JP2831274B2 - Polishing sheet and method for producing the same - Google Patents
Polishing sheet and method for producing the sameInfo
- Publication number
- JP2831274B2 JP2831274B2 JP6148752A JP14875294A JP2831274B2 JP 2831274 B2 JP2831274 B2 JP 2831274B2 JP 6148752 A JP6148752 A JP 6148752A JP 14875294 A JP14875294 A JP 14875294A JP 2831274 B2 JP2831274 B2 JP 2831274B2
- Authority
- JP
- Japan
- Prior art keywords
- polishing
- slurry
- particles
- sheet
- abrasive particles
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000005498 polishing Methods 0.000 title claims description 97
- 238000004519 manufacturing process Methods 0.000 title claims description 7
- 239000002245 particle Substances 0.000 claims description 106
- 239000002002 slurry Substances 0.000 claims description 37
- 239000007787 solid Substances 0.000 claims description 28
- 239000000853 adhesive Substances 0.000 claims description 22
- 230000001070 adhesive effect Effects 0.000 claims description 22
- 239000000758 substrate Substances 0.000 claims description 20
- 239000011230 binding agent Substances 0.000 claims description 16
- 238000002156 mixing Methods 0.000 claims description 16
- 239000000110 cooling liquid Substances 0.000 claims description 15
- BFNBIHQBYMNNAN-UHFFFAOYSA-N ammonium sulfate Chemical compound N.N.OS(O)(=O)=O BFNBIHQBYMNNAN-UHFFFAOYSA-N 0.000 claims description 8
- 229910052921 ammonium sulfate Inorganic materials 0.000 claims description 8
- 235000011130 ammonium sulphate Nutrition 0.000 claims description 8
- CZMRCDWAGMRECN-UGDNZRGBSA-N Sucrose Chemical compound O[C@H]1[C@H](O)[C@@H](CO)O[C@@]1(CO)O[C@@H]1[C@H](O)[C@@H](O)[C@H](O)[C@@H](CO)O1 CZMRCDWAGMRECN-UGDNZRGBSA-N 0.000 claims description 6
- 229930006000 Sucrose Natural products 0.000 claims description 6
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 claims description 6
- 229940037003 alum Drugs 0.000 claims description 6
- UMEAURNTRYCPNR-UHFFFAOYSA-N azane;iron(2+) Chemical compound N.[Fe+2] UMEAURNTRYCPNR-UHFFFAOYSA-N 0.000 claims description 6
- 239000004202 carbamide Substances 0.000 claims description 6
- 239000000203 mixture Substances 0.000 claims description 6
- 229960004793 sucrose Drugs 0.000 claims description 6
- 235000013681 dietary sucrose Nutrition 0.000 claims description 4
- DIZPMCHEQGEION-UHFFFAOYSA-H aluminium sulfate (anhydrous) Chemical compound [Al+3].[Al+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O DIZPMCHEQGEION-UHFFFAOYSA-H 0.000 claims description 3
- 238000005507 spraying Methods 0.000 claims description 3
- NWONKYPBYAMBJT-UHFFFAOYSA-L zinc sulfate Chemical compound [Zn+2].[O-]S([O-])(=O)=O NWONKYPBYAMBJT-UHFFFAOYSA-L 0.000 claims description 3
- 229960001763 zinc sulfate Drugs 0.000 claims description 3
- 229910000368 zinc sulfate Inorganic materials 0.000 claims description 3
- WZUKKIPWIPZMAS-UHFFFAOYSA-K Ammonium alum Chemical compound [NH4+].O.O.O.O.O.O.O.O.O.O.O.O.[Al+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O WZUKKIPWIPZMAS-UHFFFAOYSA-K 0.000 claims description 2
- 235000013877 carbamide Nutrition 0.000 claims description 2
- 239000011651 chromium Substances 0.000 claims description 2
- 229910052804 chromium Inorganic materials 0.000 claims description 2
- 229940010048 aluminum sulfate Drugs 0.000 claims 1
- 239000013078 crystal Substances 0.000 description 9
- 229910000420 cerium oxide Inorganic materials 0.000 description 8
- 230000005291 magnetic effect Effects 0.000 description 8
- 238000000034 method Methods 0.000 description 8
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 8
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 6
- 239000004744 fabric Substances 0.000 description 6
- 239000013307 optical fiber Substances 0.000 description 5
- 239000003960 organic solvent Substances 0.000 description 5
- 238000007517 polishing process Methods 0.000 description 5
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 239000004973 liquid crystal related substance Substances 0.000 description 4
- 229920000728 polyester Polymers 0.000 description 4
- 239000004814 polyurethane Substances 0.000 description 4
- 229920002635 polyurethane Polymers 0.000 description 4
- 238000003825 pressing Methods 0.000 description 4
- 239000002826 coolant Substances 0.000 description 3
- 238000000227 grinding Methods 0.000 description 3
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- 229920005830 Polyurethane Foam Polymers 0.000 description 2
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 2
- 230000001154 acute effect Effects 0.000 description 2
- -1 ammonium chromium iron Chemical compound 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000013013 elastic material Substances 0.000 description 2
- 239000003302 ferromagnetic material Substances 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229920006267 polyester film Polymers 0.000 description 2
- 229920001225 polyester resin Polymers 0.000 description 2
- 239000004645 polyester resin Substances 0.000 description 2
- 239000011496 polyurethane foam Substances 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 239000005720 sucrose Substances 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 239000003082 abrasive agent Substances 0.000 description 1
- 239000003522 acrylic cement Substances 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- LCPUDZUWZDSKMX-UHFFFAOYSA-K azane;hydrogen sulfate;iron(3+);sulfate;dodecahydrate Chemical compound [NH4+].O.O.O.O.O.O.O.O.O.O.O.O.[Fe+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O LCPUDZUWZDSKMX-UHFFFAOYSA-K 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- QDOXWKRWXJOMAK-UHFFFAOYSA-N dichromium trioxide Chemical compound O=[Cr]O[Cr]=O QDOXWKRWXJOMAK-UHFFFAOYSA-N 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 239000004745 nonwoven fabric Substances 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Landscapes
- Polishing Bodies And Polishing Tools (AREA)
Description
【０００１】[0001]
【産業上の利用分野】本発明は、光ファイバー端面の研
磨、液晶表示板用ガラス表面の研磨、磁気ハードディス
クの研磨、磁気ディスク、またはレンズ、その他精密な
仕上研磨に使用される研磨シートおよびその製造方法に
関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a polishing sheet used for polishing an end face of an optical fiber, polishing a glass surface for a liquid crystal display panel, polishing a magnetic hard disk, a magnetic disk or a lens, and other fine finish polishing, and manufacturing the same. About the method.
【０００２】[0002]
【従来技術】従来、精密な研磨は、遊離した研磨材粒子
を使用するか、または研磨シートを使用して行われてい
た。2. Description of the Related Art Conventionally, precision polishing has been performed using loose abrasive particles or using a polishing sheet.
【０００３】遊離した研磨材粒子を使用した研磨方法
は、起毛布等の研磨布表面に研磨材粒子を冷却液と共に
滴下し、その表面上に被研磨物を圧接して研磨を行とい
うものであり、研磨シートを使用した研磨方法は、プラ
スチックフィルム等の基板シート上に研磨材粒子を固定
的に接着し、研磨シートの表面に被研磨物を圧接して研
磨を行うというものであった。In a polishing method using the released abrasive particles, abrasive particles are dropped together with a cooling liquid on the surface of a polishing cloth such as a raised cloth, and the object to be polished is pressed against the surface of the polishing cloth to perform polishing. In a polishing method using a polishing sheet, polishing particles are fixedly adhered to a substrate sheet such as a plastic film, and polishing is performed by pressing an object to be polished to the surface of the polishing sheet.
【０００４】[0004]
【発明の解決しようとする課題】しかし、遊離した研磨
材粒子を使用した研磨では、遊離した研磨材粒子が研磨
布上を転がるので被研磨物表面にスクラッチを生じさせ
ず被研磨物表面を比較的滑らかに研磨できるが、研削力
が小さいため、遊離した研磨材粒子を使用した研磨を行
う前に粗研磨を行わなければならないという２段階の研
磨工程が必要であり、研磨に時間がかかっていた。However, in polishing using loose abrasive particles, since the loose abrasive particles roll on the polishing cloth, the surface of the object to be polished is compared without causing scratches on the surface of the object to be polished. Can be polished smoothly, but the grinding power is small, so a two-stage polishing process is required, in which rough polishing must be performed before polishing using loose abrasive particles, and it takes a long time for polishing. Was.
【０００５】また、遊離した研磨材粒子を使用した研磨
において、時間的に間隔をあけて研磨材粒子を冷却液と
共に滴下すると被研磨物表面に波形の凹凸を生じさせ、
研磨材の滴下を連続的に行うと冷却液が研磨材粒子の被
研磨物表面への圧接を妨げ、研磨効率を著しく低下させ
る。[0005] Further, in the polishing using the separated abrasive particles, if the abrasive particles are dropped together with the cooling liquid at a time interval, waveform irregularities are generated on the surface of the object to be polished,
If the abrasive is continuously dropped, the coolant prevents the abrasive particles from pressing against the surface of the object to be polished, thereby significantly reducing the polishing efficiency.
【０００６】研磨シートを使用した研磨では、研削力が
あり、被研磨物表面を平坦に研磨できるが、研磨材粒子
がバインダー接着剤で基板シートに強固に固着されてい
るため、研磨シート表面上に突出した研磨材粒子が被研
磨物表面に鋭角で接触したままの状態で被研磨物表面を
擦るために被研磨物表面にスクラッチを生じさせてい
た。[0006] In the polishing using a polishing sheet, there is a grinding power, and the surface of the object to be polished can be polished flat. However, since the abrasive particles are firmly fixed to the substrate sheet with a binder adhesive, the surface of the polishing sheet can be polished. The abrasive particles protruding from the surface of the object to be polished rub the surface of the object to be polished while still in contact with the surface of the object to be polished at an acute angle, thereby causing scratches on the surface of the object to be polished.
【０００７】したがって、本発明の目的は、粗研磨およ
び仕上研磨という２段階の研磨工程を行わず、１段階の
研磨工程で、被研磨物表面に波形の凹凸やスクラッチを
生じさせずに精密な研磨ができる研磨シートおよびその
製造方法を提供することである。Accordingly, an object of the present invention is to provide a single-stage polishing process without performing two-stage polishing processes of rough polishing and finish polishing, and without causing corrugations and scratches on the surface of the object to be polished, thereby achieving precise polishing. An object of the present invention is to provide a polishing sheet that can be polished and a method for producing the same.
【０００８】[0008]
【課題を解決するための手段】上記目的を達成するため
に、本発明は、基板シートにスラリーを塗布して成る研
磨シートにおいて、スラリーが、研磨材粒子と、可溶性
固体粒子と、バインダー接着剤とを混合したものである
ことを特徴とする研磨シートである。According to the present invention, there is provided a polishing sheet comprising a substrate sheet and a slurry, wherein the slurry comprises abrasive particles, soluble solid particles, and a binder adhesive. And a mixture thereof.
【０００９】ここで、可溶性固体粒子は好適に、硫酸ア
ンモニウム、尿素、サッカロース、アンモニウム鉄明
礬、アンモニウム・クロム鉄明礬、硫酸アルミニウム、
または硫酸亜鉛であり、塩、錯塩、有機結晶、その他の
可溶物であってもよい。The soluble solid particles are preferably ammonium sulfate, urea, saccharose, ammonium iron alum, ammonium chromium iron alum, aluminum sulfate ,
Alternatively, it is zinc sulfate, and may be a salt, a complex salt, an organic crystal, or another soluble substance.
【００１０】研磨材粒子と可溶性固体粒子との重量混合
比は１：９から９：１の範囲にある。 本発明の上記研
磨シートの製造方法は、スラリーを製造する工程と、ス
ラリーを基板シートに塗布する工程とから成る研磨シー
トの製造方法において、スラリーを製造する工程が、研
磨材粒子とバインダー接着剤とを混合する工程と、研磨
材粒子とバインダー接着剤との混合物に可溶性固体粒子
を更に加えて混合する工程とから成る、研磨シートの製
造方法。The weight mixing ratio of abrasive particles to soluble solid particles is in the range of 1: 9 to 9: 1. In the method for producing a polishing sheet according to the present invention, in the method for producing a polishing sheet comprising a step of producing a slurry and a step of applying the slurry to a substrate sheet, the step of producing the slurry comprises a step of producing abrasive particles and a binder adhesive. And a step of further adding soluble solid particles to a mixture of the abrasive particles and the binder adhesive and mixing.
【００１１】本発明の上記研磨シートを使用する研磨方
法は、上記研磨シートのスラリーに冷却液を吹き付ける
工程と、上記研磨シートを被研磨靴表面に圧接させ、走
行させる工程とから成る。ここで、スラリーの研磨材粒
子の周りの可溶性固体粒子がスラリーに冷却液を吹きか
けることによって溶解し、研磨材粒子が上記研磨シート
から分離することなく容易に動くことができるようにな
る。The polishing method using the polishing sheet of the present invention comprises a step of spraying a cooling liquid onto the slurry of the polishing sheet, and a step of pressing the polishing sheet against the surface of the shoe to be polished and running. Here, the soluble solid particles around the abrasive particles of the slurry are dissolved by spraying the cooling liquid on the slurry, and the abrasive particles can easily move without being separated from the polishing sheet.
【００１２】[0012]
【作用】本発明の、研磨材粒子と、可溶性固体粒子と、
バインダー接着剤とを混合したスラリーを基板シートに
塗布して成る研磨シートを被研磨物表面に圧接させなが
ら走行させ、冷却液を研磨シートに吹きかけて研磨を行
うと、可溶性固体粒子が軟質であることから研磨時に被
研磨物を圧接すると磨砕（つまり、研磨によって可溶性
固体粒子が粉砕される）し、冷却液がスラリーに吹きか
けられるとスラリーの可溶性固体粒子が溶解するので、
短時間で研磨シート表面の可溶性固体粒子は消滅する。According to the present invention, abrasive particles, soluble solid particles,
When a polishing sheet formed by applying a slurry mixed with a binder adhesive to a substrate sheet is run while being pressed against the surface of the object to be polished, and a coolant is blown onto the polishing sheet to perform polishing, the soluble solid particles are soft. Therefore, when the object to be polished is pressed during polishing, the material is ground (that is, the soluble solid particles are crushed by the polishing), and when the cooling liquid is sprayed on the slurry, the soluble solid particles of the slurry dissolve.
The soluble solid particles on the surface of the polishing sheet disappear in a short time.
【００１３】また、研磨材粒子は硬質であり、スラリー
に冷却液を吹きかけても溶解せず、研磨材粒子の周りの
可溶性固体粒子が上述のように溶解し、基板シートおよ
びバインダー接着剤には弾力性のあるものが使用されて
いるので、研磨材粒子が動き易くなり、研磨において、
研磨材粒子が被研磨物表面に弾力的に作用する。このと
き、研磨材粒子が研磨シートから分離されることがな
い。Further, the abrasive particles are hard, do not dissolve even when the cooling liquid is sprayed on the slurry, the soluble solid particles around the abrasive particles dissolve as described above, and the substrate sheet and the binder adhesive are not dissolved. Since elastic material is used, abrasive particles move easily, and in polishing,
The abrasive particles elastically act on the surface of the object to be polished. At this time, the abrasive particles are not separated from the abrasive sheet.
【００１４】[0014]
【実施例】図１は、本発明の研磨シートを示す。FIG. 1 shows an abrasive sheet according to the present invention.
【００１５】図１に示すように、本発明の研磨シート１
０は、研磨材粒子２と、可溶性固体粒子３と、バインダ
ー接着剤４とを混合したスラリー５を基板シート１上に
塗布して成る。As shown in FIG. 1, the polishing sheet 1 of the present invention
No. 0 is obtained by applying a slurry 5 obtained by mixing abrasive particles 2, soluble solid particles 3, and a binder adhesive 4 onto the substrate sheet 1.
【００１６】基板シート１は、不織布、電植布（つま
り、静電気を利用して基板シート上に植毛したもの）、
起毛布、ポリウレタンフォームフィルム、またはポリエ
ステルフィルム等が使用できる。The substrate sheet 1 is made of a nonwoven fabric, an electro-implanted cloth (that is, a hair implanted on the substrate sheet using static electricity),
Brushed cloth, polyurethane foam film, polyester film or the like can be used.
【００１７】研磨材粒子２は、ダイアモンド（Ｃ）、参
加アルミニウム（Ａｌ2Ｏ3）、シリコンカーバイド（Ｓ
ｉＣ）、酸化鉄（Ｆｅ2Ｏ3）、酸化クロム（Ｃｒ
2Ｏ3）、または酸化セリウム（ＣｅＯ2）等である。The abrasive particles 2 are composed of diamond (C), aluminum (Al 2 O 3 ), silicon carbide (S
iC), iron oxide (Fe 2 O 3 ), chromium oxide (Cr
2 O 3 ) or cerium oxide (CeO 2 ).
【００１８】可溶性固体粒子３は、硫酸アンモニウム
［（ＮＨ4）2ＳＯ4］、尿素［ＣＯ（ＮＨ2）2］、サッ
カロース（Ｃ12Ｈ22Ｏ11）、アンモニウム鉄明礬［（Ｎ
Ｈ4）2ＳＯ4・Ｆｅ2（ＳＯ4）3・２４Ｈ2Ｏ］、アンモ
ニウム・クロム鉄明礬［（ＮＨ4）2ＳＯ4・Ａｌ2（ＳＯ
4）3・２４Ｈ2Ｏ］、硫酸アルミニウム［Ａｌ2（Ｓ
Ｏ4）3・１８Ｈ2Ｏ］、硫酸亜鉛（ＺｎＳＯ4・７Ｈ
2Ｏ）等である。The soluble solid particles 3 include ammonium sulfate [(NH 4 ) 2 SO 4 ], urea [CO (NH 2 ) 2 ], saccharose (C 12 H 22 O 11 ), and ammonium iron alum [(N
H 4 ) 2 SO 4 .Fe 2 (SO 4 ) 3 .24H 2 O], ammonium chromium iron alum [(NH 4 ) 2 SO 4 .Al 2 (SO
4 ) 3 · 24H 2 O], aluminum sulfate [Al 2 (S
O 4 ) 3 · 18H 2 O], zinc sulfate (ZnSO 4 .7H)
2 O) and the like.
【００１９】バインダー接着剤４は、ポリエステル・ポ
リウレタン系、塩化ビニル・アクリル系、塩化ビニル・
酢酸ビニル系、またはポリエステル系樹脂接着剤が使用
できる。The binder adhesive 4 is made of polyester / polyurethane, vinyl chloride / acryl, vinyl chloride /
Vinyl acetate or polyester resin adhesives can be used.
【００２０】基板シート１およびバインダー接着剤４に
は、弾力性のあるものが使用されている。An elastic material is used for the substrate sheet 1 and the binder adhesive 4.
【００２１】研磨材粒子２と可溶性固体粒子３との重量
混合比は、約１：９から９：１の範囲にある。The weight mixing ratio between the abrasive particles 2 and the soluble solid particles 3 is in the range of about 1: 9 to 9: 1.
【００２２】本発明の上記研磨シート１０の製造方法
は、スラリー５を調製する工程と、スラリー５を基板シ
ート１上に塗布する工程とから成る研磨シートの製造方
法において、スラリー５を調製する工程が、研磨材粒子
２とバインダー接着剤４とを混合する工程と、その後、
更に可溶性固体粒子３を加えて混合する工程とから成る
ことを特徴とする。In the method of manufacturing the polishing sheet 10 according to the present invention, the step of preparing the slurry 5 includes the step of preparing the slurry 5 and the step of applying the slurry 5 on the substrate sheet 1. Is a step of mixing the abrasive particles 2 and the binder adhesive 4, and thereafter,
And adding and mixing the soluble solid particles 3.
【００２３】図２は、本発明の研磨シートによる研磨方
法を示す。FIG. 2 shows a polishing method using the polishing sheet of the present invention.
【００２４】図２に示すように、本発明の研磨シート１
０による研磨方法は、スラリー５に冷却液６を吹きかけ
た研磨シート１０を被研磨物７の表面に圧接し、走行
（図２の矢印９の方向）させるものであって、スラリー
５に冷却水６を吹きかけて可溶性固体粒子３を溶解さ
せ、研磨材粒子２の周りの可溶性固体粒子３の粒径を小
さく（図２の符号３′を参照）し、バインダー接着剤４
が弾力性のあるものであることから、研磨材粒子２が研
磨シート１０から分離することなく容易に動くことがで
きるようにし、研磨シート１０を走行させた（矢印９の
方向）とき、研磨材粒子２が被研磨物７の表面と接触し
て回転（矢印８の方向）され、研磨材粒子２の被研磨物
７の表面に対する接触角度が緩やかなものになるという
ものである。As shown in FIG. 2, the polishing sheet 1 of the present invention
The polishing method according to No. 0 is a method in which a polishing sheet 10 in which a cooling liquid 6 is sprayed on the slurry 5 is pressed against the surface of the polished object 7 to run (in the direction of arrow 9 in FIG. 2). 6 to dissolve the soluble solid particles 3, reduce the particle size of the soluble solid particles 3 around the abrasive particles 2 (see reference numeral 3 ′ in FIG. 2), and
Is elastic, so that the abrasive particles 2 can easily move without being separated from the abrasive sheet 10, and when the abrasive sheet 10 is run (in the direction of arrow 9), the abrasive material The particles 2 come into contact with the surface of the object 7 and are rotated (in the direction of arrow 8), so that the contact angle of the abrasive particles 2 with the surface of the object 7 becomes gentle.
【００２５】本発明の研磨シートの実施例を以下に詳細
に述べる。Examples of the polishing sheet of the present invention will be described in detail below.
【００２６】［実施例１］ 本発明の、光ファイバーの
端面研磨用の研磨シートを以下のとおりに製造した。Example 1 A polishing sheet for polishing an end face of an optical fiber of the present invention was produced as follows.
【００２７】平均粒径１μｍの酸化セリウム粒子の研磨
材粒子と、ポリエステル・ポリウレタン系接着剤とを混
合撹拌し、次いで、平均粒径１μｍの硫酸アンモニウム
の結晶粒子の可溶性固体粒子を加えて混合し、スラリー
を製造した。Abrasive particles of cerium oxide particles having an average particle size of 1 μm and a polyester / polyurethane-based adhesive are mixed and stirred. Then, soluble solid particles of ammonium sulfate crystal particles having an average particle size of 1 μm are added and mixed. A slurry was produced.
【００２８】このとき、酸化セリウム粒子と硫酸アンモ
ニウム粒子との重量混合比は２：３であった。At this time, the weight mixing ratio between the cerium oxide particles and the ammonium sulfate particles was 2: 3.
【００２９】硫酸アンモニウムの結晶粒子は、エタノー
ル、アセトン等の有機溶媒には不溶であることから有機
溶媒を含むバインダー接着剤と混合することができ、ま
た、この結晶粒子は水によく溶ける。Since the ammonium sulfate crystal particles are insoluble in organic solvents such as ethanol and acetone, they can be mixed with a binder adhesive containing an organic solvent, and the crystal particles are well soluble in water.
【００３０】 酸化セリウム粒子とポリエステル・ポリ
ウレタン系接着剤との混合撹拌において、酸化セリウム
粒子が凝集すると光ファイバーの表面に凹凸を生じさせ
てしまうので、これらの混合撹拌は丹念に行われた。[0030] In mixing and stirring the cerium oxide particles and the polyester polyurethane adhesive, since the cerium oxide particles tend to cause irregularities on the surface of the aggregate fibers, these mixing and stirring was carefully performed.
【００３１】酸化セリウム粒子とポリエステル・ポリウ
レタン系接着剤との混合物と、硫酸アンモニウム粒子と
の混合が長時間行われると硫酸アンモニウム粒子が磨砕
するので、短時間撹拌し、粘度８０ｃｐから１５０ｃｐ
の範囲のスラリーとした。If the mixture of the cerium oxide particles and the polyester / polyurethane-based adhesive is mixed with the ammonium sulfate particles for a long time, the ammonium sulfate particles are ground. Therefore, the mixture is stirred for a short time and has a viscosity of 80 cp to 150 cp.
Of slurry in the range.
【００３２】このスラリーを、厚さ５０μｍのポリウレ
タンフォームフィルムの基板シート上に、スラリーの厚
さが約４μｍになるように均一に塗布し、９０°Ｃ以下
の温度で乾燥させて、本発明の、光ファイバー用の研磨
シートを製造した。The slurry is uniformly applied on a substrate sheet of a polyurethane foam film having a thickness of 50 μm so that the slurry has a thickness of about 4 μm, and dried at a temperature of 90 ° C. or less to obtain the slurry of the present invention. A polishing sheet for an optical fiber was manufactured.
【００３３】この研磨シートを使用した光ファイバー端
面の研磨は、冷却液に水を使用し、冷却液を吹きかけた
研磨シートを光ファイバー端面に圧接し、走行させて研
磨した。The polishing of the end face of the optical fiber using the polishing sheet was performed by using water as a cooling liquid, pressing the polishing sheet sprayed with the cooling liquid against the end face of the optical fiber, and running the polishing sheet.
【００３４】［実施例２］ 本発明の、液晶表示板用ガ
ラス表面の研磨のための研磨シートを以下のとおりに製
造した。Example 2 A polishing sheet of the present invention for polishing a glass surface for a liquid crystal display panel was produced as follows.
【００３５】平均粒径２μｍの酸化セリウム粒子の研磨
材粒子と、塩化ビニル・酢酸ビニル系接着剤とを撹拌混
合し、次いで、平均粒径３μｍの尿素結晶粒子の可溶性
固体粒子を加えて撹拌混合し、粘度８０ｃｐから１５０
ｃｐの範囲のスラリーを製造した。Abrasive particles of cerium oxide particles having an average particle diameter of 2 μm and a vinyl chloride / vinyl acetate adhesive are mixed with stirring, and then soluble solid particles of urea crystal particles having an average particle diameter of 3 μm are added and mixed. And a viscosity of 80 cp to 150
A slurry in the cp range was produced.
【００３６】このとき、酸化セリウム粒子と尿素粒子と
の重量混合比は１：２であった。At this time, the weight mixing ratio between the cerium oxide particles and the urea particles was 1: 2.
【００３７】尿素結晶粒子は、有機溶媒に対して難溶解
であるが、水にはよく溶解する。The urea crystal particles are hardly soluble in an organic solvent, but are well soluble in water.
【００３８】このスラリーを、厚さ１００μｍの不織布
の基板シート上に、スラリーの厚さが約６μｍになるよ
うに均一に塗布し、９０°Ｃ以下の温度で乾燥させて、
本発明の、液晶表示板用ガラス表面の研磨シートを製造
した。This slurry is uniformly coated on a nonwoven substrate sheet having a thickness of 100 μm so as to have a thickness of about 6 μm, and dried at a temperature of 90 ° C. or less.
A polishing sheet of the present invention for a glass surface for a liquid crystal display panel was produced.
【００３９】この研磨シートを使用した液晶表示板用ガ
ラス表面の研磨は、冷却液に水を使用し、実施例１と同
様の方法で行われた。Polishing of the glass surface for a liquid crystal display panel using this polishing sheet was performed in the same manner as in Example 1 using water as a cooling liquid.
【００４０】［実施例３］ 本発明の、磁気ハードディ
スクの研磨のための研磨シートを以下のとおりに製造し
た。Example 3 A polishing sheet of the present invention for polishing a magnetic hard disk was manufactured as follows.
【００４１】平均粒径１μｍの酸化アルミニウムの研磨
材粒子と、ポリエステル系樹脂接着剤とを混合撹拌し、
次いで、平均粒径２μｍのサッカロースの結晶粒子の可
溶性固体粒子を加えて混合し、粘度８０ｃｐから１５０
ｃｐの範囲のスラリーを製造し、このスラリーを、厚さ
３０μｍのポリエステルフィルムの基板シート上に、ス
ラリーの厚さが５μｍになるように均一に塗布し、７０
°Ｃ以下の温度で乾燥させて、本発明の磁気ハードディ
スクの研磨のための研磨シートを製造した。Abrasive particles of aluminum oxide having an average particle diameter of 1 μm and a polyester resin adhesive are mixed and stirred,
Next, soluble solid particles of sucrose crystal particles having an average particle size of 2 μm were added and mixed, and the viscosity was 80 cp to 150 cp.
A slurry in the range of cp was prepared, and the slurry was uniformly applied on a 30 μm-thick polyester film substrate sheet so that the slurry thickness was 5 μm.
By drying at a temperature of not more than ° C, a polishing sheet for polishing a magnetic hard disk of the present invention was produced.
【００４２】ここで、酸化アルミニウムとサッカロース
の結晶粒子との重量混合比は１：２であった。Here, the weight mixing ratio between the aluminum oxide and the sucrose crystal particles was 1: 2.
【００４３】サッカロースの結晶は有機溶媒に対して難
溶解であるが、水には溶解し、特に、研磨中に冷却液の
量を制御することによって適度の粘性を有して溶解する
ことができるので、脱粒した酸化アルミニウム粒子を基
板シートから流し去ることなく保持することができる。Saccharose crystals are hardly soluble in organic solvents, but are soluble in water, and can be dissolved with an appropriate viscosity by controlling the amount of cooling liquid during polishing. Therefore, the degranulated aluminum oxide particles can be held without flowing off from the substrate sheet.
【００４４】この研磨シートを使用した磁気ハードディ
スクの研磨は、冷却液に水を使用し、実施例１と同様の
方法で行われた。The polishing of the magnetic hard disk using this polishing sheet was performed in the same manner as in Example 1 using water as a cooling liquid.
【００４５】［実施例４］ 本発明の、磁気ヘッドのよ
うな強磁性体の研磨のための研磨シートを以下のとおり
に製造した。Example 4 A polishing sheet of the present invention for polishing a ferromagnetic material such as a magnetic head was manufactured as follows.
【００４６】平均粒径２μｍの酸化鉄の研磨材粒子と、
塩化ビニル・アクリル系接着剤とを混合撹拌し、次い
で、平均粒径２μｍのアンモニウム鉄明礬を加えて混合
し、粘度８０ｃｐから１５０ｃｐの範囲のスラリーを製
造し、このスラリーを、厚さ３０μｍのポリエステルフ
ィルムの基板シート上に、スラリーの厚さが約６μｍに
なるように均一に塗布し、９０°Ｃ以下の温度で乾燥さ
せて、本発明の、磁気ヘッドのような強磁性体の研磨の
ための研磨シートを製造した。Abrasive particles of iron oxide having an average particle size of 2 μm;
A vinyl chloride / acrylic adhesive is mixed and stirred, then ammonium iron alum having an average particle size of 2 μm is added and mixed to produce a slurry having a viscosity in the range of 80 cp to 150 cp. The slurry is uniformly coated on a film substrate sheet so as to have a thickness of about 6 μm, dried at a temperature of 90 ° C. or less, and used for polishing a ferromagnetic material such as a magnetic head of the present invention. Was manufactured.
【００４７】ここで、酸化鉄とアンモニウム鉄明礬との
混合重量費は１：１であった。Here, the mixing weight cost of iron oxide and ammonium iron alum was 1: 1.
【００４８】アンモニウム鉄明礬は有機溶媒には不溶で
あるが、水には可溶である。[0048] Ammonium iron alum is insoluble in organic solvents but soluble in water.
【００４９】この研磨シートを使用した磁気ヘッドの研
磨は、冷却液に水を使用し、実施例１と同様の方法で行
われた。The polishing of the magnetic head using the polishing sheet was performed in the same manner as in Example 1 using water as a cooling liquid.
【００５０】[0050]
【発明の効果】以上詳細に説明したように、本発明の研
磨シートを実施すると以下の効果を奏する。As described above in detail, the following effects can be obtained by implementing the polishing sheet of the present invention.
【００５１】本発明の研磨シートは、研磨材粒子と、可
溶性固体粒子と、バインダー接着剤とを混合したスラリ
ーを基板シートに塗布して成り、研磨時に研磨シートに
冷却液を吹きかけると、スラリーの研磨材粒子の周りの
可溶性固体粒子が溶解し、研磨材粒子が研磨シートから
分離することなく容易に動くことができるため、研磨材
粒子が被研磨物表面に鋭角に接触しても研磨材粒子が動
いて研磨材粒子と被研磨物表面との接触の角度が緩やか
なものになり、従来の研磨シートを使用することで生じ
ていたスクラッチを被研磨物表面に生じさせずに研磨で
き、研磨材粒子が完全に遊離したものではないことか
ら、被研磨物表面の研削力もよく、被研磨物表面に波形
の凹凸を生じることなく一様に研磨することができる。The polishing sheet of the present invention is formed by applying a slurry obtained by mixing abrasive particles, soluble solid particles, and a binder adhesive to a substrate sheet. Since the soluble solid particles around the abrasive particles dissolve and the abrasive particles can easily move without being separated from the abrasive sheet, the abrasive particles can be easily moved even when the abrasive particles come into contact with the surface of the object to be polished at an acute angle. Moves, the angle of contact between the abrasive particles and the surface of the object to be polished becomes gentle, and polishing can be performed without causing scratches on the surface of the object to be polished, which has been caused by using a conventional polishing sheet. Since the material particles are not completely separated, the grinding power on the surface of the object to be polished is good, and the surface of the object to be polished can be uniformly polished without generating corrugations.
【００５２】また、冷却液を研磨シートに吹きかけるこ
とから、研磨シートと被研磨物表面との接触部分で生じ
る摩擦熱を分散することができる。Further, since the cooling liquid is sprayed on the polishing sheet, frictional heat generated at a contact portion between the polishing sheet and the surface of the object to be polished can be dispersed.
【００５３】したがって、本発明の研磨シートを実施す
ると、粗研磨および仕上研磨の２段階の研磨工程を行わ
ず１段階の研磨工程で、被研磨物表面に波形の凹凸やス
クラッチを生じさせずに精密な研磨を実施できる、とい
う効果を奏する。Therefore, when the polishing sheet of the present invention is implemented, the two-stage polishing process of the rough polishing and the finish polishing is not performed, and the one-stage polishing process does not cause unevenness or scratches on the surface of the object to be polished. The effect is that precise polishing can be performed.
【図１】本発明の研磨シートを示す。FIG. 1 shows a polishing sheet of the present invention.
【図２】本発明の研磨シートによる研磨方法を示す。FIG. 2 shows a polishing method using the polishing sheet of the present invention.
１ ．．．基板シート ２ ．．．研磨材粒子 ３ ．．．可溶性固体粒子 ３′ ．．．溶解中の可溶性固体粒子 ４ ．．．バインダー接着剤 ５ ．．．スラリー ６ ．．．冷却液 ７ ．．．被研磨物 ８ ．．．研磨材粒子の回転方向 ９ ．．．研磨シートの走行方向 １０．．．研磨シート 1. . . Substrate sheet 2. . . Abrasive particles 3. . . Soluble solid particles 3 '. . . 3. soluble solid particles during dissolution; . . Binder adhesive 5. . . Slurry 6. . . Coolant 7. . . Polished object 8. . . 8. Rotation direction of abrasive particles . . 10. Running direction of abrasive sheet . . Polishing sheet
Claims (4)
シートにおいて、前記スラリーが、 研磨材粒子と、 冷却液を前記スラリーに吹き付けることにより溶解され
て、そのことにより前記研磨材粒子が動きやすくなって
被研磨物表面に弾力的に作用するようになる、可溶性固
体粒子と、 バインダー接着剤と、 を混合したものであることを特徴とする、研磨シート。1. A polishing sheet formed by applying a slurry to a substrate sheet, wherein the slurry is dissolved by spraying abrasive particles and a cooling liquid onto the slurry, whereby the abrasive particles move easily. A polishing sheet comprising a mixture of a soluble solid particle and a binder adhesive, which elastically acts on the surface of the object to be polished.
ム、尿素、サッカロース、アンモニウム鉄明礬、アンモ
ニウム・クロム鉄明礬、硫酸アルミニウム、または硫酸
亜鉛である、請求項１に記載の研磨シート。2. The polishing sheet according to claim 1, wherein the soluble solid particles are ammonium sulfate, urea, saccharose, ammonium iron alum, ammonium chromium alum, aluminum sulfate , or zinc sulfate.
の重量混合比が１：９から９：１の範囲にある、請求項
１記載の研磨シート。3. The polishing sheet according to claim 1, wherein a weight mixing ratio of the abrasive particles and the soluble solid particles is in a range of 1: 9 to 9: 1.
ーを基板シートに塗布する工程とから成る研磨シートの
製造方法において、前記スラリーを製造する前記工程
が、研磨材粒子とバインダー接着剤とを混合する工程
と、前記研磨材粒子と前記バインダー接着剤との混合物
に可溶性固体粒子を更に加えて混合する工程とから成
る、研磨シートの製造方法。4. A method for producing a polishing sheet, comprising: a step of producing a slurry; and a step of applying the slurry to a substrate sheet, wherein the step of producing the slurry comprises mixing abrasive particles and a binder adhesive. And a step of further adding soluble solid particles to a mixture of the abrasive particles and the binder adhesive and mixing.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6148752A JP2831274B2 (en) | 1994-06-08 | 1994-06-08 | Polishing sheet and method for producing the same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6148752A JP2831274B2 (en) | 1994-06-08 | 1994-06-08 | Polishing sheet and method for producing the same |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH07328933A JPH07328933A (en) | 1995-12-19 |
| JP2831274B2 true JP2831274B2 (en) | 1998-12-02 |
Family
ID=15459843
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6148752A Expired - Fee Related JP2831274B2 (en) | 1994-06-08 | 1994-06-08 | Polishing sheet and method for producing the same |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2831274B2 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100446248B1 (en) * | 2001-12-17 | 2004-08-30 | 최창호 | Polymeric Polishing Pad including Polishing Microparticles |
| CN116638452A (en) * | 2023-06-26 | 2023-08-25 | 湖北玉立砂带集团股份有限公司 | A kind of grinding tool and preparation method thereof |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS554552A (en) * | 1978-06-27 | 1980-01-14 | Seiko Instr & Electronics Ltd | Date feed mechanism of watch |
| JPH07223166A (en) * | 1994-02-10 | 1995-08-22 | Tokyo Jiki Insatsu Kk | Polishing film |
-
1994
- 1994-06-08 JP JP6148752A patent/JP2831274B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH07328933A (en) | 1995-12-19 |
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