JPH0833984B2 - Magnetic recording medium and method of manufacturing the same - Google Patents
Magnetic recording medium and method of manufacturing the sameInfo
- Publication number
- JPH0833984B2 JPH0833984B2 JP62006093A JP609387A JPH0833984B2 JP H0833984 B2 JPH0833984 B2 JP H0833984B2 JP 62006093 A JP62006093 A JP 62006093A JP 609387 A JP609387 A JP 609387A JP H0833984 B2 JPH0833984 B2 JP H0833984B2
- Authority
- JP
- Japan
- Prior art keywords
- magnetic
- substrate
- thin film
- rmax
- surface roughness
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 6
- 239000000758 substrate Substances 0.000 claims description 49
- 239000010409 thin film Substances 0.000 claims description 42
- 230000003746 surface roughness Effects 0.000 claims description 40
- 239000011521 glass Substances 0.000 claims description 18
- 238000010438 heat treatment Methods 0.000 claims description 17
- 238000000034 method Methods 0.000 claims description 7
- 239000010408 film Substances 0.000 description 10
- 238000001179 sorption measurement Methods 0.000 description 8
- 229910000838 Al alloy Inorganic materials 0.000 description 6
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 6
- 238000000576 coating method Methods 0.000 description 6
- 238000005498 polishing Methods 0.000 description 6
- 229910018104 Ni-P Inorganic materials 0.000 description 5
- 229910018536 Ni—P Inorganic materials 0.000 description 5
- 238000007747 plating Methods 0.000 description 5
- 150000002500 ions Chemical group 0.000 description 4
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- FGIUAXJPYTZDNR-UHFFFAOYSA-N potassium nitrate Chemical compound [K+].[O-][N+]([O-])=O FGIUAXJPYTZDNR-UHFFFAOYSA-N 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 239000005354 aluminosilicate glass Substances 0.000 description 3
- 239000012298 atmosphere Substances 0.000 description 3
- 238000005728 strengthening Methods 0.000 description 3
- 239000008119 colloidal silica Substances 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 235000010333 potassium nitrate Nutrition 0.000 description 2
- 239000004323 potassium nitrate Substances 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 238000006467 substitution reaction Methods 0.000 description 2
- 229910000859 α-Fe Inorganic materials 0.000 description 2
- 229910020630 Co Ni Inorganic materials 0.000 description 1
- 229910002440 Co–Ni Inorganic materials 0.000 description 1
- GNKTZDSRQHMHLZ-UHFFFAOYSA-N [Si].[Si].[Si].[Ti].[Ti].[Ti].[Ti].[Ti] Chemical compound [Si].[Si].[Si].[Ti].[Ti].[Ti].[Ti].[Ti] GNKTZDSRQHMHLZ-UHFFFAOYSA-N 0.000 description 1
- 238000001994 activation Methods 0.000 description 1
- 229910001566 austenite Inorganic materials 0.000 description 1
- 239000005388 borosilicate glass Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 230000001050 lubricating effect Effects 0.000 description 1
- 238000005461 lubrication Methods 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 230000003014 reinforcing effect Effects 0.000 description 1
- 238000004439 roughness measurement Methods 0.000 description 1
- 239000005368 silicate glass Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
Landscapes
- Magnetic Record Carriers (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Description
【発明の詳細な説明】 発明の分野 本発明は磁気記録媒体に関し、特に磁気デイスク装置
で使用される表面性の良好な磁気記録媒体に関するもの
である。Description: FIELD OF THE INVENTION The present invention relates to a magnetic recording medium, and more particularly to a magnetic recording medium having a good surface property used in a magnetic disk device.
従来技術 磁気デイスク記憶装置の大容量化に伴つて、磁気特
性、記録密度の点で塗布型磁気デイスクより有利なスパ
ツタ型磁気デイスクが注目されている。塗布型磁気デイ
スクでは磁性層厚が１〜２μｍ程度と比較的厚いため、
デイスク媒体の表面性は基板の表面性に著しく影響され
るということはない。これに対し、スパツタ型磁気デイ
スクでは磁性層厚が0.5μｍ以下と薄いため、基板の表
面性がデイスク媒体の表面性に著しく影響を及ぼす。従
つて、表面精度の優れた基板を用いることにより、薄膜
型磁気デイスク媒体の表面性を向上させることができ
る。その結果、磁気ヘツドの浮上量を減少させることが
でき、記録密度の向上が可能となる。2. Description of the Related Art With the increase in capacity of magnetic disk storage devices, attention has been paid to spatter type magnetic disks, which are more advantageous than coating type magnetic disks in terms of magnetic characteristics and recording density. The coating type magnetic disk has a relatively large magnetic layer thickness of about 1 to 2 μm.
The surface property of the disk medium is not significantly affected by the surface property of the substrate. On the other hand, since the magnetic layer thickness of the sputter type magnetic disk is as thin as 0.5 μm or less, the surface property of the substrate remarkably affects the surface property of the disk medium. Therefore, the surface property of the thin film magnetic disk medium can be improved by using the substrate having excellent surface accuracy. As a result, the flying height of the magnetic head can be reduced, and the recording density can be improved.
スパツタ型磁気デイスクにおいては、アルミ合金上に
50μｍ程度のNi−Ｐめつき層を形成し、この表面を研磨
したもの、あるいは、アルミ合金表面を陽極酸化して厚
さ２μｍ程度のアルマイト硬化層を形成し、さらにアル
マイト表面を研磨したものを基板としている。これらの
基板では表面粗さ（Rmax）が0.15μｍ程度の表面が得ら
れる。On a spatter type magnetic disc
A Ni-P plating layer with a thickness of about 50 μm is formed and the surface is polished, or an aluminum alloy surface is anodized to form an alumite hardened layer with a thickness of about 2 μm and the alumite surface is further polished. It is used as a substrate. With these substrates, a surface having a surface roughness (Rmax) of about 0.15 μm can be obtained.
これらの基板上に磁性薄膜を形成する場合、例えばCo
−Niを主成分とする磁性薄膜を形成する場合には、基板
上にCrをスパツタ成膜し、この上にCo−Niを主成分とす
る磁性薄膜を1000Å程度スパツタし、更にＣ等の保護潤
滑膜を200Å程度形成する。このようにして得られた媒
体の表面は、基板の表面性が反映されて、表面粗さ（Rm
ax）が0.15μｍ程度である。酸化鉄を主成分とする磁性
薄膜を形成する場合には、Feを主成分とするターゲツト
をAr＋O2雰囲気中でスパツタし、α−Fe2O3を主成分と
するスパツタ膜を基板上に2000Å程度成膜する。これを
還元性雰囲気中で300℃程度に加熱し、α−Fe2O3を主成
分とする膜をFe3O4を主成分とする膜とし、更に酸化性
雰囲気中で300℃程度に加熱して、γ−Fe2O3を主成分と
する膜とする。この上に更に保護潤滑膜を形成し媒体と
している。このようにして得られた媒体の表面も、基板
の表面性が反映されて、表面粗さ（Rmax）が0.15μｍ程
度である。When forming a magnetic thin film on these substrates, for example, Co
When forming a magnetic thin film containing -Ni as a main component, Cr is sputtered on the substrate, and a magnetic thin film containing Co-Ni as a main component is sputtered on this layer for about 1000Å, and further protection of C etc. Form a lubrication film of about 200Å. The surface of the medium thus obtained reflects the surface property of the substrate and has a surface roughness (Rm
ax) is about 0.15 μm. When a magnetic thin film containing iron oxide as the main component is formed, a target containing Fe as the main component is sputtered in an Ar + O 2 atmosphere, and a spatter film containing α-Fe 2 O 3 as the main component is 2000 Å on the substrate. Form a film. This is heated to about 300 ° C in a reducing atmosphere, the film containing α-Fe 2 O 3 as a main component is made a film containing Fe 3 O 4 as a main component, and further heated to about 300 ° C in an oxidizing atmosphere. Then, a film containing γ-Fe 2 O 3 as a main component is obtained. A protective lubricating film is further formed on this to serve as a medium. Also on the surface of the medium thus obtained, the surface roughness of the substrate is reflected, and the surface roughness (Rmax) is about 0.15 μm.
従来技術の欠点 アルミ合金上にNi−Ｐめつき層を形成し、この表面を
研磨した基板においては、Ni−Ｐめつきを行なう前にア
ルミ合金表面を活性化処理する必要があり、基板形成の
工程が複雑となる。また活性化処理以降の工程が基板価
格の50％以上を占め、基板が割高になる。更にNi−Ｐめ
つき層は150℃以上に加熱すると結晶化して磁性を持つ
ようになるため、磁性酸化鉄膜を形成する時のように加
熱工程が必要な場合はこの基板を使用することができな
い。Disadvantages of the Prior Art In a substrate in which a Ni-P plating layer is formed on an aluminum alloy and the surface is polished, the aluminum alloy surface needs to be activated before Ni-P plating is performed. The process of becomes complicated. Moreover, the process after the activation process occupies 50% or more of the board price, and the board becomes expensive. Furthermore, since the Ni-P plating layer becomes crystalline and becomes magnetic when heated to 150 ° C or higher, this substrate should be used when a heating process is required, such as when forming a magnetic iron oxide film. Can not.
アルミ合金上にアルマイト皮膜を形成した基板は、熱
処理を行なつた場合、アルミ合金とアルマイト皮膜との
熱膨張係数の差により発生する応力のためにアルマイト
皮膜にクラツクが生じやすいという欠点がある。そのた
め磁性酸化鉄膜を形成する際の加熱温度は300℃程度以
下に限定されてしまう。更に、アルマイト皮膜には多数
の通電孔が存在し、多孔質構造となつている。そのため
この基体上に薄膜磁性層を形成した場合には通電孔の部
分に磁気的欠陥が生じやすく、また表面精度もRmaxが0.
15μｍ程度と充分なものではない。A substrate having an alumite coating formed on an aluminum alloy has a drawback that cracks are likely to occur in the alumite coating due to the stress generated due to the difference in thermal expansion coefficient between the aluminum alloy and the alumite coating when heat-treated. Therefore, the heating temperature for forming the magnetic iron oxide film is limited to about 300 ° C. or lower. Further, the alumite coating has a large number of current-carrying holes and has a porous structure. Therefore, when a thin-film magnetic layer is formed on this substrate, magnetic defects are likely to occur in the current-carrying holes, and the surface accuracy has a Rmax of 0.
It is not sufficient, about 15 μm.
上記欠点に鑑み、本発明者らは表面粗さ（Rmax）が10
0Å以下（望ましくは50Å以下）となるように超精密表
面加工されたガラス基板上に磁気記録用磁性薄膜を形成
した磁気記録媒体、及び、表面の少なくとも一部分を強
化し、又は表面粗さ（Rmax）が100Å以下（望ましくは5
0Å以下）となるように超精密表面加工されたガラス基
板上に磁気記録用磁性薄膜を形成した磁気記録媒体を開
発し、特許出願を行なつた。（特願昭60−183022）しか
し、上記発明に係わる磁気記録媒体を更に検討したとこ
ろ、ガラス基板の表面粗さ（Rmax）を40Å未満さらには
20Å以下として、その上に磁気記録用磁性薄膜を形成し
た場合には、磁気ヘツドスライダー面と磁性薄膜表面と
の間で吸着現象が生じることが明らかとなつた。すなわ
ち、吸着現象によつて磁気デイスクの回転開始時に磁気
ヘツドが短時間に浮上せず、磁気ヘツドスライダー面が
磁性薄膜表面に接触したままデイスクが回転することに
なり、磁性薄膜表面および磁気ヘツドスライダー面が破
損されたり、また吸着の著しい場合には磁気ヘツドスラ
イダー面が磁性薄膜表面に吸着したまま動かず、磁気デ
イスクの回転起動が不能となるなどの問題が生じる。In view of the above drawbacks, the present inventors have a surface roughness (Rmax) of 10
A magnetic recording medium in which a magnetic thin film for magnetic recording is formed on a glass substrate that has been subjected to ultra-precision surface processing so as to be 0 Å or less (preferably 50 Å or less), and at least a part of the surface is strengthened or the surface roughness (Rmax ) Is less than 100Å (preferably 5
We have developed a magnetic recording medium in which a magnetic thin film for magnetic recording is formed on a glass substrate that has been subjected to ultra-precision surface processing so that it becomes 0 Å or less), and filed a patent application. (Japanese Patent Application No. 60-183022) However, when the magnetic recording medium according to the present invention was further examined, the surface roughness (Rmax) of the glass substrate was less than 40Å,
When the magnetic recording magnetic thin film was formed on the surface of 20 Å or less, it became clear that an adsorption phenomenon occurred between the magnetic head slider surface and the magnetic thin film surface. That is, due to the adsorption phenomenon, the magnetic head does not float in a short time at the start of rotation of the magnetic disk, and the disk rotates while the magnetic head slider surface is in contact with the magnetic thin film surface. If the surface is damaged, or if the adsorption is remarkable, the magnetic head slider surface does not move while adsorbed on the surface of the magnetic thin film, which causes a problem that the magnetic disk cannot be rotationally activated.
発明の目的 本発明の目的は、表面精度が高く、かつ磁気ヘツドが
吸着する心配のない磁気記録媒体およびその製造方法を
提供することにある。OBJECT OF THE INVENTION It is an object of the present invention to provide a magnetic recording medium having a high surface accuracy and free from the magnetic head being attracted, and a method for manufacturing the same.
発明の構成 磁気デイスクにおいて、記録密度を向上させるには磁
気ヘツドの浮上量を減少させることが有効であり、近年
のデイスク装置においては浮上量を0.2μｍ以下にしよ
うという動きがある。しかし、表面性の良くない磁気デ
イスクを使用してヘツド浮上量を減少させると媒体表面
の突起に磁気ヘツドが接触して磁性薄膜が削りとられた
り、磁気ヘツドが破壊されてしまつたりする。すなわち
媒体の超精密表面性は、磁気ヘツドを安定に浮上させ、
この浮上量をどの程度まで小さくできるかを決める重要
なポイントとなる。In the magnetic disk, it is effective to reduce the flying height of the magnetic head in order to improve the recording density, and in recent disk devices, there is a movement to reduce the flying height to 0.2 μm or less. However, if the head flying height is reduced by using a magnetic disk having a poor surface property, the magnetic head comes into contact with a protrusion on the surface of the medium, the magnetic thin film is scraped off, or the magnetic head is destroyed. That is, the ultra-precision surface property of the medium causes the magnetic head to levitate stably,
This is an important point that determines how small this flying height can be reduced.
ところが、表面粗さ（Rmax）が40Å以下の超精密表面
を持つ基板上に磁性薄膜を形成した場合には、磁性薄膜
表面も基板の表面性を反映して超精密表面（表面粗さ
（Rmax）40Å以下）となり、前述したように磁性薄膜と
磁気ヘツドの吸着現象が現われる。However, when a magnetic thin film is formed on a substrate that has an ultra-precision surface with a surface roughness (Rmax) of 40Å or less, the magnetic thin film surface also reflects the surface properties of the substrate, and the ultra-precision surface (surface roughness (Rmax ) 40 Å or less), and the adsorption phenomenon between the magnetic thin film and the magnetic head appears as described above.
本発明における磁気記録媒体は、表面粗さ（Rmax）40
Å以下という超精密表面を持つた基板を使用しているに
もかかわらず、磁性薄膜の表面粗さ（Rmax）は40〜100
Åであるために磁性薄膜と磁気ヘツドの吸着が生じず、
なおかつ0.2μｍ以下の磁気ヘッド浮上量を実現できる
ものである。The magnetic recording medium of the present invention has a surface roughness (Rmax) of 40
The surface roughness (Rmax) of the magnetic thin film is 40 to 100 despite using a substrate with an ultra-precision surface of Å or less.
Since it is Å, adsorption of magnetic thin film and magnetic head does not occur,
Further, the flying height of the magnetic head of 0.2 μm or less can be realized.
磁性薄膜の表面粗さ（Rmax）を40〜100Åに調整する
には、熱処理によつて有効に行なうことができる。熱処
理温度と熱処理時間を増大させることにより、磁性薄膜
の表面粗さ（Rmax）を大きくすることができるが、熱処
理温度の方がより有効的であり、300℃前後の温度が使
用される。The surface roughness (Rmax) of the magnetic thin film can be adjusted to 40 to 100Å effectively by heat treatment. The surface roughness (Rmax) of the magnetic thin film can be increased by increasing the heat treatment temperature and the heat treatment time, but the heat treatment temperature is more effective and a temperature around 300 ° C is used.
本発明で使用されるガラス基板の材料は、硼珪酸ガラ
ス、アルミノ珪酸ガラス、石英ガラス、チタン珪酸ガラ
ス等ほとんどのガラスが使用可能である。ただし結晶質
成分を含まないガラスが望ましい。これは、結晶粒界の
強度が比較的弱いためメカノケミカルポリシングを行な
つた場合結晶粒界が早く研磨されて超精密表面が達成で
きないためである。As the material of the glass substrate used in the present invention, almost any glass such as borosilicate glass, aluminosilicate glass, quartz glass, and titanium silicate glass can be used. However, glass containing no crystalline component is desirable. This is because the strength of the crystal grain boundaries is relatively weak and the crystal grain boundaries are rapidly polished when mechanochemical polishing is performed, so that an ultra-precision surface cannot be achieved.
アルミ合金上にNi−Ｐめつき層を設けた基板あるいは
アルマイト層を設けた基板では加熱温度に制約がある
が、本発明に係わるガラス基板では400℃程度までは充
分に使用可能なため磁性酸化鉄膜を形成する場合のよう
に加熱工程が必要な場合は特に有効に使用することがで
きる。Although there is a limitation on the heating temperature in a substrate provided with a Ni-P plating layer on an aluminum alloy or a substrate provided with an alumite layer, the glass substrate according to the present invention can be sufficiently used up to about 400 [deg.] C. so that it is magnetically oxidized. It can be particularly effectively used when a heating step is required as in the case of forming an iron film.
磁気デイスク装置においては磁気デイスクが3500rpm
程度の高速回転されるため、磁気デイスクがそれに耐え
るに充分な強度が要求される。このような用途に対して
はガラス基板を使用するため強度の点で心配されるが、
本発明者らが鋭意検討した結果ガラス基板表面の少なく
とも一部分を強化することにより磁気デイスクとして充
分な強度を持たせることができることが明らかとなつ
た。In the magnetic disk device, the magnetic disk is 3500 rpm
Since the magnetic disk is rotated at a high speed, the magnetic disk is required to have sufficient strength to withstand it. For such applications, since it uses a glass substrate, there is concern about strength,
As a result of diligent studies by the present inventors, it was revealed that a magnetic disk having sufficient strength can be provided by strengthening at least a part of the surface of the glass substrate.
表面強化は一般的にガラス表面のイオンをガラス転移
点以下の温度でより大きなイオンに置換することにより
行なわれる。イオン置換方法としては450℃程度に加熱
した硝酸カリウム溶液塩中にガラスを浸しておくことに
より行なわれる。この置換により第１図に示したよう
に、表面に急峻な分布を持つ圧縮応力層が形成されガラ
ス基板表面の強化がなされる。この応力層の厚みはイオ
ン置換時の温度、時間を制御することにより10〜200μ
ｍにする。Surface strengthening is generally performed by substituting ions on the glass surface with larger ions at a temperature below the glass transition point. The ion substitution method is performed by immersing the glass in a potassium nitrate solution salt heated to about 450 ° C. By this substitution, as shown in FIG. 1, a compressive stress layer having a steep distribution is formed on the surface to strengthen the glass substrate surface. The thickness of this stress layer is 10-200μ by controlling the temperature and time during ion replacement.
to m.
表面強化する部分としては、磁気デイスクで考える
と、内径縁部、内径縁部周辺、外径縁部、外径縁部周
辺、これらの適当な組合せ、全面などが考えられる。Considering a magnetic disk, the surface strengthening portion may be an inner diameter edge portion, an inner diameter edge portion, an outer diameter edge portion, an outer diameter edge portion, an appropriate combination thereof, or an entire surface.
以下、本発明を実施例によりさらに詳細に説明する。 Hereinafter, the present invention will be described in more detail with reference to Examples.
〔実施例１〕 アルミノ珪酸ガラスを基板として使用した。形状は、
外形130mm、内径40mm、厚さ1.9mmの円板状である。この
ガラス基板をコロイダルシリカを含む研磨液を使用して
メカノケミカルポリシングを20分間行なつた。表面粗さ
（Rmax）は35Åであつた。この基板上にCr薄膜をスパツ
タ法により2000Å形成し、更にCo−20wt％Ni磁性薄膜を
形成した。この磁性薄膜表面の粗さ（Rmax）は基板と同
じで35Åであり、磁性薄膜とヘツドの吸着現象が認めら
れた。[Example 1] Aluminosilicate glass was used as a substrate. The shape is
It is a disk with an outer diameter of 130 mm, an inner diameter of 40 mm, and a thickness of 1.9 mm. This glass substrate was subjected to mechanochemical polishing for 20 minutes using a polishing liquid containing colloidal silica. The surface roughness (Rmax) was 35Å. A Cr thin film of 2000 Å was formed on this substrate by the sputtering method, and further a Co-20 wt% Ni magnetic thin film was formed. The roughness (Rmax) of the surface of this magnetic thin film was 35 Å, which was the same as that of the substrate, and the adsorption phenomenon between the magnetic thin film and the head was confirmed.
この磁気デイスクについて、磁性薄膜の表面粗さ（Rm
ax）を調整する目的で、窒素雰囲気中、各温度で１時間
熱処理した。このときの磁性薄膜の表面粗さ（Rmax）の
変化を第１図に示した。また、熱処理後のデイスクに関
し、磁気ヘツドの浮上安定性を調べ、浮上量を減少させ
てゆき安定に浮上する限界浮上量も第１図に示してあ
る。同図からわかるように、磁性薄膜の表面粗さ（Rma
x）を40〜100Åに調整することにより、0.2μｍ以下の
浮上量で安定に磁気ヘツドを浮上させることができ、し
かも、磁気ヘツドと磁性薄膜表面との吸着現象を生じな
い磁気デイスクを得ることができる。For this magnetic disk, the surface roughness (Rm
For the purpose of adjusting ax), heat treatment was performed for 1 hour at each temperature in a nitrogen atmosphere. The change in the surface roughness (Rmax) of the magnetic thin film at this time is shown in FIG. Further, with respect to the disk after the heat treatment, the floating stability of the magnetic head was examined, and the flying height was reduced and the limit flying height for stable flying was also shown in FIG. As can be seen from the figure, the surface roughness of the magnetic thin film (Rma
By adjusting x) to 40 to 100Å, it is possible to stably levitate the magnetic head with a flying height of 0.2 μm or less, and to obtain a magnetic disc that does not cause the adsorption phenomenon between the magnetic head and the magnetic thin film surface. You can
〔実施例２〕 実施例１と同じガラス基板を30分間メカノケミカルポ
リシングを行なつたところ、表面粗さ（Rmax）が17Åと
なつた。Example 2 When the same glass substrate as in Example 1 was subjected to mechanochemical polishing for 30 minutes, the surface roughness (Rmax) was 17Å.
この基板上に実施例１と同様にCr薄膜、Co−20wt％Ni
磁性薄膜を順次形成し、更に熱処理し、磁性薄膜の表面
粗さ（Rmax）の変化、および磁気ヘツドの浮上安定性に
ついて調べ、結果を第２図に示した。第３図には表面粗
さの測定例を示した。第３図（ａ）はCo−20wt％Ni磁性
薄膜の成膜後、熱処理する前の表面粗さの測定結果であ
り、第３図（ｂ）はこれを300℃１時間熱処理した後の
表面粗さ測定結果である。図２の結果から、実施例１と
同様に、磁性薄膜の表面粗さ（Rmax）を40〜100Åに調
整することにより、0.2μｍ以下の浮上量で安定に吸着
なしに磁気ヘツドを浮上させることができる。On this substrate, a Cr thin film and Co-20 wt% Ni were formed in the same manner as in Example 1.
Magnetic thin films were sequentially formed and further heat-treated to investigate changes in the surface roughness (Rmax) of the magnetic thin films and the floating stability of the magnetic head. The results are shown in FIG. FIG. 3 shows an example of measuring the surface roughness. FIG. 3 (a) shows the results of measuring the surface roughness of the Co-20 wt% Ni magnetic thin film before heat treatment, and FIG. 3 (b) shows the surface roughness after heat treatment at 300 ° C. for 1 hour. It is a roughness measurement result. From the results of FIG. 2, as in Example 1, by adjusting the surface roughness (Rmax) of the magnetic thin film to 40 to 100Å, the magnetic head can be stably levitated at a flying height of 0.2 μm or less without adsorption. You can
また、基板の表面粗さ（Rmax）が20Å以下である実施
例では、基板の表面粗さ（Rmax）が40Å以下である実施
例１に比べて浮上量を小さくすることができ、より有利
であることもわかる。Further, in the embodiment in which the surface roughness (Rmax) of the substrate is 20Å or less, the flying height can be made smaller than that in the embodiment 1 in which the surface roughness (Rmax) of the substrate is 40Å or less, which is more advantageous. I know that there is.
また、磁性薄膜の表面粗さ（Rmax）を50〜80Åに調整
するには、300℃前後の手ごろな温度で熱処理すればよ
く、また、磁気ヘツドの浮上量もこの領域では比較的小
さくすることができ、より有効に使用される。To adjust the surface roughness (Rmax) of the magnetic thin film to 50-80Å, heat treatment should be performed at a reasonable temperature around 300 ° C, and the flying height of the magnetic head should be relatively small in this region. Can be used more effectively.
〔実施例３〕 ガラス基板材料としてアルミノ珪酸ガラスを使用し
た。形状は実施例１と同じの円板状である。このガラス
基板の表面強化した。強化しない部分にはマスクを施
し、硝酸カリウム溶液塩を450℃にし、その中に10時間
浸すことにより行なつた。強化層厚は160μｍである。
この基板をコロイダルシリカを含む研磨液を使用してメ
カノケミカルポリシングを30分間行なつた。基板の表面
粗さ（Rmax）はほぼ同一で17Åであつた。Example 3 Aluminosilicate glass was used as the glass substrate material. The shape is the same disc shape as in the first embodiment. The surface of this glass substrate was strengthened. A mask was applied to the non-strengthened part, and potassium nitrate solution salt was heated to 450 ° C. and immersed in it for 10 hours. The reinforcing layer thickness is 160 μm.
This substrate was subjected to mechanochemical polishing for 30 minutes using a polishing liquid containing colloidal silica. The surface roughness (Rmax) of the substrate was almost the same and was 17Å.
この上に、実施例１と同様にCr薄膜、次いでCo−20wt
％−Ni磁性薄膜を順次形成し、更に熱処理し、磁性薄膜
の表面粗さ（Rmax）の変化、および浮上安定性を調べた
ところ、熱処理の前後で実施例２の第２図と実質的に変
わらない結果を得た。なお、本例の基板の強度について
は先きに引用した先願で立証済みである。On top of this, as in Example 1, a Cr thin film, then Co-20 wt
% -Ni magnetic thin films were sequentially formed and further heat-treated, and the changes in the surface roughness (Rmax) of the magnetic thin films and the floating stability were examined. I got the same result. The strength of the substrate of this example has been proved in the earlier-cited earlier application.
第１図は本発明の実施例１に於る記録媒体の熱処理温度
と磁性面の表面粗さ及び浮上量の関係を示すグラフ、第
２図は本発明の実施例２に於る同様な関係を示すグラ
フ、第３図は表面粗さを示し、（ａ）は熱処理前及び
（ｂ）は熱処理後の磁性面の表面粗さを示す。FIG. 1 is a graph showing the relationship between the heat treatment temperature of the recording medium and the surface roughness of the magnetic surface and the flying height in Example 1 of the present invention, and FIG. 2 is the same relationship in Example 2 of the present invention. FIG. 3 shows the surface roughness, (a) shows the surface roughness of the magnetic surface before heat treatment, and (b) shows the surface roughness of the magnetic surface.
Claims (8)
気記録媒体において、非磁性基板の表面粗さ（Rmax）が
40Å未満であり、磁性薄膜の表面粗さ（Rmax）が40〜10
0Åであることを特徴とする磁気記録媒体。1. A magnetic recording medium comprising a magnetic thin film formed on a non-magnetic substrate, wherein the surface roughness (Rmax) of the non-magnetic substrate is
It is less than 40Å and the surface roughness (Rmax) of the magnetic thin film is 40 to 10
A magnetic recording medium characterized by being 0Å.
であることを特徴とする特許請求の範囲第１項記載の磁
気記録媒体。2. The magnetic recording medium according to claim 1, wherein the surface roughness (Rmax) of the non-magnetic substrate is 20 Å or less.
が強化されたガラス基板であることを特徴とする特許請
求の範囲第１項および第２項記載の磁気記録媒体。3. The magnetic recording medium according to claim 1 or 2, wherein the non-magnetic substrate is a glass substrate having at least a portion of its surface reinforced.
あることを特徴とする特許請求の範囲第１項ないし第３
項に記載の磁気記録媒体。4. A magnetic thin film having a surface roughness (Rmax) of 50 to 80 Å.
A magnetic recording medium according to item.
上に磁性薄膜を形成した後、熱処理することにより磁性
薄膜の表面粗さ（Rmax）を40〜100Åに調整することを
特徴とする磁気記録媒体の製造方法。5. The surface roughness (Rmax) of the magnetic thin film is adjusted to 40 to 100Å by heat treatment after forming a magnetic thin film on a non-magnetic substrate having a surface roughness (Rmax) of 40 Å or less. And a method for manufacturing a magnetic recording medium.
であることを特徴とする特許請求の範囲第５項記載の磁
気記録媒体の製造方法。6. The method for producing a magnetic recording medium according to claim 5, wherein the surface roughness (Rmax) of the non-magnetic substrate is 20 Å or less.
が強化されたガラス基板であることを特徴とする特許請
求の範囲第５項および第６項記載の磁気記録媒体の製造
方法。7. The method for manufacturing a magnetic recording medium according to claim 5, wherein the non-magnetic substrate is a glass substrate having at least a portion of its surface reinforced.
なるように熱処理条件を選ぶことを特徴とする特許請求
の範囲第５項ないし第７項に記載の磁気記録媒体の製造
方法。8. A method of manufacturing a magnetic recording medium according to claim 5, wherein the heat treatment conditions are selected so that the surface roughness (Rmax) of the magnetic thin film is 50 to 80 Å. Method.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62006093A JPH0833984B2 (en) | 1987-01-16 | 1987-01-16 | Magnetic recording medium and method of manufacturing the same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62006093A JPH0833984B2 (en) | 1987-01-16 | 1987-01-16 | Magnetic recording medium and method of manufacturing the same |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63175219A JPS63175219A (en) | 1988-07-19 |
| JPH0833984B2 true JPH0833984B2 (en) | 1996-03-29 |
Family
ID=11628902
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62006093A Expired - Lifetime JPH0833984B2 (en) | 1987-01-16 | 1987-01-16 | Magnetic recording medium and method of manufacturing the same |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0833984B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2840966B2 (en) * | 1989-11-08 | 1998-12-24 | ティーディーケイ株式会社 | Magnetic recording medium and magnetic recording / reproducing method |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61240429A (en) * | 1985-04-17 | 1986-10-25 | Sony Corp | Magnetic recording medium |
| JPS61246380A (en) * | 1985-04-23 | 1986-11-01 | Nec Corp | Production of magnetic disk substrate |
| JPS62256216A (en) * | 1986-04-28 | 1987-11-07 | Hoya Corp | Magnetic recording medium |
-
1987
- 1987-01-16 JP JP62006093A patent/JPH0833984B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS63175219A (en) | 1988-07-19 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2816472B2 (en) | Magnetic recording media | |
| US6673474B2 (en) | Medium substrate, production method thereof and magnetic disk device | |
| US4610911A (en) | Thin film magnetic recording media | |
| US6120890A (en) | Magnetic thin film medium comprising amorphous sealing layer for reduced lithium migration | |
| JPH0916941A (en) | Magnetic recording medium and manufacture | |
| US4631202A (en) | Thin film magnetic recording film | |
| US20010008716A1 (en) | Magnetic recording medium, method of fabricating magnetic recording medium, and magnetic storage | |
| GB2136647A (en) | Magneto-optical recording medium | |
| JPS6243819A (en) | Magnetic recording medium | |
| JPH07105027B2 (en) | Perpendicular magnetic recording medium | |
| US4609593A (en) | Magnetic recording medium | |
| JPH0833984B2 (en) | Magnetic recording medium and method of manufacturing the same | |
| JPS61199224A (en) | Magnetic recording medium | |
| JP2547994B2 (en) | Magnetic recording media | |
| KR100403536B1 (en) | Magnetic alloy and magnetic recording medium and method for preparation thereof, and target for forming magnetic film and magnetic recording device | |
| JP2873702B2 (en) | Magnetic recording medium and magnetic recording / reproducing method | |
| JP3022680B2 (en) | Magnetic disk medium and method of manufacturing the same | |
| JP3492908B2 (en) | Magnetic recording / reproducing method | |
| JPS62209719A (en) | Magnetic recording medium | |
| JPH01102757A (en) | Magneto-optical recording medium | |
| JPH08273139A (en) | Magnetic recording medium | |
| JPS61172236A (en) | Photomagnetic recording element | |
| JP2547994C (en) | ||
| JPH06282834A (en) | Perpendicular magnetic recording medium and manufacture thereof | |
| JPS61184725A (en) | Magnetic recording medium and its production |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| S533 | Written request for registration of change of name |
Free format text: JAPANESE INTERMEDIATE CODE: R313533 |
|
| R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
| EXPY | Cancellation because of completion of term |