KR102856907B1 - Susceptor and substrate processing equipment having the same - Google Patents

Abstract

The present invention relates to a substrate processing device, and more particularly, to a susceptor that performs substrate processing and a substrate processing device including the same.
The present invention discloses a susceptor (200) including a substrate mounting plate (210) installed in a processing space (S) of a process chamber (100) and on which a substrate (10) is mounted, and a support rod portion (220) extending downward from the center of the bottom surface of the substrate mounting plate (210), wherein the substrate mounting plate (210) is formed with a plurality of temperature control channels (310, 320) through which a temperature control medium flows, the plurality of temperature control channels (310, 320) having the same length within a preset length deviation range, and wherein an inlet (311, 321) and an outlet (312, 322) of each of the plurality of temperature control channels (310, 320) are arranged symmetrically with respect to the center of the plane of the substrate mounting plate (210) at a position corresponding to the support rod portion (220).

Description

Susceptor and substrate processing equipment having the same

The present invention relates to a substrate processing device, and more specifically, to a susceptor that performs substrate processing and a substrate processing device including the same.

A substrate processing device, as in patent documents 1 and 2, refers to a device that performs substrate processing such as etching or deposition on the surface of a substrate placed on a susceptor in an atmosphere of process conditions by applying power to a closed processing space.

Meanwhile, in order to process large substrates and multiple substrates, susceptors are also becoming larger in area, and as susceptors become larger, the process conditions for the substrate mounting surface, especially the temperature distribution, have a great influence on the uniformity of substrate processing.

For example, as in Patent Document 1, a temperature control path for temperature control can be formed in a susceptor and a temperature control medium such as water can be flowed through the temperature control path to control the temperature of the susceptor.

However, in the case of a susceptor having a structure according to Patent Document 1, there is a problem in that it is difficult to form a temperature control path, and the piping structure for injecting and discharging a temperature control medium into the temperature control path becomes complicated.

In particular, it is desirable that the pipes for the introduction and discharge of the temperature control medium be formed as straight pipes by using metal pipes such as SUS, and a compact pipe structure is required as multiple pipes are installed in the support rod section of the susceptor having a narrow space.

(Patent Document 1) KR 10-1736363 B1

(Patent Document 2) KR 10-2055370 B1

The purpose of the present invention is to provide a susceptor capable of uniform temperature control on a susceptor mounting surface by forming a plurality of temperature control channels and arranging an inlet and an outlet of a temperature control medium for each of the temperature control channels symmetrically, and a substrate processing device having the same, in order to solve the above-described problems.

The present invention has been created to achieve the above-described object of the present invention, and the present invention is a susceptor (200) including a substrate mounting plate (210) installed in a processing space (S) of a process chamber (100) and on which a substrate (10) is mounted, and a support rod portion (220) extending downward from the center of the bottom surface of the substrate mounting plate (210), wherein the substrate mounting plate (210) has a plurality of temperature control channels (310, 320) formed therein through which a temperature control medium flows, and the plurality of temperature control channels (310, 320) have the same length within a preset length deviation range, and the inlet (311, 321) and the outlet (312, 322) of each of the plurality of temperature control channels (310, 320) are symmetrical with respect to the center of the plane of the substrate mounting plate (210) at a position corresponding to the support rod portion (220). A susceptor characterized by being arranged is disclosed.

The above substrate mounting plate (210) has a rectangular planar shape having a pair of horizontal sides and a pair of vertical sides, and is divided into a pair of partition areas (A1, A2) by a virtual vertical center line (C1) of the rectangle that is parallel to the vertical sides, and the temperature control path (310, 320) includes a first control path (310) that extends from a first inlet (311) located in the support rod part (220) along the edge of each partition area (A1, A2) and is connected to a first outlet (312) located in the support rod part (220); It may include a second control flow path (320) that extends from the second inlet (321) located in the support rod part (220) to the inside of the first control flow path (310) of each of the partition areas (A1, A2) with the same length as the first control flow path (310) and is connected to the second outlet (322) located in the support rod part (220).

The first control path (310) and the second control path (320) can be formed in a line symmetry with respect to the virtual horizontal center line (C2) of the rectangle in each of the partition areas (A1, A2).

The first control flow path (310) may be formed in a line symmetry with respect to the virtual horizontal center line (C2) of the rectangle in each of the partition areas (A1, A2), and the second control flow path (320) may be formed in asymmetric with respect to the virtual horizontal center line (C2) of the rectangle in each of the partition areas (A1, A2).

The second control flow path (320) may be formed so that the length of the flow path located in the small area where the second outlet (322) is located is longer than the length of the flow path located in the small area where the second inlet (321) is located among the two small areas that divide each of the partition areas (A1, A2) by the virtual horizontal center line (C2).

The second control flow path (320) may be formed so that the number of inflection points of the flow path located in the sub-region where the second outlet (322) is located is greater than the number of inflection points of the flow path located in the sub-region where the second inlet (321) is located among the two sub-regions that divide each of the partition areas (A1, A2) by the virtual horizontal center line (C2).

The first inlet (311) and the second inlet (321) of one of the pair of partition areas (A1, A2) may be arranged to be point-symmetrical or line-symmetrical with respect to the center of the plane of the substrate mounting plate (210) with respect to the first inlet (311) and the second inlet (321) of the other.

The first inlet (311) and the second inlet (321) of each of the above-mentioned partition areas (A1, A2) may be adjacent to each other in a clockwise direction.

One of the pair of partition areas (A1, A2) may be arranged in the order of the first inlet (311), the second outlet (322), the second inlet (321) and the first outlet (312) in a clockwise direction, and the other of the pair of partition areas (A1, A2) may be arranged in the order of the first inlet (311), the second outlet (322), the second inlet (321) and the first outlet (312) in a point symmetry with respect to one of the pair of partition areas (A1, A2).

It is preferable that the range of the above length deviation from the preset standard length be 5% or less.

The first inlet (311) and the first outlet (312), and the second inlet (321) and the second outlet (322) are arranged along the circumferential direction with the central axis of the support rod part (220) as the center, and are respectively connected to the first inlet connection pipe (331), the first outlet connection pipe (332), the second inlet connection pipe (341), and the second outlet connection pipe (342), and the first inlet connection pipe (331), the first outlet connection pipe (332), the second inlet connection pipe (341), and the second outlet connection pipe (342) are installed within the support rod part (220), and one end can be connected to the other end of a flow branch part connected to the main inlet pipe (491) and the main outlet pipe (492).

The above-mentioned branching section comprises a first main connection section (412) having one end directly or indirectly connected to one of the main inlet pipe (491) and the main discharge pipe (492), and a first branching section (410) having a plurality of first connection sections (411) connected to one of "the first inlet connection pipe (331) and the second inlet connection pipe (341)" and "the first discharge connection pipe (332) and the second discharge connection pipe (342)", and a second main connection section (422) connected to the first branching section (410) and having one end directly or indirectly connected to the remaining one of the main inlet pipe (491) and the main discharge pipe (492), and having the other end connected to "the first inlet connection pipe (331) and the second inlet connection pipe (341)" and "the first discharge connection pipe (332) And it may include a second flow branch (420) in which a plurality of second flow connection parts (421) are formed, which are connected to the remaining one of the second discharge connection pipes (342) above.

The first flow branch (410) has a first columnar shape in which the plurality of first flow connection parts (411) are formed in two at opposing positions centered on the central axis of the support rod part (220), and the second flow branch (420) has a second columnar shape in which the plurality of second flow connection parts (421) are formed in two at opposing positions centered on the central axis of the support rod part (220), and the second flow branch (420) can be inserted longitudinally into the cylindrical first flow branch (410) so that one first main connection part (412) and the four first flow connection parts (411) are connected.

The main inlet pipe (491) and the main discharge pipe (492) are connected at positions symmetrical to each other with respect to the central axis of the support rod part (220), and an auxiliary flow branch part (430) positioned corresponding to the positions of the first main connecting part (412) and the second main connecting part (422) and connected to the first main connecting part (412) and the second main connecting part (422) by auxiliary connecting pipes (413, 414) may be additionally included.

The above-mentioned flow branch section includes a first flow branch section (440) and a second flow branch section (450) to which the main inlet pipe (491) is connected and formed by dividing the central axis of the support rod section (220) into two spaces, and the first flow branch section (440) includes a first direct flow branch section (441), a first indirect flow branch section (442), a second direct flow branch section (443), and a second indirect flow branch section (444) formed at equal intervals in a clockwise direction from the boundary, and the second flow branch section (450) includes a first direct flow branch section (451), a first indirect flow branch section (452), a second direct flow branch section (453), and The second indirect flow path forming portion (454) is formed at equal intervals, and the first indirect flow path forming portion (442) and the second indirect flow path forming portion (444) are connected to a communication pipe (446) that communicates with a space (S20) formed by the second flow path branch portion (450), and a first connection port (445) that is connected to one of the main inlet pipe (491) and the main discharge pipe (492) is formed on the bottom surface of the first flow path branch portion (440), and the first indirect flow path forming portion (452) and the second indirect flow path forming portion (454) are connected to a communication pipe (456) that communicates with a space (S10) formed by the first flow path branch portion (440), and on the bottom surface of the second flow path branch portion (450), A second connection port (446) connected to the main inlet pipe (491) and the remaining one of the main discharge pipes (492) can be formed.

The present invention also discloses a substrate processing device comprising a process chamber (100) forming a sealed processing space (S); and a susceptor (200) installed in the processing space (S) and on which a substrate (10) is mounted, wherein the susceptor (200) is characterized by having the above-described configuration.

The susceptor and the substrate processing device having the same according to the present invention have the advantage of forming a plurality of temperature control passages and arranging the inlet and outlet of the temperature control medium for each of the temperature control passages symmetrically, thereby enabling uniform temperature control on the mounting surface of the susceptor.

In addition, since multiple temperature control channels are formed in the susceptor, a compact structure for supplying and discharging temperature control media to each temperature control channel is configured, thereby enabling the creation of uniform temperature conditions on the susceptor, thereby providing the advantage of optimizing temperature control by the temperature control channels.

Fig. 1 is a cross-sectional view showing a substrate processing device according to the present invention.
FIGS. 2A to 2C are plan views each showing an example of a susceptor of the substrate processing device of FIG. 1, and are plan views showing different cases of the flow of a temperature control medium.
FIG. 3a and FIG. 3b are plan views each showing another example of a susceptor of the substrate processing device of FIG. 1, and are plan views showing different cases of the flow of a temperature control medium.
Fig. 4 is a partial perspective view showing an example of a euro branch part coupled to a subtractor among the substrate processing devices of Fig. 1.
Fig. 5a is a cross-sectional view taken along the line V-V' in Fig. 4, and Fig. 5b is a perspective view showing the first and second branch sections.
Fig. 6a is a plan view showing the auxiliary flow branch shown in Fig. 4, and Fig. 6b is a perspective view showing the auxiliary flow branch shown in Fig. 4.
Fig. 7 is a partial perspective view showing another example of a euro branch part coupled to a subtractor among the substrate processing devices of Fig. 1.
Fig. 8a is a cross-sectional view taken along the line Ⅸ-Ⅸ' in Fig. 7, and Fig. 8b is a perspective view showing the euro branch portion illustrated in Fig. 7.

Hereinafter, a substrate processing device according to the present invention will be described with reference to the attached drawings.

A substrate processing device according to the present invention, as illustrated in FIG. 1, includes a process chamber (100) forming a sealed processing space (S); and a susceptor (200) installed in the processing space (S) and on which a substrate (10) is mounted.

Here, the substrate (10) to be processed is a substrate on which substrate processing such as deposition or etching is performed, and any substrate can be used as long as it has a square, particularly rectangular, plane shape, such as a substrate for LCD manufacturing, a substrate for OLED manufacturing, or a substrate for solar cell manufacturing.

And, of course, the above substrate processing device can perform substrate processing such as patterned deposition and etching by attaching a mask (not shown) from the upper side.

The above process chamber (100) is configured to form a sealed processing space (S) for substrate processing and can have various configurations.

For example, the process chamber (100) may include a chamber body (110) with an open upper side and an upper lid (120) detachably coupled to the opening of the chamber body (110).

The chamber body (110) above is configured to have a susceptor (200) installed therein, and can have various configurations. One or more gates (111) can be formed on the inner wall for introducing and discharging the substrate (10) into the processing space (S). In addition, the process chamber (100) can be grounded.

In addition, the above process chamber (100) can be configured in various ways depending on the type of substrate processing being performed, and a gas injection unit (140) for supplying processing gas for performing substrate processing, a power supply system (not shown) for performing substrate processing, an exhaust system (not shown) for controlling the pressure of the processing space (S) and exhausting the gas, etc. can be connected or installed depending on the process conditions.

For example, the gas injection unit (140) is installed on the upper part of the susceptor (200) and can be configured in various ways, such as a shower head, to inject gas for performing a process.

The above gas injection unit (140) may include an injection plate (not shown) in which a plurality of gas injection holes (not shown) are formed, and may be grounded or RF power may be applied as an upper electrode facing the susceptor (200).

The above susceptor (200) is installed at the lower side of the processing space (S) and supports the substrate (10), and can have various configurations depending on the substrate support structure.

And the above susceptor (200) can be grounded or RF power can be applied to the lower electrode of the substrate processing device.

In addition, the susceptor (200) may be installed so as to be able to move up and down for introduction and discharge of the substrate (10) through the gate (111), as shown in FIG. 1, and at this time, a plurality of lift pins (not shown) may be installed to lift the substrate when loading or unloading the substrate.

The above lift pin is installed through the susceptor (200) and can lift the substrate (10) from the upper surface of the susceptor (200) or place it on the upper surface of the susceptor (200) through relative vertical movement with the susceptor (200).

Meanwhile, the susceptor (200) may be additionally equipped with a temperature control unit such as a heater to control the temperature, such as by heating or cooling the substrate (10).

The above temperature control unit can have various configurations depending on the structure, heating method, and temperature conditions of the susceptor (200) for the substrate (10), including a heater that heats by applying electricity, a temperature control path through which a temperature control medium circulates, etc.

In particular, the susceptor (200) according to the present invention is provided with a temperature control unit that controls the temperature of the susceptor by circulating a temperature control medium, and will be described below in connection with the structure of the susceptor (200).

The above susceptor (200) may include a substrate mounting plate (210) on which a substrate (10) is mounted, and a support rod portion (220) extending downward from the center of the bottom surface of the substrate mounting plate (210).

The above substrate mounting plate (210) is configured to mount the substrate (10) for substrate processing, and can have various configurations depending on the plane shape of the substrate (10).

For example, the substrate mounting plate (210) may have a rectangular shape corresponding to the planar shape of the substrate (10) when the planar shape of the substrate (10) is rectangular. Specifically, when the substrate (10) is a substrate (10) having a rectangular planar shape for a flat panel display, the planar shape of the substrate mounting plate (210) may also have a rectangular shape.

The above support rod portion (220) is configured to extend downward from the center of the bottom surface of the substrate mounting plate (210), and can have various configurations, such as being configured as an integral part with the substrate mounting plate (210).

In addition, the support rod part (220) may have an inlet and outlet connection pipe for transmitting a temperature control medium, a power supply line for an electrostatic chuck (if installed), etc. installed inside. In addition, when applying RF power to the substrate mounting plate (210), an RF rod for this purpose may be installed inside the support rod part (220).

Meanwhile, the support rod part (220) can be moved up and down by a substrate vertical movement module (not shown), and in particular, can be connected to the substrate vertical movement module (not shown) by penetrating the bottom surface of the process chamber (100).

At this time, the support rod part (220) may be installed with a bellows (212) to block vacuum pressure between the bottom surface of the process chamber (100) and the substrate vertical movement module.

Meanwhile, the substrate mounting plate (210) is formed with a plurality of temperature control channels (310, 320) through which a temperature control medium circulates to control the temperature of the substrate (10).

Here, the temperature control medium may be a fluid such as water.

The above-described plurality of temperature control channels (310, 320) are channels formed in the substrate mounting plate (210) to control the temperature of the substrate (10), and can be configured in various ways, such as by being configured as a pipe through which a temperature control medium flows, or by being configured as a channel formed in the substrate mounting plate (210) through machining, etc.

Meanwhile, the plurality of temperature control channels (310, 320) can be formed in various patterns on the substrate mounting plate (210).

Here, in forming the plurality of temperature control channels (310, 320), the substrate mounting plate (210) has a rectangular planar shape having a pair of horizontal sides and a pair of vertical sides, as shown in FIGS. 2A to 2C, 3A and 3B, for forming the plurality of temperature control channels (310, 320), and can be divided into a pair of partition areas (A1, A2) by a virtual vertical center line (C1) of the rectangle that is parallel to the vertical sides.

The above pair of partition areas (A1, A2) are areas virtually partitioned to form a plurality of temperature control channels (310, 320) in the substrate mounting plate (210), and may include a first partition area (A1) and a second partition area (A2) partitioned in half in the rectangular substrate mounting plate (210).

The above first compartment area (A1) and second compartment area (A2) are defined as areas virtually set for forming a plurality of temperature control channels (310, 320) by dividing the upper surface of the substrate mounting plate (210) into two areas of the same size.

The above plurality of temperature control channels (310, 320) may include a first control channel (310) and a second control channel (320) arranged in each of the pair of partition areas (A1, A2).

The first control flow path (310) is a flow path that extends from the first inlet (311) located in the support rod part (220) along the edge of each of the partition areas (A1, A2) and connects to the first outlet (312) located in the support rod part (220), and can be formed in various patterns.

For example, the first control path (310) may have an overall rectangular shape along the edge of each of the partition areas (A1, A2) with the support rod portion (220) as the center.

At this time, it goes without saying that the first control path (310) can be formed by avoiding the installation hole of the lift pin (not shown), the through hole of the mask support post (not shown), etc.

The second control flow path (320) is a flow path that extends from the second inlet (321) located inside the first control flow path (310), i.e., in the support rod part (220), to the inside of the first control flow path (310) of each of the partition areas (A1, A2) with the same length as the first control flow path (310), and is connected to the second outlet (322) located in the support rod part (220), and can be formed in various patterns.

For example, the second control path (320) can be formed in various patterns as a free curve inside the first control path (310) in each of the above-described partition areas (A1, A2).

Meanwhile, as shown in FIGS. 2a and 2b, the first control path (310) and the second control path (320) can be formed in a line symmetry with respect to the virtual horizontal center line (C2) of the rectangle in each of the partition areas (A1, A2) based on the inlet and outlet.

In addition, the first control path (310) and the second control path (320), as shown in FIG. 2c, can be formed such that the inlet and outlet are point-symmetrical with respect to the center of the rectangle.

That is, one of the pair of partition areas (A1, A2) may be arranged in the order of the first inlet (311), the second outlet (322), the second inlet (321) and the first outlet (312) in a clockwise direction, and the other of the pair of partition areas (A1, A2) may be arranged in the order of the first inlet (311), the second outlet (322), the second inlet (321) and the first outlet (312) in a point symmetry with respect to one of the pair of partition areas (A1, A2).

In the case of having a flow path structure such as that in Fig. 2c, the flow path length is the same, and the inlet and outlet of the temperature control medium are sequentially arranged in a clockwise or counterclockwise direction, so that it is judged to be an optimized structure that enables uniform temperature control on the upper surface of the substrate mounting plate (210) due to the point-symmetrical structure in a situation where other surrounding conditions are not considered.

In addition, the first control flow path (310) and the second control flow path (320) may be formed asymmetrically with respect to the virtual horizontal center line (C2) of the rectangle in each of the partition areas (A1, A2), as shown in FIGS. 3A and 3B, taking into account the asymmetry of the process chamber (100).

Here, it goes without saying that the first control path (310) can be arranged in a line symmetry with respect to the virtual horizontal center line (C2) of the rectangle in each of the above-mentioned partition areas (A1, A2).

As described above, in order to compensate for the asymmetry of the internal environment of the process chamber (100), the first control passage (310) and the second control passage (320), particularly the second control passage (320), may be formed in a structure that compensates for the asymmetry of the internal environment of the process chamber (100).

For example, the second control flow path (320) can increase the relative temperature in the sub-region by forming the length of the flow path located in one of the two sub-regions divided by the virtual horizontal center line (C2) of each of the partition areas (A1, A2) to be longer than in the other one.

Furthermore, it is preferable that the second inlet (321) of the second control flow path (320) is located in a smaller area among the two smaller areas, as shown in FIG. 3b.

That is, it is preferable that the small area where the second inlet (321) of the second control flow path (320) is located has a shorter flow path length than other small areas, and the small area where the second outlet (322) of the second control flow path (320) is located has a longer flow path length.

In summary, it is preferable that the second control flow path (320) be formed so that the length of the flow path located in the small area where the second outlet (322) is located is longer than the length of the flow path located in the small area where the second inlet (321) is located among the two small areas that divide each of the partition areas (A1, A2) by the virtual horizontal center line (C2).

In addition, from another perspective in relation to the length of the flow path, the second control flow path (320) may be formed so that the number of inflection points of the flow path located in the sub-region where the second outlet (322) is located is greater than the number of inflection points of the flow path located in the sub-region where the second inlet (321) is located among the two sub-regions that divide each of the partition areas (A1, A2) by the virtual horizontal center line (C2).

For reference, according to an experiment on a substrate mounting plate having a flow arrangement and structure illustrated in FIG. 3a, the temperature standard deviation is 0.302°C for the substrate mounting plate of FIG. 3a, and when the inlet and outlet are positioned oppositely in the flow arrangement of FIG. 3a, the temperature standard deviation is 0.216°C, and it can be confirmed that a structure in which the length of the flow path is positioned longer in the small area where the second outlet (322) of the second control flow path (320) is positioned further improves the temperature uniformity.

Meanwhile, there is a problem that the plurality of temperature control channels (310, 320) formed on the substrate mounting plate (210) have different flow rates and velocity when the lengths of the channels are different, resulting in different amounts of heat generated or absorbed by each temperature control channel (310, 320), and thus causing a temperature deviation on the surface of the substrate mounting plate (210).

Specifically, the resistance to flow is proportional to the length of the channel and the viscosity of the medium, and inversely proportional to the diameter of the channel. When the diameter of the channel and the type of medium are specified, the length of the channel has the greatest influence on the resistance to flow.

Accordingly, it is preferable that the lengths of the plurality of temperature control channels (310, 320) are the same.

That is, if the lengths of the plurality of temperature control channels (310, 320) are the same, the flow rate and velocity of the medium flowing through each channel can be set substantially the same, thereby improving the uniformity of the temperature control effect by each channel.

Here, the meaning that the length of the temperature control passages (310, 320) is the same does not mean that they have exactly the same value in terms of units such as KGS, but that the flow of the temperature control medium through the temperature control passages (310, 320) is defined as a length to which the length is substantially the same, and in the present invention, the length can be defined as the same when the range of the length deviation compared to the reference length is 5% or less.

In addition, the cross-section of the temperature control channels (310, 320), i.e., the size of the channel pipe, can also be defined in the same way as the definition of equality of length.

For reference, when the lengths of the temperature control channels (310, 320) are the same, and in the case of the channel arrangement and flow structure of FIGS. 2a and 2b, as described above, the temperature standard deviation is 0.170°C and 0.244°C, respectively, while in the case of the conventional substrate mounting plate with different lengths of the temperature control channels, the temperature standard deviation is 0.278°C, which confirms that the temperature uniformity is greatly improved.

Furthermore, in addition to the flow arrangement and structure shown in Fig. 3a, when the flow path is the same, it was confirmed that the temperature standard deviation was 0.216℃, which greatly improved the temperature uniformity compared to the conventional structure.

Meanwhile, as shown in FIGS. 2a, 2b and 2c, it is preferable that the inlet (311, 321) and outlet (312, 322) of each of the plurality of temperature control channels (310, 320) be arranged symmetrically (line-symmetric, point-symmetric) with respect to the planar center of the substrate mounting plate (210) at a position corresponding to the support rod portion (220).

In particular, the inlet (311, 321) and outlet (312, 322) of each of the plurality of temperature control channels (310, 320) can be arranged to be line-symmetrical or point-symmetrical with respect to the center of the plane of the substrate mounting plate (210), as shown in FIGS. 2a to 3c.

As shown in FIGS. 2a and 2b, the first inlet (311) and the second inlet (321) of one of the pair of partition areas (A1, A2) may be arranged to form point symmetry (FIGS. 2b, 2c, 3b) or line symmetry (FIGS. 2a and 3a) with respect to the center of the plane of the substrate mounting plate (210) with respect to the other first inlet (311) and the second inlet (321).

Here, the first inlet (311) and the second inlet (321) of each of the above-described compartment areas (A1, A2) may be adjacent to each other in a clockwise direction. This is because there is a limitation in the pipe connection structure with the main inlet pipe (491) described later for pipes in opposite directions.

Meanwhile, it can be confirmed that the arrangement structure of the inlet (311, 321) and outlet (312, 322) is arranged in a point symmetry (arrangement structure of FIGS. 2b and 2c) according to experiments, and thus the uniformity on the plane of the substrate mounting plate (210) is further improved.

For reference, the standard deviation of temperature for the substrate mounting plate having the euro arrangement and flow structure shown in Fig. 2a was 0.170°C, and for the substrate mounting plate having the euro arrangement and flow structure shown in Fig. 2b, it was 0.244°C, confirming that the temperature uniformity was higher.

This is interpreted as meaning that the temperature of the temperature control medium flowing through the temperature control path (310, 320) is caused by a deviation at the inlet (311, 321) and outlet (312, 322).

Considering the above points, it is believed that a more improved temperature uniformity can be achieved by combining the flow structures of FIGS. 2a and 2c and the flow path arrangements of FIGS. 3a and 3b.

Meanwhile, since the temperature of the temperature control medium discharged through the discharge port (312, 322) is relatively low when the high-temperature temperature control medium is introduced through the inlet port (311, 321), it is preferable that the inlet ports (311, 321) and the discharge ports (312, 322) be arranged alternately clockwise or counterclockwise, if possible.

However, since there is a limit to installing the temperature control medium supply pipe to the inlet (311, 321) and outlet (312, 322) within the support rod part (220), as shown in FIG. 2a, the first inlet (311), the second inlet (321), the second outlet (322), the first outlet (312), the first inlet (311), the second inlet (321), the second outlet (332), the first outlet (312) may be arranged in that order in a clockwise or counterclockwise direction.

Meanwhile, according to the arrangement of the inlets (311, 321) and outlets (312, 322) as shown in Fig. 2a, a structure for introducing and discharging a temperature control medium from the outside, i.e., a configuration of a flow branch section, is required.

The first inlet (311) and the first outlet (312), and the second inlet (321) and the second outlet (322) need to be arranged clockwise or counterclockwise along the circumference with the central axis of the support rod part (220) as the center.

And the first inlet (311) and the first outlet (312), and the second inlet (321) and the second outlet (322) are connected to the first inlet connection pipe (331), the first outlet connection pipe (332), the second inlet connection pipe (341), and the second outlet connection pipe (342), respectively.

And in the structure as described above, the first inlet connection pipe (331), the first discharge connection pipe (332), the second inlet connection pipe (341), and the second discharge connection pipe (342) are installed within the support rod part (220), and one end can be connected to the other end of the branch part connected to the main inlet pipe (491) and the main discharge pipe (492).

The above-mentioned euro branch portion is installed within the support rod portion (220), and has one end connected to the main inlet pipe (491) and the main discharge pipe (492), and the other end connected to the first inlet connection pipe (331), the first discharge connection pipe (332), the second inlet connection pipe (341), and the second discharge connection pipe (342), and various configurations are possible depending on the branching structure of the euro.

In particular, the above-mentioned euro branch section needs to be configured with a connection structure with a main inlet pipe (491) and a main discharge pipe (492), in which the first inlet connection pipe (331), the first discharge connection pipe (332), the second inlet connection pipe (341), and the second discharge connection pipe (342) are sequentially arranged along the circumferential direction.

As an example of the above-mentioned euro branch, the euro branch may include a first euro branch (410) having a columnar shape, as shown in FIGS. 4, 5a, and 5b, and a second euro branch (420) that is inserted into the inner circumference of the first euro branch (410) and integrally connected.

Here, by the mutual connection of the first euro branch portion (410) and the second euro branch portion (420), a continuous outer shape of the support rod portion (220) can be formed, thereby having a single cylindrical shape.

The above first flow branch (410) can be configured in various ways, such as a configuration in which one end is directly or indirectly connected to one of the main inlet pipe (491) and the main discharge pipe (492), and the other end is connected to one of the "first inlet connection pipe (331) and the second inlet connection pipe (341)" and the "first discharge connection pipe (332) and the second discharge connection pipe (342)".

For example, the first branch section (410) may have a cylindrical shape as a whole and may have an opening formed into which the second branch section (420) described later can be inserted.

And, the first flow branch section (410) may have a plurality of first flow connection sections (411) formed on the upper surface that are connected to one of the “first inlet connection pipe (331) and the second inlet connection pipe (341)” and the “first discharge connection pipe (332) and the second discharge connection pipe (342)”, and a first main connection section (412) formed on the lower surface that is directly or indirectly connected to one of the main inlet pipe (491) and the main discharge pipe (492).

The material of the first branch section (410) is preferably a metal material such as aluminum, aluminum alloy, or stainless steel, and the second branch section (420) and pipe described later can be joined by welding.

The second flow branch (420) is configured to have a second main connection (422) that is connected directly or indirectly to the remaining one of the main inlet pipe (491) and the main discharge pipe (492) by being combined with the first flow branch (410), and a plurality of second flow branch connections (421) that are connected to the remaining one of the "first inlet connection pipe (331) and the second inlet connection pipe (341)" and the "first discharge connection pipe (332) and the second discharge connection pipe (342)", and thus can be configured in various ways.

For example, the second branch section (420) may have a columnar shape into which the first branch section (410), which is a cylindrical shape with an internal space (S20), can be inserted, or may have a ribbon shape with an internal space (S10) and a symmetrical cross-sectional shape, and may have various other shapes.

In particular, it is preferable that the second flow branch (420) be formed with a sufficiently large size at the edge portion in a planar shape when viewed from above so as not to interfere with the formation of the second flow connection (421).

And, the second flow branch section (420) may have a plurality of second flow connection sections (421) formed on the upper surface that are connected to the remaining one of the "first inlet connection pipe (331) and the second inlet connection pipe (341)" and the "first discharge connection pipe (332) and the second discharge connection pipe (342)", and a second main connection section (422) formed on the lower surface that is directly or indirectly connected to the remaining one of the main inlet pipe (491) and the main discharge pipe (492).

The material of the second branch section (420) is preferably a metal material such as aluminum, aluminum alloy, or stainless steel, and the first branch section (410) and the pipe can be joined by welding.

Meanwhile, the configuration and combination of the first euro branch (410) and the second euro branch (420) having the above configuration can be configured as follows.

First, the first euro branch portion (410) may have a first pillar shape in which the plurality of first euro connection portions (411) are formed in two positions facing each other around the central axis of the support rod portion (220).

And the second euro branch portion (420) may have a second pillar shape in which the plurality of second euro connection portions (421) are formed in two positions facing each other with respect to the central axis of the support rod portion (220).

Lastly, the second branch section (420) can be inserted longitudinally into the cylindrical first branch section (410) so that one first main connection section (412) and the four first connection sections (411) are connected, and then fixedly connected to the first branch section (410) by welding or the like.

That is, after the first branching section (410) and the second branching section (420) are combined, the gap (S30) between the outer surface of the second branching section (420) and the inner surface of the first branching section (410) can be maintained as a single space (S20) separated from the space (S10) formed by the second branching section (420) despite the installation of the second branching section (420).

Meanwhile, as shown in FIG. 5b, the first main connecting portion (412) and the second main connecting portion (422) connected to the main inlet pipe (491) and the main discharge pipe (492) are formed eccentrically from the central axis of the support rod portion (220), which has a problem in that the connection of the main inlet pipe (491) and the main discharge pipe (492) is not smooth.

Accordingly, as shown in FIG. 4 and FIG. 6a and FIG. 6b, the main inlet pipe (491) and the main discharge pipe (492) are connected at positions symmetrical to each other with respect to the central axis of the support rod part (220), and an auxiliary flow branch part (430) positioned corresponding to the positions of the first main connecting part (412) and the second main connecting part (422) and connected to the first main connecting part (412) and the second main connecting part (422) by auxiliary connecting pipes (413, 414) may be additionally included.

The above auxiliary flow branch (430) is configured to position the connection positions of the first main connection (412) and the second main connection (422) symmetrically to the central axis of the support rod (220), and various configurations are possible.

For example, the auxiliary flow branch (430) may include a cylindrical cylinder (431) having a connecting port (433, 434) formed on the upper surface to which an auxiliary connecting pipe (413, 414) is connected and a connecting port (435, 436) formed on the lower surface to which the main inlet pipe (491) and the main discharge pipe (492) are connected, as shown in FIGS. 6a and 6b, and a partition wall (432) that partitions the cylindrical cylinder (431) in the axial direction to block communication between the first auxiliary connecting pipe (413) and the second auxiliary connecting pipe (414).

By the above configuration, the auxiliary flow branch (430) can position the connection positions of the first main connection (412) and the second main connection (422) at positions symmetrical to the central axis of the support rod (220).

Meanwhile, the drawing symbol 423, which is not described in FIG. 4, indicates a connecting member for connecting the auxiliary branch section (430) to the first branch section (410).

As another example of the above-mentioned branching section, the branching section may include a first branching section (440) to which the main inlet pipe (491) is connected and formed by dividing the central axis of the support rod section (220) into two spaces (S10, S20), as shown in FIGS. 7, 8a, and 8b, and a second branching section (450) to which the main discharge pipe (492) is connected.

As a specific example, the above-mentioned euro branch section may be composed of a cylindrical cylinder (449) having two spaces (S10, S20) separated from each other formed therein, and a partition wall section (448) that divides the cylindrical cylinder (449) into two spaces (S10, S20).

And, on the upper surface of the cylindrical cylinder (449) and the upper surface of the first flow path branch (440), a first direct flow path forming portion (441), a first indirect flow path forming portion (442), a second direct flow path forming portion (443), and a second indirect flow path forming portion (444) can be formed at equal intervals in a clockwise direction from the boundary.

Meanwhile, the first indirect flow path forming part (442) and the second indirect flow path forming part (444) should be connected to the space (S20) formed by the second flow path branch part (450) rather than the space (S10) formed by the first flow path branch part (440), and can be connected to a communication pipe (446) that communicates with the space (S20) formed by the second flow path branch part (450).

The above-mentioned communication pipe (446) is a pipe that communicates with the space (S20) formed by the first indirect flow path forming part (442), the second indirect flow path forming part (444), and the second flow path branching part (450), and can be configured in various ways.

Meanwhile, a first connection port (445) connected to either the main inlet pipe (491) or the main discharge pipe (492) may be formed on the bottom surface of the first branch section (440).

And, on the upper surface of the second flow path branch (450), a first direct flow path forming part (451), a first indirect flow path forming part (452), a second direct flow path forming part (453), and a second indirect flow path forming part (454) can be formed at equal intervals in a counterclockwise direction from the boundary.

Meanwhile, the first indirect flow path forming part (452) and the second indirect flow path forming part (454) should be connected to the space (S10) formed by the first flow path branch part (440) rather than the space (S20) formed by the second flow path branch part (450), and can be connected to a communication pipe (456) that communicates with the space (S10) formed by the first flow path branch part (440).

The above-mentioned communication pipe (456) is a pipe that communicates with the space (S10) formed by the first indirect flow path forming part (452), the second indirect flow path forming part (454), and the first flow path branch part (440), and can be configured in various ways.

Meanwhile, a second connection port (446) connected to the remaining one of the main inlet pipe (491) and the main discharge pipe (492) may be formed on the bottom surface of the second branch section (450).

And the second branch section (450) having the above configuration can be manufactured by various methods such as processing and forming by combining a cylindrical cylinder, a disc, and a pipe.

A euro branch having the above configuration can stably perform the introduction and discharge of a temperature control medium from the main inlet pipe (491) and the main discharge pipe (492) according to the number and arrangement of the inlets (311, 321) and discharge ports (312, 322) of each of the plurality of temperature control passages (310, 320).

The above is only a description of some of the preferred embodiments that can be implemented by the present invention, and as is well known, the scope of the present invention should not be construed as being limited to the above embodiments, and the technical ideas of the present invention described above and the technical ideas underlying them are all included in the scope of the present invention.

100: Process chamber 200: Susceptor
310, 320: Temperature control passage
311, 321: Inlet 312, 322: Outlet

Claims (26)

A susceptor (200) is installed in the processing space (S) of the process chamber (100) and includes a substrate mounting plate (210) on which a substrate (10) is mounted, and a support rod portion (220) extending downward from the center of the bottom surface of the substrate mounting plate (210).
The above substrate mounting plate (210) is formed with a plurality of temperature control channels (310, 320) through which a temperature control medium flows.
In order to set the flow rate and flow velocity of the temperature control medium flowing through the plurality of temperature control channels (310, 320) to be the same, the plurality of temperature control channels (310, 320) have the same length within a preset length deviation range.
The inlet (311, 321) and outlet (312, 322) of each of the above plurality of temperature control channels (310, 320) are arranged symmetrically with respect to the center of the plane of the substrate mounting plate (210) at a position corresponding to the support rod part (220).
A susceptor characterized in that the plurality of temperature control channels (310, 320) installed in the substrate mounting plate (210) have the same length within a set length deviation range. In claim 1,
The above substrate mounting plate (210) has a rectangular planar shape having a pair of horizontal sides and a pair of vertical sides, and is divided into a pair of partition areas (A1, A2) by a virtual vertical center line (C1) of the rectangle that is parallel to the vertical sides.
The above temperature control path (310, 320) is
A first control flow path (310) extending from the first inlet (311) located in the support rod section (220) along the edge of each of the partition areas (A1, A2) and connected to the first outlet (312) located in the support rod section (220);
A susceptor characterized by including a second control flow path (320) extending from the second inlet (321) located in the support rod part (220) to the inside of the first control flow path (310) of each of the partition areas (A1, A2) with the same length as the first control flow path (310) and connected to the second outlet (322) located in the support rod part (220). In claim 2,
The above first control path (310) and the above second control path (320) are,
A susceptor characterized in that it is formed in line symmetry with respect to the virtual horizontal center line (C2) of the rectangle in each of the above-mentioned partition areas (A1, A2). In claim 2,
The above first control path (310) is
In each of the above-mentioned partition areas (A1, A2), it is formed by forming a line symmetry based on the virtual horizontal center line (C2) of the above-mentioned rectangle.
The above second control path (320) is
A susceptor characterized in that it is formed asymmetrically with respect to the virtual horizontal center line (C2) of the rectangle in each of the above-mentioned partition areas (A1, A2). In claim 4,
The above second control path (320) is
A susceptor characterized in that the length of the flow path located in the sub-region where the second outlet (322) is located is formed longer than the length of the flow path located in the sub-region where the second inlet (321) is located among the two sub-regions that divide each of the above-mentioned partition areas (A1, A2) by the above-mentioned virtual horizontal center line (C2). In claim 4,
The above second control path (320) is
A susceptor characterized in that the number of inflection points of the flow path located in the sub-region where the second outlet (322) is located is greater than the number of inflection points of the flow path located in the sub-region where the second inlet (321) is located among the two sub-regions that divide each of the above-mentioned partition areas (A1, A2) by the above-mentioned virtual horizontal center line (C2). In any one of claims 2 to 6,
A susceptor characterized in that the first inlet (311) and the second inlet (321) of one of the pair of partition areas (A1, A2) are arranged in point symmetry or line symmetry with respect to the center of the plane of the substrate mounting plate (210) with respect to the first inlet (311) and the second inlet (321) of the other. In any one of claims 2 to 6,
A susceptor characterized in that the first inlet (311) and the second inlet (321) of each of the above-mentioned partition areas (A1, A2) are adjacent to each other in a clockwise direction. In any one of claims 2 to 6,
One of the above pair of compartment areas (A1, A2) is arranged in the order of the first inlet (311), the second outlet (322), the second inlet (321) and the first outlet (312) in a clockwise direction.
A susceptor characterized in that the other of the pair of partition areas (A1, A2) is arranged such that the first inlet (311), the second outlet (322), the second inlet (321) and the first outlet (312) are arranged point-symmetrically with respect to one of the pair of partition areas (A1, A2). In any one of claims 1 to 6,
A susceptor characterized in that the range of the length deviation from a preset standard length is 5% or less. In claim 7,
The above first inlet (311) and first outlet (312), and the above second inlet (321) and second outlet (322),
It is arranged along the circumferential direction with the central axis of the above support rod part (220) as the center,
Each is connected to the first inlet connection pipe (331), the first discharge connection pipe (332), the second inlet connection pipe (341), and the second discharge connection pipe (342),
A susceptor characterized in that the first inlet connection pipe (331), the first discharge connection pipe (332), the second inlet connection pipe (341), and the second discharge connection pipe (342) are installed within the support rod part (220), and one end is connected to the other end of the branch part connected to the main inlet pipe (491) and the main discharge pipe (492). In claim 11,
The above Euro branch is,
A first main connection part (412) which is directly or indirectly connected to one of the main inlet pipe (491) and the main discharge pipe (492), and a first flow branch part (410) which is formed with a plurality of first flow connection parts (411) which are connected to one of the "first inlet connection pipe (331) and the second inlet connection pipe (341)" and the "first discharge connection pipe (332) and the second discharge connection pipe (342)",
A susceptor characterized by including a second main connection part (422) connected to the first branch part (410) at one end directly or indirectly with the remaining one of the main inlet pipe (491) and the main discharge pipe (492), and a second branch part (420) having a plurality of second connection parts (421) formed at the other end connected to the remaining one of "the first inlet connection pipe (331) and the second inlet connection pipe (341)" and "the first discharge connection pipe (332) and the second discharge connection pipe (342)". In claim 12,
The above first euro branch (410) is
The above plurality of first euro connecting parts (411) have a first pillar shape in which two are formed at opposing positions centered on the central axis of the support rod part (220).
The above second euro branch part (420) has a second pillar shape in which the plurality of second euro connection parts (421) are formed in two positions facing each other around the central axis of the support rod part (220).
A susceptor characterized in that the second branching section (420) is inserted longitudinally into the first branching section (410) formed in a cylindrical shape so that one first main connecting section (412) and the plurality of first connecting sections (411) are connected. In claim 12,
The above main inlet pipe (491) and the above main discharge pipe (492) are connected at positions symmetrical to each other with respect to the central axis of the support rod part (220),
A susceptor characterized in that it further includes an auxiliary flow branch (430) positioned corresponding to the positions of the first main connection (412) and the second main connection (422) and connected to the first main connection (412) and the second main connection (422) by an auxiliary connection pipe (413, 414). In claim 11,
The above Euro branch is,
The main inlet pipe (491) formed by dividing the central axis of the support rod section (220) into two spaces is combined, and includes a first branch section (440) and a second branch section (450) to which the main discharge pipe (492) is combined.
The above first flow path branch (440) is formed with a first direct flow path forming part (441), a first indirect flow path forming part (442), a second direct flow path forming part (443), and a second indirect flow path forming part (444) formed at equal intervals in a clockwise direction from the boundary.
The above second flow path branch (450) is formed with a first direct flow path forming part (451), a first indirect flow path forming part (452), a second direct flow path forming part (453), and a second indirect flow path forming part (454) formed at equal intervals in a counterclockwise direction from the boundary.
The first indirect flow path forming part (442) and the second indirect flow path forming part (444) are connected to a communication pipe (446) that communicates with the space (S20) formed by the second flow path branch part (450).
On the bottom surface of the first branch section (440), a first connection port (445) is formed that is connected to one of the main inlet pipe (491) and the main discharge pipe (492).
The first indirect flow path forming part (452) and the second indirect flow path forming part (454) are connected to a communication pipe (456) that communicates with the space (S10) formed by the first flow path branch part (440).
A susceptor characterized in that a second connection port (446) is formed on the bottom surface of the second branch section (450) and is connected to the remaining one of the main inlet pipe (491) and the main discharge pipe (492). A process chamber (100) forming a sealed processing space (S);
It includes a susceptor (200) installed in the above processing space (S) and on which a substrate (10) is mounted,
A substrate processing device characterized in that the above susceptor (200) is a susceptor according to any one of claims 1 to 6. In claim 16,
A substrate processing device characterized in that the range of the length deviation from a preset standard length is 5% or less. A process chamber (100) forming a sealed processing space (S);
It includes a susceptor (200) installed in the above processing space (S) and on which a substrate (10) is mounted,
A substrate processing device characterized in that the above susceptor (200) is a susceptor according to claim 7. In claim 18,
A substrate processing device characterized in that the first inlet (311) and the second inlet (321) of each of the above-mentioned partition areas (A1, A2) are adjacent to each other in a clockwise direction. In claim 18,
One of the above pair of compartment areas (A1, A2) is arranged in the order of the first inlet (311), the second outlet (322), the second inlet (321) and the first outlet (312) in a clockwise direction.
A substrate processing device characterized in that the remaining one of the pair of partition areas (A1, A2) is arranged in a point symmetry with respect to one of the pair of partition areas (A1, A2), wherein the first inlet (311), the second outlet (322), the second inlet (321) and the first outlet (312). In claim 18,
A substrate processing device characterized in that the range of the length deviation from a preset standard length is 5% or less. In claim 18,
The first inlet (311) and the first outlet (312), and the second inlet (321) and the second outlet (322),
It is arranged along the circumferential direction with the central axis of the above support rod part (220) as the center,
Each is connected to the first inlet connection pipe (331), the first discharge connection pipe (332), the second inlet connection pipe (341), and the second discharge connection pipe (342),
A substrate processing device characterized in that the first inlet connection pipe (331), the first discharge connection pipe (332), the second inlet connection pipe (341), and the second discharge connection pipe (342) are installed within the support rod part (220), and one end is connected to the other end of the flow path branch part connected to the main inlet pipe (491) and the main discharge pipe (492). In claim 22,
The above Euro branch is,
A first main connection part (412) which is directly or indirectly connected to one of the main inlet pipe (491) and the main discharge pipe (492), and a first flow branch part (410) which is formed with a plurality of first flow connection parts (411) which are connected to one of the "first inlet connection pipe (331) and the second inlet connection pipe (341)" and the "first discharge connection pipe (332) and the second discharge connection pipe (342)",
A substrate processing device characterized in that it includes a second main connection part (422) connected to the first branch part (410) and directly or indirectly connected at one end to the remaining one of the main inlet pipe (491) and the main discharge pipe (492), and a second branch part (420) having a plurality of second connection parts (421) formed at the other end, the second main connection part (422) connected at the other end to the remaining one of the "first inlet connection pipe (331) and the second inlet connection pipe (341)" and the "first discharge connection pipe (332) and the second discharge connection pipe (342)". In claim 23,
The above first euro branch (410) is
The above plurality of first euro connecting parts (411) have a first pillar shape in which two are formed at opposing positions centered on the central axis of the support rod part (220).
The above second euro branch part (420) has a second pillar shape in which the plurality of second euro connection parts (421) are formed in two positions facing each other around the central axis of the support rod part (220).
A substrate processing device characterized in that the second branch section (420) is inserted longitudinally into the first branch section (410) formed in a cylindrical shape so that one first main connecting section (412) and the plurality of first connecting sections (411) are connected. In claim 23,
The above main inlet pipe (491) and the above main discharge pipe (492) are connected at positions symmetrical to each other with respect to the central axis of the support rod part (220),
A substrate processing device characterized in that it further includes an auxiliary flow branch (430) positioned corresponding to the positions of the first main connection (412) and the second main connection (422) and connected to the first main connection (412) and the second main connection (422) by an auxiliary connection pipe (413, 414). In claim 22,
The above Euro branch is,
The main inlet pipe (491) formed by dividing the central axis of the support rod section (220) into two spaces is combined, and includes a first branch section (440) and a second branch section (450) to which the main discharge pipe (492) is combined.
The above first flow path branch (440) is formed with a first direct flow path forming part (441), a first indirect flow path forming part (442), a second direct flow path forming part (443), and a second indirect flow path forming part (444) at equal intervals in a clockwise direction from the boundary.
The above second flow path branch (450) is formed with a first direct flow path forming part (451), a first indirect flow path forming part (452), a second direct flow path forming part (453), and a second indirect flow path forming part (454) formed at equal intervals in a counterclockwise direction from the boundary.
The first indirect flow path forming part (442) and the second indirect flow path forming part (444) are connected to a communication pipe (446) that communicates with the space (S20) formed by the second flow path branch part (450).
On the bottom surface of the first branch section (440), a first connection port (445) is formed that is connected to one of the main inlet pipe (491) and the main discharge pipe (492).
The first indirect flow path forming part (452) and the second indirect flow path forming part (454) are connected to a communication pipe (456) that communicates with the space (S10) formed by the first flow path branch part (440).
A substrate processing device characterized in that a second connection port (446) is formed on the bottom surface of the second branch section (450) and is connected to the remaining one of the main inlet pipe (491) and the main discharge pipe (492).