JP3251785B2 - Printed wiring board, manufacturing method of printed wiring board - Google Patents
Printed wiring board, manufacturing method of printed wiring boardInfo
- Publication number
- JP3251785B2 JP3251785B2 JP21395694A JP21395694A JP3251785B2 JP 3251785 B2 JP3251785 B2 JP 3251785B2 JP 21395694 A JP21395694 A JP 21395694A JP 21395694 A JP21395694 A JP 21395694A JP 3251785 B2 JP3251785 B2 JP 3251785B2
- Authority
- JP
- Japan
- Prior art keywords
- copper foil
- wiring board
- printed wiring
- layer
- oxide layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Parts Printed On Printed Circuit Boards (AREA)
- Production Of Multi-Layered Print Wiring Board (AREA)
- Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
Description
【0001】[0001]
【産業上の利用分野】本発明は印刷配線板および印刷配
線板の製造方法に係り、特に層間接続部を備えた構成に
適した印刷配線板および印刷配線板の製造方法に関す
る。The present invention relates relates to a method of manufacturing a printed wiring board contact and the printed circuit board, method of manufacturing a printed wiring board contact and the printed circuit board relates particularly suitable configuration with an interlayer connection portion.
【0002】[0002]
【従来の技術】多層型印刷配線板においては、配線パタ
ーン層間の電気的な接続を、次のような手段で行ってい
る。すなわち、絶縁性基板の両面に張られた銅箔を、そ
れぞれ配線パターニングした後、その配線パターニング
面上に絶縁シート(たとえばプリプレグ層)を介して銅
箔を積層,配置し、加熱加圧により一体化する。なお、
印刷配線板の製造に当たっては、絶縁性素材、たとえば
樹脂系プリプレグ層に対する接着性を考慮して、一般的
に、少なくとも一方の主面に粗化処理(黒化処理など)
ないし酸化層形成処理を施した銅箔が使用されている。2. Description of the Related Art In a multilayer printed wiring board, electrical connection between wiring pattern layers is made by the following means. That is, after the copper foil stretched on both sides of the insulating substrate is subjected to wiring patterning, the copper foil is laminated and arranged on the wiring patterning surface via an insulating sheet (for example, a prepreg layer), and integrated by heating and pressing. Become In addition,
In manufacturing a printed wiring board, at least one principal surface is generally subjected to a roughening treatment (a blackening treatment, etc.) in consideration of adhesiveness to an insulating material, for example, a resin-based prepreg layer.
Further, a copper foil subjected to an oxide layer forming treatment is used.
【0003】次いで、前記積層体に、たとえばドリルな
どで孔明け加工を施した後、化学メッキ法で孔の内壁面
を金属層化し、さらに電気メッキで厚付けして、内層配
線パターンと外層配線パターンとの配線層間の電気的接
続を行う一方、表面銅箔についての配線パターニングを
行い多層型印刷配線板を得ている。なお、より配線層の
多い多層型印刷配線板の場合は、中間に介挿させる両面
型印刷配線板数を増加する方式で製造できる。[0003] Next, the laminated body is subjected to a drilling process using, for example, a drill or the like, and then the inner wall surface of the hole is metallized by a chemical plating method and further thickened by electroplating to form an inner layer wiring pattern and an outer layer wiring. While making electrical connection between the wiring layers with the pattern, wiring patterning is performed on the surface copper foil to obtain a multilayer printed wiring board. In the case of a multilayer printed wiring board having more wiring layers, it can be manufactured by a method of increasing the number of double-sided printed wiring boards interposed in the middle.
【0004】また、印刷配線板の配線密度を上げるた
め、いわゆるスルホール接続を省略して、電子部品実装
パッドの下で層間接続を行う方式も開発されている。た
とえば、両面銅箔張り基板に、ドリルなどで孔明け加工
を施し、孔内壁面を化学メッキ法により金属層化し、さ
らに電気メッキで厚付けして両面銅箔間の電気的接続を
行う。その後、前記孔に絶縁性樹脂を充填し、硬化後、
研磨により食み出した樹脂を取り除き・平坦面化してか
ら、再度全面に化学メッキ処理および電気メッキ処理を
施す。次いで、両面の導体層を配線パターニングするこ
とにより、部品実装パッドの下に、層間接続を形成した
構成の印刷配線板も知られている。In order to increase the wiring density of a printed wiring board, a system has been developed in which so-called through-hole connection is omitted and interlayer connection is performed under electronic component mounting pads. For example, a hole is formed on a double-sided copper foil-clad substrate with a drill or the like, and the inner wall surface of the hole is formed into a metal layer by a chemical plating method, and is further thickened by electroplating to perform electrical connection between the double-sided copper foils. After that, the hole is filled with an insulating resin, and after curing,
After the resin extruded by polishing is removed and flattened, the entire surface is again subjected to chemical plating and electroplating. Next, a printed wiring board having a configuration in which an interlayer connection is formed below a component mounting pad by patterning a wiring of conductor layers on both surfaces is also known.
【0005】さらに、前記層間接続の形成において、メ
ッキ法で導体層を形成する代わりに、ドリル加工による
孔内へ導電性組成物を充填し、硬化させて所要の層間接
続を行うことも試みられている。Further, in forming the interlayer connection, instead of forming a conductor layer by a plating method, it has been attempted to fill a conductive composition into a hole formed by drilling and cure the same to perform a required interlayer connection. ing.
【0006】[0006]
【発明が解決しようとする課題】上記説明した配線層間
の電気的な接続にメッキ法を利用する印刷配線板の製造
方法においては、次のような不都合な問題がある。すな
わち、従来の配線層間の接続方式においては、配線パタ
ーン(配線パターン化された銅箔)面を対接面とした場
合、接続の信頼性に問題が認められる。つまり、層間接
続部を形成する柱状の導体先端面が、配線パターンの黒
化層ないし酸化層面に対接する形態を採るため、前記層
間接続には界面抵抗のバラツキなどが生じ易く、印刷配
線板としての信頼性に問題が生じる。The above-described method of manufacturing a printed wiring board using a plating method for electrical connection between wiring layers has the following disadvantages. That is, in the conventional connection method between the wiring layers, when the wiring pattern (copper foil in which the wiring pattern is formed) is used as the contact surface, there is a problem in connection reliability. That is, since the columnar conductor tip surface forming the interlayer connection portion takes a form in contact with the blackened layer or the oxide layer surface of the wiring pattern, the interlayer connection is likely to have a variation in interface resistance and the like, and as a printed wiring board A problem in the reliability of
【0007】加えて、次ぎのような実用上の問題もあ
る。先ず、メッキ法で層間接続を行う場合は、配線層間
の電気的な接続用の孔明け(穿孔)加工、穿設した孔内
壁面を含めたメッキ処理工程などを要し、印刷配線板の
製造工程が冗長であるとともに、工程管理も繁雑である
という欠点がある。こうした操作上の煩雑化は、コスト
アップを招来するばかりでなく、メッキ処理の繰り返し
によって、結果的に両面導体層が厚くなるので、ファイ
ンパターン化が損なわれるという問題が付随することに
なる。一方、配線層間の電気的な接続用の孔に、導電性
ペーストを印刷などにより埋め込む方法の場合も、前記
メッキ法の場合と同様に孔明け工程を必要とする。しか
も、穿設した孔内に、均一(一様)に導体性ペーストを
流し込み埋め込むことが難しく、電気的な接続の信頼性
に問題があった。In addition, there are the following practical problems. First, in the case where the interlayer connection is performed by a plating method, it is necessary to perform a drilling process (perforation) for electrical connection between wiring layers, a plating process including an inner wall surface of the hole, and the like, to manufacture a printed wiring board. There are disadvantages that the process is redundant and the process management is complicated. Such complicated operation not only leads to an increase in cost, but also causes a problem that fine patterning is impaired because the double-sided conductor layer becomes thicker as a result of repeated plating. On the other hand, a method of embedding a conductive paste in a hole for electrical connection between wiring layers by printing or the like also requires a hole making step as in the case of the plating method. Moreover, it is difficult to uniformly (uniformly) pouring and embedding the conductive paste into the bored holes, and there is a problem in reliability of electrical connection.
【0008】いずれにしても、前記孔明け工程などを要
することは、印刷配線板のコストや歩留まりなどに反映
し、低コスト化などへの要望に対応し得ないこと、さら
に高密度配線化に伴い、穿設孔の径が比較的小さくなる
と、メッキ法や導電性ペースト充填による信頼性の高い
電気的な接続を達成し難いことなどの欠点がある。特
に、銅箔の黒化処理との接続では、界面抵抗の問題が大
きくクローズアップされ、信頼性に支障がある。In any case, the necessity of the above-described drilling step is reflected in the cost and yield of the printed wiring board, and it is impossible to meet the demand for cost reduction and the like. Accordingly, when the diameter of the perforation hole is relatively small, there are disadvantages such as difficulty in achieving a reliable electrical connection by plating or filling with a conductive paste. In particular, in connection with the copper foil blackening treatment, the problem of interface resistance is greatly highlighted, and there is a problem in reliability.
【0009】また、印刷配線板の表裏面に、配線層間接
続用の導電体孔が設置された構成の場合は、導電体孔の
領域に配線を形成,配置し得ないし、加えて電子部品を
搭載することもできないので、配線密度の向上が制約さ
れるとともに、電子部品の実装密度向上も阻害されると
いう問題がある。つまり、従来の製造方法によって得ら
れる印刷配線板は、高密度配線や高密度実装による回路
装置のコンパクト化、ひいては電子機器類の小形化など
の要望に、十分応え得るものといえず、前記コスト面を
含め、実用的により有効な印刷配線板の製造方法が望ま
れている。Further, in the case of a configuration in which a conductor hole for connection between wiring layers is provided on the front and back surfaces of the printed wiring board, wiring cannot be formed and arranged in the region of the conductor hole. Since they cannot be mounted, there is a problem that the improvement of the wiring density is restricted and the improvement of the mounting density of the electronic components is hindered. In other words, the printed wiring board obtained by the conventional manufacturing method cannot sufficiently meet the demands for downsizing the circuit device by high-density wiring and high-density mounting, and furthermore, to reduce the size of electronic devices and the like. There is a need for a more effective method of manufacturing a printed wiring board, including the surface.
【0010】本発明は、上記事情に対処してなされたも
ので、信頼性の高い層間接続を容易に構成し得る印刷配
線板および高密度の配線および実装が可能で、かつ信頼
性の高い層間接続を備えた印刷配線板の製造方法の提供
を目的とする。[0010] The present invention has been made to address the above circumstances, reliable interlayer connection can be easily configured to be a printed circuit board contact and high-density wiring and mounting, and reliable An object of the present invention is to provide a method for manufacturing a printed wiring board having an interlayer connection.
【0011】[0011]
【課題を解決するための手段】本発明に用いる印刷配線
板用銅箔は、少なくとも一方の主面が酸化層があり、配
線パターンニング予定領域で導体との被接続部に相当す
る部分の酸化層が選択的に除去されて成る。 For printed wiring board copper foil Ru used in the present invention In order to achieve the above object, according to at least one principal has oxidation layer, the portion corresponding to the connecting portion between the conductor wiring patterning scheduled region forming Ru and oxide layer is selectively removed.
【0012】本発明に係る印刷配線板の製造方法は、基
体主面の所定位置に形設され、かつ絶縁性の合成樹脂系
シートを厚さ方向に貫挿して、層間接続部を形成する突
起状の導電性バンプを備えた配線素体に、絶縁性の合成
樹脂系シートを介して、少なくとも一方の主面が酸化層
化された印刷配線板用銅箔を重ね、加圧,一体化する工
程と、前記を印刷配線板用銅箔を配線パターニングする
工程とを具備する印刷配線板の製造方法であって、前記
突起状の導電性バンプの先端側が貫挿・対接する領域の
印刷配線板用銅箔面の酸化層を選択的に除去しておくこ
とを特徴とする。なお、他の印刷配線板の製造方法は、
少なくとも一方の主面が酸化層化された印刷配線板用銅
箔面に絶縁性の合成樹脂系シートを積層配置する工程
と、前記積層体を加圧,一体化する工程と、前記一体化
させた絶縁性の合成樹脂系シート層を選択的に除去し、
印刷配線板用銅箔面を選択的に露出させる工程と、前記
露出させた印刷配線板用銅箔面の酸化層を選択的に除去
する工程と、前記酸化層を除去した面に接続する導体層
を合成樹脂系シート層の選択的除去部に形成する工程と
を具備する。また、本発明に係る印刷配線板は、主面に
酸化層を有し、この酸化層が選択的に除去されている第
1の銅箔と、前記銅箔の前記酸化層が除去された面に電
気的に接続された層間接続部と、前記層間接続部によっ
て厚さ方向に貫通され、前記銅箔に密着された合成樹脂
系シートと、前記合成樹脂系シートの前記第1の銅箔に
密着する面とは異なる側の面に密着して設けられ、主面
に酸化層を有し、この酸化層が選択的に除去され、前記
選択的に酸化層が除去された面に前記合成樹脂系シート
を貫通する前記層間接続部が電気的に接続された第2の
銅箔とを具備することを特徴とする。 The preparation process of the present invention in engagement Ru print wiring board is Katachi設a predetermined position of the substrate main surface, and by inserted through the synthetic resin sheet of insulating the thickness direction, the interlayer connection portion A copper foil for a printed wiring board having at least one main surface turned into an oxide layer is superimposed on a wiring element body having protruding conductive bumps through an insulating synthetic resin sheet. And a step of patterning the copper foil for a printed wiring board using the method described above, comprising: printing a region in which the tip side of the protruding conductive bumps is inserted and confronted. An oxide layer on the surface of the copper foil for a wiring board is selectively removed. In addition, the manufacturing method of other printed wiring boards is as follows.
A step of laminating and arranging an insulating synthetic resin-based sheet on the surface of the copper foil for a printed wiring board having at least one main surface formed of an oxide layer; a step of pressing and integrating the laminate; Selective removal of the insulating synthetic resin-based sheet layer
A step of selectively exposing the copper foil surface for a printed wiring board; a step of selectively removing an oxide layer on the exposed copper foil surface for a printed wiring board; and a conductor connected to the surface from which the oxide layer has been removed. you and forming a layer on the selective removal of the synthetic resin sheet layer. The printed wiring board according to the present invention has a
An oxide layer, wherein the oxide layer is selectively removed;
1 and the surface of the copper foil from which the oxide layer has been removed.
The interlayer connection part which is connected by air and the interlayer connection part
Synthetic resin penetrated in the thickness direction and adhered to the copper foil
Base sheet and the first copper foil of the synthetic resin base sheet
The main surface is provided in close contact with the surface on the side different from the
Having an oxide layer, the oxide layer is selectively removed,
The synthetic resin sheet is formed on the surface from which the oxide layer has been selectively removed.
The second interlayer connection portion penetrating through is electrically connected.
And a copper foil.
【0013】上記発明は、次ぎのような知見に基づいて
なされたものである。すなわち、印刷配線板用銅箔は、
絶縁体層との密着性を上げたり、あるいは耐酸化性を向
上させるため、主面を凹凸状に粗化したり、あるいは亜
鉛層/クロメート処理による酸化層化(酸化層形成)し
てある。そして、通常のスルホールメッキ法で層間接続
を形成する場合は、銅箔の厚さ方向に貫通する孔の内壁
面で電気的な接続を確保し得るが、銅箔の主面に対接す
る形で層間接続を形成したときは、接続抵抗のバラツキ
が生じたりして信頼性に問題があること、また、この接
続抵抗の問題は、対応する銅箔面の酸化層を除去してお
けば、容易に解消し得るという実験的な確認に基づいて
本発明はなされたものである。The above invention has been made based on the following findings. In other words, copper foil for printed wiring boards
In order to increase the adhesion to the insulator layer or to improve the oxidation resistance, the main surface is roughened into an uneven shape, or an oxide layer is formed by forming a zinc layer / chromate (forming an oxide layer). Then, when forming an interlayer connection by a normal through-hole plating method, electrical connection can be secured on the inner wall surface of the hole penetrating in the thickness direction of the copper foil, but in a form in contact with the main surface of the copper foil. When an interlayer connection is formed, there is a problem in reliability due to variations in connection resistance, and the problem of connection resistance can be easily solved by removing the oxide layer on the corresponding copper foil surface. The present invention has been made based on an experimental confirmation that the problem can be solved.
【0014】本発明に用いる印刷配線板用銅箔は、次ぎ
のようにして製造し得る。すなわち、少なくとも一方の
主面が、たとえば凹凸状に粗化されたり、あるいは亜鉛
層/クロメート処理されたりして酸化層化(酸化層形
成)された厚さ 4〜 100nm程度の電解銅箔を用意する。
次いで、前記電解銅箔の酸化層化面に、形成する配線パ
ターに対応した領域、すなわち予定もしくは設計する配
線パターニングの領域で、かつ導体との被接続部に相当
する部分の酸化層を選択的(部分的)に除去することに
よって得られる。そして、前記選択的な酸化層の除去
は、たとえばピンを立てた型を用意し、ピン先端を酸化
層に位置決め対接させ機械的に押圧して、ピン先端押圧
面の酸化層を選択的に破壊・除去する。勿論、この酸化
層の選択的な破壊・除去は、前記機械的な手段に限られ
ず、他の機械的な方法(たとえば選択的な研磨)や化学
的な方法(たとえば選択的なエッチング処理)で行うこ
ともできる。また、前記酸化層の選択的な除去は、厳密
に配線パターニングの領域で、かつ導体との被接続部に
相当する部分のみでなく、たとえば細かい格子状に配置
しておいてもよい。つまり、配線パターニングの設計自
由度をもたせた形態としておいてもよい。なお、この刷
配線板用銅箔は、選択的に除去した部分の酸化を防止す
るため、たとえば金,銀,白金,パラジウム,ロジウム
などのメッキ層で被覆しておくことが好ましい。[0014] Printing wiring board copper foil Ru used in the present invention may be prepared in the following manner. That is, an electrolytic copper foil having a thickness of about 4 to 100 nm is prepared in which at least one main surface is roughened, for example, into an uneven shape, or is subjected to a zinc layer / chromate treatment to form an oxide layer (form an oxide layer). I do.
Next, on the oxide layered surface of the electrolytic copper foil, a region corresponding to a wiring pattern to be formed, that is, a region of a planned or designed wiring pattern, and a portion of the oxide layer corresponding to a portion to be connected to a conductor are selectively formed. Obtained by (partial) removal. Then, the selective removal of the oxide layer is performed, for example, by preparing a mold with a pin up, positioning the pin tip against the oxide layer, mechanically pressing the pin tip, and selectively pressing the oxide layer on the pin tip pressing surface. Destroy and remove. Of course, the selective destruction and removal of the oxide layer is not limited to the mechanical means described above, but may be performed by another mechanical method (for example, selective polishing) or a chemical method (for example, selective etching treatment). You can do it too. The selective removal of the oxide layer may be performed not only in a strictly wiring patterning region and in a portion corresponding to a portion to be connected to a conductor, but also in a fine lattice shape, for example. In other words, a mode in which the degree of design freedom of the wiring patterning is provided may be adopted. The copper foil for a printed wiring board is preferably covered with a plating layer of, for example, gold, silver, platinum, palladium, rhodium or the like in order to prevent oxidation of the selectively removed portion.
【0015】本発明に係る製造方法において、層間接続
部を形成する突起状の導電性バンプを備えた配線素体
は、基体主面の所定位置に形設された突起状の導電性バ
ンプが、合成樹脂系シートを厚さ方向に貫挿した構成を
成している。ここで、導電性バンプを形設する基体とし
ては、たとえば剥離性の良好な合成樹脂シート類,もし
くは導電性シート(箔)などが挙げられる。そして、こ
の基体は、作業性の点から1枚のシートであることがよ
り望ましいが、予めパターン化したものでもよく、その
形状も特には限定されない。[0015] In the engaging Ru Manufacturing method according to the present invention, a wiring body having a protruding conductive bump forming an interlayer connections, Katachi設been protruding conductive bump at a predetermined position of the substrate main surface However, it has a configuration in which a synthetic resin sheet is inserted in the thickness direction. Here, examples of the substrate on which the conductive bumps are formed include synthetic resin sheets having good releasability, and conductive sheets (foil). The base is more preferably a single sheet from the viewpoint of workability, but may be patterned in advance, and its shape is not particularly limited.
【0016】前記導電性バンプは、選択的な金属メッキ
などによって形成し得るが、たとえば導電性ペーストな
ど導電性組成物による形成が簡便である。そして、この
ような導電性ペーストとしては、たとえば銀,金,銅,
半田粉などの導電性粉末、これらの合金粉末もしくは複
合(混合)金属粉末と、たとえばポリカーボネート樹
脂,ポリスルホン樹脂,ポリエステル樹脂,フェノキシ
樹脂,フェノール樹脂,ポリイミド樹脂などのバインダ
ー成分とを混合して調製されたものが挙げられる。 ま
た、前記導電性ペーストによる突起状(たとえば円錐状
もしくは柱状体など)の導電性バンプの形設は、たとえ
ば比較的厚いメタルマスクを用いた印刷法により、アス
ペクト比の高い突起を形成でき、その突起の高さ,径,
および分布は、形成する貫通型の導体配線部の構成に応
じて適宜設定される。具体的には最終的に構成する、貫
通型の導体配線部の配置構造などを考慮して決められ、
たとえば合成樹脂系シートが、ガラスクロス入りのBス
テージエポキシ樹脂層の場合、両面側から圧入する形態
のときはBステージエポキシ樹脂層厚の80〜 120%程
度、片面側から圧入する形態のときはBステージエポキ
シ樹脂層厚の 180〜 220%程度の高さが好ましい。な
お、前記突起状の導電性バンプ配置は、たとえば厚さ 5
mm程度のステンレス板の所定位置に、 0.3mmの孔を明け
て成るマスクを筐体の全面に配置し、この筐体内に収容
した導電性ペーストを加圧して、前記マスクの孔から導
電性ペーストを押し出す構成の、いわゆるスタンプ方式
で行うことも可能である。The conductive bumps can be formed by selective metal plating or the like, but are easily formed by using a conductive composition such as a conductive paste. Such conductive pastes include, for example, silver, gold, copper,
It is prepared by mixing a conductive powder such as a solder powder, an alloy powder thereof or a composite (mixed) metal powder with a binder component such as a polycarbonate resin, a polysulfone resin, a polyester resin, a phenoxy resin, a phenol resin and a polyimide resin. One. In addition, the formation of the projections (for example, conical or columnar bodies) of the conductive bumps by the conductive paste can be achieved by forming a projection having a high aspect ratio by, for example, a printing method using a relatively thick metal mask. The height, diameter,
The distribution is appropriately set according to the configuration of the through-type conductor wiring portion to be formed. Specifically, it is determined in consideration of the arrangement structure of the through-type conductor wiring part to be finally configured,
For example, when the synthetic resin-based sheet is a B-stage epoxy resin layer containing a glass cloth, it is about 80 to 120% of the thickness of the B-stage epoxy resin layer when pressed from both sides, and when pressed from one side. A height of about 180 to 220% of the thickness of the B-stage epoxy resin layer is preferable. The arrangement of the protruding conductive bumps is, for example, 5 mm thick.
At a predetermined position of a stainless steel plate of about mm, a mask having a hole of 0.3 mm is arranged on the entire surface of the housing, and the conductive paste contained in the housing is pressed, and the conductive paste is passed through the hole of the mask. Can be performed by a so-called stamp method having a configuration for pushing out.
【0017】前記突起状の導電性バンプが貫挿され、貫
通型配線部(層間接続部)を形成する合成樹脂系シート
としては、たとえば熱可塑性樹脂フイルム(シート)が
挙げられ、その厚さは25〜 300μm 程度が好ましい。こ
こで、熱可塑性樹脂シートとしては、たとえばポリカー
ボネート樹脂,ポリスルホン樹脂,熱可塑性ポリイミド
樹脂,4フッ化ポリエチレン樹脂,6フッ化ポリプロピ
レン樹脂,ポリエーテルエーテルケトン樹脂などのシー
ト類が挙げられる。また、硬化前状態に保持される熱硬
化性樹脂シートとしては、エポキシ樹脂,ビスマレイミ
ドトリアジン樹脂,ポリイミド樹脂,フェノール樹脂,
ポリエステル樹脂,メラミン樹脂,あるいはブタジェン
ゴム,ブチルゴム,天然ゴム,ネオプレンゴム,シリコ
ーンゴムなどの生ゴムのシート類が挙げられる。これら
合成樹脂は、単独でもよいが絶縁性無機物や有機物系の
充填物を含有してもよく、さらにガラスクロスやマッ
ト、有機合成繊維布やマット、あるいは紙などの補強材
と組み合わせて成るシートであってもよい。The synthetic resin sheet into which the protruding conductive bumps are inserted and which forms the penetrating wiring portion (interlayer connection portion) is, for example, a thermoplastic resin film (sheet). About 25 to 300 μm is preferable. Here, examples of the thermoplastic resin sheet include sheets such as polycarbonate resin, polysulfone resin, thermoplastic polyimide resin, polyethylene tetrafluoride resin, polypropylene hexafluoride resin, and polyether ether ketone resin. The thermosetting resin sheet held in a pre-cured state includes epoxy resin, bismaleimide triazine resin, polyimide resin, phenol resin,
Examples include sheets of polyester resin, melamine resin, or raw rubber such as butadiene rubber, butyl rubber, natural rubber, neoprene rubber, and silicone rubber. These synthetic resins may be used alone or may contain an insulating inorganic or organic filler, and may be a sheet made of glass cloth or mat, organic synthetic fiber cloth or mat, or a sheet combined with a reinforcing material such as paper. There may be.
【0018】さらに、前記層間接続部を備えた配線素体
は、次のようにして形成し得る。すなわち、突起状の導
電性バンプを形設した基体面へ、合成樹脂系シート主面
を対接させて積層配置し、この積層体の両側に要すれ
ば、当て板として寸法や変形の少ない金属板もしくは耐
熱性樹脂板、たとえばステンレス板,真鍮板、ポリイミ
ド樹脂板(シート),ポリテトラフロロエチレン樹脂板
(シート)を配置して加圧して、突起状の導電性バンプ
先端側を合成樹脂系シートの厚さ方向に貫通させること
により形成できる。Further, the wiring element provided with the interlayer connection portion can be formed as follows. That is, the synthetic resin-based sheet main surface is laminated and arranged on the substrate surface on which the protruding conductive bumps are formed, and if necessary on both sides of the laminated body, a metal having a small size and deformation is used as a backing plate. A plate or a heat-resistant resin plate, for example, a stainless steel plate, a brass plate, a polyimide resin plate (sheet), a polytetrafluoroethylene resin plate (sheet) is placed and pressurized, and the protruding conductive bump tip side is made of synthetic resin. It can be formed by penetrating in the thickness direction of the sheet.
【0019】なお、上記他の製造方法において、印刷配
線板用銅箔に積層配置する絶縁性の合成樹脂系シート
は、前記製造方法で例示したものを同様に使用し得る。
そして、前記積層体の加圧,一体化は、通常の銅箔張り
基板を製造する場合と同様でよく、また絶縁性の合成樹
脂系シート層の選択的な除去は、たとえばドリル加工な
どの機械的手段、フォトエッチング法など化学的手段で
行われる。さらに、露出させた印刷配線板用銅箔面の選
択的な酸化層の除去は、前記押圧や研磨など機械的な破
壊・除去、あるいは合成樹脂系シート層をマスクとした
エッチング処理などの手段が挙げられる。また、前記合
成樹脂系シート層の選択的除去部に、酸化層を除去した
面と接続する導体層を形成する手段としては、たとえば
化学メッキ法、化学メッキ法,電気メッキ法の併用、あ
るいは導電体の埋め込みなどが挙げられる。[0019] In the above other manufacturing method, an insulating synthetic resin sheet to be stacked on a copper foil for printed wiring board may be used as well those exemplified in the previous SL Manufacturing method.
The pressurization and integration of the laminate may be the same as in the case of manufacturing a normal copper foil-clad substrate, and the selective removal of the insulating synthetic resin-based sheet layer may be performed by a machine such as drilling. This is performed by chemical means such as a physical means and a photo etching method. Further, the selective removal of the oxidized layer on the exposed copper foil surface of the printed wiring board can be achieved by mechanical destruction or removal such as pressing or polishing, or etching using a synthetic resin-based sheet layer as a mask. No. Means for forming a conductor layer connected to the surface from which the oxide layer has been removed in the selectively removed portion of the synthetic resin-based sheet layer include, for example, a chemical plating method, a combination of a chemical plating method and an electroplating method, or a conductive layer. Implantation of the body and the like.
【0020】[0020]
【作用】本発明に用いる印刷配線板用銅箔は、層間接続
を成す導体との被接続部領域面の酸化層が、予め選択的
に除去され金属面を露出している。したがって、絶縁体
層を厚さ方向に挿通した層間接続(導体)の先端面が銅
箔面に対接し、いわゆる面接触型の電気的接続部を形成
した場合でも、電気的に良好な接合が容易に形成され
る。つまり、界面抵抗の問題が大幅に改善されるので、
信頼性の高い層間接続の形成が可能となる。一方、酸化
層を選択的に除去した領域以外の領域面の酸化層は、相
互で積層体を形成する絶縁性の樹脂系シート層に対して
良好な密着性を呈する。したがって、たとえば熱・冷サ
イクルなどにおいても、剥離・破損など起こす恐れのな
い印刷配線板として機能することになる。[Action] for printed wiring board copper foil Ru used in the present invention, oxide layer of the interface region surface of the conductor forming the interlayer connection are exposed metal surface is pre-selectively removed. Therefore, even when the tip surface of the interlayer connection (conductor) in which the insulator layer is inserted in the thickness direction is in contact with the copper foil surface, and a so-called surface contact type electrical connection portion is formed, good electrical connection is obtained. It is easily formed. In other words, the problem of interface resistance is greatly improved,
A highly reliable interlayer connection can be formed. On the other hand, the oxide layer on the surface of the region other than the region from which the oxide layer has been selectively removed exhibits good adhesion to the insulating resin-based sheet layer that forms a laminate with each other. Therefore, the printed wiring board functions as a printed wiring board that is not likely to be peeled or damaged, for example, in a heat / cool cycle.
【0021】本発明に係る印刷配線板の製造方法によれ
ば、配線層間を電気的に接続する層間接続部は、層間絶
縁層を成す合成樹脂系シートの可塑状態化などと、支持
基体面の先端の尖った導電性バンプの圧入とによって、
確実に信頼性の高い配線層間の電気的な接続が達成され
る。つまり、層間接続用孔の穿設工程の省略など、プロ
セスの簡易化を図りながら、導電性バンプが酸化層の除
去された銅箔面に対接するので、信頼性の高い電気的な
接続を形成し得る。さらに具体的には、前記印刷配線板
用銅箔の作用に基づいて、微細な配線パターン層間の接
続が、高精度に、かつ高い信頼性で達成できる。また、
前記配線パターン層間の電気的な接続に当たり、接続孔
の形設も不要となるので、その分高密度配線および高密
度実装の可能な印刷配線板を低コストで製造することが
可能となる。According to the manufacturing method of the engaging Ru printed wiring board of the present invention, the interlayer connection portion for electrically connecting the wiring layers, and the like plastic state of the synthetic resin sheet forming the interlayer insulating layer, the supporting base By press-fitting a conductive bump with a sharp tip on the body surface,
A reliable electrical connection between the wiring layers is reliably achieved. In other words, since the conductive bumps are in contact with the copper foil surface from which the oxide layer has been removed while simplifying the process, such as omitting the step of drilling holes for interlayer connection, a highly reliable electrical connection is formed. I can do it. More specifically, connection between fine wiring pattern layers can be achieved with high accuracy and high reliability based on the action of the copper foil for a printed wiring board. Also,
Since there is no need to form connection holes in the electrical connection between the wiring pattern layers, a printed wiring board capable of high-density wiring and high-density mounting can be manufactured at a low cost.
【0022】上記他の印刷配線板の製造方法によれば、
前記製造方法の場合と同様に、層間接続を成す導体の先
端面は、酸化層の除去された銅箔面に対接するので、信
頼性の高い電気的な接続を形成し得る。According to the other method for manufacturing a printed wiring board,
As with the previous SL Manufacturing method, the distal end surface of the conductor forming the interlayer connection, since contact against the copper foil surface that is removing the oxide layer, to form a reliable electrical connection.
【0023】[0023]
実施例1 図1 (a)および (b)は本実施例の実施態様を模式的に示
したものである。Example 1 FIGS. 1A and 1B schematically show an embodiment of this example.
【0024】先ず、クロメート被膜層が一主面に形成さ
れた厚さ35μm の電解銅箔(商品名:EC-3,三井金属鉱
業KK製)1を用意し、この電解銅箔1両主面に、図1
(a)に断面的に示すごとく、ドライフィルムタイプのフ
ォトレジスト2,2′をそれぞれラミネートした。次い
で、前記クロメート被膜層が形成されている一主面側の
フォトレジスト2を、ネガマスクを介して選択的に露光
し、現像して、図1 (b)に断面的に示すごとく、層間接
続を形成する予定領域の電解銅箔面1を露出3させた。
その後、 5%塩酸水溶液をエッチング液として、前記電
解銅箔1面にエッチング処理を施して、露出3面のクロ
メート被膜層を選択的に除去した。なお、このクロメー
ト被膜層の選択的な除去においては、下側の銅箔面も薄
く除去されて新生面を露出した。次に、アルカリ水溶液
で処理して、前記フォトレジスト2,2′をそれぞれ剥
離・除去し、配線パターンニング予定領域で、かつ導体
との被接続部に相当する部分の酸化層が選択的に除去さ
れて成る印刷配線板用銅箔を得た。First, a 35 μm-thick electrolytic copper foil (trade name: EC-3, manufactured by Mitsui Mining & Smelting KK) 1 having a chromate coating layer formed on one principal surface is prepared. Figure 1
As shown in cross section in (a), dry film type photoresists 2 and 2 'were laminated respectively. Next, the photoresist 2 on one main surface side on which the chromate coating layer is formed is selectively exposed through a negative mask and developed, and as shown in cross section in FIG. The electrodeposited copper foil surface 1 in the region to be formed was exposed 3.
Thereafter, one surface of the electrolytic copper foil was subjected to an etching treatment using a 5% hydrochloric acid aqueous solution as an etching solution to selectively remove the three exposed chromate coating layers. In the selective removal of the chromate coating layer, the lower copper foil surface was also thinly removed to expose a new surface. Next, the photoresists 2 and 2 'are respectively peeled and removed by treating with an alkaline aqueous solution, and an oxide layer in a region where wiring patterning is to be performed and a portion corresponding to a portion to be connected to a conductor is selectively removed. Thus, a copper foil for a printed wiring board was obtained.
【0025】実施例2 図2 (a)〜 (d)は本実施例の実施態様を模式的に示した
ものである。Embodiment 2 FIGS. 2A to 2D schematically show an embodiment of this embodiment.
【0026】前記実施例1で得た印刷配線板用銅箔4を
用意する一方、前記印刷配線板用銅箔4の選択的に露出
した新生面に対応した位置に直径 0.3mmの孔が形設され
たメタルスクリーンを用意した。そして、前記印刷配線
板用銅箔4面に、メタルスクリーンを位置合わせ・配置
して、銀粉末を主成分と下エポキシ樹脂バインダー系の
導電性ペーストを印刷した。その後、70℃で仮乾燥して
から、前記メタルスクリーンを同一位置に位置合わせ・
配置して、導電性ペーストの印刷,70℃での仮乾燥を 3
階繰り返し、図2 (a)に断面的に示すごとく、高さ 200
μm 程度の円錐状の導電性バンプ5を形成してから、さ
らに、 180℃で加熱して導電性バンプ5を硬化させた。While preparing the copper foil 4 for a printed wiring board obtained in Example 1, a hole having a diameter of 0.3 mm was formed at a position corresponding to the selectively exposed new surface of the copper foil 4 for a printed wiring board. Prepared metal screen. Then, a metal screen was positioned and arranged on the four surfaces of the copper foil for a printed wiring board, and a conductive paste containing silver powder as a main component and a lower epoxy resin binder was printed. Then, after pre-drying at 70 ° C, the metal screen is positioned at the same position.
Place, print conductive paste, pre-dry at 70 ℃ 3
Repeated floor, height 200, as shown in cross section in Figure 2 (a)
After forming a conical conductive bump 5 having a diameter of about μm, the conductive bump 5 was further cured by heating at 180 ° C.
【0027】次いで、前記印刷配線板用銅箔4の導電性
バンプ5形成面に、図2 (b)に断面的に示すごとく、ガ
ラスクロス厚 100μm のガラスエポキシ系プリプレグ
(商品名: TLP-551,東芝ケミカルKK製)6を位置合わ
せ・積層配置し、90℃に加熱した状態で、シリコーンゴ
ム層のような弾性体を介して押圧(プレス)した。この
押圧(プレス)加工によって、前記導電性バンプ5先端
部が、ガラスエポキシ系プリプレグ層6を貫挿し、かつ
印刷配線板用銅箔4およびガラスエポキシ系プリプレグ
層6が密着した積層体が得られた。Next, as shown in cross section in FIG. 2B, a glass epoxy-based prepreg (trade name: TLP-551) having a glass cloth thickness of 100 μm is formed on the surface of the copper foil 4 for a printed wiring board on which the conductive bumps 5 are formed. (Manufactured by Toshiba Chemical KK) 6 were aligned and laminated and pressed (pressed) through an elastic body such as a silicone rubber layer while being heated to 90 ° C. By this pressing (pressing), a laminated body is obtained in which the tip of the conductive bump 5 penetrates the glass epoxy prepreg layer 6 and the copper foil 4 for a printed wiring board and the glass epoxy prepreg layer 6 are in close contact. Was.
【0028】前記積層体のガラスエポキシ系プリプレグ
層6を貫挿した導電性バンプ5先端露出面に、別途用意
した実施例1で得た印刷配線板用銅箔4′を位置合わせ
・積層配置し、真空型加熱加圧プレスを用いて、 170
℃,40kg/cm2 (樹脂圧)でプレスした。このプレス加
工によって、図2 (c)に断面的に示すような、両面銅箔
4,4′張り積層板を得た。つまり、ガラスエポキシ系
プリプレグ層6から形成された絶縁体層6′を貫通する
層間接続部5′で電気的に接続され、かつ前記層間接続
部5′に対応する両面銅箔4,4′面が、選択的に酸化
層が除去されている構成の両面銅箔4,4′張り積層板
を作成した。その後、前記両面銅張り積層板の両面銅箔
4,4′に、いわゆるフォトエッチング処理を施して、
図2 (d)に断面的に示すような、両面配線板を得た。The printed wiring board copper foil 4 ′ prepared in Example 1 prepared separately was aligned and laminated on the exposed surface of the conductive bump 5 at the tip end of the conductive body 5 through which the glass epoxy prepreg layer 6 of the laminate was inserted. , Using a vacuum-type heating and pressing press, 170
It pressed at 40 degreeC and 40 kg / cm < 2 > (resin pressure). By this press working, a double-sided copper foil 4,4'-clad laminate as shown in cross section in FIG. 2 (c) was obtained. That is, the surfaces of the double-sided copper foils 4 and 4 'which are electrically connected at the interlayer connection portion 5' penetrating the insulator layer 6 'formed of the glass epoxy prepreg layer 6 and correspond to the interlayer connection portion 5'. However, a double-sided copper foil 4, 4'-clad laminate having a configuration in which the oxide layer was selectively removed was prepared. Thereafter, a so-called photo-etching treatment is applied to the double-sided copper foils 4, 4 'of the double-sided copper-clad laminate,
A double-sided wiring board as shown in cross section in FIG. 2 (d) was obtained.
【0029】上記両面配線板について、常套的な各種の
試験・評価を行ったところ、ビア当たりの抵抗値が 5〜
10 mΩ、シリコーンオイルにて調温したバスで、 260
℃,5sec.〜室温, 10sec.でのホットオイルテストで
は 100サイクル後の抵抗値変化が 5%以内であった。ま
た、前記両面配線板の製造工程において、作成した積層
板の両面銅箔4,4′の密着強度を、ピール強度測定用
パターンの形で測定したところ 1.8kg/cmの強度を示
し、さらに 155℃,240hの加速劣化試験後においても
1.2kg/cmの強度を示した。The conventional double-sided wiring board was subjected to various conventional tests and evaluations.
10 mΩ, bath controlled by silicone oil, 260
° C, 5sec. ~ Room temperature, 10sec. In the hot oil test, the resistance change after 100 cycles was within 5%. In the manufacturing process of the double-sided wiring board, the adhesion strength between the double-sided copper foils 4 and 4 ′ of the prepared laminated board was measured in the form of a peel strength measurement pattern, showing a strength of 1.8 kg / cm. Even after accelerated deterioration test at 240 ℃ for 240h
It showed a strength of 1.2 kg / cm.
【0030】比較のため、前記両面銅箔4,4′張り積
層板の作成に当たり、印刷配線板用銅箔4,4′の酸化
層を選択的に除去しなかった場合(比較例1)は、ビア
当たりの抵抗値が20〜40 mΩ、ホットオイルテストでは
100サイクル後の抵抗値変化が 150%に上昇していた。
また、印刷配線板用銅箔4,4′の酸化層を全面除去し
た場合(比較例2)は、ピール強度測定で 1.5kg/cmの
強度を示したが、 155℃,240hの加速劣化試験後におい
ては0.25kg/cmに低下していた。For the purpose of comparison, when the double-sided copper foil 4,4'-clad laminate was prepared, the oxide layer of the copper foil 4,4 'for the printed wiring board was not selectively removed (Comparative Example 1). The resistance per via is 20-40 mΩ, in hot oil test
The resistance change after 100 cycles increased to 150%.
When the oxide layers of the copper foils 4 and 4 'for the printed wiring board were completely removed (Comparative Example 2), the peel strength measurement showed a strength of 1.5 kg / cm, but the accelerated aging test at 155 ° C for 240 hours. Later, it was reduced to 0.25 kg / cm.
【0031】実施例3 図3 (a)〜 (i)および図4 (a)〜 (d)は、本実施例の実
施態様を模式的に示したものである。Embodiment 3 FIGS. 3 (a) to 3 (i) and FIGS. 4 (a) to 4 (d) schematically show an embodiment of this embodiment.
【0032】先ず、両面にクロメート被膜層が形成され
た厚さ35μm の電解銅箔(商品名:EC-A3)1,1′、
エポキシ樹脂系シート(商品名: AS-3000,日立化成KK
製)7を用意し、エポキシ樹脂系シート7の両面に電解
銅箔1,1′をそれぞれ熱圧着・硬化させて、図3 (a)
に断面的に示すような両面銅箔張り板を作成した。次い
で、前記両面銅箔張り板の両銅箔1,1′面に、図3
(b)に断面的に示すごとく、ドライフィルムタイプのフ
ォトレジスト2,2′をラミネートし、一方のフォトレ
ジスト2層をネガマスクを介して露光した。その後、現
像処理を施しして、層間接続部を形成する領域のフォト
レジスト2を選択的に除去し、図3 (c)に断面的に示す
ごとく、電解銅箔1のクロメート被膜層を選択的に露出
させた。First, a 35 μm-thick electrolytic copper foil (trade name: EC-A3) having a chromate coating layer formed on both surfaces, 1, 1 ',
Epoxy resin sheet (Product name: AS-3000, Hitachi Chemical KK
7), electrolytic copper foils 1 and 1 ′ are thermocompression-bonded and cured on both surfaces of the epoxy resin sheet 7, respectively, as shown in FIG.
A double-sided copper foil-clad board as shown in FIG. Next, on both copper foil 1, 1 'surfaces of the double-sided copper foil-clad board, FIG.
As shown in cross section in (b), dry film type photoresists 2 and 2 'were laminated, and one of the two photoresists was exposed through a negative mask. Thereafter, a developing process is performed to selectively remove the photoresist 2 in a region where an interlayer connection portion is to be formed, and as shown in a sectional view in FIG. 3C, the chromate film layer of the electrolytic copper foil 1 is selectively removed. Exposed.
【0033】次に、前記露出させた電解銅箔1のクロメ
ート被膜層領域を、選択的にエッチング除去して電解銅
箔1を穴明けし、図3 (d)に断面的に示すように、下地
のエポキシ樹脂系シート7面を選択的に露出させた。そ
の後、アルカリ水溶液を用いて前記フォトレジスト2,
2′を剥離・除去してから(図3 (e))、70℃に過温し
た過マンガン酸カリ水溶液でエッチング処理して、前記
露出したエポキシ樹脂系シート7面領域を、選択的に酸
化分解させて、図3 (f)に断面的に示すごとく、対向す
る電解銅箔1′面を選択的に露出させた。この選択的に
露出させた電解銅箔1′面を、次亜塩素酸ソーダを主成
分とするアルカリ水溶液で処理し、前記電解銅箔1′の
露出面を黒化処理(粗面化)した後、塩酸10%水溶液で
処理して、黒化処理面を還元して銅の粗面を露出させ、
この露出粗面に化学メッキ法によって厚さ 0.1μm の白
金層8を被着形成した(図3 (g))。Next, the exposed area of the chromate film layer of the electrolytic copper foil 1 is selectively removed by etching to form a hole in the electrolytic copper foil 1 as shown in FIG. The surface of the base epoxy resin sheet 7 was selectively exposed. Thereafter, the photoresist 2, using an aqueous alkali solution,
After stripping and removing 2 '(FIG. 3 (e)), the exposed epoxy resin-based sheet 7 is selectively oxidized by etching with potassium permanganate aqueous solution heated to 70 ° C. By disassembling, as shown in cross section in FIG. 3 (f), the opposing electrolytic copper foil 1 'surface was selectively exposed. The selectively exposed surface of the electrolytic copper foil 1 'was treated with an aqueous alkali solution containing sodium hypochlorite as a main component, and the exposed surface of the electrolytic copper foil 1' was blackened (roughened). Then, it is treated with a 10% aqueous solution of hydrochloric acid to reduce the blackened surface to expose the rough surface of copper,
A platinum layer 8 having a thickness of 0.1 μm was formed on the exposed rough surface by a chemical plating method (FIG. 3 (g)).
【0034】次いで、常套的な手段によって、触媒付
与,化学銅メッキ,電気銅メッキなどの各処理を施し
て、前記白金層8面を含む電解銅箔1,1′の全面に、
図3 (h)に断面的に示すごとく、厚さ20μm の銅メッキ
層9,9′を被着形成して、層間接続10を備えた両面銅
箔張り板を得た。前記作成した層間接続10を備えた両面
銅箔張り板の両面に、再びドライフィルムタイプのフォ
トレジスト2,2′をラミネートし、一方のフォトレジ
スト2層をネガマスクを介して露光した。その後、現像
処理を施して、エッチングレジストパターニングした
後、銅メッキ層9および電解銅箔1を選択的にエッチン
ク除去してから、フォトレジスト2,2′を剥離・除去
して、図3 (i)に断面的に示すような片面配線パターン
基板を得た。Next, by performing conventional treatments such as catalyst application, chemical copper plating, and electrolytic copper plating, the entire surface of the electrolytic copper foils 1, 1 'including the platinum layer 8 surface is applied by conventional means.
As shown in cross section in FIG. 3 (h), copper plating layers 9 and 9 'each having a thickness of 20 μm were applied to form a double-sided copper foil-clad board having an interlayer connection 10. Dry film-type photoresists 2 and 2 'were laminated again on both sides of the double-sided copper foil-clad board provided with the interlayer connection 10 prepared above, and one of the two photoresists was exposed through a negative mask. Thereafter, after performing a development process and patterning the etching resist, the copper plating layer 9 and the electrolytic copper foil 1 are selectively etched and then the photoresists 2 and 2 'are peeled and removed. ) To obtain a single-sided wiring pattern substrate as shown in cross section.
【0035】一方、厚さ 0.6mmのガラス・エポキシ樹脂
系絶縁基板 11aの両面に、配線パターニング 11bしたコ
ア基板11を用意し、図4 (a)に断面的に示すように、こ
のコア基板11の両面側に、それぞれ厚さ 100μm のガラ
ス・エポキシ樹脂系プリプレグを介して、前記片面配線
パターン基板を位置決め,積層配置した。そして、この
積層配置した積層体を、真空型加熱加圧プレス装置にセ
ットし、 170℃,40kg/cm2 (樹脂圧)で加圧・加熱成
型して、図4 (b)に断面的に示すような、6層両面銅箔
張り板を得た。On the other hand, a core substrate 11 on which wiring patterning 11b is provided on both sides of a glass-epoxy resin based insulating substrate 11a having a thickness of 0.6 mm is prepared, and as shown in cross section in FIG. The single-sided wiring pattern substrate was positioned and laminated on both sides of the substrate via glass / epoxy resin prepregs each having a thickness of 100 μm. Then, the laminated body arranged in this manner is set in a vacuum-type heating / pressing machine, and is pressed and heated at 170 ° C. and 40 kg / cm 2 (resin pressure) to form a cross section as shown in FIG. As shown, a six-layer double-sided copper foil-clad board was obtained.
【0036】次ぎに、前記6層両面銅箔張り板につい
て、ドリル加工を施し、所定位置に両面間を貫通する穴
12を形設してから、いわゆるスルホールメッキ処理を行
って、図4 (c)に断面的に示すような、スルホール接続
を形成した6層両面銅箔張り板を得た。その後、両面の
銅箔1′などについて、常套的な手段で、所要のパター
ニング処理を行って、図4 (d)に断面的に示すような、
表層IVH (インターステシャル・ビア・ホール)6層両
面銅箔張り板を得た。このようにして製造した印刷配線
板は、前記片面配線パターン基板(図3 (i)参照)が備
えている層間接続10(ビア)内もエポキシ樹脂で充填さ
れており、この領域面上に半田パッドを形成することが
可能であった。Next, the above-mentioned six-layer double-sided copper foil-clad board is drilled, and a hole penetrating between both sides at a predetermined position.
After forming No. 12, a so-called through-hole plating treatment was performed to obtain a six-layer double-sided copper foil-clad board having a through-hole connection as shown in cross section in FIG. 4 (c). Thereafter, a required patterning process is performed on the copper foils 1 ′ on both sides by a conventional means, and as shown in a sectional view in FIG.
A 6-layer double-sided copper foil clad board having a surface layer IVH (interstitial via hole) was obtained. In the printed wiring board thus manufactured, the inside of the interlayer connection 10 (via) provided in the single-sided wiring pattern board (see FIG. 3 (i)) is also filled with epoxy resin. It was possible to form a pad.
【0037】上記6層両面配線板について、常套的な各
種の試験・評価を行ったところ、ビア当たりの抵抗値が
5〜10 mΩ、シリコーンオイルにて調温したバスで、 2
60℃,5sec.〜室温, 10sec.でのホットオイルテスト
では 100サイクル後の抵抗値変化が 5%以内であった。
また、前記6層両面配線板の製造工程において、作成し
た片面配線パターン基板の両面銅箔4,4′の密着強度
を、ピール強度測定用パターンの形で測定したところ
1.8kg/cmの強度を示し、さらに 155℃,240hの加速劣
化試験後においても 1.2kg/cmの強度を示した。The conventional six-layer double-sided wiring board was subjected to various conventional tests and evaluations.
5-10 mΩ, bath controlled by silicone oil, 2
60 ° C, 5sec. ~ Room temperature, 10sec. In the hot oil test, the resistance change after 100 cycles was within 5%.
Further, in the manufacturing process of the six-layer double-sided wiring board, the adhesion strength of the double-sided copper foils 4, 4 'of the single-sided wiring pattern substrate thus prepared was measured in the form of a peel strength measurement pattern.
It showed a strength of 1.8 kg / cm and a strength of 1.2 kg / cm even after the accelerated aging test at 155 ° C for 240 hours.
【0038】なお、本発明は、前記実施例に限定される
ものでなく、発明の趣旨を逸脱しない範囲で、いろいろ
変形して実施することも可能である。It should be noted that the present invention is not limited to the above-described embodiment, but can be implemented in various modifications without departing from the spirit of the invention.
【0039】[0039]
【発明の効果】本発明によれば、配線パターン層間の安
定した電気的な接続が容易、かつ確実に確保し得るばか
りでなく、絶縁体に対する良好な密着性もしくは一体性
も保持された印刷配線板の提供が可能となる。つまり、
信頼性の高い層間接続の形成・保持が図られるととも
に、加速劣化試験においてもピル強度の低下が少ない信
頼性の高い印刷配線板を歩留まりよく提供し得る。According to the present invention, a printed wiring not only can easily and reliably secure a stable electrical connection between wiring pattern layers, but also has good adhesion or integrity to an insulator. Boards can be provided. That is,
It is possible to form and maintain a highly reliable interlayer connection, and to provide a highly reliable printed wiring board with a small decrease in pill strength even in an accelerated deterioration test with high yield.
【図1】本発明に用いる印刷配線用銅箔の製造方法例を
模式的に示すもので、 (a)は銅箔面にフォトレジスト層
を配置した状態を示す断面図、 (a)はフォトレジスト層
をパターニングした状態を示す断面図。[1] The manufacturing method of a printing wiring copper foil Ru used in the present invention shows schematically, (a) shows the cross-sectional view showing a state of arranging the photoresist layer to copper foil surface, (a) shows the Sectional drawing which shows the state which patterned the photoresist layer.
【図2】本発明に係る印刷配線板の製造方法の実施態様
例を模式的に示すもので、 (a)は銅箔面に突起状の導電
性バンプを設けた状態を示す断面図、 (b)は突起状の導
電性バンプを設けた銅箔面に合成樹脂系シートを配置し
た状態を示す断面図、 (c)は合成樹脂系シートを挿通し
た導電性バンプ先端部に電気的に接続して銅箔を一体化
させた状態を示す断面図、 (d)は両面の銅箔をパターニ
ングした状態を示す断面図。FIG. 2 schematically shows an embodiment of a method for manufacturing a printed wiring board according to the present invention, in which (a) is a cross-sectional view showing a state in which protruding conductive bumps are provided on a copper foil surface; (b) is a cross-sectional view showing a state in which a synthetic resin sheet is disposed on a copper foil surface provided with protruding conductive bumps, and (c) is electrically connected to the tip of the conductive bump through which the synthetic resin sheet is inserted. FIG. 4D is a cross-sectional view showing a state where the copper foil is integrated with the copper foil, and FIG. 4D is a cross-sectional view showing a state where the copper foil on both sides is patterned.
【図3】印刷配線板の製造方法の他の実施態様例を模式
的に示すもので、(a)は絶縁体層の両面に銅箔を張り合
わせた状態を示す断面図、 (b)は銅箔面にフォシレジス
ト層を配置した状態を示す断面図、 (c)は一方のフォシ
レジスト層をパターニングした状態を示す断面図、 (d)
は一方の銅箔面エッチングした状態を示す断面図、 (e)
は両面のフォシレジスト層を剥離・除去した状態を示す
断面図、 (f)はパターニングした銅箔をマスクとして絶
縁体層を選択的に除去した状態を示す断面図、 (g)は絶
縁体層の選択的な除去で露出した面に白金層をメッキで
形成した状態を示す断面図、 (h)は両面に銅メッキ層を
形成した状態を示す断面図、 (i)は片面配線パターニン
グした状態を示す断面図。[3] Another embodiment of the manufacturing method of the printed wiring board shows schematically, (a) shows the cross-sectional view showing a state in which laminated a copper foil on both surfaces of the insulating layer, (b) is Sectional view showing a state where a photoresist layer is arranged on a copper foil surface, (c) is a sectional view showing a state where one photoresist layer is patterned, (d)
Is a cross-sectional view showing the etched state of one copper foil surface, (e)
Is a cross-sectional view showing a state in which the photoresist layers on both sides are peeled and removed, (f) is a cross-sectional view showing a state in which the insulator layer is selectively removed using a patterned copper foil as a mask, and (g) is a cross-sectional view showing the insulator layer. Sectional view showing a state in which a platinum layer is formed by plating on the surface exposed by selective removal, (h) is a sectional view showing a state in which a copper plating layer is formed on both sides, and (i) is a state in which single-sided wiring is patterned. FIG.
【図4】図3 (i)に図示した片面配線パターン板を用い
る多層印刷配線板の製造方法の実施態様例を模式的に示
すもので、 (a)はコア基板の両面絶縁体層を介して片面
配線パターン板に積層配置した状態を示す断面図、 (b)
は加熱加圧・一体化した状態を示す断面図、 (c)はスル
ホール導体層を設けた状態を示す断面図、 (d)は両面パ
ターニングした状態を示す断面図。FIGS. 4A and 4B schematically show an embodiment of a method for manufacturing a multilayer printed wiring board using the single-sided wiring pattern board shown in FIG. 3I, wherein FIG. Cross-sectional view showing a state of being stacked on a single-sided wiring pattern board, (b)
FIG. 3 is a cross-sectional view showing a state in which heating and pressurization and integration are performed, (c) is a cross-sectional view showing a state in which a through-hole conductor layer is provided, and (d) is a cross-sectional view showing a state in which both sides are patterned.
1,1′……酸化層付き電解銅箔 2,2′……フ
ォトレジスト層 3……電解銅箔の露出面 4,4′……印刷配線用
銅箔 5……導電性バンプ 5′,10……層間
接続部 6…合成樹脂系シート(プリプレグ層)
7……エポキシ樹脂系シート 8……白金層
9……銅メッキ層 11……コア配線基板
11a……絶縁基板 11b……配線パターン1,1 ': electrolytic copper foil with oxide layer 2, 2': photoresist layer 3: exposed surface of electrolytic copper foil 4, 4 ': copper foil for printed wiring 5: conductive bump 5', 10 ... Interlayer connection 6 ... Synthetic resin sheet (prepreg layer)
7: Epoxy resin sheet 8: Platinum layer
9 Copper plating layer 11 Core wiring board
11a …… Insulating substrate 11b …… Wiring pattern
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI H05K 3/46 H05K 3/46 N (56)参考文献 特開 平2−111097(JP,A) (58)調査した分野(Int.Cl.7,DB名) H05K 1/05 H05K 1/09 H05K 3/06 H05K 3/40 H05K 3/46 ──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. 7 Identification symbol FI H05K3 / 46 H05K3 / 46N (56) References JP-A-2-111097 (JP, A) (58) Fields investigated ( Int.Cl. 7 , DB name) H05K 1/05 H05K 1/09 H05K 3/06 H05K 3/40 H05K 3/46
Claims (2)
縁性の合成樹脂系シートを厚さ方向に貫挿して、層間接
続部を形成する突起状の導電性バンプを備えた配線素体
に、前記絶縁性の合成樹脂系シートを介して、少なくと
も一方の主面が酸化層化された印刷配線板用銅箔を重
ね、加圧,一体化する工程と、前記印刷配線板用銅箔を
配線パターニングする工程とを具備する印刷配線板の製
造方法であって、 前記突起状の導電性バンプの先端側が貫挿・対接する領
域の前記印刷配線板用銅箔面の酸化層を選択的に除去し
ておくことを特徴とする印刷配線板の製造方法。1. A wiring element having a projecting conductive bump formed at a predetermined position on a main surface of a substrate and penetrating an insulating synthetic resin sheet in a thickness direction to form an interlayer connection portion. the body, via a synthetic resin sheet of the insulation, superimposed at least one main surface oxide layer of print wiring board copper foil, pressing, a step of integrating, for copper the printed circuit board a method of manufacturing a printed wiring board and a step of wiring patterning foil, selective oxidation layer of the printed wiring board copper foil surface of the distal end side of the protruding conductive bump is in contact Nuki挿-pair region A method for manufacturing a printed wiring board, wherein the printed wiring board is removed.
的に除去されている第1の銅箔と、 前記銅箔の前記酸化層が除去された面に電気的に接続さ
れた層間接続部と、 前記層間接続部によって厚さ方向に貫通され、前記銅箔
に密着された合成樹脂系シートと、 前記合成樹脂系シートの前記第1の銅箔に密着する面と
は異なる側の面に密着して設けられ、主面に酸化層を有
し、この酸化層が選択的に除去され、前記選択的に酸化
層が除去された面に前記合成樹脂系シートを貫通する前
記層間接続部が電気的に接続された第2の銅箔と を具備
することを特徴とする印刷配線板。 2. An oxide layer is provided on a main surface, and this oxide layer is selected.
Electrically connected to the first copper foil that has been electrically removed and the surface of the copper foil from which the oxide layer has been removed.
And the copper foil penetrated in the thickness direction by the interlayer connection portion
And a surface of the synthetic resin sheet that is in close contact with the first copper foil.
Are provided in close contact with different surfaces and have an oxide layer on the main surface.
Then, the oxide layer is selectively removed, and the selective oxidation is performed.
Before penetrating the synthetic resin sheet on the surface from which the layer has been removed
Includes serial interlayer connection portion and a second copper foil are electrically connected
A printed wiring board characterized in that:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21395694A JP3251785B2 (en) | 1994-09-07 | 1994-09-07 | Printed wiring board, manufacturing method of printed wiring board |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21395694A JP3251785B2 (en) | 1994-09-07 | 1994-09-07 | Printed wiring board, manufacturing method of printed wiring board |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0878799A JPH0878799A (en) | 1996-03-22 |
| JP3251785B2 true JP3251785B2 (en) | 2002-01-28 |
Family
ID=16647845
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP21395694A Expired - Lifetime JP3251785B2 (en) | 1994-09-07 | 1994-09-07 | Printed wiring board, manufacturing method of printed wiring board |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3251785B2 (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4973226B2 (en) * | 2007-02-16 | 2012-07-11 | 富士通株式会社 | Wiring board manufacturing method |
| KR20150049515A (en) * | 2013-10-30 | 2015-05-08 | 삼성전기주식회사 | Printed Circuit Board and The Method of Manufacturing the same |
| CN114641141B (en) * | 2020-12-16 | 2024-09-13 | 深南电路股份有限公司 | Manufacturing method of circuit board, circuit board and electronic device |
-
1994
- 1994-09-07 JP JP21395694A patent/JP3251785B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0878799A (en) | 1996-03-22 |
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