JP2974627B2 - Platinum plating method for ion exchange membrane - Google Patents
Platinum plating method for ion exchange membraneInfo
- Publication number
- JP2974627B2 JP2974627B2 JP8294383A JP29438396A JP2974627B2 JP 2974627 B2 JP2974627 B2 JP 2974627B2 JP 8294383 A JP8294383 A JP 8294383A JP 29438396 A JP29438396 A JP 29438396A JP 2974627 B2 JP2974627 B2 JP 2974627B2
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- Japan
- Prior art keywords
- exchange membrane
- plating
- solution
- ion
- platinum
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- Electrodes For Compound Or Non-Metal Manufacture (AREA)
- Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
Description
【0001】[0001]
【発明の属する技術分野】本発明は、水を電気分解して
酸素ガス、水素ガスを得るのに用いるイオン交換膜への
白金めっき方法に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of platinum plating an ion exchange membrane used for obtaining oxygen gas and hydrogen gas by electrolyzing water.
【0002】水そのものは電気を通しにくいので、従来
は水酸化ナトリウム溶液や水酸化カリウム溶液等の電解
質溶液中に電極を入れて直流電流を流して電気分解を行
っていたが、近年イオン交換膜の進歩に伴って、イオン
交換膜内を水素イオンが移動する性質を応用して、イオ
ン交換膜によって水を直接電気分解しようとするもので
ある。[0002] Since water itself is difficult to conduct electricity, conventionally, electrolysis was carried out by placing an electrode in an electrolyte solution such as a sodium hydroxide solution or a potassium hydroxide solution and passing a direct current thereto. With the progress of the technology, water is directly electrolyzed by the ion exchange membrane by utilizing the property that hydrogen ions move in the ion exchange membrane.
【0003】[0003]
【従来の技術】イオン交換膜面上に白金薄膜を形成させ
るのに、調整された白金触媒微粒子を結着材でフィルム
に形成後、熱で圧着させる方法があるが、層の厚みが2
0〜50μmとなり、付着力が弱く、また、電気抵抗が
高くオーム損失が大きい欠点があった。2. Description of the Related Art In order to form a platinum thin film on the surface of an ion exchange membrane, there is a method in which prepared platinum catalyst fine particles are formed into a film with a binder and then pressure-bonded by heat.
0 to 50 [mu] m, the adhesive force was weak, and the electrical resistance was high and the ohmic loss was large.
【0004】本願発明者は、前記欠点を含めて改善する
ために、イオン交換膜に直接白金めっきをする方法とし
て、先に特許出願(特願平8−206476号)を行っ
た。The inventor of the present invention has previously filed a patent application (Japanese Patent Application No. 8-206476) as a method of directly plating platinum on an ion-exchange membrane in order to improve the above-mentioned disadvantages.
【0005】この方法では、白金めっきが極めて薄く、
密着性も紫外線照射エッチングによって良好で、表面電
気抵抗も数百Ω/cmとなり、減少した。In this method, platinum plating is extremely thin,
The adhesion was also good by the ultraviolet irradiation etching, and the surface electric resistance was reduced to several hundred Ω / cm.
【0006】しかし、新たな改善すべき課題として、白
金めっきが両面同時になされる方法であったので、両面
が同程度の均質につけるのに、技術的熟練を要し、ま
た、白金めっきはイオン交換膜の全表面に付着するが、
水電気分解装置において、前記イオン交換膜は電気絶縁
枠に取り付けられるが、実際に水と接触し、電気分解と
関係する面は、電気絶縁枠内の面であり、この部分にの
み白金めっきが必要で枠部分は無駄となり、高価な材料
なので、経済上問題である等の不具合があった。However, as a new problem to be improved, platinum plating is a method in which both surfaces are simultaneously formed. Therefore, technical skills are required to obtain uniform plating on both surfaces, and platinum plating is an ion-implanting method. Adheres to the entire surface of the exchange membrane,
In the water electrolyzer, the ion exchange membrane is attached to an electric insulating frame, but a surface that actually contacts water and is related to electrolysis is a surface in the electric insulating frame, and platinum plating is applied only to this portion. Since the necessary frame portion is wasted and is an expensive material, there are disadvantages such as an economic problem.
【0007】[0007]
【発明が解決しようとする課題】水を電気分解して、酸
素・水素ガスを得るのに用いるイオン交換膜への白金め
っき方法に関する解決しようとする課題は、下記の通り
である。イオン交換膜面に直接めっきをする方法で表面
電気抵抗を数Ω以下/cmでオーム損失を小さくする目
標。The problems to be solved with respect to the method of platinum plating an ion exchange membrane used for obtaining oxygen / hydrogen gas by electrolyzing water are as follows. The goal is to reduce the ohmic loss with a surface electrical resistance of several ohms / cm or less by plating directly on the ion exchange membrane surface.
【0008】表・裏めっきが同程度のめっき厚で同程度
の表面電気抵抗に付着を可能とする目標。[0008] The goal is to allow the front and back plating to adhere to the same surface electrical resistance with the same plating thickness.
【0009】めっき面積は必要とされる面のみにめっき
を可能とし、めっきに関わる経済性を向上させる目標。[0009] A plating area is a goal of enabling plating only on a required surface and improving the economical efficiency relating to plating.
【0010】以上、記載した内容は、イオン交換膜に対
しての付着力が強く、且つポーラスなめっき方法の開発
に求められる課題である。[0010] The contents described above are issues required for the development of a porous plating method which has a strong adhesion to an ion exchange membrane and is porous.
【0011】[0011]
【課題を解決するための手段】上記の目的を達成するた
めに、本発明のイオン交換膜の両面に有効な白金めっき
を施す方法として、水の電気分解に用いるイオン交換膜
の白金めっき方法に関するもので、(a)最初に、イオ
ン交換膜8をサンドブラストや微粒研磨材を用いて粗面
処理後、純水沸騰液中での熱水処理をし、(b)第2
に、塩化錫(SnCl2)溶液中での感受性処理をし、
(c)第3に、塩化パラジウム(PdCl2)溶液中での
活性化処理をし、(d)第4に、塩化錫溶液中での感受
性処理→塩化パラジウム溶液中での活性化処理の手順を
2〜3回繰り返した後、(e)第5に、ヒドラジン一水
和物(H2NNH2・H2O)溶液中での還元処理後、 透
明性の上蓋状めっきセル4、試料台2、締めつけ具5よ
りなる浸漬セル型めっき装置1を用い、試料台2上に還
元処理後のイオン交換膜8を載せ、その上に上蓋状めっ
きセル4をかぶせ、締めつけ具5で試料台2と上蓋状め
っきセル4を締め合わせ、 上蓋状めっきセル4に設け
た注液口6より塩化白金酸(H2PtCl6)溶液13を
注ぎ、イオン交換膜8が上蓋状めっきセル4の水平底面
をなし、その上に前記塩化白金酸溶液13が静止状態で
堆積した状態を保って、上蓋状めっきセル4の外部より
めっき面の観察を可能とし、白金めっきすることを特徴
とするイオン交換膜への白金めっき方法。In order to achieve the above-mentioned object, the present invention relates to a method for applying effective platinum plating to both surfaces of an ion-exchange membrane according to the present invention. (A) First, the ion-exchange membrane 8 is roughened using sandblasting or a fine abrasive, and then treated with hot water in a boiling pure water solution.
And then subjected to a sensitivity treatment in a tin chloride (SnCl 2 ) solution,
(C) Thirdly, an activation treatment in a palladium chloride (PdCl 2 ) solution, and (d) fourthly, a sensitivity treatment in a tin chloride solution → an activation treatment procedure in a palladium chloride solution (E) Fifth, after a reduction treatment in a hydrazine monohydrate (H 2 NNH 2 .H 2 O) solution, a transparent top lid plating cell 4, a sample stage 2. Using the immersion cell type plating apparatus 1 composed of the clamp 5, the ion exchange membrane 8 after the reduction treatment is placed on the sample table 2, the upper lid-like plating cell 4 is covered thereon, and the sample table 2 is clamped with the clamp 5. And the upper lid-shaped plating cell 4 are tightened. A chloroplatinic acid (H 2 PtCl 6 ) solution 13 is poured from a liquid inlet 6 provided in the upper lid-shaped plating cell 4. And the state in which the chloroplatinic acid solution 13 is deposited in a stationary state I, to allow the observation of the plated surface from the outside of the upper cover-like plating cell 4, platinum plating method to the ion-exchange membrane, characterized in that the platinum plating.
【0012】[0012]
(イ)めっきの付着性を良好にするために、イオン交換
膜表面の粗面化を行うが、一般には金属表面の錆落とし
に使用するサンドブラストを用い、微細なガラスビーズ
を3〜5kgf/cm2 の圧力で、20〜30cm離れ
た位置から吹き付け、透明な膜が摺りガラス状の不透明
な状態になるよう1〜2分吹き付けるか或いは微粒研磨
材を用いて研磨板上に研磨材を撒き、イオン交換膜をそ
の上に置き、平板を重ねて動かし、イオン交換膜を粗面
化するが、簡易的には研磨材入りの洗剤をスポンジにつ
けて、表面を万遍なく軽く擦って表面を研磨粗面化する
ことも可能、イオン交換膜の両面に白金めっきをする場
合は、この粗面化を両面に施す必要があり、研磨後は洗
剤を用いて両面をよく洗浄、水洗いをする。(A) In order to improve the adhesion of plating, the surface of the ion exchange membrane is roughened. In general, sandblast used for removing rust on the metal surface is used, and fine glass beads are used at 3 to 5 kgf / cm. At a pressure of 2 , spray from a distance of 20 to 30 cm, spray the abrasive on the polishing plate using a fine abrasive or spray for 1 to 2 minutes so that the transparent film becomes a ground glass opaque state, Place the ion-exchange membrane on top of it, move the flat plates together to roughen the ion-exchange membrane, but simply apply a detergent containing abrasive to the sponge and rub the surface evenly and lightly to polish the surface. If platinum plating is performed on both surfaces of the ion exchange membrane, it is necessary to perform the surface roughening. After polishing, both surfaces are thoroughly washed with a detergent and washed with water.
【0013】(ロ)次いで、沸騰浴中に1〜2時間浸没
させ、煮沸してイオン交換膜中に内包する不純物を排出
させる。(B) Next, it is immersed in a boiling bath for 1 to 2 hours, and boiled to discharge impurities contained in the ion exchange membrane.
【0014】(ハ)次いで、塩化錫(SnCl2)溶液
に浸漬させ、 ポンプで循環途中にフィルターを設け
て、溶液中に生じる不純物を常に除去する方法を取り、
その後浴中より引き上げ水洗する。(C) Then, a method is adopted in which the filter is immersed in a tin chloride (SnCl 2 ) solution and a filter is provided in the middle of the circulation by a pump to constantly remove impurities generated in the solution.
Then, withdraw from the bath and wash.
【0015】(ニ)次いで、塩化パラジウム(PdC
l2)溶液に浸漬させ、ポンプで循環、途中にフィルタ
ーを設けて溶液中に生じる不純物を常に除去する方法を
取り、その後、浴中より引き上げ水洗する。(D) Next, palladium chloride (PdC)
l 2 ) It is immersed in a solution, circulated by a pump, and provided with a filter in the middle to constantly remove impurities generated in the solution.
【0016】(ホ)前記の塩化錫溶液浸漬→水洗→塩化
パラジウム溶液浸漬→水洗の工程を2〜3回繰り返して
イオン交換膜にパラジウムを付着させる。(E) The above steps of immersion in a tin chloride solution, washing with water, immersing in a palladium chloride solution, and washing with water are repeated two or three times to deposit palladium on the ion exchange membrane.
【0017】(ヘ)次いで、 還元剤としてのヒドラジ
ン一水和物(H2NNH2・H2O)溶液中に浸漬し、マ
グネットスタラーによる攪拌子の回転で、混合、濃度の
均一化を保つようにし、所要時間浸漬後液中より引き上
げ水洗する。(F) Next, the sample is immersed in a hydrazine monohydrate (H 2 NNH 2 .H 2 O) solution as a reducing agent, and the mixture is stirred and the concentration is made uniform by rotating a stirrer with a magnetic stirrer. After the immersion for a required time, pull up from the liquid and wash with water.
【0018】(ト)浸漬セル型めっき装置1の試料台2
に載せ、試料台2は塩化ビニル等のプラスチック製の平
板でその上面に平板パッキン3を敷いてあり、パッキン
材としてシリコンゴム、バイトンゴム等を用い、一方浸
漬セル型めっき装置1は試料台2、透明性上蓋状めっき
セル4、締めつけ具5より構成され、透明性上蓋状めっ
きセル4は箱形又は茶筒状の上蓋形状で塩化ビニル等プ
ラスチック製で底部の縁にはパッキン材3が張り付けて
あり、上面は透明な材料を用い、観察を可能とし、ま
た、上面には注液口6、エアー抜き7を設け、試料台2
に置かれたイオン交換膜8の上に、前記透明性上蓋状め
っきセル4をかぶせ、該透明性上蓋状めっきセル4を試
料台2に対し、締めつけ具5で圧着固定、締めつけ具5
は試料台2に対し、めっきセル4を圧着固定できるもの
ならどのような方法でも良く、ねじの利用、バネの利
用、エアー圧の利用等が考えられるが、図1では、ねじ
9を利用し、L型金具を用いて蝶ナット11を締め付け
ることにより、めっきセル4を試料台2に押しつけ圧着
固定している一例である。(G) Sample table 2 of immersion cell type plating apparatus 1
The sample stage 2 is a flat plate made of plastic such as vinyl chloride, and a flat packing 3 is laid on the upper surface thereof. Silicon rubber, viton rubber, or the like is used as a packing material. The transparent upper-plated plating cell 4 comprises a transparent upper lid-shaped plating cell 4 and a fastening tool 5. The transparent upper-lid-shaped plating cell 4 is a box-shaped or tea-tube-shaped upper lid-shaped plastic made of vinyl chloride or the like. The upper surface is made of a transparent material to enable observation. The upper surface is provided with a liquid inlet 6 and an air vent 7, and
The transparent top lid-like plating cell 4 is covered on the ion exchange membrane 8 placed on the sample table 2, and the transparent top lid-like plating cell 4 is fixed to the sample table 2 by press-fitting with a fastening tool 5.
Any method may be used as long as the plating cell 4 can be fixed to the sample table 2 by pressure bonding. Use of a screw, use of a spring, use of air pressure, or the like is considered. In FIG. This is an example in which the wing nut 11 is tightened using an L-shaped fitting to press the plating cell 4 against the sample table 2 and fix it by pressure bonding.
【0019】(チ)注液口6にロート12を取り付け
て、塩化白金酸溶液13を所要液位入れ、放置、イオン
交換膜8面上に小さな泡(水素ガス)の発生が見られ、
白金がめっきされて表面が白金色に変わって行くのが観
察でき、注入初期の塩化白金酸溶液13は黄色をしてい
るが、白金めっきの進行に伴って、色が消えてやがて無
色になり、白金めっきの終了を示し、この時点で浸漬セ
ル型めっき装置を傾けてエアー抜き7より排液し、締め
つけ具5を緩めてめっきセル4を外し、白金めっきされ
たイオン交換膜8を試料台2より取り外し、めっき面を
スポンジで軽くこすりながら水洗いをする。(H) A funnel 12 is attached to the injection port 6, a chloroplatinic acid solution 13 is charged at a required liquid level, and left, and small bubbles (hydrogen gas) are generated on the surface of the ion exchange membrane 8.
It can be observed that the platinum is plated and the surface changes to a platinum color. The chloroplatinic acid solution 13 in the initial stage of the injection is yellow, but with the progress of the platinum plating, the color disappears and eventually becomes colorless. At this point, the immersion cell type plating apparatus was tilted, drained from the air vent 7, the fastener 5 was loosened, the plating cell 4 was removed, and the platinum-plated ion exchange membrane 8 was placed on the sample stage. Remove from 2 and wash with water while gently rubbing the plating surface with a sponge.
【0020】(リ)めっき面の表面抵抗を測定し、所要
値内であればめっきは終了する。(I) The surface resistance of the plated surface is measured, and if it is within the required value, the plating is completed.
【0021】(ヌ)もし、所要値に満たない場合につい
ては、再度ヒドラジン−水和物溶液に浸漬し、浸漬セル
型めっき装置での白金めっきの工程を繰り返し、所要値
になるようにする。(V) If the value is less than the required value, the substrate is immersed again in a hydrazine-hydrate solution, and the platinum plating process is repeated with an immersion cell type plating apparatus to obtain the required value.
【0022】(ル)以上は片面についての白金めっきの
工程であるが、両面に白金めっきをつける場合について
も同様にヒドラジン−水和物溶液に浸漬後、水洗いし、
白金めっきされない面を上にして試料台2に載せ、めっ
きセル4を取り付けて後、塩化白金酸溶液13を所要液
位入れ、白金めっきを行い、その後の工程は上記(チ)
〜(ヌ)の通りである。(L) The above is the step of platinum plating on one side. In the case of plating platinum on both sides, similarly, after immersing in a hydrazine-hydrate solution, washing with water,
The platinum-plated surface is placed on the sample stand 2 with the surface not plated with platinum facing up, the plating cell 4 is attached, the required level of the chloroplatinic acid solution 13 is charged, and platinum plating is carried out.
-(Nu).
【0023】[0023]
【発明の効果】本発明は、以上説明したような形態で実
施され、以下に記載されるような効果を奏する。The present invention is embodied in the form described above and has the following effects.
【0024】本発明によれば、イオン交換膜の前処理の
粗面化が白金めっきの付着力の向上に寄与するところ大
で、その効果の判定は「めっきの密着性試験方法」(J
ISH 8504)に記載の「テープ試験方法」によっ
て、白金めっきの密着性を調べたところ、めっきが剥が
れることなく密着性が良いことが判った。According to the present invention, the roughening of the pretreatment of the ion-exchange membrane contributes to the improvement of the adhesion of the platinum plating, and its effect is judged by the "plating adhesion test method" (J
When the adhesion of platinum plating was examined by the “tape test method” described in ISH8504), it was found that the adhesion was good without peeling of the plating.
【0025】また、従来方法では両面同時に白金めっき
できる時間的省力化がある反面、同性能にめっき仕上げ
をするのに技術的熟練を要した。In the conventional method, although platinum plating can be performed simultaneously on both surfaces, there is a time saving, but technical skill is required to finish plating with the same performance.
【0026】これに対し、本発明では片面ずつ白金めっ
きし、且つ所要性能に至るまで再めっきを繰り返すこと
ができるので、両面の性能を揃えることは極めて簡単と
なった。On the other hand, in the present invention, platinum plating can be performed on one side at a time, and replating can be repeated until the required performance is reached. Therefore, it is extremely easy to make the performances on both sides uniform.
【0027】また、イオン交換膜に白金めっきされる面
積はめっきセルの枠内寸法で決定され、この寸法、面積
を水電気分解装置の電気絶縁枠の内枠寸法と合わせれ
ば、希望の所要面積のみ白金めっきすることは容易で、
無駄な部分への白金めっきはなくなり、白金めっきの経
済効率を向上させるのに役立った。The area of the ion-exchange membrane to be plated with platinum is determined by the dimensions of the plating cell, and if this dimension and area are combined with the dimensions of the electric insulation frame of the water electrolyzer, the desired required area can be obtained. Only platinum plating is easy,
Platinum plating on unnecessary parts has been eliminated, which has helped to improve the economic efficiency of platinum plating.
【0028】白金めっき工程を繰り返して表面抵抗を数
Ω/cm以下という低い抵抗値にすることが可能にな
り、また、粗面比によって白金めっきの付着表面積も増
大したので、水電解セルを組み立てた時のオーム損失は
極めて小さくなり、大電流を流してもその発熱量は少な
くすることができた。装置に組込み、実際に用いられる
状況下での耐久性を求めたところ、ガス発生によってめ
っき膜が剥がれることもなく、オーム損失の増大も90
00時間まで認められなかった。By repeating the platinum plating step, the surface resistance can be reduced to a low resistance value of several Ω / cm or less, and the surface area of the platinum plating increases due to the rough surface ratio. The ohmic loss at the time of heating became extremely small, and even when a large current was passed, the calorific value could be reduced. When it was incorporated into the apparatus and the durability under actual use conditions was determined, the plating film did not peel off due to gas generation, and the increase in ohmic loss was 90%.
Not detected until 00 hours.
【図1】浸漬セル型めっき装置の実施例を示す縦断面
図。FIG. 1 is a longitudinal sectional view showing an embodiment of an immersion cell type plating apparatus.
1 浸漬セル型めっき装置 2 試料台 3 パッキン 4 上蓋状めっきセル 5 締めつけ具 6 注液口 7 エアー抜き 8 イオン交換膜 9 ねじ 10 L型金具 11 蝶ナット 12 ロート 13 塩化白金酸溶液 DESCRIPTION OF SYMBOLS 1 Immersion cell type plating apparatus 2 Specimen stand 3 Packing 4 Top-plated plating cell 5 Clamping tool 6 Injection port 7 Air release 8 Ion exchange membrane 9 Screw 10 L-shaped fitting 11 Wing nut 12 Funnel 13 Chloroplatinic acid solution
───────────────────────────────────────────────────── フロントページの続き (72)発明者 谷口 皓一 東京都新宿区新宿5丁目4番14号 スガ 試験機株式会社内 審査官 木村 孔一 (58)調査した分野(Int.Cl.6,DB名) C23C 18/00 - 18/54 ──────────────────────────────────────────────────続 き Continuing on the front page (72) Inventor Koichi Taniguchi 5-4-1-14 Shinjuku, Shinjuku-ku, Tokyo Suga Test Equipment Co., Ltd. Examiner Koichi Kimura (58) Field surveyed (Int. Cl. 6 , DB Name) C23C 18/00-18/54
Claims (1)
金めっき方法に関するもので、(a)最初に、イオン交
換膜8をサンドブラストや微粒研磨材を用いて粗面処理
後、純水沸騰液中での熱水処理をし、(b)第2に、塩
化錫(SnCl2)溶液中での感受性処理をし、 (c)
第3に、塩化パラジウム(PdCl2)溶液中での活性化
処理をし、(d)第4に、塩化錫溶液中での感受性処理
→塩化パラジウム溶液中での活性化処理の手順を2〜3
回繰り返した後、(e)第5に、ヒドラジン一水和物
(H2NNH2・H2O)溶液中での還元処理後、 透明性
の上蓋状めっきセル4、試料台2、締めつけ具5よりな
る浸漬セル型めっき装置1を用い、試料台2上に還元処
理後のイオン交換膜8を載せ、その上に上蓋状めっきセ
ル4に設けた注液口6より塩化白金酸(H2PtCl6)
溶液を注ぎ、 イオン交換膜8が上蓋状めっきセル4の
水平底面をなし、その上に前記塩化白金酸溶液13が静
止状態で堆積した状態を保って、上蓋状めっきセル4の
外部よりめっき面の観察を可能とし、白金めっきするこ
とを特徴とするイオン交換膜への白金めっき方法。The present invention relates to a method of platinum plating an ion-exchange membrane used for electrolysis of water. (A) First, after roughening the ion-exchange membrane 8 using sandblasting or fine abrasive, a pure water boiling liquid is obtained. (B) secondly, a sensitizing treatment in a tin chloride (SnCl 2 ) solution, and (c)
Third, an activation treatment is performed in a palladium chloride (PdCl 2 ) solution. (D) Fourth, a sensitizing treatment in a tin chloride solution → the activation treatment in a palladium chloride solution is performed in two steps. 3
(E) Fifth, after a reduction treatment in a hydrazine monohydrate (H 2 NNH 2 .H 2 O) solution, a transparent top lid-shaped plating cell 4, a sample table 2, and a fastening tool The ion-exchange membrane 8 after the reduction treatment is placed on the sample stage 2 by using the immersion cell type plating apparatus 1 composed of chloroplatinic acid (H 2). PtCl 6 )
The solution is poured, and the ion exchange membrane 8 forms the horizontal bottom surface of the upper lid-shaped plating cell 4, and the chloroplatinic acid solution 13 is kept stationary on the ion exchange membrane 8. Platinum plating method for ion-exchange membrane, characterized in that platinum plating is possible.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8294383A JP2974627B2 (en) | 1996-10-16 | 1996-10-16 | Platinum plating method for ion exchange membrane |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8294383A JP2974627B2 (en) | 1996-10-16 | 1996-10-16 | Platinum plating method for ion exchange membrane |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH10121258A JPH10121258A (en) | 1998-05-12 |
| JP2974627B2 true JP2974627B2 (en) | 1999-11-10 |
Family
ID=17807022
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8294383A Expired - Fee Related JP2974627B2 (en) | 1996-10-16 | 1996-10-16 | Platinum plating method for ion exchange membrane |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2974627B2 (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008101260A (en) * | 2006-10-20 | 2008-05-01 | Osaka Prefecture Univ | Conductive fine particles and method for producing the same |
| CN103909038B (en) * | 2013-01-07 | 2017-06-13 | 通用电气公司 | Dip coating apparatus and the method that electrode is prepared using the device |
| JP7162214B2 (en) * | 2018-11-30 | 2022-10-28 | ダイハツ工業株式会社 | Electrolyte layer manufacturing method |
-
1996
- 1996-10-16 JP JP8294383A patent/JP2974627B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH10121258A (en) | 1998-05-12 |
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