JP2554488B2 - Magnetic recording medium manufacturing equipment - Google Patents
Magnetic recording medium manufacturing equipmentInfo
- Publication number
- JP2554488B2 JP2554488B2 JP62093384A JP9338487A JP2554488B2 JP 2554488 B2 JP2554488 B2 JP 2554488B2 JP 62093384 A JP62093384 A JP 62093384A JP 9338487 A JP9338487 A JP 9338487A JP 2554488 B2 JP2554488 B2 JP 2554488B2
- Authority
- JP
- Japan
- Prior art keywords
- vapor
- wall surface
- flow control
- control wall
- vapor flow
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 11
- 230000005291 magnetic effect Effects 0.000 title claims description 6
- 239000003302 ferromagnetic material Substances 0.000 claims description 27
- 238000001704 evaporation Methods 0.000 claims description 26
- 238000010438 heat treatment Methods 0.000 claims description 23
- 230000008020 evaporation Effects 0.000 claims description 21
- 239000000758 substrate Substances 0.000 claims description 10
- 239000000919 ceramic Substances 0.000 claims description 9
- 230000006698 induction Effects 0.000 claims description 8
- 239000003870 refractory metal Substances 0.000 claims description 5
- 230000008016 vaporization Effects 0.000 claims description 3
- 230000033228 biological regulation Effects 0.000 claims description 2
- 238000009834 vaporization Methods 0.000 claims 1
- 238000007740 vapor deposition Methods 0.000 description 16
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 10
- 229910052721 tungsten Inorganic materials 0.000 description 10
- 239000010937 tungsten Substances 0.000 description 10
- 229910052751 metal Inorganic materials 0.000 description 9
- 239000002184 metal Substances 0.000 description 9
- 239000000463 material Substances 0.000 description 8
- 238000000151 deposition Methods 0.000 description 7
- 230000008018 melting Effects 0.000 description 7
- 238000002844 melting Methods 0.000 description 7
- 230000008021 deposition Effects 0.000 description 5
- CPLXHLVBOLITMK-UHFFFAOYSA-N Magnesium oxide Chemical compound [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 4
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 4
- 238000005260 corrosion Methods 0.000 description 4
- 230000007797 corrosion Effects 0.000 description 4
- 239000011810 insulating material Substances 0.000 description 4
- 229910052750 molybdenum Inorganic materials 0.000 description 4
- 239000011733 molybdenum Substances 0.000 description 4
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 3
- 238000005485 electric heating Methods 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- 230000001276 controlling effect Effects 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 239000000395 magnesium oxide Substances 0.000 description 2
- 229910052715 tantalum Inorganic materials 0.000 description 2
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 2
- 229920000049 Carbon (fiber) Polymers 0.000 description 1
- DZZDTRZOOBJSSG-UHFFFAOYSA-N [Ta].[W] Chemical compound [Ta].[W] DZZDTRZOOBJSSG-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 239000010425 asbestos Substances 0.000 description 1
- 239000004917 carbon fiber Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 1
- 239000011490 mineral wool Substances 0.000 description 1
- JZLMRQMUNCKZTP-UHFFFAOYSA-N molybdenum tantalum Chemical compound [Mo].[Ta] JZLMRQMUNCKZTP-UHFFFAOYSA-N 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- -1 polyethylene terephthalate Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 229910052895 riebeckite Inorganic materials 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000005019 vapor deposition process Methods 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明は真空蒸着等に使用する蒸着装置に関し、特に
基体と強磁性材料の蒸発源との間に蒸気流制御壁面を備
えてなる磁気記録媒体の製造装置に関するものである。The present invention relates to a vapor deposition apparatus used for vacuum vapor deposition and the like, and more particularly to magnetic recording provided with a vapor flow control wall surface between a substrate and an evaporation source of a ferromagnetic material. The present invention relates to a medium manufacturing apparatus.
近年、記録密度が一段と優れたものとして、強磁性材
料を薄膜として基体上に被着してなる、所謂、金属薄膜
型記録媒体が注目を集めている。この様な金属薄膜型記
録媒体は、通常真空状態で、蒸着・スパッタ等によって
製造されるものであるが、蒸着物質の蒸着効率（材料使
用効率）が非常に低く、実用化の大きな障害となってい
た。これに対して、蒸着効率を高めるために、強磁性材
料を高周波誘導加熱で蒸発させる蒸発源と被蒸着基体と
の間に蒸発源の上方側に蒸発蒸気流を制御する蒸気流制
御壁面を配置させる真空蒸着装置が、考案されていた。In recent years, so-called metal thin-film type recording media, in which a ferromagnetic material is applied as a thin film on a substrate, have attracted attention as recording media having a much higher recording density. Although such a metal thin film type recording medium is usually manufactured by vapor deposition / sputtering in a vacuum state, the vapor deposition efficiency (material use efficiency) of the vapor deposition material is very low, which is a major obstacle to practical use. Was there. On the other hand, in order to improve the vapor deposition efficiency, a vapor flow control wall surface for controlling the vapor vapor flow is arranged above the vapor source between the vapor source for vaporizing the ferromagnetic material by high frequency induction heating and the vapor deposition substrate. A vacuum vapor deposition device has been devised.
従来、蒸気流制御壁面の内側に強磁性材料が蒸着・付
着し堆積するのを防ぐために、蒸気流制御壁面の材質と
して高融点金属（モリブデン・タングステン等）を用い
て、通電加熱によって蒸気流制御壁面の温度を適切に保
っていた。Conventionally, in order to prevent ferromagnetic materials from depositing and adhering to the inside of the steam flow control wall surface, a high melting point metal (molybdenum, tungsten, etc.) is used as the material of the steam flow control wall surface, and steam flow control is performed by electric heating. The wall temperature was kept proper.
しかしながら、高融点金属といえども蒸気流制御壁面
として繰り返し使用していると、高温にさらされるた
め、耐久性及び耐蝕性に難点を持っていた。However, even if a refractory metal is repeatedly used as a wall surface for controlling vapor flow, it is exposed to high temperatures, and thus has a problem in durability and corrosion resistance.
本発明は、上述した問題点を解決するためになされた
ものであり、耐久性・耐蝕性に優れた蒸気流制御壁面を
有する磁気記録媒体の製造装置を提供することを目的と
するものである。The present invention has been made to solve the above-mentioned problems, and an object of the present invention is to provide a magnetic recording medium manufacturing apparatus having a vapor flow control wall surface excellent in durability and corrosion resistance. .
本発明の前記目的は、真空槽内で、強磁性材料を高周
波誘導加熱で蒸発させる蒸発源と被蒸着基体との間に、
前記蒸発源から前記被蒸着基体に向かって蒸発する蒸発
蒸気流の蒸発蒸気流路を形成する蒸気流制御壁面を備え
た磁気記録媒体の製造装置において、前記蒸発源と前記
蒸気流制御壁面とは略連続した状態で略垂直に延びる規
制面で囲まれる前記蒸発蒸気流路を構成するべく配置さ
れており、前記蒸気流制御壁面の構造を強磁性材料の蒸
発分子が衝突する内側の壁面がセラミックにて構成さ
れ、該蒸気流制御壁面の外周には高融点金属からなる温
度制御用加熱ヒータが設けられた二層構造とされ、さら
に前記温度制御用加熱ヒータは前記蒸気流制御壁面の高
さ方向に複数分割され且つ独立制御可能に設けられたこ
とを特徴とする磁気記録媒体の製造装置によって達成さ
れる。The above object of the present invention is, in a vacuum chamber, between an evaporation source for evaporating a ferromagnetic material by high-frequency induction heating and a substrate to be evaporated,
In a magnetic recording medium manufacturing apparatus having a vapor flow control wall surface that forms an evaporation vapor flow path of an evaporation vapor flow that evaporates from the evaporation source toward the deposition target substrate, the evaporation source and the vapor flow control wall surface are It is arranged so as to form the vaporized vapor flow path surrounded by a restriction surface that extends substantially vertically in a substantially continuous state, and the inner wall surface on which the vaporized molecules of the ferromagnetic material collide with the structure of the vapor flow control wall surface is a ceramic. And has a two-layer structure in which a temperature control heating heater made of a high melting point metal is provided on the outer periphery of the steam flow control wall surface, and the temperature control heating heater is the height of the steam flow control wall surface. This is achieved by an apparatus for manufacturing a magnetic recording medium, characterized in that it is divided into a plurality of parts in each direction and provided so as to be independently controllable.
なお、本発明における高融点金属とは、タングステ
ン，モリブデン，タンタル等をいう。The refractory metal in the present invention means tungsten, molybdenum, tantalum, or the like.
以下に、本発明の実施態様を図を用いて説明する。 Embodiments of the present invention will be described below with reference to the drawings.
第１図において、真空槽１は、排気ユニット（ポン
プ）14によって真空雰囲気に保たれている。強磁性材料
３は、蒸発源２においては該蒸発源２の外周に配置した
加熱コイル４を用いて、電源５で高周波誘導加熱によっ
て加熱される。In FIG. 1, the vacuum chamber 1 is maintained in a vacuum atmosphere by an exhaust unit (pump) 14. In the evaporation source 2, the ferromagnetic material 3 is heated by high frequency induction heating with a power source 5 using a heating coil 4 arranged on the outer periphery of the evaporation source 2.
一方、高分子成形物基体９は、送り出ロール６から送
り出され蒸着ドラム７上でマスク10によって入射角の規
制された強磁性材料３の蒸気が蒸着され、巻き取りロー
ル８に巻き取られる。前記蒸発源２は、高周波誘導加熱
によって加熱されるため、蒸気流制御壁面11は、蒸発源
２の直ぐ上に該蒸発源とは隙間なく配置され、且つ蒸気
流路の周囲の規制面が略垂直に延びて該蒸気流路を完全
に包囲している。On the other hand, the polymer molded body 9 is sent out from the sending-out roll 6, vapor of the ferromagnetic material 3 whose incident angle is regulated by the mask 10 is vapor-deposited on the vapor deposition drum 7, and is taken up by the take-up roll 8. Since the evaporation source 2 is heated by high-frequency induction heating, the vapor flow control wall surface 11 is arranged immediately above the evaporation source 2 without any gap between the evaporation source 2 and the regulation surface around the vapor flow path. It extends vertically to completely surround the vapor flow path.
又、蒸気流制御壁面11は、材質としてセラミックが用
いられており、その周囲には、例えば高さ方向に３分割
化された加熱ヒータ12a,12b,12cとしてタングステン，
モリブデン，タンタル等の高融点金属が被っており、そ
して、その外側に断熱材13が巻かれている。尚、蒸気流
制御壁面11への強磁性材料３の付着・堆積を防止するた
め、ヒータ12a,12b,12cは、独立した３個の電源15a,15
b,15cによって各々通電加熱され、蒸気流制御壁面11の
高さ方向に温度勾配をつけられるように温度制御可能な
構造となっている。又は高周波加熱により渦電流をヒー
タ12に流して加熱しても良い。Ceramic is used as the material of the vapor flow control wall surface 11, and the surroundings thereof are, for example, tungsten heaters 12a, 12b, 12c which are divided into three in the height direction.
A refractory metal such as molybdenum or tantalum is covered, and a heat insulating material 13 is wound on the outside thereof. In order to prevent the ferromagnetic material 3 from adhering to and depositing on the vapor flow control wall surface 11, the heaters 12a, 12b and 12c are provided with three independent power sources 15a and 15c.
Each of b and 15c is electrically heated, and has a temperature controllable structure so that a temperature gradient can be provided in the height direction of the steam flow control wall surface 11. Alternatively, eddy current may be passed through the heater 12 for heating by high frequency heating.
次に、本発明の製造装置における蒸着プロセスに関し
て、詳しく説明する。Next, the vapor deposition process in the manufacturing apparatus of the present invention will be described in detail.
強磁性材料３は、蒸発源２内で加熱され、蒸発する。
蒸発した強磁性材料３は、蒸着効率を向上するために設
置された蒸気流制御壁面11に衝突する粒子と蒸気流制御
壁面11の上部開口部から飛散する分子の二種類に区別さ
れる。前者の蒸気流制御壁面11に衝突した分子は、蒸気
流制御減11の温度が強磁性材料３の融点以上に保たれて
いない場合、蒸気流制御壁面11に蒸着・堆積して、強磁
性材料３の蒸気流を妨げる事になる。The ferromagnetic material 3 is heated in the evaporation source 2 and evaporated.
The evaporated ferromagnetic material 3 is classified into two types, that is, particles that collide with the vapor flow control wall surface 11 installed to improve the vapor deposition efficiency and molecules that scatter from the upper opening of the vapor flow control wall surface 11. If the temperature of the vapor flow control wall 11 is not kept above the melting point of the ferromagnetic material 3, the molecules colliding with the vapor flow control wall surface 11 of the former will be deposited and deposited on the vapor flow control wall surface 11 to form the ferromagnetic material. It will impede the steam flow of 3.
第２図に比較例として示した様に、蒸気流制御壁面16
としてモリブデン，タングステンタンタル等の高融点金
属が用いられ、通電加熱等により加熱される構成のもの
は、強磁性材料３の高温の液滴が蒸気流制御壁面11に付
着し流れると、両者が反応して穴があくといった問題点
があった。しかし、本発明では第１図に示すように強磁
性材料３の蒸気が触れる蒸気流制御壁面11と、加熱制御
するための加熱ヒータ12との材質を別種のものとする。As shown as a comparative example in FIG. 2, the steam flow control wall 16
As a high melting point metal such as molybdenum or tungsten tantalum, which is heated by electric heating or the like, when a high temperature droplet of the ferromagnetic material 3 adheres to the vapor flow control wall surface 11 and flows, the two react with each other. There was a problem that it made a hole. However, in the present invention, as shown in FIG. 1, the vapor flow control wall surface 11 where the vapor of the ferromagnetic material 3 contacts and the heater 12 for heating control are made of different materials.
前記蒸気流制御壁面11の材質としては、例えば、Mg
O、ZrO2、Al2O3、CaO、Y2O3、ThO2、BN、BeO、CaO安定
化ZrO2（ZrO2が90％〜98％＋CaOが10％〜２％）、Y2O3
安定化ZrO2（ZrO2が90％〜98％＋Y2O3が10％〜２％）等
のセラミックを用いる事が可能となり、蒸気流制御壁面
11の耐久性が良好なものとなる。Examples of the material of the steam flow control wall surface 11 include Mg
O, ZrO 2 , Al 2 O 3 , CaO, Y 2 O 3 , ThO 2 , BN, BeO, CaO stabilized ZrO 2 (90% to 98% ZrO 2 + 10% to 2% CaO), Y 2 O 3
It becomes possible to use ceramics such as stabilized ZrO 2 (90% to 98% of ZrO 2 + 10% to 2% of Y 2 O 3 ) and steam flow control wall surface.
11 has good durability.
前記各加熱ヒータ12a,12b,12cはその材質を例えばタ
ングステン，モリブデンタンタル等の高融点金属とし、
両者を接合してある。The heaters 12a, 12b, 12c are made of a high melting point metal such as tungsten or molybdenum tantalum.
Both are joined.
又、前記蒸発源２の材質としては、例えば、MgO、ZrO
2、Al2O3、CaO、Y2O3、ThO2、BN、BeO、CaO安定化ZrO2
（ZrO2が90％〜98％＋CaOが10％〜２％）、Y2O3安定化Z
rO2（ZrO2が90％〜98％＋Y2O3が10％〜２％）等のセラ
ミックを用いる事が可能となり、該蒸発源２のの耐久性
も良好なものとなる。The material of the evaporation source 2 is, for example, MgO or ZrO.
2 , Al 2 O 3 , CaO, Y 2 O 3 , ThO 2 , BN, BeO, CaO stabilized ZrO 2
(ZrO 2 90% -98% + CaO 10% -2%), Y 2 O 3 stabilized Z
It is possible to use a ceramic such as rO 2 (ZrO 2 is 90% to 98% + Y 2 O 3 is 10% to 2%), and the durability of the evaporation source 2 is also good.
前記断熱材13の材料としては上述した各種セラミック
ス類、アスベスト、炭素繊維、ロックウール等を使用す
ることができる。As the material of the heat insulating material 13, the above-mentioned various ceramics, asbestos, carbon fiber, rock wool and the like can be used.
一方、蒸気流制御壁面11は、蒸発面より輻射熱を受け
るが、その入射輻射熱量は、一般的に、蒸発面に近い部
分では大きく、蒸発面から遠い部分では小さい傾向にあ
る。従って、強磁性材料３が蒸着・付着堆積されやすい
場所は、蒸発面から遠い部分の蒸気流制御壁面であり、
蒸発面に近い部分の蒸気流制御壁面では、断熱性が充分
確保されていれば、微少な加熱パワーで強磁性材料３
は、蒸気流制御壁面11で蒸着・付着堆積せずに溶解又は
再蒸発する。よって、加熱ヒータ12a,12b,12cの順番で
加熱パワーを大きくすれば、上述の条件にそくした温度
勾配にできて、蒸気流制御壁面11への強磁性材料３の付
着・堆積を防止を最小のパワーで効率的に行う事が出
来、また、蒸気流制御壁面11の高さ方向の温度分布を均
一にする事が可能となる。On the other hand, the vapor flow control wall surface 11 receives radiant heat from the evaporating surface, but the incident radiant heat amount generally tends to be large in a portion close to the evaporating surface and small in a portion distant from the evaporating surface. Therefore, the place where the ferromagnetic material 3 is easily vapor-deposited / deposited is the vapor flow control wall surface far from the evaporation surface.
On the vapor flow control wall near the evaporation surface, if sufficient heat insulation is ensured, the ferromagnetic material
Is melted or re-evaporated without vapor deposition / adhesion deposition on the vapor flow control wall surface 11. Therefore, if the heating power is increased in the order of the heaters 12a, 12b, 12c, the temperature gradient can be made to meet the above conditions, and the adhesion and deposition of the ferromagnetic material 3 on the vapor flow control wall surface 11 can be prevented at the minimum. It is possible to efficiently perform it with the power of, and it is also possible to make the temperature distribution in the height direction of the steam flow control wall surface 11 uniform.
又、本発明において、蒸気流制御壁面11は、セラミッ
クであるため、強磁性材料３の蒸気及び溶解金属に対す
る耐久性・耐蝕性に優れ、且つ、外側を高融点金属であ
る加熱ヒータ12に被われているので、通電加熱等によ
り、蒸気流制御壁面11の加熱制御が可能になり、強磁性
材料３の付着・堆積が防止され、高蒸着効率が得られ
る。Further, in the present invention, since the vapor flow control wall surface 11 is made of ceramic, the ferromagnetic material 3 has excellent durability and corrosion resistance against vapor and molten metal, and the outside is covered by the heater 12 having a high melting point metal. Therefore, heating of the vapor flow control wall surface 11 can be controlled by electric heating, etc., adhesion and deposition of the ferromagnetic material 3 can be prevented, and high vapor deposition efficiency can be obtained.
次に、本発明の具体的な実施例について説明する。蒸
発源として内径50mm坩堝，高周波誘導加熱電源として周
波数200（KHz）出力容量20（KW），高分子成形物基体と
してポリエチレンテレフタレートフイルム（100mm幅,13
μｍ厚），蒸着ドラムとして直径300mm（表面温度約０
℃），蒸気流制御壁面としてマグネシア（外径60mm・内
径50mm・高さ90mm），ヒータとしてタングステン（外径
62mm・内径60mm・高さ29mm）を３個，断熱材としてアル
ミナ繊維（Al2O3,SiO,外径72mm・内径62mm・高さ90mm）
を用いた。高周波電源の出力を９（KW），高分子成形物
基体の搬送速度を15（m/min）となるよう、約1500
（Å）の膜厚でCoを蒸着させたところ、蒸着効率は、19
（％）であった。また、タングステン・ヒータ12a,12b,
12cへの各々への加熱電力を４（Ｖ）・200（Ａ）,3
（Ｖ）・140（Ａ）,2（Ｖ）・100（Ａ）のしたところ強
磁性材料３の蒸気流制御壁面11への付着・堆積は、起こ
らなかった。尚、タングステン・ヒータの総加熱電力
は、1.42（KW）であり、ヒータを一つで行った一体型タ
ングステン・ヒータの加熱電力2.4（KW）（＝４（Ｖ）
・600（Ａ））と比較して省電力となっている。Next, specific examples of the present invention will be described. 50 mm inner diameter crucible as evaporation source, 200 (KHz) output capacity 20 (KW) as high frequency induction heating power source, polyethylene terephthalate film (100 mm width, 13
(μm thickness), diameter 300 mm as a vapor deposition drum (surface temperature about 0
℃), magnesia (outer diameter 60 mm, inner diameter 50 mm, height 90 mm) as a wall for steam flow control, tungsten as a heater (outer diameter)
62mm, inner diameter 60mm, height 29mm) 3 pieces, alumina fiber (Al 2 O 3 , SiO, outer diameter 72mm, inner diameter 62mm, height 90mm) as heat insulating material
Was used. Approximately 1500 so that the output of the high frequency power supply is 9 (KW) and the conveying speed of the polymer molded product substrate is 15 (m / min).
When Co was vapor-deposited with a film thickness of (Å), the vapor deposition efficiency was 19
(%)Met. Also, the tungsten heaters 12a, 12b,
Heating power to each 12c 4 (V) ・ 200 (A), 3
After (V) · 140 (A), 2 (V) · 100 (A), adhesion and deposition of the ferromagnetic material 3 on the vapor flow control wall surface 11 did not occur. The total heating power of the tungsten heater is 1.42 (KW), and the heating power of the integrated tungsten heater with one heater is 2.4 (KW) (= 4 (V)).
・ Compared to 600 (A)), it has less power consumption.
尚、上記の条件で蒸着を繰り返し行ったところ、ヒー
タの使用可能回数は、12回であった。一方、従来の方法
として、蒸気流制御壁面とヒータを兼用した場合を第２
図に示した。即ち、蒸気流制御壁面16としてタングステ
ン（外径52mm・内径50mm・高さ90mm）を用いて、その他
の条件は前記と同じにして行ったところ、ヒータの使用
可能回数は、３回であった。When vapor deposition was repeated under the above conditions, the number of times the heater could be used was 12 times. On the other hand, as the conventional method, the case where the steam flow control wall surface and the heater are also used
As shown in the figure. That is, when tungsten (outer diameter 52 mm, inner diameter 50 mm, height 90 mm) was used as the vapor flow control wall surface 16 and other conditions were the same as the above, the number of times the heater could be used was 3 times. .
以上述べたように、本発明は真空槽内で、強磁性材料
を高周波誘導加熱で蒸発させるて被蒸着基体に向かって
蒸発する蒸発蒸気流の蒸気流制御壁面を備えた製造装置
にて、蒸発源と前記蒸気流制御壁面とは略連続した状態
で略垂直に延びる規制面で囲まれる前記蒸発蒸気流路を
構成するべく配置し、蒸気流制御壁面の構造を強磁性材
料の蒸発分子が衝突する内側の壁面がセラミックにて構
成され、該蒸気流制御壁面の外周には高融点金属からな
る温度制御用加熱ヒータが設けられた二層構造とされ、
更に前記温度制御用加熱ヒータは前記蒸気流制御壁面の
高さ方向に複数分割され且つ独立制御可能に構成されて
いる。As described above, according to the present invention, in a manufacturing apparatus equipped with a vapor flow control wall surface of an evaporated vapor flow that evaporates a ferromagnetic material by high frequency induction heating in a vacuum chamber and evaporates toward a substrate to be vaporized, The source and the vapor flow control wall surface are arranged to form the vaporized vapor flow path surrounded by a restriction surface extending substantially vertically in a substantially continuous state, and the vaporized flow control wall surface structure is collided with vaporized molecules of a ferromagnetic material. The inner wall surface is made of ceramic, and the vapor flow control wall surface has a two-layer structure in which a heater for temperature control made of refractory metal is provided on the outer periphery of the wall surface,
Further, the temperature control heater is divided into a plurality of parts in the height direction of the vapor flow control wall surface, and is independently controllable.
したがって、このように蒸気流制御壁面を強磁性材料
が接触する面をセラミックとし、加熱させる部分を高融
点金属とし、さらに、その周囲に断熱材を設け、蒸気流
制御，加熱，保温の機能構造を分離する事により、耐久
性・耐蝕性に優れ、さらに蒸気流制御壁面の高さ方向に
おいて温度制御可能に構成されているので、温度制御性
に優れた少ない消費電力で効率のよい蒸着を可能する装
置を提供することができる。Therefore, the surface of the steam flow control wall that comes into contact with the ferromagnetic material is made of ceramic, the part to be heated is made of a high melting point metal, and further a heat insulating material is provided around it to provide a functional structure for steam flow control, heating, and heat retention. By separating it, it has excellent durability and corrosion resistance, and since the temperature can be controlled in the height direction of the vapor flow control wall surface, it is possible to perform efficient vapor deposition with excellent temperature control and low power consumption. It is possible to provide the device.
第１図は、本発明の製造装置の１実施例の側面配置図、
第２図は、従来の製造装置の側面配置図である。 １……真空槽、２……蒸発源 ３……強磁性材料、４……加熱コイル ５……高周波誘導加熱電源 ６……送り出しロール、７……蒸着ドラム ８……巻き取りロール、９……高分子成形物基体 10……入射角規制用マスク 11……蒸気流制御壁面 12a,12b,12c……加熱ヒータ 13……断熱材 14……真空ポンプ、15a,15b,15c……電源 16……タングステン蒸気流制御壁面FIG. 1 is a side view of one embodiment of the manufacturing apparatus of the present invention,
FIG. 2 is a side view of a conventional manufacturing apparatus. 1 ... Vacuum tank, 2 ... Evaporation source, 3 ... Ferromagnetic material, 4 ... Heating coil, 5 ... High-frequency induction heating power source, 6 ... Sending roll, 7 ... Evaporating drum, 8 ... Winding roll, 9 ... … Polymer molding substrate 10 …… Incident angle control mask 11 …… Vapor flow control wall 12a, 12b, 12c …… Heater 13 …… Insulation 14 …… Vacuum pump, 15a, 15b, 15c …… Power supply 16 ...... Tungsten vapor flow control wall
Claims (1)
で蒸発させる蒸発源と被蒸着基体との間に、前記蒸発源
から前記被蒸着基体に向かって蒸発する蒸発蒸気流の蒸
発蒸気流路を形成する蒸気流制御壁面を備えた磁気記録
媒体の製造装置において、 前記蒸発源と前記蒸気流制御壁面とは略連続した状態で
略垂直に延びる規制面で囲まれる前記蒸発蒸気流路を構
成するべく配置されており、 前記蒸気流制御壁面の構造を強磁性材料の蒸発分子が衝
突する内側の壁面がセラミックにて構成され、該蒸気流
制御壁面の外周には高融点金属からなる温度制御用加熱
ヒータが設けられた二層構造とされ、さらに前記温度制
御用加熱ヒータは前記蒸気流制御壁面の高さ方向に複数
分割され且つ独立制御可能に設けられたことを特徴とす
る磁気記録媒体の製造装置。1. An evaporative vapor of an evaporative vapor stream that evaporates from the evaporation source toward the substrate to be vapor-deposited between an evaporation source for vaporizing a ferromagnetic material by high frequency induction heating and a substrate to be vapor-deposited in a vacuum chamber. In a manufacturing apparatus for a magnetic recording medium having a vapor flow control wall surface forming a flow channel, the vaporization vapor flow channel surrounded by a regulation surface extending substantially vertically in a state where the evaporation source and the vapor flow control wall surface are substantially continuous. The inner wall surface against which vaporized molecules of the ferromagnetic material collide is made of ceramic, and the outer periphery of the steam flow control wall surface is made of a refractory metal. It has a two-layer structure provided with a temperature control heating heater, and the temperature control heating heater is divided into a plurality of parts in the height direction of the vapor flow control wall surface and is independently controllable. recoding media Manufacturing equipment.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62093384A JP2554488B2 (en) | 1987-04-17 | 1987-04-17 | Magnetic recording medium manufacturing equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62093384A JP2554488B2 (en) | 1987-04-17 | 1987-04-17 | Magnetic recording medium manufacturing equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63259834A JPS63259834A (en) | 1988-10-26 |
| JP2554488B2 true JP2554488B2 (en) | 1996-11-13 |
Family
ID=14080815
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62093384A Expired - Lifetime JP2554488B2 (en) | 1987-04-17 | 1987-04-17 | Magnetic recording medium manufacturing equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2554488B2 (en) |
-
1987
- 1987-04-17 JP JP62093384A patent/JP2554488B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS63259834A (en) | 1988-10-26 |
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