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JP3022458B2 - Platinum plating method for ion exchange membrane - Google Patents
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JP3022458B2 - Platinum plating method for ion exchange membrane - Google Patents

Platinum plating method for ion exchange membrane

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Publication number
JP3022458B2
JP3022458B2 JP9352432A JP35243297A JP3022458B2 JP 3022458 B2 JP3022458 B2 JP 3022458B2 JP 9352432 A JP9352432 A JP 9352432A JP 35243297 A JP35243297 A JP 35243297A JP 3022458 B2 JP3022458 B2 JP 3022458B2
Authority
JP
Japan
Prior art keywords
exchange membrane
platinum
ion exchange
plating
ion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP9352432A
Other languages
Japanese (ja)
Other versions
JPH11172458A (en
Inventor
長市 須賀
冨士夫 須賀
洋二 渡辺
皓一 谷口
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Suga Test Instruments Co Ltd
Original Assignee
Suga Test Instruments Co Ltd
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Filing date
Publication date
Application filed by Suga Test Instruments Co Ltd filed Critical Suga Test Instruments Co Ltd
Priority to JP9352432A priority Critical patent/JP3022458B2/en
Publication of JPH11172458A publication Critical patent/JPH11172458A/en
Application granted granted Critical
Publication of JP3022458B2 publication Critical patent/JP3022458B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、水の電気分解によ
る水素・酸素発生装置又は水の電気分解によるオゾン発
生装置に用いるイオン交換膜への白金めっき方法に関す
るものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for plating platinum on an ion exchange membrane used in a hydrogen / oxygen generator by electrolysis of water or an ozone generator by electrolysis of water.

【0002】[0002]

【従来の技術】イオン交換膜面上に白金薄膜を形成させ
るのに、調整された白金触媒微粒子を結着材でフィルム
に形成後、熱で圧着させる方法があるが、層の厚みが2
0〜50μmとなり、付着力が弱く電気抵抗大でオーム
損失が大きい欠点がある。
2. Description of the Related Art In order to form a platinum thin film on the surface of an ion exchange membrane, there is a method in which prepared platinum catalyst fine particles are formed into a film with a binder and then pressure-bonded by heat.
0 to 50 μm, and there is a defect that adhesion is weak, electric resistance is large, and ohmic loss is large.

【0003】そこで、イオン交換膜上に直接白金めっき
をすることはできないので、パラジウムや白金触媒がイ
オン交換膜上に存在することが必要である。従って、イ
オン交換膜に塩化錫溶液中で感受性処理をし、次いで塩
化パラジウム溶液中で活性化処理をし、更にヒドラジン
一水和物溶液中で還元処理をした後、塩化白金酸溶液中
で無電解白金めっきをする方法がある(特願平8−29
4383号)。この場合、膜中に残るパラジウムがオゾ
ン発生装置ではオゾン発生の障害となり、発生濃度を著
しく低下させる欠点がある。また、イオン交換膜面の表
面電気抵抗が約5×10-3Ωcm程度でそれ以下は困難
であった。
[0003] Therefore, since platinum plating cannot be performed directly on an ion exchange membrane, palladium or a platinum catalyst must be present on the ion exchange membrane. Therefore, the ion-exchange membrane is subjected to a sensitizing treatment in a tin chloride solution, an activation treatment in a palladium chloride solution, a reduction treatment in a hydrazine monohydrate solution, and then a non-treatment in a chloroplatinic acid solution. There is a method of electroplating platinum (Japanese Patent Application No. 8-29)
No. 4383). In this case, the palladium remaining in the film becomes a hindrance to ozone generation in the ozone generator, and has a drawback that the generated concentration is significantly reduced. Further, the surface electric resistance of the ion-exchange membrane surface was about 5 × 10 −3 Ωcm, which was difficult.

【0004】[0004]

【発明が解決しようとする課題】本発明の課題は、イオ
ン交換膜に白金めっきをし、表面電気抵抗を5×10
−5 Ωcm以下とし、オーム損失を小さくすると同時に
パラジウム等の異質金属によるオゾン発生の障害を防い
で発生能力の高いイオン交換膜を作ることを目的とす
SUMMARY OF THE INVENTION An object of the present invention is to provide an ion-exchange membrane with a platinum plating and a surface electric resistance of 5 × 10
The purpose is to produce an ion exchange membrane having a high generation ability by reducing the ohmic loss to -5 Ωcm or less, and at the same time, preventing the obstruction of ozone generation by foreign metals such as palladium .
You .

【0005】また表・裏めっきが同程度のめっき層で同
程度の表面電気抵抗に付着を可能とすることを目的とす
る。
Another object of the present invention is to make it possible to attach the same surface electric resistance to the same surface layer with the same plating layer for the front and back plating .
You.

【0006】さらにめっき面積は必要とされる面のみに
めっきを可能とし、めっきに関わる経済性を向上させる
ことである
[0006] Further, the plating area allows plating only on the required surface, thereby improving the economics involved in plating.
That is .

【0007】[0007]

【課題を解決するための手段】上記の目的を達成するた
めに、本発明のイオン交換膜の有効な白金めっきを施す
方法として、(a)最初に、イオン交換膜をサンドブラ
ストや微粒研磨材を用いて粗面処理後、純水沸騰液中で
の熱水処理をし、(b)第2に、乾燥後、スパッタリン
グ装置で真空容器内を所定の真空度に到着後、アルゴン
ガスを真空容器内に導入し、圧力を10-1Pa近傍にし、
白金ターゲットとイオン交換膜を載せた基板との間でグ
ロー放電を発生させ、アルゴン陽イオンを加速し、白金
ターゲットに衝突させ、スパッタリングを起こし、ター
ゲットから放出された白金原子をこれに対向して位置す
る基板上のイオン交換膜に付着させて薄膜を作り、
(c)第3に、白金蒸着後のイオン交換膜は純水温水中
で熱処理をし、(d)第4に、ヒドラジン一水和物(H
2NNH2・H2O)溶液中での還元剤処理後、 (e)第
5に、めっき枠、試料台、締め付け具よりなる浸漬セル
型めっき装置を用い、試料台上に還元剤処理後のイオン
交換膜を載せ、その上にめっき枠を載せて締め付け具で
試料台に固定、 この枠内のイオン交換膜面に塩化白金
酸(H2PtCl6)溶液を注ぎ、イオン交換膜を水平底
面となし、その上に前記塩化白金酸溶液が静止状態で堆
積した状態を保って、イオン交換膜への白金めっきする
ことを特徴とするイオン交換膜への白金めっき方法。
In order to achieve the above-mentioned object, the present invention provides a method for applying an effective platinum plating to an ion-exchange membrane by (a) first forming the ion-exchange membrane by sandblasting or a fine abrasive. After the rough surface treatment, a hot water treatment in a boiling pure water solution is performed. (B) Secondly, after drying, the inside of the vacuum vessel reaches a predetermined degree of vacuum with a sputtering device, and then argon gas is supplied to the vacuum vessel. And the pressure is brought to around 10 -1 Pa,
A glow discharge is generated between the platinum target and the substrate on which the ion-exchange membrane is mounted, and argon cations are accelerated, collide with the platinum target, cause sputtering, and the platinum atoms released from the target are opposed to this. Make a thin film by attaching it to the ion exchange membrane on the substrate
(C) Third, the ion-exchange membrane after platinum deposition is heat-treated in pure water and hot water, and (d) fourth, hydrazine monohydrate (H
After the reducing agent treatment with 2 NNH 2 · H 2 O) solution, (e) Fifth, plating frame, the sample stage, using the immersion cell type plating apparatus consisting fastener, after the reducing agent treatment on the sample stage Is placed on the ion exchange membrane, and the plating frame is placed on it and fixed to the sample table with the fastener. The chloroplatinic acid (H 2 PtCl 6 ) solution is poured on the ion exchange membrane surface in this frame, and the ion exchange membrane is leveled. A platinum plating method for an ion-exchange membrane, characterized in that platinum is applied to an ion-exchange membrane while maintaining a state in which the chloroplatinic acid solution is deposited in a stationary state on a bottom surface.

【0008】[0008]

【発明の実施の形態】(イ)めっきの付着性を良好にす
るために、イオン交換膜表面の粗面化を行うが、一般に
金属表面の錆落としに使用するサンドブラストを用い、
微細なガラスビーズを3〜5kgf/cm2 の圧力で、
20〜30cm離れた位置から吹き付け、透明な膜が摺
りガラス状の不透明な状態になるよう1〜2分間吹き付
けるか或いは微粉研磨材を用いて研磨板上に研磨材を撒
き、イオン交換膜2をその上に置いて平板を重ねて動か
し、イオン交換膜を粗面化するが、簡易的には研磨材入
りの洗剤をスポンジにつけて、表面を万遍なく軽く擦っ
て表面を研磨粗面化することも可能、研磨後は洗剤を用
いてよく洗浄、水洗いをする。
DESCRIPTION OF THE PREFERRED EMBODIMENTS (a) In order to improve the adhesion of plating, the surface of an ion exchange membrane is roughened, and sand blasting, which is generally used for removing rust on metal surfaces, is used.
Fine glass beads at a pressure of 3-5 kgf / cm 2 ,
Spray from a position 20 to 30 cm away, spray for 1 to 2 minutes so that the transparent film becomes frosted glass-like opaque state, or scatter the abrasive on the polishing plate using fine abrasive, Place the plate on top of it and move it to roughen the ion exchange membrane, but simply put a detergent containing abrasives on the sponge and rub the surface evenly and lightly to roughen the surface. After polishing, it can be washed well with detergent and washed with water.

【0009】(ロ)次いで、純水沸騰浴中に1〜2時間
浸没させ、煮沸してイオン交換膜中に内包する不純物を
排出させる。
(B) Next, it is immersed in a pure water boiling bath for 1 to 2 hours, and boiled to discharge impurities contained in the ion exchange membrane.

【0010】(ハ)煮沸後はイオン交換膜2の水分を吸
取紙等で抜き取り自然乾燥する。
(C) After boiling, the moisture of the ion exchange membrane 2 is extracted with a blotting paper or the like and air-dried.

【0011】(ニ)乾燥後のイオン交換膜2をスパッタ
リング装置の真空容器内基板上に置く。真空ポンプを作
動し、真空度を10-3〜10-4Paの間に到着したら、ア
ルゴンガスを真空容器内に導入し、圧力を10-1Pa近傍
に保持し、白金ターゲットと基板との間にグロー放電を
開始、アルゴン陽イオンを加速させる。加速したアルゴ
ン陽イオンは白金ターゲットに衝突して、スパッタリン
グを起こし、ターゲットから白金原子を放出させ、基板
上のイオン交換膜に付着させて白金薄膜を作り、0.0
5〜0.2mg/cm2の付着量とする。
(D) The dried ion-exchange membrane 2 is placed on a substrate in a vacuum chamber of a sputtering apparatus. Activate the vacuum pump, and when the degree of vacuum arrives between 10 -3 and 10 -4 Pa, introduce argon gas into the vacuum vessel, keep the pressure near 10 -1 Pa, and maintain the pressure between the platinum target and the substrate. Glow discharge is started during that time to accelerate argon cations. The accelerated argon cation collides with a platinum target, causing sputtering, releasing platinum atoms from the target, and attaching it to an ion exchange film on a substrate to form a platinum thin film.
The adhesion amount is 5 to 0.2 mg / cm 2 .

【0012】(ホ)白金蒸着後のイオン交換膜は純水温
水中で熱処理を施し、無電解めっきのために水分を充分
に吸った状態に戻す。
(E) The ion-exchange membrane after the platinum deposition is subjected to a heat treatment in pure water and hot water to return to a state in which moisture is sufficiently absorbed for electroless plating.

【0013】(ヘ) 還元剤としてヒドラジン一水和物
(H2NNH2・H2O)溶液中に浸漬し、溶液の濃度が
均一化を保つようにマグネットスターラによる攪拌子の
回転で溶液を攪拌し、所要時間浸漬後液中より引き上げ
水洗する。
[0013] The (f) Hydrazine monohydrate as a reducing agent (H 2 NNH 2 · H 2 O) was immersed in the solution, the solution in the rotation of the stirrer by magnetic stirrer so that the concentration of the solution keeping the uniform After stirring and immersing for a required time, it is pulled out of the liquid and washed with water.

【0014】(ト)浸漬セル型めっき装置1の試料台4
に、上記(ヘ)処理後のイオン交換膜2を載せる。試料
台4は塩化ビニル等のプラスチック製平板でその上面に
平板パッキンが敷いてあり、パッキン材としてシリコン
ゴム、バイドンゴム等を用いてある。イオン交換膜2の
上にめっき枠3を載せて、締め付け具5によってめっき
枠3を試料台4に固定する。めっき枠3は塩化ビニル等
のプラスチック製で四角形の枠形で枠の底部縁には、パ
ッキン材が張り付けてある。締め付け具5は試料台4に
対し、めっき枠3がイオン交換膜2を挟んで固定できる
ものならどのような方法でもよい。図1では、ねじ8を
利用してL型金具9を用いて蝶ナット10を締め付ける
ことにより、めっき枠3を試料台4に押しつけ固定して
いる一例である。
(G) Sample table 4 of immersion cell type plating apparatus 1
Then, the ion-exchange membrane 2 after the treatment (f) is placed thereon. The sample stage 4 is a flat plate made of plastic such as vinyl chloride, and a flat plate packing is laid on an upper surface thereof. Silicon rubber, vidone rubber, or the like is used as a packing material. The plating frame 3 is placed on the ion exchange membrane 2, and the plating frame 3 is fixed to the sample table 4 by the fastener 5. The plating frame 3 is made of plastic such as vinyl chloride and has a rectangular frame shape, and a packing material is adhered to a bottom edge of the frame. The fastening tool 5 may be any method as long as the plating frame 3 can be fixed to the sample table 4 with the ion exchange membrane 2 interposed therebetween. FIG. 1 shows an example in which a plating frame 3 is pressed and fixed to a sample table 4 by tightening a wing nut 10 using an L-shaped bracket 9 using a screw 8.

【0015】(チ)塩化白金酸溶液を所要量めっき枠内
のイオン交換膜2に注入し放置する。イオン交換膜面に
小さな泡(水素ガス)の発生が見られ、白金がめっきさ
れて表面が白金色に変化する。白金めっきの進行に伴っ
て、溶液の色は黄色から色が消えてやがて無色透明とな
り、白金めっきの終了を示す。この時点でめっき液を排
出し、締め付け具5を緩めてめっき枠3を外し、白金め
っきされたイオン交換膜2を試料台4より取り外す。め
っき面をスポンジで軽くこすりながら水洗する。
(H) A required amount of a chloroplatinic acid solution is injected into the ion exchange membrane 2 in the plating frame and allowed to stand. Generation of small bubbles (hydrogen gas) is seen on the surface of the ion exchange membrane, and platinum is plated to change the surface to a platinum color. As the platinum plating progresses, the color of the solution disappears from yellow and eventually becomes colorless and transparent, indicating the end of the platinum plating. At this point, the plating solution is discharged, the fastener 5 is loosened, the plating frame 3 is removed, and the platinum-plated ion exchange membrane 2 is removed from the sample table 4. Rinse the plating surface lightly with a sponge.

【0016】(リ)めっき面の表面抵抗を測定し、所要
値内であればめっきは終了とする。
(I) The surface resistance of the plated surface is measured, and if it is within the required value, the plating is terminated.

【0017】(ヌ)もし、所要値に満たない場合につい
ては、再度ヒドラジン一水和物溶液に浸漬し、浸漬セル
型めっき装置での白金めっきの工程を繰り返し、所要値
になるようにする。
(V) If the value is less than the required value, the substrate is immersed again in a hydrazine monohydrate solution, and the steps of platinum plating in an immersion cell type plating apparatus are repeated to obtain the required value.

【0018】(ル)以上は片面についての白金めっき工
程であるが、両面に白金めっきをつける場合についても
同様にヒドラジン一水和物溶液に浸漬後、水洗いし、白
金めっきされてない面を上にして試料台に載せ、めっき
枠を取り付けて後、塩化白金酸溶液を枠内に所要量入
れ、白金めっきを行う。その後の工程は上記(チ)〜
(ヌ)の通りである。
(L) The above is a platinum plating process on one side. When platinum plating is performed on both surfaces, the surface is similarly immersed in a hydrazine monohydrate solution, washed with water, and the surface not subjected to platinum plating is raised. After mounting the plating frame and mounting a required amount of chloroplatinic acid solution in the frame, platinum plating is performed. Subsequent steps are the above (h)-
It is as (nu).

【0019】[0019]

【発明の効果】本発明は、以上説明したような形態で実
施され、以下に記載されるような効果を奏する。
The present invention is embodied in the form described above and has the following effects.

【0020】従来白金めっきの前処理として塩化錫溶液
中における感受性処理、次いで塩化パラジウム溶液中で
の活性化処理が必要であったが、これに代わって白金ス
パッタリングによる白金蒸着となった。これによって、
従来オゾン発生装置に用いられるイオン交換膜の場合、
その陽極側で、本来不必要な錫とかパラジウム金属がイ
オン交換膜中に残ることによる弊害が除かれた
Conventionally, as a pretreatment for platinum plating, a sensitizing treatment in a tin chloride solution and then an activation treatment in a palladium chloride solution were required. Instead, platinum deposition by platinum sputtering was performed. by this,
For ion exchange membranes conventionally used in ozone generators,
On the anode side, tin or palladium metal, which is originally unnecessary, is
The adverse effects of remaining in the on-exchange membrane were eliminated .

【0021】即ちオゾン発生装置のイオン交換膜として
、その陽極側にオゾン発生の触媒として二酸化鉛を電
着させた陽極給電体が密着接触されるが、この面に接す
イオン交換膜部分にパラジウムとか白金とかがあると
オゾン化率は極端に低下し、場合によってはオゾンが発
生しない現象が生じ、酸素のみの発生しか見られないこ
とがある。本発明によれば、白金以外の金属が入り込む
恐れがないので、この現象の心配は全くなくなった。従
って、オゾン発生効率の高いイオン交換膜が容易に作れ
るようになった。
That is , as the ion exchange membrane of the ozone generator, lead dioxide is charged on the anode side as an ozone generation catalyst.
The attached anode power feeder is in close contact with the surface, but if there is palladium or platinum in the ion exchange membrane in contact with this surface, the ozonation rate will drop extremely, and in some cases, a phenomenon in which ozone is not generated will occur. Only the occurrence may be seen. According to the present invention, there is no fear that a metal other than platinum may enter, so that there is no concern about this phenomenon. Therefore, an ion exchange membrane having high ozone generation efficiency can be easily formed.

【0022】白金膜面の表面抵抗はめっき工程を繰り返
しても約5×10−3Ωcm程度であったが、本発明に
よれば5×10−5Ωcm以下も可能であることが確認
された。 スパッタリングによる白金のイオン交換膜面
への付着ではイオン交換膜は真空容器における減圧で膜
中の水分は蒸発し、膜はその寸法を収縮した状態になっ
ている。ここに白金原子が付着するので薄い膜(0.1
μm以下)ではあるが、表面抵抗は極めて小さく、5×
10 −5 Ωcm以下の短絡状態を示す。しかし、これを
純水温湯中で熱処理をすると、イオン交換膜中に水分が
取り込まれて寸法は拡大延伸された状態となる。従っ
て、白金膜は寸断されてしまい、そのつながりを失うの
で表面抵抗は約5Ωcmとなる。しかし、この白金が基
素材となって、その後の白金めっきによって相互の結合
が再生し、且つそのめっき層も厚く成長し、表面抵抗5
×10 −5 Ωcm以下の白金膜となる。
Although the surface resistance of the platinum film surface was about 5 × 10 −3 Ωcm even when the plating process was repeated, it was confirmed that according to the present invention, the surface resistance could be 5 × 10 −5 Ωcm or less. . In the deposition of platinum on the surface of the ion exchange membrane by sputtering, the ion exchange membrane is in a state in which the moisture in the membrane evaporates due to the reduced pressure in the vacuum vessel, and the dimensions of the membrane shrink. Since platinum atoms are attached here, a thin film (0.1
μm or less), but the surface resistance is extremely small, 5 ×
It indicates a short-circuit state of 10 −5 Ωcm or less . However, when this is heat-treated in pure hot water, water is taken into the ion exchange membrane and the dimensions are expanded and stretched. Therefore, the platinum film is cut off and loses its connection, and the surface resistance becomes about 5 Ωcm. However, this platinum is used as a base material, the mutual bonding is regenerated by the subsequent platinum plating, and the plating layer also grows thick, and the surface resistance 5
It becomes a platinum film of × 10 −5 Ωcm or less .

【0023】表面抵抗が小さいので、水を電気分解する
のに流れる電流とで生じる熱損失、即ち(電流)2×抵
抗は小さくなり、 発生熱量を小さくすることができ、
消費電力は減少した。
Since the surface resistance is small, the heat loss caused by the current flowing to electrolyze the water, that is, (current) 2 × resistance is reduced, and the amount of generated heat can be reduced.
Power consumption has decreased.

【図面の簡単な説明】[Brief description of the drawings]

【図1】浸漬セル型めっき装置の実施例を示す縦断面
図。
FIG. 1 is a longitudinal sectional view showing an embodiment of an immersion cell type plating apparatus.

【符号の説明】[Explanation of symbols]

1 浸漬セル型めっき装置 2 イオン交換膜 3 めっき枠 4 試料台 5 締め付け具 6 塩化白金酸溶液 7 パッキン 8 ねじ 9 L型金具 10 蝶ナット DESCRIPTION OF SYMBOLS 1 Immersion cell type plating apparatus 2 Ion exchange membrane 3 Plating frame 4 Sample stand 5 Clamping tool 6 Chloroplatinic acid solution 7 Packing 8 Screw 9 L-shaped fitting 10 Wing nut

───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 昭58−193381(JP,A) 特開 昭58−185790(JP,A) 特開 昭58−185789(JP,A) (58)調査した分野(Int.Cl.7,DB名) C23C 18/00 - 18/54 ──────────────────────────────────────────────────続 き Continuation of the front page (56) References JP-A-58-193381 (JP, A) JP-A-58-185790 (JP, A) JP-A-58-185789 (JP, A) (58) Field (Int. Cl. 7 , DB name) C23C 18/00-18/54

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 イオン交換膜2を用いた水の電気分解に
よる水素・酸素発生装置又は水の電気分解によるオゾン
発生装置のイオン交換膜面に白金めっきを行う方法に関
するもので、(a)最初に、イオン交換膜2をサンドブ
ラストや微粒研磨材を用いて粗面処理後、純水沸騰液中
での熱水処理をし、(b)第2に、乾燥後、スパッタリ
ング装置で真空容器内を所定の真空度に到着後、アルゴ
ンガスを真空容器内に導入し、圧力を10−1Pa近傍に
し、白金ターゲットとイオン交換膜を載せた基板との間
でグロー放電を発生させ、アルゴン陽イオンを加速し、
白金ターゲットに衝突させ、スパッタリングを起こし、
ターゲットから放出された白金原子をこれに対向して位
置する基板上のイオン交換膜2に付着させて薄膜を作
り、(c)第3に、白金蒸着後のイオン交換膜2は純水
温水中で熱処理をし、 (d)第4に、ヒドラジン一水
和物(HNNH・HO)溶液中での還元剤処理
後、(e)第5に、めっき枠3、試料台4、締め付け具
5よりなる浸漬セル型めっき装置1を用い、試料台4上
に還元剤処理後のイオン交換膜2を載せ、その上にめっ
き枠3を載せて締め付け具5で試料台4に固定、この枠
内のイオン交換膜2面に塩化白金酸(HPtCl
溶液を注ぎ、 イオン交換膜2を水平底面となし、その
上に前記塩化白金酸溶液が静止状態で堆積した状態を保
って、イオン交換膜2への白金めっきすることを特徴と
するイオン交換膜への白金めっき方法。
The present invention relates to a method for performing platinum plating on the surface of an ion exchange membrane of a hydrogen / oxygen generator by electrolysis of water using an ion exchange membrane 2 or an ozone generator by electrolysis of water. The surface of the ion-exchange membrane 2 is roughened using sandblasting or fine-grain abrasive, and then subjected to hot water treatment in a boiling water of pure water. (B) Secondly, after drying, the inside of the vacuum vessel is sputtered with a sputtering device. After arriving at a predetermined degree of vacuum, an argon gas is introduced into the vacuum vessel, the pressure is set at about 10 -1 Pa, and a glow discharge is generated between the platinum target and the substrate on which the ion exchange membrane is mounted, thereby forming argon cations. Accelerate
Collision with a platinum target, causing sputtering,
The platinum atoms released from the target are attached to the ion-exchange membrane 2 on the substrate located opposite thereto to form a thin film. (C) Thirdly, the ion-exchange membrane 2 after platinum deposition is placed in pure hot water. then subjected to heat treatment, (d) fourth, after the reducing agent treatment with hydrazine monohydrate (H 2 NNH 2 · H 2 O) solution, to the 5 (e), the plating frame 3, the sample stage 4, Using the immersion cell type plating apparatus 1 including the fasteners 5, the ion exchange membrane 2 after the reducing agent treatment is placed on the sample table 4, the plating frame 3 is placed thereon, and the sample is fixed to the sample table 4 with the fasteners 5. Chloroplatinic acid (H 2 PtCl 6 ) is applied to the surface of the ion exchange membrane 2 in this frame.
A solution is poured, and the ion exchange membrane 2 is formed as a horizontal bottom surface, and the chloroplatinic acid solution is deposited on the ion exchange membrane 2 in a stationary state, and platinum plating is performed on the ion exchange membrane 2. Platinum plating method.
JP9352432A 1997-12-05 1997-12-05 Platinum plating method for ion exchange membrane Expired - Fee Related JP3022458B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9352432A JP3022458B2 (en) 1997-12-05 1997-12-05 Platinum plating method for ion exchange membrane

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9352432A JP3022458B2 (en) 1997-12-05 1997-12-05 Platinum plating method for ion exchange membrane

Publications (2)

Publication Number Publication Date
JPH11172458A JPH11172458A (en) 1999-06-29
JP3022458B2 true JP3022458B2 (en) 2000-03-21

Family

ID=18424044

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9352432A Expired - Fee Related JP3022458B2 (en) 1997-12-05 1997-12-05 Platinum plating method for ion exchange membrane

Country Status (1)

Country Link
JP (1) JP3022458B2 (en)

Also Published As

Publication number Publication date
JPH11172458A (en) 1999-06-29

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