JP3334960B2 - Defect inspection method for periodic pattern - Google Patents
Defect inspection method for periodic patternInfo
- Publication number
- JP3334960B2 JP3334960B2 JP24512393A JP24512393A JP3334960B2 JP 3334960 B2 JP3334960 B2 JP 3334960B2 JP 24512393 A JP24512393 A JP 24512393A JP 24512393 A JP24512393 A JP 24512393A JP 3334960 B2 JP3334960 B2 JP 3334960B2
- Authority
- JP
- Japan
- Prior art keywords
- periodic pattern
- signal
- defect
- sample
- inspection method
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Landscapes
- Length Measuring Devices By Optical Means (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Image Processing (AREA)
- Image Analysis (AREA)
Description
【0001】[0001]
【産業上の利用分野】本発明は、カラーテレビ用ブラウ
ン管に用いられるシャドウマスク、カラー撮像管用色分
解フィルタ、液体表示用カラーフィルタ、電子管に用い
られるメッシュ状電極、VDTフィルタ、フォトマス
ク、フレネルレンズ、レンチキュラーレンズなど一定の
光学的性質、形状をもつ単位(以下単位パターン)が1
次元方向、或いは2次元方向に規則的に繰り返し配列さ
れている工業製品、或いは単位パターンがその光学的性
質、形状及び1次元方向、2次元方向の配列ピッチが徐
々に変化しながら繰り返し配列されている工業製品の欠
陥を検出する方法に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a shadow mask used for a cathode ray tube for a color television, a color separation filter for a color image pickup tube, a color filter for a liquid display, a mesh electrode used for an electron tube, a VDT filter, a photomask, and a Fresnel lens. , A unit having a certain optical property and shape (hereinafter a unit pattern) such as a lenticular lens
An industrial product or a unit pattern that is regularly and repeatedly arranged in a two-dimensional direction or a two-dimensional direction is repeatedly arranged while its optical properties, shapes, and arrangement pitches in one-dimensional and two-dimensional directions are gradually changed. The present invention relates to a method for detecting defects in certain industrial products.
【0002】[0002]
【従来の技術】従来、上記の様な工業製品の欠陥検査に
ついては、配列単位及び欠陥形状を解像できる顕微鏡撮
影装置によってビデオ信号を調べてパターン認識を行う
方法、欠陥の無いパターンを同様に撮影して得られた信
号と比較する等の手段により欠陥を検出する方法、或い
は周期的開口をもつ製品についてはコヒーレント光を照
射した時の周期性パターンによる光の回折現象を利用す
る光学的フーリエ変換、空間フィルタリング法により欠
陥を検出する方法等が提案されているが、いずれの方法
においても検査時間がかかり、さらに微細な欠陥の検出
が困難である。この問題を解決するため、これまでエリ
アセンサまたはラインセンサを備えたテレビカメラで、
試料透過光を撮影した映像信号より欠陥を検出する方法
が提案されている。2. Description of the Related Art Conventionally, for the defect inspection of industrial products as described above, a method of recognizing a pattern by examining a video signal with a microscope photographing apparatus capable of resolving an array unit and a defect shape, and a method of recognizing a pattern having no defect in the same manner. A method of detecting defects by means such as comparing with a signal obtained by photographing, or for a product having a periodic aperture, an optical Fourier using a light diffraction phenomenon by a periodic pattern when irradiating coherent light. Although a method of detecting a defect by a conversion and a spatial filtering method and the like have been proposed, any of the methods requires an inspection time, and it is difficult to detect a finer defect. To solve this problem, TV cameras with area or line sensors
There has been proposed a method of detecting a defect from a video signal obtained by capturing light transmitted through a sample.
【0003】[0003]
【発明が解決しようとする課題】しかし、テレビカメラ
で試料透過光を撮影する方法では、より微細な欠陥を検
出する為にはカメラの解像度を上げねばならず、エリア
センサカメラを使用した場合、得られたエリアデータを
蓄えておかなければならない為、データ量が増加し検査
に時間がかかるという問題が生じる。又、ラインセンサ
カメラを使用した場合、エリアセンサカメラに比べ蓄え
るデータ量が少なくて済むため、高解像なカメラを使用
しても短時間で検査することが可能となるが、パターン
領域外に発生する信号及びパターン領域外周部エッジ信
号が欠陥と一緒に検出されてしまうため、この信号を除
去する必要が生じる。除去方法としては、得られた信号
を二次元画像に再構成し、マスキング処理にて除去する
方法があるが、この方法では結果としてエリアセンサカ
メラと同様に蓄えるデータ量が増加するため、大容量の
メモリーを必要とし、又検査に時間がかかると言う問題
が生じる。However, in the method of photographing the sample transmitted light with a television camera, the resolution of the camera must be increased in order to detect finer defects, and when an area sensor camera is used, Since the obtained area data must be stored, there arises a problem that the data amount increases and the inspection takes time. In addition, when a line sensor camera is used, the amount of data to be stored is smaller than that of an area sensor camera, so that inspection can be performed in a short time even with a high-resolution camera. Since the generated signal and the edge signal of the outer peripheral portion of the pattern area are detected together with the defect, it is necessary to remove this signal. As a removal method, there is a method of reconstructing the obtained signal into a two-dimensional image and removing it by a masking process. However, this method results in an increase in the amount of data to be stored as in the case of the area sensor camera. Requires a large amount of memory and takes a long time for inspection.
【0004】本発明は上記課題を解決するためのもの
で、周期性パターン部の外周位置を認識し、そのアドレ
スを元にパターン領域外に発生する信号及びパターン領
域外周部エッジ信号をカメラのスキャン毎に除去して検
査を行うことでエリアデータとして保存する必要がなく
なる為、これまでよりも高解像なラインセンサカメラを
使用して大容量のメモリを使用することなく短時間で検
査を行うことが可能な周期性パターンの欠陥検査方法を
提供することを目的とする。An object of the present invention is to solve the above-mentioned problem. A camera scans a signal generated outside a pattern area and a pattern area outer edge signal based on the address of the outer peripheral position of a periodic pattern portion. Since it is not necessary to save as area data by performing inspection after removing each time, inspection can be performed in a short time without using a large capacity memory using a line sensor camera with higher resolution than before. It is an object of the present invention to provide a periodic pattern defect inspection method capable of performing the defect inspection.
【0005】[0005]
【課題を解決するための手段】本発明は、試料移動装置
により一定速度で移動する周期性パターンを有する試料
を光源で照明し、その透過光を1個又は複数個のライン
センサで撮影した一次元データを基にして平滑化処理、
2値化処理、膨張処理、縮退処理、膨張処理をこの順に
行い、得られる2値信号の連結成分の両端を周期性パタ
ーンを有する領域の外周の位置として認識し、認識され
た領域外に発生する信号を除去し、試料の周期性パター
ンを形成している領域にのみ発生している欠陥を検出す
る周期性パターンの欠陥検査方法であって、前記膨張処
理及び縮退処理において膨張、縮退させる画素数は、周
期性パターン部最外周より数画素内側を外周として認識
できるように設定されることを特徴とする。SUMMARY OF THE INVENTION According to the present invention, there is provided a primary light source which illuminates a sample having a periodic pattern moving at a constant speed by a sample moving device with a light source, and photographs the transmitted light with one or a plurality of line sensors. Smoothing processing based on the original data,
Performing the binarization processing, expansion processing, reduction processing, and expansion processing in this order, and recognizes both ends of the connected component of the obtained binary signal as the position of the outer periphery of the area having the periodic pattern, and occurs outside the recognized area. A periodic pattern defect inspection method for detecting a defect occurring only in a region where a periodic pattern of a sample is formed, by removing a signal to be generated, the pixel being expanded and contracted in the expansion and contraction processing. The number is set such that an area several pixels inside the outermost circumference of the periodic pattern portion can be recognized as the outer circumference.
【0006】[0006]
【作用】本発明は、単位パターンの繰り返し配列からな
る周期性パターンに発生する欠陥を検査する方法であ
り、試料移動装置により一定速度で移動する試料を光源
で照明し、その透過光をラインセンサカメラで撮影して
得られる周期性パターンの画像データ(一次元データ)
を基にして周期性パターン部の外周を認識し、認識され
た領域以外に発生する信号(パターン領域外に発生する
信号及びパターン領域外周部エッジ信号)を逐一除去
し、欠陥検査を行うことにより、これまでよりも高速な
検査の実施が可能となる。According to the present invention, there is provided a method for inspecting a defect generated in a periodic pattern composed of a repetitive arrangement of unit patterns. The specimen moving device illuminates a sample moving at a constant speed with a light source, and transmits the transmitted light to a line sensor. Image data (one-dimensional data) of a periodic pattern obtained by shooting with a camera
By recognizing the outer periphery of the periodic pattern portion on the basis of the signal, removing signals generated outside the recognized region (signals generated outside the pattern region and edge signals of the outer periphery of the pattern region) one by one, and performing defect inspection. Thus, the inspection can be performed at a higher speed than before.
【0007】[0007]
【実施例】以下、実施例に基づき本発明を詳細に説明す
る。図1は本発明の一実施例を示す図であり、試料とし
てシャドウマスクを用いた場合について説明する。図
中、1はラインセンサカメラ、2はシャドウマスク、3
は搬送装置、4は光源、5はカメラコントローラ、6は
信号処理装置、7はホストコンピュータ、8は搬送制御
装置を表す。双方向に搬送可能な一軸搬送装置3により
一定速度で送られてくるシャドウマスク2(以下、SM
と言う)を光源4で照明して得られるSM透過光をCC
Dラインセンサカメラ1(以下ラインセンサ)で撮影し
て得られる画像信号からSMに発生する欠陥を抽出す
る。DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described below in detail based on embodiments. FIG. 1 is a view showing one embodiment of the present invention, and a case where a shadow mask is used as a sample will be described. In the figure, 1 is a line sensor camera, 2 is a shadow mask, 3
Denotes a transport device, 4 denotes a light source, 5 denotes a camera controller, 6 denotes a signal processing device, 7 denotes a host computer, and 8 denotes a transport control device. The shadow mask 2 (hereinafter, referred to as SM) sent at a constant speed by a uniaxial transfer device 3 capable of transferring in both directions.
Is transmitted by the light source 4 and the SM transmitted light obtained by CC
A defect generated in the SM is extracted from an image signal obtained by photographing with the D line sensor camera 1 (hereinafter, line sensor).
【0008】図2により周期性パターン部の外周位置の
認識方法を説明する。なお、図2において、縦軸は画像
信号の大きさ(試料の透過光強度)、横軸は画素数を示
している。図1のラインセンサで得られた画像信号に対
して信号処理装置6で平滑化処理を施した時の波形を図
2(a)に示す。図2(a)における各信号は、10は
周期性パターン、11は周波性パターンに発生した欠
陥、12はSMの端部に設けたトリミング用位置合わせ
穴、13はワーク端部で光源の光ガ直接入ってきた状態
等をそれぞれ例示的に示したものである。図2(a)の
信号を所定レベルでスライスすると図2(b)に示すよ
うな2値信号が得られる。なお、図2(b)ではワーク
端部の信号は除去している。この信号から周期性パター
ン10の外周を認識するには、周期性パターン部以外に
発生する信号を除去し、周期性パターン部に対応する信
号が連続した部分(信号連結成分)の両端の位置を求め
る必要がある為、まず図2(b)の信号を膨張処理す
る。この処理は、各信号の外周部に所定画素数分付加す
るものである。こうして、欠陥11により分割された周
期性パターン部を連結させて図2(c)の信号を得る。
このとき、トリミング用位置合わせ穴の信号も膨張処理
により幅広になっている。次に、図2(c)に示した信
号を縮退処理し、図2(d)に示すように、トリミング
用位置合わせ穴など周期性パターン部以外に発生する信
号を除去する。図2(d)に示す信号は、縮退処理によ
り実際の周期性パターンより幅狭になっているので、所
定画素数分膨張させて図2(e)の信号が得られる。な
お、膨張、縮退させる画素数は、微分処理等で強調され
る周期性パターン部とそれ以外の外周部との輝度差の信
号を検出しない様に周期性パターン部最外周より数画素
内側を外周として認識出来る様に設定する。以上の処理
で得られた図2(e)の信号の両端a、bを周期性パタ
ーン部の外周アドレスとして認識する。なお、外周アド
レスの認識は、検査に際して標準品に対してあらかじめ
求めるか、実際の検査品に対してその都度求めるように
する。A method of recognizing the outer peripheral position of the periodic pattern will be described with reference to FIG. In FIG. 2, the vertical axis represents the magnitude of the image signal (the transmitted light intensity of the sample), and the horizontal axis represents the number of pixels. FIG. 2A shows a waveform when the signal processing device 6 performs a smoothing process on the image signal obtained by the line sensor of FIG. 2A, 10 is a periodic pattern, 11 is a defect generated in a frequency pattern, 12 is a trimming positioning hole provided at an end of the SM, and 13 is a light source light at an end of the work. The state in which the gas has directly entered is exemplarily shown. When the signal of FIG. 2A is sliced at a predetermined level, a binary signal as shown in FIG. 2B is obtained. In FIG. 2B, the signal at the end of the work is removed. In order to recognize the outer periphery of the periodic pattern 10 from this signal, signals generated in portions other than the periodic pattern portion are removed, and the positions of both ends of a portion (signal connection component) where the signal corresponding to the periodic pattern portion is continuous are determined. Since the signal needs to be obtained, the signal in FIG. In this process, a predetermined number of pixels are added to the outer peripheral portion of each signal. In this manner, the periodic pattern portions divided by the defect 11 are connected to obtain a signal shown in FIG.
At this time, the signal of the trimming positioning hole is also widened by the expansion processing. Next, the signal shown in FIG. 2C is subjected to degeneration processing, and as shown in FIG. 2D, a signal generated in a portion other than the periodic pattern portion such as a trimming alignment hole is removed. Since the signal shown in FIG. 2D is narrower than the actual periodic pattern due to the degeneration processing, the signal shown in FIG. 2E is obtained by expanding the signal by a predetermined number of pixels. The number of pixels to be expanded and contracted is set to be several pixels inward from the outermost periphery of the periodic pattern portion so as not to detect a signal of a luminance difference between the periodic pattern portion emphasized by the differential processing and the other outer periphery. Set so that it can be recognized as. Both ends a and b of the signal of FIG. 2E obtained by the above processing are recognized as the outer peripheral address of the periodic pattern portion. Note that the perimeter address is determined in advance for a standard product during inspection or is determined each time for an actual inspection product.
【0009】以上で述べた外周認識による除去を検査で
行った例を図3に示す。撮影して得られる信号(図3
(a))より、図2で説明した方法によりa,bを外周
アドレスとして認識する。次に、図3(a)の信号に二
次微分処理した信号を図3(b)に示す。この信号の0
〜a画素、b〜N画素の領域に発生する周期性パターン
部以外の信号を除去し、図3(c)の信号を得る。この
信号にスライス処理を行い欠陥を抽出する。以上の方法
で検査することによりカメラのスキャン毎の欠陥検出が
可能となり、データを多量に蓄える必要がなくなるた
め、高解像なカメラ使用しても高速な検査が可能とな
る。FIG. 3 shows an example in which the above-described removal by outer periphery recognition is performed by inspection. Signal obtained by shooting (Fig. 3
(A)), a and b are recognized as the outer peripheral addresses by the method described with reference to FIG. Next, FIG. 3B shows a signal obtained by subjecting the signal of FIG. 3A to second-order differentiation. 0 of this signal
A signal other than the periodic pattern portion generated in the area of the pixels a to b and the pixels b to N is removed to obtain the signal of FIG. Slice processing is performed on this signal to extract defects. Inspection by the above method enables defect detection for each scan of the camera, and eliminates the need to store a large amount of data. Therefore, high-speed inspection can be performed even when a high-resolution camera is used.
【0010】[0010]
【発明の効果】以上のように本発明によれば、大量のメ
モリを使用することなく、これまでよりも高解像なライ
ンセンサカメラでの高速な検査が実現可能となる。As described above, according to the present invention, high-speed inspection with a line sensor camera having a higher resolution than before can be realized without using a large amount of memory.
【図1】 本発明の検査方法を実施するための図であ
る。FIG. 1 is a diagram for implementing an inspection method of the present invention.
【図2】 外周認識方法を説明する図である。FIG. 2 is a diagram illustrating an outer periphery recognition method.
【図3】 外周除去方法を説明する図である。FIG. 3 is a diagram illustrating an outer periphery removing method.
1…ラインセンサカメラ、2…シャドウマスク、3…搬
送装置、4…光源、5…カメラコントローラ、6…信号
処理装置、7…ホストコンピュータ、8…搬送制御装
置、10…周期性パターン、11…欠陥、12…トリミ
ング用位置合わせ穴に対応する信号、13…ワーク端部
に対応する信号。DESCRIPTION OF SYMBOLS 1 ... Line sensor camera, 2 ... Shadow mask, 3 ... Transport device, 4 ... Light source, 5 ... Camera controller, 6 ... Signal processing device, 7 ... Host computer, 8 ... Transport control device, 10 ... Periodic pattern, 11 ... Defects, 12: signal corresponding to trimming alignment hole, 13: signal corresponding to workpiece end.
───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 平4−120448(JP,A) 特開 昭61−256237(JP,A) 特開 平5−225336(JP,A) 実開 平2−20157(JP,U) (58)調査した分野(Int.Cl.7,DB名) G01N 21/84 - 21/958 G06T 1/00 - 9/40 ──────────────────────────────────────────────────続 き Continuation of the front page (56) References JP-A-4-120448 (JP, A) JP-A-61-256237 (JP, A) JP-A-5-225336 (JP, A) 20157 (JP, U) (58) Fields investigated (Int. Cl. 7 , DB name) G01N 21/84-21/958 G06T 1/00-9/40
Claims (1)
周期性パターンを有する試料を光源で照明し、 その透過光を1個又は複数個のラインセンサで撮影した
一次元データを基にして平滑化処理、2値化処理、膨張
処理、縮退処理、膨張処理をこの順に行い、 得られる2値信号の連結成分の両端を周期性パターンを
有する領域の外周の位置として認識し、 認識された領域外に発生する信号を除去し、 試料の周期性パターンを形成している領域にのみ発生し
ている欠陥を検出する周期性パターンの欠陥検査方法で
あって、 前記膨張処理及び縮退処理において膨張、縮退させる画
素数は、周期性パターン部最外周より数画素内側を外周
として認識できるように設定されることを特徴とする周
期性パターンの欠陥検査方法。1. A sample having a periodic pattern moving at a constant speed by a sample moving device is illuminated by a light source, and the transmitted light is photographed by one or a plurality of line sensors.
Based on the one-dimensional data, a smoothing process, a binarization process, an expansion process, a degeneration process, and an expansion process are performed in this order, and both ends of a connected component of the obtained binary signal are located at the outer periphery of a region having a periodic pattern. A periodic pattern defect inspection method for removing a signal generated outside the recognized area, and detecting a defect occurring only in a region where the periodic pattern is formed on the sample, A defect inspection method for a periodic pattern, wherein the number of pixels to be expanded and contracted in the expansion processing and the reduction processing is set so that a few pixels inside the outermost circumference of the periodic pattern portion can be recognized as the outer circumference.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24512393A JP3334960B2 (en) | 1993-09-30 | 1993-09-30 | Defect inspection method for periodic pattern |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24512393A JP3334960B2 (en) | 1993-09-30 | 1993-09-30 | Defect inspection method for periodic pattern |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH07103912A JPH07103912A (en) | 1995-04-21 |
| JP3334960B2 true JP3334960B2 (en) | 2002-10-15 |
Family
ID=17128969
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP24512393A Expired - Fee Related JP3334960B2 (en) | 1993-09-30 | 1993-09-30 | Defect inspection method for periodic pattern |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3334960B2 (en) |
-
1993
- 1993-09-30 JP JP24512393A patent/JP3334960B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH07103912A (en) | 1995-04-21 |
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