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JP2914518B2 - Oriented conductive organic thin film - Google Patents
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JP2914518B2 - Oriented conductive organic thin film - Google Patents

Oriented conductive organic thin film

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Publication number
JP2914518B2
JP2914518B2 JP13408990A JP13408990A JP2914518B2 JP 2914518 B2 JP2914518 B2 JP 2914518B2 JP 13408990 A JP13408990 A JP 13408990A JP 13408990 A JP13408990 A JP 13408990A JP 2914518 B2 JP2914518 B2 JP 2914518B2
Authority
JP
Japan
Prior art keywords
thin film
substrate
conductivity
polycyclic aromatic
oriented
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP13408990A
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Japanese (ja)
Other versions
JPH0431486A (en
Inventor
尚 南方
勝 尾崎
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Asahi Kasei Corp
Original Assignee
Asahi Kasei Kogyo KK
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Priority to JP13408990A priority Critical patent/JP2914518B2/en
Publication of JPH0431486A publication Critical patent/JPH0431486A/en
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Expired - Fee Related legal-status Critical Current

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Description

【発明の詳細な説明】 〔技術分野〕 本発明は配向性導電性有機薄膜に関する。Description: TECHNICAL FIELD The present invention relates to an oriented conductive organic thin film.

〔産業上の利用分野〕[Industrial applications]

本発明の配向性導電性有機薄膜は導電性材料として用
いることができる。
The oriented conductive organic thin film of the present invention can be used as a conductive material.

〔従来技術および問題点〕[Conventional technology and problems]

これまで、ポリアセチレン、ポリピロール、ポリチオ
フェン、ポリアリレンビニレン、ポリチエニレンビニレ
ンなどの共役系高分子に電子供与性分子または電子受容
性分子をドーピングすることによって導電性材料が得ら
れることが知られている。またテトラチアフルバレンな
どの電子供与性分子とテトラシアノキノジメタンなどの
電子受容性分子の組合せによる電荷移動錯体が導電性を
有することも知られている。これらの導電性材料は高い
電導度を有するが薄膜形成が難しく、またこれら導電性
材料の大気中での酸化、ドーパントの付加反応などによ
る安定性に問題があった。
Until now, it has been known that a conductive material can be obtained by doping a conjugated polymer such as polyacetylene, polypyrrole, polythiophene, polyarylenevinylene, or polythienylenevinylene with an electron-donating molecule or an electron-accepting molecule. I have. It is also known that a charge transfer complex formed by a combination of an electron donating molecule such as tetrathiafulvalene and an electron accepting molecule such as tetracyanoquinodimethane has conductivity. These conductive materials have high conductivity but are difficult to form a thin film, and have problems in stability of the conductive materials due to oxidation in the air, addition reaction of dopants, and the like.

薄膜作製法としてLB法を用いて前記の導電性材料の薄
膜を作製する試みがなされているが高い導性を有し安定
性に優れた薄膜は得られていない。
Attempts have been made to produce a thin film of the above-mentioned conductive material using the LB method as a thin film production method, but a thin film having high conductivity and excellent stability has not been obtained.

縮合多環芳香族化合物の蒸着によって配向性薄膜が得
られることは知られている〔Z.Physik.Chem.19,206(19
59)〕が、導電性薄膜を得た例はない。
It is known that an oriented thin film can be obtained by vapor deposition of a condensed polycyclic aromatic compound [Z. Physik. Chem. 19 , 206 (19)
59)], but there is no example of obtaining a conductive thin film.

大気中での安定性に優れ、高い電導度を有する有機薄
膜が要求されている。
There is a demand for an organic thin film having excellent stability in the atmosphere and high electric conductivity.

〔問題を解決するための手段〕[Means for solving the problem]

このような問題点に鑑み、本発明者らは安定性に優
れ、高い電導度を有する有機薄膜を得るべく鋭意検討を
重ねた結果、本発明の配向性導電性有機薄膜を得るに至
った。
In view of such problems, the present inventors have conducted intensive studies to obtain an organic thin film having excellent stability and high conductivity, and as a result, have obtained the oriented conductive organic thin film of the present invention.

すなわち、本発明は下記の式(I)においてxが2か
ら5で示される直鎖状縮合多環芳香族化合物に電子受容
性分子がドーピングされ、かつ(00n)の回折面(nは
1以上の整数)を有する配向性導電性有機薄膜に関する
ものである。
That is, in the present invention, a linear condensed polycyclic aromatic compound represented by the following formula (I) wherein x is 2 to 5 is doped with an electron-accepting molecule, and a (00n) diffraction surface (n is 1 or more) (Integer).

本発明で用いる直鎖状縮合多環芳香族化合物について
説明する。本発明で用いる直鎖状縮合多環芳香族化合物
として、ナフタセン(x=2)、ペンタセン(x=
3)、ヘキサセン(x=4)、ヘプタセン(x=5)を
挙げることができる。
The linear condensed polycyclic aromatic compound used in the present invention will be described. Examples of the linear condensed polycyclic aromatic compound used in the present invention include naphthacene (x = 2) and pentacene (x =
3), hexacene (x = 4) and heptacene (x = 5).

次に本発明で使用する電子受容性分子について説明す
る。電子受容性分子としてCl2、Br2、I2、ICl、ICl3、I
Br、IFなどのハロゲン、PF5、AsF5、SbF5、BF3、BCl3
BBr3、SO3、NOx、SO2などのルイス酸、HF、HCl、HNO3
H2SO4、HClO4、FSO3H、ClSO3H、CF3SO3H、CF3SO3H、酢
酸、ぎ酸などの有機酸、アミノ酸などのプロトン酸、TC
NQ、クロラニル、テトラフルオロテトラシアノキノジメ
タン、テトラシアノエチレン、ジシアノクロロキノンな
どの電子受容性有機分子、FeCl3、FeOCl、TiCl4、ZrC
l4、HFCl4、NbF5、NbCl5、TaCl5、MoCl5、WF5、WCL6、U
F6、LnCl3、(Ln=La、Ce、Pr、Nd、Smなどのランタノ
イド)などの遷移金属化合物、Cl-、Br-、I-、ClO4 -、P
F6 -、AsF5 -、SbF6 -、BF4 -、FeCl4 -、スルホン酸アニオ
ンなどの電解質アニオンなどを用いることができる。
Next, the electron accepting molecule used in the present invention will be described. Cl 2 , Br 2 , I 2 , ICl, ICl 3 , I
Br, halogen such as IF, PF 5, AsF 5, SbF 5, BF 3, BCl 3,
Lewis acids such as BBr 3 , SO 3 , NOx, SO 2 , HF, HCl, HNO 3 ,
H 2 SO 4, HClO 4, FSO 3 H, ClSO 3 H, CF 3 SO 3 H, CF 3 SO 3 H, acetic, organic acids such as formic acid, protonic acids such as amino acids, TC
Electron-accepting organic molecules such as NQ, chloranil, tetrafluorotetracyanoquinodimethane, tetracyanoethylene, dicyanochloroquinone, FeCl 3 , FeOCl, TiCl 4 , ZrC
l 4, HFCl 4, NbF 5 , NbCl 5, TaCl 5, MoCl 5, WF 5, WCL 6, U
Transition metal compounds such as F 6 , LnCl 3 , (Ln = lanthanoids such as La, Ce, Pr, Nd, Sm), Cl , Br , I , ClO 4 , P
Electrolyte anions such as F 6 , AsF 5 , SbF 6 , BF 4 , FeCl 4 , and a sulfonate anion can be used.

これらの電子受容性分子は前記の直鎖状縮合多環芳香
族化合物と共存した場合に後者から電子移動が生じ後者
の電子受容性分子の分子構造は変化する。
When these electron accepting molecules coexist with the above-mentioned linear condensed polycyclic aromatic compound, electron transfer occurs from the latter, and the molecular structure of the latter electron accepting molecule changes.

次に本発明の配向性導電性有機薄膜の作製法について
その一例を示す。本発明の配向性導電性有機薄膜は前記
の縮合多環芳香族化合物薄膜作製法に電子受容性分子を
ドーピングして配向性導電性薄膜を得る方法、前記の縮
合多環芳香族化合物の薄膜作製時に電子受容性分子をド
ーピングして配行性導電性薄膜を得る方法によって作製
することができる。
Next, an example of a method for producing an oriented conductive organic thin film of the present invention will be described. The oriented conductive organic thin film of the present invention is a method for obtaining an oriented conductive thin film by doping an electron-accepting molecule into the above-mentioned method for producing a condensed polycyclic aromatic compound thin film, and producing the above-mentioned condensed polycyclic aromatic compound thin film. It can be produced by a method in which an electron-accepting molecule is sometimes doped to obtain a distributed conductive thin film.

前者の配向性導電性薄膜の作製は、まず直鎖状縮合多
環芳香族化合物の薄膜を真空蒸着法、MBE法、CVD法、ス
パッタリングなどの薄膜形成法を用いて基板上に作製す
る。この際、基板材料として石英ガラス、フッ化カルシ
ウム、サファイヤ、アルミナ、マグネシア、塩化ナトリ
ウム、塩化カリウム、窒化アルミニウム、ボロンナイト
ライドなどのセラミック材料、シリコン、ゲルマニウ
ム、ITO、GaAs、InSb、GaNなどの半導体材料、金、アル
ミニウム、銀、鉄、ステンレスなどの金属材料、Y−Ba
−Cu−O系、Bi−Sr−Ca−Cu−O系、Nb系などの超伝導
材料、ポリエステル、ポリスチレン、ポリエチレン、ポ
リアセチレン、ポリピロールなどの有機物材料などを用
いることができる。また、基板は使用する目的に応じて
種々の形態が使用可能である。
In the former method of producing an oriented conductive thin film, first, a thin film of a linear condensed polycyclic aromatic compound is formed on a substrate by using a thin film forming method such as a vacuum evaporation method, an MBE method, a CVD method, or a sputtering method. At this time, ceramic materials such as quartz glass, calcium fluoride, sapphire, alumina, magnesia, sodium chloride, potassium chloride, aluminum nitride, boron nitride, and semiconductors such as silicon, germanium, ITO, GaAs, InSb, and GaN are used as substrate materials. Material, metal material such as gold, aluminum, silver, iron, stainless steel, Y-Ba
A superconducting material such as —Cu—O, Bi—Sr—Ca—Cu—O, or Nb, or an organic material such as polyester, polystyrene, polyethylene, polyacetylene, or polypyrrole can be used. Various forms of the substrate can be used depending on the purpose of use.

成膜の際の基板温度はとくに限定されないが液体窒素
温度などの低温の場合には膜の配向性が低下する。基板
温度の増加に従って膜の配向性が向上する。しかし、前
記縮合多環芳香族化合物の融点以上に加熱すると薄膜の
配向性は低下する。従って、基板温度は通常−100℃〜3
00℃が好ましい。基板温度が室温近傍の条件においても
良い配向性薄膜が得られる。この配向性は通常のX線回
折法によって評価することができる。ここで(00n)面
(nは1以上の整数)が選択的に現われることから配向
性薄膜であることがわかる。薄膜形成法として、たとえ
ば真空蒸着法を用いた場合は圧力10-2Torr以下の雰囲気
で前記の縮合多環芳香族化合物を加熱蒸着する。この雰
囲気の圧力は低い方が配向性薄膜を得るために望ましく
好ましくは10-4Torr以下である。また、MBE法を用いる
場合は縮合多環芳香族の蒸着源としてクヌーセンセル、
電子線銃加熱、ガスセルのいずれも使用可能であり、通
常の成膜法によって配向性薄膜を得ることができる。さ
らにCVD法の場合は真空下またはキャリアーガス存在下
で縮合多環芳香族の蒸気を基板上に供給することによっ
て配向性薄膜が得られる。また、スパッタリングは前記
の縮合多環芳香族化合物ターゲットを用いてアルゴンス
パッタにより薄膜形成ができる。以上のようにして配向
性縮合多環芳香族化合物薄膜が得られ、この配向性が高
いほど高電導度の配向性導電性薄膜とするために好まし
い。
The substrate temperature at the time of film formation is not particularly limited, but at a low temperature such as liquid nitrogen temperature, the orientation of the film decreases. As the substrate temperature increases, the orientation of the film improves. However, the orientation of the thin film decreases when heated above the melting point of the condensed polycyclic aromatic compound. Therefore, the substrate temperature is usually −100 ° C. to 3
00 ° C. is preferred. A good oriented thin film can be obtained even when the substrate temperature is near room temperature. This orientation can be evaluated by a usual X-ray diffraction method. Here, since the (00n) plane (n is an integer of 1 or more) selectively appears, it is understood that the film is an oriented thin film. For example, when a vacuum evaporation method is used as a thin film forming method, the above-mentioned condensed polycyclic aromatic compound is heated and evaporated in an atmosphere at a pressure of 10 −2 Torr or less. The lower the pressure of this atmosphere is, desirably 10 -4 Torr or less, in order to obtain an oriented thin film. When using the MBE method, Knudsen cell as a condensation polycyclic aromatic vapor deposition source,
Either electron beam heating or gas cell can be used, and an oriented thin film can be obtained by a normal film forming method. Further, in the case of the CVD method, an oriented thin film can be obtained by supplying a condensed polycyclic aromatic vapor onto a substrate in a vacuum or in the presence of a carrier gas. In sputtering, a thin film can be formed by argon sputtering using the condensed polycyclic aromatic compound target. As described above, an oriented condensed polycyclic aromatic compound thin film is obtained, and the higher the orientation is, the more preferable it is to obtain an oriented conductive thin film having high conductivity.

次いで、得られた配向性薄膜に電子受容性分子をドー
ピングして配向性導電性薄膜とすることができる。この
ドーピングの方法としてガス状分子(ドーパント)を用
いた気相ドーピング、ドーパント溶液または液状ドーパ
ント中でドーピングする液相ドーピング、固体状のドー
パントを薄膜に接触させて拡散させる固相ドーピングの
いずれも使用可能である。また必要があれば電解するこ
とによりドーピングの効率を向上させることもできる。
このドーピングによって該薄膜の配向性がドーピングを
施さない薄膜に比べて向上する。たとえば、ペンタセン
蒸着膜では沃素ドーピングによってX線回折パターンの
(00n)面の回折強度増加と配向の乱れによるサブピー
クの回折強度の減少、消失が認められる。このことか
ら、ドーピングによって分子の配向性が向上しているこ
とがわかる。
Next, the obtained oriented thin film can be doped with an electron accepting molecule to form an oriented conductive thin film. As the doping method, any of gas phase doping using gaseous molecules (dopant), liquid phase doping in a dopant solution or liquid dopant, and solid phase doping in which a solid dopant is brought into contact with a thin film and diffused is used. It is possible. If necessary, the efficiency of doping can be improved by electrolysis.
This doping improves the orientation of the thin film as compared to a non-doped thin film. For example, in a pentacene vapor-deposited film, an increase in the diffraction intensity of the (00n) plane of the X-ray diffraction pattern due to iodine doping, and a decrease or disappearance of the diffraction intensity of the sub-peak due to disorder of the orientation are observed. This indicates that doping improves the orientation of molecules.

次の後者の方法、すなわち前記の縮合多環芳香族化合
物の薄膜作製時に電子受容性分子を薄膜中に供給して導
電性薄膜を得る方法についてその一例を示す。前記の薄
膜作製法である真空蒸着法、MBE法を用いて縮合多環芳
香族化合物とドーパント(電子受容性分子)をそれぞれ
の蒸着源から基板上に積層して配向性導電性薄膜を得る
ことができる。必要があれば、成膜時の成膜速度の制御
ならびにシャッタリングを用いることによって縮合多環
芳香族化合物とドーパント分子が交互に規則正しく積層
した薄膜、たとえば一原子層ずつ積層した薄膜を得るこ
とができる。またCVD法では、縮合多環芳香族化合物と
ドーパントの蒸気をそれぞれ基板上に供給して配向性導
電性薄膜を得ることもできる。スパッタリングではアル
ゴンとドーパント共存下での直鎖状縮合多環芳香族化合
物のスパッタリングにより薄膜を得ることができる。ド
ーパントによっては二元スパッタリングも可能である。
ここで用いる基板材料として前記の基板材料が使用可能
である。
An example of the latter method, that is, a method of obtaining a conductive thin film by supplying an electron-accepting molecule into the thin film at the time of preparing the thin film of the above-mentioned condensed polycyclic aromatic compound, will be described. Obtaining an oriented conductive thin film by laminating a condensed polycyclic aromatic compound and a dopant (electron-accepting molecule) on a substrate from their respective evaporation sources using the above-mentioned thin film production methods such as vacuum evaporation and MBE. Can be. If necessary, a thin film in which a condensed polycyclic aromatic compound and a dopant molecule are alternately and regularly stacked, for example, a thin film in which one atomic layer is stacked, can be obtained by controlling the film forming speed during film formation and using shuttering. it can. In the CVD method, a vapor of a condensed polycyclic aromatic compound and a vapor of a dopant can be respectively supplied onto a substrate to obtain an oriented conductive thin film. In sputtering, a thin film can be obtained by sputtering a linear condensed polycyclic aromatic compound in the presence of argon and a dopant. Depending on the dopant, binary sputtering is also possible.
The substrate material described above can be used as the substrate material used here.

本発明の薄膜の膜厚は利用する目的により変化するた
めに限定できないが、50Åからミクロンオーダーまで作
製が可能である。
The thickness of the thin film of the present invention cannot be limited because it varies depending on the purpose of use, but it can be manufactured from 50 ° to the order of microns.

必要があれば、本発明の薄膜上にドーパントの拡散・
飛散防止のための保護層や他の材料の層を設けることも
できる。また本発明の薄膜を応用した機能材料とするた
めに、本発明の薄膜と他の材料の薄膜の多層の積層膜と
して用いることもできる。
If necessary, diffusion of the dopant on the thin film of the present invention
A protective layer for preventing scattering and a layer of another material may be provided. Further, in order to obtain a functional material to which the thin film of the present invention is applied, the thin film of the present invention and a thin film of another material may be used as a multilayer laminated film.

上記で得られたドーパント分子を含有する有機薄膜
は、その分子配向性に優れ、かつ高い導電性を示す。薄
膜の分子配向性は前記のX線回折法、電子線回折法など
の構造解析法によって評価できる。本発明の薄膜は(00
n)面(nは1以上の整数)の回折面が現われ、その格
子定数が分子の長軸に対応することから縮合多環芳香族
化合物の分子がその長軸を基板面に垂直方向に規則正し
く配列していることがわかる。
The organic thin film containing the dopant molecule obtained above has excellent molecular orientation and high conductivity. The molecular orientation of the thin film can be evaluated by a structural analysis method such as the X-ray diffraction method and the electron beam diffraction method described above. The thin film of the present invention is (00
An n) plane (n is an integer of 1 or more) diffraction plane appears, and the lattice constant thereof corresponds to the long axis of the molecule. Therefore, the molecules of the condensed polycyclic aromatic compound have the long axis regularly in the direction perpendicular to the substrate surface. It can be seen that they are arranged.

本発明の薄膜の導電性は通常の方法である二端子法、
四端子法により評価できる。その電導度は使用する目的
に応じてドーパントの種類、含有量によって変化させる
ことができる。本発明の薄膜の電導度は10-13S/cmから1
00S/cmである。また、本発明の薄膜は前記のように高い
分子配向性を有するため、電導度に異方性を有する。す
なわち基板面に平行方向と垂直方向の電導度の異方性
(σ=/σ⊥)は1から104である。
The conductivity of the thin film of the present invention is a two-terminal method which is a usual method,
It can be evaluated by the four terminal method. The conductivity can be changed depending on the type and content of the dopant according to the purpose of use. The conductivity of the thin film of the present invention is 10 -13 S / cm to 1
00S / cm. Further, since the thin film of the present invention has high molecular orientation as described above, it has anisotropy in electric conductivity. That is, the conductivity anisotropy (σ = / σ⊥) in the direction parallel to and perpendicular to the substrate surface is 1 to 10 4 .

本発明の薄膜は大気中に長時間放置しても酸化、ドー
パントの付加反応などによる安定性に問題がなく非常に
安定であるため、電子材料としてエレクトロニクス、オ
プトエレクトロニクスなど種々の分野に応用でき工業上
有益である。
Since the thin film of the present invention is very stable without any problem in stability due to oxidation and addition reaction of dopants even when left in the air for a long time, it can be applied to various fields such as electronics and optoelectronics as an electronic material. Is beneficial.

(実施例) 以下実施例により本発明をさらに詳細に説明する。(Examples) Hereinafter, the present invention will be described in more detail with reference to Examples.

実施例1 ペンタセンを石英ガラス基板上に500Åの薄厚で真空
蒸着してペンタセンの薄膜を作製した。基板温度は室
温、圧力2x10-5Toorの雰囲気下で、蒸着源はタングステ
ンボートの抵抗加熱により行った。該薄膜の構造をX線
回折により測定したところ格子定数15Åの(00n)面
(n=1〜3)が認められた。次いで、得られた薄膜を
沃素ガス雰囲気(室温、1Torrの圧力下)中でドーピン
グをおこない配向性導電性薄膜を作製した。
Example 1 Pentacene was vacuum-deposited to a thin thickness of 500 ° on a quartz glass substrate to produce a pentacene thin film. The substrate temperature was room temperature, the pressure was 2 × 10 −5 Toor, and the evaporation source was resistance heating of a tungsten boat. When the structure of the thin film was measured by X-ray diffraction, a (00n) plane (n = 1 to 3) having a lattice constant of 15 ° was recognized. Next, the obtained thin film was doped in an iodine gas atmosphere (room temperature, under a pressure of 1 Torr) to produce an oriented conductive thin film.

該薄膜の構造をX線回折法(CuK α線)により測定し
たところ格子定数19Åの(00n)(n=1〜14)の回折
面が認められた。該薄膜の電導度を直流四端子により測
定したところ70 S/cmであった。
When the structure of the thin film was measured by an X-ray diffraction method (CuK α ray), a diffraction plane of (00n) (n = 1 to 14) having a lattice constant of 19 ° was observed. The conductivity of the thin film was measured by a DC four terminal and found to be 70 S / cm.

実施例2 実施例1と同様にしてポリエステル基板上に1000Åの
膜厚でペンタセン薄膜を作製した。該薄膜の構造をX線
回折法により測定したところ格子定数15Åの(00n)面
(n=1〜3)が認められた。
Example 2 In the same manner as in Example 1, a pentacene thin film having a thickness of 1000 ° was formed on a polyester substrate. When the structure of the thin film was measured by an X-ray diffraction method, a (00n) plane (n = 1 to 3) having a lattice constant of 15 ° was recognized.

得られた膜を5TorrのSO3ガス雰囲気下に置くことによ
りドーピングして配向性導電性薄膜を得た。
The obtained film was doped in a 5 Torr SO 3 gas atmosphere to obtain an oriented conductive thin film.

該薄膜の構造をX線回折法(CuK α線)により測定し
たところ格子定数18Åの(00n)(n=1〜8)の回折
面が認められた。該薄膜の電導度を直流四端子法により
測定したところ6S/cmであった。
When the structure of the thin film was measured by an X-ray diffraction method (CuKα ray), a diffraction plane of (00n) (n = 1 to 8) having a lattice constant of 18 ° was recognized. The conductivity of the thin film was measured by a DC four-probe method and found to be 6 S / cm.

実施例3 実施例1と同様にしてマグネシア基板上にペンタセン
薄膜を作製した。該薄膜をFeCl3のニトロメタン溶液
(0.1M)に1時間浸せきした。得られた薄膜の構造をX
線回折法により測定したところ格子定数20Åの(00n)
面(n=1〜10)が認められた。該薄膜の電導度を直流
四端子法により測定したところ1S/cmであった。
Example 3 A pentacene thin film was formed on a magnesia substrate in the same manner as in Example 1. The thin film was immersed in a FeCl 3 nitromethane solution (0.1 M) for 1 hour. The structure of the obtained thin film is represented by X
(00n) with a lattice constant of 20Å as measured by X-ray diffraction
Surfaces (n = 1 to 10) were observed. The conductivity of the thin film was measured by a DC four-terminal method, and was 1 S / cm.

実施例4 部分的に金薄膜(300Å)をもうけた石英基板を用い
て該基板上にペンタセンを2000Åの膜厚で真空蒸着して
ペンタセン薄膜を得た。成膜条件として基板温度は30
℃、圧力4x10-5Torrの雰囲気下、蒸着源はタングステン
ボートの抵抗加熱により行った。
Example 4 Using a quartz substrate partially provided with a gold thin film (300 °), pentacene was vacuum-deposited on the substrate to a thickness of 2000 ° to obtain a pentacene thin film. The substrate temperature is 30
In an atmosphere at a temperature of 4 ° C. and a pressure of 4 × 10 −5 Torr, the deposition source was performed by resistance heating of a tungsten boat.

該薄膜の金薄膜をアノードとして過塩素酸テトラメチ
ルアンモニウムのアセトニトリル溶液(0.05mM)中で電
解することによりClO4 -のドーピングを行い配向性導電
性薄膜を得た。
To obtain an oriented conductive thin film performs a doping - ClO 4 by electrolysis in acetonitrile perchlorate tetramethylammonium (0.05 mM) of gold thin film of the thin film as an anode.

該薄膜の構造をX線回折法(CuK α線)により測定し
たところ格子定数18Åの(00n)(n=1〜10)の回折
面が認められた。該薄膜の電導度を直流四端子法により
測定したところ10S/cmであった。
When the structure of the thin film was measured by an X-ray diffraction method (CuK α ray), a (00n) (n = 1 to 10) diffraction plane having a lattice constant of 18 ° was observed. The conductivity of the thin film was measured by a DC four-terminal method and found to be 10 S / cm.

実施例5 部分的に金薄膜(膜厚500Å)被覆した石英ガラス基
板上にペンタセン−沃素薄膜を作製した。MBE装置を用
いて、圧力10-5Torrの雰囲気下でペンタセンをKセル加
熱、沃素はガスセルにより基板上に5000Åのペンタセン
−沃素薄膜を作製した。該薄膜の作製条件である蒸着源
の温度、雰囲気圧力の制御によってペンタセンと沃素を
それぞれ単原子層ずつ積層した。なお、基板温度は0℃
であった。
Example 5 A pentacene-iodine thin film was formed on a quartz glass substrate partially covered with a gold thin film (thickness: 500 °). Using an MBE apparatus, pentacene was heated in a K cell under an atmosphere of a pressure of 10 −5 Torr, and a 5000 ° pentacene-iodine thin film was formed on a substrate of iodine using a gas cell. Pentacene and iodine were each laminated in a monoatomic layer by controlling the temperature of the deposition source and the atmospheric pressure, which are the conditions for forming the thin film. The substrate temperature is 0 ° C.
Met.

該薄膜の構造をX線回折法(CuK α線)により測定し
たところ格子定数19Åの(00n)(n=1〜14)の回折
面が認められた。該薄膜の基板面方向の電導度(σ=)
を直流四端子法により測定したところ電導度は80S/cmで
あった。
When the structure of the thin film was measured by an X-ray diffraction method (CuK α ray), a diffraction plane of (00n) (n = 1 to 14) having a lattice constant of 19 ° was observed. Conductivity of the thin film in the direction of the substrate surface (σ =)
Was measured by a DC four-terminal method, and the conductivity was 80 S / cm.

該薄膜上に金電極(500Å)を真空蒸着法によって設
けサンドイッチ状構造とした。この構造の膜に沃素をド
ーピングした後ペンタセン−沃素薄膜の基板面に垂直方
向の電導度(σ⊥)を直流二端子法で測定したところ、
電導度は0.04S/cmであった。このことから電導度の異方
性(σ=/σ⊥)は2000であった。
A gold electrode (500 °) was provided on the thin film by a vacuum evaporation method to form a sandwich structure. After doping the film with this structure with iodine, the conductivity (σ⊥) in the direction perpendicular to the substrate surface of the pentacene-iodine thin film was measured by a DC two-terminal method.
The conductivity was 0.04 S / cm. From this, the anisotropy of conductivity (σ = / σ⊥) was 2000.

実施例6 シリコン基板を用いヘキセン薄膜を真空蒸着法で作製
した(膜厚は2000Å)。この作製における作製条件とし
て圧力2x10-5Torr、基板温度は50℃、蒸着源はタングス
テンボートの抵抗加熱で行った。ついで実施例1と同様
にして得られた薄膜に沃素ドーピングを施した。
Example 6 A hexene thin film was formed by a vacuum deposition method using a silicon substrate (the film thickness was 2000 Å). The production conditions in this production were a pressure of 2 × 10 −5 Torr, a substrate temperature of 50 ° C., and an evaporation source by resistance heating of a tungsten boat. Next, iodine doping was performed on the thin film obtained in the same manner as in Example 1.

該薄膜の構造をX線回折法(CuK α線)により測定し
たところ格子定数22Åの(00n)(n=1〜16)の回折
面が認められた。該薄膜の電導度を直流四端子法により
測定したところ60S/cmであった。
When the structure of the thin film was measured by an X-ray diffraction method (CuK α ray), a (00n) (n = 1 to 16) diffraction plane having a lattice constant of 22 ° was observed. The conductivity of the thin film was measured by a DC four-probe method and found to be 60 S / cm.

実施例7 ポリエチンフィルム基板上にヘプタセン薄膜を膜厚10
00Åで真空蒸着した。真空容器中でこの薄膜にSO3ガス
(圧力5mTorr)を導入してドーピングを施した。
Example 7 A heptacene thin film having a film thickness of 10 was formed on a polyethene film substrate.
Vacuum deposited at 00 °. The thin film was doped with SO 3 gas (pressure 5 mTorr) in a vacuum vessel.

成膜条件として基板温度は25℃、圧力1x10-5Torrの雰
囲気下、蒸着源はタングステンボートの抵抗加熱により
成膜を行った。
The film was formed under the conditions of a substrate temperature of 25 ° C. and a pressure of 1 × 10 −5 Torr, and the deposition source was formed by resistance heating of a tungsten boat.

得られた該薄膜の構造をX線回折法(CuK α線)によ
り測定したところ格子定数25Å(00n)(n=1〜15)
の回折面が認められた。該薄膜の電導度を直流四端子法
により測定したところ40S/cmであった。
The structure of the obtained thin film was measured by an X-ray diffraction method (CuK α-ray) to find that the lattice constant was 25 ° (00n) (n = 1 to 15).
Was observed. The conductivity of the thin film was measured by a DC four-terminal method and found to be 40 S / cm.

実施例8 石英ガラス基板上に真空蒸着法で膜厚800Åのナフタ
セン薄膜を作製した。成膜条件として基板温度は40℃、
圧力5x10-5Torrの雰囲気下で、蒸着源はタングステンボ
ートの抵抗加熱により成膜を行った。ついで真空容器中
でこの薄膜にAsF5ガス(圧力5mTorr)を導入してドーピ
ングを施した。
Example 8 A 800-nm-thick naphthacene thin film was formed on a quartz glass substrate by a vacuum evaporation method. The substrate temperature was 40 ° C,
Under an atmosphere of a pressure of 5 × 10 −5 Torr, the deposition source was formed by resistance heating of a tungsten boat. Then, the thin film was doped with AsF 5 gas (pressure 5 mTorr) in a vacuum vessel.

得られた該薄膜の構造をX線回折法(CuK α線)によ
り測定してところ格子定数15Åの(00n)(n=1〜
3)の回折面が認められた。該薄膜の電導度を直流四端
子法により測定したところ1x10-3S/cmであった。
The structure of the obtained thin film was measured by an X-ray diffraction method (CuK α ray).
The diffraction surface of 3) was recognized. The conductivity of the thin film was measured by a DC four-terminal method and found to be 1 × 10 −3 S / cm.

【図面の簡単な説明】[Brief description of the drawings]

第1図は実施例1で作製したペンタセン薄膜のX線回折
パターン、第2図は実施例1で作製したペンタセン−沃
素薄膜のX線回折パターンを示す。
FIG. 1 shows an X-ray diffraction pattern of the pentacene thin film produced in Example 1, and FIG. 2 shows an X-ray diffraction pattern of the pentacene-iodine thin film produced in Example 1.

───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 昭61−77322(JP,A) 特開 昭60−166298(JP,A) 特開 昭63−94507(JP,A) 特開 平1−265404(JP,A) 特開 昭62−84120(JP,A) (58)調査した分野(Int.Cl.6,DB名) C09K 3/00 H01B 1/12,5/14 G02F 1/35 CA(STN) REGISTRY(STN)──────────────────────────────────────────────────続 き Continuation of the front page (56) References JP-A-61-77322 (JP, A) JP-A-60-166298 (JP, A) JP-A-63-94507 (JP, A) JP-A-1- 265404 (JP, A) JP-A-62-84120 (JP, A) (58) Fields investigated (Int. Cl. 6 , DB name) C09K 3/00 H01B 1 / 12,5 / 14 G02F 1/35 CA (STN) REGISTRY (STN)

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】下記の式(I)においてxが2から5で示
される直鎖状縮合多環芳香族化合物に電子受容性分子が
ドーピングされ、かつ(00n)の回折面(nは1以上の
整数)を有する配向性導電性有機薄膜。
1. A linear condensed polycyclic aromatic compound represented by the following formula (I) wherein x is 2 to 5 is doped with an electron accepting molecule, and a (00n) diffraction surface (n is 1 or more) Orientated conductive organic thin film having the following formula:
JP13408990A 1990-05-25 1990-05-25 Oriented conductive organic thin film Expired - Fee Related JP2914518B2 (en)

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JP2914518B2 true JP2914518B2 (en) 1999-07-05

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