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JP2849602B2 - Joining method of single crystal sapphire - Google Patents
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JP2849602B2 - Joining method of single crystal sapphire - Google Patents

Joining method of single crystal sapphire

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Publication number
JP2849602B2
JP2849602B2 JP25614989A JP25614989A JP2849602B2 JP 2849602 B2 JP2849602 B2 JP 2849602B2 JP 25614989 A JP25614989 A JP 25614989A JP 25614989 A JP25614989 A JP 25614989A JP 2849602 B2 JP2849602 B2 JP 2849602B2
Authority
JP
Japan
Prior art keywords
joining
single crystal
sapphire
crystal sapphire
bonding
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP25614989A
Other languages
Japanese (ja)
Other versions
JPH03115200A (en
Inventor
幹裕 梅原
淳一 川崎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Corp
Original Assignee
Kyocera Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyocera Corp filed Critical Kyocera Corp
Priority to JP25614989A priority Critical patent/JP2849602B2/en
Publication of JPH03115200A publication Critical patent/JPH03115200A/en
Application granted granted Critical
Publication of JP2849602B2 publication Critical patent/JP2849602B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は単結晶サファイアの接合方法に関するもので
ある。
Description: TECHNICAL FIELD The present invention relates to a method for bonding single crystal sapphire.

〔従来技術並びにその問題点〕[Conventional technology and its problems]

単結晶サファイアの接合に関しては特開昭59−233000
号に既に提案されており、この方法によれば、2個の単
結晶サファイアをその結晶面方位が1゜以内の角度で一
致するように配置し、そして、その端部を溶融して接合
する。
Regarding the joining of single crystal sapphire, see JP-A-59-233000.
According to this method, two single-crystal sapphires are arranged such that their crystal plane orientations coincide at an angle within 1 °, and their ends are fused and joined. .

しかしながら、上記接合方法によれば、溶融して接合
させるために該接合部の形状が崩れ、これにより、精密
な形状の接合体が出来ないという問題点がある。
However, according to the above-mentioned joining method, there is a problem that the shape of the joining portion is destroyed due to melting and joining, so that a joined body having a precise shape cannot be formed.

しかも、接合面を溶融させるに当たり、その接合面積
が大きくなった場合、その接合面全体に亘って均一に溶
融することはむずかしく、そのため、大面積に亘る接合
に適さないという問題点もある。
In addition, when the joining area is increased when the joining surface is melted, it is difficult to uniformly melt the entire joining surface, and thus there is a problem that the joining is not suitable for joining over a large area.

〔発明の目的〕[Object of the invention]

従って本発明は上記事情に鑑みて完成されたものであ
り、その目的は接合面付近の形状が崩れず、しかも、大
面積に亘る接合にも適した単結晶サファイアの接合方法
を提供するものである。
Accordingly, the present invention has been completed in view of the above circumstances, and an object of the present invention is to provide a method for joining single crystal sapphire which is suitable for joining over a large area without deforming the shape near the joining surface. is there.

〔問題点を解決するための手段〕 本発明に係る単結晶サファイアの接合方法は下記A工
程及びB工程から順次成ることを特徴とする。
[Means for Solving the Problems] The method for bonding single crystal sapphire according to the present invention is characterized by comprising the following steps A and B in order.

A:中心線平均粗さがRa500Å以下である接合面をもった
単結晶サファイア体の上記接合面同士を密接する。
A: The bonding surfaces of a single crystal sapphire body having a bonding surface having a center line average roughness of not more than Ra500 ° are in close contact with each other.

B:密接状態の単結晶サファイア体を真空炉に入れ、真空
中で加熱する。
B: A single crystal sapphire body in a close state is placed in a vacuum furnace and heated in a vacuum.

〔作用〕[Action]

上記接合方法である場合、溶融せずとも強固に接合で
き、しかも、その接合面を大面積化にもでき、これによ
り、精密な形状をもつ大型化した接合体ができる。
In the case of the above joining method, the joining can be made firmly without melting, and the joining surface can be made large, whereby a large joined body having a precise shape can be made.

〔実施例〕〔Example〕

以下、本発明を実施例により説明する。 Hereinafter, the present invention will be described with reference to examples.

本例においては、第1図に示す通り2枚の円板状単結
晶サファイア板1,2(直径50mm、厚み0.5mm)を用意し、
その両板の接合主面1a,2aを完全に重ね合わせ、後述す
るA工程及びB工程によって接合体を得る。尚、1b,2b
はそれぞれの非接合主面である。
In this example, as shown in FIG. 1, two disk-shaped single-crystal sapphire plates 1 and 2 (50 mm in diameter and 0.5 mm in thickness) were prepared.
The joining principal surfaces 1a and 2a of the two plates are completely overlapped, and a joined body is obtained by the steps A and B described later. In addition, 1b, 2b
Is the non-bonded main surface of each.

結晶の面方位 単結晶サファイアは六角晶形であり、第2図に示す面
方位によれば、結晶のC軸に対して直角方向に(0001)
面(一般にC面と呼ぶ)が存在し、このC軸に対して直
交する方向に且つ120゜中心角になるように回転対称方
向にa1軸、a2軸、a3軸があり、これら3種類の軸に垂直
に出来る3つの面は結晶学的に等価であり、その面が
(110)面(一般にA面と呼ぶ)である。また、C軸
に対してm軸方向(m軸方向とは六角柱の側面に垂直な
軸をいう)に57.6゜傾いたR軸に垂直な面が(102)
面(一般にR面と呼ぶ)である。
Crystal Orientation Single crystal sapphire is hexagonal, and according to the orientation shown in FIG. 2, it is (0001) perpendicular to the C axis of the crystal.
There is a surface (commonly referred to as C-plane), a 1-axis rotational symmetry direction so that and 120 ° central angle in a direction perpendicular to the C axis, a 2 axis, there is a 3-axis, these The three planes perpendicular to the three axes are crystallographically equivalent, and the plane is the (110) plane (generally called the A plane). Also, a plane perpendicular to the R axis inclined at 57.6 ° in the m axis direction (the m axis direction is an axis perpendicular to the side surface of the hexagonal prism) with respect to the C axis is (102).
Plane (generally called an R plane).

このように3種類の面方位があり、接合主面1a,2aを
所望の面方位にするためには既存の単結晶サファイアを
ダイヤモンドバイトを用いて面取りを行うことによって
も得られるが、本例においては下記のEFG法(Edge−def
ined Film−fed Growth法)により作製した。
As described above, there are three types of plane orientations. In order to obtain the desired plane orientations of the bonding principal surfaces 1a and 2a, it is also possible to obtain an existing single-crystal sapphire by chamfering using a diamond tool. In the following EFG method (Edge-def
ined Film-fed Growth method).

EFG法 サファイア板を製作するに当たって、その板表面が所
定の面方位になるように単結晶の育成を行う。
EFG method In producing a sapphire plate, a single crystal is grown so that the plate surface has a predetermined plane orientation.

即ち、高純度アルミナを不活性雰囲気中で溶融し、こ
の融液と接するように内部にスリットを備えたリボン状
サファイア単結晶育成モリブデンダイを位置させ、アル
ミナ融液を毛細管作用によりダイ上端部に上昇させ、所
定の面方位を有するサファイアシードをダイ上端部のア
ルミナ融液と接触させ、次いでシードを上方に引き上げ
て単結晶サファイアの育成を行う。これによって引き上
げられたサファイア板の一方の主面は所定の面方位を有
する。
That is, a high-purity alumina is melted in an inert atmosphere, and a ribbon-shaped sapphire single crystal growing molybdenum die having a slit therein is positioned so as to be in contact with the melt. The sapphire seed having a predetermined plane orientation is brought into contact with the alumina melt at the upper end of the die, and then the seed is pulled upward to grow single crystal sapphire. One main surface of the sapphire plate pulled up by this has a predetermined plane orientation.

次にA,B両工程を述べる。 Next, both steps A and B will be described.

A工程 このような所定通りの面方位を有するサファイア板1,
2を作製し、その接合を行うに当たり、A工程としてそ
の接合主面1a,2aを研磨し、その主面の中心線平均粗さR
aを500Å以下、望ましくは300Å以下に設定する必要が
ある。
Step A Sapphire plate 1 having such a predetermined plane orientation
In manufacturing and bonding, the main bonding surfaces 1a and 2a are polished as a step A, and the center line average roughness R of the main surface is obtained.
It is necessary to set a to 500 mm or less, preferably 300 mm or less.

かかる研磨には単結晶を研磨する従来周知の手段を採
用すればよい。本例においては先ずラッピング油に溶か
したダイヤモンドパウダによりラッピングを行い、次い
でクロスによりポリシングを行い、かくして上記所定通
りの中心線平均粗さRaが得られた。
Conventionally known means for polishing a single crystal may be employed for such polishing. In this example, lapping was first performed using diamond powder dissolved in lapping oil, and then polishing was performed using a cloth. Thus, the center line average roughness Ra as described above was obtained.

一般的には上記研磨後、その接合主面1a,2aは有機物
やゴミなどにより汚染される。そのため、洗剤やイソプ
ロピルアルコールなどにより洗浄を行う。
Generally, after the above-mentioned polishing, the joining main surfaces 1a and 2a are contaminated by organic substances and dust. Therefore, cleaning is performed with a detergent, isopropyl alcohol, or the like.

然る後、すみやかに両サファイア板1,2を重ね合わせ
る。この重ね合わせは単に両接合主面1a,2aが全面に亘
って密接しているにすぎず、適当な力を加えれば容易に
離れる。従って、上記密接体を次のB工程を行うに際
し、真空アニール炉の内部所定位置に配置するとともに
非接合主面1b,2b側より若干の押圧力(例えばサファイ
ア板の単位面積当たり約10〜50g/cm2)を加える。これ
により、上記密接状態を維持せしめる。
After that, both sapphire plates 1 and 2 are immediately superimposed. In this superposition, the two joining main surfaces 1a and 2a are merely in close contact over the entire surface, and are easily separated by applying an appropriate force. Therefore, in performing the next step B, the intimate contact body is placed at a predetermined position inside the vacuum annealing furnace and slightly pressed from the non-bonding main surfaces 1b and 2b (for example, about 10 to 50 g per unit area of the sapphire plate). / cm 2 ). Thereby, the close contact state is maintained.

B工程 B工程によれば、例えば誘導加熱方式を備えた真空ア
ニール炉を用いて、脱気し、真空度を著しく高める。例
えば本発明者等の実験においては真空度を1×10-5Torr
以下、好適には1×10-6Torr以下にすればよいと考える
が、必ずしも上記数値範囲内に限定されるものではな
く、その真空度を更に一層高めてもよい。
Step B According to the step B, for example, a vacuum annealing furnace equipped with an induction heating method is used to degas and significantly increase the degree of vacuum. For example, in experiments conducted by the present inventors, the degree of vacuum was set to 1 × 10 −5 Torr.
Hereinafter, it is considered that the pressure is preferably set to 1 × 10 −6 Torr or less. However, the pressure is not necessarily limited to the above numerical range, and the degree of vacuum may be further increased.

またアニール温度はサファイア自体が溶融しない範囲
の温度内で適宜決められるが、本発明者等が繰り返し行
った実験によれば、1000℃以上、好適には1500℃以上あ
ればよい。
The annealing temperature is appropriately determined within a range in which sapphire itself does not melt. According to experiments repeatedly performed by the present inventors, the annealing temperature may be 1000 ° C. or higher, preferably 1500 ° C. or higher.

かかるB工程が終了すれば、徐々にゆっくりと室温に
まで下げればよい。
When the step B is completed, the temperature may be gradually lowered to room temperature.

接合主面1a,2aの間の面方位のずれ角度 例えば接合主面1a,2aがともにC面である場合、その
両者間に面方位のずれ角度が存在する場合がある。
Shift angle of plane orientation between joining main surfaces 1a and 2a For example, when both joining main surfaces 1a and 2a are C-planes, there may be a shift angle of plane orientation between the two.

即ち、第3図に示す接合状態によれば、両サファイア
板1,2のそれぞれのC軸間のずれ角度θが上記面方位の
ずれ角度に対応する。
That is, according to the joining state shown in FIG. 3, the deviation angle θ between the respective C axes of the sapphire plates 1 and 2 corresponds to the deviation angle of the plane orientation.

次に本発明者等が行った実施例を述べる。 Next, examples performed by the present inventors will be described.

(例1) 接合主面1a,2aがともにR面であり、且つ中心線平均
粗さが20Åであるように研磨し、洗浄後、すみやかに両
サファイア板1,2を加圧しながら重ね合わせた。この場
合、両者の接合主面1a,2a間の面方位のずれ角度を1゜
以内に設定して重ね合わせた。
(Example 1) Polishing was performed so that the joining principal surfaces 1a and 2a were both R surfaces and the center line average roughness was 20 °, and after washing, the two sapphire plates 1 and 2 were immediately superimposed while being pressed. . In this case, the superposition was performed with the misalignment angle of the plane orientation between the two joining principal surfaces 1a and 2a set within 1 °.

次いで真空度を3〜4×10-7Torr、アニール温度を16
80℃に設定し、4時間真空アニールを行い、接合体を得
た。
Next, the degree of vacuum is set to 3 to 4 × 10 −7 Torr and the annealing temperature is set to 16
The temperature was set to 80 ° C., and vacuum annealing was performed for 4 hours to obtain a joined body.

かくして得られた接合体を1辺10mmの正方形状に切断
し、第4図又は第5図に示す通りに接合強度を測定し
た。
The joined body thus obtained was cut into a square having a side of 10 mm, and the joining strength was measured as shown in FIG. 4 or FIG.

第4図においては、3は上記正方形状体であり、その
両主面上をニッケル金属によりメタライジングし、更に
両主面に対して3mmφの金属製丸棒4をロー付し、そし
て、両者の丸棒4を矢印×方向に引っ張る。
In FIG. 4, reference numeral 3 denotes the above-mentioned square body, on both main surfaces thereof metallized with nickel metal, and further, a metal round bar 4 of 3 mmφ is brazed to both main surfaces. Is pulled in the direction indicated by the arrow X.

このような引っ張り強度試験を行ったところ、先にメ
タライズ部より剥がれた。
When such a tensile strength test was performed, it was peeled off from the metallized portion first.

第5図に示す測定方法よれば、上記正方形状体3の両
主面上をニッケル金属によりメタライジングし、そし
て、短辺が10mmである長方形状のSUS製板状体5を2個
用意し、上記両主面の全面に亘ってロー付し、両者の板
状体5を矢印Y方向に引っ張る。
According to the measuring method shown in FIG. 5, both main surfaces of the square body 3 are metallized with nickel metal, and two rectangular SUS plate-like bodies 5 each having a short side of 10 mm are prepared. Then, brazing is applied over the entire surfaces of the two main surfaces, and both plate-like members 5 are pulled in the arrow Y direction.

このような引っ張り強度試験を行っても先にメタライ
ズ部より剥がれた。
Even when such a tensile strength test was performed, it was peeled off from the metallized portion first.

(例2) 本例においては、(例1)のなかで接合主面1a,2aの
それぞれの面方位を第1表に示す通りに設定し、しか
も、その中心線平均粗さも設定し、その他は(例1)と
同じ条件とし、これによって6種類の接合体を作製し
た。尚、接合体イ、ロ、ヘについては両者の接合主面1
a,2a間の面方位のずれ角度を1゜以内に設定して重ね合
わせた。
(Example 2) In this example, in (Example 1), the respective plane orientations of the joining main surfaces 1a and 2a are set as shown in Table 1, and the center line average roughness is also set. Were set to the same conditions as in (Example 1), whereby six types of joined bodies were produced. For the joints A, B, and F, the main joining surface 1 of both
The superposition was performed by setting the deviation angle of the plane orientation between a and 2a within 1 °.

かくして得られた各接合体に対して(例1)と同様に
2通りの引っ張り接合強度試験を行ったところ、すべて
先にメタライズ部より剥がれた。
When each of the thus obtained joined bodies was subjected to two types of tensile joining strength tests in the same manner as in (Example 1), all of the joined bodies were peeled off from the metallized portion first.

本発明者等は接合主面の面方位がR面であり、その主
面に対してラッピング及びポリシングの各々の研磨処理
を行わず、中心線平均粗さを2000Åにまで大きくしたサ
ファイア板を2個用意し、両者の接合主面間の面方位の
すれ角度を1゜以内に設定し、その他は本実施例と同じ
条件に設定し、接合体の作製を試みたが、全く接合しな
かった。
The present inventors have proposed a sapphire plate in which the bonding principal surface has an R-plane orientation, and the lapping and polishing processes are not performed on the principal surface, and the center line average roughness is increased to 2000 °. Individual pieces were prepared, the angle of the plane orientation between the two joining principal surfaces was set to within 1 °, and the other conditions were set to the same conditions as in this example. An attempt was made to produce a joined body, but no joining was performed. .

(例3) 次に本発明者等は(例1)の本発明接合体並びに接合
体イ、ロに対して、それぞれ接合主面1a,2a間の面方位
のずれ角度を5゜,15゜,40゜,70゜もしくは90゜に設定
し、重ね合わせた。
(Example 3) Next, with respect to the joined body of the present invention and the joined bodies A and B of (Example 1), the present inventors set the misalignment angle of the plane orientation between the joining principal surfaces 1a and 2a to 5 ° and 15 °, respectively. , 40 ゜, 70 ゜ or 90 ゜ were set and superimposed.

かくして得られた15種類の接合体に対して(例1)と
同様に2通りの引っ張り接合強度試験を行ったところ、
すべて先にメタライズ部より剥がれた。
The 15 types of joined bodies thus obtained were subjected to two types of tensile joint strength tests in the same manner as in (Example 1).
All peeled off from the metallized part first.

〔発明の効果〕〔The invention's effect〕

以上の通り、本発明の接合方法によれば、単結晶サフ
ァイアの一部を溶融しなくとも、両者を強固に接合で
き、これによって複雑且つ精密な形状の接合体を提供す
ることができた。
As described above, according to the joining method of the present invention, the single crystal sapphire can be firmly joined without melting part of the single crystal sapphire, thereby providing a joined body having a complicated and precise shape.

また、本発明によれば、接合面を大面積化できるため
に所望通りの形状が得られる高信頼性の接合体を提供す
ることができた。
Further, according to the present invention, it is possible to provide a high-reliability bonded body in which a desired shape can be obtained because the bonding surface can be enlarged.

【図面の簡単な説明】[Brief description of the drawings]

第1図は実施例の接合方法を表す説明図、第2図は単結
晶サファイアの結晶面方位を表す説明図、第3図は接合
体の部分断面図、第4図及び第5図は引っ張り接合強度
試験の方法を表す断面図である。 1,2……サファイア板 1a,2a……接合主面
FIG. 1 is an explanatory view showing a bonding method of an embodiment, FIG. 2 is an explanatory view showing a crystal plane orientation of single crystal sapphire, FIG. 3 is a partial cross-sectional view of a bonded body, and FIGS. It is sectional drawing showing the method of a joining strength test. 1,2 …… Sapphire plate 1a, 2a …… Main surface of joining

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】下記A工程及びB工程から順次成ることを
特徴とする単結晶サファイアの接合方法。 A:中心線平均粗さがRa500Å以下である接合面をもった
単結晶サファイア体の上記接合面同士を密接する。 B:密接状態の単結晶サファイア体を真空炉に入れ、真空
中で加熱する。
1. A method for bonding single crystal sapphire, comprising the following steps A and B: A: The bonding surfaces of a single crystal sapphire body having a bonding surface having a center line average roughness of not more than Ra500 ° are in close contact with each other. B: A single crystal sapphire body in a close state is placed in a vacuum furnace and heated in a vacuum.
JP25614989A 1989-09-29 1989-09-29 Joining method of single crystal sapphire Expired - Lifetime JP2849602B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP25614989A JP2849602B2 (en) 1989-09-29 1989-09-29 Joining method of single crystal sapphire

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP25614989A JP2849602B2 (en) 1989-09-29 1989-09-29 Joining method of single crystal sapphire

Publications (2)

Publication Number Publication Date
JPH03115200A JPH03115200A (en) 1991-05-16
JP2849602B2 true JP2849602B2 (en) 1999-01-20

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Country Status (1)

Country Link
JP (1) JP2849602B2 (en)

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US10324496B2 (en) 2013-12-11 2019-06-18 Apple Inc. Cover glass arrangement for an electronic device
US10406634B2 (en) 2015-07-01 2019-09-10 Apple Inc. Enhancing strength in laser cutting of ceramic components

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