JP2740570B2 - Semiconductor process support system - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a semiconductor process support system for creating a semiconductor process flow used in a semiconductor manufacturing support system or the like.

[Conventional technology]

FIG. 7 is a diagram showing a lot configuration of a conventional semiconductor process support system. A conventional example will be described with reference to FIG. In creating a semiconductor process flow in a conventional semiconductor process support system, one process processing condition is set for each process. For example, it consists of 9 steps and 2 in step 5
When two different process conditions 5a and 5b are set and two different process conditions 8a and 8b are set in step 8, four semiconductor wafers (hereinafter abbreviated as wafers) are used in steps 1 to 4. In step 5, the processing conditions 5a are set in Lot-B, and the processing conditions 5b are set in Lot-C. Then, from step 6 to step 7, one Lo composed of four wafers is again
A processing condition is set as t−D. On the other hand, in step 8, the processing conditions 8a and 8b are set for Lot-E and Lot-F respectively composed of two wafers.
The processing conditions were set as one Lot-G composed of one wafer.

[Problems to be solved by the invention]

As described above, in the conventional process support system, two process processing conditions 5a, 5b and 8a, 8
Seven lots from A to G were required to set b. In order to set a plurality of process processing conditions in the semiconductor manufacturing process as described above, a plurality of lots are required, and there is a problem that the number of lots increases.

The present invention has been made in view of such a conventional problem, and has as its technical object to provide a semiconductor process support system for reducing the number of lots.

[Means for solving the problem]

The present invention provides a condition division table file having data items including a process name, a process number, a parameter name, a parameter value, a unit, and a semiconductor wafer number for creating a specific semiconductor device. If the groups are the same, the data is stored in a process correspondence table file having, as one record, a condition classification table file registration means for registering a data item value group, and a process name and a common process name when creating various semiconductor devices as data items. A process correspondence table file registration means for registering an item value group;
Register the data item value group in the basic process flow file that has items as data items including the process number, sub number, common process name, process name, parameter name, parameter value, unit, and semiconductor wafer number to be processed. Basic process flow file registration means for registering the initial value N in the item, condition division table record extraction means for extracting one record from the condition division table file, and step name item value of the record extracted by the condition division table record extraction means. , A process correspondence table record search unit that compares the process name item value of the process correspondence table file and searches for a record containing the matching item value from the process correspondence table file, and a record shared by the process correspondence table record search unit A common process name item value extraction means for extracting the process name item value, Compares the process number item value of the record extracted by the table record extraction means with the process number item value of the basic process flow file, and includes the item value matched from the basic process flow file, and has the largest sub number item value If the sub-number item value of the record retrieved by the process number record retrieval means is an initial value, a condition grouping table record extraction means and a common step The item value group of the record extracted by the name item extracting means is registered with the value obtained by adding 1 to the sub number item value for the sub number item, and if the sub number item value is not the initial value, immediately after the searched record Insert a new record into the corresponding item group of the record Condition classification process flow registration for registering the item value group of the record extracted by the division table record extraction means and the common process name item extraction means, and the value obtained by adding 1 to the sub number item value of the immediately preceding record for the sub number item And means.

[Action]

According to the present invention having such features, a record is extracted from the condition dividing table file by the condition dividing table record extracting means, and the record including the matching process name item value from the process correspondence table file by the process correspondence table record retrieving means. And extract the common process name item value from the process correspondence table file by the common process name item value extracting means,
A record including the matching process number item value is retrieved from the basic process flow file by the process number record retrieval unit, and the item value group extracted by the condition division table record extraction unit and the common process name item extraction unit by the condition division process flow registration unit Is registered in the basic process flow file, so that a semiconductor process flow file including a record in which different processing conditions are set for each wafer is created. In the semiconductor process flow file thus created, semiconductor processing conditions can be set for each wafer, and even when a plurality of processing conditions are set, one lot can be used, and the number of lots can be reduced. .

〔Example〕

FIG. 1 is a functional block diagram of a semiconductor process support system according to one embodiment of the present invention, FIG. 2 is a bipolar condition classification table file configuration diagram of the semiconductor process support system according to one embodiment of the present invention, and FIG. FIG. 4 is a configuration diagram of a bipolar process correspondence table file of the semiconductor process support system in one embodiment of the present invention, FIG. 4 is a configuration diagram of a basic bipolar process flow file of the semiconductor process support system in one embodiment of the present invention, and FIG. FIG. 6 is a configuration diagram of a bipolar process flow file after conversion of the semiconductor process support system in the embodiment, and FIG. 6 is a diagram illustrating a lot configuration of the semiconductor process support system in one embodiment of the present invention.

Here, an embodiment will be described by taking as an example a process flow creation in the case of developing and manufacturing a bipolar semiconductor product. In this embodiment, for example, a process flow is created using a microcomputer. First, as shown in FIG. 2, the condition dividing table file registration means 1 stores a bipolar process name 11 for producing a bipolar semiconductor device.
0, process number 120, parameter name 130, parameter value 140,
A bipolar condition classification table file 100 having a unit 150 and four wafer numbers wf1, wf2, wf3, wf4 as data items.
If all the item value groups except the wafer number are the same, they are registered as one record. In this procedure, the registration process for each record is repeated by the number of conditions for dividing the conditions of the wafer. The bipolar process name describes a process name as a name unique to the manufacture of a bipolar semiconductor. For example Si ₃ N ₄ as a bipolar process name 110 as shown in FIG. 2
Film thickness deposition, process number 120 as 5, parameter name 130 as film thickness, parameter value 140 as 50, unit 150 as nm,
The wafer numbers wf1 and wf2 are registered as the first record 101. Similarly, records 102 are sequentially registered as shown in FIG. Record 1 is Si ₃ N ₄ and the Si ₃ N ₄ film with a thickness of deposition process to 50μm deposited on the wafer 1 and the wafer 2, the same in the record 2 wafer 3 and the wafer 4
This shows that 75 nm is deposited.

As shown in FIG. 3, the process correspondence table file registration means 2 stores a bipolar process name 210 and a bipolar process correspondence table file 200 having, as data items, a common process name 220 for creating all semiconductor devices. Register as a group record. For example, Si ₃ N ₄ film thickness deposition is registered as the bipolar process name of the record 201, and Si ₃ N ₄ tyeseki is registered as the common process name. In this procedure, the registration process for each record is repeated by a necessary number. In addition, this process correspondence table shows a specific semiconductor device, for example, bipolar, MOS,...
It is created for each semiconductor device and is used to associate a name unique to the manufacture of various semiconductor devices with a process name common to all semiconductor device manufacturing processes.

As shown in FIG. 4, the basic process flow file registration means 3 stores a process number 310, a sub-number 311 and a common process name 32.
A data item value group is registered in a basic bipolar process flow file 300 having data items of 0, a bipolar process name 321, a parameter name 330, a parameter value 340, a unit 350, and a semiconductor wafer number 360 to be processed. For example, a basic process flow for creating a bipolar device is registered as each data item value.
As part of this, 3.5.7.8.8 and EB.Si ₃ N ₄ tyeseki.B are added to the item values of process number 310 and common process name 320, respectively.
Register P ・ B i / i. The processing conditions of each step of the bipolar basic process flow are one type, and standard conditions are registered. Here, the sub-number indicates that a certain process is composed of a plurality of processes for each wafer, and it is assumed that an initial value N, for example, 0 is all registered when a basic process flow file is registered.

The condition sorting table record extracting means 4 sequentially extracts one record at a time from the first record 101 of the bipolar condition sorting table file 100.

The process correspondence table record search means 5 is a record extracted by the condition division table record extraction means 4, for example, a first record.
Si ₃ N ₄ film thickness deposition of 101 bipolar process name 110 and bipolar process name 210 of bipolar process correspondence table file 200
Compare the item value of each record from the first record,
The record 201 including the matching item value is searched.

The common process name item extracting means 6 extracts the item value of the common process name 220 of the record 201 searched by the process correspondence table record searching means 5, for example, the Si ₃ N _{4 type of the} record 201.

The process number record search means 7 compares the item value 5 of the process number 120 of the record 101 extracted by the condition division table record extracting means 4 with the item value of the process number 310 of the bipolar basic process flow file 300 in the first record. A comparison is made for each record, and a record 301 including the matched item value and having the largest item value of the sub number 311 is searched from the records of the bipolar basic process flow file 300.

The condition dividing process flow registration means 8 stores the records retrieved by the process number record retrieval means 7 as shown in FIG.
If the sub-number 311 of 302 is an initial value, that is, 0, the record 101 extracted by the condition grouping table record extracting means 4 and the record extracted by the common process name item extracting means 6 into the item group corresponding to the searched record 302 Register 201 item value groups. Also, the sub-number 311 of the record 302 retrieved by the process number record retrieval means 7 has an initial value of 0.
If not, a new record 401 is inserted immediately after the searched record 302, and the record extracted by the condition grouping table record extracting means 4 into the item group corresponding to the record is inserted.
The item value group of the record 201 extracted by 101 and the common process name item extracting means 6 is registered. For example, process number 4
10.Common process name 420 ・ Bipolar process name 421 ・ Parameter name 430 ・ Parameter value 440 ・ Unit 450 ・ Processing wafer 460
The item values of the first record 101 extracted by the condition dividing table record extracting means 4 and the record 201 extracted by the common process name item extracting means 7 are 5 · Si ₃ N ₄ tyeseki · Si ₃ N ₄ film thickness. A value obtained by adding 1 to the sub-number item value, that is, 1 is registered in the item of the sub-number 411 for the deposition / film thickness / 50 · nm · 1, 2 respectively. Then, 5 · Si ₃ N ₄ tyseki · Si ₃ N ₄ film thickness deposition, which is the item value of each of the second record 103 extracted by the condition dividing table record extracting means 4 and the record 201 extracted by the common process name item extracting means 7・ Thickness ・ 75 ・ nm ・ 3, 4 are registered in the item of sub number 411 with the value obtained by adding 1 to the item value of sub number 411 of the record 302 immediately before, ie, 2 I do. The common process name 420 item contains the common process name for creating a semiconductor device, and the bipolar process name.
The names specific to the bipolar device are registered in the 421 items, respectively, and the bipolar process name can be used as a search key at the time of data search.

Last record 103 of bipolar condition table file 100
The process repeats the process of sequentially extracting the condition grouping table record, searching for the process correspondence table record, extracting the common process name item, searching for the process number record, and sequentially registering the extracted record items in the process number basic bipolar process file 300 until the number of records reaches the maximum.

As described above, according to this embodiment, as shown in FIG. 5, it is possible to create a converted bipolar process file 400 including a record in which different processing conditions are set for each wafer, and furthermore, it is possible to create a specific bipolar device specific file. , And a common process name for creating a semiconductor device, a process flow can be created.

Therefore, the first of the converted bipolar process file 400
By extracting one record from each record, semiconductor processing conditions can be set for each wafer in each semiconductor processing step. That is, as shown in FIG. 6, even when different processing conditions 5a, 5b, 8a, and 8b are set for each wafer in a plurality of process processing conditions, steps 5 and 8, 1 is composed of four wafers. Two Lo
Not only can it be tA (20), but also a process flow can be created that uses a specific name for a particular semiconductor device and common steps for creating the semiconductor device.

The processes of the above-described condition division table file registration means 1, step correspondence table file registration means 2, and basic process flow file registration means 3 can be performed in any order. After performing the processing of the condition division table record extraction means 4, the process number record search and the process correspondence table record search are performed in an arbitrary order, and then the common process name item extraction and the condition classification process flow are registered. Is also good.

〔The invention's effect〕

As described above in detail, according to the present invention, by setting the processing conditions for each semiconductor wafer in the semiconductor processing step, one lot is set even when a plurality of processing conditions are set in a certain step. And the number of lots can be reduced. In addition, a process flow using a name specific to a specific semiconductor device and a common process for preparing the semiconductor device can be created, and the practical effect is large.

[Brief description of the drawings]

FIG. 1 is a functional block diagram of a semiconductor process support system according to the present invention, FIG. 2 is a diagram showing a bipolar condition classification table file structure according to an embodiment of the present invention, and FIG. FIG. 4 is a diagram showing a basic bipolar process flow file according to an embodiment of the present invention. FIG. 5 is a diagram showing a converted bipolar process flow file of a semiconductor process support system according to an embodiment of the present invention. The figure is a lot configuration diagram of the semiconductor process support system in one embodiment of the present invention,
FIG. 7 is a diagram showing a lot configuration of a semiconductor process support system according to a conventional example. 1 ... Conditioning table file registration means, 2 ... Process correspondence table file registration means, 3 ... Basic process flow file registration means, 4 ... Conditioning table record extraction means, 5 ...
Process correspondence table record search means, 6 ... Common process name item extraction means, 7 ... Process number record search means, 8 ...
Conditioning process flow registration means, 100 Bipolar condition classification table file, 101 First record, 102 Second record, 103 Last record, 110, 210, 321, 421
… Bipolar process name, 120,310,410 …… Process number, 130,3
30,430 …… Parameter name, 140,340,440 …… Parameter value, 150,350,450… Unit, 200 …… Bipolar process correspondence table file, 201,301,302,401… Record, 220,320,4
20: Common process name, 300: Basic bipolar process flow file, 311,411: Sub number, 360,460: Semiconductor wafer number to be processed, 400: Converted bipolar process flow file.

Claims (1)

(57) [Claims] 1. A process name, a process number, a parameter name, a parameter value, a unit, and a process name for producing a specific semiconductor device.
A condition dividing table file for registering the data item value group as one record when all the item value groups except the semiconductor wafer number are the same in the condition dividing table file having the data item including the semiconductor wafer number; A process correspondence table file registration unit for registering the data item value group in a process correspondence table file having a process name and a common process name when creating various semiconductor devices as a data item; and the process number, the sub number, and the common Process name, the process name, the parameter name, the parameter value, the unit,
A basic process flow file registration unit for registering the data item value group in a basic process flow file having an item including a semiconductor wafer number to be processed as a data item, and registering an initial value N in a sub number item; A condition dividing table record extracting means for extracting one record from the file; comparing the process name item value of the record extracted by the condition dividing table record extracting means with the process name item value of the process correspondence table file; A step correspondence table record search means for searching for a record including a matching item value from the step correspondence table file; and a common step name item value for extracting the common step name item value of the record searched by the step correspondence table record search means. Extraction means; and the condition extraction table record extraction means. The process number item value of the code is compared with the process number item value of the basic process flow file, and a record including the matched item value from the basic process flow file and further having the largest sub number item value is searched. A process number record retrieving means, and if the sub-number item value of the record retrieved by the process number record retrieving means is an initial value, the condition grouping table record extracting means and the common step The item value group of the record extracted by the name item extracting means is registered with the value obtained by adding 1 to the sub number item value for the sub number item, and if the sub number item value is not the initial value, immediately after the searched record A new record is inserted into the corresponding item group of the record, Condition grouping process flow for registering the item value group of the record extracted by the table record extraction means and the common step name item extraction means, and adding the value obtained by adding 1 to the sub number item value of the immediately preceding record to the sub number item And a registering means.