JP2514144B2 - NF3 Decomposition gas treatment method - Google Patents
NF3 Decomposition gas treatment methodInfo
- Publication number
- JP2514144B2 JP2514144B2 JP4206135A JP20613592A JP2514144B2 JP 2514144 B2 JP2514144 B2 JP 2514144B2 JP 4206135 A JP4206135 A JP 4206135A JP 20613592 A JP20613592 A JP 20613592A JP 2514144 B2 JP2514144 B2 JP 2514144B2
- Authority
- JP
- Japan
- Prior art keywords
- gas
- zeolite
- treatment
- volume
- concentration
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000000034 method Methods 0.000 title claims description 17
- 238000000354 decomposition reaction Methods 0.000 title description 3
- 229910021536 Zeolite Inorganic materials 0.000 claims description 25
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 claims description 25
- 239000010457 zeolite Substances 0.000 claims description 25
- 229910044991 metal oxide Inorganic materials 0.000 claims description 13
- 150000004706 metal oxides Chemical class 0.000 claims description 13
- 230000001590 oxidative effect Effects 0.000 claims description 7
- 239000003463 adsorbent Substances 0.000 claims description 6
- 239000000203 mixture Substances 0.000 claims description 2
- 238000012856 packing Methods 0.000 claims description 2
- 239000007789 gas Substances 0.000 description 39
- 238000011049 filling Methods 0.000 description 7
- 238000001179 sorption measurement Methods 0.000 description 7
- 239000003795 chemical substances by application Substances 0.000 description 6
- 238000012545 processing Methods 0.000 description 5
- 238000005979 thermal decomposition reaction Methods 0.000 description 4
- MWUXSHHQAYIFBG-UHFFFAOYSA-N Nitric oxide Chemical compound O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 238000000197 pyrolysis Methods 0.000 description 3
- 238000011144 upstream manufacturing Methods 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000011068 loading method Methods 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 238000004868 gas analysis Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- JTJMJGYZQZDUJJ-UHFFFAOYSA-N phencyclidine Chemical compound C1CCCCN1C1(C=2C=CC=CC=2)CCCCC1 JTJMJGYZQZDUJJ-UHFFFAOYSA-N 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 238000011002 quantification Methods 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 239000002760 rocket fuel Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000000741 silica gel Substances 0.000 description 1
- 229910002027 silica gel Inorganic materials 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 229910000314 transition metal oxide Inorganic materials 0.000 description 1
- 238000009423 ventilation Methods 0.000 description 1
Landscapes
- Treating Waste Gases (AREA)
- Solid-Sorbent Or Filter-Aiding Compositions (AREA)
Description
【０００１】[0001]
【産業上の利用分野】本発明は、ＮＦ3 分解ガスの処理
方法に係り、特に酸化性ガスとＮＦ3 を含むガスを金属
酸化物等と接触させながら加熱分解した時に副生するＮ
Ｏ及びＮＯ2を含有するＮＦ3 分解ガスの処理方法に関
する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for treating NF 3 decomposed gas, and in particular, N produced as a by-product when thermally decomposed while bringing an oxidizing gas and a gas containing NF 3 into contact with a metal oxide or the like.
The present invention relates to a method for treating NF 3 decomposition gas containing O and NO 2 .
【０００２】[0002]
【従来の技術】ＮＦ3 は、ロケット燃料のほか、最近で
は超ＬＳＩのエッチングガスやＣＶＤのクリーニングガ
スとして使用されている。しかしながら、このガスはＴ
ＬＶ値が１０ｐｐｍと低く極めて有害であるにも関わら
ず、常温で安定であると同時に水に対する溶解度も低
く、除去すべきではあるが処理困難な物質の一つであ
る。また、特に酸化性ガスが共存すると、ＮＦ3 分解剤
の消耗や、ＮＯ及びＮＯ2 の発生等の問題があり、この
ことが処理を一層困難なものにしている。酸化性ガス共
存下でのＮＦ3 の処理方法としては、遷移金属の酸化物
と２５０℃以上で接触させ、ＮＦ3 中のフッ素を該金属
のふっ化物として酸化物表面に固定し、窒素は、ＮＯ及
び／又はＮＯ2 に変換して、吸着剤により吸着除去する
方法（特願平１−３２０４７７号）がある。2. Description of the Related Art In addition to rocket fuel, NF 3 has recently been used as an etching gas for VLSI and a cleaning gas for CVD. However, this gas
Despite its extremely low LV value of 10 ppm, which is extremely harmful, it is stable at room temperature and at the same time has low solubility in water. Further, especially when an oxidizing gas coexists, there are problems such as exhaustion of the NF 3 decomposing agent and generation of NO and NO 2 , which makes the treatment more difficult. As a treatment method of NF 3 in the presence of an oxidizing gas, a transition metal oxide is brought into contact with the oxide at 250 ° C. or higher to fix fluorine in NF 3 as a fluoride of the metal on the oxide surface, and nitrogen is There is a method of converting to NO and / or NO 2 and adsorbing and removing it with an adsorbent (Japanese Patent Application No. 1-320477).
【０００３】この技術を採用したＮＦ3 除去装置では、
発生したＮＯ及びＮＯ2 は、まずゼオライトに通され
る。排ガス中のＯ2 濃度が高い場合には、ここで、ＮＯ
の一部も吸着除去されるが、通常、排ガス中のＯ2 濃度
は１％程度なので、ＮＯはほとんど除去されず、ＮＯ2
のみが吸着除去される。ついで、除去されなかったＮＯ
を含む排ガスは、ゼオライト１容に対して０．５容充填
された金属酸化物に通され、ＮＯが吸着除去される処理
剤構成となっている。In the NF 3 removal device adopting this technique,
The generated NO and NO 2 are first passed through the zeolite. If the O 2 concentration in the exhaust gas is high, NO
A part of NO is adsorbed and removed, but since the O 2 concentration in the exhaust gas is usually about 1%, NO is hardly removed and NO 2
Only adsorbed and removed. Then, the NO that was not removed
The exhaust gas containing is passed through a metal oxide filled with 0.5 volume relative to 1 volume of zeolite, and has a treatment agent configuration in which NO is adsorbed and removed.
【０００４】[0004]
【発明が解決しようとする課題】従来のＮＦ3 除去方法
では、ＮＦ3 の熱分解で発生するＮＯｘの総量に占める
ＮＯの割合が、１０％程度であることを想定している。
しかし、この割合は、ＮＦ3 を含んだ模擬ガスを単独で
処理した時に得られた実験データを基に算出されたもの
に過ぎない。ところが、本除去装置を、ＮＦ3 を含んだ
実ガスに適用し、評価を行ったところ、この割合が予想
していたよりも高く、５０％程度にもなることがわかっ
た。このように、ＮＯの負荷増大により、従来の処理剤
構成比で、かつ金属酸化物のみでＮＯを除去する方法で
は、処理能がＮＯ負荷増大に追いつかず、ＮＯが設定処
理量以下でリークしてしまう結果となった。そこで、本
発明は、実ガスでの試験データを基に、ＮＯ負荷増大に
対応した処理方法を提供することを課題とする。In THE INVENTION Problems to be Solved by conventional NF 3 removal method, the proportion of NO relative to the total amount of NOx generated by the thermal decomposition of NF 3 is assumed to be about 10%.
However, this ratio is only calculated based on the experimental data obtained when the simulated gas containing NF 3 was treated alone. However, when the present removal device was applied to an actual gas containing NF 3 and evaluated, it was found that this ratio was higher than expected and reached about 50%. As described above, due to the increase in the load of NO, the conventional method of removing NO with the composition ratio of the treatment agent and only the metal oxide cannot keep up with the increase in the load of NO, and NO leaks below the set treatment amount. The result was Therefore, it is an object of the present invention to provide a treatment method that copes with an increase in NO load, based on test data in actual gas.
【０００５】[0005]
【課題を解決するための手段】上記課題を解決するため
に、本発明では、酸化性ガスとＮＦ3 を含むガスを加熱
分解した時に副生するＮＯ及びＮＯ2 を含有する分解ガ
スの処理方法において、該ガス中のＯ2 濃度を４％以上
として該ガスをゼオライト充填層、次に金属酸化物充填
層の順に通して吸着処理するに際し、該吸着剤の充填容
積比をゼオライト１容に対して金属酸化物を０．８〜
１．３容とすることとしたものである。In order to solve the above problems, in the present invention, a method for treating a decomposed gas containing NO and NO 2 which are by-produced when an oxidizing gas and a gas containing NF 3 are thermally decomposed. In the case where the O 2 concentration in the gas is 4% or more and the gas is passed through a zeolite packed bed and then a metal oxide packed bed in this order for adsorption treatment, the packing volume ratio of the adsorbent is 1 volume of zeolite. 0.8 to 0.8
It is supposed to be 1.3 volume.
【０００６】本発明では、上記のように、Ｏ2 源として
空気又はＯ2 ガスを混合してＯ2 濃度を４％以上にする
ことにより、ゼオライトにＮＯの吸着除去性能を新たに
賦与するとともに、金属酸化物のＮＯ吸着除去性能をも
高めることができる。また、ゼオライト１容に対する金
属酸化物の充填容積を、従来の０．５容から０．８〜
１．３容に増加することによって、ＮＯの処理容量自体
を増やしている。これら一連の工程により、酸化性ガス
の共存下にあるＮＦ3 を完全に効率よく除去し、かつ外
部環境に対して有害な成分を一切排出しない方法として
いる。According to the present invention, as described above, by mixing air or O 2 gas as the O 2 source to make the O 2 concentration 4% or more, the adsorption and removal performance of NO is newly imparted to the zeolite. Also, the NO adsorption and removal performance of the metal oxide can be enhanced. Further, the filling volume of the metal oxide with respect to 1 volume of zeolite is 0.8 to 0.8 from the conventional volume.
By increasing the volume to 1.3, the NO processing capacity itself is increased. Through a series of these steps, NF 3 in the presence of an oxidizing gas is completely and efficiently removed, and no harmful component to the external environment is discharged.
【０００７】吸着剤による吸着除去を効率よく行うた
め、ＮＦ3 の加熱分解によって発生したＮＯｘを含むガ
スは、空冷又は水冷方式のガス冷却機を通して、７０℃
以下に冷却した後、吸着剤に導かれることが望ましい。
また、混合するＯ2 源は、コンプレッサー等の空気で
も、ボンベ等で供給される空気又はＯ2 ガスでも良い
が、水分等のゼオライトのＮＯｘ吸着を阻害する成分
を、シリカゲル・ゼオライト等であらかじめ除去した後
に、使用することが望ましい。In order to efficiently perform adsorption removal by the adsorbent, the gas containing NOx generated by the thermal decomposition of NF 3 is passed through an air-cooled or water-cooled gas cooler at 70 ° C.
After cooling to below, it is desirable to guide to the adsorbent.
The O 2 source to be mixed may be air from a compressor or the like, or air or O 2 gas supplied from a cylinder or the like, but components such as water that inhibit NOx adsorption of zeolite are removed in advance with silica gel or zeolite. It is desirable to use after doing.
【０００８】これらのＯ２源は、ＮＦ３熱分解工程の上
流側、下流側の何れで処理ガスに混合されても良いが、
Ｏ２との反応によってＨ２Ｏを生成するような成分が、
ガス中に共存すると、ＮＦ３熱分解過程でＨ２Ｏが生成
し、ゼオライトのＮＯおよびＮＯ２吸着除去が阻害され
るので、このような場合は、Ｏ２源の混合をＮＦ３熱分
解工程より下流側で行い、ここでのＯ２濃度をできるだ
け下げて、Ｈ２Ｏの生成を抑えることが望ましい。ガス
を通す場合、流れの方向は上向流・下向流の何れによる
ものでも差し支えない。These O 2 sources may be mixed with the process gas either upstream or downstream of the NF 3 pyrolysis step.
A component that produces H 2 O by reaction with O 2 ,
When coexisting in the gas, H 2 O is generated in the NF 3 pyrolysis process, and NO and NO 2 adsorption removal of the zeolite is inhibited. In such a case, therefore, the O 2 source should be mixed in the NF 3 pyrolysis process. It is desirable to carry out on the further downstream side and reduce the O 2 concentration here as much as possible to suppress the production of H 2 O. When passing the gas, the flow direction may be either upward flow or downward flow.
【０００９】使用するゼオライトは、天然のものでも、
合成されたものでも良いが、有効細孔径は５〜１０Åの
ものが良い。使用する金属酸化物としては、ＣｕＯ、Ｍ
ｎＯ2 、ホプカライト等がよい。ガスとの接触面積を大
きくするため、ゼオライト及び金属酸化物の粒径はでき
る限り小さなものがよいが、排ガスの流量によっては、
通気抵抗が大きくなるので、流量に合わせて選定する必
要がある。The zeolite used may be natural,
Although they may be synthesized, those having an effective pore diameter of 5 to 10Å are preferable. As the metal oxide used, CuO, M
nO 2 and hopcalite are preferable. In order to increase the contact area with gas, the particle size of zeolite and metal oxide should be as small as possible, but depending on the flow rate of exhaust gas,
Since ventilation resistance increases, it is necessary to select it according to the flow rate.
【００１０】[0010]
【作用】ＮＦ3 の加熱分解で発生するＮＯ及びＮＯ2 の
うち、ＮＯは吸着剤との反応性が乏しく、除去が困難な
成分である。特に、ガス中のＯ2 濃度が１％以下の場
合、ゼオライトではＮＯを除去することはできない。従
来技術のように、発生したＮＯ・ＮＯ2 をそのままゼオ
ライトに通すと、ＮＯ2 は除去されるものの、ＮＯは全
く除去されずにそのまま通過してしまう。そこで、ＮＦ
3 の熱分解によって発生したＮＯ・ＮＯ2 を含むガス
に、酸素あるいは空気を混合し、Ｏ2 濃度を４％以上に
してゼオライトに導入する。その結果ゼオライトは、Ｎ
Ｏ2 のみならず、ＮＯの一部をも吸着除去することが可
能となる。これは、ＮＯがゼオライト表面で、次式に示
す反応によりＮＯ2 に酸化された後吸着されることによ
ると考えられる。 ＮＯ ＋ 1/2 Ｏ2 → ＮＯ2 [Function] Of NO and NO 2 generated by the thermal decomposition of NF 3 , NO is a component which has poor reactivity with the adsorbent and is difficult to remove. Especially when the O 2 concentration in the gas is 1% or less, NO cannot be removed by zeolite. If the generated NO / NO 2 is passed through the zeolite as it is, as in the prior art, although NO 2 is removed, NO is not removed at all and passes through as it is. So NF
Oxygen or air is mixed with the gas containing NO.NO 2 generated by the thermal decomposition of 3 , and the O 2 concentration is adjusted to 4% or more and introduced into the zeolite. As a result, the zeolite is
Not only O 2 but also part of NO can be adsorbed and removed. It is considered that this is because NO is adsorbed on the zeolite surface after being oxidized to NO 2 by the reaction shown by the following formula. NO + 1/2 O 2 → NO 2
【００１１】さらに、ゼオライトの後段にゼオライト１
容にたいして０．８〜１．３容の金属酸化物を置き、ゼ
オライトで取りきれないＮＯを除去する。従来よりＯ２
濃度が高くなっているため、金属酸化物によるＮＯ吸着
除去性能も向上する。これは、ＮＯが金属酸化物に固定
される過程に、ＮＯのＮＯ ３ −イオンへの酸化が含まれ
ており、これを気相中のＯ２が促進することによると考
えられる。また、金属酸化物の充填量を従来よりも増量
し、ＮＯ負荷の増大に対応させている。Further, zeolite 1 is provided after the zeolite.
A 0.8 to 1.3 volume of metal oxide is placed on the volume to remove NO that cannot be removed by the zeolite. Conventionally O 2
Since the concentration is high, the NO adsorption and removal performance by the metal oxide is also improved. It is considered that this is because NO is oxidized to NO 3 − ions in the process of fixing NO to the metal oxide, and O 2 in the gas phase promotes this. Further, the filling amount of the metal oxide is increased as compared with the conventional case to cope with the increase of NO load.
【００１２】[0012]
【実施例】以下、実施例により本発明を具体的に説明す
るが、本発明はこれらの実施例に限定されるものでとな
い。 実施例１ ４０ｍｍφのアクリル製容器を２段に分け、上流側１段
目に層高５０ｍｍになるようにゼオライトを、２段目に
層高５０ｍｍのホプカライトをそれぞれ充填した。この
容器にＮ2 ，Ｏ2 ，ＮＯ2 ，ＮＯの混合ガスを総流量
０．５リットル／ｍｉｎで流した。入口のＮＯ2 及びＮ
Ｏ濃度は、実ガスの分析データと同じく、いずれも１０
０ｐｐｍとした。Ｏ2 濃度は、処理効果を見るため、０
〜１０％の間で変動させた。処理剤はいずれも、粒径７
〜１６ｍｅｓｈの市販品を用いた。容器出口のＮＯおよ
びＮＯ2 濃度を窒素酸化物分離定量用の検知管で測定し
た。ＮＯまたはＮＯ2 が各々のＴＬＶ値（ＮＯ：２５ｐ
ｐｍ、ＮＯ2 ：３ｐｐｍ）を超えるまで処理を行い、そ
れまでに経過した時間を比較した。EXAMPLES The present invention will be described in detail below with reference to examples, but the present invention is not limited to these examples. Example 1 A 40 mmφ acrylic container was divided into two stages, and zeolite was filled in the first stage on the upstream side so that the layer height was 50 mm, and hopcalite with a layer height of 50 mm was filled in the second stage. A mixed gas of N 2 , O 2 , NO 2 and NO was flown into this container at a total flow rate of 0.5 liter / min. NO 2 and N at the inlet
The O concentration was 10 in both cases, the same as the actual gas analysis data.
It was set to 0 ppm. The O 2 concentration is 0 in order to see the treatment effect.
Varyed between -10%. All treatment agents have a particle size of 7
A commercially available product of ˜16 mesh was used. The NO and NO 2 concentrations at the container outlet were measured with a detector tube for nitrogen oxide separation and quantification. NO or NO 2 is each TLV value (NO: 25p
pm, NO 2: performs processing to more than 3 ppm), and comparing the time that has elapsed so far.
【００１３】この結果を表１及び図１に示す。The results are shown in Table 1 and FIG.
【表１】 上記のように、Ｏ2 を全く混合していない場合は、処理
時間は３０時間に過ぎないが、Ｏ2 濃度の増加ととも
に、直線的に増加し、４％で５９８時間に達した。これ
以上Ｏ2 濃度を増加させても、処理時間はほとんど変わ
らなかった。[Table 1] As described above, when O 2 was not mixed at all, the treatment time was only 30 hours, but it increased linearly as the O 2 concentration increased, reaching 598 hours at 4%. Even if the O 2 concentration was further increased, the treatment time remained almost unchanged.
【００１４】実施例２ ４０ｍｍφのアクリル製容器を２段に分け、総充填量の
１２６ｍｌ（層高１００ｍｍ）は一定として、上流側１
段目にゼオライト、２段目にホプカライトの順に充填し
た。両処理剤の充填量の比率による処理量の差を見るた
め、ゼオライト１容に対するホプカライト充填容積を０
〜２容まで変化させた。この容器にＮ2，Ｏ2 ，Ｎ
Ｏ2 ，ＮＯの混合ガスを一定条件で流した。総流量は
０．５リットル／ｍｉｎとし、ＮＯ2 及びＮＯ濃度は実
ガスでの分析データを基にいずれも１００ｐｐｍとし、
Ｏ2 は４％とした。処理剤及び測定法は、実施例１と同
じとした。カラム出口のＮＯ又はＮＯ2 が各々のＴＬＶ
値を超えるまで処理を行い、それまでに経過した時間を
比較した。Example 2 A 40 mmφ acrylic container was divided into two stages, the total filling amount of 126 ml (layer height 100 mm) was kept constant, and the upstream side 1
Zeolite was packed in the second stage, and hopcalite was packed in the second stage. In order to see the difference in the treatment amount depending on the ratio of the filling amounts of both treatment agents, the filling volume of hopcalite with respect to 1 volume of zeolite was 0.
Changed to ~ 2 volumes. N 2 , O 2 , N in this container
A mixed gas of O 2 and NO was caused to flow under constant conditions. The total flow rate was 0.5 liter / min, and the NO 2 and NO concentrations were 100 ppm based on the analysis data of actual gas.
O 2 was 4%. The treating agent and the measuring method were the same as in Example 1. NO or NO 2 at the column outlet is the respective TLV
The treatment was performed until the value was exceeded, and the time elapsed until then was compared.
【００１５】この結果を表２及び図２に示す。The results are shown in Table 2 and FIG.
【表２】 [Table 2]
【００１６】上記のようにホプカライトを充填していな
い場合は、処理時間は２３９時間しかなかった。ホプカ
ライトの充填比が増えるに従って、処理時間は長くな
り、ゼオライトとホプカライトの充填量が等しいとき、
処理時間は最大に達した。これ以上ホプカライトの充填
比を増やすと、処理時間は逆に減少した。ゼオライト１
容に対してホプカライト０．８〜１．３容の範囲の充填
比であれば、最長時間の９０％以上の処理能力が得られ
た。When not filled with hopcalite as described above, the processing time was only 239 hours. As the loading ratio of Hopcalite increases, the treatment time increases, and when the loadings of zeolite and Hopcalite are equal,
The processing time reached the maximum. When the filling ratio of Hopcalite was further increased, the treatment time was decreased. Zeolite 1
With a filling ratio in the range of 0.8 to 1.3 volumes of Hopcalite with respect to the volume, a treatment capacity of 90% or more of the longest time was obtained.
【００１７】[0017]
【発明の効果】本発明を酸化性ガスとＮＦ3 ガスを含む
分解ガスの処理に適用することにより、ＮＦ3 及びＮＯ
ｘを効率よく、環境に無害なレベルまで処理することが
可能である。INDUSTRIAL APPLICABILITY By applying the present invention to the treatment of decomposition gas containing oxidizing gas and NF 3 gas, NF 3 and NO
It is possible to process x efficiently and to a level that is harmless to the environment.
【図１】酸素濃度と有効処理時間の関係を示すグラフ。FIG. 1 is a graph showing the relationship between oxygen concentration and effective treatment time.
【図２】充填材の容積比と有効処理時間の関係を示すグ
ラフ。FIG. 2 is a graph showing the relationship between the volume ratio of the filler and the effective processing time.
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 庁内整理番号 ＦＩ 技術表示箇所 Ｂ０１Ｊ 20/06 Ｂ０１Ｄ 53/34 ＺＡＢ 20/18 (56)参考文献 特開 平３−181316（ＪＰ，Ａ) 特開 平１−155933（ＪＰ，Ａ) 特開 昭49−129695（ＪＰ，Ａ)─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 6 Identification code Internal reference number FI Technical display location B01J 20/06 B01D 53/34 ZAB 20/18 (56) Reference JP-A-3-181316 (JP , A) JP-A-1-155933 (JP, A) JP-A-49-129695 (JP, A)
Claims (1)
解した時に副生するＮＯ及びＮＯ2 を含有する分解ガス
の処理方法において、該ガス中のＯ2 濃度を４％以上と
して該ガスをゼオライト充填層、次に金属酸化物充填層
の順に通して吸着処理するに際し、該吸着剤の充填容積
比をゼオライト１容に対して金属酸化物を０．８〜１．
３容とすることを特徴とするＮＦ3 分解ガスの処理方
法。1. A method for treating a decomposed gas containing NO and NO 2 which is by-produced when a gas containing an oxidizing gas and NF 3 is thermally decomposed, wherein the O 2 concentration in the gas is 4% or more. When adsorbing the mixture through a zeolite packed bed and then a metal oxide packed bed in this order, the packing volume ratio of the adsorbent was 0.8-1.
A method for treating NF 3 decomposed gas, which is characterized in that the volume is 3.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4206135A JP2514144B2 (en) | 1992-07-10 | 1992-07-10 | NF3 Decomposition gas treatment method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4206135A JP2514144B2 (en) | 1992-07-10 | 1992-07-10 | NF3 Decomposition gas treatment method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0647253A JPH0647253A (en) | 1994-02-22 |
| JP2514144B2 true JP2514144B2 (en) | 1996-07-10 |
Family
ID=16518365
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4206135A Expired - Lifetime JP2514144B2 (en) | 1992-07-10 | 1992-07-10 | NF3 Decomposition gas treatment method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2514144B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100841183B1 (en) * | 2003-09-23 | 2008-06-24 | 주식회사 효성 | Method for Purifying Nitrogen Trifluoride (NF₃) Using Nickel and Copper Impregnated Zeolite Adsorbents |
-
1992
- 1992-07-10 JP JP4206135A patent/JP2514144B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0647253A (en) | 1994-02-22 |
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