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JPH085008B2 - Single crystal plane orientation correction method - Google Patents
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JPH085008B2 - Single crystal plane orientation correction method - Google Patents

Single crystal plane orientation correction method

Info

Publication number
JPH085008B2
JPH085008B2 JP62187922A JP18792287A JPH085008B2 JP H085008 B2 JPH085008 B2 JP H085008B2 JP 62187922 A JP62187922 A JP 62187922A JP 18792287 A JP18792287 A JP 18792287A JP H085008 B2 JPH085008 B2 JP H085008B2
Authority
JP
Japan
Prior art keywords
crystal
jig
pointers
height
orientation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP62187922A
Other languages
Japanese (ja)
Other versions
JPH01140962A (en
Inventor
行紀 喜平田
滋男 桂
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eneos Corp
Original Assignee
Japan Energy Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Japan Energy Corp filed Critical Japan Energy Corp
Priority to JP62187922A priority Critical patent/JPH085008B2/en
Publication of JPH01140962A publication Critical patent/JPH01140962A/en
Publication of JPH085008B2 publication Critical patent/JPH085008B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)

Description

【発明の詳細な説明】 [産業上の利用分野] この発明は、結晶研磨技術に関し、例えばラッピング
装置による半導体単結晶の面方位修正方法に利用して効
果的な技術に関する。
Description: TECHNICAL FIELD The present invention relates to a crystal polishing technique, for example, a technique effectively applied to a method for correcting a plane orientation of a semiconductor single crystal by a lapping apparatus.

[従来の技術] 半導体デバイスの製造においては、所定の方位の格子
面上に素子を形成するので、表面の結晶方位に高い精度
が必要とされている。一般的に精度の良い表面結晶方位
を得るには、切断時の精度によるところが大きいが、小
さくて不定形な結晶、例えばCdTe結晶の場合には切断時
の精度を高くすることは困難であり、切断後の面方位修
正が必要とされていた。
[Prior Art] In the manufacture of a semiconductor device, since an element is formed on a lattice plane having a predetermined orientation, high precision is required for the crystal orientation of the surface. Generally, in order to obtain a highly accurate surface crystal orientation, it depends largely on the accuracy at the time of cutting, but it is difficult to increase the accuracy at the time of cutting in the case of a small and amorphous crystal, for example, a CdTe crystal, It was necessary to correct the plane orientation after cutting.

従来、結晶の面方位の修正は、例えば第6図に示すよ
うな治具を用いて行っていた。
Conventionally, the plane orientation of the crystal has been corrected by using a jig as shown in FIG. 6, for example.

すなわち、第6図の治具は、円筒状の保持リング1
と、この保持リング1の中心に配置され、上端部と下端
部に各々装着されている3個の調整ネジ群3aと3bとによ
って固定されたシリンダ2とによって構成されている。
そして、面方位の修正は、シリンダ2の下部のピストン
2aの下面に結晶4をはりつけて、この治具をX線方位測
定装置の載物台に固定し、結晶4の表面にX線を照射し
てその反射パターンを観測してそのパターンが求める面
方位のパターンと一致するように調整ネジ群3a,3bを調
整して結晶を傾けた後、結晶4を治具に取り付けたまま
ラッピング装置の研磨定盤に載せ、所望の方位の結晶面
が現われるように研磨することにより行っていた。この
とき、ピストン2aの下面の結晶4は、シリンダ2に内蔵
されたバネ2bによって適当な圧力で、定盤の研磨面に押
し付けられて研磨される。
That is, the jig shown in FIG. 6 has a cylindrical holding ring 1
And a cylinder 2 which is arranged at the center of the holding ring 1 and is fixed by three adjusting screw groups 3a and 3b which are respectively attached to the upper end portion and the lower end portion.
Then, the plane orientation is corrected by the piston at the bottom of the cylinder 2.
The crystal 4 is attached to the lower surface of 2a, this jig is fixed to the stage of the X-ray orientation measuring device, the surface of the crystal 4 is irradiated with X-rays, and its reflection pattern is observed to obtain the pattern. After adjusting the adjustment screw groups 3a and 3b so as to match the orientation pattern and tilting the crystal, the crystal 4 is mounted on the polishing platen of the lapping device with the crystal 4 still attached to the jig, and the crystal plane of the desired orientation appears. It was done by polishing. At this time, the crystal 4 on the lower surface of the piston 2a is pressed against the polishing surface of the surface plate by an appropriate pressure by the spring 2b built in the cylinder 2 to be polished.

[発明が解決しようとする問題点] 第6図に示すような治具を用いた従来の面方位修正方
法にあっては、結晶4の傾きを6個の調整ネジ3a,3bに
より行わなくてはならないため、調整作業が微妙かつ面
倒で熟練を要するとともに、修正精度が複雑な治具の各
部分の加工精度に依存するため、修正精度を上げるには
治具自体が高価になるという問題点があった。
[Problems to be Solved by the Invention] In the conventional plane orientation correction method using a jig as shown in FIG. 6, the tilt of the crystal 4 is not adjusted by the six adjusting screws 3a and 3b. Since the adjustment work is delicate and tedious and requires skill, the correction accuracy depends on the processing accuracy of each part of the jig where the correction accuracy is complicated, and the jig itself is expensive to improve the correction accuracy. was there.

この発明の目的は、構造簡単かつ安価な治具を用いて
熟練を要することなく高精度かつ再現性よく結晶方位の
修正を行えるような研磨技術を提供することにある。
An object of the present invention is to provide a polishing technique capable of correcting a crystal orientation with high accuracy and reproducibility without using skill by using a jig having a simple structure and a low cost.

[問題点を解決するための手段] 上記目的を達成するためこの発明は、周縁部に3個の
高さ調整可能な円錐状ポインタを設けてなる剛性プレー
トを治具とし、このプレートの中心に結晶を貼り付け
て、その結晶の表面をX線方位測定装置で観測して格子
面の傾きを検出し、上記3個のポインタの先端を結ぶ面
が所望の格子面と平行となるように各ポインタの高さを
独立して調整した後、結晶を治具表面に貼り付けた状態
で研磨装置の研磨定盤に載せ、定盤の研磨面が全ポイン
タの先端に接するまで研磨を行うようにした。
[Means for Solving the Problems] In order to achieve the above object, the present invention uses a rigid plate having three height-adjustable conical pointers at its peripheral edge as a jig, and the center of the plate is used as a jig. A crystal is attached, the surface of the crystal is observed by an X-ray azimuth measuring device to detect the inclination of the lattice plane, and each surface connecting the tips of the three pointers is parallel to the desired lattice plane. After adjusting the height of the pointer independently, put the crystal on the surface of the jig on the polishing surface plate of the polishing device, and polish until the polishing surface of the surface plate touches the tips of all pointers. did.

[作用] 上記した手段によれば、露出面を決定する3個のポイ
ンタの高さをダイヤルゲージ等を用いて精度よく調整で
きるため熟練を要することがないとともに、3個のポイ
ンタの高さを調整するだけでよいので、作業性が向上す
る。
[Operation] According to the above-described means, the heights of the three pointers that determine the exposed surface can be adjusted accurately by using a dial gauge or the like, so that no skill is required and the heights of the three pointers can be adjusted. Workability is improved because it only needs to be adjusted.

また、治具の構造が簡素で部品点数も少なくなって高
精度の治具を安価に作成することができる。
Further, the jig structure is simple and the number of parts is small, so that a highly accurate jig can be manufactured at low cost.

[実施例] 以下、図面を用いて本発明に係る面方位修正方法の一
実施例を説明する。
[Embodiment] An embodiment of the surface orientation correction method according to the present invention will be described below with reference to the drawings.

第1図に、本実施例に使用される治具の構成例を示
す。
FIG. 1 shows a structural example of a jig used in this embodiment.

この実施例の治具10は、剛性のある円盤状プレート11
の周縁部に、先端が円錐形をなす3個の基準ピンとして
のポインタ12a,12b,12cが当間隔をおいて上向きに設け
られている。このポインタ12a〜12cは、少なくとも先端
部が高硬度材質からなり、その外周には第2図に示すご
とくネジ部13が形成されており、上記円盤状プレート11
を上下に貫通するように形成された貫通孔14a,14b,14c
の内壁に形成された雌ネジに螺合されている。
The jig 10 of this embodiment includes a rigid disc-shaped plate 11
Pointers 12a, 12b, 12c, which serve as three reference pins having conical tips, are provided on the peripheral edge of the and facing upward at regular intervals. At least the tips of the pointers 12a to 12c are made of a high-hardness material, and a screw portion 13 is formed on the outer periphery thereof as shown in FIG.
Through holes 14a, 14b, 14c formed so as to penetrate vertically
Is screwed into a female screw formed on the inner wall of the.

また、各ポインタ12a〜12cの後端(図では下端)に
は、押えナット15a〜15cが螺着されており、ポインタ12
a〜12cを各々独立に回転して先端の高さを調整した後、
押えナット15a〜15cを締め付けることにより、ポインタ
を固定できるようになっている。
Further, presser nuts 15a to 15c are screwed to the rear ends (lower ends in the figure) of the pointers 12a to 12c, respectively.
After independently rotating a to 12c to adjust the height of the tip,
The pointer can be fixed by tightening the holding nuts 15a to 15c.

上記のごとく構成された治具10による結晶の面方位の
修正は、次のようにして行われる。
The correction of the crystal plane orientation by the jig 10 configured as described above is performed as follows.

すなわち、先ずX線方位測定装置により、結晶4の表
面を観測し、所望の格子面との傾きを検出し、次にプレ
ート11の上面中央に結晶4をワックス等を用いて貼り付
ける。その際、結晶4の一辺bcと、ポインタ12b,12cを
結ぶ直線とが平行になるように貼り付けることが望まし
い。
That is, first, the surface of the crystal 4 is observed by an X-ray azimuth measuring device to detect the inclination with respect to a desired lattice plane, and then the crystal 4 is attached to the center of the upper surface of the plate 11 using wax or the like. At that time, it is desirable that one side bc of the crystal 4 and the straight line connecting the pointers 12b and 12c be parallel to each other.

次に、検出した傾き角に応じて3個のポインタ12a〜1
2cの高さをそれぞれ調整する。具体的には、第1図にお
いて、結晶4に符号abcdで示されている面が実際に出て
いる面であり、符号ijklが表面に出したい格子面である
とすると、abとijのなす角度αおよびbcとjkのなす角度
βを、例えばX線ディフラクトメータを用いて各々測定
する。そして、得たい結晶の厚みに応じて例えばポイン
タ12aの高さHaを決定し、その高さに固定した後、次式 より、ポインタ12bと12cの高さHb,Hcを求める。
Next, according to the detected tilt angle, three pointers 12a-1
Adjust the height of 2c respectively. Specifically, in FIG. 1, if the surface indicated by the symbol abcd on the crystal 4 is the actual surface and the symbol ijkl is the lattice surface desired to be projected on the surface, then ab and ij form The angles α and the angle β formed by bc and jk are measured using, for example, an X-ray diffractometer. Then, for example, determine the height Ha of the pointer 12a according to the thickness of the crystal to be obtained, and after fixing it at that height, the following formula Thus, the heights Hb and Hc of the pointers 12b and 12c are obtained.

なお、上式においてLは各ポインタ12a,12b,12c間の
距離である。
In the above equation, L is the distance between the pointers 12a, 12b, 12c.

上式より求めた高さHb,Hcになるようにポインタ12b,1
2cを回して高さ調整してから、押えナット15b,15cを締
め付ける。上記の場合、各ポインタ12a〜12cの高さ調整
は、例えば第3図に示すように3本の脚21a〜21cにより
支持された支持プレート22の中央に装着されたダイヤル
ゲージ23を用いて、脚21a〜21cを治具のプレート11上に
載せて平行を保ち、ダイヤルゲージ23の測定子23aを各
ポインタ12a〜12cの先端に次々に接触させて表示部23b
の目盛を見ながら高さを調整すればよい。
Pointer 12b, 1 so that the height is Hb, Hc obtained from the above formula
Turn 2c to adjust the height, and then tighten the presser nuts 15b and 15c. In the above case, the height of each of the pointers 12a to 12c can be adjusted by using the dial gauge 23 attached to the center of the support plate 22 supported by the three legs 21a to 21c as shown in FIG. The legs 21a to 21c are placed on the plate 11 of the jig to keep them parallel, and the contact point 23a of the dial gauge 23 is brought into contact with the tips of the pointers 12a to 12c one after another to display the display portion 23b.
You can adjust the height while watching the scale.

このようにすれば、ポインタ12a〜12cの高さ設定精度
はダイヤルゲージの精度に左右されるが、1μmの精度
で設定が可能となる。この誤差が面方位に及ぼす影響
は、α,βが充分に小さいとき計算上はL=70mmにおい
て7秒以下となり、実用上の要求を満たすことができ
る。
In this way, the height setting accuracy of the pointers 12a to 12c depends on the accuracy of the dial gauge, but can be set with the accuracy of 1 μm. The effect of this error on the surface orientation is 7 seconds or less at L = 70 mm when α and β are sufficiently small, and the practical requirement can be satisfied.

上記のようにして各ポインタ12a〜12cの高さ調整が終
了したならば、例えば第4図に示すようなラッピング装
置の定盤31上の修正リング32内に、治具10を逆さにして
プレート11上の結晶4が定盤31に接触するように載置
し、研磨面に砥粒を供給しながら定盤31を回転させて、
プレート11上の各ポインタ12a〜12cがすべて定盤に当接
するまで研磨を行う。
When the height adjustment of the pointers 12a to 12c is completed as described above, the jig 10 is turned upside down in the correction ring 32 on the surface plate 31 of the lapping device as shown in FIG. 4, for example. The crystal 4 on 11 is placed so as to contact the surface plate 31, and the surface plate 31 is rotated while supplying abrasive grains to the polishing surface,
Polishing is performed until all the pointers 12a to 12c on the plate 11 come into contact with the surface plate.

上記手順に従ってCdTe単結晶12枚について面方位の修
正研磨を行った結果を以下に示す。
The results of performing the plane direction correction polishing on 12 CdTe single crystals according to the above procedure are shown below.

なお、実験には、プレート11の直径が110mmでポイン
タ12a,12b,12cの間隔が70mmの治具を使用し、パイレッ
クスガラス製の定盤上でアルミナ砥粒を用いてラッピン
グを行った。研磨面は(111)面とし、補正前後の結晶
表面の面方位のずれをX線方位測定装置で測定した。第
5図に測定結果を示す。同図より、研磨前に0.2〜0.5゜
程度あったずれがすべて0.05゜以内に修正できたことが
分かる。これは、現在化合物半導体単結晶に求められて
いる面方位精度を充分に満足するものである。
In the experiment, a jig having a diameter of the plate 11 of 110 mm and a distance of the pointers 12a, 12b, 12c of 70 mm was used, and lapping was performed on a surface plate made of Pyrex glass using alumina abrasive grains. The polished surface was the (111) plane, and the deviation of the plane orientation of the crystal surface before and after the correction was measured by an X-ray orientation measuring device. FIG. 5 shows the measurement results. From the figure, it can be seen that all deviations of 0.2 to 0.5 ° before polishing could be corrected within 0.05 °. This sufficiently satisfies the plane orientation accuracy currently required for compound semiconductor single crystals.

なお、上記実施例の治具ではポインタ12a〜12cの外周
にネジ部13を形成して高さを調整できるようにしている
が、高さ調整手段はネジに限定されるものでなく、例え
ば所定の高さを有するポインタと交換する方式等であっ
てもよい。
In the jig of the above embodiment, the screw portion 13 is formed on the outer circumference of the pointers 12a to 12c so that the height can be adjusted, but the height adjusting means is not limited to the screw, and for example, a predetermined value can be used. A method of exchanging with a pointer having a height of 1 may be used.

[発明の効果] 以上説明したようにこの発明は、少なくとも3個の高
さ調整可能なポインタを有する治具に結晶を取り付け、
その結晶の表面の方位を検出し、上記3個のポインタの
先端を結ぶ面が所望の格子面と平行となるように各ポイ
ンタの高さを独立して調整した後、研磨面が上記全ポイ
ンタの先端に接触するまで研磨を行うようにしたので、
露出面を決定する3個のポインタの高さをダイヤルゲー
ジ等を用いて精度よく調整できるため熟練を要すること
がないとともに、3個のポインタの高さを調整するだけ
でよいので、作業性が向上する。また治具の構造が簡素
で部品点数も少なくなって高精度の治具を安価に作成す
ることができるという効果がある。
[Effect of the Invention] As described above, according to the present invention, a crystal is attached to a jig having at least three height-adjustable pointers,
The orientation of the surface of the crystal is detected, and the heights of the pointers are independently adjusted so that the surface connecting the tips of the three pointers becomes parallel to the desired lattice plane. Since I tried to polish until it touched the tip of
Since the heights of the three pointers that determine the exposed surface can be adjusted accurately by using a dial gauge or the like, no skill is required, and since it is only necessary to adjust the heights of the three pointers, workability is improved. improves. In addition, the jig structure is simple and the number of parts is small, so that a highly accurate jig can be manufactured at low cost.

【図面の簡単な説明】[Brief description of drawings]

第1図は、本発明に係る結晶の面方位修正方法の実施に
使用される治具の構成例を示す斜視図、 第2図は、第1図におけるII−II線に沿った断面図、 第3図は、上記治具のポインタの高さ調整に使用される
ゲージの構成例を示す斜視図、 第4図は、ラッピング装置の一例を示す斜視図、 第5図は、本発明方法を適用して修正を行った結晶の修
正前後の面方位のずれを示す説明図、 第6図は、従来の面方位修正に使用される治具の構成例
を示す斜視図である。 10……治具、11……プレート、12a〜12c……ポインタ、
4……結晶。
FIG. 1 is a perspective view showing a structural example of a jig used for carrying out the crystal face orientation correcting method according to the present invention, and FIG. 2 is a sectional view taken along line II-II in FIG. FIG. 3 is a perspective view showing a configuration example of a gauge used for adjusting the height of the pointer of the jig, FIG. 4 is a perspective view showing an example of a lapping device, and FIG. 5 shows the method of the present invention. FIG. 6 is an explanatory view showing the deviation of the plane orientation before and after the modification of the crystal that has been applied and modified, and FIG. 6 is a perspective view showing a configuration example of a conventional jig used for the plane modification. 10 ... Jig, 11 ... Plate, 12a-12c ... Pointer,
4 ... Crystal.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】少なくとも3個の高さ調整可能な基準ピン
を有する治具に結晶を取り付け、その結晶の表面の方位
を検出し、上記3個の基準ピンの先端を結ぶ面が所望の
格子面と平行となるように各基準ピンの高さを各々独立
して調整した後、研磨面が上記全基準ピンの先端に接触
するまで研磨を行うようにしたことを特徴とする単結晶
の面方位修正方法。
1. A lattice, in which a crystal is attached to a jig having at least three height-adjustable reference pins, the orientation of the surface of the crystal is detected, and a surface connecting the tips of the three reference pins is a desired lattice. After independently adjusting the height of each reference pin so that it becomes parallel to the surface, polishing is performed until the polishing surface comes into contact with the tips of all the reference pins. Direction correction method.
JP62187922A 1987-07-28 1987-07-28 Single crystal plane orientation correction method Expired - Lifetime JPH085008B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62187922A JPH085008B2 (en) 1987-07-28 1987-07-28 Single crystal plane orientation correction method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62187922A JPH085008B2 (en) 1987-07-28 1987-07-28 Single crystal plane orientation correction method

Publications (2)

Publication Number Publication Date
JPH01140962A JPH01140962A (en) 1989-06-02
JPH085008B2 true JPH085008B2 (en) 1996-01-24

Family

ID=16214550

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62187922A Expired - Lifetime JPH085008B2 (en) 1987-07-28 1987-07-28 Single crystal plane orientation correction method

Country Status (1)

Country Link
JP (1) JPH085008B2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA2690791C (en) * 2007-06-25 2012-10-30 Saint-Gobain Ceramics & Plastics, Inc. Methods of crystallographically reorienting single crystal bodies
JP5936563B2 (en) * 2013-02-15 2016-06-22 株式会社高田工業所 Sample jig for setting the sample on the polishing jig and the polishing jig

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57149153A (en) * 1981-03-05 1982-09-14 Fujitsu Ltd Polisher for correction of angle
JPS5944829A (en) * 1982-09-06 1984-03-13 Toshiba Corp Processing of wafer and jig for the same

Also Published As

Publication number Publication date
JPH01140962A (en) 1989-06-02

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