JP3274366B2 - Method for producing transparent electrode thin film - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

The present invention relates to a method for producing a transparent electrode material, and more particularly to a method for producing a transparent electrode thin film provided on polyethersulfone, polyester or the like.

[0002]

2. Description of the Related Art Conventionally, a transparent conductive film used as a transparent electrode for liquid crystal display, electroluminescence and the like is made by rolling a transparent conductive film forming material such as indium tin oxide (ITO) in a vacuum process using a sputtering method or the like. Manufactured by rolls.

[0003] The transparent conductive film manufactured in this manner has different types and thicknesses of the base material on which ITO is formed depending on the intended use. There are optimal transport conditions for the film.
In recent years, there is a substrate on which anti-reflection or slippery coating has been applied, and it is difficult to set optimum transport conditions. In the thin film forming process, a particular problem is slippage between the film and the driving roll. Once a large slip occurs, the set speed and the actual film speed are different, so the thickness of the formed transparent conductive film is different from the designed value. As a result, the desired sheet resistance cannot be obtained. Since the resistance monitoring device that measures the formed sheet resistance and the thin film formation process chamber are generally separated, there is a time lag before the sheet resistance value when slipping appears on the monitor, so you should be aware of the occurrence of slippage. The current situation was to be late.

However, most of the slip phenomenon can be completely stopped by resetting the transport system such as tension adjustment while the slip in the initial stage is small (within a speed difference of 1%). If this timing is missed, there is a high possibility that all processes must be stopped before resetting the film transport system. In particular, in the case of a vacuum apparatus, it takes a lot of time to release air to the atmosphere, which must be performed when the transfer system is reset, and to evacuate after resetting, and wasteful man-hours increase. Therefore, it is important to detect slippage at an early stage.

[0005]

When a transparent electrode thin film is manufactured by using a roll-to-roll vacuum film forming apparatus, slippage between a film and a driving roll, which is particularly problematic, is controlled by a method which can be easily detected at low cost. A manufacturing method is provided.

[0006]

The [Summary of the present invention, in the vacuum deposition apparatus of roll-to-roll, using two rotational speed detector, one of the rotational speed of the drive rolls in contact with the drive roll, other One is a method of manufacturing a transparent electrode thin film in which the speed of the film is measured by bringing the film into contact with the film, and the film speed is compared to control the transport of the film. This is a method for producing a transparent electrode thin film, which is a film forming apparatus and a roll-to-roll vacuum film forming apparatus is an ion plating vacuum film forming apparatus.

[0007]

DESCRIPTION OF THE PREFERRED EMBODIMENTS FIG. 1 shows a sputtering apparatus incorporating the present invention. The computer calculates the number of pulses per unit time generated from the rotation speed detector (1) installed on the driving roll and the number of pulses per unit time generated from the rotation speed detector (2) installed on the transport film. Compare in 3). If there is a difference between the compared pulse numbers, the computer (3) adjusts the tension setting according to the slip condition.

When the number of pulses of the rotation speed detector (1) exceeds the number of pulses of the rotation speed detector (2), the tension of the unwinding roll is reduced in the range of 1 to 10%, and the tension of the winding roll is reduced. The computer (3) issues an instruction to increase the value in the range of 1 to 10%. Conversely, when the number of pulses of the rotation speed detector (1) becomes smaller than the number of pulses of the rotation speed detector (2), the tension of the unwinding roll is set to 1 to 10.
% And the tension of the take-up roll is 1 to 1
Calculator (3) issues an instruction to lower it within the range of 0%. If the rotation speed detectors (1) and (2) are repeated until there is no difference in the number of pulses, unwinding and winding are balanced, and the slipping phenomenon stops. The advantage of this method is that it enables stable transport of any kind of slippery film at low cost. Although this method can be applied to any method for forming a thin film in a vacuum state, it is preferable for a sputtering vacuum film forming apparatus and an ion plating vacuum film forming apparatus.

[0009]

【Example】

Example 1 ITO sputtering was performed on a PET film having a width of 650 mm and a thickness of 125 μm using a vacuum film forming apparatus equipped with a system according to the present invention. Film transport speed is 1m / min, tension is 1N for both unwinding and winding
/ Cm until the sliding phenomenon appeared. In FIG. 2, the vertical axis represents the sheet resistance value, and the horizontal axis represents the position in the film flow direction with the position at which slipping starts as 0 m. It can be seen that the slip control performed in the initial stage has no effect on the sheet resistance value, which indicates the production quality.

Comparative Example 1 A conventional vacuum film forming apparatus has a width of 65
ITO sputtering was performed on a PET film having a thickness of 0 mm and a thickness of 125 μm. The film was conveyed at a speed of 1 m / min. The tension was 1 N / cm for both unwinding and winding until the sliding phenomenon appeared. The vertical axis in FIG. 3 represents the sheet resistance value, and the horizontal axis represents the position in the film flow direction with the position at which slipping starts as 0 m. It can be seen that the sheet resistance, which indicates the production quality, has increased at the time when slippage occurs.

[0011]

By using the method for controlling the conveyance of a film according to the present invention, it is possible to detect and prevent slippage of the film at low cost and with high accuracy, and it is possible to greatly reduce the number of steps required for resetting and to improve the yield. .

[Brief description of the drawings]

FIG. 1 is a schematic view of an apparatus of the present invention.

FIG. 2 is a sheet resistance value of Example 1.

FIG. 3 is a sheet resistance value of Comparative Example 1.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 Rotation speed detector (1) 2 Rotation speed detector (2) 3 Computer 4 Unwind roll 5 Take-up roll 6 Drive roll 7 Unwind tension controller 8 Take-up tension controller 9 Film base material 10 Vacuum tank 11 Sputtering target

Claims (3)

(57) [Claims] 1. A roll-to-roll vacuum deposition apparatus, using a two speed detector, one is rotational speed of the contacted by drive roll to the drive roll and one in contact with the film Film And measuring the speeds of the films and comparing the measured speeds to control the transport of the film. 2. The method for producing a transparent electrode thin film according to claim 1, wherein the roll-to-roll vacuum film forming apparatus is a sputtering vacuum film forming apparatus. 3. The method according to claim 1, wherein the roll-to-roll vacuum film forming apparatus is an ion plating vacuum film forming apparatus.