JP3464474B2 - Gas pyrolysis equipment - Google Patents
Gas pyrolysis equipmentInfo
- Publication number
- JP3464474B2 JP3464474B2 JP2002237441A JP2002237441A JP3464474B2 JP 3464474 B2 JP3464474 B2 JP 3464474B2 JP 2002237441 A JP2002237441 A JP 2002237441A JP 2002237441 A JP2002237441 A JP 2002237441A JP 3464474 B2 JP3464474 B2 JP 3464474B2
- Authority
- JP
- Japan
- Prior art keywords
- gas
- reaction
- pipe
- reaction tube
- filler
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000000197 pyrolysis Methods 0.000 title claims description 23
- 238000006243 chemical reaction Methods 0.000 claims description 69
- 239000007789 gas Substances 0.000 claims description 69
- 239000000945 filler Substances 0.000 claims description 46
- 230000009931 harmful effect Effects 0.000 claims description 35
- 238000005979 thermal decomposition reaction Methods 0.000 claims description 35
- 239000002245 particle Substances 0.000 claims description 12
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 claims description 5
- 229910052731 fluorine Inorganic materials 0.000 claims description 5
- 239000011737 fluorine Substances 0.000 claims description 5
- 239000012495 reaction gas Substances 0.000 claims description 5
- 238000010438 heat treatment Methods 0.000 claims description 4
- 229910052710 silicon Inorganic materials 0.000 claims description 4
- 239000010703 silicon Substances 0.000 claims description 4
- 238000007599 discharging Methods 0.000 claims 2
- 238000010951 particle size reduction Methods 0.000 claims 1
- 239000000843 powder Substances 0.000 description 15
- 229910004298 SiO 2 Inorganic materials 0.000 description 7
- 238000001784 detoxification Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000005452 bending Methods 0.000 description 1
Landscapes
- Treating Waste Gases (AREA)
- Devices And Processes Conducted In The Presence Of Fluids And Solid Particles (AREA)
Description
【０００１】[0001]
【発明の属する技術分野】本発明はガス熱分解装置に関
し、特に充填剤が充填された反応管にヒーターを設けて
なるガス熱分解装置に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a gas pyrolysis apparatus, and more particularly to a gas pyrolysis apparatus in which a reaction tube filled with a filler is provided with a heater.
【０００２】[0002]
【従来の技術】半導体製造プロセスにおいて有害ガスの
除害化は重要な課題である。様々ある有害ガスの除害方
法の中に、有害ガスを熱分解することによって除害化す
る方法がある。この方法に用いられている、従来のガス
熱分解装置を図４に基づいて以下に説明する。従来のガ
ス熱分解装置は、円柱形の反応管１２とその上端に導入
管１１を、下端に排出管１３を接続し、上記反応管１２
の外周にヒータ１４を設けた構造となっている。上記反
応管１２の内部には、それぞれの有害ガスに対する熱分
解反応による除害効果を持つ充填剤Ｓ１を充填する。こ
の充填剤Ｓ１は有害ガスとの接触面積を多く取るため、
粒状として用いている。上記構成の装置を用いた、有害
ガスの除害化を説明する。有害ガスを導入管１１から反
応管１２に送り込む。反応管１２の内部は、あらかじめ
ヒーター１４で有害ガスと充填剤Ｓ１の熱分解反応の温
度領域に加熱しておく。反応管１２に送り込まれた有害
ガスは、充填剤Ｓ１との熱分解反応によって除害化さ
れ、反応管１２の下端に接続した排出管１３より排出さ
せる。2. Description of the Related Art Detoxification of harmful gases is an important issue in semiconductor manufacturing processes. Among various harmful gas removal methods, there is a method of removing harmful gas by thermally decomposing the harmful gas. A conventional gas pyrolysis apparatus used in this method will be described below with reference to FIG. In the conventional gas pyrolysis apparatus, a cylindrical reaction tube 12 is connected to an inlet pipe 11 at its upper end and an exhaust pipe 13 at its lower end.
The heater 14 is provided on the outer circumference of the. The inside of the reaction tube 12 is filled with a filler S1 having a detoxifying effect by a thermal decomposition reaction with respect to each harmful gas. Since this filler S1 has a large contact area with harmful gas,
It is used as a grain. The detoxification of harmful gas using the apparatus having the above configuration will be described. A harmful gas is sent from the introduction pipe 11 to the reaction pipe 12. The inside of the reaction tube 12 is preheated by the heater 14 to a temperature range of the thermal decomposition reaction of the harmful gas and the filler S1. The harmful gas sent to the reaction tube 12 is detoxified by the thermal decomposition reaction with the filler S1, and is discharged from the discharge tube 13 connected to the lower end of the reaction tube 12.
【０００３】[0003]
【発明が解決しようとする課題】しかし上記のガス熱分
解装置には、以下に示す問題があった。即ち、充填剤Ｓ
１は熱分解反応を繰り返すに従って粒径が小さくなり、
粉末充填剤Ｓ２となる。さらに熱分解反応を繰り返すこ
とによって、やがては粉末充填剤Ｓ２は消耗してなくな
る。しかし、粒径が小さくなった粉末充填剤Ｓ２は、消
耗してなくなるに到る前に反応管１２の下方向に落下し
ていく。反応管１２の両端部は、熱分解反応が起きにく
い領域であり、上記落下してきた粉末充填剤Ｓ２は、そ
れ以上熱分解反応を繰り返すことはなく、従って消耗し
てなくなるには到らない。また、熱分解反応によって減
少した充填剤Ｓ１は反応管１２の上部から補充するた
め、末充填剤Ｓ２は反応管１２の下端にそのまま残留す
る。以上を繰り返すことによって、反応管１２の下端で
は徐々に粉末充填剤Ｓ２が堆積し、反応管１２と排出管
１３と連通する箇所を塞ぎ、ガス詰まりを引き起こす。
以上は、ガスの流れを反対にしても同様である。この発
明は、以上に述べた問題点を解決することを目的とす
る。However, the above-mentioned gas pyrolysis apparatus has the following problems. That is, the filler S
No. 1 has a smaller particle size as the thermal decomposition reaction is repeated,
It becomes the powder filler S2. By repeating the thermal decomposition reaction, the powder filler S2 is eventually consumed and disappears. However, the powder filler S2 having a reduced particle size drops downward in the reaction tube 12 before it is consumed and disappears. Both ends of the reaction tube 12 are regions where a thermal decomposition reaction is unlikely to occur, and the powder filler S2 that has dropped does not repeat the thermal decomposition reaction any more, and therefore is not exhausted. Further, since the filler S1 reduced by the thermal decomposition reaction is replenished from the upper portion of the reaction tube 12, the powder filler S2 remains at the lower end of the reaction tube 12 as it is. By repeating the above, the powder filler S2 is gradually deposited at the lower end of the reaction tube 12, and the place where the reaction tube 12 and the discharge tube 13 communicate with each other is closed to cause gas clogging.
The above is the same even if the gas flow is reversed. The present invention aims to solve the problems described above.
【０００４】[0004]
【課題を解決するための手段】上記目的を達成するため
の本発明は、フッ素を含む有害ガスを導入する導入管、
この導入管に接続されシリコンを含む充填剤が充填され
る反応管、この反応管に接続され有害ガスと充填剤との
反応ガスを排出する排出管、および反応管を加熱するヒ
ータとを有しており、反応管が導入管および排出管の下
方に位置しており、有害ガスと反応して粒径が小さくな
った前記充填剤が落下して滞留する前記反応管の部分
が、当該反応管と前記導入管および排出管との接続部よ
りも下方に設置されており、粒子径が小さくなった充填
剤をさらに有害ガスと反応させることを特徴とするガス
熱分解装置である。Means for Solving the Problems The present invention for achieving the above object includes an introduction pipe for introducing a harmful gas containing fluorine,
It has a reaction tube connected to the introduction tube and filled with a filler containing silicon, an exhaust tube connected to the reaction tube for exhausting a reaction gas of the harmful gas and the filler, and a heater for heating the reaction tube. The reaction tube is located below the introduction tube and the discharge tube, and the portion of the reaction tube where the filler, which has reacted with harmful gas and has a small particle size, drops and stays is the reaction tube. And a filler which is installed below the connection between the introduction pipe and the discharge pipe and further reacts the filler having a reduced particle size with a harmful gas.
【０００５】[0005]
【作用】上記構成のガス熱分解装置では、導入管から反
応管内に有害ガスが導入されると、反応管内の充填剤は
有害ガスの熱分解によって小粒径化して粉末充填剤とな
り、反応管内においては、粉末充填剤が充填剤の隙間を
落下する。このため、反応管の屈曲部が下向きになるよ
うに当該ガス熱分解装置を配置することで、上記粉末充
填剤が上記屈曲部に落下するようになる。この屈曲部
は、導入管との接続部と排出管との接続部との間の上記
熱分解反応が活発な領域であるため、該粉末充填剤はさ
らに熱分解反応によって粒径が小さくなり、ついには消
耗してなくなる。従って、粉末充填剤が反応管内に堆積
することはない。In the gas pyrolysis apparatus having the above structure, when a harmful gas is introduced into the reaction tube from the introduction tube, the filler in the reaction tube is reduced in particle size by thermal decomposition of the harmful gas to become a powder filler, and In, the powder filler falls through the gap between the fillers. Therefore, by arranging the gas pyrolysis device so that the bent portion of the reaction tube faces downward, the powder filler drops into the bent portion. This bent portion is a region where the thermal decomposition reaction between the connection portion with the introduction pipe and the connection portion with the discharge pipe is active, so that the particle size of the powder filler is further reduced by the thermal decomposition reaction, Eventually it will be exhausted and gone. Therefore, the powder filler does not deposit in the reaction tube.
【０００６】[0006]
【実施例】以下本発明の第１実施例を、図１に基づいて
説明する。図１は第１実施例を示すガス熱分解装置の断
面図である。この装置は、反応管２と、反応管２の一端
に接続された導入管１と、反応管２の他端に接続された
排出管３とを備え、さらに上記反応管２をヒーター４で
覆った構造となっている。導入管１と排出管３との間の
上記反応管２には、屈曲部２ａが設けられている。この
反応管２は、例えば中間部分に屈曲部２ａを有するＵ字
型状であり、上記導入管２と排出管３との接続部分を上
方向、屈曲部２ａを下方向として設置される。上記反応
管２の内部には、それぞれの有害ガスに対する熱分解反
応による除害効果を持つ充填剤Ｓ１を充填する。この充
填剤Ｓ１は、有害ガスとの接触面積を多く取って熱分解
反応を促進させ、且つガスの流れを妨げないことを考慮
し、粒状として充填する。また上記ヒーター４は、反応
管２の内部を熱分解反応の温度領域に加熱するためのも
のである。このため、反応管２の周囲全体にヒーター４
を設けて、反応管２の内部の温度分布を均等に保ち、反
応管２の内部での熱分解反応の領域をより広くする。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS A first embodiment of the present invention will be described below with reference to FIG. FIG. 1 is a sectional view of a gas pyrolysis apparatus showing a first embodiment. This apparatus comprises a reaction tube 2, an introduction tube 1 connected to one end of the reaction tube 2, and an exhaust tube 3 connected to the other end of the reaction tube 2, and the reaction tube 2 is covered with a heater 4. It has a different structure. The reaction tube 2 between the introduction tube 1 and the discharge tube 3 is provided with a bent portion 2a. The reaction tube 2 has, for example, a U-shape having a bent portion 2a in an intermediate portion, and is installed with the connecting portion between the introduction pipe 2 and the discharge pipe 3 being upward and the bending portion 2a being downward. The inside of the reaction tube 2 is filled with a filler S1 having an abatement effect by a thermal decomposition reaction with respect to each harmful gas. The filler S1 is filled in a granular form in consideration of taking a large contact area with the harmful gas to promote the thermal decomposition reaction and not hindering the gas flow. The heater 4 is for heating the inside of the reaction tube 2 to the temperature region of the thermal decomposition reaction. For this reason, the heater 4 is provided all around the reaction tube 2.
Is provided to keep the temperature distribution inside the reaction tube 2 uniform and to widen the area of the thermal decomposition reaction inside the reaction tube 2.
【０００７】以下、有害ガスであるＮＦ3の除害化を例
に取り、充填剤Ｓ１としてＳｉＯ2を、上記反応管２に
充填した場合について説明する。ＳｉＯ2は、ＮＦ3に対
して、熱分解反応による除害効果を持つ。反応管２に充
填するＳｉＯ 2からなる充填剤Ｓ１の粒径は上述を考慮
し２ｍｍ程度が好ましい。先ず、ＳｉＯ2からなる充填
剤Ｓ１を充填した反応管２を、あらかじめＮＦ3とＳｉ
Ｏ2が熱分解反応を起こす６００℃に加熱しておく。次
に、有害ガス（以下ＮＦ3と記す）を導入管１から反応
管２に送り込む。すると反応管２の内部では、ＮＦ3が
ＳｉＯ2からなる充填剤Ｓ１との熱分解反応によって除
害化され、ＳｉＦ4ガスとなる。ＳｉＦ4ガスが排出管３
より排出される。The case where SiO 2 is filled as the filler S1 in the reaction tube 2 will be described below by taking detoxification of NF 3 which is a harmful gas as an example. SiO 2 has a harmful effect on NF 3 by a thermal decomposition reaction. The particle size of the reaction tube 2 filler S1, which consists of SiO 2 to be filled in the order of 2mm in consideration of the above are preferred. First, the reaction tube 2 filled with the filler S1 made of SiO 2 was previously charged with NF 3 and Si.
It is heated to 600 ° C. at which O 2 causes a thermal decomposition reaction. Next, a harmful gas (hereinafter referred to as NF 3 ) is fed from the introduction pipe 1 into the reaction pipe 2. Then, inside the reaction tube 2, NF 3 is detoxified by a thermal decomposition reaction with the filler S1 made of SiO 2, and becomes SiF 4 gas. SiF 4 gas is exhaust pipe 3
More discharged.
【０００８】一方、ＳｉＯ2からなる充填剤Ｓ１は熱分
解反応を繰り返すに従って、粒径が小さくなり粉末充填
剤Ｓ２となり、反応管２内を屈曲部２ａに向かって落下
する。ここで、反応管１２の両端部、すなわち導入管１
及び排出管３との接続部は熱分解反応が起きにくい領域
であるのに対して、この間に設けられた屈曲部２ａは熱
分解反応が活発に起こる位置である。このため、この屈
曲部２ａに向かって落下した粉末充填剤Ｓ２はさらに有
害ガスとの熱分解反応を繰り返し、ついには消耗してな
くなる。また、粒径が小さくなる程、表面積が増すので
熱分解反応も促進される。熱分解反応によって消耗した
ＳｉＯ2からなる充填剤Ｓ１の減少量を、Ｕ字型の反応
管２の上部から補充する。On the other hand, the filler S1 made of SiO 2 becomes a powder filler S2 as the particle size becomes smaller as the thermal decomposition reaction is repeated, and falls in the reaction tube 2 toward the bent portion 2a. Here, both ends of the reaction tube 12, that is, the introduction tube 1
While the connection portion with the discharge pipe 3 is a region where the thermal decomposition reaction is unlikely to occur, the bent portion 2a provided therebetween is a position where the thermal decomposition reaction actively occurs. Therefore, the powder filler S2 dropped toward the bent portion 2a further repeats the thermal decomposition reaction with the harmful gas, and is eventually consumed and disappears. Further, as the particle size becomes smaller, the surface area increases, so that the thermal decomposition reaction is promoted. A decrease amount of the filler S1 made of SiO 2 consumed by the thermal decomposition reaction is replenished from the upper part of the U-shaped reaction tube 2.
【０００９】次に第２実施例を図２に基づいて説明す
る。第２実施例は図２に示すように、上記第１実施例の
反応管２の屈曲部２ａの角をとって丸みをもたせたもの
である。上記屈曲部２ａの角は、ガスの流れからはず
れ、粉末充填剤Ｓ２が堆積しやすいと思われ、丸みを持
たせることによってこれを防止する。Next, a second embodiment will be described with reference to FIG. In the second embodiment, as shown in FIG. 2, the bent portion 2a of the reaction tube 2 of the first embodiment has a rounded corner. The corner of the bent portion 2a is deviated from the flow of gas, and the powder filler S2 is likely to be deposited, and this is prevented by making it round.
【００１０】第３実施例を図３に基づいて説明する。第
３実施例は図３に示すように、上記第１実施例の反応管
２の形状をＪ字型状にしたものである。反応管２の両端
部に接続している導入管１と排出管３は、それぞれ反対
でも差し支えない。A third embodiment will be described with reference to FIG. In the third embodiment, as shown in FIG. 3, the reaction tube 2 of the first embodiment has a J-shape. The introduction pipe 1 and the discharge pipe 3 connected to both ends of the reaction pipe 2 may be opposite to each other.
【００１１】[0011]
【発明の効果】以上説明したように本発明のガス熱分解
装置によれば、反応管内において落下するシリコン含有
の粉末充填剤が、反応管内でそのまま堆積することなく
順次フッ素を含有する有害ガスとの熱分解反応によって
消耗してなくなるので、反応管の内部でのガス詰まりが
防止され、フッ素を含む有害ガスを用いた半導体製造プ
ロセスの安全性が向上する。また、熱分解反応の反応領
域により粒径の小さな充填剤を集めることが可能になる
ため、充填剤による有害ガスの熱分解反応を促進させる
ことができる。さらに、充填剤の補充も反応管の上方か
ら手軽にできる。As described above, according to the gas pyrolysis apparatus of the present invention, the silicon-containing powder filler that drops in the reaction tube is sequentially mixed with the harmful gas containing fluorine without being deposited as it is in the reaction tube. Since it is consumed and disappears due to the thermal decomposition reaction of, the gas clogging inside the reaction tube is prevented, and the safety of the semiconductor manufacturing process using the harmful gas containing fluorine is improved. Further, since the filler having a small particle size can be collected in the reaction region of the thermal decomposition reaction, the thermal decomposition reaction of the harmful gas by the filler can be promoted. Furthermore, the replenishment of the filler can be easily performed from above the reaction tube.
【図１】第１実施例のガス熱分解装置の断面図である。FIG. 1 is a sectional view of a gas thermal decomposition apparatus of a first embodiment.
【図２】第２実施例のガス熱分解装置の断面図である。FIG. 2 is a sectional view of a gas thermal decomposition apparatus of a second embodiment.
【図３】第３実施例のガス熱分解装置の断面図である。FIG. 3 is a sectional view of a gas thermal decomposition apparatus of a third embodiment.
【図４】従来のガス熱分解装置の断面図である。FIG. 4 is a cross-sectional view of a conventional gas pyrolysis device.
１ 導入管 ２ 反応管 ２ａ 曲部 ３ 排出管 ４ ヒーター Ｓ１ 充填剤 1 Introductory pipe 2 reaction tubes 2a music part 3 discharge pipe 4 heater S1 filler
───────────────────────────────────────────────────── フロントページの続き (58)調査した分野(Int.Cl.7，ＤＢ名) B01J 8/06 B01D 53/34 B01D 53/68 ─────────────────────────────────────────────────── ─── Continuation of the front page (58) Fields surveyed (Int.Cl. 7 , DB name) B01J 8/06 B01D 53/34 B01D 53/68
Claims (9)
って除害するガス熱分解装置において、 前記有害ガスを導入する導入管と、 前記導入管に接続され、前記有害ガスと反応して反応ガ
スを発生させる、シリコンを含む充填剤が充填される反
応管と、 前記反応管に接続され、前記反応ガスを排出する排出管
と、 前記反応管を加熱するヒータとを有しており、 前記反応管は、前記導入管及び前記排出管よりも下方に
位置しており、 前記有害ガスと反応して粒径が小さくなった前記充填剤
を前記反応管の下部に落下させ、前記粒子径が小さくな
った前記充填剤をさらに前記有害ガスと反応させること
を特徴とするガス熱分解装置。1. A gas pyrolysis apparatus for detoxifying a harmful gas containing fluorine by a thermal decomposition reaction, an introduction pipe for introducing the harmful gas, and a reaction gas which is connected to the introduction pipe and reacts with the harmful gas. A reaction tube filled with a filler containing silicon, a discharge tube connected to the reaction tube for discharging the reaction gas, and a heater for heating the reaction tube. The pipe is located below the inlet pipe and the discharge pipe, and the filler having a smaller particle size that reacts with the harmful gas is dropped to the lower part of the reaction pipe to reduce the particle size. A gas pyrolysis apparatus, characterized in that the filled filler is further reacted with the harmful gas.
って除害するガス熱分解装置において、 前記有害ガスを導入する導入管と、 前記導入管に接続され、前記有害ガスと反応して反応ガ
スを発生させる、シリコンを含む充填剤が充填される反
応管と、 前記反応管に接続され、前記反応ガスを排出する排出管
と、 前記反応管を加熱するヒータとを有しており、 前記反応管は、前記導入管及び前記排出管よりも下方に
位置しており、前記有害ガスと反応することにより粒径
が小さくなって前記反応管の下部に落下した前記充填剤
を、さらに前記有害ガスと反応させることを特徴とする
ガス熱分解装置。2. A gas pyrolysis apparatus for detoxifying a harmful gas containing fluorine by a thermal decomposition reaction, an introduction pipe for introducing the harmful gas, and a reaction gas which is connected to the introduction pipe and reacts with the harmful gas. A reaction tube filled with a filler containing silicon, a discharge tube connected to the reaction tube for discharging the reaction gas, and a heater for heating the reaction tube. The pipe is located below the inlet pipe and the discharge pipe, and the filler is dropped to the lower part of the reaction pipe due to a particle size reduction due to the reaction with the harmful gas, and the harmful gas. A gas pyrolysis device characterized by reacting with.
おいて、 前記反応管は屈曲部を有していることを特徴とするガス
熱分解装置。3. The gas pyrolysis device according to claim 1, wherein the reaction tube has a bent portion.
て、 前記屈曲部が湾曲形状となっていることを特徴とするガ
ス熱分解装置。4. The gas pyrolysis apparatus according to claim 3, wherein the bent portion has a curved shape.
おいて、 前記反応管は、前記導入管および前記排出管との接続部
分が上方に、前記屈曲部が下方になるように配置されて
いることを特徴とするガス熱分解装置。5. The gas pyrolysis apparatus according to claim 3 or 4, wherein the reaction tube is arranged such that a connecting portion between the introduction pipe and the discharge pipe is upward and the bent portion is downward. A gas pyrolysis device characterized in that
たガス熱分解装置において、 前記導入管と前記反応管との接続部の高さは、前記排出
管と前記反応管との接続部の高さとは異なることを特徴
とするガス熱分解装置。6. The gas thermal decomposition apparatus according to claim 1, wherein a height of a connecting portion between the introduction pipe and the reaction pipe is equal to that of the discharge pipe and the reaction pipe. A gas pyrolysis device characterized by being different from the height of the connecting portion.
て、 前記導入管と前記反応管との接続部は、前記排出管と前
記反応管との接続部よりも高い位置に設けられているこ
とを特徴とするガス熱分解装置。7. The gas thermal decomposition apparatus according to claim 6, wherein the connecting portion between the introduction pipe and the reaction pipe is provided at a position higher than the connecting portion between the discharge pipe and the reaction pipe. A gas pyrolysis device.
て、 前記排出管と前記反応管との接続部は、前記導入管と前
記反応管との接続部よりも高い位置に設けられているこ
とを特徴とするガス熱分解装置。8. The gas thermal decomposition apparatus according to claim 6, wherein the connecting portion between the discharge pipe and the reaction pipe is provided at a position higher than the connecting portion between the introduction pipe and the reaction pipe. A gas pyrolysis device.
たガス熱分解装置において、 前記ヒータは、前記反応管を６００℃に加熱することを
特徴とするガス熱分解装置。9. The gas pyrolysis apparatus according to claim 1, wherein the heater heats the reaction tube to 600 ° C.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002237441A JP3464474B2 (en) | 2002-08-16 | 2002-08-16 | Gas pyrolysis equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002237441A JP3464474B2 (en) | 2002-08-16 | 2002-08-16 | Gas pyrolysis equipment |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13768192A Division JP3358130B2 (en) | 1992-04-30 | 1992-04-30 | Gas pyrolysis method |
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|---|---|
| JP2003117342A JP2003117342A (en) | 2003-04-22 |
| JP3464474B2 true JP3464474B2 (en) | 2003-11-10 |
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ID=19196406
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002237441A Expired - Fee Related JP3464474B2 (en) | 2002-08-16 | 2002-08-16 | Gas pyrolysis equipment |
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| Country | Link |
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Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6348570B2 (en) | 2013-03-22 | 2018-06-27 | プシロックス アクチエボラグＰｓｉｌｏｘ ＡＢ | Hollow calcium phosphate particles |
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2002
- 2002-08-16 JP JP2002237441A patent/JP3464474B2/en not_active Expired - Fee Related
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6348570B2 (en) | 2013-03-22 | 2018-06-27 | プシロックス アクチエボラグＰｓｉｌｏｘ ＡＢ | Hollow calcium phosphate particles |
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| Publication number | Publication date |
|---|---|
| JP2003117342A (en) | 2003-04-22 |
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