JP2730364B2 - Anionic electrodeposition paint and method for producing the same - Google Patents
Anionic electrodeposition paint and method for producing the sameInfo
- Publication number
- JP2730364B2 JP2730364B2 JP3338498A JP33849891A JP2730364B2 JP 2730364 B2 JP2730364 B2 JP 2730364B2 JP 3338498 A JP3338498 A JP 3338498A JP 33849891 A JP33849891 A JP 33849891A JP 2730364 B2 JP2730364 B2 JP 2730364B2
- Authority
- JP
- Japan
- Prior art keywords
- group
- monomer
- acid
- polymerizable unsaturated
- component
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000004070 electrodeposition Methods 0.000 title claims description 26
- 125000000129 anionic group Chemical group 0.000 title claims description 21
- 238000004519 manufacturing process Methods 0.000 title claims description 21
- 239000003973 paint Substances 0.000 title claims description 16
- -1 polysiloxane unit Polymers 0.000 claims description 71
- 239000000178 monomer Substances 0.000 claims description 50
- 125000000751 azo group Chemical group [*]N=N[*] 0.000 claims description 44
- 229920001296 polysiloxane Polymers 0.000 claims description 40
- 150000001875 compounds Chemical class 0.000 claims description 36
- 239000002253 acid Substances 0.000 claims description 31
- 229920001400 block copolymer Polymers 0.000 claims description 25
- 239000000203 mixture Substances 0.000 claims description 12
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims description 10
- 125000000217 alkyl group Chemical group 0.000 claims description 9
- 239000002904 solvent Substances 0.000 claims description 9
- 239000006185 dispersion Substances 0.000 claims description 8
- 150000001412 amines Chemical class 0.000 claims description 6
- 229920001577 copolymer Polymers 0.000 claims description 6
- 229910021529 ammonia Inorganic materials 0.000 claims description 5
- 125000002723 alicyclic group Chemical group 0.000 claims description 4
- 125000001931 aliphatic group Chemical group 0.000 claims description 4
- 150000001408 amides Chemical group 0.000 claims description 3
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical group CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 claims description 2
- 150000008431 aliphatic amides Chemical class 0.000 claims description 2
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 claims description 2
- 150000004945 aromatic hydrocarbons Chemical class 0.000 claims description 2
- 239000004202 carbamide Chemical group 0.000 claims description 2
- 150000002148 esters Chemical group 0.000 claims description 2
- 150000003254 radicals Chemical group 0.000 claims description 2
- 229920006395 saturated elastomer Polymers 0.000 claims description 2
- 239000008199 coating composition Substances 0.000 claims 1
- 238000000576 coating method Methods 0.000 description 21
- 239000011248 coating agent Substances 0.000 description 19
- 238000006243 chemical reaction Methods 0.000 description 17
- 229920000642 polymer Polymers 0.000 description 17
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 14
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 13
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 12
- 229920005989 resin Polymers 0.000 description 12
- 239000011347 resin Substances 0.000 description 12
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 10
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 10
- 150000004820 halides Chemical class 0.000 description 9
- 238000000034 method Methods 0.000 description 9
- LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 description 8
- 230000015572 biosynthetic process Effects 0.000 description 8
- 125000005442 diisocyanate group Chemical group 0.000 description 8
- 239000000463 material Substances 0.000 description 8
- 239000000243 solution Substances 0.000 description 8
- 238000003786 synthesis reaction Methods 0.000 description 8
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 7
- 239000007864 aqueous solution Substances 0.000 description 7
- 230000007423 decrease Effects 0.000 description 7
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 6
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 6
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 6
- 239000003054 catalyst Substances 0.000 description 6
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 6
- 239000010419 fine particle Substances 0.000 description 6
- 238000006116 polymerization reaction Methods 0.000 description 6
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 6
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 5
- 229920000178 Acrylic resin Polymers 0.000 description 5
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 5
- 238000012661 block copolymerization Methods 0.000 description 5
- 239000003795 chemical substances by application Substances 0.000 description 5
- 239000008367 deionised water Substances 0.000 description 5
- 229910021641 deionized water Inorganic materials 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- 229920002050 silicone resin Polymers 0.000 description 5
- 238000005979 thermal decomposition reaction Methods 0.000 description 5
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 5
- 239000004793 Polystyrene Substances 0.000 description 4
- KVXNKFYSHAUJIA-UHFFFAOYSA-N acetic acid;ethoxyethane Chemical compound CC(O)=O.CCOCC KVXNKFYSHAUJIA-UHFFFAOYSA-N 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 4
- 125000004432 carbon atom Chemical group C* 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 4
- 238000007654 immersion Methods 0.000 description 4
- 239000003999 initiator Substances 0.000 description 4
- QYZFTMMPKCOTAN-UHFFFAOYSA-N n-[2-(2-hydroxyethylamino)ethyl]-2-[[1-[2-(2-hydroxyethylamino)ethylamino]-2-methyl-1-oxopropan-2-yl]diazenyl]-2-methylpropanamide Chemical compound OCCNCCNC(=O)C(C)(C)N=NC(C)(C)C(=O)NCCNCCO QYZFTMMPKCOTAN-UHFFFAOYSA-N 0.000 description 4
- 229920002223 polystyrene Polymers 0.000 description 4
- 229920002554 vinyl polymer Polymers 0.000 description 4
- VUDVPVOIALASLB-UHFFFAOYSA-N 2-[(2-cyano-1-hydroxypropan-2-yl)diazenyl]-3-hydroxy-2-methylpropanenitrile Chemical compound OCC(C)(C#N)N=NC(C)(CO)C#N VUDVPVOIALASLB-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 3
- SJRJJKPEHAURKC-UHFFFAOYSA-N N-Methylmorpholine Chemical compound CN1CCOCC1 SJRJJKPEHAURKC-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- UKLDJPRMSDWDSL-UHFFFAOYSA-L [dibutyl(dodecanoyloxy)stannyl] dodecanoate Chemical compound CCCCCCCCCCCC(=O)O[Sn](CCCC)(CCCC)OC(=O)CCCCCCCCCCC UKLDJPRMSDWDSL-UHFFFAOYSA-L 0.000 description 3
- 239000012975 dibutyltin dilaurate Substances 0.000 description 3
- UAOMVDZJSHZZME-UHFFFAOYSA-N diisopropylamine Chemical compound CC(C)NC(C)C UAOMVDZJSHZZME-UHFFFAOYSA-N 0.000 description 3
- 239000004205 dimethyl polysiloxane Substances 0.000 description 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 3
- 239000001530 fumaric acid Substances 0.000 description 3
- 230000007774 longterm Effects 0.000 description 3
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 3
- 239000011976 maleic acid Substances 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- 150000002978 peroxides Chemical class 0.000 description 3
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- 238000012546 transfer Methods 0.000 description 3
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 2
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 2
- LCZVSXRMYJUNFX-UHFFFAOYSA-N 2-[2-(2-hydroxypropoxy)propoxy]propan-1-ol Chemical compound CC(O)COC(C)COC(C)CO LCZVSXRMYJUNFX-UHFFFAOYSA-N 0.000 description 2
- MFKRHJVUCZRDTF-UHFFFAOYSA-N 3-methoxy-3-methylbutan-1-ol Chemical compound COC(C)(C)CCO MFKRHJVUCZRDTF-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 2
- 229920000877 Melamine resin Polymers 0.000 description 2
- 239000004640 Melamine resin Substances 0.000 description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 2
- YNAVUWVOSKDBBP-UHFFFAOYSA-N Morpholine Chemical compound C1COCCN1 YNAVUWVOSKDBBP-UHFFFAOYSA-N 0.000 description 2
- JLTDJTHDQAWBAV-UHFFFAOYSA-N N,N-dimethylaniline Chemical compound CN(C)C1=CC=CC=C1 JLTDJTHDQAWBAV-UHFFFAOYSA-N 0.000 description 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- NQRYJNQNLNOLGT-UHFFFAOYSA-N Piperidine Chemical compound C1CCNCC1 NQRYJNQNLNOLGT-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 2
- DKGAVHZHDRPRBM-UHFFFAOYSA-N Tert-Butanol Chemical compound CC(C)(C)O DKGAVHZHDRPRBM-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- TUVYSBJZBYRDHP-UHFFFAOYSA-N acetic acid;methoxymethane Chemical compound COC.CC(O)=O TUVYSBJZBYRDHP-UHFFFAOYSA-N 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 2
- 150000001450 anions Chemical class 0.000 description 2
- 239000012986 chain transfer agent Substances 0.000 description 2
- 238000007334 copolymerization reaction Methods 0.000 description 2
- AQEFLFZSWDEAIP-UHFFFAOYSA-N di-tert-butyl ether Chemical compound CC(C)(C)OC(C)(C)C AQEFLFZSWDEAIP-UHFFFAOYSA-N 0.000 description 2
- SZXQTJUDPRGNJN-UHFFFAOYSA-N dipropylene glycol Chemical compound OCCCOCCCO SZXQTJUDPRGNJN-UHFFFAOYSA-N 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 238000009472 formulation Methods 0.000 description 2
- 229920000578 graft copolymer Polymers 0.000 description 2
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 2
- ZXEKIIBDNHEJCQ-UHFFFAOYSA-N isobutanol Chemical compound CC(C)CO ZXEKIIBDNHEJCQ-UHFFFAOYSA-N 0.000 description 2
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 2
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 2
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 2
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 2
- BDJRBEYXGGNYIS-UHFFFAOYSA-N nonanedioic acid Chemical compound OC(=O)CCCCCCCC(O)=O BDJRBEYXGGNYIS-UHFFFAOYSA-N 0.000 description 2
- YPFDHNVEDLHUCE-UHFFFAOYSA-N propane-1,3-diol Chemical compound OCCCO YPFDHNVEDLHUCE-UHFFFAOYSA-N 0.000 description 2
- 230000035484 reaction time Effects 0.000 description 2
- CXMXRPHRNRROMY-UHFFFAOYSA-N sebacic acid Chemical compound OC(=O)CCCCCCCCC(O)=O CXMXRPHRNRROMY-UHFFFAOYSA-N 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- DVKJHBMWWAPEIU-UHFFFAOYSA-N toluene 2,4-diisocyanate Chemical compound CC1=CC=C(N=C=O)C=C1N=C=O DVKJHBMWWAPEIU-UHFFFAOYSA-N 0.000 description 2
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 2
- IMNIMPAHZVJRPE-UHFFFAOYSA-N triethylenediamine Chemical compound C1CN2CCN1CC2 IMNIMPAHZVJRPE-UHFFFAOYSA-N 0.000 description 2
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- RYNQKSJRFHJZTK-UHFFFAOYSA-N (3-methoxy-3-methylbutyl) acetate Chemical compound COC(C)(C)CCOC(C)=O RYNQKSJRFHJZTK-UHFFFAOYSA-N 0.000 description 1
- BSSNZUFKXJJCBG-UPHRSURJSA-N (z)-but-2-enediamide Chemical compound NC(=O)\C=C/C(N)=O BSSNZUFKXJJCBG-UPHRSURJSA-N 0.000 description 1
- BQCIDUSAKPWEOX-UHFFFAOYSA-N 1,1-Difluoroethene Chemical compound FC(F)=C BQCIDUSAKPWEOX-UHFFFAOYSA-N 0.000 description 1
- ZWVMLYRJXORSEP-UHFFFAOYSA-N 1,2,6-Hexanetriol Chemical compound OCCCCC(O)CO ZWVMLYRJXORSEP-UHFFFAOYSA-N 0.000 description 1
- FKTHNVSLHLHISI-UHFFFAOYSA-N 1,2-bis(isocyanatomethyl)benzene Chemical compound O=C=NCC1=CC=CC=C1CN=C=O FKTHNVSLHLHISI-UHFFFAOYSA-N 0.000 description 1
- XSCLFFBWRKTMTE-UHFFFAOYSA-N 1,3-bis(isocyanatomethyl)cyclohexane Chemical compound O=C=NCC1CCCC(CN=C=O)C1 XSCLFFBWRKTMTE-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- OVBFMUAFNIIQAL-UHFFFAOYSA-N 1,4-diisocyanatobutane Chemical compound O=C=NCCCCN=C=O OVBFMUAFNIIQAL-UHFFFAOYSA-N 0.000 description 1
- WDVBMXJLYFINLX-UHFFFAOYSA-N 1-(1-butoxyethoxy)propan-1-ol Chemical compound CCCCOC(C)OC(O)CC WDVBMXJLYFINLX-UHFFFAOYSA-N 0.000 description 1
- DURPTKYDGMDSBL-UHFFFAOYSA-N 1-butoxybutane Chemical compound CCCCOCCCC DURPTKYDGMDSBL-UHFFFAOYSA-N 0.000 description 1
- RWNUSVWFHDHRCJ-UHFFFAOYSA-N 1-butoxypropan-2-ol Chemical compound CCCCOCC(C)O RWNUSVWFHDHRCJ-UHFFFAOYSA-N 0.000 description 1
- 238000005160 1H NMR spectroscopy Methods 0.000 description 1
- YJGUVTBNQCVSQB-UHFFFAOYSA-N 2,2-diphenylpropanedioic acid Chemical compound C=1C=CC=CC=1C(C(O)=O)(C(=O)O)C1=CC=CC=C1 YJGUVTBNQCVSQB-UHFFFAOYSA-N 0.000 description 1
- KMZHZAAOEWVPSE-UHFFFAOYSA-N 2,3-dihydroxypropyl acetate Chemical compound CC(=O)OCC(O)CO KMZHZAAOEWVPSE-UHFFFAOYSA-N 0.000 description 1
- LXOFYPKXCSULTL-UHFFFAOYSA-N 2,4,7,9-tetramethyldec-5-yne-4,7-diol Chemical compound CC(C)CC(C)(O)C#CC(C)(O)CC(C)C LXOFYPKXCSULTL-UHFFFAOYSA-N 0.000 description 1
- SGQANBPILYFENT-UHFFFAOYSA-N 2,6-dimethyloct-4-yne-3,6-diol Chemical compound CCC(C)(O)C#CC(O)C(C)C SGQANBPILYFENT-UHFFFAOYSA-N 0.000 description 1
- CCTFAOUOYLVUFG-UHFFFAOYSA-N 2-(1-amino-1-imino-2-methylpropan-2-yl)azo-2-methylpropanimidamide Chemical compound NC(=N)C(C)(C)N=NC(C)(C)C(N)=N CCTFAOUOYLVUFG-UHFFFAOYSA-N 0.000 description 1
- OEPOKWHJYJXUGD-UHFFFAOYSA-N 2-(3-phenylmethoxyphenyl)-1,3-thiazole-4-carbaldehyde Chemical compound O=CC1=CSC(C=2C=C(OCC=3C=CC=CC=3)C=CC=2)=N1 OEPOKWHJYJXUGD-UHFFFAOYSA-N 0.000 description 1
- YMJOMUPMCOTNTI-UHFFFAOYSA-N 2-[(1-amino-2-methyl-1-phenyliminopropan-2-yl)diazenyl]-2-methyl-n'-phenylpropanimidamide Chemical compound C=1C=CC=CC=1N=C(N)C(C)(C)N=NC(C)(C)C(N)=NC1=CC=CC=C1 YMJOMUPMCOTNTI-UHFFFAOYSA-N 0.000 description 1
- OHQNIUPQCKDEOW-UHFFFAOYSA-N 2-[(1-hydroxy-2-methylpropan-2-yl)diazenyl]-2-methylpropan-1-ol Chemical compound OCC(C)(C)N=NC(C)(C)CO OHQNIUPQCKDEOW-UHFFFAOYSA-N 0.000 description 1
- URIBBZXJMBCEKC-UHFFFAOYSA-N 2-[(2-cyano-1-hydroxybutan-2-yl)diazenyl]-2-(hydroxymethyl)butanenitrile Chemical compound CCC(CO)(C#N)N=NC(CC)(CO)C#N URIBBZXJMBCEKC-UHFFFAOYSA-N 0.000 description 1
- OEUOSNUUSQBBKI-UHFFFAOYSA-N 2-[(2-cyano-1-hydroxypentan-2-yl)diazenyl]-2-(hydroxymethyl)pentanenitrile Chemical compound CCCC(CO)(C#N)N=NC(CO)(C#N)CCC OEUOSNUUSQBBKI-UHFFFAOYSA-N 0.000 description 1
- XQSGGALXCGUHAZ-UHFFFAOYSA-N 2-[[1-amino-1-(2-hydroxyethylimino)-2-methylpropan-2-yl]diazenyl]-n'-(2-hydroxyethyl)-2-methylpropanimidamide Chemical compound OCCNC(=N)C(C)(C)N=NC(C)(C)C(=N)NCCO XQSGGALXCGUHAZ-UHFFFAOYSA-N 0.000 description 1
- JMQWYNRFGWFWBU-UHFFFAOYSA-N 2-[[1-amino-1-(4-aminophenyl)imino-2-methylpropan-2-yl]diazenyl]-n'-(4-aminophenyl)-2-methylpropanimidamide Chemical compound C=1C=C(N)C=CC=1N=C(N)C(C)(C)N=NC(C)(C)C(N)=NC1=CC=C(N)C=C1 JMQWYNRFGWFWBU-UHFFFAOYSA-N 0.000 description 1
- OAYDTAZWDZIFSO-UHFFFAOYSA-N 2-[[1-amino-1-(4-chlorophenyl)imino-2-methylpropan-2-yl]diazenyl]-n'-(4-chlorophenyl)-2-methylpropanimidamide Chemical compound C=1C=C(Cl)C=CC=1N=C(N)C(C)(C)N=NC(C)(C)C(N)=NC1=CC=C(Cl)C=C1 OAYDTAZWDZIFSO-UHFFFAOYSA-N 0.000 description 1
- 125000001340 2-chloroethyl group Chemical group [H]C([H])(Cl)C([H])([H])* 0.000 description 1
- WFUGQJXVXHBTEM-UHFFFAOYSA-N 2-hydroperoxy-2-(2-hydroperoxybutan-2-ylperoxy)butane Chemical compound CCC(C)(OO)OOC(C)(CC)OO WFUGQJXVXHBTEM-UHFFFAOYSA-N 0.000 description 1
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 1
- HCGFUIQPSOCUHI-UHFFFAOYSA-N 2-propan-2-yloxyethanol Chemical compound CC(C)OCCO HCGFUIQPSOCUHI-UHFFFAOYSA-N 0.000 description 1
- FRIBMENBGGCKPD-UHFFFAOYSA-N 3-(2,3-dimethoxyphenyl)prop-2-enal Chemical compound COC1=CC=CC(C=CC=O)=C1OC FRIBMENBGGCKPD-UHFFFAOYSA-N 0.000 description 1
- DKIDEFUBRARXTE-UHFFFAOYSA-N 3-mercaptopropanoic acid Chemical compound OC(=O)CCS DKIDEFUBRARXTE-UHFFFAOYSA-N 0.000 description 1
- JSGVZVOGOQILFM-UHFFFAOYSA-N 3-methoxy-1-butanol Chemical compound COC(C)CCO JSGVZVOGOQILFM-UHFFFAOYSA-N 0.000 description 1
- QMYGFTJCQFEDST-UHFFFAOYSA-N 3-methoxybutyl acetate Chemical compound COC(C)CCOC(C)=O QMYGFTJCQFEDST-UHFFFAOYSA-N 0.000 description 1
- XPFCZYUVICHKDS-UHFFFAOYSA-N 3-methylbutane-1,3-diol Chemical compound CC(C)(O)CCO XPFCZYUVICHKDS-UHFFFAOYSA-N 0.000 description 1
- UPMLOUAZCHDJJD-UHFFFAOYSA-N 4,4'-Diphenylmethane Diisocyanate Chemical compound C1=CC(N=C=O)=CC=C1CC1=CC=C(N=C=O)C=C1 UPMLOUAZCHDJJD-UHFFFAOYSA-N 0.000 description 1
- WVDRSXGPQWNUBN-UHFFFAOYSA-N 4-(4-carboxyphenoxy)benzoic acid Chemical compound C1=CC(C(=O)O)=CC=C1OC1=CC=C(C(O)=O)C=C1 WVDRSXGPQWNUBN-UHFFFAOYSA-N 0.000 description 1
- NEQFBGHQPUXOFH-UHFFFAOYSA-N 4-(4-carboxyphenyl)benzoic acid Chemical compound C1=CC(C(=O)O)=CC=C1C1=CC=C(C(O)=O)C=C1 NEQFBGHQPUXOFH-UHFFFAOYSA-N 0.000 description 1
- JLBJTVDPSNHSKJ-UHFFFAOYSA-N 4-Methylstyrene Chemical compound CC1=CC=C(C=C)C=C1 JLBJTVDPSNHSKJ-UHFFFAOYSA-N 0.000 description 1
- ZRWNRAJCPNLYAK-UHFFFAOYSA-N 4-bromobenzamide Chemical compound NC(=O)C1=CC=C(Br)C=C1 ZRWNRAJCPNLYAK-UHFFFAOYSA-N 0.000 description 1
- MAGFQRLKWCCTQJ-UHFFFAOYSA-N 4-ethenylbenzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=C(C=C)C=C1 MAGFQRLKWCCTQJ-UHFFFAOYSA-N 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- 239000004342 Benzoyl peroxide Substances 0.000 description 1
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- MVNLONWHLZTRAN-UHFFFAOYSA-N CC(C(NC(C=CC=C1)=C1O)=O)(C1=CC=CC=C1)N=NC(C)(C(NC(C=CC=C1)=C1O)=O)C1=CC=CC=C1 Chemical compound CC(C(NC(C=CC=C1)=C1O)=O)(C1=CC=CC=C1)N=NC(C)(C(NC(C=CC=C1)=C1O)=O)C1=CC=CC=C1 MVNLONWHLZTRAN-UHFFFAOYSA-N 0.000 description 1
- VKHZCNMAGMGOFM-UHFFFAOYSA-N CCCCC(CO)(C#N)N=NC(CCCC)(CO)C#N Chemical compound CCCCC(CO)(C#N)N=NC(CCCC)(CO)C#N VKHZCNMAGMGOFM-UHFFFAOYSA-N 0.000 description 1
- UXVMQQNJUSDDNG-UHFFFAOYSA-L Calcium chloride Chemical compound [Cl-].[Cl-].[Ca+2] UXVMQQNJUSDDNG-UHFFFAOYSA-L 0.000 description 1
- 229920000298 Cellophane Polymers 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- 229920003270 Cymel® Polymers 0.000 description 1
- ZAFNJMIOTHYJRJ-UHFFFAOYSA-N Diisopropyl ether Chemical compound CC(C)OC(C)C ZAFNJMIOTHYJRJ-UHFFFAOYSA-N 0.000 description 1
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 239000005057 Hexamethylene diisocyanate Substances 0.000 description 1
- 239000005058 Isophorone diisocyanate Substances 0.000 description 1
- YIVJZNGAASQVEM-UHFFFAOYSA-N Lauroyl peroxide Chemical compound CCCCCCCCCCCC(=O)OOC(=O)CCCCCCCCCCC YIVJZNGAASQVEM-UHFFFAOYSA-N 0.000 description 1
- PEEHTFAAVSWFBL-UHFFFAOYSA-N Maleimide Chemical compound O=C1NC(=O)C=C1 PEEHTFAAVSWFBL-UHFFFAOYSA-N 0.000 description 1
- XOBKSJJDNFUZPF-UHFFFAOYSA-N Methoxyethane Chemical compound CCOC XOBKSJJDNFUZPF-UHFFFAOYSA-N 0.000 description 1
- ZFFSNPIBMZJJLQ-UHFFFAOYSA-N N(=NC(C(=N)NCC(C)O)(C)C)C(C(=N)NCC(C)O)(C)C Chemical compound N(=NC(C(=N)NCC(C)O)(C)C)C(C(=N)NCC(C)O)(C)C ZFFSNPIBMZJJLQ-UHFFFAOYSA-N 0.000 description 1
- TVXCIJNADCAPGL-UHFFFAOYSA-N N(=NC(C(=N)NCCCO)(C)C)C(C(=N)NCCCO)(C)C Chemical compound N(=NC(C(=N)NCCCO)(C)C)C(C(=N)NCCCO)(C)C TVXCIJNADCAPGL-UHFFFAOYSA-N 0.000 description 1
- AMXBRERXCNIALW-UHFFFAOYSA-N N(=NC(C(=O)NCCCCCCCO)(C)C)C(C(=O)NCCCCCCCO)(C)C Chemical compound N(=NC(C(=O)NCCCCCCCO)(C)C)C(C(=O)NCCCCCCCO)(C)C AMXBRERXCNIALW-UHFFFAOYSA-N 0.000 description 1
- JXDMKOMCNLPBOO-UHFFFAOYSA-N N(=NC(CO)(C)C1=CC=CC=C1)C(CO)(C)C1=CC=CC=C1 Chemical compound N(=NC(CO)(C)C1=CC=CC=C1)C(CO)(C)C1=CC=CC=C1 JXDMKOMCNLPBOO-UHFFFAOYSA-N 0.000 description 1
- GSCCALZHGUWNJW-UHFFFAOYSA-N N-Cyclohexyl-N-methylcyclohexanamine Chemical compound C1CCCCC1N(C)C1CCCCC1 GSCCALZHGUWNJW-UHFFFAOYSA-N 0.000 description 1
- UEEJHVSXFDXPFK-UHFFFAOYSA-N N-dimethylaminoethanol Chemical compound CN(C)CCO UEEJHVSXFDXPFK-UHFFFAOYSA-N 0.000 description 1
- JTDWCIXOEPQECG-UHFFFAOYSA-N N=C=O.N=C=O.CCCCCC(C)(C)C Chemical compound N=C=O.N=C=O.CCCCCC(C)(C)C JTDWCIXOEPQECG-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- GPDWNEFHGANACG-UHFFFAOYSA-L [dibutyl(2-ethylhexanoyloxy)stannyl] 2-ethylhexanoate Chemical compound CCCCC(CC)C(=O)O[Sn](CCCC)(CCCC)OC(=O)C(CC)CCCC GPDWNEFHGANACG-UHFFFAOYSA-L 0.000 description 1
- KYIKRXIYLAGAKQ-UHFFFAOYSA-N abcn Chemical compound C1CCCCC1(C#N)N=NC1(C#N)CCCCC1 KYIKRXIYLAGAKQ-UHFFFAOYSA-N 0.000 description 1
- 238000000862 absorption spectrum Methods 0.000 description 1
- OHBRHBQMHLEELN-UHFFFAOYSA-N acetic acid;1-butoxybutane Chemical compound CC(O)=O.CCCCOCCCC OHBRHBQMHLEELN-UHFFFAOYSA-N 0.000 description 1
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 1
- 239000001361 adipic acid Substances 0.000 description 1
- 235000011037 adipic acid Nutrition 0.000 description 1
- 150000007824 aliphatic compounds Chemical class 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 125000004849 alkoxymethyl group Chemical group 0.000 description 1
- 150000003973 alkyl amines Chemical class 0.000 description 1
- 150000001346 alkyl aryl ethers Chemical class 0.000 description 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 150000001409 amidines Chemical class 0.000 description 1
- 229920003180 amino resin Polymers 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 238000002048 anodisation reaction Methods 0.000 description 1
- 239000000010 aprotic solvent Substances 0.000 description 1
- 125000002029 aromatic hydrocarbon group Chemical group 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 235000019400 benzoyl peroxide Nutrition 0.000 description 1
- LZPKXTXASVJXNA-UHFFFAOYSA-N bis[2-(1,4,5,6-tetrahydropyrimidin-2-yl)propan-2-yl]diazene Chemical compound N=1CCCNC=1C(C)(C)N=NC(C)(C)C1=NCCCN1 LZPKXTXASVJXNA-UHFFFAOYSA-N 0.000 description 1
- BBXRLLPQXQKCJR-UHFFFAOYSA-N bis[2-(4,5,6,7-tetrahydro-1h-1,3-diazepin-2-yl)propan-2-yl]diazene Chemical compound N=1CCCCNC=1C(C)(C)N=NC(C)(C)C1=NCCCCN1 BBXRLLPQXQKCJR-UHFFFAOYSA-N 0.000 description 1
- GYCUTPICSQQWKP-UHFFFAOYSA-N bis[2-(5-methyl-4,5-dihydro-1h-imidazol-2-yl)propan-2-yl]diazene Chemical compound N1C(C)CN=C1C(C)(C)N=NC(C)(C)C1=NCC(C)N1 GYCUTPICSQQWKP-UHFFFAOYSA-N 0.000 description 1
- 125000005997 bromomethyl group Chemical group 0.000 description 1
- 239000004566 building material Substances 0.000 description 1
- CDQSJQSWAWPGKG-UHFFFAOYSA-N butane-1,1-diol Chemical compound CCCC(O)O CDQSJQSWAWPGKG-UHFFFAOYSA-N 0.000 description 1
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000001110 calcium chloride Substances 0.000 description 1
- 229910001628 calcium chloride Inorganic materials 0.000 description 1
- 150000001723 carbon free-radicals Chemical class 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- 125000004218 chloromethyl group Chemical group [H]C([H])(Cl)* 0.000 description 1
- HNEGQIOMVPPMNR-IHWYPQMZSA-N citraconic acid Chemical compound OC(=O)C(/C)=C\C(O)=O HNEGQIOMVPPMNR-IHWYPQMZSA-N 0.000 description 1
- 229940018557 citraconic acid Drugs 0.000 description 1
- 125000004093 cyano group Chemical group *C#N 0.000 description 1
- QYQADNCHXSEGJT-UHFFFAOYSA-N cyclohexane-1,1-dicarboxylate;hydron Chemical compound OC(=O)C1(C(O)=O)CCCCC1 QYQADNCHXSEGJT-UHFFFAOYSA-N 0.000 description 1
- YZFOGXKZTWZVFN-UHFFFAOYSA-N cyclopentane-1,1-dicarboxylic acid Chemical compound OC(=O)C1(C(O)=O)CCCC1 YZFOGXKZTWZVFN-UHFFFAOYSA-N 0.000 description 1
- 229960002887 deanol Drugs 0.000 description 1
- WMPOZLHMGVKUEJ-UHFFFAOYSA-N decanedioyl dichloride Chemical compound ClC(=O)CCCCCCCCC(Cl)=O WMPOZLHMGVKUEJ-UHFFFAOYSA-N 0.000 description 1
- 238000002242 deionisation method Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- KORSJDCBLAPZEQ-UHFFFAOYSA-N dicyclohexylmethane-4,4'-diisocyanate Chemical compound C1CC(N=C=O)CCC1CC1CCC(N=C=O)CC1 KORSJDCBLAPZEQ-UHFFFAOYSA-N 0.000 description 1
- 150000001993 dienes Chemical class 0.000 description 1
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 description 1
- HPNMFZURTQLUMO-UHFFFAOYSA-N diethylamine Chemical compound CCNCC HPNMFZURTQLUMO-UHFFFAOYSA-N 0.000 description 1
- 229940043279 diisopropylamine Drugs 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- GWZCCUDJHOGOSO-UHFFFAOYSA-N diphenic acid Chemical compound OC(=O)C1=CC=CC=C1C1=CC=CC=C1C(O)=O GWZCCUDJHOGOSO-UHFFFAOYSA-N 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- WNAHIZMDSQCWRP-UHFFFAOYSA-N dodecane-1-thiol Chemical compound CCCCCCCCCCCCS WNAHIZMDSQCWRP-UHFFFAOYSA-N 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 235000019441 ethanol Nutrition 0.000 description 1
- MEGHWIAOTJPCHQ-UHFFFAOYSA-N ethenyl butanoate Chemical compound CCCC(=O)OC=C MEGHWIAOTJPCHQ-UHFFFAOYSA-N 0.000 description 1
- UIWXSTHGICQLQT-UHFFFAOYSA-N ethenyl propanoate Chemical compound CCC(=O)OC=C UIWXSTHGICQLQT-UHFFFAOYSA-N 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 238000010528 free radical solution polymerization reaction Methods 0.000 description 1
- 238000001879 gelation Methods 0.000 description 1
- 235000011187 glycerol Nutrition 0.000 description 1
- 150000008282 halocarbons Chemical class 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- RRAMGCGOFNQTLD-UHFFFAOYSA-N hexamethylene diisocyanate Chemical compound O=C=NCCCCCCN=C=O RRAMGCGOFNQTLD-UHFFFAOYSA-N 0.000 description 1
- XTBJSRPRFRBLIP-UHFFFAOYSA-N hexane-1,6-diol;pentane-1,5-diol Chemical compound OCCCCCO.OCCCCCCO XTBJSRPRFRBLIP-UHFFFAOYSA-N 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 150000003949 imides Chemical class 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 239000011630 iodine Substances 0.000 description 1
- 229940035429 isobutyl alcohol Drugs 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- NIMLQBUJDJZYEJ-UHFFFAOYSA-N isophorone diisocyanate Chemical compound CC1(C)CC(N=C=O)CC(C)(CN=C=O)C1 NIMLQBUJDJZYEJ-UHFFFAOYSA-N 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 description 1
- 150000005673 monoalkenes Chemical class 0.000 description 1
- WVFLGSMUPMVNTQ-UHFFFAOYSA-N n-(2-hydroxyethyl)-2-[[1-(2-hydroxyethylamino)-2-methyl-1-oxopropan-2-yl]diazenyl]-2-methylpropanamide Chemical compound OCCNC(=O)C(C)(C)N=NC(C)(C)C(=O)NCCO WVFLGSMUPMVNTQ-UHFFFAOYSA-N 0.000 description 1
- OQJIZRJHKARBNW-UHFFFAOYSA-N n-(3-hydroxypropyl)-2-[[1-(3-hydroxypropylamino)-2-methyl-1-oxopropan-2-yl]diazenyl]-2-methylpropanamide Chemical compound OCCCNC(=O)C(C)(C)N=NC(C)(C)C(=O)NCCCO OQJIZRJHKARBNW-UHFFFAOYSA-N 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- ABMFBCRYHDZLRD-UHFFFAOYSA-N naphthalene-1,4-dicarboxylic acid Chemical compound C1=CC=C2C(C(=O)O)=CC=C(C(O)=O)C2=C1 ABMFBCRYHDZLRD-UHFFFAOYSA-N 0.000 description 1
- RXOHFPCZGPKIRD-UHFFFAOYSA-N naphthalene-2,6-dicarboxylic acid Chemical compound C1=C(C(O)=O)C=CC2=CC(C(=O)O)=CC=C21 RXOHFPCZGPKIRD-UHFFFAOYSA-N 0.000 description 1
- 230000003472 neutralizing effect Effects 0.000 description 1
- KZCOBXFFBQJQHH-UHFFFAOYSA-N octane-1-thiol Chemical compound CCCCCCCCS KZCOBXFFBQJQHH-UHFFFAOYSA-N 0.000 description 1
- MADOXCFISYCULS-UHFFFAOYSA-N octyl 2-sulfanylacetate Chemical compound CCCCCCCCOC(=O)CS MADOXCFISYCULS-UHFFFAOYSA-N 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 125000002524 organometallic group Chemical group 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000010422 painting Methods 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 239000004848 polyfunctional curative Substances 0.000 description 1
- 239000003505 polymerization initiator Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 150000003460 sulfonic acids Chemical class 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- CIHOLLKRGTVIJN-UHFFFAOYSA-N tert‐butyl hydroperoxide Chemical compound CC(C)(C)OO CIHOLLKRGTVIJN-UHFFFAOYSA-N 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 description 1
- ILWRPSCZWQJDMK-UHFFFAOYSA-N triethylazanium;chloride Chemical compound Cl.CCN(CC)CC ILWRPSCZWQJDMK-UHFFFAOYSA-N 0.000 description 1
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
- NLVXSWCKKBEXTG-UHFFFAOYSA-N vinylsulfonic acid Chemical compound OS(=O)(=O)C=C NLVXSWCKKBEXTG-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Landscapes
- Polymerisation Methods In General (AREA)
- Graft Or Block Polymers (AREA)
- Paints Or Removers (AREA)
Description
【0001】[0001]
【産業上の利用分野】本発明は、高耐候性を有するアニ
オン電着塗料の製造方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for producing an anionic electrodeposition paint having high weather resistance.
【0002】[0002]
【従来の技術】従来より、一般家屋やビルディングのア
ルミニウムサッシ、カーテンウォールなどの建材用アル
ミニウム材の塗装には、アクリル系水性樹脂に硬化剤と
してメラミン樹脂のようなアミノ樹脂を配合した塗料が
用いられ、これをアルミニウム材にアニオン電着塗装を
施こして実用化されてきたが、近年では時代の要請によ
り、さらに耐候性の良好な塗装が重要視されている。当
然のことながら、これに対応すべく、アクリル/シリコ
ーン樹脂のブレンド系、またはアクリル−シリコーン系
のグラフト共重合系樹脂、さらにはフッ素系樹脂が開発
されている。2. Description of the Related Art Conventionally, in coating aluminum materials for building materials such as aluminum sashes and curtain walls of ordinary houses and buildings, a coating material in which an amino resin such as melamine resin is mixed as a curing agent with an acrylic water-based resin has been used. This has been put to practical use by applying an anionic electrodeposition coating to an aluminum material, but in recent years, due to the demands of the times, painting with even better weather resistance has been regarded as important. Naturally, acrylic / silicone resin blends, acrylic-silicone graft copolymer resins, and fluororesins have been developed to meet this demand.
【0003】ところが、アクリル/シリコーン樹脂のブ
レンド系は、両樹脂のブレンドなるがため、長期的には
シリコーン樹脂の脱落が起り、アクリル系樹脂に比べて
優れるものの、長期の耐候性を示さない。また、アクリ
ル−シリコーン系のグラフト共重合系樹脂は、その反応
工程でアクリルとシリコーン樹脂とのグラフト共重合反
応が有効に行なわれない場合が多く、一般的にはアクリ
ル/シリコーン樹脂のブレンド系より優れるものの、長
期の耐候性にはなお問題を残している。そして、フッ素
系樹脂は性能的には十分とされながらも経済的に不利と
なり、汎用性に乏しい。また、最近のユーザーニーズと
して、塗面の金属光沢感より落ち着いた雰囲気をかもし
出せる艶消し塗面が富に要望されるようになってきた。
この艶消し塗面を与える1回塗り仕上げ用電着塗料も盛
んに開発されているが、現状では高耐候性及び艶消し性
を有し、かつフッ素系樹脂のように高価でないものの開
発は行なわれていない。However, since the acrylic / silicone resin blend system is a blend of both resins, the silicone resin falls off in the long term, and although it is superior to the acrylic resin, it does not exhibit long-term weather resistance. In addition, acrylic-silicone-based graft copolymer resins often fail to effectively carry out the graft copolymerization reaction between acrylic and silicone resin in the reaction process, and are generally more effective than acrylic / silicone resin blends. Although excellent, long-term weatherability still has problems. Fluorine-based resins are economically disadvantageous and have poor versatility, although their performance is sufficient. In recent years, there has been an increasing demand for a matte painted surface capable of producing a more calm atmosphere than the metallic glossiness of the painted surface.
Electrodeposition paints for single-coat finishes that provide this matte coating surface are also being actively developed, but at present the development of inexpensive materials having high weather resistance and matting properties, such as fluororesins, is underway. Not.
【0004】[0004]
【本発明が解決しようとする課題】本発明は、上記従来
のアニオン電着塗料が有する欠点を克服し、重合性不飽
和酸単量体を1成分とする共重合性混合単量体とアゾ基
含有ポリシロキサン化合物より導かれるシリコーン単位
とを効率よく結合させた付着性、耐候性及び艷消し性に
優れるアニオン電着塗料の製造方法を提供することを目
的とする。重合性不飽和酸単量体を1成分とする共重合
性混合単量体と、アゾ基含有ポリシロキサン化合物より
導かれるシリコーン単位とを効率よく結合させた耐候性
及び艶消し性に優れるアニオン電着塗料の製造方法を提
供することを目的とする。DISCLOSURE OF THE INVENTION The present invention overcomes the drawbacks of the above-mentioned conventional anionic electrodeposition paints and provides a polymerizable unsaturated paint.
Copolymerizable mixed monomer containing carboxylic acid monomer as one component and azo group
Silicone units derived from polysiloxane compounds
And to provide a method for producing an anionic electrodeposition coating material having excellent adhesion, weather resistance, and anti-glare property in which the anion electrodeposition paint is efficiently bonded . Copolymerization using polymerizable unsaturated acid monomer as one component
From an ionic mixed monomer and an azo group-containing polysiloxane compound
Weather resistance that efficiently combines with the led silicone unit
It is another object of the present invention to provide a method for producing an anionic electrodeposition paint having excellent matting properties .
【0005】[0005]
【本発明が解決しようとする課題】本発明によって、上
記目的を達成し得るアニオン電着塗料の製造方法が提供
される。According to the present invention, there is provided a method for producing an anionic electrodeposition paint capable of achieving the above object.
【0006】即ち、本発明の第1は、重合性不飽和酸単
量体(a)及びこれと共重合可能な重合性不飽和単量体
(b)の混合単量体より導かれる共重合体単位(A)と
アゾ基含有ポリシロキサン化合物より導かれるポリシロ
キサン単位(B)とを主鎖に有するブロック共重合体の
水性化物を主成分とする分散型アニオン電着塗料に関す
る。That is, a first aspect of the present invention is to provide a copolymer derived from a polymerizable unsaturated acid monomer (a) and a monomer mixture of the polymerizable unsaturated monomer (b) copolymerizable therewith. The present invention relates to a dispersion-type anionic electrodeposition coating material containing, as a main component, an aqueous hydrate of a block copolymer having a main unit comprising a united unit (A) and a polysiloxane unit (B) derived from an azo group-containing polysiloxane compound. >
【0007】また、本発明の第2は、一般式〔I〕A second aspect of the present invention is a compound represented by the general formula [I]:
【0008】[0008]
【化2】 Embedded image
【0009】[式中、R1はアルキル基、R2はアルキ
ル基またはシアノ基、R3は脂肪族炭化水素、脂肪族ア
ミド、アミジン、脂肪族アミジンもしくはその誘導体の
各基、R4は飽和または不飽和脂肪族、脂環式、芳香族
炭化水素の各基、R5はポリシロキサン含有化合物基を
示し、X及びZはエステル、アミド、ウレタンまたは尿
素結合を示す]で表わされるアゾ基含有ポリシロキサン
化合物の2〜60重量%の存在下に、重合性不飽和酸単
量体(a)及びこれと共重合可能な重合性不飽和単量体
(b)の混合単量体の40〜98重量%を親水性溶媒中
でラジカル重合し、アンモニア及び/またはアミン類で
中和した後、水性化することを特徴とする請求項1記載
の分散型アニオン電着塗料の製造方法に関する。Wherein R 1 is an alkyl group, R 2 is an alkyl group or a cyano group, R 3 is an aliphatic hydrocarbon, an aliphatic amide, an amidine, an aliphatic amidine or a derivative thereof, and R 4 is a saturated group. Or an unsaturated aliphatic, alicyclic, or aromatic hydrocarbon group, R 5 represents a polysiloxane-containing compound group, and X and Z each represent an ester, amide, urethane or urea bond]. In the presence of 2 to 60% by weight of the polysiloxane compound, 40 to 40% of a mixed monomer of the polymerizable unsaturated acid monomer (a) and the polymerizable unsaturated monomer (b) copolymerizable therewith. 2. A method for producing a dispersion-type anionic electrodeposition coating material according to claim 1, wherein 98% by weight is radically polymerized in a hydrophilic solvent, neutralized with ammonia and / or amines, and then made aqueous.
【0010】以下に本発明をさらに詳細に説明する。本
発明は、重合性不飽和酸単量体(a)とこれと共重合可
能な重合性不飽和単量体(b)の混合単量体から導かれ
る共重合体単位(A)と、アゾ基含有ポリシロキサン化
合物から導かれるポリシロキサン単位(B)との各単位
が、主にA−B、A−B−A及び/または−(A−B)
n−に結合してなるブロック共重合体の水性化物を主成
分とする分散型アニオン電着塗料に関するものであっ
て、その製造方法としては前期一般式[I]で表わされ
るアゾ基含有ポリシロキサン化合物を用いて、前期
(a)及び(b)成分を親水性溶媒中で加熱反応せしめ
ることにより得られるブロック共重合体溶液をアンモニ
ア及び/またはアミン類で中和して後、脱イオン水を添
加して水性化する方法が採用され、アニオン電着塗料用
樹脂が安定な微粒子分散体として得られる。Hereinafter, the present invention will be described in more detail. The present invention relates to a copolymer unit (A) derived from a mixed monomer of a polymerizable unsaturated acid monomer (a) and a polymerizable unsaturated monomer (b) copolymerizable therewith, Each unit with the polysiloxane unit (B) derived from the group-containing polysiloxane compound is mainly AB, ABA and / or-(AB)
The present invention relates to a dispersion-type anionic electrodeposition coating material containing, as a main component, an aqueous hydrate of a block copolymer bonded to n-, and a method for producing the azo group-containing polysiloxane represented by the general formula [I] A block copolymer solution obtained by heating and reacting the components (a) and (b) in a hydrophilic solvent using a compound is neutralized with ammonia and / or amines, and then deionized water is added. A method of adding an aqueous solution is used to obtain a resin for anionic electrodeposition paint as a stable fine particle dispersion.
【0011】ブロック共重合体を製造する際に用いる前
記一般式〔I〕で表わされるアゾ基含有ポリシロキサン
化合物は、アゾ成分(c)、ジイソシアネートまたは酸
ハライド成分(d)及びポリシロキサン成分(e)を反
応させることによって製造することができる。The azo group-containing polysiloxane compound represented by the above general formula [I] used for producing the block copolymer includes an azo component (c), a diisocyanate or acid halide component (d), and a polysiloxane component (e). ) Can be produced by reacting
【0012】アゾ成分(c)は、一般式〔II〕The azo component (c) has the general formula [II]
【0013】[0013]
【化3】 Embedded image
【0014】で表わされるアゾジオールまたはアゾジア
ミジン系の化合物であって、具体例としては、2,2′
−アゾビス(2−シアノプロパール)、2,2′−アゾ
ビス(2−シアノブタノール)、2,2′−アゾビス
(2−シアノペンタノール)、2,2′−アゾビス(2−
シアノヘキサノール)、2,2′−アゾビス(2−メチル
プロパノール)、2,2′−アゾビス(2−フェニルプ
ロパノール)、2,2′−アゾビス〔2−メチル−N−
(2−ヒドロキシエチル)プロピオンアミド〕、2,2′
−アゾビス〔2−メチル−N−(3−ヒドロキシプロピ
ル)プロピオンアミド〕、2,2′−アゾビス〔2−メ
チル−N−(7−ヒドロキシヘプチル)プロピオンアミ
ド〕、2,2′−アゾビス〔2−フェニル−N−(2−
ヒドロキシフェニル)プロピオンアミド〕、2,2′−
アゾビス〔2−メチル−N−(2−ヒドロキシエチル)
プロピオンアミジン〕、2,2′−アゾビス〔2−メチ
ル−N−(3−ヒドロキシプロピル)プロピオンアミジ
ン〕、2,2′−アゾビス〔2−メチル−N−(2−ヒ
ドロキシプロピル)プロピオンアミジン〕及びそのハラ
イドなどのアゾジオール類;2,2′−アゾビス(2−
メチルプロピオンアミジン)、2,2′−アゾビス(2
−メチル−N−フェニルプロピオンアミジン)、2,
2′−アゾビス〔N−(4−クロロフェニル)−2−メ
チルプロピオンアミジン〕、2,2′−アゾビス(N,
N′−ジメチレンイソブチルアミジン)、2,2′−ア
ゾビス〔2−(5−メチル−2−イミダゾリン−2−イ
ル)プロパン〕、2,2′−アゾビス〔2−(3,4,5,
6−テトラヒドロピリミジン−2−イル)プロパン〕、
2,2′−アゾビス〔2−(4,5,6,7−テトラヒ
ドロ−1H−1,3−ジアゼピン−2−イル)プロパ
ン〕、2,2′−アゾビス〔N−(4−アミノフェニ
ル)−2−メチルプロピオンアミジン〕及びそのハライ
ドなどのアゾジアミジン類があげられる。An azodiol or azodiamidine compound represented by the formula:
-Azobis (2-cyanopropal), 2,2'-azobis (2-cyanobutanol), 2,2'-azobis
(2-cyanopentanol), 2,2'-azobis (2-
Cyanohexanol), 2,2'-azobis (2-methylpropanol), 2,2'-azobis (2-phenylpropanol), 2,2'-azobis [2-methyl-N-
(2-hydroxyethyl) propionamide], 2,2 '
-Azobis [2-methyl-N- (3-hydroxypropyl) propionamide], 2,2'-azobis [2-methyl-N- (7-hydroxyheptyl) propionamide], 2,2'-azobis [2 -Phenyl-N- (2-
Hydroxyphenyl) propionamide], 2,2'-
Azobis [2-methyl-N- (2-hydroxyethyl)
Propionamidine], 2,2'-azobis [2-methyl-N- (3-hydroxypropyl) propionamidine], 2,2'-azobis [2-methyl-N- (2-hydroxypropyl) propionamidine] and Azodiols such as halides; 2,2'-azobis (2-
Methylpropionamidine), 2,2'-azobis (2
-Methyl-N-phenylpropionamidine), 2,
2'-azobis [N- (4-chlorophenyl) -2-methylpropionamidine], 2,2'-azobis (N,
N'-dimethyleneisobutylamidine), 2,2'-azobis [2- (5-methyl-2-imidazolin-2-yl) propane], 2,2'-azobis [2- (3,4,5,
6-tetrahydropyrimidin-2-yl) propane],
2,2'-azobis [2- (4,5,6,7-tetrahydro-1H-1,3-diazepin-2-yl) propane], 2,2'-azobis [N- (4-aminophenyl) -2-methylpropionamidine] and azodiamidines such as halides thereof.
【0015】ジイソシアネートまたは酸ハライドは、一
般式〔III〕The diisocyanate or acid halide is represented by the general formula [III]
【0016】[0016]
【化4】 D−R4−D 〔III〕Embedded image DR 4 -D [III]
【0017】〔式中、R4は前記に同じであり、DはN
CO,−COClを示す〕で表わされるものである。Wherein R 4 is the same as above, and D is N
CO, -COCl].
【0018】ジイソシアネートの具体例としては、テト
ラメチレンジイソシアネート、へキサメチレンジイソシ
アネート、トリメチルヘキサンジイソシアネートなどの
脂肪族ジイソシアネート;イソホロンジイソシアネー
ト、メチルシクロヘキサン−2,4−ジイソシアネー
ト、メチルシクロヘキサン−2,6−ジイソシアネー
ト、4,4′−メチレンビス(シクロヘキシルイソシア
ネート)、1,3−ジ(イソシアネートメチル)シクロ
ヘキサンなどの脂環式ジイソシアネート;またはトリレ
ンジイソシアネート、キシリレンジイソシアネート、
4,4′−ジフェニルメタンジイソシアネートなどの芳
香族ジイソシアネートなどがあげられる。Specific examples of the diisocyanate include aliphatic diisocyanates such as tetramethylene diisocyanate, hexamethylene diisocyanate and trimethylhexane diisocyanate; isophorone diisocyanate, methylcyclohexane-2,4-diisocyanate, methylcyclohexane-2,6-diisocyanate, Cycloaliphatic diisocyanates such as 4,4'-methylenebis (cyclohexylisocyanate) and 1,3-di (isocyanatomethyl) cyclohexane; or tolylene diisocyanate, xylylene diisocyanate,
And aromatic diisocyanates such as 4,4'-diphenylmethane diisocyanate.
【0019】また、酸ハライドの具体例としては、コハ
ク酸、アジピン酸、アゼライン酸、セバシン酸などの飽
和脂肪族ジカルボン酸及びその誘導体のジクロライド;
シクロヘキサンジカルボン酸、シクロペンタンジカルボ
ン酸などの脂環式ジカルボン酸及びその誘導体のジクロ
ライド;イソフタル酸、テレフタル酸、2,2′−ジフ
ェニルジカルボン酸、3,3′−ジフェニルジカルボン
酸、4,4′−ジフェニルジカルボン酸、ジフェニルメ
タンジカルボン酸、1,4−ナフタレンジカルボン酸、
2,6−ナフタレンジカルボン酸、3,3′−ジフェニ
ルケトンジカルボン酸、4,4′−ジフェニルケトンジ
カルボン酸、4,4′−ジフェニルエーテルジカルボン
酸、4,4′−ジフェニルチオエーテルジカルボン酸、
4,4′−ジフェニルスルフォンジカルボン酸などの芳
香族類ジカルボン酸及びその誘導体のジクロライド;マ
レイン酸、フマル酸、シトラコン酸、イタコン酸などの
不飽和脂肪族ジカルボン酸のジクロライドなどがあげら
れる。Specific examples of the acid halide include dichlorides of saturated aliphatic dicarboxylic acids such as succinic acid, adipic acid, azelaic acid and sebacic acid and derivatives thereof;
Dichlorides of alicyclic dicarboxylic acids such as cyclohexanedicarboxylic acid and cyclopentanedicarboxylic acid and derivatives thereof; isophthalic acid, terephthalic acid, 2,2'-diphenyldicarboxylic acid, 3,3'-diphenyldicarboxylic acid, 4,4'- Diphenyldicarboxylic acid, diphenylmethanedicarboxylic acid, 1,4-naphthalenedicarboxylic acid,
2,6-naphthalenedicarboxylic acid, 3,3'-diphenyl ketone dicarboxylic acid, 4,4'-diphenyl ketone dicarboxylic acid, 4,4'-diphenyl ether dicarboxylic acid, 4,4'-diphenyl thioether dicarboxylic acid,
Dichlorides of aromatic dicarboxylic acids such as 4,4'-diphenylsulfone dicarboxylic acid and derivatives thereof; dichlorides of unsaturated aliphatic dicarboxylic acids such as maleic acid, fumaric acid, citraconic acid and itaconic acid.
【0020】ポリシロキサン成分(e)は、一般式〔I
V〕The polysiloxane component (e) has the general formula [I
V]
【0021】[0021]
【化5】 G−R5−G 〔IV〕Embedded image GR 5 -G [IV]
【0022】〔式中、R5は前記に同じであり、Gは−
OHまたは−NH2を示す〕で表され、一般式〔V〕Wherein R 5 is the same as above, and G is-
Represented by represents OH or -NH 2], the general formula (V)
【0023】[0023]
【化6】 Embedded image
【0024】〔式中、R6は同一または異なって低級ア
ルキル基、R7は同一または異なって、ハロゲン原子置
換もしくは非置換のアルキル基またはフェニル基、Jは
(CH2)l(但し、lは同一または異なって0または1〜
6の整数)または−(CH2)3O(CH2)2−を示し、m
は0または1〜200の整数を示し、Gは前記に同じで
ある〕として表わされるポリシロキサン化合物である。Wherein R 6 is the same or different and is a lower alkyl group, R 7 is the same or different and is a halogen-substituted or unsubstituted alkyl or phenyl group, and J is
(CH 2 ) l (where l is the same or different and is 0 or 1 to 1)
6) or — (CH 2 ) 3 O (CH 2 ) 2 —, and m
Represents 0 or an integer of 1 to 200, and G is the same as described above].
【0025】上記一般式〔V〕において、低級アルキル
基とは、例えばメチル、エチル、プロピル、イソプロピ
ル、ブチル、t−ブチル、ペンチル、ヘキシル基等の炭
素数1〜6の直鎖または分枝状のアルキル基があげられ
る。また、ハロゲン原子置換のアルキル基としては、上
記アルキル基がハロゲン化されたもの、例えばクロロメ
チル、ブロモメチル、トリフルオロメチル、2−クロロ
エチル、3−クロロプロピル、3−ブロモプロピル、
3,3,3−トリフルオロプロピル、1,1,2,2−テト
ラヒドロパーフルオロオクチル基があげられる。またハ
ロゲン原子としては、例えば弗素原子、塩素原子、臭素
原子、沃素元素があげられる。In the above formula [V], the lower alkyl group means a straight or branched C1-C6 group such as methyl, ethyl, propyl, isopropyl, butyl, t-butyl, pentyl and hexyl. Alkyl group. Further, as the halogen-substituted alkyl group, those in which the above alkyl group is halogenated, for example, chloromethyl, bromomethyl, trifluoromethyl, 2-chloroethyl, 3-chloropropyl, 3-bromopropyl,
3,3,3-trifluoropropyl, 1,1,2,2-tetrahydroperfluorooctyl group. Examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom, and an iodine element.
【0026】一般式〔I〕で表されるアゾ基含有ポリシ
ロキサン化合物の合成は、一般式〔II〕で表わさせるア
ゾ成分(c)、一般式〔III〕で表わされるジイソシアネ
ートまたは酸ハライド成分(d)及び一般式〔IV〕また
は〔V〕で表わされるポリシロキサン成分(e)の反応
であり、各成分の仕込比率は、モル比で成分(d)=成
分(c)+成分(e)であるが、特に成分(c):成分
(d):成分(e)=1:2:1であることが好まし
い。The synthesis of the azo group-containing polysiloxane compound represented by the general formula [I] is performed by the azo component (c) represented by the general formula [II] and the diisocyanate or acid halide component represented by the general formula [III]. (D) and the reaction of the polysiloxane component (e) represented by the general formula [IV] or [V]. The charging ratio of each component is as follows: component (d) = component (c) + component (e) ), But it is particularly preferable that component (c): component (d): component (e) = 1: 2: 1.
【0027】また、各成分の具体的な組合せには次の4
通りの方法があって、その1は成分(c)のアゾジオー
ル、成分(d)のジイソシアネート及び成分(e)であ
り、その2は成分(c)のアゾジオール、成分(d)の
酸ハライド及び成分(e)であり、その3は成分(c)
のアゾジアミジン、成分(d)のジイソシアネート及び
成分(e)であり、その4は成分(c)のアゾジアミジ
ン、成分(d)の酸ハライド及び成分(e)である。な
お、合成する際の上記の成分(c)、成分(d)及び成分
(e)の添加順序には、特に制限はなく、基本的には次
の3方法があげられる。その1は、成分(c)と成分
(d)を反応させてから、成分(e)を反応させてアゾ
基含有ポリシロキサン化合物を得る方法。その2は、成
分(d)と成分(e)を反応させてから、成分(c)を
反応させてアゾ基含有ポリシロキサン化合物を得る方
法。その3は、成分(c)、成分(d)及び成分(e)
と同時に反応させてアゾ基含有ポリシロキサン化合物を
得る方法である。The specific combinations of the components are as follows:
There are three methods, 1 of which is azodiol of component (c), diisocyanate of component (d) and component (e), and 2 of which is azodiol of component (c), acid halide and component of component (d). (E), 3 of which is component (c)
Azodiamidine, component (d) diisocyanate and component (e), and No. 4 is component (c) azodiamidine, component (d) acid halide and component (e). The order of addition of the components (c), (d) and (e) during the synthesis is not particularly limited, and the following three methods can be basically mentioned. The first is a method of reacting the component (c) with the component (d) and then reacting the component (e) to obtain an azo group-containing polysiloxane compound. The second is a method of reacting the component (d) with the component (e) and then reacting the component (c) to obtain an azo group-containing polysiloxane compound. Part 3 includes component (c), component (d) and component (e)
This is a method for obtaining an azo group-containing polysiloxane compound by simultaneously reacting.
【0028】アゾ基含有ポリシロキサン化合物を合成す
る際に用いる有機溶媒としては、非プロトン性の溶媒が
好ましく、具体例としてはジエチルエーテル、ジメトキ
シエタン及びテトラヒドロフランなどのエーテル類;四
塩化炭素、クロロホルム、塩化メチレン及びトリクレン
などのハロゲン化炭化水素類;n−ヘキサン、シクロヘ
キサン、ベンゼン及びキシレンなどの脂肪族、脂環式及
び芳香族炭化水素類;アセトニトリル、N,N−ジメチ
ルホルムアミド、及びN−メチル−2−ピロリドンなど
があげられる。As the organic solvent used for synthesizing the azo group-containing polysiloxane compound, an aprotic solvent is preferable, and specific examples thereof include ethers such as diethyl ether, dimethoxyethane and tetrahydrofuran; carbon tetrachloride, chloroform, Halogenated hydrocarbons such as methylene chloride and tricrene; aliphatic, alicyclic and aromatic hydrocarbons such as n-hexane, cyclohexane, benzene and xylene; acetonitrile, N, N-dimethylformamide, and N-methyl- 2-pyrrolidone and the like.
【0029】なお、アゾ基含有ポリシロキサン化合物の
合成には、必要に応じて触媒が使用される。この場合、
成分(d)としてジイソシアネートを使用するに際して
用いる触媒の例としては、ジメチル錫ジラウレート、ジ
ブチル錫ジラウレート、ジブチル錫ジ(2−エチルヘキ
ソエート)などの有機金属系触媒;トリエチレンジアミ
ン、トリエチルアミン、N,N,N′,N′,N″−ペンタ
メチルジエチレントリアミン、N,N−ジシクロヘキシ
ルメチルアミン、N−メチルモルホリンなどの脂肪族、
脂環式及び異節環式の3級アミン系触媒があげられる。
成分(d)として酸ハライドを使用するに際して用いる
触媒は塩基性触媒が好ましく、具体例としてはトリエチ
ルアミン、トリブチルアミン、N,N−ジメチルアニリ
ン、ピペリジン、ピリジン、モルホリンなどの脂肪族、
芳香族及び異節環式の3級アミンがあげられる。In the synthesis of the azo group-containing polysiloxane compound, a catalyst is used if necessary. in this case,
Examples of catalysts used when using diisocyanate as component (d) include organometallic catalysts such as dimethyltin dilaurate, dibutyltin dilaurate, dibutyltin di (2-ethylhexoate); triethylenediamine, triethylamine, N, Aliphatics such as N, N ', N', N "-pentamethyldiethylenetriamine, N, N-dicyclohexylmethylamine and N-methylmorpholine;
Alicyclic and heterocyclic tertiary amine catalysts are exemplified.
The catalyst used when using an acid halide as the component (d) is preferably a basic catalyst, and specific examples thereof include aliphatic compounds such as triethylamine, tributylamine, N, N-dimethylaniline, piperidine, pyridine and morpholine.
Aromatic and heterocyclic tertiary amines are included.
【0030】反応温度は、反応中のアゾ基の熱分解及び
各成分間の副反応を防止する意味で通常−10〜50℃
であることが好ましいが、さらに好ましくは0℃〜30
℃である。反応温度が−10℃未満では、反応速度が遅
くて好ましくなく、逆に50℃を超えると成分(c)の熱
分解が起り、また使用する成分(d)、成分(e)によ
っては副反応を起してゲル化するなどの問題を生ずる。
反応時間は特に限定しないが、0.5〜24時間が好ま
しい。The reaction temperature is usually -10 to 50 ° C. in order to prevent thermal decomposition of the azo group during the reaction and side reactions between the components.
But more preferably 0 ° C to 30 ° C.
° C. If the reaction temperature is lower than −10 ° C., the reaction rate is low, which is not preferable. This causes problems such as gelation.
The reaction time is not particularly limited, but is preferably 0.5 to 24 hours.
【0031】一般式〔I〕で表わされるアゾ基含有ポリ
シロキサン化合物の数平均分子量は、通常1,500〜
100,000であるが、好ましくは2,000〜60,
000である。数平均分子量が1,500未満である
と、実質的にアゾ結合を保有しない分子がかなり存在す
ることになるため、重合性単量体とのブロック共重合の
効率が低下し、本来の機能を示さなくなる。逆に10
0,000を超えるとブロック共重合に使用する親水性
溶媒に対する溶解性が低下し、また溶液粘度が高くなる
ため、低濃度でブロック共重合を行なわなければなら
ず、この場合にはブロック共重合に使用した重合性単量
体の重合率が低下するため、長時間の反応を余儀なくさ
れる。The number average molecular weight of the azo group-containing polysiloxane compound represented by the general formula [I] is usually from 1,500 to
100,000, preferably 2,000-60,
000. If the number average molecular weight is less than 1,500, there will be considerable molecules that do not substantially possess an azo bond, so that the efficiency of block copolymerization with a polymerizable monomer is reduced, and the original function is lost. No longer shown. Conversely 10
If it exceeds 000, the solubility in the hydrophilic solvent used for block copolymerization decreases, and the solution viscosity increases, so that block copolymerization must be performed at a low concentration. For this reason, the polymerization rate of the polymerizable monomer used in the step (1) decreases, so that a long-time reaction is inevitable.
【0032】かくして得られたアゾ基含有ポリシロキサ
ン化合物の性状は、使用する各成分の分子量と種類に依
存して変動するが、通常、無色から褐色の粉末状、粘稠
油状またはゴム状を呈している。The properties of the azo group-containing polysiloxane compound thus obtained vary depending on the molecular weight and type of each component to be used, but usually exhibit a colorless to brown powder , viscous oil or rubber. ing.
【0033】次に、重合性不飽和酸単量体(a)及びこ
れと共重合可能な重合性不飽和単量体(b)の混合単量
体より導かれる共重合体単位(A)と、アゾ基含有ポリ
シロキサン化合物より導かれるポリシロキサン単位
(B)とを主鎖に有するブロック共重合体の水性化物の
製造について説明する。Next, a copolymer unit (A) derived from a mixed monomer of a polymerizable unsaturated acid monomer (a) and a polymerizable unsaturated monomer (b) copolymerizable therewith, The production of an aqueous product of a block copolymer having a polysiloxane unit (B) derived from an azo group-containing polysiloxane compound in the main chain will be described.
【0034】ブロック共重合体の水性化物の製造に用い
る前記のアゾ基含有ポリシロキサン化合物の使用量は2
〜60重量%であり、好ましくは5〜30重量%であ
る。アゾ基含有ポリシロキサン化合物の使用量が2重量
%未満ではブロック共重合が極めて困難となり、60重
量%を超えるとブロック共重合体の分子量が低下して好
ましくなく、かつ経済性も低下する。The amount of the azo group-containing polysiloxane compound used for producing the aqueous hydrate of the block copolymer is 2
-60% by weight, preferably 5-30% by weight. If the amount of the azo group-containing polysiloxane compound is less than 2% by weight, block copolymerization becomes extremely difficult, and if it exceeds 60% by weight, the molecular weight of the block copolymer decreases, which is not preferable, and the economic efficiency also decreases.
【0035】ブロック共重合体の製造に用いられる重合
性不飽和酸単量体(a)は、生成したブロック共重合体
の水性化またはアニオン電着塗装工程上必要であること
は云うまでもない。使用できる重合性不飽和酸単量体の
具体例としては(メタ)アクリル酸、マレイン酸、フマ
ール酸、イタコン酸などがあげられ、これらは単独もし
くは併用して用いることができる。It is needless to say that the polymerizable unsaturated acid monomer (a) used in the production of the block copolymer is necessary in the step of making the produced block copolymer aqueous or anionic electrodeposition coating. . Specific examples of the polymerizable unsaturated acid monomer that can be used include (meth) acrylic acid, maleic acid, fumaric acid, and itaconic acid, and these can be used alone or in combination.
【0036】また使用可能な(a)には、アシッドホス
ホオキシエチル(メタ)アクリレート、アシッドホスホ
オキシプロピル(メタ)アクリレート、アシッドホスホ
オキシポリオキシエチレングリコールモノ(メタ)アク
リレート、アシッドホスホオキシポリオキシプロピレン
グリコールモノ(メタ)アクリレートのような不飽和有
機りん酸;ビニルスルホン酸、2−アクリルアミド−2
−メチルプロパンスルホン酸、p−スチレンスルホン酸
のような不飽和有機スルホン酸などがあげられる。これ
らの重合性不飽和酸単量体(a)の中で特に(メタ)ア
クリル酸の使用が好適である。The usable (a) includes acid phosphooxyethyl (meth) acrylate, acid phosphooxypropyl (meth) acrylate, acid phosphooxypolyoxyethylene glycol mono (meth) acrylate, and acid phosphooxypolyoxypropylene. Unsaturated organic phosphoric acid such as glycol mono (meth) acrylate; vinyl sulfonic acid, 2-acrylamide-2
And unsaturated organic sulfonic acids such as -methylpropanesulfonic acid and p-styrenesulfonic acid. Among these polymerizable unsaturated acid monomers (a), the use of (meth) acrylic acid is particularly preferred.
【0037】重合性不飽和酸単量体(a)の使用量は、共
重合の相手となる該単量体組成(b)及びその分子量と
分布、または反応条件により異なるが、通常は酸価で1
5〜150で、好ましくは20〜100の範囲に調整す
べきである。The amount of the polymerizable unsaturated acid monomer (a) varies depending on the monomer composition (b) to be copolymerized and its molecular weight and distribution, or reaction conditions. At 1
It should be adjusted between 5 and 150, preferably between 20 and 100.
【0038】ブロック共重合体の製造に用いる重合性不
飽和単量体(b)の具体例としては、1〜8個の炭素原子
を有する(メタ)アクリル酸エステル例えば(メタ)ア
クリル酸メチル、エチル、イソプロピル、n−ブチル、
イソブチル、2−エチルヘキシル、2−ヒドロキシエチ
ル、ヒドロキシプロピル:1〜12個の炭素原子を有す
るアルカンモノカルボン酸のビニルエステル例えば酢酸
ビニル、プロピオン酸ビニル、ビニル−n−ブチレー
ト、ビニルバーサテート:不飽和アミド又はイミド例え
ば(メタ)アクリルアミド、N−メチル(メタ)アクリ
ルアミド、N,N−ジメチル(メタ)アクリルアミド、
N−メチロール(メタ)アクリルアミド、アルコキシメ
チル(メタ)アクリルアミド例えばN−ブトキシメチル
(メタ)アクリルアミド、マレイン酸イミド、マレイン
酸ジアミド:ビニル芳香族モノマー例えばスチレン、p
−メチルスチレンなどがあげられる。なお、一般にラジ
カル重合性を有する単量体であれば何れのものも本発明
の単量体として使用可能であり、塩化ビニル、塩化ビニ
リデン、弗化ビニリデンなどのハロゲン含有ビニル化合
物:エチレン、1,3−ブタジエンなどのモノまたはジ
オレフィン類:α−βオレフィン性不飽和酸例えばマレ
イン酸、フマル酸などのエステル:その他(メタ)アク
リロニトリル、などがあげられる。これらの単量体は単
独または併用できる。Specific examples of the polymerizable unsaturated monomer (b) used for producing the block copolymer include (meth) acrylates having 1 to 8 carbon atoms, for example, methyl (meth) acrylate, Ethyl, isopropyl, n-butyl,
Isobutyl, 2-ethylhexyl, 2-hydroxyethyl, hydroxypropyl: vinyl esters of alkanemonocarboxylic acids having 1 to 12 carbon atoms, such as vinyl acetate, vinyl propionate, vinyl-n-butyrate, vinyl versatate: unsaturated Amides or imides such as (meth) acrylamide, N-methyl (meth) acrylamide, N, N-dimethyl (meth) acrylamide,
N-methylol (meth) acrylamide, alkoxymethyl (meth) acrylamide such as N-butoxymethyl (meth) acrylamide, maleic imide, maleic diamide: vinyl aromatic monomer such as styrene, p
-Methylstyrene and the like. In general, any monomer having radical polymerizability can be used as the monomer of the present invention, and halogen-containing vinyl compounds such as vinyl chloride, vinylidene chloride, and vinylidene fluoride: ethylene, 1, Mono- or diolefins such as 3-butadiene: α-β olefinically unsaturated acids such as maleic acid and fumaric acid; and other (meth) acrylonitrile. These monomers can be used alone or in combination.
【0039】なお、重合性不飽和酸単量体(a)と重合
性不飽和単量体(b)を含む混合単量体の使用量は40
〜98重量%、好ましくは70〜95重量%である。混
合単量体の使用量が40重量%未満では、ブロック共重
合体の分子量が低下するので好ましくなく、また混合単
量体の使用量が98重量%より多い場合はブロック共重
合体の合成が極めて困難である。The amount of the mixed monomer containing the polymerizable unsaturated acid monomer (a) and the polymerizable unsaturated monomer (b) is 40
9898% by weight, preferably 70-95% by weight. When the amount of the mixed monomer used is less than 40% by weight, the molecular weight of the block copolymer decreases, which is not preferable. When the amount of the mixed monomer is more than 98% by weight, the synthesis of the block copolymer is difficult. Extremely difficult.
【0040】ブロック共重合体の製造に用いる親水性溶
媒の具体例としては、1〜4個の炭素原子を有するモノ
アルコール、例えばメチルアルコール、エチルアルコー
ル、イソプロピルアルコール、n−ブチルアルコール、
イソブチルアルコール及びt−ブチルアルコール:エチ
レングリコール及びその誘導体、例えばエチレングリコ
ールのモノメチルエーテル、モノメチルエーテルアセテ
ート、モノエチルエーテル、ジエチルエーテル、モノエ
チルエーテルアセテート、モノイソプロピルエーテル、
モノブチルエーテル、ジエチルエーテル、モノエチルエ
ーテルアセテート、モノイソプロピルエーテル、モノブ
チルエーテルアセテート:ジエチレングリコール及びそ
の誘導体、例えばジエチレングリコールのモノメチルエ
ーテル、モノエチルエーテル、モノエチルエーテルアセ
テート、モノ−n−ブチルエーテル、モノ−t−ブチル
エーテル、ジメチルエーテル、メチルエチルエーテル、
ジエチルエーテルモノアセテート:トリエチレングリコ
ール及びその誘導体、例えばトリエチレングリコールの
モノメチルエーテル、モノエチルエーテル:プロピレン
グリコール及びその誘導体、例えばプロピレングリコー
ルのモノメチルエーテル、モノエチルエーテル、モノ−
n−ブチルエーテル、モノ−t−ブチルエーテル、メチ
ルエーテルアセテート:ジプロピレングリコール及びそ
の誘導体、例えばジプロピレングリコールのモノメチル
エーテル、モノエチルエーテル:トリプロピレングリコ
ール及びその誘導体、例えばトリプロピレングリコール
のモノメチルエーテル:グリセリン及びその誘導体、例
えばグリセリンのモノアセテート:トリメチレングリコ
ール及びその誘導体、例えば1−ブトキシ−エトキシプ
ロパノール、3,3−ジメチル−3−メトキシプロパノ
ール、3−メトキシブチルアセテート:ブタンジオール
及びその誘導体、例えば3−メトキシブタノール、3−
メチル−3−メトキシブタノール、3−メチル−3−メ
トキシブチルアセテート、3−メチル−1,3−ブタン
ジオール:アセチレングリコール誘導体、例えば2,
4,7,9−テトラメチル−5−デシン−4,7−ジオ
ール及びそのエチレンオキサイド付加物、2,6−ジメ
チル−4−オクチン−3,6−ジオール:その他ジオキ
サン、1,5−ペンタンジオール、ヘキシレングリコー
ル、トリメチロールプロパン、1,2,6−ヘキサント
リオール及び低分子量ポリエチレングリコールなどがあ
げられるが、一般にエチレングリコールまたはプロピレ
ングリコールのモノアルキルエーテル及び炭素数5以下
のモノアルコールとの併用が好適である。なお、これら
の溶剤は単独または併用できる。Specific examples of the hydrophilic solvent used for producing the block copolymer include monoalcohols having 1 to 4 carbon atoms, for example, methyl alcohol, ethyl alcohol, isopropyl alcohol, n-butyl alcohol,
Isobutyl alcohol and t-butyl alcohol: ethylene glycol and its derivatives such as monomethyl ether, monomethyl ether acetate, monoethyl ether, diethyl ether, monoethyl ether acetate, monoisopropyl ether of ethylene glycol,
Monobutyl ether, diethyl ether, monoethyl ether acetate, monoisopropyl ether, monobutyl ether acetate: diethylene glycol and derivatives thereof, for example, monomethyl ether, monoethyl ether, monoethyl ether acetate of diethylene glycol, mono-n-butyl ether, mono-t-butyl ether , Dimethyl ether, methyl ethyl ether,
Diethyl ether monoacetate: triethylene glycol and its derivatives, for example, monomethyl ether of triethylene glycol, monoethyl ether: propylene glycol and its derivatives, for example, monomethyl ether, monoethyl ether, mono-ethyl of propylene glycol
n-butyl ether, mono-t-butyl ether, methyl ether acetate: dipropylene glycol and its derivatives, for example, monomethyl ether of dipropylene glycol, monoethyl ether: tripropylene glycol and its derivatives, for example, monomethyl ether of tripropylene glycol: glycerin and Derivatives thereof, such as glycerin monoacetate: trimethylene glycol and its derivatives, such as 1-butoxy-ethoxypropanol, 3,3-dimethyl-3-methoxypropanol, 3-methoxybutyl acetate: butanediol and its derivatives, such as 3- Methoxybutanol, 3-
Methyl-3-methoxybutanol, 3-methyl-3-methoxybutyl acetate, 3-methyl-1,3-butanediol: an acetylene glycol derivative such as 2,
4,7,9-Tetramethyl-5-decyne-4,7-diol and its ethylene oxide adduct, 2,6-dimethyl-4-octyne-3,6-diol: other dioxane, 1,5-pentanediol Hexylene glycol, trimethylolpropane, 1,2,6-hexanetriol and low molecular weight polyethylene glycol, and the like. Generally, monoalkyl ethers of ethylene glycol or propylene glycol and monoalcohols having 5 or less carbon atoms are used in combination. It is suitable. These solvents can be used alone or in combination.
【0041】ブロック共重合体の水性化物の製造に用い
る中和剤はアンモニア及び/またはアミン類であり、使
用しうるアミン類の具体例としてはジエチルアミン、ト
リエチルアミン、ジイソプロピルアミン、トリメチルア
ミンなどのアルキルアミン;ジエタノールアミン、トリ
エタノールアミンなどのアルカノールアミン類;ジメチ
ルアミノエタノールの如きアルキルアルカノールアミン
があげられる。使用量は使用する重合性不飽和酸単量体
の濃度(酸化)により異なるが、通常、酸基に対して5
0〜95モル%である。The neutralizing agent used in the production of the aqueous hydrate of the block copolymer is ammonia and / or amines. Specific examples of the amines that can be used include alkylamines such as diethylamine, triethylamine, diisopropylamine and trimethylamine; Alkanolamines such as diethanolamine and triethanolamine; and alkylalkanolamines such as dimethylaminoethanol. The amount used varies depending on the concentration (oxidation) of the polymerizable unsaturated acid monomer used, but is usually 5 to the acid group.
0 to 95 mol%.
【0042】ポリシロキサン単位を主鎖にもつ不飽和単
量体とのブロック共重合体の製造方法は、通常のアニオ
ン電着塗料に採用されている方法とは異なって、前述し
たアゾ基含有ポリシロキサン化合物を使用するため、一
般に用いられている低分子の重合開始剤を必要としな
い。即ち、親水性溶媒、重合性不飽和酸単量体(a)及
び重合性不飽和単量体(b)にアゾ基含有ポリシロキサ
ン化合物を溶解させてから昇温することにより、アゾ基
含有ポリシロキサン化合物中に含まれているアゾ基が分
解され、生じる炭素ラジカルが重合開始の場となる。し
たがって、ポリシロキサン単位の両延長分子末端より不
飽和単量体の重合反応が起ることになる。The method for producing a block copolymer with an unsaturated monomer having a polysiloxane unit in the main chain is different from the method employed in ordinary anionic electrodeposition coatings, and is different from the above-mentioned azo group-containing polymer. Since a siloxane compound is used, a generally used low molecular weight polymerization initiator is not required. That is, the azo group-containing polysiloxane compound is dissolved in the hydrophilic solvent, the polymerizable unsaturated acid monomer (a) and the polymerizable unsaturated monomer (b), and then the temperature is raised. The azo group contained in the siloxane compound is decomposed, and the generated carbon radical becomes a site for initiation of polymerization. Therefore, a polymerization reaction of the unsaturated monomer occurs from both ends of the extended molecule of the polysiloxane unit.
【0043】原料の仕込方法は、一括仕込みまたは分割
仕込みのどちらでもよく、通常反応温度は60〜140
℃で、反応時間は4〜20時間程度行なわれる。なお、
アゾ基含有ポリシロキサン化合物の濃度が低い場合、ア
ゾ基含有ポリシロキサン化合物中のポリシロキサン単位
の分子量が高い場合、全体として反応系に含まれるアゾ
基含有ポリシロキサン化合物のアゾ成分の濃度が低下す
るため重合率の低下が起ることがある。このような場合
には、通常のパーオキサイド系及び/またはアゾ系の開
始剤を、重合反応の後半に添加して重合率の向上を計る
こともできる。The method of charging the raw materials may be either batch charging or split charging, and the reaction temperature is usually 60 to 140.
C., the reaction time is about 4 to 20 hours. In addition,
When the concentration of the azo group-containing polysiloxane compound is low, and when the molecular weight of the polysiloxane unit in the azo group-containing polysiloxane compound is high, the concentration of the azo component of the azo group-containing polysiloxane compound included in the reaction system as a whole decreases. As a result, the polymerization rate may decrease. In such a case, a normal peroxide-based and / or azo-based initiator can be added in the latter half of the polymerization reaction to improve the polymerization rate.
【0044】パーオキサイド系開始剤の具体例として
は、メチルエチルケトンパーオキサイド、ラウロイルパ
ーオキサイド、ベンゾイルパーオキサイド、クメンハイ
ドロパーオキサイド、t−ブチルハイドロパーオキサイ
ドなどがあげられる。アゾ系開始剤の具体例としては、
2,2′−アゾビスイソブチロニトリル、1,1′−ア
ゾビス(シクロヘキサン−1−カーボニトリル)及び前
記した一般式〔II〕で表わされるアゾジオールまたはア
ゾジアミジン系化合物があげられる。また、必要に応じ
て、オクチルメルカプタン、ラウリルメルカプタン、β
−メルカプトプロピオン酸、チオグリコール酸オクチル
などの各種連鎖移動剤を分子量調節のために用いること
もできる。Specific examples of the peroxide-based initiator include methyl ethyl ketone peroxide, lauroyl peroxide, benzoyl peroxide, cumene hydroperoxide and t-butyl hydroperoxide. Specific examples of the azo initiator include:
Examples thereof include 2,2'-azobisisobutyronitrile, 1,1'-azobis (cyclohexane-1-carbonitrile), and azodiol or azodiamidine compounds represented by the above general formula [II]. Further, if necessary, octyl mercaptan, lauryl mercaptan, β
-Various chain transfer agents such as mercaptopropionic acid and octyl thioglycolate can also be used for controlling the molecular weight.
【0045】かくして得られたブロック共重合体は、ア
ンモニア及び/またはアミン類で中和後、脱イオン水を
添加することにより水性化され、安定な微粒子分散体
(アニオン電着塗料用樹脂)となる。The block copolymer thus obtained is neutralized with ammonia and / or amines, and then made aqueous by adding deionized water, to obtain a stable fine particle dispersion (resin for anionic electrodeposition paint). Become.
【0046】なお、水性化された安定な微粒子分散体に
は、主成分のブロック共重合体の外、例えば反応中の溶
剤による連鎖移動、または連鎖移動剤を使用した場合に
はそれによる連鎖移動を受け、ブロック共重合体になら
ない(a)(b)単量体の混合単量体のみより導かれる
共重合体が生成する。また通常のパーオキサイド系また
はアゾ系開始剤をアゾ基含有ポリシロキサン化合物と併
用した場合にも、ブロック共重合体にならない(a)
(b)単量体の混合単量体のみより導かれる共重合体が
生成する。また厳密にはブロック共重合反応中にアゾ基
が失括したアゾ基含有ポリシロキサン化合物及び未反応
の水酸基を有するポリジメチルシロキサンなども含まれ
ている。そして、水性化された安定な微粒子分散体の固
形分は通常20〜40%の範囲で製造できるが、アニオ
ン電着塗料はこれに硬化剤成分を含め約10%の濃度に
通常調製される。ブロック共重合体の製造後に添加混合
される硬化剤は脱イオン水を添加して水性化する前後の
どちらの添加でもよい。The aqueous stable dispersion of fine particles may contain, in addition to the block copolymer as the main component, chain transfer by a solvent during the reaction, or chain transfer by a chain transfer agent when a chain transfer agent is used. As a result, a copolymer derived from only a mixed monomer of the monomers (a) and (b), which does not become a block copolymer, is produced. Also, when a normal peroxide-based or azo-based initiator is used in combination with an azo-containing polysiloxane compound, a block copolymer is not obtained (a).
(B) A copolymer derived from only a monomer mixture of monomers is produced. Strictly, it also includes an azo group-containing polysiloxane compound in which the azo group has been lost during the block copolymerization reaction, and an unreacted hydroxyl group-containing polydimethylsiloxane. The solid content of the water-based stable fine particle dispersion can be usually produced in the range of 20 to 40%, but the anionic electrodeposition paint is usually prepared to a concentration of about 10% including the curing agent component. The hardener added and mixed after the production of the block copolymer may be added either before or after adding deionized water to make it aqueous.
【0047】[0047]
【実施例】以下、実施例及び比較例をあげて本発明をさ
らに詳細に説明する。なお、製造例、実施例、比較例及
び応用参考例中の「部」は、特に断りのない限り「重量
部」である。The present invention will be described below in more detail with reference to examples and comparative examples. Note that “parts” in Production Examples, Examples, Comparative Examples, and Application Reference Examples are “parts by weight” unless otherwise specified.
【0048】製造例1(アゾ基含有ポリシロキサン化合
物の合成) 温度計、撹拌機、還流冷却器及び塩化カルシウム管の付
いた500mlの四つ口フラスコに、クロロホルム380
部、2,2′−アゾビス(2−シアノプロパノール)
〔和光純薬工業(株)社製,VF−077〕5.88
部、分子量3,200の両末端に水酸基を有するポリジ
メチルシロキサン〔前記一般式(V)において、R6及
びR7はメチル基、Gは水酸基、Jは−(CH2)2O
(CH2)3−、mは平均40の信越化学工業(株)社
製,KF−6002〕96部及びトリエチルアミン1
2.12部を仕込み、撹拌均質化後氷冷した。次に、セ
バシン酸ジクロライド14.32部を含むクロロホルム
溶液47部を約1時間で滴下した後、30℃加温下に4
時間反応を続けた。Production Example 1 (Synthesis of azo group-containing polysiloxane compound) In a 500 ml four-necked flask equipped with a thermometer, a stirrer, a reflux condenser and a calcium chloride tube, chloroform 380 was added.
Part, 2,2'-azobis (2-cyanopropanol)
[VF-077, manufactured by Wako Pure Chemical Industries, Ltd.] 5.88
Part, a polydimethylsiloxane having a hydroxyl group at both terminals having a molecular weight of 3,200 [In the above general formula (V), R 6 and R 7 are methyl groups, G is a hydroxyl group, and J is — (CH 2 ) 2 O.
(CH 2 ) 3- , m is an average of 40, 96 parts of KF-6002 manufactured by Shin-Etsu Chemical Co., Ltd. and triethylamine 1
After charging 2.12 parts, the mixture was homogenized with stirring and cooled with ice. Next, 47 parts of a chloroform solution containing 14.32 parts of sebacic acid dichloride was added dropwise over about one hour, and then heated at 30 ° C.
The reaction was continued for hours.
【0049】反応終了後、生成物溶液を水洗し、溶液中
に含まれているトリエチルアミン塩酸塩などの水溶性成
分を除去し、減圧乾燥を行なって重合体を得た。重合体
の収率は93%、GPCより求めた重合体のポリスチレ
ン換算数平均分子量は22,000であった。なお、D
SC(示差走査熱量計)より求めたアゾ基の熱分解温度
は88.6℃であって、そのエンタルピーは−38.6
mJ/mgであったが、140℃、5時間熱処理後の重合体
にはこの熱収支は見受けられなかった。After completion of the reaction, the product solution was washed with water to remove water-soluble components such as triethylamine hydrochloride contained in the solution, and dried under reduced pressure to obtain a polymer. The yield of the polymer was 93%, and the number average molecular weight in terms of polystyrene of the polymer determined by GPC was 22,000. Note that D
The thermal decomposition temperature of the azo group determined by SC (differential scanning calorimeter) is 88.6 ° C., and its enthalpy is −38.6.
Although this was mJ / mg, this heat balance was not found in the polymer after heat treatment at 140 ° C. for 5 hours.
【0050】製造例2(アゾ基含有ポリシロキサン化合
物の合成) 製造例1で用いた2,2′−アゾビス(2−シアノプロ
パノール)の代りに、2,2′−アゾビス(N,N′−
ジメチレンイソブチルアミジン)7.5部を用いた以外
は、製造例1と同様に行なって重合体を得た。Production Example 2 (Synthesis of azo group-containing polysiloxane compound) Instead of 2,2'-azobis (2-cyanopropanol) used in Production Example 1, 2,2'-azobis (N, N'-
A polymer was obtained in the same manner as in Production Example 1 except that 7.5 parts of dimethyleneisobutylamidine) was used.
【0051】重合体の収率は98%、GPCより求めた
重合体のポリスチレン換算数平均分子量は12,000
であった。なお、DSCより求めたアゾ基の熱分解温度
は86.2℃であって、そのエンタルピーは−88.8m
J/mgであったが、140℃、5時間熱処理後の重合体に
はこの熱収支は見受けられなかった。The yield of the polymer was 98%, and the number average molecular weight in terms of polystyrene of the polymer determined by GPC was 12,000.
Met. The thermal decomposition temperature of the azo group determined by DSC was 86.2 ° C, and its enthalpy was -88.8 m
J / mg, but this heat balance was not observed in the polymer after heat treatment at 140 ° C. for 5 hours.
【0052】製造例3(アゾ基含有ポリシロキサン化合
物の合成) 製造例1で用いたフラスコに、撹拌しながらクロロホル
ム140部、製造例1で用いた両末端に水酸基を有する
ポリジメチルシロキサン100部、トリレンジイソシア
ネート10.88部及びジブチル錫ジラウレート0.0
7部を順次仕込み、室温で4時間反応させた。次に、
2,2′−アゾビス(N,N′−ジメチレンイソブチル
アミジン)7.82部、クロロホルム140部及びジブ
チル錫ジラウレート0.005部を仕込んで、更に室温
で23時間反応を続けた。反応終了後、生成物溶液を水
洗し、減圧乾燥を行なって重合体を得た。Preparation Example 3 (Synthesis of azo group-containing polysiloxane compound) 140 parts of chloroform was stirred in the flask used in Preparation Example 1, 100 parts of polydimethylsiloxane having hydroxyl groups at both ends used in Preparation Example 1, 10.88 parts of tolylene diisocyanate and 0.0 of dibutyltin dilaurate
7 parts were sequentially charged and reacted at room temperature for 4 hours. next,
7.82 parts of 2,2'-azobis (N, N'-dimethyleneisobutylamidine), 140 parts of chloroform and 0.005 part of dibutyltin dilaurate were charged, and the reaction was further continued at room temperature for 23 hours. After the reaction, the product solution was washed with water and dried under reduced pressure to obtain a polymer.
【0053】重合体の収率は93%、GPCにより求め
た重合体のポリスチレン換算数平均分子量は14,50
0であった。なお、DSCより求めたアゾ基の熱分解温
度は106.2℃であって、そのエンタルピーは−23.
5mJ/mgであったが、140℃、5時間熱処理後の重合
体には、この熱収支は見受けられなかった。The yield of the polymer was 93%, and the number average molecular weight in terms of polystyrene of the polymer determined by GPC was 14,50.
It was 0. The thermal decomposition temperature of the azo group determined by DSC was 106.2 ° C. and its enthalpy was −23.
Although it was 5 mJ / mg, this heat balance was not found in the polymer after heat treatment at 140 ° C. for 5 hours.
【0054】製造例4(アゾ基含有ポリシロキサン化合
物の合成) 製造例3で用いた2,2′−アゾビス(N,N′−ジメチ
レンイソブチルアミジン)の代りに2,2′−アゾビス
(2−シアノプロパノール)6.13部を用いた以外は
製造例3と同様に行なって重合体を得た。Production Example 4 (Synthesis of azo group-containing polysiloxane compound) Instead of 2,2'-azobis (N, N'-dimethyleneisobutylamidine) used in Production Example 3, 2,2'-azobis (2 -Cyanopropanol) was carried out in the same manner as in Production Example 3 except for using 6.13 parts, to obtain a polymer.
【0055】重合体の収率は99%、GPCにより求め
た重合体のポリスチレン換算数平均分子量は21,00
0であった。なおDSCより求めたアゾ基の熱分解温度
は81.3℃であって、そのエンタルピーは−27.4mJ
/mgであったが、140℃、5時間熱処理後の重合体に
は、この熱収支は見受けられなかった。The yield of the polymer was 99%, and the number average molecular weight in terms of polystyrene of the polymer determined by GPC was 21,000.
It was 0. The thermal decomposition temperature of the azo group determined by DSC was 81.3 ° C., and its enthalpy was −27.4 mJ.
/ Mg, but this heat balance was not found in the polymer after heat treatment at 140 ° C for 5 hours.
【0056】実施例1〜5 撹拌機、熱交換器及び温度計を備えた1000mlの四つ
口フラスコに、表1記載の処方にしたがって、アゾ基含
有ポリシロキサン化合物、重合性不飽和酸単量体及び重
合性不飽和単量体を一括して仕込み、撹拌下約100℃
の温度で7時間溶液重合を行なってから、希釈溶剤を添
加した。次いで反応物溶液の温度を約60℃とし、中和
剤溶液で中和後、脱イオン水を徐々に添加して水性化
し、安定な微粒子分散体(アニオン電着塗料用樹脂)と
した。Examples 1 to 5 In a 1000 ml four-necked flask equipped with a stirrer, a heat exchanger and a thermometer, an azo group-containing polysiloxane compound and a polymerizable unsaturated acid monomer were added according to the formulation shown in Table 1. And the polymerizable unsaturated monomer are charged at a time and stirred at about 100 ° C.
The solution polymerization was carried out at a temperature of 7 hours, and then a diluting solvent was added. Next, the temperature of the reaction solution was adjusted to about 60 ° C., neutralized with a neutralizer solution, and deionized water was gradually added to make the aqueous solution aqueous, thereby obtaining a stable fine particle dispersion (resin for anionic electrodeposition paint).
【0057】得られた微粒子分散体は酢酸を添加して樹
脂を析出し、アセトン/水で溶解/析出を繰り返して未
反応成分を除去して乾燥し、 1H−NMR及び赤外吸収
スペクトル分析を行なった結果、いづれの試料もポリジ
メチルシロキサン単位を主鎖に持つブロック共重合体で
あることを確認した。The obtained fine particle dispersion was added with acetic acid to precipitate a resin, and repeated dissolution / precipitation with acetone / water to remove unreacted components, followed by drying, and 1 H-NMR and infrared absorption spectrum analysis. As a result, it was confirmed that each sample was a block copolymer having a polydimethylsiloxane unit in the main chain.
【0058】[0058]
【発明の効果】本発明のポリシロキサン単位を主鎖にも
つビニル成分とのブロック共重合体の水性化物は、付着
性、耐候性に優れており、かつ艶消し性を有するアニオ
ン電着塗料として有用である。The aqueous product of the block copolymer of the present invention with a vinyl component having a polysiloxane unit in the main chain is excellent in adhesion and weather resistance, and is used as an anionic electrodeposition paint having a matting property. Useful.
【0059】[0059]
【表1】 [Table 1]
【0060】応用参考例1〜5及び(比較)参考例1〜
2 実施例1〜5で得られたポリシロキサン単位を主鎖に持
つブロック共重合体の水性化物を主成分とするアニオン
電着塗料用樹脂及び比較例1〜2の樹脂に硬化剤成分と
してサイメル301(三井東圧化学(株)社製の水溶性メ
ラミン樹脂)を表2記載の処方にしたがって配合してア
ニオン電着塗装を行ない、表2の結果を得た。Application Reference Examples 1 to 5 and (Comparative) Reference Examples 1 to
2 Cymel as a curing agent component was added to a resin for an anionic electrodeposition paint having a water-based block copolymer having a polysiloxane unit as a main chain obtained in Examples 1 to 5 and a resin of Comparative Examples 1 to 2 as main components. 301 (water-soluble melamine resin manufactured by Mitsui Toatsu Chemicals, Inc.) was blended in accordance with the formulation shown in Table 2 and anion electrodeposition coating was carried out.
【0061】なお、用いた被塗装体、電着塗装条件及び
塗膜性能の評価方法は次のような要領で行なった。The object to be coated, the electrodeposition coating conditions, and the method of evaluating the coating film performance were performed in the following manner.
【0062】イ)アルミニウム板:JIS H400
(A1050P)1.5×35×70mm ロ)陽極酸化: ・10%NaOH水溶液に2分/60℃浸漬後、脱イオ
ン水洗浄 ・15%HNO3 水溶液に30秒/25℃浸漬後、脱イ
オン水洗浄 ・15%H2SO4水溶液に電流量1A/dm2 で30分/
30℃通電後、脱イオン水洗浄 ハ)電着塗装:電圧150V,2分/25℃,電極間距
離150mm ニ)膜厚:膜厚計(イソスコープMP2,ヘルムトフィ
ッシャー社製品)を用いて測定 ホ)塗膜の平滑性:塗装後の塗膜の外観を肉眼観察し、
外観、凹凸、ピンホールを調べた。 ヘ)付着性:塗面に1mm間隔のゴバン目(10×10)
を入れ、セロハンテープを貼り付けた後に剥離し、残っ
た塗膜の数で評価 ト)光沢:光沢計〔デジタル変角光沢計UGV−5D,
スガ試験機(株)製品〕を用いて60度鏡面光沢度を測
定 チ)耐候性:サンシャインウエザオメーター1000時
間後の光沢保持率(%) リ)鉛筆硬度:「三菱ユニ」(三菱鉛筆(株)製品)を
用いて塗膜に傷が付くまでの硬度で評価 ヌ)耐アルカリ性:5%Na2CO3水溶液に塗膜を24
時間/20℃浸漬後の状態を観察 ル)耐酸性:5%H2SO4水溶液に塗膜を24時間/2
0℃浸漬後の状態を観察A) Aluminum plate: JIS H400
(A1050P) 1.5 × 35 × 70 mm b) Anodization: ・ Immersion in a 10% NaOH aqueous solution for 2 minutes / 60 ° C., then washing with deionized water ・ Immersion in a 15% HNO 3 aqueous solution for 30 seconds / 25 ° C., then deionization Water washing ・ 15% H 2 SO 4 aqueous solution at a current of 1 A / dm 2 for 30 minutes /
3) Electrodeposition coating: voltage 150V, 2 minutes / 25 ° C, distance between electrodes 150mm d) Film thickness: Using a film thickness meter (Isoscope MP2, manufactured by Helmut Fisher Co.) Measurement e) Smoothness of the coating film: The appearance of the coating film after coating is visually observed.
The appearance, irregularities, and pinholes were examined. F) Adhesion: Gobang eyes at 1 mm intervals on the coated surface (10 × 10)
And then peel off after attaching cellophane tape, and evaluate by the number of remaining coatings. G) Gloss: Gloss meter [Digital variable angle gloss meter UGV-5D,
Suga Test Machine Co., Ltd. product) to measure the specular gloss at 60 degrees g) Weather resistance: gloss retention (%) after 1000 hours of sunshine weatherometer Re) Pencil hardness: "Mitsubishi Uni" (Mitsubishi Pencil (Product) Co., Ltd.) to evaluate the hardness until the coating film is damaged. D) Alkali resistance: 24 coating films in 5% Na 2 CO 3 aqueous solution.
Time / 20 ° C. observing Le a state after immersion) Acid resistance: 5% H 2 SO 4 aqueous solution for coating 24 hours / 2
Observe the condition after immersion at 0 ℃
【0063】[0063]
【表2】 [Table 2]
【0064】[0064]
【発明の効果】本発明のポリシロキサン単位を主鎖に持
つビニル成分とのブロック共重合体の水性化物は、付着
性、耐候性に優れており、かつ艶消し性を有するアニオ
ン電着塗料用樹脂として有用である。The aqueous product of the block copolymer of the present invention with a vinyl component having a polysiloxane unit in the main chain is excellent in adhesion and weather resistance, and has a matting property for an anionic electrodeposition paint. Useful as a resin.
Claims (2)
共重合可能な重合性不飽和単量体(b)の混合単量体よ
り導かれる共重合体単位(A)とアゾ基含有ポリシロキ
サン化合物より導かれるポリシロキサン単位(B)とを
主鎖に有するブロック共重合体の水性化物を主成分とす
る分散型アニオン電着塗料。1. A copolymer unit (A) derived from a monomer mixture of a polymerizable unsaturated acid monomer (a) and a polymerizable unsaturated monomer (b) copolymerizable therewith, and azo A dispersion-type anionic electrodeposition coating composition containing, as a main component, an aqueous hydrate of a block copolymer having a polysiloxane unit (B) derived from a group-containing polysiloxane compound in a main chain.
アノ基、R 3 は脂肪族炭化水素、脂肪族アミド、アミジ
ン、脂肪族アミジンもしくはその誘導体の各基、R 4 は
飽和または不飽和脂肪族、脂環式、芳香族炭化水素の各
基、R 5 はポリシロキサン含有化合物基を示し、X及び
Zはエステル、アミド、ウレタンまたは尿素結合を示
す]で表わされるアゾ基含有ポリシロキサン化合物の2
〜60重量%の存在下に、重合性不飽和酸単量体(a)
及びこれと共重合可能な重合性不飽和単量体(b)の混
合単量体の40〜98重量%を親水性溶媒中でラジカル
重合し、アンモニア及び/またはアミン類で中和した
後、水性化することを特徴とする請求項1記載の分散型
アニオン電着塗料の製造方法。 2. A general formula [I] embedded image Wherein R 1 is an alkyl group, R 2 is an alkyl group or
Ano group, R 3 is an aliphatic hydrocarbon, an aliphatic amide,
Emissions, aliphatic amidine or each group of derivatives thereof, R 4 is
Saturated or unsaturated aliphatic, alicyclic and aromatic hydrocarbons
The group R 5 represents a polysiloxane-containing compound group, X and
Z represents an ester, amide, urethane or urea bond
Of the azo group-containing polysiloxane compound represented by the formula
Polymerizable unsaturated acid monomer (a) in the presence of
And a mixture of the polymerizable unsaturated monomer (b) copolymerizable therewith.
40-98% by weight of the monomer is free radical in a hydrophilic solvent
Polymerized and neutralized with ammonia and / or amines
2. The dispersion type according to claim 1, wherein the dispersion type is made aqueous.
A method for producing an anionic electrodeposition paint .
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3338498A JP2730364B2 (en) | 1991-12-20 | 1991-12-20 | Anionic electrodeposition paint and method for producing the same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3338498A JP2730364B2 (en) | 1991-12-20 | 1991-12-20 | Anionic electrodeposition paint and method for producing the same |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH05171075A JPH05171075A (en) | 1993-07-09 |
| JP2730364B2 true JP2730364B2 (en) | 1998-03-25 |
Family
ID=18318722
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3338498A Expired - Lifetime JP2730364B2 (en) | 1991-12-20 | 1991-12-20 | Anionic electrodeposition paint and method for producing the same |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2730364B2 (en) |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2649244B2 (en) * | 1988-04-04 | 1997-09-03 | 大日本インキ化学工業株式会社 | Resin composition for paint |
-
1991
- 1991-12-20 JP JP3338498A patent/JP2730364B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH05171075A (en) | 1993-07-09 |
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