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JP3276385B2 - Method of forming polymer film - Google Patents
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JP3276385B2 - Method of forming polymer film - Google Patents

Method of forming polymer film

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Publication number
JP3276385B2
JP3276385B2 JP33869491A JP33869491A JP3276385B2 JP 3276385 B2 JP3276385 B2 JP 3276385B2 JP 33869491 A JP33869491 A JP 33869491A JP 33869491 A JP33869491 A JP 33869491A JP 3276385 B2 JP3276385 B2 JP 3276385B2
Authority
JP
Japan
Prior art keywords
film
substrate
polymer film
catalyst
polyacetylene
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP33869491A
Other languages
Japanese (ja)
Other versions
JPH05175485A (en
Inventor
伸夫 佐々木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP33869491A priority Critical patent/JP3276385B2/en
Publication of JPH05175485A publication Critical patent/JPH05175485A/en
Application granted granted Critical
Publication of JP3276385B2 publication Critical patent/JP3276385B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Electroluminescent Light Sources (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Non-Insulated Conductors (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は基板などの上に配向し
た、プリント板やIC内部の配線材料として有用な導電
性高分子膜を形成させる方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for forming a conductive polymer film oriented on a substrate or the like and useful as a wiring material inside a printed board or an IC.

【0002】[0002]

【従来の技術】集積回路には、一般に、トランジスタ部
分として、Si、GaAs等の無機半導体が用いられ、
また配線部分として、濃くドープされたSi、Al、W
等の無機金属が用いられている。一方、例えばポリアセ
チレンなどの有機の導電性高分子膜は半導体としての性
質を持っていることが知られており、この高分子膜を用
いてトランジスタをつくることができる。また、かかる
有機の導電性高分子膜にハロゲン分子や五フッ化ヒ素な
どのドーパントをドープした導電性有機高分子膜では、
例えばポリアセチレンのように銅並の電気伝導度を示す
ものが得られるようになってきた。これらの膜は有機物
であるから、軽量でフレキシブルであり、安価に大量に
作ることが可能である。
2. Description of the Related Art In general, an integrated circuit uses an inorganic semiconductor such as Si or GaAs as a transistor portion.
Further, as the wiring portion, heavily doped Si, Al, W
And the like are used. On the other hand, it is known that an organic conductive polymer film such as polyacetylene has a property as a semiconductor, and a transistor can be formed using the polymer film. Further, in a conductive organic polymer film obtained by doping a dopant such as a halogen molecule or arsenic pentafluoride into the organic conductive polymer film,
For example, materials having an electric conductivity comparable to that of copper, such as polyacetylene, have been obtained. Since these films are organic, they are lightweight and flexible, and can be mass-produced at low cost.

【0003】従来は、有機高分子膜の電気伝導度を高め
るためには、基板の上に触媒を塗布し、アセチレンなど
のモノマー分子の重合により基板上に導電性高分子膜を
作成した後、基板から高分子膜を剥がして延伸すること
により行なっていた。これは、重合した直後の導電性高
分子膜は、一般に、その中の分子が無配向で、この膜を
延伸すると、配向性が増し、電気伝導度も2〜3桁向上
し、例えばポリアセチレン膜の場合には、銅なみの電気
伝導度(数十万S(シーメンス)/cm)が得られる(文
献:H. Naarmann and N. Theophilou, Synthetic Metal
s, 22 (1987) 1参照)。
Conventionally, in order to increase the electric conductivity of an organic polymer film, a catalyst is applied on a substrate and a conductive polymer film is formed on the substrate by polymerizing monomer molecules such as acetylene. This has been done by peeling off the polymer film from the substrate and stretching it. This is because, in a conductive polymer film immediately after polymerization, molecules in the film are generally non-oriented, and when this film is stretched, the orientation is increased, and the electric conductivity is improved by two to three digits. For example, a polyacetylene film In the case of (1), an electrical conductivity comparable to copper (several hundred thousand S (Siemens) / cm) can be obtained (Reference: H. Naarmann and N. Theophilou, Synthetic Metal)
s, 22 (1987) 1).

【0004】別の方法として、液晶(溶媒)に触媒を溶
かして、この触媒液に対して、10kガウス程度の強磁場
を印加し、液晶を配向させた状態でアセチレンなどのモ
ノマーを重合させると、延伸しなくても配向膜を得るこ
とができる。この場合の電気伝導度は1万S/cm程度で
ある(文献:K. Akagi, S. Katayama, M. Ito, H. Shir
akawa, and K. Araya, Synthetic Metals, 28 (1989) D
51参照)。
Another method is to dissolve a catalyst in a liquid crystal (solvent), apply a strong magnetic field of about 10 kGauss to the catalyst solution, and polymerize a monomer such as acetylene while the liquid crystal is oriented. An orientation film can be obtained without stretching. The electric conductivity in this case is about 10,000 S / cm (Reference: K. Akagi, S. Katayama, M. Ito, H. Shir)
akawa, and K. Araya, Synthetic Metals, 28 (1989) D
51).

【0005】[0005]

【発明が解決しようとする課題】しかしながら、前記し
た配向した導電性高分子膜を得る方法のうち、第一の延
伸方法は基板から高分子膜を剥がして、延伸しなければ
ならない。この延伸法では高い電気伝導度を有する高分
子膜を得ることができるが、それをプリント板とかIC
内部配線として用いるには、再び基板に張りつける必要
があるという問題がある。一方、液晶(溶媒)に溶解し
た触媒を磁場中で用いる方法は、基板上に直接配向膜を
得ることはできるが、この方法では、電気伝導度の値が
延伸法によるものに比較して1桁以上小さく、また、強
磁場下での重合のために大がかりな装置を必要とすると
いう問題がある。
However, of the above-mentioned methods for obtaining an oriented conductive polymer film, the first stretching method involves peeling the polymer film from the substrate and stretching. With this stretching method, a polymer film having high electrical conductivity can be obtained, but it can be obtained using a printed board or IC.
In order to use it as an internal wiring, there is a problem that it needs to be attached to the substrate again. On the other hand, in a method using a catalyst dissolved in a liquid crystal (solvent) in a magnetic field, an alignment film can be directly obtained on a substrate. However, in this method, the value of electric conductivity is 1 compared to that obtained by a stretching method. There is a problem that a large-scale apparatus is required for polymerization under an intense magnetic field.

【0006】従って、本発明は、簡便な構成で、基板上
に電気伝導度の高い配向した導電性高分子膜を直接重合
させる方法を提供することにある。
Accordingly, an object of the present invention is to provide a method for directly polymerizing an oriented conductive polymer film having high electric conductivity on a substrate with a simple structure.

【0007】[0007]

【課題を解決するための手段】本発明に従えば、基板表
面に薄膜を形成する工程と、該基板表面をレーザビーム
で一方向にスキャンし、該薄膜表面に一方向性の縞状凹
凸を施す工程と、その表面に触媒を塗布する工程と、そ
の触媒にモノマーを接触させて気相触媒重合を行う工程
の各工程を含んで成ることを特徴とする、基板上に配向
した導電性高分子膜を形成する方法が提供される。
According to the present invention, a step of forming a thin film on a substrate surface, and a step of scanning the substrate surface in one direction with a laser beam to form unidirectional striped irregularities on the thin film surface. A step of applying a catalyst to the surface thereof, and a step of contacting a monomer with the catalyst to perform gas-phase catalytic polymerization. A method for forming a molecular film is provided.

【0008】本発明に従えば、先ず、SiO2、Si3N4 、S
- などの基板の表面上にポリテトラフルオロエチレンな
どの薄膜(例えば厚さ 0.5〜10μm) を常法により塗布
する。ポリテトラフルオロエチレンは絶縁性で或る程度
の耐熱性を有し、かつ電気的に悪影響を及ぼさないので
基板上に積層するのに好適である。
According to the present invention, first, SiO 2 , Si 3 N 4 , S
- a thin film (e.g., thickness 0.5 to 10 [mu] m), such as polytetrafluoroethylene on the surface of a substrate, such as a conventional method by applying. Polytetrafluoroethylene is suitable for lamination on a substrate because it is insulative and has a certain degree of heat resistance and does not adversely affect electricity.

【0009】本発明によれば、前記したポリテトラフル
オロエチレンなどの膜にレーザビームを一方向にスキャ
ンして膜表面に一方向性又は一軸性の縞状凹凸(深さ
0.3〜1.2 μm程度)を施し、その表面に触媒を塗布す
る。触媒としては従来からポリアセチレンなどの重合に
一般的に使用されている触媒、例えばチーグラーナッタ
触媒を用いることができる。
According to the present invention, the film of polytetrafluoroethylene or the like is scanned with a laser beam in one direction to form a unidirectional or uniaxial stripe-like unevenness (depth) on the film surface.
(Approximately 0.3 to 1.2 μm), and apply a catalyst to the surface. As the catalyst, a catalyst generally used for polymerization of polyacetylene or the like, for example, a Ziegler-Natta catalyst can be used.

【0010】ポリテトラフルオロエチレンなどの膜の一
方向性の縞状凹凸に塗布された触媒にアセチレンなどの
モノマーを接触させる時間を調節することにより、膜厚
の 0.1〜30μmの膜が成長する。系を真空に引いてアセ
チレンを系内から除去することにより重合は停止する。
また生成した膜は例えばトルエンなどの溶媒で洗浄する
ことによりポリマー膜中から触媒を除去することができ
る。
A film having a thickness of 0.1 to 30 μm is grown by adjusting the time for bringing a monomer such as acetylene into contact with the catalyst coated on the unidirectional striped unevenness of the film such as polytetrafluoroethylene. The polymerization is stopped by applying vacuum to remove acetylene from the system.
Further, the catalyst can be removed from the polymer film by washing the formed film with a solvent such as toluene.

【0011】配線として用いる場合はこの膜に気相中よ
り例えば沃素をドープすることで電気伝導度を向上させ
ることができる。トランジスタとして用いる場合は、ド
ープしていない状態あるいは、薄いドーピングをした
後、絶縁膜を介してゲート電極を設け、かつソース・ド
レインのコンタクトを形成することによって可能とな
る。なお、ドープ剤としては例えばAsF5、H2SO4 、IC
l3、HNO3なども用いることができる。
When the film is used as a wiring, the electric conductivity can be improved by doping this film with, for example, iodine from the gas phase. In the case of using as a transistor, it becomes possible by providing a gate electrode via an insulating film and forming a source / drain contact after undoping or lightly doping. As the dopant, for example, AsF 5 , H 2 SO 4 , IC
l 3 , HNO 3 and the like can also be used.

【0012】[0012]

【実施例】以下、実施例により本発明を具体的に説明す
るが、本発明を以下の実施例に限定するものでないこと
はいうまでもない。
EXAMPLES Hereinafter, the present invention will be described in detail with reference to Examples, but it goes without saying that the present invention is not limited to the following Examples.

【0013】SiO2 基板1の表面にポリテトラフルオ
ロエチレンの膜2を膜厚1μmに塗布し、この基板1を
図1に示すように、XYステージ4上に設けたホットチ
ャック3上に配置した。XYステージ4をXY方向にス
キャンしながらArレーザ5を全面に照射した。このよ
うにして基板1上のポリテトラフルオロエチレンの膜2
の表面をレーザビーム6で一方向にスキャンした。使用
したレーザのパワーは0.5 W、スキャンスピードは10mm
/sec 、スポットサイズは30μm、スキャンピッチは10
μm、基板温度は 100℃(ホットチャック3で加熱)で
あった。
A polytetrafluoroethylene film 2 is applied to a surface of a SiO 2 substrate 1 to a thickness of 1 μm, and this substrate 1 is placed on a hot chuck 3 provided on an XY stage 4 as shown in FIG. . While scanning the XY stage 4 in the XY directions, the entire surface was irradiated with the Ar laser 5. Thus, the polytetrafluoroethylene film 2 on the substrate 1
Was scanned in one direction by a laser beam 6. Laser power used is 0.5 W, scan speed is 10 mm
/ Sec, spot size is 30 μm, scan pitch is 10
μm, and the substrate temperature was 100 ° C. (heated by the hot chuck 3).

【0014】一方、ブトキシチタンとトリエチルアルミ
ニウムとをモル比1:4で、トルエン中にチタンの量が
100mmol/リットルとなるように混合し、その後、室温
で1時間アルゴン雰囲気中で熟成した。このようにして
調製した触媒のトルエン溶液を上でレーザスキャンした
基板1上のポリテトラフルオロエチレン膜2の上に塗布
し、−78℃に冷却した(膜質を良くする)。次に図2に
示したような装置を用いて、反応瓶7の内部雰囲気を一
度真空にし、次に、系内にアセチレンガス8を0.4 気圧
導入し、重合させた。このようにして約 1.0μmの膜厚
で導電性高分子膜であるポリアセチレンの膜を基板上で
成長させた。アセチレンガスをコールドトラップにトラ
ップし反応瓶7内の雰囲気を真空にすることにより重合
反応を停止させた。図2において9は冷浴、10は液体窒
素のコールドトラップである。
On the other hand, butoxytitanium and triethylaluminum are mixed at a molar ratio of 1: 4 and the amount of titanium in toluene is reduced.
The mixture was mixed at 100 mmol / liter, and then aged at room temperature for 1 hour in an argon atmosphere. The thus-prepared toluene solution of the catalyst was applied onto the polytetrafluoroethylene film 2 on the substrate 1 on which laser scanning was performed, and cooled to -78 ° C (improving the film quality). Next, using an apparatus as shown in FIG. 2, the internal atmosphere of the reaction bottle 7 was once evacuated, and then an acetylene gas 8 was introduced into the system at 0.4 atm for polymerization. Thus, a polyacetylene film as a conductive polymer film having a thickness of about 1.0 μm was grown on the substrate. The polymerization reaction was stopped by trapping acetylene gas in a cold trap and evacuating the atmosphere in the reaction bottle 7. In FIG. 2, 9 is a cold bath, and 10 is a cold trap for liquid nitrogen.

【0015】次に、図3に示すように、反応瓶7内にト
ルエン11を導入して、トルエンにてポリアセチレン膜を
重合させた基板を洗浄し、ポリアセチレン膜中に含まれ
ている触媒を除去した。次にポリアセチレン膜を真空乾
燥すると、ポリテトラフルオロエチレンの薄い膜の上に
導電性高分子膜であるポリアセチレンの配向膜が得られ
た。
Next, as shown in FIG. 3, toluene 11 is introduced into the reaction bottle 7, the substrate on which the polyacetylene film is polymerized with toluene is washed, and the catalyst contained in the polyacetylene film is removed. did. Next, the polyacetylene film was vacuum-dried, and an oriented film of polyacetylene, which was a conductive polymer film, was obtained on a thin film of polytetrafluoroethylene.

【0016】上で得られたポリアセチレン膜は、配線と
して用いるためには、この膜に気相中より例えば沃素を
ドープすることによって電気伝導度を向上させることが
できる。室温で約5時間、沃素ドーピングすることによ
り5万S/cmの電気伝導度が得られた。
In order to use the polyacetylene film obtained above as a wiring, the electrical conductivity can be improved by doping the film with, for example, iodine from a gas phase. An electrical conductivity of 50,000 S / cm was obtained by iodine doping at room temperature for about 5 hours.

【0017】別の実施例として、SiO2基板上に、ポリシ
リコンを約5000Å堆積し、これを一方向にレーザアニー
ルした後、この表面に上記と同様の配向ポリアセチレン
膜(電気伝導度:約2万S/cm)を得ることができた。
この例では、レーザアニールは基板温度 400℃、レーザ
パワー3Wで行なった。
In another embodiment, polysilicon is deposited on an SiO 2 substrate by about 5,000 ° and laser-annealed in one direction, and then the same oriented polyacetylene film (electric conductivity: about 2 10,000 S / cm).
In this example, laser annealing was performed at a substrate temperature of 400 ° C. and a laser power of 3 W.

【0018】[0018]

【発明の効果】以上説明したように、本発明に従えば、
基板上に直接に、かつ磁場印加のような大型の設備を用
いることなく、簡単に導電性高分子膜の配向膜を形成さ
せることができる。
As described above, according to the present invention,
An alignment film of a conductive polymer film can be easily formed directly on a substrate without using a large-scale facility such as application of a magnetic field.

【図面の簡単な説明】[Brief description of the drawings]

【図1】図1は、本発明の第一の実施例において基板上
のポリテトラフルオロエチレン薄膜をレーザアニールす
る操作を説明する図面である。
FIG. 1 is a drawing for explaining an operation of laser annealing a polytetrafluoroethylene thin film on a substrate in a first embodiment of the present invention.

【図2】図2は本発明の第一の実施例において基板上の
レーザアニールした膜上にポリアセチレンの膜を成長さ
せる操作を説明する図面である。
FIG. 2 is a view for explaining an operation of growing a polyacetylene film on a laser-annealed film on a substrate in the first embodiment of the present invention.

【図3】図3は成長したポリアセチレンの膜をトルエン
で洗浄する操作を示す図面である。
FIG. 3 is a view showing an operation of washing a grown polyacetylene film with toluene.

【符号の説明】[Explanation of symbols]

1…基板 2…ポリテトラフルオロエチレン膜 3…ホットチャック 4…XYステージ 5…Arレーザ 6…レーザビーム 7…反応瓶 8…アセチレンガス 9…冷浴 10…液体窒素のコールドトラップ 11…トルエン DESCRIPTION OF SYMBOLS 1 ... Substrate 2 ... Polytetrafluoroethylene film 3 ... Hot chuck 4 ... XY stage 5 ... Ar laser 6 ... Laser beam 7 ... Reaction bottle 8 ... Acetylene gas 9 ... Cold bath 10 ... Cold trap of liquid nitrogen 11 ... Toluene

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI H05K 3/10 H01L 21/88 M (58)調査した分野(Int.Cl.7,DB名) H01L 51/00 C08G 63/78 H01B 1/12 H01B 5/14 H01L 21/3205 H05K 3/10 ──────────────────────────────────────────────────の Continuation of the front page (51) Int.Cl. 7 identification code FI H05K 3/10 H01L 21/88 M (58) Field surveyed (Int.Cl. 7 , DB name) H01L 51/00 C08G 63 / 78 H01B 1/12 H01B 5/14 H01L 21/3205 H05K 3/10

Claims (2)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 基板表面に薄膜を形成する工程と、 該基板表面をレーザービームで一方向にスキャンし、該
薄膜表面に一方向性の縞状凹凸を施す工程と、 薄膜表面に触媒を塗布する工程と、 触媒にモノマーを接触させて気相触媒重合を行う工程
と、 を備えることを 特徴とする高分子膜の形成方法。
And 1. A process for forming a thin film on the substrate surface, the substrate surface was scanned in one direction with a laser beam, a step of applying a unidirectional stripe unevenness on the thin film surface, a catalyst to the thin film surface a step of applying, the step of performing a gas phase catalytic polymerization by contacting a monomer in the catalyst
Method of forming a polymer film, characterized in that it comprises a and.
【請求項2】 前記薄膜が、ポリテトラフルオロエチレ
ンであることを特徴とする請求項1記載の高分子膜の
形成方法
2. The polymer film according to claim 1 , wherein said thin film is polytetrafluoroethylene .
Forming method .
JP33869491A 1991-12-20 1991-12-20 Method of forming polymer film Expired - Lifetime JP3276385B2 (en)

Priority Applications (1)

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Application Number Priority Date Filing Date Title
JP33869491A JP3276385B2 (en) 1991-12-20 1991-12-20 Method of forming polymer film

Publications (2)

Publication Number Publication Date
JPH05175485A JPH05175485A (en) 1993-07-13
JP3276385B2 true JP3276385B2 (en) 2002-04-22

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Country Link
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Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW555790B (en) 2000-12-26 2003-10-01 Matsushita Electric Industrial Co Ltd Conductive organic thin film, process for producing the same, and organic photoelectronic device, electric wire, and electrode aech employing the same
DE60216257T2 (en) * 2001-04-17 2007-06-14 Matsushita Electric Industrial Co., Ltd., Kadoma Conductive organic thin film, process for its manufacture, as well as electric and electrical cables that make use of it

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2980130B2 (en) 1990-08-29 1999-11-22 富士通株式会社 Polymer film growth method

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2980130B2 (en) 1990-08-29 1999-11-22 富士通株式会社 Polymer film growth method

Also Published As

Publication number Publication date
JPH05175485A (en) 1993-07-13

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