JP3214764B2 - Molding material - Google Patents
Molding materialInfo
- Publication number
- JP3214764B2 JP3214764B2 JP20622093A JP20622093A JP3214764B2 JP 3214764 B2 JP3214764 B2 JP 3214764B2 JP 20622093 A JP20622093 A JP 20622093A JP 20622093 A JP20622093 A JP 20622093A JP 3214764 B2 JP3214764 B2 JP 3214764B2
- Authority
- JP
- Japan
- Prior art keywords
- group
- imide
- resin
- compound
- aliphatic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000012778 molding material Substances 0.000 title claims description 22
- 239000005011 phenolic resin Substances 0.000 claims description 62
- -1 aromatic imide compound Chemical class 0.000 claims description 41
- 125000005462 imide group Chemical group 0.000 claims description 41
- 229920005989 resin Polymers 0.000 claims description 41
- 239000011347 resin Substances 0.000 claims description 41
- 125000001931 aliphatic group Chemical group 0.000 claims description 18
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 18
- 229920001568 phenolic resin Polymers 0.000 claims description 17
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 claims description 16
- 150000001875 compounds Chemical class 0.000 claims description 15
- 125000003710 aryl alkyl group Chemical group 0.000 claims description 14
- 150000002989 phenols Chemical class 0.000 claims description 12
- 125000004104 aryloxy group Chemical group 0.000 claims description 9
- 125000002950 monocyclic group Chemical group 0.000 claims description 8
- 229920003987 resole Polymers 0.000 claims description 8
- 125000005843 halogen group Chemical group 0.000 claims description 7
- 125000003545 alkoxy group Chemical group 0.000 claims description 6
- 125000001424 substituent group Chemical group 0.000 claims description 6
- 125000003118 aryl group Chemical group 0.000 claims description 5
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 5
- 125000003367 polycyclic group Chemical group 0.000 claims description 4
- 229920006395 saturated elastomer Polymers 0.000 claims description 4
- 125000000217 alkyl group Chemical group 0.000 claims description 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 3
- 150000003949 imides Chemical group 0.000 claims description 3
- 239000011256 inorganic filler Substances 0.000 claims description 3
- 239000012766 organic filler Substances 0.000 claims description 3
- 125000006539 C12 alkyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 claims description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 2
- 125000004429 atom Chemical group 0.000 claims description 2
- 229910052739 hydrogen Inorganic materials 0.000 claims description 2
- 239000001257 hydrogen Substances 0.000 claims description 2
- 102000006835 Lamins Human genes 0.000 claims 1
- 108010047294 Lamins Proteins 0.000 claims 1
- 125000004836 hexamethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[*:1] 0.000 claims 1
- 210000005053 lamin Anatomy 0.000 claims 1
- 238000006243 chemical reaction Methods 0.000 description 37
- 125000003277 amino group Chemical group 0.000 description 24
- 239000003054 catalyst Substances 0.000 description 21
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 20
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 20
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 18
- 239000002904 solvent Substances 0.000 description 13
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 12
- 150000004982 aromatic amines Chemical class 0.000 description 12
- VKYKSIONXSXAKP-UHFFFAOYSA-N hexamethylenetetramine Chemical compound C1N(C2)CN3CN1CN2C3 VKYKSIONXSXAKP-UHFFFAOYSA-N 0.000 description 11
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 10
- 238000000034 method Methods 0.000 description 10
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 8
- 150000008064 anhydrides Chemical class 0.000 description 7
- 230000018044 dehydration Effects 0.000 description 7
- 238000006297 dehydration reaction Methods 0.000 description 7
- 235000010299 hexamethylene tetramine Nutrition 0.000 description 7
- 239000004312 hexamethylene tetramine Substances 0.000 description 7
- 238000010992 reflux Methods 0.000 description 7
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 6
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 6
- 239000002253 acid Substances 0.000 description 6
- 239000003377 acid catalyst Substances 0.000 description 6
- 230000002378 acidificating effect Effects 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- 238000003786 synthesis reaction Methods 0.000 description 6
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 6
- ZZHIDJWUJRKHGX-UHFFFAOYSA-N 1,4-bis(chloromethyl)benzene Chemical group ClCC1=CC=C(CCl)C=C1 ZZHIDJWUJRKHGX-UHFFFAOYSA-N 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 5
- 238000006482 condensation reaction Methods 0.000 description 5
- 125000005439 maleimidyl group Chemical group C1(C=CC(N1*)=O)=O 0.000 description 5
- 230000003647 oxidation Effects 0.000 description 5
- 238000007254 oxidation reaction Methods 0.000 description 5
- 229960001755 resorcinol Drugs 0.000 description 5
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 4
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 4
- 238000010521 absorption reaction Methods 0.000 description 4
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 4
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 4
- 150000001244 carboxylic acid anhydrides Chemical class 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- CTQNGGLPUBDAKN-UHFFFAOYSA-N o-dimethylbenzene Natural products CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 4
- 229940078552 o-xylene Drugs 0.000 description 4
- 230000035484 reaction time Effects 0.000 description 4
- 238000006276 transfer reaction Methods 0.000 description 4
- 238000005406 washing Methods 0.000 description 4
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- 150000007513 acids Chemical class 0.000 description 3
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 3
- 150000001412 amines Chemical class 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000000945 filler Substances 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- GPIUUMROPXDNRH-UMRXKNAASA-N molport-035-395-376 Chemical group O=C1NC(=O)[C@@H]2[C@H]1[C@]1([H])C=C[C@@]2([H])C1 GPIUUMROPXDNRH-UMRXKNAASA-N 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 229920003986 novolac Polymers 0.000 description 3
- 230000000704 physical effect Effects 0.000 description 3
- 239000002994 raw material Substances 0.000 description 3
- 238000006798 ring closing metathesis reaction Methods 0.000 description 3
- 125000000467 secondary amino group Chemical class [H]N([*:1])[*:2] 0.000 description 3
- 239000011973 solid acid Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 229920001187 thermosetting polymer Polymers 0.000 description 3
- 239000008096 xylene Substances 0.000 description 3
- DZSJGYKKLRZRMS-UHFFFAOYSA-N 1,1-dimethyl-2,3-dihydroinden-4-amine Chemical compound C1=CC=C(N)C2=C1C(C)(C)CC2 DZSJGYKKLRZRMS-UHFFFAOYSA-N 0.000 description 2
- KJCVRFUGPWSIIH-UHFFFAOYSA-N 1-naphthol Chemical compound C1=CC=C2C(O)=CC=CC2=C1 KJCVRFUGPWSIIH-UHFFFAOYSA-N 0.000 description 2
- CZZZABOKJQXEBO-UHFFFAOYSA-N 2,4-dimethylaniline Chemical group CC1=CC=C(N)C(C)=C1 CZZZABOKJQXEBO-UHFFFAOYSA-N 0.000 description 2
- NXXYKOUNUYWIHA-UHFFFAOYSA-N 2,6-Dimethylphenol Chemical compound CC1=CC=CC(C)=C1O NXXYKOUNUYWIHA-UHFFFAOYSA-N 0.000 description 2
- MLPVBIWIRCKMJV-UHFFFAOYSA-N 2-ethylaniline Chemical compound CCC1=CC=CC=C1N MLPVBIWIRCKMJV-UHFFFAOYSA-N 0.000 description 2
- CRBJBYGJVIBWIY-UHFFFAOYSA-N 2-isopropylphenol Chemical compound CC(C)C1=CC=CC=C1O CRBJBYGJVIBWIY-UHFFFAOYSA-N 0.000 description 2
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 2
- JWAZRIHNYRIHIV-UHFFFAOYSA-N 2-naphthol Chemical compound C1=CC=CC2=CC(O)=CC=C21 JWAZRIHNYRIHIV-UHFFFAOYSA-N 0.000 description 2
- DOLQYFPDPKPQSS-UHFFFAOYSA-N 3,4-dimethylaniline Chemical group CC1=CC=C(N)C=C1C DOLQYFPDPKPQSS-UHFFFAOYSA-N 0.000 description 2
- CWLKGDAVCFYWJK-UHFFFAOYSA-N 3-aminophenol Chemical compound NC1=CC=CC(O)=C1 CWLKGDAVCFYWJK-UHFFFAOYSA-N 0.000 description 2
- ZUVPLKVDZNDZCM-UHFFFAOYSA-N 3-chloro-2-methylaniline Chemical compound CC1=C(N)C=CC=C1Cl ZUVPLKVDZNDZCM-UHFFFAOYSA-N 0.000 description 2
- PLIKAWJENQZMHA-UHFFFAOYSA-N 4-aminophenol Chemical compound NC1=CC=C(O)C=C1 PLIKAWJENQZMHA-UHFFFAOYSA-N 0.000 description 2
- HXDOZKJGKXYMEW-UHFFFAOYSA-N 4-ethylphenol Chemical compound CCC1=CC=C(O)C=C1 HXDOZKJGKXYMEW-UHFFFAOYSA-N 0.000 description 2
- ZSBDGXGICLIJGD-UHFFFAOYSA-N 4-phenoxyphenol Chemical compound C1=CC(O)=CC=C1OC1=CC=CC=C1 ZSBDGXGICLIJGD-UHFFFAOYSA-N 0.000 description 2
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 2
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 2
- 229930185605 Bisphenol Natural products 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 2
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 2
- BWVAOONFBYYRHY-UHFFFAOYSA-N [4-(hydroxymethyl)phenyl]methanol Chemical group OCC1=CC=C(CO)C=C1 BWVAOONFBYYRHY-UHFFFAOYSA-N 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N ammonia Natural products N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- RDOXTESZEPMUJZ-UHFFFAOYSA-N anisole Chemical compound COC1=CC=CC=C1 RDOXTESZEPMUJZ-UHFFFAOYSA-N 0.000 description 2
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 2
- 239000012965 benzophenone Substances 0.000 description 2
- LLEMOWNGBBNAJR-UHFFFAOYSA-N biphenyl-2-ol Chemical compound OC1=CC=CC=C1C1=CC=CC=C1 LLEMOWNGBBNAJR-UHFFFAOYSA-N 0.000 description 2
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 2
- 239000004927 clay Substances 0.000 description 2
- 238000007906 compression Methods 0.000 description 2
- 230000006835 compression Effects 0.000 description 2
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000004898 kneading Methods 0.000 description 2
- 230000007774 longterm Effects 0.000 description 2
- RLSSMJSEOOYNOY-UHFFFAOYSA-N m-cresol Chemical compound CC1=CC=CC(O)=C1 RLSSMJSEOOYNOY-UHFFFAOYSA-N 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 229940098779 methanesulfonic acid Drugs 0.000 description 2
- 239000010445 mica Substances 0.000 description 2
- 229910052618 mica group Inorganic materials 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- QWVGKYWNOKOFNN-UHFFFAOYSA-N o-cresol Chemical compound CC1=CC=CC=C1O QWVGKYWNOKOFNN-UHFFFAOYSA-N 0.000 description 2
- RNVCVTLRINQCPJ-UHFFFAOYSA-N o-toluidine Chemical compound CC1=CC=CC=C1N RNVCVTLRINQCPJ-UHFFFAOYSA-N 0.000 description 2
- IWDCLRJOBJJRNH-UHFFFAOYSA-N p-cresol Chemical compound CC1=CC=C(O)C=C1 IWDCLRJOBJJRNH-UHFFFAOYSA-N 0.000 description 2
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 2
- KNDQHSIWLOJIGP-UMRXKNAASA-N (3ar,4s,7r,7as)-rel-3a,4,7,7a-tetrahydro-4,7-methanoisobenzofuran-1,3-dione Chemical compound O=C1OC(=O)[C@@H]2[C@H]1[C@]1([H])C=C[C@@]2([H])C1 KNDQHSIWLOJIGP-UMRXKNAASA-N 0.000 description 1
- UVXKCEMBYZHXMM-UHFFFAOYSA-N 1,1-dimethyl-2,3-dihydroindene-4,6-diamine Chemical compound C1=C(N)C=C(N)C2=C1C(C)(C)CC2 UVXKCEMBYZHXMM-UHFFFAOYSA-N 0.000 description 1
- KMOUUZVZFBCRAM-UHFFFAOYSA-N 1,2,3,6-tetrahydrophthalic anhydride Chemical compound C1C=CCC2C(=O)OC(=O)C21 KMOUUZVZFBCRAM-UHFFFAOYSA-N 0.000 description 1
- KGKAYWMGPDWLQZ-UHFFFAOYSA-N 1,2-bis(bromomethyl)benzene Chemical group BrCC1=CC=CC=C1CBr KGKAYWMGPDWLQZ-UHFFFAOYSA-N 0.000 description 1
- FMGGHNGKHRCJLL-UHFFFAOYSA-N 1,2-bis(chloromethyl)benzene Chemical group ClCC1=CC=CC=C1CCl FMGGHNGKHRCJLL-UHFFFAOYSA-N 0.000 description 1
- GEYOCULIXLDCMW-UHFFFAOYSA-N 1,2-phenylenediamine Chemical compound NC1=CC=CC=C1N GEYOCULIXLDCMW-UHFFFAOYSA-N 0.000 description 1
- YJTKZCDBKVTVBY-UHFFFAOYSA-N 1,3-Diphenylbenzene Chemical group C1=CC=CC=C1C1=CC=CC(C=2C=CC=CC=2)=C1 YJTKZCDBKVTVBY-UHFFFAOYSA-N 0.000 description 1
- OXHOPZLBSSTTBU-UHFFFAOYSA-N 1,3-bis(bromomethyl)benzene Chemical group BrCC1=CC=CC(CBr)=C1 OXHOPZLBSSTTBU-UHFFFAOYSA-N 0.000 description 1
- GRJWOKACBGZOKT-UHFFFAOYSA-N 1,3-bis(chloromethyl)benzene Chemical group ClCC1=CC=CC(CCl)=C1 GRJWOKACBGZOKT-UHFFFAOYSA-N 0.000 description 1
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 1
- RBZMSGOBSOCYHR-UHFFFAOYSA-N 1,4-bis(bromomethyl)benzene Chemical group BrCC1=CC=C(CBr)C=C1 RBZMSGOBSOCYHR-UHFFFAOYSA-N 0.000 description 1
- RJZCPVOAAXABEZ-UHFFFAOYSA-N 1,4-bis(iodomethyl)benzene Chemical group ICC1=CC=C(CI)C=C1 RJZCPVOAAXABEZ-UHFFFAOYSA-N 0.000 description 1
- DAJPMKAQEUGECW-UHFFFAOYSA-N 1,4-bis(methoxymethyl)benzene Chemical group COCC1=CC=C(COC)C=C1 DAJPMKAQEUGECW-UHFFFAOYSA-N 0.000 description 1
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 description 1
- DURPTKYDGMDSBL-UHFFFAOYSA-N 1-butoxybutane Chemical compound CCCCOCCCC DURPTKYDGMDSBL-UHFFFAOYSA-N 0.000 description 1
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical compound C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 description 1
- VVNKQEJVCBMGHV-UHFFFAOYSA-N 19479-86-8 Chemical compound C1C2CCC1C1=C2C(=O)OC1=O VVNKQEJVCBMGHV-UHFFFAOYSA-N 0.000 description 1
- VVAKEQGKZNKUSU-UHFFFAOYSA-N 2,3-dimethylaniline Chemical group CC1=CC=CC(N)=C1C VVAKEQGKZNKUSU-UHFFFAOYSA-N 0.000 description 1
- KWVPRPSXBZNOHS-UHFFFAOYSA-N 2,4,6-Trimethylaniline Chemical compound CC1=CC(C)=C(N)C(C)=C1 KWVPRPSXBZNOHS-UHFFFAOYSA-N 0.000 description 1
- ZPDPRPHPYMTWMA-UHFFFAOYSA-N 2,4-di(propan-2-yl)aniline Chemical compound CC(C)C1=CC=C(N)C(C(C)C)=C1 ZPDPRPHPYMTWMA-UHFFFAOYSA-N 0.000 description 1
- VOZKAJLKRJDJLL-UHFFFAOYSA-N 2,4-diaminotoluene Chemical compound CC1=CC=C(N)C=C1N VOZKAJLKRJDJLL-UHFFFAOYSA-N 0.000 description 1
- GEQNZVKIDIPGCO-UHFFFAOYSA-N 2,4-dimethoxyaniline Chemical compound COC1=CC=C(N)C(OC)=C1 GEQNZVKIDIPGCO-UHFFFAOYSA-N 0.000 description 1
- XVBLEUZLLURXTF-UHFFFAOYSA-N 2,4-dimethylbenzene-1,3-diamine Chemical compound CC1=CC=C(N)C(C)=C1N XVBLEUZLLURXTF-UHFFFAOYSA-N 0.000 description 1
- KUFFULVDNCHOFZ-UHFFFAOYSA-N 2,4-xylenol Chemical compound CC1=CC=C(O)C(C)=C1 KUFFULVDNCHOFZ-UHFFFAOYSA-N 0.000 description 1
- RLYCRLGLCUXUPO-UHFFFAOYSA-N 2,6-diaminotoluene Chemical compound CC1=C(N)C=CC=C1N RLYCRLGLCUXUPO-UHFFFAOYSA-N 0.000 description 1
- FOYHNROGBXVLLX-UHFFFAOYSA-N 2,6-diethylaniline Chemical compound CCC1=CC=CC(CC)=C1N FOYHNROGBXVLLX-UHFFFAOYSA-N 0.000 description 1
- UFFBMTHBGFGIHF-UHFFFAOYSA-N 2,6-dimethylaniline Chemical group CC1=CC=CC(C)=C1N UFFBMTHBGFGIHF-UHFFFAOYSA-N 0.000 description 1
- OEWYVHJLQDINFS-UHFFFAOYSA-N 2-(2-aminoethyl)aniline Chemical compound NCCC1=CC=CC=C1N OEWYVHJLQDINFS-UHFFFAOYSA-N 0.000 description 1
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 1
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- 238000000465 moulding Methods 0.000 description 1
- BXSZBTFVSMMJQG-UHFFFAOYSA-N naphtho[2,3-e][2]benzofuran-1,3-dione Chemical compound C1=CC2=CC3=CC=CC=C3C=C2C2=C1C(=O)OC2=O BXSZBTFVSMMJQG-UHFFFAOYSA-N 0.000 description 1
- AJXNLGUENUIIRW-UHFFFAOYSA-N naphtho[2,3-f][2]benzofuran-1,3-dione Chemical compound C1=CC=C2C=C(C=C3C(=O)OC(=O)C3=C3)C3=CC2=C1 AJXNLGUENUIIRW-UHFFFAOYSA-N 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- VMPITZXILSNTON-UHFFFAOYSA-N o-anisidine Chemical compound COC1=CC=CC=C1N VMPITZXILSNTON-UHFFFAOYSA-N 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000010292 orthophenyl phenol Nutrition 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- QBDSZLJBMIMQRS-UHFFFAOYSA-N p-Cumylphenol Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=CC=C1 QBDSZLJBMIMQRS-UHFFFAOYSA-N 0.000 description 1
- BHAAPTBBJKJZER-UHFFFAOYSA-N p-anisidine Chemical compound COC1=CC=C(N)C=C1 BHAAPTBBJKJZER-UHFFFAOYSA-N 0.000 description 1
- NKTOLZVEWDHZMU-UHFFFAOYSA-N p-cumyl phenol Natural products CC1=CC=C(C)C(O)=C1 NKTOLZVEWDHZMU-UHFFFAOYSA-N 0.000 description 1
- URLKBWYHVLBVBO-UHFFFAOYSA-N p-dimethylbenzene Natural products CC1=CC=C(C)C=C1 URLKBWYHVLBVBO-UHFFFAOYSA-N 0.000 description 1
- NWVVVBRKAWDGAB-UHFFFAOYSA-N p-methoxyphenol Chemical compound COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 1
- LRTFPLFDLJYEKT-UHFFFAOYSA-N para-isopropylaniline Chemical compound CC(C)C1=CC=C(N)C=C1 LRTFPLFDLJYEKT-UHFFFAOYSA-N 0.000 description 1
- DHRLEVQXOMLTIM-UHFFFAOYSA-N phosphoric acid;trioxomolybdenum Chemical compound O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.OP(O)(O)=O DHRLEVQXOMLTIM-UHFFFAOYSA-N 0.000 description 1
- IYDGMDWEHDFVQI-UHFFFAOYSA-N phosphoric acid;trioxotungsten Chemical compound O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.OP(O)(O)=O IYDGMDWEHDFVQI-UHFFFAOYSA-N 0.000 description 1
- 150000003018 phosphorus compounds Chemical class 0.000 description 1
- 229910000073 phosphorus hydride Inorganic materials 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 238000011417 postcuring Methods 0.000 description 1
- 150000003141 primary amines Chemical class 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 229910052895 riebeckite Inorganic materials 0.000 description 1
- 230000005070 ripening Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000011949 solid catalyst Substances 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 238000001256 steam distillation Methods 0.000 description 1
- HXJUTPCZVOIRIF-UHFFFAOYSA-N sulfolane Chemical compound O=S1(=O)CCCC1 HXJUTPCZVOIRIF-UHFFFAOYSA-N 0.000 description 1
- 150000003460 sulfonic acids Chemical class 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- HPGGPRDJHPYFRM-UHFFFAOYSA-J tin(iv) chloride Chemical compound Cl[Sn](Cl)(Cl)Cl HPGGPRDJHPYFRM-UHFFFAOYSA-J 0.000 description 1
- YNJBWRMUSHSURL-UHFFFAOYSA-N trichloroacetic acid Chemical compound OC(=O)C(Cl)(Cl)Cl YNJBWRMUSHSURL-UHFFFAOYSA-N 0.000 description 1
- 238000007039 two-step reaction Methods 0.000 description 1
- 238000005292 vacuum distillation Methods 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
- 239000010457 zeolite Substances 0.000 description 1
- 239000011592 zinc chloride Substances 0.000 description 1
- 235000005074 zinc chloride Nutrition 0.000 description 1
Landscapes
- Manufacture Of Macromolecular Shaped Articles (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Polyoxymethylene Polymers And Polymers With Carbon-To-Carbon Bonds (AREA)
Description
【0001】[0001]
【産業上の利用分野】本発明は、耐熱性、耐酸化安定
性、機械的強度、耐水性及び作業性に優れたイミド基含
有フェノール樹脂成形材料に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an imide group-containing phenol resin molding material excellent in heat resistance, oxidation stability, mechanical strength, water resistance and workability.
【0002】[0002]
【従来の技術】従来、フェノール類とホルムアルデヒド
を反応させて得られるフェノール樹脂は、その耐熱性、
難燃性、電気絶縁性、寸法安定性、加工性などの特性と
価格にバランスのとれた材料として、熱硬化性樹脂の中
でも重要な位置を占めており、電子部品の封止材料、接
着剤、各種成形材料等として産業上の利用範囲は非常に
広い。しかしながら、近年、産業の発展にともない、作
業性や、フェノール樹脂を熱硬化させたフェノール樹脂
硬化物の耐熱性、機械強度、耐酸化安定性、耐水性等を
大幅に向上させることが求められている。現在、フェノ
ール樹脂硬化物の特性の一部を一層向上させることを目
的に、フェノール樹脂にイミド基を導入することが試み
られている。例えば、フェノール類、ホルムアルデヒ
ド、芳香族アミン及び芳香族カルボン酸無水物の反応に
より得られたイミド化樹脂が通常のフェノール樹脂と同
様にヘキサミン等によって熱硬化性樹脂を与えることが
開示されている(特開平3 ー275708 )。2. Description of the Related Art Conventionally, a phenol resin obtained by reacting a phenol with formaldehyde has a heat resistance,
As a material that balances properties and price, such as flame retardancy, electrical insulation, dimensional stability, workability, etc., it occupies an important position in thermosetting resins. The industrial application range as various molding materials is very wide. However, in recent years, with the development of industry, it has been required to significantly improve workability, heat resistance, mechanical strength, oxidation resistance, water resistance, etc. of a phenol resin cured product obtained by thermosetting a phenol resin. I have. At present, attempts have been made to introduce an imide group into a phenol resin for the purpose of further improving a part of the properties of the cured phenol resin. For example, it is disclosed that an imidized resin obtained by a reaction of phenols, formaldehyde, an aromatic amine, and an aromatic carboxylic anhydride gives a thermosetting resin with hexamine or the like in the same manner as an ordinary phenol resin ( JP-A-3-275708).
【0003】しかしながら、上記の開示された樹脂は、
ノボラック型のフェノール構造からなるものであり、耐
熱性の改善には効果があるものの、ホルマリン結合を持
つこのフェノール樹脂類では他の要求性能を満足し得る
ものとは言い難い。即ち、フェノール硬化物の欠点とし
ては、 (1)硬くて脆いこと (2)水酸基密度が高いため吸水性が大きいこと (3)耐酸化安定性が劣るため長期にわたる耐熱性が不
足すること 等が一般的に知られている事実であるが、前記の変性フ
ェノール樹脂に於いても、これらの欠点は改善され得な
い。[0003] However, the resin disclosed above is:
Although it has a novolak-type phenol structure and is effective in improving heat resistance, it cannot be said that this phenolic resin having a formalin bond can satisfy other required performances. That is, the disadvantages of the phenol cured product include (1) that it is hard and brittle (2) that it has a high water-absorbing property due to its high hydroxyl group density and (3) that it has poor heat resistance for a long time due to poor oxidation resistance. As is generally known, these disadvantages cannot be ameliorated even in the above-mentioned modified phenolic resin.
【0004】また、作業性の面で、原料樹脂と各種配合
剤等の混練や成形等の作業が容易に行い、生産性の向上
を達成するため、原料樹脂の軟化点は高すぎないこと、
好ましくは140℃以下であることが望まれているが、
前記変性樹脂は軟化点が高くなる難点がある。[0004] In terms of workability, the softening point of the raw material resin is not too high in order to easily perform operations such as kneading and molding of the raw material resin and various compounding agents, and to improve productivity.
It is desired that the temperature is preferably 140 ° C. or lower,
The modified resin has a disadvantage that the softening point is increased.
【0005】[0005]
【発明が解決しようとする課題】本発明の課題は、従来
のフェノール樹脂が有する諸特性を損うことなく、耐熱
性、機械強度、耐酸化安定性、耐水性及び作業性等を著
しく向上できる成形材料を提供することにある。SUMMARY OF THE INVENTION An object of the present invention is to remarkably improve heat resistance, mechanical strength, oxidation resistance, water resistance, workability, etc. without impairing various properties of a conventional phenol resin. It is to provide a molding material.
【0006】[0006]
【課題を解決するための手段】本発明者らは、前記課題
を解決するため鋭意検討した結果、本発明を完成するに
至った。すなわち、本発明は、一般式(1)(化2)Means for Solving the Problems The present inventors have made intensive studies to solve the above-mentioned problems, and as a result, completed the present invention. That is, the present invention provides a compound represented by the general formula (1):
【化2】 (式中、R1 、R2 は水素原子、ハロゲン原子、水酸
基、またはC1 〜C12のアルキル基、シクロアルキル
基、アラルキル基、アルコキシ基、アリール基またはア
リールオキシ基を示し、同一でも異なってもよく、R1
とR2 は環を形成しても良い。R3 、R4 は、水素原
子、ハロゲン原子、水酸基、イミド基、C1 〜C 12のア
ルキル基、アリール基、シクロアルキル基、アラルキル
基、イミド基置換アラルキル基、ヒドロキシ基置換アラ
ルキル基、アルコキシ基、アリールオキシ基、イミド基
置換アリールオキシ基、ヒドロキシ基置換アリールオキ
シ基を示し、同一でも異なってもよく、R3 とR4 は環
を形成してもよい。また、ZはC2〜C24の不飽和脂肪
族基、飽和単環式脂肪族基、不飽和単環式脂肪族基、不
飽和縮合多環式脂肪族基、飽和縮合多環式脂肪族基、置
換基として不飽和単環式脂肪族基を有する脂肪族基、置
換基として鎖状脂肪族基を有することもある単環式芳香
族基、単環式芳香族基が直接または架橋員により相互に
連結された非縮合多環式芳香族基、置換基として鎖状脂
肪族基を有することもある縮合多環式芳香族基から成る
群より選ばれた2価の基を示す。但し、m,nは0〜2
0を示し、m+n≠0である。末端はフェノール化合物
及び/または芳香族イミド化合物であり、フェノール化
合物と芳香族イミド化合物の結合順序は限定されな
い。)で表される軟化点60〜140℃、平均分子量3
50〜5000、イミド基/水酸基のモル比が、3:9
7〜80:20の範囲にあるイミド基含有フェノール樹
脂を含むフェノール樹脂と無機および/または有機の充
填材にヘキサミンまたはレゾール樹脂を加えた成形材
料、これらから得られる硬化物に関する。Embedded image(Where R1, RTwoIs hydrogen atom, halogen atom, hydroxyl
Group, or C1~ C12Alkyl group, cycloalkyl
Group, aralkyl group, alkoxy group, aryl group or
A reeloxy group, which may be the same or different;1
And RTwoMay form a ring. RThree, RFourIs a hydrogen source
Atom, halogen atom, hydroxyl group, imide group, C1~ C 12No
Alkyl, aryl, cycloalkyl, aralkyl
Group, imide group-substituted aralkyl group, hydroxy group-substituted ara
Alkyl group, alkoxy group, aryloxy group, imide group
Substituted aryloxy group, hydroxy-substituted aryloxy
And represents the same or a different group,ThreeAnd RFourIs a ring
May be formed. Z is CTwo~ Ctwenty fourUnsaturated fat
Group, saturated monocyclic aliphatic group, unsaturated monocyclic aliphatic group,
Saturated condensed polycyclic aliphatic group, saturated condensed polycyclic aliphatic group,
Aliphatic group having an unsaturated monocyclic aliphatic group as a substituent,
Monocyclic aromatics which may have chain aliphatic groups as substituents
Group or monocyclic aromatic group, directly or
Linked non-fused polycyclic aromatic group, chain-like fat as a substituent
Consists of fused polycyclic aromatic groups that may have aliphatic groups
Shows a divalent group selected from the group. However, m and n are 0 to 2
0, and m + n ≠ 0. Terminal is phenolic compound
And / or an aromatic imide compound,
The bonding order of the compound and the aromatic imide compound is not limited.
No. ), Average molecular weight 3
50-5000, the molar ratio of imide group / hydroxyl group is 3: 9
An imide group-containing phenol tree in the range of 7 to 80:20
Phenolic resin containing fat and inorganic and / or organic
Molded material with hexamine or resole resin added to filler
And cured products obtained from these materials.
【0007】本発明のイミド基含有フェノール樹脂は、
いずれも新規化合物である。本発明のイミド基含有フェ
ノール樹脂は、フェノール樹脂の構造にイミド基を導入
し、また、これらを連結するためにアラルキル基を用い
ることを特徴とするものである。この結果、これらのフ
ェノール樹脂は、ホルマリン結合によるものと比べて、
軟化点や溶融粘度が著しく低くなり作業性の向上が計れ
る。また、これらのイミド基含有フェノール樹脂を用い
た硬化組成物は連結基にアラルキル基を持つために、単
位分子当りの水酸基密度が低下して、疎水性を増し低吸
水化が達成される。更に、このアラルキル基による結合
構造はホルマリン結合の構造と比べ耐酸化安定性や耐衝
撃性等の機械的強度に優れている(特開昭63-238122号
公報)。また、イミド基の導入による効果として、種々
の用途で耐熱性を向上させることが出来る。特に、マレ
イミド基、ナジックイミド基等の不飽和基を有するフェ
ノール樹脂では、イミド基同士の反応により、架橋密度
が上昇し、その結果、熱間強度の大幅な向上が達成され
る。The imide group-containing phenolic resin of the present invention comprises
Both are new compounds. The imide group-containing phenolic resin of the present invention is characterized by introducing an imide group into the structure of the phenolic resin and using an aralkyl group for linking these. As a result, these phenolic resins, compared to those with formalin bonds,
The softening point and melt viscosity are remarkably reduced, and workability can be improved. Further, since the cured composition using these imide group-containing phenol resins has an aralkyl group in the linking group, the hydroxyl group density per unit molecule is reduced, the hydrophobicity is increased, and low water absorption is achieved. Furthermore, the bond structure formed by the aralkyl group is superior to the structure having a formalin bond in mechanical strength such as oxidation resistance and impact resistance (JP-A-63-238122). Further, as an effect of introducing the imide group, heat resistance can be improved in various uses. In particular, in a phenol resin having an unsaturated group such as a maleimide group or a nadic imide group, the crosslink density increases due to the reaction between the imide groups, and as a result, a large improvement in hot strength is achieved.
【0008】以下、本発明の成形材料に用いるイミド基
含有フェノール樹脂を得る方法について説明する。イミ
ド基含有フェノール樹脂は、フェノール類と芳香族アミ
ン類とを反応させてアミノ基含有フェノール樹脂を得
え、ついでこのフェノール樹脂にジカルポン酸無水物を
反応させて得られる。Hereinafter, a method for obtaining an imide group-containing phenol resin used in the molding material of the present invention will be described. The imide group-containing phenol resin is obtained by reacting a phenol with an aromatic amine to obtain an amino group-containing phenol resin, and then reacting the phenol resin with dicarponic anhydride.
【0009】まず、アミノ基含有フェノール樹脂の製造
方法について説明する。アミノ基含有フェノール樹脂を
製造する具体的な方法としては、一般式(2)(化3)First, a method for producing an amino group-containing phenol resin will be described. As a specific method for producing an amino group-containing phenol resin, general formula (2)
【化3】 (式中、R1 およびR2 は前記一般式(1)と同様の意
味を表す)で表されるフェノール類および一般式(3)
(化4)Embedded image (Wherein R 1 and R 2 have the same meanings as in the general formula (1)) and a phenol represented by the general formula (3)
(Formula 4)
【化4】 (式中、R5 、R6 は、水素原子、ハロゲン原子、水酸
基、アミノ基、C1 〜C 12のアルキル基、アリール基、
シクロアルキル基、アラルキル基、アミノ基置換アラル
キル基、ヒドロキシ基置換アラルキル基、アルコキシ
基、アリールオキシ基、アミノ基置換アリールオキシ
基、ヒドロキシ基置換アリールオキシ基を示し、同一で
も異なってもよく、R5 とR6 は環を形成してもよ
い。)で表される芳香族アミン類とのモル比(0.9
7:0.03)〜(0.2:0.8)の混合物1モル
と、一般式(4)(化5)Embedded image(Where RFive, R6Is hydrogen atom, halogen atom, hydroxyl
Group, amino group, C1~ C 12An alkyl group, an aryl group,
Cycloalkyl, aralkyl, amino-substituted arals
Kill group, hydroxy-substituted aralkyl group, alkoxy
Group, aryloxy group, amino group-substituted aryloxy
Group, a hydroxy-substituted aryloxy group,
May also be different, RFiveAnd R6May form a ring
No. ) And the aromatic amine represented by the molar ratio (0.9)
7: 0.03) to 1 mol of a mixture of (0.2: 0.8)
And the general formula (4)
【化5】 (式中、Xはハロゲン原子、水酸基、C1 〜C4 のアル
コキシ基を表す)で表されるアラルキル化合物0.1〜
0.95モルとを、酸触媒を用いて反応させる。Embedded image (Wherein, X represents a halogen atom, a hydroxyl group, or a C 1 -C 4 alkoxy group).
0.95 moles is reacted with an acid catalyst.
【0010】フェノール類としては、一価または二価フ
ェノール、およびビスフェノール、トリスフェノール等
が挙げられる。具体的には、フェノール、o−クレゾー
ル、m−クレゾール、p−クレゾール、o−エチルフェ
ノール、p−エチルフェノール、o−イソプロピルフェ
ノール、p−sec−ブチルフェノール、p−シクロヘ
キシルフェノール、p−クロロフェノール、o−ブロモ
フェノール、p−ブロモフェノール、2,4−キシレノ
ール、2,6−キシレノール、p−t−ブチルフェノー
ル、p−オクチルフェノール、p−ノニルフェノール、
p−クミルフェノール、p−フェニルフェノール、o−
フェニルフェノール、p−フェノキシフェノール、o−
メトキシフェノール、p−メトキシフェノール、レゾル
シン、カテコール、ハイドロキノン、2,2−ビス(4
−ヒドロキシフェニル)プロパン、ジヒドロキシジフェ
ニルメタン、α−ナフトール、β−ナフトール等があげ
られる。The phenols include monohydric or dihydric phenols, bisphenol, trisphenol and the like. Specifically, phenol, o-cresol, m-cresol, p-cresol, o-ethylphenol, p-ethylphenol, o-isopropylphenol, p-sec-butylphenol, p-cyclohexylphenol, p-chlorophenol, o-bromophenol, p-bromophenol, 2,4-xylenol, 2,6-xylenol, pt-butylphenol, p-octylphenol, p-nonylphenol,
p-cumylphenol, p-phenylphenol, o-
Phenylphenol, p-phenoxyphenol, o-
Methoxyphenol, p-methoxyphenol, resorcinol, catechol, hydroquinone, 2,2-bis (4
-Hydroxyphenyl) propane, dihydroxydiphenylmethane, α-naphthol, β-naphthol and the like.
【0011】また、芳香族アミンとしては、アニリン、
p−シクロヘキシルアニリン、2−メチルアニリン、2
−クロルアニリン、2−エチルアニリン、m−フェニレ
ンジアミン、p−フェニレンジアミン、2,6−ジアミ
ノトルエン、3,5−ジアミノビフェニル、4,4’−
ジアミノジフェニルメタン、1,3,5−トリアミノベ
ンゼン、p−アミノフェノール、m−アミノフェノー
ル、4−アミノ−4’−ヒドロキシジフェニルエーテ
ル、4−アミノ−4’−ヒドロキシジフェニルプロパ
ン、2−アミノ−1,3−レゾルシン、4−アミノ−
1,3−レゾルシン、2−アミノハイドロキノン、2−
メトキシアニリン、4−メトキシアニリン、2−イソプ
ロポキシアニリン、2,4−ジメトキシアニリン、p−
フェノキシアニリン、o−イソプロピルアニリン、m−
イソプロピルアニリン、p−イソプロピルアニリン、o
−n−プロピルアニリン、o−tert−ブチルアニリ
ン、p−tert−ブチルアニリン、p−sec−ブチ
ルアニリン、2,3−キシリジン、2,4−キシリジ
ン、2,6−キシリジン、3,4−キシリジン、3,5
−キシリジン、2−メチル−3−エチルアニリン、2−
メチル−4−イソプロピルアニリン、2,6−ジエチル
アニリン、2−エチル−5−tert−ブチルアニリ
ン、2,4−ジイソプロピルアニリン、2,4,6−ト
リメチルアニリン、4−クロロアニリン、4−ブロモア
ニリン、4−フルオロアニリン、3−クロロアニリン、
3−ブロモアニリン、3,4−ジクロロアニリン、3−
クロロ−o−トルイジン、3−クロロ−p−トルイジ
ン、2,6−ジメチル−4−クロロアニリン、2−アミ
ノ−4−クレゾール、4−アミノ−2−tert−ブチ
ルフェノール、2,6−ジメチル−4−アミノフェノー
ル、2,6−ジクロロ−4−アミノフェノール、2−ア
ミノ−1,3−レゾルシン、4−アミノ−1,3−レゾ
ルシン、1,1−ジメチル−4−アミノインダン、o−
フェニレンジアミン、2,4−ジアミノトルエン、2,
4−ジアミノエチルベンゼン、2,6−ジアミノエチル
ベンゼン、2,4−ジアミノイソプロピルベンゼン、
2,4−ジアミノ−tert−ブチルベンゼン、2,6
−ジアミノ−tert−ブチルベンゼン、2,4−ジア
ミノ−1,3−ジメチルベンゼン、1,1−ジメチル−
4−アミノインダン、1,1−ジメチル−4,6−ジア
ミノインダン等が挙げられる。好適な化合物は、アニリ
ンである。As the aromatic amine, aniline,
p-cyclohexylaniline, 2-methylaniline, 2
-Chloroaniline, 2-ethylaniline, m-phenylenediamine, p-phenylenediamine, 2,6-diaminotoluene, 3,5-diaminobiphenyl, 4,4'-
Diaminodiphenylmethane, 1,3,5-triaminobenzene, p-aminophenol, m-aminophenol, 4-amino-4′-hydroxydiphenyl ether, 4-amino-4′-hydroxydiphenylpropane, 2-amino-1, 3-resorcinol, 4-amino-
1,3-resorcinol, 2-aminohydroquinone, 2-
Methoxyaniline, 4-methoxyaniline, 2-isopropoxyaniline, 2,4-dimethoxyaniline, p-
Phenoxyaniline, o-isopropylaniline, m-
Isopropyl aniline, p-isopropyl aniline, o
-N-propylaniline, o-tert-butylaniline, p-tert-butylaniline, p-sec-butylaniline, 2,3-xylidine, 2,4-xylidine, 2,6-xylidine, 3,4-xylidine , 3,5
-Xylidine, 2-methyl-3-ethylaniline, 2-
Methyl-4-isopropylaniline, 2,6-diethylaniline, 2-ethyl-5-tert-butylaniline, 2,4-diisopropylaniline, 2,4,6-trimethylaniline, 4-chloroaniline, 4-bromoaniline , 4-fluoroaniline, 3-chloroaniline,
3-bromoaniline, 3,4-dichloroaniline, 3-
Chloro-o-toluidine, 3-chloro-p-toluidine, 2,6-dimethyl-4-chloroaniline, 2-amino-4-cresol, 4-amino-2-tert-butylphenol, 2,6-dimethyl-4 -Aminophenol, 2,6-dichloro-4-aminophenol, 2-amino-1,3-resorcin, 4-amino-1,3-resorcin, 1,1-dimethyl-4-aminoindan, o-
Phenylenediamine, 2,4-diaminotoluene, 2,
4-diaminoethylbenzene, 2,6-diaminoethylbenzene, 2,4-diaminoisopropylbenzene,
2,4-diamino-tert-butylbenzene, 2,6
-Diamino-tert-butylbenzene, 2,4-diamino-1,3-dimethylbenzene, 1,1-dimethyl-
4-aminoindan, 1,1-dimethyl-4,6-diaminoindan and the like. A preferred compound is aniline.
【0012】アラルキル化合物類としては、式(4)で
表される化合物であり、Xが塩素原子、臭素原子、フッ
素原子等のハロゲン原子、水酸基、炭素数1〜4までの
アルコキシ基である。例えば、α,α’−ジヒドロキシ
−o−キシレン、α,α’−ジヒドロキシ−m−キシレ
ン、α,α’−ジヒドロキシ−p−キシレン、α,α’
−ジメトキシ−m−キシレン、α,α’−ジメトキシ−
p−キシレン、α,α’−ジエトキシ−o−キシレン、
α,α’−ジエトキシ−m−キシレン、α,α’−ジエ
トキシ−p−キシレン、α,α’−ジイソプロポキシ−
o−キシレン、α,α’−ジイソプロポキシ−m−キシ
レン、α,α’−ジイソプロポキシ−p−キシレン、
α,α’−ジ−n−プロポキシ−p−キシレン、α,
α’−ジ−n−ブトキシ−m−キシレン、α,α’−ジ
−n−ブトキシ−p−キシレン、α,α’−ジ−sec −
ブトキシ−p−キシレン、α,α’−ジイソブトキシ−
p−キシレン、α,α’−ジクロロ−o−キシレン、
α,α’−ジクロロ−m−キシレン、α,α’−ジクロ
ロ−p−キシレン、α,α’−ジブロモ−o−キシレ
ン、α,α’−ジブロモ−m−キシレン、α,α’−ジ
ブロモ−p−キシレン、α,α’−ジフルオロ−o−キ
シレン、α,α’−ジフルオロ−m−キシレン、α,
α’−ジフルオロ−p−キシレン、α,α’−ジヨード
−o−キシレン、α,α’−ジヨード−m−キシレン、
α,α’−ジヨード−p−キシレン等を挙げることが出
来る。好適な化合物としては、α,α’−ジヒドロキシ
−p−キシレン、α,α’−ジクロロ−p−キシレン等
が挙げられる。なお、一般式(1)におけるR1 および
R2 は、一般式(4)におけるR5 およびR6 に対応
し、R1 およびR2 のイミド末端基はR5 およびR6 の
アミノ基に由来する。The aralkyl compounds are compounds represented by the formula (4), wherein X is a halogen atom such as a chlorine atom, a bromine atom or a fluorine atom, a hydroxyl group, or an alkoxy group having 1 to 4 carbon atoms. For example, α, α′-dihydroxy-o-xylene, α, α′-dihydroxy-m-xylene, α, α′-dihydroxy-p-xylene, α, α ′
-Dimethoxy-m-xylene, α, α'-dimethoxy-
p-xylene, α, α′-diethoxy-o-xylene,
α, α'-diethoxy-m-xylene, α, α'-diethoxy-p-xylene, α, α'-diisopropoxy-
o-xylene, α, α′-diisopropoxy-m-xylene, α, α′-diisopropoxy-p-xylene,
α, α'-di-n-propoxy-p-xylene, α,
α′-di-n-butoxy-m-xylene, α, α′-di-n-butoxy-p-xylene, α, α′-di-sec −
Butoxy-p-xylene, α, α'-diisobutoxy-
p-xylene, α, α′-dichloro-o-xylene,
α, α′-dichloro-m-xylene, α, α′-dichloro-p-xylene, α, α′-dibromo-o-xylene, α, α′-dibromo-m-xylene, α, α′-dibromo -P-xylene, α, α′-difluoro-o-xylene, α, α′-difluoro-m-xylene, α,
α′-difluoro-p-xylene, α, α′-diiodo-o-xylene, α, α′-diiodo-m-xylene,
α, α'-diiodo-p-xylene and the like can be mentioned. Suitable compounds include α, α′-dihydroxy-p-xylene, α, α′-dichloro-p-xylene and the like. Note that R 1 and R 2 in the general formula (1) correspond to R 5 and R 6 in the general formula (4), and the imide terminal groups of R 1 and R 2 are derived from the amino groups of R 5 and R 6. I do.
【0013】酸触媒としては、無機または有機の酸、例
えば、塩酸、燐酸、硫酸または硝酸、あるいは塩化亜
鉛、塩化第二錫、塩化アルミニウム、塩化第二鉄のよう
なフリーデルクラフツ系触媒、メタンスルホン酸、ナフ
ィオンH(商品名:デュポン社製)のような超強酸等が
挙げられる。これらは単独で使用しても、併用してもよ
い。又、活性白土、ゼオライト類の固体酸触媒やヘテロ
ポリ酸類も使用できる。工業的に好ましいのは安価な塩
酸である。触媒の使用量は、フェノール類と芳香族アミ
ン類の合計に対して、3モル%以上、好ましくは5〜8
0モル%である。固体触媒の場合は全原料に対し1〜1
00wt%、好ましくは5wt%以上である。この範囲
以上でも反応における問題はないが、経済的でない。式
(4)で表されるアラルキル化合物としてビスハロゲノ
メチル誘導体を用いた場合には、触媒の不存在下でも反
応を行うことが出来るが、反応を速める目的で酸触媒を
用いてもよい。その酸触媒としては、前記の酸触媒のい
ずれも使用可能であり、工業的に好ましいのは安価な塩
酸である。As the acid catalyst, an inorganic or organic acid, for example, hydrochloric acid, phosphoric acid, sulfuric acid or nitric acid, or a Friedel-Crafts catalyst such as zinc chloride, stannic chloride, aluminum chloride, ferric chloride, methane Sulfonic acid, super strong acids such as Nafion H (trade name: manufactured by DuPont) and the like can be mentioned. These may be used alone or in combination. Activated clay, solid acid catalysts such as zeolites and heteropolyacids can also be used. Industrially preferred is inexpensive hydrochloric acid. The amount of the catalyst to be used is 3 mol% or more, preferably 5 to 8%, based on the total of phenols and aromatic amines.
0 mol%. In the case of a solid catalyst, 1 to 1
It is 00 wt%, preferably 5 wt% or more. Above this range, there is no problem in the reaction, but it is not economical. When a bishalogenomethyl derivative is used as the aralkyl compound represented by the formula (4), the reaction can be performed in the absence of a catalyst, but an acid catalyst may be used for the purpose of accelerating the reaction. As the acid catalyst, any of the aforementioned acid catalysts can be used, and industrially preferred is inexpensive hydrochloric acid.
【0014】フェノール樹脂構造に芳香族アミン成分を
導入する方法で、芳香族アミン成分と式(4)のアラル
キル化合物の反応は二段階の反応によって得られる。即
ち、一段目の反応に於いては第二アミンを含む樹脂が生
成するが、この第二アミンを転移反応(第二段目の反
応)によって第一アミン樹脂に導くことができる。その
転移反応は前記の酸を触媒として達成されるが、アラル
キル化合物としてビスハロゲノメチル誘導体を用いた場
合には、第二アミン樹脂が生成する際に発生するハロゲ
ン化水素を触媒としてこの転移反応が達成される。In the method of introducing an aromatic amine component into the phenolic resin structure, the reaction between the aromatic amine component and the aralkyl compound of the formula (4) can be obtained by a two-step reaction. That is, in the first-stage reaction, a resin containing a secondary amine is generated, and this secondary amine can be led to the primary amine resin by a transfer reaction (second-stage reaction). The transfer reaction is achieved using the above-mentioned acid as a catalyst, but when a bishalogenomethyl derivative is used as the aralkyl compound, the transfer reaction is performed using hydrogen halide generated when a secondary amine resin is formed as a catalyst. Achieved.
【0015】この転移反応を速める場合には、第二アミ
ン樹脂が生成される反応条件よりも、(イ)同種または
異種の触媒量の増加、(ロ)反応温度を上げる、(ハ)
反応時間を長くする等の手段が採られる。アラルキル化
合物としてビスハロゲノメチル誘導体を用い自己触媒に
よって反応を行う場合にも、先に述べたように上記の酸
触媒を使用することにより反応を速めることが出来る。
本発明の方法では、このような第一段〜第二段の反応の
途中に、フェノール類とアラルキル化合物の反応も同時
に起こる。その結果、本発明のイミド基含有フェノール
樹脂の原料となるアミノ基含有フェノール樹脂が製造さ
れる。反応温度は、反応全体としては0〜220℃であ
るが、第一段目の反応においては0〜130℃、好まし
くは20〜110℃であり、第二段目の反応においては
150〜220℃であり、第二段目の反応時間をできる
だけ短縮するためには170℃以上の反応温度が望まし
い。反応時間は、第一段目の反応が1〜5時間であり、
第二段目の反応が3〜20時間である。In order to accelerate the transfer reaction, (a) increase the amount of the same or different catalyst, (b) raise the reaction temperature, and (c)
Means such as increasing the reaction time may be employed. Even when a reaction is carried out by a self-catalyst using a bishalogenomethyl derivative as an aralkyl compound, the reaction can be accelerated by using the above-mentioned acid catalyst as described above.
In the method of the present invention, a reaction between a phenol and an aralkyl compound occurs simultaneously during the reaction of the first and second steps. As a result, an amino group-containing phenol resin which is a raw material of the imide group-containing phenol resin of the present invention is produced. The reaction temperature is 0 to 220 ° C. as a whole reaction, but is 0 to 130 ° C., preferably 20 to 110 ° C. in the first stage reaction, and 150 to 220 ° C. in the second stage reaction. In order to shorten the reaction time of the second stage as much as possible, a reaction temperature of 170 ° C. or more is desirable. The reaction time is 1 to 5 hours for the first-stage reaction,
The second stage reaction is for 3-20 hours.
【0016】このアミノ基含有フェノール樹脂では、フ
ェノール類と芳香族アミン類の合計に対するアラルキル
化合物のモル比を変えることにより、低分子量樹脂か
ら、高分子量樹脂まで、種々の形態のフェノール樹脂を
用途に応じて製造できる。すなわち、液状−低軟化点の
フェノール樹脂は、その縮合反応の際に、アラルキル化
合物に対してフェノール類と芳香族アミン類の合計モル
比を大きくすれば得ることが出来る。一方高軟化点の芳
香族アミン樹脂は、その縮合反応の際に、アラルキル化
合物に対してフェノール類と芳香族アミン類の合計モル
比を理論量に近いところにすれば得られる。即ち、フェ
ノール類と芳香族アミン類の合計モル比に対し、アラル
キル化合物を0.1〜0.95モル比の範囲で反応させ
ることにより、得られるアミノ基含有フェノール樹脂の
分子量範囲300〜5000程度、樹脂の軟化点範囲4
0〜120℃程度、アミン価150〜2000g/eq
程度であるアミノ基含有フェノール樹脂を得ることがで
きる。In this amino group-containing phenolic resin, various forms of phenolic resin from low molecular weight resin to high molecular weight resin can be used by changing the molar ratio of the aralkyl compound to the total of phenols and aromatic amines. Can be manufactured according to. That is, a liquid-low softening point phenol resin can be obtained by increasing the total molar ratio of phenols and aromatic amines to the aralkyl compound during the condensation reaction. On the other hand, an aromatic amine resin having a high softening point can be obtained by making the total molar ratio of phenols and aromatic amines to the aralkyl compound close to the theoretical amount during the condensation reaction. That is, by reacting the aralkyl compound in the range of 0.1 to 0.95 mole ratio with respect to the total mole ratio of phenols and aromatic amines, the molecular weight range of the obtained amino group-containing phenolic resin is about 300 to 5000. , Resin softening point range 4
0-120 ° C, amine value 150-2000 g / eq
An amino group-containing phenolic resin having a certain degree can be obtained.
【0017】なお、この方法では反応に不活性な溶媒を
使用してもよいが、通常は無溶媒で反応を行う。反応終
了後、反応で触媒として使用した酸または反応で生成し
た酸は、例えば、アンモニア水等の希アルカリ水溶液で
中和する。この際、未反応のフェノール類、芳香族アミ
ン化合物等は、これを真空下で留去するか、あるいは水
蒸気蒸留によって留去する。また、中和で副生した無機
塩等は、反応系にベンゼン、トルエン、MEK等の、水
と混和しない溶剤を加え、水洗分液法で除去すればよ
い。この後、脱溶剤を行って目的物を得ることが出来
る。なお、固体の酸触媒を用いた場合は濾過することに
よって除去することができる。In this method, a solvent inert to the reaction may be used, but the reaction is usually carried out without a solvent. After completion of the reaction, the acid used as a catalyst in the reaction or the acid generated in the reaction is neutralized with a dilute aqueous alkali solution such as aqueous ammonia. At this time, unreacted phenols and aromatic amine compounds are distilled off under vacuum or by steam distillation. In addition, inorganic salts and the like by-produced by neutralization may be removed by adding a water-immiscible solvent such as benzene, toluene, and MEK to the reaction system, and washing with a water-liquid separation method. Thereafter, the desired product can be obtained by removing the solvent. When a solid acid catalyst is used, it can be removed by filtration.
【0018】次に、この様にして得られたアミノ基含有
フェノール樹脂に、一般式 (5) (化6)Next, the amino group-containing phenolic resin thus obtained is added to the phenol resin of the general formula (5).
【化6】 (式中、Zは前記一般式(1)と同様の意味を表す)で
表されるジカルボン酸無水物を反応させてイミド基含有
フェノール樹脂を得る方法を説明する。ここで使用され
るジカルボン酸無水物としては、無水マレイン酸、無水
フタル酸、2,3−ベンゾフェノンジカルボン酸無水
物、3,4−ベンゾフェノンジカルボン酸無水物、2,
3−ジカルボキシフェニルフェニルエーテル無水物、
3,4−ジカルボキシフェニルフェニルエーテル無水
物、2,3−ビフェニルジカルボン酸無水物、3,4−
ビフェニルジカルボン酸無水物、2,3−ジカルボキシ
フェニルフェニルスルホン無水物、3,4−ジカルボキ
シフェニルフェニルスルホン無水物、2,3−ジカルボ
キシフェニルフェニルスルフィド無水物、3,4−ジカ
ルボキシフェニルフェニルスルフィド無水物、1,2−
ナフタレンジカルボン酸無水物、2,3−ナフタレンジ
カルボン酸無水物、1,8−ナフタレンジカルボン酸無
水物、1,2−アントラセンジカルボン酸無水物、2,
3−アントラセンジカルボン酸無水物、1,9−アント
ラセンジカルボン酸無水物、シクロブタン−1,2−ジ
カルボン酸無水物、シクロブタン−1,3−ジカルボン
酸無水物、1,2−シクロペンタンジカルボン酸無水
物、1−メチル−1,2−シクロペンタンジカルボン酸
無水物、1,2−シクロヘキサンジカルボン酸無水物、
1,3−シクロヘキサンジカルボン酸無水物、1−シク
ロヘキセン−1,2−ジカルボン酸無水物、2−シクロ
ヘキセン−1,2−ジカルボン酸無水物、3−シクロヘ
キセン−1,2−ジカルボン酸無水物、4−シクロヘキ
セン−1,2−ジカルボン酸無水物、1−シクロヘキセ
ン−1,3−ジカルボン酸無水物、3−シクロヘキセン
−1,3−ジカルボン酸無水物、4−シクロヘキセン−
1,3−ジカルボン酸無水物、1,3−シクロヘキサジ
エン−1,2−ジカルボン酸無水物、1,4−シクロヘ
キサジエン−1,2−ジカルボン酸無水物、2,4−シ
クロヘキサジエン−1,2−ジカルボン酸無水物、2,
5−シクロヘキサジエン−1,2−ジカルボン酸無水
物、2,6−シクロヘキサジエン−1,2−ジカルボン
酸無水物、3,5−シクロヘキサジエン−1,2−ジカ
ルボン酸無水物、シクロヘキセニルコハク酸無水物、5
−ビシクロ[2,2,1]ヘプテン−2,3−ジカルボ
ン酸無水物、ビシクロ[2,2,1]ヘプタン−2,3
−ジカルボン酸無水物、2−ビシクロ[2,2,1]ヘ
プテン−2,3−ジカルボン酸無水物、2−ビシクロ
[2,2,2]オクテン−2,3−ジカルボン酸無水物
5−ビシクロ[2,2,2]オクテン−2,3−ジカ
ルボン酸無水物等が挙げられる。好適な化合物はマレイ
ン酸無水物、フタル酸無水物及びナジック酸無水物であ
る。Embedded image (Wherein, Z represents the same meaning as in the general formula (1)), a method for obtaining an imide group-containing phenol resin by reacting a dicarboxylic anhydride represented by the general formula (1) will be described. As the dicarboxylic anhydride used here, maleic anhydride, phthalic anhydride, 2,3-benzophenone dicarboxylic anhydride, 3,4-benzophenone dicarboxylic anhydride, 2,
3-dicarboxyphenylphenyl ether anhydride,
3,4-dicarboxyphenylphenyl ether anhydride, 2,3-biphenyldicarboxylic anhydride, 3,4-
Biphenyl dicarboxylic anhydride, 2,3-dicarboxyphenyl phenyl sulfone anhydride, 3,4-dicarboxyphenyl phenyl sulfone anhydride, 2,3-dicarboxyphenyl phenyl sulfide anhydride, 3,4-dicarboxyphenyl phenyl Sulfide anhydride, 1,2-
Naphthalenedicarboxylic anhydride, 2,3-naphthalenedicarboxylic anhydride, 1,8-naphthalenedicarboxylic anhydride, 1,2-anthracenedicarboxylic anhydride, 2,
3-anthracene dicarboxylic anhydride, 1,9-anthracene dicarboxylic anhydride, cyclobutane-1,2-dicarboxylic anhydride, cyclobutane-1,3-dicarboxylic anhydride, 1,2-cyclopentane dicarboxylic anhydride , 1-methyl-1,2-cyclopentanedicarboxylic anhydride, 1,2-cyclohexanedicarboxylic anhydride,
1,3-cyclohexanedicarboxylic anhydride, 1-cyclohexene-1,2-dicarboxylic anhydride, 2-cyclohexene-1,2-dicarboxylic anhydride, 3-cyclohexene-1,2-dicarboxylic anhydride, 4 -Cyclohexene-1,2-dicarboxylic anhydride, 1-cyclohexene-1,3-dicarboxylic anhydride, 3-cyclohexene-1,3-dicarboxylic anhydride, 4-cyclohexene-
1,3-dicarboxylic anhydride, 1,3-cyclohexadiene-1,2-dicarboxylic anhydride, 1,4-cyclohexadiene-1,2-dicarboxylic anhydride, 2,4-cyclohexadiene-1, 2-dicarboxylic anhydride, 2,
5-cyclohexadiene-1,2-dicarboxylic anhydride, 2,6-cyclohexadiene-1,2-dicarboxylic anhydride, 3,5-cyclohexadiene-1,2-dicarboxylic anhydride, cyclohexenylsuccinic acid Anhydride, 5
-Bicyclo [2,2,1] heptene-2,3-dicarboxylic anhydride, bicyclo [2,2,1] heptane-2,3
-Dicarboxylic anhydride, 2-bicyclo [2,2,1] heptene-2,3-dicarboxylic anhydride, 2-bicyclo [2,2,2] octene-2,3-dicarboxylic anhydride 5-bicyclo [2,2,2] octene-2,3-dicarboxylic anhydride and the like. Preferred compounds are maleic anhydride, phthalic anhydride and nadic anhydride.
【0019】この製造方法においては、まずアミノ基含
有フェノール樹脂にジカルボン酸無水物を反応させたの
ち、この付加物を加熱脱水閉環するか、酸性触媒の存在
下、所定の溶媒中で加熱還流することにより脱水縮合さ
せるものである。触媒を用いずに加熱脱水閉環する方法
では、常圧もしくは減圧下において加熱脱水を行う。こ
の時、反応温度は150〜200℃である。反応は通常
無溶媒で行うが、反応に不活性な溶媒を使用してもよ
い。この方法では上記のカルボン酸無水物のいずれも使
用できるが、特に不飽和基を有する脂肪族カルボン酸無
水物を除くカルボン酸無水物が好適である。In this production method, first, a dicarboxylic acid anhydride is reacted with an amino group-containing phenol resin, and the resulting adduct is subjected to dehydration ring closure or heating to reflux in a predetermined solvent in the presence of an acidic catalyst. In this way, dehydration condensation is performed. In the method of performing heat dehydration ring closure without using a catalyst, heat dehydration is performed under normal pressure or reduced pressure. At this time, the reaction temperature is 150 to 200 ° C. The reaction is usually performed without a solvent, but a solvent inert to the reaction may be used. In this method, any of the above carboxylic anhydrides can be used, but carboxylic anhydrides other than aliphatic carboxylic anhydrides having an unsaturated group are particularly preferred.
【0020】酸性触媒を用いて脱水閉環する方法では、
酸性触媒として、硫酸、塩酸、リン酸等の鉱酸、リンタ
ングステン酸、リンモリブデン酸等のヘテロポリ酸、p
−トルエンスルホン酸、メタンスルホン酸等の有機スル
ホン酸、トリクロル酢酸、トリフルオロ酢酸等のハロゲ
ン化カルボン酸、シリカアルミナ等の固体酸、カチオン
型イオン交換樹脂等が使用できる。特に硫酸、リン酸、
p−トルエンスルホン酸が好適である。またこれらの酸
は、アミンとの塩の形となっていてもよい。これらの酸
性触媒は、その種類によっても異なるが、一般にジカル
ボン酸無水物と前記アミノ基含有フェノール樹脂との合
計量当り、0.1〜10重量%の量で使用することが望
ましい。触媒量が、0.1重量%未満の場合には所望の
触媒効果が達成されず、また10重量%を越えて用いた
としても一定以上の効果が得られず、経済的に不利とな
るばかりか、残存触媒の除去が困難になる。In the method of dehydration ring closure using an acidic catalyst,
As acidic catalysts, mineral acids such as sulfuric acid, hydrochloric acid, and phosphoric acid; heteropolyacids such as phosphotungstic acid and phosphomolybdic acid;
-Organic sulfonic acids such as toluenesulfonic acid and methanesulfonic acid, halogenated carboxylic acids such as trichloroacetic acid and trifluoroacetic acid, solid acids such as silica alumina, and cation-type ion exchange resins can be used. Especially sulfuric acid, phosphoric acid,
p-Toluenesulfonic acid is preferred. These acids may also be in the form of a salt with an amine. These acidic catalysts vary depending on the type thereof, but generally, it is desirable to use the acidic catalyst in an amount of 0.1 to 10% by weight based on the total amount of the dicarboxylic anhydride and the amino group-containing phenol resin. If the amount of the catalyst is less than 0.1% by weight, the desired catalytic effect cannot be achieved, and even if the amount exceeds 10% by weight, the effect cannot be obtained beyond a certain level, which is economically disadvantageous. Or, it becomes difficult to remove the remaining catalyst.
【0021】縮合反応に際して用いる溶媒としては、ヘ
キサン、ヘプタン、デカン、シクロヘキサン等の脂肪族
または脂環族炭化水素、ベンゼン、トルエン、キシレン
等の芳香族炭化水素およびそのハロゲン化物、N,N−
ジメチルホルムアミド、N−メチルピロリドン、アセト
ニトリル、N,N−ジメチルアセトアミド、ジメチルス
ルホキシド、スルホラン、アニソール、n−ブチルエー
テル等の含酸素ないしは含硫黄極性溶媒が使用される。
溶媒量は、一般に前記アミノ基含有フェノール樹脂およ
びカルボン酸無水物との合計量の1〜20倍、特に2〜
10倍の範囲にあることが好適である。The solvent used in the condensation reaction includes aliphatic or alicyclic hydrocarbons such as hexane, heptane, decane and cyclohexane, aromatic hydrocarbons such as benzene, toluene and xylene and their halides, N, N-
Oxygen-containing or sulfur-containing polar solvents such as dimethylformamide, N-methylpyrrolidone, acetonitrile, N, N-dimethylacetamide, dimethyl sulfoxide, sulfolane, anisole, and n-butyl ether are used.
The amount of the solvent is generally 1 to 20 times, preferably 2 to 20 times the total amount of the amino group-containing phenol resin and the carboxylic anhydride.
Preferably it is in the range of 10 times.
【0022】加熱還流下における反応温度は、用いる溶
媒等によっても若干異なるが、一般に80〜190℃、
特に100〜160℃の範囲が好適である。圧力は、加
圧、常圧、減圧のいずれでもよく、用いる溶媒と反応温
度とに応じて適宜選択される。反応時間は、一般に0.
5〜20時間、特に1〜15時間の範囲である。The reaction temperature under reflux under heating varies slightly depending on the solvent used and the like.
Particularly, the range of 100 to 160 ° C. is preferable. The pressure may be any of pressurized, normal or reduced pressure, and is appropriately selected according to the solvent used and the reaction temperature. The reaction time is generally 0.
The range is from 5 to 20 hours, especially from 1 to 15 hours.
【0023】尚、ジカルボン酸無水物とアミノ基含有フ
ェノール樹脂の仕込量は、アミノ基含有フェノール樹脂
成分に対して、ジカルボン酸無水物量を若干過剰とする
ことが好適である。一般には、モル基準で、アミノ基含
有フェノール樹脂中の全アミノ基に対して、カルボン酸
無水物が1.03〜1.50倍となるように仕込めばよ
い。The amount of the dicarboxylic acid anhydride and the amino group-containing phenol resin to be charged is preferably such that the amount of the dicarboxylic acid anhydride is slightly excessive with respect to the amino group-containing phenol resin component. In general, the carboxylic acid anhydride may be charged so as to be 1.03 to 1.50 times the total amino groups in the amino group-containing phenol resin on a molar basis.
【0024】縮合反応完了後、反応混合物を水洗して、
残存触媒、未反応ジカルボン酸無水物を除去したのち、
溶媒を留去して濃縮物を得る。このようにして前記の一
般式(1)で表されるされるイミド基含有フェノール樹
脂が得られる。このイミド基含有フェノール樹脂は一般
式(1)において、アラルキル基によるフェノール化合
物と芳香族イミド化合物の結合数であるmおよびnはそ
れぞれ0から20までであり、しかし、ともに0ではな
い。また、フェノール化合物と芳香族イミド化合物との
アラルキル基による結合順序は特に規則性はなく、限定
されるものではない。また、分子の末端はフェノール化
合物と芳香族イミド化合物のいずれか一方、または両方
に由来するものである。得られるイミド基含有フェノー
ル樹脂の平均分子量範囲は350〜5000、イミド基
/水酸基のモル比が3:97〜80:20、軟化点60
〜140℃程度である。After completion of the condensation reaction, the reaction mixture is washed with water,
After removing the remaining catalyst and unreacted dicarboxylic anhydride,
The solvent is distilled off to obtain a concentrate. Thus, the imide group-containing phenol resin represented by the general formula (1) is obtained. In the imide group-containing phenol resin, in the general formula (1), m and n, which are the numbers of bonds between the phenol compound and the aromatic imide compound by the aralkyl group, are each from 0 to 20, but not both 0. In addition, the binding order of the aralkyl group between the phenol compound and the aromatic imide compound is not particularly limited and is not limited. The terminal of the molecule is derived from one or both of the phenol compound and the aromatic imide compound. The resulting imide group-containing phenol resin has an average molecular weight range of 350 to 5,000, a molar ratio of imide group / hydroxyl group of 3:97 to 80:20, and a softening point of 60.
~ 140 ° C.
【0025】次に、このイミド基含有フェノール樹脂を
用いた成形材料について述べる。この成形材料には本発
明のイミド基含有フェノール樹脂を必須成分とし、必要
により他のフェノール樹脂を併用してもよい。このフェ
ノール樹脂としてはフェノール類とホルマリンのような
アルデヒド類を反応させて得られるノボラック樹脂、フ
ェノール類と本発明のイミド基含有フェノール樹脂の製
造で使用されるようなアラルキル化合物を反応させて得
られるフェノールアラルキル樹脂およびフェノール類と
ジシクロペンタジエンを反応させて得られるフェノール
樹脂が使用される。これらのフェノール樹脂と本発明の
必須成分であるイミド基含有フェノール樹脂の使用割合
は特に限定されないが、成形材料でマトリックスレジン
全体に占めるイミド基の量が少な過ぎると耐熱性や熱時
強度等、本発明の効果が発揮されなくなるので、イミド
基の含有割合に応じて適宜調整されるべきである。この
イミド基はマトリックスレジン全体のフェノール性水酸
基に対して3モル%以上、好ましくは5モル%以上あれ
ばよい。又、イミド基の上限は単独の場合80モル%以
下であるので併用する場合はこれ以下が一般的である。Next, a molding material using this imide group-containing phenol resin will be described. This molding material contains the imide group-containing phenol resin of the present invention as an essential component, and if necessary, may be used in combination with another phenol resin. The phenolic resin is a novolak resin obtained by reacting a phenol and an aldehyde such as formalin, and a phenol and an aralkyl compound used in the production of the imide group-containing phenol resin of the present invention. Phenol aralkyl resins and phenol resins obtained by reacting phenols with dicyclopentadiene are used. The use ratio of these phenolic resins and the imide group-containing phenolic resin, which is an essential component of the present invention, is not particularly limited.However, if the amount of the imide groups occupying the entire matrix resin in the molding material is too small, heat resistance and heat strength, Since the effect of the present invention is no longer exhibited, it should be appropriately adjusted according to the content ratio of the imide group. This imide group should be at least 3 mol%, preferably at least 5 mol%, based on the phenolic hydroxyl groups of the entire matrix resin. The upper limit of the imide group is 80 mol% or less when used alone, and is generally lower when used in combination.
【0026】次に本発明の成形材料で使用される硬化成
分を述べる。本発明のイミド基含有フェノール樹脂で脂
肪族不飽和結合を有するマレイミド基、ナジックイミド
基等はそれ自体、重合により架橋できることが特長であ
る。したがって、それらのイミド基含有割合が高いもの
は別種の硬化成分を添加することなく自硬化性成形材料
として使用することができる。しかしながら、耐熱性や
機械的強度の向上という観点から見れば、どのような種
類または割合のイミド基を含有する樹脂であろうとも硬
化成分を添加する方がより良い。このような硬化成分と
しては通常フェノール樹脂を硬化せしめるヘキサミンメ
チレンテトラミンまたはレゾール化物が使用される。Next, the curing components used in the molding material of the present invention will be described. The imide group-containing phenolic resin of the present invention is characterized in that the maleimide group, nadic imide group and the like having an aliphatic unsaturated bond can be crosslinked by polymerization. Therefore, those having a high imide group content can be used as a self-curing molding material without adding another kind of curing component. However, from the viewpoint of improving heat resistance and mechanical strength, it is better to add a curing component to any kind or ratio of resin containing an imide group. As such a curing component, hexaminemethylenetetramine or a resolated product which usually cures a phenol resin is used.
【0027】ヘキサメチレンテトラミンの場合は、通
常、全樹脂に対して2〜18重量%の量で使用される。
これはイミド基の含有量に応じて適宜調整して使用され
る。即ち、イミド基の含有量が多ければヘキサメチレン
テトラミンの使用量が少なくても良く、イミド基が少な
ければヘキサメチレンテトラミンの使用量も増加させる
方が良い。一方、レゾール化物の場合は、使用量の如何
にかかわらず、すべて硬化物を与えるので、使用量に特
に限定はない。しかしながら、硬化物の物性が良好な硬
化物を得るには、レゾール化物の使用量はイミド基含有
フェノール樹脂またはこれを含むフェノール樹脂に対し
て10〜500重量%の範囲が適当である。レゾール化
物としては、一般に知られているフェノール系レゾール
樹脂、例えばレゾールノボラック、ジメチロール化フェ
ノール化合物、ビスフェノールのレゾール化物、フェノ
ールアラルキル樹脂のレゾール化物、フェノール−ジシ
クロペンタジエン樹脂のレゾール化物等であり、また、
キシレン、メシチレン等の芳香族炭化水素類のレゾール
化物が挙げられる。ここでいうレゾールの意味は、アル
カリ性触媒または酸性触媒の存在下でホルマリン、ヘキ
サミン等を用いて反応させたメチロール化物またはメチ
レン結合、ジメチレンエーテル結合、メチロール基、メ
チレンオキシメチロール基等の混合系から成るものであ
る。In the case of hexamethylenetetramine, it is usually used in an amount of 2 to 18% by weight based on the total resin.
This is used after being appropriately adjusted according to the content of the imide group. That is, if the content of the imide group is large, the use amount of hexamethylenetetramine may be small, and if the content of the imide group is small, the use amount of hexamethylenetetramine may be increased. On the other hand, in the case of the resolated product, the cured product is provided irrespective of the usage amount, and thus the usage amount is not particularly limited. However, in order to obtain a cured product having good physical properties, the amount of the resolated product is suitably in the range of 10 to 500% by weight based on the imide group-containing phenol resin or the phenol resin containing the same. Examples of the resolated compound include generally known phenolic resole resins, for example, resol novolak, dimethylolated phenol compound, resylated compound of bisphenol, resolated compound of phenol aralkyl resin, resole compound of phenol-dicyclopentadiene resin, and the like. ,
Examples include resole compounds of aromatic hydrocarbons such as xylene and mesitylene. The meaning of resol as used herein means a methylol compound reacted with formalin, hexamine, or the like in the presence of an alkaline catalyst or an acidic catalyst, or a mixed system of a methylene bond, a dimethylene ether bond, a methylol group, a methyleneoxymethylol group, and the like. It consists of
【0028】次に、本発明の成形材料に無機および/ま
たは有機の充填剤を用いる。これらは例えばアスベス
ト、雲母、ガラス繊維、炭素繊維、アラミド繊維、金属
繊維、シリカ、アルミナ、炭酸カルシウム、酸化マグネ
シウム、水酸化アルミニウム、木粉、木炭、カオリン、
クレー、珪藻土、マイカ、カーボンブラック等である。
これらの充填剤と樹脂成分の割合は、通常0.3〜6対
1の重量比である。Next, an inorganic and / or organic filler is used in the molding material of the present invention. These include, for example, asbestos, mica, glass fiber, carbon fiber, aramid fiber, metal fiber, silica, alumina, calcium carbonate, magnesium oxide, aluminum hydroxide, wood flour, charcoal, kaolin,
Clay, diatomaceous earth, mica, carbon black and the like.
The ratio between the filler and the resin component is usually 0.3 to 6: 1 by weight.
【0029】また、本発明の成形材料には上記の各成分
の他に、硬化促進剤、顔料、潤滑剤、防錆剤、安定剤、
難燃剤、帯電防止剤等、目的に応じて適宜使用すること
ができる。特にマレイミド基、ナジックイミド基等の二
重結合の架橋促進を効率的に進める意味でイミダゾール
系、例えば2−メチルイミダゾール(2MZ)、2−ウ
ンデシルイミダゾール(C17Z)の等リン系、例えば
トリフェニルホスフィン(TPP)、テトラフェニルホ
スホニウムテトラフェニルボレート等または1.8−ジ
アザビシクロ(5,4,0)ウンデセンー7等の促進剤
を樹脂に対して0.1〜5重量%の範囲で用いることは
むしろ効果的な手段である。本発明の成形材料は上記各
成分を、例えばロールミルにより80〜140℃程度
で、配合・混練して成形材料とすることができる。この
ようにして得られた成形材料は圧縮、押出等の方法によ
り成形後、硬化物を得ることができる。The molding material of the present invention may contain, in addition to the above components, a curing accelerator, a pigment, a lubricant, a rust inhibitor, a stabilizer,
Flame retardants, antistatic agents and the like can be appropriately used according to the purpose. In particular, imidazole-based compounds such as 2-methylimidazole (2MZ) and 2-undecylimidazole (C17Z) -based phosphorus compounds, such as triphenyl, in terms of efficiently promoting the promotion of crosslinking of double bonds such as a maleimide group and a nadic imide group. The use of an accelerator such as phosphine (TPP), tetraphenylphosphonium tetraphenylborate or 1.8-diazabicyclo (5,4,0) undecene-7 in the range of 0.1 to 5% by weight based on the resin is rather. It is an effective means. The molding material of the present invention can be obtained by mixing and kneading the above components at, for example, about 80 to 140 ° C. by a roll mill to obtain a molding material. The molding material thus obtained can be cured by a method such as compression or extrusion, and then a cured product can be obtained.
【0030】[0030]
【実施例】次に実施例により本発明を更に詳細に説明す
る。しかし、本発明はこれら実施例によって限定される
ものではない。 合成例1 攪拌器、温度計及び還流冷却器を備えたガラス製反応容
器に、フェノール193.0g(2.05モル)、アニ
リン181.5g(1.95モル)を装入し、内温を1
05℃まで昇温した。次にp−キシリレンジクロライド
175.0g(1.0モル)を装入し、内温を同温度に
保ちつつ、2.5時間攪拌を続けた。その後、内温を1
80℃まで昇温して、さらに9.5時間攪拌を続けた。
反応終了後、内温を60℃まで徐冷し、28%アンモニ
ア水280gを加え、中和した。次いで、水、未反応の
フェノール及びアニリンを真空蒸留により除去し、残渣
にトルエン、水を加えて水洗し、塩化アンモニウムを除
いた。水洗終了後、トルエン、微量の水を減圧蒸留によ
って除去し、得られた赤褐色透明樹脂を熱時に排出し
た。収量は215gで、軟化点(JIS−K−254
8)は62.4℃であった。この樹脂の水酸基当量(g
/eq)は201で、アミン価(g/eq)は820で
あった。また、GPCによる樹脂の平均分子量は、62
0であった。次に、攪拌器、温度計、還流冷却器及び水
分離器を備えたガラス製反応容器に、トルエン50gお
よびp−トルエンスルホン酸0.8gを装入し、昇温し
てトルエンの還流状態で1時間還流脱水を行った。次
に、無水マレイン酸7.75g(0.08モル)を加
え、更に1時間還流脱水を行った。これに、あらかじめ
上記のアミノ基含有フェノール樹脂を50gのトルエン
に加熱溶解した溶液を2時間で滴下ロートより滴下し
た。滴下終了後、更に6時間熟成した。滴下開始から熟
成終了までの間、反応で生成する水を還流冷却器に備え
付けてある水分離器に依って捕集した。反応終了後、内
温を80℃まで徐冷し、水を加えてp−トルエンスルホ
ン酸、未反応の無水マレイン酸を水洗で取り除いた。減
圧蒸留で溶媒を留去し、得られた赤褐色樹脂を熱時に排
出した。収量は54gで軟化点(JIS−K−254
8)は71.5℃であった。なお、この樹脂のマレイミ
ド基/水酸基のモル比は19.7/80.3であった。Next, the present invention will be described in more detail by way of examples. However, the present invention is not limited by these examples. Synthesis Example 1 193.0 g (2.05 mol) of phenol and 181.5 g (1.95 mol) of aniline were charged into a glass reaction vessel equipped with a stirrer, a thermometer, and a reflux condenser, and the internal temperature was reduced. 1
The temperature was raised to 05 ° C. Next, 175.0 g (1.0 mol) of p-xylylene dichloride was charged, and stirring was continued for 2.5 hours while maintaining the internal temperature at the same temperature. Then, the internal temperature is reduced to 1
The temperature was raised to 80 ° C., and the stirring was further continued for 9.5 hours.
After completion of the reaction, the internal temperature was gradually cooled to 60 ° C., and 280 g of 28% aqueous ammonia was added to neutralize. Then, water, unreacted phenol and aniline were removed by vacuum distillation, and toluene and water were added to the residue, followed by washing with water to remove ammonium chloride. After washing with water, toluene and a trace amount of water were removed by distillation under reduced pressure, and the resulting red-brown transparent resin was discharged when hot. The yield was 215 g and the softening point (JIS-K-254)
8) was 62.4 ° C. The hydroxyl equivalent of this resin (g
/ Eq) was 201 and the amine value (g / eq) was 820. The average molecular weight of the resin measured by GPC is 62
It was 0. Next, 50 g of toluene and 0.8 g of p-toluenesulfonic acid were charged into a glass reaction vessel equipped with a stirrer, a thermometer, a reflux condenser, and a water separator. Reflux dehydration was performed for 1 hour. Next, 7.75 g (0.08 mol) of maleic anhydride was added, and the mixture was further subjected to reflux dehydration for 1 hour. A solution prepared by previously heating and dissolving the above amino group-containing phenol resin in 50 g of toluene was added dropwise from a dropping funnel over 2 hours. After completion of the dropwise addition, the mixture was aged for 6 hours. During the period from the start of the dropping to the completion of ripening, water generated by the reaction was collected by a water separator provided in a reflux condenser. After completion of the reaction, the internal temperature was gradually cooled to 80 ° C, and water was added to remove p-toluenesulfonic acid and unreacted maleic anhydride by washing with water. The solvent was distilled off under reduced pressure, and the obtained reddish brown resin was discharged while hot. The yield was 54 g and the softening point (JIS-K-254)
8) was 71.5 ° C. In addition, the molar ratio of maleimide group / hydroxyl group of this resin was 19.7 / 80.3.
【0031】合成例2 フェノール138.3g(1.47モル)、アニリン1
42.4g(1.53モル)に対しP−キシリレンジク
ロライド175g(1モル)を使用した以外は合成例1
と同様に行ってマレイミド基含有フェノール樹脂252
gを得た。この樹脂のマレイミド/水酸基のモル比は2
7.4/72.6であり、軟化点は84.5℃であっ
た。Synthesis Example 2 138.3 g (1.47 mol) of phenol, aniline 1
Synthesis Example 1 except that 175 g (1 mol) of P-xylylene dichloride was used for 42.4 g (1.53 mol).
The same procedure as described above was repeated to obtain a maleimide group-containing phenol resin 252.
g was obtained. The maleimide / hydroxyl molar ratio of this resin is 2
7.4 / 72.6, and the softening point was 84.5 ° C.
【0032】合成例3 フェノール94g(1モル)、アニリン186g(2モ
ル)に対しp−キシレンジクロリド262.5g(1.
5モル)を使用した以外は合成例1と同様に行ってアミ
ノ基含有フェノール樹脂290gを得た。この樹脂のア
ミノ基/水酸基のモル比は53.2/46.8であっ
た。つぎに、このアミノ基含有フェノール樹脂に対して
無水フタル酸118.4g(0.8モル)を加え、18
0℃で溶融混合させながらアスピレーターによる減圧下
にアミノ基と無水フタル酸の縮合反応を行った。途中生
成する水は冷却トラップにより捕集した。2時間、同温
度で熟成を行って水の生成が認められなくなった時点で
反応を終了した。この溶融樹脂はアミノ基がフタルイミ
ド化されたフェノール樹脂であり、軟化点は126℃で
収量は388gであった。Synthesis Example 3 262.5 g of p-xylylene dichloride (1. mol of phenol and 94 g (1 mol) of phenol and 186 g (2 mol) of aniline).
290 g of an amino group-containing phenol resin was obtained in the same manner as in Synthesis Example 1 except that 5 mol) was used. The molar ratio of amino group / hydroxyl group of this resin was 53.2 / 46.8. Next, 118.4 g (0.8 mol) of phthalic anhydride was added to the amino group-containing phenol resin, and 18
The condensation reaction between the amino group and phthalic anhydride was performed under reduced pressure using an aspirator while melting and mixing at 0 ° C. Water generated on the way was collected by a cooling trap. The reaction was terminated when aging was carried out at the same temperature for 2 hours and no generation of water was observed. This molten resin was a phenol resin in which amino groups were phthalimidized, had a softening point of 126 ° C. and a yield of 388 g.
【0033】実施例1〜6、比較例1〜2 合成例1〜3で得られたイミド基含有フェノール樹脂お
よび比較としてフェノールノボラック樹脂#2000
(昭和高分子製)、一般式(6)(化7)Examples 1 to 6, Comparative Examples 1 to 2 The imide group-containing phenolic resins obtained in Synthesis Examples 1 to 3 and a phenol novolak resin # 2000 for comparison
(Manufactured by Showa Polymer), general formula (6)
【化7】 で表されるフェノールザイロック樹脂(三井東圧化学
(株)製:ミレックス225、平均分子量2400)を
用い、充填剤、硬化剤、その他の添加剤成分を表1のよ
うに配合し、120℃でロール混練して成形材用組成物
を得た。これら組成物を190℃で5分間圧縮成形し物
性評価用の試験片を得た。この試験片は220℃/4h
r、250℃/4hrポストキュアした後、物性評価を
行った。尚硬化剤としてはヘキサメチレンテトラミンの
他レゾール型フェノール樹脂(大日本インキ化学製、T
D−2040C 固形分100%)、キシレン樹脂(三
菱ガス化学製、ニカノール−HH)を用いた。Embedded image A filler, a curing agent, and other additive components are blended as shown in Table 1 using a phenol ziloc resin (Mirex 225, manufactured by Mitsui Toatsu Chemicals, Inc., average molecular weight 2400) represented by To obtain a molding material composition. These compositions were compression molded at 190 ° C. for 5 minutes to obtain test pieces for evaluating physical properties. This test piece is 220 ° C / 4h
After 250 ° C./4 hr post-curing, physical properties were evaluated. As a curing agent, hexamethylenetetramine and resol type phenol resin (manufactured by Dainippon Ink and Chemicals, T
D-2040C solid content 100%) and a xylene resin (Nickanol-HH, manufactured by Mitsubishi Gas Chemical).
【0034】[0034]
【表1】 [Table 1]
【0035】表1の結果から明らかなように、吸水率
は、実施例1〜6が、比較例1に比べ50〜90%程度
であり、長期熱劣化は、実施例1〜6が270℃×31
2時間後でも処理前の40%以上の強度を示すが、比較
例1では大きく低下し強度を保つことができない。ま
た、Tgは、実施例1〜6が比較例2に比べ、30〜1
20℃程度高く、熱時の曲げ強さが2〜3倍程度向上し
ている。すなわち、これらの実施例は、本願発明の成形
材料が、Tgや熱時の曲げ強さの性能についてはザイロ
ック樹脂を越えて、これらをノポラック樹脂と同程度に
維持し、その上、ノポラック樹脂の難点である吸水率、
長期熱劣化の性能についてザイロック樹脂以上に改善し
たものであることを示している。As is clear from the results shown in Table 1, the water absorption of Examples 1 to 6 is about 50 to 90% as compared with Comparative Example 1, and the long-term thermal deterioration is 270 ° C. for Examples 1 to 6. × 31
Even after 2 hours, the strength is 40% or more before the treatment, but in Comparative Example 1, the strength is greatly reduced and the strength cannot be maintained. Further, Tg was 30 to 1 in Examples 1 to 6 compared to Comparative Example 2.
The temperature is higher by about 20 ° C., and the bending strength when heated is improved by about 2 to 3 times. In other words, in these examples, the molding material of the present invention exceeds the Xyloc resin with respect to the performance of Tg and flexural strength when heated, and maintains them at the same level as the Nopolak resin. Water absorption, which is a difficulty,
It shows that the performance of long-term thermal deterioration is improved more than that of Xylock resin.
【0036】[0036]
【発明の効果】以上詳述したように本発明の成形材料は
軟化点が適当な範囲にあるため作業性は良好であり、そ
の硬化物は耐熱性、機械的強度に優れ、しかも低吸水性
であることから先端複合材分野等における使用で高い信
頼性を得ることができる。As described in detail above, the molding material of the present invention has good workability because the softening point is within an appropriate range, and the cured product has excellent heat resistance and mechanical strength, and low water absorption. Therefore, high reliability can be obtained when used in the advanced composite material field and the like.
フロントページの続き (72)発明者 山口 彰宏 神奈川県横浜市栄区笠間町1190番地 三 井東圧化学株式会社内 (56)参考文献 特開 平5−67706(JP,A) (58)調査した分野(Int.Cl.7,DB名) C08G 61/02 Continuation of front page (72) Inventor Akihiro Yamaguchi 1190 Kasama-cho, Sakae-ku, Yokohama-shi, Kanagawa Prefecture Inside Mitsui Toatsu Chemicals Co., Ltd. (56) References JP-A-5-67706 (JP, A) (58) Fields investigated ( Int.Cl. 7 , DB name) C08G 61/02
Claims (4)
基、またはC1 〜C12のアルキル基、シクロアルキル
基、アラルキル基、アルコキシ基、アリール基またはア
リールオキシ基を示し、同一でも異なってもよく、R1
とR2 は環を形成しても良い。R3 、R4 は、水素原
子、ハロゲン原子、水酸基、イミド基、C1 〜C 12のア
ルキル基、アリール基、シクロアルキル基、アラルキル
基、イミド基置換アラルキル基、ヒドロキシ基置換アラ
ルキル基、アルコキシ基、アリールオキシ基、イミド基
置換アリールオキシ基、ヒドロキシ基置換アリールオキ
シ基を示し、同一でも異なってもよく、R3 とR4 は環
を形成してもよい。また、ZはC2〜C24の不飽和脂肪
族基、飽和単環式脂肪族基、不飽和単環式脂肪族基、不
飽和縮合多環式脂肪族基、飽和縮合多環式脂肪族基、置
換基として不飽和単環式脂肪族基を有する脂肪族基、置
換基として鎖状脂肪族基を有することもある単環式芳香
族基、単環式芳香族基が直接または架橋員により相互に
連結された非縮合多環式芳香族基、置換基として鎖状脂
肪族基を有することもある縮合多環式芳香族基から成る
群より選ばれた2価の基を示す。但し、m,nは0〜2
0を示し、m+n≠0である。末端はフェノール化合物
及び/または芳香族イミド化合物であり、フェノール化
合物と芳香族イミド化合物の結合順序は限定されな
い。)で表される軟化点60〜140℃、平均分子量3
50〜5000、イミド基/水酸基の比が、3:97〜
80:20の範囲にあるイミド基含有フェノール樹脂と
無機および/または有機の充填材、ヘキサメチレンテト
ラミンを含有してなることを特徴とする成形材料。1. A compound represented by the general formula (1):(Where R1, RTwoIs hydrogen atom, halogen atom, hydroxyl
Group, or C1~ C12Alkyl group, cycloalkyl
Group, aralkyl group, alkoxy group, aryl group or
A reeloxy group, which may be the same or different;1
And RTwoMay form a ring. RThree, RFourIs a hydrogen source
Atom, halogen atom, hydroxyl group, imide group, C1~ C 12No
Alkyl, aryl, cycloalkyl, aralkyl
Group, imide group-substituted aralkyl group, hydroxy group-substituted ara
Alkyl group, alkoxy group, aryloxy group, imide group
Substituted aryloxy group, hydroxy-substituted aryloxy
And represents the same or a different group,ThreeAnd RFourIs a ring
May be formed. Z is CTwo~ Ctwenty fourUnsaturated fat
Group, saturated monocyclic aliphatic group, unsaturated monocyclic aliphatic group,
Saturated condensed polycyclic aliphatic group, saturated condensed polycyclic aliphatic group,
Aliphatic group having an unsaturated monocyclic aliphatic group as a substituent,
Monocyclic aromatics which may have chain aliphatic groups as substituents
Group or monocyclic aromatic group, directly or
Linked non-fused polycyclic aromatic group, chain-like fat as a substituent
Consists of fused polycyclic aromatic groups that may have aliphatic groups
Shows a divalent group selected from the group. However, m and n are 0 to 2
0, and m + n ≠ 0. Terminal is phenolic compound
And / or an aromatic imide compound,
The bonding order of the compound and the aromatic imide compound is not limited.
No. ), Average molecular weight 3
50-5000, the ratio of imide group / hydroxyl group is 3: 97-
An imide group-containing phenolic resin in the range of 80:20 and
Inorganic and / or organic filler, hexamethylene tet
A molding material characterized by containing lamin.
るイミド基含有フェノール樹脂と無機および/または有
機の充填材、レゾール樹脂を含有してなることを特徴と
する成形材料。2. A molding material comprising the imide group-containing phenol resin represented by the general formula (1) according to claim 1, an inorganic and / or organic filler, and a resol resin.
成形硬化物。3. A molded cured product obtained from the molding material according to claim 1.
成形硬化物。4. A molded cured product obtained from the molding material according to claim 2.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20622093A JP3214764B2 (en) | 1993-08-20 | 1993-08-20 | Molding material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20622093A JP3214764B2 (en) | 1993-08-20 | 1993-08-20 | Molding material |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0753678A JPH0753678A (en) | 1995-02-28 |
| JP3214764B2 true JP3214764B2 (en) | 2001-10-02 |
Family
ID=16519758
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP20622093A Expired - Fee Related JP3214764B2 (en) | 1993-08-20 | 1993-08-20 | Molding material |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3214764B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6379998B1 (en) | 1986-03-12 | 2002-04-30 | Hitachi, Ltd. | Semiconductor device and method for fabricating the same |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010013610A (en) * | 2008-07-07 | 2010-01-21 | Sumitomo Bakelite Co Ltd | Phenol resin composition for frictional material and thermosetting phenol resin composition for frictional material |
| JP7157601B2 (en) * | 2018-09-06 | 2022-10-20 | 日鉄ケミカル&マテリアル株式会社 | Thermosetting resin composition and cured product thereof |
| JP7598033B2 (en) * | 2022-06-28 | 2024-12-11 | Dic株式会社 | Polymaleimide resin, curable composition, cured product, prepreg, circuit board, build-up film, semiconductor encapsulant, and semiconductor device |
-
1993
- 1993-08-20 JP JP20622093A patent/JP3214764B2/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6379998B1 (en) | 1986-03-12 | 2002-04-30 | Hitachi, Ltd. | Semiconductor device and method for fabricating the same |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0753678A (en) | 1995-02-28 |
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