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JPH083068B2 - Ink for dry lithographic printing - Google Patents
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JPH083068B2 - Ink for dry lithographic printing - Google Patents

Ink for dry lithographic printing

Info

Publication number
JPH083068B2
JPH083068B2 JP62103880A JP10388087A JPH083068B2 JP H083068 B2 JPH083068 B2 JP H083068B2 JP 62103880 A JP62103880 A JP 62103880A JP 10388087 A JP10388087 A JP 10388087A JP H083068 B2 JPH083068 B2 JP H083068B2
Authority
JP
Japan
Prior art keywords
rosin
phenol resin
parts
resin
lithographic printing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP62103880A
Other languages
Japanese (ja)
Other versions
JPS63268779A (en
Inventor
一喜 飯田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Artience Co Ltd
Original Assignee
Toyo Ink Mfg Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyo Ink Mfg Co Ltd filed Critical Toyo Ink Mfg Co Ltd
Priority to JP62103880A priority Critical patent/JPH083068B2/en
Publication of JPS63268779A publication Critical patent/JPS63268779A/en
Publication of JPH083068B2 publication Critical patent/JPH083068B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Description

【発明の詳細な説明】 「発明の目的」 (産業上の利用分野) 本発明は乾式平版印刷用インキに関するものである。DETAILED DESCRIPTION OF THE INVENTION "Object of the Invention" (Field of Industrial Application) The present invention relates to a dry lithographic printing ink.

(従来技術) 現在,一般的な印刷方法として凸版印刷,平版印刷,
凹版印刷等があり,平版印刷の内,ウェットオフセット
印刷では,印刷版表面が親水部分と親油部分からなり,
インキは親油部分にのみ転移し,画線が得られる方式で
ある。この印刷方式では画像が鮮明であり,高級な印刷
物が得られること,製版価格が安価で,短時間で製版が
できることを特徴としている。しかし,この印刷方法で
は,印刷時にインキと共に湿し水を使うため,インキの
コントロールと共に湿し水についてもコントロールする
必要があり,印刷作業は高度の技術を要する。このため
最近湿し水を使うことなく,平版オフセット印刷ができ
る印刷方式が提唱されている。すなわち,乾式平版印刷
であり,この方式での印刷は,従来のウェットオフセッ
ト印刷時に問題となっていた湿し水による弊害,例えば
印刷インキの乳化,水負けによる転移不良,ゴースティ
ングの発生等が改良される。
(Prior Art) Currently, as general printing methods, letterpress printing, planographic printing,
There are intaglio printing, etc. Among the lithographic printing, in wet offset printing, the printing plate surface consists of a hydrophilic part and a lipophilic part,
This is a method in which the ink is transferred only to the lipophilic part to obtain a streak. The features of this printing method are that images are clear, high-quality printed matter can be obtained, plate making price is low, and plate making can be done in a short time. However, in this printing method, the dampening water is used together with the ink at the time of printing, so that it is necessary to control the dampening water as well as the control of the ink, and the printing work requires a high technique. For this reason, a printing method has been proposed recently that enables lithographic offset printing without using dampening water. That is, it is a dry lithographic printing, and the printing by this method has problems such as emulsification of printing ink, transfer failure due to water loss, occurrence of ghosting, etc. which are problems at the time of conventional wet offset printing. Be improved.

しかし,通常のインキを使用して,この乾式平版印刷
法によって印刷を長時間継続すると,版面での温度が上
昇し,インキが非画線部に付着して汚れを起こしやすく
なる。これを解決する手段として各種インキ用素材をシ
リコン化合物で変性する手段が提案されている。例え
ば,シリコン変性アルキッド樹脂(特公昭51-10124号公
報,同51-22405号公報),シリコン変性フェノール樹脂
(特開昭52-10042号公報,同52-62506号公報),シリコ
ン変性乾性油(特公昭52-10041号公報,同52-10042号公
報)シリコン変性シクロペンタジエン系樹脂(特開昭56
-11024号公報,同56-110706号公報),低芳香族系オレ
フィン成分の溶剤を使用するインキ(特開昭56-82861号
公報)等がある。これらの素材は,汚れには効果が見ら
れるものの,組み合わせによっては汚れ耐性がまだ不満
足であったり,地汚れ耐性が改良されると共に印刷物の
光沢が劣化して,印刷物の品質が低下するなどの欠点が
見られる。一方,インキでの問題は保存中にインキが増
粘するために作業性が悪くなる。さらにはシロキサン化
合物は一般インキ用素材に比べ,非常に高価であるた
め,インキの価格も上昇してしまうなどの欠点がある。
However, when printing is continued for a long time by this dry lithographic printing method using ordinary ink, the temperature on the plate surface rises, and the ink easily adheres to the non-image area to cause stains. As a means for solving this, a means for modifying various ink materials with a silicon compound has been proposed. For example, silicon-modified alkyd resin (Japanese Patent Publication No. 51-10124, No. 51-22405), silicon-modified phenol resin (Japanese Patent Laid-Open No. 52-10042, 52-62506), silicon-modified drying oil ( Japanese Patent Publication Nos. 52-10041 and 52-10042) Silicon-modified cyclopentadiene resin (JP-A-56-56)
-11024 and 56-110706), and an ink using a solvent of a low aromatic olefin component (JP-A-56-82861). Although these materials show an effect on stains, depending on the combination, stain resistance is still unsatisfactory, or the background stain resistance is improved and the gloss of the printed matter deteriorates, and the quality of the printed matter deteriorates. There are drawbacks. On the other hand, the problem with ink is that workability deteriorates because the ink thickens during storage. Furthermore, since siloxane compounds are much more expensive than general ink materials, there is a drawback that the price of ink also rises.

(発明が解決しようとする問題点) 乾式平版を用いた印刷において,地汚れ耐性があり,
光沢が優れ,かつ安価で保存中の安定性の優れた乾式平
版印刷用インキが望まれていた。
(Problems to be solved by the invention) In printing using a dry lithographic plate, there is scum resistance,
There has been a demand for a dry lithographic printing ink that has excellent gloss, is inexpensive, and has excellent stability during storage.

「発明の構成」 (問題点を解決するための手段) 本発明者等は,地汚れ耐性があり,光沢が優れ,保存
安定性の優れ,かつ安価な乾式平版印刷用インキの検討
をしたところ,レゾール型フェノール樹脂とロジンの二
重結合とを反応せしめた樹脂成分と,残りのフェノール
樹脂であるレゾール型フェノール樹脂およびまたはノボ
ラック型フェノール樹脂とロジンのカルボキシル基とを
エステル化反応せしめた樹脂成分からなり,酸価を40以
下としてなるロジン変性フェノール樹脂を,流動点−20
℃以下,アニリン点75〜85℃,沸点230℃以上である,
芳香族炭化水素含有量が10重量%以下のインキ溶剤に溶
解させたワニスを含有する乾式平版印刷用インキを発明
した。
“Structure of the Invention” (Means for Solving Problems) The inventors of the present invention have studied a dry lithographic printing ink that is resistant to scumming, has excellent gloss, has excellent storage stability, and is inexpensive. , A resin component obtained by reacting a resol type phenolic resin with a double bond of rosin, and a resin component obtained by esterifying the remaining phenolic resin such as a resole type phenolic resin and / or a novolac type phenolic resin with a carboxyl group of rosin Rosin-modified phenolic resin with an acid value of 40 or less
℃ below, aniline point 75 ~ 85 ℃, boiling point above 230 ℃,
A dry lithographic printing ink containing a varnish dissolved in an ink solvent having an aromatic hydrocarbon content of 10% by weight or less was invented.

本発明のロジン変性フェノール樹脂は,安価で,かつ
オフセット印刷のインキに適した分子量のコントロール
ができ,しかもオフセット印刷の印刷適性の良いロジン
変性フェノール樹脂の合成に検討を加え,ロジンとフェ
ノール樹脂を反応させることにより得られるロジン変性
フェノール樹脂において,フェノール樹脂の一部である
レゾール型フェノール樹脂がロジン分子内に存在する二
重結合と反応し,樹脂状の多塩基酸(主として2塩基
酸)となる。更にこの反応物とレゾール型およびまたは
ノボラック型フェノール樹脂とを酸性触媒の存在下でエ
ステル化反応によて酸価を40以下としたロジン変性フェ
ノール樹脂をワニス成分として含有する乾式平版印刷用
インキを見出したものである。なお,反応の順序を逆に
することもできる。
INDUSTRIAL APPLICABILITY The rosin-modified phenolic resin of the present invention is inexpensive, can control the molecular weight suitable for offset printing ink, and has been studied for the synthesis of rosin-modified phenolic resin having good printability for offset printing. In the rosin-modified phenolic resin obtained by the reaction, the resole-type phenolic resin that is a part of the phenolic resin reacts with the double bond present in the rosin molecule and becomes a resin-like polybasic acid (mainly dibasic acid). Become. Furthermore, a dry lithographic printing ink containing as a varnish component a rosin-modified phenolic resin having an acid value of 40 or less by an esterification reaction of this reaction product and a resol-type and / or novolac-type phenolic resin in the presence of an acidic catalyst is provided. I found it. The order of the reactions can be reversed.

すなわち酸性触媒下での反応では,ポリオール成分と
してのレゾール型またはノボラック型フェノール樹脂は
ロジンおよび上記のレゾール型フェノール樹脂とロジン
の反応による樹脂状多塩基酸との混合物と150℃以上の
温度によってエステル化反応し,酸価40以下,好ましく
は30以下としてなる印刷インキ用樹脂である。
That is, in the reaction under acidic catalyst, the resole-type or novolak-type phenolic resin as the polyol component is rosin and the mixture of the above-mentioned resole-type phenolic resin and the resinous polybasic acid resulting from the reaction of rosin with ester at a temperature of 150 ° C or higher. It is a resin for printing ink that undergoes a chemical reaction to give an acid value of 40 or less, preferably 30 or less.

ロジンとしてはガムロジン,ウッドロジン,トール油
ロジン,不均化ロジンなどがあり,また重合ロジン,マ
レイン化ロジン,フマル化ロジン等のロジン誘導体,炭
素数6〜18の脂肪酸,重合乾性油脂肪酸等の併用も必要
に応じて可能である。
Examples of rosin include gum rosin, wood rosin, tall oil rosin, disproportionated rosin, etc. Also, combined use of rosin derivatives such as polymerized rosin, maleated rosin, fumarized rosin, C6-18 fatty acids, and polymerized dry oil fatty acids Is also possible if necessary.

また,本発明に用いるフェノール樹脂はレゾール型,
ノボラック型にかかわらず,p-t−ブチルフェノール,p−
オクチルフェノールおよびp−ノニルフェノールから選
ばれる少なくとも1種を主体として用いたフェノールの
p−ホルムアルデヒドとの縮合によるフェノール樹脂が
好ましい。勿論,その他のフェノールを用いることもで
きる。レゾール型縮合体には水酸化ナトリウム,水酸化
カリウム,水酸化カルシウム,酸化マグネシウム等のア
ルカリ,アンモニア水,1−エチルアミン,トリエタノー
ルアミン・トリエチレンジアミン等のアミン類等が反応
触媒として利用することができる。
The phenol resin used in the present invention is a resol type,
Regardless of novolac type, pt-butylphenol, p-
Phenolic resins obtained by condensation of phenol with p-formaldehyde mainly containing at least one selected from octylphenol and p-nonylphenol are preferable. Of course, other phenols can be used. For the resol type condensate, alkali such as sodium hydroxide, potassium hydroxide, calcium hydroxide and magnesium oxide, ammonia water, amines such as 1-ethylamine, triethanolamine and triethylenediamine can be used as reaction catalysts. it can.

また,ノボラック型縮合体の合成には硫酸,塩酸,修
酸,p−トルエンスルホン酸等の公知の反応触媒が利用で
きる。
Further, known reaction catalysts such as sulfuric acid, hydrochloric acid, oxalic acid and p-toluenesulfonic acid can be used for the synthesis of the novolak type condensate.

次に本発明のロジン変性フェノール樹脂のロジンとフ
ェノール樹脂の重量割合はロジン100に対し,フェノー
ル樹脂30〜150が望ましい。もしこの範囲よりフェノー
ル樹脂が少ないと,樹脂の分子量が低下し,軟化点も低
くなってしまう。また150より多くなると分子量が高く
なり,その結果インキ溶剤への溶解性が劣化してしま
う。更に本発明におけるロジンと反応させるフェノール
樹脂の比率は無触媒でロジンの二重結合と反応するフェ
ノール樹脂と酸性触媒の存在下でカルボン酸とエステル
化反応させるフェノール樹脂の比が重量で1:0.8〜1:4が
望ましい。もしこの範囲よりも,無触媒でロジンの二重
結合と反応させるフェノール樹脂が多いと,エステル化
に要する水酸基が不足することになり,酸価の低下が難
しく,別のエステル化工程を必要とし,オフセット印刷
適性が不足する。また逆にこの範囲より少なくなると架
橋性のある樹脂状多塩基酸の生成が減ってしまい,分子
量の低下をきたす。
Next, the weight ratio of the rosin and the phenol resin of the rosin-modified phenol resin of the present invention is preferably 30 to 150 phenol resin to 100 rosin. If the amount of phenolic resin is less than this range, the molecular weight of the resin will decrease and the softening point will also decrease. If it exceeds 150, the molecular weight becomes high, and as a result, the solubility in the ink solvent deteriorates. Further, the ratio of the phenol resin reacted with the rosin in the present invention is such that the ratio of the phenol resin which reacts with the double bond of the rosin without a catalyst and the phenol resin which is esterified with the carboxylic acid in the presence of an acidic catalyst is 1: 0.8 by weight. ~ 1: 4 is desirable. If the amount of phenolic resin that reacts with the double bond of rosin without catalyst is more than this range, the hydroxyl groups required for esterification will be insufficient, making it difficult to lower the acid value and requiring a separate esterification step. , Offset printability is insufficient. On the other hand, when the amount is less than this range, the production of crosslinkable resinous polybasic acid is reduced and the molecular weight is lowered.

樹脂の酸価は遊離のカルボキシル基を残存量を示すも
のであり,残存量が多いとオフセット印刷適性上好まし
くなく、酸価は40以下,好ましくは30以下となるまで反
応する必要がある。
The acid value of the resin indicates the residual amount of free carboxyl groups, and if the residual amount is large, it is not preferable for offset printing suitability, and it is necessary to react until the acid value becomes 40 or less, preferably 30 or less.

本発明のロジン変性フェノール樹脂を得るためにはp
−トルエンスルホン酸,ドデシルベンゼンスルホン酸,
メタンスルホン酸,エタンスルホン酸等のスルホン酸
類,硫酸,塩酸等の鉱酸を触媒として150℃以上の加熱
によってロジンとレゾール型またはノボラック型フェノ
ール樹脂とのエステル化反応をする必要がある。しか
し,このような条件では反応物が容易に着色するため,
還元剤である次亜リン酸,トリフェニルホスファイト,
トリフェニルホスフェート等の併用が好ましい。
To obtain the rosin-modified phenolic resin of the present invention, p
-Toluenesulfonic acid, dodecylbenzenesulfonic acid,
Esterification reaction between rosin and resole-type or novolac-type phenol resin must be carried out by heating above 150 ° C using sulfonic acids such as methanesulfonic acid and ethanesulfonic acid, and mineral acids such as sulfuric acid and hydrochloric acid as catalysts. However, the reaction product is easily colored under these conditions,
Reducing agent hypophosphorous acid, triphenylphosphite,
A combined use of triphenyl phosphate and the like is preferable.

ロジンとフェノール樹脂の反応の順序は先に無触媒
でロジン分子中の二重結合とレゾール型フェノール樹脂
を反応させ,次に酸性触媒を加えてレゾール型およびま
たはノボラック型フェノール樹脂をロジンのカルボキシ
ル基と反応させる方法,酸性触媒下で先にロジンのカ
ルボキシル基とレゾール型またはノボラック型フェノー
ル樹脂を反応せしめ,酸性触媒を中和した後,レゾール
型フェノール樹脂を添加し,二重結合との反応を行うこ
とも可能である。
The reaction sequence of the rosin and the phenolic resin is such that the double bond in the rosin molecule is first reacted with the resol type phenolic resin without catalyst, and then an acid catalyst is added to the resol type and / or novolac type phenolic resin to react with the carboxyl group of the rosin. Method, the carboxyl group of rosin is first reacted with a resole-type or novolak-type phenol resin under an acidic catalyst to neutralize the acid catalyst, and then a resole-type phenol resin is added to react with the double bond. It is also possible to do so.

しかし,の工程には触媒中和のためにアルカリ物質
が必要であること,また中和による塩が残ることから
の工程の方が有利である。
However, the step (1) requires an alkaline substance for catalyst neutralization, and the step (1) is more advantageous because it leaves a salt due to neutralization.

更に本発明の乾式平版印刷用インキ用樹脂は従来から
印刷インキに用いられるロジン変性フェノール樹脂,ア
ルキッド樹脂,石油樹脂,更にはロジンとフェノール樹
脂のエステル化反応によって得られる高融点,高溶解性
のロジン変性フェノール樹脂との併用や一部の石油樹脂
変性,アクリル変性等の変性も可能である。
Further, the resin for a dry lithographic printing ink of the present invention has a high melting point and a high solubility obtained by an esterification reaction of a rosin-modified phenol resin, an alkyd resin, a petroleum resin, and a rosin and a phenol resin which have been conventionally used for printing inks. It can be used in combination with rosin-modified phenolic resin, or modified with some petroleum resin or acrylic.

本発明の乾式平版印刷用インキに用いる溶剤は流動点
−10℃以下であり,アニリン点75〜85℃の範囲にあり,
沸点が230℃以上で,芳香族炭化水素含有量が10重量%
以下のインキ溶剤が好ましい。従来の溶剤の1つとし
て,芳香族炭化水素含有量が高いものであり,これを利
用した乾式平版印刷用インキは地汚れ耐性が不十分であ
る。また,芳香族炭化水素含有量は10重量%以下である
が,アニリン点が85℃以上で,流動点も5℃近く,と高
いため,インキの光沢が劣化し,また冬季や長期間の保
存安定性に欠ける溶剤であった。従来のこれらの溶剤に
伴う欠点を解消するために,流動点が−10℃以下という
低いことで冬季の粘度安定が保たれる。またアニリン点
が75℃より低い場合は光沢は良好であるが,地汚れ耐性
が不十分である。また85℃より高いものは光沢が劣化
し,保存安定性が悪い。地汚れ耐性と芳香族炭化水素含
有量とも関係があり,10重量%以上の場合は地汚れ耐性
が不十分となる。沸点が230℃より低い場合は,印刷機
上での安定性が欠け,長時間の連続印刷で紙むけ等の事
故を起こすことがある。
The solvent used in the dry lithographic printing ink of the present invention has a pour point of -10 ° C or lower and an aniline point of 75 to 85 ° C.
Boiling point is over 230 ℃, aromatic hydrocarbon content is 10% by weight
The following ink solvents are preferred. One of the conventional solvents has a high aromatic hydrocarbon content, and the ink for dry lithographic printing using this has insufficient resistance to scumming. The aromatic hydrocarbon content is 10% by weight or less, but the aniline point is 85 ° C or higher and the pour point is high at 5 ° C, which deteriorates the gloss of the ink and preserves it in winter or for a long time. It was a solvent lacking stability. In order to eliminate the disadvantages associated with these conventional solvents, the pour point is as low as -10 ° C or lower to maintain the viscosity stability in winter. When the aniline point is lower than 75 ° C, the gloss is good but the stain resistance is insufficient. Also, if the temperature is higher than 85 ° C, the gloss deteriorates and the storage stability is poor. There is also a relation between the soil resistance and the aromatic hydrocarbon content, and when the content is 10% by weight or more, the soil resistance becomes insufficient. When the boiling point is lower than 230 ° C, the stability on the printing press is poor, and accidents such as peeling of paper may occur during continuous printing for a long time.

本発明の乾式平版印刷用インキは,ロジン変性フェノ
ール樹脂20〜60重量%,インキ溶剤20〜60重量%,の他
に,アマニ油,桐油,米ぬか油等の乾性油およびまたは
それらの重合油5〜30重量%によるワニス,さらにこの
ワニスを,オクチル酸アルミニウム,ステアリン酸アル
ミニウム,オクチル酸ジルコニウム,アルミニウムトリ
イソプロポキサイド,アルミニウムジイソプロポキサイ
ドモノアセチルアセテート等による公知のゲル化剤を利
用してゲルワニスにすることが望ましい。
The dry lithographic printing ink of the present invention comprises, in addition to 20 to 60% by weight of a rosin-modified phenolic resin and 20 to 60% by weight of an ink solvent, a drying oil such as linseed oil, tung oil or rice bran oil and / or a polymerized oil thereof. -30% by weight of varnish, and further this varnish using a known gelling agent such as aluminum octylate, aluminum stearate, zirconium octylate, aluminum triisopropoxide, and aluminum diisopropoxide monoacetyl acetate. Is desirable.

さらに必要に応じてオルガノポリシロキサンの添加も
可能である。添加量は,5重量%以下が望ましく,それ以
上の添加は光沢が劣化する。オルガノポリシロキサンと
しては,メチルポリシロキサン,メチルフェニルポリシ
ロキサン,ジメチルポリシロキサン,アルキルアリル変
性シリコーンオイルなどが挙げられる。
If necessary, organopolysiloxane can be added. The amount added is preferably less than 5% by weight, and the addition of more than that deteriorates the gloss. Examples of the organopolysiloxane include methylpolysiloxane, methylphenylpolysiloxane, dimethylpolysiloxane, and alkylallyl-modified silicone oil.

また着色剤としては黄色,紅色,藍色,または墨色な
どの顔料を分散し,必要に応じて耐摩擦向上剤,インキ
ドライヤー,乾燥抑制剤等のコンパウンドを添加し,適
切な粘度となるよう調整することで枚葉乾式平版印刷用
インキ,オフ輪乾式平版印刷用インキとなる。
Also, as a colorant, pigments such as yellow, crimson, indigo, or black are dispersed, and if necessary, compounds such as an anti-friction agent, an ink dryer and a drying inhibitor are added to adjust the viscosity to an appropriate level. By doing so, it becomes a sheet-fed dry lithographic printing ink and an off-wheel dry lithographic printing ink.

次に具体例によって本発明を説明する。「部」,
「%」とは重量部,重量%をそれぞれ表わす。
The present invention will be described below with reference to specific examples. "Part",
"%" Represents parts by weight and% by weight, respectively.

製造例1 (レゾール型フェノール樹脂の製造) 撹拌機,水分離器付還流冷却器,温度計付き4つ口フ
ラスコにp−オクチルフェノール170部,p-t−ブチルフ
ェノール22部,35%ホルマリン170部,93%水酸化ナトリ
ウム12部,水道水100部を加え90℃に加熱し,4時間反応
させた後,200部のトルエンを加えてフェノール樹脂をト
ルエンに溶解し,6N塩酸25部を水道水200部で希釈して添
加して,中和した後,静置し,水層除去した後,200部の
水で2回水洗し,PH5〜6とした後,トルエン層を採出し
た。このフェノール樹脂のトルエン溶液は不揮発分50%
で収量は420であった。このレゾール型フェノール樹脂
溶液をAレゾール液とする。
Production Example 1 (Production of Resol-type Phenolic Resin) Stirrer, reflux condenser with water separator, 4-port flask with thermometer, p-octylphenol 170 parts, pt-butylphenol 22 parts, 35% formalin 170 parts, 93% After adding 12 parts of sodium hydroxide and 100 parts of tap water and heating to 90 ° C and reacting for 4 hours, 200 parts of toluene was added to dissolve the phenol resin in toluene, and 25 parts of 6N hydrochloric acid was added to 200 parts of tap water. The mixture was diluted and added, neutralized, allowed to stand, the aqueous layer was removed, then washed twice with 200 parts of water to PH5 to 6, and then the toluene layer was collected. The toluene solution of this phenol resin has a nonvolatile content of 50%
The yield was 420. This resol type phenol resin solution is referred to as A resol solution.

製造例2 製造例1で示した工程でフェノール成分(p−オクチ
ルフェノール170部,p-t−ブチルフェノール22部)をp
−オクチルフェノール200部にかえた以外は全く同様の
操作により不揮発分49%のレゾール型フェノール樹脂溶
液(Bレゾール液)を400部得た。
Production Example 2 In the process shown in Production Example 1, the phenol component (p-octylphenol 170 parts, pt-butylphenol 22 parts) was added to p.
In the same manner as above, except that the amount of octylphenol was changed to 200 parts, 400 parts of a resole type phenol resin solution (B resole solution) having a nonvolatile content of 49% was obtained.

製造例3 (ノボラック型フェノール樹脂の製造) 製造例1で示したものと同様なフラスコにp−オクチ
ルフェノール170部,p-t−ブチルフェノール22部,35%ホ
ルマリン60部,修酸2部を仕込み,90℃に加熱した後90
分反応し塩酸5部を加えて120分90℃で撹拌して水を200
部加えて20分撹拌後1時間放置した。その後,水を除き
更にもう一度200部の水を加えて20分間撹拌して30分間
放置して水を除き,キシレン180部を添加した後110℃で
2時間撹拌し,不揮発分50%のAノボラック液を得た。
Production Example 3 (Production of Novolac Phenolic Resin) A flask similar to that shown in Production Example 1 was charged with 170 parts of p-octylphenol, 22 parts of pt-butylphenol, 60 parts of 35% formalin, 2 parts of oxalic acid, and 90 ° C. After heating to 90
After reacting for 5 minutes, add 5 parts of hydrochloric acid and stir for 120 minutes at 90 ℃ to add 200 parts of water.
After adding 20 parts for 20 minutes, the mixture was left for 1 hour. Then, remove water, add 200 parts of water again, stir for 20 minutes, leave for 30 minutes to remove water, add 180 parts of xylene, stir for 2 hours at 110 ° C., and add A novolak with a nonvolatile content of 50%. A liquid was obtained.

製造例4 製造例3で示した工程でフェノール成分(p−オクチ
ルフェノール170部,p-t−ブチルフェノール22部)をp-t
−ブチルフェノール200部にかえた以外は全く同じ工程
で不揮発分45%のBノボラック液を得た。
Production Example 4 The phenol component (170 parts of p-octylphenol, 22 parts of pt-butylphenol) was pt in the process shown in Production Example 3.
-A B novolak solution having a nonvolatile content of 45% was obtained by the same steps except that 200 parts of butylphenol was replaced.

製造例5 (ロジン変性フェノール樹脂の製造) 撹拌機,水分離器付コンデンサー,温度計付き4つ口
フラスコに中国ガムロジン200部を仕込み,窒素ガスを
吹き込みながら加熱し,200℃以下で溶融,撹拌し,260℃
まで昇温する。Bレゾール液120部を1時間かけて滴下
する,この間にレゾール液中のトルエンを水分離器付コ
ンデンサーを通して回収して260℃に温度を保った。そ
の後260℃で2時間撹拌し,280部のBレゾール液と,硫
酸/次亜リン酸=3/7の混合したエステル化触媒1.2部と
をよく混合して,1時間かけて滴下する。この間トルエン
と水(エステル化による反応脱水)を水分離器付コンデ
ンサーを通して回収して260℃に温度を保った。その後
6時間反応して酸価20となった時点で汲出した。
Production Example 5 (Production of rosin-modified phenolic resin) Stirrer, condenser with water separator, four-necked flask with thermometer were charged with 200 parts of Chinese gum rosin, heated while blowing nitrogen gas, and melted and stirred below 200 ° C. 260 ° C
Heat up to 120 parts of B resol solution was added dropwise over 1 hour, during which toluene in the resol solution was collected through a condenser with a water separator and the temperature was kept at 260 ° C. After that, the mixture is stirred at 260 ° C. for 2 hours, 280 parts of B resol solution and 1.2 parts of a mixed esterification catalyst of sulfuric acid / hypophosphorous acid = 3/7 are thoroughly mixed and added dropwise over 1 hour. During this period, toluene and water (reaction dehydration by esterification) were collected through a condenser with a water separator to keep the temperature at 260 ° C. After that, the mixture was reacted for 6 hours and was pumped out when the acid value reached 20.

このロジン変性フェノール樹脂は酸価20,重量平均分
子量23.200(GPC法による),融点158℃(キャピラリー
法)であった。
This rosin-modified phenolic resin had an acid value of 20, a weight average molecular weight of 23.200 (by GPC method), and a melting point of 158 ° C (capillary method).

製造例6 製造例1と同様な反応装置で,Bレゾール液120部を無
触媒でロジン200部と反応し,更に酸性触媒下でBノボ
ラック液を実施例1と同工程で酸価24となるまで反応さ
せた。
Production Example 6 In the same reactor as in Production Example 1, 120 parts of B resol solution was reacted with 200 parts of rosin without a catalyst, and B novolak solution was acidified to 24 in the same process as in Example 1 under an acidic catalyst. Reacted.

この樹脂の酸価は24,重量平均分子量は18700,融点は1
52℃であった。
This resin has an acid value of 24, a weight average molecular weight of 18700 and a melting point of 1
It was 52 ° C.

製造例7 製造例1と同様な装置に中国ガムロジン200部を仕込
み,窒素ガスを吹き込みながら加熱し,200℃以下で溶
融,撹拌し,240℃として,Aレゾール液120部を1時間か
けて滴下し,2時間反応した後,Aレゾール液200部と,p−
トルエンスルホン酸/次亜リン酸=1/1の触媒液1.2部と
をよく混合して,240℃の反応系に1時間かけて滴下し,7
時間30分撹拌し,酸価23として汲出した。
Production Example 7 200 parts of Chinese gum rosin were charged in the same apparatus as in Production Example 1, heated while blowing nitrogen gas, melted and stirred at 200 ° C or lower, and at 240 ° C, 120 parts of A resol solution was added dropwise over 1 hour. After reacting for 2 hours, 200 parts of A resol solution and p-
Toluene sulfonic acid / hypophosphorous acid = 1/1 catalyst solution 1.2 parts was mixed well and added dropwise to the reaction system at 240 ° C over 1 hour.
After stirring for 30 minutes, an acid value of 23 was pumped out.

この樹脂の酸価は23,重量平均分子量22800,融点163℃
であった。
The acid value of this resin is 23, weight average molecular weight 22800, melting point 163 ° C.
Met.

製造例8 製造例7と同様な工程で中国ガムロジン200部とAレ
ゾール液120部とを無触媒で反応した後,Aノボラック液2
00部と,p−トルエンスルホン酸/次亜リン酸=1/1のエ
ステル化触媒2.5部とをよく混合して,滴下し8時間エ
ステル化反応して,酸価26として汲出した。
Production Example 8 In the same process as in Production Example 7, 200 parts of Chinese gum rosin and 120 parts of A resol solution were reacted without a catalyst, and then A novolak solution 2
00 parts and 2.5 parts of an esterification catalyst of p-toluenesulfonic acid / hypophosphorous acid = 1/1 were mixed well, added dropwise and subjected to an esterification reaction for 8 hours, and an acid value of 26 was pumped out.

この樹脂の酸価は26,重量平均分子量19700,融点159℃
であった。
The acid value of this resin is 26, weight average molecular weight 19700, melting point 159 ° C.
Met.

実施例1 (地汚れ耐性,光沢,保存安定性のよい乾式平版印刷用
インキの製造) 製造例5で得たロジン変性フェノール樹脂400部,00号
アマニ油重合油80部,エクソゾールD100(エクソン化学
系インキ溶剤)320部を撹拌機,温度計付きフラスコに
仕込み加熱し,180℃として30分撹拌後,冷却し,ワニス
1を得た。ワニス1 800部をオクトープAl(ホープ製薬
製ゲル化剤)16部でゲル化しゲルワニス1を得た。
Example 1 (Production of dry lithographic printing ink with good background stain resistance, gloss, and storage stability) 400 parts of rosin-modified phenolic resin obtained in Preparation Example 5, No. 00 linseed oil polymerized oil 80 parts, Exol D100 (Exxon Chemical 320 parts of a system ink solvent) was charged into a flask equipped with a stirrer and a thermometer, heated and stirred at 180 ° C. for 30 minutes and then cooled to obtain a varnish 1. Gel varnish 1 was obtained by gelling 800 parts of varnish 1 with 16 parts of octope Al (gelling agent manufactured by Hope Pharmaceutical Co., Ltd.).

実施例2 実施例1と同様にして,製造例6で得た樹脂400部,00
号アマニ油重合油80部,ナフテゾールH(日本石油化学
製インキ溶剤)320部でワニス2を得,ワニス2 800部と
オクトープAl16部によってゲルワニス2を得た。
Example 2 In the same manner as in Example 1, 400 parts of resin obtained in Production Example 6 was added.
No. linseed oil 80 parts of polymerized oil, 320 parts of Naphthesol H (Nippon Petrochemical Ink Solvent) were used to obtain varnish 2, and 800 parts of varnish 2 and 16 parts of octope Al were used to obtain gel varnish 2.

実施例3 実施例1と同様にして,製造例2で得た樹脂400部,00
号アマニ油重合油80部,エクソゾールD110(エクソン化
学性インキ溶剤)100部,PKWF28/S1(ハルトマンGMBH製
溶剤)100部によってワニス3を得,このワニス800部と
AlCH(川研ファインケミカル製ゲル化剤)12部によって
ゲルワニス3を得た。
Example 3 In the same manner as in Example 1, 400 parts of the resin obtained in Production Example 2 was added.
No. linseed oil 80 parts of polymerized oil, 100 parts of Exosol D110 (exxon chemical ink solvent), 100 parts of PKWF28 / S1 (Hartmann GMBH solvent) to obtain varnish 3 and 800 parts of this varnish
A gel varnish 3 was obtained with 12 parts of AlCH (Kawaken Fine Chemicals gelling agent).

比較例1 (従来からの樹脂とナフテン系溶剤でのワニスの作成) 製造例1と同様な反応装置に中国ガムロジン200部を
仕込み窒素ガスを吹き込みながら加熱し,200℃で撹拌を
はじめ更に230℃に昇温して,ヒタノール2501(日立化
成製p−オクチルフェノールのレゾール型フェノール樹
脂)150部を2時間かけて添加し,同温度で2時間反応
したものは酸価83であり,エステル化は起こっていな
い。この後グリセリンを17.5部(OH基/COOH基=1.1/1)
添加し,260℃に昇温して8時間反応して酸価24とした。
Comparative Example 1 (Preparation of varnish from conventional resin and naphthenic solvent) 200 parts of Chinese gum rosin were charged in the same reactor as in Production Example 1, heated while blowing nitrogen gas, and stirred at 200 ° C and further 230 ° C. The temperature was raised to 150 ° C and 150 parts of Hitachinol 2501 (p-octylphenol resol-type phenol resin manufactured by Hitachi Chemical) was added over 2 hours, and the reaction was conducted for 2 hours at the same temperature, the acid value was 83, and esterification occurred. Not not. After this, 17.5 parts of glycerin (OH group / COOH group = 1.1 / 1)
After the addition, the temperature was raised to 260 ° C and the reaction was carried out for 8 hours to obtain an acid value of 24.

この樹脂の酸価は24,融点は134℃であった。このロジ
ン変性フェノール樹脂を比較樹脂Iとする。
The acid value of this resin was 24 and the melting point was 134 ° C. This rosin-modified phenolic resin is referred to as Comparative Resin I.

この樹脂175部,00号アマニ油重合油40部,エクゾール
D100によって実施例1と同工程で比較ワニス1および比
較ゲルワニス1を得た。
175 parts of this resin, No. 00 linseed oil 40 parts of polymerized oil, Exol
Comparative varnish 1 and comparative gel varnish 1 were obtained by the same process as in Example 1 using D100.

比較例2 (従来のパラフィン系溶剤を使用した場合) 実施例1と同様にして製造例5で得たロジン変性フェ
ノール樹脂180部,00号アマニ油重合油40部,日石0号ソ
ルベントH(日本石油化学製ノルマルパラフィン系溶
剤)180部を用いてワニス化およびゲルワニス化し,そ
れぞれ比較ワニス2,比較ゲルワニス2とした。
Comparative Example 2 (when a conventional paraffinic solvent is used) In the same manner as in Example 1, the rosin-modified phenolic resin obtained in Production Example 5 180 parts, No. 00 linseed oil polymerized oil 40 parts, Nisseki No. 0 solvent H ( A varnish and a gel varnish were prepared by using 180 parts of normal petroleum-based solvent (Nippon Petrochemical Co., Ltd.) to prepare Comparative Varnish 2 and Comparative Gel Varnish 2, respectively.

比較例3 製造例3で示した工程でロジン変性フェノール樹脂I1
80部を比較樹脂I180部に替えた以外は全く同工程で比較
ワニス3および比較ゲルワニス3を得た。
Comparative Example 3 Rosin-modified phenolic resin I1 in the process shown in Production Example 3
Comparative varnish 3 and comparative gel varnish 3 were obtained in exactly the same process except that 80 parts of the comparative resin I was replaced with 180 parts of the comparative resin I.

〔インキの作成〕[Creation of ink]

インキは,それぞれのゲルワニス65部,カーミン6BA
(東洋インキ製造製紅顔料)180部を3本ロールミルを
用いて分散し,それぞれワニスおよびゲルワニス,およ
びワニス化時に用いたインキ溶剤を用いてインキ化し
た。
Ink is 65 parts of each gel varnish, Carmin 6BA
180 parts (red pigment manufactured by Toyo Ink Mfg. Co., Ltd.) were dispersed using a three-roll mill, and each was made into an ink using the varnish and gel varnish, and the ink solvent used at the time of forming the varnish.

実施例4はゲルワニス1を使用してオルガノポリシロ
キサン(信越シリコンKF96 信越シリコン製)を添加し
た例であり、比較例4は比較ゲルワニス1を使用してオ
ルガノポリシロキサンを添加した例である。
Example 4 is an example in which the gel varnish 1 was used to add an organopolysiloxane (Shin-Etsu Silicon KF96 manufactured by Shin-Etsu Silicon), and Comparative Example 4 was an example in which the comparative gel varnish 1 was used to add an organopolysiloxane.

〔インキ評価〕[Ink evaluation]

これらのインキを乾式平版を用いて印刷し,地汚れ温
度と印刷物の光沢を測定した。すなわち,版胴に電熱ヒ
ーターを設置して版面温度を上昇できるように改造した
印刷機に,シリコーンゴムよりなる非粘着性層を有する
乾式平版を取りつけ,湿し水を供給することなく,版面
温度を上昇させながら印刷し,一定のベタ濃度を測定し
た。結果を表に示す。
These inks were printed using a dry lithographic plate, and the background temperature and gloss of the printed matter were measured. That is, a dry lithographic plate having a non-adhesive layer made of silicone rubber was attached to a printing machine modified by installing an electric heater on the plate cylinder to raise the plate surface temperature, and the plate surface temperature was supplied without supplying dampening water. The printing was performed while increasing the value, and a constant solid density was measured. The results are shown in the table.

なお,光沢は印刷物を160℃のオーブンに5秒入れて
加熱後,村上色材製グロスメーターモデルDM-26D(60-6
0)で測定した。
For gloss, place the printed matter in an oven at 160 ° C for 5 seconds and heat it, then use the gloss meter model Murakami DM-26D (60-6
It was measured in 0).

さらにインキの保存安定性は60℃,48時間保存した後,
25℃としてパーチ上から指で押して,硬さを調べた。
Furthermore, the storage stability of the ink is as follows:
The hardness was examined by pushing it from above the perch with a finger at 25 ° C.

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】レゾール型フェノール樹脂とロジンの二重
結合とを反応せしめた樹脂成分と、レゾール型フェノー
ル樹脂およびまたはノボラック型フェノール樹脂とロジ
ンのカルボキシル基とをエステル化反応せしめた樹脂成
分とからなり、酸価を40以下としてなるロジン変性フェ
ノール樹脂を、流動点−20℃以下、アニリン点75〜85
℃、沸点230℃以上である、芳香族炭化水素含有量が10
重量%以下のインキ溶剤に溶解させたワニスを用いるこ
とを特徴とする乾式平版印刷用インキ。
1. A resin component obtained by reacting a resol-type phenol resin with a double bond of rosin, and a resin component obtained by esterifying a resol-type phenol resin and / or a novolac-type phenol resin with a carboxyl group of rosin. The rosin-modified phenolic resin having an acid value of 40 or less has a pour point of −20 ° C. or less and an aniline point of 75 to 85.
℃, boiling point 230 ℃ or more, aromatic hydrocarbon content is 10
An ink for dry lithographic printing, which comprises using a varnish dissolved in an ink solvent of not more than wt%.
【請求項2】上記レゾール型フェノール樹脂またはノボ
ラック型フェノール樹脂がp-t−ブチルフェノール、p
−オクチルフェノールおよびp−ノニルフェノールから
選ばれる少なくとも1種を主体として用いたホルムアル
デヒドとの縮合体である特許請求の範囲第1項記載の乾
式平版印刷用インキ。
2. The resol type phenol resin or novolac type phenol resin is pt-butylphenol, p.
The dry lithographic printing ink according to claim 1, which is a condensate of formaldehyde mainly containing at least one selected from octylphenol and p-nonylphenol.
【請求項3】上記ロジン変性フェノール樹脂においてロ
ジンとフェノール樹脂との重量比が、ロジン100に対し
フェノール樹脂30〜150である特許請求の範囲第1項ま
たは第2項記載の乾式平版印刷用インキ。
3. The dry lithographic printing ink according to claim 1, wherein the weight ratio of rosin to phenol resin in the rosin-modified phenol resin is 30 to 150 with respect to 100 rosin. .
【請求項4】ロジンと反応させるフェノール樹脂が、無
触媒によるロジンの二重結合と反応するレゾール型フェ
ノール樹脂と酸性触媒下でロジンのカルボキシル基と反
応するレゾール型またはノボラック型フェノール樹脂と
の重量比が1:0.8〜1:4である特許請求の範囲第1項ない
し第3項いずれか記載の乾式平版印刷用インキ。
4. The weight of a phenol resin to be reacted with a rosin, which is a resol type phenol resin which reacts with a non-catalyst rosin double bond and a resole type or novolak type phenol resin which reacts with a carboxyl group of rosin under an acidic catalyst. The dry lithographic printing ink according to any one of claims 1 to 3, wherein the ratio is 1: 0.8 to 1: 4.
【請求項5】さらにオルガノポリシロキサンを添加して
なる特許請求の範囲第1項ないし第4項いずれか記載の
乾式平版印刷用インキ。
5. The dry lithographic printing ink according to any one of claims 1 to 4, further comprising an organopolysiloxane.
JP62103880A 1987-04-27 1987-04-27 Ink for dry lithographic printing Expired - Fee Related JPH083068B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62103880A JPH083068B2 (en) 1987-04-27 1987-04-27 Ink for dry lithographic printing

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62103880A JPH083068B2 (en) 1987-04-27 1987-04-27 Ink for dry lithographic printing

Publications (2)

Publication Number Publication Date
JPS63268779A JPS63268779A (en) 1988-11-07
JPH083068B2 true JPH083068B2 (en) 1996-01-17

Family

ID=14365747

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62103880A Expired - Fee Related JPH083068B2 (en) 1987-04-27 1987-04-27 Ink for dry lithographic printing

Country Status (1)

Country Link
JP (1) JPH083068B2 (en)

Also Published As

Publication number Publication date
JPS63268779A (en) 1988-11-07

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