JPH0832608B2 - Manufacturing method of ceramic thin film adhered to substrate - Google Patents
Manufacturing method of ceramic thin film adhered to substrateInfo
- Publication number
- JPH0832608B2 JPH0832608B2 JP6424887A JP6424887A JPH0832608B2 JP H0832608 B2 JPH0832608 B2 JP H0832608B2 JP 6424887 A JP6424887 A JP 6424887A JP 6424887 A JP6424887 A JP 6424887A JP H0832608 B2 JPH0832608 B2 JP H0832608B2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- thin film
- ceramic thin
- manufacturing
- film adhered
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000000758 substrate Substances 0.000 title claims description 22
- 239000010409 thin film Substances 0.000 title claims description 20
- 239000000919 ceramic Substances 0.000 title claims description 9
- 238000004519 manufacturing process Methods 0.000 title claims description 5
- 239000003960 organic solvent Substances 0.000 claims description 6
- 150000002736 metal compounds Chemical class 0.000 claims description 4
- 239000000243 solution Substances 0.000 description 13
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 12
- 229910000000 metal hydroxide Inorganic materials 0.000 description 10
- 150000004692 metal hydroxides Chemical class 0.000 description 10
- 150000002902 organometallic compounds Chemical class 0.000 description 8
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 7
- 239000010408 film Substances 0.000 description 7
- 150000004703 alkoxides Chemical class 0.000 description 4
- SMZOGRDCAXLAAR-UHFFFAOYSA-N aluminium isopropoxide Chemical compound [Al+3].CC(C)[O-].CC(C)[O-].CC(C)[O-] SMZOGRDCAXLAAR-UHFFFAOYSA-N 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 230000007062 hydrolysis Effects 0.000 description 4
- 238000006460 hydrolysis reaction Methods 0.000 description 4
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- DFOMPYFFBAELGP-UHFFFAOYSA-N butan-1-ol;yttrium Chemical compound [Y].CCCCO.CCCCO.CCCCO DFOMPYFFBAELGP-UHFFFAOYSA-N 0.000 description 3
- BSDOQSMQCZQLDV-UHFFFAOYSA-N butan-1-olate;zirconium(4+) Chemical compound [Zr+4].CCCC[O-].CCCC[O-].CCCC[O-].CCCC[O-] BSDOQSMQCZQLDV-UHFFFAOYSA-N 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 229910002084 calcia-stabilized zirconia Inorganic materials 0.000 description 2
- 238000007606 doctor blade method Methods 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000011148 porous material Substances 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 229910001233 yttria-stabilized zirconia Inorganic materials 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- XSTXAVWGXDQKEL-UHFFFAOYSA-N Trichloroethylene Chemical group ClC=C(Cl)Cl XSTXAVWGXDQKEL-UHFFFAOYSA-N 0.000 description 1
- 239000007983 Tris buffer Substances 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 238000004220 aggregation Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 239000013522 chelant Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 239000002612 dispersion medium Substances 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 239000012776 electronic material Substances 0.000 description 1
- -1 ethyl acetoacetate aluminum Chemical compound 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- GPRLSGONYQIRFK-UHFFFAOYSA-N hydron Chemical compound [H+] GPRLSGONYQIRFK-UHFFFAOYSA-N 0.000 description 1
- 150000004679 hydroxides Chemical class 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 238000001935 peptisation Methods 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 229910002076 stabilized zirconia Inorganic materials 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Landscapes
- Chemically Coating (AREA)
Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明は電極材料、電子材料などとして用いる基板に
密着したセラミツク薄膜の製造法に関する。The present invention relates to a method for producing a ceramic thin film adhered to a substrate used as an electrode material, an electronic material or the like.
従来、セラミツク薄膜を製造する方法としては、酸化
物粉末とバインダー、分散媒を混合し、平膜に成形した
後乾燥、焼成するいわゆるドクターブレード法が著名で
ある。As a conventional method for producing a ceramic thin film, a so-called doctor blade method in which an oxide powder, a binder and a dispersion medium are mixed, a flat film is formed, which is then dried and baked is famous.
しかしながら、従来のドクターブレード法で製造する
膜は、薄膜単体で紙のようなもので強度が低く、基板の
表面に担持させることが困難であり、強度を高くしよう
として膜厚を大にすると膜性能が低下するという問題が
あつた。However, the film produced by the conventional doctor blade method is a thin film like a paper and has a low strength, and it is difficult to support it on the surface of the substrate. There was a problem that the performance deteriorated.
本発明は従来の技術水準に鑑み、セラミツクス薄膜を
基板に密着して製造する方法を提供しようとするもので
ある。In view of the conventional state of the art, the present invention aims to provide a method for producing a ceramic thin film by closely adhering to a substrate.
本発明は有機金属化合物を有機溶剤に溶解して溶液と
し、同溶液を加水分解した後解膠剤を加えてゾル溶液と
し、同ゾル溶液を基板に塗布した後、乾燥、焼成するこ
とを特徴とする基板に密着したセラミツク薄膜の製造法
である。The present invention is characterized in that an organic metal compound is dissolved in an organic solvent to form a solution, the solution is hydrolyzed, a peptizer is added to form a sol solution, and the sol solution is applied to a substrate and then dried and baked. Is a method of manufacturing a ceramic thin film that is in close contact with the substrate.
すなわち、本発明では有機金属化合物を含有する有機
溶剤溶液と水を接触させて加水分解することにより金属
水酸化物を生成させ、これに解膠剤を加えてゾル溶液と
し基板に塗布して薄膜を形成した後、乾燥、焼成するこ
とにより基板に密着したセラミツクスの薄膜を得る方法
である。That is, in the present invention, an organic solvent solution containing an organometallic compound is brought into contact with water to hydrolyze it to produce a metal hydroxide, and a peptizer is added to this to form a sol solution, which is applied to a substrate to form a thin film. It is a method of obtaining a ceramic thin film adhered to a substrate by forming and then drying and baking.
有機金属化合物は一般に固体（常温付近）であり、ま
た水との反応により加水分解しやすく加水分解すると水
和物となるため物性が変化する。そこで本発明では有機
金属化合物を溶解する有機溶剤に溶解したものを出発原
料とする。Organometallic compounds are generally solid (around normal temperature), and are easily hydrolyzed by a reaction with water, and when hydrolyzed to form a hydrate, physical properties change. Therefore, in the present invention, a starting material is one in which an organic metal compound is dissolved in an organic solvent.
次に、この原料を水と接触させて均一に加水分解し、
金属水酸化物の沈殿を得る。この時使用する水は水蒸気
であつてもよいし、液状の水であつてもよい。この時、
原料の有機金属化合物を２種以上の金属を含有するよう
にすれば、２種以上の金属の水酸化物が同時に得られ
る。Next, this raw material is brought into contact with water to uniformly hydrolyze,
A precipitate of metal hydroxide is obtained. The water used at this time may be water vapor or liquid water. This time,
When the raw material organometallic compound contains two or more metals, hydroxides of two or more metals can be obtained at the same time.
このようにして得られた金属水酸化物は一般に凝集が
激しく、薄膜を形成させるような場合には好ましくな
い。The metal hydroxide thus obtained generally has strong aggregation and is not preferable in the case of forming a thin film.
従つてここで凝集をほぐすための解膠剤を加えて処理
することにより、金属水酸化物ゾルを得る。解膠の方法
としては酸またはアルカリを添加して水素イオン濃度を
調整するだけでよい場合もあるし、又はいわゆる解膠剤
と呼ばれる有機化合物を添加しボールミル等により機械
的に分散させゾル溶液としてもよい。Therefore, a peptizing agent for loosening the agglomerates is added and treated here to obtain a metal hydroxide sol. As a method for deflocculation, it may be sufficient to adjust the hydrogen ion concentration by adding an acid or an alkali, or an organic compound called a deflocculant is added and mechanically dispersed by a ball mill or the like to obtain a sol solution. Good.
このようにして均一な金属水酸化物ゾル溶液を得た
後、基板に塗布する。この場合の基板は緻密質であつて
もよいし多孔質であつてもよい。塗布後乾燥することに
より、基板表面に金属水酸化物薄膜が形成される。薄膜
の厚さの制御はゾル溶液の濃度を制御してもよいし、濃
度の薄いものを多数回形成してもよい。After thus obtaining a uniform metal hydroxide sol solution, it is applied to the substrate. In this case, the substrate may be dense or porous. By coating and drying, a metal hydroxide thin film is formed on the surface of the substrate. To control the thickness of the thin film, the concentration of the sol solution may be controlled, or a thin solution may be formed many times.
次に、金属酸化物薄膜とするには、乾燥、焼成した後
金属水酸化物が分解する温度以上において熱処理を行な
つて酸化物とする。Next, to obtain a metal oxide thin film, heat treatment is carried out at a temperature equal to or higher than the temperature at which the metal hydroxide decomposes after being dried and baked to obtain an oxide.
有機金属化合物としては種々の金属のアルコキシドが
ポピュラーであるが、その他キレート化合物も使用可能
である。例えば、アルミニウムの有機金属化合物として
は、アルミニウムアルコラートとして、アルミニウムイ
ソプロポキシドやアルミニウム−２−ブチレートなどが
あり、アルミニウムキレートとしてはトリス（エチルア
セラート）やエチルアセトアセテートアルミニウムジイ
ソプロピレートなどが知られている。Alkoxides of various metals are popular as the organometallic compound, but other chelate compounds can also be used. For example, as an organometallic compound of aluminum, there are aluminum isopropoxide, aluminum-2-butyrate and the like as aluminum alcoholate, and tris (ethyl acecerate) and ethyl acetoacetate aluminum diisopropylate are known as aluminum chelates. ing.
有機金属化合物は水に対し不安定なものが多く、また
室温では固体のものが多くハンドリング上不都合である
ので、アセトン、トリクロルエタン、キシレンなどの有
機溶剤に溶解し、使用すると液体としての取り扱いが可
能となり、また空気中の水蒸気との接触による加水分解
も防止できるので都合がよい。Many organic metal compounds are unstable to water, and many of them are solid at room temperature, which are inconvenient in handling. This is advantageous because it becomes possible and hydrolysis due to contact with water vapor in the air can be prevented.
実施例１ 有機金属化合物としてジルコニウムブトキシド〔Zr(O
nBu)4〕及びイツトリウムブトキシド〔Y(OnBu)3〕を準
備した。また、上記のアルコキシドは空気中においては
空気中の水蒸気と反応し水和物を生成しやすく、また室
温においては固体であるのでハンドリングが困難である
ため、問題解決のため両アルコキシドをキシレンに溶解
した。この時のそれぞれの濃度はジルコニウムブトキシ
ドが1.08モル/l、イツトリウムブトキシドが0.29モル/l
であつた。Example 1 Zirconium butoxide [Zr (O
n Bu) 4 ] and yttrium butoxide [Y (O n Bu) 3 ] were prepared. In addition, the above alkoxides easily react with water vapor in the air to form a hydrate in the air, and are difficult to handle because they are solid at room temperature, so both alkoxides are dissolved in xylene to solve the problem. did. The respective concentrations at this time were 1.08 mol / l for zirconium butoxide and 0.29 mol / l for yttrium butoxide.
It was.
上記のアルコキシド溶液をそれぞれジルコニウム酸化
物（ZrO2）として92モル％、イツトリウム酸化物（Y
2O3）として８モル％になるように混合した。The above alkoxide solution was used as zirconium oxide (ZrO 2 ) in an amount of 92 mol%, yttrium oxide (YrO 2 )
2 O 3 ) was mixed so as to be 8 mol%.
この有機溶剤に溶解した有機金属化合物に10倍量（重
量比）の水を加え、加水分解した。この時、加水分解に
より乳白色の沈殿が得られた。A 10-fold amount (weight ratio) of water was added to the organometallic compound dissolved in this organic solvent to cause hydrolysis. At this time, a milky white precipitate was obtained by hydrolysis.
次に1N塩酸を滴下した解膠しゾル溶液を得た。 Next, 1N hydrochloric acid was added dropwise to peptize to obtain a sol solution.
次に基板として平均細孔径20μｍ、気孔率10％のカル
シア安定ジルコニア基板（50mm□×3t）の表面に塗布
し、約200μｍ厚さの膜を形成した。このようにして得
た金属水酸化物の薄膜を実験室内に48時間放置して自然
乾燥した後、電気炉中に入れて、1200℃までは100℃/h
の昇温速度で昇温し、1200℃において２時間保持した後
炉冷した。Then, as a substrate, a calcia-stabilized zirconia substrate (50 mm □ × 3 t) having an average pore diameter of 20 μm and a porosity of 10% was applied on the surface to form a film having a thickness of about 200 μm. The metal hydroxide thin film thus obtained is left to stand in the laboratory for 48 hours to dry naturally, then put in an electric furnace to 100 ℃ / h up to 1200 ℃.
The temperature was raised at a heating rate of 1, the temperature was maintained at 1200 ° C. for 2 hours, and then the furnace was cooled.
炉冷後、サンプルをとり出すとカルシア安定化ジルコ
ニア基板の表面に、厚さ約40μｍの均質なイツトリア安
定化ジルコニアの薄膜が生成していることが確認され
た。When the sample was taken out after furnace cooling, it was confirmed that a uniform thin film of yttria-stabilized zirconia with a thickness of about 40 μm was formed on the surface of the calcia-stabilized zirconia substrate.
実施例２ 実施例１と同様に有機金属化合物としてジルコニウム
ブトキシド、イツトリウムブトキシドを使用し、８モル
％Y2O3安定化ジルコニアの組成になるように混合した後
10倍量の水を加えて加水分解した。Example 2 Zirconium butoxide and yttrium butoxide were used as the organometallic compound in the same manner as in Example 1 and mixed so as to have a composition of 8 mol% Y 2 O 3 stabilized zirconia.
Hydrolysis was performed by adding 10 times the amount of water.
次に分散剤としてエチレングリコールを５％添加し
て、ボールミルで100rpm24時間分散し擬似ゾルを得た。Next, 5% of ethylene glycol was added as a dispersant and dispersed by a ball mill at 100 rpm for 24 hours to obtain a pseudo sol.
次に基板として平均細孔径3.0μｍ、気孔率30％のア
ルミナ基板（50mm□×3t）の表面に塗布し、約200μｍ
厚さの膜を形成した。Next, it is coated on the surface of an alumina substrate (50mm □ × 3t) with an average pore diameter of 3.0μm and porosity of 30% as a substrate, and it is about 200μm
A thick film was formed.
このようにして得た金属水酸化物の薄膜を実験室内に
48時間放置して自然乾燥した後、電気炉中に入れて1200
℃までは100℃/hの昇温速度で昇温し、1200℃において
２時間保持した後炉冷した。The metal hydroxide thin film thus obtained was placed in the laboratory.
Leave it for 48 hours to dry naturally, then put it in an electric furnace for 1200
The temperature was raised to 100 ° C. at a heating rate of 100 ° C./hour, held at 1200 ° C. for 2 hours, and then cooled in the furnace.
炉冷後サンプルをとり出すと、アルミナ基板の表面に
約140μｍの均質なイツトリア安定化ジルコニアの薄膜
が生成していることが確認された。When the sample was taken out after cooling in the furnace, it was confirmed that a uniform thin film of yttria-stabilized zirconia of about 140 μm was formed on the surface of the alumina substrate.
実施例３ 有機金属化合物としてアルミニウムイソプロピレート
を使用し、有機溶媒としてトリクロロエチレンを使用し
て、アルミニウムイソプロピレートの濃度が0.5モル/l
となるように溶解した。Example 3 Aluminum isopropylate was used as the organometallic compound and trichlorethylene was used as the organic solvent, and the concentration of aluminum isopropylate was 0.5 mol / l.
It was dissolved so that
次に10倍量の水を加えてアルミニウムイソプロピレー
トを加水分解した後、硝酸を加えて解膠しアルミナゾル
溶液を得た。Next, 10 times the amount of water was added to hydrolyze the aluminum isopropylate, and then nitric acid was added to peptize the mixture to obtain an alumina sol solution.
次に、アルミナ焼結体基板（50mm□×3t）の表面にア
ルミナゾルを塗布して約100μｍの膜を得た。Next, alumina sol was applied to the surface of the alumina sintered body substrate (50 mm □ × 3 t) to obtain a film of about 100 μm.
このようにして得た金属水酸化物の薄膜を実験室内に
24時間放置して自然乾燥した後、電気炉に入れて1200℃
までは100℃/hの昇温速度で昇温し、1200℃において２
時間保持した後炉冷した。The metal hydroxide thin film thus obtained was placed in the laboratory.
After leaving it for 24 hours to air dry, put it in an electric furnace and 1200 ℃
Up to 100 ℃ / h at a heating rate of 2 ℃ at 1200 ℃
After holding for a time, the furnace was cooled.
炉冷後、サンプルをとり出すとアルミナ基板の表面に
約70μｍの均質なアルミナの薄膜が形成されていること
が確認された。When the sample was taken out after furnace cooling, it was confirmed that a uniform alumina thin film of about 70 μm was formed on the surface of the alumina substrate.
本発明により、セラミツク膜を形成すると比較的容易
に均質な膜を得ることができ、かつ基板上に密着したセ
ラミツク薄膜を得ることができ、その利用範囲は極めて
大で工業的効果に顕著なものがある。According to the present invention, when a ceramic film is formed, a homogeneous film can be obtained relatively easily, and a ceramic thin film adhered on a substrate can be obtained, and its application range is extremely large and is remarkable for industrial effects. There is.
Claims (1)
とし、同溶液を加水分解した後解膠剤を加えてゾル溶液
とし、同ゾル溶液を基板に塗布した後、乾燥、焼成する
ことを特徴とする基板に密着したセラミツク薄膜の製造
法。1. An organic metal compound is dissolved in an organic solvent to form a solution, and the solution is hydrolyzed and then a peptizer is added to form a sol solution. The sol solution is applied to a substrate, and then dried and baked. A method of manufacturing a ceramic thin film adhered to a substrate, which is characterized by:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6424887A JPH0832608B2 (en) | 1987-03-20 | 1987-03-20 | Manufacturing method of ceramic thin film adhered to substrate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6424887A JPH0832608B2 (en) | 1987-03-20 | 1987-03-20 | Manufacturing method of ceramic thin film adhered to substrate |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63233089A JPS63233089A (en) | 1988-09-28 |
| JPH0832608B2 true JPH0832608B2 (en) | 1996-03-29 |
Family
ID=13252664
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6424887A Expired - Lifetime JPH0832608B2 (en) | 1987-03-20 | 1987-03-20 | Manufacturing method of ceramic thin film adhered to substrate |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0832608B2 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5369428B2 (en) * | 2007-11-12 | 2013-12-18 | 大日本印刷株式会社 | Method for producing metal oxide film |
| JP4968125B2 (en) * | 2008-03-17 | 2012-07-04 | 大日本印刷株式会社 | Method for forming corundum crystal film |
-
1987
- 1987-03-20 JP JP6424887A patent/JPH0832608B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS63233089A (en) | 1988-09-28 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CA2382591A1 (en) | Process for making chemically bonded sol-gel ceramics | |
| CN108417889A (en) | A kind of preparation method of lithium lanthanum zirconium oxygroup oxide powder | |
| CN113185305B (en) | High-temperature heat-insulation high-entropy oxide and preparation method thereof | |
| CN111087235B (en) | Method for preparing YAG transparent ceramic by adopting yttrium/auxiliary agent/aluminum triple core-shell structure powder | |
| CN114226723B (en) | Low-infrared, anti-oxidation composite material, preparation method and application of oxide ceramics coated metal aluminum | |
| US20040247791A1 (en) | Method for preparing nanocrystalline ceramic thin films | |
| CN111205079B (en) | Lanthanum-doped yttrium aluminum garnet ceramic and preparation method thereof | |
| JPH0832608B2 (en) | Manufacturing method of ceramic thin film adhered to substrate | |
| JPS5978928A (en) | Manufacture of zirconia powder | |
| CN103225062B (en) | ZrO2 thermal barrier coating prepared by electron-beam physical vapor desorption | |
| JP2818694B2 (en) | Zirconia stabilized by yttrium oxide and cerium oxide | |
| CN107365151A (en) | A kind of fine and close sub-micron crystal β "-Al2O3Product, its preparation method and application | |
| JP2762508B2 (en) | Zirconia sintered body and method for producing the same | |
| JP3072009B2 (en) | Coating solution composition | |
| JPS63210003A (en) | Production of aluminum nitride powder | |
| JPS63233088A (en) | Manufacture of yttria stabilized zirconia thin film tightly adhered to substrate | |
| JPH0674173B2 (en) | Method for producing lead zirconate titanate | |
| TWM665418U (en) | High temperature resistant electron beam target | |
| Golubko et al. | Sol-gel synthesis of lanthanum-gallate-based ceramic coatings | |
| JPH02221121A (en) | Manufacture of ferroelectric thin film | |
| JPS62191466A (en) | Zirconia polycrystal independent thin membrane and manufacture | |
| JPH0431359A (en) | Production of yttria-stabilized zirconia-based raw material powder | |
| JPS62162670A (en) | Manufacturing method of lead zirconate titanate sintered body | |
| JPS63282118A (en) | Method for manufacturing superconducting materials | |
| JP2887308B2 (en) | Manufacturing method of stabilized zirconia thin film |