JP3137966B2 - Method and apparatus for correcting leakage current of photometric element in TTL division photometry - Google Patents
Method and apparatus for correcting leakage current of photometric element in TTL division photometryInfo
- Publication number
- JP3137966B2 JP3137966B2 JP01136396A JP13639689A JP3137966B2 JP 3137966 B2 JP3137966 B2 JP 3137966B2 JP 01136396 A JP01136396 A JP 01136396A JP 13639689 A JP13639689 A JP 13639689A JP 3137966 B2 JP3137966 B2 JP 3137966B2
- Authority
- JP
- Japan
- Prior art keywords
- photometric
- eva
- leak current
- output
- light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
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- Photometry And Measurement Of Optical Pulse Characteristics (AREA)
Description
【発明の詳細な説明】 (発明の利用分野) 本発明は、TTL分割測光装置において、分割された被
写体画面の一部測光素子に他部測光素子からリーク電流
が入りこみ誤測光を引きおこすことを防止し正しい測光
値を得る方法及び装置に関する。DETAILED DESCRIPTION OF THE INVENTION (Field of Application of the Invention) The present invention, in a TTL split photometry device, prevents a leak current from entering a photometry element from another photometry element into one photometry element of a divided subject screen and causing erroneous photometry. And a method and apparatus for obtaining correct photometric values.
(従来の技術及び発明の課題) TTL分割測光において、SPDを測光素子として使用する
場合、第2図及び第3図のごとき被写体画面における分
割測光を考えると、多分割のSPD各部分からリーク電流
が生じて正しい測光値が得られない。その補正方法とし
て、各SPD間のアイソレーションを広くする事でリーク
電流の影響を小さくしようとする方法もあるが、この方
法は不感帯が大きくなってしまう。また、特開昭59−46
521号公報に記載のように、測光する時に不用なSPDのア
ノードとカソードをショートしてリーク電流が発生しな
いようにする方法もあるが、そのためには余分なスイッ
チ回路が必要になる。また、各SPDにアンプを並設して
リーク電流を防ぐ方法もあるが、SPDの数だけアンプが
必要となり回路が複雑となる。(Problems of the Related Art and the Invention) In the case of using TTL split photometry, where the SPD is used as a photometric element, considering split photometry on the subject screen as shown in FIGS. 2 and 3, leakage current from each part of the multi-split SPD is considered. And correct photometric values cannot be obtained. As a correction method, there is a method of reducing the influence of the leak current by widening the isolation between the SPDs, but this method increases the dead zone. Also, JP-A-59-46
As described in Japanese Patent Publication No. 521, there is a method in which an unnecessary SPD anode and cathode are short-circuited at the time of photometry so as not to generate a leak current. However, an extra switch circuit is required for that purpose. There is also a method of preventing leakage current by installing an amplifier in each SPD, but the number of amplifiers is required by the number of SPDs, and the circuit becomes complicated.
(課題を解決するための手段) 上述の事情に鑑み、本発明はTTL分割測光される多分
割された被写体画面のうちの一領域の測光を受け持つ一
部測光手段と、前記画面のうちの前記一領域を除く他領
域の測光を受け持つ他部測光手段と、これらの測光手段
の測光出力を演算しそのデータを記憶する演算記憶手段
とを備え、前記両測光手段に測光面から均一な光束を照
射し、前記他部測光手段の陽極陰極間を短絡してリーク
電流を遮断した状態で測光面からの前記光束を受けたと
きの前記一部測光手段の出力(EVa)と、前記他部測光
手段の陽極陰極間の開放してリーク電流を許容した状態
で測光面からの前記光束を受けたときの前記一部測光手
段の出力(EVA)及び前記一部測光手段のリーク電流を
許容した状態で測光面からの前記光束を受けたときの前
記他部測光手段の出力(EVB)をあらかじめ測定し、EVa
=EVA−K・2(EVB-EVA)式により補正係数Kをあらかじ
め求めておき、測光出力から前記補正係数Kの係る項を
減すことにより他部測光手段からのリーク電流に影響さ
れない測光出力を得ることを特徴としたTTL分割測光に
おける測光素子のリーク電流補正方法を提供する。(Means for Solving the Problems) In view of the above-described circumstances, the present invention provides a partial photometry unit that performs photometry of one area of a multi-divided subject screen subjected to TTL division photometry, Other photometric means for performing photometry in other areas except for one area, and arithmetic storage means for calculating the photometric output of these photometric means and storing the data, and providing a uniform luminous flux from the photometric surface to both photometric means. The output (EVa) of the partial photometric unit when the light beam is received from the photometric surface in a state of irradiating and short-circuiting between the anode and the cathode of the other unit photometric device and blocking the leak current; The output (EVA) of the partial photometric means when the light flux from the photometric surface is received in a state where the leak current is permitted by opening between the anode and the cathode of the means and the state in which the leak current of the partial photometric means is permitted When receiving the luminous flux from the photometric surface at The output (EVB) of the other-part photometric means of
= EVA-K · 2 (EVB-EVA) The correction coefficient K is obtained in advance and the term related to the correction coefficient K is subtracted from the photometry output, so that the photometric output is not affected by the leak current from the other photometric means. The present invention provides a method for correcting a leak current of a photometric element in TTL division photometry, characterized by obtaining
また、TTL分割測光される多分割された被写体画面の
うちの一領域の測光を受け持つ一部測光手段と、前記画
面のうちの前記一領域を除く他領域の測光を受け持つ他
部測光手段と、前記両測光手段に測光面から均一な光束
を照射して、前記他部測光手段のリーク電流を遮断した
状態で測光面からの前記光束を受けたときの前記一部測
光手段の出力(EVa)と、前記他部測光手段のリーク電
流を許容した状態で測光面からの前記光束を受けたとき
の前記一部測光手段の出力(EVA)及び前記一部測光手
段のリーク電流を許容した状態で測光面からの前記光束
を受けたときの前記他部測光手段の出力(EVB)をあら
かじめ測定し、EVa=EVA−K・2(EVB-EVA)式により演算
し求めた補正係数Kをあらかじめ記憶しておき、前記両
測光手段の出力と前記補正係数Kとにより他部測光手段
のリーク電流に影響されない測光出力を演算する演算記
憶手段とを備えたことを特徴としたTTL分割測光におけ
る測光素子のリーク電流補正装置を提供する。Further, a partial photometric unit that performs photometry in one area of the multi-divided subject screen that is subjected to TTL division photometry, and another unit photometric unit that performs photometry in another area excluding the one area of the screen, An output (EVa) of the partial photometric means when the two photometric means are irradiated with a uniform light beam from the photometric surface and the light beam from the photometric surface is received in a state where the leak current of the other photometric means is blocked. And an output (EVA) of the partial photometric unit when the light flux from the photometric surface is received in a state where the leak current of the other photometric unit is allowed and a leak current of the partial photometric unit is allowed. The output (EVB) of the other part photometric means when receiving the light beam from the photometric surface is measured in advance, and the correction coefficient K calculated and calculated by the equation EVa = EVA-K · 2 (EVB-EVA) is stored in advance. In addition, the output of the two photometric means and the correction coefficient K By providing the leakage current compensation device of the photometric element in TTL split photometry is characterized in that an arithmetic memory means for calculating a photometric output which is not affected by the leakage current of the other portion photometric means.
(実施例) 以下、本発明について、図面に従って詳細に説明す
る。Hereinafter, the present invention will be described in detail with reference to the drawings.
第1図は本発明装置の一実施例図、第2図は被写体画
面の分割例を示す図、第3図は他の被写体画面の分割例
を示す図である。FIG. 1 is a diagram showing an embodiment of the apparatus of the present invention, FIG. 2 is a diagram showing an example of division of a subject screen, and FIG. 3 is a diagram showing an example of division of another subject screen.
第1図において、SPD1、2、3、4、及び5は、各々
第3図のA、B、C、D、及びEに対応し、これらのSP
Dから発生する光電流は対数圧縮器6により対数圧縮さ
れ、A−D変換器7によりA−D変換され、演算器8で
は各々の部分同志のリーク電流をパラメータとする測光
光学系の後述する補正式の演算を行い、真の測光値を得
る動作が行われる。9から13はスイッチ、14はレギュレ
ータである。In FIG. 1, SPDs 1, 2, 3, 4, and 5 respectively correspond to A, B, C, D, and E in FIG.
The photocurrent generated from D is logarithmically compressed by a logarithmic compressor 6, A / D-converted by an A / D converter 7, and a computing unit 8 of a photometric optical system that uses a leak current of each partial parameter as a parameter. The operation of calculating the correction formula and obtaining the true photometric value is performed. 9 to 13 are switches, and 14 is a regulator.
次に補正式について説明する。説明を簡単にするた
め、第2図の二分割方式を説明する。他部測光素子のリ
ーク電流に影響されない真のEV値(露出値)をEVa、他
部測光素子のリーク電流の影響を含んだEV値をEVA、補
正係数をKとして、中央部Aと周辺部Bとに輝度が均一
な測光面からの光束を受けて測光すると、中央部Aの真
のEV値は、 EVa=EVA−K ・・・・・(1) 式で求めることができる。Next, the correction formula will be described. For simplicity of explanation, the two-split system in FIG. 2 will be described. The central part A and the peripheral part, where EVa is the true EV value (exposure value) that is not affected by the leakage current of the other part of the photometry element, EVA is the EV value that includes the influence of the leakage current of the other part of the photometry element, and K is the correction coefficient. When light is measured by receiving a light beam from a light measuring surface having a uniform luminance with B, the true EV value of the central portion A can be obtained by the following equation: EVa = EVA-K (1)
したがって、輝度均一な面光源に向けて、その測光面
の光束で中央部A及び周辺部Bともに照射し、B部のSP
Dのアノードとカソードをオープン状態にしたときの中
央部AのEV値EVAを測光し、次に同なじ明るさの光束で
中央部A及び周辺部Bともに照射し、B部のSPDのアノ
ードとカソードをショートした状態にしたときの中央部
AのEV値EVaを測光すれば、補正係数Kは K=EVA−EVa ・・・・・(2) 式で求めることができる。Therefore, toward the surface light source having uniform brightness, the light flux of the photometric surface is irradiated to both the central portion A and the peripheral portion B, and the SP of the portion B is irradiated.
The EV value EVA of the central part A when the anode and the cathode of D are opened is measured, and then the central part A and the peripheral part B are irradiated with the same luminous flux. By metering the EV value EVa of the central portion A when the cathode is short-circuited, the correction coefficient K can be obtained by the following equation: K = EVA−EVa (2)
この補正係数Kを演算器8に記憶しておけば、中央部
Aと周辺部Bが同一輝度の時、周辺部Bのリーク電流に
影響されない中央部Aの真のEVa値を得ることができ
る。If the correction coefficient K is stored in the arithmetic unit 8, when the central portion A and the peripheral portion B have the same luminance, a true EVa value of the central portion A which is not affected by the leakage current of the peripheral portion B can be obtained. .
しかしながら、中央部Aと周辺部Bの輝度が異なる場
合が当然あり、例えば、輝度が2倍になれば補正係数K
も2倍にする必要がある。However, the brightness of the central portion A and the peripheral portion B may naturally be different. For example, if the brightness doubles, the correction coefficient K
Also needs to be doubled.
したががって、中央部Aのリーク電流の影響を含んだ
周辺部BのEV値をEVBとすれば、 EVa=EVA−K・2(EVB-EVA) ・・(3) 式により、真のEVa値を求めることができる。Therefore, if the EV value of the peripheral portion B including the influence of the leak current in the central portion A is EVB, the true value can be obtained by the following equation: EVa = EVA−K · 2 (EVB−EVA) EVa value can be obtained.
上述したように、リーク電流の影響を受けているEV値
と、リーク電流の影響を受ていないEV値との差を影響分
としてやることで、補正係数Kが決定されるが、これは
第3図のような多分割の場合にも適用できるものであ
る。この場合、補正式は次のようになる。As described above, the correction coefficient K is determined by taking the difference between the EV value affected by the leak current and the EV value not affected by the leak current as an influence component. The present invention can be applied to the case of multi-division as shown in FIG. In this case, the correction equation is as follows.
EVa=EVA−Kb・2(EVB-EVA) −Kc・2(EVC-EVA) −Kd・2(EVD-EVA) −Ke・2(EVE-EVA) ・・(4) (但し、リーク電流の影響を含んだC部、D部、E部の
EV値をそれぞれEVC、EVD、EVEとし、補正係数をKb,Kc,K
d,Keとし、Kbは(3)式で求まり、他の係数もそれぞれ
(3)式を準用してあらかじめ求められる。) 尚、この補正では若干の誤差を生じることがあるが、
補正された値を3式又は4式の2の指数部分に使用し
て、2回あるいは多数回の補正を行うことで精度のよい
補正となる。EVa = EVA−Kb · 2 (EVB-EVA) −Kc · 2 (EVC-EVA) −Kd · 2 (EVD-EVA) −Ke · 2 (EVE-EVA)・ ・ (4) C, D, and E
The EV values are EVC, EVD, and EVE, respectively, and the correction coefficients are Kb, Kc, and Kb.
Here, d and Ke are set, and Kb is obtained by Expression (3), and other coefficients are obtained in advance by applying Expression (3), respectively. Note that this correction may cause some errors,
By using the corrected value for the exponent of 2 in Equation 3 or Equation 4 and performing correction twice or many times, accurate correction can be achieved.
(効果) 以上詳しく説明したように、本発明によれば、簡単な
構成で精度の良いTTL分割測光を行うことができる。(Effects) As described in detail above, according to the present invention, accurate TTL division photometry can be performed with a simple configuration.
第1図は本発明装置の一実施例図、第2図は被写体画面
の分割例を示す図、第3図は他の被写体画面の分割例を
示す図である。 1〜5……SPD、6……対数圧縮器、7……A−D変換
器、8……演算器、9〜13……スイッチ、14……レギュ
レータFIG. 1 is a diagram showing an embodiment of the apparatus of the present invention, FIG. 2 is a diagram showing an example of division of a subject screen, and FIG. 3 is a diagram showing an example of division of another subject screen. 1 to 5 SPD, 6 logarithmic compressor, 7 AD converter, 8 arithmetic unit, 9 to 13 switches, 14 regulator
───────────────────────────────────────────────────── フロントページの続き (58)調査した分野(Int.Cl.7,DB名) G01J 1/44 G03B 7/28 ──────────────────────────────────────────────────続 き Continued on the front page (58) Field surveyed (Int.Cl. 7 , DB name) G01J 1/44 G03B 7/28
Claims (2)
面のうちの一領域の測光を受け持つ一部測光手段と、前
記画面のうちの前記一領域を除く他領域の測光を受け持
つ他部測光手段と、これらの測光手段の測光出力を演算
しそのデータを記憶する演算記憶手段とを備え、 前記両測光手段に測光面から均一な光束を照射し、前記
他部測光手段の陽極陰極間を短絡してリーク電流を遮断
した状態で測光面からの前記光束を受けたときの前記一
部測光手段の出力(EVa)と、前記他部測光手段の陽極
陰極間の開放してリーク電流を許容した状態で測光面か
らの前記光束を受けたときの前記一部測光手段の出力
(EVA)及び前記一部測光手段のリーク電流を許容した
状態で測光面からの前記光束を受けたときの前記他部測
光手段の出力(EVB)をあらかじめ測定し、EVa=EVA−
K・2(EVB-EVA)式により補正係数Kをあらかじめ求めて
おき、 測光出力から前記補正係数Kの係る項を減すことにより
他部測光手段からのリーク電流に影響されない測光出力
を得ることを特徴としたTTL分割測光における測光素子
のリーク電流補正方法。1. A partial photometer for taking light metering of one area of a multi-divided subject screen subjected to TTL split photometry, and another part metering taking charge of photometry of another area excluding said one area of the screen. Means, and a calculation storage means for calculating the photometric output of these photometric means and storing the data, irradiating a uniform light flux from the photometric surface to both photometric means, and between the anode and the cathode of the other part photometric means. An output (EVa) of the partial photometric unit when receiving the luminous flux from the photometric surface in a state where the leak current is short-circuited and an opening between the anode and the cathode of the other photometric unit allow a leak current. The output (EVA) of the partial photometric means when receiving the light flux from the photometric surface in a state where the light flux is received from the photometric surface in a state where the leak current of the partial photometric means is allowed. Set the output (EVB) of the photometry Measure, EVa = EVA-
K · 2 (EVB-EVA) to obtain the correction coefficient K in advance and obtain a photometric output that is not affected by leakage current from other photometric means by subtracting the term related to the correction coefficient K from the photometric output. A leak current correction method for a photometric element in TTL split photometry, characterized by the following.
面のうちの一領域の測光を受け持つ一部測光手段と、 前記画面のうちの前記一領域を除く他領域の測光を受け
持つ他部測光手段と、 前記両測光手段に測光面から均一な光束を照射して、前
記他部測光手段のリーク電流を遮断した状態で測光面か
らの前記光束を受けたときの前記一部測光手段の出力
(EVa)と、前記他部測光手段のリーク電流を許容した
状態で測光面からの前記光束を受けたときの前記一部測
光手段の出力(EVA)及び前記一部測光手段のリーク電
流を許容した状態で測光面からの前記光束を受けたとき
の前記他部測光手段の出力(EVB)をあらかじめ測定
し、EVa=EVA−K・2(EVB-EVA)式により演算し求めた補
正係数Kをあらかじめ記憶しておき、前記両測光手段の
出力と前記補正係数Kとにより他部測光手段のリーク電
流に影響されない測光出力を演算する演算記憶手段とを
備えたことを特徴としたTTL分割測光における測光素子
のリーク電流補正装置。2. A partial light metering means for performing light metering of one area of a multi-divided subject screen subjected to TTL split metering, and another light metering section for performing light metering of another area other than the one area of the screen. Means for irradiating the light measuring means with a uniform light flux from the light measuring surface and outputting the partial light measuring means when receiving the light flux from the light measuring surface in a state in which the leak current of the other light measuring means is cut off. (EVa), the output (EVA) of the partial photometric unit and the leak current of the partial photometric unit when the light flux from the photometric surface is received in a state where the leak current of the other photometric unit is permitted. In this state, the output (EVB) of the other photometric means when receiving the light beam from the photometric surface is measured in advance, and the correction coefficient K calculated and calculated by the equation EVa = EVA−K · 2 (EVB−EVA) Is stored in advance, and the outputs of the two photometric means and the correction A device for correcting a leak current of a photometric element in TTL split photometry, comprising: a calculation storage means for calculating a photometric output that is not affected by a leak current of another portion photometric means using a coefficient K.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP01136396A JP3137966B2 (en) | 1989-05-30 | 1989-05-30 | Method and apparatus for correcting leakage current of photometric element in TTL division photometry |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP01136396A JP3137966B2 (en) | 1989-05-30 | 1989-05-30 | Method and apparatus for correcting leakage current of photometric element in TTL division photometry |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH032529A JPH032529A (en) | 1991-01-08 |
| JP3137966B2 true JP3137966B2 (en) | 2001-02-26 |
Family
ID=15174182
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP01136396A Expired - Fee Related JP3137966B2 (en) | 1989-05-30 | 1989-05-30 | Method and apparatus for correcting leakage current of photometric element in TTL division photometry |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3137966B2 (en) |
-
1989
- 1989-05-30 JP JP01136396A patent/JP3137966B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH032529A (en) | 1991-01-08 |
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