JPH0822374B2 - Method for producing graft membrane - Google Patents
Method for producing graft membraneInfo
- Publication number
- JPH0822374B2 JPH0822374B2 JP61099387A JP9938786A JPH0822374B2 JP H0822374 B2 JPH0822374 B2 JP H0822374B2 JP 61099387 A JP61099387 A JP 61099387A JP 9938786 A JP9938786 A JP 9938786A JP H0822374 B2 JPH0822374 B2 JP H0822374B2
- Authority
- JP
- Japan
- Prior art keywords
- group
- membrane
- monomer
- film
- grafted
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000012528 membrane Substances 0.000 title claims description 31
- 238000004519 manufacturing process Methods 0.000 title claims description 8
- 239000000178 monomer Substances 0.000 claims description 20
- 239000011148 porous material Substances 0.000 claims description 13
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 10
- 239000000463 material Substances 0.000 claims description 8
- 230000007935 neutral effect Effects 0.000 claims description 8
- 150000001450 anions Chemical group 0.000 claims description 7
- 150000001768 cations Chemical group 0.000 claims description 6
- 229920000089 Cyclic olefin copolymer Polymers 0.000 claims description 4
- 150000001336 alkenes Chemical class 0.000 claims description 4
- 229920000098 polyolefin Polymers 0.000 claims description 4
- 239000002033 PVDF binder Substances 0.000 claims description 3
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 claims description 3
- 229920002492 poly(sulfone) Polymers 0.000 claims description 3
- 229920002981 polyvinylidene fluoride Polymers 0.000 claims description 3
- 238000000034 method Methods 0.000 description 16
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 12
- 239000002585 base Substances 0.000 description 10
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 8
- XXROGKLTLUQVRX-UHFFFAOYSA-N hydroxymethylethylene Natural products OCC=C XXROGKLTLUQVRX-UHFFFAOYSA-N 0.000 description 7
- 238000010894 electron beam technology Methods 0.000 description 5
- 239000010419 fine particle Substances 0.000 description 5
- 150000002500 ions Chemical class 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- -1 polyethylene Polymers 0.000 description 5
- MYRTYDVEIRVNKP-UHFFFAOYSA-N 1,2-Divinylbenzene Chemical compound C=CC1=CC=CC=C1C=C MYRTYDVEIRVNKP-UHFFFAOYSA-N 0.000 description 4
- 239000012510 hollow fiber Substances 0.000 description 4
- 238000011002 quantification Methods 0.000 description 4
- 235000011121 sodium hydroxide Nutrition 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 3
- MQIUGAXCHLFZKX-UHFFFAOYSA-N Di-n-octyl phthalate Natural products CCCCCCCCOC(=O)C1=CC=CC=C1C(=O)OCCCCCCCC MQIUGAXCHLFZKX-UHFFFAOYSA-N 0.000 description 3
- BJQHLKABXJIVAM-UHFFFAOYSA-N bis(2-ethylhexyl) phthalate Chemical compound CCCCC(CC)COC(=O)C1=CC=CC=C1C(=O)OCC(CC)CCCC BJQHLKABXJIVAM-UHFFFAOYSA-N 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 238000006277 sulfonation reaction Methods 0.000 description 3
- 238000005406 washing Methods 0.000 description 3
- UOCLXMDMGBRAIB-UHFFFAOYSA-N 1,1,1-trichloroethane Chemical compound CC(Cl)(Cl)Cl UOCLXMDMGBRAIB-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- UUAGAQFQZIEFAH-UHFFFAOYSA-N chlorotrifluoroethylene Chemical group FC(F)=C(F)Cl UUAGAQFQZIEFAH-UHFFFAOYSA-N 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 230000004907 flux Effects 0.000 description 2
- BTCSSZJGUNDROE-UHFFFAOYSA-N gamma-aminobutyric acid Chemical compound NCCCC(O)=O BTCSSZJGUNDROE-UHFFFAOYSA-N 0.000 description 2
- 230000014759 maintenance of location Effects 0.000 description 2
- 239000012299 nitrogen atmosphere Substances 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- KJFMBFZCATUALV-UHFFFAOYSA-N phenolphthalein Chemical compound C1=CC(O)=CC=C1C1(C=2C=CC(O)=CC=2)C2=CC=CC=C2C(=O)O1 KJFMBFZCATUALV-UHFFFAOYSA-N 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 125000001174 sulfone group Chemical group 0.000 description 2
- 125000000542 sulfonic acid group Chemical group 0.000 description 2
- HIFJUMGIHIZEPX-UHFFFAOYSA-N sulfuric acid;sulfur trioxide Chemical compound O=S(=O)=O.OS(O)(=O)=O HIFJUMGIHIZEPX-UHFFFAOYSA-N 0.000 description 2
- 238000004448 titration Methods 0.000 description 2
- OGNSCSPNOLGXSM-UHFFFAOYSA-N (+/-)-DABA Natural products NCCC(N)C(O)=O OGNSCSPNOLGXSM-UHFFFAOYSA-N 0.000 description 1
- LIKMAJRDDDTEIG-UHFFFAOYSA-N 1-hexene Chemical compound CCCCC=C LIKMAJRDDDTEIG-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- AGBXYHCHUYARJY-UHFFFAOYSA-N 2-phenylethenesulfonic acid Chemical compound OS(=O)(=O)C=CC1=CC=CC=C1 AGBXYHCHUYARJY-UHFFFAOYSA-N 0.000 description 1
- KGIGUEBEKRSTEW-UHFFFAOYSA-N 2-vinylpyridine Chemical compound C=CC1=CC=CC=N1 KGIGUEBEKRSTEW-UHFFFAOYSA-N 0.000 description 1
- DBCAQXHNJOFNGC-UHFFFAOYSA-N 4-bromo-1,1,1-trifluorobutane Chemical compound FC(F)(F)CCCBr DBCAQXHNJOFNGC-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical group C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 1
- FKNQFGJONOIPTF-UHFFFAOYSA-N Sodium cation Chemical compound [Na+] FKNQFGJONOIPTF-UHFFFAOYSA-N 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical group CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- BLAKAEFIFWAFGH-UHFFFAOYSA-N acetyl acetate;pyridine Chemical compound C1=CC=NC=C1.CC(=O)OC(C)=O BLAKAEFIFWAFGH-UHFFFAOYSA-N 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910001854 alkali hydroxide Inorganic materials 0.000 description 1
- 150000008044 alkali metal hydroxides Chemical class 0.000 description 1
- 150000004808 allyl alcohols Chemical group 0.000 description 1
- 150000001412 amines Chemical group 0.000 description 1
- 230000001580 bacterial effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 125000002091 cationic group Chemical group 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- OBRMNDMBJQTZHV-UHFFFAOYSA-N cresol red Chemical compound C1=C(O)C(C)=CC(C2(C3=CC=CC=C3S(=O)(=O)O2)C=2C=C(C)C(O)=CC=2)=C1 OBRMNDMBJQTZHV-UHFFFAOYSA-N 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 238000010828 elution Methods 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- STVZJERGLQHEKB-UHFFFAOYSA-N ethylene glycol dimethacrylate Substances CC(=C)C(=O)OCCOC(=O)C(C)=C STVZJERGLQHEKB-UHFFFAOYSA-N 0.000 description 1
- 229920000840 ethylene tetrafluoroethylene copolymer Polymers 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 229960003692 gamma aminobutyric acid Drugs 0.000 description 1
- 230000005251 gamma ray Effects 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- ZIUHHBKFKCYYJD-UHFFFAOYSA-N n,n'-methylenebisacrylamide Chemical compound C=CC(=O)NCNC(=O)C=C ZIUHHBKFKCYYJD-UHFFFAOYSA-N 0.000 description 1
- 238000005191 phase separation Methods 0.000 description 1
- 229920000233 poly(alkylene oxides) Polymers 0.000 description 1
- 229920001748 polybutylene Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920013716 polyethylene resin Polymers 0.000 description 1
- 229920005672 polyolefin resin Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229920002545 silicone oil Polymers 0.000 description 1
- 229910001415 sodium ion Inorganic materials 0.000 description 1
- 238000010186 staining Methods 0.000 description 1
- 238000007447 staining method Methods 0.000 description 1
- 230000001954 sterilising effect Effects 0.000 description 1
- 238000004659 sterilization and disinfection Methods 0.000 description 1
- 239000011550 stock solution Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 125000000020 sulfo group Chemical group O=S(=O)([*])O[H] 0.000 description 1
- 150000003512 tertiary amines Chemical group 0.000 description 1
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 description 1
- PRZSXZWFJHEZBJ-UHFFFAOYSA-N thymol blue Chemical compound C1=C(O)C(C(C)C)=CC(C2(C3=CC=CC=C3S(=O)(=O)O2)C=2C(=CC(O)=C(C(C)C)C=2)C)=C1C PRZSXZWFJHEZBJ-UHFFFAOYSA-N 0.000 description 1
- NLVXSWCKKBEXTG-UHFFFAOYSA-N vinylsulfonic acid Chemical compound OS(=O)(=O)C=C NLVXSWCKKBEXTG-UHFFFAOYSA-N 0.000 description 1
- 239000011800 void material Substances 0.000 description 1
- 238000004065 wastewater treatment Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D67/00—Processes specially adapted for manufacturing semi-permeable membranes for separation processes or apparatus
- B01D67/0081—After-treatment of organic or inorganic membranes
- B01D67/0093—Chemical modification
- B01D67/00931—Chemical modification by introduction of specific groups after membrane formation, e.g. by grafting
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2323/00—Details relating to membrane preparation
- B01D2323/38—Graft polymerization
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Transplantation (AREA)
- Inorganic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Separation Using Semi-Permeable Membranes (AREA)
- Manufacture Of Macromolecular Shaped Articles (AREA)
- Manufacture Of Porous Articles, And Recovery And Treatment Of Waste Products (AREA)
Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、水性混合物から微粒子と、必要ならばイオ
ンを同時に除去する選択過膜において、過特性にす
ぐれた新規な複合グラフト膜を製造する方法に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention produces a novel composite graft membrane excellent in over-performance in a selective permeation membrane for simultaneously removing fine particles and, if necessary, ions from an aqueous mixture. Regarding the method.
単に詳しくは、一般産業用水中での微粒子と、必要な
らばイオンを同時に除去する事の出来る過膜におい
て、極めて高い過能力と溶出性の少ない複合膜を製造
する方法に関する。More specifically, the present invention relates to a method for producing a composite membrane having extremely high capacity and low elution property in a membrane capable of simultaneously removing fine particles in water for general industrial use and ions if necessary.
水性混合物から、微粒子と必要ならばイオンを同時に
除去する高効率的な機能膜は、例えば特開昭61-220705
号や特開昭62-179540号等に記載の方法で製造し得られ
る。A highly efficient functional film capable of simultaneously removing fine particles and, if necessary, ions from an aqueous mixture is disclosed in, for example, JP-A-61-220705.
And the method described in JP-A-62-179540.
これらの新規複合機能膜は、その過特性においてす
ぐれた機能を有しているが、一方アニオン基、カチオン
基、又は中性水酸基をグラフトさせると、基材膜に比し
て過能力(フラツクス)が低下する傾向があつた。These novel multi-functional membranes have an excellent function in their over-characteristics, but on the other hand, when an anion group, a cation group or a neutral hydroxyl group is grafted, they have a higher ability (flux) than the substrate membrane. Tended to decrease.
このため基材膜の選択が重要となるが、往々にして基
材膜を設計したのち得られるグラフト膜の過能力が、
期待通りにならない場合がある。For this reason, the selection of the base material film is important, but the excess capacity of the graft film obtained after designing the base material film is often
It may not be what you expect.
本発明者は、前記問題を解決する手段を鋭意研究した
結果、以下の手段によつて達成出来る事を見出した。As a result of earnest research on means for solving the above problems, the present inventor has found that the means can be achieved by the following means.
すなわち本発明は、ポリオレフィン、オレフィンとハ
ロゲン化オレフィン共重合体、ポリフッ化ビニリデンま
たはポリスルホンからなる多孔の基材膜に、アニオン
基、カチオン基または中性水酸基を含有する、あるいは
導入し得るモノマーに、このモノマーと共重合し得る2
コ以上の反応基を有するモノマーを共存させてグラフト
させ、最終的にアニオン基、カチオン基または中性水酸
基を含有する多孔膜を得ることを特徴とする平均孔径0.
001μm〜5μm、空孔率20%〜80%の微孔性グラフト
膜の製造方法である。That is, the present invention is a polyolefin, an olefin and a halogenated olefin copolymer, a porous substrate film made of polyvinylidene fluoride or polysulfone, an anion group, containing a cationic group or a neutral hydroxyl group, or to a monomer that can be introduced, Copolymerizable with this monomer 2
An average pore diameter of 0, which is characterized in that a monomer having a co-reactive group is coexisted and grafted to finally obtain a porous membrane containing an anion group, a cation group or a neutral hydroxyl group.
A method for producing a microporous graft membrane having a porosity of 20% to 80% and a porosity of 001 μm to 5 μm.
以下本発明について更に具体的に詳細説明を行なう。 The present invention will be described in more detail below.
本発明に用いられる基材膜としては、ポリオレフイ
ン、オレフインとハロゲン化オレフイン共重合体、ポリ
フツ化ビニリデン、ポリスルホン等の疎水性多孔膜であ
る事が必要で、これは基材膜として必要な機械的性質の
保持に役立つ。The base film used in the present invention is required to be a hydrophobic porous film such as polyolefin, olefin and halogenated olefin copolymer, polyvinylidene fluoride, polysulfone, etc. Useful for maintaining properties.
ポリオレフイン、オレフインとハロゲン化オレフイン
共重合体の具体例としては、ポリオレフイン樹脂、たと
えばポリエチレン、ポリプロピレン、ポリブチレン又は
前記の2種以上の混合物又はエチレン、プロピレン、ブ
テン、ヘキセン、テトラフルオロエチレン、クロロトリ
フルオロエチレンの2種以上の混合物よりなる共重合体
等があげられる。Specific examples of polyolefins, olefins and halogenated olefin copolymers include polyolefin resins such as polyethylene, polypropylene, polybutylene or mixtures of two or more of the foregoing or ethylene, propylene, butene, hexene, tetrafluoroethylene, chlorotrifluoroethylene. And a copolymer composed of a mixture of two or more of the above.
次に基材膜にグラフトされるアニオン基の例として
は、スルホン酸基、カルボキシル基が好ましく、これら
を含むモノマーとしてはスチレンスルホン酸、ビニール
スルホン酸、アクリル酸、メタクリル酸が使用される。Next, as an example of an anion group to be grafted to the base material film, a sulfonic acid group and a carboxyl group are preferable, and styrenesulfonic acid, vinylsulfonic acid, acrylic acid, and methacrylic acid are used as monomers containing these.
基材膜にグラフトされるカチオン基の例としては、第
4級アミン、第3級アミン、ピリジン基等が好ましく、
それらを含むモノマーとして、例えばビニールピリジン
があげられる。Preferred examples of the cation group to be grafted on the base material film are quaternary amine, tertiary amine, pyridine group and the like,
Examples of monomers containing them include vinyl pyridine.
基材膜にグラフトされる中性水酸基を含むモノマーの
例としては、アリルアルコールがあげられる。また、例
えば、酢酸ビニールモノマーをグラフトさせたのちけん
化させて中性水酸基を得るグラフト膜製造方法も本発明
は適用できる。An example of the monomer having a neutral hydroxyl group that is grafted to the base material film is allyl alcohol. Further, for example, the present invention can also be applied to a method for producing a graft film in which a vinyl acetate monomer is grafted and then saponified to obtain a neutral hydroxyl group.
更に、最終的にスルホン基を有するグラフト膜を得る
方法として、まづスチレンを基材膜にグラフトさせ、そ
の後発煙硫酸等で化学的にスルホン化させる方法も採用
される。Further, as a method for finally obtaining a graft film having a sulfo group, a method in which styrene is first grafted to a base material film and then chemically sulfonated with fuming sulfuric acid or the like is also adopted.
前記のアニオン基、カチオン基又は中性水酸基を含有
するモノマーと共重合し得る2コ以上の反応性を有する
モノマーの例としては、ジビニールベンゼン、エチレン
グリコールジメタクリレート等のポリアルキレンオキサ
イドとジメタクリル酸エステル、N,N′−メチレンビス
アクリルアミド等が用いられ、最終適用用途、及び前記
官能性モノマーの種類に応じて使用される。Examples of the monomer having two or more reactivities capable of copolymerizing with the above-mentioned monomer containing an anion group, a cation group or a neutral hydroxyl group include polyalkylene oxides such as divinylbenzene and ethylene glycol dimethacrylate, and dimethacryl. Acid esters, N, N'-methylenebisacrylamide, etc. are used depending on the final application and the kind of the functional monomer.
これらの2コ以上の反応性を有するモノマーの添加量
は、総モノマー量に対し重量比で0.01ないし20%の範囲
にある事が好ましいが、もちろんこれに限定されず、特
殊な場合には90%程度に添加されて架橋される。The addition amount of these two or more reactive monomers is preferably in the range of 0.01 to 20% by weight with respect to the total amount of the monomers, but it is not limited to this, and 90% in special cases. % To add and crosslink.
グラフト膜は基材膜に応じて適宜製造する事が出来る
が、具体的には各種の放射線(コバルトガンマー線、電
子線)等で基材膜を照射し、照射時同時にモノマーを存
在させるか又はあとでモノマーに浸漬してグラフトさせ
る事が出来る。The graft film can be appropriately produced according to the base film, but specifically, the base film is irradiated with various kinds of radiation (cobalt gamma ray, electron beam) or the like, and the monomer is allowed to exist at the same time as the irradiation. It can be soaked in a monomer and grafted later.
グラフト後、未反応モノマーは洗浄除去される。After the grafting, the unreacted monomer is washed off.
さらに、未反応モノマーの洗浄除去後か、または洗浄
除去せずに、追加の放射線照射を行い、グラフト膜を改
質することもできる。Further, additional irradiation of radiation may be performed to modify the graft membrane after or without removing the unreacted monomer by washing.
本発明多孔膜は、平均孔径0.001μmないし5μm好
ましくは0.01μmないしは1μmの範囲にある事が、好
ましい。ここで平均孔径とは、平均孔径0.01μm以上で
はASTMF316-70に記載されている方法で得られた値を指
しており、通常エアーフロー法と呼ばれ、空気圧を変え
て乾燥膜と湿潤膜の空気透過流束を測定し、その比から
求めるものである。0.01μm以下は、電顕法、分画分子
量測定法等で決定される。The porous membrane of the present invention preferably has an average pore size of 0.001 μm to 5 μm, preferably 0.01 μm to 1 μm. Here, the average pore diameter refers to a value obtained by the method described in ASTM F316-70 when the average pore diameter is 0.01 μm or more, and is usually called an air flow method, which is a dry film or a wet film by changing the air pressure. The air permeation flux is measured and the ratio is determined. The size of 0.01 μm or less is determined by an electron microscope method, a molecular weight cut-off method or the like.
本発明における平均孔径の範囲は、実用性能上から設
定されたものであり、これ以外の範囲では、透過速度も
しくは除微粒子効果等の点で不適当である。The range of the average pore diameter in the present invention is set from the viewpoint of practical performance, and in the range other than this range, it is unsuitable in terms of the transmission rate or the effect of removing fine particles.
次に本発明によつて得られた多孔膜の空孔率は、20な
いし80%の範囲にある事が好ましい。ここで空孔率と
は、あらかじめ膜を水等の液体に浸漬し、そののち乾燥
させて、その前後の重量変化から測定したものである。Next, the porosity of the porous film obtained according to the present invention is preferably in the range of 20 to 80%. Here, the porosity is measured by previously immersing the membrane in a liquid such as water, drying the membrane, and measuring the weight change before and after the drying.
空孔率が本発明の範囲以外においては、それぞれ透過
速度、機械的性質等の点で好ましくない。When the porosity is outside the range of the present invention, it is not preferable in terms of permeation rate, mechanical properties and the like.
本発明で得られた多孔膜のベースとなる基材膜の孔構
造は、種々な成型加工によつて得る事が出来る。The pore structure of the base film, which is the base of the porous film obtained in the present invention, can be obtained by various molding processes.
具体的には、いわゆる延伸法や、電子線照射後化学処
理で作られたエツチング法等も適用可能であるが、孔構
造としては延伸法やエツチング法などにより得られた直
孔貫通型の空孔構造よりも、たとえば特公昭59-37292号
公報、特公昭40-957号公報および特公昭47-17460号公報
に示されたミクロ相分離法や混合抽出法などにより形成
される3次元網目構造を有するものが好ましい。特に、
特開昭55-131028号公報に示された構造体の製造技術が
確立することに伴なつて、本発明の意義が明確化し、従
来技術では得られない優れた性能を有する材料の製造方
法を達成することができた。Specifically, a so-called stretching method or an etching method made by chemical treatment after electron beam irradiation can be applied, but as a pore structure, a straight-hole through-type void obtained by a stretching method or an etching method is used. Rather than the pore structure, for example, a three-dimensional network structure formed by the micro phase separation method or the mixed extraction method disclosed in Japanese Patent Publication No. 59-37292, Japanese Patent Publication No. 40-957 and Japanese Patent Publication No. 47-17460. Those having are preferred. In particular,
With the establishment of the manufacturing technology for the structure shown in Japanese Patent Laid-Open No. 55-131028, the significance of the present invention has been clarified, and a method for manufacturing a material having excellent performance that cannot be obtained by the conventional technology has been developed. I was able to achieve it.
多孔膜の形状は、平膜状、チユーブ状、中空糸膜状の
いずれも適用可能であるが、本発明の目的には、内径0.
1ないし10ミリ、厚み0.05ないし5ミリの形状を有する
中空糸タイプのものが好ましい。The shape of the porous membrane may be any of a flat membrane shape, a tube shape, and a hollow fiber membrane shape, but for the purpose of the present invention, an inner diameter of 0.
A hollow fiber type having a shape of 1 to 10 mm and a thickness of 0.05 to 5 mm is preferable.
次に、本発明の効果を実施例で具体的に示すが、本発
明の実施例は発明を限定するものではない。Next, the effects of the present invention will be specifically shown by examples, but the examples of the present invention do not limit the invention.
実施例1及び比較例1 微粉硅酸(ニプシルVN3LP)22.1重量部、ジオクチル
フタレート(DOP)55.0重量部、ポリエチレン樹脂粉末
〔旭化成S-360グレード〕23.0重量部の組成物を予備混
合した後、30ミリ2軸押出機で内径0.7mm、厚み0.25mm
の中空糸状に押出した後、1,1,1−トリクロルエタン
〔クロロセンVG(商品名)〕中に60分間浸漬し、DOPを
抽出した。更に温度60℃の苛性ソーダ40%水溶液中に約
20分浸漬して微粉硅酸を抽出したあと、水洗、乾燥し
た。Example 1 and Comparative Example 1 22.1 parts by weight of fine silicate (Nipsyl VN3LP), 55.0 parts by weight of dioctyl phthalate (DOP), 23.0 parts by weight of polyethylene resin powder [Asahi Kasei S-360 grade] were premixed, and then 30 Millimeter twin-screw extruder, inner diameter 0.7mm, thickness 0.25mm
After being extruded into a hollow fiber, the product was immersed in 1,1,1-trichloroethane [chlorocene VG (trade name)] for 60 minutes to extract DOP. In addition, about 40% caustic soda solution at a temperature of 60 ℃
After immersing for 20 minutes to extract fine powder of silicic acid, it was washed with water and dried.
得られた多孔膜に電子加速器(加圧電圧1.5MeV、電子
線電流1mA)を用いて窒素雰囲気下100KGyで電子線を照
射したのち、あらかじめ溶存酸素を0.1ppm以下にしたス
チレンに浸漬し、グラフトさせて洗浄乾燥後、発煙硫酸
を用いてスルホン化し、平均孔径0.15μm、空孔率62
%、スルホン酸基1.5ミリ当量/1グラム膜の膜(比較例
膜(A))を得た。The obtained porous membrane was irradiated with an electron beam at 100KGy in a nitrogen atmosphere using an electron accelerator (pressurization voltage: 1.5MeV, electron beam current: 1mA), and then immersed in styrene with dissolved oxygen of 0.1ppm or less in advance and grafted. After washing, drying and sulfonation using fuming sulfuric acid, average pore diameter 0.15μm, porosity 62
%, Sulfonic acid group 1.5 meq / g film (comparative example film (A)) was obtained.
一方、前記のスチレンの代わりにスチレンとジビニー
ルベンゼン(重量比95:5)の混合モノマーを用いてグラ
フト化し、その後ほぼ同じ条件でスルホン化させて平均
孔径0.16μ、空孔率63%、スルホン酸基1.5ミリ当量/1
グラム膜の実施例膜(A)を得た。On the other hand, grafting was performed using a mixed monomer of styrene and divinylbenzene (weight ratio 95: 5) instead of the above styrene, and then sulfonation was performed under almost the same conditions to obtain an average pore size of 0.16μ, a porosity of 63%, and a sulfonation. Acid group 1.5 meq / 1
A gram membrane example membrane (A) was obtained.
ここで実施例膜のスルホン基の定量は以下によつた。 Here, the quantification of the sulfone group of the example membrane was as follows.
スルホン化多孔膜を1NHClag.に浸漬し、H型とした
後、水洗し、次に1NCaCl2ag.へ浸漬し、遊離したHClを
0.1NNaOHag.を用い、フエノールフタレインを指示薬と
して滴定した。The sulfonated porous membrane was dipped in 1N HClag. To form H type, washed with water, and then dipped in 1N CaCl 2 ag.
Using 0.1N NaOH, titration was performed with phenolphthalein as an indicator.
次に、下記に示される水質の液を使用して、実際に
過テストを行つたところ、第1表に示される結果を得
た。Next, when an overtest was actually carried out using the water quality liquid shown below, the results shown in Table 1 were obtained.
原液中の微粒子濃度1) 3×104ケ/c.c バクテリヤ濃度2) 103ケ/c.c 鉄+3イオン濃度 0.15ミリモル/l ナトリウムイオン濃度 0.50ミリモル/l 1)0.2μmポリカーボネート製平膜での直接顕鏡した
測定値 2)ブロカ染色法によつて染色後、顕微鏡によつて直接
測定した値 3)原子吸光法による測定値 上表から明らかなように、本発明実施例膜(A)は、
初期透過速度が比較例膜(A)に比してすぐれた結果を
示しており、イオン除去性も良好である。Concentration of fine particles in stock solution 1) 3 × 10 4 cells / cc Bacterial concentration 2) 10 3 cells / cc Iron + 3 ion concentration 0.15 mmol / l Sodium ion concentration 0.50 mmol / l 1) 0.2 μm Directly on a polycarbonate flat membrane Measured value under microscope 2) Value measured directly by microscope after staining with Broca staining method 3) Measured value by atomic absorption method As is apparent from the above table, the inventive example membrane (A) is
The result shows that the initial permeation rate is superior to that of the comparative example membrane (A), and the ion removability is also good.
実施例2及び比較例2 エチレン−テトラフルオロエチレン共重合体(商品名
アフロンCOP)25.0重量部、クロロトリフルオロエチレ
ンオリゴマー(商品名ダイフロイル#20)53.6重量部、
シリコーンオイル)商品名KF-96)6.2重量部、微粉シリ
カ15.1重量部を予備混合後30ミリ二軸押出機で内径0.7m
m、厚み0.25mmの中空糸状に押出した後、1,1,1−トリク
ロルエタン〔フロロセンVG(商品名)〕中に60分間浸漬
し可型剤を押出した後、更に温度60℃の苛性ソーダ40%
水溶液中に約20分浸漬して微粉硅酸を抽出したあと、水
洗、乾燥した。Example 2 and Comparative Example 2 25.0 parts by weight of ethylene-tetrafluoroethylene copolymer (trade name Aflon COP), 53.6 parts by weight of chlorotrifluoroethylene oligomer (trade name Daifloyl # 20),
Silicone oil) Product name: KF-96) 6.2 parts by weight, 15.1 parts by weight of finely divided silica are premixed, and the inner diameter is 0.7 m with a 30 mm twin screw extruder.
m, extruded into a hollow fiber with a thickness of 0.25 mm, immersed in 1,1,1-trichloroethane [Fluorocene VG (trade name)] for 60 minutes to extrude the moldable agent, and then caustic soda 40 at a temperature of 60 ° C %
After immersing in an aqueous solution for about 20 minutes to extract finely divided silicate, it was washed with water and dried.
かくして得られた多孔膜に、電子加速器(加圧電圧1.
5MeV、電子線電流1mA)を用いて窒素雰囲気下100KGYで
照射した後、あらかじめ溶存酸素を0.1ppm以下にしたア
リルアルコールに当ててグラフトさせ、2.5ミリ当量/1
グラム膜の比較例膜(B)(平均孔径0.16μm、空孔率
60%)を得た。An electron accelerator (pressurizing voltage 1.
After irradiation with 100KGY in a nitrogen atmosphere using 5MeV, electron beam current 1mA), it was exposed to allyl alcohol in which dissolved oxygen was adjusted to 0.1ppm or less in advance and grafted, and 2.5 meq / 1
Gram Membrane Comparative Example Membrane (B) (Average Pore Diameter 0.16 μm, Porosity
60%).
更に前記比較例膜(B)におけるアリルアルコールの
代わりに、アリルアルコールとポリプロピレンジメタア
クリレート(95対5)の混合モノマーを用いた他は、殆
ど同じ条件でグラフトさせ、実施例膜(B)(平均孔径
0.17μm、空孔率62%)を得た。Further, instead of the allyl alcohol in the comparative example film (B), a mixed monomer of allyl alcohol and polypropylene dimethacrylate (95: 5) was used, and grafting was carried out under almost the same conditions, and the example film (B) ( Average pore size
0.17 μm, porosity 62%) was obtained.
なお、ここで実施例膜及び比較例膜のヒドロキシル
基、の定量は以下によつた。In addition, here, the quantification of the hydroxyl groups in the example film and the comparative example film was as follows.
アルカリ処理後の膜を十分に水洗、乾燥した後無水酢
酸−ピリジン混液(1:3容量比)を適量加え、密封容器
中で60℃、2.5時間加温する。冷却後水を加えて過剰の
無水酢酸を酢酸に変えてクレゾールレツドとチモールブ
ルーの混合指示薬を加え、標準水酸化アルカリを用いて
滴定した。The membrane after alkali treatment is thoroughly washed with water and dried, then an appropriate amount of acetic anhydride-pyridine mixed solution (1: 3 volume ratio) is added, and the mixture is heated in a sealed container at 60 ° C for 2.5 hours. After cooling, water was added to change excess acetic anhydride to acetic acid, a mixed indicator of cresol red and thymol blue was added, and titration was performed using standard alkali hydroxide.
前記二つの膜の過性能は第2表の如くであつた。 The overperformance of the two membranes is shown in Table 2.
なお、前記の実施例膜(B)、比較例膜(B)に1%
のγ−アミノ酪酸モデル液を通して過速度、保持率を
測定したところ、6m3/m2過した後、その保持率はそ
れぞれ70%、65%であつた。その後これを苛性ソーダ水
溶液及び蒸気滅菌操作で洗浄後その過速度を測定した
ところ、それぞれ100%、95%に回復した。 In addition, 1% is added to the above-mentioned Example film (B) and Comparative Example film (B).
Roh γ- aminobutyric acid model solution through overspeed, where the retention was measured after spent 6m 3 / m 2, 70% respectively, the retention, Atsuta 65%. Then, after washing this with an aqueous solution of caustic soda and steam sterilization and measuring the overspeed, it was recovered to 100% and 95%, respectively.
〔発明の効果〕 本発明によれば、半導体工業用、一般産業用、原子力
廃水処理用、製薬工業等に広く使用し得る高効率膜を、
その性能を低下させることなく製造することが可能であ
る。[Effects of the Invention] According to the present invention, a highly efficient membrane that can be widely used in the semiconductor industry, general industry, nuclear wastewater treatment, pharmaceutical industry, etc.
It is possible to manufacture without deteriorating its performance.
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 庁内整理番号 FI 技術表示箇所 B01D 71/82 500 9538−4D ─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 6 Identification code Internal reference number FI technical display location B01D 71/82 500 9538-4D
Claims (1)
オレフィン共重合体、ポリフッ化ビニリデンまたはポリ
スルホンからなる多孔の基材膜に、アニオン基、カチオ
ン基または中性水酸基を含有する、あるいは導入し得る
モノマーに、このモノマーと共重合し得る2コ以上の反
応基を有するモノマーを共存させてグラフトさせ、最終
的にアニオン基、カチオン基または中性水酸基を含有す
る多孔膜を得ることを特徴とする平均孔径0.001μmな
いし5μm、空孔率20%ないし80%の微孔性グラフト膜
の製造方法。1. A monomer containing an anion group, a cation group or a neutral hydroxyl group or capable of being introduced into a porous base material film comprising polyolefin, olefin and halogenated olefin copolymer, polyvinylidene fluoride or polysulfone, An average pore diameter of 0.001 characterized in that a monomer having two or more reactive groups copolymerizable with this monomer is coexisted and grafted to finally obtain a porous membrane containing an anion group, a cation group or a neutral hydroxyl group. A method for producing a microporous graft membrane having a micrometer to 5 micrometers and a porosity of 20% to 80%.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61099387A JPH0822374B2 (en) | 1986-05-01 | 1986-05-01 | Method for producing graft membrane |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61099387A JPH0822374B2 (en) | 1986-05-01 | 1986-05-01 | Method for producing graft membrane |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62258711A JPS62258711A (en) | 1987-11-11 |
| JPH0822374B2 true JPH0822374B2 (en) | 1996-03-06 |
Family
ID=14246095
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61099387A Expired - Lifetime JPH0822374B2 (en) | 1986-05-01 | 1986-05-01 | Method for producing graft membrane |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0822374B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107847873A (en) * | 2015-06-26 | 2018-03-27 | 恩特格里斯公司 | grafted polysulfone membrane |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH082994B2 (en) * | 1987-03-12 | 1996-01-17 | 日本原子力研究所 | Method for producing modified open-cell polyolefin foam |
| JP2796995B2 (en) * | 1988-06-13 | 1998-09-10 | 旭化成工業株式会社 | Anion-selective adsorptive porous membrane and its production method |
| FR2694842B1 (en) * | 1992-08-11 | 1994-09-30 | Accumulateurs Fixes | Grafted microporous separator for an electrochemical generator and its manufacturing process. |
| EP1435261B1 (en) | 2001-10-04 | 2009-06-17 | Toray Industries, Inc. | Method for production of a hollow fiber membrane |
| CN106256839B (en) * | 2015-06-18 | 2019-02-19 | 中国石油化工股份有限公司 | A kind of method that surface thermal polymerization prepares ion blotting composite membrane |
| JP6633349B2 (en) * | 2015-10-29 | 2020-01-22 | 日東電工株式会社 | Separation membrane, membrane element and membrane module for bubble liquid concentration |
| CN106268375B (en) * | 2016-08-14 | 2018-09-11 | 太原市晋华恒远科技有限公司 | A kind of preparation method of ion liquid functionalization polyphenylene sulfide porous film |
| CN110975649A (en) * | 2019-11-19 | 2020-04-10 | 江苏大孚膜科技有限公司 | Modified polyvinylidene fluoride ultrafiltration membrane and preparation method thereof |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6034980B2 (en) * | 1979-02-05 | 1985-08-12 | 日本原子力研究所 | Method for producing graft membranes with excellent dimensional stability using radiation graft polymerization method |
-
1986
- 1986-05-01 JP JP61099387A patent/JPH0822374B2/en not_active Expired - Lifetime
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107847873A (en) * | 2015-06-26 | 2018-03-27 | 恩特格里斯公司 | grafted polysulfone membrane |
| CN107847873B (en) * | 2015-06-26 | 2021-11-26 | 恩特格里斯公司 | Grafted polysulfone membranes |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62258711A (en) | 1987-11-11 |
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