JP2602266B2 - Laser marker and laser oscillator using the same - Google Patents
Laser marker and laser oscillator using the sameInfo
- Publication number
- JP2602266B2 JP2602266B2 JP63021996A JP2199688A JP2602266B2 JP 2602266 B2 JP2602266 B2 JP 2602266B2 JP 63021996 A JP63021996 A JP 63021996A JP 2199688 A JP2199688 A JP 2199688A JP 2602266 B2 JP2602266 B2 JP 2602266B2
- Authority
- JP
- Japan
- Prior art keywords
- liquid crystal
- laser
- crystal mask
- laser beam
- time
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/06—Apparatus for monitoring, sorting, marking, testing or measuring
- H10P72/0614—Marking devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
- B23K26/066—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms by using masks
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B44—DECORATIVE ARTS
- B44B—MACHINES, APPARATUS OR TOOLS FOR ARTISTIC WORK, e.g. FOR SCULPTURING, GUILLOCHING, CARVING, BRANDING, INLAYING
- B44B7/00—Machines, apparatus or hand tools for branding, e.g. using radiant energy such as laser beams
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1313—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells specially adapted for a particular application
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/106—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity
- H01S3/1065—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity using liquid crystals
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2101/00—Articles made by soldering, welding or cutting
- B23K2101/007—Marks, e.g. trade marks
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Nonlinear Science (AREA)
- Electromagnetism (AREA)
- Plasma & Fusion (AREA)
- Liquid Crystal (AREA)
- General Physics & Mathematics (AREA)
- Mechanical Engineering (AREA)
- Laser Beam Processing (AREA)
Description
本発明は、被加工物にパターン情報を刻印するパター
ンマスクに液晶素子を使用したレーザマーカ及びそのを
利用したレーザ発振器に関する。The present invention relates to a laser marker using a liquid crystal element as a pattern mask for imprinting pattern information on a workpiece and a laser oscillator using the same.
一般に被加工物たとえば電子部品は、その製造番号、
製造年月日、名称等の符号を刻印し、出所を明示してい
る。従来、明示方法はエツチングにより、金属板にパタ
ーン情報である符号に相当する貫通穴をあけて、パター
ンマスクを形成している。パターンマスクは電子部品に
当接し、ペイントをパターンマスクに塗布後、パターン
マスクを除去すれば、符号が電子部品に附着する。この
方法によれば、電子部品の種類が変る毎に適宜なパター
ンマスクに取換える必要があり、多大な取換時間と多数
のパターンマスクを用意しなければならない欠点があつ
た。 そこで、特開昭60−174671号公報に示されたレーザマ
ーカは、パターンマスクとして液晶素子を使用し、液晶
素子をレーザ発振器と被加工物との間に配置し、液晶素
子の表示部に被加工物に刻印すべき符号の電圧を印加
し、レーザ発振器からレーザビームを照射すれば、符号
を通過して来たレーザビームのみが偏光板を通過して、
被加工物を照射し、符号を刻印している。 しかしながら、この刻印は鮮明に出来る場合と、鮮明
に出来ない場合とがある。この原因について、本発明者
が種々検討した結果、次のことがわかつた。 第7図は液晶素子13の動作状態を示すものである。第
7図(A)は電圧印加していない場合で、液晶分子13
は、電極13A間でねじれた(ツイスト)状態になつてい
る。この為、入射した直線偏光(例えばP偏光)のレー
ザ光12Aは偏光面が90度回転した直線偏光のレーザ光12B
となつて射出する。Generally, a work piece, for example, an electronic component has its serial number,
The date of manufacture, the name and other symbols are engraved to indicate the source. Conventionally, in a clear method, a pattern mask is formed by etching a metal plate to form a through-hole corresponding to a code as pattern information. The pattern mask is in contact with the electronic component, and after the paint is applied to the pattern mask, if the pattern mask is removed, the code is attached to the electronic component. According to this method, it is necessary to replace the pattern mask with an appropriate one each time the type of electronic component changes, which has disadvantages that a large replacement time and a large number of pattern masks must be prepared. Therefore, the laser marker disclosed in Japanese Patent Application Laid-Open No. Sho 60-174671 uses a liquid crystal element as a pattern mask, arranges the liquid crystal element between a laser oscillator and a workpiece, and processes the liquid crystal element on a display portion of the liquid crystal element. If the voltage of the sign to be imprinted on the object is applied and the laser beam is irradiated from the laser oscillator, only the laser beam that has passed the sign passes through the polarizing plate,
The workpiece is illuminated and the reference mark is engraved. However, there are cases where this marking can be made clear and cases where it cannot be made clear. As a result of various studies by the present inventors on the cause, the following has been found. FIG. 7 shows the operation state of the liquid crystal element 13. FIG. 7A shows a case where no voltage is applied, and the liquid crystal molecules 13 are not applied.
Is in a twisted state between the electrodes 13A. Therefore, the incident linearly-polarized (for example, P-polarized) laser light 12A is converted into a linearly-polarized laser light 12B whose polarization plane is rotated by 90 degrees.
And eject.
第7図(B)では液晶電源スイツチ25を閉じて、電源
29の電圧が電極13A間に印加されている状態を示す。液
晶分子13Bは電界Eの方向に伸ばされた所謂動作状態に
なる。この状態ではレーザ光12Aの偏光面は回転せず、
そのままで通過する。 電源スイツチ25を閉じてから、液晶分子が動作状態に
なるまでの応答時間、動作状態から元のねじれた状態に
もどる時間は液晶分子の種類にもよるが0.2〜0.5秒を要
する為、この時間にまたがつてレーザ光12Aが照射され
ると、レーザ光12Aは楕円偏光となつて射出する。そし
て、その後に配置された偏光板によつて、本来通過すべ
きレーザ光12Aの一部がさえぎられる為、光量が減少
し、被加工物に鮮明な符号が刻印できない。 また移動して来る被加工物に対応した所望のパターン
情報を刻印する点に配慮が払われていなかった。 本発明の目的は、移動いて来る被加工物に同一情報を
多数の被加工物に液晶マスクを交換すること無く、鮮明
に刻印することができるようにしたので、刻印作業効率
を向上したレーザマーカ及びそれを利用したレーザ発振
器を提供することにある。 本発明の他の目的は、移動いて来る多数の被加工物の
同じ個所に正確に刻印できる製品管理に適したレーザマ
ーカを提供することにある。In FIG. 7B, the liquid crystal power switch 25 is closed and the power
This shows a state where a voltage of 29 is applied between the electrodes 13A. The liquid crystal molecules 13B are in a so-called operating state extended in the direction of the electric field E. In this state, the polarization plane of the laser beam 12A does not rotate,
Pass as it is. Since the response time from when the power switch 25 is closed to when the liquid crystal molecules enter the operating state and the time to return from the operating state to the original twisted state depend on the type of liquid crystal molecules, it takes 0.2 to 0.5 seconds. When the laser beam 12A is irradiated over the laser beam, the laser beam 12A is emitted as elliptically polarized light. Then, a part of the laser beam 12A that should pass through is intercepted by the polarizing plate disposed thereafter, so that the amount of light decreases, and a clear code cannot be imprinted on the workpiece. Further, no consideration has been given to engraving desired pattern information corresponding to the moving workpiece. SUMMARY OF THE INVENTION An object of the present invention is to make it possible to clearly mark the same information on a moving workpiece without replacing a liquid crystal mask on a large number of workpieces, so that a laser marker with improved marking work efficiency and It is to provide a laser oscillator utilizing the same. Another object of the present invention is to provide a laser marker suitable for product management that can accurately mark the same location on a large number of moving workpieces.
【課題を解決するための手段] 本発明のレーザマーカにおける制御部は、情報を表示
した液晶マスクの動作時間t4を、少なくとも1パルスレ
ーザビームの照射時間t2以上保持し、その間にパルスレ
ーザビームを停止時間t1′の間隔で上記液晶マスクに複
数回照射すると共に、停止時間t1′と照射時間t2との関
係をt1′>t2になるように制御する。 【作用】 前者において、t1′>t2の関係より、パルスレーザビ
ームを液晶マスクに繰返し複数回照射しても、停止時間
t1′の方を照射時間t2より長くし、この間に液晶マスク
を冷却して温度上昇に伴う液晶マスクの電気光学特性の
劣化を抑え、液晶マスクを交換すること無く、同一情報
を鮮明に刻印した多数の被加工物を加工することが出来
るようになり、刻印作業効率が著しく向上した。 又後者においては、レーザビーム照射位置に来た時に
複数の被加工物の同個所に所望の情報を正確に刻印が出
来ると共に、多数の被加工物の管理に適した刻印をする
ことが出来るようになった。Means for Solving the Problems] controller in the laser marker of the present invention, the operating time t 4 of the liquid crystal mask displays information, holds at least one pulsed laser beam irradiation time t 2 or more, pulsed laser beam during the 'irradiates a plurality of times to the liquid crystal mask at intervals, t 1 downtime' stop time t 1 is controlled to be a relationship between the irradiation time t 2 and to t 1 '> t 2. [Effect] In the former case, the stop time is maintained even when the liquid crystal mask is repeatedly irradiated with the pulse laser beam a plurality of times because of the relationship of t 1 ′> t 2
t 1 ′ is longer than irradiation time t 2 , during which time the liquid crystal mask is cooled to suppress the deterioration of the electro-optical characteristics of the liquid crystal mask due to temperature rise, and the same information can be clearly seen without replacing the liquid crystal mask A large number of engraved workpieces can be processed, and the engraving efficiency has been significantly improved. Also, in the latter, when the laser beam irradiation position is reached, desired information can be accurately engraved on the same place of a plurality of workpieces, and an engraving suitable for management of a large number of workpieces can be performed. Became.
【請求項第1項及び第2項の実施例】 以下、本発明の実施例を第1図ないし第3図により説
明する。 パルスレーザ発振器11たとえばYAGに代表される固体
レーザからのパルスレーザビーム12の例えばP偏光12A
が液晶素子13を照射する。液晶素子13は電極13Aに電圧
を印加した場合に表示部13Dにパターン情報たとえば符
号6を表示する。 この状態で、P偏光12Aが表示部13Dを照射すると、P
偏光12Aは符号6をそのまま通過するが、符号6以外を
通過するP偏光12Aは90゜偏光面のS偏光12Bとなつて通
過する。これらの偏光が偏光板14を照射する。S偏光12
Bは偏光板14で反射されて、吸収板15に吸収される。偏
光板14を素通りしたP偏光12Aは、集光用光学レンズ16
を通り、被加工物である電子部品17に符号6を刻印す
る。電子部品17は図示していないがベルトコンベアで矢
印方向Yに移動している。P偏光12Aと電子部品17との
同期タイミングは、第3図に示す制御部20により行う。 制御部20は次のように構成されている。 制御卓21は操作部21Aおよび表示部21Bを有し、操作部
21Aで符号6を入力すると、表示部21Bに符号6を表示す
ると共に、この入力信号は励磁コイル23および第1タイ
マ24および第2タイマ28に流れる。励磁コイル23を励磁
すれば、液晶電源スイツチ25を閉じる。液晶電源スイツ
チ25は液晶素子13の各セグメント13Sに1個ずつ取付け
てあり、液晶電源スイツチ25を閉じて、交流電源29から
第3図(a)に示す印加電圧Vを電極13A間に印加する
と、後述する液晶操作回路31を介して、液晶素子13を駆
動する。 液晶素子13は第7図(A),(B)に示す如く、液晶
分子13Cがねじれた無電圧状態から電極間に電圧Vを印
加し、液晶分子13Bが一方向に配列された動作状態とな
る。動作状態を維持する時間は第3図(b)に示す如く
動作時間t4である。応答時間t3は液晶分子の状態が液晶
分子13Cから液晶分子13Bになるまでの時間である。復帰
時間t5は液晶分子13Bから液晶分子13Cに復帰するまでの
時間である。 第1タイマ24は応答時間t3と復帰時間t5との間は動作
せず、動作時間t4のときのみ動作する。レーザスイツチ
26を閉じると、第2図に示すレーザ操作回路32を介して
パルス電源27によりパルスレーザ発振器11の図示してい
ない電極間に電圧を印加し、パルスレーザ発振器11より
P偏光12Aを第3図(d)に示す照射時間t2だけ照射す
る。第2タイマ28は照射時間t2のみ動作をし、停止時間
t1,t1′の時は動作をしない。第2タイマ28が動作をす
る時に制御卓21と液晶電源スイツチ25との間に設けた保
持回路30が働き、その作用は後述する。 次に、制御部20の作用について説明する。 操作部21Aより符号6に相当する入力信号を入力し、
操作入力接点31A,31Bを閉じる。第1タイマ24は停止つ
まり遅延しているが、励磁コイル23は励磁され、補助接
点23Aが閉じて、液晶側の第1励磁コイル33が励磁され
るので、液晶電源スイツチ25を閉じる。液晶素子13に第
3図(a)に示す印加電圧(V)が印加される。液晶素
子13は無電圧状態から印加電圧(V)を印加し応答時間
t3を経て動作時間t4になると、液晶分子13Bが動作状態
になっている。 この状態で第1タイマ24が動作をして、補助接点24A
を閉じて、レーザ側の第2励磁コイル36を励磁して、レ
ーザスイツチ26を閉じ、パルス電源部27よりパルス電圧
をパルスレーザ発振器11に印加する。 パルスレーザ発振器11で発生したP偏光12Aは、第3
図(d)に示す如く液晶素子13を照射時間t2だけ照射す
る。この結果、電圧が印加されている液晶部分を通過す
るレーザ光は、直線偏光(P偏光)で取り出されるの
で、電子部品17に鮮明な符号6を刻印できるので、電子
部品17の刻印の歩留まりが著しく向上した。 このように、本発明では第1タイマ24でレーザスイツ
チ26の動作時間を液晶電源スイツチ25の動作時間より遅
らせて動作させて、液晶素子13が完全な動作時間t4の時
にP偏光12Aを照射させる様構成しているので、応答時
間t3あるいは復帰時間t5内にP偏光12Aが照射された場
合のように直線偏光→楕円偏光への変換が起らない。 その結果、レーザ光の強度が減少せず、電子部品17に
鮮明な符号6を刻印できるので、電子部品17の刻印の歩
留まりを向上することが出来るようになった。このこと
は、制御部20で液晶マスク13に表示されるパターン情報
の書替え作業に伴う液晶分子の応答時間t4と復帰時間t5
にはレーザビーム12Aを非照射に制御しているからであ
る。 また上述の実施例では第1タイマ24によりレーザスイ
ツチ26を遅延させたが、第1タイマ24を使用することな
く、手動で液晶電源スイツチ25を閉じた後、動作時間t4
を保持している間に、レーザスイツチ26を閉じてもよ
い。 その後、操作部21Aの入力信号を切つた後、再び操作
部より異なつて符号を入力し、上述と同様な作業を行な
えば電子部品に異なつた符号を鮮明に刻印出来るので、
電子部品17に応じた異なった符号を電子部品17に連続的
に刻印することが出来るようになった。 一方、多数の電子部品17に同一符号とたとえば6を刻
印する場合、操作部21Aで符号6を入力すると、鎖線で
示す保持回路30が働き、保持接点30A,30Bを閉じるが、
第2タイマ28は停止している。第1励磁コイル33は励磁
し、液晶電源スイツチ25を閉じて、液晶素子13は第3図
(c)に示す動作時間t4を維持した動作状態になると、
第2タイマ28は動作をして、補助接点28Aを閉じると、
上述と同様にP偏光12Aを照射時間t2だけ照射後、第2
タイマ28が時間t1′だけ停止し、その後、第2タイマ28
が再び動作を行う作業を繰り返すことにより、液晶マス
ク13の電気光学特性が劣化しないのは、t1′>t2の関係
より、パルスレーザビームを液晶マスク13に繰返し複数
回照射しても、停止時間t1′の方が照射時間t2より長く
し、液晶マスク13を冷却して温度上昇に伴う液晶マスク
13の電気光学特性の劣化を抑え、液晶マスク13を交換す
ることなく、同一情報を鮮明に刻印した多数の被加工物
を加工することが出来るようになり、刻印作業効率が著
しく向上した。An embodiment of the present invention will be described below with reference to FIGS. 1 and 3. FIG. For example, a P-polarized light 12A of a pulsed laser beam 12 from a solid-state laser represented by a pulsed laser oscillator 11 such as YAG
Illuminates the liquid crystal element 13. When a voltage is applied to the electrode 13A, the liquid crystal element 13 displays pattern information, for example, reference numeral 6 on the display unit 13D. In this state, when the P-polarized light 12A irradiates the display unit 13D,
The polarized light 12A passes through the code 6 as it is, but the P-polarized light 12A passing through other than the code 6 passes as the S-polarized light 12B having a 90 ° polarization plane. These polarized lights irradiate the polarizing plate 14. S-polarized light 12
B is reflected by the polarizing plate 14 and absorbed by the absorbing plate 15. The P-polarized light 12A that has passed through the polarizing plate 14 is
, The reference numeral 6 is stamped on the electronic component 17 which is the workpiece. Although not shown, the electronic component 17 is moving in the arrow direction Y on a belt conveyor. The synchronization timing between the P-polarized light 12A and the electronic component 17 is performed by the control unit 20 shown in FIG. The control unit 20 is configured as follows. The control console 21 has an operation unit 21A and a display unit 21B.
When reference numeral 6 is input at 21A, reference numeral 6 is displayed on the display section 21B, and this input signal flows to the exciting coil 23, the first timer 24, and the second timer 28. When the exciting coil 23 is excited, the liquid crystal power switch 25 is closed. One liquid crystal power switch 25 is attached to each segment 13S of the liquid crystal element 13. When the liquid crystal power switch 25 is closed and an applied voltage V shown in FIG. The liquid crystal element 13 is driven via a liquid crystal operation circuit 31 described later. As shown in FIGS. 7A and 7B, the liquid crystal element 13 applies a voltage V between the electrodes from the non-voltage state in which the liquid crystal molecules 13C are twisted to the operation state in which the liquid crystal molecules 13B are arranged in one direction. Become. Time for maintaining the operating state is the operating time t 4 as shown in FIG. 3 (b). Response time t 3 is the time until the state of the liquid crystal molecules of a liquid crystal molecules 13C to the liquid crystal molecules 13B. Recovery time t 5 is the time from the liquid crystal molecules 13B until returning to the liquid crystal molecules 13C. The first timer 24 is not operated during the return time t 5 the response time t 3, operates only when the operation time t 4. Laser switch
When 26 is closed, a voltage is applied between electrodes (not shown) of the pulse laser oscillator 11 by a pulse power supply 27 via a laser operation circuit 32 shown in FIG. irradiated by the irradiation time t 2 shown in (d). The second timer 28 and the operation only irradiation time t 2, the stop time
No operation is performed at t 1 and t 1 ′. When the second timer 28 operates, the holding circuit 30 provided between the control console 21 and the liquid crystal power switch 25 operates, and the operation will be described later. Next, the operation of the control unit 20 will be described. An input signal corresponding to reference numeral 6 is input from the operation unit 21A,
The operation input contacts 31A and 31B are closed. Although the first timer 24 is stopped or delayed, the exciting coil 23 is excited, the auxiliary contact 23A is closed, and the first exciting coil 33 on the liquid crystal side is excited, so that the liquid crystal power switch 25 is closed. An applied voltage (V) shown in FIG. 3 (a) is applied to the liquid crystal element 13. The liquid crystal element 13 applies the applied voltage (V) from the no-voltage state and responds
Operations When the time t 4 through t 3, the liquid crystal molecules 13B is in the operating state. In this state, the first timer 24 operates, and the auxiliary contact 24A
Is closed, the second excitation coil 36 on the laser side is excited, the laser switch 26 is closed, and a pulse voltage is applied to the pulse laser oscillator 11 from the pulse power supply unit 27. The P-polarized light 12A generated by the pulse laser oscillator 11
The liquid crystal element 13 as shown in (d) of FIG irradiated by the irradiation time t 2. As a result, the laser light passing through the liquid crystal portion to which the voltage is applied is extracted as linearly polarized light (P-polarized light), so that a clear code 6 can be imprinted on the electronic component 17, and the yield of the imprint of the electronic component 17 can be reduced. Significantly improved. Thus, the present invention irradiates the operation time by operating to delay than the operation time of the liquid crystal power switch 25, P-polarized light 12A when the liquid crystal element 13 is fully operating time t 4 of Rezasuitsuchi 26 in the first timer 24 since the structure as to be, is not occur conversion into linear polarization → elliptical polarization as in the case of P-polarized light 12A in response time t 3 or recovery time t 5 is irradiated. As a result, the intensity of the laser beam does not decrease, and a clear code 6 can be imprinted on the electronic component 17, so that the yield of the imprint of the electronic component 17 can be improved. This means that the response time t 4 and the recovery time t 5 of the liquid crystal molecules accompanying the rewriting operation of the pattern information displayed on the liquid crystal
This is because the laser beam 12A is controlled to be non-irradiated. In the above-described embodiment, the laser switch 26 is delayed by the first timer 24. However, after the liquid crystal power switch 25 is manually closed without using the first timer 24, the operation time t 4
The laser switch 26 may be closed while holding the switch. After that, after cutting off the input signal of the operation unit 21A, a different code is input again from the operation unit, and if the same operation as described above is performed, the different code can be clearly engraved on the electronic component.
A different code corresponding to the electronic component 17 can be continuously imprinted on the electronic component 17. On the other hand, when the same code and, for example, 6 are engraved on a large number of electronic components 17, when the code 6 is input by the operation unit 21A, the holding circuit 30 indicated by a chain line operates and the holding contacts 30A and 30B are closed.
The second timer 28 is stopped. The first excitation coil 33 is excited to close the liquid crystal power switch 25, the liquid crystal element 13 comes to operating state of maintaining the operating time t 4 when shown in FIG. 3 (c),
When the second timer 28 operates and closes the auxiliary contact 28A,
After the same manner as described above irradiated P-polarized light 12A only the irradiation time t 2, the second
The timer 28 stops for the time t 1 ′, and then the second timer 28
By repeating the operation of performing the operation again, the electro-optical characteristics of the liquid crystal mask 13 are not degraded because of the relationship of t 1 ′> t 2 even if the pulse laser beam is repeatedly irradiated on the liquid crystal mask 13 a plurality of times. The stop time t 1 ′ is longer than the irradiation time t 2 , and the liquid crystal mask 13 is cooled to increase the temperature of the liquid crystal mask.
Thus, it is possible to process a large number of workpieces on which the same information is clearly imprinted without replacing the liquid crystal mask 13, thereby significantly improving the engraving work efficiency.
【請求項第3項の実施例】 この実施例で矢印方向Yに進んでいる電子部品17は、
レーザビーム照射位置X1でP偏光12Aを照射する必要が
ある。位置X2からレーザビーム照射位置X1に移動する時
に時間t3,t5又は時間t1,t1′に合せて、矢印方向Yたと
えばベルトコンベアの速度を調整すれば、上述の時間で
はパルスレーザ発振器11は停止している停止時間を利用
していることになり、刻印作業の能率を落すことなく、
正確に刻印作業が出来る利点がある。 このことは、レーザビーム照射位置X1で電子部品17が
一旦停止した状態で、P偏光12Aを照射する時には、照
射時間t2以外の時間t1,t1′,t3,t5で停止するように、
Yの速度、各タイマの時間を調整すれば、刻印作業の能
率を上げることができる。各タイマの時間を調整すれ
ば、移動して来る多数の電子部品に対応した所望のパタ
ーン情報を連続的に刻印した多数の電子部品の管理を正
確にすることが出来る。 又電子部品17が位置X2を通過時より所定時間後のレー
ザビーム照射位置X1でレーザビームを電子部品17に照射
すると、多数の電子部品17の同じ個所に正確にパターン
情報を刻印することが出来るので、パターン情報を刻印
した電子部品17の歩留まりが著しく向上をした。3. An electronic component 17 traveling in a direction indicated by an arrow Y in this embodiment.
It is necessary to irradiate the P-polarized light 12A with a laser beam irradiation position X 1. The combined from the position X 2 to time t 3, t 5 or time t 1, t 1 'when moving the laser beam irradiation position X 1, by adjusting the speed of the arrow direction Y for example a belt conveyor, a pulse is above time The laser oscillator 11 uses the stop time during which it is stopped, without reducing the efficiency of the engraving work,
There is an advantage that the stamping operation can be performed accurately. This is a state where the electronic component 17 by the laser beam irradiation position X 1 is stopped temporarily, when irradiated with P-polarized light 12A, the time other than the irradiation time t2 t 1, t 1 ', stops at t 3, t 5 like,
By adjusting the speed of Y and the time of each timer, the efficiency of the engraving operation can be increased. By adjusting the time of each timer, it is possible to accurately manage a large number of electronic components in which desired pattern information corresponding to a large number of moving electronic components is continuously imprinted. Also when the electronic component 17 is irradiated on the electronic component 17 with the laser beam at the laser beam irradiation position X 1 after a predetermined time from the time of passing through the position X 2, be engraved accurately pattern information in the same location of the large number of electronic components 17 As a result, the yield of the electronic component 17 on which pattern information is imprinted is significantly improved.
【請求項第4項の実施例】 第4図は液晶素子13の一部に液晶動作表示部40を設
け、液晶動作表示部に参照光41および検出器42を接続
し、参照光41の透過参照光の透過量が液晶マスク13の応
答時間に関係する。 即ち、透過量が大くれば、温度が高くなり、液晶マス
ク13の応答時間が早くなり、また透過量が少なくれば、
上述と逆になり、液晶マスク13の応答時間の変化を制御
卓21で所定の応答時間になるように是正することによ
り、検出器42を接続し、周囲温度の変化による液晶素子
13の応答時間が変化しても、これを検出器42で検出し、
制御卓21で是正することにより、透過量を一定にして被
加工物に鮮明にパターン情報を刻印することができる。FIG. 4 shows a liquid crystal element 13 having a liquid crystal operation display section 40, a reference light 41 and a detector 42 connected to the liquid crystal operation display section, and a transmission of the reference light 41. The transmission amount of the reference light is related to the response time of the liquid crystal mask 13. That is, if the transmission amount is large, the temperature is high, the response time of the liquid crystal mask 13 is fast, and if the transmission amount is small,
Contrary to the above, the control console 21 corrects the change in the response time of the liquid crystal mask 13 so that the response time becomes a predetermined response time.
Even if the response time of 13 changes, this is detected by the detector 42,
Correction by the control console 21 makes it possible to imprint the pattern information on the workpiece with a constant transmission amount.
【請求項第5項の実施例】 第5,6図の実施例では液晶素子13、偏光板14を固体レ
ーザ発振器47内に配置した場合である。励起ランプ44で
レーザロツド43を励起することにより発生したP偏光12
Aは、液晶表示素子13により、一部は液晶表示素子13の
パターン情報を含む(有り)レーザ光のP偏光12Aとな
り、残りは偏光面が90゜回転したパターン情報を含まな
い(無し)レーザ光のS偏光12Bに変換される。両者は
偏光板14により分離され、P偏光12Aは結像光学系16に
より、電子部品17上に結像し、刻印を行う。 一方、S偏光12Bは反射鏡46で反射され、偏光板14を
逆方向に進み、液晶素子13によりS偏光からP偏光に変
換され、レーザロツド43を経て全反射鏡45に至り、折り
返えされて、増幅された後、液晶素子13に向う。この実
施例で励起ランプ44の両端および液晶素子13は、第2図
ないし第3図と同構造の制御部20に接続している。 第6図の実施例は第5図の変形例で反射鏡46と集光々
学系16、電子部品17の配置を入れ替えたもので、全反射
鏡45、反射鏡46が一直線上に並ぶので、光学的な調節が
容易となる。 このように第5図及び第6図の構成では、レーザロツ
ド43をはさんで、光学的に向い合つた反射鏡46と全反射
鏡45により光共振器を構成し、今まで利用していなかつ
たS偏光12Bをレーザロツド43へ戻すようにしたので、
マスク式レーザマーカの欠点であるレーザ光の利用率の
低さ(通常はレーザ装置から射出される光の20〜30%が
刻印に使用され、残りは散乱熱などにより失われてい
る)を大幅に改善できる。5. Embodiment 5 In the embodiment shown in FIGS. 5 and 6, a liquid crystal element 13 and a polarizing plate 14 are arranged in a solid-state laser oscillator 47. FIG. P-polarized light 12 generated by exciting laser rod 43 with excitation lamp 44
A is a P-polarized light 12A of a laser beam partially including (including) the pattern information of the liquid crystal display element 13 by the liquid crystal display element 13, and the rest is not including (not including) the pattern information obtained by rotating the polarization plane by 90 °. The light is converted to S-polarized light 12B. Both are separated by a polarizing plate 14, and the P-polarized light 12A forms an image on an electronic component 17 by an image forming optical system 16 and performs marking. On the other hand, the S-polarized light 12B is reflected by the reflecting mirror 46, travels through the polarizing plate 14 in the opposite direction, is converted from S-polarized light to P-polarized light by the liquid crystal element 13, reaches the total reflecting mirror 45 via the laser rod 43, and is folded back. After being amplified, it goes to the liquid crystal element 13. In this embodiment, both ends of the excitation lamp 44 and the liquid crystal element 13 are connected to the control unit 20 having the same structure as that shown in FIGS. The embodiment shown in FIG. 6 is a modification of FIG. 5 in which the arrangement of the reflecting mirror 46, the focusing system 16, and the electronic components 17 is exchanged, and the total reflecting mirror 45 and the reflecting mirror 46 are aligned. , Optical adjustment becomes easy. As described above, in the configuration of FIGS. 5 and 6, an optical resonator is constituted by the optically facing reflecting mirror 46 and the total reflecting mirror 45 with the laser rod 43 interposed therebetween, and has not been used until now. Since the S-polarized light 12B is returned to the laser rod 43,
Significantly reduces the low utilization rate of laser light, which is a drawback of masked laser markers (usually 20 to 30% of the light emitted from the laser device is used for marking, and the rest is lost due to scattered heat, etc.) Can be improved.
以上のように、本発明のレーザマーカによれば、パル
スレーザビームを液晶マスク13に繰返し複数回照射きて
も、停止時間t1′の方が照射時間t2より長くし、液晶マ
スク13を冷却して温度上昇に伴う液晶マスク13の電気光
学特性の劣化を抑え、液晶マスク13を交換することな
く、同一情報を鮮明に刻印した多数の製品を加工するこ
とが出来るようになり、刻印作業効率が著しく向上し
た。又多数の製品の同じ個所に正確に刻印をすることが
出来るようになり、更に情報を刻印した製品の歩留が著
しく向上をした。As described above, according to the laser marker of the present invention, even when the liquid crystal mask 13 is repeatedly irradiated with the pulse laser beam a plurality of times, the stop time t 1 ′ is longer than the irradiation time t 2 and the liquid crystal mask 13 is cooled. As a result, the deterioration of the electro-optical characteristics of the liquid crystal mask 13 due to the temperature rise is suppressed, and it is possible to process many products with the same information clearly engraved without replacing the liquid crystal mask 13, and the engraving work efficiency Significantly improved. In addition, it is possible to accurately imprint the same location on a large number of products, and the yield of products on which information is imprinted is significantly improved.
第1図および第2図は本発明の実施例であるレーザマー
カの概略説明図および等価回路図、第3図(a)ないし
(d)は第1図および第2図の動作特性図、第4図ない
し第6図は本発明の他の実施例であるレーザマーカの概
略説明図、第7図(a),(b)は従来の液晶素子の動
作説明図である。 11……パルスレーザ発振器、13……液晶素子、24……第
1タイマ、25……液晶電源スイツチ、26……レーザスイ
ツチ。FIGS. 1 and 2 are schematic explanatory diagrams and an equivalent circuit diagram of a laser marker according to an embodiment of the present invention, FIGS. 3 (a) to 3 (d) are operating characteristic diagrams of FIGS. 1 and 2, and FIG. FIGS. 6 to 6 are schematic explanatory views of a laser marker according to another embodiment of the present invention, and FIGS. 7 (a) and 7 (b) are operational explanatory views of a conventional liquid crystal element. 11 ... pulse laser oscillator, 13 ... liquid crystal element, 24 ... first timer, 25 ... liquid crystal power switch, 26 ... laser switch.
───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 昭56−38888(JP,A) 特開 昭62−24884(JP,A) 特開 昭61−108488(JP,A) ────────────────────────────────────────────────── ─── Continuation of the front page (56) References JP-A-56-38888 (JP, A) JP-A-62-24884 (JP, A) JP-A-61-108488 (JP, A)
Claims (5)
スクに照射し、該液晶マスクに表示された情報を被加工
物上に転写するレーザマーカにおいて、液晶マスクに表
示されたパターン情報とレーザ発振器からレーザビーム
とを制御する制御部を設け、 前記制御部は情報を表示した液晶マスクの動作時間t
4を、少なくとも1パルスレーザビームの照射時間t2以
上保持し、その間にパルスレーザビームを停止時間t1′
の間隔で上記液晶マスクに複数回照射すると共に、停止
時間t1′と照射時間t2との関係をt1′>t2になるように
制御することを特徴とするレーザマーカ。1. A laser marker which irradiates a laser beam from a laser oscillator onto a liquid crystal mask and transfers information displayed on the liquid crystal mask onto a workpiece. A control unit for controlling the beam and the operation time t of the liquid crystal mask displaying the information.
4, retains at least one pulse laser beam irradiation time t 2 or more, pulsed laser beam stop time t 1 'therebetween
A laser marker that irradiates the liquid crystal mask a plurality of times at intervals of, and controls the relationship between the stop time t 1 ′ and the irradiation time t 2 such that t 1 ′> t 2 .
スクに照射し、該液晶マスクに表示された情報を被加工
物上に転写するレーザマーカにおいて、上記にレーザ発
振器からのレーザビームを制御するスイッチ及び液晶マ
スクのパターン表示を制御する液晶電源スイッチと、液
晶電源スイッチの動作電圧を少なくとも1パルスレーザ
ビームの照射時間t3以上保持する保持回路と、保持回路
が動作している間にパルスレーザビームを停止時間t1′
の間隔で上記液晶マスクに複数回照射すると共に、停止
時間t1′と照射時間t2との関係をt1′>t2になるように
制御する制御部とを備えたことを特徴とするレーザマー
カ。2. A laser marker for irradiating a laser beam from a laser oscillator onto a liquid crystal mask and transferring information displayed on the liquid crystal mask onto a workpiece, wherein a switch for controlling the laser beam from the laser oscillator is provided. and a liquid crystal power switch for controlling the pattern display of the liquid crystal mask, a holding circuit for holding the operating voltage of the liquid crystal power switch at least one pulse laser beam irradiation time t 3 or more, the pulsed laser beam while holding circuit is operating Stop time t 1 ′
And a control unit for controlling the relationship between the stop time t 1 ′ and the irradiation time t 2 so that t 1 ′> t 2. Laser marker.
スクに照射し、該液晶マスクに表示された情報を被加工
物上に転写するレーザマーカにおいて、液晶マスクに表
示されたパターン情報とレーザ発振器からレーザビーム
とを制御する制御部を設け、前記制御部は搬送部により
搬送された前記被加工物が位置X2通過した時刻より所定
時間後にレーザビーム照射位置X1で被加工物にレーザビ
ームを照射されるように制御することを特徴とするレー
ザマーカ。3. A laser marker for irradiating a laser beam from a laser oscillator onto a liquid crystal mask and transferring the information displayed on the liquid crystal mask onto a workpiece. a control unit for controlling the beam is provided, a laser beam to the controller workpiece by the laser beam irradiation position X 1 after a predetermined time from the time at which the workpiece is conveyed has passed the position X 2 by the conveying unit A laser marker characterized in that the laser marker is controlled to be controlled.
スクに照射し、該液晶マスクに表示された情報を被加工
物上に転写するレーザマーカにおいて、 前記液晶マスクの一部に参照光を照射し、透過参照光の
変化量を検出して、該液晶マスクのパターン表示能力を
判定する手段を設けたことを特徴とするレーザマーカ。4. A laser marker for irradiating a laser beam from a laser oscillator onto a liquid crystal mask and transferring information displayed on the liquid crystal mask onto a workpiece, irradiating a part of the liquid crystal mask with reference light, A laser marker comprising means for detecting a change amount of transmitted reference light and determining a pattern display capability of the liquid crystal mask.
射鏡より成る光共振器と、前記レーザロッドと一対の反
射鏡のいずれか一方側反射鏡との間に配置され被加工物
上に転写すべき情報が与えられる液晶マスクと、該液晶
マスクに表示された情報が表示された液晶マスクを透過
したパターン情報を含む「有り」レーザ光と、情報を含
まない「無し」レーザ光とを区別する偏光板とを備え、
偏光板で前者のレーザ光を光共振器外に取りだし、後者
のレーザ光を光共振器内に戻すことを特徴とするレーザ
マーカに利用したレーザ発振器。5. An optical resonator comprising a pair of reflecting mirrors facing each other with a laser rod interposed therebetween, and an optical resonator disposed between the laser rod and one of the pair of reflecting mirrors on a workpiece. A liquid crystal mask to which information to be transferred is given; a "present" laser beam including pattern information transmitted through the liquid crystal mask indicating the information displayed on the liquid crystal mask; and an "absent" laser beam including no information. With a polarizing plate to distinguish,
A laser oscillator used as a laser marker, wherein a polarizing plate takes the former laser light out of the optical resonator and returns the latter laser light into the optical resonator.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63021996A JP2602266B2 (en) | 1987-03-02 | 1988-02-03 | Laser marker and laser oscillator using the same |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62-45251 | 1987-03-02 | ||
| JP4525187 | 1987-03-02 | ||
| JP63021996A JP2602266B2 (en) | 1987-03-02 | 1988-02-03 | Laser marker and laser oscillator using the same |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6411088A JPS6411088A (en) | 1989-01-13 |
| JP2602266B2 true JP2602266B2 (en) | 1997-04-23 |
Family
ID=26359156
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63021996A Expired - Fee Related JP2602266B2 (en) | 1987-03-02 | 1988-02-03 | Laser marker and laser oscillator using the same |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2602266B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPWO2014171245A1 (en) * | 2013-04-17 | 2017-02-23 | 村田機械株式会社 | Laser processing machine and laser processing method |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5231263A (en) * | 1990-03-09 | 1993-07-27 | Hitachi, Ltd. | Liquid crystal mask type laser marking system |
| US5331446A (en) * | 1992-06-10 | 1994-07-19 | Ag Technology Co., Ltd. | Liquid crystal optical element and a laser projection apparatus using polymer dispersed liquid crystal |
| KR960702369A (en) * | 1993-05-07 | 1996-04-27 | 안자키 사토루 | LASER LIQUID CRYSTAL MARKER AND METHOD FOR JUDGING DETERIORATION OF LIQUID CRYSTAL |
| KR960704672A (en) * | 1993-09-30 | 1996-10-09 | 안자키 사토루 | Transmissive Liquid Crystal Mask (TRANSMISSION TYPE LIQUTD CRYSTAL MASK MARKER) |
| JP2663238B2 (en) * | 1993-09-30 | 1997-10-15 | 株式会社小松製作所 | Liquid crystal mask laser marker |
| JP3263517B2 (en) * | 1994-02-08 | 2002-03-04 | 株式会社小松製作所 | Driving method of liquid crystal mask marker |
| JP2007059948A (en) * | 2006-11-27 | 2007-03-08 | Oki Electric Ind Co Ltd | Semiconductor chip, method for manufacturing semiconductor chip, lead frame, method for manufacturing lead frame, semiconductor device, and method for manufacturing semiconductor device |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5075738A (en) * | 1973-11-07 | 1975-06-21 | ||
| JPS5638888A (en) * | 1979-09-07 | 1981-04-14 | Hitachi Ltd | Pattern forming method |
| JPS61108488A (en) * | 1984-10-31 | 1986-05-27 | Nec Corp | Laser beam machine |
| JPS6224884A (en) * | 1985-07-23 | 1987-02-02 | Nec Corp | Laser beam machine |
-
1988
- 1988-02-03 JP JP63021996A patent/JP2602266B2/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPWO2014171245A1 (en) * | 2013-04-17 | 2017-02-23 | 村田機械株式会社 | Laser processing machine and laser processing method |
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| Publication number | Publication date |
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| JPS6411088A (en) | 1989-01-13 |
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