JP3358130B2 - Gas pyrolysis method - Google Patents
Gas pyrolysis methodInfo
- Publication number
- JP3358130B2 JP3358130B2 JP13768192A JP13768192A JP3358130B2 JP 3358130 B2 JP3358130 B2 JP 3358130B2 JP 13768192 A JP13768192 A JP 13768192A JP 13768192 A JP13768192 A JP 13768192A JP 3358130 B2 JP3358130 B2 JP 3358130B2
- Authority
- JP
- Japan
- Prior art keywords
- gas
- filler
- reaction
- tube
- reaction tube
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J8/00—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
- B01J8/02—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with stationary particles, e.g. in fixed beds
- B01J8/06—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with stationary particles, e.g. in fixed beds in tube reactors; the solid particles being arranged in tubes
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Treating Waste Gases (AREA)
- Devices And Processes Conducted In The Presence Of Fluids And Solid Particles (AREA)
Description
【0001】[0001]
【産業上の利用分野】本発明はガス熱分解装置に関し、
特には充填剤が充填された反応管にヒーターを設けてな
るガス熱分解装置に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a gas pyrolysis apparatus,
In particular, do not install a heater in the reaction tube filled with filler.
That relates to gas pyrolysis apparatus.
【0002】[0002]
【従来の技術】半導体製造プロセスにおいて有害ガスの
除害化は重要な課題である。様々ある有害ガスの除害方
法の中に、有害ガスを熱分解することによって除害化す
る方法がある。この方法に用いられている、従来のガス
熱分解装置を図4に基づいて以下に説明する。従来のガ
ス熱分解装置は、円柱形の反応管12とその上端に導入
管11を、下端に排出管13を接続し、上記反応管12
の外周にヒーター14を設けた構造となっている。上記
反応管12の内部には、それぞれの有害ガスに対する熱
分解反応による除害効果を持つ充填剤S1を充填する。
この充填剤S1は有害ガスとの接触面積を多く取るた
め、粒状として用いている。上記構成の装置を用いた、
有害ガスの除害化を説明する。有害ガスを導入管11か
ら反応管12に送り込む。反応管12の内部は、あらか
じめヒーター14で有害ガスと充填剤S1の熱分解反応
の温度領域に加熱しておく。反応管12に送り込まれた
有害ガスは、充填剤S1との熱分解反応によって除害化
され、反応管12の下端に接続した排出管13より排出
させる。2. Description of the Related Art Elimination of harmful gases is an important subject in a semiconductor manufacturing process. Among various harmful gas removal methods, there is a method of removing harmful gases by thermally decomposing them. A conventional gas pyrolysis apparatus used in this method will be described below with reference to FIG. In the conventional gas pyrolysis apparatus, a cylindrical reaction tube 12 is connected to an inlet tube 11 at an upper end thereof, and a discharge tube 13 is connected to a lower end thereof.
Is provided with a heater 14 on its outer periphery. The inside of the reaction tube 12 is filled with a filler S1 having a detoxifying effect by a thermal decomposition reaction on each harmful gas.
The filler S1 is used in a granular form in order to increase the contact area with the harmful gas. Using the device having the above configuration,
Explain the harmful gas removal. The harmful gas is sent from the inlet tube 11 to the reaction tube 12. The inside of the reaction tube 12 is previously heated by the heater 14 to a temperature range of a thermal decomposition reaction of the harmful gas and the filler S1. The harmful gas sent into the reaction tube 12 is detoxified by a thermal decomposition reaction with the filler S1, and is discharged from a discharge tube 13 connected to a lower end of the reaction tube 12.
【0003】[0003]
【発明が解決しようとする課題】しかし上記のガス熱分
解装置には、以下に示す問題があった。即ち、充填剤S
1は熱分解反応を繰り返すに従って粒径が小さくなり、
粉末充填剤S2となる。さらに熱分解反応を繰り返すこ
とによって、やがては粉末充填剤S2は消耗してなくな
る。しかし、粒径が小さくなった粉末充填剤S2は、消
耗してなくなるに到る前に反応管12の下方向に落下し
ていく。反応管12の両端部は、熱分解反応が起きにく
い領域であり、上記落下してきた粉末充填剤S2は、そ
れ以上熱分解反応を繰り返すことはなく、従って消耗し
てなくなるには到らない。また、熱分解反応によって減
少した充填剤S1は反応管12の上部から補充するた
め、末充填剤S2は反応管12の下端にそのまま残留す
る。以上を繰り返すことによって、反応管12の下端で
は徐々に粉末充填剤S2が堆積し、反応管12と排出管
13と連通する箇所を塞ぎ、ガス詰まりを引き起こす。
以上は、ガスの流れを反対にしても同様である。この発
明は、以上に述べた問題点を解決することを目的とす
る。However, the above gas pyrolysis apparatus has the following problems. That is, the filler S
1 is that the particle size becomes smaller as the thermal decomposition reaction is repeated,
It becomes powder filler S2. By further repeating the thermal decomposition reaction, the powder filler S2 is eventually consumed. However, the powder filler S2 having a reduced particle diameter falls downward in the reaction tube 12 before it is consumed and disappears. Both ends of the reaction tube 12 are regions where the thermal decomposition reaction is unlikely to occur, and the dropped powder filler S2 does not repeat the thermal decomposition reaction anymore, and thus does not become exhausted. Further, since the filler S1 reduced by the thermal decomposition reaction is replenished from the upper part of the reaction tube 12, the filler S2 remains at the lower end of the reaction tube 12. By repeating the above, the powder filler S2 gradually accumulates at the lower end of the reaction tube 12, closes a portion communicating with the reaction tube 12 and the discharge tube 13, and causes gas clogging.
The above is the same even if the flow of gas is reversed. An object of the present invention is to solve the problems described above.
【0004】[0004]
【課題を解決するための手段】上記目的を達成するため
の本発明は、フッ素を含む有害ガスを導入する導入管、
この入管に接続されシリコンを含む充填剤が充填される
反応管、この反応管に接続され有害ガスと充填剤との反
応ガスを排出する排出管、および反応管を加熱するヒー
タとを有しており、反応管が導入管および排出管の下方
に位置しており、有害ガスと反応して粒径が小さくなっ
た前記充填剤が落下して滞留する前記反応管の部分が、
当該反応管と前記導入管および排出管との接続部よりも
下方に設置されていることを特徴とするガス熱分解装置
である。また、本発明はこのようなガス熱分解装置を用
いてフッ素を含む有害ガスを除害化するガス熱分解方法
でもある。According to the present invention, there is provided an inlet pipe for introducing a harmful gas containing fluorine.
A reaction tube connected to the inlet tube and filled with a filler containing silicon, a discharge tube connected to the reaction tube and discharging a reaction gas of the harmful gas and the filler, and a heater for heating the reaction tube The reaction tube is located below the inlet and outlet tubes, and reacts with harmful gases to reduce the particle size.
The part of the reaction tube where the filler falls and stays,
Than the connection between the reaction tube and the introduction tube and the discharge tube.
It is a gas pyrolysis apparatus characterized by being installed below . The present invention is also a gas pyrolysis method for detoxifying harmful gas containing fluorine using such a gas pyrolysis apparatus.
【0005】[0005]
【作用】上記構成のガス熱分解装置では、導入管から反
応管内に有害ガスが導入されると、反応管内の充填剤は
有害ガスの熱分解によって小粒径化して粉末充填剤とな
り、反応管内においては、粉末充填剤が充填剤の隙間を
落下する。このため、反応管の屈曲部が下向きになるよ
うに当該ガス熱分解装置を配置することで、上記粉末充
填剤が上記屈曲部に落下するようになる。この屈曲部
は、導入管との接続部と排出管との接続部との間の上記
熱分解反応が活発な領域であるため、該粉末 充填剤はさ
らに熱分解反応によって粒径が小さくなり、ついには消
耗してなくなる。従って、粉末充填剤が反応管内に堆積
することはない。 In the gas pyrolysis apparatus having the above configuration, the gas pyrolysis apparatus
When harmful gas is introduced into the reaction tube, the filler in the reaction tube
Reduced particle size by thermal decomposition of harmful gas to become powder filler
In the reaction tube, the powder filler fills the gap between the fillers.
Fall. For this reason, the bent part of the reaction tube will face downward
By arranging the gas pyrolysis unit as described above,
The filler falls to the bent portion. This bend
Between the connection with the inlet pipe and the connection with the discharge pipe
Since the pyrolysis reaction is active, the powder filler is not
In addition, the particle size becomes smaller due to the thermal decomposition reaction,
Wear out. Therefore, powder filler is deposited in the reaction tube.
I will not do it.
【0006】[0006]
【実施例】以下本発明の第1実施例を、図1に基づいて
説明する。図1は第1実施例を示すガス熱分解装置の断
面図である。この装置は、反応管2と、反応管2の一端
に接続された導入管1と、反応管2の他端に接続された
排出管3とを備え、さらに上記反応管2をヒーター4で
覆った構造となっている。導入管1と排出管3との間の
上記反応管2には、屈曲部2aが設けられている。この
反応管2は、例えば中間部分に屈曲部2aを有するU字
型状であり、上記導入管2と排出管3との接続部分を上
方向、屈曲部2aを下方向として設置される。上記反応
管2の内部には、それぞれの有害ガスに対する熱分解反
応による除害効果を持つ充填剤S1を充填する。この充
填剤S1は、有害ガスとの接触面積を多く取って熱分解
反応を促進させ、且つガスの流れを妨げないことを考慮
し、粒状として充填する。また上記ヒーター4は、反応
管2の内部を熱分解反応の温度領域に加熱するためのも
のである。このため、反応管2の周囲全体にヒーター4
を設けて、反応管2の内部の温度分布を均等に保ち、反
応管2の内部での熱分解反応の領域をより広くする。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS A first embodiment of the present invention will be described below with reference to FIG. FIG. 1 is a sectional view of a gas pyrolysis apparatus showing a first embodiment. This apparatus comprises a reaction tube 2 and one end of the reaction tube 2
And a reaction tube 2 connected to the other end of the reaction tube 2.
And a discharge pipe 3.
It has a covered structure. Between the inlet pipe 1 and the outlet pipe 3
The reaction tube 2 is provided with a bent portion 2a. this
The reaction tube 2 has, for example , a U-shape having a bent portion 2a at an intermediate portion, and is installed such that a connection portion between the introduction tube 2 and the discharge tube 3 is directed upward and the bent portion 2a is directed downward. The inside of the reaction tube 2 is filled with a filler S1 having a detoxifying effect on each harmful gas by a thermal decomposition reaction. The filler S1 is packed as particles in consideration of increasing the contact area with the harmful gas to promote the thermal decomposition reaction and not to obstruct the gas flow. The heater 4 is for heating the inside of the reaction tube 2 to a temperature range of a thermal decomposition reaction. For this reason, the heater 4 is provided all around the reaction tube 2.
Is provided, the temperature distribution inside the reaction tube 2 is kept uniform, and the area of the thermal decomposition reaction inside the reaction tube 2 is made wider.
【0007】以下、有害ガスであるNF3 の除害化を例
に取り、充填剤S1としてSiO2を、上記反応管2に
充填した場合について説明する。SiO2 は、NF3 に
対して、熱分解反応にる除害効果を持つ反応管2に充填
するSiO2 からなる充填剤S1の粒径は上述を考慮し
2mm程度が好ましい。先ず、SiO2 からなる充填剤
S1を充填した反応管2を、あらかじめNF3とSiO
2 が熱分解反応を起こす600℃に加熱しておく。次
に、有害ガス(以下NF3 と記す)を導入管1から反応
管2に送り込む。すると反応管2の内部では、NF3 が
SiO2 からなる充填剤S1との熱分解反応によって除
害化され、SiF4 ガスとなる。SiF4 ガスが排出管
3より排出される。Hereinafter, a case where SiO 2 is filled in the reaction tube 2 as the filler S1 will be described taking as an example the removal of harmful gas NF 3 . SiO 2 has a detoxification effect of a thermal decomposition reaction with respect to NF 3. The particle size of the filler S 1 made of SiO 2 filled in the reaction tube 2 is preferably about 2 mm in consideration of the above. First, the reaction tube 2 filled with the filler S1 made of SiO 2 is previously placed on NF 3 and SiO 2.
2 is heated to 600 ° C. where a thermal decomposition reaction occurs. Next, a harmful gas (hereinafter, referred to as NF 3 ) is sent from the introduction tube 1 to the reaction tube 2. Then, inside the reaction tube 2, NF 3 is detoxified by a thermal decomposition reaction with the filler S1 made of SiO 2, and becomes SiF 4 gas. The SiF 4 gas is discharged from the discharge pipe 3.
【0008】一方、SiO2からなる充填剤S1は熱分
解反応を繰り返すに従って、粒径が小さくなり粉末充填
剤S2となり、反応管2内を屈曲部2aに向かって落下
する。ここで、反応管12の両端部、すなわち導入管1
及び排出管3との接続部は熱分解反応が起きにくい領域
であるのに対して、この間に設けられた屈曲部2aは熱
分解反応が活発に起こる位置である。このため、この屈
曲部2aに向かって落下した粉末充填剤S2はさらに有
害ガスとの熱分解反応を繰り返し、ついには消耗してな
くなる。また、粒径が小さくなる程、表面積が増すので
熱分解反応も促進される。熱分解反応によって消耗した
SiO2からなる充填剤S1の減少量を、U字型の反応
管2の上部から補充する。On the other hand, as the filler S1 made of SiO 2 repeats the thermal decomposition reaction, the particle size becomes smaller and becomes the powder filler S2 as it repeats the thermal decomposition reaction, and falls in the reaction tube 2 toward the bent portion 2a. Here, both ends of the reaction tube 12, that is, the introduction tube 1
The connecting portion with the discharge pipe 3 is a region where the thermal decomposition reaction hardly occurs, whereas the bent portion 2a provided therebetween is a position where the thermal decomposition reaction actively occurs. For this reason, the powder filler S2 that has dropped toward the bent portion 2a repeats the thermal decomposition reaction with the harmful gas and eventually is not consumed. Further, the smaller the particle size, the larger the surface area, so that the thermal decomposition reaction is promoted. The reduction amount of the SiO 2 filler S1 consumed by the thermal decomposition reaction is determined by a U-shaped reaction.
Refill from the top of tube 2 .
【0009】次に第2実施例を図2に基づいて説明す
る。第2実施例は図2に示すように、上記第1実施例の
反応管2の屈曲部2aの角をとって丸みをもたせたもの
である。上記屈曲部2aの角は、ガスの流れからはず
れ、粉末充填剤S2が堆積しやすいと思われ、丸みを持
たせることによってこれを防止する。Next, a second embodiment will be described with reference to FIG. In the second embodiment, as shown in FIG. 2, the bent portion 2a of the reaction tube 2 of the first embodiment is rounded at an angle. The corner of the bent portion 2a is deviated from the gas flow, and it is considered that the powder filler S2 is likely to be deposited. This is prevented by making the corner round.
【0010】第3実施例を図3に基づいて説明する。第
3実施例は図3に示すように、上記第1実施例の反応管
2の形状をJ字型状にしたものである。反応管2の両端
部に接続している導入管1と排出管3は、それぞれ反対
でも差し支えない。A third embodiment will be described with reference to FIG. In the third embodiment, as shown in FIG. 3, the shape of the reaction tube 2 of the first embodiment is J-shaped. The introduction tube 1 and the discharge tube 3 connected to both ends of the reaction tube 2 may be opposite to each other.
【0011】[0011]
【発明の効果】以上説明したように本発明のガス熱分解
装置によれば、反応管内において落下するシリコン含有
の粉末充填剤が、反応管内でそのまま堆積することなく
順次フッ素を含有する有害ガスとの熱分解反応によって
消耗してなくなるので、反応管の内部でのガス詰まりが
防止され、フッ素を含む有害ガスを用いた半導体製造プ
ロセスの安全性が向上する。また、熱分解反応の反応領
域により粒径の小さな充填剤を集めることが可能になる
ため、充填剤による有害ガスの熱分解反応を促進させる
ことができる。さらに、充填剤の補充も反応管の上方か
ら手軽にできる。As described above, according to the gas pyrolysis apparatus of the present invention, the silicon content falling in the reaction tube is reduced.
Powder filler, since the reaction tube disappears consumed by thermal decomposition of a harmful gas containing successively fluorine without depositing it, gas clogging inside the reaction tube can be prevented, noxious gas containing fluorine Semiconductor manufacturing process using
Process safety is improved. In addition, since the filler having a small particle diameter can be collected by the reaction region of the thermal decomposition reaction, the thermal decomposition reaction of the harmful gas by the filler can be promoted. Further, the filler can be easily refilled from above the reaction tube.
【図1】第1実施例のガス熱分解装置の断面図である。FIG. 1 is a sectional view of a gas pyrolysis apparatus of a first embodiment.
【図2】第2実施例のガス熱分解装置の断面図である。FIG. 2 is a sectional view of a gas pyrolysis apparatus of a second embodiment.
【図3】第3実施例のガス熱分解装置の断面図である。FIG. 3 is a sectional view of a gas pyrolysis apparatus of a third embodiment.
【図4】従来のガス熱分解装置の断面図である。FIG. 4 is a sectional view of a conventional gas pyrolysis apparatus.
1 導入管 2 反応管 2a 屈曲部 3 排出管 4 ヒーター S1 充填剤REFERENCE SIGNS LIST 1 introduction pipe 2 reaction pipe 2 a bent portion 3 discharge pipe 4 heater S1 filler
───────────────────────────────────────────────────── フロントページの続き (58)調査した分野(Int.Cl.7,DB名) B01J 8/00 - 8/06 B01D 53/54 B01D 53/68 ──────────────────────────────────────────────────続 き Continuation of front page (58) Field surveyed (Int. Cl. 7 , DB name) B01J 8/00-8/06 B01D 53/54 B01D 53/68
Claims (6)
って除害するガス熱分解方法において、In the gas pyrolysis method that removes 導入管及び排出管よりも下方に位置する反応管内に、前In the reaction tube located below the inlet tube and discharge tube,
記有害ガスと反応して反応ガスを発生させる、シリコンSilicon that reacts with harmful gases to generate reactive gases
を含む充填剤を充填し、Filled with a filler containing 前記反応管を加熱することによって、前記導入管より前By heating the reaction tube, before the introduction tube
記反応管に導入される前記有害ガスを前記充填剤と反応Reacting the harmful gas introduced into the reaction tube with the filler
させると共に、前記有害ガスと反応して粒径が小さくなAnd react with the harmful gas to reduce the particle size.
った前記充填剤を前記反応管の下部に落下させ、前記粒The filled filler is dropped to the lower part of the reaction tube,
径が小さくなった前記充填剤をさらに前記有害ガスと反The filler having a reduced diameter is further reacted with the harmful gas.
応させ、Respond 前記反応ガスを、前記排出管より排出することを特徴とThe reaction gas is discharged from the discharge pipe.
するガス熱分解方法。Gas pyrolysis method.
って除害するガス熱分解方法において、In the gas pyrolysis method that removes 導入管及び排出管よりも下方に位置する反応管内に、前In the reaction tube located below the inlet tube and discharge tube,
記有害ガスと反応して反応ガスを発生させる、シリコンSilicon that reacts with harmful gases to generate reactive gases
を含む充填剤を充填し、Filled with a filler containing 前記反応管を加熱することによって、前記導入管より前By heating the reaction tube, before the introduction tube
記反応管に導入される前記有害ガスを前記充填剤と反応Reacting the harmful gas introduced into the reaction tube with the filler
させると共に、前記有害ガスと反応することにより粒径And reacts with the harmful gas to reduce the particle size.
が小さくなって前記反応管の下部に落下した前記充填剤The filler dropped to the bottom of the reaction tube due to
を、さらに前記有害ガスと反応させ、Is further reacted with the harmful gas, 前記反応ガスを、前記排出管より排出することを特徴とThe reaction gas is discharged from the discharge pipe.
するガス熱分解方法。Gas pyrolysis method.
おいて、 前記充填剤の粒径は約2mmであることを特徴とするガ
ス熱分解方法。 3. The gas pyrolysis method according to claim 1 , wherein the filler has a particle size of about 2 mm.
たガス熱分解方法において、 前記反応管は、600℃に加熱されることを特徴とする
ガス熱分解方法。 4. The gas pyrolysis method according to claim 1 , wherein the reaction tube is heated to 600 ° C.
たガス熱分解方法において、Gas pyrolysis method, 前記反応管の下部に落下して、さらに前記有害ガスと反It falls to the lower part of the reaction tube and further reacts with the harmful gas.
応する前記充填剤は、熱分解反応を繰り返すことによっThe corresponding filler is regenerated by repeating the thermal decomposition reaction.
て消耗してなくなることを特徴とするガス熱分解方法。A gas pyrolysis method characterized in that it is not consumed by consumption.
て、hand, 前記熱分解反応による充填剤の減少量を、前記反応管のThe reduced amount of the filler due to the thermal decomposition reaction is
上部から補充することを特徴とするガス熱分解方法。A gas pyrolysis method characterized by replenishing from the top.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13768192A JP3358130B2 (en) | 1992-04-30 | 1992-04-30 | Gas pyrolysis method |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13768192A JP3358130B2 (en) | 1992-04-30 | 1992-04-30 | Gas pyrolysis method |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002237441A Division JP3464474B2 (en) | 2002-08-16 | 2002-08-16 | Gas pyrolysis equipment |
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| Publication Number | Publication Date |
|---|---|
| JPH05309259A JPH05309259A (en) | 1993-11-22 |
| JP3358130B2 true JP3358130B2 (en) | 2002-12-16 |
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| Application Number | Title | Priority Date | Filing Date |
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| JP13768192A Expired - Fee Related JP3358130B2 (en) | 1992-04-30 | 1992-04-30 | Gas pyrolysis method |
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| JP6777852B2 (en) * | 2016-09-21 | 2020-10-28 | セントラル硝子株式会社 | Fluorine-containing compound gas detection method |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6348570B2 (en) | 2013-03-22 | 2018-06-27 | プシロックス アクチエボラグPsilox AB | Hollow calcium phosphate particles |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| JP6348570B2 (en) | 2013-03-22 | 2018-06-27 | プシロックス アクチエボラグPsilox AB | Hollow calcium phosphate particles |
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| Publication number | Publication date |
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| JPH05309259A (en) | 1993-11-22 |
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