JP2591950B2 - Electron beam evaporation source device - Google Patents
Electron beam evaporation source deviceInfo
- Publication number
- JP2591950B2 JP2591950B2 JP62092039A JP9203987A JP2591950B2 JP 2591950 B2 JP2591950 B2 JP 2591950B2 JP 62092039 A JP62092039 A JP 62092039A JP 9203987 A JP9203987 A JP 9203987A JP 2591950 B2 JP2591950 B2 JP 2591950B2
- Authority
- JP
- Japan
- Prior art keywords
- crucible
- electron beam
- magnetic field
- evaporation source
- source device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000005566 electron beam evaporation Methods 0.000 title claims 2
- 238000010894 electron beam technology Methods 0.000 claims description 23
- 238000001704 evaporation Methods 0.000 description 17
- 230000008020 evaporation Effects 0.000 description 12
- 239000000126 substance Substances 0.000 description 8
- 230000005284 excitation Effects 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 239000010408 film Substances 0.000 description 5
- NNJPGOLRFBJNIW-HNNXBMFYSA-N (-)-demecolcine Chemical compound C1=C(OC)C(=O)C=C2[C@@H](NC)CCC3=CC(OC)=C(OC)C(OC)=C3C2=C1 NNJPGOLRFBJNIW-HNNXBMFYSA-N 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
- C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Description
【発明の詳細な説明】 （産業上の利用分野） 本発明はるつぼ内の物質を電子銃の出力電子ビームに
より照射して加熱蒸発させる主として真空蒸着用の蒸発
源装置に関する。Description: TECHNICAL FIELD The present invention relates to an evaporation source device mainly for vacuum evaporation, which irradiates a substance in a crucible with an electron beam output from an electron gun and heats and evaporates the material.
（従来の技術） 従来、この種の蒸発源装置として、例えば第１図に見
られるように、励磁体ａの左右の磁極板ｂ、ｂ間に、る
つぼｃとその前方下側の電子銃ｄとを設け、該電子銃ｄ
の出力電子ビームｅを両磁極板ｂ、ｂ間の磁場の作用に
より彎曲させてつるぼｃ内にその前側上面から導くよう
にし、さらに該るつぼｃ内の物質ｆに全体的な加熱を与
えるために、該出力電子ビームｅの通路に沿つて左右１
対に補助励磁コイルｇ、ｇを設け、これらのコイルｇ、
ｇを交互に逆方向に励磁して該出力電子ビームｅに左右
交互の偏向を生じさせるようにしたものが知られている
（特公昭51−6025号公報）。(Prior Art) Conventionally, as this type of evaporation source device, as shown in FIG. 1, for example, a crucible c and an electron gun d on the lower front side thereof are provided between left and right magnetic pole plates b, b of an exciter a. And the electron gun d
The output electron beam e is bent by the action of the magnetic field between the two magnetic pole plates b and b to be guided into the crucible c from the front upper surface thereof, and further, the material f in the crucible c is entirely heated. At right and left sides along the path of the output electron beam e.
A pair of auxiliary excitation coils g, g are provided, and these coils g,
There is known a device in which g is alternately excited in the opposite direction to cause the output electron beam e to alternately deflect left and right (Japanese Patent Publication No. 51-6025).
（発明が解決しようとする問題点） 前記のものは、励磁体ａの電流値を変化させれば、出
力電子ビームｅはるつぼｃ内を前後に移動し、これと同
時に補助励磁コイルｇ、ｇを交互に励磁すると出力電子
ビームｅはるつぼｃ内を左右に移動させ得、るつぼｃ内
の物質ｆの表面に広く電子ビームｅを照射することが出
来るが、出力電子ビームｅはるつぼｃの側方へ収束し勝
ちであり、該物質ｆが加熱により液相を生じない昇華物
の場合、物質ｆには第２図示のように出力電子ビームｅ
の軌跡に沿つて表面から側方へ彎曲した蒸発跡ｈの穴が
形成される不都合がある。このような彎曲した横穴が発
生すると、るつぼｃから発生する物質ｆの蒸気が不均一
になり、その結果るつぼ上方の基板（図示してない）に
形成される薄膜の膜厚分布が不均一になり、膜厚分布の
再現性が悪くなる問題が生ずる。(Problems to be Solved by the Invention) According to the above, when the current value of the exciter a is changed, the output electron beam e moves back and forth in the crucible c, and at the same time, the auxiliary excitation coils g and g Are alternately excited, the output electron beam e can move left and right in the crucible c, and the surface of the material f in the crucible c can be widely irradiated with the electron beam e. When the substance f is a sublimate that does not generate a liquid phase by heating, the substance f has an output electron beam e as shown in FIG.
There is an inconvenience that a hole of the evaporation trace h curved laterally from the surface along the trajectory is formed. When such a curved lateral hole is generated, the vapor of the substance f generated from the crucible c becomes uneven, and as a result, the film thickness distribution of the thin film formed on the substrate (not shown) above the crucible becomes uneven. This causes a problem that the reproducibility of the film thickness distribution is deteriorated.
本発明は蒸発源のるつぼ内に彎曲した穴を生ずること
による問題を解決することを目的とするものである。SUMMARY OF THE INVENTION It is an object of the present invention to solve the problem of creating a curved hole in a crucible of an evaporation source.
（問題点を解決するための手段） 本発明では、励磁コイルその他の励磁体の両外側の左
右１対の磁極板間に、るつぼとその前方下側の電子銃と
を設け、該電子銃の出力電子ビームを両磁極板間の磁界
の作用により彎曲させてるつぼ内にその前面上側から導
かせるようにしたものに於て、該るつぼの下方に、前記
磁極板による磁界と逆方向の磁界を発生する永久磁石等
の制御磁石を設けて該るつぼ内の出力電子ビームの彎曲
率を緩和するようにして前記問題点を解決するようにし
た。(Means for Solving the Problems) In the present invention, a crucible and an electron gun on the lower front side of the crucible are provided between a pair of left and right magnetic pole plates on both outer sides of an excitation coil and other exciters. In an apparatus in which an output electron beam is guided into a crucible which is curved by the action of a magnetic field between both pole plates from the upper front side thereof, a magnetic field in a direction opposite to the magnetic field of the pole plate is formed below the crucible. The problem is solved by providing a control magnet such as a permanent magnet to be generated to reduce the curvature of the output electron beam in the crucible.
（作用） 真空中に蒸発源装置を設置し、電子銃を作動させる
と、これより出力する電子ビームは励磁体の磁極板間の
磁界の作用によりるつぼ内へ導かれ、るつぼ内に収めら
れた物質が蒸発する。該物質が例えばCr等の昇華物であ
る場合、出力電子ビームが照射された点の物質が昇華蒸
発し、そこに蒸発跡の穴が形成されるが、該るつぼの下
方に設けた制御磁石がるつぼ内に於ける磁極板による磁
界の強さを減少させるような逆方向の磁界を発生するた
めに出力電子ビームのるつぼ内の曲率が緩和され、出力
電子ビームは物質の表面から下面へと拡散して物質を照
射するようになるのでその蒸発跡は竪穴形となり、穴の
奥部から途中で乱されることなく直上へ蒸発させ得、上
方の基板に均一な膜厚分布の薄膜を再現性良く形成する
ことが出来る。(Effect) When the evaporation source device is installed in a vacuum and the electron gun is operated, the electron beam output from the evaporator is guided into the crucible by the action of the magnetic field between the pole plates of the exciter, and is contained in the crucible. The substance evaporates. When the substance is a sublimate such as Cr, for example, the substance at the point irradiated with the output electron beam is sublimated and evaporated, and a hole of an evaporation mark is formed therein. The curvature of the output electron beam in the crucible is reduced to generate a magnetic field in the opposite direction that reduces the strength of the magnetic field caused by the pole plate in the crucible, and the output electron beam diffuses from the surface to the lower surface of the material As the material is irradiated, the trace of evaporation becomes a vertical hole, and it can be evaporated directly from the depth of the hole without being disturbed on the way, and a thin film with uniform film thickness distribution can be reproduced on the substrate above. It can be formed well.
（実施例） 本発明の実施例を図面に基づき説明すると、第３図及
び第４図に於て、符号（１）は励磁コイル或は永久磁石
から成る励磁体、（２）（２）は該励磁体（１）の両外
側に前後方向に設けられ該励磁体（１）によりＮ極とＳ
極とに励磁される１対の磁極板、（３）は蒸発物質
（４）を収容して該磁極板（２）（２）間に設けられた
るつぼ、（５）は該るつぼ（３）の前方下側に設けられ
た電子銃を示し、該電子銃（５）からの出力電子ビーム
（６）を両磁極板（２）（２）の磁界の作用により彎曲
させてるつぼ（３）内へその前方上側から導き、蒸発物
質（４）の加熱蒸発が行なわれる。こうした構成は従来
のものと同様であり、該励磁体（１）をコイルとしたと
きにこれへの電流値を変化させれば出力電子ビーム
（６）をるつぼ（３）の前後に移動させ得、更に該ビー
ム（６）の通路に沿つて左右１対の補助励磁コイル
（７）を設けてこれを交互に励磁すれば該ビーム（６）
をるつぼ（３）の左右に移動させることが出来ることも
従来のものと変わりがない。(Embodiment) An embodiment of the present invention will be described with reference to the drawings. In FIGS. 3 and 4, reference numeral (1) denotes an exciting body made of an exciting coil or a permanent magnet, and (2) and (2) The N pole and the S pole are provided on both outer sides of the exciter (1) in the front-rear direction.
A pair of magnetic pole plates excited by the poles, (3) a crucible containing the evaporating substance (4) and provided between the magnetic pole plates (2) and (2), and (5) a crucible (3) FIG. 2 shows an electron gun provided at the front lower side of the crucible (3) in which an output electron beam (6) from the electron gun (5) is bent by the action of the magnetic field of the magnetic pole plates (2) and (2). The evaporating substance (4) is heated and evaporated by being guided from the upper front of the navel. Such a configuration is the same as the conventional one. When the exciting body (1) is a coil and the current value to the coil is changed, the output electron beam (6) can be moved before and after the crucible (3). Further, a pair of left and right auxiliary excitation coils (7) are provided along the path of the beam (6), and are alternately excited to excite the beam (6).
Can be moved to the left and right of the crucible (3).
しかし乍ら以上の構成では出力電子ビーム（６）はる
つぼ（３）の上面から側方への軌跡を描き、その内部の
蒸発物質（４）が昇華物である場合、蒸発の進行に伴な
い蒸発物質（４）に横穴が形成される不都合があるが、
本発明に於ては、第４図に見られるように、るつぼ
（３）の下方に磁極板（２）（２）による磁界の方向と
逆方向の磁界を発生する電磁石又は永久磁石からなる制
御磁石（８）を設けてるつぼ（３）内の磁界を減少さ
せ、出力電子ビーム（６）の彎曲率を緩和してるつぼ
（３）の上面から下面へ直進するようにした。これによ
り昇華物の蒸発物質（４）に蒸発の進行で形成される穴
はるつぼ（３）の上下方向となり、穴の奥部から直上へ
途中で流れが乱されることなく蒸発出来、その上方の基
板に均一な膜厚分布で薄膜を形成しその再現性も良好と
なし得る。However, in the above configuration, the output electron beam (6) draws a trajectory from the upper surface of the crucible (3) to the side, and when the evaporating substance (4) in the inside is a sublimate, it is accompanied by the progress of evaporation. There is a disadvantage that a horizontal hole is formed in the evaporant (4).
In the present invention, as shown in FIG. 4, a control comprising an electromagnet or a permanent magnet for generating a magnetic field in the direction opposite to the direction of the magnetic field by the magnetic pole plates (2) and (2) below the crucible (3). The magnetic field in the crucible (3) provided with the magnet (8) is reduced, the curvature of the output electron beam (6) is reduced, and the crucible (3) goes straight from the upper surface to the lower surface. As a result, the hole formed in the evaporating substance (4) of the sublimate by the progress of evaporation is in the vertical direction of the crucible (3), and can evaporate from the inner part of the hole to the upper part without disturbing the flow on the way. A thin film is formed on the substrate with a uniform film thickness distribution, and the reproducibility can be made good.
（発明の効果） 以上のように本発明では、電子銃の出力電子ビームを
励極板の磁界によりるつぼへと導くようにした蒸発源に
於て、該るつぼの下方に該励磁板の磁界を減少させる制
御磁石を設けて該るつぼ内の出力電子ビームの彎曲率を
緩和するようにしたので、昇華物の蒸発物質の蒸発に際
してその蒸発跡が彎曲した横穴となる不都合を解消出
来、蒸着により形成される膜厚の分布を均一化し再現性
も向上させ得る等の効果がある。(Effect of the Invention) As described above, according to the present invention, in the evaporation source in which the output electron beam of the electron gun is guided to the crucible by the magnetic field of the excitation plate, the magnetic field of the excitation plate is provided below the crucible. By providing a control magnet to decrease the curvature of the output electron beam in the crucible, the inconvenience of the evaporation traces forming a curved horizontal hole when evaporating the sublimate evaporation material can be eliminated, and the formation by vapor deposition This has the effect of making the distribution of the film thickness uniform and improving the reproducibility.
第１図は従来例の斜視図、第２図は従来例の断面図、第
３図は本考案の実施例の断面図、第４図は第３図のIV−
IV線断面図である。 （１）……励磁体、（２）（２）……磁極板 （３）……るつぼ、（５）……電子銃 （６）……出力電子ビーム、（８）……制御磁石1 is a perspective view of a conventional example, FIG. 2 is a cross-sectional view of a conventional example, FIG. 3 is a cross-sectional view of an embodiment of the present invention, and FIG.
FIG. 4 is a sectional view taken along line IV. (1) Exciting body (2) (2) Magnetic pole plate (3) Crucible (5) Electron gun (6) Output electron beam (8) Control magnet
Claims (1)
１対の磁極板間に、るつぼとその前方下側の電子銃とを
設け、該電子銃の出力電子ビームを両磁極板間の磁界の
作用により彎曲させてるつぼ内にその前面上側から導か
せるようにしたものに於て、該るつぼの下方に、前記磁
極板による磁界と逆方向の磁界を発生する永久磁石等の
制御磁石を設けて該るつぼ内の出力電子ビームの彎曲率
を緩和したことを特徴とする電子ビーム蒸発源装置。A crucible and an electron gun at the lower front of the crucible are provided between a pair of left and right magnetic pole plates on both outer sides of an exciting coil and other exciters, and an output electron beam of the electron gun is applied between the two magnetic pole plates. A control magnet such as a permanent magnet that generates a magnetic field in a direction opposite to the magnetic field generated by the magnetic pole plate is provided below the crucible in a crucible that is bent by the action of a magnetic field. An electron beam evaporation source device, wherein a curvature of an output electron beam in the crucible is reduced.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62092039A JP2591950B2 (en) | 1987-04-16 | 1987-04-16 | Electron beam evaporation source device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62092039A JP2591950B2 (en) | 1987-04-16 | 1987-04-16 | Electron beam evaporation source device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63259074A JPS63259074A (en) | 1988-10-26 |
| JP2591950B2 true JP2591950B2 (en) | 1997-03-19 |
Family
ID=14043388
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62092039A Expired - Fee Related JP2591950B2 (en) | 1987-04-16 | 1987-04-16 | Electron beam evaporation source device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2591950B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP2075352B1 (en) * | 2006-09-22 | 2013-07-24 | Ulvac, Inc. | Vacuum processing system |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61194172A (en) * | 1985-02-21 | 1986-08-28 | Sumitomo Electric Ind Ltd | Electron beam heater for vapor deposition device |
-
1987
- 1987-04-16 JP JP62092039A patent/JP2591950B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPS63259074A (en) | 1988-10-26 |
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