JP2584066B2 - Transparent organic thin film remover for pellicle cover - Google Patents
Transparent organic thin film remover for pellicle coverInfo
- Publication number
- JP2584066B2 JP2584066B2 JP22076289A JP22076289A JP2584066B2 JP 2584066 B2 JP2584066 B2 JP 2584066B2 JP 22076289 A JP22076289 A JP 22076289A JP 22076289 A JP22076289 A JP 22076289A JP 2584066 B2 JP2584066 B2 JP 2584066B2
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- organic thin
- transparent organic
- pellicle cover
- remover
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000010409 thin film Substances 0.000 title claims description 33
- 239000000853 adhesive Substances 0.000 claims description 6
- 230000001070 adhesive effect Effects 0.000 claims description 6
- 239000011368 organic material Substances 0.000 claims 1
- 238000000034 method Methods 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 238000005096 rolling process Methods 0.000 description 2
- 239000004820 Pressure-sensitive adhesive Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
Description
【発明の詳細な説明】 産業上の利用分野 本発明は、フォトリソグラフィ工程の転写パターン欠
陥発生を防止する目的で、パーティクルからマスク保護
をするペリクルカバーの透明有機薄膜除去器に関するも
のである。Description: BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a pellicle cover transparent organic thin film remover for protecting a mask from particles for the purpose of preventing transfer pattern defects from occurring in a photolithography process.
従来の技術 近年、半導体製造の歩留まり安定化の一手段として、
フォトリソグラフィ工程での転写パターン欠陥発生を防
止するため、マスクにパーティクルが付着することを防
止するペリクルカバーをマスクに装着する方法が用いら
れている。2. Description of the Related Art In recent years, as one means for stabilizing the yield of semiconductor manufacturing,
In order to prevent transfer pattern defects from occurring in the photolithography process, a method of attaching a pellicle cover to a mask to prevent particles from adhering to the mask has been used.
以下にペリクルカバーのマスクへの装着について説明
する。第２図はペリクルカバーフレームのマスクへの装
着例の一つを示すものである。第２図において、３は透
明有機薄膜、４はペリクルカバーのフレーム、５はマス
クである。Hereinafter, the attachment of the pellicle cover to the mask will be described. FIG. 2 shows one example of mounting a pellicle cover frame on a mask. In FIG. 2, 3 is a transparent organic thin film, 4 is a frame of a pellicle cover, and 5 is a mask.
以上ように構成されたペリクルカバーを装着したマス
クを露光に用いると、紫外線により透明有機薄膜が劣化
しペリクルカバーの交換が必要になる。When a mask with a pellicle cover configured as described above is used for exposure, the transparent organic thin film is deteriorated by ultraviolet rays, and the pellicle cover needs to be replaced.
発明が解決しようとする課題 しかしながら上記構成のペリクルカバー装着マスクの
従来の交換方法では、ペリクルカバーフレームから透明
有機薄膜を取り除くとき、透明有機薄膜を破って取り除
いていたので、透明有機薄膜がマスク面に付着し洗浄を
困難にしたり、マスクパターン面に付着した透明有機薄
膜を取り除く際に発生した静電気でマスクパターンが破
壊されるという課題を有していた。However, in the conventional method of replacing the pellicle cover-mounted mask having the above configuration, when the transparent organic thin film is removed from the pellicle cover frame, the transparent organic thin film is broken and removed. There has been a problem that the mask pattern is damaged by the static electricity generated when the transparent organic thin film adhered to the mask pattern surface is removed or the transparent organic thin film adhered to the mask pattern surface is removed.
本発明は上記従来の課題を解決するもので、透明有機
薄膜をマスクパターン面に付着させることなく、ペリク
ルカバーフレームから除去する優れたペリクルカバー透
明有機薄膜除去器を提供することを目的とする。An object of the present invention is to solve the above-mentioned conventional problems, and an object of the present invention is to provide an excellent pellicle cover transparent organic thin film remover for removing a transparent organic thin film from a pellicle cover frame without attaching the transparent organic thin film to a mask pattern surface.
課題を解決するための手段 この目的を達成するために本発明のペリクルカバー透
明有機薄膜除去器は、円筒状をなし側面に粘着剤を塗布
したものであって、円筒の周の長さが、除去しようとす
る透明有機薄膜の長さよりも長く、幅は除去しようとす
る透明有機薄膜の幅よりも広いという構成を有してい
る。Means for Solving the Problems To achieve this object, the pellicle cover transparent organic thin film remover of the present invention has a cylindrical shape and is coated with an adhesive on a side surface, and the circumferential length of the cylinder is The length of the transparent organic thin film to be removed is longer and the width thereof is wider than the width of the transparent organic thin film to be removed.
作用 この構成によって、透明有機薄膜をペリクルカバーフ
レームより取り除く際に、円筒状の除去器をペリクルカ
バーフレーム上で転がせば、円筒側面に塗ってある粘着
剤に透明有機薄膜を粘着させて除去できる。また、除去
器の幅，円周はそれぞれ除去する透明有機薄膜の幅，長
さよりも大きいのでペリクルカバーフレーム上での除去
器の一回転でペリクルカバーフレームの透明有機薄膜は
除去される。従って、破れた有機薄膜がマスクパターン
面に付着することが防止できる。Operation With this configuration, when the transparent organic thin film is removed from the pellicle cover frame by rolling the cylindrical remover on the pellicle cover frame, the transparent organic thin film can be adhered to the adhesive applied to the side surface of the cylinder and removed. Further, since the width and the circumference of the remover are respectively larger than the width and the length of the transparent organic thin film to be removed, one rotation of the remover on the pellicle cover frame removes the transparent organic thin film of the pellicle cover frame. Therefore, it is possible to prevent the broken organic thin film from adhering to the mask pattern surface.
実施例 以下本発明の一実施例について、図面を参照しながら
説明する。An embodiment of the present invention will be described below with reference to the drawings.
第１図は本発明の一実施例におけるペリクルカバーの
透明有機薄膜の除去例を示すものである。同図におい
て、１は除去器、２は除去器の粘着面、３は透明有機薄
膜、４はペリクルカバーフレーム、５はマスクである。FIG. 1 shows an example of removing a transparent organic thin film from a pellicle cover in one embodiment of the present invention. In the figure, 1 is a remover, 2 is an adhesive surface of the remover, 3 is a transparent organic thin film, 4 is a pellicle cover frame, and 5 is a mask.
以上のように構成された除去器に用いて、ペリクルカ
バーの有機薄膜を除去する動作について説明する。The operation of removing the organic thin film of the pellicle cover using the remover configured as described above will be described.
まず、除去器１をペリクルカバーフレーム４上にの
せ、除去器１をペリクルカバーフレーム４上で回転させ
る。すると、ペリクルカバーの透明有機薄膜は除去器の
粘着面にはぎ取られ、従来法のように透明有機薄膜を破
ってマスク面に付着させることなくペリクルカバーから
除去できる。First, the remover 1 is placed on the pellicle cover frame 4 and the remover 1 is rotated on the pellicle cover frame 4. Then, the transparent organic thin film of the pellicle cover is peeled off from the adhesive surface of the remover, and can be removed from the pellicle cover without breaking the transparent organic thin film and attaching it to the mask surface as in the conventional method.
発明の効果 以上のように本発明は、円筒状をなし側面に粘着剤を
塗布したものを、ペリクルカバーフレーム上を転がすこ
とにより、透明有機薄膜を破ってマスクパターン面に付
着させることなく、透明有機薄膜をペリクルカバーフレ
ームより除去できる優れた除去器を実現できるものであ
る。Effect of the Invention As described above, the present invention has a cylindrical shape and a pressure-sensitive adhesive applied to the side surface, and by rolling on the pellicle cover frame, the transparent organic thin film is broken and adhered to the mask pattern surface without being adhered. An excellent remover capable of removing the organic thin film from the pellicle cover frame can be realized.
第１図は本発明の一実施例におけるペリクルカバーの透
明有機薄膜除去器を用いている図、第２図は従来のペリ
クルカバーの透明有機薄膜除去を示す図である。 １……除去器、２……粘着面、３……透明有機薄膜、４
……ペリクルカバーフレーム、５……マスク。FIG. 1 is a diagram showing the use of a transparent organic thin film remover for a pellicle cover according to one embodiment of the present invention, and FIG. 2 is a diagram showing removal of a transparent organic thin film from a conventional pellicle cover. 1 ... Remover, 2 ... Adhesive surface, 3 ... Transparent organic thin film, 4
…… pellicle cover frame, 5 …… mask.
Claims (1)
であって、円筒の周の長さが、除去しようとする透明有
機薄膜の長さよりも長く、幅は除去しようとする透明有
機薄膜の幅よりも広いペリクルカバーの透明有機薄膜除
去器。1. A transparent organic material having a cylindrical shape and a side surface coated with an adhesive, wherein the length of the circumference of the cylinder is longer than the length of the transparent organic thin film to be removed, and the width of the transparent organic thin film to be removed. A transparent organic thin film remover with a pellicle cover wider than the width of the thin film.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22076289A JP2584066B2 (en) | 1989-08-28 | 1989-08-28 | Transparent organic thin film remover for pellicle cover |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22076289A JP2584066B2 (en) | 1989-08-28 | 1989-08-28 | Transparent organic thin film remover for pellicle cover |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0383062A JPH0383062A (en) | 1991-04-09 |
| JP2584066B2 true JP2584066B2 (en) | 1997-02-19 |
Family
ID=16756152
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP22076289A Expired - Lifetime JP2584066B2 (en) | 1989-08-28 | 1989-08-28 | Transparent organic thin film remover for pellicle cover |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2584066B2 (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008086273A (en) * | 2006-10-03 | 2008-04-17 | Tominaga Jushi Kogyosho:Kk | Scooping tool for pet fish, and the like |
| JP5743450B2 (en) * | 2010-07-28 | 2015-07-01 | 株式会社東芝 | Reticle chuck cleaner |
| CN110125094A (en) * | 2018-02-08 | 2019-08-16 | 华为机器有限公司 | A kind of residual glue removal system and residual glue removal method |
-
1989
- 1989-08-28 JP JP22076289A patent/JP2584066B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0383062A (en) | 1991-04-09 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US6573980B2 (en) | Removable optical pellicle | |
| JPH10509524A (en) | Pellicle protection mask | |
| JP2642637B2 (en) | Dustproof film | |
| ATE168789T1 (en) | FILM PRODUCTION METHOD AND ADJUSTING DEVICE THEREOF | |
| JP2584066B2 (en) | Transparent organic thin film remover for pellicle cover | |
| US4834833A (en) | Mask for etching, and method of making mask and using same | |
| JPH086005A (en) | Liquid crystal display device and manufacturing method thereof | |
| KR20060047206A (en) | Pericle Frame and Pericle for Photolithography Using It | |
| JP2001272768A (en) | Photolithography mask | |
| JP4319757B2 (en) | Pellicle manufacturing method | |
| JP2599460B2 (en) | Photo mask | |
| JPH03114050A (en) | Frame of pellicle cover | |
| KR0142791B1 (en) | Reticle structure | |
| JPS604944A (en) | Photomask | |
| JP3758339B2 (en) | Pellicle for lithography | |
| JPS61241756A (en) | photomask | |
| KR20050003293A (en) | Photo mask for fabricating of semiconductor device | |
| KR200149834Y1 (en) | Mask with pellicle | |
| JPH05216214A (en) | Photomask and pellicle | |
| JPH04163551A (en) | Pellicle | |
| JP2939193B2 (en) | Dustproof film | |
| JPH02181755A (en) | Photomask | |
| JPH0588015A (en) | Method for manufacturing chrome pattern substrate for color filter | |
| JPH0266546A (en) | Mask for manufacturing semiconductor device | |
| JPH08114911A (en) | Pellicle for photomask and photomask |