JP2864427B2 - Highly oriented organic thin film - Google Patents
Highly oriented organic thin filmInfo
- Publication number
- JP2864427B2 JP2864427B2 JP13533790A JP13533790A JP2864427B2 JP 2864427 B2 JP2864427 B2 JP 2864427B2 JP 13533790 A JP13533790 A JP 13533790A JP 13533790 A JP13533790 A JP 13533790A JP 2864427 B2 JP2864427 B2 JP 2864427B2
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- doping
- organic thin
- torr
- polycyclic aromatic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Compositions Of Macromolecular Compounds (AREA)
- Non-Insulated Conductors (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
Description
【発明の詳細な説明】 〔技術分野〕 本発明は配向性有機薄膜に関する。Description: TECHNICAL FIELD The present invention relates to an oriented organic thin film.
本発明の配向性有機薄膜は電子材料およびオプトエレ
クトロニクス材料として用いることができる。The oriented organic thin film of the present invention can be used as an electronic material and an optoelectronic material.
現在、薄膜有機材料は導電性材料、絶縁材料、非線形
光学材料、光記録材料、表示材料、レジスト材料などの
分野への応用が盛んに研究されている。上記の分野に有
機薄膜を応用するためには、その分子配向性に優れるこ
とが必要である。At present, application of thin film organic materials to fields such as conductive materials, insulating materials, nonlinear optical materials, optical recording materials, display materials, and resist materials is being actively studied. In order to apply an organic thin film to the above fields, it is necessary to have excellent molecular orientation.
これまで、LB法、真空蒸着法、MBE法、プラズマ重合
法、電解重合法、塗布法などによって有機薄膜が作製さ
れている。しかし、これらの方法で得られた有機薄膜を
前記の応用分野に応用するにはその分子配向性が充分で
ない。特に電荷移動錯体系の導電性材料ではその導電性
に強い結晶軸異方性を有するため、高導電性材料や異方
性導電性材料として用いるためには、高い分子配向性が
要求される。また、非線形光学材料として用いる場合、
その分子配向性が高いほどその非線形特性が優れること
が知られている。このように、機能性有機薄材料に応用
するためには、その分子配向性の向上が要求されてい
る。Until now, organic thin films have been prepared by LB method, vacuum deposition method, MBE method, plasma polymerization method, electrolytic polymerization method, coating method, and the like. However, the molecular orientation of the organic thin films obtained by these methods is not sufficient for application to the above-mentioned application fields. In particular, since a charge-transfer complex-based conductive material has a crystal axis anisotropy that is strong in its conductivity, a high molecular orientation is required for use as a highly conductive material or an anisotropic conductive material. When used as a nonlinear optical material,
It is known that the higher the molecular orientation, the better the nonlinear characteristics. As described above, in order to apply it to a functional organic thin material, it is required to improve its molecular orientation.
〔課題を解決するための手段〕 このような問題点に鑑み、本発明者らは分子配向性に
優れた有機薄膜を得るべく鋭意検討を重ねた結果、本発
明の配向性有機薄膜を得るに至った。[Means for Solving the Problems] In view of such problems, the present inventors have conducted intensive studies to obtain an organic thin film having excellent molecular orientation, and as a result, have obtained an oriented organic thin film of the present invention. Reached.
すなわち本発明は、縮合したベンゼン環の数が3以上
13以下である縮合多環芳香族化合物の有機薄膜に、電子
受容性分子のドーピングおよびそれに続く脱ドーピング
を施した高配向性有機薄膜に関するものである。That is, in the present invention, the number of fused benzene rings is 3 or more.
The present invention relates to a highly oriented organic thin film obtained by subjecting an organic thin film of a condensed polycyclic aromatic compound having a molecular weight of 13 or less to electron doping and subsequent undoping.
本発明で用いる縮合多環芳香族化合物について説明す
る。本発明で用いる縮合多環芳香族化合物はその縮合し
たベンゼンユニット数が3以上13以下の縮合多環芳香族
化合物である。次にその一例を示す。縮合多環芳香族化
合物としてアントラセン(n=3)、ナフタセン(n=
4)、ペンタセン(n=5)、ヘキサセン(n=6)、
ヘプタセン(n=7),フェナントレン(n=3)、ア
セナフテン(n=3)、ピレン(n=4)、クリセン
(n=4)、ペリレン(n=5)、コロネン(n=
7)、テリレン(n=8)、オバレン(n=10)、クオ
テリレン(n=11)、サーカムアントラセン(n=13)
およびこれらの誘導体などの炭化水素化合物、トリフェ
ノジオキサジン(n=5)、トリフェノジチアジン(n
=5)、トリフェノジセレナジン(n=5)、ヘキサセ
ン−6,15−キノン(n=6)などの炭素の一部をN、
S、O、カルボニルなどに置換した誘導体などを挙げる
ことができる。The fused polycyclic aromatic compound used in the present invention will be described. The condensed polycyclic aromatic compound used in the present invention is a condensed polycyclic aromatic compound having 3 to 13 condensed benzene units. Next, an example is shown. As condensed polycyclic aromatic compounds, anthracene (n = 3), naphthacene (n =
4), pentacene (n = 5), hexacene (n = 6),
Heptacene (n = 7), phenanthrene (n = 3), acenaphthene (n = 3), pyrene (n = 4), chrysene (n = 4), perylene (n = 5), coronene (n = 3)
7), Terylene (n = 8), Ovalene (n = 10), Quarterylene (n = 11), Circum anthracene (n = 13)
And hydrocarbon compounds such as derivatives thereof, trifenodioxazine (n = 5), trifenodithiazine (n
= 5), triphenodiselenazine (n = 5), hexacene-6,15-quinone (n = 6), etc.
Derivatives substituted with S, O, carbonyl and the like can be mentioned.
次に本発明で使用する電子受容性分子について説明す
る。電子受容性分子としてCl2,Br2,ICl,ICl3,IBr,IFな
どのハロゲン、PF5,AsF5,SbF5,BF3,BCl3,BBr3,SO3など
のルイス酸、HF,HCl,HNO3,H2SO4,HClO4,FSO3H,ClSO3H,C
F3SO3H,酢酸、ぎ酸などの有機酸、アミノ酸などのプロ
トン酸、FeCl3,FeOCl,TiCl4,ZrCl4,HfCl4,NbF5,NbCl5,T
aCl5,MoCl5,WF6,WCl6,UF6,LnCl3,(Ln=La,Ce,Pr,Nd,Sm
などのランタノイド)などの遷移金属化合物、Cl-,B
r-、I-,ClO4 -,PF6 -,AsF5 -,SbF6 -,BF4,スルホン酸アニオ
ンなどの電解質アニオンなどを用いることができる。Next, the electron accepting molecule used in the present invention will be described. As electron-accepting molecules, halogens such as Cl 2 , Br 2 , ICl, ICl 3 , IBr, IF, Lewis acids such as PF 5 , AsF 5 , SbF 5 , BF 3 , BCl 3 , BBr 3 , SO 3 , HF, HCl, HNO 3 , H 2 SO 4 , HClO 4 , FSO 3 H, ClSO 3 H, C
F 3 SO 3 H, organic acids such as acetic acid and formic acid, protonic acids such as amino acids, FeCl 3 , FeOCl, TiCl 4 , ZrCl 4 , HfCl 4 , NbF 5 , NbCl 5 , T
aCl 5 , MoCl 5 , WF 6 , WCl 6 , UF 6 , LnCl 3 , (Ln = La, Ce, Pr, Nd, Sm
Transition metal compounds such as lanthanide) such as, Cl -, B
Electrolyte anions such as r − , I − , ClO 4 − , PF 6 − , AsF 5 − , SbF 6 − , BF 4 , and sulfonate anion can be used.
次に本発明の高配向性有機薄膜の作製法について説明
する。本発明の高配向性有機薄膜は前記の縮合多環芳香
族化合物薄膜作製後に該薄膜に電子受容性分子をドーピ
ングした後、電子受容性分子の脱ドーピング処理を施す
ことによって高配向性有機薄膜を作製することができ
る。Next, a method for producing the highly oriented organic thin film of the present invention will be described. The highly oriented organic thin film of the present invention is a highly oriented organic thin film obtained by doping an electron accepting molecule into the thin film after preparing the condensed polycyclic aromatic compound thin film and then performing dedoping of the electron accepting molecule. Can be made.
本発明の高配向性有機薄膜の作製についてその一例を
示す。本発明の高配向性有機薄膜の作製法として、あら
かじめ作製した縮合多環芳香族化合物の薄膜に電子受容
性分子のドーピング処理、脱ドーピング処理を施し高配
向性有機薄膜を得る方法、縮合多環芳香族化合物・電子
受容性分子薄膜作製後に脱ドーピング処理を施すことに
より高配向性有機薄膜を得る方法を挙げることができ
る。An example of production of a highly oriented organic thin film of the present invention will be described. As a method for producing a highly oriented organic thin film of the present invention, a method of obtaining a highly oriented organic thin film by subjecting a thin film of a condensed polycyclic aromatic compound prepared in advance to a doping treatment and an undoping treatment of an electron accepting molecule, A method of obtaining a highly oriented organic thin film by performing a dedoping treatment after the preparation of the aromatic compound / electron accepting molecular thin film can be given.
前者の高配向性有機薄膜の作製法について説明する。
まず前記の縮合多環芳香族化合物の薄膜をたとえば真空
蒸着法、MBE法、CVD法、スパッタリングなどの薄膜形成
法によって作製する。得られた膜は基板上の薄膜として
得られる。この際、基板材料として石英ガラス、フッ化
カルシウム、サファイヤ、アルミナなどのセラミック材
料、シリコン、ゲルマニウム、ITO,GaAs,InSb,GaNなど
の半導体材料、金、アルミニウム、銀、鉄、ステンレス
などの金属材料、Y−Ba−Cu−O系、Bi−Sr−Ca−Cu−
O系、Nd系などの超伝導材料、ポリエステル、ポリスチ
レン、ポリエチレン、ポリアセチレン、ポリピロールな
どの有機物材料などを用いることができる。また、基板
は使用する目的に応じて種々の形態が使用可能である。The former method for producing a highly oriented organic thin film will be described.
First, a thin film of the above-mentioned condensed polycyclic aromatic compound is prepared by a thin film forming method such as a vacuum evaporation method, an MBE method, a CVD method, and sputtering. The resulting film is obtained as a thin film on a substrate. At this time, ceramic materials such as quartz glass, calcium fluoride, sapphire, and alumina; semiconductor materials such as silicon, germanium, ITO, GaAs, InSb, and GaN; and metal materials such as gold, aluminum, silver, iron, and stainless steel , Y-Ba-Cu-O, Bi-Sr-Ca-Cu-
Superconductive materials such as O-based and Nd-based materials, organic materials such as polyester, polystyrene, polyethylene, polyacetylene, and polypyrrole can be used. Various forms of the substrate can be used depending on the purpose of use.
前記の縮合芳香環化合物の薄膜形成法として、たとえ
ば真空蒸着法を用いた場合は圧力10-2Torr以下の雰囲気
で前記の縮合多環芳香族化合物を加熱蒸着する。この雰
囲気の圧力は低い方が配向性薄膜を得るために望ましく
好ましくは10-4Torr以下である。またMBE法を用いる場
合は縮合多環芳香族の蒸着源としてクヌーセンセル、電
子線銃加熱、ガスセルのいずれも使用可能であり、通常
の成膜法によって薄膜を得ることができる。さらにCVD
法の場合は真空下またはキャリアーガス存在下で縮合多
環芳香族の蒸気を基板上に供給することによって薄膜が
得られる。また、スパッタリングの場合は縮合多環芳香
族化合物のターゲットを用いてアルゴンスパッタを行い
基板上に薄膜を形成する。このようにして縮合多環芳香
族化合物薄膜が得られるが前記の方法に限定されない。As a method for forming a thin film of the condensed aromatic ring compound, for example, when a vacuum evaporation method is used, the condensed polycyclic aromatic compound is heated and vapor-deposited in an atmosphere at a pressure of 10 −2 Torr or less. The lower the pressure of this atmosphere is, desirably 10 -4 Torr or less, in order to obtain an oriented thin film. When the MBE method is used, a Knudsen cell, an electron gun heating, or a gas cell can be used as a condensation polycyclic aromatic vapor deposition source, and a thin film can be obtained by an ordinary film forming method. Further CVD
In the case of the method, a thin film is obtained by supplying a condensed polycyclic aromatic vapor onto a substrate under vacuum or in the presence of a carrier gas. In the case of sputtering, a thin film is formed on a substrate by performing argon sputtering using a condensed polycyclic aromatic compound target. In this way, a condensed polycyclic aromatic compound thin film can be obtained, but is not limited to the above method.
次いで、得られた薄膜に電子受容性分子をドーピング
した後脱ドーピングすることによって配向性薄膜とする
ことができる。このドーピングの方法としてガス状分子
(ドーパント)を用いた気相ドーピング、ドーパント溶
液または液状ドーパント中でドーピングする液相ドーピ
ング、固体状のドーパントを薄膜に接触させて拡散させ
る固相ドーピングのいずれも使用可能である。また必要
があれば電解することによりドーピングの効率を向上さ
せることもできる。Next, the obtained thin film is doped with electron-accepting molecules and then undoped to obtain an oriented thin film. As the doping method, any of gas phase doping using gaseous molecules (dopant), liquid phase doping in a dopant solution or liquid dopant, and solid phase doping in which a solid dopant is brought into contact with a thin film and diffused is used. It is possible. If necessary, the efficiency of doping can be improved by electrolysis.
次に、ドーピング処理した薄膜は脱ドーピングを施す
ことによって高配向性有機薄膜を得ることができる。こ
の脱ドーピング方法についてその一例を示す。ドーピン
グプロセスにおいて蒸気圧の高いドーパント分子がドー
ピングされた薄膜は高真空下で処理することによりドー
パント分子を薄膜から脱ドーピングさせることができ
る。この際、必要があれば加熱を行い脱ドーピングを加
速することができる。ドーパントが液相抽出できる薄膜
では、ドーパントを溶解できる溶媒や溶液中に浸漬して
拡散除去することによって脱ドーピングすることができ
る。必要があれば、薄膜に電解ドーパントの時と逆の電
界を印加して脱ドーピングを加速することもできる。上
記のようにして脱ドーピングを行うが上記に限定されな
い。Next, a highly oriented organic thin film can be obtained by subjecting the doped thin film to undoping. An example of this dedoping method will be described. In the doping process, a thin film doped with a dopant molecule having a high vapor pressure can be treated under a high vacuum to undope the dopant molecule from the thin film. At this time, if necessary, heating can be performed to accelerate dedoping. In a thin film from which a dopant can be extracted in a liquid phase, undoping can be performed by immersing in a solvent or a solution capable of dissolving the dopant to diffuse and remove the dopant. If necessary, an electric field opposite to that of the electrolytic dopant may be applied to the thin film to accelerate dedoping. Dedoping is performed as described above, but is not limited thereto.
次に後者の方法、すなわち縮合多環芳香族化合物−電
子受容性分子薄膜を作製後に脱ドーピング処理を行い高
配向性有機薄膜を得る方法について説明する。Next, the latter method, that is, a method of producing a condensed polycyclic aromatic compound-electron accepting molecular thin film and then performing a dedoping treatment to obtain a highly oriented organic thin film will be described.
縮合多環芳香族化合物−電子受容性分子薄膜の作製法
についてその一例を示す。前記の薄膜作製法である真空
蒸着法、MBE法を用いて縮合多環芳香族化合物と酸化性
分子をそれぞれ蒸着源から基板上に積層して薄膜を作製
する。得られた薄膜はすでに電子受容性分子がドーピン
グされているため、この膜を脱ドーピング処理すること
によって配向性有機薄膜が作製できる。脱ドーピングの
方法は前者の方法と同様にして行なうことができる。An example of a method for producing a condensed polycyclic aromatic compound-electron accepting molecular thin film will be described. A thin film is prepared by laminating a condensed polycyclic aromatic compound and an oxidizing molecule on a substrate from a vapor deposition source, respectively, using the above-described thin film preparation methods such as vacuum deposition and MBE. Since the obtained thin film is already doped with electron-accepting molecules, an oriented organic thin film can be prepared by dedoping this film. The method of undoping can be performed in the same manner as the former method.
また、必要があればドーピングと脱ドーピングの工程
を繰り返し行い配向性を高めることもできる。If necessary, doping and undoping steps can be repeated to enhance the orientation.
脱ドーピング後に得られた薄膜はドーピングを行う前
の薄膜に比べてその配向性が向上する。薄膜の配向性は
通常のX線回折法、電子線回折法などの回折法によって
評価することができる。たとえば、X線回折法では有機
薄膜の高配向性を示す指標は、その薄膜の(OOn)面
(nは1以上の整数)の次数nの増加や(OOn)面以外
のサブピークの減少・消失である。また場合によっては
(OOn)回折面の回折強度増加が認められる。これらの
ことから、ドーピング・脱ドーピングによって薄膜の配
向性の向上を評価することができる。また、X線回折パ
ターンの(OO1)面の層間距離に相当する格子定数から
薄膜中で縮合多環芳香族化合物がその長軸を基板面に垂
直または水平のいずれかの方向に配向しているかを推定
することができる。通常、縮合多環芳香族化合物薄膜は
その分子の長軸が基板面に垂直方向に配向しやすい傾向
にある。我々はこの薄膜にドーピング・脱ドーピングを
行うことによってより高配向性となることを見い出し
た。なお、この配向性向上の原因は明かでないがドーピ
ングによって縮合多環芳香族化合物分子相中に電子受容
性分子のドーパントが進入する際に何らかの相互作用に
よって縮合多環芳香族分子の配列を揃えるためと考えら
れる。脱ドーピング後のドーパント含量は膜厚、ドーパ
ント分子種、縮合多環芳香族化合物の分子種、脱ドーピ
ング方法などによって異なるため特に限定されない。ま
た、利用する用途によってドーパントの含量が許される
場合には脱ドーピングの途中過程の膜で用いることがで
きる。The orientation of the thin film obtained after the undoping is improved as compared with the thin film before the doping. The orientation of the thin film can be evaluated by ordinary diffraction methods such as X-ray diffraction and electron diffraction. For example, in the X-ray diffraction method, an index indicating the high orientation of an organic thin film is an increase in the order n of the (OOn) plane (n is an integer of 1 or more) of the thin film and a decrease or disappearance of a subpeak other than the (OOn) plane. It is. In some cases, an increase in the diffraction intensity of the (OOn) diffraction plane is observed. From these facts, it is possible to evaluate the improvement of the orientation of the thin film by doping / undoping. Also, based on the lattice constant corresponding to the interlayer distance of the (OO1) plane of the X-ray diffraction pattern, whether the major axis of the condensed polycyclic aromatic compound is oriented in a direction perpendicular or horizontal to the substrate surface in the thin film Can be estimated. In general, the condensed polycyclic aromatic compound thin film tends to have its major axis easily oriented in a direction perpendicular to the substrate surface. We have found that doping and undoping of this thin film makes it more highly oriented. Although the cause of the improvement in the orientation is not clear, the doping of the electron-accepting molecules into the molecular phase of the condensed polycyclic aromatic compound by doping causes the arrangement of the condensed polycyclic aromatic molecules to be arranged by some kind of interaction. it is conceivable that. The dopant content after dedoping is not particularly limited because it differs depending on the film thickness, the dopant molecular species, the molecular species of the condensed polycyclic aromatic compound, the dedoping method, and the like. Further, when the content of the dopant is permitted depending on the application to be used, it can be used in a film in the course of undoping.
本発明の薄膜の膜厚は利用する目的により変化するた
めに限定できないが、50Åからミクロンオーダーまで作
製が可能である。The thickness of the thin film of the present invention cannot be limited because it varies depending on the purpose of use, but it can be manufactured from 50 ° to the order of microns.
必要があれば、本発明の薄膜上に保護層や電極、他の
材料の層を設けることもできる。また本発明の薄膜を応
用した機能材料とするために、本発明の薄膜と他の材料
の薄膜の多層の積層膜として用いることもできる。If necessary, a protective layer, an electrode, and a layer of another material can be provided on the thin film of the present invention. Further, in order to obtain a functional material to which the thin film of the present invention is applied, the thin film of the present invention and a thin film of another material may be used as a multilayer laminated film.
上記で得られた高配向性有機薄膜は、その分子配向性
に優れ、かつ大気中に長時間放置しても安定であるた
め、電子材料としてエレクトロニクスやオプトエレクト
ロニクスなどの種々の分野に応用でき工業上有益であ
る。The highly oriented organic thin film obtained above has excellent molecular orientation and is stable even when left in the air for a long time, so it can be applied to various fields such as electronics and optoelectronics as an electronic material. Is beneficial.
以下実施例により本発明をさらに詳細に説明する。 Hereinafter, the present invention will be described in more detail by way of examples.
実施例1 ペンタセンを石英ガラス基板上に2000Åの膜厚で真空
蒸着してペンタセンの薄膜を作製した。この作製条件と
して基板温度は室温、圧力10-5Torrの雰囲気下で、蒸着
源はタングステンボートの抵抗加熱により行った。得ら
れたペンタセン薄膜の構造をX線回折法により測定した
ところ格子定数15Åの(OOn)面(n=1〜3)ととも
に格子定数14Åの(OOn)面(n=1〜3)が認められ
た。次に得られた薄膜を沃素ガス雰囲気(室温、2Torr
の圧力下)中でドーピングを行った後、該薄膜を50℃の
温度で圧力1x10-5Torrの雰囲気下に10時間保持して脱ド
ーピングを行った。Example 1 Pentacene was vacuum-deposited on a quartz glass substrate to a thickness of 2000 ° to form a pentacene thin film. As the manufacturing conditions, the substrate temperature was room temperature and the pressure was 10 −5 Torr, and the deposition source was a resistance heating of a tungsten boat. When the structure of the obtained pentacene thin film was measured by an X-ray diffraction method, an (OOn) plane having a lattice constant of 15 ° (n = 1 to 3) and a (OOn) plane having a lattice constant of 14 ° (n = 1 to 3) were recognized. Was. Next, the obtained thin film is placed in an iodine gas atmosphere (room temperature, 2 Torr).
After the doping was performed, the thin film was dedoped by keeping the thin film at a temperature of 50 ° C. under an atmosphere of a pressure of 1 × 10 −5 Torr for 10 hours.
得られた薄膜の構造をX線回折法により測定したとこ
ろ格子定数15Åの(OOn)面(n=1〜4)が認めら
れ、かつ格子定数14Åの回折面は消失した。When the structure of the obtained thin film was measured by an X-ray diffraction method, an (OOn) plane with a lattice constant of 15 ° (n = 1 to 4) was recognized, and the diffraction plane with a lattice constant of 14 ° disappeared.
実施例2 実施例1と同様にしてポリエステル基板に1000Åの膜
厚でペンタセン薄膜を作製した。得られた薄膜の構造を
X線回折法により測定したところ28Åと14〜15Åの層間
距離の回折面が見られた。Example 2 A pentacene thin film having a thickness of 1000 ° was formed on a polyester substrate in the same manner as in Example 1. When the structure of the obtained thin film was measured by the X-ray diffraction method, a diffraction plane having an interlayer distance of 28 ° and an interlayer distance of 14 to 15 ° was observed.
このペンタセン薄膜を、10mTorrのSO3ガス雰囲気下に
置くことによりドーピングして配向性導電性薄膜を得
た。ついで該薄膜を圧力10-5Torrの雰囲気中で90℃に保
持して脱ドーピングを行った。This pentacene thin film was doped under a 10 mTorr SO 3 gas atmosphere to obtain an oriented conductive thin film. Subsequently, the thin film was dedoped while being kept at 90 ° C. in an atmosphere at a pressure of 10 −5 Torr.
得られた薄膜の構造をX線回折法で評価したところ格
子定数15Åの(OOn)面(n=1〜4)が認められた。
これらのことからドーピング・脱ドーピングによってペ
ンタセン薄膜中の分子の配向性が向上したことがわかっ
た。When the structure of the obtained thin film was evaluated by an X-ray diffraction method, an (OOn) plane (n = 1 to 4) having a lattice constant of 15 ° was recognized.
From these results, it was found that the orientation of the molecules in the pentacene thin film was improved by doping / undoping.
実施例3 部分的に金薄膜(300Å)をもうけた石英基板を用い
て該基板上にペンタセンを3000Åの膜厚で真空蒸着して
ペンタセン薄膜を得た。成膜条件として基板温度は30
℃、圧力4x10-5Torrの雰囲気下、蒸着源はタングステン
ボートの抵抗加熱により行った。得られた薄膜の構造を
X線回折により測定したところ格子定数15Åの(OOn)
面(n=1〜3)とともに層間距離14Åの回折ピークが
見られた。Example 3 Using a quartz substrate partially provided with a gold thin film (300 °), pentacene was vacuum-deposited to a thickness of 3000 ° on the substrate to obtain a pentacene thin film. The substrate temperature is 30
In an atmosphere at a temperature of 4 ° C. and a pressure of 4 × 10 −5 Torr, the deposition source was performed by resistance heating of a tungsten boat. The structure of the obtained thin film was measured by X-ray diffraction.
A diffraction peak at an interlayer distance of 14 ° was observed together with the plane (n = 1 to 3).
該薄膜の金薄膜をアノードとして過塩素酸テトラメチ
ルアンモニウムのアセトニトリル溶液(0.05mM)中で電
解することによりClO4 -のドーピングを行った後、アセ
トニトリル浸漬・洗浄を繰り返し脱ドーピングを行っ
た。After doping with ClO 4 − by performing electrolysis in a solution of tetramethylammonium perchlorate in acetonitrile (0.05 mM) using the gold thin film as an anode, immersion and washing with acetonitrile were repeated to perform dedoping.
該薄膜の構造をX線回折法(CuKα線)により測定し
たところ格子定数15Åの(OOn)(n=1〜4)の回折
面が認められ、かつ層間距離14Åの回折ピークは消失し
た。When the structure of the thin film was measured by an X-ray diffraction method (CuKα ray), a diffraction plane of (OOn) (n = 1 to 4) with a lattice constant of 15 ° was recognized, and the diffraction peak at an interlayer distance of 14 ° disappeared.
実施例4 部分的に金薄膜(膜厚500Å)被覆した石英ガラス基
板上にペンタセン−沃素薄膜を作製した。MBE装置を用
いて、圧力10-5Torrの雰囲気下でペンタセンをKセル加
熱、沃素はガスセルにより基板上に5000Åのペンタセン
−沃素薄膜を作製した。なお、基板温度は10℃であっ
た。ついで、該薄膜を圧力10-4Torrの雰囲気下で60℃に
保持して脱ドーピングを行った。Example 4 A pentacene-iodine thin film was formed on a quartz glass substrate partially covered with a gold thin film (thickness: 500 °). Using an MBE apparatus, pentacene was heated in a K cell under an atmosphere of a pressure of 10 −5 Torr, and a 5000 ° pentacene-iodine thin film was formed on a substrate of iodine using a gas cell. The substrate temperature was 10 ° C. Next, the thin film was dedoped while being kept at 60 ° C. in an atmosphere of a pressure of 10 −4 Torr.
得られた薄膜の構造をX線回折法で評価したところ格
子定数15Åの(OOn)面(n=1〜5)が認められた。When the structure of the obtained thin film was evaluated by an X-ray diffraction method, an (OOn) plane (n = 1 to 5) having a lattice constant of 15 ° was recognized.
実施例5 ポリエチレンフィルム基板上にヘプタセン薄膜を膜厚
1000Åで真空蒸着した。成膜条件として基板温度は25
℃、圧力1x10-5Torrの雰囲気下、蒸着源はタングステン
ボートの抵抗加熱により成膜を行った。得られた薄膜の
構造をX線回折法で評価したところ格子定数18Åの(OO
n)面(n=1〜3)の回折面が見られた。真空容器中
でこの薄膜に沃素ガス(圧力2mTorr)を導入してドーピ
ングを施した後、圧力1x10-6Torrの雰囲気で1週間放置
して脱ドーピングを行った。得られた薄膜の構造をX線
回折法で評価したところ格子定数18Åの(OOn)面(n
=1〜6)の回折面が見られた。Example 5 Thickness of heptacene thin film on polyethylene film substrate
Vacuum deposited at 1000Å. The substrate temperature is 25
In an atmosphere at a temperature of 1 ° C. and a pressure of 1 × 10 −5 Torr, the deposition was performed by resistance heating of a tungsten boat as a deposition source. The structure of the obtained thin film was evaluated by an X-ray diffraction method.
An n) plane (n = 1 to 3) diffraction plane was observed. After doping by introducing iodine gas (pressure 2 mTorr) into the thin film in a vacuum vessel, the thin film was left for 1 week in an atmosphere of pressure 1 × 10 −6 Torr to perform dedoping. When the structure of the obtained thin film was evaluated by X-ray diffraction method, the (OOn) plane (n
= 1 to 6).
実施例6 石英ガラス基板上に真空蒸着法で膜厚800Åのナフタ
セン薄膜を作製した。成膜条件として基板温度は40℃、
圧力5x10-5Torrの雰囲気下で、蒸着源はタングステンボ
ートの抵抗加熱によって成膜を行った。この薄膜の構造
をX線回折法で評価したところ格子定数12Åの(OOn)
面(n=1〜3)が認められた。真空容器中でこの薄膜
にNOxガス(圧力10Torr)を導入してドーピングを施し
た後、圧力4x10-6Torrの雰囲気下で2時間保持すること
によって脱ドーピングを行った。Example 6 A 800-nm-thick naphthacene thin film was formed on a quartz glass substrate by a vacuum evaporation method. The substrate temperature was 40 ° C,
Under an atmosphere of a pressure of 5 × 10 −5 Torr, the deposition source was formed by resistance heating of a tungsten boat. The structure of this thin film was evaluated by X-ray diffraction.
Surfaces (n = 1 to 3) were observed. After doping by introducing a NOx gas (pressure 10 Torr) into this thin film in a vacuum vessel, dedoping was performed by maintaining the film under an atmosphere of pressure 4 × 10 −6 Torr for 2 hours.
得られた該薄膜の構造をX線回折法(CuKα線)によ
り測定したところ格子定数12Åの(OOn)面(n=1〜
4)の回折面が認められた。The structure of the obtained thin film was measured by an X-ray diffraction method (CuKα ray), and the (OOn) plane having a lattice constant of 12 ° (n = 1 to 1)
The diffraction surface of 4) was observed.
実施例7 石英ガラス基板上にコロネン薄膜を蒸着法で作製し
た。作製条件として圧力4x10-5Torrの雰囲気下で基板温
度20℃、蒸着源はタングステンボートの抵抗加熱により
行った。このコロネン薄膜の構造をX線回折法で評価し
たところ格子定数9.3Åの(OOn)面(n=1〜4)が見
られた。Example 7 A coronene thin film was formed on a quartz glass substrate by an evaporation method. The deposition was performed under a pressure of 4 × 10 −5 Torr in an atmosphere at a substrate temperature of 20 ° C., and the deposition source was a tungsten boat by resistance heating. When the structure of this coronene thin film was evaluated by an X-ray diffraction method, an (OOn) plane (n = 1 to 4) having a lattice constant of 9.3 ° was observed.
この薄膜を臭素ガス雰囲気(圧力100Torr)中でドー
ピングを行った後、圧力1x10-6Torrの雰囲気下に保持し
て脱ドーピングを行った。得られた薄膜の構造をX線回
折法で評価したところ格子定数9.5Åの(OOn)面(n=
1〜6)が認められた。After doping this thin film in a bromine gas atmosphere (pressure 100 Torr), dedoping was performed while maintaining the atmosphere at a pressure of 1 × 10 −6 Torr. When the structure of the obtained thin film was evaluated by X-ray diffraction method, the (OOn) plane (n =
1 to 6) were observed.
実施例8 石英ガラス基板上にクオテリレン薄膜を蒸着法で作製
した。作製条件として圧力1x10-5Torrの雰囲気下で基板
温度20度、蒸着源はタングステンボートの抵抗加熱によ
り行った。このクオテリレン薄膜の構造をX線回折法で
評価したところ格子定数20Åの(OOn)面(n=1〜
3)が見られた。Example 8 A quaterylene thin film was formed on a quartz glass substrate by an evaporation method. The deposition was performed under a pressure of 1 × 10 −5 Torr in an atmosphere of a substrate temperature of 20 ° C., and the evaporation source was performed by resistance heating of a tungsten boat. The structure of the quarterylene thin film was evaluated by an X-ray diffraction method.
3) was seen.
この薄膜を臭素ガス雰囲気(圧力2Torr)中でドーピ
ングを行った後、圧力1x10-6Torrの雰囲気下に保持して
脱ドーピングを行った。得られた薄膜の構造をX線回折
法で評価したところ格子定数20Åの(OOn)面(n=1
〜6)が認められた。After doping this thin film in a bromine gas atmosphere (pressure 2 Torr), dedoping was performed while maintaining the atmosphere at a pressure of 1 × 10 −6 Torr. When the structure of the obtained thin film was evaluated by an X-ray diffraction method, a (OOn) plane (n = 1) having a lattice constant of 20 ° was obtained.
To 6) were observed.
実施例9 石英ガラス基板上にトリフェノジチアジン薄膜を真空
蒸着法で作製した。作製条件として圧力1x10-4Torrの雰
囲気下で基板温度60度、蒸着源はタングステンボートの
抵抗加熱により行った。このトリフェノジチアジン薄膜
の構造をX線回折法で評価したところ格子定数9Åの
(OOn)面(n=1,2)が見られた。Example 9 A trifenodithiazine thin film was formed on a quartz glass substrate by a vacuum evaporation method. The production conditions were as follows: the substrate temperature was 60 ° C. in an atmosphere of a pressure of 1 × 10 −4 Torr, and the evaporation source was resistance heating of a tungsten boat. When the structure of this trifenodithiazine thin film was evaluated by X-ray diffraction, an (OOn) plane (n = 1, 2) having a lattice constant of 9 ° was found.
この薄膜を沃素ガス雰囲気(圧力2mTorr)中でドーピ
ングした後、圧力1x10-6Torrの雰囲気下、80度の温度で
脱ドーピングを行った。得られた薄膜の構造をX線回折
法で評価したところ格子定数10Åの(OOn)面(n=1
〜4)が認められた。After doping this thin film in an iodine gas atmosphere (pressure 2 mTorr), dedoping was performed at a temperature of 80 ° C. in an atmosphere of pressure 1 × 10 −6 Torr. When the structure of the obtained thin film was evaluated by an X-ray diffraction method, the (OOn) plane having a lattice constant of 10 ° (n = 1)
To 4) were observed.
第1図は実施例1において作製したドーピング前のペン
タセン薄膜のX線回折パターンを示す。第2図は実施例
1において作製したドーピング・脱ドーピング後のペン
タセン薄膜のX線回折パターンを示す。FIG. 1 shows an X-ray diffraction pattern of a pentacene thin film before doping produced in Example 1. FIG. 2 shows an X-ray diffraction pattern of the pentacene thin film after doping and undoping prepared in Example 1.
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 FI H01B 5/14 H01B 5/14 Z (56)参考文献 特開 昭61−77322(JP,A) 特開 昭60−166298(JP,A) 材料技術,Vol.3(3) p143 −150(1985) Thin Sdid Films,V ol.175,p89−93(1989) (58)調査した分野(Int.Cl.6,DB名) C09K 3/00 C08L 57/00 G02F 1/35 G03C 1/73 H01B 1/12 H01B 5/14 CA(STN) REGISTRY(STN)────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 6 Identification symbol FI H01B5 / 14 H01B5 / 14Z (56) References JP-A-61-77322 (JP, A) JP-A-60-166298 ( JP, A) Materials Technology, Vol. 3 (3) p143-150 (1985) Thin Sid Films, Vol. 175, p89-93 (1989) (58) Fields investigated (Int. Cl. 6 , DB name) C09K 3/00 C08L 57/00 G02F 1/35 G03C 1/73 H01B 1/12 H01B 5/14 CA ( STN) REGISTRY (STN)
Claims (1)
ある縮合多環芳香族化合物の有機薄膜に、電子受容性分
子のドーピングおよびそれに続く脱ドーピングを施した
高配合性有機薄膜An organic thin film of a condensed polycyclic aromatic compound in which the number of condensed benzene rings is 3 or more and 13 or less is subjected to doping with an electron accepting molecule and subsequent undoping, and a highly blendable organic thin film.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13533790A JP2864427B2 (en) | 1990-05-28 | 1990-05-28 | Highly oriented organic thin film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13533790A JP2864427B2 (en) | 1990-05-28 | 1990-05-28 | Highly oriented organic thin film |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0431487A JPH0431487A (en) | 1992-02-03 |
| JP2864427B2 true JP2864427B2 (en) | 1999-03-03 |
Family
ID=15149411
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13533790A Expired - Lifetime JP2864427B2 (en) | 1990-05-28 | 1990-05-28 | Highly oriented organic thin film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2864427B2 (en) |
-
1990
- 1990-05-28 JP JP13533790A patent/JP2864427B2/en not_active Expired - Lifetime
Non-Patent Citations (2)
| Title |
|---|
| Thin Sdid Films,Vol.175,p89−93(1989) |
| 材料技術,Vol.3(3) p143−150(1985) |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0431487A (en) | 1992-02-03 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| Yemata et al. | Improved thermoelectric properties and environmental stability of conducting PEDOT: PSS films post-treated with imidazolium ionic liquids | |
| Minakata et al. | Highly ordered and conducting thin film of pentacene doped with iodine vapor | |
| Rong et al. | Solvent engineering towards controlled grain growth in perovskite planar heterojunction solar cells | |
| Luo et al. | A multifunctional ionic liquid additive enabling stable and efficient perovskite light‐emitting diodes | |
| US2497376A (en) | Process of producing films | |
| JPH0555568A (en) | Organic thin film transistor | |
| US20140087501A1 (en) | Doped graphene transparent conductive electrode | |
| JPWO2004023560A1 (en) | Organic thin film transistor and method for producing organic thin film transistor | |
| KR101664979B1 (en) | Preparing method of reduced graphene oxide film, reduced graphene oxide film prepared by the same, and graphene electrode including the reduced graphene oxide film | |
| Takenami et al. | In situ polymerization of liquid-crystalline thin films of electron-transporting perylene tetracarboxylic bisimide bearing cyclotetrasiloxane rings | |
| Chatterjee et al. | Thermoelectric performance of electrodeposited nanostructured polyaniline doped with sulfo‐salicylic acid | |
| JP2864427B2 (en) | Highly oriented organic thin film | |
| JPH0551330A (en) | Organic thin film having anisotropic electrical conductivity | |
| CN100414734C (en) | Polymer material having carrier transporting property, and organic thin film element, electronic device and wire using the same | |
| Yoshino et al. | Novel properties of new type conducting and insulating polymers and their composites | |
| Lu et al. | Multi‐dimensional doping of polyaniline emeraldine base by hydrogensulfated fullerenol derivatives | |
| US5229845A (en) | Electroconductive thin film of organic charge transfer complexes of bisethylenedithiatetrathiafulvalene | |
| Dillingham et al. | Structural and chemical characterization of vapor‐deposited polythiophene films | |
| JP2914518B2 (en) | Oriented conductive organic thin film | |
| Sharma et al. | Synergistic effect of sequential solvent treatment on the structural and low temperature charge transport of PEDOT: PSS films | |
| Kim et al. | Colorless polyimide/organoclay nanocomposite substrates for flexible organic light-emitting devices | |
| Dedyk et al. | The dielectric hysteresis of YBCO-SrTiO3-YBCO structures at 4.2 K | |
| JP2004335932A (en) | Organic thin film transistor and method of manufacturing the same | |
| JP5025124B2 (en) | ORGANIC SEMICONDUCTOR DEVICE, ITS MANUFACTURING METHOD, AND DISPLAY DEVICE | |
| Rohom et al. | Oxidative Polymerization of Polyaniline (PANI) Colloids with Different Oxidizing Agents |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313115 |
|
| R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Year of fee payment: 10 Free format text: PAYMENT UNTIL: 20081218 |
|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Year of fee payment: 10 Free format text: PAYMENT UNTIL: 20081218 |
|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20091218 Year of fee payment: 11 |
|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20091218 Year of fee payment: 11 |
|
| S531 | Written request for registration of change of domicile |
Free format text: JAPANESE INTERMEDIATE CODE: R313531 |
|
| R360 | Written notification for declining of transfer of rights |
Free format text: JAPANESE INTERMEDIATE CODE: R360 |
|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Year of fee payment: 12 Free format text: PAYMENT UNTIL: 20101218 |
|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20101218 Year of fee payment: 12 |
|
| R370 | Written measure of declining of transfer procedure |
Free format text: JAPANESE INTERMEDIATE CODE: R370 |
|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20101218 Year of fee payment: 12 |
|
| S531 | Written request for registration of change of domicile |
Free format text: JAPANESE INTERMEDIATE CODE: R313531 |
|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20101218 Year of fee payment: 12 |
|
| R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
| EXPY | Cancellation because of completion of term | ||
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20101218 Year of fee payment: 12 |