KR102360986B1 - Curable composition including quantum dot, manufacturing method of pixel for color filter using the same and color filter - Google Patents

Abstract

(A) resin; (B) surface-modified quantum dots with a surface-modifying material; And (C) a curable composition comprising a solvent, a method for manufacturing a pixel for a color filter using the curable composition, and a color filter including the pixel manufactured by the manufacturing method are provided.

Description

Curable composition containing quantum dots, pixel manufacturing method and color filter for color filter using the curable composition

The present disclosure relates to a quantum dot-containing curable composition, a method for manufacturing a pixel for a color filter using the curable composition, and a color filter manufactured using the curable resin composition.

A color filter is used for a liquid crystal display device, an optical filter of a camera, etc., and is manufactured by coating a fine area colored with three or more colors on a solid-state imaging device or a transparent substrate. Such a colored thin film may be generally formed by a dyeing method, a printing method, a pigment dispersion method, an inkjet method, and the like.

In the dyeing method, an image with a dyeing base such as natural photosensitive resin such as gelatin, amine-modified polyvinyl alcohol, or amine-modified acrylic resin is formed on a substrate in advance, and then dyed with a dye such as a direct dye to form a colored thin film. In the case of the dyeing method, the clarity and dispersibility of commonly used dyes and resins themselves are good, but there are disadvantages in that light resistance, moisture resistance and heat resistance are inferior.

In the printing method, a colored thin film is formed by printing using an ink in which a pigment is dispersed in a thermosetting or photocurable resin, and then curing with heat or light. In the case of the dyeing method, the material cost can be reduced compared to other methods, but there is a disadvantage in that it is difficult to form a highly precise and detailed image.

The pigment dispersion method is a method of forming a colored thin film by repeating a series of processes of coating, exposing, developing, and thermally curing a photopolymerizable composition containing a colorant on a transparent substrate provided with a black matrix. The pigment dispersion method has advantages in that heat resistance and durability can be improved and the thickness of the film can be maintained uniformly. In addition, the implementation of the fine pattern is excellent and the manufacturing method is relatively easy, so it is universally employed. For example, in Korean Patent Publication No. 1992-7002502, Korean Patent Publication No. 1994-0005617, Korean Patent Publication No. 1995-0011163, Korean Patent Publication No. 1995-7000359, etc., the preparation of a colored photosensitive resin composition using a pigment dispersion method A method is being proposed.

However, the method requires a process of coating, exposing, developing, and curing each of red (R), green (G) and blue (B) to form a pixel, so the manufacturing process is very long and the control factor between the processes is very long. As the number increases, it is difficult to manage the yield.

In order to overcome this problem, various new process methods have been used to replace the conventional pigment dispersion method, and a representative one is the inkjet printing method. In the inkjet printing method, a light blocking layer such as a black matrix is formed on a glass substrate and ink is injected into the pixel space. In the inkjet printing method, since separate processes such as coating, exposure, and development are unnecessary in manufacturing the color filter, materials required for the process can be reduced and the process can be simplified.

When a color filter is manufactured using the inkjet ink as described above, it is common to use a mixture of two or more types of pigments in order to secure required color characteristics. In particular, in a red filter, a dicytopyrrolopyrrole-based red pigment, for example, C.I. Pigment Red 254 is mainly used. In addition, as a toning pigment, an anthraquinone-based red pigment, for example, C.I. Pigment Red 177 may be added, or an isoindolinone-based yellow pigment such as C.I. It is common to add Pigment Yellow 139. Optionally other yellow and orange pigments, for example C.I. Pigment Yellow 138, C.I Pigment Yellow 150, C.I. Pigment Orange 38, etc. may be added. The above pigments have excellent color characteristics, light resistance and heat resistance, and have been commonly used as a material for color filters. However, as the use of LCD color filters has recently expanded, the level of required properties is increasing day by day. Therefore, in order to improve color characteristics such as brightness and color purity when transmitted, research on atomizing and finely dispersing the pigments is being conducted, but in fact, there is a limit to the expression of color characteristics of a color filter only with the combination of these pigments.

One embodiment is to provide a curable composition capable of greatly improving the dispersibility of quantum dots in high boiling point and low vapor pressure solvents.

Another embodiment is to provide a method for manufacturing a pixel for a color filter using the curable composition.

Another embodiment is to provide a color filter including a pixel manufactured by the pixel manufacturing method.

A curable composition according to an embodiment includes (A) a resin; (B) surface-modified quantum dots with a surface-modifying material; and (C) a solvent, wherein the surface-modifying material includes a compound represented by Formula 1 below, a compound represented by Formula 2 below, or a combination thereof, and the solvent is a compound represented by Formula 3 to Formula 8 any one or more of

[Formula 1]

[Formula 2]

[Formula 3]

[Formula 4]

[Formula 5]

[Formula 6]

[Formula 7]

[Formula 8]

In Formulas 1 to 8,

R ¹ to R ⁹ are each independently a hydrogen atom or a substituted or unsubstituted C1 to C20 alkyl group,

L ¹ to L ⁶ are each independently a substituted or unsubstituted C1 to C20 alkylene group.

The surface modifying material may include a compound represented by Formula 1 and a compound represented by Formula 2 above.

The surface modifying material may include the compound represented by Formula 1 and the compound represented by Formula 2 in a weight ratio of 15:1 to 1:1.

The quantum dots may have a maximum fluorescence emission wavelength in the range of 500 nm to 680 nm.

The resin may further include a binder resin and a reactive unsaturated compound.

The binder resin may include an acrylic resin, an epoxy resin, or a combination thereof.

The curable composition may further include a diffusing agent.

The dispersing agent may be included in an amount of 0.1 wt% to 20 wt% based on the total amount of the curable composition.

The dispersing agent may include barium sulfate, calcium carbonate, titanium dioxide, zirconia, or a combination thereof.

The curable composition may include 1 wt% to 40 wt% of the resin, 1 wt% to 40 wt% of the surface-modified quantum dots, and the remainder of the solvent with respect to the total amount of the curable composition.

The curable composition may include a thiol-based additive; polymerization inhibitor; malonic acid; 3-amino-1,2-propanediol; silane-based coupling agent; leveling agent; fluorine-based surfactants; polymerization inhibitors; Or it may further include a combination thereof.

Another embodiment includes the steps of forming a pattern by applying the curable composition on a substrate by an inkjet spraying method; and curing the pattern.

Another embodiment provides a color filter including a pixel for a color filter manufactured by the pixel manufacturing method.

The specific details of other aspects of the invention are included in the detailed description below.

One embodiment relates to a curable composition suitable for an inkjet printing method that does not require processes such as coating, exposure, and development. The solvent used in the curable composition has a higher boiling point and a higher vapor pressure than a solvent used in a conventional photosensitive resin composition. It has low characteristics. These high boiling point and low vapor pressure solvents are a problem by lowering the dispersibility of quantum dots, but the curable composition according to an embodiment uses quantum dots surface-modified with a specific compound, and quantum dots for a specific solvent used in the curable composition. Acidity can be greatly improved.

1 is a schematic diagram showing a surface-modified quantum dot in a curable composition according to an embodiment.

Hereinafter, embodiments of the present invention will be described in detail. However, this is provided as an example, and the present invention is not limited thereto, and the present invention is only defined by the scope of the claims to be described later.

Unless otherwise specified herein, "alkyl group" means a C1 to C20 alkyl group, "alkenyl group" means a C2 to C20 alkenyl group, and "cycloalkenyl group" means a C3 to C20 cycloalkenyl group. , "heterocycloalkenyl group" means a C3 to C20 heterocycloalkenyl group, "aryl group" means a C6 to C20 aryl group, "arylalkyl group" means a C6 to C20 arylalkyl group, "alkylene group" means a C1 to C20 alkylene group, "arylene group" means a C6 to C20 arylene group, "alkylarylene group" means a C6 to C20 alkylarylene group, and "heteroarylene group" means a C3 to C20 hetero It means an arylene group, and "alkoxyylene group" means a C1 to C20 alkoxyylene group.

Unless otherwise specified herein, "substitution" means that at least one hydrogen atom is a halogen atom (F, Cl, Br, I), a hydroxy group, a C1 to C20 alkoxy group, a nitro group, a cyano group, an amine group, an imino group, Azido group, amidino group, hydrazino group, hydrazono group, carbonyl group, carbamyl group, thiol group, ester group, ether group, carboxyl group or a salt thereof, sulfonic acid group or a salt thereof, phosphoric acid or a salt thereof, C1 to C20 alkyl group, C2 to C20 alkenyl group, C2 to C20 alkynyl group, C6 to C20 aryl group, C3 to C20 cycloalkyl group, C3 to C20 cycloalkenyl group, C3 to C20 cycloalkynyl group, C2 to C20 heterocycloalkyl group, C2 to C20 heterocycloalkenyl group, C2 to C20 heterocycloalkynyl group, C3 to C20 heteroaryl group, or a combination thereof means substituted with a substituent.

In addition, unless otherwise specified in the present specification, "hetero" means that at least one hetero atom among N, O, S and P is included in the formula.

In addition, unless otherwise specified herein, "(meth)acrylate" means that both "acrylate" and "methacrylate" are possible, and "(meth)acrylic acid" is "acrylic acid" and "methacrylic acid" “It means that both are possible.

Unless otherwise specified herein, "combination" means mixing or copolymerization.

Unless otherwise defined in the chemical formulas in the present specification, when a chemical bond is not drawn at a position where a chemical bond is to be drawn, it means that a hydrogen atom is bonded to the position.

In addition, unless otherwise specified in the present specification, "*" means a moiety connected to the same or different atoms or chemical formulas.

A curable composition according to an embodiment includes (A) a resin; (B) a quantum dot surface-modified with a surface-modifying material comprising a compound represented by the following formula (1), a compound represented by the following formula (2), or a combination thereof; and (C) a solvent comprising any one or more of the compounds represented by the following Chemical Formulas 3 to 8.

[Formula 1]

[Formula 2]

[Formula 3]

[Formula 4]

[Formula 5]

[Formula 6]

[Formula 7]

[Formula 8]

In Formulas 1 to 8,

R ¹ to R ⁹ are each independently a hydrogen atom or a substituted or unsubstituted C1 to C20 alkyl group,

L ¹ to L ⁶ are each independently a substituted or unsubstituted C1 to C20 alkylene group.

One embodiment relates to a curable inkjet composition containing quantum dots. In particular, it is possible to greatly improve the dispersibility of the surface-modified quantum dots in a solvent having properties suitable for the inkjet process through the surface modification of the quantum dots, which are core materials. In this case, the surface modification of the quantum dots is possible through ligand substitution. Basically, most quantum dots obtained by known synthetic methods are mainly dispersed only in non-polar solvents because the structure except for the chelating group is composed of non-polar aliphatic chains such as oleic acid and dodecyl thiol. There were limitations. However, most of the other materials constituting the curable inkjet composition are polar, which is not preferable in terms of compatibility with the other materials. Furthermore, the solvent used in the curable inkjet composition has a high boiling point and low vapor pressure, and a solvent having these properties does not have high dispersibility for quantum dots, and above all, the demand for increasing the dispersibility of quantum dots in the solvents is very high.

More specifically, the solvent used in the curable inkjet composition generally has a high boiling point, high surface tension, and low vapor pressure. However, most solvents having these characteristics are polar solvents and have low compatibility with the surface properties of quantum dots themselves. Although compatibility with other materials used in the curable inkjet composition can be improved by using an amphoteric solvent such as cyclohexyl acetate, there is a large limitation in satisfying both surface tension and vapor pressure. There is also a method to increase the dispersibility by using additives such as other surfactants, but the applicability is not great as a temporary method.

Therefore, the present inventors have conducted research focusing on changing the physical properties of quantum dots themselves, which are core materials, and by developing an appropriate ligand and using it for surface modification of quantum dots, dispersibility in various polar solvents can be greatly improved.

According to one embodiment, the surface of the quantum dots constituting the curable composition is modified with a phosphate-based ligand or a phosphate-based ligand represented by Chemical Formula 1 or Chemical Formula 2, and a (meth)acrylate end portion to help cure the inkjet composition Since the compound represented by Formula 1 is in a mono-functional form, and the compound represented by Formula 2 is in a di-functional form, the compound represented by Formula 1 and Formula 2 is in the solvent used in the curable composition. Various solvent groups with good dispersibility of quantum dots in the curable composition (for example, a solvent having a surface tension of 30 dyne/cm to 55 dyne/cm, specifically the compound represented by Formulas 3 to 8) can be obtained

Hereinafter, each component will be described in detail.

(B) Surface-modified quantum dots

According to one embodiment, the quantum dots are surface-modified with a ligand without a thiol group or a carboxyl group, specifically, a compound represented by Formula 1 and/or Formula 2, and when the surface-modified quantum dot is used in the curable composition, it is used in a curable composition It is possible to greatly improve the dispersibility of the quantum dots in a solvent to be used, specifically, a solvent including any one or more of the compounds represented by Chemical Formulas 3 to 8, thereby greatly expanding the scope of application of the curable composition for inkjet.

For example, the surface modifying material may include both the compound represented by Formula 1 and the compound represented by Formula 2 above. In this case, the surface modification material may include the compound represented by Formula 1 and the compound represented by Formula 2 in a weight ratio of 15:1 to 1:1, specifically, 10:1 to 1:1 by weight. have. Since the compound represented by Formula 1 has two hydroxyl groups, it has good affinity with quantum dots and has excellent performance in surface modification of quantum dots, but has only one (meth)acrylate, so the affinity with the resin is There is a bad problem. On the other hand, since the compound represented by Formula 2 has one hydroxyl group, the affinity with the quantum dots is not good, but the affinity with the resin is good because it has only two (meth)acrylates. Therefore, in the case of using a mixture of these as a surface modification material, rather than using each of the compound represented by Formula 1 and the compound represented by Formula 2 as a surface modification material, affinity with the quantum dots and the resin (affinity) aspect is advantageous, and when the compound represented by Formula 1 and the compound represented by Formula 2 are included in the above weight ratio, affinity between the quantum dots and the resin may be the best.

For example, in Formulas 1 and 2, R ¹ to R ³ may each independently be a methyl group, and L ¹ to L ³ may each independently be an ethylene group.

The surface-modified quantum dot may have a core-shell structure, the shell may include Zn, and the compound represented by Chemical Formula 1 and/or Chemical Formula 2 may have a structure forming a bond with Zn of the shell.

For example, the quantum dots absorb light in a wavelength region of 360 nm to 780 nm, for example, 400 nm to 780 nm, and emit fluorescence in a wavelength region of 500 nm to 700 nm, such as 500 nm to 580 nm, or emit fluorescence in 600 nm to 680 nm. can That is, the quantum dots may have a maximum fluorescence emission wavelength (fluorescence λ _em ) at 500 nm to 680 nm.

The quantum dots may each independently have a full width at half maximum (FWHM) of 20 nm to 100 nm, for example, 20 nm to 50 nm. When the quantum dot has a full width at half maximum in the above range, as the color purity is high, when used as a color material in a color filter, color gamut is increased.

The quantum dots may each independently be an organic material or an inorganic material or a hybrid (hybrid material) of an organic material and an inorganic material.

The quantum dots may each independently consist of a core and a shell surrounding the core, wherein the core and the shell are each independently made of a group II-IV, group III-V, etc., a core, a core/shell, a core/first shell/ It may have a structure such as a second shell, an alloy, an alloy/shell, and the like, but is not limited thereto.

For example, the core may include at least one material selected from the group consisting of CdS, CdSe, CdTe, ZnS, ZnSe, ZnTe, HgS, HgSe, HgTe, GaN, GaP, GaAs, InP, InAs, and alloys thereof. , but is not necessarily limited thereto. The shell surrounding the core may include at least one material selected from the group consisting of CdSe, ZnSe, ZnS, ZnTe, CdTe, PbS, TiO, SrSe, HgSe, and alloys thereof, but is not necessarily limited thereto.

In one embodiment, since interest in the environment has recently increased significantly around the world and regulations on toxic substances are being strengthened, instead of a light emitting material having a cadmium-based core, quantum yield is somewhat low, but eco-friendly Although a non-cadmium-based light emitting material (InP/ZnS, InP/ZeSe/ZnS, etc.) was used, it is not necessarily limited thereto.

In the case of the quantum dots of the core/shell structure, the size (average particle diameter) of each quantum dot including the shell may be 1 nm to 15 nm, for example, 5 nm to 15 nm.

For example, the quantum dots may each independently include a red quantum dot, a green quantum dot, or a combination thereof. The red quantum dots may each independently have an average particle diameter of 10 nm to 15 nm. The green quantum dots may each independently have an average particle diameter of 5 nm to 8 nm.

On the other hand, for the dispersion stability of the quantum dots, the curable composition according to an embodiment may further include a dispersing agent. The dispersing agent helps to uniformly disperse a light conversion material such as quantum dots in the curable composition, and any nonionic, anionic or cationic dispersant may be used. Specifically, polyalkylene glycol or esters thereof, polyoxyalkylene, polyhydric alcohol ester alkylene oxide adduct, alcohol alkylene oxide adduct, sulfonic acid ester, sulfonic acid salt, carboxylic acid ester, carboxylic acid salt, alkyl amide alkylene oxide Adducts, alkyl amines, etc. may be used, and these may be used alone or in combination of two or more. The dispersant may be used in an amount of 0.1 wt% to 100 wt%, such as 10 wt% to 20 wt%, based on the solid content of the light conversion material such as quantum dots.

The surface-modified quantum dots may be included in an amount of 1 wt% to 40 wt%, such as 5 wt% to 30 wt%, based on the solid content based on the total amount of the curable resin composition. When the surface-modified quantum dots are included within the above range, the light conversion rate is excellent, and the pattern characteristics and the developing characteristics are not impaired, and thus excellent processability can be obtained.

(A) resin

The resin may include a binder resin and a reactive unsaturated compound.

The binder resin may include an acrylic resin, an epoxy resin, or a combination thereof.

The acrylic resin is a copolymer of a first ethylenically unsaturated monomer and a second ethylenically unsaturated monomer copolymerizable therewith, and may be a resin including one or more acrylic repeating units.

The first ethylenically unsaturated monomer is an ethylenically unsaturated monomer containing at least one carboxyl group, and specific examples thereof include acrylic acid, methacrylic acid, maleic acid, itaconic acid, fumaric acid, or a combination thereof.

The first ethylenically unsaturated monomer may be included in an amount of 5 wt% to 50 wt%, for example 10 wt% to 40 wt%, based on the total amount of the acrylic binder resin.

The second ethylenically unsaturated monomer may be an aromatic vinyl compound such as styrene, α-methylstyrene, vinyltoluene or vinylbenzylmethyl ether; Methyl (meth) acrylate, ethyl (meth) acrylate, butyl (meth) acrylate, 2-hydroxyethyl (meth) acrylate, 2-hydroxybutyl (meth) acrylate, benzyl (meth) acrylate, unsaturated carboxylic acid ester compounds such as cyclohexyl (meth)acrylate and phenyl (meth)acrylate; unsaturated carboxylic acid amino alkyl ester compounds such as 2-aminoethyl (meth)acrylate and 2-dimethylaminoethyl (meth)acrylate; Carboxylic acid vinyl ester compounds, such as vinyl acetate and a vinyl benzoate; unsaturated carboxylic acid glycidyl ester compounds such as glycidyl (meth)acrylate; Vinyl cyanide compounds, such as (meth)acrylonitrile; unsaturated amide compounds such as (meth)acrylamide; and the like, and these may be used alone or in combination of two or more.

Specific examples of the acrylic binder resin include polybenzyl methacrylate, (meth)acrylic acid/benzyl methacrylate copolymer, (meth)acrylic acid/benzyl methacrylate/styrene copolymer, (meth)acrylic acid/benzyl methacrylate/ 2-hydroxyethyl methacrylate copolymer, (meth)acrylic acid / benzyl methacrylate / styrene / 2-hydroxyethyl methacrylate copolymer and the like may be mentioned, but are not limited thereto, and these are single or two types. It is also possible to use a combination of the above.

The weight average molecular weight of the acrylic resin may be 5,000 g/mol to 15,000 g/mol.　When the weight average molecular weight of the acrylic resin is within the above range, the adhesion to the substrate is excellent, the physical and chemical properties are good, and the viscosity is appropriate.

The acrylic resin may have an acid value of 80 mgKOH/g to 130 mgKOH/g. When the acid value of the acrylic resin is within the above range, the resolution of the pixel pattern is excellent.

The epoxy resin is a monomer or oligomer that can be polymerized by heat, and may include a compound having a carbon-carbon unsaturated bond and a carbon-carbon cyclic bond.

For example, the epoxy resin may be two or more types of epoxy resins necessarily including a compound represented by the following Chemical Formula 9-1 and a compound represented by the following Chemical Formula 9-2.

[Formula 9-1]

[Formula 9-2]

(In Formulas 9-1 and 9-2,

R ¹⁰ to R ¹³ are each independently a hydrogen atom, a halogen atom, or a C1 to C5 alkyl group,

p is an integer from 0 to 25.)

As the epoxy resin, in addition to Chemical Formulas 9-1 and 9-2, bisphenol A type epoxy resin, bisphenol F type epoxy resin, phenol novolak type epoxy resin, cyclic aliphatic epoxy resin, aliphatic polyglycidyl ether, etc. more may be included.

As a commercial product of such a compound, the bisphenyl epoxy resin represented by Formula 9-1 includes YX4000, YX4000H, YL6121H, YL6640, YL6677 of Yuka Shell Epoxy Co., Ltd.; The cresol novolak-type epoxy resin represented by Formula 9-2 includes EOCN-102, EOCN-103S, EOCN-104S, EOCN-1020, EOCN-1025, EOCN of Nippon Kayaku Co., Ltd. for the cresol novolak-type epoxy resin. -1027 and Epicoat 180S75 of Yuka Shell Epoxy Co., Ltd.; Examples of the bisphenol A-type epoxy resin include Epicoat 1001, 1002, 1003, 1004, 1007, 1009, 1010 and 828 of Yuka Shell Epoxy Co., Ltd.; Examples of the bisphenol F-type epoxy resin include Epicoat 807 and 834 of Yuka Shell Epoxy Co., Ltd.; Examples of the phenol no-block type epoxy resin include Epicoat 152, 154, 157H65 of Yuka Shell Epoxy Co., Ltd. and EPPN 201, 202 of Nippon Kayaku Co., Ltd.; Other cyclic aliphatic epoxy resins include CY175, CY177 and CY179 of CIBA-GEIGY AG, ERL-4234, ERL-4299, ERL-4221 and ERL-4206 of UCC, Shodyin 509 of Showa Denko Co., Ltd. , CIBA-GEIGY AG's Araldite CY-182, CY-192 and CY-184, Dainippon Ink High School's Epikron 200 and 400, Eucashell Epoxy Co., Ltd.'s Epicoat 871, 872 and EP1032H60, ED-5661 and ED-5662 of Celanese Coating Co., Ltd.; Examples of aliphatic polyglycidyl ethers include Epicoat 190P and 191P from Yukashell Epoxy Co., Ltd., Eporite 100MF from Kyoesha Yushi Chemical Co., Ltd., and Epiol TMP from Nippon Yushi Co., Ltd. can

The reactive unsaturated compound may be used by mixing a curable monomer or a curable oligomer generally used in conventional thermosetting or photocurable compositions. For example, the reactive unsaturated compound may be an oxetane-based monomer, an acrylate-based monomer, or a combination thereof.

Examples of the reactive unsaturated compound include ethylene glycol diacrylate, triethylene glycol diacrylate, 1,4-butanediol diacrylate, 1,6-hexanediol diacrylate, neopentyl glycol diacrylate, pentaeryth Ritol diacrylate, pentaerythritol triacrylate, dipentaerythritol diacrylate, dipentaerythritol triacrylate, dipentaerythritol pentaacrylate, pentaerythritol hexaacrylate, bisphenol A diacrylate, trimethyl Allpropane triacrylate, novolac epoxy acrylate, ethylene glycol dimethacrylate, diethylene glycol dimethacrylate, triethylene glycol dimethacrylate, propylene glycol dimethacrylate, 1,4-butanediol dimethacrylate 1,6-hexanediol dimethacrylate, bis[1-ethyl(3-oxetanyl)]methyl ether, etc. may be selected or used in combination.

The resin may be included in an amount of 1 wt% to 40 wt%, for example 5 wt% to 30 wt%, based on the total amount of the curable composition. When the content of the resin is within the above range, there is an effect excellent in heat resistance, chemical resistance, film strength and physical properties, which are reliability of a pattern formed by inkjet printing prepared therefrom.

(C) solvent

The curable composition according to an embodiment may include a solvent having a surface tension (based on 20° C.) of 30 dyne/cm or more, such as 30 dyne/cm to 55 dyne/cm, such as 32 dyne/cm to 55 dyne/cm. have.

For example, the solvent may have a boiling point of 215° C. or higher.

For example, the solvent may have a vapor pressure of 0.5 or less at 20°C.

For example, a solvent having a surface tension of 30 dyne / cm to 55 dyne / cm (based on 20 ° C.), a boiling point of 215 ° C. or higher, and a vapor pressure of 0.5 or less at 20 ° C. It is possible to provide a curable composition having excellent stability, optical properties, and the like.

The solvent having a surface tension of 30 dyne/cm to 55 dyne/cm, a boiling point of 215° C. or more, and a vapor pressure of 0.5 or less at 20° C. may be a compound represented by Chemical Formulas 3 to 8. For example, in Chemical Formulas 4, 5, 7 and 8, R ⁴ to R ⁹ may each independently be a methyl group, L ⁴ may be a butylene group, and L ⁵ and L ⁶ may each independently be an ethylene group. can

For example, the solvent may have a surface tension of 48 dyne/cm or more (based on 20°C), a boiling point of 245°C or more, and a vapor pressure of 0.01 or less at 20°C.

The solvent may be included in a balance based on the total amount of the photosensitive resin composition, for example, 20 wt% to 80 wt%, for example 35 wt% to 80 wt%. When the solvent is included within the above range, since the curable composition has an appropriate viscosity, it may have excellent coatability during spin coating and large-area coating using a slit.

(D) dispersing agent (or dispersing agent dispersion)

The curable composition according to an embodiment may further include a diffusing agent.

For example, the diffusing agent may include barium sulfate (BaSO ₄ ), calcium carbonate (CaCO ₃ ), titanium dioxide (TiO ₂ ), zirconia (ZrO ₂ ), or a combination thereof.

The diffusing agent reflects light not absorbed by the quantum dots, and enables the quantum dots to absorb the reflected light again. That is, the diffusing agent may increase the amount of light absorbed by the quantum dots, thereby increasing the light conversion efficiency of the curable composition.

The diffusing agent may have an average particle diameter (D ₅₀ ) of 150 nm to 250 nm, specifically 180 nm to 230 nm. When the average particle diameter of the diffusing agent is within the above range, a more excellent light diffusion effect may be obtained, and light conversion efficiency may be increased.

The dispersing agent may be included in an amount of 0.1 wt% to 20 wt%, for example, 1 wt% to 15 wt%, based on the solid content, based on the total amount of the curable composition. When the diffusion agent is included in an amount of less than 0.1% by weight based on the total amount of the curable composition, it is difficult to expect an effect of improving light conversion efficiency by using the diffusion agent, and when it contains more than 20% by weight, the pattern characteristics may be deteriorated there is

other additives

In order to improve the stability and dispersibility of the quantum dots, the curable composition according to an embodiment may further include (E) a thiol-based additive.

The thiol-based additive may be substituted on the shell surface of the quantum dots to improve the dispersion stability of the quantum dots to a solvent, thereby stabilizing the quantum dots.

The thiol-based additive may have 2 to 10, for example, 2 to 4 thiol groups (-SH) at the terminal depending on the structure thereof.

For example, the thiol-based additive may include at least two or more functional groups represented by the following Chemical Formula 10 at the terminal thereof.

[Formula 10]

In the formula (10),

L ⁷ and L ⁸ are each independently a single bond, a substituted or unsubstituted C1 to C20 alkylene group, a substituted or unsubstituted C3 to C20 cycloalkylene group, a substituted or unsubstituted C6 to C20 arylene group, or a substituted or unsubstituted It is a C2 to C20 heteroarylene group.

For example, the thiol-based additive may be represented by the following Chemical Formula 11.

[Formula 11]

In the above formula (11),

L ⁷ and L ⁸ are each independently a single bond, a substituted or unsubstituted C1 to C20 alkylene group, a substituted or unsubstituted C3 to C20 cycloalkylene group, a substituted or unsubstituted C6 to C20 arylene group, or a substituted or unsubstituted is a C2 to C20 heteroarylene group,

n1 and n2 are each independently an integer of 0 or 1.

For example, in Formulas 10 and 11, L ⁷ and L ⁸ may each independently represent a single bond or a substituted or unsubstituted C1 to C20 alkylene group.

Specific examples of the thiol-based additive include pentaerythritol tetrakis (3-mercaptopropionate) represented by the following formula 12a, and trimethylolpropane tris (3) represented by the following formula 12b. -mercaptopropionate) (trimethylolpropane tris (3-mercaptopropionate)), pentaerythritol tetrakis (mercapto acetate) represented by the following formula 12c Pentaerythritol tetrakis (mercaptoacetate), trimethylolpropane tris ( Any selected from the group consisting of 2-mercaptoacetate) (trimethylolpropane tris(2-mercaptoacetate)), glycol di-3-mercaptopropionate represented by the following formula 12e, and combinations thereof can take one

[Formula 12a]

[Formula 12b]

[Formula 12c]

[Formula 12d]

[Formula 12e]

The thiol-based additive may be included in an amount of 1 wt% to 10 wt%, such as 1 wt% to 5 wt%, based on the total amount of the curable composition. When the thiol-based additive is included in less than 1% by weight, it is difficult to maintain the stability of the quantum dots by process, and when the thiol-based additive is included in more than 10% by weight, the patternability of the curable composition is reduced, and changes over time at room temperature may occur.

The curable composition according to an embodiment may further include a polymerization inhibitor including a hydroquinone-based compound, a catechol-based compound, or a combination thereof. As the curable composition according to an embodiment further includes the hydroquinone-based compound, the catechol-based compound, or a combination thereof, it is possible to prevent crosslinking at room temperature during exposure after printing (coating) the photosensitive resin composition.

For example, the hydroquinone-based compound, catechol-based compound, or a combination thereof is hydroquinone, methyl hydroquinone, methoxyhydroquinone, t-butyl hydroquinone, 2,5-di- t -butyl hydroquinone, 2,5- Bis(1,1-dimethylbutyl) hydroquinone, 2,5-bis(1,1,3,3-tetramethylbutyl) hydroquinone, catechol, t-butyl catechol, 4-methoxyphenol, pyroga Rol, 2,6-di- t -butyl-4-methylphenol, 2-naphthol, tris(N-hydroxy-N-nitrosophenylaminato-O,O')aluminum (Tris(N-hydroxy-N) -nitrosophenylaminato-O,O')aluminium) or a combination thereof, but is not necessarily limited thereto.

The hydroquinone-based compound, catechol-based compound, or a combination thereof may be used in the form of a dispersion, and the polymerization inhibitor in the dispersion form is 0.001% to 1% by weight, such as 0.01% to 0.1% by weight, based on the total amount of the photosensitive resin composition % may be included. When the stabilizer is included within the above range, it is possible to solve the problem of aging at room temperature, and at the same time, to prevent a decrease in sensitivity and surface peeling phenomenon.

In addition, the curable composition according to an embodiment may include malonic acid; 3-amino-1,2-propanediol; silane coupling agent; leveling agent; fluorine-based surfactants; Or it may further include a combination thereof.

For example, the curable composition may further include a silane-based coupling agent having a reactive substituent such as a vinyl group, a carboxyl group, a methacryloxy group, an isocyanate group, and an epoxy group in order to improve adhesion to the substrate.

Examples of the silane-based coupling agent include trimethoxysilyl benzoic acid, γ methacryl oxypropyl trimethoxysilane, vinyl triacetoxysilane, vinyl trimethoxysilane, γ isocyanate propyl triethoxysilane, γ glycidoxy propyl and trimethoxysilane and β-epoxycyclohexyl)ethyl trimethoxysilane, and these may be used alone or in combination of two or more.

The silane-based coupling agent may be included in an amount of 0.01 to 10 parts by weight based on 100 parts by weight of the curable composition. When the silane-based coupling agent is included within the above range, adhesion and storage properties are excellent.

In addition, the curable composition may further include a surfactant, such as a fluorine-based surfactant, if necessary, for improving coating properties and preventing defect formation, that is, to improve leveling performance.

The fluorine-based surfactant may have a low weight average molecular weight of 4,000 g/mol to 10,000 g/mol, and specifically, a weight average molecular weight of 6,000 g/mol to 10,000 g/mol. In addition, the fluorine-based surfactant may have a surface tension of 18 mN/m to 23 mN/m (measured in 0.1% propylene glycol monomethyl ether acetate (PGMEA) solution). When the weight average molecular weight and surface tension of the fluorine-based surfactant are within the above ranges, the leveling performance can be further improved, and staining can be prevented during high-speed coating, and there are fewer film defects due to less bubble generation. , It gives excellent properties to slit coating, a high-speed coating method.

As the fluorine-based surfactant, BM-1000 ^® of BM Chemie, BM-1100 ^® , etc.; Mecha Pack F 142D ^® , F 172 ^® , F 173 ^® , F 183 ^® and the like of Dai Nippon Inky Chemical High School Co., Ltd.; Sumitomo 3M Co., Ltd.'s Prorad FC-135 ^® , copper FC-170C ^® , copper FC-430 ^® , copper FC-431 ^® , etc.; Saffron S-112 ^® , Copper S-113 ^® , S-131 ^® , S-141 ^® , S-145 ^® from Asahi Grass Co., Ltd., etc.; SH-28PA ^® , Copper-190 ^® , Copper-193 ^® , SZ-6032 ^® , SF-8428 ^® , etc. of Toray Silicone Co., Ltd.; F-482, F-484, F-478, F-554 commercially available fluorine-based surfactants of DIC Co., Ltd. may be used.

In addition, as the surfactant, a silicone-based surfactant may be used together with the above-described fluorine-based surfactant. Specific examples of the silicone-based surfactant include, but are not limited to, TSF400, TSF401, TSF410, and TSF4440 manufactured by Toshiba Silicone.

The surfactant may be included in an amount of 0.01 parts by weight to 5 parts by weight, for example, 0.1 parts by weight to 2 parts by weight, based on 100 parts by weight of the curable composition. When the surfactant is included within the above range, the occurrence of foreign matter after development is small.

In addition, a predetermined amount of other additives such as antioxidants may be further added to the curable composition according to the exemplary embodiment within a range that does not impair physical properties.

Another embodiment provides a method for manufacturing a pixel for a color filter manufactured by using the above-described curable composition and a color filter including the pixel manufactured by the manufacturing method.

The manufacturing method of the pixel for the color filter includes the steps of forming a pattern by applying the above-described curable composition on a substrate by an inkjet spraying method (S1); and curing the pattern (S2).

(S1) forming a pattern

The curable composition is preferably applied on the substrate in a thickness of 0.5 to 20 μm by an inkjet dispersion method. In the inkjet jetting, a pattern can be formed by jetting only a single color and repeatedly jetting according to the required number of colors, and in order to reduce the process, the pattern can be formed by simultaneously jetting the required number of colors through each inkjet nozzle. have.

(S2) curing step

A pixel can be obtained by curing the obtained pattern. In this case, as a curing method, both a thermosetting process and a photocuring process may be applied, and a thermosetting process is preferable. The thermosetting process is preferably cured by heating at a temperature of 160 ° C. or higher, more preferably by heating at 160 ° C. to 300 ° C., and more preferably by heating at 200 ° C. to 250 ° C. can

Hereinafter, preferred embodiments of the present invention will be described. However, the following examples are only preferred examples of the present invention, and the present invention is not limited thereto.

(Preparation of surface-modified quantum dot dispersion solution)

Preparation Example 1

After centrifugation twice using acetone and ethanol from the InP/ZnSe/ZnS quantum dot dispersion solution (Hansol, SHQD-533; quantum dot solid content 30%), pure quantum dot powder was obtained through vacuum drying, and then 100 g of the quantum dot powder was mixed with toluene. It was completely dissolved in 125 g and 125 g of hexane, and 30 g of the compound of Formula 1-1 was added thereto, and then the temperature was raised to 80° C. under a nitrogen atmosphere and reacted for 15 hours while maintaining the temperature to prepare a surface-modified quantum dot. Thereafter, the surface-modified quantum dots were dispersed in a tetramethylene sulfoxide solvent (surface tension 54.2 at 20°C, boiling point 235°C, vapor pressure 0.0123 at 20°C) to finally surface-modified with a solid content concentration of 50% A quantum dot dispersion solution was prepared.

[Formula 1-1]

Preparation 2

A surface-modified quantum dot dispersion solution was prepared in the same manner as in Preparation Example 1, except that the compound of Formula 2-1 was used instead of the compound of Formula 1-1.

[Formula 2-1]

Preparation 3

The surface-modified surface-modified compound was carried out in the same manner as in Preparation Example 1, except that a mixture of the compound of Formula 1-1 and the compound of Formula 2-1 in a weight ratio of 10:1 was used instead of the compound of Formula 1-1. A quantum dot dispersion solution was prepared.

Preparation 4

The same as in Preparation Example 3 except that N-acetyl pyrrolidone (N-Acetyl Pyrrolidone) solvent (surface tension 50.3 at 20°C, boiling point 235°C, vapor pressure 0.1 at 20°C) was used instead of tetramethylene sulfoxide solvent method to prepare a surface-modified quantum dot dispersion solution.

Preparation 5

The same method as in Preparation Example 3 except that an N-acetyl morpholine solvent (surface tension 48.9 at 20°C, boiling point 246°C, vapor pressure 0.01 at 20°C) was used instead of the tetramethylene sulfoxide solvent was carried out to prepare a surface-modified quantum dot dispersion solution.

Preparation 6

Except for using a caprolactone solvent (surface tension 46.7 at 20°C, boiling point 241°C, vapor pressure 0.01 at 20°C) instead of the tetramethylene sulfoxide solvent, it was carried out in the same manner as in Preparation Example 3, and the surface-modified A quantum dot dispersion solution was prepared.

Preparation 7

In the same manner as in Preparation Example 3, except that a dimethyl adipate solvent (surface tension 35.6 at 20°C, boiling point 227°C, vapor pressure 0.05 at 20°C) was used instead of the tetramethylene sulfoxide solvent, the surface A modified quantum dot dispersion solution was prepared.

Preparation 8

Preparation Example 3 except for using a diethylene glycol monoethyl ether acetate solvent (surface tension 32.1 at 20°C, boiling point 217°C, vapor pressure 0.5 at 20°C) instead of tetramethylene sulfoxide solvent A surface-modified quantum dot dispersion solution was prepared by carrying out the same method as described above.

Comparative Preparation Example 1

The surface was carried out in the same manner as in Preparation Example 3, except that the compound represented by the following formula C-1 was used instead of a mixture of the compound of Formula 1-1 and the compound of Formula 2-1 in a weight ratio of 10:1. A modified quantum dot dispersion solution was prepared.

[Formula C-1]

Comparative Preparation Example 2

The surface was carried out in the same manner as in Preparation Example 4, except that the compound represented by Formula C-1 was used instead of the mixture obtained by mixing the compound of Formula 1-1 and the compound of Formula 2-1 in a weight ratio of 10:1. A modified quantum dot dispersion solution was prepared.

Comparative Preparation Example 3

The surface was carried out in the same manner as in Preparation Example 5, except that the compound represented by Formula C-1 was used instead of the mixture obtained by mixing the compound of Formula 1-1 and the compound of Formula 2-1 in a weight ratio of 10:1 A modified quantum dot dispersion solution was prepared.

Comparative Preparation Example 4

The surface was carried out in the same manner as in Preparation Example 6 except that the compound represented by Formula C-1 was used instead of the mixture obtained by mixing the compound of Formula 1-1 and the compound of Formula 2-1 in a weight ratio of 10:1 A modified quantum dot dispersion solution was prepared.

Comparative Preparation Example 5

The surface was carried out in the same manner as in Preparation Example 7, except that the compound represented by Formula C-1 was used instead of a mixture obtained by mixing the compound of Formula 1-1 and the compound of Formula 2-1 in a weight ratio of 10:1. A modified quantum dot dispersion solution was prepared.

Comparative Preparation Example 6

The surface was carried out in the same manner as in Preparation Example 8, except that the compound represented by Formula C-1 was used instead of a mixture of the compound of Formula 1-1 and the compound of Formula 2-1 in a weight ratio of 10:1 A modified quantum dot dispersion solution was prepared.

Evaluation 1: Dispersibility

Using a particle size analyzer, the particle size of the quantum dot dispersion solution prepared from Preparation Examples 1 to 8 and Comparative Preparation Examples 1 to 6 was measured three times with a micro particle size analyzer, respectively, and the average was obtained and the results are shown in Tables 1 and 2 below.

particle size (nm) Preparation Example 1 Preparation 2 Preparation 3 Preparation 4 Preparation 5 Preparation 6 Preparation 7 Preparation 8 D50 12.4 12.5 12.2 12.8 12.5 12.1 11.7 9.6 D90 36.6 38 24.6 28.9 24.8 26.3 18.7 11.6

particle size (nm) Comparative Preparation Example 1 Comparative Preparation Example 2 Comparative Preparation Example 3 Comparative Preparation Example 4 Comparative Preparation Example 5 Comparative Preparation Example 6 D50 21.1 19.8 22.3 20.5 19.0 18.4 D90 48.2 45.6 49.9 42.3 44.0 36.9

From Table 1 and Table 2, it can be seen that the quantum dot dispersion solutions of Preparation Examples 1 to 8 have a narrow particle size distribution and are well dispersed in high boiling point and high surface tension solvents, but Comparative Preparation Examples 1 to Comparative Preparation It can be seen that the quantum dot dispersion solution of Example 6 has a wide particle size distribution and is not well dispersed in a high boiling point and high surface tension solvent.

(Preparation of curable composition)

Curable compositions according to Examples 1 to 8 and Comparative Examples 1 to 6 were prepared with the compositions shown in Tables 3 and 4 below by using the components mentioned below.

(A) resin

(A-1) binder resin

Acrylic resin (TB04, Tacoma)

(A-2) Curable Monomer

(a-1) PFM-02 (SMS company)

(a-2) OXT 221 (TOAGOSEI)

(B) Quantum dots

(B-1) Quantum dot dispersion solution of Preparation Example 1

(B-2) Quantum dot dispersion solution of Preparation Example 2

(B-3) Quantum dot dispersion solution of Preparation Example 3

(B-4) Quantum dot dispersion solution of Preparation Example 4

(B-5) Quantum dot dispersion solution of Preparation Example 5

(B-6) Quantum dot dispersion solution of Preparation Example 6

(B-7) Quantum dot dispersion solution of Preparation Example 7

(B-8) Quantum dot dispersion solution of Preparation Example 8

(B-9) Quantum dot dispersion solution of Comparative Preparation Example 1

(B-10) Quantum dot dispersion solution of Comparative Preparation Example 2

(B-11) Quantum dot dispersion solution of Comparative Preparation Example 3

(B-12) Quantum dot dispersion solution of Comparative Preparation Example 4

(B-13) Quantum dot dispersion solution of Comparative Preparation Example 5

(B-14) Quantum dot dispersion solution of Comparative Preparation Example 6

(C) solvent

(C-1) dimethyl adipate (DMA, TCI)

(C-2) Propylene glycol monomethyl ether acetate (PGMEA, Sigma-Aldrich)

(D) diffusion agent

Titanium dioxide dispersion (TiO ₂ solid content 20% by weight, average particle diameter: 200nm, Dito Technology Co., Ltd.)

(E) thiol-based additives

Glycol di-3-mercaptopropionate (THIOCURE ^® GDMP, BRUNO BOCK)

(F) polymerization inhibitor

Methyl hydroquinone (TOKYO CHEMICAL)

(G) other additives

Leveling agent (F-554, DIC company)

(Unit: % by weight) Example 1 Example 2 Example 3 Example 4 Example 5 Example 6 Example 7 Example 8 binder resin 6.2 6.2 6.2 6.2 6.2 6.2 6.2 6.2 hardening type
monomer (a-1) 12.2 12.2 12.2 12.2 12.2 12.2 12.2 12.2 (a-2) 1.6 1.6 1.6 1.6 1.6 1.6 1.6 1.6 polymerization inhibitor 0.3 3.4 3.4 3.4 3.4 3.4 3.4 3.4 quantum dots (B-1) 47 - - - - - - - (B-2) - 47 - - - - - - (B-3) - - 47 - - - - - (B-4) - - - 47 - - - - (B-5) - - - - 47 - - - (B-6) - - - - - 47 - - (B-7) - - - - - - 47 - (B-8) - - - - - - - 47 menstruum (C-1) 15 13 13 13 13 13 13 13 (C-2) 9.4 9.4 9.4 9.4 9.4 9.4 9.4 9.4 diffusion agent 2 2 2 2 2 2 2 2 Thiol-based additives 4.2 4.2 4.2 4.2 4.2 4.2 4.2 4.2 other additives 2.1 2.1 2.1 2.1 2.1 2.1 2.1 2.1

(Unit: % by weight) Comparative Example 1 Comparative Example 2 Comparative Example 3 Comparative Example 4 Comparative Example 5 Comparative Example 6 binder resin 6.2 6.2 6.2 6.2 6.2 6.2 hardening type
monomer (a-1) 12.2 12.2 12.2 12.2 12.2 12.2 (a-2) 1.6 1.6 1.6 1.6 1.6 1.6 polymerization inhibitor 0.3 3.4 3.4 3.4 3.4 3.4 quantum dots (B-1) 47 - - - - - (B-2) - 47 - - - - (B-3) - - 47 - - - (B-4) - - - 47 - - (B-5) - - - - 47 - (B-6) - - - - - 47 (B-7) - - - - - - (B-8) - - - - - - menstruum (C-1) 15 13 13 13 13 13 (C-2) 9.4 9.4 9.4 9.4 9.4 9.4 diffusion agent 2 2 2 2 2 2 Thiol-based additives 4.2 4.2 4.2 4.2 4.2 4.2 other additives 2.1 2.1 2.1 2.1 2.1 2.1

Evaluation 2: Evaluation of light conversion rate and light absorption rate of quantum dots

Each of the curable compositions prepared in Examples 1 to 8 and Comparative Examples 1 to 6 was applied to a thickness of 10 μm to 15 μm on a glass substrate using a spin coater (Mikasa, Opticoat MS-A150, 150 rpm). and dried at 120° C. for 2 minutes using a hot-plate to obtain a coating film, and then the initial blue light conversion rate was measured (first step).

After drying the obtained coating film at 180° C. in a nitrogen atmosphere drying furnace for 30 minutes, the blue light conversion rate was measured (second step).

For the first and second steps, the light conversion rate of blue light incident from the BLU to green and the process maintenance rate were evaluated, and the results are shown in Tables 5 and 6 below. Here, the blue light conversion rate was measured with an Otsuka integral hemispherical film type measuring device, and when the coating film coated with the curable composition was loaded, blue light of 450 nm was applied to the coating film, and all the green light emitted in the upward direction was absorbed and calculated as an integral value. , the light conversion rate (Green/Blue) was measured by calculating the increase amount of the peak converted to green compared to the decrease amount of the blue light absorption peak. In addition, the light absorptance in the process proceeding from the first step to the second step was also measured.

Example 1 Example 2 Example 3 Example 4 Example 5 Example 6 Example 7 Example 8 Light Absorption (%) 94.7 94.8 95.2 95 95 94.9 95 94.9 Light conversion rate (%) 33 33.2 34 33.8 33.5 33.6 33.9 33.8

Comparative Example 1 Comparative Example 2 Comparative Example 3 Comparative Example 4 Comparative Example 5 Comparative Example 6 Light Absorption (%) 94 94.1 93.9 94.2 94 93.9 Light conversion rate (%) 32.5 32.1 32 32.8 32.7 32.3

As shown in Tables 5 and 6, the curable compositions according to Examples 1 to 8 were compared to the photosensitive resin compositions according to Comparative Examples 1 to 6, blue light absorption rate and light conversion rate as the color filter process progressed. It was confirmed that the value showed excellent characteristics.

The present invention is not limited to the above embodiments, but can be manufactured in various different forms, and those of ordinary skill in the art to which the present invention pertains can take other specific forms without changing the technical spirit or essential features of the present invention. It will be understood that it can be implemented as Therefore, it should be understood that the embodiments described above are illustrative in all respects and not restrictive.

Claims (13)

(A) resin;
(B) surface-modified quantum dots with a surface-modifying material; and
(C) solvent
including,
The surface-modifying material includes a compound represented by the following formula (1) and a compound represented by the following formula (2) in a weight ratio of 15:1 to 1:1,
The solvent is a curable composition comprising any one or more of the compounds represented by the following Chemical Formulas 3 to 8:
[Formula 1]

[Formula 2]

[Formula 3]

[Formula 4]

[Formula 5]

[Formula 6]

[Formula 7]

[Formula 8]

In Formulas 1 to 8,
R ¹ to R ⁹ are each independently a hydrogen atom or a substituted or unsubstituted C1 to C20 alkyl group,
L ¹ to L ⁶ are each independently a substituted or unsubstituted C1 to C20 alkylene group.
delete delete According to claim 1,
The quantum dot is a curable composition having a maximum fluorescence emission wavelength in 500nm to 680nm.
According to claim 1,
The resin is a curable composition further comprising a binder resin and a reactive unsaturated compound.
6. The method of claim 5,
The binder resin is a curable composition comprising an acrylic resin, an epoxy resin, or a combination thereof.
According to claim 1,
The curable composition further comprises a diffusing agent.
8. The method of claim 7,
The curable composition comprising the dispersing agent in an amount of 0.1 wt% to 20 wt% based on the total amount of the curable composition.
8. The method of claim 7,
The dispersing agent is a curable composition comprising barium sulfate, calcium carbonate, titanium dioxide, zirconia, or a combination thereof.
According to claim 1,
The curable composition is a curable composition comprising 1 wt% to 40 wt% of the resin, 1 wt% to 40 wt% of the surface-modified quantum dots, and the remainder of the solvent with respect to the total amount of the curable composition.
According to claim 1,
The curable composition may include a thiol-based additive; polymerization inhibitor; malonic acid; 3-amino-1,2-propanediol; silane-based coupling agent; leveling agent; fluorine-based surfactants; polymerization inhibitors; Or a curable composition further comprising a combination thereof.
Forming a pattern by applying the curable composition according to any one of claims 1 to 11 by an inkjet spraying method on a substrate; and
curing the pattern
A pixel manufacturing method for a color filter comprising a.
A color filter comprising a pixel for a color filter manufactured by the method of claim 12 .

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