JP2811531B2 - Heater for vacuum deposition equipment - Google Patents
Heater for vacuum deposition equipmentInfo
- Publication number
- JP2811531B2 JP2811531B2 JP5351535A JP35153593A JP2811531B2 JP 2811531 B2 JP2811531 B2 JP 2811531B2 JP 5351535 A JP5351535 A JP 5351535A JP 35153593 A JP35153593 A JP 35153593A JP 2811531 B2 JP2811531 B2 JP 2811531B2
- Authority
- JP
- Japan
- Prior art keywords
- heater
- lid
- container
- base
- vacuum
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000001771 vacuum deposition Methods 0.000 title description 20
- 239000000463 material Substances 0.000 claims description 36
- 238000007738 vacuum evaporation Methods 0.000 claims description 29
- 229910052751 metal Inorganic materials 0.000 claims description 11
- 239000002184 metal Substances 0.000 claims description 11
- 230000008018 melting Effects 0.000 claims description 9
- 238000002844 melting Methods 0.000 claims description 9
- 239000004020 conductor Substances 0.000 claims description 5
- 238000001704 evaporation Methods 0.000 claims description 5
- 230000008020 evaporation Effects 0.000 claims description 5
- 239000010955 niobium Substances 0.000 claims description 4
- 229910001182 Mo alloy Inorganic materials 0.000 claims description 3
- 229910001257 Nb alloy Inorganic materials 0.000 claims description 3
- 229910001362 Ta alloys Inorganic materials 0.000 claims description 3
- 229910001080 W alloy Inorganic materials 0.000 claims description 3
- 229910052758 niobium Inorganic materials 0.000 claims description 3
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims description 3
- 229910052715 tantalum Inorganic materials 0.000 claims description 3
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 3
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 2
- 229910052750 molybdenum Inorganic materials 0.000 claims description 2
- 239000011733 molybdenum Substances 0.000 claims description 2
- 239000003870 refractory metal Substances 0.000 claims description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 2
- 229910052721 tungsten Inorganic materials 0.000 claims description 2
- 239000010937 tungsten Substances 0.000 claims description 2
- 238000007740 vapor deposition Methods 0.000 description 17
- 239000010453 quartz Substances 0.000 description 16
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 16
- 238000002474 experimental method Methods 0.000 description 9
- 238000005452 bending Methods 0.000 description 7
- 238000000151 deposition Methods 0.000 description 7
- 230000008021 deposition Effects 0.000 description 7
- 238000005520 cutting process Methods 0.000 description 5
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 229910000510 noble metal Inorganic materials 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 3
- 238000005304 joining Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 230000002093 peripheral effect Effects 0.000 description 3
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 3
- 239000010408 film Substances 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 230000002159 abnormal effect Effects 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 238000005553 drilling Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 230000010365 information processing Effects 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052755 nonmetal Inorganic materials 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 238000005019 vapor deposition process Methods 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Description
【０００１】[0001]
【産業上の利用分野】本発明は、水晶振動子の製造に用
いられる真空蒸着装置に適した真空蒸着装置用ヒータに
関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a heater for a vacuum deposition apparatus suitable for a vacuum deposition apparatus used for manufacturing a quartz oscillator.
【０００２】[0002]
【従来の技術】水晶の持つ圧電現象を利用した水晶振動
子は、水晶板の両端に適当な電極を設ける基本構造を呈
し、この電極に正弦波電圧を印加して励振させること
で、所定の振動形式で振動する。この原理を利用し、所
定の周波数（低、高周波数）を選択可能であることか
ら、時計、情報処理機器および通信機器等の各種電子機
器に広く用いられている。2. Description of the Related Art A quartz resonator utilizing the piezoelectric phenomenon of quartz has a basic structure in which appropriate electrodes are provided at both ends of a quartz plate, and a predetermined voltage is applied to the electrodes by exciting them with a sine wave voltage. Vibrates in the form of vibration. Utilizing this principle, predetermined frequencies (low and high frequencies) can be selected, and thus are widely used in various electronic devices such as watches, information processing devices, and communication devices.
【０００３】上記のような構造を呈する水晶振動子の製
造にあたっては、複数枚の水晶板を接合する工程や、電
極等の金属部品を接合する工程が必要である。具体的に
は、所定の大きさにカットした水晶板に、ニッケル（Ｎ
ｉ）を蒸着し、さらに、貴金属の一種である銀（Ａｇ）
を蒸着するのが一般的である。Ｎｉは、水晶板およびＡ
ｇの双方に接合可能な金属であり、非金属と貴金属とを
接合する際に、下地として用いられるＮｉめっきと同様
の目的で施される。[0003] In manufacturing a quartz resonator having the above-described structure, a step of joining a plurality of quartz plates and a step of joining metal parts such as electrodes are required. Specifically, nickel (N
i) is deposited, and silver (Ag), which is a kind of noble metal,
Is generally deposited. Ni is a quartz plate and A
g, which is a metal that can be joined to both, and is applied for the same purpose as Ni plating used as a base when joining a nonmetal and a noble metal.
【０００４】Ｎｉめっきされた水晶板にＡｇ等の貴金属
を蒸着するために、真空蒸着装置が用いられる。そし
て、この装置は、真空蒸着装置用ヒータを備えている。A vacuum deposition apparatus is used to deposit a noble metal such as Ag on a Ni-plated quartz plate. And this apparatus is provided with a heater for a vacuum evaporation apparatus.
【０００５】図３および図４は、従来の真空蒸着装置用
ヒータの一例を示す斜視図、および、そのＡ−Ａ断面図
である。FIGS. 3 and 4 are a perspective view showing an example of a conventional heater for a vacuum evaporation apparatus and a sectional view taken along the line AA.
【０００６】図３および図４を参照すると、従来の真空
蒸着装置用ヒータ６０は、一枚のＭｏ板材を折り曲げ加
工および所定の孔開け加工を施して成り、板部６１〜６
３と、板部６１から延びる一対の板部６４と、一対の板
部６４からそれぞれ延びる一対の板部６５と、板部６１
に備えられた放出孔６６と、一対の板部６５にそれぞれ
備えられた一対の電極取付孔６７とを有している。真空
蒸着装置用ヒータ６０は、折り曲げ加工した構造である
ため、板部６１と板部６３との間に間隙６８（図４）を
持ち、板部６２、６３と一対の板部６４との間にも、間
隙を持っている。Referring to FIGS. 3 and 4, a conventional heater 60 for a vacuum evaporation apparatus is formed by bending a single Mo plate material and performing a predetermined drilling process.
3, a pair of plate portions 64 extending from the plate portion 61, a pair of plate portions 65 respectively extending from the pair of plate portions 64, and a plate portion 61.
And a pair of electrode mounting holes 67 respectively provided in a pair of plate portions 65. Since the vacuum deposition apparatus heater 60 has a bent structure, it has a gap 68 (FIG. 4) between the plate portion 61 and the plate portion 63, and a gap between the plate portions 62 and 63 and the pair of plate portions 64. Even have a gap.
【０００７】Ｎｉめっきされた水晶板には、真空蒸着装
置用ヒータ６０を真空室内に備える真空蒸着装置（図示
せず）を用い、以下のようにしてＡｇが蒸着される。Ag is vapor-deposited on the Ni-plated quartz plate using a vacuum vapor deposition device (not shown) having a vacuum vapor deposition device heater 60 in a vacuum chamber as follows.
【０００８】まず、真空室内における真空蒸着装置用ヒ
ータ６０の一対の板部６５の各電極取付孔６７に、真空
蒸着装置からの電源のプラス極およびマイナス極それぞ
れを、ボルトとナットによって、クランプ留めしてお
く。次に、真空蒸着装置用ヒータ６０の内部に、即ち、
板部６１〜６３と一対の板部６４で規定される空間に、
放出孔６６を利用して、Ａｇ粒材またはＡｇ棒材を入れ
る。一方、被蒸着体であるＮｉめっきされた水晶板（図
示せず）を、放出孔６６に対向して、かつ板部６１表面
に対して平行に配する。First, a positive electrode and a negative electrode of a power source from a vacuum deposition apparatus are clamped to respective electrode mounting holes 67 of a pair of plates 65 of a heater 60 for a vacuum deposition apparatus in a vacuum chamber by bolts and nuts. Keep it. Next, inside the heater 60 for the vacuum evaporation apparatus,
In the space defined by the plate portions 61 to 63 and the pair of plate portions 64,
Ag particles or Ag rods are put in using the discharge holes 66. On the other hand, a Ni-plated quartz plate (not shown), which is an object to be deposited, is arranged in opposition to the emission holes 66 and in parallel to the surface of the plate portion 61.
【０００９】そして、装置の真空室内を真空引きして所
定の真空度に維持しつつ、真空蒸着装置用ヒータ６０に
通電する。これによって、真空蒸着装置用ヒータ６０が
発熱し、その内部のＡｇ粒材またはＡｇ棒材が加熱さ
れ、蒸気化したＡｇ材が放出孔６６から放出し、対向す
るＮｉめっきされた水晶板にＡｇが蒸着される。Then, the vacuum chamber of the apparatus is evacuated and the heater 60 for the vacuum evaporation apparatus is energized while maintaining a predetermined degree of vacuum. As a result, the heater 60 for the vacuum evaporation apparatus generates heat, and the Ag particles or the Ag bar inside the heater 60 are heated, the vaporized Ag material is released from the discharge holes 66, and the Ag-plated Ni-plated quartz plate faces the opposite. Is deposited.
【００１０】[0010]
【発明が解決しようとする課題】図３および図４に示す
ものをも含め、従来の真空蒸着装置用ヒータは、Ｍｏ板
材を折り曲げ加工した構造であるため、以下の二点の問
題点がある。The conventional heaters for vacuum vapor deposition apparatuses, including those shown in FIGS. 3 and 4, have the following two problems since they are formed by bending a Mo plate. .
【００１１】第一に、Ｍｏ板材は、一般に、耐脆性が低
く、折り曲げ加工には不向きであり、特に、厚い板材の
複雑加工は困難である。このため、蒸着効率に優れる形
状等に設計しようとしても、形状に制約がかかるという
問題点がある。そして、上述のような形状の真空蒸着装
置用ヒータを製造する場合には、０．１〜０．２ｍｍ厚
のＭｏ板材が実質的に限界であると考えられる。真空蒸
着装置用ヒータの板材の厚さが厚い程、ヒータの寿命は
延びる傾向にあるが、Ｍｏ板材の折り曲げ加工の困難性
が、真空蒸着装置用ヒータの寿命の長期化の障害となっ
ているのが実情である。First, Mo plate materials generally have low brittle resistance and are unsuitable for bending, and it is particularly difficult to perform complicated processing on thick plate materials. For this reason, there is a problem in that even if an attempt is made to design a shape having excellent vapor deposition efficiency, the shape is restricted. When manufacturing a heater for a vacuum deposition apparatus having the above-described shape, it is considered that a Mo plate having a thickness of 0.1 to 0.2 mm is substantially the limit. Although the life of the heater tends to be extended as the thickness of the plate material of the heater for the vacuum evaporation apparatus increases, the difficulty in bending the Mo plate material is an obstacle to prolonging the life of the heater for the vacuum evaporation apparatus. That is the fact.
【００１２】第二に、折り曲げ加工した構造は、連続し
ていない板部間に間隙を持つため、蒸着工程の際に、目
的とする被蒸着体へ放出されずに、溶けたＡｇ材や蒸気
化したＡｇ材が間隙から漏洩することが多く、蒸着効率
に劣るという問題点がある。Second, since the bent structure has a gap between the discontinuous plate portions, it is not released to the target object during the vapor deposition process, and the molten Ag material or vapor is not released. There is a problem that the converted Ag material often leaks from the gap, resulting in poor deposition efficiency.
【００１３】本発明の課題は、複雑な形状に設計できる
真空蒸着装置用ヒータを提供することである。It is an object of the present invention to provide a heater for a vacuum evaporation apparatus which can be designed into a complicated shape.
【００１４】本発明の他の課題は、寿命の長い真空蒸着
装置用ヒータを提供することである。Another object of the present invention is to provide a heater for a vacuum evaporation apparatus having a long life.
【００１５】本発明のさらに他の課題は、蒸着効率に優
れた真空蒸着装置用ヒータを提供することである。Still another object of the present invention is to provide a heater for a vacuum evaporation apparatus having excellent evaporation efficiency.
【００１６】[0016]
【課題を解決するための手段】分を備えた台部と、高融
点金属から成り、筒状を呈する側面部分、側面部分に形
成された少くとも１つの放出孔、および側面部分の一端
を覆蓋するように形成された底面部分を備え、底面部分
が前記台部の前記軸部分に対して小さい接触面積で接触
する容器部と、高融点金属から成り、板状を呈し、前記
容器部の前記側面部分の他端を覆蓋するように該側面部
分の開口縁に対して小さい接触面積で接触する蓋部とを
有し、前記蓋部と前記台部との間に電圧を印加すること
によって、前記容器部および前記蓋部によって規定され
た空間内に収容した蒸着材料を加熱し、蒸気化した該蒸
着材料を前記放出孔から放出することを特徴とする真空
蒸着装置用ヒータが得られる。SUMMARY OF THE INVENTION A pedestal portion having a portion, a cylindrical side portion made of a high melting point metal, at least one discharge hole formed in the side portion, and a cover at one end of the side portion. A bottom portion formed so that the bottom portion is in contact with the shaft portion of the base with a small contact area, a high melting point metal, plate-shaped, the plate portion, the container portion of the A lid portion that contacts the opening edge of the side portion with a small contact area so as to cover the other end of the side portion, and by applying a voltage between the lid portion and the base portion, A heater for a vacuum evaporation apparatus is obtained, wherein the evaporation material accommodated in the space defined by the container and the lid is heated, and the vaporized evaporation material is discharged from the discharge hole.
【００１７】本発明によればまた、前記蓋部および前記
台部にはそれぞれ、導電性材から成り、棒状を呈する電
極棒が取り付けられ、前記蓋部および前記台部は、各前
記電極棒によって外部から支持される前記真空蒸着装置
用ヒータが得られる。According to the present invention, the lid and the base are each provided with a rod-shaped electrode rod made of a conductive material, and the lid and the base are connected to each other by the electrode rods. The heater for the vacuum deposition apparatus supported from the outside is obtained.
【００１８】本発明によればさらに、前記高融点金属
は、モリブデン、タングステン、ニオブ、タンタル、モ
リブデン合金、タングステン合金、ニオブ合金およびタ
ンタル合金のうちのいずれかである前記真空蒸着装置用
ヒータが得られる。According to the present invention, there is further provided the heater for a vacuum evaporation apparatus, wherein the refractory metal is any one of molybdenum, tungsten, niobium, tantalum, a molybdenum alloy, a tungsten alloy, a niobium alloy and a tantalum alloy. Can be
【００１９】[0019]
【実施例】以下、図面を参照して、本発明の一実施例に
よる真空蒸着装置用ヒータを説明する。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS A heater for a vacuum deposition apparatus according to an embodiment of the present invention will be described below with reference to the drawings.
【００２０】図１および図２は、本実施例による真空蒸
着装置用ヒータを示す斜視図およびその要部の縦断面図
である。FIGS. 1 and 2 are a perspective view showing a heater for a vacuum evaporation apparatus according to the present embodiment and a longitudinal sectional view of a main part thereof.
【００２１】図１および図２において、本真空蒸着装置
用ヒータは、Ｍｏ材を切削加工して成り、側面に放出孔
１１を備えた有底筒状の容器部１０と、Ｍｏ材を切削加
工して成り、容器部１０の上端面に、周凹部分２１にて
載置され、容器部１０内を覆蓋する蓋部２０と、Ｍｏ材
を切削加工して成り、容器部１０の底面の凹部分１２を
軸部分３１にて軸支する台部３０とを有している。In FIG. 1 and FIG. 2, the heater for the vacuum evaporation apparatus is formed by cutting a Mo material, and is provided with a bottomed cylindrical container portion 10 having a discharge hole 11 on a side surface, and a cutting process of the Mo material. The lid 20 is placed on the upper end surface of the container 10 at the peripheral concave portion 21 and covers the inside of the container 10. The lid 20 is formed by cutting a Mo material. And a pedestal portion 30 that supports the portion 12 with a shaft portion 31.
【００２２】尚、容器部１０と蓋部２０とは、上記のよ
うな載置関係に限らず、例えば、どちらかに軸部分を設
けて、蓋部２０が容器部１０に軸支されるような関係で
あってもよい。また、容器部１０と台部３０との軸支関
係も上記例に限らず、例えば、軸部分を複数としてもよ
い。いずれにしても、各部間の接触面積を、後述するよ
うな理由から、実質的に小さくすることが好ましい。ま
た、各部間の水平方向の間隙には、水平方向の位置ずれ
防止のために、だぼ部分を形成してもよい。この場合に
も、接触面積を実質的に小さくすることが好ましい。さ
らに、容器部１０は、円筒形に限らず、角筒形等でもよ
い。The container portion 10 and the lid portion 20 are not limited to the above-described mounting relationship. For example, a shaft portion may be provided on one of the two, and the lid portion 20 may be supported by the container portion 10. Relationship. Further, the pivotal support relationship between the container unit 10 and the base unit 30 is not limited to the above example. For example, a plurality of shaft portions may be provided. In any case, it is preferable to substantially reduce the contact area between the respective parts for the reason described later. Further, a dowel portion may be formed in a horizontal gap between the portions in order to prevent displacement in the horizontal direction. Also in this case, it is preferable to substantially reduce the contact area. Further, the container 10 is not limited to a cylindrical shape, and may be a rectangular tube or the like.
【００２３】蓋部２０、台部３０にはそれぞれ、導電性
材から成る電極棒４０、５０が取り付けられている。電
極棒４０および５０はいずれも、直角に屈曲された比較
的太い棒状を呈し、その一端が蓋部２０あるいは台部３
０に対してネジ止めか溶接されている。また、他端は、
図中、蓋部２０よりも上方にて、外側へ向かって水平に
延びており、図示しない真空蒸着装置の電極部分にクラ
ンプされるようになっている。よって、電極棒４０およ
び５０が真空蒸着装置の電極部分にクランプされること
によって、蓋部２０および台部３０も、真空蒸着装置の
電極部分に支持される。さらに、容器１０は台部３０に
軸支されているため、本実施例による真空蒸着装置用ヒ
ータ全体が、真空蒸着装置の電極部分に支持されること
になる。尚、電極棒４０、５０は、丸棒に限らず、角棒
でもよい。Electrode bars 40 and 50 made of a conductive material are attached to the lid 20 and the base 30, respectively. Each of the electrode rods 40 and 50 has a relatively thick rod shape bent at a right angle, and one end thereof is provided on the lid 20 or the base 3.
0 is screwed or welded. The other end is
In the drawing, it extends horizontally outward from above the lid portion 20 and is clamped by an electrode portion of a vacuum evaporation apparatus (not shown). Therefore, the lid 20 and the base 30 are also supported by the electrode portions of the vacuum vapor deposition device by clamping the electrode rods 40 and 50 to the electrode portions of the vacuum vapor deposition device. Further, since the container 10 is pivotally supported by the base 30, the entire heater for the vacuum evaporation apparatus according to the present embodiment is supported by the electrode portion of the vacuum evaporation apparatus. The electrode rods 40 and 50 are not limited to round rods, but may be square rods.
【００２４】次に、本実施例による真空蒸着装置用ヒー
タを用いた真空蒸着工程によって、本発明をさらに詳し
く説明する。Next, the present invention will be described in more detail by a vacuum deposition process using a heater for a vacuum deposition device according to the present embodiment.
【００２５】はじめに、真空蒸着工程に先立つ、準備工
程を説明する。まず、真空蒸着装置の真空室内におい
て、台部３０の軸部分３１が上方に向かって垂直になる
ように、台部３０に取り付けられている電極棒５０の他
端を真空蒸着装置の電極部分にクランプする。そして、
台部３０の軸部分３１に容器部１０の凹部分１２を位置
決めするように合わせて、台部３０によって容器部１０
を軸支させる。この後、粒状、棒状、箔状あるいは塊状
のＡｇ材を所定量だけ、容器１０の内部に入れる。そし
て、容器部１０の上端面に蓋部２０の周凹部分２１を合
わせるように、容器１０に蓋部２０を載置して、容器１
０内部を覆蓋する。この後、蓋部２０に取り付けられて
いる電極棒４０の他端を真空蒸着装置の電極部分にクラ
ンプする。First, a preparation step prior to the vacuum deposition step will be described. First, in the vacuum chamber of the vacuum evaporation apparatus, the other end of the electrode rod 50 attached to the base section 30 is connected to the electrode section of the vacuum evaporation apparatus so that the shaft section 31 of the base section 30 becomes vertical upward. Clamp. And
The concave portion 12 of the container portion 10 is aligned with the shaft portion 31 of the base portion 30 so as to be positioned.
To be pivoted. Thereafter, a predetermined amount of a granular, rod-shaped, foil-shaped or lump-shaped Ag material is put into the container 10. Then, the lid 20 is placed on the container 10 so that the peripheral concave portion 21 of the lid 20 is aligned with the upper end surface of the container 10, and the container 1
0 Cover the inside. Thereafter, the other end of the electrode rod 40 attached to the lid 20 is clamped to the electrode portion of the vacuum evaporation device.
【００２６】以上のように準備された本実施例による真
空蒸着装置用ヒータは、蓋部２０に取り付けられた電極
棒４０と台部３０に取り付けられた電極棒５０との間
に、真空蒸着装置の電源から電圧を印加することによっ
て、容器部１０、蓋部２０および台部３０の電気抵抗に
よってこれらが発熱し、容器部１０内に収容した蒸着材
料であるＡｇ材を加熱する。加熱され融解したＡｇ材
は、熱蒸気化して容器部１０の放出孔１１から放出さ
れ、予め対向配設されている被蒸着体に蒸着する。The heater for a vacuum deposition apparatus according to the present embodiment prepared as described above is provided between the electrode rod 40 attached to the lid 20 and the electrode rod 50 attached to the base 30. When a voltage is applied from the power source, the container unit 10, the lid unit 20, and the base unit 30 generate heat due to electric resistance of the container unit 10, and heat the Ag material, which is a deposition material accommodated in the container unit 10. The heated and melted Ag material is thermally vaporized and released from the discharge hole 11 of the container portion 10, and is deposited on the object to be deposited which is disposed in advance to be opposed.
【００２７】尚、前述の準備工程においては、蓋部２０
および台部３０がそれぞれ容器部１０に接することが必
要である。これは、各部間に間隙があると、電流が流れ
なかったり、部分的に電流が流れて抵抗が大きくなり異
常温度上昇が生じるためである。In the above-described preparation step, the cover 20
It is necessary that the base 30 and the base 30 contact the container 10, respectively. This is because if there is a gap between the parts, the current does not flow or the current partially flows to increase the resistance and cause an abnormal temperature rise.
【００２８】ここで、蓋部２０および台部３０それぞれ
と容器部１０との接触構造と、ヒータとしての加熱能力
および真空蒸着装置の蒸着効率との関係を考える。Here, the relationship between the contact structure between each of the lid portion 20 and the base portion 30 and the container portion 10, the heating capability as a heater, and the vapor deposition efficiency of the vacuum vapor deposition device will be considered.
【００２９】仮に、本実施例による真空蒸着装置用ヒー
タにおいて、蓋部２０および台部３０それぞれと容器部
１０とが溶接等によって接合され、比較的大きな接触面
積で接触するとすると、比率的に、電極棒４０、５０の
断面積の方が小さくなり、逆に、電気抵抗は高くなる。
そして、電極棒４０、５０間に電圧を印加した場合に、
各部間の電気抵抗よりも電極棒４０、５０の方が高いた
め、容器部１０よりも電極棒４０、５０の方が大きく発
熱する。したがって、Ａｇ材の加熱効率に劣り、結果と
して、蒸着効率にも劣る。In the vacuum vapor deposition apparatus heater according to the present embodiment, if each of the lid 20 and the base 30 and the container 10 are joined by welding or the like and come into contact with a relatively large contact area, The cross-sectional area of the electrode rods 40, 50 is smaller, and conversely, the electric resistance is higher.
When a voltage is applied between the electrode rods 40 and 50,
Since the electrode rods 40 and 50 are higher than the electrical resistance between the parts, the electrode rods 40 and 50 generate more heat than the container 10. Therefore, the heating efficiency of the Ag material is poor, and as a result, the vapor deposition efficiency is also poor.
【００３０】これに対し、本発明の実施例では、蓋部２
０が容器部１０の上端面に載置され、台部３０が容器部
１０の底面を軸支する構造であるため、各部間における
接触面積が比較的小さく、導電材から成る棒状の電極棒
４０、５０よりも、電気抵抗が大きい。したがって、電
極棒４０、５０間に電圧を印加した場合に、各部間から
発熱し、熱伝導で容器部１０が加熱され、その内部に収
容されたＡｇ材は、効率よく加熱され、蒸着効率にも優
れている。On the other hand, in the embodiment of the present invention, the lid 2
0 is mounted on the upper end surface of the container portion 10 and the base portion 30 is configured to pivotally support the bottom surface of the container portion 10. Therefore, the contact area between the respective portions is relatively small, and the rod-shaped electrode rod 40 made of a conductive material is used. , 50, the electric resistance is larger. Therefore, when a voltage is applied between the electrode rods 40 and 50, heat is generated between the respective parts, the container part 10 is heated by heat conduction, and the Ag material contained therein is efficiently heated, and the deposition efficiency is reduced. Is also excellent.
【００３１】次に、以上説明した構造の本発明の実施例
による真空蒸着装置用ヒータと、比較例としての図３お
よび図４に示した真空蒸着装置用ヒータとをそれぞれ用
いた真空蒸着装置によって、Ｎｉめっきされた水晶板に
Ａｇを蒸着する実験を行った。Next, the vacuum evaporation apparatus using the heater for the vacuum evaporation apparatus according to the embodiment of the present invention having the above-described structure and the heater for the vacuum evaporation apparatus shown in FIGS. An experiment was conducted in which Ag was deposited on a Ni-plated quartz plate.
【００３２】本実施例による真空蒸着装置用ヒータは、
容器部１０の高さが１４ｍｍ、肉厚が１ｍｍ、内容積が
１９００ｍｍ3 、放出孔１１の直径が１．５ｍｍであ
る。また、蓋部２０および台部３０はそれぞれ、基部の
肉厚が２ｍｍであり、電極棒４０および５０はそれぞ
れ、直径１．５ｍｍである。The heater for a vacuum deposition apparatus according to the present embodiment
The height of the container 10 is 14 mm, the thickness is 1 mm, the internal volume is 1900 mm 3 , and the diameter of the discharge hole 11 is 1.5 mm. The lid 20 and the base 30 each have a base with a thickness of 2 mm, and the electrode rods 40 and 50 each have a diameter of 1.5 mm.
【００３３】一方、比較例は、Ｍｏ板材の厚さが０．１
ｍｍ、高さが１４ｍｍ、内容積が１９００ｍｍ3 、放出
孔６６の直径が１．５ｍｍである。On the other hand, in the comparative example, the thickness of the Mo plate material was 0.1%.
mm, the height is 14 mm, the internal volume is 1900 mm 3 , and the diameter of the discharge hole 66 is 1.5 mm.
【００３４】その他の条件は、本実施例および比較例共
に、同じとした。即ち、蒸着材料は、Ａｇ粒材を８グラ
ム用いた。また、被蒸着体であるＮｉめっきされた水晶
板を、各放出孔に対向して配設した。The other conditions were the same for both the embodiment and the comparative example. That is, as a vapor deposition material, 8 grams of Ag particles were used. In addition, a Ni-plated quartz plate as an object to be vapor-deposited was disposed to face each emission hole.
【００３５】そして、真空室内を真空度１×１０-4Ｔｏ
ｒｒとし、温度を１１００℃に維持し、各ヒータに電圧
を印加した。より具体的には、以下に示す実験１および
実験２を行った。Then, the degree of vacuum is 1 × 10 −4 To in the vacuum chamber.
rr, the temperature was maintained at 1100 ° C., and a voltage was applied to each heater. More specifically, the following Experiments 1 and 2 were performed.
【００３６】［実験１］Ｎｉめっきされた水晶板に、低
周波用Ａｇ厚膜と高周波用Ａｇ薄膜とを蒸着し、８グラ
ムのＡｇ粒材全てを使い切るまでに蒸着した水晶板の出
来高を調べた。実験は、５回の平均値である。実験の結
果を以下の表１に示す。[Experiment 1] A low-frequency Ag thick film and a high-frequency Ag thin film were deposited on a Ni-plated quartz plate, and the yield of the quartz plate deposited until all of the 8-gram Ag material was used up was examined. Was. Experiments are the average of 5 runs. The results of the experiment are shown in Table 1 below.
【００３７】[0037]
【表１】 [Table 1]
【００３８】表１を参照すると、本発明の実施例による
真空蒸着装置用ヒータは、比較例に比べて、蒸着材料の
損失が少なく、蒸着効率に優れていることがわかる。Referring to Table 1, it can be seen that the heater for the vacuum deposition apparatus according to the embodiment of the present invention has less loss of the deposition material and is superior in the deposition efficiency as compared with the comparative example.
【００３９】［実験２］Ｎｉめっきされた水晶板に、低
周波用Ａｇ厚膜と高周波用Ａｇ薄膜とを蒸着し、８グラ
ムのＡｇ粒材全てを使い切るまでを１サイクルとし、以
後、Ａｇ粒材８グラムを繰り返し収容し、何サイクルで
破断するかを確認した。実験は、５回の平均値である。
実験の結果を以下の表２に示す。[Experiment 2] A low-frequency Ag thick film and a high-frequency Ag thin film were vapor-deposited on a Ni-plated quartz plate, and one cycle was performed until all of the 8-gram Ag material was used up. 8 grams of the material was repeatedly accommodated, and it was confirmed how many cycles it would break. Experiments are the average of 5 runs.
The results of the experiment are shown in Table 2 below.
【００４０】[0040]
【表２】 [Table 2]
【００４１】表２において、本実施例による真空蒸着装
置用ヒータは１０００サイクル以上でも破断しないた
め、実験をここ迄で中止したが、本発明の実施例による
真空蒸着装置用ヒータは、比較例に比べて、寿命が長い
ことがわかる。In Table 2, since the heater for a vacuum deposition apparatus according to the present embodiment did not break even over 1000 cycles, the experiment was stopped up to this point. However, the heater for a vacuum deposition apparatus according to the embodiment of the present invention was compared with the comparative example. In comparison, it can be seen that the life is long.
【００４２】尚、以上説明した実施例では、容器部１
０、蓋部２０および台部３０の材質として、Ｍｏを用い
たが、本発明では、Ｗ、ニオブ（Ｎｂ）、タンタル（Ｔ
ａ）、Ｍｏ合金、Ｗ合金、Ｎｂ合金およびＴａ合金等の
高融点金属を用いても、同様の効果が得られる。また、
容器部１０内に収容して用いる蒸着材料としては、Ａｇ
材に限らず、金（Ａｕ）材や白金（Ｐｔ）材等、他の貴
金属でもよい。In the embodiment described above, the container 1
0, Mo was used as the material of the lid 20 and the base 30, but in the present invention, W, niobium (Nb), tantalum (T
Similar effects can be obtained by using high melting point metals such as a), Mo alloy, W alloy, Nb alloy and Ta alloy. Also,
The deposition material used in the container 10 is Ag.
Not only the material but also other noble metals such as a gold (Au) material and a platinum (Pt) material may be used.
【００４３】[0043]
【発明の効果】本発明による真空蒸着装置用ヒータは、
高融点金属から成り、板状を呈し、板面上にて突出する
軸部分を備えた台部と、高融点金属から成り、筒状を呈
する側面部分、側面部分に形成された少くとも１つの放
出孔、および側面部分の一端を覆蓋するように形成され
た底面部分を備え、底面部分が台部の軸部分に対して小
さい接触面積で接触する容器部と、高融点金属から成
り、板状を呈し、容器部の側面部分の他端を覆蓋するよ
うに側面部分の開口縁に対して小さい接触面積で接触す
る蓋部とを有し、蓋部と台部との間に電圧を印加するこ
とによって、容器部および蓋部によって規定された空間
内に収容した蒸着材料を加熱し、蒸気化した蒸着材料を
放出孔から放出するため、切削加工等により製造でき、
複雑な形状に設計できる。また、肉圧の厚い形状が可能
であり、ヒータとしての寿命が長い。さらに、容器部に
折り曲げ加工時のような継目がないために、蒸着材料の
漏洩がなく、蒸着効率に優れている。The heater for a vacuum deposition apparatus according to the present invention has the following features.
A base portion made of a high melting point metal and having a plate-like shape and having a shaft portion protruding on the plate surface; a side portion made of a high melting point metal and having a cylindrical shape; A discharge port, and a bottom portion formed to cover one end of the side portion, a bottom portion contacting the shaft portion of the base portion with a small contact area, and a high melting point metal, And a lid that contacts the opening edge of the side portion with a small contact area so as to cover the other end of the side portion of the container portion, and applies a voltage between the lid portion and the base portion. By heating the vapor deposition material contained in the space defined by the container and the lid, and discharging the vaporized vapor deposition material from the discharge holes, it can be manufactured by cutting or the like,
Can be designed into complex shapes. Further, a shape having a large wall pressure is possible, and the life as a heater is long. Further, since the container does not have a seam as in the case of bending, there is no leakage of the vapor deposition material, and the vapor deposition efficiency is excellent.
【００４４】また、容器部に折り曲げ加工時のような継
目がないために、発熱部分から容器部全体へ効率よく熱
が伝導し、容器部全体が均一に加熱されるため、Ａｇ粒
子が小さく均一な高品質の蒸着層が形成できる。Further, since the container does not have a seam as in the case of bending, heat is efficiently conducted from the heat generating portion to the entire container, and the entire container is uniformly heated. A high quality vapor deposition layer can be formed.
【００４５】さらに、蓋部を除けると、容器部の大きな
開口部が露出するため、蒸着材料の挿入が容易である。Further, when the lid is removed, the large opening of the container is exposed, so that the deposition material can be easily inserted.
【００４６】また、電極側の蓋部および台部と容器部と
を分割した構造であり、しかも各部間における接触面積
が比較的小さいため、単に、折り曲げ加工に代えて切削
加工によって製造するような構造とは異なり、導電材か
ら成る棒状の電極棒よりも各部間における電気抵抗が大
きく、各部間から発熱することで容器部が加熱され、蒸
着効率にも優れている。Further, since the cover and the base on the electrode side and the container are separated from each other and the contact area between the respective parts is relatively small, such a structure that is manufactured simply by cutting instead of bending is used. Unlike the structure, the electric resistance between the parts is higher than that of the rod-shaped electrode rod made of a conductive material, and the container part is heated by generating heat between the parts, so that the vapor deposition efficiency is excellent.
【図１】本発明の一実施例による真空蒸着装置用ヒータ
を示す斜視図である。FIG. 1 is a perspective view showing a heater for a vacuum deposition apparatus according to an embodiment of the present invention.
【図２】図１に示す真空蒸着装置用ヒータの要部を示す
縦断面図である。FIG. 2 is a longitudinal sectional view showing a main part of the heater for a vacuum evaporation apparatus shown in FIG.
【図３】従来例による真空蒸着装置用ヒータを示す斜視
図である。FIG. 3 is a perspective view showing a conventional heater for a vacuum evaporation apparatus.
【図４】図３に示す真空蒸着装置用ヒータのＡ−Ａ断面
図である。FIG. 4 is a cross-sectional view of the heater for a vacuum evaporation apparatus taken along line AA of FIG. 3;
１０ 容器部 １１ 放出孔 １２ 凹部分 ２０ 蓋部 ２１ 周凹部分 ３０ 台部 ３１ 軸部分 ４０、５０ 電極棒 ６１〜６５ 板部 ６６ 放出孔 ６７ 電極取付孔 DESCRIPTION OF SYMBOLS 10 Container part 11 Emission hole 12 Depression part 20 Cover part 21 Peripheral depression part 30 Stand part 31 Shaft part 40, 50 Electrode rod 61-65 Plate part 66 Emission hole 67 Electrode attachment hole
Claims (3)
上にて突出する軸部分を備えた台部と、 高融点金属から成り、筒状を呈する側面部分、側面部分
に形成された少くとも１つの放出孔、および側面部分の
一端を覆蓋するように形成された底面部分を備え、底面
部分が前記台部の前記軸部分に対して小さい接触面積で
接触する容器部と、 高融点金属から成り、板状を呈し、前記容器部の前記側
面部分の他端を覆蓋するように該側面部分の開口縁に対
して小さい接触面積で接触する蓋部とを有し、 前記蓋部と前記台部との間に電圧を印加することによっ
て、前記容器部および前記蓋部によって規定された空間
内に収容した蒸着材料を加熱し、蒸気化した該蒸着材料
を前記放出孔から放出することを特徴とする真空蒸着装
置用ヒータ。1. A plate made of a high melting point metal, having a plate shape,
A base portion having a shaft portion protruding above, and a cylindrical side surface portion and a side portion made of a high melting point metal.
At least one discharge hole formed in the
A bottom part formed to cover one end is provided.
Part with a small contact area with the shaft part of the platform
A container part to be in contact with, made of a high melting point metal, having a plate shape, and the side of the container part
The opening edge of the side surface portion is covered with a cover so as to cover the other end of the surface portion.
And a lid that contacts with a small contact area, and by applying a voltage between the lid and the base, in a space defined by the container and the lid . A heater for a vacuum evaporation apparatus, wherein the evaporation material accommodated in the heater is heated and the vaporized evaporation material is discharged from the discharge hole.
導電性材から成り、棒状を呈する電極棒が取り付けら
れ、前記蓋部および前記台部は、各前記電極棒によって
外部から支持される請求項１記載の真空蒸着装置用ヒー
タ。2. The lid and the base, respectively,
The heater for a vacuum evaporation apparatus according to claim 1, wherein a rod-shaped electrode rod made of a conductive material is attached, and the lid and the base are externally supported by each of the electrode rods.
ステン、ニオブ、タンタル、モリブデン合金、タングス
テン合金、ニオブ合金およびタンタル合金のうちのいず
れかである請求項１または２記載の真空蒸着装置用ヒー
タ。3. The heater according to claim 1, wherein the refractory metal is any one of molybdenum, tungsten, niobium, tantalum, a molybdenum alloy, a tungsten alloy, a niobium alloy, and a tantalum alloy.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5351535A JP2811531B2 (en) | 1993-12-29 | 1993-12-29 | Heater for vacuum deposition equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5351535A JP2811531B2 (en) | 1993-12-29 | 1993-12-29 | Heater for vacuum deposition equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH07197241A JPH07197241A (en) | 1995-08-01 |
| JP2811531B2 true JP2811531B2 (en) | 1998-10-15 |
Family
ID=18417951
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5351535A Expired - Lifetime JP2811531B2 (en) | 1993-12-29 | 1993-12-29 | Heater for vacuum deposition equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2811531B2 (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101225371B1 (en) * | 2011-03-29 | 2013-01-25 | 주식회사 야스 | Hybrid Heating Type Evaporator |
| KR101225318B1 (en) * | 2012-09-21 | 2013-02-01 | 주식회사 야스 | Hybrid Heating Type Evaporator |
| CN109487218B (en) * | 2018-11-27 | 2026-03-10 | 鸿翌科技有限公司 | Evaporation source heating electric leading-in device and vacuum evaporation coating equipment |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4913793U (en) * | 1972-05-11 | 1974-02-05 |
-
1993
- 1993-12-29 JP JP5351535A patent/JP2811531B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH07197241A (en) | 1995-08-01 |
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