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JP3137967B2 - TTL division photometry method and apparatus - Google Patents
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JP3137967B2 - TTL division photometry method and apparatus - Google Patents

TTL division photometry method and apparatus

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Publication number
JP3137967B2
JP3137967B2 JP01136397A JP13639789A JP3137967B2 JP 3137967 B2 JP3137967 B2 JP 3137967B2 JP 01136397 A JP01136397 A JP 01136397A JP 13639789 A JP13639789 A JP 13639789A JP 3137967 B2 JP3137967 B2 JP 3137967B2
Authority
JP
Japan
Prior art keywords
photometric
eva
output
partial
ttl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP01136397A
Other languages
Japanese (ja)
Other versions
JPH032530A (en
Inventor
正作 井東
祐一 池田
卓巳 井上
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Corp
Original Assignee
Kyocera Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
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Priority to JP01136397A priority Critical patent/JP3137967B2/en
Publication of JPH032530A publication Critical patent/JPH032530A/en
Application granted granted Critical
Publication of JP3137967B2 publication Critical patent/JP3137967B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Photometry And Measurement Of Optical Pulse Characteristics (AREA)

Description

【発明の詳細な説明】 (発明の利用分野) 本発明は、TTL分割測光装置において、分割された被
写体画面の一部測光素子に向うべき光束が隣接する他部
測光素子に入りこみ誤測光を引おこすことを防止し正し
い測光値を得る方法及び装置に関する。
DETAILED DESCRIPTION OF THE INVENTION (Field of Application of the Invention) The present invention relates to a TTL split metering device, in which a luminous flux to be directed to a portion of a split subject screen into a photometric device enters an adjacent other photometric device and erroneous photometry is performed. The present invention relates to a method and an apparatus for preventing occurrence and obtaining a correct photometric value.

(従来の技術及び発明の課題) TTL分割測光において、SPDを測光素子として使用する
場合、第4図及び第5図のごとき被写体画面における分
割測光を考えると、周辺部に到達すべき光の一部が中央
部に到達し、中央部に到達すべき光の一部が周辺部に到
達するというような事が通常の測光光学系では、レンズ
の収差等のために起る。
(Problems of the Related Art and Invention) In the case of using the SPD as the photometric element in the TTL split photometry, considering the split photometry on the subject screen as shown in FIGS. In an ordinary photometric optical system, a part reaches the central part, and a part of the light that should reach the central part reaches the peripheral part.

理想的な光学系を用いてフラットな光源を見た時、中
央部の測光分布は、第2図の様になるが、現実には前述
のように光束に広がりがあり第3図のようになる。第3
図の斜線部が周辺部の光の一部が中央部に到達してしま
った部分で、中央部には余分な光となる。従来、これを
防止するためには複雑な光学系を必要としていた。
When a flat light source is viewed using an ideal optical system, the photometric distribution at the center is as shown in FIG. 2, but in reality, the luminous flux is spread as described above, and as shown in FIG. Become. Third
The hatched portion in the drawing is a portion where a part of the light in the peripheral portion reaches the central portion, and extra light is provided in the central portion. Conventionally, a complicated optical system was required to prevent this.

(課題を解決するための手段) 上述の事情に鑑み、本発明はTTL分割測光される多分
割された被写体画面のうちの一領域の測光を受け持つ一
部測光手段と、前記画面のうちの前記一領域を除く他領
域の測光を受け持つ他部測光手段と、これらの測光手段
の測光出力を演算しそのデータを記憶する演算記憶手段
とを備え、前記他部測光手段が受ける測光面からの光束
が前記一部測光手段に影響しないときの前記一部測光手
段の出力(EVa)と、両測光手段に輝度差のない測光面
からの光束を受けたときの前記一部測光手段の出力(EV
A)及び前記他部測光手段の出力(EVB)をあらかじめ測
定し、EVa=EVA−K・2(EVB-EVA)式により補正係数Kを
あらかじめ求めておき、測光出力から前記補正係数Kの
係る項を減すことにより他部測光手段からの光束に影響
されない測光出力を得ることを特徴としたTTL分割測光
方法を提供する。
(Means for Solving the Problems) In view of the above-described circumstances, the present invention provides a partial photometry unit that performs photometry of one area of a multi-divided subject screen subjected to TTL division photometry, A light flux from a photometric surface which is provided with another photometric means for performing photometry in another area except for one area, and a computation storage means for computing the photometric output of these photometric means and storing the data; Does not affect the partial photometric means (EVa) and the output (EVa) of the partial photometric means when the two photometric means receive a luminous flux from a photometric surface having no luminance difference
A) and the output (EVB) of the other-part photometry means are measured in advance, and a correction coefficient K is obtained in advance by the equation EVa = EVA-K · 2 (EVB-EVA). A TTL division photometry method characterized by obtaining a photometry output that is not affected by a light beam from another portion photometry means by reducing terms.

また、TTL分割測光される多分割された被写体画面の
うちの一領域の測光を受け持つ一部測光手段と、前記画
面のうちの前記一領域を除く他領域の測光を受け持つ他
部測光手段と、前記他部測光手段が受ける測光面からの
光束が前記一部測光手段に影響しないときの前記一部測
光手段の出力(EVa)と、両測光手段に輝度差のない測
光面からの光束を受けたときの前記一部測光手段の出力
(EVA)及び前記他部測光手段の出力(EVB)をあらかじ
め測定し、EVa=EVA−K・2(EVB-EVA)式により演算し求
めた補正係数Kをあらかじめ記憶しておき、前記両測光
手段の出力と前記補正係数Kとにより他部測光手段から
の光束に影響されない測光出力を演算する演算記憶手段
とを備えたことを特徴としたTTL分割測光装置を提供す
る。
Further, a partial photometric unit that performs photometry in one area of the multi-divided subject screen that is subjected to TTL division photometry, and another unit photometric unit that performs photometry in another area excluding the one area of the screen, It receives the output (EVa) of the partial photometric means when the light flux from the photometric surface received by the other part photometric means does not affect the partial photometric means, and the light flux from the photometric surface where there is no difference in luminance between the two photometric means. The output of the partial photometer (EVA) and the output of the other photometer (EVB) are measured in advance and the correction coefficient K calculated by the equation EVa = EVA−K · 2 (EVB−EVA). TTL division photometry characterized by comprising: a storage device for preliminarily storing the photometry output and calculating a photometry output that is not affected by the luminous flux from the other photometry unit based on the outputs of the two photometry units and the correction coefficient K. Provide equipment.

(実施例) 以下、本発明について、図面に従って詳細に説明す
る。
Hereinafter, the present invention will be described in detail with reference to the drawings.

第1図は本発明装置の一実施例図、第2図は理想的光
学的によるフラット光源を見たときの中央部の測光分布
図、第3図は本発明装置の光学系による中央部の測光分
布図、第4図は被写体画面の分割例を示す図、第5図は
他の被写体画面の分割例を示す図である。
FIG. 1 is a view of an embodiment of the apparatus of the present invention, FIG. 2 is a photometric distribution diagram of a central portion when a flat light source based on ideal optics is viewed, and FIG. FIG. 4 is a diagram showing an example of division of a subject screen, and FIG. 5 is a diagram showing an example of division of another subject screen.

第1図において、SPD1、2、3、4、及び5は、各々
第5図のA、B、C、D、及びEに対応し、これらのSP
Dから発生する光電流は対数圧縮器6により対数圧縮さ
れ、A−D変換器7によりA−D変換され、演算器8で
は各々の部分同志の輝度差をパラメータとする測光光学
系の後述する補正式の演算を行い、真の測光値を得る動
作が行われる。9から13はスイッチ、14はレギュレータ
である。
In FIG. 1, SPDs 1, 2, 3, 4, and 5 respectively correspond to A, B, C, D, and E in FIG.
The photocurrent generated from D is logarithmically compressed by a logarithmic compressor 6, A / D-converted by an A / D converter 7, and a computing unit 8 of a photometric optical system which uses the luminance difference between the respective parts as a parameter, which will be described later. The operation of calculating the correction formula and obtaining the true photometric value is performed. 9 to 13 are switches, and 14 is a regulator.

次に補正式について説明する。説明を簡単にするた
め、第4図の二分割方式を説明する。測光する真のEV値
(露出値)をEVa、隣接する測光領域の光束の広がりの
影響を含んだEV値をEVA、補正係数をKとして、中央部
Aと周辺部Bとに輝度が均一な測光面からの光束を受け
て測光すると、中央部Aの真のEV値は、 EVa=EVA−K ・・・・・(1) 式で求めることができる。
Next, the correction formula will be described. For simplicity of description, the two-division system shown in FIG. 4 will be described. Assuming that the true EV value (exposure value) to be measured is EVa, the EV value including the influence of the spread of the luminous flux in the adjacent photometric region is EVA, and the correction coefficient is K, the brightness is uniform between the central portion A and the peripheral portion B. When the light flux is received from the photometry surface and photometry is performed, the true EV value of the central portion A can be obtained by the following equation: EVa = EVA−K (1)

したがって、周辺部Bより明るい光束で中央部AのEV
値EVaを測光し、次に同なじ明るさの光束で中央部A及
び周辺部Bともに照射し、中央部AのEV値EVAを測光す
れば、補正係数Kは K=EVA−EVa ・・・・・(2) 式で求めることができる。
Therefore, the EV of the central part A is brighter than the peripheral part B.
By measuring the value EVa, and then irradiating both the central portion A and the peripheral portion B with a light beam having the same brightness, and measuring the EV value EVA of the central portion A, the correction coefficient K becomes K = EVA−EVa. ··· (2)

この補正係数Kを演算器8に記憶しておけば、中央部
Aと周辺部Bが同一輝度の時の中央部Aの真のEVa値を
得ることができる。
If the correction coefficient K is stored in the arithmetic unit 8, a true EVa value of the central portion A when the central portion A and the peripheral portion B have the same luminance can be obtained.

しかしながら、中央部Aと周辺部Bの輝度が異なる場
合が当然あり、例えば、輝度が2倍になれば補正係数K
も2倍にする必要がある。
However, the brightness of the central portion A and the peripheral portion B may naturally be different. For example, if the brightness doubles, the correction coefficient K
Also needs to be doubled.

したががって、光束の広がりの影響を含んだ周辺部B
のEV値をEVBとすれば、 EVa=EVA−K・2(EVB-EVA) ・・(3) 式により、真のEVa値を求めることができる。
Therefore, the peripheral portion B including the influence of the spread of the luminous flux
Assuming that the EV value is EVB, the true EVa value can be obtained from the equation EVa = EVA−K · 2 (EVB−EVA) (3).

上述したように、光束の広がり影響を受けているEV値
と、光束の広がりの影響を受ていないEV値との差を影響
分としてやることで、補正係数Kが決定されるが、これ
は第5図のような多分割の場合にも適用できるものであ
る。この場合、補正式は次のようになる。
As described above, the correction coefficient K is determined by taking the difference between the EV value affected by the spread of the luminous flux and the EV value not affected by the spread of the luminous flux as the influence component. This is applicable to the case of multi-division as shown in FIG. In this case, the correction equation is as follows.

EVa=EVA−Kb・2(EVB-EVA) −Kc・2(EVC-EVA) −Kd・2(EVD-EVA) −Ke・2(EVE-EVA) ・・(4) (但し、光束の広がりの影響を含んだC部、D部、 E
部のEV値をそれぞれEVC、EVD、EVEとし、補正係数をK
b、Kc、Kd、Keとし、Kbは(3)式で求まり、他の係数
もそれぞれ(3)式を準用してあらかじめ求められ
る。) 尚、この補正では若干の誤差を生じることがあるが、
補正された値を3式又は4式の2の指数部分に使用し
て、2回あるいは多数回の補正を行うことで精度のよい
補正となる。
EVa = EVA-Kb · 2 (EVB-EVA) -Kc · 2 (EVC-EVA) -Kd · 2 (EVD-EVA) -Ke · 2 (EVE-EVA) · · (4) C, D, E
The EV value of each section is EVC, EVD, and EVE, and the correction coefficient is K
Here, b, Kc, Kd, and Ke are obtained. Kb is obtained by Expression (3), and other coefficients are obtained in advance by applying Expression (3). Note that this correction may cause some errors,
By using the corrected value for the exponent of 2 in Equation 3 or Equation 4 and performing correction twice or many times, accurate correction can be achieved.

(効果) 以上詳しく説明したように、本発明によれば、簡単な
構成で精度の良いTTL分割測光を行うことができる。
(Effects) As described in detail above, according to the present invention, accurate TTL division photometry can be performed with a simple configuration.

【図面の簡単な説明】[Brief description of the drawings]

第1図は本発明装置の一実施例図、第2図は理想的光学
系によるフラット光源を見たときの中央部の測光分布
図、第3図は本発明装置の光学系による中央部の測光分
布図、第4図は被写体画面の分割例を示す図、第5図は
他の被写体画面の分割例を示す図である。 1〜5……SPD、6……対数圧縮器、7……A−D変換
器、8……演算器、9〜13……スイッチ、14……レギュ
レータ
FIG. 1 is a view of an embodiment of the apparatus of the present invention, FIG. 2 is a photometric distribution diagram of a central portion when a flat light source is viewed by an ideal optical system, and FIG. FIG. 4 is a diagram showing an example of division of a subject screen, and FIG. 5 is a diagram showing an example of division of another subject screen. 1 to 5 SPD, 6 logarithmic compressor, 7 AD converter, 8 arithmetic unit, 9 to 13 switches, 14 regulator

───────────────────────────────────────────────────── フロントページの続き (58)調査した分野(Int.Cl.7,DB名) G01J 1/44 G03B 7/28 ──────────────────────────────────────────────────続 き Continued on the front page (58) Field surveyed (Int.Cl. 7 , DB name) G01J 1/44 G03B 7/28

Claims (2)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】TTL分割測光される多分割された被写体画
面のうちの一領域の測光を受け持つ一部測光手段と、前
記画面のうちの前記一領域を除く他領域の測光を受け持
つ他部測光手段と、これらの測光手段の測光出力を演算
しそのデータを記憶する演算記憶手段とを備え、 前記他部測光手段が受ける測光面からの光束が前記一部
測光手段に影響しないときの前記一部測光手段の出力
(EVa)と、両測光手段に輝度差のない測光面からの光
束を受けたときの前記一部測光手段の出力(EVA)及び
前記他部測光手段の出力(EVB)をあらかじめ測定し、E
Va=EVA−K・2(EVB-EVA)式により補正係数Kをあらか
じめ求めておき、 測光出力から前記補正係数Kの係る項を減すことにより
他部測光手段からの光束に影響されない測光出力を得る
ことを特徴としたTTL分割測光方法。
1. A partial photometer for taking light metering of one area of a multi-divided subject screen subjected to TTL split photometry, and another part metering taking charge of photometry of another area excluding said one area of the screen. Means for calculating the photometric output of these photometric means and storing the data, wherein the light beam from the photometric surface received by the other photometric means does not affect the partial photometric means. The output (EVa) of the partial photometer, the output (EVA) of the partial photometer and the output (EVB) of the other photometer when the two photometers receive the luminous flux from the photometric surface having no difference in luminance. Measure in advance and E
Va = EVA−K · 2 (EVB−EVA) The correction coefficient K is obtained in advance and the photometric output not affected by the luminous flux from the other photometric means by subtracting the term of the correction coefficient K from the photometric output. TTL split metering method characterized by obtaining
【請求項2】TTL分割測光される多分割された被写体画
面のうちの一領域の測光を受け持つ一部測光手段と、 前記画面のうちの前記一領域を除く他領域の測光を受け
持つ他部測光手段と、 前記他部測光手段が受ける測光面からの光束が前記一部
測光手段に影響しないときの前記一部測光手段の出力
(EVa)と、両測光手段に輝度差のない測光面からの光
束を受けたときの前記一部測光手段の出力(EVA)及び
前記他部測光手段の出力(EVB)をあらかじめ測定し、E
Va=EVA−K・2(EVB-EVA)式により演算し求めた補正係
数Kをあらかじめ記憶しておき、前記両測光手段の出力
と前記補正係数Kとにより他部測光手段からの光束に影
響されない測光出力を演算する演算記憶手段とを備えた
ことを特徴としたTTL分割測光装置。
2. A partial light metering means for performing light metering of one area of a multi-divided subject screen subjected to TTL split metering, and another light metering section for performing light metering of another area other than the one area of the screen. Means, an output (EVa) of the partial photometric means when the light flux from the photometric surface received by the other photometric means does not affect the partial photometric means, The output (EVA) of the partial photometer and the output (EVB) of the other photometer when the light beam is received are measured in advance, and E
Va = EVA−K · 2 (EVB−EVA) The correction coefficient K calculated and calculated by the equation (EVB-EVA) is stored in advance, and the output of the two photometric means and the correction coefficient K affect the luminous flux from the other photometric means. A TTL division photometric device, comprising: an arithmetic storage unit for calculating a photometric output that is not performed.
JP01136397A 1989-05-30 1989-05-30 TTL division photometry method and apparatus Expired - Fee Related JP3137967B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP01136397A JP3137967B2 (en) 1989-05-30 1989-05-30 TTL division photometry method and apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP01136397A JP3137967B2 (en) 1989-05-30 1989-05-30 TTL division photometry method and apparatus

Publications (2)

Publication Number Publication Date
JPH032530A JPH032530A (en) 1991-01-08
JP3137967B2 true JP3137967B2 (en) 2001-02-26

Family

ID=15174208

Family Applications (1)

Application Number Title Priority Date Filing Date
JP01136397A Expired - Fee Related JP3137967B2 (en) 1989-05-30 1989-05-30 TTL division photometry method and apparatus

Country Status (1)

Country Link
JP (1) JP3137967B2 (en)

Also Published As

Publication number Publication date
JPH032530A (en) 1991-01-08

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