JP3323337B2 - TiO2-CaO-NiO based non-magnetic substrate material - Google Patents
TiO2-CaO-NiO based non-magnetic substrate materialInfo
- Publication number
- JP3323337B2 JP3323337B2 JP27587294A JP27587294A JP3323337B2 JP 3323337 B2 JP3323337 B2 JP 3323337B2 JP 27587294 A JP27587294 A JP 27587294A JP 27587294 A JP27587294 A JP 27587294A JP 3323337 B2 JP3323337 B2 JP 3323337B2
- Authority
- JP
- Japan
- Prior art keywords
- cao
- substrate material
- nio
- magnetic substrate
- tio
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000000758 substrate Substances 0.000 title claims description 21
- 239000000463 material Substances 0.000 title claims description 20
- 229910010413 TiO 2 Inorganic materials 0.000 claims description 13
- 239000000203 mixture Substances 0.000 claims description 8
- 239000000696 magnetic material Substances 0.000 description 7
- 238000010586 diagram Methods 0.000 description 5
- 239000010409 thin film Substances 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 3
- 239000000654 additive Substances 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- 229910000702 sendust Inorganic materials 0.000 description 2
- 239000011230 binding agent Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000010298 pulverizing process Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
Landscapes
- Magnetic Heads (AREA)
- Compositions Of Oxide Ceramics (AREA)
- Thin Magnetic Films (AREA)
Description
【０００１】[0001]
【産業上の利用分野】本発明は、ＨＤＤ及びビデオ用読
み書きヘッドに用いられる磁性材料（バルク、薄膜等）
用非磁性基板材料に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a magnetic material (bulk, thin film, etc.) used for HDD and video read / write head.
Non-magnetic substrate material for use.
【０００２】[0002]
【従来の技術】従来、この種の非磁性基板材料に関して
は、使用される磁性材料を基板上にスパッタリング等で
薄膜形成する際、基板−磁性体間の熱収縮の差から生ず
る残留歪によって、ヘッド出力が低下するので、薄膜を
形成する磁性体の熱膨張係数（α）に近いαを有する基
板材料が求められていた。2. Description of the Related Art Conventionally, regarding a non-magnetic substrate material of this type, when a magnetic material to be used is formed into a thin film on a substrate by sputtering or the like, a residual strain caused by a difference in thermal shrinkage between the substrate and the magnetic material causes a problem. Since the head output decreases, a substrate material having an α close to the thermal expansion coefficient (α) of the magnetic material forming the thin film has been required.
【０００３】例として、磁性材として、センダストを用
いる際には、１００〜４００℃の温度範囲で１３０〜１
５０×１０-7程度のαを持った基板材料が必要とされて
いた。これに対し、従来のＴｉＯ2−ＣａＯ−ＮｉＯ系
基板では、１００〜４００℃の温度範囲では１３０〜１
５０×１０-7のαを有していたが、他のＭｎＯ−ＮｉＯ
系及びＮｉＯ−ＣｏＯ系基板と比較して、同程度のαで
も、ヘッド出力が低くなる傾向が見られた。[0003] For example, when Sendust is used as a magnetic material, a temperature of 100 to 400 ° C and a temperature of 130 to 1 ° C are required.
A substrate material having an α of about 50 × 10 −7 has been required. On the other hand, in the case of the conventional TiO 2 —CaO—NiO-based substrate, 130 to 1 in the temperature range of 100 to 400 ° C.
Had an α of 50 × 10 −7 , but other MnO—NiO
As compared with the Ni-based and NiO-CoO-based substrates, there was a tendency that the head output was reduced even at the same level of α.
【０００４】[0004]
【発明が解決しようとする課題】本発明の技術的課題
は、１００〜２００℃の温度範囲（温度範囲△Ｔ1）
と、１００〜４００℃の温度範囲（温度範囲△Ｔ）の両
方の温度範囲において、αを磁性材のαに近付け、１０
０〜４００℃の温度範囲、全域において、基板−磁性体
間の残留歪を少なくすることである。The technical object of the present invention is to provide a temperature range of 100 to 200 ° C. (temperature range ΔT 1 ).
In both temperature ranges of 100 to 400 ° C. (temperature range ΔT), α is brought close to α of the magnetic material, and
An object of the present invention is to reduce the residual strain between the substrate and the magnetic body in the temperature range of 0 to 400 ° C. and in the entire range.
【０００５】[0005]
【課題を解決するための手段】本発明によれば、温度範
囲△Ｔ1で１２０〜１３０×１０-7であり、温度範囲△
Ｔで１３０〜１５０×１０-7のαを有するＴｉＯ2−Ｃ
ａＯ−ＮｉＯ系基板材料に、添加物として、ＣｏＯを１
０〜３０ｗｔ％（全体のモル比で５〜２５ｍｏｌ％）を
含有せしめて、温度範囲△Ｔ1のαを１３０〜１５０×
１０-7とし、温度範囲△Ｔのαを１４０〜１５０×１０
-7とする非磁性基板材料が得られる。According to the present invention SUMMARY OF], a 120 to 130 × 10 -7 at a temperature range △ T 1, the temperature range △
TiO 2 —C with α at 130 to 150 × 10 −7 at T
CoO is added as an additive to aO-NiO-based substrate material.
0 to 30 wt% (5 to 25 mol% in total mole ratio), and α in the temperature range ΔT 1 is 130 to 150 ×
10 −7 and α in the temperature range ΔT is 140 to 150 × 10
-7 is obtained.
【０００６】又、本発明によれば、前記記載のＴｉＯ2
−ＣａＯ−ＮｉＯ系の非磁性基板材料において、ＴｉＯ
2−ＣａＯ−ＮｉＯの基本組成の比を１３.４モル％，１
３.４モル％，７３.２モル％としたことを特徴とするＴ
ｉＯ2−ＣａＯ−ＮｉＯ系非磁性基板材料が得られる。According to the present invention, there is provided the TiO 2 described above.
-CaO-NiO based non-magnetic substrate material, TiO
The basic composition ratio of 2- CaO-NiO was 13.4 mol%, 1
3.4 mol% and 73.2 mol%.
iO 2 -CaO-NiO based non-magnetic substrate material is obtained.
【０００７】[0007]
【作用】ＴｉＯ2−ＣａＯ−ＮｉＯ系非磁性基板材料の
熱膨張係数（α）は、１００〜２００℃でのαと１００
〜４００℃でのαが、それぞれ１２０×１０-7および１
４３×１０-7となっているので、２００〜４００℃での
熱膨張係数が相当に大きく、１００〜４００℃での熱膨
張の直線性が良くないことを示している。ＴｉＯ2−Ｃ
ａＯ−ＮｉＯをベースにして、これにＣｏＯを加える
と、１００〜２００℃のαが増大して、１４０×１０-7
程度となり、１００〜４００℃の温度範囲で熱膨張が一
様になって、センダスト等の金属磁性材料をスパッタリ
ングで薄膜形成するのに好適な非磁性基板材料となる。
特に、ＴｉＯ2−ＣａＯ−ＮｉＯの基本組成の比が１３.
４モル％，１３.４モル％，７３.２モル％の場合、焼成
条件に対して安定に上記特性が得られる。The thermal expansion coefficient (α) of the TiO 2 —CaO—NiO-based non-magnetic substrate material is α at 100 to 200 ° C.
Α at ℃ 400 ° C. are 120 × 10 −7 and 1 respectively.
Since it is 43 × 10 −7 , the coefficient of thermal expansion at 200 to 400 ° C. is considerably large, indicating that the linearity of thermal expansion at 100 to 400 ° C. is not good. TiO 2 -C
Based on aO-NiO and adding CoO thereto, α at 100 to 200 ° C. increases to 140 × 10 −7.
The thermal expansion becomes uniform in the temperature range of 100 to 400 ° C., and the nonmagnetic substrate material is suitable for forming a thin film of a metallic magnetic material such as sendust by sputtering.
In particular, the ratio of the basic composition of TiO 2 -CaO-NiO is 13.
In the case of 4 mol%, 13.4 mol%, and 73.2 mol%, the above characteristics can be obtained stably with respect to the firing conditions.
【０００８】[0008]
【実施例】以下、本発明の実施例について、図面を用い
て詳しく説明する。表１にベースとなるＴｉＯ2−Ｃａ
Ｏ−ＮｉＯ系基板材料の代表組成を示す。ベース材は、
各原料を所定の比率に配合後、２０Ｈｒ湿式混合した
後、１１００〜１２００℃で仮焼して作製した。Embodiments of the present invention will be described below in detail with reference to the drawings. Table 1 shows TiO 2 -Ca as a base.
The representative composition of the O-NiO-based substrate material is shown. The base material is
After blending each raw material at a predetermined ratio, the mixture was wet mixed for 20 hours, and then calcined at 1100 to 1200 ° C.
【０００９】[0009]
【表１】 [Table 1]
【００１０】表２に、評価対象となるＣｏＯの添加量が
４水準の組成と得られたαを示している。試料は、Ｃｏ
Ｏを添加物としてベース材仮焼粉末に添加した後、湿式
粉砕し、適量のバインダー添加後、１ｔ／ｃｍ2の圧力
によって、プレス成形した後、１３００℃で焼結し、最
終的にＨＩＰ処理して作製された。なお、ＣｏＯを添加
しないで同様に作製された試料のαは、表１に示してい
る。[0010] Table 2 shows the composition of four levels of CoO to be evaluated and the obtained α. The sample was Co
After adding O as an additive to the calcined base material powder, wet pulverizing, adding an appropriate amount of binder, press-molding under a pressure of 1 t / cm 2 , sintering at 1300 ° C., and finally HIPing It was produced. In addition, α of the sample similarly prepared without adding CoO is shown in Table 1.
【００１１】[0011]
【表２】 [Table 2]
【００１２】表２よると、添加量のＣｏＯ増加に伴い、
△Ｔ1域のαが１４５×１０-7まで増加していることが
分かる。又、同時に、△Ｔ域のαも１４３から１４９×
１０-7まで増加している。図１ないし図５に、αの温度
に対する挙動を図示する。図１は、ベース材（ＣｏＯを
含まない）、図２〜図５は表２の試料ＮｏのＡ３，Ａ
４，Ａ５およびＡ６に対応し、図の横軸に温度、縦軸に
試料の伸びをとっている。ベース材における低温域での
若干、傾きの小さな、すなわちαの低い領域が図４，５
のＣｏＯ添加量大なる範囲にては解消され、全体的にリ
ニアな膨張曲線へと曲線の形態が変化していく。つま
り、ＣｏＯの添加により、低温域のαが増加しているこ
とを示している。According to Table 2, as the amount of CoO increases,
It can be seen that α in the ΔT 1 region has increased to 145 × 10 −7 . At the same time, the α in the ΔT range is also from 143 to 149 ×
It has increased to 10 -7 . 1 to 5 show the behavior of α with respect to the temperature. 1 is a base material (not including CoO), and FIGS. 2 to 5 are A3 and A of sample Nos. In Table 2.
4, A5 and A6, the abscissa of the figure shows the temperature, and the ordinate shows the elongation of the sample. In the base material, in a low temperature region, a region having a small inclination, that is, a region in which α is low is shown in FIGS.
Is solved in the range where the amount of CoO added is large, and the shape of the curve changes to a linear expansion curve as a whole. In other words, it indicates that α in the low temperature range is increased by the addition of CoO.
【００１３】[0013]
【発明の効果】以上、述べたように、本発明によれば、
ＴｉＯ2−ＣａＯ−ＮｉＯ系基本組成にＣｏＯを５〜２
５ｍｏｌ％添加することにより、１００〜２００℃のα
が増加し、１００〜４００℃の温度範囲でのαも増加し
て、この温度範囲での熱膨張が滑らかとなり、スパッタ
リング等で磁性膜を形成する際に、熱膨張の差を解消し
て優れた非磁性基板となる。As described above, according to the present invention,
5 to 2 CoO in the TiO 2 -CaO-NiO-based basic composition
By adding 5 mol%, α at 100 to 200 ° C.
Increases in the temperature range of 100 to 400 ° C., and the thermal expansion in this temperature range becomes smooth, and when forming a magnetic film by sputtering or the like, the difference in thermal expansion is eliminated and excellent. It becomes a non-magnetic substrate.
【図１】ベース材（ＣｏＯの添加なし）の温度に対する
伸びを示す特性図。FIG. 1 is a characteristic diagram showing elongation with respect to temperature of a base material (without addition of CoO).
【図２】ＣｏＯの添加水準を変えて作製した試料Ａ３の
温度に対する伸びを示す特性図。FIG. 2 is a characteristic diagram showing elongation with respect to temperature of a sample A3 manufactured by changing the addition level of CoO.
【図３】ＣｏＯの添加水準を変えて作製した試料Ａ４の
温度に対する伸びを示す特性図。FIG. 3 is a characteristic diagram showing elongation with respect to temperature of a sample A4 manufactured by changing the addition level of CoO.
【図４】ＣｏＯの添加水準を変えて作製した試料Ａ５の
温度に対する伸びを示す特性図。FIG. 4 is a characteristic diagram showing elongation with respect to temperature of a sample A5 manufactured by changing the addition level of CoO.
【図５】ＣｏＯの添加水準を変えて作製した試料Ａ６の
温度に対する伸びを示す特性図。FIG. 5 is a characteristic diagram showing elongation with respect to temperature of a sample A6 manufactured by changing the addition level of CoO.
Claims (2)
とする非磁性基板材料において、前記基本組成に対し、
ＣｏＯを５〜２５ｍｏｌ％含有しており、かつ１００〜
２００℃および１００〜４００℃の各温度範囲における
熱膨張係数が、いずれも１３０〜１５０×１０-7である
ことを特徴とするＴｉＯ2−ＣａＯ−ＮｉＯ系非磁性基
板材料。1. A non-magnetic substrate material having a TiO 2 —CaO—NiO-based basic composition, wherein:
Containing 5 to 25 mol% of CoO, and
A TiO 2 —CaO—NiO-based non-magnetic substrate material having a thermal expansion coefficient of 130 to 150 × 10 −7 in each of temperature ranges of 200 ° C. and 100 to 400 ° C.
Ｏ系の非磁性基板材料において、ＴｉＯ2−ＣａＯ−Ｎ
ｉＯの基本組成の比を１３.４モル％，１３.４モル％，
７３.２モル％としたことを特徴とするＴｉＯ2−ＣａＯ
−ＮｉＯ系非磁性基板材料。2. The TiO 2 —CaO—Ni according to claim 1.
In an O-based non-magnetic substrate material, TiO 2 —CaO—N
The ratio of the basic composition of iO was 13.4 mol%, 13.4 mol%,
TiO 2 -CaO characterized by being 73.2 mol%.
-NiO based non-magnetic substrate material.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP27587294A JP3323337B2 (en) | 1994-10-14 | 1994-10-14 | TiO2-CaO-NiO based non-magnetic substrate material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP27587294A JP3323337B2 (en) | 1994-10-14 | 1994-10-14 | TiO2-CaO-NiO based non-magnetic substrate material |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH08119739A JPH08119739A (en) | 1996-05-14 |
| JP3323337B2 true JP3323337B2 (en) | 2002-09-09 |
Family
ID=17561616
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP27587294A Expired - Lifetime JP3323337B2 (en) | 1994-10-14 | 1994-10-14 | TiO2-CaO-NiO based non-magnetic substrate material |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3323337B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11485859B2 (en) | 2017-09-04 | 2022-11-01 | Lg Chem, Ltd. | Polyimide film for flexible display device substrate |
-
1994
- 1994-10-14 JP JP27587294A patent/JP3323337B2/en not_active Expired - Lifetime
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11485859B2 (en) | 2017-09-04 | 2022-11-01 | Lg Chem, Ltd. | Polyimide film for flexible display device substrate |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH08119739A (en) | 1996-05-14 |
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