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JP2976172B2 - Gas shut-off valve - Google Patents
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JP2976172B2 - Gas shut-off valve - Google Patents

Gas shut-off valve

Info

Publication number
JP2976172B2
JP2976172B2 JP6198384A JP19838494A JP2976172B2 JP 2976172 B2 JP2976172 B2 JP 2976172B2 JP 6198384 A JP6198384 A JP 6198384A JP 19838494 A JP19838494 A JP 19838494A JP 2976172 B2 JP2976172 B2 JP 2976172B2
Authority
JP
Japan
Prior art keywords
valve
gas
shut
annular seal
seal portion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP6198384A
Other languages
Japanese (ja)
Other versions
JPH08105552A (en
Inventor
啓治 阿部
昭二 飯山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokuyama Corp
Original Assignee
Tokuyama Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokuyama Corp filed Critical Tokuyama Corp
Priority to JP6198384A priority Critical patent/JP2976172B2/en
Publication of JPH08105552A publication Critical patent/JPH08105552A/en
Application granted granted Critical
Publication of JP2976172B2 publication Critical patent/JP2976172B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Details Of Valves (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、粒体が付随せしめられ
ている場合にも良好に気体を遮断することができる気体
遮断弁に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a gas shut-off valve which can shut off a gas even when particles are attached.

【0002】[0002]

【従来の技術】シリコン半導体ウエーハの製造において
は、周知の如く、多結晶シリコンを製造し、次いでかか
る多結晶シリコンを単結晶化して単結晶シリコンインゴ
ットを製造している。多結晶シリコンの製造において
は、一般にシリコンを棒状に析出せしめて棒状多結晶シ
リコンを生成せしめているが、近時においてはシリコン
を粒状に析出せしめて、例えば直径1乃至1.5mm程
度のシリコン粒体を生成することが提案され実用に供さ
れるようになってきた。かようなシリコン粒体の製造に
おいては、モノシランガスの如き気体と共にシリコン粒
体が流動ラインを通して流動せしめられる。米国特許第
5,202,099号及び第5,205,998号明細
書及び図面に開示されている如く、流動ライン中には、
必要に応じてシリコン粒体及び気体の流動を遮断するた
めに、特定表面に粒体が安息角をなして滞留する現象を
利用した粒体遮断弁が配設されると共に、かかる粒体遮
断弁の下流側に1個又は2個以上の気体遮断弁が配設さ
れる。
2. Description of the Related Art In the production of silicon semiconductor wafers, as is well known, polycrystalline silicon is produced, and then the polycrystalline silicon is monocrystallized to produce a monocrystalline silicon ingot. In the production of polycrystalline silicon, silicon is generally precipitated in the form of a rod to produce rod-shaped polycrystalline silicon. In recent years, however, silicon has been precipitated in the form of particles, for example, silicon particles having a diameter of about 1 to 1.5 mm. Producing bodies has been proposed and put into practical use. In the production of such silicon particles, silicon particles are caused to flow through a flow line together with a gas such as a monosilane gas. As disclosed in US Pat. Nos. 5,202,099 and 5,205,998 and the drawings,
In order to shut off the flow of silicon particles and gas, if necessary, a particle shutoff valve utilizing a phenomenon in which particles stay at an angle of repose on a specific surface is provided, and such a particle shutoff valve is provided. One or two or more gas shut-off valves are disposed downstream of.

【0003】[0003]

【発明が解決しようとする課題】而して、上記流動ライ
ン中に配設される気体遮断弁として、弁座部材と弁部材
との協働によって気体を選択的に遮断する公知の遮断弁
を使用すると、次の通りの問題が発生することが判明し
ている。即ち、上記流動ラインにおいて粒体及び気体の
流動を遮断する場合には、先ず粒体遮断弁を作用せしめ
て粒体の流動を遮断し、しかる後に粒体遮断弁の下流に
配設されている気体遮断弁を作動せしめて気体を遮断す
る。気体遮断弁の作動に先立ってその上流側において粒
体遮断弁が作動せしめられる故に、気体遮断弁を作動せ
しめる時点においては気体遮断弁に多量の粒体が流入せ
しめられることはない。しかしながら、気体遮断弁を作
動せしめる時点において気体遮断弁中に存在する粒体を
実質上皆無にせしめることは不可能であり、気体遮断弁
中には幾分かの粒体が存在する。そして、相互に密接せ
しめられる弁座部材と弁部材との間にかかる粒体が介在
せしめられてしまうと、弁座部材と弁部材との密接が不
充分になって気体の遮断が不充分なものになってしま
う。また、弁座部材と弁部材との間に粒体が噛み込まれ
ることに起因して、粒体が損傷せしめられてしまうと共
に、弁座部材及び弁部材が比較的短期間の内に摩耗され
て所要とおりに機能し得なくなってしまう。
As a gas shut-off valve disposed in the flow line, a known shut-off valve for selectively shutting off gas by the cooperation of a valve seat member and a valve member is used. When used, the following problems have been found to occur. That is, when the flow of the particles and the gas is shut off in the flow line, the flow of the particles is first shut off by operating the particle shutoff valve, and thereafter, the flow is disposed downstream of the particle shutoff valve. Activate the gas shutoff valve to shut off the gas. Since the particulate shutoff valve is operated upstream of the gas shutoff valve prior to the activation of the gas shutoff valve, a large amount of particles do not flow into the gas shutoff valve when the gas shutoff valve is activated. However, it is not possible to eliminate substantially any particles present in the gas shut-off valve when the gas shut-off valve is activated, and there are some particles present in the gas shut-off valve. If the granular material is interposed between the valve seat member and the valve member which are brought into close contact with each other, the close contact between the valve seat member and the valve member becomes insufficient, and the shutoff of the gas becomes insufficient. It becomes something. In addition, the granular material is damaged due to the granular material being caught between the valve seat member and the valve member, and the valve seat member and the valve member are worn in a relatively short time. Will not work as required.

【0004】本発明は上記事実に鑑みてなされたもので
あり、その技術的課題は、気体に粒体が付随している場
合にも充分良好に気体を遮断せしめることができ、そし
てまた気体に付随せしめられる粒体の損傷と共に弁座部
材及び弁部材の摩耗が可及的に防止される、改良された
気体遮断弁を提供することである。
The present invention has been made in view of the above-mentioned facts, and a technical problem of the present invention is that it is possible to sufficiently shut off gas even when particles are attached to the gas, and also to prevent gas from being blocked. It is an object of the present invention to provide an improved gas shut-off valve in which the wear of the valve seat member and the valve member is prevented as much as possible with the accompanying damage of the granular material.

【0005】[0005]

【課題を解決するための手段】上記技術的課題を達成す
るために、本発明においては、弁座部材と弁部材との一
方に上流側環状シール部と下流側環状シール部とを形成
し、弁部材が遮断位置に移動せしめられる際に上流側環
状シール部と下流側環状シール部との間において弁ハウ
ジング内に気体を噴射するための気体噴射手段を配設す
る。
In order to achieve the above technical object, according to the present invention, an upstream annular seal portion and a downstream annular seal portion are formed on one of a valve seat member and a valve member. Gas injection means for injecting gas into the valve housing is provided between the upstream annular seal portion and the downstream annular seal portion when the valve member is moved to the shut-off position.

【0006】即ち、本発明によれば、上記技術的課題を
達成する気体遮断弁として、導入路と導出路とが配設さ
れている弁ハウジングと、該弁ハウジング内において該
導入路と該導出路との連通を選択的に遮断するための遮
断手段とを具備し、該遮断手段は静止環状弁座部材と、
遮断位置と非遮断位置との間を移動せしめられる可動弁
部材と、気体噴射手段とから構成されており、該弁座部
材と該弁部材との一方には上流側環状シール部と下流側
環状シール部とが形成されており、該気体噴射手段は該
上流側環状シール部と該下流側環状シール部との間にお
いて該弁ハウジング内に気体を噴射する、ことを特徴と
する気体遮断弁が提供される。
That is, according to the present invention, as a gas shut-off valve for achieving the above technical object, a valve housing in which an introduction passage and an outlet passage are provided, and the introduction passage and the outlet passage in the valve housing. Shutoff means for selectively shutting off communication with the road, the shutoff means comprising a stationary annular valve seat member,
A movable valve member that can be moved between a shut-off position and a non-cut-off position, and gas injection means, and one of the valve seat member and the valve member has an upstream annular seal portion and a downstream annular member. A gas shut-off valve, wherein the gas injection means injects gas into the valve housing between the upstream annular seal and the downstream annular seal. Provided.

【0007】好ましくは、該弁部材が該非遮断位置から
該遮断位置に移動せしめられる際には、該弁部材と該弁
座部材との他方は最初に該上流側環状シール部に密接せ
しめられ、しかる後に該下流側環状シール部に密接せし
められる。該弁座部材に該上流側環状シール部と該下流
側環状シール部とが形成されているのが好適である。好
ましくは、該気体噴射手段は該弁座部材の内周面に開口
せしめられている多数の噴射孔を含み、該噴射孔から該
弁ハウジング内に気体が噴射される。該導入路は該弁ハ
ウジングの上端部に配設されており、該弁部材が該遮断
位置に位置せしめられると、該弁部材は該導入路の下端
に位置する流入開口に対向してその下方に位置し、該弁
部材が該非遮断位置に位置せしめられると、該弁部材は
該流入開口に対して横方向に退避するのが好都合であ
る。
Preferably, when the valve member is moved from the non-blocking position to the blocking position, the other of the valve member and the valve seat member is first brought into close contact with the upstream annular seal portion, Thereafter, it is brought into close contact with the downstream annular seal portion. It is preferable that the upstream side annular seal portion and the downstream side annular seal portion are formed on the valve seat member. Preferably, the gas injection means includes a plurality of injection holes opened on the inner peripheral surface of the valve seat member, and gas is injected from the injection holes into the valve housing. The introduction passage is disposed at an upper end portion of the valve housing, and when the valve member is located at the shut-off position, the valve member is opposed to and below the inflow opening located at the lower end of the introduction passage. And the valve member is advantageously retracted laterally with respect to the inlet opening when the valve member is in the non-blocking position.

【0008】[0008]

【作用】本発明の気体遮断弁においては、弁座部材と弁
部材とが協働する際に、弁座部材と弁部材との一方に形
成されている上流側環状シール部と下流側環状シール部
との間において気体噴射手段が弁ハウジング内に気体を
噴出する。従って、弁座部材と弁部材の一方に形成され
ている上流側環状シール部及び下流側環状シール部に弁
座部材と弁部材との他方が密接せしめられる際には、気
体噴射手段から噴射された気体によって弁座部材と弁部
材との他方と上流側環状シール部及び下流側環状シール
部との間から残留粒体が排除される。かくして、弁座部
材と弁部材との他方と上流側環状シール部及び下流側環
状シール部とは両者間に実質上粒体を介在せしめること
なく密接せしめられ、これによって気体の遮断が確保さ
れる。弁座部材と弁部材との他方と上流側環状シール部
及び下流側環状シール部との間に粒体が介在せしめられ
ることは充分に抑制され、気体に付随せしめられる粒体
の損傷と共に弁座部材及び弁部材の摩耗が可及的に防止
される。
In the gas shut-off valve of the present invention, when the valve seat member and the valve member cooperate, the upstream annular seal portion and the downstream annular seal formed on one of the valve seat member and the valve member. Gas injection means injects gas into the valve housing between the first and second portions. Therefore, when the other of the valve seat member and the valve member is brought into close contact with the upstream annular seal portion and the downstream annular seal portion formed on one of the valve seat member and the valve member, the gas is injected from the gas injection means. The residual gas is removed from the space between the other of the valve seat member and the valve member and the upstream annular seal portion and the downstream annular seal portion by the gas. Thus, the other of the valve seat member and the valve member and the upstream-side annular seal portion and the downstream-side annular seal portion are brought into close contact with substantially no intervening granular material therebetween, thereby ensuring gas shutoff. . The interposition of particles between the other of the valve seat member and the valve member and the upstream annular seal portion and the downstream annular seal portion is sufficiently suppressed, and the valve seat is damaged together with the damage of the particles accompanying the gas. Wear of the member and the valve member is prevented as much as possible.

【0009】[0009]

【実施例】以下、添付図面を参照して、本発明に従って
構成された粒体遮断弁の好適実施例について、更に詳細
に説明する。
BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a perspective view showing a preferred embodiment of a particulate shutoff valve according to the present invention.

【0010】図1には、本発明に従って構成された気体
遮断弁の好適実施例が図示されている。多結晶シリコン
粒体の製造プラントにおける気体遮断弁として好適に使
用される図示の気体遮断弁は全体を番号2で示す弁ハウ
ジングを具備しており、弁ハウジング2は上部ハウジン
グ部材4と下部ハウジング部材6とから構成されてい
る。炭素鋼又はステンレス鋼の如き適宜の金属材料から
形成することができる上部ハウジング4は、下面が全体
に渡って開口されている略円錐台筒形状の主部8を有す
る。主部8の下端には環状連結フランジ10が形成され
ている。この連結フランジ10の外面即ち下面の内周縁
部にはライニングのための浅い環状凹部12が形成され
ている。主部8の上端には上方に延出する円筒状突出部
14が形成され、この円筒状突出部14の上端には環状
連結フランジ16が形成されている。円筒状突出部14
の内周面は比較的大径の上部18と比較的小径の下部2
0とによって規定されており、円筒状突出部14の内周
面には上方を向いた環状肩面22が形成されている。上
記連結フランジ16の外面即ち上面の内周縁部にはライ
ニングのための浅い凹部24が形成されている。連結フ
ランジ16の上面には、密封用Oリング(図示していな
い)を収容するための環状凹部25も形成されている。
上部ハウジング部材4の主部8における、図1において
左側には、左方に延出する比較的小径のパージガス導入
用円筒状突出部26が形成され、この円筒状突出部26
の先端には環状連結フランジ28が形成されている。図
1から明確に理解される如く、上述したとおりの上部ハ
ウジング2の内面(後述する弁座部材が配設されている
部分を除き、連結フランジ10及び16における凹部1
2及び24並びに連結フランジ28の外面即ち左面の内
周縁部を含む)には、ポリテトラフルオロエチレンの如
きフッ素系樹脂製であるのが好ましいライニング32が
施されている。
FIG. 1 illustrates a preferred embodiment of a gas shut-off valve constructed in accordance with the present invention. The illustrated gas shut-off valve, which is preferably used as a gas shut-off valve in a polycrystalline silicon particle manufacturing plant, includes a valve housing indicated by reference numeral 2 as a whole, and the valve housing 2 includes an upper housing member 4 and a lower housing member. 6 is comprised. The upper housing 4, which can be formed from a suitable metal material such as carbon steel or stainless steel, has a main portion 8 having a substantially frustoconical cylindrical shape whose lower surface is entirely open. An annular connecting flange 10 is formed at a lower end of the main part 8. A shallow annular recess 12 for lining is formed on the outer surface of the connecting flange 10, that is, on the inner peripheral edge of the lower surface. A cylindrical projection 14 extending upward is formed at an upper end of the main portion 8, and an annular connecting flange 16 is formed at an upper end of the cylindrical projection 14. Cylindrical projection 14
The inner peripheral surface has a relatively large diameter upper part 18 and a relatively small diameter lower part 2.
0, an annular shoulder surface 22 facing upward is formed on the inner peripheral surface of the cylindrical projection 14. A shallow concave portion 24 for lining is formed on the outer surface of the connecting flange 16, that is, on the inner peripheral edge of the upper surface. An annular recess 25 for accommodating a sealing O-ring (not shown) is also formed on the upper surface of the connection flange 16.
In the main portion 8 of the upper housing member 4, a relatively small-diameter purge gas introduction cylindrical protrusion 26 extending leftward is formed on the left side in FIG. 1.
An annular connecting flange 28 is formed at the tip of the. As can be clearly understood from FIG. 1, the inner surface of the upper housing 2 as described above (except for the portion where the valve seat member described later is disposed, the recess 1 in the connecting flanges 10 and 16).
2 and 24 and the outer periphery of the connecting flange 28 (including the inner peripheral edge on the left side) are provided with a lining 32 preferably made of a fluororesin such as polytetrafluoroethylene.

【0011】図1と共に図2を参照して説明すると、上
部ハウジング部材4の主部8の上端に形成されている上
記円筒状突出部14には筒状導入部材34が装着されて
いる。後に更に言及する如く筒状導入部材34を通して
モノシランガスを含む気体と共に多結晶シリコン粒体が
流動せしめられるが、かかるシリコン粒体は著しく高純
度であり、シリコン以外の物質に接触して汚染されるこ
とが回避されることが望まれる。それ故に、筒状導入部
材34は焼なまし処理した多結晶シリコンから形成され
ているのが好都合である。筒状導入部材34は、比較的
大きな外径を有する円筒状上部36、比較的小さい外径
を有する円筒状中間部38、及び外径が下方に向かって
漸次減少せしめられている円錐台筒状下部40を有し、
筒状導入部材34の外周面には下方を向いた環状肩面4
2が形成されている。筒状導入部材34の上部36の外
径は上記円筒状突出部14の上部18の内径に対応せし
められ、筒状導入部材34の中間部38の外径は上記円
筒状突出部14の下部20の内径に対応せしめられてい
る。かような筒状導入部材34は、図1に明確に図示す
る如く、上部ハウジング部材4の円筒状突出部14に上
方から挿入して、その外周面に形成されている肩面42
を円筒状突出部14の内周面に形成されている肩面22
に当接せしめることによって、所要装着位置に支持され
る。筒状導入部材34の円錐台筒状下部40は、円筒状
突出部14の下端を越えて下方に上部ハウジング4内に
突出せしめられている。円錐台筒状下部40の外周面に
おける先細傾斜角度αは10乃至30度程度でよい。筒
状導入部材34にはこれを貫通して延びる導入路44が
形成されており、その下端には流入開口46が規定され
ている。導入路44の横断面形状及び流入開口46の形
状は円形でよい。導入路44の下端部は下方に向かって
内径が漸次増大する円錐台形状にせしめられている。図
1に図示する如く、導入路44は実質上鉛直に延び、流
入開口46は実質上水平に位置せしめられているのが好
都合である。
Referring to FIG. 2 together with FIG. 1, a cylindrical introduction member 34 is mounted on the cylindrical protrusion 14 formed at the upper end of the main portion 8 of the upper housing member 4. As will be further described later, the polycrystalline silicon particles are caused to flow together with the gas containing the monosilane gas through the cylindrical introduction member 34, and such silicon particles are extremely high in purity and may be contaminated by contact with substances other than silicon. Is desired to be avoided. Therefore, the tubular introduction member 34 is advantageously formed from annealed polycrystalline silicon. The tubular introduction member 34 has a cylindrical upper portion 36 having a relatively large outer diameter, a cylindrical intermediate portion 38 having a relatively small outer diameter, and a frustoconical cylindrical shape whose outer diameter is gradually reduced downward. Has a lower part 40,
An annular shoulder surface 4 facing downward is provided on the outer peripheral surface of the cylindrical introduction member 34.
2 are formed. The outer diameter of the upper part 36 of the cylindrical introduction member 34 is made to correspond to the inner diameter of the upper part 18 of the cylindrical projection part 14, and the outer diameter of the intermediate part 38 of the cylindrical introduction member 34 is lower than the lower part 20 of the cylindrical projection part 14. It corresponds to the inside diameter of. As shown in FIG. 1, the cylindrical introduction member 34 is inserted into the cylindrical protrusion 14 of the upper housing member 4 from above, and a shoulder surface 42 formed on the outer peripheral surface thereof.
A shoulder surface 22 formed on the inner peripheral surface of the cylindrical protrusion 14.
, So that it is supported at the required mounting position. The frustoconical cylindrical lower part 40 of the cylindrical introduction member 34 is projected downward into the upper housing 4 beyond the lower end of the cylindrical projection 14. The tapered inclination angle α on the outer peripheral surface of the truncated conical cylindrical lower portion 40 may be about 10 to 30 degrees. The tubular introduction member 34 is formed with an introduction passage 44 extending therethrough, and an inflow opening 46 is defined at a lower end thereof. The cross-sectional shape of the introduction path 44 and the shape of the inflow opening 46 may be circular. The lower end of the introduction path 44 is formed in a truncated cone shape whose inner diameter gradually increases downward. Conveniently, as shown in FIG. 1, the introduction channel 44 extends substantially vertically and the inflow opening 46 is positioned substantially horizontally.

【0012】図1を参照して説明を続けると、弁ハウジ
ング2の下部ハウジング部材6も上部ハウジング部材4
と同様に炭素鋼又はステンレス鋼の如き適宜の金属材料
から形成することができる。下部ハウジング部材6は外
径及び内径が下方に向かって漸次減少せしめられている
円錐台筒形状の主部48を有し、その上面は全体に渡っ
て開口されている。下部ハウジング部材6の上端には環
状連結フランジ50が形成されている。この連結フラン
ジ50の外面即ち上面の内周縁部にはライニンイグのた
めの浅い凹部52が形成されている。更に、連結フラン
ジ50の上面には、密封用Oリング54が収容される環
状凹部56も形成されている。下部ハウジング部材6の
下端には下方に延出する円筒状突出部58が形成され、
この円筒状突出部58の下端には環状連結フランジ60
が形成されている。円筒状突出部58の内周面は比較的
大径の上部62と比較的小径の下部64とによって規定
されており、円筒状突出部58の内周面には下方を向い
た環状肩面66が形成されている。かような下部ハウジ
ング部材6の内面(連結フランジ50の凹部52及び連
結フランジ60の外面即ち下面の内周縁部を含む)に
も、上部ハウジング部材4の内面と同様に、フッ素系樹
脂製であるのが好都合であるライニイング68が施され
ている。
Continuing with FIG. 1, the lower housing member 6 of the valve housing 2 is also connected to the upper housing member 4.
Similarly, it can be formed from an appropriate metal material such as carbon steel or stainless steel. The lower housing member 6 has a truncated-cone-shaped main portion 48 whose outer diameter and inner diameter are gradually reduced downward, and the upper surface thereof is entirely open. An annular connecting flange 50 is formed at the upper end of the lower housing member 6. On the outer surface of the connecting flange 50, that is, on the inner peripheral edge of the upper surface, a shallow concave portion 52 for lining is formed. Further, an annular concave portion 56 for accommodating the sealing O-ring 54 is formed on the upper surface of the connecting flange 50. At the lower end of the lower housing member 6, a cylindrical projection 58 extending downward is formed,
An annular connecting flange 60 is provided at the lower end of the cylindrical projection 58.
Are formed. The inner peripheral surface of the cylindrical protrusion 58 is defined by an upper portion 62 having a relatively large diameter and a lower portion 64 having a relatively small diameter, and the inner peripheral surface of the cylindrical protrusion 58 has an annular shoulder surface 66 facing downward. Are formed. The inner surface of the lower housing member 6 (including the concave portion 52 of the connecting flange 50 and the outer surface of the connecting flange 60, that is, the inner peripheral edge of the lower surface) is also made of a fluororesin similarly to the inner surface of the upper housing member 4. A lining 68 is provided which is convenient.

【0013】下部ハウジング部材6の上記円筒状突出部
58には、筒状導出部材70が装着されている。この筒
状導出部材70も、上部ハウジング部材4における筒状
導入部材34と同様に、シリコン粒体の汚染を回避する
ために焼なまし処理した多結晶シリコンから形成されて
いるのが好都合である。筒状導出部材70は比較的大き
な外径を有する上部72及び比較的小さい外径を有する
下部74を有し、筒状導出部材70の外周面には下方を
向いた環状肩面76が形成されている。筒状導出部材7
0の上端面の内周縁部には上方に突出する環状突条78
が形成されている。筒状導出部材70の上部72の外径
は上記円筒状突出部58の上部62の内径に対応せしめ
られ、筒状導出部材70の下部74の外径は上記円筒状
突出部58の下部64の内径に対応せしめられている。
かような筒状導出部材70は、下部ハウジング部材6の
円筒状突出部58に上方から挿入して、その外周面に形
成されている肩面78を円筒状突出部58の内周面に形
成されている肩面66に当接せしめることによって、所
要装着位置に支持される。筒状導出部材70には実質上
鉛直に延びる導出路80が形成されている。導出路80
の横断面形状は円形であり、上半部においては下方に向
かって内径が漸次減少せしめられており、下半部におい
ては内径は変化せしめられることなく同一に維持されて
いる。後に更に詳細に言及する如く、モノシランガスを
含む気体と共に上部ハウジング部材4に配設されている
上記導入路44から弁ハウジング2内に流入されるシリ
コン粒体は、導出路80に至る前に下部ハウジング部材
6の内面に衝突乃至接触する可能性がある。かかる事実
に鑑みて、下部ハウジング部材6の内面には、上記ライ
ニング68に加えて、焼なまし処理した多結晶シリコン
から形成されているのが好都合である複数個の保護部材
82が配設されている。下部ハウジング部材6の主部4
8の内面に沿って周方向に配列せしめられた保護部材8
2は全体として、下部ハウジング部材6の主部48の内
面に対応した円錐台筒形状をなし、保護部材82の下端
面の外側縁部には突条84が形成されている。保護部材
82の各々は、下部ハウジング部材6に上方から挿入し
て、その下端面を上記筒状導出部材70の上端面に当接
せしめる、更に詳しくはその下端面に形成されている突
条84を上記筒状導出部材70の上端面に形成されてい
る環状突条78に対向せしめてその半径方向外側に位置
せしめてその下端面を上記筒状導出部材70の上端面に
当接せしめることによって、所要装着位置に支持され
る。図1に明確に図示する如く、複数個の保護部材82
の内周面は協働して、内径が下方に向かって漸次減少せ
しめられる円錐台形状を規定し、かかる円錐台形状は上
記筒状導出部材70に形成されている導出路80の上半
部における円錐台形状に円滑に続く。
A cylindrical lead-out member 70 is mounted on the cylindrical protrusion 58 of the lower housing member 6. This tubular lead-out member 70 is, similarly to the tubular lead-in member 34 in the upper housing member 4, advantageously formed of polycrystalline silicon that has been annealed to avoid contamination of silicon particles. . The tubular lead-out member 70 has an upper portion 72 having a relatively large outer diameter and a lower portion 74 having a relatively small outer diameter, and an annular shoulder surface 76 facing downward is formed on the outer peripheral surface of the tubular lead-out member 70. ing. Cylindrical lead-out member 7
An annular ridge 78 protruding upward is formed on the inner peripheral edge of the upper end surface of the ridge.
Are formed. The outer diameter of the upper portion 72 of the cylindrical protruding member 70 is made to correspond to the inner diameter of the upper portion 62 of the cylindrical protruding portion 58, and the outer diameter of the lower portion 74 of the cylindrical protruding member 70 is smaller than that of the lower portion 64 of the cylindrical protruding portion 58. Corresponds to the inner diameter.
The cylindrical lead-out member 70 is inserted into the cylindrical protrusion 58 of the lower housing member 6 from above, and a shoulder surface 78 formed on the outer peripheral surface is formed on the inner peripheral surface of the cylindrical protrusion 58. By being brought into contact with the shoulder surface 66 which is provided, it is supported at a required mounting position. A lead-out passage 80 extending substantially vertically is formed in the tubular lead-out member 70. Outgoing path 80
Has a circular cross-section, the inner diameter of which is gradually reduced downward in the upper half, and the inner diameter is maintained unchanged in the lower half. As will be described in more detail later, the silicon particles flowing into the valve housing 2 from the introduction path 44 provided in the upper housing member 4 together with the gas containing the monosilane gas before the lower housing 80 There is a possibility of collision or contact with the inner surface of the member 6. In view of this fact, on the inner surface of the lower housing member 6, in addition to the lining 68, a plurality of protective members 82, which are conveniently formed of annealed polycrystalline silicon, are provided. ing. Main part 4 of lower housing member 6
Protective members 8 arranged circumferentially along the inner surface of 8
2 has a truncated cone shape corresponding to the inner surface of the main portion 48 of the lower housing member 6 as a whole, and a projection 84 is formed on the outer edge of the lower end surface of the protection member 82. Each of the protection members 82 is inserted into the lower housing member 6 from above, and a lower end surface thereof is brought into contact with an upper end surface of the tubular lead-out member 70. More specifically, a protrusion 84 formed on the lower end surface is provided. Is opposed to an annular ridge 78 formed on the upper end surface of the tubular lead-out member 70 and positioned radially outward, and the lower end surface thereof is brought into contact with the upper end surface of the tubular lead-out member 70 by , Supported at the required mounting position. As is clearly shown in FIG.
Cooperate to define a truncated cone shape whose inner diameter is gradually reduced downward, and the truncated cone shape is the upper half of the lead-out passage 80 formed in the tubular lead-out member 70. Smoothly follows the truncated cone shape in.

【0014】上部ハウジング部材4と下部ハウジング部
材6とは、図1に明確に図示する如く、上部ハウジング
部材4の下端に配設されている連結フランジ10と下部
ハウジング部材6の上端に配設されている連結フランジ
50とを整合せしめて、相互に連結される。かかる連結
は、周方向に間隔をおいた複数個の位置において連結フ
ランジ10及び50に形成されている孔にボルト86の
軸を挿通せしめ、かかるボルト86の軸の突出端部にナ
ット88を螺着せしめることによって遂行される。
The upper housing member 4 and the lower housing member 6 are arranged at the lower end of the upper housing member 4 and the upper end of the lower housing member 6 as clearly shown in FIG. The connecting flanges 50 are aligned and connected to each other. In this connection, the shaft of the bolt 86 is inserted into holes formed in the connection flanges 10 and 50 at a plurality of positions spaced apart in the circumferential direction, and a nut 88 is screwed onto the protruding end of the shaft of the bolt 86. This is accomplished by dressing up.

【0015】図1及び図2を参照して説明すると、弁ハ
ウジング2内には上記導入路44と導出路80との連通
を選択的に遮断するための遮断手段90が配設されてい
る。この遮断手段90は静止環状弁座部材92と可動弁
部材94とを含んでいる。弁座部材92は好ましくはポ
リテトラフルオロエチレンの如きフッ素系樹脂から形成
されており、全体として環状であり、その横断面形状は
略矩形状である。かかる弁座部材92は、上部ハウジン
グ部材4における主部8の上端所要位置に、周方向に間
隔をおいた複数個の位置にて弁座部材92を貫通せしめ
て上部ハウジング部材4の実質上水平な環状内面に、フ
ッ素系樹脂製コーティングを有するのが好都合である止
めねじ96を螺合することによって固定されている。弁
座部材92には上流側環状シール部98と下流側環状シ
ール部100とが形成されていることが重要である。図
2に明確に図示する如く、上流側環状シール部98は、
弁座部材92の主部内周面の上端部から半径方向内方に
突出し、次いで下方に突出する環状突出片によって規定
されている。弁座部材92の下面には内周縁から幾分か
離隔せしめて環状溝が形成され、かかる環状溝よりも内
周側に下流側環状シール部100を規定する環状垂下片
が形成されている。弁座部材92の外周面には密封用O
リング102が収容される環状凹部104が形成されて
いる。弁座部材92には、更に、全体を番号110で示
す気体噴射手段が付設されている。かかる気体噴射手段
110について詳細に説明すると、弁座部材92の外周
面上半部には環状凹部が形成されており、かかる環状凹
部によって上部ハウジング部材4の主部8における側壁
上端部と弁座部材92との間には環状通気路111が規
定されている。弁座部材92には、更に、上記環状凹部
から半径方向内方に向かって下方に幾分傾斜して延びる
多数の噴射孔106(図1及び図2にそのうちの1個の
みを図示している)が形成されている。かかる噴射孔1
06は弁座部材92の周方向全体渡って均一に配列され
ており、噴射孔106の各々は弁座部材92に形成され
ている上記上流側環状シール部98と下流側環状シール
部100との間において弁座部材92の内周面に開口せ
しめられている。上部ハウジング部材4の主部8におけ
る側壁上端部には貫通孔108が形成されており、かか
る貫通孔108の下流端は上記環状通気路111に連通
せしめられている。貫通孔108の上流端は可撓製ホー
ス、送給制御弁等(図示していない)を介して加圧気体
源113に接続されている。かような気体噴射手段11
0は、窒素ガスであるのが好都合である気体を、貫通孔
108及び環状通気路111を介して多数の噴射孔10
6に送給し、噴射孔106から弁ハウジング2内に噴射
する。
Referring to FIGS. 1 and 2, a shut-off means 90 for selectively shutting off the communication between the introduction passage 44 and the exit passage 80 is provided in the valve housing 2. The shut-off means 90 includes a stationary annular valve seat member 92 and a movable valve member 94. The valve seat member 92 is preferably formed of a fluorine-based resin such as polytetrafluoroethylene, is generally annular, and has a substantially rectangular cross-sectional shape. The valve seat member 92 is substantially horizontal to the upper housing member 4 by allowing the valve seat member 92 to penetrate at a plurality of circumferentially spaced positions at a required position at the upper end of the main portion 8 of the upper housing member 4. It is secured by screwing a set screw 96, which advantageously has a fluororesin coating, to the annular inner surface. It is important that the valve seat member 92 be formed with an upstream annular seal portion 98 and a downstream annular seal portion 100. As clearly shown in FIG. 2, the upstream annular sealing portion 98
The valve seat member 92 is defined by an annular projecting piece that projects radially inward from the upper end of the inner peripheral surface of the main portion and then projects downward. An annular groove is formed on the lower surface of the valve seat member 92 at a certain distance from the inner peripheral edge, and an annular hanging piece defining the downstream annular seal portion 100 is formed on the inner peripheral side of the annular groove. On the outer peripheral surface of the valve seat member 92, a sealing O
An annular recess 104 in which the ring 102 is accommodated is formed. The valve seat member 92 is further provided with gas injection means indicated by reference numeral 110 as a whole. The gas injection means 110 will be described in detail. An annular recess is formed in the upper half of the outer peripheral surface of the valve seat member 92, and the annular recess allows the upper end of the side wall of the main portion 8 of the upper housing member 4 to be connected to the valve seat. An annular ventilation passage 111 is defined between the member and the member 92. The valve seat member 92 further includes a number of injection holes 106 (FIGS. 1 and 2 show only one of them) that extends slightly inward from the annular recess radially inward and downward. ) Is formed. Such an injection hole 1
Reference numerals 06 are arranged uniformly over the entire circumferential direction of the valve seat member 92, and each of the injection holes 106 is formed between the upstream annular seal portion 98 and the downstream annular seal portion 100 formed in the valve seat member 92. An opening is formed on the inner peripheral surface of the valve seat member 92 between them. A through hole 108 is formed at the upper end of the side wall of the main portion 8 of the upper housing member 4, and the downstream end of the through hole 108 is communicated with the annular air passage 111. The upstream end of the through hole 108 is connected to a pressurized gas source 113 via a flexible hose, a feed control valve, or the like (not shown). Such gas injection means 11
0 is a gas, which is conveniently nitrogen gas, is passed through a plurality of injection holes 10 through a through hole 108 and an annular ventilation passage 111.
6 and is injected into the valve housing 2 from the injection hole 106.

【0016】上記遮断手段90における可動弁部材94
は、図1に二点鎖線で示し図2に実線で示す遮断位置と
図1に実線で示す非遮断位置との間を適宜に移動せしめ
られる。図1及び図2と共に図3を参照して更に詳細に
説明すると、上部ハウジング部材4には図3において上
下方向に延びる膨出部112が形成されており、かかる
膨出部112を通って延在する支持軸114が回転自在
に装着されている。かかる支持軸114は上部ハウジン
グ部材4に装着された一対の軸受部材116及び118
を介して回転自在に装着されており、図1から明確に理
解される如く上記筒状導入部材34の下端に形成されて
いる流入開口46から横方向(図1において右方向)に
変位して、図1において紙面に垂直な方向に図3におい
て上下方向に実質上水平に延在せしめられている。図3
に明確に図示する如く、膨出部112の内周面と支持軸
114の外周面との間には、一対のシール手段115及
び117が配設されている。シール手段115及び11
7の各々は内側Oリング119及び121と外側Oリン
グ123及び125とを含んでおり、内側Oリング11
9及び121と外側Oリング123及び125との間に
おいて膨出部112には排出路127及び129が形成
されている。内側Oリング119及び121を通過して
モノシランの如きガスが漏出した場合、かかる漏出ガス
は排出路127及び129を介して除害装置(図示して
いない)に送られる。上部ハウジング部材4の上記膨出
部112の外側端(図3において下端)にはカバー12
0が締結ねじの如き適宜の固着手段(図示していない)
によって固定されている。支持軸114の一端部はカバ
ー120を貫通して図3において下方に延出せしめられ
ており、支持軸114のかかる延出端部は減速歯車列で
よい減速手段122を介して電動モータ又はエアモータ
等から構成することができる駆動源124に駆動連結さ
れている。上記膨出部112の、弁ハウジング2内に露
呈する内面にもフッ素系樹脂製でよいライニイングが施
され、そしてまた支持軸114の、弁ハウジング2内に
おいて露呈される表面にはフッ素系樹脂製でよいコーテ
ィングが施されているのが好都合である。
The movable valve member 94 in the shut-off means 90
Can be appropriately moved between a blocking position shown by a two-dot chain line in FIG. 1 and a solid line in FIG. 2 and a non-blocking position shown by a solid line in FIG. More specifically, referring to FIG. 3 together with FIGS. 1 and 2, the upper housing member 4 is formed with a bulging portion 112 extending vertically in FIG. 3, and extends through the bulging portion 112. An existing support shaft 114 is rotatably mounted. The support shaft 114 has a pair of bearing members 116 and 118 mounted on the upper housing member 4.
And is displaced laterally (to the right in FIG. 1) from an inflow opening 46 formed at the lower end of the tubular introduction member 34 as clearly understood from FIG. 1, it extends substantially horizontally in a direction perpendicular to the plane of the paper and in a vertical direction in FIG. FIG.
As clearly shown in FIG. 1, a pair of sealing means 115 and 117 are disposed between the inner peripheral surface of the bulging portion 112 and the outer peripheral surface of the support shaft 114. Sealing means 115 and 11
7 includes inner O-rings 119 and 121 and outer O-rings 123 and 125;
Discharge paths 127 and 129 are formed in the bulging portion 112 between the bulging portion 112 and the outer O-rings 123 and 125. If a gas such as monosilane leaks through the inner O-rings 119 and 121, the leaked gas is sent to the abatement apparatus (not shown) via the exhaust passages 127 and 129. A cover 12 is provided on the outer end (lower end in FIG. 3) of the bulging portion 112 of the upper housing member 4.
0 is a suitable fixing means such as a fastening screw (not shown)
Has been fixed by. One end of the support shaft 114 penetrates the cover 120 and extends downward in FIG. 3, and the extension end of the support shaft 114 is connected to an electric motor or an air motor via a speed reducing means 122 which may be a reduction gear train. And the like. The inner surface of the bulging portion 112 exposed in the valve housing 2 is also provided with a lining which may be made of a fluorine resin, and the surface of the support shaft 114 exposed in the valve housing 2 is made of a fluorine resin. Advantageously, a good coating is applied.

【0017】上記支持軸114には略L字形状である支
持アーム126の一端が、ねじ止め或いは接着の如き適
宜の固定手段(図示していない)によって固定されてい
る。この支持アーム126の他端部には略円板形状の支
持部材128が装着されている。更に詳述すると、支持
アーム126の他端部の、図2に図示する状態において
下面には、凹部130が形成されていると共に、この凹
部130から上面まで延びる貫通孔が形成されている。
そして、かかる貫通孔を通して締結ボルト132の軸を
延在せしめ、かかる締結ボルト132の軸を支持部材1
28の下面中央部に螺着せしめることによって、支持ア
ーム126の他端部に支持部材128が装着されてい
る。支持アーム126に形成されている上記凹部130
にはカバー部材134が圧入され、凹部130内に位置
する締結ボルト132の頭部がカバー部材134によっ
て覆われている。支持アーム126、支持部材128及
びカバー部材134は、ポリテトラフルオロエチレンの
如きフッ素系樹脂から形成されているのが好都合であ
る。所望ならば、支持アーム126、支持部材128及
びカバー部材134を鋼の如き他の適宜の部材から形成
し、フッ素系樹脂製のコーティングを施すこともでき
る。上記弁部材94は支持部材128に装着されてい
る。弁部材94自体もポリテトラフルオロエチレンの如
きフッ素系樹脂から形成することができる。後の説明か
ら明らかになる如く、弁部材94の表面には多結晶リシ
コン粒子が若干ではあるが接触せしめられる故に、所望
ならばそれに接触せしめられるシリコン粒体の汚染を回
避するために焼なまし処理した多結晶シリコンから弁部
材94を形成することもできる。全体として円板形状で
ある弁部材94の裏面には支持部材128の外径よりも
幾分大きい内径を有する円形凹部136が形成されてお
り、かかる凹部136に支持部材128を螺着、即ち凹
部136の内周面に形成されている雌螺条に支持部材1
28の外周面に形成されている雄螺条を螺合せしめて装
着することによって、支持部材128上に弁部材94が
装着されている。弁部材94の上面には球面状であるの
が好都合である凹部138が形成されているのが好都合
である。弁部材94の上面周縁部乃至側面の形状は、上
記弁座部材92に対して次のとおりに作用するように設
定されていることが重要である。即ち、弁部材94が図
1に実線で示す非遮断位置から図2に実線で示し図1に
二点鎖線で示す遮断位置に向けて移動せしめられる際に
は、上記遮断位置に到達する若干前である図2に二点鎖
線94Aで示す位置まで弁部材94が移動せしめられる
と、弁部材94が弁座部材92の上流側環状シール部9
8に密接せしめられる。この時点においては、弁部材9
4は弁座部材92の下流側環状シール部100に対して
は未だ若干離隔せしめられている。次いで、弁部材94
が図2に実線で示し図1に二点鎖線で示す遮断位置まで
移動せしめられると、図2から明確に理解されるとお
り、弁部材94は弁座部材92の下流側環状シール部1
00にも密接せしめられ、これによって導入路44と導
出路80との間の遮断が確保される。
One end of a substantially L-shaped support arm 126 is fixed to the support shaft 114 by an appropriate fixing means (not shown) such as screwing or bonding. A substantially disk-shaped support member 128 is attached to the other end of the support arm 126. More specifically, a recess 130 is formed on the lower surface of the other end of the support arm 126 in the state shown in FIG. 2, and a through hole extending from the recess 130 to the upper surface is formed.
Then, the shaft of the fastening bolt 132 is extended through the through hole, and the shaft of the fastening bolt 132 is
The support member 128 is attached to the other end of the support arm 126 by being screwed to the center of the lower surface of the support arm 128. The recess 130 formed in the support arm 126
, A cover member 134 is press-fitted, and the head of the fastening bolt 132 located in the recess 130 is covered with the cover member 134. Conveniently, the support arm 126, support member 128, and cover member 134 are formed from a fluorinated resin such as polytetrafluoroethylene. If desired, the support arm 126, support member 128, and cover member 134 can be formed from other suitable members, such as steel, and can be coated with a fluorocarbon resin. The valve member 94 is mounted on a support member 128. The valve member 94 itself can also be formed from a fluorine-based resin such as polytetrafluoroethylene. As will be apparent from the description below, the surface of the valve member 94 is slightly contacted with polycrystalline silicon particles, and if desired, is annealed to avoid contamination of the silicon particles contacted with it. The valve member 94 can also be formed from the treated polycrystalline silicon. A circular concave portion 136 having an inner diameter slightly larger than the outer diameter of the support member 128 is formed on the back surface of the valve member 94 which has a disk shape as a whole, and the support member 128 is screwed into the concave portion 136, that is, the concave portion. The support member 1 is attached to a female thread formed on the inner peripheral surface of the 136.
The valve member 94 is mounted on the support member 128 by screwing and mounting a male thread formed on the outer peripheral surface of the support member 128. The upper surface of the valve member 94 is advantageously formed with a recess 138, which is advantageously spherical. It is important that the shape of the upper peripheral edge or side surface of the valve member 94 is set so as to act on the valve seat member 92 as follows. That is, when the valve member 94 is moved from the non-blocking position shown by the solid line in FIG. 1 to the blocking position shown by the solid line in FIG. 2 and shown by the two-dot chain line in FIG. When the valve member 94 is moved to the position indicated by the two-dot chain line 94A in FIG. 2, the valve member 94 is moved to the upstream side annular seal portion 9 of the valve seat member 92.
Closer to 8. At this point, the valve member 9
4 is still slightly separated from the downstream annular seal portion 100 of the valve seat member 92. Next, the valve member 94
2 is moved to the shut-off position shown by the solid line in FIG. 2 and by the two-dot chain line in FIG. 1, as can be clearly understood from FIG. 2, the valve member 94 is connected to the downstream annular seal portion 1 of the valve seat member 92.
00, so that a cut-off between the inlet path 44 and the outlet path 80 is ensured.

【0018】上記駆動源124によって支持軸114を
適宜に回転せしめることによって、弁部材94は、図1
に二点鎖線で示し図2に実線で示す遮断位置と図1に実
線で示す非遮断位置との間を移動せしめられる。所望な
らば、支持軸114又は支持アーム126に作用する遮
断位置規制片及び非遮断位置規制片(図示していない)
を配設し、弁部材94が上記遮断位置及び非遮断位置に
充分精密に位置付けられるようになすことができる。図
1及び図2を参照することによって明確に理解される如
く、弁部材94が上記遮断位置に位置せしめられると、
弁部材94が弁座部材92の上流側環状シール部98及
び下流側環状シール部100に密接せしめられると共
に、弁部材94の上面に形成されている凹部138が、
筒状導入部材34の下端に規定されている流入開口46
に対向してその下方に、好ましくは実質上同心状に位置
する。一方、図1から明確に理解される如く、弁部材9
4が上記非遮断位置に位置せしめられると、弁部材94
は流入開口46に対して横方向に退避する。
By appropriately rotating the support shaft 114 by the drive source 124, the valve member 94 is moved to the position shown in FIG.
2 is moved between a blocking position shown by a two-dot chain line and a solid line in FIG. 2 and a non-blocking position shown by a solid line in FIG. If desired, a blocking position restriction piece and a non-blocking position restriction piece acting on the support shaft 114 or the support arm 126 (not shown)
Can be provided so that the valve member 94 can be positioned with sufficient precision in the shut-off position and the non-cut-off position. As will be clearly understood with reference to FIGS. 1 and 2, when the valve member 94 is positioned in the shut-off position,
The valve member 94 is brought into close contact with the upstream annular seal portion 98 and the downstream annular seal portion 100 of the valve seat member 92, and a concave portion 138 formed on the upper surface of the valve member 94 is provided.
Inflow opening 46 defined at the lower end of tubular introduction member 34
, Below and preferably substantially concentrically. On the other hand, as clearly understood from FIG.
4 is positioned at the non-blocking position, the valve member 94
Retreats laterally with respect to the inflow opening 46.

【0019】而して、上述した実施例においては弁座部
材92に上流側環状シール部98と下流側環状シール部
100とを形成しているが、所望ならば、弁座部材92
に代えて弁部材94に適宜の形態の上流側環状シール部
と下流側環状シール部とを形成し、弁部材94が非遮断
位置から遮断位置に向けて移動せしめられる際には、最
初に弁部材94の上流側環状シール部が弁座部材92に
密接せしめられ、次いで弁部材94の下流側環状シール
部が弁座部材92に密接せしめられるように構成するこ
ともできる。
In the above-described embodiment, the upstream-side annular seal portion 98 and the downstream-side annular seal portion 100 are formed in the valve seat member 92.
When the valve member 94 is formed with an upstream-side annular seal portion and a downstream-side annular seal portion in an appropriate form, the valve member 94 is first moved when the valve member 94 is moved from the non-blocking position to the blocking position. The upstream annular seal portion of the member 94 can be made to be in close contact with the valve seat member 92, and then the downstream annular seal portion of the valve member 94 can be made to be in close contact with the valve seat member 92.

【0020】上述したとおりの気体遮断弁は多結晶シリ
コン粒体の製造プラントにおける気体遮断弁として好適
に使用される。この場合、図1に二点鎖線で示す如く、
弁ハウジング2の上端には管部材140(かかる管部材
の内面にもフッ素系樹脂製ライニング及び多結晶シリコ
ン製保護部材が配設される)が連結され、かかる管部材
140は適宜の粒体遮断弁(図示していない)を介して
多結晶シリコン粒体析出手段(図示していない)に接続
される。多結晶シリコン粒体析出手段においては、当業
者には周知の如く、モノシランガスが使用される。従っ
て、粒体遮断弁が非作用状態即ち非遮断状態にせしめら
れている場合には、管部材140を通して気体遮断弁に
モノシランガスを含む気体と共にシリコン粒体が送給さ
れる。この際には、遮断手段90の弁部材94は図1に
実線で示す非遮断位置に位置せしめられている。従っ
て、管部材140から導入路44に供給された気体及び
シリコン粒体は流入開口46から弁ハウジング2内に流
入して、弁ハウジング2内を実質上鉛直に流下し、そし
て導出路80を通って弁ハウジング2から流出する。弁
ハウジング2の下端には、図1に二点鎖線で示す如く、
管部材142(かかる管部材の内面にもフッ素系樹脂製
ライニング及び多結晶シリコン製保護部材が配設され
る)が連結されており、かかる管部材142は図示の気
体遮断弁と実質上同一でよい付加気体遮断弁(図示して
いない)を介して例えば収集容器(図示していない)に
接続されている。従って、気体及びシリコン粒体は、管
部材142から遮断手段における弁部材が非遮断位置に
位置せしめられている付加気体遮断弁を通して収集容器
まで搬送される。図1を参照することによって明確に理
解されるとおり、弁部材94が非遮断位置に位置せしめ
られている時には、弁部材94は流入開口46に対して
横方向に退避せしめられている故に、流入開口46から
弁ハウジング2内に流入し弁ハウジング2を流下するシ
リコン粒体が弁部材94に衝突することは実質上皆無で
ある。
The gas shut-off valve as described above is suitably used as a gas shut-off valve in a plant for producing polycrystalline silicon particles. In this case, as shown by a two-dot chain line in FIG.
The upper end of the valve housing 2 is connected to a pipe member 140 (a lining made of a fluorine-based resin and a protection member made of polycrystalline silicon are also provided on the inner surface of the pipe member). It is connected to a polycrystalline silicon particle deposition means (not shown) via a valve (not shown). In the means for depositing polycrystalline silicon particles, a monosilane gas is used as is well known to those skilled in the art. Therefore, when the particulate shut-off valve is in a non-operating state, that is, in a non-cut-off state, silicon particles are supplied to the gas shut-off valve through the pipe member 140 together with a gas containing monosilane gas. At this time, the valve member 94 of the shut-off means 90 is located at a non-cut-off position indicated by a solid line in FIG. Accordingly, the gas and the silicon particles supplied from the pipe member 140 to the introduction passage 44 flow into the valve housing 2 from the inflow opening 46, flow down the valve housing 2 substantially vertically, and pass through the discharge passage 80. And flows out of the valve housing 2. At the lower end of the valve housing 2, as shown by a two-dot chain line in FIG.
A pipe member 142 (a fluorinated resin lining and a protection member made of polycrystalline silicon are also provided on the inner surface of the pipe member) is connected. The pipe member 142 is substantially the same as the illustrated gas shut-off valve. It is connected, for example, to a collecting vessel (not shown) via a good additional gas shut-off valve (not shown). Accordingly, the gas and the silicon particles are conveyed from the pipe member 142 to the collection container through the additional gas shut-off valve in which the valve member in the shut-off means is located at the non-cut-off position. As can be clearly understood with reference to FIG. 1, when the valve member 94 is in the non-blocking position, the valve member 94 is retracted laterally with respect to the inlet opening 46 so that the inlet Silicon particles flowing into the valve housing 2 from the opening 46 and flowing down the valve housing 2 do not substantially collide with the valve member 94.

【0021】気体及びシリコン粒体の流動を遮断する場
合には、最初に、気体遮断弁の上流側に配設されている
上記粒体遮断弁が作動状態即ち遮断状態にせしめられ、
気体の通過は許容されるがシリコン粒体の流動は遮断さ
れる。従って、管部材140を通して多量のシリコン粒
体が気体遮断弁に供給されることが停止される。しかる
後に、気体遮断弁が遮断状態にせしめられると共にその
下流に配設されている上記付加気体遮断弁が遮断状態に
せしめられる。気体遮断弁が遮断状態にせしめられる際
には、例えば、遮断手段90における弁部材94が図1
に実線で示す非遮断位置から図2に二点鎖線94Bで示
す位置まで移動せしめられて一旦停止せしめられる。弁
部材94が図2に二点鎖線94Bで示す位置まで移動せ
しめられると、弁座部材92の上流側環状シール部98
が弁部材94に近接する(しかしながら、上流側環状シ
ール部98と弁部材94との間には未だシリコン粒体の
通過を許容する程度の若干の隙間が存在せしめられてい
る)。次いで、気体噴射手段110の多数の噴射孔10
6から、弁座部材92の上流側環状シール部98と下流
側環状シール部100との間にて弁ハウジング2内に気
体が噴射される。かかる気体の噴射によって、弁部材9
4並びに弁座部材92の上流側環状シール部98及び下
流側環状シール部100から付着シリコン粒体が除去さ
れる。この際には導入路44を通して若干のシリコン粒
体が流下せしめられ、かかるシリコン粒体が弁部材94
の凹部138上に堆積することもある。好適例において
は、弁部材94を再び図1に実線で示す非遮断位置に戻
し、弁部材94の凹部138上のシリコン粒体を下方に
落下せしめる。そして更に、弁部材94を図2に二点鎖
線94Bで示す位置に移動せしめ、次いで図1に実線で
示す非遮断位置に戻す操作を繰り返す。しかる後に、弁
部材94を図1に二点鎖線で示す遮断位置に向けて移動
せしめる。弁部材94が図2に二点鎖線94Aで示す位
置まで移動せしめられると、弁座部材92の上流側環状
シール部98が弁部材94に密接せしめられる。従っ
て、多数の噴射孔106から弁ハウジング2内に噴射さ
れる気体は、上流側への流動が阻止され、弁部材94の
下部と弁座部材92の下流側環状シール部100に集中
的に指向され、これらの部分におけるシリコン粒体の残
留付着が充分確実に除去される。次いで、弁部材94が
図1に二点鎖線で示し図2に実線で示す遮断位置に位置
せしめられ、弁座部材92の下流側環状シール部100
が弁部材94に密接せしめられ、かくして弁座部材92
と弁部材94との協働によって気体が充分確実に遮断さ
れる。そして、弁座部材92の下流側環状シール部10
0が弁部材94に密接せしめられるのと実質上同時或い
はその後に、噴射孔106からの気体の噴射が停止され
る。この時点まで噴射孔106からの気体の噴射を連続
して遂行することができるが、所望ならば弁部材94が
図2に二点鎖線94Bで示す位置よりも遮断位置側に存
在する時にのみ気体を噴射する、換言すれば弁部材94
が図2に二点鎖線94Bで示す位置よりも非遮断位置側
に存在する時には気体の噴射を中断する、こともでき
る。
When shutting off the flow of gas and silicon particles, first, the above-mentioned particle shut-off valve, which is disposed upstream of the gas shut-off valve, is brought into an operating state, that is, a shut-off state.
The passage of gas is allowed, but the flow of silicon particles is cut off. Therefore, supply of a large amount of silicon particles to the gas shutoff valve through the pipe member 140 is stopped. Thereafter, the gas shut-off valve is shut off, and the additional gas shut-off valve disposed downstream thereof is shut off. When the gas shut-off valve is set to the shut-off state, for example, the valve member 94 of the shut-off means 90 is turned off as shown in FIG.
Are moved from the non-blocking position shown by the solid line to the position shown by the two-dot chain line 94B in FIG. 2 and temporarily stopped. When the valve member 94 is moved to a position indicated by a two-dot chain line 94B in FIG.
Is close to the valve member 94 (however, there is still a slight gap between the upstream annular seal portion 98 and the valve member 94 to such an extent that the silicon particles can pass through). Next, the many injection holes 10 of the gas injection means 110
From 6, gas is injected into the valve housing 2 between the upstream annular seal portion 98 and the downstream annular seal portion 100 of the valve seat member 92. The injection of the gas causes the valve member 9
The attached silicon particles are removed from the upstream annular seal 98 and the downstream annular seal 100 of the valve seat member 4 and the valve seat member 92. At this time, some silicon particles are caused to flow down through the introduction path 44, and the silicon particles are
May be deposited on the concave portion 138. In a preferred embodiment, the valve member 94 is returned to the non-blocking position shown by the solid line in FIG. 1 again, and the silicon particles on the concave portion 138 of the valve member 94 are dropped. Further, the operation of moving the valve member 94 to the position shown by the two-dot chain line 94B in FIG. 2 and then returning it to the non-blocking position shown by the solid line in FIG. 1 is repeated. Thereafter, the valve member 94 is moved toward the shutoff position indicated by the two-dot chain line in FIG. When the valve member 94 is moved to a position indicated by a two-dot chain line 94A in FIG. 2, the upstream annular seal portion 98 of the valve seat member 92 is brought into close contact with the valve member 94. Therefore, the gas injected into the valve housing 2 from the large number of injection holes 106 is prevented from flowing upstream, and is directed intensively to the lower portion of the valve member 94 and the downstream annular seal portion 100 of the valve seat member 92. Thus, residual adhesion of silicon particles in these portions is sufficiently and reliably removed. Next, the valve member 94 is positioned at the shut-off position indicated by the two-dot chain line in FIG. 1 and the solid line in FIG.
Is brought into close contact with the valve member 94 and thus the valve seat member 92.
The gas is shut off sufficiently and reliably by cooperation of the valve member 94 and the valve member 94. Then, the downstream annular seal portion 10 of the valve seat member 92 is provided.
Substantially at the same time as or after 0 is brought into close contact with the valve member 94, the injection of gas from the injection hole 106 is stopped. Up to this point, the injection of gas from the injection hole 106 can be continuously performed. However, if desired, the gas is injected only when the valve member 94 is located closer to the shut-off position than the position indicated by the two-dot chain line 94B in FIG. , In other words, the valve member 94
When is located on the non-blocking position side of the position shown by the two-dot chain line 94B in FIG. 2, the gas injection can be interrupted.

【0022】上述したとおりの弁部材94の操作様式に
代えて、例えば弁部材94を図1に実線で示す非遮断位
置から図2に実線で示す遮断位置まで単に連続的に移動
せしめることもできる。この場合には、弁部材94が図
2に二点鎖線94Bで示す位置或いは図2に二点鎖線9
4Aで示す位置になった時点で気体の噴射を開始し、弁
部材94が図2に実線で示す遮断位置になった時点乃至
その後に気体の噴射を停止することができる。弁部材9
4が遮断位置にせしめられた後においても導入路44を
通して弁ハウジング2内に若干のシリコン粒体が進入せ
しめられる可能性があるが、かかるシリコン粒体は弁部
材94の上面に形成されている凹部138内に収容され
る。
Instead of the operation mode of the valve member 94 as described above, for example, the valve member 94 can be simply continuously moved from a non-blocking position shown by a solid line in FIG. 1 to a blocking position shown by a solid line in FIG. . In this case, the valve member 94 is positioned at a position indicated by a two-dot chain line 94B in FIG.
4A, the gas injection can be started, and the gas injection can be stopped after the valve member 94 reaches the shut-off position indicated by the solid line in FIG. 2 or thereafter. Valve member 9
Even after the shutter 4 has been moved to the shut-off position, some silicon particles may enter the valve housing 2 through the introduction path 44, but such silicon particles are formed on the upper surface of the valve member 94. It is housed in the recess 138.

【0023】気体遮断弁が遮断状態にせしめられるのと
実質上同時に或いはその直後に付加気体遮断弁も遮断状
態にせしめられると、気体遮断弁においては、弁ハウジ
ング2の上部ハウジング部材4に形成されている突出部
26内に規定されている導入路を通して、窒素ガスでよ
いパージガスが導入される。かかるパージガスは弁ハウ
ジング2内に存在するモノシランガスを含む気体と共
に、上部ハウジング4に形成されている排出路(図示し
ていない)及びこれに連結されている管部材(図示して
いない)を通して、適宜の除害装置(図示していない)
に排出される。気体及びシリコン粒体の流動を再開する
際には、付加気体遮断弁、気体遮断弁及び粒体遮断弁を
順次に開放すればよい。
When the additional gas shut-off valve is shut off substantially simultaneously with or immediately after the gas shut-off valve is shut off, the gas shut-off valve is formed on the upper housing member 4 of the valve housing 2. A purge gas, which may be nitrogen gas, is introduced through an introduction path defined in the projection 26. The purge gas and the gas containing the monosilane gas present in the valve housing 2 are appropriately passed through a discharge passage (not shown) formed in the upper housing 4 and a pipe member (not shown) connected thereto. Abatement equipment (not shown)
Is discharged. When the flow of the gas and the silicon granules is restarted, the additional gas shutoff valve, the gas shutoff valve and the granule shutoff valve may be sequentially opened.

【0024】[0024]

【発明の効果】本発明の気体遮断弁においては、気体に
粒体が付随している場合でも充分確実に気体を遮断する
ことができ、加えて粒体の損傷並びに弁部材及び弁座部
材の摩耗を著しく低減せしめることができる。
According to the gas shut-off valve of the present invention, the gas can be shut off sufficiently reliably even when the gas is accompanied by particles, and in addition, the particles are damaged and the valve member and the valve seat member are damaged. Wear can be significantly reduced.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明に従って構成された気体遮断弁の好適実
施例を示す縦断面図。
FIG. 1 is a longitudinal sectional view showing a preferred embodiment of a gas shutoff valve configured according to the present invention.

【図2】図1の気体遮断弁の一部を示す拡大縦断面図。FIG. 2 is an enlarged vertical sectional view showing a part of the gas shut-off valve of FIG.

【図3】図1の気体遮断弁を示す部分横断面図。FIG. 3 is a partial cross-sectional view showing the gas shut-off valve of FIG. 1;

【符号の説明】[Explanation of symbols]

2:弁ハウジング 4:上部ハウジング部材 6:下部ハウジング部材 44:導入路 46:流入開口 80:導出路 90:遮断手段 92:弁座部材 94:弁部材 98:上流側環状シール部 100:下流側環状シール部 106:噴射孔 110:気体噴射手段 2: valve housing 4: upper housing member 6: lower housing member 44: introduction path 46: inflow opening 80: outlet path 90: shut-off means 92: valve seat member 94: valve member 98: upstream annular seal portion 100: downstream side Annular seal portion 106: injection hole 110: gas injection means

Claims (5)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 導入路と導出路とが配設されている弁ハ
ウジングと、該弁ハウジング内において該導入路と該導
出路との連通を選択的に遮断するための遮断手段とを具
備し、該遮断手段は静止環状弁座部材と、遮断位置と非
遮断位置との間を移動せしめられる可動弁部材と、気体
噴射手段とから構成されており、該弁座部材と該弁部材
との一方には上流側環状シール部と下流側環状シール部
とが形成されており、該気体噴射手段は該上流側環状シ
ール部と該下流側環状シール部との間において該弁ハウ
ジング内に気体を噴射する、ことを特徴とする気体遮断
弁。
1. A valve housing having an introduction path and an output path disposed therein, and a shutoff means for selectively shutting off communication between the introduction path and the output path within the valve housing. The shut-off means comprises a stationary annular valve seat member, a movable valve member that can be moved between a shut-off position and a non-cut-off position, and gas injection means. On one side, an upstream-side annular seal portion and a downstream-side annular seal portion are formed, and the gas injection unit supplies gas into the valve housing between the upstream-side annular seal portion and the downstream-side annular seal portion. A gas shut-off valve for injecting.
【請求項2】 該弁部材が該非遮断位置から該遮断位置
に移動せしめられる際には、該弁部材と該弁座部材との
他方は最初に該上流側環状シール部に密接せしめられ、
しかる後に該下流側環状シール部に密接せしめられる、
請求項1記載の気体遮断弁。
2. When the valve member is moved from the non-blocking position to the blocking position, the other of the valve member and the valve seat member is first brought into close contact with the upstream annular seal portion,
After that, it is brought into close contact with the downstream side annular seal portion,
The gas shut-off valve according to claim 1.
【請求項3】 該弁座部材に該上流側環状シール部と該
下流側環状シール部とが形成されている、請求項1又2
記載の気体遮断弁。
3. The valve seat member according to claim 1, wherein the upstream annular seal portion and the downstream annular seal portion are formed on the valve seat member.
A gas shut-off valve as described.
【請求項4】 該気体噴射手段は該弁座部材の内周面に
開口せしめられている多数の噴射孔を含み、該噴射孔か
ら該弁ハウジング内に気体が噴射される、請求項1から
3までのいずれかに記載の気体遮断弁。
4. The gas injection means according to claim 1, wherein said gas injection means includes a plurality of injection holes opened on an inner peripheral surface of said valve seat member, and gas is injected into said valve housing from said injection holes. 3. The gas shut-off valve according to any one of 3).
【請求項5】 該導入路は該弁ハウジングの上端部に配
設されており、該弁部材が該遮断位置に位置せしめられ
ると、該弁部材は該導入路の下端に位置する流入開口に
対向してその下方に位置し、該弁部材が該非遮断位置に
位置せしめられると、該弁部材は該流入開口に対して横
方向に退避する、請求項1から4までのいずれかに記載
の気体遮断弁。
5. The introduction passage is disposed at an upper end of the valve housing, and when the valve member is located at the shut-off position, the valve member is connected to an inflow opening located at a lower end of the introduction passage. The valve member according to any of the preceding claims, wherein the valve member retreats laterally with respect to the inflow opening when the valve member is positioned opposite to and below the non-blocking position. Gas shut-off valve.
JP6198384A 1994-08-11 1994-08-23 Gas shut-off valve Expired - Fee Related JP2976172B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6198384A JP2976172B2 (en) 1994-08-11 1994-08-23 Gas shut-off valve

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP18954294 1994-08-11
JP6-189542 1994-08-11
JP6198384A JP2976172B2 (en) 1994-08-11 1994-08-23 Gas shut-off valve

Publications (2)

Publication Number Publication Date
JPH08105552A JPH08105552A (en) 1996-04-23
JP2976172B2 true JP2976172B2 (en) 1999-11-10

Family

ID=26505522

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6198384A Expired - Fee Related JP2976172B2 (en) 1994-08-11 1994-08-23 Gas shut-off valve

Country Status (1)

Country Link
JP (1) JP2976172B2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102599877B1 (en) * 2017-11-20 2023-11-09 가부시끼가이샤 도꾸야마 Method for producing trichlorosilane and device for producing trichlorosilane
JP7605752B2 (en) * 2019-11-22 2024-12-24 株式会社トクヤマ Trichlorosilane manufacturing method and trichlorosilane manufacturing apparatus

Also Published As

Publication number Publication date
JPH08105552A (en) 1996-04-23

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