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JP3065766B2 - Manufacturing method of multilayer printed wiring board - Google Patents
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JP3065766B2 - Manufacturing method of multilayer printed wiring board - Google Patents

Manufacturing method of multilayer printed wiring board

Info

Publication number
JP3065766B2
JP3065766B2 JP1907192A JP1907192A JP3065766B2 JP 3065766 B2 JP3065766 B2 JP 3065766B2 JP 1907192 A JP1907192 A JP 1907192A JP 1907192 A JP1907192 A JP 1907192A JP 3065766 B2 JP3065766 B2 JP 3065766B2
Authority
JP
Japan
Prior art keywords
hole
reference hole
adhesive layer
layer
metal foil
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP1907192A
Other languages
Japanese (ja)
Other versions
JPH05218649A (en
Inventor
嘉保 西川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ibiden Co Ltd
Original Assignee
Ibiden Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ibiden Co Ltd filed Critical Ibiden Co Ltd
Priority to JP1907192A priority Critical patent/JP3065766B2/en
Publication of JPH05218649A publication Critical patent/JPH05218649A/en
Application granted granted Critical
Publication of JP3065766B2 publication Critical patent/JP3065766B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Production Of Multi-Layered Print Wiring Board (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は多層プリント配線板の製
造方法に係り、詳しくは少なくとも最外層の導体回路の
形成にアディティブ法を用いるとともに、多層基板の積
層にピンラミネーション方式を用い、積層時の基準穴を
スルーホール穴あけ時の基準穴に共用する多層プリント
配線板の製造方法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a multilayer printed wiring board, and more particularly to an additive method for forming at least an outermost conductive circuit, and a pin lamination method for laminating a multilayer substrate. The present invention relates to a method of manufacturing a multilayer printed wiring board in which the reference hole is used as a reference hole when drilling a through hole.

【0002】[0002]

【従来の技術】従来、プリント配線板に導体回路を形成
する方法としては、絶縁基板に銅箔を積層した後、フォ
トエッチングすることにより導体回路を形成するサブト
ラクティブ法が広く行われている。この方法によれば絶
縁基板との密着性に優れた導体回路を形成することがで
きるが、銅箔の厚さのためにエッチングにより所謂アン
ダーカットが生じ高精度のファインパターンが得難く、
高密度化に対応することが難しいという問題がある。こ
のためサブトラクティブ法に代る方法として、絶縁基板
に接着剤を塗布して接着層を形成し、この接着層の表面
を粗化した後、無電解銅メッキを施して導体回路を形成
するアディティブ法が注目されている。
2. Description of the Related Art Conventionally, as a method of forming a conductive circuit on a printed wiring board, a subtractive method of forming a conductive circuit by laminating a copper foil on an insulating substrate and then performing photoetching has been widely used. According to this method, it is possible to form a conductor circuit having excellent adhesion to the insulating substrate, but it is difficult to obtain a so-called undercut due to etching due to the thickness of the copper foil, and to obtain a highly accurate fine pattern.
There is a problem that it is difficult to cope with high density. Therefore, as an alternative to the subtractive method, an additive is formed by applying an adhesive to an insulating substrate to form an adhesive layer, roughening the surface of the adhesive layer, and applying electroless copper plating to form a conductor circuit. The law is drawing attention.

【0003】又、近年、電子機器の小型化、高性能化及
び多機能化が進められており、絶縁基板の表裏両面だけ
でなく、内部にも導体回路が形成された層を有する多層
プリント配線板が実用化されている。多層プリント配線
板の製造方法としてピンラミネーション方式がある。ピ
ンラミネーション方式は基準穴がそれぞれ形成された内
層回路基板、層間絶縁材(プリプレグ)及び外層回路用
基材又は金属箔を、各基準穴に位置決めピンが嵌挿され
た状態で積層するとともに、加熱プレスして多層基板を
形成する。
In recent years, miniaturization, high performance, and multi-functionality of electronic devices have been promoted, and multilayer printed wiring having a layer in which a conductive circuit is formed not only on both front and back surfaces of an insulating substrate but also inside. The board has been put to practical use. There is a pin lamination method as a method for manufacturing a multilayer printed wiring board. In the pin lamination method, an inner layer circuit board, an interlayer insulating material (prepreg), and an outer layer circuit substrate or metal foil, each having a reference hole formed therein, are laminated while positioning pins are inserted into the respective reference holes, and heated. Press to form a multilayer substrate.

【0004】多層プリント配線板の内外各層間の導通に
はスルーホールが用いられる。ドリルによるスルーホー
ルの穴あけ加工時には、発生する摩擦熱により基板の材
質である樹脂が軟化し、内層銅箔や上下面の銅箔の切削
面に付着する現象、所謂スミアが発生する場合がある。
そして、最外層の導体回路の形成にアディティブ法を用
いる場合、接着剤の種類により外層回路用基材に塗布し
た接着剤層の粗化とスルーホール穴あけの順序が異な
る。すなわち、接着剤層の粗化に必要なエッチング量が
少なくてよい接着剤の場合は、接着剤層の粗化の前にス
ルーホール穴あけを行い、前記スミアの除去を接着剤層
の粗化のためのエッチングの際に同時に行っている。
又、接着剤層の粗化に必要なエッチング量を多く必要と
する接着剤の場合は、接着剤層の粗化の後にスルーホー
ル穴あけを行い、接着剤層の粗化とスミアの除去とを別
個に行っている。なぜならば、エッチング量を多く必要
とする接着剤の粗化と同時にスミアの除去を行うと、内
層導体回路と基材との間や基材のガラスクロスに沿って
エッチング剤が侵入して銅メッキ工程におけるメッキし
み込みが大きくなるという不良となるからである。
[0004] Through holes are used for conduction between the inner and outer layers of the multilayer printed wiring board. At the time of drilling of a through hole by a drill, a resin, which is a material of the substrate, is softened by the generated frictional heat, and a phenomenon of attaching to the cut surface of the inner layer copper foil and the upper and lower copper foils, so-called smear, may occur.
When the additive method is used to form the outermost conductor circuit, the order of roughening and through-hole drilling of the adhesive layer applied to the outer circuit substrate differs depending on the type of the adhesive. That is, in the case of an adhesive that requires a small amount of etching for roughening the adhesive layer, a through-hole is drilled before the roughening of the adhesive layer, and the removal of the smear is performed by the roughening of the adhesive layer. Is performed at the same time as etching.
In addition, in the case of an adhesive that requires a large amount of etching required for roughening the adhesive layer, a through hole is drilled after the roughening of the adhesive layer, and roughening of the adhesive layer and removal of smear are performed. Going separately. This is because if the smear is removed simultaneously with the roughening of the adhesive that requires a large amount of etching, the etching agent penetrates between the inner conductor circuit and the base material or along the glass cloth of the base material, causing copper plating. This is because it becomes a defect that plating soak in the process increases.

【0005】[0005]

【発明が解決しようとする課題】ドリルによるスルーホ
ールの穴あけ加工時には、位置決め用の基準穴又はター
ゲットマークを必要とする。ピンラミネーション方式に
より多層基板を形成した場合は、積層時の基準穴をスル
ーホールの穴あけ加工時の基準穴に共用するのが便利で
ある。ところが、接着剤層の粗化に必要なエッチング量
を多く必要とする接着剤を用いるアディティブ法の場合
は、粗化の際に基準穴の穴壁もエッチングされ、穴径が
大きくなる。穴径が大きくなった基準穴をスルーホール
の穴あけ加工時の基準穴として使用すると、基準ピンと
基準穴との間の隙間が大きくなり穴あけ位置の精度が悪
くなるという問題がある。
When drilling a through hole with a drill, a positioning reference hole or a target mark is required. When a multi-layer substrate is formed by the pin lamination method, it is convenient to share the reference hole at the time of lamination with the reference hole at the time of drilling a through hole. However, in the case of the additive method using an adhesive that requires a large amount of etching for roughening the adhesive layer, the hole wall of the reference hole is also etched at the time of roughening, and the hole diameter becomes large. When a reference hole having an increased hole diameter is used as a reference hole at the time of drilling a through-hole, there is a problem that a gap between the reference pin and the reference hole becomes large and accuracy of a drilling position is deteriorated.

【0006】本発明は前記の問題点に鑑みてなされたも
のであって、その目的はアディティブ法及びピンラミネ
ーション方式を用いるとともに、積層時の基準穴をスル
ーホール穴あけ時の基準穴に共用する多層プリント配線
板の製造方法において、接着剤層の粗化に必要なエッチ
ング量を多く必要とする接着剤を用いた場合に、スルー
ホール穴あけの位置精度を向上することができる多層プ
リント配線板の製造方法を提供することにある。
SUMMARY OF THE INVENTION The present invention has been made in view of the above problems, and has as its object to use an additive method and a pin lamination method, and to use a reference hole at the time of lamination as a reference hole at the time of drilling a through hole. In the method of manufacturing a printed wiring board, when an adhesive that requires a large amount of etching necessary for roughening the adhesive layer is used, manufacturing a multilayer printed wiring board that can improve the positional accuracy of through-hole drilling It is to provide a method.

【0007】[0007]

【課題を解決するための手段】前記の目的を達成するた
め請求項1に記載の発明では、少なくとも最外層の導体
回路の形成にアディティブ法を用いるとともに、多層基
板の積層にピンラミネーション方式を用い、積層時の基
準穴をスルーホール穴あけ時の基準穴に共用する多層プ
リント配線板の製造方法において、少なくとも最外層の
基準穴の周りに金属箔を形成した後、多層基板の表面へ
の接着剤層の形成及び接着剤層の粗化を行い、次にスル
ーホール穴あけを行うようにした。
According to the first aspect of the present invention, an additive method is used for forming at least the outermost conductive circuit, and a pin lamination method is used for laminating a multilayer substrate. In a method of manufacturing a multilayer printed wiring board in which a reference hole at the time of lamination is shared with a reference hole at the time of through-hole drilling, after forming a metal foil at least around the reference hole of the outermost layer, an adhesive to the surface of the multilayer substrate is formed. The layer was formed and the adhesive layer was roughened, and then a through-hole was formed.

【0008】又、請求項2に記載の発明では、前記基準
穴の周りに金属箔を形成する方法として、最外層に金属
箔を配置した状態で多層基板を積層形成し、次に基準穴
の周りを残して金属箔を除去することにより最外層の基
準穴の周りに金属箔を形成するようにした。
Further, in the invention according to claim 2, as a method of forming a metal foil around the reference hole, a multilayer substrate is formed by laminating the metal foil in a state where the metal foil is arranged on the outermost layer, and then the reference hole of the reference hole is formed. The metal foil was formed around the reference hole in the outermost layer by removing the metal foil while leaving the surroundings.

【0009】又、請求項3に記載の発明では、最も外側
に配置される層間絶縁材を基準穴の周りを切り欠いた状
態とし、当該層間絶縁材が切り欠かれた部分のみに金属
箔を配置して多層基板を積層形成した後、多層基板の表
面への接着剤層の形成及び接着剤層の粗化を行い、次に
スルーホール穴あけを行うようにした。
According to the third aspect of the present invention, the outermost interlayer insulating material is cut off around the reference hole, and the metal foil is applied only to the cutout portion of the interlayer insulating material. After arranging and forming a multilayer substrate, an adhesive layer was formed on the surface of the multilayer substrate and the adhesive layer was roughened, and then a through-hole was formed.

【0010】[0010]

【作用】本発明の方法では、少なくとも最外層の基準穴
の周りに金属箔が形成された状態に多層基板が形成され
る。次に多層基板の表面に接着剤層が形成された後、接
着剤層の粗化が行なわれる。金属箔は接着剤層の粗化に
使用するエッチング剤によってはエッチングされない。
従って、基準穴の径は基準穴の周りあるいは穴壁内に存
在する金属箔部においては接着剤層の粗化工程で変化し
ない。次にスルーホール穴あけが行なわれるが、金属箔
部で基準穴の径が基準ピンに対応した所定の径に保持さ
れているため、穴あけ位置精度が向上する。
According to the method of the present invention, a multilayer substrate is formed with a metal foil formed around at least the outermost reference hole. Next, after an adhesive layer is formed on the surface of the multilayer substrate, the adhesive layer is roughened. The metal foil is not etched by the etching agent used for roughening the adhesive layer.
Therefore, the diameter of the reference hole does not change in the step of roughening the adhesive layer in the metal foil portion around the reference hole or in the hole wall. Next, through-hole drilling is performed. Since the diameter of the reference hole is held at a predetermined diameter corresponding to the reference pin in the metal foil portion, the accuracy of the drilling position is improved.

【0011】請求項2に記載の発明では、最外層に金属
箔を配置した状態で多層基板が積層形成される。次に基
準穴の周りを残して金属箔が除去されて最外層の基準穴
の周りに金属箔が形成される。接着剤層の形成以降は前
記と同様である。
According to the second aspect of the present invention, the multilayer substrate is formed by laminating the metal foil on the outermost layer. Next, the metal foil is removed leaving the periphery of the reference hole, and the metal foil is formed around the reference hole of the outermost layer. After the formation of the adhesive layer, it is the same as above.

【0012】又、請求項3に記載の発明では、最も外側
に配置される層間絶縁材として基準穴の周りが切り欠か
れたものが使用される。そして、当該層間絶縁材が切り
欠かれた部分のみに金属箔を配置した状態で多層基板が
積層形成され、基準穴の周りに金属箔が形成される。接
着剤層の形成以降は前記と同様である。
In the third aspect of the present invention, the outermost interlayer insulating material having a cutout around the reference hole is used. Then, the multi-layer substrate is laminated and formed in a state where the metal foil is arranged only in the cutout portion of the interlayer insulating material, and the metal foil is formed around the reference hole. After the formation of the adhesive layer, it is the same as above.

【0013】[0013]

【実施例】(実施例1)以下、本発明を具体化した第1
実施例を図1及び図2に従って説明する。
(Embodiment 1) Hereinafter, the first embodiment of the present invention will be described.
An embodiment will be described with reference to FIGS.

【0014】最外層に金属箔としての銅箔(厚さ70μ
m)1を配置した状態で、内層回路基板2と層間絶縁材
としてのプリプレグ3とを積層し、プレス装置により加
熱プレス成形し、図1(a)に示すように多層基板4を
形成した。積層はピンラミネーション方式で行った。す
なわち、銅箔1、内層回路基板2及びプリプレグ3にそ
れぞれ形成された基準穴(直径5mm)5に位置決めピ
ンが嵌挿された状態で加熱プレス成形を行った。
The outermost layer is a copper foil (thickness: 70 μm) as a metal foil.
m) In the state where 1 was arranged, the inner-layer circuit board 2 and the prepreg 3 as an interlayer insulating material were laminated, and heated and pressed by a press device to form a multilayer board 4 as shown in FIG. Lamination was performed by a pin lamination method. That is, hot press molding was performed in a state where the positioning pins were inserted into the reference holes (diameter: 5 mm) 5 formed in the copper foil 1, the inner layer circuit board 2, and the prepreg 3, respectively.

【0015】次に前記銅箔1の基準穴5と対応する位置
に、基準穴5を中心として1cm角の大きさにレジスト
層6を形成し、その状態でエッチングを行い、レジスト
層6と対応する部分以外の銅箔1を除去した(図1
(b)の状態)。次にレジスト層6を剥離した。この結
果、多層基板4の基準穴5の周りに銅箔1が残った状態
となる。次に多層基板4の表面にロールコーターで接着
剤を塗布して接着剤層7を形成した(図1(c)の状
態)。接着剤としてはビスフェノールA型エポキシ樹脂
(油化シェル製、商品名:E−1001)40重量部
と、フェノールノボラック型エポキシ樹脂(油化シェル
製、商品名:E−154)60重量部と、イミダゾール
型硬化剤(四国化成製、商品名:2PHZ)5重量部
と、エポキシ樹脂微粒子(東レ製、商品名:トレパール
EP−B、平均粒径0.5μm)10重量部と、エポキ
シ樹脂微粒子(東レ製、商品名:トレパールEP−B、
平均粒径5.5μm)25重量部と、ブチルセロソルブ
アセテート75重量部とを三本ローラーで攪拌、混合し
て調整したものを使用した。
Next, a resist layer 6 is formed at a position corresponding to the reference hole 5 of the copper foil 1 to a size of 1 cm square with the reference hole 5 as a center. The copper foil 1 other than the portion to be removed was removed (FIG. 1).
(State of (b)). Next, the resist layer 6 was peeled off. As a result, the copper foil 1 remains around the reference hole 5 of the multilayer substrate 4. Next, an adhesive was applied to the surface of the multilayer substrate 4 with a roll coater to form an adhesive layer 7 (the state of FIG. 1C). As the adhesive, bisphenol A type epoxy resin (manufactured by Yuka Shell, trade name: E-1001) 40 parts by weight, phenol novolak type epoxy resin (manufactured by Yuka Shell, trade name: E-154) 60 parts by weight, 5 parts by weight of an imidazole-type curing agent (manufactured by Shikoku Chemicals, trade name: 2PHZ), 10 parts by weight of epoxy resin fine particles (manufactured by Toray, trade name: Trepearl EP-B, average particle size: 0.5 μm), and epoxy resin fine particles ( Made by Toray, trade name: Trepal EP-B,
A mixture prepared by stirring and mixing 25 parts by weight (average particle size: 5.5 μm) and 75 parts by weight of butyl cellosolve acetate with a three-roller was used.

【0016】接着剤が完全硬化した後、溶解液としての
クロム酸水溶液に浸漬して接着剤層7の表面を粗化した
(図2(a)の状態)。接着剤層7を構成するエポキシ
樹脂層は溶解液に難溶で、その中に分散されたエポキシ
樹脂微粒子が溶解液に可溶なため、微粒子が溶解液によ
り接着剤層7の表面部分から選択的に溶解除去されてそ
の表面の粗化が行われる。銅箔1は接着剤層7の粗化に
使用する溶解液によってはエッチングされないため、接
着剤層7の粗化処理の際に基準穴5の穴壁の銅箔1以外
の部分が若干エッチングされても、銅箔1の基準穴5の
径は変化しない。
After the adhesive was completely cured, it was immersed in an aqueous solution of chromic acid as a solution to roughen the surface of the adhesive layer 7 (the state shown in FIG. 2A). The epoxy resin layer forming the adhesive layer 7 is hardly soluble in the dissolving solution, and the epoxy resin fine particles dispersed therein are soluble in the dissolving solution. Therefore, the fine particles are selected from the surface portion of the adhesive layer 7 by the dissolving solution. Is dissolved and removed to roughen the surface. Since the copper foil 1 is not etched by the solution used for roughening the adhesive layer 7, a portion of the hole wall of the reference hole 5 other than the copper foil 1 is slightly etched during the roughening treatment of the adhesive layer 7. However, the diameter of the reference hole 5 of the copper foil 1 does not change.

【0017】次にピンラミネーション方式による積層時
の基準穴5を基準穴として、ドリル(図示せず)により
スルーホール用の穴8をあけた(図2(b)の状態)。
穴8の位置精度を測定した結果、位置ずれはX,Y方向
とも±50μmであった。この値はサブトラクティブ法
により多層プリント配線板を形成した際の精度と同等で
あった。
Next, a hole 8 for a through hole was formed by a drill (not shown) using the reference hole 5 at the time of lamination by the pin lamination method as a reference hole (the state of FIG. 2B).
As a result of measuring the positional accuracy of the hole 8, the positional deviation was ± 50 μm in both the X and Y directions. This value was equivalent to the accuracy when a multilayer printed wiring board was formed by the subtractive method.

【0018】(比較例)前記実施例と同様な内層回路基
板2及びプリプレグ3を最外層に離型紙を配置した状態
でピンラミネーション方式により積層し、加熱プレス成
形により最外層に銅箔のない多層基板4を形成した。こ
の多層基板4に前記実施例と同様にして接着剤層7の形
成及び粗化を行った後、スルーホール穴あけを行った。
穴8の位置精度を測定した結果、位置ずれはX,Y方向
とも±60μmであった。すなわち、前記実施例の場合
の位置精度と比較して20%悪かった。
(Comparative Example) The same inner layer circuit board 2 and prepreg 3 as in the above embodiment are laminated by a pin lamination method with release paper disposed on the outermost layer, and a multilayer having no copper foil on the outermost layer by hot press molding. Substrate 4 was formed. After forming and roughening the adhesive layer 7 on the multilayer substrate 4 in the same manner as in the above embodiment, through holes were drilled.
As a result of measuring the positional accuracy of the hole 8, the positional deviation was ± 60 μm in both the X and Y directions. That is, it was 20% worse than the position accuracy in the case of the above embodiment.

【0019】(実施例2)次に第2実施例について説明
する。この実施例では基準穴5の周りの銅箔1及び基準
穴5の穴壁にメッキを行う点が前記実施例と異なってい
る。前記実施例と同様にして最外層に銅箔1が配置され
た多層基板4を形成した後、多層基板4を無電解銅メッ
キ浴に浸漬して基準穴5の穴壁及び基準穴5の周りに金
属箔としての銅メッキ層9を形成した(図3(a)の状
態)。次に前記実施例と同様にして基準穴5の周りを除
いて銅箔1を除去した。次に多層基板4の表面への接着
剤層7の形成及び接着剤層7の粗化を行った((図3
(b)の状態)。
(Embodiment 2) Next, a second embodiment will be described. This embodiment differs from the previous embodiment in that the copper foil 1 around the reference hole 5 and the hole wall of the reference hole 5 are plated. After forming the multilayer substrate 4 having the copper foil 1 disposed on the outermost layer in the same manner as in the above embodiment, the multilayer substrate 4 is immersed in an electroless copper plating bath to surround the hole wall of the reference hole 5 and around the reference hole 5. Then, a copper plating layer 9 as a metal foil was formed (state of FIG. 3A). Next, the copper foil 1 was removed except for around the reference hole 5 in the same manner as in the above embodiment. Next, formation of the adhesive layer 7 on the surface of the multilayer substrate 4 and roughening of the adhesive layer 7 were performed (see FIG.
(State of (b)).

【0020】次に前記基準穴5を基準穴としてドリルに
よりスルーホール用の穴8をあけた。穴8の位置精度は
サブトラクティブ法により多層プリント配線板を形成し
た際の精度と同等であった。この実施例では基準穴5の
穴壁に銅メッキ層9が形成されているため、接着剤層7
の粗化処理の際に基準穴5の全体においてその径が変化
しない。すなわち銅箔1の厚さを薄くしても基準穴5の
径が確実に保持される。従って、銅箔1を薄くすること
により、銅箔1の除去時間の短縮や除去液の使用量を少
なくすることができる。
Next, a hole 8 for a through hole was formed by drilling using the reference hole 5 as a reference hole. The positional accuracy of the hole 8 was equivalent to the accuracy when the multilayer printed wiring board was formed by the subtractive method. In this embodiment, since the copper plating layer 9 is formed on the hole wall of the reference hole 5, the adhesive layer 7 is formed.
The diameter of the reference hole 5 does not change during the roughening process. That is, even if the thickness of the copper foil 1 is reduced, the diameter of the reference hole 5 is reliably maintained. Therefore, by reducing the thickness of the copper foil 1, the time for removing the copper foil 1 can be shortened and the amount of the removing solution used can be reduced.

【0021】(実施例3)次に第3実施例について説明
する。この実施例では多層基板4の積層形成時に多層基
板4の表面全体に銅箔1を積層せずに、基準穴5の周り
にのみ銅箔1を積層する点が前記両実施例と大きく異な
っている。
(Embodiment 3) Next, a third embodiment will be described. This embodiment differs greatly from the previous embodiments in that the copper foil 1 is laminated only around the reference hole 5 without laminating the copper foil 1 on the entire surface of the multilayer substrate 4 when the multilayer substrate 4 is formed. I have.

【0022】最も外側に配置されるプリプレグ3は図4
に示すようにピンラミネーション方式による多層基板の
積層形成時及びドリルによるスルーホール穴あけ時にお
ける位置決め用の基準穴5の周りに切欠き部10が形成
されている。当該プリプレグ3には前記基準穴5はな
く、多層基板4の積層形成時にのみ使用される位置決め
穴11が形成されている。又、内層回路基板2及び最外
層に配置されるプリプレグ3以外のプリプレグ3には前
記基準穴5及び位置決め穴11が形成されている。
The outermost prepreg 3 is shown in FIG.
As shown in FIG. 5, a notch 10 is formed around a positioning reference hole 5 when a multilayer substrate is formed by a pin lamination method and when a through hole is drilled. The prepreg 3 does not have the reference hole 5 but has a positioning hole 11 used only when the multilayer substrate 4 is formed. The reference holes 5 and the positioning holes 11 are formed in the prepreg 3 other than the prepreg 3 disposed on the inner layer circuit board 2 and the outermost layer.

【0023】最外層に配置した離型紙の内側に切欠き部
10が形成された前記プリプレグ3(厚さ100μm)
を配置するとともに、当該プリプレグ3と内層回路基板
2との間にもプリプレグ3を配置し、基準穴5を有する
銅箔1(厚さ100μm)を切欠き部10と対応する位
置に配置した状態で積層し、プレス装置により加熱プレ
ス成形して図5(a)に示すように多層基板4を形成し
た。次に多層基板4の表面への接着剤層7の形成及び接
着剤層7の粗化を行った後、基準穴5を基準穴としてス
ルーホール用の穴8をあけた(図5(b)に示す状
態)。穴8の位置精度はサブトラクティブ法により多層
プリント配線板を形成した際の精度と同等であった。
The prepreg 3 (thickness: 100 μm) in which a cutout portion 10 is formed inside the release paper disposed on the outermost layer
And the prepreg 3 is also arranged between the prepreg 3 and the inner layer circuit board 2, and the copper foil 1 (thickness 100 μm) having the reference hole 5 is arranged at a position corresponding to the notch 10. , And press-molded with a press device to form a multilayer substrate 4 as shown in FIG. Next, after forming the adhesive layer 7 on the surface of the multilayer substrate 4 and roughening the adhesive layer 7, a hole 8 for a through hole was formed using the reference hole 5 as a reference hole (FIG. 5B). State). The positional accuracy of the hole 8 was equivalent to the accuracy when the multilayer printed wiring board was formed by the subtractive method.

【0024】この実施例では基準穴5の周りにのみ銅箔
1が形成されているため、前記両実施例と異なり銅箔1
の除去工程が不要となる。従って、銅箔1を厚くして基
準穴5の径を確保することが容易となる。
In this embodiment, since the copper foil 1 is formed only around the reference hole 5, the copper foil 1 is different from the above two embodiments.
Is unnecessary. Therefore, it is easy to secure the diameter of the reference hole 5 by increasing the thickness of the copper foil 1.

【0025】なお、本発明は前記実施例に限定されるも
のではなく、接着剤としてエポキシ樹脂溶液とエポキシ
樹脂微粒子の組合せに代えて、特開昭61−27687
5号公報に開示された別の組合せの接着剤を使用しても
よい。又、最外層に積層する銅箔1の厚さを変更した
り、第1及び第2実施例において積層時に最外層に銅張
積層板を使用して、多層基板の最外層に銅箔1が配置さ
れるようにしてもよい。又、第2実施例において銅箔1
を最外層に積層せずに基準穴5の周り及び穴壁に銅メッ
キ層を形成してもよい。又、銅箔1以外の金属箔を使用
してもよい。さらには、第3実施例において第1及び第
2の実施例と同様に位置決め穴11を形成することなく
基準穴5によって位置決めをしてもよく、又、最外層か
ら第2層目のプリプレグ3に切欠き部10を形成し当該
切欠き部10に基準穴5を有する銅箔を配置する所謂内
層化構造としてもよいのである。
Incidentally, the present invention is not limited to the above-mentioned embodiment. Instead of using a combination of an epoxy resin solution and epoxy resin fine particles as an adhesive, Japanese Patent Laid-Open No. 61-27687 is used.
Another combination of adhesives disclosed in US Pat. Further, the thickness of the copper foil 1 to be laminated on the outermost layer is changed, or the copper foil 1 is used as the outermost layer of the multilayer substrate by using a copper-clad laminate for the outermost layer at the time of lamination in the first and second embodiments. It may be arranged. In the second embodiment, the copper foil 1
May be formed on the periphery of the reference hole 5 and on the hole wall without laminating the outermost layer. Further, a metal foil other than the copper foil 1 may be used. Further, in the third embodiment, the positioning may be performed by the reference hole 5 without forming the positioning hole 11 as in the first and second embodiments, and the prepreg 3 of the second layer from the outermost layer may be used. It is also possible to form a so-called inner layer structure in which a notch 10 is formed in the notch 10 and a copper foil having a reference hole 5 is arranged in the notch 10.

【0026】[0026]

【発明の効果】以上詳述したように本発明によれば、ア
ディティブ法及びピンラミネーション方式を用いるとと
もに、積層時の基準穴をスルーホール穴あけ時の基準穴
に共用して多層プリント配線板を製造する場合、接着剤
層の粗化に必要なエッチング量を多く必要とする接着剤
を用いても、スルーホール穴あけの位置精度を向上する
ことができ、結果としてアディティブ法の利点である高
精度のファインパターンを形成できるという特性を生か
すことができる。
As described above in detail, according to the present invention, a multi-layer printed wiring board is manufactured by using an additive method and a pin lamination method, and sharing a reference hole for lamination with a reference hole for drilling a through-hole. In this case, even when using an adhesive that requires a large amount of etching required for roughening the adhesive layer, the positional accuracy of the through-hole drilling can be improved, and as a result, the high accuracy, which is an advantage of the additive method, is achieved. The property that a fine pattern can be formed can be utilized.

【図面の簡単な説明】[Brief description of the drawings]

【図1】第1実施例を示し、(a)は多層基板を示す模
式部分断面図、(b)は銅箔をエッチングした状態を示
す模式部分断面図、(c)は多層基板の表面に接着剤層
を形成した状態を示す模式部分断面図である。
1A and 1B show a first embodiment, wherein FIG. 1A is a schematic partial sectional view showing a multilayer substrate, FIG. 1B is a schematic partial sectional view showing a state where a copper foil is etched, and FIG. FIG. 3 is a schematic partial cross-sectional view showing a state where an adhesive layer is formed.

【図2】(a)は接着剤層の表面を粗化した状態を示す
模式部分断面図、(b)はスルーホール用の穴があけら
れた状態を示す模式部分断面図である。
FIG. 2A is a schematic partial cross-sectional view showing a state where the surface of an adhesive layer is roughened, and FIG. 2B is a schematic partial cross-sectional view showing a state where holes for through holes are formed.

【図3】第2実施例を示し、(a)は多層基板の基準穴
の周り及び穴壁に銅メッキ層を形成した状態を示す模式
部分断面図、(b)は接着剤層の表面を粗化した状態を
示す模式部分断面図である。
3A and 3B show a second embodiment, in which FIG. 3A is a schematic partial cross-sectional view showing a state in which a copper plating layer is formed around a reference hole and a hole wall of a multilayer substrate, and FIG. FIG. 3 is a schematic partial cross-sectional view showing a roughened state.

【図4】第3実施例の多層基板の模式平面図である。FIG. 4 is a schematic plan view of a multilayer substrate according to a third embodiment.

【図5】(a)は多層基板を示す模式部分断面図、
(b)はスルーホール用の穴があけられた状態を示す模
式部分断面図である。
FIG. 5A is a schematic partial sectional view showing a multilayer substrate,
(B) is a schematic partial cross-sectional view showing a state in which a hole for a through hole has been drilled.

【符号の説明】[Explanation of symbols]

1…金属箔としての銅箔、2…内装回路基板、3…層間
絶縁材としてのプリプレグ、4…多層基板、5…基準
穴、7…接着剤層、8…穴、9…金属箔としての銅メッ
キ層、10…切欠き部。
DESCRIPTION OF SYMBOLS 1 ... Copper foil as a metal foil, 2 ... Interior circuit board, 3 ... Prepreg as an interlayer insulating material, 4 ... Multilayer board, 5 ... Reference hole, 7 ... Adhesive layer, 8 ... Hole, 9 ... Metal foil Copper plating layer, 10 ... notch.

Claims (3)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 少なくとも最外層の導体回路の形成にア
ディティブ法を用いるとともに、多層基板(4)の積層
にピンラミネーション方式を用い、積層時の基準穴
(5)をスルーホール穴あけ時の基準穴に共用する多層
プリント配線板の製造方法において、 少なくとも最外層の基準穴(5)の周りに金属箔(1)
を形成した後、多層基板(4)の表面への接着剤層
(7)の形成及び接着剤層(7)の粗化を行い、次にス
ルーホール穴あけを行うことを特徴とする多層プリント
配線板の製造方法。
An additive method is used for forming at least the outermost conductive circuit, a pin lamination method is used for laminating a multilayer substrate (4), and a reference hole (5) for lamination is a reference hole for drilling a through hole. A method of manufacturing a multilayer printed wiring board commonly used for: a metal foil (1) at least around a reference hole (5) in an outermost layer;
Forming an adhesive layer (7) on the surface of the multilayer substrate (4), roughening the adhesive layer (7), and then drilling a through hole. Plate manufacturing method.
【請求項2】 最外層に金属箔(1)を配置した状態で
多層基板(4)を積層形成し、次に基準穴(5)の周り
を残して金属箔(1)を除去することにより最外層の基
準穴(5)の周りに金属箔(1)を形成することを特徴
とする請求項1に記載の多層プリント配線板の製造方
法。
2. A multi-layer board (4) is laminated and formed with the metal foil (1) disposed on the outermost layer, and then the metal foil (1) is removed while leaving the periphery of the reference hole (5). The method according to claim 1, wherein the metal foil (1) is formed around the outermost reference hole (5).
【請求項3】 少なくとも最外層の導体回路の形成にア
ディティブ法を用いるとともに、多層基板(4)の積層
にピンラミネーション方式を用い、積層時の基準穴
(5)をスルーホール穴あけ時の基準穴に共用する多層
プリント配線板の製造方法において、 最も外側に配置される層間絶縁材(3)を基準穴(5)
の周りを切り欠いた状態とし、当該層間絶縁材(3)が
切り欠かれた部分のみに金属箔(1)を配置して多層基
板(4)を積層形成した後、多層基板(4)の表面への
接着剤層(7)の形成及び接着剤層(7)の粗化を行
い、次にスルーホール穴あけを行うことを特徴とする多
層プリント配線板の製造方法。
3. An additive method is used for forming at least the outermost conductive circuit, a pin lamination method is used for laminating the multilayer substrate (4), and a reference hole (5) for laminating is a reference hole for drilling a through hole. In the method for manufacturing a multilayer printed wiring board commonly used for the above, the outermost interlayer insulating material (3) is provided with the reference hole (5).
Is cut out, and the metal foil (1) is arranged only in the cutout portion of the interlayer insulating material (3) to form a multilayer board (4). A method for manufacturing a multilayer printed wiring board, comprising forming an adhesive layer (7) on a surface, roughening the adhesive layer (7), and then drilling a through hole.
JP1907192A 1992-02-04 1992-02-04 Manufacturing method of multilayer printed wiring board Expired - Lifetime JP3065766B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1907192A JP3065766B2 (en) 1992-02-04 1992-02-04 Manufacturing method of multilayer printed wiring board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1907192A JP3065766B2 (en) 1992-02-04 1992-02-04 Manufacturing method of multilayer printed wiring board

Publications (2)

Publication Number Publication Date
JPH05218649A JPH05218649A (en) 1993-08-27
JP3065766B2 true JP3065766B2 (en) 2000-07-17

Family

ID=11989202

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1907192A Expired - Lifetime JP3065766B2 (en) 1992-02-04 1992-02-04 Manufacturing method of multilayer printed wiring board

Country Status (1)

Country Link
JP (1) JP3065766B2 (en)

Also Published As

Publication number Publication date
JPH05218649A (en) 1993-08-27

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