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JP3227601B2 - Harmful exhaust gas abatement agent - Google Patents
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JP3227601B2 - Harmful exhaust gas abatement agent - Google Patents

Harmful exhaust gas abatement agent

Info

Publication number
JP3227601B2
JP3227601B2 JP32219998A JP32219998A JP3227601B2 JP 3227601 B2 JP3227601 B2 JP 3227601B2 JP 32219998 A JP32219998 A JP 32219998A JP 32219998 A JP32219998 A JP 32219998A JP 3227601 B2 JP3227601 B2 JP 3227601B2
Authority
JP
Japan
Prior art keywords
agent
remover
exhaust gas
oxide
hydroxide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP32219998A
Other languages
Japanese (ja)
Other versions
JPH11226390A (en
Inventor
忠治 渡辺
由章 杉森
▲均▼ 菊池
文誉 遠藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Taiyo Nippon Sanso Corp
Original Assignee
Nippon Sanso Corp
Nippon Sanso Holdings Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Sanso Corp, Nippon Sanso Holdings Corp filed Critical Nippon Sanso Corp
Priority to JP32219998A priority Critical patent/JP3227601B2/en
Publication of JPH11226390A publication Critical patent/JPH11226390A/en
Application granted granted Critical
Publication of JP3227601B2 publication Critical patent/JP3227601B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Solid-Sorbent Or Filter-Aiding Compositions (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、半導体製造工場等から
排出される有害排ガスを除害する際に用いる除害剤に関
する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an abatement agent used for removing harmful exhaust gas discharged from a semiconductor manufacturing plant or the like.

【0002】[0002]

【従来の技術】半導体製造工場では、アルシン,ホスフ
イン,シラン,ジクロルシラン,ターシャリーブチルア
ルシン等の有害成分を含む有害排ガスが排出される。こ
れらの成分は、爆発性があったり、人体に有害なため、
大気に放出する前に無害化する必要がある。
2. Description of the Related Art In a semiconductor manufacturing plant, harmful exhaust gas containing harmful components such as arsine, phosphine, silane, dichlorosilane and tertiary butyl arsine is discharged. Because these ingredients are explosive or harmful to the human body,
Must be detoxified before release to atmosphere.

【0003】このため、前記有害排ガスを無害化するた
めの処理剤として、例えば、特公平3−64166号,
同3−64167号,同4−17082号,同4−19
886号等の各公報に示されるように、酸化銅(Cu
O)をはじめとする各種の金属酸化物を反応主成分とす
る除去剤が提案されている。
[0003] Therefore, as a treating agent for detoxifying the harmful exhaust gas, for example, Japanese Patent Publication No. 3-64166,
3-64167, 4-17082, 4-19
No. 886 and the like, copper oxide (Cu
O) and various other metal oxides have been proposed as a main component of the removal agent.

【0004】[0004]

【発明が解決しようとする課題】しかし、上述した酸化
銅等の金属酸化物を反応主成分とする従来の除去剤で
は、シランに対する除去能力が小さく、このため、細粒
化処理を行うとともに、アルミナ等の担体に担持させて
比表面積を大きくする必要があり、除去剤自体の製造も
面倒であった。
However, the conventional remover containing a metal oxide such as copper oxide as a main component has a small ability to remove silane. The specific surface area must be increased by supporting the carrier on a carrier such as alumina, and the production of the removing agent itself is troublesome.

【0005】このようなことから、本出願人は、先に結
晶性水酸化第二銅を主成分とする除去剤を提案した(特
願平5−56653号)。この除去剤(以下、水酸化銅
剤という)は、ヒ素系のアルシンやリン系のホスフィン
みならず、特にシラン等のケイ素系の有害成分に対する
除去能力に優れ、前記金属酸化物を反応主成分とする従
来の金属酸化物を主体とした除去剤(以下、金属酸化物
剤という)より多量に有害成分を除去処理できるという
効果を有しているが、使用条件によっては、処理後の排
ガス中に残留する有害成分量が金属酸化物剤で処理した
ものに比べて多めになることがあった。
[0005] Under such circumstances, the present applicant has previously proposed a removing agent containing crystalline cupric hydroxide as a main component (Japanese Patent Application No. 5-56653). This removing agent (hereinafter, referred to as a copper hydroxide agent) is excellent not only in removing arsenic-based arsine and phosphorus-based phosphine but also in removing silicon-based harmful components such as silane. It has the effect of removing harmful components in a larger amount than conventional metal oxide-based removers (hereinafter referred to as metal oxide agents). In some cases, the amount of the harmful components remaining in the resin was larger than that treated with the metal oxide agent.

【0006】そこで、本発明は、多量の有害成分を除去
処理できるとともに、様々な条件下においても有害成分
を所定濃度以下にまで確実に除去処理できる有害排ガス
の除害方法及び除害剤を提供することを目的としてい
る。
Accordingly, the present invention provides a harmful exhaust gas elimination method and harmless agent which can remove a large amount of harmful components and can surely remove harmful components to a predetermined concentration or less even under various conditions. It is intended to be.

【0007】[0007]

【課題を解決するための手段】上記目的を達成するた
め、本発明の有害排ガスの除害剤は、結晶性水酸化第二
銅(以下、水酸化銅除去剤いう。)と金属酸化物(以
下、金属酸化物除去剤いう。)とを含むことを特徴とし
ている。
Means for Solving the Problems In order to achieve the above object, the harmful exhaust gas abatement agent of the present invention comprises crystalline cupric hydroxide (hereinafter, referred to as copper hydroxide remover) and metal oxide ( Hereinafter, referred to as a metal oxide remover).

【0008】本発明において、主成分となる結晶性水酸
化第二銅(Cu(OH)2 )には、水酸化第一銅を含ん
でいても良い。また、水酸化第二銅には、結晶性のもの
と非晶質のものとがあるが、結晶性のものの方が温度に
対する安定性が高いので、安定的に使用でき、有害成分
の濃度が高く、反応熱が高い場合でも除去効率が高い。
In the present invention, crystalline cupric hydroxide (Cu (OH) 2 ) as a main component may contain cuprous hydroxide. Cupric hydroxide is classified into crystalline one and amorphous one, but crystalline one has higher stability against temperature, so that it can be used stably and the concentration of harmful components is lower. High removal efficiency even when the reaction heat is high.

【0009】なお、従来の酸化銅を主成分とした除去剤
中には、酸化銅を製造する工程における残留物として微
量の水酸化第二銅が含まれていることがあるが、従来の
除去剤においては、この水酸化第二銅はあくまでも不純
物として残留しているものであって、本発明のように、
除去剤の主成分として用いるものとは、本質的に異なる
ものである。
The conventional removing agent containing copper oxide as a main component sometimes contains a trace amount of cupric hydroxide as a residue in the process of producing copper oxide. In the agent, the cupric hydroxide remains as an impurity to the last, as in the present invention,
It is essentially different from the one used as the main component of the remover.

【0010】また、金属酸化物としては、酸化第一銅,
酸化第二銅,酸化マグネシウム,酸化カルシウム,二酸
化チタン,酸化クロム,二酸化マンガン,酸化第一鉄,
酸化ニッケル,酸化亜鉛,酸化アルミニウム,二酸化ケ
イ素等、多くの種類の金属酸化物を挙げることができ
る。
The metal oxides include cuprous oxide,
Cupric oxide, magnesium oxide, calcium oxide, titanium dioxide, chromium oxide, manganese dioxide, ferrous oxide,
Many types of metal oxides, such as nickel oxide, zinc oxide, aluminum oxide, and silicon dioxide, can be mentioned.

【0011】本発明の対象となる有害成分は、半導体製
造工場等で使用される揮発性無機水素化物,揮発性無機
ハロゲン化物,有機金属化合物等である。前記揮発性無
機水素化物としては、ジボラン,シラン,ジシラン,ゲ
ルマン,アンモニア,ホスフィン,アルシン,硫化水
素,セレン化水素等を挙げることができ、また、揮発性
無機ハロゲン化物としては、三フッ化ホウ素,三塩化ホ
ウ素,四フッ化ケイ素,ジクロルシラン,トリクロルシ
ラン,四塩化ケイ素,トリクロルアルシン,六フッ化タ
ングステン,フッ素,塩素,フッ化水素,塩化水素,臭
化水素等、ハロゲンガスも含む各種ガスを挙げることが
できる。
The harmful components targeted by the present invention are volatile inorganic hydrides, volatile inorganic halides, organometallic compounds and the like used in semiconductor manufacturing plants and the like. Examples of the volatile inorganic hydride include diborane, silane, disilane, germane, ammonia, phosphine, arsine, hydrogen sulfide, and hydrogen selenide. Examples of the volatile inorganic halide include boron trifluoride. , Boron trichloride, silicon tetrafluoride, dichlorosilane, trichlorosilane, silicon tetrachloride, trichloroarsine, tungsten hexafluoride, fluorine, chlorine, hydrogen fluoride, hydrogen chloride, hydrogen bromide, etc. Can be mentioned.

【0012】さらに、有機金属化合物としては、アルキ
ル基を含むものとして、ジメチル亜鉛,ジエチル亜鉛,
トリメチルアルミニウム,トリエチルアルミニウム,ト
リメチルガリウム,トリエチルガリウム,トリメチルイ
ンジウム,トリエチルインジウム,テトラメチル錫,テ
トラエチル錫,ターシャリーブチルホスフィン,トリメ
チルアルシン,トリエチルアルシン,ターシャリーブチ
ルアルシン等を、アルコキシド基を含むものとして、ジ
メトキシ亜鉛,トリブトキシガリウム,トリメトキシボ
ロン,トリエトキシボロン,テトラメトキシシラン,テ
トラエトキシシラン,テトラメトキシゲルマン,テトラ
エトキシゲルマン,テトラターシャリーブトキシ錫,ト
リメトキシホスフィン,トリエトキシホスフィン,トリ
メトキシアルシン,トリエトキシアルシン,テトラエト
キシセレン,テトラメトキシチタン,テトラエトキシチ
タン,テトライソプロポキシチタン,テトライソプロポ
キシジルコニウム,テトラターシャリーブトキシジルコ
ニウム,ペンタメトキシタンタル,ペンタエトキシタン
タル等をそれぞれ挙げることができる。
Further, as the organometallic compound, dimethylzinc, diethylzinc,
Trimethylaluminum, triethylaluminum, trimethylgallium, triethylgallium, trimethylindium, triethylindium, tetramethyltin, tetraethyltin, tertiarybutylphosphine, trimethylarsine, triethylarsine, tertiarybutylarsine, etc. as those containing an alkoxide group; Dimethoxyzinc, tributoxygallium, trimethoxyboron, triethoxyboron, tetramethoxysilane, tetraethoxysilane, tetramethoxygermane, tetraethoxygermane, tetratertiarybutoxytin, trimethoxyphosphine, triethoxyphosphine, trimethoxyarsine, trimethoxy Ethoxyarsine, tetraethoxyselenium, tetramethoxytitanium, tetraethoxytitanium, tetraiso Ropokishichitan, tetraisopropoxy zirconium, tetra-tertiary-butoxy zirconium, pentamethoxy tantalum, pentaethoxytantalum etc. can be mentioned, respectively.

【0013】[0013]

【作 用】水酸化銅除去剤は、排ガス中の有害成分を除
害化する際の処理量は大きいが、使用条件によっては、
金属酸化物除去剤に比べて有害成分の残存量が多くなる
ことがある。一方の金属酸化物除去剤は、有害成分を極
微量にまで除去処理することができるが、破過に至るま
での処理量は少ない。
[Action] The amount of copper hydroxide remover used to remove harmful components in exhaust gas is large, but depending on the use conditions,
The residual amount of the harmful component may be larger than that of the metal oxide remover. On the other hand, the metal oxide remover can remove harmful components to a very small amount, but the amount of treatment until breakthrough is small.

【0014】本発明の除害剤のように、水酸化銅除去剤
と金属酸化物除去剤とを含む除害剤に有害排ガスを接触
させると、それぞれを単独で用いた場合に比べて、排ガ
ス中の有害成分を効率よく除去することができる。通
常、2成分の除去剤を混合すると、両者の平均値が除去
能力のように思えるが、本発明の除害剤の場合は相乗効
果が生じ、水酸化銅除去剤又は金属酸化物除去剤をそれ
ぞれ単独で用いるより処理量が増大する。
When the harmful exhaust gas is brought into contact with an abatement agent containing a copper hydroxide remover and a metal oxide remover as in the abatement agent of the present invention, the harmful exhaust gas is compared with the case where each is used alone. The harmful components therein can be efficiently removed. Normally, when two components of the remover are mixed, the average value of the two appears to be the removal ability, but in the case of the abatement agent of the present invention, a synergistic effect occurs, and the copper hydroxide remover or the metal oxide remover is used. The processing amount increases as compared with the case of using each alone.

【0015】また、水酸化第二銅は、除去対象ガスと反
応すると、青色から黒色に変色するので、充填筒(カラ
ム)を透明な材料で作成するか、カラムに透明な窓を設
けておけば、反応の進行に伴って青色/黒色の破過前線
が上流側から下流側へと移動するのが観察できる。した
がって、特別な検知手段を用いずに水酸化銅除去剤の破
過を事前に知ることができ、除去剤(除害剤)を的確に
交換することができる。しかも、水酸化銅除去剤は、比
表面積が小さくても十分な処理能力を発揮できるため、
例えば、錠剤の形状にして用いることが可能であり、製
造も容易である。
When cupric hydroxide reacts with the gas to be removed, the color changes from blue to black. Therefore, the filling cylinder (column) is made of a transparent material or a transparent window is provided in the column. For example, it can be observed that the blue / black breakthrough front moves from the upstream side to the downstream side as the reaction proceeds. Therefore, the breakthrough of the copper hydroxide removing agent can be known in advance without using any special detecting means, and the removing agent (harmless agent) can be accurately replaced. Moreover, since the copper hydroxide remover can exhibit sufficient processing capacity even with a small specific surface area,
For example, it can be used in the form of a tablet, and production is easy.

【0016】[0016]

【実施例】以下、本発明の実施例及び比較例を説明す
る。
EXAMPLES Examples and comparative examples of the present invention will be described below.

【0017】まず、水酸化銅除去剤,金属酸化物除去剤
及び試験ガスとして下記のものを用意した。なお、成形
品とは、押出成型機によって、直径1.0mm、長さ5
mmのペレットに成型したものである。また、除去剤
(除害剤)の処理能力の測定は、除害処理後のガス中に
含まれる有害成分量が、下記の許容濃度に達した時を除
去剤の使用限度とし、使用限度に到達するまでの試験ガ
スの導入量から、除去剤1Kgあたりの有害成分ガス処
理量を算出することにより行った。
First, the following were prepared as a copper hydroxide remover, a metal oxide remover, and a test gas. In addition, a molded product is a diameter of 1.0 mm and a length of 5 mm by an extrusion molding machine.
It was molded into a pellet of mm. In addition, the measurement of the treatment capacity of the remover (harmless agent) is based on the limit of use of the remover when the amount of harmful components contained in the gas after the removal reaches the following allowable concentration. The amount of the harmful component gas to be processed per 1 kg of the removing agent was calculated from the amount of the test gas introduced until the test gas was reached.

【0018】水酸化銅除去剤 A:市販の結晶性水酸化第二銅粉末(関東化学製)の成
型品 B:1モル/リットルの硫酸銅溶液と、1モル/リット
ルの水酸化ナトリウム溶液とを混合して得た沈澱物(結
晶性水酸化第二銅)を乾燥した後の成型品 金属酸化物除去剤 a:市販の酸化第二銅粉末(関東化学製)の成型品 b:硝酸銅,硝酸アルミニウム,炭酸ナトリウムの3種
の水溶液を混合して得られた沈澱物を焼成することによ
って、酸化第二銅をアルミナに担持させたもの(酸化第
二銅の量は全重量の約30%) c:市販の酸化銀(関東化学製)の成型品 d:市販の二酸化マンガン(関東化学製)の成型品 試験ガス 有害成分 許容濃度 シラン 5ppm アルシン 0.05ppm ホスフィン 0.3ppm ターシャリーブチルアルシン(TBA) 0.025ppm (TBAの許容濃度は含有するヒ素の許容濃度からの換算値である。) 濃度及び流量 G1 :窒素ベースで有害成分ガス濃度1%、流量1リッ
トル/分 G2 :窒素ベースで有害成分ガス濃度5%、流量5リッ
トル/分
Copper hydroxide remover A: molded product of commercially available crystalline cupric hydroxide powder (manufactured by Kanto Kagaku) B: 1 mol / l copper sulfate solution and 1 mol / l sodium hydroxide solution A molded product after drying a precipitate (crystalline cupric hydroxide) obtained by mixing the above. Metal oxide remover a: A molded product of commercially available cupric oxide powder (manufactured by Kanto Chemical) b: Copper nitrate , Aluminum nitrate, and sodium carbonate are mixed to obtain a precipitate obtained by calcining a precipitate obtained by calcining the precipitate, whereby cupric oxide is supported on alumina (the amount of cupric oxide is about 30 wt. %) C: molded product of commercially available silver oxide (manufactured by Kanto Kagaku) d: molded product of commercially available manganese dioxide (manufactured by Kanto Kagaku) Test gas harmful component Permissible concentration Silane 5 ppm Arsine 0.05 ppm Phosphine 0.3 ppm Tertiary butylarsine (T A) allowable concentration of 0.025 ppm (TBA is converted value from the allowable concentration of arsenic containing) concentration and flow rate G 1:. Nitrogen Base hazardous component gas concentration of 1%, a flow rate 1 liter / min G 2: Nitrogen Hazardous component gas concentration 5% at base, flow rate 5 liter / min

【0019】比較例1 上記水酸化銅除去剤A,B及び金属酸化物除去剤a,b
を、それぞれ単独で用いた場合のシランの処理能力を測
定した。なお、各除去剤は、内径43mmのカラム内に
充填層長300mmに充填した。その結果を表1に示
す。
Comparative Example 1 The above copper hydroxide removers A and B and the metal oxide removers a and b
Was used alone, and the silane treatment capacity was measured. In addition, each remover was packed into a column having an inner diameter of 43 mm to a packed layer length of 300 mm. Table 1 shows the results.

【0020】実施例1 水酸化銅除去剤Aと金属酸化物除去剤bとを容積比で
5:1で混合した除害剤を、比較例1と同様に内径43
mmのカラム内に充填層長300mmに充填し、シラン
の処理能力を測定した。その結果を表1に示す。
Example 1 An abatement agent obtained by mixing a copper hydroxide remover A and a metal oxide remover b at a volume ratio of 5: 1 was used in the same manner as in Comparative Example 1 to obtain an inner diameter of 43%.
The column was packed with a packed bed length of 300 mm in a column of mm, and the silane treatment capacity was measured. Table 1 shows the results.

【0021】[0021]

【表1】 [Table 1]

【0022】上記表1において、処理能力は、使用した
除去剤(水酸化第二銅及び/又は酸化銅)の量に対する
値であり、括弧内は使用した全除去剤量(アルミナ担体
や脱水剤を含む全重量)当たりの値である。
In Table 1 above, the processing capacity is a value relative to the amount of the removing agent (cupric hydroxide and / or copper oxide) used, and the amount in parentheses is the total amount of the removing agent used (alumina carrier or dehydrating agent). Per weight).

【0023】表1に示したように、酸化銅からなる除去
剤a,bに比べて、水酸化銅からなる除去剤A、Bは、
単独で使用してもシランの処理能力は著しく大きい。そ
して、水酸化銅除去剤Aに金属酸化物除去剤bを混合し
た除害剤は、試験ガスG1 のように、シラン濃度が低く
流量の小さい場合には、両者を混合した効果はあまり認
められないが、試験ガスG2 のように、濃度が高く流量
が多い場合には、処理能力が向上することが判る。括弧
内の全除去剤の量に対する値でも優れていることから、
両者を混合することによって、除去剤の全充填量を低減
して装置の縮小又は除害筒の寿命の延長を図ることがで
きる。
As shown in Table 1, the removers A and B made of copper hydroxide are more abundant than the removers a and b made of copper oxide.
Even when used alone, the processing capacity of silane is remarkably large. The detoxifying agent obtained by mixing a metal oxide removing agent b hydroxide copper removal agent A, as test gas G 1, when the silane concentration is small low flow rate, the effect of mixing the two is less recognized Never, but as the test gas G 2, when the concentration is high flow rate is large, it can be seen that the processing performance is improved. Because the value for the amount of all removers in parentheses is also excellent,
By mixing both of them, the total amount of the removing agent can be reduced to reduce the size of the apparatus or extend the life of the abatement cylinder.

【0024】[0024]

【発明の効果】以上説明したように、本発明によれば、
有害成分を含む排ガス、特に半導体製造工場から排出さ
れるアルシン,ホスフイン,シラン,ジクロルシラン,
ターシャリーブチルアルシン等の有害成分を含む有害排
ガスを効率よく除害することができる。
As described above, according to the present invention,
Exhaust gas containing harmful components, especially arsine, phosphine, silane, dichlorosilane, emitted from semiconductor manufacturing plants,
Harmful exhaust gas containing harmful components such as tertiary butyl arsine can be efficiently removed.

フロントページの続き (72)発明者 遠藤 文誉 山梨県北巨摩郡高根町下黒沢3054−3 日本酸素株式会社内 (56)参考文献 特開 平3−12219(JP,A) (58)調査した分野(Int.Cl.7,DB名) B01J 20/00 - 20/34 Continuation of the front page (72) Inventor Fumihisa Endo 3054-3 Shimokurosawa, Takane-cho, Kita-Koma District, Yamanashi Prefecture Inside Nippon Sanso Corporation (56) References JP-A-3-12219 (JP, A) (58) Fields investigated ( Int.Cl. 7 , DB name) B01J 20/00-20/34

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 結晶性水酸化第二銅と、金属酸化物とを
含むことを特徴とする有害排ガスの除害剤。
1. A harmful exhaust gas abatement agent comprising crystalline cupric hydroxide and a metal oxide.
JP32219998A 1993-12-22 1998-11-12 Harmful exhaust gas abatement agent Expired - Fee Related JP3227601B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP32219998A JP3227601B2 (en) 1993-12-22 1998-11-12 Harmful exhaust gas abatement agent

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP32219998A JP3227601B2 (en) 1993-12-22 1998-11-12 Harmful exhaust gas abatement agent

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP5324408A Division JP2972975B2 (en) 1993-03-17 1993-12-22 Hazardous exhaust gas abatement method and abatement agent

Publications (2)

Publication Number Publication Date
JPH11226390A JPH11226390A (en) 1999-08-24
JP3227601B2 true JP3227601B2 (en) 2001-11-12

Family

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Country Link
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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7107686B2 (en) 2003-02-06 2006-09-19 Buck Knives, Inc. Spring assist knife
US8001693B2 (en) 2005-06-03 2011-08-23 Onion Kenneth J Closable knife with opening mechanism
US8161653B2 (en) 2007-11-12 2012-04-24 Leatherman Tool Group, Inc. Folding tool having a rotatable locking mechanism

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6805728B2 (en) * 2002-12-09 2004-10-19 Advanced Technology Materials, Inc. Method and apparatus for the abatement of toxic gas components from a semiconductor manufacturing process effluent stream

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7107686B2 (en) 2003-02-06 2006-09-19 Buck Knives, Inc. Spring assist knife
US7313866B2 (en) 2003-02-06 2008-01-01 Buck Knives, Inc. Spring assist knife
US8001693B2 (en) 2005-06-03 2011-08-23 Onion Kenneth J Closable knife with opening mechanism
US8161653B2 (en) 2007-11-12 2012-04-24 Leatherman Tool Group, Inc. Folding tool having a rotatable locking mechanism

Also Published As

Publication number Publication date
JPH11226390A (en) 1999-08-24

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