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JP2810573B2 - Manufacturing method of magneto-optical element - Google Patents
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JP2810573B2 - Manufacturing method of magneto-optical element - Google Patents

Manufacturing method of magneto-optical element

Info

Publication number
JP2810573B2
JP2810573B2 JP282792A JP282792A JP2810573B2 JP 2810573 B2 JP2810573 B2 JP 2810573B2 JP 282792 A JP282792 A JP 282792A JP 282792 A JP282792 A JP 282792A JP 2810573 B2 JP2810573 B2 JP 2810573B2
Authority
JP
Japan
Prior art keywords
layer
film
magneto
multilayer film
gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP282792A
Other languages
Japanese (ja)
Other versions
JPH05189824A (en
Inventor
淳策 中嶋
明 高橋
賢司 太田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sharp Corp
Original Assignee
Sharp Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Corp filed Critical Sharp Corp
Priority to JP282792A priority Critical patent/JP2810573B2/en
Publication of JPH05189824A publication Critical patent/JPH05189824A/en
Application granted granted Critical
Publication of JP2810573B2 publication Critical patent/JP2810573B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y25/00Nanomagnetism, e.g. magnetoimpedance, anisotropic magnetoresistance, giant magnetoresistance or tunneling magnetoresistance
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F10/00Thin magnetic films, e.g. of one-domain structure
    • H01F10/32Spin-exchange-coupled multilayers, e.g. nanostructured superlattices
    • H01F10/324Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer
    • H01F10/325Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer the spacer being noble metal

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Nanotechnology (AREA)
  • Power Engineering (AREA)
  • Physical Vapour Deposition (AREA)
  • Thin Magnetic Films (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明はレーザー光等の光により
情報の記録、消去及び再生を行う磁気光学素子の製造方
法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a magneto-optical element for recording, erasing and reproducing information by using light such as laser light.

【0002】[0002]

【従来の技術】Pt層とCo層を交互に繰り返し積層し
たCo/Pt多層膜は垂直磁気異方性を有しているだけ
でなく、短波長の光に対して希土類遷移金属合金よりも
大きなカー回転角を有している。このためCo/Pt多
層膜を用いた磁気光学素子は高密度の光磁気記録を可能
とする光磁気記録媒体として注目されている。記録され
た情報を安定に保持するためにはCo/Pt多層膜は高
い保磁力を有していることが望まれる。1989年発行
の日本応用磁気学会学術講演概要集の第55頁には、C
o/Pt多層膜をスパッタ法により成膜するときスパッ
タガスであるArガスの圧力を高くすれば高保磁力を有
するCo/Pt多層膜が得られることが報告されてい
る。また、同概要集の第56頁にはCo/Pt多層膜を
PtやPd等のfcc格子を有する金属膜上にスパッタ
法により成膜すると高保磁力を有するCo/Pt多層膜
が得られることが報告されている。
2. Description of the Related Art A Co / Pt multilayer film in which a Pt layer and a Co layer are alternately and repeatedly laminated not only has a perpendicular magnetic anisotropy but also has a larger size than a rare earth transition metal alloy with respect to short wavelength light. It has a car rotation angle. For this reason, a magneto-optical element using a Co / Pt multilayer film has attracted attention as a magneto-optical recording medium capable of high-density magneto-optical recording. In order to stably retain recorded information, it is desired that the Co / Pt multilayer film has a high coercive force. On page 55 of the Abstracts of the Japanese Society of Applied Magnetics, published in 1989,
It has been reported that when an o / Pt multilayer film is formed by a sputtering method, a Co / Pt multilayer film having a high coercive force can be obtained by increasing the pressure of Ar gas as a sputtering gas. Also, on page 56 of the summary, it is found that a Co / Pt multilayer film having a high coercive force can be obtained by forming a Co / Pt multilayer film on a metal film having an fcc lattice such as Pt or Pd by a sputtering method. It has been reported.

【0003】[0003]

【発明が解決しようとする課題】ところが高いArガス
圧力下でCo/Pt多層膜を成膜するとCo/Pt多層
膜は多くの空孔を含むことになる。また、金属膜上にC
o/Pt多層膜を成膜する場合、誘電体層/記録層/誘
電体層/反射膜という4層構造を採ることができず、効
果的なカー回転角の増大を図ることができない。Co/
Pt多層膜における空孔の増加は情報再生時の雑音の原
因となり、4層構造を採れず効果的なカー回転角の増大
が図れないということは情報再生時に大きな信号強度が
得られないという問題点を有している。
However, when a Co / Pt multilayer film is formed under a high Ar gas pressure, the Co / Pt multilayer film contains many holes. Also, C on the metal film
When an o / Pt multilayer film is formed, a four-layer structure of a dielectric layer / recording layer / dielectric layer / reflection film cannot be adopted, and an effective increase in the Kerr rotation angle cannot be achieved. Co /
The increase in vacancies in the Pt multilayer film causes noise at the time of information reproduction, and the fact that a 4-layer structure cannot be employed to effectively increase the Kerr rotation angle means that a large signal intensity cannot be obtained at the time of information reproduction. Have a point.

【0004】[0004]

【課題を解決するための手段】本発明の磁気光学記憶素
子の製造方法は、Pt,Pd,Ag,Alのうち少なく
とも1種類の元素を含む単体もしくは合金膜上に、Mg
OターゲットをO2ガスとArガスの混合ガスのもとで
スパッタすることにより上記金属膜上に結晶性MgO膜
を形成した後、PtターゲットとCoターゲットを不活
性ガスのもとで交互にスパッタすることにより前記Mg
O膜上にPt層とCo層を交互に積層したCo/Pt多
層膜を形成する磁気光学素子の製造方法において、上記
MgO膜の形成時、高保磁力のCo/Pt多層膜が得ら
れるようにO2ガスの分圧設定を行うことを特徴として
いる。
According to a method of manufacturing a magneto-optical storage element of the present invention, a method for manufacturing a magneto-optical storage element comprising the steps of:
After a crystalline MgO film is formed on the metal film by sputtering an O target under a mixed gas of O 2 gas and Ar gas, a Pt target and a Co target are alternately sputtered under an inert gas. The Mg
In the method for manufacturing a magneto-optical element in which a Co / Pt multilayer film in which a Pt layer and a Co layer are alternately stacked on an O film is formed, a high coercive force Co / Pt multilayer film is obtained when the MgO film is formed. It is characterized in that the partial pressure of O 2 gas is set.

【0005】[0005]

【作用】上記の構成によれば、MgO膜の形成時に高保
磁力のCo/Pt多層膜が得られるように上記O2ガス
の分圧設定を行うので、高いArガス圧力下でCo/P
t多層膜を製造しなくても高保磁力のCo/Pt多層膜
が得られる。また、透明結晶の上にCo/Pt多層膜を
形成するので誘電体層/記録層/誘電体層/反射層の4
層構造をとることができ大きな信号強度を得ることが可
能となる。この場合反射膜はPt,Pd,Ag,Alの
うち少なくとも1種類の元素を含んだ金属層とする。
According to the above-mentioned structure, the partial pressure of the O 2 gas is set so that a Co / Pt multilayer film having a high coercive force can be obtained when the MgO film is formed.
A Co / Pt multilayer film having a high coercive force can be obtained without manufacturing a t multilayer film. Also, since a Co / Pt multilayer film is formed on the transparent crystal, the dielectric layer / recording layer / dielectric layer / reflection layer
A layer structure can be obtained, and a large signal intensity can be obtained. In this case, the reflection film is a metal layer containing at least one element of Pt, Pd, Ag, and Al.

【0006】[0006]

【実施例】本実施例で製造する磁気光学記憶素子を図3
に示す。図3において、1はガラスあるいはポリカーボ
ネート等の樹脂からなる基板、2は基板1上に形成され
たPt層からなる反射膜、3はPt層の上に形成された
MgO層、4はCo/Pt多層膜、5は非晶質AlN膜
である。Co/Pt多層膜4はPt層6とCo層7を交
互に積層した構成である。
FIG. 3 shows a magneto-optical storage element manufactured in this embodiment.
Shown in In FIG. 3, 1 is a substrate made of a resin such as glass or polycarbonate, 2 is a reflection film made of a Pt layer formed on the substrate 1, 3 is an MgO layer formed on the Pt layer, and 4 is Co / Pt. The multilayer film 5 is an amorphous AlN film. The Co / Pt multilayer film 4 has a configuration in which Pt layers 6 and Co layers 7 are alternately stacked.

【0007】Pt層2及びCo/Pt多層膜4はArガ
スを用いてPtターゲットとCoターゲットをスパッタ
することで作製した。MgO層はMgOターゲットをA
rとO2の混合ガスのもとでスパッタし成膜した。Al
N層はAlターゲットをN2とArの混合ガスのもとで
スパッタして作製した。Pt層2は500オングストロ
ーム、MgO層3は400オングストローム、Co/P
t多層膜層はPt層6が16.5オングストローム,C
o層7が3.5オングストロームの層を交互に10組積
層した。AlN層は300オングストロームである。
The Pt layer 2 and the Co / Pt multilayer film 4 were formed by sputtering a Pt target and a Co target using Ar gas. For the MgO layer, set the MgO target to A
A film was formed by sputtering under a mixed gas of r and O 2 . Al
The N layer was produced by sputtering an Al target under a mixed gas of N 2 and Ar. The Pt layer 2 is 500 angstroms, the MgO layer 3 is 400 angstroms, Co / P
The t multilayer film layer has a Pt layer 6 of 16.5 angstroms, C
Ten sets of layers each having 3.5 Å of the o layer 7 were alternately laminated. The AlN layer is 300 Å.

【0008】図3で示したような構造の素子の中のMg
O膜を作製する際に、O2ガスの分圧を変えて成膜し、
得られたCo/Pt多層膜の保磁力(Hc)とMgO層
の成膜条件との関係を調べた結果が図1の曲線8であ
る。ただし、ArとO2の混合ガスの全圧力は5mTo
rrである。Co/Pt層の保磁力は図1に示すように
MgO成膜時のO2ガス分圧に大きく依存し、かつO2
圧を適当な値(本実施例では2×10-5Torr)にす
ると保磁力は最大になることが分かった。
In the device having the structure as shown in FIG.
When producing the O film, the partial pressure of the O 2 gas is changed to form a film,
The result of examining the relationship between the coercive force (Hc) of the obtained Co / Pt multilayer film and the conditions for forming the MgO layer is curve 8 in FIG. However, the total pressure of the mixed gas of Ar and O 2 is 5 mTo
rr. As shown in FIG. 1, the coercive force of the Co / Pt layer largely depends on the partial pressure of O 2 gas during the formation of MgO, and the partial pressure of O 2 is set to an appropriate value (2 × 10 −5 Torr in this embodiment). It turned out that the coercive force was maximized.

【0009】次に上記の磁気光学記憶素子のMgO膜3
の構造をX線回折により調べた。図2にMgOの(11
1)面による回折ピーク位置を矢印で示し、各O2分圧
で作製したMgO膜のX線回折パターンを示す。これよ
りO2分圧が適当な値をとるとMgO膜の(111)面
からの回折ピークが大きくなっているのが分かる。
Next, the MgO film 3 of the above magneto-optical storage element
Was examined by X-ray diffraction. FIG. 2 shows the MgO (11
1) The position of the diffraction peak due to the plane is indicated by an arrow, and the X-ray diffraction pattern of the MgO film produced at each O 2 partial pressure is shown. This indicates that when the O 2 partial pressure takes an appropriate value, the diffraction peak from the (111) plane of the MgO film increases.

【0010】図1、図2の結果を考え合わせると、Mg
O膜が(111)配向することがCo/Pt層のHcに
大きく影響しているものと思われる。以上のようにMg
O膜の成膜時に適当なO2分圧を設定することでCo/
Pt層の保磁力を大きくすることができる。従ってCo
/Pt層成膜時にArガス圧力を高くする必要がなくな
り空孔の少ないCo/Pt層を製造できる。なお、Ar
ガス圧は従来法では30mTorr必要であったのに対
し、本発明の方法では5mTorrで空孔の少ないCo
/Pt膜を製造することができる。またMgO膜は透明
膜なので効率よくカー回転角のエンハンスを図ることが
できる。
Considering the results of FIGS. 1 and 2, Mg
It is considered that the (111) orientation of the O film greatly affects the Hc of the Co / Pt layer. As described above, Mg
By setting an appropriate O 2 partial pressure during the formation of the O film, Co /
The coercive force of the Pt layer can be increased. Therefore Co
It is not necessary to increase the Ar gas pressure during the formation of the / Pt layer, so that a Co / Pt layer having few vacancies can be manufactured. Note that Ar
The conventional method requires a gas pressure of 30 mTorr, whereas the method of the present invention requires a gas pressure of 5 mTorr and a small porosity of Co.
/ Pt film can be manufactured. Since the MgO film is a transparent film, the Kerr rotation angle can be efficiently enhanced.

【0011】このように本実施例の磁気光学記憶素子の
製造方法によれば空孔が少なく透明下地層を用いたCo
/Pt多層膜が得られるので情報再生時に雑音が少なく
信号強度の大きな磁気光学記憶素子製造できる。
As described above, according to the method of manufacturing the magneto-optical storage element of the present embodiment, the Co is produced by using a transparent underlayer with few holes.
Since the / Pt multilayer film can be obtained, a magneto-optical memory element having a small noise and a high signal intensity at the time of information reproduction can be manufactured.

【0012】[0012]

【発明の効果】本発明の磁気光学記憶素子の製造方法は
以上のようにMgO膜の形成時に高保磁力のCo/Pt
層が得られるようにO2分圧の設定を行うので、高いA
rガス圧力下でCo/Pt膜を成膜しなくても高保磁力
のCo/Pt層が得られる。このため空孔の少ない高保
磁力のCo/Pt膜が得られる。また、透明膜であるM
gO層上にCo/Pt層を形成するので、誘電体層/
(Co/Pt層)/誘電体層/反射層といった4層構造
の磁気光学素子を作製することができ効率よくカー回転
角のエンハンス効果を得ることができる。以上により情
報再生時に雑音が少なく信号強度の大きい磁気光学素子
を製造することができるという効果を奏する。
As described above, the method of manufacturing a magneto-optical memory element according to the present invention has a high coercivity Co / Pt during the formation of an MgO film.
Since the O 2 partial pressure is set so as to obtain a layer, a high A
A Co / Pt layer having a high coercive force can be obtained without forming a Co / Pt film under the r gas pressure. For this reason, a Co / Pt film with a small number of holes and a high coercive force can be obtained. Further, the transparent film M
Since the Co / Pt layer is formed on the gO layer, the dielectric layer /
A magneto-optical element having a four-layer structure of (Co / Pt layer) / dielectric layer / reflection layer can be manufactured, and the effect of enhancing the Kerr rotation angle can be efficiently obtained. As described above, there is an effect that it is possible to manufacture a magneto-optical element having a small noise and a high signal strength during information reproduction.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の構成の膜のうちのCo/Pt多層膜の
保磁力の、MgO層作製時のO2分圧依存性である。
FIG. 1 shows the dependency of the coercive force of a Co / Pt multilayer film among the films of the present invention on the partial pressure of O 2 when an MgO layer is formed.

【図2】本発明の構成の膜で、MgO層作製時のO2
圧の異なるサンプルのX線回折パターンである。
[Figure 2] in the construction of membranes of the present invention, an X-ray diffraction patterns of different samples of O 2 partial pressure during the MgO layer prepared.

【図3】本発明の磁気光学素子の断面図である。FIG. 3 is a sectional view of a magneto-optical element according to the present invention.

【符号の説明】 1 基板 2 Pt層 3 MgO層 4 Co/Pt多層膜 6 Co/Pt多層膜中のPt層 7 Co/Pt多層膜中のCo層[Description of Signs] 1 Substrate 2 Pt layer 3 MgO layer 4 Co / Pt multilayer film 6 Pt layer in Co / Pt multilayer film 7 Co layer in Co / Pt multilayer film

───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 平2−56752(JP,A) 特開 平2−69907(JP,A) (58)調査した分野(Int.Cl.6,DB名) G11B 11/10 541 H01F 41/18────────────────────────────────────────────────── ─── Continuation of the front page (56) References JP-A-2-56752 (JP, A) JP-A-2-69907 (JP, A) (58) Fields investigated (Int. Cl. 6 , DB name) G11B 11/10 541 H01F 41/18

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】基板上にPt,Pd,Ag,Alのうち少
なくとも1種類の元素を含んだ単体もしくは合金層を形
成し、その上にMgOターゲットをO2ガスとArガス
の混合ガスのもとでスパッタすることにより結晶性Mg
O層を形成した後、PtターゲットとCoターゲットを
不活性ガスのもとで交互にスパッタすることにより前記
MgO層上にPt層とCo層を交互に積層したCo/P
t多層膜を形成する磁気光学素子の製造方法において、
上記MgO層の形成時に高保磁力のCo/Pt多層膜が
得られるように上記O2ガスの分圧設定を行うことを特
徴とする磁気光学素子の製造方法。
1. A single or alloy layer containing at least one element of Pt, Pd, Ag, and Al is formed on a substrate, and an MgO target is formed thereon by using a mixed gas of O 2 gas and Ar gas. Crystalline Mg by sputtering with
After forming the O layer, a Pt target and a Co target are alternately sputtered under an inert gas to alternately laminate a Pt layer and a Co layer on the MgO layer.
In a method for manufacturing a magneto-optical element for forming a multilayer film,
A method of manufacturing a magneto-optical element, wherein the partial pressure of the O 2 gas is set so that a Co / Pt multilayer film having a high coercive force is obtained when the MgO layer is formed.
JP282792A 1992-01-10 1992-01-10 Manufacturing method of magneto-optical element Expired - Lifetime JP2810573B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP282792A JP2810573B2 (en) 1992-01-10 1992-01-10 Manufacturing method of magneto-optical element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP282792A JP2810573B2 (en) 1992-01-10 1992-01-10 Manufacturing method of magneto-optical element

Publications (2)

Publication Number Publication Date
JPH05189824A JPH05189824A (en) 1993-07-30
JP2810573B2 true JP2810573B2 (en) 1998-10-15

Family

ID=11540252

Family Applications (1)

Application Number Title Priority Date Filing Date
JP282792A Expired - Lifetime JP2810573B2 (en) 1992-01-10 1992-01-10 Manufacturing method of magneto-optical element

Country Status (1)

Country Link
JP (1) JP2810573B2 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6986954B2 (en) 2002-04-17 2006-01-17 Imation Corp. Perpendicular magnetic recording media
US6921585B2 (en) 2002-05-15 2005-07-26 Imation Corp. Perpendicular magnetic recording media with an amorphous underlayer
US6953629B2 (en) 2003-06-30 2005-10-11 Imation Corp. NiCr and NiFeCr seed layers for perpendicular magnetic recording media
JP5195868B2 (en) * 2010-10-25 2013-05-15 富士電機株式会社 Method for manufacturing perpendicular magnetic recording medium

Also Published As

Publication number Publication date
JPH05189824A (en) 1993-07-30

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