas flow A is heated in the discharge space B and reaches a considerably high temperature (for example, 130 ° C.) at the terminal position Y 2 of the discharge space B. Therefore, the gas density ρ
(Y) becomes lower in proportion to Y.
そこで、本例では、図示の如く、下方の放電電極19を
上方の放電電極17に対し角度θだけ傾けた。この角度θ
は、第５図に示したように、放電空間Ｂの始端Y1と終端
Y2とで電界Ｅ（Ｙ）とガス密度ρ（Ｙ）との比Ｅ（Ｙ）
／ρ（Ｙ）が略一定となるように定めたものである。Therefore, in this example, as shown in the figure, the lower discharge electrode 19 is inclined with respect to the upper discharge electrode 17 by an angle θ. This angle θ
As shown in FIG. 5, is the beginning Y 1 and the end Y 1 of the discharge space B.
Y 2 and in an electric field E (Y) and the gas density [rho (Y) ratio of E (Y)
/ Ρ (Y) is set to be substantially constant.
従って、本例では、電界Ｅ（Ｙ）と密度ρ（Ｙ）との
比Ｅ（Ｙ）／ρ（Ｙ）の値がＹの値に関係なく一定とな
り、放電効率ηもこの値に関係なく一定のものとなり、
全体効率ηを向上させることが可能となる。Therefore, in this example, the value of the ratio E (Y) / ρ (Y) between the electric field E (Y) and the density ρ (Y) is constant regardless of the value of Y, and the discharge efficiency η is also independent of this value. Becomes constant,
It becomes possible to improve the overall efficiency η.
言い換えれば、放電空間の始端Y1での放電効率ηを10
0％としたならば、放電空間の終端Y2での放電効率ηも1
00％とすることができ、全体の放電効率を略100％とす
ることが可能となる。In other words, the discharge efficiency η at the beginning Y 1 of the discharge space is 10
If it is 0%, the discharge efficiency η at the end Y 2 of the discharge space is also 1
It can be set to 00%, and the overall discharge efficiency can be set to about 100%.
なお、上記例では、上方の放電電極17に対し、下方の
放電電極19を傾斜させたが、上方の放電電極を、又は、
上下両方の放電電極を傾斜させることにより放電空間の
全領域に亘りE/ρを略一定とすることができることは勿
論である。In the above example, the lower discharge electrode 19 was inclined with respect to the upper discharge electrode 17, but the upper discharge electrode, or
Obviously, by inclining both the upper and lower discharge electrodes, E / ρ can be made substantially constant over the entire area of the discharge space.
又、上記例では、放電電極17,19を相互に傾斜させる
例を示したが、放電電極17,19の各ピン状電極15に印加
する電圧ＶをＹの関数として変化させ、電界Ｅとガス密
度ρとの比E/ρを一定する構成も可能である。In the above example, the discharge electrodes 17 and 19 are inclined with respect to each other. However, the voltage V applied to each pin-shaped electrode 15 of the discharge electrodes 17 and 19 is changed as a function of Y, and the electric field E and the gas are changed. A configuration in which the ratio E / ρ with the density ρ is constant is also possible.
更に、上記例では平らな平板状の放電電極の例を示し
たが、放電電極は、ガス流Ａを円滑化するためにガス流
Ａに沿って円弧状に曲げられた基板を有する放電電極で
あっても良い。この場合、一対の円弧状基板のそれぞれ
にピン状電極が植設され、両基板間にガス流Ａが円滑に
流される。そこで、両基板間の間隔を下流側で広くし、
ガス流Ａに対し、電界Ｅと密度との比E/ρが各所で一定
となるようにすれば、円滑なガス流内で高効率のガス放
電が行われるようになる。Further, in the above example, a flat flat plate-shaped discharge electrode is shown, but the discharge electrode is a discharge electrode having a substrate bent in an arc shape along the gas flow A in order to smooth the gas flow A. It may be. In this case, a pin-shaped electrode is implanted in each of the pair of arc-shaped substrates, and the gas flow A is smoothly flown between the substrates. Therefore, widen the space between both boards on the downstream side,
If the ratio E / ρ of the electric field E to the density of the gas flow A is made constant at various points, highly efficient gas discharge can be performed in a smooth gas flow.
第１図は、ガス放電装置を有するレーザ発振装置の外観
を示す斜視図である。 第２図は第１図のII−II矢視断面図である。 第３図は上記レーザ発振装置の長手方向に沿った断面図
である。 第４図はこの発明の一実施例に係る放電電極の正面図で
ある。 第５図はガス流軸（Ｙ）に対する電界Ｅとガス密度ρと
の比E/ρを示す説明図である。 １……レーザ発振装置、３……レーザ容器 15……ピン状電極、17,19……放電電極FIG. 1 is a perspective view showing the external appearance of a laser oscillation device having a gas discharge device. FIG. 2 is a sectional view taken along the line II-II of FIG. FIG. 3 is a sectional view taken along the longitudinal direction of the laser oscillator. FIG. 4 is a front view of the discharge electrode according to the embodiment of the present invention. FIG. 5 is an explanatory diagram showing the ratio E / ρ of the electric field E to the gas flow axis (Y) and the gas density ρ. 1 ... Laser oscillator, 3 ... Laser container 15 ... Pin-shaped electrode, 17,19 ... Discharge electrode
Claims (2)
比E/ρを放電空間の各所において一定とするよう構成し
たことを特徴とするガス放電装置用放電電極。1. A discharge electrode for a gas discharge device, characterized in that a ratio E / ρ between an electric field E and a gas density ρ in the discharge space is made constant at various points in the discharge space.
平板状放電電極を、ガス流入口よりガス流出口側の方が
間隔が広くなるよう対向配設したことを特徴とする特許
請求の範囲第１項に記載のガス放電装置用放電電極。2. A pair of flat plate discharge electrodes provided with a large number of pin-shaped electrodes on a substrate are arranged so as to face each other such that the distance between the gas inlet and the gas outlet is wider. A discharge electrode for a gas discharge device according to claim 1.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US84160086A | 1986-03-20 | 1986-03-20 | |
| US841600 | 2010-07-22 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62219980A JPS62219980A (en) | 1987-09-28 |
| JPH0821738B2 true JPH0821738B2 (en) | 1996-03-04 |
Family
ID=25285273
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4327087A Expired - Fee Related JPH0821738B2 (en) | 1986-03-20 | 1987-02-27 | Discharge electrode for gas discharge device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0821738B2 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06105808B2 (en) * | 1987-09-30 | 1994-12-21 | オ−クマ株式会社 | Gas laser oscillator |
| JP2757198B2 (en) * | 1989-01-30 | 1998-05-25 | 三菱電機株式会社 | Gas laser device |
-
1987
- 1987-02-27 JP JP4327087A patent/JPH0821738B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62219980A (en) | 1987-09-28 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| LAPS | Cancellation because of no payment of annual fees |