JP2512013B2 - Board static elimination method - Google Patents
Board static elimination methodInfo
- Publication number
- JP2512013B2 JP2512013B2 JP24514987A JP24514987A JP2512013B2 JP 2512013 B2 JP2512013 B2 JP 2512013B2 JP 24514987 A JP24514987 A JP 24514987A JP 24514987 A JP24514987 A JP 24514987A JP 2512013 B2 JP2512013 B2 JP 2512013B2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- static
- tray
- static elimination
- charge
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 230000003068 static effect Effects 0.000 title claims description 63
- 230000008030 elimination Effects 0.000 title claims description 23
- 238000003379 elimination reaction Methods 0.000 title claims description 23
- 238000000034 method Methods 0.000 title claims description 13
- 239000000758 substrate Substances 0.000 claims description 58
- 230000005611 electricity Effects 0.000 claims description 9
- 239000004020 conductor Substances 0.000 claims description 3
- 125000006850 spacer group Chemical group 0.000 description 16
- 150000002500 ions Chemical class 0.000 description 10
- 239000000463 material Substances 0.000 description 6
- 239000004973 liquid crystal related substance Substances 0.000 description 4
- 230000007547 defect Effects 0.000 description 3
- 239000006185 dispersion Substances 0.000 description 3
- 230000007423 decrease Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000006386 neutralization reaction Methods 0.000 description 2
- 239000004677 Nylon Substances 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
Landscapes
- Liquid Crystal (AREA)
Description
【発明の詳細な説明】 産業上の利用分野 本発明は、例えば液晶表示パネルのギャップ形成用ス
ペーサーのような静電気の影響を受けやすい微少粉体を
散布する基板の除電方法に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of removing static electricity from a substrate, for example, a spacer for forming a gap of a liquid crystal display panel, which sprays fine powder susceptible to static electricity.
従来の技術 従来、例えば液晶表示パネルのスペーサーを分散する
基板は、ガラス基板の上に透明電極や、保護膜、配向膜
等が形成され、ナイロン等で作られたラビング布を接触
し、配向処理を行なったものが用いられる。この基板は
静電気を帯び、この状態でスペーサーを分散すると、ス
ペーサーと基板が同電位の場合は反発し、逆電位の場合
は吸着する。このことにより基板へのスペーサーの分散
密度が異なり、キャップ不良を発生する。これらを防ぐ
ために(特願昭62−64553号)で記載されている電圧印
加型の除電器で基板を除電した後スペーサーを散布する
方法がある。2. Description of the Related Art Conventionally, for example, a substrate in which a spacer of a liquid crystal display panel is dispersed has a transparent electrode, a protective film, an alignment film, etc. formed on a glass substrate, and a rubbing cloth made of nylon or the like is brought into contact with the substrate for alignment treatment. What is done is used. This substrate is charged with static electricity, and when the spacer is dispersed in this state, it repels when the spacer and the substrate have the same potential, and adsorbs when the spacer and the substrate have the opposite potential. Due to this, the dispersion density of the spacers on the substrate differs, and a cap defect occurs. In order to prevent these, there is a method described in (Japanese Patent Application No. 62-64553), in which spacers are sprinkled after the substrate is neutralized by a voltage application type static eliminator.
発明が解決しようとする問題点 このような従来の除電方法では、次のような問題点が
ある。数μmの球状や円柱状のガラスあるいは樹脂で作
られたスペーサーは、わずかな静電気で影響を受ける。
これに対し、電圧印加型の除電器で除電した場合、イオ
ンバランス調整つきのものは一般的に除電能力が低く、
除電後の基板の帯電量にバラツキが発生し除電時間も多
くかかり、量産の効率が悪い。又、イオンバランス調整
なしのものは、除電能力は高いが、イオンバランスが異
なり、,どちらかに基板が逆帯電する。又、イオン
バランス調整のあり、なしに係わらず、電圧印加型の除
電器は、電極にゴミ等が付着し、使用時間とともに除電
能力が変化し、イオンバランスが異なってくる問題があ
る。更に、基板のバラツキや、配向処理等で基板の初期
の帯電量が数KVで異なっていると、同じ除電器で同じ時
間除電した場合、除電後の基板の帯電量が異なってきて
一定の帯電量にならない。これにより、基板のスペーサ
ー分散密度がバラツキを生じる。本発明はかかる点に鑑
み、簡易な方法で、除電後の基板の帯電量を安定にしバ
ラツキを少なくした基板の除電方法を提供するものであ
る。Problems to be Solved by the Invention Such a conventional static elimination method has the following problems. Spacers made of spherical or columnar glass or resin of several μm are affected by slight static electricity.
On the other hand, when static electricity is removed with a voltage application type static eliminator, those with ion balance adjustment generally have low static elimination ability,
The amount of charge on the substrate after static elimination varies and the static elimination time is long, resulting in poor mass production efficiency. Further, the one without ion balance adjustment has a high static elimination ability, but the ion balance is different, and the substrate is reversely charged to either one. Further, regardless of whether or not the ion balance is adjusted, the voltage application type static eliminator has a problem that dust and the like are attached to the electrodes and the static eliminability changes with the use time, resulting in a different ion balance. Furthermore, if the initial charge amount of the substrate is different by several KV due to variations in the substrate and orientation treatment, etc., when the same static eliminator is used for static charge removal for the same time, the static charge on the substrate after static charge will be different and a constant charge will be obtained. It doesn't amount. As a result, the spacer dispersion density of the substrate varies. In view of such a point, the present invention provides a method of removing static electricity from a substrate by a simple method in which the charge amount of the substrate after static elimination is stabilized and variation is reduced.
問題点を解決するための手段 本発明は上記問題点を解決するために、基板をトレイ
に載置し、このトレイを接地、絶縁する切換え手段を設
け、除電器を少なくとも2回作動させ、1回目の作動時
はトレイを絶縁し、1回目の作動停止後にトレイを接地
し、その後に2回目の作動を行なう。Means for Solving the Problems In order to solve the above problems, the present invention places a substrate on a tray, provides switching means for grounding and insulating this tray, and operates the static eliminator at least twice to Insulate the tray during the first operation, ground the tray after stopping the first operation, and then perform the second operation.
作用 本発明は上記した構成により、トレイを絶縁して除電
器を作動し、基板とトレイを同電位に除電し、その後、
トレイを接地することにより、基板とトレイは電位を打
ち消し合って基板の帯電量はOV近傍になる。この状態で
再度除電器を作動し、OV近傍の帯電量の基板を除電する
ことにより、安定した除電ができる。Action The present invention has the above-described configuration, insulates the tray, operates the static eliminator, and neutralizes the substrate and the tray to the same potential,
By grounding the tray, the potential of the substrate and that of the tray cancel each other and the charge amount of the substrate becomes near OV. In this state, the static eliminator is actuated again to neutralize the charge of the substrate having a charge amount near OV, thereby enabling stable static neutralization.
実施例 以下本発明の一実施例を第1図〜第3図で説明する。Embodiment An embodiment of the present invention will be described below with reference to FIGS.
第1図において、基板1は金属等の導電体のトレイ2の
上に載置されている。トレイ2には切り換えスイッチ3
が接続され、大地に接地あるいは絶縁が可能となってい
る。基板1の上には所定距離(約4cm)離れた位置に除
電バー4,5を設置し、それぞれ高圧電源6,7に接続されて
いる。除電器は除電バー4と高圧電源6で1個とし、そ
れぞれの対を除電器と呼ぶ。次にこのような構成で基板
1を除電する場合を説明する。例えば液晶基板を扱う
時、基板1の表面をラビングし配向処理を施こしたもの
は、基板1表面が数KVに帯電している。この基板1をト
レイ2上に載置し、除電器を作動させる。この時切り換
えスイッチ3は開放しておりトレイ2は大地より絶縁さ
れた状態にある。除電を始めて所定時間で基板1とトレ
イ2は同一除電され、数KVのものが数10V〜数100Vの値
になる。この値は、除電器のバラツキや、経時変化によ
り異なるが、基板1とトレイ2の帯電量は等しくなる
(第2図)。次に除電器の作動を停止し、切り換えスイ
ッチ3によりトレイ2を接地すると、基板1の帯電量
は、0〜数10Vになる。これは、絶縁したトレイ2と基
板1を除電器で同帯電している時のみ効果がある(第3
図)。この状態で基板1上にスペーサー材を散布しても
良いが、逆に基板1をスペーサー材の電位と反対の電位
をもたせ、散布されたスペーサー材を効率的に付着させ
る(引き寄せる)ために再度、除電器を作動させ帯電さ
せれば除電器の能力に応じた帯電量が安定して得られ
る。これは、1回目の除電時には、基板1の初期帯電量
が、数KVのバラツキであったものが、2回目の除電時
は、基板1の帯電量が、0〜数10Vの小さいバラツキの
ものであることによる。こうして、除電された基板1
に、スペーサー材を散布すると、スペーサー材は、大量
の基板に対してバラツキなく安定した分散密度が得ら
れ、ギャップ不良を発生させない。次に、スペーサー材
が,でどちらかの電位をもっている場合、基板1の
電位は0でなければならず、この場合の一実施例につい
請求の範囲第2項〜第4項を説明する。第2項におい
て、除電器の特性として、電極が帯極物から遠くなる
程、除電能力は低下するが、除電器のイオンバランスは
とが混在して中和してくる。そのため、第4図の如
く、1回目の除電では、基板1の数KVの帯電をとるため
に、除電バー4を基板1に近づけ、2回目の除電では、
基板1の数10Vの帯電を0V近傍にするだけなので、除電
能力も低くてよく、除電バー4を基板1から遠ざけた位
置で除電を行なうことにより基板1の帯電量を0近傍に
することができる。次に第3項については第5図の如
く、除電バー4と基板1の間に導電性の網8を取りつけ
たものである。網8は開孔率の異なった網目で作成さ
れ、両端のロール9,10で基板1上を移動できる。又網8
は接地状態である。こうすることで、除電バー4から出
される,のイオンが均等でない時、網4を通過した
後は、イオン数が減少し除電能力が低下するが、イオン
バランスが均等化されてくる。この均等化は、網目の開
孔率で異なり、除電器の能力に応じて開孔率を選定する
ことにより、均等化ができる。従って、1回目の除電時
は、網目のない部分11を用い、2回目の動作時に、網目
を用いることで、基板1の帯電量は0近傍にできる。In FIG. 1, a substrate 1 is placed on a tray 2 made of a conductor such as metal. Changeover switch 3 for tray 2
Is connected and can be grounded or insulated to the ground. Static elimination bars 4 and 5 are installed on the substrate 1 at positions separated by a predetermined distance (about 4 cm), and are connected to high-voltage power sources 6 and 7, respectively. The static eliminator comprises one static eliminator bar 4 and one high-voltage power source 6, and each pair is called a static eliminator. Next, a case where the substrate 1 is discharged with such a configuration will be described. For example, in the case of handling a liquid crystal substrate, in the case where the surface of the substrate 1 is rubbed and subjected to an alignment treatment, the surface of the substrate 1 is charged to several KV. The substrate 1 is placed on the tray 2 and the static eliminator is operated. At this time, the changeover switch 3 is open and the tray 2 is in a state of being insulated from the ground. The static electricity is removed from the substrate 1 and the tray 2 in a predetermined time after the static elimination is started, and the value of several KV becomes a value of several 10V to several 100V. Although this value varies depending on variations in the static eliminator and changes over time, the charge amounts of the substrate 1 and the tray 2 are equal (FIG. 2). Next, when the operation of the static eliminator is stopped and the tray 2 is grounded by the changeover switch 3, the charge amount of the substrate 1 becomes 0 to several tens of volts. This is effective only when the insulated tray 2 and the substrate 1 are charged by the static eliminator (the third charge).
Figure). In this state, the spacer material may be scattered on the substrate 1, but conversely, the substrate 1 may be provided with an electric potential opposite to the electric potential of the spacer material, and again in order to efficiently attach (pull) the scattered spacer material. By operating the static eliminator to charge the static eliminator, it is possible to obtain a stable charge amount according to the capability of the static eliminator. This is the case where the initial charge amount of the substrate 1 has a variation of several KV at the first charge removal, but the charge amount of the substrate 1 has a small variation of 0 to several tens V at the second charge removal. Depends on. In this way, the substrate 1 is destaticized.
In addition, when the spacer material is sprayed, the spacer material can obtain a stable dispersion density without variation in a large number of substrates and does not cause a gap defect. Next, when the spacer material has either of the electric potentials of and, the electric potential of the substrate 1 must be 0. In this case, claims 2 to 4 will be described. In the second term, as a characteristic of the static eliminator, the farther the electrode is from the poled object, the lower the static elimination ability is, but the ion balance of the static eliminator is mixed and neutralized. Therefore, as shown in FIG. 4, in the first static elimination, the static elimination bar 4 is brought close to the substrate 1 in order to charge the substrate 1 by several KV, and in the second static elimination,
Since the charge of several tens of volts of the substrate 1 is only brought to near 0V, the charge removal capability may be low, and the charge removal amount of the substrate 1 can be made close to 0 by performing charge removal at a position away from the substrate 1. it can. Next, as to the third term, as shown in FIG. 5, a conductive net 8 is attached between the charge eliminating bar 4 and the substrate 1. The mesh 8 is made of meshes having different porosities, and can be moved on the substrate 1 by the rolls 9 and 10 at both ends. Again net 8
Is grounded. By doing so, when the ions emitted from the static elimination bar 4 are not uniform, after passing through the net 4, the number of ions decreases and the static elimination capability decreases, but the ion balance becomes uniform. This equalization differs depending on the open area ratio of the mesh, and can be made uniform by selecting the open area ratio according to the capability of the static eliminator. Therefore, the charge amount of the substrate 1 can be close to 0 by using the non-meshed portion 11 during the first charge removal and using the mesh during the second operation.
発明の効果 以上のように本発明によれば、帯電した基板を、除電
器の性能や、経時変化でのイオンバランスのずれたもの
でも、簡単な構成で確実に安定した除電が行なえ、液晶
パネルのスペーサー散布作業等において、静電気による
ギャップ不良がなくすことができる。EFFECTS OF THE INVENTION As described above, according to the present invention, even if the charged substrate is deviated in the performance of the static eliminator or the ion balance due to aging, stable static neutralization can be performed with a simple structure, and the liquid crystal panel It is possible to eliminate gap defects due to static electricity in the spacer spraying work, etc.
第1図は本発明の一実施例における基板の除電方法を示
す斜視図、第2図は同方法での除電前の基板電位を示す
側面図、第3図は同方法での除電後の基板電位を示す側
面図、第4図,第5図は同方法の他の実施例の斜視図で
ある。 1……基板、2……トレイ、3……切換えスイッチ、4,
5……除電バー。FIG. 1 is a perspective view showing a method of static elimination of a substrate in one embodiment of the present invention, FIG. 2 is a side view showing a substrate potential before static elimination by the method, and FIG. 3 is a substrate after static elimination by the method. Side views showing the potential, FIGS. 4 and 5 are perspective views of another embodiment of the method. 1 ... Board, 2 ... Tray, 3 ... Changeover switch, 4,
5 ... Static elimination bar.
Claims (3)
板を載置するトレイと、このトレイを接地,絶縁する切
換え手段と、前記基板から所定距離の位置に少なくとも
1個の除電器を設け、この除電器を少なくとも2回作動
させ、1回目の作動時は前記トレイを絶縁し、1回目の
作動停止後に前記トレイを接地し、その後に2回目の作
動を行なう基板の除電方法。1. A static elimination method for a charged substrate, comprising a tray on which the substrate is placed, a switching means for grounding and insulating the tray, and at least one static eliminator at a position at a predetermined distance from the substrate. Is provided, the static eliminator is operated at least twice, the tray is insulated during the first operation, the tray is grounded after the first operation is stopped, and then the second operation is performed.
目の作動で異ならせて除電を行なう特許請求の範囲第1
項記載の基板の除電方法。2. The static elimination is performed by changing the distance between the static eliminator and the substrate between the first operation and the second operation.
A method for eliminating static electricity from a substrate according to the item.
動により、除電能力を可変する特許請求の範囲第1項記
載の基板の除電方法。3. The method for static elimination of a substrate according to claim 1, wherein a conductor is provided in the vicinity of the static eliminator, and the static elimination ability is varied by moving the conductor.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24514987A JP2512013B2 (en) | 1987-09-29 | 1987-09-29 | Board static elimination method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24514987A JP2512013B2 (en) | 1987-09-29 | 1987-09-29 | Board static elimination method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6488428A JPS6488428A (en) | 1989-04-03 |
| JP2512013B2 true JP2512013B2 (en) | 1996-07-03 |
Family
ID=17129350
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP24514987A Expired - Fee Related JP2512013B2 (en) | 1987-09-29 | 1987-09-29 | Board static elimination method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2512013B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4703549B2 (en) * | 2006-12-15 | 2011-06-15 | 株式会社リコー | Substrate processing method and substrate processing apparatus |
-
1987
- 1987-09-29 JP JP24514987A patent/JP2512013B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6488428A (en) | 1989-04-03 |
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| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |