JPH0926500A - Capillary for X-ray focusing - Google Patents
Capillary for X-ray focusingInfo
- Publication number
- JPH0926500A JPH0926500A JP7177050A JP17705095A JPH0926500A JP H0926500 A JPH0926500 A JP H0926500A JP 7177050 A JP7177050 A JP 7177050A JP 17705095 A JP17705095 A JP 17705095A JP H0926500 A JPH0926500 A JP H0926500A
- Authority
- JP
- Japan
- Prior art keywords
- ray
- capillary
- wall
- diameter
- incident
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000463 material Substances 0.000 claims description 4
- 238000004519 manufacturing process Methods 0.000 abstract description 6
- 230000005540 biological transmission Effects 0.000 abstract description 4
- 230000004907 flux Effects 0.000 description 30
- 238000004458 analytical method Methods 0.000 description 4
- 239000011521 glass Substances 0.000 description 3
- 239000005355 lead glass Substances 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 2
- 239000000523 sample Substances 0.000 description 2
- 238000002441 X-ray diffraction Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000013081 microcrystal Substances 0.000 description 1
- 238000009304 pastoral farming Methods 0.000 description 1
- 238000001420 photoelectron spectroscopy Methods 0.000 description 1
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- Analysing Materials By The Use Of Radiation (AREA)
Abstract
(57)【要約】
【課題】 製作が容易で、かつ微細で高照度のビ−ム
が得られるX線集光用キャピラリを提供する。
【解決手段】 本発明にかかるX線集光用キャピラリ
は、管の内壁(6)の形状を単純な円錐台形として製作
を容易とする。更に、本発明にかかるX線集光用キャピ
ラリは、管の中心軸に平行に入射したX線(1、2、
3)とキャピラリの内壁との衝突を全て全反射させて、
壁面からの透過によるX線の漏れを防止し、入射したX
線の全てがキャピラリの出射孔(7)まで到達できるよ
うに管の内壁の形状を工夫することにより、微細で高照
度のビ−ムが得られることを特徴とする。
(57) An object of the present invention is to provide a capillary for X-ray focusing, which is easy to manufacture, and which is capable of obtaining a fine beam with high illuminance. An X-ray condensing capillary according to the present invention facilitates production by making the shape of an inner wall (6) of a tube into a simple truncated cone shape. Further, the X-ray condensing capillary according to the present invention has an X-ray (1, 2,
All the collisions between 3) and the inner wall of the capillary are totally reflected,
Prevents leakage of X-rays due to transmission from the wall surface
By designing the shape of the inner wall of the tube so that all of the lines can reach the exit hole (7) of the capillary, it is possible to obtain a beam of fine and high illuminance.
Description
【0001】[0001]
【産業上の利用分野】本発明は、X線回折装置、蛍光X
線分析装置や光電子分光分析装置等のX線ビ−ムを探針
として利用する分析装置において、X線ビ−ムを集光し
て分析試料上の微小部に照射するためのX線集光用キャ
ピラリに関する。BACKGROUND OF THE INVENTION The present invention relates to an X-ray diffractometer, fluorescent X
In an analyzer using an X-ray beam as a probe, such as an X-ray analyzer or a photoelectron spectroscopy analyzer, an X-ray condenser for condensing the X-ray beam and irradiating it to a minute portion on an analysis sample. For capillaries.
【0002】[0002]
【従来の技術】従来、微小結晶や微小領域のX線回折等
を行なうためのX線集光用キャピラリとしては、例えば
特開平1−141343号公報に示されているように、
X線束の集光によるビ−ムの微細化、高照度化を目的と
して、キャピラリの内壁の曲面を工夫して出射光を一定
の焦点に集光するようにしている。2. Description of the Related Art Conventionally, as an X-ray condensing capillary for performing X-ray diffraction of a microcrystal or a microregion, for example, as disclosed in Japanese Patent Laid-Open No. 1-141343,
For the purpose of miniaturizing the beam and increasing the illuminance by condensing the X-ray flux, the curved surface of the inner wall of the capillary is devised so that the emitted light is condensed at a fixed focus.
【0003】[0003]
【発明が解決しようとする課題】しかし、上記従来技術
において、キャピラリの内壁に所定の曲面を付けている
ので高度な加工技術を要し、所望のX線集光用キャピラ
リを入手するのは容易でない。そこで、本発明は、形状
が単純で製作が容易であり、かつ微細で高照度のビ−ム
が得られるX線集光用キャピラリを提供することを目的
とする。However, in the above-mentioned prior art, since the inner wall of the capillary is provided with a predetermined curved surface, a sophisticated processing technique is required, and it is easy to obtain a desired X-ray focusing capillary. Not. Therefore, an object of the present invention is to provide a capillary for X-ray focusing, which has a simple shape, is easy to manufacture, and is capable of obtaining a fine beam with high illuminance.
【0004】[0004]
【課題を解決するための手段】本発明にかかるX線集光
用キャピラリは、管の内壁の形状を単純な円錐台形とし
て製作を容易とする。更に、本発明にかかるX線集光用
キャピラリは、管の中心軸に平行に入射したX線が出射
孔から出射するまでの間、キャピラリの内壁との衝突を
全て全反射するようにして、壁面からの透過によるX線
の漏れを防止し、微細で高照度のビ−ムが得られるよう
にする。The capillary for X-ray focusing according to the present invention facilitates the manufacture by making the shape of the inner wall of the tube simple frustoconical. Furthermore, the X-ray condensing capillary according to the present invention is configured to totally reflect all collisions with the inner wall of the capillary until X-rays incident parallel to the central axis of the tube are emitted from the emission hole. X-rays are prevented from leaking due to transmission from the wall surface, so that a beam of fine and high illuminance can be obtained.
【0005】具体的には、管の内壁での全反射を利用し
てX線ビ−ムを集光するX線用キャピラリにおいて、内
壁の形状を円錐台形として、X線ビ−ムが入射する入射
孔の直径をB、集光されたX線ビ−ムが出射する出射孔
の直径をD、入射するX線の波長と管内壁の材質で決ま
る全反射の臨界角をθとしたときに、X線集光用キャピ
ラリの長さLが次式で与えられることを特徴とする。 2.0×(B−D)×(B−2D)/(2Dθ) ≧L≧ 0.9×(B−D)×(B−2D)/(2Dθ) (1)Specifically, in an X-ray capillary for condensing an X-ray beam by utilizing the total reflection on the inner wall of the tube, the shape of the inner wall is frustoconical and the X-ray beam enters. When the diameter of the entrance hole is B, the diameter of the exit hole through which the focused X-ray beam exits is D, and the critical angle of total reflection determined by the wavelength of the incoming X-ray and the material of the inner wall of the tube is θ. , The length L of the X-ray focusing capillary is given by the following equation. 2.0 × (B−D) × (B−2D) / (2Dθ) ≧ L ≧ 0.9 × (B−D) × (B−2D) / (2Dθ) (1)
【0006】[0006]
【作用】本発明では、X線が一定の臨界角度以下の角度
で、屈折率の高い媒質から屈折率の低い媒質へ入射した
場合に、そのX線の全てが反射することにより屈折や透
過によるX線の漏れが起こらないという全反射が生ずる
事象を利用する。即ち、X線集光用キャピラリの中心軸
に平行に入射するX線が円錐台形のキャピラリの内壁と
衝突するときにはすべて全反射するようにして内壁から
の漏れを防止し、入射したX線の全てが出射孔まで達す
るようにして、微細で高照度のビ−ムが得られるように
する。 尚、X線と媒質の屈折率との関係は、原子番号
が小さい元素からなる媒質、例えば空気の屈折率は大き
く、原子番号が大きい元素からなる媒質、例えばガラ
ス、金属などの屈折率は小さくなる。従って、本発明に
かかるX線集光用キャピラリは、中空のガラス細管等か
らなる。According to the present invention, when X-rays are incident at an angle equal to or less than a certain critical angle from a medium having a high refractive index to a medium having a low refractive index, all of the X-rays are reflected to cause refraction or transmission. It utilizes the phenomenon of total internal reflection where X-ray leakage does not occur. That is, when the X-rays incident parallel to the central axis of the X-ray condensing capillary collide with the inner wall of the truncated cone-shaped capillary, they are totally reflected to prevent leakage from the inner wall, and all of the incident X-rays are prevented. So as to reach the emission hole so that a minute beam with high illuminance can be obtained. The relationship between the X-ray and the refractive index of the medium is such that a medium made of an element having a small atomic number, such as air, has a large refractive index, and a medium made of an element having a large atomic number, such as glass or metal, has a small refractive index. Become. Therefore, the X-ray condensing capillary according to the present invention is made of a hollow glass thin tube or the like.
【0007】図1に、本発明にかかる円錐台形の内壁を
有するX線集光用キャピラリ及びこれに平行に入射した
X線との関係を示す。本図に基づいて、X線集光用キャ
ピラリに平行に入射したX線が円錐台形の内壁で全て全
反射して出射孔から出射するための条件について説明す
る。FIG. 1 shows a relationship between an X-ray converging capillary having a truncated cone-shaped inner wall according to the present invention and an X-ray incident parallel thereto. Based on this figure, conditions for all the X-rays incident in parallel to the X-ray condensing capillary to be totally reflected by the inner wall of the truncated cone and to be emitted from the emission hole will be described.
【0008】まず、出射孔7の直径をD、入射孔8の直
径をB、キャピラリの中心軸10に対する円錐台形の内
壁6の傾斜角度をαとする。尚、この内壁の傾斜角度α
は、全反射角θが、一般に0.01ラジアン程度と小さ
いことから、これ以下の小さい値となる。First, let the diameter of the exit hole 7 be D, the diameter of the entrance hole 8 be B, and the inclination angle of the inner wall 6 of the truncated cone with respect to the central axis 10 of the capillary be α. The inclination angle α of this inner wall
Since the total reflection angle θ is generally as small as about 0.01 radian, the value is smaller than this.
【0009】入射孔8に平行に入射したX線のうち、出
射孔7の直径Dと同じ径を有する中心軸10を含む円柱
状のX線束11は、内壁との反射を生ずることなく、出
射孔7よりそのまま出射する。Of the X-rays incident on the incident hole 8 in parallel, the cylindrical X-ray flux 11 including the central axis 10 having the same diameter as the diameter D of the emission hole 7 is emitted without reflection on the inner wall. The light is directly emitted from the hole 7.
【0010】円柱状のX線束11の周辺の、X線1とX
線2で挟まれた円筒状のX線束12は、1回だけ内壁と
全反射して出射孔7より出射する。例えば、円筒状のX
線束12の最も内側を進行するX線1は出射孔7の先端
の内側部分でその内壁とのなす角度αで全反射し、中心
軸とのなす角度2αの方向に出射する。最も外側を進行
するX線2は、内壁4の部分で内壁とのなす角度αで全
反射し、出射孔7の先端の内側部分をかすめて中心軸と
のなす角度2αの方向に出射する。この円筒状のX線束
12は、直径Dの出射孔7から中心軸とのなす角度2α
の方向に出射するので、その幅は入射から出射までの全
行路にわたりDcos2αとなり、また垂直方向の長さ
がDcos2α/tanα(≒D/α)にわたるキャピ
ラリの内壁4の部分と全反射により衝突する。X-rays 1 and X around the cylindrical X-ray flux 11
The cylindrical X-ray flux 12 sandwiched by the lines 2 is totally reflected once from the inner wall and emitted from the emission hole 7. For example, a cylindrical X
The X-ray 1 which travels in the innermost part of the ray bundle 12 is totally reflected by the inner portion of the tip of the emission hole 7 at an angle α with the inner wall thereof and emitted in the direction of an angle 2α with the central axis. The X-ray 2 traveling on the outermost side is totally reflected at the angle α formed by the inner wall 4 with the inner wall, and is emitted in the direction of the angle 2α formed by the central axis by grazing the inner portion of the tip of the emission hole 7. The cylindrical X-ray flux 12 has an angle 2α between the exit hole 7 having a diameter D and the central axis.
Since the light is emitted in the direction of, the width is Dcos2α over the entire path from the incidence to the emission, and it collides with the portion of the inner wall 4 of the capillary whose total length in the vertical direction is Dcos2α / tanα (≈D / α) by total reflection. .
【0011】X線束12の外側の、X線2とX線3で挟
まれた円筒状のX線束23は2回だけ内壁と全反射して
出射孔7より出射する。このX線束23は、内壁と2回
全反射の後、直径Dの出射孔7から中心軸とのなす角度
4αの方向に出射するので、その幅は入射から出射まで
の全行路にわたりDcos4αとなり、また内壁5の部
分と1回目の全反射が生じ、その1回目の全反射が生ず
る垂直方向の長さはDcos4α/tanα(≒D/
α)にわたる。The cylindrical X-ray flux 23, which is located outside the X-ray flux 12 and is sandwiched between the X-rays 2 and the X-rays 3, is totally reflected on the inner wall only twice and is emitted from the emission hole 7. This X-ray flux 23 is emitted from the emission hole 7 having the diameter D in the direction of the angle 4α formed by the central axis after total reflection twice on the inner wall, and thus the width is Dcos4α over the entire path from the incidence to the emission. Further, the first total reflection occurs with the portion of the inner wall 5, and the length in the vertical direction in which the first total reflection occurs is Dcos4α / tanα (≈D /
over α).
【0012】入射孔8の直径Bが、図1よりも大きけれ
ば、X線束23の外側に、3回以上全反射して出射する
円筒状のX線束が存在しうるが、これらについてはX線
束12、23に関する上記考察から容易に類推できる。If the diameter B of the entrance hole 8 is larger than that of FIG. 1, there may be a cylindrical X-ray flux which is totally reflected three times or more and is emitted outside the X-ray flux 23. It can be easily inferred from the above consideration regarding 12, 23.
【0013】一般的に、キャピラリに平行に入射したX
線束は内壁と衝突するたびに内壁とのなす角度は、2α
ずつ増加する。キャピラリに平行に入射したX線束が出
射するまでに内壁と衝突する回数が最も多い最外層のX
線束について、その全反射の回数をNとすると、このX
線束が出射する前に、内壁と最後に衝突する際のX線と
内壁とのなす角度は(2N−1)αで表される。従っ
て、キャピラリに入射したX線をすべて全反射により出
射孔7から出射させるためには、この角度を、次式のよ
うにキャピラリの材質で決まる全反射の臨界角度θより
も小さくすればよい。 (2N−1)α ≦ θ (2)Generally, X incident on the capillary in parallel.
Each time the wire bundle collides with the inner wall, the angle it makes with the inner wall is 2α.
It increases in steps. The X-ray of the outermost layer that has the most number of collisions with the inner wall before the X-ray flux incident parallel to the capillary is emitted.
If the number of total reflections of a ray bundle is N, then this X
The angle formed by the X-ray and the inner wall at the time of the last collision with the inner wall before the ray bundle is emitted is represented by (2N-1) α. Therefore, in order to cause all the X-rays incident on the capillary to be emitted from the emission hole 7 by total reflection, this angle may be made smaller than the critical angle θ of total reflection determined by the material of the capillary as in the following formula. (2N-1) α ≤ θ (2)
【0014】次に入射孔の直径BとN、α、Dとの間に
は以下の関係がある。先ず入射孔Bの直径は、入射する
X線束全体の直径に等しくなければならない。入射する
X線束全体の直径は、最外層のX線束が出射するまでに
N回内壁と全反射するとすれば、円柱状のX線束11の
直径D、その外側の円筒状のX線束12の厚さ2×Dc
os2α、X線束23の厚さ2×Dcos4α等の総計
である。従って、次式が成立する。 B=D+2×Dcos2α+2×Dcos4α……… ≒(2N+1)D (3) 全反射の回数Nが2の場合の例を図2に示す。Next, there is the following relationship between the diameter B of the entrance hole and N, α, and D. First, the diameter of the entrance hole B must be equal to the diameter of the entire incident X-ray flux. Assuming that the total diameter of the incident X-ray flux is totally reflected on the inner wall N times before the X-ray flux of the outermost layer is emitted, the diameter D of the cylindrical X-ray flux 11 and the thickness of the cylindrical X-ray flux 12 on the outer side thereof. 2 x Dc
os2α, the thickness of the X-ray flux 23 2 × Dcos4α, etc. Therefore, the following equation is established. B = D + 2 × Dcos2α + 2 × Dcos4α ... ≈ (2N + 1) D (3) FIG. 2 shows an example in which the number N of total reflections is 2.
【0015】次に、キャピラリの長さLと、B、D、α
との間には以下の関係がある。 L=(B−D)/2tanα ≒(B−D)/2α ≒N×D/α (4) 因みに、キャピラリの長さLは、前記円柱状X線束1
2、23等が、内壁と最初に衝突する各領域の中心軸方
向の長さの和であるので、次式によっても記述でき、同
じ結果を与える。 L=Dcos2α/tanα(≒D/α) +Dcos4α/tanα(≒D/α)+……… ≒D/α+D/α+……… =N×D/α (4a)Next, the length L of the capillary and B, D, α
Has the following relationship. L = (B−D) / 2 tanα ≈ (B−D) / 2α ≈N × D / α (4) Incidentally, the length L of the capillary is the cylindrical X-ray flux 1
Since 2, 23, etc. are the sums of the lengths in the central axis direction of the regions that first collide with the inner wall, they can be described by the following equations and give the same result. L = Dcos2α / tanα (≈D / α) + Dcos4α / tanα (≈D / α) + ... ≈D / α + D / α + ... …… = N × D / α (4a)
【0016】式(2)と式(3)から、Nとαが決まる
のでこれらを式(4)に代入すると、次式が得られる。 L≧(B−D)×(B−2D)/(2Dθ) (5)Since N and α are determined from the equations (2) and (3), when these are substituted into the equation (4), the following equation is obtained. L ≧ (B−D) × (B−2D) / (2Dθ) (5)
【0017】式(5)は、入射孔8の直径B、出射孔7
の直径D、入射X線の波長とキャピラリの材料により決
まる全反射の臨界角θを与えた場合に、平行に入射した
X線束がすべて全反射して出射孔7から出射するため
の、X線集光用キャピラリの長さLの条件を示す。Equation (5) is defined by the diameter B of the entrance hole 8 and the exit hole 7
When the critical angle θ of total reflection determined by the diameter D, the wavelength of the incident X-ray, and the material of the capillary is given, all X-ray fluxes incident in parallel are totally reflected and emitted from the emission hole 7. The condition of the length L of the condensing capillary is shown.
【0018】[0018]
【実施例】以下、添付図面を参照しながら本発明の実施
例を詳細に説明する。なお、図面の説明おいて同一の要
素には同一の符号を付し、重複する説明を省略する。Embodiments of the present invention will be described below in detail with reference to the accompanying drawings. In the description of the drawings, the same elements will be denoted by the same reference symbols, without redundant description.
【0019】第1の実施例について説明する。図1は、
X線集光用キャピラリの中心軸10の方向の縦断面図で
ある。図1において、6は鉛ガラスからなるキャピラリ
の内壁であって、単純な円錐台形とする。この鉛ガラス
の全反射の臨界角θは10ミリラジアンである。入射孔
8の直径Bは90μm、出射孔7の直径Dは1μm、キ
ャピラリの長さLは39cmである。因みに、このX線
集光用キャピラリの場合、入射孔8から平行に入射した
X線束は内壁と最大44回全反射した後に出射する。The first embodiment will be described. FIG.
It is a longitudinal cross-sectional view in the direction of the central axis 10 of the X-ray focusing capillary. In FIG. 1, reference numeral 6 denotes an inner wall of a capillary made of lead glass, which has a simple truncated cone shape. The critical angle θ of total reflection of this lead glass is 10 milliradians. The diameter B of the entrance hole 8 is 90 μm, the diameter D of the exit hole 7 is 1 μm, and the length L of the capillary is 39 cm. Incidentally, in the case of this X-ray condensing capillary, the X-ray flux incident in parallel from the incident hole 8 is emitted after being totally reflected up to 44 times on the inner wall.
【0020】まず、内径90μm、肉厚0.5mmの鉛
ガラスの細管を用意し、ガラス管の一部を加熱し一定の
加重をかけて一定の速度で引き伸ばす。加熱温度、引っ
張り加重、速度を調整し所望のキャピラリが出来るまで
上記操作を繰り返し、試作したキャピラリから所望のキ
ャピラリを選択することができる。最初の試行錯誤によ
り適切な加熱温度、引っ張り加重、速度が決まれば、以
降は容易に所望のキャピラリを得ることが出来る。本キ
ャピラリの入射孔8にX線を平行に入射させ、出射孔7
に直接写真フィルムを当て露光、現像後の像の濃度によ
り、集光X線束の照度とビ−ムの径を測定した。この結
果、出射孔7の直近で、入射X線よりも約8000倍
の、理論上予想される照度のX線ビ−ムを得ることが出
来た。また、集光X線束の大きさは、直径約1μmと極
めて微細なX線束を得ることが出来た。First, a lead glass thin tube having an inner diameter of 90 μm and a wall thickness of 0.5 mm is prepared, and a part of the glass tube is heated, and a certain weight is applied to the thin tube, which is stretched at a certain speed. The desired temperature can be selected from the trial-produced capillaries by adjusting the heating temperature, tensile load, and speed and repeating the above operations until the desired capillaries are formed. If an appropriate heating temperature, tensile load, and speed are determined by initial trial and error, the desired capillary can be easily obtained thereafter. X-rays are made to enter the entrance hole 8 of this capillary in parallel and the exit hole 7
The illuminance of the focused X-ray flux and the diameter of the beam were measured by directly applying a photographic film to and exposing and developing the image. As a result, it was possible to obtain an X-ray beam having a theoretically expected illuminance that was about 8000 times that of the incident X-ray in the vicinity of the exit hole 7. Moreover, the size of the focused X-ray flux was about 1 μm in diameter, and an extremely fine X-ray flux could be obtained.
【0021】尚、上記実施例はキャピラリの長さLが、
式(5)の右辺と等しい場合であるが、これに限られる
ものではない。キャピラリの長さが、式(5)から決ま
るLの範囲よりも短い場合には、Nよりも少ない衝突回
数でX線と内壁とのなす角度が全反射の臨界角θを超え
てしまい、入射したX線の一部は屈折を生じ、細管の内
壁から透過により漏れ出るようになる。 従って、入射
したX線束は全てキャピラリの出射孔7まで到達できな
くなり、射出したX線束の照度が、低くなり分析に時間
を要するようになる。キャピラリの長さLは、経験上か
ら式(5)の右辺から決まる値の90%未満は好ましく
ない。キャピラリの長さが、式(5)の右辺で決まる値
よりも大きい場合は、入射したX線束は全てキャピラリ
の出射孔7まで到達できるが、あまり大きくなると精度
良くキャピラリを製作することが困難になる。キャピラ
リの長さLは、式(5)の右辺から決まる値の200%
以下であることが好ましい。In the above embodiment, the length L of the capillary is
The case is equal to the right side of Expression (5), but the present invention is not limited to this. When the length of the capillary is shorter than the range of L determined from the equation (5), the angle formed by the X-ray and the inner wall exceeds the critical angle θ of total reflection with the number of collisions smaller than N, and the incident angle A part of the generated X-rays is refracted and leaks out from the inner wall of the capillary by transmission. Therefore, all of the incident X-ray flux cannot reach the exit hole 7 of the capillary, the illuminance of the emitted X-ray flux becomes low, and analysis takes time. From the experience, it is not preferable that the length L of the capillary is less than 90% of the value determined from the right side of the formula (5). When the length of the capillary is larger than the value determined by the right side of the equation (5), all the incident X-ray flux can reach the exit hole 7 of the capillary, but if it is too large, it becomes difficult to manufacture the capillary with high accuracy. Become. The length L of the capillary is 200% of the value determined from the right side of Expression (5).
The following is preferred.
【0022】[0022]
【効果】以上説明したように、本発明によれば、製作が
きわめて容易なX線集光用キャピラリを得ることが出来
る。また、十分な照度のX線束を得ることが出来るの
で、分析時間が短くなり、分析が効率的になる。また極
めて細いX線ビ−ムを得ることが出来るので、高い分解
能で微細な結晶などの分析が出来る。As described above, according to the present invention, it is possible to obtain a capillary for X-ray focusing which is extremely easy to manufacture. Further, since the X-ray flux with sufficient illuminance can be obtained, the analysis time is shortened and the analysis becomes efficient. Further, since an extremely thin X-ray beam can be obtained, it is possible to analyze fine crystals with high resolution.
【0023】[0023]
【図1】本発明にかかるX線集光用キャピラリの中心軸
方向の縦断面図であって、キャピラリの形状と入射X線
の全反射の回数との関係を示す。FIG. 1 is a vertical cross-sectional view in the direction of the central axis of an X-ray condensing capillary according to the present invention, showing the relationship between the shape of the capillary and the number of total reflections of incident X-rays.
【図2】本発明にかかるX線集光用キャピラリの横断面
図であって、入射X線の全反射の回数とキャピラリの入
射孔及び出射孔の直径との関係を示す。FIG. 2 is a cross-sectional view of the X-ray condensing capillary according to the present invention, showing the relationship between the number of total reflections of incident X-rays and the diameters of the entrance hole and the exit hole of the capillary.
1、2、3:入射X線 4:X線束12が内壁と全反射する領域 5:X線束23が内壁と最初に全反射する領域 6:X線集光用キャピラリの内壁 7:X線集光用キャピラリの出射孔 8:X線集光用キャピラリの入射孔 11、12、23:X線束 1, 2 and 3: incident X-rays 4: region where X-ray flux 12 totally reflects from inner wall 5: region where X-ray flux 23 totally reflects from inner wall first 6: inner wall of X-ray focusing capillary 7: X-ray collection Emission hole of light capillary 8: Incident hole of X-ray condensing capillary 11, 12, 23: X-ray flux
Claims (1)
ムを集光するX線用キャピラリにおいて、X線ビ−ムが
入射する入射孔の直径をB、集光されたX線ビ−ムが出
射する出射孔の直径をD、入射するX線の波長と管内壁
の材質で決まる全反射の臨界角をθとしたときに、前記
X線用キャピラリの長さLが(B−D)×(B−2D)
/(2Dθ)で与えられる値の90%から200%の範
囲であることを特徴とするX線集光用キャピラリ1. An X-ray beam utilizing total internal reflection on the inner wall of the tube.
In the X-ray capillary that focuses the beam, the diameter of the entrance hole through which the X-ray beam enters is B, the diameter of the exit hole through which the focused X-ray beam exits is D, and the diameter of the incoming X-ray When the critical angle of total reflection determined by the wavelength and the material of the inner wall of the tube is θ, the length L of the X-ray capillary is (BD) × (B-2D).
Capillary for X-ray focusing, which is in the range of 90% to 200% of the value given by / (2Dθ)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7177050A JPH0926500A (en) | 1995-07-13 | 1995-07-13 | Capillary for X-ray focusing |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7177050A JPH0926500A (en) | 1995-07-13 | 1995-07-13 | Capillary for X-ray focusing |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0926500A true JPH0926500A (en) | 1997-01-28 |
Family
ID=16024266
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7177050A Pending JPH0926500A (en) | 1995-07-13 | 1995-07-13 | Capillary for X-ray focusing |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0926500A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007093315A (en) * | 2005-09-28 | 2007-04-12 | Shimadzu Corp | X-ray focusing device |
-
1995
- 1995-07-13 JP JP7177050A patent/JPH0926500A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007093315A (en) * | 2005-09-28 | 2007-04-12 | Shimadzu Corp | X-ray focusing device |
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