JP3094132B2 - Photosensitive material processing tank - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a photographic material processing tank for immersing a silver halide photographic material in a processing solution filled in a plurality of processing chambers and communicating with each other through a photosensitive material conveying path. .

[0002]

2. Description of the Related Art In general, when a silver halide photographic light-sensitive material is immersed, a processing tank containing a large amount of processing solution is used for uniform processing. By processing a photosensitive material by storing a large amount of a processing solution in a processing tank, the processing solution can be exchanged well on the film surface of the photosensitive material, but since a large amount of the processing solution is used in this type of processing tank, The processing device becomes larger accordingly.

On the other hand, as an apparatus for processing a photosensitive material with a small amount of processing solution, a slit type processing tank has been proposed (Japanese Patent Application Laid-Open Nos. 61-77851 and 63-1311).
No. 38, No. 63-216050, etc.). In this processing tank, the contact area (opening degree) between the air and the processing liquid is small, so that the oxygen and carbon dioxide gas in the air are less likely to enter the liquid to prevent the deterioration of the processing liquid. Further, since the amount of the tank liquid is small, if the replenisher is replenished during the processing of the photosensitive material, the ratio of the replenisher to the processing liquid is high, so that the processing liquid can be prevented from deteriorating during the idle processing.

Further, a multi-chamber processing apparatus has been proposed as a processing apparatus for performing processing with a small amount of processing solution and differentiating functions (Japanese Patent Laid-Open Nos. 1-267648 and 2-13054).
No. 8 and No. 2-240651). As a multi-chamber processing apparatus, there is an apparatus having a configuration in which a number of processing chambers communicate with each other through a cross-section slit portion, and the cross-section slit portion is provided with a seal member or the like for blocking the flow of a processing solution, and When the material is not being processed, the processing liquid does not move between the chambers. When the photosensitive material passes through the slit section, the seal member elastically contacts the photosensitive material, so that the processing liquid is prevented from moving even when the photosensitive material passes therethrough, and the boundary layer on the photosensitive material is prevented. Can be destroyed.

In order to perform the water washing process in the multi-chamber processing apparatus, the washing water flows from the downstream side to the upstream side in the photosensitive material transport direction in a plurality of processing chambers. It is desirable to be in a so-called multi-stage countercurrent state. According to the above configuration, when the seal member elastically contacts the photosensitive material, a slight gap is generated at both ends of the photosensitive material, and the liquid can move only when the seal member elastically contacts the photosensitive material. .

[0006] As a seal structure in which the photosensitive material and the processing liquid can be moved between the processing chambers which communicate with each other, the tip portions of a pair of cantilevered elastic blades are elastically brought into contact with each other, or a single cantilevered piece is supported. There is a configuration in which the tip of the elastic blade elastically contacts the opposing wall surface (Japanese Patent Laid-Open No. Hei 4-243258).
No. JP-A-4-243259). According to such a configuration, by conveying the photosensitive material against the elastic force of the elastic blade, the photosensitive material can advance while being in contact with the blade. The processing liquid can also move from the gap corresponding to the material thickness.

[0007]

In the case of a process in which processing is performed in multiple stages, such as a washing process, a counter flow state is set when the processing liquid is moved between adjacent processing chambers in the multi-chamber processing tank having the above configuration. Although it is preferable because it can be performed, when the adjacent processing chambers are filled with different processing liquids in the multi-chamber processing tank for processing, it is necessary to surely prevent the processing liquid from being mixed (contamination).

For example, when the developing process and the bleaching process are performed in the adjacent processing chambers, it does not matter much if the developer is mixed in the bleaching solution. Should be avoided at all costs. This is because if the bleaching solution is mixed in the developing solution, the function of the developing solution can hardly be exhibited, and the function of the developing solution can hardly be exhibited, so that the developing solution cannot be used. In consideration of the fact that the processing solution component drops due to the effect of gravity, if a bleaching processing chamber is provided below the developing processing chamber and the photosensitive material is conveyed downward, the bleaching liquid will be produced even if both processing chambers are adjacent to each other. It was thought that it would not be mixed into the developer.

However, in practice, merely providing a sealing member for sealing the photosensitive material between the two processing chambers so that the photosensitive material can pass therethrough is not sufficient.
It was found that the bleaching solution was mixed with the bleaching solution irrespective of the gravity only by the temporary contact of the developing solution with the bleaching solution having a higher specific gravity . Therefore, it was found that the multi-chamber processing tank having the above configuration is insufficient for performing processing using different types of processing solutions such as development processing and bleaching processing in the adjacent processing chamber.

SUMMARY OF THE INVENTION An object of the present invention is to solve the above-mentioned conventional problems, and to provide a photosensitive material processing tank in which a processing solution is not mixed from a processing chamber on a downstream side in a photosensitive material transport direction to a processing chamber on an upstream side. It is in.

[0011]

The above object of the present invention is attained by the following constitution. (1) In a multi-chamber processing tank in which a plurality of processing chambers communicated via a photosensitive material conveying path are vertically stacked, and a photosensitive material passage between adjacent processing chambers is liquid-tightly sealed so that the photosensitive material can pass through,
So that at least one pair of adjacent processing chamber lower process chamber of a processing solution surface above the gas layer is generated, only setting means for adjusting the lower process chamber liquid level, and said means is a liquid level detecting means
And a drainage unit for maintaining the liquid level and a pressurizing unit.
Photosensitive material processing tank, wherein.

[0012]

( 2 ) In the processing tank of (1), a plurality of processing chambers are filled with a processing solution for the next step of development, and a means for replenishing the uppermost processing chamber with a replenisher is provided. Means for discharging a processing solution from a processing chamber below a replenishing processing chamber, wherein the photosensitive material is transported upward between the processing chambers for processing.

( 3 ) Using the processing tank according to any one of (1) to ( 2 ) above, filling a processing chamber above the gas layer with any of a developing solution, a fixing solution, a washing solution, and a rinsing solution. A lower processing chamber is filled with another processing liquid, and the photosensitive material is conveyed downward between the processing chambers for processing.

( 4 ) In the processing tank according to any one of (1) to ( 2 ), a plurality of processing chambers for filling any of a developer, a fixing solution, a washing solution, and a rinsing solution are continuous. A photosensitive material processing tank.

( 5 ) The fixing bath, the bleaching bath, the bleach-fix bath, the washing bath, and the rinsing bath are placed in the processing chamber above the gas layer using the processing bath according to any one of the above (1) to ( 2 ). A method for processing a photosensitive material, wherein one of them is filled, another processing solution is filled in a lower processing chamber, and the photosensitive material is conveyed upward between the processing chambers for processing.

( 6 ) In the processing tank according to any one of (1) to ( 2 ), a plurality of processing chambers filled with any one of a developer, a fixing solution, a washing solution, and a rinsing solution are continuous. A photosensitive material processing tank.

[0018]

By providing a gas layer between adjacent processing chambers, the processing liquid in the processing chamber below the gas layer does not enter the processing chamber above the gas layer due to the action of gravity. Therefore, in a configuration in which the photosensitive material is transported downward in the gas layer, the processing chamber above the gas layer is filled with a processing liquid that must avoid contamination, and contamination can be allowed in the processing chamber below the gas layer. What is necessary is just to fill the processing solution and transport the photosensitive material throughout the processing chambers for processing. In this way, by filling different types of processing liquids at the gas layer,
Contamination of the processing liquid can be reliably prevented, and unexpected deterioration of the processing liquid performance can be prevented, thus facilitating maintenance.

As the gas to be used, a gas which does not react with each processing solution is preferable. In particular, an inert gas such as nitrogen is preferable, but air may be used. Furthermore, if necessary,
Heavy gases such as carbon dioxide, argon, xeno
Or krypton gas. The thickness of the gas layer is 2 to
10 mm is preferable, and particularly preferably 5 to 10 mm. Ma
During processing, the liquid at the top of the blade is exchanged for air at the bottom.
However, to reduce this, use a magnet at the tip of the blade.
It may be inserted to increase the blade adhesion. Need more
The magnetic force may be controlled accordingly.

In the processing chamber above the gas layer in the photosensitive material transport direction, even if the processing liquid in the processing chamber enters the processing chamber below the processing chamber, it does not adversely affect the performance of the processing liquid below. Is preferably filled. Conversely, it is preferable that the processing chamber below the gas layer is filled with a processing liquid having such a property that the performance does not cause a problem even if the processing liquid is mixed in from the processing chamber above the gas chamber.

As a suitable combination of the processing liquids in the above relationship, a processing liquid above the gas layer and a processing liquid below the gas layer are listed. Processing liquids having developing ability and processing liquids having fixing ability, washing water and fixing ability And a combination of processing liquids such as The specific combination of the processing solution above and below the gas layer may be a color developer and a bleach-fix solution when processing a color photosensitive material, a color developer and a fixing solution, or a process when processing a black-and-white photosensitive material. Denotes a black-and-white developer and a bleaching solution, and a bleaching solution and a fixing solution.

For example, in a configuration in which the upper processing chamber above the gas layer is filled with a developing solution, the lower processing chamber is filled with a fixing solution, and the photosensitive material is transported downward and processed in the processing tank arranged as described above, Although there is a small amount of developer in the fixer,
Mixing of the fixer into the developer is reliably prevented.
Therefore, the expiration of the developing solution is eliminated, and there is no cause of performance deterioration other than the fatigue of the developing solution due to the processing of the photosensitive material and the aging, and the replenishment amount of the developing replenisher can be reduced by that amount, which is advantageous in cost. .

The means for adjusting the liquid level includes, for example, a liquid level sensor for detecting the liquid level below the gas layer, and a liquid discharging means for discharging the processing liquid when the liquid level is higher than a set level. Pumps, valves, etc.) and compressed gas supply means (pumps, compressors, pressure chambers, etc.) for constantly generating a predetermined pressure in the gas layer on the processing liquid. The pressure of the gas layer is
In the photosensitive material passage portion between the photosensitive material and the upper processing chamber, the processing liquid is constantly pushed up so that the processing liquid does not drop from a slight gap that may be generated near the seal member during the processing of the photosensitive material. Even if there is a gap in the vicinity of the seal member provided between the processing chambers, the processing liquid can be prevented from falling by the action of the surface tension. Is done.

The portion where the gas layer is provided is preferably a portion which is a boundary between two processing chambers filled with different processing liquids in order to prevent contamination of different processing liquids. Also, if an air layer is formed above the bleach-fix solution, the bleach-fix solution will always be in contact with the oxygen of the air to increase the activity,
The amount of replenisher can be reduced accordingly.

In the adjacent processing chamber filled with the same type of processing liquid, the processing liquid component in the upper processing chamber moves to the lower processing chamber through the photosensitive material passage by gravity to form a concentration gradient. Therefore, the replenisher is replenished to the uppermost processing chamber of the multi-chamber processing tank filled with the same type of processing liquid, and overflows from the lowermost processing chamber (the processing chamber immediately after the single-chamber processing bath), and the photosensitive material is removed. It is preferable to convey upward and perform multi-stage countercurrent processing.

The multi-stage countercurrent treatment is particularly effective in a washing treatment for removing unnecessary components of the prebath adhering to the emulsion surface of the photosensitive material and unnecessary components of the prebath in the emulsion film. For this reason, a process in which a multi-chamber processing tank is filled with the same type of processing solution is particularly effective when a predetermined process of the photosensitive material is performed and then a temporary cleaning process is performed.

It is preferable to provide a gas layer between the processing chambers even at the boundary between adjacent processing chambers filled with the same type of processing liquid. The reason is that in the cleaning process, the photosensitive material is more efficiently cleaned by temporarily contacting the gas and cutting off the surface liquid than by constantly contacting the processing solution. Therefore, by providing a gas layer between the adjacent processing chambers for performing the cleaning process, there is an effect that the cleaning can be performed quickly and well.

The term "cleaning process" used herein refers to a process for removing unnecessary components adhered or impregnated on a photosensitive material.
Specifically, there are a washing process and a rinsing process. Further, the washing treatment for removing unnecessary components broadly includes a fixing treatment for performing a desilvering treatment, which is an action of washing out silver, and the present invention is also effective for a fixing treatment performed in a multistage cascade. In a broader sense, since all post-development processes are washing processes to remove any substances, bleaching and bleach-fixing are performed by forming a gas layer between adjacent processing chambers in a multi-stage countercurrent multi-chamber processing tank. The same effect can be obtained even if it is provided.

[0029]

An embodiment of the present invention will be described below with reference to the accompanying drawings. However, the present invention is not limited to only the present embodiment, and any changes can be made based on the technical idea of the present invention.

FIG. 1 is a sectional view of a processing tank 2 according to a first embodiment of the present invention. The processing tank 2 shown in FIG. 1 performs color development of the exposed color paper.
The developing process and the bleach-fixing process are performed.

The processing tank 2 has a plurality of processing chambers 8a to 8 formed by vertical partition walls 4 extending in the vertical direction and horizontal partition walls 6 extending in the horizontal direction.
e. A slit-shaped photosensitive material passage 14 is formed in the horizontal partition 6, and the lower end of the vertical partition 4 is located at a predetermined height from the bottom of the processing tank. Through each processing chamber 8a
To 8e. A seal member 16 made of an elastic blade is provided in the passage 14 to seal the passage 14 in a liquid-tight manner except when the photosensitive material is passed.

The processing tank 2 has a first processing chamber 8a, a second processing chamber 8b, a third processing chamber 8c,
A fourth processing chamber 8d and a fifth processing chamber 8e are provided, and the first processing chamber 8a and the second processing chamber 8b are filled with a color developing solution. The third processing chamber 8c, the fourth processing chamber 8d, and the fifth
The processing chamber 8e is filled with a bleach-fixing solution. The gas layer 18 which is a feature of the present invention is formed in the third processing chamber 8c and the fourth processing chamber 8d filled with the bleach-fix solution. The volume per processing chamber is preferably about 20 to 3000 ml.

The first processing chamber 8a is provided with a replenishing pipe 20 for replenishing a developing replenisher, and the fifth processing chamber 8e is provided with a replenishing pipe 22 for replenishing a bleach-fixing solution. The developer in the first processing chamber 8a adheres to the photosensitive material S by the action of gravity and partially through the second processing from a gap formed near the seal member 16 when the photosensitive material S passes through the passage 14. It flows into the chamber 8b. A part of the developing solution in the second processing chamber 8b drops from the similarly generated gap and flows into the third processing chamber 8c. Therefore, the first processing chamber 8a and the second processing chamber 8
The developing solution (b) has a concentration gradient having a higher performance between the two in the upstream of the photosensitive material transport direction, and the developing process is performed in multiple stages.

On the other hand, the bleach-fix solution in the fifth processing chamber 8e
When the photosensitive material S passes through the passage 14, the sealing member 16
From the gap formed in the vicinity of the first processing chamber 8d, and a part thereof flows into the fourth processing chamber 8d by the action of gravity. Further, the bleach-fix solution in the fourth processing chamber 8d flows into the third processing chamber 8c from the similarly generated gap by the action of gravity. Therefore, the third to fifth processing chambers 8
In the bleach-fixing solutions c to 8e, a density gradient having a higher performance is generated downstream in the photosensitive material transport direction, so that the bleach-fixing process is also performed in multiple stages.

Although the bleach-fixing solution is initially filled in the third processing chamber 8c, the developing solution falls with the processing of the photosensitive material S and mixes with the bleach-fixing solution, so that the bleach-fixing solution becomes dirty. . However, the third processing chamber 8c is the first stage of the bleach-fix processing, and the bleach-fix processing is performed in the fourth processing chamber 8d and the fifth processing chamber 8e thereafter. There is no major problem even if the bleach-fix solution in the third processing chamber 8c is slightly contaminated.

Next, the structure of the liquid level adjustment for setting the lower limit of the gas layer, which is a main part of the present invention, will be described with reference to the third processing chamber 8.
This will be described using c as an example. Adjustment of the liquid level is performed by the liquid level sensor 2
4, a drain valve 26 as a drain unit, and a pressure chamber 28 as a compressed gas supply unit for feeding a compressed gas onto the liquid surface.
And an air supply valve 30 and a drive control means (CPU or the like) 32 for controlling each of these drives. Pressure chamber 28
Compressed gas is appropriately supplied by a compressor (not shown), and a constant high pressure state is maintained.

The liquid level sensor 24 issues a detection signal when the liquid level rises above a set liquid level, and the control means 32
To supply a detection signal. The control means 32 controls the drain valve 26
And an operation signal is supplied to the air supply valve 30 to control these operations. That is, when the liquid level in the third processing chamber 8c rises due to the inflow of the same or different processing liquid from another processing chamber and the liquid level sensor 24 detects this, the control unit 32
Opens a drain valve 26 to partially discharge the bleach-fixing solution, and also opens an air supply valve 30 to supply a compressed gas onto the liquid surface to form a gas layer 18 having a predetermined height. The pressure in the gas layer may be detected by a pressure gauge and maintained at a constant value.However, without using a pressure gauge, the pressure is set to a predetermined level above a set level. The pressure may be set so that the liquid level is pushed down to a set level.

Similarly, a liquid level sensor 34, an air supply valve 36, and a compression chamber 38 are provided for the fourth processing chamber 8d, and these are connected to the controller 32. The processing liquid in the fourth processing chamber 8d is discharged through the third processing chamber 8c, and the drain valve 26 is also used for discharging the liquid. The control device 32 controls the operation of the drain valve 26 and the air supply valve 36 in accordance with the detection signal from the liquid level sensor 34 to adjust the liquid level of the fourth processing chamber 8d to thereby control the gas of a predetermined height. A layer 19 is formed.

The bleach-fix solution in the third processing chamber 8c and the fourth
Since there is a head difference with the bleach-fix solution in the processing chamber 8d, the first
The pressure of the gas layer 18 is set higher than the pressure of the second gas layer 19, so that appropriate liquid level can be maintained in each of the third processing chamber 8c and the fourth processing chamber 8d. For example, each pressure of the first gas layer 18 and the second gas layer 19 is 1.0
The pressure is preferably about 01 to 1.5 atm.

FIG. 2 is an enlarged view of portions a and b in FIG. Since there is a head difference between the liquid level in the third processing chamber 8c and the liquid level in the fourth processing chamber 8d, the pressure P1 in the section a is larger than the pressure P2 in the section b. Here, the pair of seal members 16 provided in the passage 14 are made of an elastic material, and are cantilevered so that the front ends thereof elastically contact with each other in the photosensitive material conveying direction. Pressure P1 acts in the direction in which Of course, the sealing function is exerted by the sealing member 16 alone. However, in the part a, the sealing property of the sealing member 16 is improved by the effect of the air pressure in the gas layer 18 and the sealing function is enhanced. It is also possible to prevent the developer from leaking between the seal members 16.

The seal member 16 is similarly supported at the portion b, but the pressure of the gas layer 19 acts in the direction to release the close contact of the seal member 16, contrary to the portion a. Liquid mobility is increased. However, it is preferable that a predetermined amount of liquid moves in part b in order to cause a countercurrent state. Therefore, the pressure P2 and the weight of the bleach-fixing solution in the fifth processing chamber 8e are appropriately adjusted. Although a fixed amount of the bleach-fix solution can be moved, the bleach-fix solution does not leak more than necessary.

The photosensitive material S is immersed in a developing solution in the first processing chamber 8a and the second processing chamber 8b and developed, and then the third
After passing through the gas layer 18 in the processing chamber 8c, the third processing chamber 8c
Then, it is immersed in the bleach-fixing solution to start the bleach-fixing process. The main ingredient is attached to the photosensitive material S that has exited from the second processing chamber 8b, and this main ingredient is directly used in the third processing chamber 8c.
Mixed in. Further, a part of the developing solution in the second processing chamber 8b falls into the third processing chamber 8c from a gap created near the seal member 16 as the photosensitive material S passes. However, in a general processing apparatus, there is no significant problem even if a small amount of the developer is mixed by the fall from the passage 14 as in the case where the developer is brought into the bleach-fix solution by the photosensitive material S.

On the other hand, if the bleach-fixing solution is mixed in the developing solution, the developing performance is immediately lost, and this should be absolutely avoided. By filling the second processing chamber 8b with the developing solution and filling the third processing chamber 8c with the bleach-fixing solution via the gas layer 18, the mixing of the bleach-fixing solution into the developing solution is against gravity. Therefore, this is not possible, and the developer does not lose its performance due to the mixing of the bleach-fix solution into the developer.

Further, when the photosensitive material S temporarily moves in the gas, the processing liquid adhering to the photosensitive material S becomes droplets due to surface tension while passing through the gas layers 18 and 19, and as a result, There is also an effect that cutting is improved. Therefore,
In the first gas layer 8a, the developer runs off and the development can be stopped immediately, and in the second gas layer 8b, the bleach-fix solution runs out. The final bleach-fixing process using the bleach-fixing solution is quickly and satisfactorily performed.

In the above embodiment, the first and second processing chambers 8
a and 8b are filled with a developer, and the third to fifth processing chambers 8c to 8c are filled.
The processing is performed by filling the bleach-fixing solution into e. Alternatively, the processing may be performed by changing the processing solution and filling as described below.

For example, when the third to fifth processing chambers 8c to 8e are filled with a liquid having a cleaning function, the uppermost processing chamber 8e is replenished with a replenisher. When transported upward, the uppermost processing chamber 8e
The processing liquid sequentially flows into each of the processing chambers 8d and 8c below. The processing liquid flows in a cascade state from the upper side (downstream in the transport direction) from the upper side (upstream in the transport direction), and the components are lowered by the influence of gravity. Thus, the photosensitive material S is efficiently cleaned.

Therefore, the photosensitive material S on the right side of the vertical partition 4
If the processing chamber is transported upward, the processing chamber upstream of the transport direction will have a thicker liquid of the processing liquid component, and conversely, the downstream processing chamber will have a thinner liquid of the processing liquid, and the processing liquid in the preceding bath will be washed in a countercurrent state. And cleaning efficiency is good. In particular, when the cleaning process is performed, the photosensitive material S is more in contact with the processing solution than the photosensitive material S is always in contact with.
Temporarily contacting with gas is preferable because the processing liquid is once removed from the film surface, and it is preferable to provide a gas layer between adjacent processing tanks.

The washing here may be a temporary washing between specific treatments, or a washing in the final step before drying. Further, the washing solution has a washing function in a broad sense, and includes a solution having a bleaching ability, a solution having a fixing ability, a rinsing solution, and washing water.

The processing liquid above the gas layer 18 on the side where the photosensitive material S is transported downward may be any of a developing liquid, a fixing liquid, a washing liquid, and a rinsing liquid. Preferably, a plurality of processing chambers are filled. The processing solution above the air layer 19 on the side where the photosensitive material S is transported upward may be any of a bleaching solution, a bleach-fixing solution, a washing solution, and a rinsing solution. Preferably, a plurality of processing chambers are filled.

In the case of processing the photosensitive material S, the processing tank having the above configuration can be used in each of the steps of development, bleach-fixing, bleaching, fixing, washing, rinsing, stabilization, and the like. It is effective even if only the tank for performing at least two processing steps is configured as described above. In particular, application in a processing step in which mixing of different types of processing liquids is desired to be prevented is preferable.

Next, a second embodiment of the present invention will be described. FIG. 3 is a sectional view of a processing tank according to a second embodiment of the present invention. This embodiment is different from the first embodiment described above.
This is the position where the gas layer is provided. In the processing tank 2 of the second embodiment, the gas layer 18 is provided only in the third processing chamber 8c which is the lowermost chamber, and the liquid surface provided for the fourth processing chamber 8d is provided. Sensor 3
4 and the air supply valve 36 are omitted.

Even if the gas layer 18 is provided only in the third processing chamber 8c, the gas layer 18 has the effect of preventing the backflow, and the bleach-fixing solution in the third processing chamber 8c is removed from the second processing chamber 8c.
b), and can prevent the developer from expiring.
Further, since the gas layer 18 is also provided between the fourth processing chamber 8d, the bleach-fixing solution in the third processing chamber 8c does not enter the fourth processing chamber 8d even with the same type of processing liquid. The concentration gradient of the bleach-fix solution between the third processing chamber 8c and the fourth processing chamber 8d is kept good.

In the second embodiment, a common gas layer 18 between processing chambers filled with different types of processing liquids and between processing chambers filled with the same type of processing liquid is formed by a set of a liquid level sensor 24 and a drainage liquid. It can be formed by the valve 26, the air supply valve 30, and the pressure chamber 28.

When the photosensitive material S is transported downward, the processing liquid above the gas layer 18 includes a developing solution, a fixing solution,
Any of a washing liquid and a rinsing liquid may be used, and it is preferable that each processing liquid is filled in a plurality of processing chambers 8a and 8b. The processing liquid above the gas layer 18 on the side where the photosensitive material S is transported upward includes a bleaching solution, a bleach-fixing solution,
Any of a washing liquid and a rinsing liquid may be used, and each processing liquid is preferably filled in a plurality of processing chambers 8d and 8e.

[0055]

According to the present invention, the liquid level is adjusted so that the gas layer is present on the processing liquid level in the processing chamber below at least one set of adjacent processing tanks, so that the liquid level is adjusted above the gas layer. The processing solution in the processing chamber does not come into contact with the processing solution in the lower processing chamber, and the processing solution in the lower processing chamber does not mix with the processing liquid in the upper processing chamber. Therefore, it is possible to process the photosensitive material by filling the upper processing chamber and the lower processing chamber with different processing liquids to be surely prevented from being mixed. For example, the upper processing chamber is filled with the developer. Even if the lower processing chamber is filled with the bleaching solution to process the photographic material, the photographic material can be satisfactorily processed without causing any problem due to the mixing of the processing solutions.

[Brief description of the drawings]

FIG. 1 is a sectional view of a photosensitive material processing tank according to a first embodiment of the present invention.

FIG. 2 is an enlarged view of a part a and a part b of FIG.

FIG. 3 is a sectional view of a photosensitive material processing tank according to a second embodiment of the present invention.

[Explanation of symbols]

 S photosensitive material 2 processing tank 4 vertical partition 6 horizontal partition 8a, 8b, 8c, 8d, 8e processing chamber 12 transport roller 14 passage 16 seal member 18, 19 gas layer 20, 22 refill pipe 24, 34 liquid level sensor 26 drainage Valve 28, 38 Pressure chamber 30, 36 Air supply valve 32 Controller

Continuation of the front page (56) References JP-A-3-257451 (JP, A) JP-A-3-121453 (JP, A) JP-A-4-281452 (JP, A) JP-A-2-69744 (JP) , A) (58) Fields studied (Int. Cl. ⁷ , DB name) G03D 3/00-17/00

Claims (6)

(57) [Claims] 1. A multi-chamber processing tank in which a plurality of processing chambers communicated via a photosensitive material transport path are vertically stacked, and a photosensitive material passage between adjacent processing chambers is liquid-tightly sealed so that the photosensitive material can pass therethrough. as the gas layer is generated in the processing solution surface above the lower process chamber of the at least one pair of adjacent processing chamber, only setting means for adjusting the lower process chamber liquid level, and said means is a liquid level detecting means
And a drainage unit for maintaining the liquid level and a pressurizing unit.
Photosensitive material processing tank, wherein. 2. A processing tank according to claim 1, wherein a plurality of processing chambers are filled with a processing solution for the next step of development, and a replenishing solution is replenished to an uppermost processing chamber of the processing chambers. Means for discharging the processing liquid from the processing chamber below the chamber,
A photosensitive material processing tank, wherein the photosensitive material is transported upward between the processing chambers for processing. 3. Using the processing tank according to any one of claims 1-2, developer above the processing chamber of the gas layer, the fixing solution,
A photosensitive material, which is filled with one of a washing liquid and a rinsing liquid, and a lower processing chamber is filled with another processing liquid, and the photosensitive material is conveyed downward between the processing chambers for processing. Processing method. 4. The processing tank according to any one of claims 1-2, developer, fixing solution, characterized in that the washing solution, the process chamber to fill any of the rinsing liquid is more continuous Photosensitive material processing tank. 5. A fixing solution, a bleaching solution, a bleaching solution, and a processing tank according to claim 1 or 2 ,
A bleach-fixing solution, a washing solution, or a rinsing solution is filled, another processing solution is filled in a lower processing chamber, and the photosensitive material is transported upward between the processing chambers for processing. Photosensitive material processing method. 6. The treatment tank according to any one of claims 1-2, developer, fixing solution, characterized in that the washing solution, the process chamber to fill any of the rinsing liquid is more continuous Photosensitive material processing tank.