JP2887382B2 - Bake equipment - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an improvement in a baking apparatus provided in an apparatus for applying a photoresist to a glass substrate having a circuit pattern formed on its surface, an apparatus for developing a substrate, and the like.

[0002]

2. Description of the Related Art FIG. 2 shows a conventional baking apparatus used for manufacturing a liquid crystal display element.
A plurality of bake plates 1 and 1 and a cool plate 2 are continuously arranged in a space formed by the first cover 1 and the lower cover 15, and a glass substrate (not shown) having a surface coated with a resist is formed. After heating with the bake plate 1 kept at a predetermined temperature, it is cooled with the cool plate 2 kept at approximately room temperature, and the resist film on the surface is cured so as not to cause a circuit failure. Since the solvent contained in the resist volatilizes and sublimates are generated, an exhaust pipe 16 is attached to the lower cover 15 to discharge the generated sublimates to the outside together with the internal air as indicated by arrows.

[0003]

In the above-mentioned conventional apparatus, a part of the sublimate generated by volatilization of the solvent contained in the resist adheres to the inside of the bake cover on a cool plate having a relatively low temperature. There is a problem in that the resist pattern is deposited and eventually falls on a substrate to be processed, thereby causing poor formation of a resist pattern. An object of the present invention is to solve the above conventional problems.

[0004]

Baking apparatus according to the present invention means for solving the problems]
Connect the sublimate-prevention piping maintained at a temperature at which sublimate does not adhere to the upper side of the cool plate and the lower side of the lower cover.
Continue to have Rutotomoni, sublimation of the sublimate mixed gas crystallization
Characterized in that the trap portion which is recovered is provided continuously to each sublimate deposition preventive pipe.

[0005]

The heating wire arranged in the sublimation-prevention pipe works so as to keep the sublimate-prevention pipe at a temperature at which sublimate does not adhere to the inside thereof. This cools the exhaust gas and acts to crystallize sublimates contained in the exhaust gas.

[0006]

DETAILED DESCRIPTION FIG. 1 is Ri schematic der showing an embodiment of a baking apparatus according to the present invention, the baking apparatus of this, as in the conventional example, in which is surrounded by a baking cover 3 and the lower cover 8 space,
A plurality of bake plates 1, ... , each of which is maintained at a predetermined temperature, and a cool plate 2, which is maintained at a room temperature, are arranged continuously. A sublimation-prevention pipe 9 in which a heating wire (not shown) for keeping the temperature at which the sublimate does not adhere is disposed below the lower cover 8 at this time .
It is connected as exhaust piping communicating with the inside of the device.
You. Furthermore, the sublimate deposition preventive pipe 9, the exhaust pipe 1 upon via the trap portion 10 to the cooling pipe 13 to the inside is distribution
2 and are continuously connected.

[0007] In addition, in the upper side of the click Rupureto 2, bake
Inlet 14 taken generations Waru exhaust to cover, in other words, the lower end gradually拡状
And to exhaust inlet 14 is provided with, on the exhaust inlet 14, (not shown) heat rays to keep the temperature of the sublimate is not adhered sublimate deposition preventing pipe 4 arranged inside are connected <br/> The continuous this sublimate deposition preventing pipe 4 also, the exhaust pipe 7 via the trap portion 5 which cooling pipes 6 inside is distribution
They are connected to each other.

[0008] As described above, the baking apparatus of the present invention comprises a sublimation-prevention pipe in which the inside of the apparatus is provided with a heating wire, and a trap section which is continuous with the sublimate-prevention pipe and in which a cooling pipe is disposed. Communicates with the outside world.

Next, the operation of the baking apparatus of the present invention having the above structure will be described. The baking apparatus of the present invention is applied to the surface of a liquid crystal substrate (not shown) or the like carried in similarly to the conventional one. After the resist is heated by the bake plate 1 kept at a predetermined temperature, it is cooled by the cool plate 2 and hardened, thereby improving the etching accuracy in the next step. Here, in the bake apparatus of the present invention, As described above, since the sublimation-preventing pipes 4 and 9 provided with heat rays are connected to the upper and lower portions of the apparatus, the sublimate generated by volatilization of the solvent contained in the resist when heated (FIG. Is sucked out from the sublimation-proof pipes 4 and 9 together with the high-temperature internal air as shown by arrows. Therefore, the generated sublimate does not crystallize due to a decrease in temperature and does not adhere and deposit inside the apparatus, and the occurrence of a pattern defect due to the deposit falling on the resist film on the surface of the pattern forming substrate is prevented. . The sublimate mixed gas sucked from the sublimate-prevention pipes 4 and 9 is supplied to a trap section 5 provided with cooling pipes 6 and 13 through which cooling water and the like are circulated.
The sublimate which has been cooled at 10 and mixed therein is crystallized and recovered here. The cooled air is supplied to the exhaust pipes 7 and 1
2 to the outside.

[0010] As described above, in the baking apparatus of the present invention, sublimates generated when a liquid crystal substrate is processed are sucked out and collected without being crystallized in the apparatus.

[0011]

As described above, in the baking apparatus of the present invention,
Sublimates generated when the liquid crystal substrate is processed are sucked out without being crystallized in the apparatus, and collected in the trap section, so that pattern defects caused by the sublimates re-adhering to the pattern can be prevented. Thus, there is an excellent effect that the product yield in forming a fine circuit pattern can be improved.

[Brief description of the drawings]

FIG. 1 is a schematic diagram of an embodiment of the present invention.

FIG. 2 is a schematic view of a conventional example.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 Bake plate 2 Cool plate 3 Bake cover 4, 9 Sublimation prevention pipe 5, 10 Trap part 6, 13 Cooling pipe 7, 12 Exhaust pipe 8 Lower cover

──────────────────────────────────────────────────続 き Continuation of the front page (56) References JP-A-3-209714 (JP, A) JP-A-63-181321 (JP, A) JP-A-3-41926 (JP, U) (58) Field (Int.Cl. ⁶ , DB name) H01L 21/027 G02F 1/13 G03F 7/16

Claims (1)

(57) [Claims] 1. A plurality of baking plates which are held at a predetermined temperature in a space surrounded by the bake cover and lower cover
And the baking apparatus comprising features a click Rupureto, with the upper and lower side of the lower cover of the click Rupureto connects the sublimate deposition preventive piping drip retaining the temperature at which the sublimate does not adhere to the inside, the sublimation the Monobogi pipe, baking apparatus characterized by being arranged to sublimate sublimate in the gas mixture continuously trap portion for recovering crystallized.