Back to Attractionとは 意味・読み方・使い方

A hole (2) through which the charging cable of a portable telephone or the like can be passed is opened on the bottom of a housing case body (1) with partitions and a magnet (3) for attraction to a metallic attaching metal fitting (6) is fixed to a back surface.例文帳に追加

仕切りを付けた収納ケース本体（１）の底には携帯電話等の充電ケーブルを通すことが出来る穴（２）が開けられており背面には金属製の取付け金具（６）への吸着用の磁石（３）が固定されている。 - 特許庁

The mirror section 210 is turned clockwise around Y-axis by electrostatic attraction from the second outside back division electrode 422 and the outside front division electrode in addition to the electrostatic suction force from the third and the fourth inside back division electrodes 413, 414 and the inside front division electrode.例文帳に追加

ミラー部２１０は、第３及び第４の内側裏分割電極４１３、４１４並びに内側表分割電極からの静電引力に加えて、第２の外側裏分割電極４２２及び外側表分割電極からの静電引力によりＹ軸時計回りに回動する。 - 特許庁

The fixing tool 1 is made of a first fixing disc 2 having a first magnet 3 with a bobbin portion 4 and a first magnet 3 adhered to a back surface of the first fixing disc 2, and attached to one surface edge portion of a first block by magnetic attraction of the first magnet 3.例文帳に追加

第１固定治具１は、糸巻き部４を有する第１固定盤２および第１固定盤２の裏面に固着された第１磁石３からなり、第１磁石３の磁気吸引力により第１滑車の一面縁部に取り付けられる。 - 特許庁

In the burying process of the W plug, the W film is etched back while a silicon substrate is electrostatically attracted to the stage, electrostatic attraction in the silicon substrate is cancelled once during an etchback, and then the silicon substrate is electrostatically attracted to the silicon substrate again.例文帳に追加

上記Ｗプラグを埋め込む工程は、シリコン基板をステージに静電吸着した状態で、Ｗ膜にエッチバックを行い、このエッチバックの途中で、シリコン基板の静電吸着を一旦解除した後、再びシリコン基板をステージに静電吸着するものである。 - 特許庁

Then, the movable part 120 is rotated by attraction or repulsion generated between the magnet part 124 and the movable part by making a current to flow through the coil 112, switching of the surface and the back of the dimmer filter 122 is performed on the optical path of a laser beam.例文帳に追加

そして、コイル１１２に電流を流すことで磁石部１２４との間に発生する引力または斥力により、可動部１２０を回転させ、レーザ光の光路上において減光フィルタ１２２の表裏面の切り替えを行う。 - 特許庁

A layer 4 consisting of the material having a thermal expansion coefficient nearer to the material of the electrode 2 than the ceramics or the thermal expansion coefficient same as the material of the electrode 2 is arranged at least between the back surface 1c facing to the electrostatic attraction surface 1b and the center.例文帳に追加

また、静電吸着面１ｂに対向する裏面１ｃと該中心との間に少なくとも、セラミックスよりも電極２の材料に近い熱膨張係数を有する材料または電極２の材料と同じ熱膨張係数を有する材料からなる層４が配置される。 - 特許庁

The second fixing tool is made of a second fixing disc having a thread guard portion around which a tip end side of the thread 6 paid out from the bobbin portion 4, and a second magnet adhered to a back surface of the second fixing disc; and attached to one surface edge portion of a second block by magnetic attraction of the second magnet.例文帳に追加

また、第２固定治具は、糸巻き部４から繰り出された糸６の先端側が掛けられる糸掛け部を有する第２固定盤および第２固定盤の裏面に固着された第２磁石からなり、該第２磁石の磁気吸引力により第２滑車の一面縁部に取り付けられる。 - 特許庁

The vapor deposition is applied to the surface 22 side to be vapor deposited being the surface of the substrate 10 by closely adhering a back surface 21 of the vapor deposition substrate 20 on a reference surface 11 of a substrate supporting part 10 having the reference surface 11 at a lower surface by applying an magnetic attraction between the substrate supporting part 10 and the substrate 20.例文帳に追加

基準面１１を下面に有する基板支持部１０のこの基準面１１に、蒸着用の基板２０の裏面２１を、基板支持部１０と基板２０との間に磁気吸引力を働かせて密着させ、基板１０の表面である被蒸着面２２の側に蒸着を施す。 - 特許庁