JP3244299B2 - Hydrophilic chemisorption monomolecular film and method for producing the same - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a hydrophilic chemisorption monomolecular film and a method for producing the same. More specifically, the present invention relates to a hydrophilic chemisorption monomolecular film characterized in that a hydrophilic functional group is fixed to a molecule chemically adsorbed by a chemical bond, and a method for producing the same.

[0002]

2. Description of the Related Art The imparting of hydrophilicity to the surface of a hydrophobic substance is required in various fields. For example, plastic, fiber,
Some materials such as ceramics are required to have a hydrophilic surface. Taking synthetic fibers as an example, if the surface of synthetic fibers such as polyester and polyolefin can be made hydrophilic, for example, clothing applications such as underwear,
It is expected to further expand to industrial applications such as wipers. It is an industrially important problem to provide a versatile molecular construction technology as a method for producing a chemically adsorbed film having desired hydrophilicity.

Conventionally, plasma treatment and the like have been known as means for making surfaces of materials such as plastics, fibers and ceramics hydrophilic.

[0004] As another means, a method of manufacturing a specific chemisorption film by incorporating a functional group having a specific function into a chemisorption reagent itself in advance and performing chemisorption is disclosed in Ogawa (USP). No. 4,673,474).

[0005]

However, there is a problem that the plasma treatment cannot always provide satisfactory hydrophilicity and the process is complicated. Also, according to the Ogawa method, it is difficult to incorporate a hydrophilic group into the chemical adsorption reagent itself in advance, and the production of a chemically adsorbed film having desired hydrophilicity has been greatly restricted. Therefore, this method has a problem that its versatility is poor.

An object of the present invention is to provide a chemisorbed monomolecular film incorporating a hydrophilic group and a method for producing the same, in order to solve the above-mentioned problems of the prior art.

[0007]

Means for Solving the Problems To achieve the above object, the hydrophilic chemisorption monomolecular film of the present invention is a chemisorption film chemically bonded to the surface of a base material through a siloxane bond. Thus , hydrophilic -CN, -NH
-, - characterized in that it comprises at least one functional group selected from NO ₂ and -SCN group.

Next, the method for producing a hydrophilic chemisorption monomolecular film of the present invention comprises a chlorosilyl group at a linear molecular terminal,
A bromo group, an iodine group, a cyano group, a thiocyano group, a chlorosilyl group, and a chemisorbed substance containing at least one group selected from functional groups containing an ester bond at another end thereof.
A chemisorption solution is prepared by dissolving in a non-aqueous solvent, the chemisorption solution is brought into contact with a hydrophilic base material, and a hydroxyl group on the base material surface is reacted with a chlorosilyl group of the chemisorption substance to form a chemisorption molecule. The step of adsorbing on the substrate surface, a bromo group at the other end of the chemisorption substance, an iodine group, a cyano group,
At least one group selected from a thiocyano group, a chlorosilyl group, and a functional group containing an ester bond is chemically reacted or another group is added to form a hydrophilic -C on the outermost surface.
N, -NH -, - characterized in that it comprises a step of forming at least one functional group selected from NO ₂ and -SCN group.

In the above method, a substance containing a chlorosilyl group at a molecular terminal may be A- (B) ₁ -SiX _q Cl _3-q (where A is a bromo group, an iodo group, a cyano group, a thiocyano group, a chlorosilyl group) Or a functional group containing an ester bond, q is 0 or 1 or 2, l is an integer in the range of 1 to 30, and B is an organic group.

In the above method, the substance containing a chlorosilyl group at a molecular terminal may be A- (CH ₂ ) _m —SiCl ₃ or a compound represented by the following formula:

[0011]

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(Where A is a bromo group, an iodo group, a cyano group, a thiocyano group, a chlorosilyl group, or a functional group containing an ester bond, and m and n are integers in the range of 1 to 30).

[0013]

According to the structure of the present invention, since a hydrophilic group can be formed through a chemically adsorbed molecule, a specific hydrophilic group is previously incorporated into the reagent itself as a chemical adsorption reagent. It is not necessary to set it, and a chemically adsorbed monomolecular film having any hydrophilicity can be produced relatively freely. That is, first, a chemisorption film can be prepared, and then a hydrophilic group can be provided on the surface of the chemisorption film. In addition, since the hydrophilic chemisorption monomolecular film of the present invention is a thin film at the nanometer or angstrom level, it does not impair the shape, appearance, gloss and the like of the substrate surface. Further, since the hydrophilic chemisorption monomolecular film of the present invention is chemically bonded to the surface of the base material by a siloxane bond, it is difficult to peel off and can have excellent durability.

Next, according to the structure of the manufacturing method of the present invention, the hydrophilic chemical adsorption film can be efficiently and rationally manufactured.

[0015]

EXAMPLES In order to prepare a chemically adsorbed monomolecular film having hydrophilicity according to the present invention, -CN and -NH are used as hydrophilic groups.
-, - there is a method of introducing a NO ₂ or -SCN group, it will be described in order below. In addition, -OH, -COOH,-
^{_{NH2, -N + R 3 X- (}} X represents a halogen atom), - S
How to introduce H or —SO ₃ H group etc.
This is described as a reference example for the purpose.

Example 1 (Introduction of -CN Group) First, a hydrophilic substrate 11 (for example, a glass substrate) was prepared (FIG. 1 (a)), washed with an organic solvent, and then washed with a cyano group and a chlorosilyl group. A non-aqueous solvent mixed with a substance containing, for example, NC (CH ₂ ) ₇ SiCl ₃ , which is dissolved at a concentration of about 1 wt%, and 80 wt% of n-hexadecane (toluene, xylene, dicyclohexyl); 12wt
% Carbon tetrachloride, 8 wt% chloroform solution was prepared, and the substrate was immersed for about 2 hours.
2, the chlorosilyl (SiCl) group of the substance containing a cyano group and the hydroxyl group react with each other to cause a dehydrochlorination reaction, and the following bond shown below is formed over the entire surface of the substrate. A hydrophilic monomolecular film 13 containing a cyano group (FIG. 1 (b)) can be formed to a thickness of about 15 angstroms (1.5 nm) in a state chemically bonded to the surface of the substrate. Was.

[0017]

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Since the monomolecular film is very strongly chemically bonded, it did not peel off.

Example 2 (Introduction of -SCN group) First, a hydrophilic substrate 21 was prepared (FIG. 2A), washed with an organic solvent, and mixed with a substance containing a thiocyano group and a chlorosilane group. Non-aqueous solvents such as NCS (C
Using H ₂ ) ₇ SiCl ₃ , a solution of n-hexadecane (may be toluene, xylene, dicyclohexyl), 12 wt% of carbon tetrachloride and 8 wt% of chloroform dissolved at a concentration of about 2 wt% was prepared. When the substrate is immersed for about 5 hours, since the surface of the substrate contains many hydroxyl groups, the SiCl groups of the substance containing a thiocyano group and a chlorosilyl group react with the hydroxyl groups to cause a dehydrochlorination reaction and the entire surface of the substrate surface The following chemical formula (3) is generated, and a hydrophilic monomolecular film 22 containing a thiocyano group can be formed with a thickness of about 15 angstroms in a state chemically bonded to the surface of the base material (FIG. 2 (b)).

[0020]

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Since the monomolecular film is very strongly chemically bonded, it did not peel off.

Reference Example 1 (Introduction of -OH group) First, a hydrophilic substrate 31 was prepared (FIG. 3A), washed with an organic solvent, and then ester-bonded (R-CO-OCH _2).
-(R is a functional group)) and a non-aqueous solvent mixed with a substance containing a chlorosilyl group, for example, CH ₃ OOC (CH ₂ ) ₇ S
80 wt% dissolved at a concentration of about 2 wt% using iCl ₃
When a solution of n-hexadecane (may be toluene, xylene, or dicyclohexyl), 12 wt% carbon tetrachloride, and 8 wt% chloroform is prepared, and the base material is immersed for about 5 hours,
Since a large number of hydroxyl groups are contained on the surface of the base material, the SiCl groups of the substance containing an ester bond and a chlorosilyl group react with the hydroxyl groups to cause a dehydrochlorination reaction. Is formed, and a monomolecular film 32 containing an ester bond can be formed to a thickness of about 15 angstroms in a state chemically bonded to the surface of the base material (FIG. 3).
(B)).

[0023]

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Next, this substrate is reacted in an ether solution containing several percent of lithium aluminum hydride (LiAlH ₄ ) at room temperature for 20 minutes to convert it into a hydrophilic hydroxyl group at the terminal, and represented by the following chemical formula. A monomolecular film 33 to be formed was formed (FIG. 3C).

[0025]

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Since the monomolecular film 33 is also very strongly chemically bonded to the substrate, it did not peel off.

Further, when the base material is immersed in a hexane solution in which about 5% by weight of an alkali metal organic compound, for example, Li (CH ₂ ) ₃ CH ₃ (or NaOCH ₃ may be dissolved), the following chemical formula is obtained. Thus, a film 34 having extremely high hydrophilicity was formed (FIG. 3D).

[0028]

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Reference Example 2 (Introduction of -COOH group) First, a hydrophilic substrate 41 was prepared (FIG. 4A), washed with an organic solvent, and then ester-bonded (R-CO-OCH _2).
-(R is a functional group)) and a non-aqueous solvent mixed with a substance containing a chlorosilyl group, for example, CH ₃ OOC (CH ₂ ) ₁₀ S
80 wt% dissolved at a concentration of about 2 wt% using iCl ₃
When a solution of n-hexadecane (may be toluene, xylene, or dicyclohexyl), 12 wt% carbon tetrachloride, and 8 wt% chloroform is prepared, and the base material is immersed for about 5 hours,
Since a large number of hydroxyl groups are contained on the surface of the substrate, the SiCl groups of the substance containing an ester bond and a chlorosilyl group react with the hydroxyl groups to cause a dehydrochlorination reaction. 4) was formed, and a monomolecular film 42 containing an ester bond was formed to a thickness of about 20 angstroms in a state chemically bonded to the surface of the base material (FIG. 4).
(B)).

[0030]

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Next, this base material was treated with hydrochloric acid (HCl) at 36 wt.
% Solution at 65 ° C. for 30 minutes to form a hydrophilic carboxyl group at the terminal. The monomolecular film thus obtained is shown in the following (Chem. 8).

[0032]

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The monomolecular film 43 (FIG. 4 (c)) was also very strongly chemically bonded to the substrate, so that it did not peel off at all.

Further, an alkali metal (for example, L
i, Na, K, Rb, Cs, Fr) or an alkaline earth metal (eg, Be, Mg, Ca, Sr, Ba, Ra)
Or other metals (Al, Ti, V, Cr, Mn, Fe,
4A, 5A, 6A, 7A, 8, 1B, 2 of the long-periodic periodic table such as Co, Ni, Cu, Zn, Ga, Zr, and Ln
B, 3B), for example, NaOH (Ca (OH) ₂
When the base material was immersed in an aqueous solution in which about 1% by weight was dissolved, an extremely hydrophilic film 44 (FIG. 4D) represented by the following formula (Formula 9) could be formed.

[0035]

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Reference Example 3 (Introduction of -NH ₂ group) First, a hydrophilic substrate 51 was prepared (FIG. 5A), washed with an organic solvent, and mixed with a substance containing a cyano group and a chlorosilyl group. Non-aqueous solvents such as NC (CH ₂ ) ₁₇
80 wt% dissolved at a concentration of about 1 wt% using SiCl ₃
% N-hexadecane (toluene, xylene, dicyclohexyl), 12 wt% carbon tetrachloride, 8 wt% chloroform solution is prepared, and the base material is immersed for about 2 hours. Therefore, the SiCl group of the substance containing a cyano group and the hydroxyl group react with each other to cause a dehydrochlorination reaction, and the entire surface of the substrate is represented by the following formula (Chemical Formula 1)
0) was generated, and a monomolecular film 52 containing a cyano group was formed in a state chemically bonded to the surface of the base material (FIG. 5).
(B)).

[0037]

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Next, the substrate is immersed in ether (10 mg / ml) in which lithium aluminum hydride is dissolved, and reacted overnight. Thereafter, the solution is taken out of the solution, and ether is added, followed by 10 wt% hydrochloric acid in the same volume as the ether. Then, further put in a triethylamine solution,
After performing the reaction for a time, the resultant was washed with a chloroform solution to obtain a highly hydrophilic monomolecular film having a thickness of about 25 angstroms represented by the following formula.

[0039]

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The monomolecular film 53 (FIG. 5 (c)) was also very strongly chemically bonded to the substrate, so that it did not peel off.

Alternatively, the following are examples of the introduction of other -NH ₂ groups.

First, a hydrophilic substrate is prepared, washed with an organic solvent, and then mixed with a substance containing a bromo group or an iodo group and a chlorosilyl group, for example, a non-aqueous solvent such as Br (C
H ₂ ) ₁₇ SiCl ₃ , 80 wt% n-hexadecane (toluene, xylene, dicyclohexyl may be used) dissolved at a concentration of about 1 wt%, 12 wt% carbon tetrachloride, 8 wt%
When a chloroform solution is prepared and the substrate is immersed for about 2 hours, since a large number of hydroxyl groups are contained on the surface of the substrate, the SiCl groups of the substance containing a bromo group react with the hydroxyl groups to cause a dehydrochlorination reaction. The following formula (Formula 1) is applied over the entire surface of the base material.
The bond of 2) was generated, and a monomolecular film containing a bromo group could be formed in a state chemically bonded to the surface of the substrate.

[0043]

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Next, sodium amide dissolved N, N
-Base material 5 in dimethylformamide solution (8 mg / ml)
1 and the reaction was carried out overnight to obtain a monomolecular film represented by the following formula (Formula 13).

[0045]

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Further, the substrate was immersed in ether (10 mg / ml) in which lithium aluminum hydride was dissolved, allowed to react overnight, taken out, put into an empty container, and then put ether, and then 10% of the same volume as ether. Of hydrochloric acid. Thereafter, the resultant was placed in a triethylamine solution and reacted for 2 hours, and then washed with a chloroform solution to obtain a monomolecular film represented by the following formula (Formula 14).

[0047]

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Since this monomolecular film was also very strongly chemically bonded to the substrate, it did not peel off at all.

Example 3 (Introduction of -NH- group) First, a hydrophilic substrate 61 was prepared (FIG. 6 (a)), washed with an organic solvent, and then a chlorosilane group was applied to one end and another was applied to the other end. A non-aqueous solvent mixed with a substance containing a chlorosilyl group,
For example, using ClSi (CH ₃ ) ₂ (CH ₂ ) ₁₀ SiCl ₃ , 80 wt% n-hexadecane (toluene, xylene, dicyclohexyl may be used) dissolved at a concentration of about 2 wt%, 12 wt% carbon tetrachloride, 8 wt% chloroform After adjusting the solution and immersing the base material for about 5 hours, since the surface of the base material contains a large number of hydroxyl groups, one end of a substance containing a chlorosilyl group at one end and a chlorosilyl group at the other end. The SiCl group reacts with the hydroxyl group to cause a dehydrochlorination reaction, and a bond represented by the following formula (Formula 15) is generated over the entire surface of the substrate,
A monomolecular film 62 containing a chlorosilyl group (FIG. 6B was formed in a state of being chemically bonded to the surface of the base material).

[0050]

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Then, the base material is immersed in a chloroform solution of 10 wt% CH ₃ NH ₂ to cause a dehydrochlorination reaction, and then washed with chloroform to obtain a hydrophilic monomolecular film 63 represented by the following formula (Formula 16). Was obtained (FIG. 6 (c)).

[0052]

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Since the monomolecular film is very strongly chemically bonded, it did not peel off at all.

Reference Example 4 (Introduction of -N + R ₃ X-group (X represents a halogen atom)) First, a hydrophilic substrate 71 was prepared (FIG. 7A) and washed with an organic solvent. Later, a non-aqueous solvent mixed with a substance containing a chlorosilyl group at one end and a chlorosilyl group at the other end,
For example, using ClSi (CH ₃ ) ₂ (CH ₂ ) ₁₀ SiCl ₃ , 80 wt% n-hexadecane (toluene, xylene, dicyclohexyl may be used) dissolved at a concentration of about 2 wt%, 12 wt% carbon tetrachloride, 8 wt% chloroform After adjusting the solution and immersing the base material for about 5 hours, since the surface of the base material contains a large number of hydroxyl groups, the SiCl group at one end of a substance containing a chlorosilyl group at one end and a chlorosilyl group at the other end. Reacts with the hydroxyl group to cause a dehydrochlorination reaction, and a bond represented by the following formula (Formula 17) is formed over the entire surface of the base material;
A monomolecular film 72 containing a chlorosilyl group was formed in a state chemically bonded to the surface of the base material (FIG. 7B).

[0055]

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Therefore, 10 wt% (CH ₃ ) ₂ NC ₂ H ₄ OH
The substrate was immersed in a chloroform solution to cause a dehydrochlorination reaction, and then washed with chloroform to obtain a monomolecular film 73 represented by the following formula (Chem. 18) (FIG. 7C).

[0057]

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Then, when immersed in a chloroform solution in which CH ₃ I containing iodine as a halogen atom is dissolved and refluxed for 2 hours, a quaternary anion represented by the following formula (Formula 19) is obtained .
An extremely hydrophilic monomolecular film 74 having a group consisting of a monium salt on the surface was obtained (FIG. 7D).

[0059]

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Example 4 (Introduction of -NO ₂ group) First, a hydrophilic base material 81 was prepared (FIG. 8A), washed with an organic solvent, and then contained a bromo or iodo group and a chlorosilyl group-containing substance. A non-aqueous solvent such as B
Using r (CH ₂ ) ₁₀ SiCl ₃ , a solution of 80 wt% n-hexadecane (toluene, xylene, dicyclohexyl), 12 wt% carbon tetrachloride and 8 wt% chloroform dissolved at a concentration of about 2 wt% was prepared. When the material is immersed for about 5 hours, since many hydroxyl groups are contained on the surface of the base material, the SiCl group of the substance containing a bromo group reacts with the hydroxyl groups to cause a dehydrochlorination reaction. The bond represented by the formula (Formula 20) was generated, and a monomolecular film 82 containing a bromo group was formed with a thickness of about 25 Å in a state of being chemically bonded to the surface of the base material (FIG. 8B).

[0061]

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Next, this substrate was reacted in an alkaline aqueous solution containing 5 wt% AgNO ₃ at 80 ° C. for 2 hours to obtain a hydrophilic monomolecular film 83 represented by the following formula (Formula 21) (FIG. 8).
(C)) was obtained.

[0063]

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Since this monomolecular film was also very strongly chemically bonded to the substrate, it did not peel off.

Reference Example 5 (Introduction of -SH Group) First, a hydrophilic substrate 91 was prepared (FIG. 9 (a)), washed with an organic solvent, and containing a thiocyano group (-SCN) and a chlorosilyl group. Non-aqueous solvent mixed with the substance, for example,
Using NCS (CH ₂ ) ₁₀ SiCl ₃ , a solution of 80% n-hexadecane (toluene, xylene, dicyclohexyl), 12 wt% carbon tetrachloride and 8 wt% chloroform dissolved at a concentration of about 2 wt% was prepared. When the material is immersed for about 5 hours, a large number of hydroxyl groups are contained on the surface of the base material, so that the SiCl groups of the substance containing a thiocyano group and a chlorosilyl group react with the hydroxyl groups to cause a dehydrochlorination reaction, thereby causing the entire surface of the base material surface to be dehydrochlorinated. Along with this, a bond represented by the following formula (Formula 22) was generated, and a monomolecular film 92 containing a thiocyano group could be formed with a thickness of about 15 Å in a state chemically bonded to the surface of the substrate (FIG. 9B). ).

[0066]

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Next, the base material was put into ether (10 mg / ml) in which lithium aluminum hydride was dissolved,
After reacting for 4 hours, a hydrophilic monomolecular film 93 (FIG. 9C) represented by the following formula (Formula 23) was obtained.

[0068]

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REFERENCE EXAMPLE 6 (Introduction of -SO ₃ H group) The monomolecular film 93 (FIG. 9C) shown in (Chemical Formula 23) obtained in Reference Example 5 was prepared by adding 10 wt% hydrogen peroxide solution and 10 wt% % Acetic acid in a mixed solution of 1: 5 by volume,
When the reaction was carried out at 0 ° C. for 30 minutes, a highly hydrophilic monomolecular film 94 (FIG. 9D) represented by the following formula (Formula 24) was obtained.

[0070]

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Further, an alkali metal (for example, L
i, Na, K, Rb, Cs, Fr) or an alkaline earth metal (eg, Be, Mg, Ca, Sr, Ba, Ra)
Or other metals (Al, Ti, V, Cr, Mn, Fe,
4A, 5A, 6A, 7A, 8, 1B, 2 of the long-periodic periodic table such as Co, Ni, Cu, Zn, Ga, Zr, and Ln
B, 3B), for example, NaOH (Ca (OH) ₂
When the base material was immersed in an aqueous solution in which about 2 wt% was dissolved, an extremely hydrophilic film 95 represented by the following formula (Formula 25) could be formed (FIG. 9E).

[0072]

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[0073]

As described above, according to the method of the present invention, since the hydrophilic functional group is immobilized on the surface of the substrate by chemical bonding via the chemically adsorbed molecule, the reagent for chemical adsorption is used. Thus, there is no need to previously incorporate a specific hydrophilic group into the reagent itself, and there is an effect that a chemically adsorbed monomolecular film having an arbitrary hydrophilicity can be produced relatively freely. In addition, since the hydrophilic chemisorption monomolecular film of the present invention is a thin film at the nanometer or angstrom level, it does not impair the shape, appearance, gloss, etc. of the substrate surface. In addition, since the hydrophilic chemisorption monomolecular film of the present invention is chemically bonded to the surface of the base material by a siloxane bond,
It is hard to peel off and can be excellent in durability.

Next, according to the structure of the manufacturing method of the present invention, the hydrophilic chemical adsorption film can be efficiently and rationally manufactured.

[Brief description of the drawings]

FIG. 1 is a process cross-sectional view in which a substrate surface is enlarged to a molecular level in order to explain a manufacturing process of a hydrophilic monomolecular thin film of Example 1 of the present invention.

FIG. 2 is a process cross-sectional view in which a substrate surface is enlarged to a molecular level in order to explain a manufacturing process of a hydrophilic monomolecular thin film of Example 2 of the present invention.

FIG. 3 is a process cross-sectional view in which a substrate surface is enlarged to a molecular level in order to explain a manufacturing process of a hydrophilic monomolecular thin film of Reference Example 1 .

FIG. 4 is a process cross-sectional view in which a substrate surface is enlarged to a molecular level in order to explain a manufacturing process of a hydrophilic monomolecular thin film of Reference Example 2 .

FIG. 5 is a process cross-sectional view in which a substrate surface is enlarged to a molecular level in order to explain a manufacturing process of a hydrophilic monomolecular thin film of Reference Example 3 .

FIG. 6 is a process cross-sectional view in which a substrate surface is enlarged to a molecular level in order to explain a manufacturing process of a hydrophilic monomolecular thin film of Example 3 of the present invention.

FIG. 7 is a process cross-sectional view in which the surface of a base material is enlarged to a molecular level in order to explain a manufacturing process of a hydrophilic monomolecular thin film of Reference Example 4 .

FIG. 8 is a process cross-sectional view in which a substrate surface is enlarged to a molecular level in order to explain a manufacturing process of a hydrophilic monomolecular thin film of Example 4 of the present invention.

FIG. 9 is a process cross-sectional view in which the surface of a base material is enlarged to a molecular level in order to explain a manufacturing process of the hydrophilic monomolecular thin films of Reference Examples 5 and 6 .

[Explanation of symbols]

11, 21, 31, 41, 51, 61, 71, 81, 9
DESCRIPTION OF SYMBOLS 1 ... Base material 12 ... Hydroxyl group 13, 22, 32, 33, 34, 42, 43, 44, 5
2, 53, 62, 63, 72, 73, 74, 82, 8
3, 92, 93, 94, 95 ... monomolecular film

──────────────────────────────────────────────────の Continued on the front page (51) Int.Cl. ⁷ Identification code FI C08J 7/04 C09K 3/00 R C09K 3/00 D06M 13/513 D06M 13/513 G02B 5/08 F G02B 5/08 1 / 10 (56) References JP-A-3-134818 (JP, A) JP-A-61-170645 (JP, A) JP-A-59-113177 (JP, A) JP-A-4-328701 (JP, A) Japanese Unexamined Patent Publication No. Hei 5-179026 (JP, A) Japanese Unexamined Patent Publication No. Hei 5-168920 (JP, A) Japanese Unexamined Patent Publication No. Sho 64-164675 (JP, A) (JP, A) JP-A-5-96679 (JP, A) JP-A-62-50657 (JP, A) JP-A-4-132637 (JP, A) JP-A-5-182637 (JP, A) United States Patent No. 4847160 (US, A) US Patent No. 459061 (US, A) French Patent Application No. 1459124 (FR, 1) (58) investigated the field (Int.Cl. ^7, DB name) G02B 1/10 B05D 1/18 B05D 5/00 B32B 27/18 C08J 7/04 D06M 13/513 G02B 5/08 C09K 3/00 C03C 17/30

Claims (4)

(57) [Claims] 1. A chemisorption film chemically bonded to a substrate surface via a siloxane bond, wherein a top surface of the chemisorption film is
Hydrophilic -CN to, -NH -, - NO ₂ and -SCN
A hydrophilic chemisorption monomolecular film comprising at least one functional group selected from groups. 2. A compound having a chlorosilyl group at a linear molecular terminal and at least one group selected from a functional group containing a bromo group, an iodo group, a cyano group, a thiocyano group, a chlorosilyl group, and an ester bond at the other end. The chemically adsorbed substance contained in is dissolved in a non-aqueous solvent to prepare a chemisorbed solution, and the chemisorbed liquid is brought into contact with a hydrophilic substrate to form a hydroxyl group on the substrate surface and a chlorosilyl group of the chemically adsorbed substance. Reacting and adsorbing the chemisorbed molecules on the surface of the base material, and a functional group containing a bromo group, an iodo group, a cyano group, a thiocyano group, a chlorosilyl group, and an ester bond at the other end of the chemisorption substance. At least one group is chemically reacted or another group is added to make the outermost surface hydrophilic-
CN, -NH -, - NO _2, and a manufacturing method of a hydrophilic chemically adsorbed monomolecular film, which -SCN and a step of forming at least one functional group selected from the group. 3. A substance containing a chlorosilyl group at a molecular terminal, A- (B) ₁ -SiX _q Cl _3-q (where A is a bromo group, an iodo group, a cyano group, a thiocyano group, a chlorosilyl group, or an ester) The method for producing a hydrophilic chemisorption monomolecular film according to claim 2, wherein a functional group containing a bond, q is 0 or 1 or 2, l is an integer in the range of 1 to 30, and B is an organic group). 4. A substance containing a chlorosilyl group at a molecular terminal, A- (CH ₂ ) _m —SiCl ₃ (where A is a bromo group, an iodo group, a cyano group, a thiocyano group, a chlorosilyl group, or an ester bond) The method for producing a hydrophilic chemisorption monomolecular film according to claim 3, wherein a functional group ( m is an integer in the range of 1 to 30) is used.