JPH0824066B2 - High frequency heating equipment - Google Patents
High frequency heating equipmentInfo
- Publication number
- JPH0824066B2 JPH0824066B2 JP63046251A JP4625188A JPH0824066B2 JP H0824066 B2 JPH0824066 B2 JP H0824066B2 JP 63046251 A JP63046251 A JP 63046251A JP 4625188 A JP4625188 A JP 4625188A JP H0824066 B2 JPH0824066 B2 JP H0824066B2
- Authority
- JP
- Japan
- Prior art keywords
- heated
- high frequency
- heating chamber
- mounting table
- heating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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- Constitution Of High-Frequency Heating (AREA)
Description
【発明の詳細な説明】 産業上の利用分野 本発明は高周波加熱装置の高周波給電方法に関するも
ので、加熱室の上下壁面にそれぞれ高周波の給電手段を
有する装置における加熱室内の高周波による異常加熱現
象を抑制せんとするものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a high-frequency power feeding method for a high-frequency heating device, and is intended to prevent abnormal heating phenomenon due to high frequency in a heating chamber in a device having high-frequency power feeding means on the upper and lower walls of the heating chamber. It is something to suppress.
従来の技術 一般にこの種の加熱装置において、高出力の装置を得
んとする場合、高周波の発生手段を複数個設け、同一の
加熱室内に並列運転されるそれぞれの高周波発生手段の
発した高周波を導く構成を設ける方法がとられる。特に
高出力でかつ均一加熱の目的から、高周波を加熱室へ導
びく構成の一例として加熱室の上壁と底壁の部分に、高
周波の加熱室への給電手段を設け被加熱物を上下より加
熱するという手段も用いられている。2. Description of the Related Art In general, in order to obtain a high output device in this kind of heating device, a plurality of high frequency generating means are provided and the high frequency generated by each high frequency generating means operated in parallel in the same heating chamber. A method of providing a guiding structure is adopted. Especially for the purpose of high output and uniform heating, as an example of a structure that guides high frequency waves to the heating chamber, power supply means to the high frequency heating chamber is provided in the upper wall and the bottom wall of the heating chamber and the object to be heated is placed from above and below. Means of heating are also used.
第3図はこの様な構成をなす高周波発生装置の側方断
面を模式的に示したものである。FIG. 3 schematically shows a lateral cross section of a high frequency generator having such a structure.
加熱室1を構成する上壁2及び底壁3の一部にそれぞ
れ、高周波の加熱室への供給にかかる円型の給電口4及
び5を設けている。給電口4,5の中心には誘電体で軸支
された給電用のアンテナ6,7が給電口4,5の中心を軸とし
て回動自在に軸支されている。アンテナ6,7はそれぞれ
一端を加熱室1内に突出させ、その端面近傍に電界の撹
拌にかかる撹拌板8,9を具備している。撹拌板8,9は直接
アンテナ6,7に固着される場合も、又、誘電体を介して
結合される場合もあり得る。下部の撹拌板より上側にガ
ラス等の誘電体よりなる被加熱物10の載置台11が加熱室
をなす側壁12に設けた支持片13により支持されている。
アンテナ6,7の加熱室外の端部は加熱室の後部に設けら
れた高周波発生装置として2個のマグネトロン14,15と
導波管16,17により高周波的に結合されている。また、
アンテナ6,7の導波管16,17側の端部には、導波管16,17
外に設けた駆動モータ18,19の出力軸が結合され、マグ
ネトロン14,15が高周波を発生している間アンテナ6,7を
給電口4,5の中心を軸に回転せしめる構成としている。Circular power supply ports 4 and 5 for supplying a high frequency wave to the heating chamber are provided in a part of the upper wall 2 and the bottom wall 3 constituting the heating chamber 1, respectively. At the center of the power feed ports 4 and 5, antennas 6 and 7 for power feeding, which are rotatably supported by dielectrics, are rotatably supported around the centers of the power feed ports 4 and 5. Each of the antennas 6 and 7 has one end protruding into the heating chamber 1 and is provided with stirring plates 8 and 9 near the end faces thereof for stirring the electric field. The stirring plates 8 and 9 may be directly fixed to the antennas 6 and 7, or may be coupled via a dielectric. Above the lower stirring plate, a mounting table 11 for a heated object 10 made of a dielectric material such as glass is supported by a support piece 13 provided on a side wall 12 forming a heating chamber.
The ends of the antennas 6 and 7 outside the heating chamber are coupled in high frequency by two magnetrons 14 and 15 and waveguides 16 and 17 as a high frequency generator provided at the rear of the heating chamber. Also,
The ends of the antennas 6 and 7 on the side of the waveguides 16 and 17 are
The output shafts of drive motors 18 and 19 provided outside are coupled, and the antennas 6 and 7 are configured to rotate about the centers of the power supply ports 4 and 5 while the magnetrons 14 and 15 generate high frequencies.
上記構成をなし、加熱室1内の載置台11に被加熱物10
を載置しマグネトロン14,15にそれぞれ必要に応じた電
力を供給することで、被加熱物を上下よりしかも、最高
2倍の出力で加熱する事を可能にしている。With the above configuration, the object to be heated 10 is placed on the mounting table 11 in the heating chamber 1.
It is possible to heat the object to be heated from above and below and with a maximum output of twice by supplying electric power to the magnetrons 14 and 15 as needed.
発明が解決しようとする課題 この様な構成の高周波加熱装置の1つの問題点として
載置台の被加熱物の載置されていない部分の異常過熱現
象が上げられる。高周波エネルギーによりその誘電体損
の存在が、被加熱物と同時に載置台11をも加熱し、その
熱は被加熱物が存在する部分は被加熱物に吸収される
が、被加熱物のない部分では時として1000℃以上に溶融
点を有する例えば結晶化ガラス等の高耐熱の誘電体であ
っても、これを局部的に溶融せしめる。この結果、熱応
力の発生により載置台全体が破壊に及ぶというもので、
くりかえし加熱動作が行われると蓄熱作用によりその可
能性が非常に高くなってくる。使用者にとって火傷の原
因となり、ひいては庫内よりの出火、更には本体全体の
火災にもなりかねないきわめて危険な状態を生じる可能
性があった。従来、この対応として例えば加熱室壁に温
度過昇防止手段として、サーモスタット20等を設け庫内
の温度が異常に上昇した場合このスイッチにより、マグ
ネトロン14,15の入力電力を遮断し、加熱動作を停止す
る様にしていたが、高周波出力が大きくなるほど局部的
加熱現象が激しく、例えば載置台の一部が1000℃を超す
状態でもサーモスタットの温度は100℃以下で、正常時
の誤動作を防止する様に設定されたサーモスタットの動
作温度に達せず、充分に機能を果さないという課題を有
していた。Problem to be Solved by the Invention One problem of the high-frequency heating apparatus having such a configuration is an abnormal overheating phenomenon of a portion of the mounting table on which the object to be heated is not mounted. The presence of the dielectric loss due to the high-frequency energy heats the mounting table 11 at the same time as the object to be heated, and the heat is absorbed by the object to be heated in the part where the object to be heated exists, but the part without the object to be heated. Then, even a highly heat-resistant dielectric such as crystallized glass having a melting point of 1000 ° C. or higher is sometimes locally melted. As a result, the entire mounting table will be destroyed due to the generation of thermal stress.
If repeated heating operations are performed, the possibility becomes very high due to the heat storage effect. There is a possibility of causing a burn to the user, eventually causing a fire from the inside of the refrigerator, and causing an extremely dangerous state that may cause a fire of the entire body. Conventionally, as a countermeasure against this, for example, as a means for preventing overheating in the wall of the heating chamber, if a thermostat 20 or the like is provided and the temperature inside the chamber rises abnormally, this switch shuts off the input power of the magnetrons 14 and 15 to perform the heating operation. Although it was stopped, the local heating phenomenon became more severe as the high-frequency output increased, for example, even if a part of the mounting table exceeds 1000 ° C, the temperature of the thermostat is 100 ° C or less, so that malfunctions during normal operation can be prevented. However, there is a problem that the operating temperature of the thermostat set to 1 is not reached and the thermostat does not function sufficiently.
課題を解決するための手段 本発明はかかる載置台の異常加熱を防止せんとされた
もので、載置台と対向する底壁間の距離を電界の変化す
る撹拌板の回転領域部分に比較し、それ以外の部分を短
かくする事で、回転領域外の部分の高周波電界を弱め、
その高周波エネルギーを被加熱物の載置領域に集中さ
せ、又、載置台と底壁間の換気を行ない、載置台の被加
熱物載置領域以外の部分の異常加熱を抑えんとするもの
である。Means for Solving the ProblemsThe present invention is intended to prevent abnormal heating of such a mounting table, and compares the distance between the mounting table and the bottom wall facing the rotating area portion of the stirring plate where the electric field changes, By shortening the other parts, weaken the high-frequency electric field outside the rotation area,
The high-frequency energy is concentrated in the placement area of the object to be heated, and ventilation between the placing table and the bottom wall is performed to suppress abnormal heating of the part of the placing table other than the object placing area. is there.
作用 載置台部分に印加される高周波の電界強度は、加熱室
内に生じる高周波の定在波に左右される。すなわち、底
壁表面の電界は0であり、定在波の腹の部分までを見る
と、壁面より距離が離れるに従がい、電界強度は強くな
っていく。本発明において、被加熱物の載置領域は被加
熱物に対し最も強い電界が印加される様、壁面よりの距
離を設定している。さらにこの領域のほぼ全域にわた
り、電界の撹拌手段が回動する構成を設け強く均一な電
界により、被加熱物の加熱が行われる。同時に載置台も
加熱されるが、載置台に生じる熱は被加熱物に吸収され
る為、この部分での載置台の異常加熱現象は生じない。Action The electric field strength of the high frequency applied to the mounting table part depends on the high frequency standing wave generated in the heating chamber. That is, the electric field on the bottom wall surface is 0, and when looking up to the antinode of the standing wave, the electric field strength increases as the distance from the wall increases. In the present invention, the placement area of the object to be heated is set at a distance from the wall surface so that the strongest electric field is applied to the object to be heated. Further, a configuration in which the stirring means for the electric field is rotated is provided over almost the entire area to heat the object to be heated by a strong and uniform electric field. At the same time, the mounting table is also heated, but since the heat generated in the mounting table is absorbed by the object to be heated, the abnormal heating phenomenon of the mounting table does not occur in this part.
一方、被加熱物の載置領域以外で載置台が底壁に対向
する部分は、撹拌手段の回転による電界の変動に対する
効果が少なく、定在波による局部加熱を生じようとする
が、被加熱物の設置領域に比較し、底壁と載置台との距
離を短かくしただけ載置台の部分に印加される電界が弱
められており、これによって載置台の異常加熱は抑制さ
れる。On the other hand, in the portion where the placing table faces the bottom wall other than the placing area of the object to be heated, there is little effect on the fluctuation of the electric field due to the rotation of the stirring means, and local heating due to standing waves tends to occur. The electric field applied to the part of the mounting table is weakened only by shortening the distance between the bottom wall and the mounting table as compared with the installation area of the object, thereby suppressing abnormal heating of the mounting table.
しかし、この方法のみでは被加熱物の外周部分、特に
上面部分は底壁側より発せられる高周波が被加熱物の底
面によって遮断されてしまい、ほとんど加熱する事が出
来ない。本発明においては平面状の上壁に設けられた第
2の給電手段によって上壁に沿って高周波電磁波が加熱
室周辺に放射され各壁面によって反射され、又上壁近傍
に設けられたもう1つの撹拌板により電界を撹拌されな
がら被加熱物上面や側面を加熱することが出来る。そし
てさらに被加熱物載置領域以外の部分の高周波による加
熱は、載置台と底壁間距離が短かい部分に設けた通気口
を通し、この部分の換気を行ない冷却風の印加によりさ
らに抑制される。However, with this method alone, the outer peripheral portion of the object to be heated, particularly the upper surface portion, can hardly be heated because the high frequency generated from the bottom wall side is blocked by the bottom surface of the object to be heated. In the present invention, the high frequency electromagnetic wave is radiated to the vicinity of the heating chamber along the upper wall by the second power feeding means provided on the flat upper wall, reflected by each wall surface, and another high frequency electromagnetic wave is provided near the upper wall. It is possible to heat the upper surface or side surface of the object to be heated while stirring the electric field with the stirring plate. Further, heating of the portion other than the heated object placement area by high frequency is further suppressed by passing ventilation holes in the portion where the distance between the placement table and the bottom wall is short, and by applying cooling air. It
実施例 本発明の実施例を、第1図,第2図により説明する。
尚、従来例に記す構成と同一の構成部材については同一
の番号を付す。Embodiment An embodiment of the present invention will be described with reference to FIGS.
The same components as those in the conventional example are designated by the same reference numerals.
図に示すように、加熱室底壁3の中央には給電手段と
して円形の高周波の給電口5を設け、従来同様アンテナ
7とその先端に固着した平板状の撹拌板9を給電口5の
中心を軸に回動自在に軸支し、駆動モータ19によりマグ
ネトロン14,15が発振中回転する様に構成している。As shown in the figure, a circular high-frequency power supply port 5 is provided in the center of the heating chamber bottom wall 3 as a power supply means, and an antenna 7 and a flat plate-shaped stirring plate 9 fixed to the tip thereof are provided at the center of the power supply port 5 as in the conventional case. Is rotatably supported by a shaft, and the drive motor 19 causes the magnetrons 14 and 15 to rotate during oscillation.
加熱室1を構成する底壁3は被加熱物の載置領域と同
等又はそれ以下の大きさで撹拌板9の回転半径と大略同
様な半径の円形状の絞り部21を設ける。本実施例におい
ては、加熱室底面が330mm幅×310mm奥行に対し、絞り部
の直径を250mmとしている。絞りの深さは載置領域部分
で充分な電界強度が得られる様な寸法、すなわち実施例
の高周波の周波数が2450MHzの場合、絞り部21の下端
(給電口の部分)面から載置台までの高さを25mm程度と
している。絞り部21の周囲はすり鉢状に60゜の傾斜面22
を設け、その外側は加熱室1の側壁まで載置台11までの
距離を10mm程度としている。加熱室1の上壁2は同様撹
拌板9の回転半径と同様な半径の円形状の絞り部23を設
ける。この絞り部23の中央には同様に給電口4が設けら
れており、アンテナ6とその先端に固定した撹拌板8
を、前述と同様給電口4の中心を軸に回動自在に軸支
し、駆動モータ18によりマグネトロン14,15が発振中回
転し、高周波を加熱室内1へ放射、かつ撹拌する構成を
なしている。絞り部23の周囲は50゜の傾斜面24を設けそ
の外側は給電口4の設けられた面よりも20mm低い面を形
成し側壁部に結合している。The bottom wall 3 constituting the heating chamber 1 is provided with a circular throttle portion 21 having a size equal to or smaller than the placement area of the object to be heated and having a radius substantially similar to the radius of rotation of the stirring plate 9. In this embodiment, the bottom of the heating chamber has a width of 330 mm × 310 mm, and the diameter of the narrowed portion is 250 mm. The depth of the diaphragm is such that sufficient electric field strength can be obtained in the mounting area, that is, when the high frequency of the embodiment is 2450 MHz, the distance from the lower end (portion of the power supply port) surface of the diaphragm 21 to the mounting table. The height is about 25 mm. Around the narrowed portion 21 is a mortar-like 60 ° inclined surface 22
On the outside, the distance from the side wall of the heating chamber 1 to the mounting table 11 is about 10 mm. Similarly, the upper wall 2 of the heating chamber 1 is provided with a circular throttle portion 23 having a radius similar to the rotation radius of the stirring plate 9. Similarly, a power supply port 4 is provided in the center of the throttle portion 23, and the antenna 6 and the stirring plate 8 fixed to the tip thereof are provided.
Is rotatably supported around the center of the power supply port 4 as described above, and the drive motor 18 rotates the magnetrons 14 and 15 during oscillation to radiate a high frequency into the heating chamber 1 and stir it. There is. An inclined surface 24 of 50 ° is provided around the narrowed portion 23, and a surface lower than the surface provided with the power supply port 4 by 20 mm is formed on the outer side thereof and connected to the side wall portion.
さらに、底壁3の傾斜面22より外側の部分には、前方
左右に2ケ所及び後方の左右に2ケ所、それぞれ直径3m
mの穴が複数個よりなる通気口25,26,27,28を設ける。
又、加熱室側壁12において、載置台11よりも下方の部分
も底壁と接合部分より上部において同様の小径の穴が複
数個よりなる通気口29を設けている。加熱室底壁よりの
高周波の放射に係るマグネトロン15は、そのマグネトロ
ン15と側壁の間に設けられたブロアーモーター30の回転
により冷却される構成を有している。ブロアーモーター
30の吸気部の一部には前記通気口27,28,29との間を結ぶ
吸気ガイド31を設け、高周波が発生している間ブロアー
モーター30が回転し、マグネトロン15を冷却すると共
に、通気口28,29,30より載置台11下部の空気を引き出
す。その分の空気は本体前面に設けられた吸気口32より
本体内にとり込まれた本体の冷却風の一部が通気口25,2
6より載置台下部への流入により補充される構成を有し
ている。Further, in the portion outside the inclined surface 22 of the bottom wall 3, there are two front and left and two rear and right and left portions, each having a diameter of 3 m.
Vent holes 25, 26, 27, 28 having a plurality of m holes are provided.
Further, in the side wall 12 of the heating chamber, a vent hole 29 having a plurality of holes of the same small diameter is provided in a portion below the mounting table 11 above the bottom wall and the joint portion. The magnetron 15 relating to high-frequency radiation from the bottom wall of the heating chamber has a configuration in which it is cooled by rotation of a blower motor 30 provided between the magnetron 15 and the side wall. Blower motor
An air intake guide 31 is provided in a part of the air intake portion of the air passage 30 to connect the air vents 27, 28 and 29, and the blower motor 30 rotates while high frequency is generated, cooling the magnetron 15 and venting the air. The air under the mounting table 11 is drawn out through the mouths 28, 29, 30. A part of the cooling air of the main body taken into the main body from the intake port 32 provided on the front surface of the main body is the ventilation port 25, 2
It has a structure in which it is replenished by flowing into the lower part of the mounting table from 6.
その他加熱室1を形成する前壁33には被加熱物の出入
にかかる扉34を開閉自在に設け、両者の接触により高周
波の漏洩を防ぐ構成をなしている。又、マグネトロン15
を冷却した風は排気口35より本体外部に排出される。In addition, a front wall 33 forming the heating chamber 1 is provided with a door 34 for opening and closing an object to be heated and closed so as to prevent leakage of high frequency waves due to contact between the two. Also, magnetron 15
The cooled air is discharged from the exhaust port 35 to the outside of the main body.
以上の構成によれば、アンテナ7を介して加熱室1底
部の絞り部21に放射された高周波は、載置台11を通過
し、直接被加熱物10の底部に吸収されるかまたは傾斜面
22に向い、この部分で反射される。傾斜面の底壁3に対
する角度により反射の方向は左右されるが、傾斜面22の
給電口を設けた面に対する傾斜を45゜以上の角度とした
場合、高周波は加熱室の中心側へ向って反射され、被加
熱物10の底面に向うことになる。According to the above configuration, the high frequency wave radiated to the narrowed portion 21 at the bottom of the heating chamber 1 through the antenna 7 passes through the mounting table 11 and is directly absorbed by the bottom of the object to be heated 10 or the inclined surface.
It is facing 22 and is reflected by this part. The direction of reflection depends on the angle of the inclined surface with respect to the bottom wall 3, but when the inclination of the inclined surface 22 with respect to the surface provided with the power supply port is 45 ° or more, the high frequency wave is directed toward the center of the heating chamber. It is reflected and faces the bottom surface of the object to be heated 10.
すなわちマグネトロン15の発した高周波はアンテナ7
を介して被加熱物10の底部の方向に向って放射され、傾
斜面22より外側へは進行しにくくなる。平板状の撹拌板
9は回転に応じて高周波のアンテナ7の回転軸を中心と
した高周波の照射の方向を変える事と又、壁面を起点と
した定在波の立ち具合を変化させ、絞り部21の電界を変
化させ、被加熱物10底面の局部加熱を防止する。そして
この部分における載置台11は被加熱物10が熱を吸収し異
常加熱現象を生じない。さらに、傾斜面22より外側へ出
た高周波は、載置台11を通過し、加熱室1内へ放射され
るが、前述のごとく底壁3よりの載置台11までの距離を
10mmとした事で、この部分における定在波による電界強
度が低くなり、従来10分間の本体動作にて300℃以上の
温度となっていた部分を140℃以下とする事が出来る様
になった。That is, the high frequency generated by the magnetron 15 is transmitted to the antenna 7
Is radiated toward the bottom of the article to be heated 10 via, and is less likely to travel to the outside of the inclined surface 22. The flat plate-shaped stirring plate 9 changes the direction of high-frequency irradiation centering on the rotation axis of the high-frequency antenna 7 according to the rotation, and also changes the standing wave standing on the wall surface as the starting point, and the diaphragm part The electric field of 21 is changed to prevent local heating of the bottom surface of the object 10 to be heated. Then, the mounting table 11 in this portion does not cause an abnormal heating phenomenon because the object 10 to be heated absorbs heat. Further, the high frequency wave that has exited from the inclined surface 22 passes through the mounting table 11 and is radiated into the heating chamber 1. However, as described above, the distance from the bottom wall 3 to the mounting table 11 is increased.
By making it 10 mm, the electric field strength due to the standing wave in this part becomes low, and it became possible to lower the part where the temperature was 300 ° C or more in the conventional body operation for 10 minutes to 140 ° C or less. .
さらに、通気口25,26より底壁3と載置台11間へ流入
し通気口27,28,29部分より排出される空気の流れは、10
mmという狭い空間を流れる為、載置台11の表面近傍の流
速も被加熱物10の載置領域すなわち絞り部21に比較しき
わめて早くその表面に対する冷却効果もきわめて高くな
っている。結果、10分間の温度上昇はさらに140℃の部
分が110℃前後まで低下するに至った。さらに常時空気
の流れが存在する事で、この空間部分の蓄熱を防止し、
長時間使用時における被加熱物10の載置領域外における
200℃を超える異常加熱現象は皆無とする事が出来、載
置台11の破壊を未然に防ぐ事が可能となった。Furthermore, the flow of air flowing from the vents 25, 26 between the bottom wall 3 and the mounting table 11 and discharged from the vents 27, 28, 29 is 10
Since it flows in a narrow space of mm, the flow velocity near the surface of the mounting table 11 is much faster than the mounting area of the object to be heated 10, that is, the narrowed portion 21, and the cooling effect on the surface is extremely high. As a result, the temperature rise of 10 minutes further decreased to around 110 ℃ at 140 ℃. Furthermore, the presence of air flow at all times prevents heat accumulation in this space,
Outside the placement area of the object to be heated 10 during long-term use
It is possible to eliminate the abnormal heating phenomenon that exceeds 200 ° C and prevent the mounting table 11 from being destroyed.
一方、この方法のみでは、被加熱物10の上面及び側面
を充分に加熱する事が困難であるが、本発明においては
加熱室の上壁にもその中央部分に給電口4を設ける事で
アンテナ6より発射される高周波により充分加熱し得
る。On the other hand, it is difficult to sufficiently heat the upper surface and the side surface of the object to be heated 10 only by this method. However, in the present invention, the antenna is provided by providing the power feeding port 4 in the central portion of the upper wall of the heating chamber. It can be sufficiently heated by the high frequency wave emitted from No. 6.
アンテナ6の先端に設けられた撹拌板8により傾斜面
24に向った高周波は、この傾斜面24にて反射される。傾
斜面の上壁3に対する角度を50゜とした事で反射された
高周波はその位置から直下より若干内側へ向い、被加熱
物10へ進入していく。載置台11と給電口4間の距離は、
給電口5との距離に比較し、被加熱物10の載置用の空間
が必要な分だけ大きく、高周波の集束性が低下している
為、傾斜部24の直下部分に載置された被加熱物も充分加
熱され、結果被加熱物は上下方向より充分に加熱され、
それより外部の被加熱物10の載置されない載置台11の周
辺部分へは高周波の進入が少なくなり給電口4より加熱
室内へ照射された高周波によっても載置台11の異常加熱
を生じない。An inclined surface by the stirring plate 8 provided at the tip of the antenna 6.
The high frequency wave toward 24 is reflected by this inclined surface 24. The high frequency reflected by setting the angle with respect to the upper wall 3 of the inclined surface to 50 ° goes slightly inward from below and enters the object to be heated 10. The distance between the mounting table 11 and the power supply port 4 is
Compared with the distance to the power supply port 5, the space for placing the article to be heated 10 is larger by a necessary amount, and the high-frequency focusing property is deteriorated, so that the object placed directly below the inclined portion 24 is placed. The object to be heated is also sufficiently heated, and as a result, the object to be heated is sufficiently heated from above and below,
Further, the high frequency does not enter the peripheral portion of the mounting table 11 on which the object to be heated 10 is not mounted outside, and abnormal heating of the mounting table 11 does not occur even by the high frequency irradiated into the heating chamber from the power supply port 4.
尚本実施例において傾斜部22,24の傾斜角は60゜と50
゜という値に設定しているが、この角度は加熱室1の寸
法,絞り部の寸法,あるいは被加熱物の種類、形状によ
っては被加熱物10の加熱具合と、載置台11の周辺部の温
度の上昇の具合に応じて最適値を設定するようにしてい
る。In this embodiment, the inclination angles of the inclined portions 22 and 24 are 60 ° and 50 °.
Although it is set to a value of °, this angle depends on the size of the heating chamber 1, the size of the narrowed portion, or the heating condition of the heated object 10 and the peripheral part of the mounting table 11 depending on the type and shape of the heated object. The optimum value is set according to how the temperature rises.
また、上壁に設けた絞り部23は設けなくても載置台12
の温度の上昇をある程度おさえる事が可能である。すな
わち、載置台の外周部は撹拌板9の回転域に比較し、壁
面よりの距離が近い為、加熱に係る充分な高周波電界が
生じないのは前述のごとくである。In addition, the mounting table 12 does not have to be provided with the diaphragm 23 provided on the upper wall.
It is possible to suppress the rise in the temperature to a certain degree. That is, as described above, since the outer peripheral portion of the mounting table is closer to the rotation area of the stirring plate 9 than the wall surface, a sufficient high-frequency electric field for heating is not generated.
さらに本実施例においては、載置台11と底壁3の間の
換気を行うため、ブロアーモーター30の回転による負圧
により、この空間の空気を引き出す方法を示したが、他
の実施例としてこの空間の換気は逆にブロアーモーター
30により例えば通気口29等より強制的にこの空間へ空気
を送り込み正圧とし、他の通気口25,26等より加熱室壁
外へ排出させる事もあり得る。この場合は、実施例に比
較し、空気の流速が高く、載置台はさらに良く冷却さ
れ、異常加熱を抑制するに効果的である。Further, in this embodiment, in order to perform ventilation between the mounting table 11 and the bottom wall 3, a method of drawing out the air in this space by the negative pressure generated by the rotation of the blower motor 30 has been shown. Ventilation of the space is the reverse blower motor
It is possible that, for example, air is forcibly sent to this space from the vent hole 29 or the like by means of 30 to make it a positive pressure, and is discharged to the outside of the heating chamber wall from the other vent holes 25, 26 or the like. In this case, as compared with the embodiment, the flow velocity of air is higher, the mounting table is further cooled, and it is effective in suppressing abnormal heating.
発明の効果 以上の構成により本発明は、当初の目的通り被加熱物
の載置台の外周部分における異常加熱を未然に防ぐこと
が出来る様になったと同時に以下のごとき効果も合わせ
て得ることが出来る様になった。Effects of the Invention With the above configuration, the present invention makes it possible to prevent abnormal heating in the outer peripheral portion of the mounting table of the object to be heated as originally intended, and at the same time, the following effects can be obtained together. It became like.
(1) 被加熱物の加熱室内への出入にかかる扉と対向
する加熱室の前壁の接触部分等への高周波の進入が軽減
され電界が弱められる事でこの部分よりの高周波の漏洩
の軽減を計ることが出来た。更にはこの部分の高周波に
よる加熱現象をも大幅に低減する事が出来、被加熱物出
入の際のこの接触部分に触れることによる火傷を未然に
防ぐ事が出来る様になり安全性を向上させる事が出来
た。(1) Reduction of high-frequency leakage from this part by reducing the high-frequency intrusion to the contact part of the front wall of the heating chamber facing the door that moves the heated object in and out of the heating chamber and weakening the electric field I was able to measure. Furthermore, it is possible to significantly reduce the heating phenomenon due to high frequency in this part, and to prevent burns caused by touching this contact part when moving in and out of the object to be heated, thus improving safety. Was completed.
(2) 円形の絞り部と傾斜部を設け、この中で撹拌板
を回転させる事で、アンテナから見た負荷インピーダン
スの変動が従来にくらべきわめて少なくなり、従来、載
置台へ吸収されていた高周波が底面より被加熱物へ吸収
されることと相まって、大幅に加熱効率を向上する事が
できた。特にこの傾向は軽負荷時に顕著に表われた。実
施例において、マグネトロンに一定の入力電力を印加し
た場合、2の水負荷に対する250ccの水負荷時の高周
波出力の割合は、従来60〜65%程度であったものが80%
以上の値を得ることが出来るに至り、従来1分の加熱時
間を要していた被加熱物を45〜50秒にて加熱する事が可
能となったのである。(2) By providing a circular throttle and an inclined part, and rotating the stirring plate in this, the fluctuation of the load impedance seen from the antenna is extremely reduced compared to the past, and the high frequency that was previously absorbed by the mounting table. In addition to being absorbed by the object to be heated from the bottom surface, the heating efficiency could be greatly improved. This tendency was especially remarkable at light loads. In the embodiment, when a constant input power is applied to the magnetron, the ratio of the high frequency output at the time of 250 cc of water load to the water load of 2 is 80% in the conventional 60 to 65%.
With the above values being obtained, it has become possible to heat an object to be heated in 45 to 50 seconds, which conventionally required a heating time of 1 minute.
第1図は本発明の実施例の要部を示す平面断面図、第2
図は本発明の実施例を示す側方断面図、第3図は従来例
を示す側方断面図である。 1……加熱室、3……底壁、5……給電口、7……アン
テナ、9……撹拌板、10……被加熱物、11……載置台、
21……絞り部、22……傾斜面、25,26,27,28,29……通気
口。FIG. 1 is a plan sectional view showing an essential part of an embodiment of the present invention.
FIG. 3 is a side sectional view showing an embodiment of the present invention, and FIG. 3 is a side sectional view showing a conventional example. 1 ... heating chamber, 3 ... bottom wall, 5 ... power supply port, 7 ... antenna, 9 ... stirring plate, 10 ... object to be heated, 11 ... mounting table,
21 …… throttle part, 22 …… slanted surface, 25, 26, 27, 28, 29 …… vent.
Claims (1)
する上壁及び底壁の壁面の中央部にそれぞれ高周波の給
電手段およびその給電手段を中心に回動する撹拌板を設
け、少なくとも前記底壁には被加熱物の載置領域と同等
あるいはそれ以下の前記撹拌板の回動領域と略同一寸法
の外形で、前記撹拌板の回動軸を中心とする被加熱物側
に向って開いたすり鉢状の傾斜面を周囲に有する円形の
絞り部を設け、さらにその絞り部より外側部分に通気口
を設け、加熱動作中、この絞り部より外側部分の換気を
行なう構成とを有する事を特長とする高周波加熱装置。1. A heating chamber is provided in a main body, and high-frequency power feeding means and a stirring plate which rotates around the power feeding means are provided at central portions of wall surfaces of an upper wall and a bottom wall which form the heating chamber, respectively. At least the bottom wall has an outer shape which is substantially the same as the rotating area of the stirring plate which is equal to or smaller than the placement area of the object to be heated, and is located on the side of the object to be heated around the rotating shaft of the stirring plate. A circular throttling part having a mortar-shaped inclined surface open toward the periphery is provided, and a vent is provided further outside the throttling part to ventilate the part outside the throttling part during heating operation. High frequency heating device characterized by having.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63046251A JPH0824066B2 (en) | 1988-02-29 | 1988-02-29 | High frequency heating equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63046251A JPH0824066B2 (en) | 1988-02-29 | 1988-02-29 | High frequency heating equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH01221886A JPH01221886A (en) | 1989-09-05 |
| JPH0824066B2 true JPH0824066B2 (en) | 1996-03-06 |
Family
ID=12741949
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63046251A Expired - Lifetime JPH0824066B2 (en) | 1988-02-29 | 1988-02-29 | High frequency heating equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0824066B2 (en) |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2180127B (en) * | 1985-09-04 | 1989-08-23 | Philips Electronic Associated | Method of data communication |
-
1988
- 1988-02-29 JP JP63046251A patent/JPH0824066B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH01221886A (en) | 1989-09-05 |
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| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |