JP3359360B2 - Curable composition - Google Patents
Curable compositionInfo
- Publication number
- JP3359360B2 JP3359360B2 JP23106692A JP23106692A JP3359360B2 JP 3359360 B2 JP3359360 B2 JP 3359360B2 JP 23106692 A JP23106692 A JP 23106692A JP 23106692 A JP23106692 A JP 23106692A JP 3359360 B2 JP3359360 B2 JP 3359360B2
- Authority
- JP
- Japan
- Prior art keywords
- group
- compound
- carbon
- general formula
- carbon atoms
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000000203 mixture Substances 0.000 title claims description 44
- -1 imide compound Chemical class 0.000 claims description 98
- 125000000962 organic group Chemical group 0.000 claims description 53
- 125000004432 carbon atom Chemical group C* 0.000 claims description 40
- 150000001875 compounds Chemical class 0.000 claims description 40
- 239000011203 carbon fibre reinforced carbon Substances 0.000 claims description 33
- 125000003118 aryl group Chemical group 0.000 claims description 15
- 239000003054 catalyst Substances 0.000 claims description 15
- 238000006459 hydrosilylation reaction Methods 0.000 claims description 11
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims description 10
- 229910052799 carbon Inorganic materials 0.000 claims description 7
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 claims description 6
- 150000001721 carbon Chemical group 0.000 claims description 6
- 125000001931 aliphatic group Chemical group 0.000 claims description 5
- 125000005462 imide group Chemical group 0.000 claims description 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 4
- ATVJXMYDOSMEPO-UHFFFAOYSA-N 3-prop-2-enoxyprop-1-ene Chemical compound C=CCOCC=C ATVJXMYDOSMEPO-UHFFFAOYSA-N 0.000 claims description 3
- GIXXQTYGFOHYPT-UHFFFAOYSA-N Bisphenol P Chemical compound C=1C=C(C(C)(C)C=2C=CC(O)=CC=2)C=CC=1C(C)(C)C1=CC=C(O)C=C1 GIXXQTYGFOHYPT-UHFFFAOYSA-N 0.000 claims description 3
- JKJWYKGYGWOAHT-UHFFFAOYSA-N bis(prop-2-enyl) carbonate Chemical compound C=CCOC(=O)OCC=C JKJWYKGYGWOAHT-UHFFFAOYSA-N 0.000 claims description 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 3
- SCZZNWQQCGSWSZ-UHFFFAOYSA-N 1-prop-2-enoxy-4-[2-(4-prop-2-enoxyphenyl)propan-2-yl]benzene Chemical compound C=1C=C(OCC=C)C=CC=1C(C)(C)C1=CC=C(OCC=C)C=C1 SCZZNWQQCGSWSZ-UHFFFAOYSA-N 0.000 claims description 2
- ZDNFTNPFYCKVTB-UHFFFAOYSA-N bis(prop-2-enyl) benzene-1,4-dicarboxylate Chemical compound C=CCOC(=O)C1=CC=C(C(=O)OCC=C)C=C1 ZDNFTNPFYCKVTB-UHFFFAOYSA-N 0.000 claims description 2
- 229910052739 hydrogen Inorganic materials 0.000 claims description 2
- 239000001257 hydrogen Substances 0.000 claims description 2
- 239000000047 product Substances 0.000 description 34
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 25
- 239000002904 solvent Substances 0.000 description 23
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 22
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 22
- 238000006243 chemical reaction Methods 0.000 description 19
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 16
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 16
- 238000000034 method Methods 0.000 description 13
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 12
- 230000015572 biosynthetic process Effects 0.000 description 12
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 12
- 238000003786 synthesis reaction Methods 0.000 description 12
- 239000000126 substance Substances 0.000 description 11
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 10
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 10
- 238000004519 manufacturing process Methods 0.000 description 10
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 9
- 239000002253 acid Substances 0.000 description 9
- 150000004985 diamines Chemical class 0.000 description 9
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 8
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 description 8
- 229910052757 nitrogen Inorganic materials 0.000 description 7
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 6
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 6
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 6
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 6
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 150000008065 acid anhydrides Chemical class 0.000 description 6
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 6
- RLSSMJSEOOYNOY-UHFFFAOYSA-N m-cresol Chemical compound CC1=CC=CC(O)=C1 RLSSMJSEOOYNOY-UHFFFAOYSA-N 0.000 description 6
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 6
- QWVGKYWNOKOFNN-UHFFFAOYSA-N o-cresol Chemical compound CC1=CC=CC=C1O QWVGKYWNOKOFNN-UHFFFAOYSA-N 0.000 description 6
- IWDCLRJOBJJRNH-UHFFFAOYSA-N p-cresol Chemical compound CC1=CC=C(O)C=C1 IWDCLRJOBJJRNH-UHFFFAOYSA-N 0.000 description 6
- 125000006158 tetracarboxylic acid group Chemical group 0.000 description 6
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 5
- 125000003342 alkenyl group Chemical group 0.000 description 5
- 238000011156 evaluation Methods 0.000 description 5
- 150000002430 hydrocarbons Chemical class 0.000 description 5
- 238000005259 measurement Methods 0.000 description 5
- 229910052697 platinum Inorganic materials 0.000 description 5
- 229920005575 poly(amic acid) Polymers 0.000 description 5
- 229920001187 thermosetting polymer Polymers 0.000 description 5
- 230000004580 weight loss Effects 0.000 description 5
- WZJUBBHODHNQPW-UHFFFAOYSA-N 2,4,6,8-tetramethyl-1,3,5,7,2$l^{3},4$l^{3},6$l^{3},8$l^{3}-tetraoxatetrasilocane Chemical compound C[Si]1O[Si](C)O[Si](C)O[Si](C)O1 WZJUBBHODHNQPW-UHFFFAOYSA-N 0.000 description 4
- DLFVBJFMPXGRIB-UHFFFAOYSA-N Acetamide Chemical compound CC(N)=O DLFVBJFMPXGRIB-UHFFFAOYSA-N 0.000 description 4
- VVJKKWFAADXIJK-UHFFFAOYSA-N Allylamine Chemical compound NCC=C VVJKKWFAADXIJK-UHFFFAOYSA-N 0.000 description 4
- 239000004215 Carbon black (E152) Substances 0.000 description 4
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- RDOXTESZEPMUJZ-UHFFFAOYSA-N anisole Chemical compound COC1=CC=CC=C1 RDOXTESZEPMUJZ-UHFFFAOYSA-N 0.000 description 4
- 238000009835 boiling Methods 0.000 description 4
- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical compound OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 description 4
- MTZQAGJQAFMTAQ-UHFFFAOYSA-N ethyl benzoate Chemical compound CCOC(=O)C1=CC=CC=C1 MTZQAGJQAFMTAQ-UHFFFAOYSA-N 0.000 description 4
- ZHNUHDYFZUAESO-UHFFFAOYSA-N formamide Substances NC=O ZHNUHDYFZUAESO-UHFFFAOYSA-N 0.000 description 4
- QPJVMBTYPHYUOC-UHFFFAOYSA-N methyl benzoate Chemical compound COC(=O)C1=CC=CC=C1 QPJVMBTYPHYUOC-UHFFFAOYSA-N 0.000 description 4
- 238000002156 mixing Methods 0.000 description 4
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- YLHUPYSUKYAIBW-UHFFFAOYSA-N 1-acetylpyrrolidin-2-one Chemical compound CC(=O)N1CCCC1=O YLHUPYSUKYAIBW-UHFFFAOYSA-N 0.000 description 3
- AVCOFPOLGHKJQB-UHFFFAOYSA-N 4-(3,4-dicarboxyphenyl)sulfonylphthalic acid Chemical compound C1=C(C(O)=O)C(C(=O)O)=CC=C1S(=O)(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 AVCOFPOLGHKJQB-UHFFFAOYSA-N 0.000 description 3
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 3
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 3
- WHNWPMSKXPGLAX-UHFFFAOYSA-N N-Vinyl-2-pyrrolidone Chemical compound C=CN1CCCC1=O WHNWPMSKXPGLAX-UHFFFAOYSA-N 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- CCAFPWNGIUBUSD-UHFFFAOYSA-N diethyl sulfoxide Chemical compound CCS(=O)CC CCAFPWNGIUBUSD-UHFFFAOYSA-N 0.000 description 3
- 125000000524 functional group Chemical group 0.000 description 3
- GNOIPBMMFNIUFM-UHFFFAOYSA-N hexamethylphosphoric triamide Chemical compound CN(C)P(=O)(N(C)C)N(C)C GNOIPBMMFNIUFM-UHFFFAOYSA-N 0.000 description 3
- 229930195733 hydrocarbon Natural products 0.000 description 3
- 238000002844 melting Methods 0.000 description 3
- 230000008018 melting Effects 0.000 description 3
- AJFDBNQQDYLMJN-UHFFFAOYSA-N n,n-diethylacetamide Chemical compound CCN(CC)C(C)=O AJFDBNQQDYLMJN-UHFFFAOYSA-N 0.000 description 3
- 239000003960 organic solvent Substances 0.000 description 3
- 150000002989 phenols Chemical class 0.000 description 3
- 239000002798 polar solvent Substances 0.000 description 3
- 239000002244 precipitate Substances 0.000 description 3
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 3
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 3
- HNJBEVLQSNELDL-UHFFFAOYSA-N pyrrolidin-2-one Chemical compound O=C1CCCN1 HNJBEVLQSNELDL-UHFFFAOYSA-N 0.000 description 3
- 150000003462 sulfoxides Chemical class 0.000 description 3
- 125000002256 xylenyl group Chemical class C1(C(C=CC=C1)C)(C)* 0.000 description 3
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 2
- LZDKZFUFMNSQCJ-UHFFFAOYSA-N 1,2-diethoxyethane Chemical compound CCOCCOCC LZDKZFUFMNSQCJ-UHFFFAOYSA-N 0.000 description 2
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 2
- VLQZJOLYNOGECD-UHFFFAOYSA-N 2,4,6-trimethyl-1,3,5,2,4,6-trioxatrisilinane Chemical compound C[SiH]1O[SiH](C)O[SiH](C)O1 VLQZJOLYNOGECD-UHFFFAOYSA-N 0.000 description 2
- DKKYOQYISDAQER-UHFFFAOYSA-N 3-[3-(3-aminophenoxy)phenoxy]aniline Chemical compound NC1=CC=CC(OC=2C=C(OC=3C=C(N)C=CC=3)C=CC=2)=C1 DKKYOQYISDAQER-UHFFFAOYSA-N 0.000 description 2
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 2
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 2
- LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- VQTUBCCKSQIDNK-UHFFFAOYSA-N Isobutene Chemical group CC(C)=C VQTUBCCKSQIDNK-UHFFFAOYSA-N 0.000 description 2
- SUAKHGWARZSWIH-UHFFFAOYSA-N N,N‐diethylformamide Chemical compound CCN(CC)C=O SUAKHGWARZSWIH-UHFFFAOYSA-N 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- KXKVLQRXCPHEJC-UHFFFAOYSA-N acetic acid trimethyl ester Natural products COC(C)=O KXKVLQRXCPHEJC-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 150000008064 anhydrides Chemical class 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- 229940043232 butyl acetate Drugs 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 239000003759 ester based solvent Substances 0.000 description 2
- 239000004210 ether based solvent Substances 0.000 description 2
- 229940093499 ethyl acetate Drugs 0.000 description 2
- 238000005187 foaming Methods 0.000 description 2
- 150000008282 halocarbons Chemical class 0.000 description 2
- FUZZWVXGSFPDMH-UHFFFAOYSA-M hexanoate Chemical compound CCCCCC([O-])=O FUZZWVXGSFPDMH-UHFFFAOYSA-M 0.000 description 2
- 239000003112 inhibitor Substances 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- UZKWTJUDCOPSNM-UHFFFAOYSA-N methoxybenzene Substances CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 description 2
- 229940095102 methyl benzoate Drugs 0.000 description 2
- 239000003607 modifier Substances 0.000 description 2
- YKYONYBAUNKHLG-UHFFFAOYSA-N n-Propyl acetate Natural products CCCOC(C)=O YKYONYBAUNKHLG-UHFFFAOYSA-N 0.000 description 2
- 125000004957 naphthylene group Chemical group 0.000 description 2
- 239000003921 oil Substances 0.000 description 2
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 2
- 229920001451 polypropylene glycol Polymers 0.000 description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
- 229940090181 propyl acetate Drugs 0.000 description 2
- CYIDZMCFTVVTJO-UHFFFAOYSA-N pyromellitic acid Chemical compound OC(=O)C1=CC(C(O)=O)=C(C(O)=O)C=C1C(O)=O CYIDZMCFTVVTJO-UHFFFAOYSA-N 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 239000008096 xylene Substances 0.000 description 2
- SZOLUXDHHKCYKT-ONEGZZNKSA-N (e)-but-1-en-1-amine Chemical compound CC\C=C\N SZOLUXDHHKCYKT-ONEGZZNKSA-N 0.000 description 1
- MYRTYDVEIRVNKP-UHFFFAOYSA-N 1,2-Divinylbenzene Chemical compound C=CC1=CC=CC=C1C=C MYRTYDVEIRVNKP-UHFFFAOYSA-N 0.000 description 1
- ROLAGNYPWIVYTG-UHFFFAOYSA-N 1,2-bis(4-methoxyphenyl)ethanamine;hydrochloride Chemical compound Cl.C1=CC(OC)=CC=C1CC(N)C1=CC=C(OC)C=C1 ROLAGNYPWIVYTG-UHFFFAOYSA-N 0.000 description 1
- PRJNEUBECVAVAG-UHFFFAOYSA-N 1,3-bis(ethenyl)benzene Chemical compound C=CC1=CC=CC(C=C)=C1 PRJNEUBECVAVAG-UHFFFAOYSA-N 0.000 description 1
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 1
- WEERVPDNCOGWJF-UHFFFAOYSA-N 1,4-bis(ethenyl)benzene Chemical compound C=CC1=CC=C(C=C)C=C1 WEERVPDNCOGWJF-UHFFFAOYSA-N 0.000 description 1
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 description 1
- PRBHEGAFLDMLAL-UHFFFAOYSA-N 1,5-Hexadiene Natural products CC=CCC=C PRBHEGAFLDMLAL-UHFFFAOYSA-N 0.000 description 1
- KWKAKUADMBZCLK-UHFFFAOYSA-N 1-octene Chemical group CCCCCCC=C KWKAKUADMBZCLK-UHFFFAOYSA-N 0.000 description 1
- UXOXUHMFQZEAFR-UHFFFAOYSA-N 2,2',5,5'-Tetrachlorobenzidine Chemical group C1=C(Cl)C(N)=CC(Cl)=C1C1=CC(Cl)=C(N)C=C1Cl UXOXUHMFQZEAFR-UHFFFAOYSA-N 0.000 description 1
- VOZKAJLKRJDJLL-UHFFFAOYSA-N 2,4-diaminotoluene Chemical compound CC1=CC=C(N)C=C1N VOZKAJLKRJDJLL-UHFFFAOYSA-N 0.000 description 1
- FJYCAYKHNVQCJW-UHFFFAOYSA-N 2-[4-[4-(2-aminophenoxy)phenyl]sulfonylphenoxy]aniline Chemical compound NC1=CC=CC=C1OC1=CC=C(S(=O)(=O)C=2C=CC(OC=3C(=CC=CC=3)N)=CC=2)C=C1 FJYCAYKHNVQCJW-UHFFFAOYSA-N 0.000 description 1
- XVWJWPWCGSHRKX-UHFFFAOYSA-N 2-amino-5-(1,1,1,3,3,3-hexafluoropropan-2-yl)phenol Chemical compound NC1=CC=C(C(C(F)(F)F)C(F)(F)F)C=C1O XVWJWPWCGSHRKX-UHFFFAOYSA-N 0.000 description 1
- IIQLVLWFQUUZII-UHFFFAOYSA-N 2-amino-5-(4-amino-3-carboxyphenyl)benzoic acid Chemical group C1=C(C(O)=O)C(N)=CC=C1C1=CC=C(N)C(C(O)=O)=C1 IIQLVLWFQUUZII-UHFFFAOYSA-N 0.000 description 1
- ZGDMDBHLKNQPSD-UHFFFAOYSA-N 2-amino-5-(4-amino-3-hydroxyphenyl)phenol Chemical group C1=C(O)C(N)=CC=C1C1=CC=C(N)C(O)=C1 ZGDMDBHLKNQPSD-UHFFFAOYSA-N 0.000 description 1
- YMVYKBJXVKHCEV-UHFFFAOYSA-N 2-amino-5-propylphenol Chemical compound CCCC1=CC=C(N)C(O)=C1 YMVYKBJXVKHCEV-UHFFFAOYSA-N 0.000 description 1
- KURPPWHPIYBYBS-UHFFFAOYSA-N 2-ethenylaniline Chemical compound NC1=CC=CC=C1C=C KURPPWHPIYBYBS-UHFFFAOYSA-N 0.000 description 1
- UWRZIZXBOLBCON-UHFFFAOYSA-N 2-phenylethenamine Chemical compound NC=CC1=CC=CC=C1 UWRZIZXBOLBCON-UHFFFAOYSA-N 0.000 description 1
- HUWXDEQWWKGHRV-UHFFFAOYSA-N 3,3'-Dichlorobenzidine Chemical group C1=C(Cl)C(N)=CC=C1C1=CC=C(N)C(Cl)=C1 HUWXDEQWWKGHRV-UHFFFAOYSA-N 0.000 description 1
- JRBJSXQPQWSCCF-UHFFFAOYSA-N 3,3'-Dimethoxybenzidine Chemical group C1=C(N)C(OC)=CC(C=2C=C(OC)C(N)=CC=2)=C1 JRBJSXQPQWSCCF-UHFFFAOYSA-N 0.000 description 1
- NUIURNJTPRWVAP-UHFFFAOYSA-N 3,3'-Dimethylbenzidine Chemical group C1=C(N)C(C)=CC(C=2C=C(C)C(N)=CC=2)=C1 NUIURNJTPRWVAP-UHFFFAOYSA-N 0.000 description 1
- LXJLFVRAWOOQDR-UHFFFAOYSA-N 3-(3-aminophenoxy)aniline Chemical compound NC1=CC=CC(OC=2C=C(N)C=CC=2)=C1 LXJLFVRAWOOQDR-UHFFFAOYSA-N 0.000 description 1
- LJGHYPLBDBRCRZ-UHFFFAOYSA-N 3-(3-aminophenyl)sulfonylaniline Chemical compound NC1=CC=CC(S(=O)(=O)C=2C=C(N)C=CC=2)=C1 LJGHYPLBDBRCRZ-UHFFFAOYSA-N 0.000 description 1
- ZBMISJGHVWNWTE-UHFFFAOYSA-N 3-(4-aminophenoxy)aniline Chemical compound C1=CC(N)=CC=C1OC1=CC=CC(N)=C1 ZBMISJGHVWNWTE-UHFFFAOYSA-N 0.000 description 1
- WCXGOVYROJJXHA-UHFFFAOYSA-N 3-[4-[4-(3-aminophenoxy)phenyl]sulfonylphenoxy]aniline Chemical compound NC1=CC=CC(OC=2C=CC(=CC=2)S(=O)(=O)C=2C=CC(OC=3C=C(N)C=CC=3)=CC=2)=C1 WCXGOVYROJJXHA-UHFFFAOYSA-N 0.000 description 1
- GPXCORHXFPYJEH-UHFFFAOYSA-N 3-[[3-aminopropyl(dimethyl)silyl]oxy-dimethylsilyl]propan-1-amine Chemical compound NCCC[Si](C)(C)O[Si](C)(C)CCCN GPXCORHXFPYJEH-UHFFFAOYSA-N 0.000 description 1
- ZWRBLCDTKAWRHT-UHFFFAOYSA-N 3-[[[3-aminopropyl(dimethyl)silyl]oxy-dimethylsilyl]oxy-dimethylsilyl]propan-1-amine Chemical compound NCCC[Si](C)(C)O[Si](C)(C)O[Si](C)(C)CCCN ZWRBLCDTKAWRHT-UHFFFAOYSA-N 0.000 description 1
- IFSSSYDVRQSDSG-UHFFFAOYSA-N 3-ethenylaniline Chemical compound NC1=CC=CC(C=C)=C1 IFSSSYDVRQSDSG-UHFFFAOYSA-N 0.000 description 1
- ZSSBYOXGEIGBLA-UHFFFAOYSA-N 3-phenylpropa-1,2-dienylbenzene Chemical group C=1C=CC=CC=1C=C=CC1=CC=CC=C1 ZSSBYOXGEIGBLA-UHFFFAOYSA-N 0.000 description 1
- WECDUOXQLAIPQW-UHFFFAOYSA-N 4,4'-Methylene bis(2-methylaniline) Chemical compound C1=C(N)C(C)=CC(CC=2C=C(C)C(N)=CC=2)=C1 WECDUOXQLAIPQW-UHFFFAOYSA-N 0.000 description 1
- ICNFHJVPAJKPHW-UHFFFAOYSA-N 4,4'-Thiodianiline Chemical compound C1=CC(N)=CC=C1SC1=CC=C(N)C=C1 ICNFHJVPAJKPHW-UHFFFAOYSA-N 0.000 description 1
- YBRVSVVVWCFQMG-UHFFFAOYSA-N 4,4'-diaminodiphenylmethane Chemical compound C1=CC(N)=CC=C1CC1=CC=C(N)C=C1 YBRVSVVVWCFQMG-UHFFFAOYSA-N 0.000 description 1
- XTEBLARUAVEBRF-UHFFFAOYSA-N 4-(1,1,1,3,3,3-hexafluoropropan-2-yl)aniline Chemical compound NC1=CC=C(C(C(F)(F)F)C(F)(F)F)C=C1 XTEBLARUAVEBRF-UHFFFAOYSA-N 0.000 description 1
- UITKHKNFVCYWNG-UHFFFAOYSA-N 4-(3,4-dicarboxybenzoyl)phthalic acid Chemical compound C1=C(C(O)=O)C(C(=O)O)=CC=C1C(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 UITKHKNFVCYWNG-UHFFFAOYSA-N 0.000 description 1
- LFBALUPVVFCEPA-UHFFFAOYSA-N 4-(3,4-dicarboxyphenyl)phthalic acid Chemical compound C1=C(C(O)=O)C(C(=O)O)=CC=C1C1=CC=C(C(O)=O)C(C(O)=O)=C1 LFBALUPVVFCEPA-UHFFFAOYSA-N 0.000 description 1
- FWOLORXQTIGHFX-UHFFFAOYSA-N 4-(4-amino-2,3,5,6-tetrafluorophenyl)-2,3,5,6-tetrafluoroaniline Chemical group FC1=C(F)C(N)=C(F)C(F)=C1C1=C(F)C(F)=C(N)C(F)=C1F FWOLORXQTIGHFX-UHFFFAOYSA-N 0.000 description 1
- KHYXYOGWAIYVBD-UHFFFAOYSA-N 4-(4-propylphenoxy)aniline Chemical compound C1=CC(CCC)=CC=C1OC1=CC=C(N)C=C1 KHYXYOGWAIYVBD-UHFFFAOYSA-N 0.000 description 1
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 description 1
- LBSXSAXOLABXMF-UHFFFAOYSA-N 4-Vinylaniline Chemical compound NC1=CC=C(C=C)C=C1 LBSXSAXOLABXMF-UHFFFAOYSA-N 0.000 description 1
- CBEVWPCAHIAUOD-UHFFFAOYSA-N 4-[(4-amino-3-ethylphenyl)methyl]-2-ethylaniline Chemical compound C1=C(N)C(CC)=CC(CC=2C=C(CC)C(N)=CC=2)=C1 CBEVWPCAHIAUOD-UHFFFAOYSA-N 0.000 description 1
- ZYEDGEXYGKWJPB-UHFFFAOYSA-N 4-[2-(4-aminophenyl)propan-2-yl]aniline Chemical compound C=1C=C(N)C=CC=1C(C)(C)C1=CC=C(N)C=C1 ZYEDGEXYGKWJPB-UHFFFAOYSA-N 0.000 description 1
- WUPRYUDHUFLKFL-UHFFFAOYSA-N 4-[3-(4-aminophenoxy)phenoxy]aniline Chemical compound C1=CC(N)=CC=C1OC1=CC=CC(OC=2C=CC(N)=CC=2)=C1 WUPRYUDHUFLKFL-UHFFFAOYSA-N 0.000 description 1
- SSDBTLHMCVFQMS-UHFFFAOYSA-N 4-[4-(1,1,1,3,3,3-hexafluoropropan-2-yl)phenoxy]aniline Chemical compound C1=CC(N)=CC=C1OC1=CC=C(C(C(F)(F)F)C(F)(F)F)C=C1 SSDBTLHMCVFQMS-UHFFFAOYSA-N 0.000 description 1
- JCRRFJIVUPSNTA-UHFFFAOYSA-N 4-[4-(4-aminophenoxy)phenoxy]aniline Chemical compound C1=CC(N)=CC=C1OC(C=C1)=CC=C1OC1=CC=C(N)C=C1 JCRRFJIVUPSNTA-UHFFFAOYSA-N 0.000 description 1
- QBSMHWVGUPQNJJ-UHFFFAOYSA-N 4-[4-(4-aminophenyl)phenyl]aniline Chemical compound C1=CC(N)=CC=C1C1=CC=C(C=2C=CC(N)=CC=2)C=C1 QBSMHWVGUPQNJJ-UHFFFAOYSA-N 0.000 description 1
- LDFYRFKAYFZVNH-UHFFFAOYSA-N 4-[4-[4-(4-aminophenoxy)phenoxy]phenoxy]aniline Chemical compound C1=CC(N)=CC=C1OC(C=C1)=CC=C1OC(C=C1)=CC=C1OC1=CC=C(N)C=C1 LDFYRFKAYFZVNH-UHFFFAOYSA-N 0.000 description 1
- HYDATEKARGDBKU-UHFFFAOYSA-N 4-[4-[4-(4-aminophenoxy)phenyl]phenoxy]aniline Chemical group C1=CC(N)=CC=C1OC1=CC=C(C=2C=CC(OC=3C=CC(N)=CC=3)=CC=2)C=C1 HYDATEKARGDBKU-UHFFFAOYSA-N 0.000 description 1
- UTDAGHZGKXPRQI-UHFFFAOYSA-N 4-[4-[4-(4-aminophenoxy)phenyl]sulfonylphenoxy]aniline Chemical compound C1=CC(N)=CC=C1OC1=CC=C(S(=O)(=O)C=2C=CC(OC=3C=CC(N)=CC=3)=CC=2)C=C1 UTDAGHZGKXPRQI-UHFFFAOYSA-N 0.000 description 1
- HVOANTMNYBSIGH-UHFFFAOYSA-N 4-prop-2-enoxyaniline Chemical compound NC1=CC=C(OCC=C)C=C1 HVOANTMNYBSIGH-UHFFFAOYSA-N 0.000 description 1
- VQVIHDPBMFABCQ-UHFFFAOYSA-N 5-(1,3-dioxo-2-benzofuran-5-carbonyl)-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(C(C=2C=C3C(=O)OC(=O)C3=CC=2)=O)=C1 VQVIHDPBMFABCQ-UHFFFAOYSA-N 0.000 description 1
- ROWKCXLLOLDVIO-UHFFFAOYSA-N 7-oxabicyclo[2.2.1]hept-5-ene-2,3-dicarboxylic acid Chemical compound O1C2C=CC1C(C(=O)O)C2C(O)=O ROWKCXLLOLDVIO-UHFFFAOYSA-N 0.000 description 1
- MQJKPEGWNLWLTK-UHFFFAOYSA-N Dapsone Chemical compound C1=CC(N)=CC=C1S(=O)(=O)C1=CC=C(N)C=C1 MQJKPEGWNLWLTK-UHFFFAOYSA-N 0.000 description 1
- 229910010082 LiAlH Inorganic materials 0.000 description 1
- 229920003354 Modic® Polymers 0.000 description 1
- NIPNSKYNPDTRPC-UHFFFAOYSA-N N-[2-oxo-2-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)ethyl]-2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidine-5-carboxamide Chemical compound O=C(CNC(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F)N1CC2=C(CC1)NN=N2 NIPNSKYNPDTRPC-UHFFFAOYSA-N 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- UIEXFJVOIMVETD-UHFFFAOYSA-N P([O-])([O-])[O-].[Pt+3] Chemical compound P([O-])([O-])[O-].[Pt+3] UIEXFJVOIMVETD-UHFFFAOYSA-N 0.000 description 1
- 101150003085 Pdcl gene Proteins 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical group C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 1
- 125000000738 acetamido group Chemical group [H]C([H])([H])C(=O)N([H])[*] 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000005456 alcohol based solvent Substances 0.000 description 1
- 150000001299 aldehydes Chemical class 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 229940045985 antineoplastic platinum compound Drugs 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 230000003078 antioxidant effect Effects 0.000 description 1
- HFACYLZERDEVSX-UHFFFAOYSA-N benzidine Chemical group C1=CC(N)=CC=C1C1=CC=C(N)C=C1 HFACYLZERDEVSX-UHFFFAOYSA-N 0.000 description 1
- NIDNOXCRFUCAKQ-UHFFFAOYSA-N bicyclo[2.2.1]hept-5-ene-2,3-dicarboxylic acid Chemical compound C1C2C=CC1C(C(=O)O)C2C(O)=O NIDNOXCRFUCAKQ-UHFFFAOYSA-N 0.000 description 1
- TUQQUUXMCKXGDI-UHFFFAOYSA-N bis(3-aminophenyl)methanone Chemical compound NC1=CC=CC(C(=O)C=2C=C(N)C=CC=2)=C1 TUQQUUXMCKXGDI-UHFFFAOYSA-N 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- CREMABGTGYGIQB-UHFFFAOYSA-N carbon carbon Chemical compound C.C CREMABGTGYGIQB-UHFFFAOYSA-N 0.000 description 1
- LDKSTCHEYCNPDS-UHFFFAOYSA-L carbon monoxide;dichloroplatinum Chemical compound O=C=[Pt](Cl)(Cl)=C=O LDKSTCHEYCNPDS-UHFFFAOYSA-L 0.000 description 1
- 125000002843 carboxylic acid group Chemical group 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- UKJLNMAFNRKWGR-UHFFFAOYSA-N cyclohexatrienamine Chemical group NC1=CC=C=C[CH]1 UKJLNMAFNRKWGR-UHFFFAOYSA-N 0.000 description 1
- NLDGJRWPPOSWLC-UHFFFAOYSA-N deca-1,9-diene Chemical compound C=CCCCCCCC=C NLDGJRWPPOSWLC-UHFFFAOYSA-N 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 239000012024 dehydrating agents Substances 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 1
- 125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000004088 foaming agent Substances 0.000 description 1
- 238000001879 gelation Methods 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- PYGSKMBEVAICCR-UHFFFAOYSA-N hexa-1,5-diene Chemical compound C=CCCC=C PYGSKMBEVAICCR-UHFFFAOYSA-N 0.000 description 1
- 125000004836 hexamethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[*:1] 0.000 description 1
- 239000012456 homogeneous solution Substances 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 239000004611 light stabiliser Substances 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000006078 metal deactivator Substances 0.000 description 1
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 1
- OBKARQMATMRWQZ-UHFFFAOYSA-N naphthalene-1,2,5,6-tetracarboxylic acid Chemical compound OC(=O)C1=C(C(O)=O)C=CC2=C(C(O)=O)C(C(=O)O)=CC=C21 OBKARQMATMRWQZ-UHFFFAOYSA-N 0.000 description 1
- 150000001451 organic peroxides Chemical class 0.000 description 1
- 150000002898 organic sulfur compounds Chemical class 0.000 description 1
- 150000002903 organophosphorus compounds Chemical class 0.000 description 1
- AICOOMRHRUFYCM-ZRRPKQBOSA-N oxazine, 1 Chemical compound C([C@@H]1[C@H](C(C[C@]2(C)[C@@H]([C@H](C)N(C)C)[C@H](O)C[C@]21C)=O)CC1=CC2)C[C@H]1[C@@]1(C)[C@H]2N=C(C(C)C)OC1 AICOOMRHRUFYCM-ZRRPKQBOSA-N 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- PKELYQZIUROQSI-UHFFFAOYSA-N phosphane;platinum Chemical compound P.[Pt] PKELYQZIUROQSI-UHFFFAOYSA-N 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 150000003058 platinum compounds Chemical class 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920005599 polyhydrosilane Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- WGYKZJWCGVVSQN-UHFFFAOYSA-N propylamine Chemical group CCCN WGYKZJWCGVVSQN-UHFFFAOYSA-N 0.000 description 1
- 150000003254 radicals Chemical group 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 150000003335 secondary amines Chemical class 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 125000000383 tetramethylene group Chemical group [H]C([H])([*:1])C([H])([H])C([H])([H])C([H])([H])[*:2] 0.000 description 1
- 150000003606 tin compounds Chemical class 0.000 description 1
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
Landscapes
- Compositions Of Macromolecular Compounds (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
- Silicon Polymers (AREA)
Description
【0001】[0001]
【産業上の利用分野】本発明は反応性を有するイミド化
合物を含有する硬化性組成物に関する。さらに詳しく
は、硬化時に低沸点化合物の発生を伴わず、比較的低温
で速やかに硬化し、硬化後に優れた耐熱性、耐薬品性、
機械的特性を有する硬化物を与える硬化性組成物に関す
る。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a curable composition containing a reactive imide compound. More specifically, it cures quickly at a relatively low temperature without the generation of low-boiling compounds during curing, and has excellent heat resistance, chemical resistance after curing,
The present invention relates to a curable composition that gives a cured product having mechanical properties.
【0002】[0002]
【従来の技術】従来、硬化性組成物として多くの組成物
が開発されている。その中には、比較的低温で進行する
ヒドロシリル化反応を利用した硬化性組成物も開示され
ている(特開平1-138230号公報)。該組成物を使用する
と、硬化時に低沸点化合物の発生がほとんどなく、外観
の良好な化合物がえられるが、アルケニル基含有成分お
よびヒドロシリル基含有成分がともに主鎖がポリエーテ
ルからなり、えられる硬化物は耐熱性、耐薬品性などが
充分でなく、100 ℃といった温度でも短時間で機械的特
性が大きく低下する、耐酸性、耐溶剤性がわるいなどの
欠点を有している。したがって、耐熱性や耐薬品性の要
求される用途、たとえば電子部品まわりのコーティング
剤、耐熱性接着剤などの用途には適さない。2. Description of the Related Art Conventionally, many compositions have been developed as curable compositions. Among them, a curable composition utilizing a hydrosilylation reaction which proceeds at a relatively low temperature is also disclosed (JP-A-1-138230). When the composition is used, a low-boiling compound is hardly generated at the time of curing, and a compound having a good appearance can be obtained. However, the main chain of both the alkenyl group-containing component and the hydrosilyl group-containing component is composed of polyether, and the obtained curing is obtained. The products have insufficient heat resistance, chemical resistance, etc., and have drawbacks such as a large decrease in mechanical properties in a short time even at a temperature of 100 ° C., and poor acid resistance and solvent resistance. Therefore, it is not suitable for applications requiring heat resistance and chemical resistance, for example, applications such as coating agents around electronic components and heat-resistant adhesives.
【0003】[0003]
【発明が解決しようとする課題】本発明は、硬化時に低
沸点化合物の発生を伴わず比較的低温で速やかに硬化
し、硬化後に耐熱性、耐薬品性、機械的強度の優れた硬
化物を与える硬化性組成物を提供することを目的とす
る。DISCLOSURE OF THE INVENTION The present invention provides a cured product which cures rapidly at a relatively low temperature without generating a low-boiling compound at the time of curing, and has excellent heat resistance, chemical resistance and mechanical strength after curing. It is intended to provide a curable composition to be provided.
【0004】[0004]
【課題を解決するための手段】発明者らは、かかる課題
について鋭意検討を重ねた結果、分子中に少なくとも2
個のヒドロシリル基を有するイミド化合物と分子内に少
なくとも2個の炭素−炭素2重結合を有する化合物とを
ヒドロシリル化触媒を用いて反応させると比較的低温で
も速やかに硬化し、硬化時に低沸点化合物の発生を伴わ
ないために、硬化物の作製が容易で、硬化後に優れた耐
熱性、耐薬品性、機械的特性を有する硬化物を与えるこ
とを見出し、本発明を完成するに至った。Means for Solving the Problems As a result of intensive studies on such problems, the present inventors have found that at least two molecules are present in a molecule.
When an imide compound having two hydrosilyl groups and a compound having at least two carbon-carbon double bonds in the molecule are reacted with each other using a hydrosilylation catalyst, the compound is rapidly cured even at a relatively low temperature, and a low-boiling compound is obtained during curing. It has been found that the production of a cured product is easy because of not causing the occurrence of the cured product, and a cured product having excellent heat resistance, chemical resistance and mechanical properties is provided after curing, and the present invention has been completed.
【0005】すなわち、本発明は、(A)一般式
(I):That is, the present invention provides (A) a compound represented by the general formula (I):
【0006】[0006]
【化4】 Embedded image
【0007】(式中、R1 は炭素数6〜30個の芳香族基
を含有する4価の有機基、R2 は炭素数6〜30個の芳香
族基を含有する2価の有機基、または一般式(II):Wherein R 1 is a tetravalent organic group containing an aromatic group having 6 to 30 carbon atoms, and R 2 is a divalent organic group containing an aromatic group having 6 to 30 carbon atoms. Or the general formula (II):
【0008】[0008]
【化5】 Embedded image
【0009】(R4は炭素数1〜20個の2価の有機基、
R5は炭素数1〜20個の1価の有機基を表わし、複数の
R4、R5は同一であってもよく、また異なっていてもよ
い、lは1〜20の正の整数を表わす)で表わされる2価
の有機基、R3は炭素数1〜20の2価の有機基、Yは少
なくとも1つのヒドロシリル基を含む炭素数1〜20の有
機基を表わし、2つのR3およびYは同一であってもよ
く、また異なっていてもよい、nは1〜100 の整数を表
わす)で表わされるイミド化合物および一般式(II
I):(R 4 is a divalent organic group having 1 to 20 carbon atoms,
R 5 represents a monovalent organic group having 1 to 20 carbon atoms, and a plurality of R 4 and R 5 may be the same or different; l is a positive integer of 1 to 20 R 3 is a divalent organic group having 1 to 20 carbon atoms, Y is an organic group having 1 to 20 carbon atoms including at least one hydrosilyl group, and two R 3 and Y may be the same, or different Tei may, n imide compound is represented by representing) an integer from 1 to 100 and the general formula (II
I):
【0010】[0010]
【化6】 Embedded image
【0011】(式中、R1、R2、nは前記と同じであ
り、R6は少なくとも1つのヒドロシリル基を含む炭素
数1〜20個の2価の有機基であって、2つのR6は同一
であってもよく、また異なっていてもよい)で表わされ
るイミド化合物から選ばれた少なくとも1種のイミド化
合物、 (B)一般式(IV): Wherein R 1 , R 2 , and n are the same as above, and R 6 is a divalent organic group having 1 to 20 carbon atoms containing at least one hydrosilyl group; At least one imide compound selected from imide compounds represented by the following general formula (IV):
【化8】 (式中、R 8 は水素原子またはメチル基であり、R 9 は炭
素数2〜20個の2価の有機基であり、1個以上のエーテ
ル結合を有していてもよい、R 10 は炭素数1〜30個の芳
香族または脂肪族系の2〜4価の有機基、aは2〜4の
整数を表わす)で表わされるエーテル結合を有する化合
物、一般式(V): Embedded image (Wherein, R 8 is a hydrogen atom or a methyl group, and R 9 is
A divalent organic group having a prime number of 2 to 20;
R 10 may have 1 to 30 carbon atoms.
An aromatic or aliphatic divalent to tetravalent organic group, a is 2 to 4
A compound having an ether bond represented by
Object, general formula (V):
【化9】 (式中、R 8 、R 9 は前記に同じであり、R 11 は炭素数1
〜30個の1〜4価の有機基、bは1〜4の整数を表わ
す)で表わされるエステル結合を有する化合物、一般式
(VI): Embedded image (Wherein, R 8 and R 9 are the same as described above, and R 11 has 1 carbon atom)
~ 30 monovalent to tetravalent organic groups, b represents an integer of 1 to 4
Compound having an ester bond represented by the general formula
(VI):
【化10】 (式中、R 8 、aは前記に同じであり、R 12 は炭素数2
〜50個の2〜4価の有機基を表わす)で表わされる炭化
水素系の化合物、および、一般式(VII): Embedded image (Wherein R 8 and a are the same as described above, and R 12 has 2 carbon atoms.
Represents up to 50 divalent to tetravalent organic groups)
A hydrogen-based compound and a compound represented by the general formula (VII):
【化11】 (式中、R 8 、R 9 、aは前記に同じであり、R 13 は炭素
数1〜30個の2〜4価の有機基を表わす)で表わされる
カーボネート結合を有する化合物、1,3−ブタジエ
ン、ビスフェノールAジアリルエーテル、ビスフェノー
ルPジアリルエーテル、ジアリルテレフタレート、ジア
リルイソフタレートまたはジアリルカーボネートであ
る、分子内に少なくとも2個の炭素−炭素2重結合を有
し、イミド基を含まない化合物、および (C)ヒドロシリル化触媒 を含有し、(A)成分中のヒドロシリル(Si−H)基
が(B)成分中の炭素−炭素2重結合に対してモル比で
0.5〜10倍量、(C)成分の使用量が、(B)成分中の
炭素−炭素2重結合1モルに対して10 -1 〜10 -8 モルであ
る硬化性組成物に関する。Embedded image (Wherein R 8 , R 9 and a are the same as above, and R 13 is a carbon atom
Represents an organic group having 1 to 30 divalent to tetravalent organic groups)
Compound having a carbonate bond, 1,3-butadiene
, Bisphenol A diallyl ether, bisphenol
P diallyl ether, diallyl terephthalate, dia
Ryl isophthalate or diallyl carbonate
Have at least two carbon-carbon double bonds in the molecule
And a compound containing no imide group , and (C) a hydrosilylation catalyst, and a hydrosilyl (Si—H) group in the component (A).
Is a molar ratio with respect to the carbon-carbon double bond in the component (B).
0.5 to 10 times the amount of component (C) used in component (B)
The present invention relates to a curable composition having an amount of 10 < -1 > to 10 < -8> mol per mol of carbon-carbon double bond .
【0012】[0012]
【作用および実施例】本発明においては、(A)成分と
して、一般式(I):In the present invention, the component (A) is represented by the general formula (I):
【0013】[0013]
【化7】 Embedded image
【0014】(式中、R1 は炭素数6〜30個の芳香族基
を含有する4価の有機基、R2 は炭素数6〜30個の芳香
族基を含有する2価の有機基、または一般式(II):Wherein R 1 is a tetravalent organic group containing an aromatic group having 6 to 30 carbon atoms, and R 2 is a divalent organic group containing an aromatic group having 6 to 30 carbon atoms. Or the general formula (II):
【0015】[0015]
【化8】 Embedded image
【0016】(R4 は炭素数1〜20個の2価の有機基、
R5 は炭素数1〜20個の1価の有機基を表わし、複数の
R4 、R5 は同一であってもよく、また異なっていても
よい、lは1〜20の正の整数を表わす)で表わされる2
価の有機基、R3 は炭素数1〜20の2価の有機基、Yは
少なくとも1つのヒドロシリル基を含む炭素数1〜20の
有機基を表わし、2つのR3 およびYは同一であっても
よく、また異なってもいてもよい、nは1〜100 の整数
を表わす)で表わされるイミド化合物および一般式(I
II):(R 4 is a divalent organic group having 1 to 20 carbon atoms,
R 5 represents a monovalent organic group having 1 to 20 carbon atoms, and a plurality of R 4 and R 5 may be the same or different; l is a positive integer of 1 to 20 2)
R 3 is a divalent organic group having 1 to 20 carbon atoms, Y is an organic group having 1 to 20 carbon atoms containing at least one hydrosilyl group, and two R 3 and Y are the same. And n may represent an integer of 1 to 100), and an imide compound represented by the general formula (I
II):
【0017】[0017]
【化9】 Embedded image
【0018】(式中、R1 、R2 、nは前記と同じであ
り、R6 は少なくとも1つのヒドロシリル基を含む炭素
数1〜20個の2価の有機基であって、2つのR6 は同一
であってもよく、また異なっていてもよい)で表わされ
るイミド化合物から選ばれた少なくとも1種のイミド化
合物(以下、ヒドロシリル基含有イミド化合物ともい
う)が使用される。(Wherein R 1 , R 2 , and n are the same as described above; R 6 is a divalent organic group having 1 to 20 carbon atoms containing at least one hydrosilyl group; 6 may be the same or different), and at least one imide compound selected from imide compounds represented by the following formula (hereinafter, also referred to as a hydrosilyl group-containing imide compound) is used.
【0019】本発明の組成物は、前記ヒドロシリル基含
有イミド化合物が炭素−炭素2重結合、たとえばアルケ
ニル基を有する化合物と、触媒の存在下で反応して硬化
物を生成することを利用したものであり、ヒドロシリル
基含有イミド化合物中にイミド基があるので、硬化後と
くに優れた耐熱性、耐薬品性、機械的特性を示す硬化物
がえられる。The composition of the present invention utilizes the fact that the hydrosilyl group-containing imide compound reacts with a compound having a carbon-carbon double bond, for example, an alkenyl group, in the presence of a catalyst to form a cured product. Since there is an imide group in the hydrosilyl group-containing imide compound, a cured product having particularly excellent heat resistance, chemical resistance and mechanical properties after curing can be obtained.
【0020】本発明に用いられる(A)成分であるヒド
ロシリル基含有イミド化合物は、分子中に少なくとも2
個、好ましくは2〜15個、さらには3〜12個のヒドロシ
リル基を有する化合物である。ヒドロシリル基含有イミ
ド化合物(A)が分子中に少なくとも2個のヒドロシリ
ル基を有するため、後述する(B)成分である分子内に
少なくとも2個の炭素−炭素2重結合を有する化合物と
の反応により、直鎖状または網目状重合体となる。1分
子中に含まれるヒドロシリル基の数が2個より少ないと
硬化不良を起こすばあいが多い。一方、ヒドロシリル基
の数が多くなりすぎると、ヒドロシリル基含有イミド化
合物(A)の貯蔵安定性がわるくなり、そのうえ、硬化
後も多量のヒドロシリル基が硬化物中に残存し、ボイド
やクラックの原因となる。The hydrosilyl group-containing imide compound as the component (A) used in the present invention has at least 2
, Preferably 2 to 15, more preferably 3 to 12 hydrosilyl groups. Since the hydrosilyl group-containing imide compound (A) has at least two hydrosilyl groups in the molecule, it reacts with a compound having at least two carbon-carbon double bonds in the molecule, which is the component (B) described below. , A linear or network polymer. If the number of hydrosilyl groups contained in one molecule is less than 2, curing failure often occurs. On the other hand, if the number of hydrosilyl groups is too large, the storage stability of the hydrosilyl group-containing imide compound (A) becomes poor, and a large amount of hydrosilyl groups remains in the cured product even after curing, causing voids and cracks. Becomes
【0021】前記ヒドロシリル基含有イミド化合物
(A)は分子中に少なくとも2個のヒドロシリル基を有
するイミド化合物である限りとくに限定はないが、分子
量としては500 〜20000 程度、さらには500 〜10000 程
度のものであるのが、溶解性や溶融性がよいため成形性
に優れ、かつ、えられる硬化物の耐熱性がすぐれるなど
の点から好ましい。The hydrosilyl group-containing imide compound (A) is not particularly limited as long as it is an imide compound having at least two hydrosilyl groups in the molecule, but has a molecular weight of about 500 to 20,000, more preferably about 500 to 10,000. These are preferred in that they have good moldability due to good solubility and meltability, and have excellent heat resistance of the resulting cured product.
【0022】前記一般式(I)および一般式(III)
において、R1 は炭素数6〜30個の芳香族基を含有する
4価の有機基であるが、とりわけ炭素数6〜30個の4価
の芳香族基または2価の基を介して結合した芳香族環か
らなる4価の基が、硬化後に耐熱性に優れた硬化物を与
えるという点から好ましい。とくに好ましい具体例とし
ては、ピロメリット酸、 3,3′,4,4′- ビフェニルテト
ラカルボン酸、 3,3′,4,4′- ベンゾフェノンテトラカ
ルボン酸、 3,3′,4,4′- ジフェニルスルホンテトラカ
ルボン酸、 3,3′,4,4′- ジフェニルエーテルテトラカ
ルボン酸、ナフタレン-1,2,5,6- テトラカルボン酸から
カルボン酸基を除いた残基などがあげられる。これらは
単独で用いてもよく、2種以上を併用してもよい。The above general formulas (I) and (III)
In the formula, R 1 is a tetravalent organic group containing an aromatic group having 6 to 30 carbon atoms, and particularly, R 1 is bonded via a tetravalent aromatic group having 6 to 30 carbon atoms or a divalent group. A tetravalent group comprising an aromatic ring is preferred from the viewpoint of providing a cured product having excellent heat resistance after curing. Particularly preferred specific examples are pyromellitic acid, 3,3 ', 4,4'-biphenyltetracarboxylic acid, 3,3', 4,4'-benzophenonetetracarboxylic acid, 3,3 ', 4,4' -Diphenylsulfonetetracarboxylic acid, 3,3 ', 4,4'-diphenylethertetracarboxylic acid, and residues obtained by removing carboxylic acid groups from naphthalene-1,2,5,6-tetracarboxylic acid. These may be used alone or in combination of two or more.
【0023】前記一般式(I)および一般式(III)
において、R2 は炭素数6〜30個の芳香族基を含有する
2価の有機基、または一般式(II):The above general formulas (I) and (III)
In the formula, R 2 is a divalent organic group containing an aromatic group having 6 to 30 carbon atoms, or a general formula (II):
【0024】[0024]
【化10】 Embedded image
【0025】(R4 は炭素数1〜20個の2価の有機基、
R5 は炭素数1〜20個の1価の有機基を表わし、複数の
R4 、R5 は同一であってもよく、また異なっていても
よい、lは1〜20の正の整数を表わす)で表わされる基
であるが、このような基の具体例としては、たとえば、
4,4′- ジアミノジフェニルエーテル、 3,4′- ジアミ
ノジフェニルエーテル、 3,3′- ジアミノジフェニルエ
ーテル、 4,4′- ジアミノジフェニルスルフィド、 4,
4′- ビス(4-アミノフェノキシ)ビフェニル、 4,4′-
ジアミノジフェニルスルホン、 3,3′- ジアミノジフ
ェニルスルホン、 3,3′- ジアミノベンゾフェノン、ビ
ス[4-(4-アミノフェノキシ)フェニル]スルホン、ビ
ス[4-(3-アミノフェノキシ)フェニル]スルホン、ビ
ス[4-(2-アミノフェノキシ)フェニル]スルホン、1,
4-ビス(4-アミノフェノキシ)ベンゼン、1,3-ビス(4-
アミノフェノキシ)ベンゼン、1,4-ビス(4-アミノフェ
ニル)ベンゼン、ビス[4-(4-アミノフェノキシ)フェ
ニル]エーテル、 4,4′- ジアミノジフェニルメタン、
ビス(3-エチル-4- アミノフェニル)メタン、ビス(3-
メチル-4- アミノフェニル)メタン、ビス(3-クロロ-4
- アミノフェニル)メタン、 4,4′- ジアミノビフェニ
ル、 4,4′- ジアミノオクタフルオロビフェニル、 3,
3′- ジメトキシ-4,4′- ジアミノビフェニル、 3,3′-
ジメチル-4,4′-ジアミノビフェニル、 3,3′- ジクロ
ロ-4,4′- ジアミノビフェニル、 2,2′,5,5′- テトラ
クロロ-4,4′- ジアミノビフェニル、 3,3′- ジカルボ
キシ-4,4′- ジアミノビフェニル、 3,3′- ジヒドロキ
シ-4,4′- ジアミノビフェニル、2,4-ジアミノトルエ
ン、1,3-ジアミノベンゼン、1,4-ジアミノベンゼン、
2,2′-ビス[4-(4-アミノフェノキシ)フェニル]プロ
パン、 2,2′- ビス[4-(4-アミノフェノキシ)フェニ
ル]ヘキサフルオロプロパン、 2,2′- ビス(4-アミノ
フェニル)プロパン、 2,2′- ビス(4-アミノフェニ
ル)ヘキサフルオロプロパン、 2,2′- ビス(3-ヒドロ
キシ-4- アミノフェニル)プロパン、 2,2′- ビス(3-
ヒドロキシ-4- アミノフェニル)ヘキサフルオロプロパ
ン、 9,9′- ビス(4-アミノフェニル)-10-ヒドロアン
トラセン、 9,9′- ビス(4-アミノフェニル)フルオレ
ン、オルトトリジンスルホン;1,3-ビス(3-アミノプロ
ピル)テトラメチルジシロキサン、1,5-ビス(3-アミノ
プロピル)ヘキサメチルトリシロキサン、(R 4 is a divalent organic group having 1 to 20 carbon atoms,
R 5 represents a monovalent organic group having 1 to 20 carbon atoms, and a plurality of R 4 and R 5 may be the same or different; l is a positive integer of 1 to 20 Represents a group represented by the following formulas. Specific examples of such a group include, for example,
4,4'-diaminodiphenyl ether, 3,4'-diaminodiphenyl ether, 3,3'-diaminodiphenyl ether, 4,4'-diaminodiphenyl sulfide, 4,
4'-bis (4-aminophenoxy) biphenyl, 4,4'-
Diaminodiphenyl sulfone, 3,3'-diaminodiphenyl sulfone, 3,3'-diaminobenzophenone, bis [4- (4-aminophenoxy) phenyl] sulfone, bis [4- (3-aminophenoxy) phenyl] sulfone, bis [4- (2-aminophenoxy) phenyl] sulfone, 1,
4-bis (4-aminophenoxy) benzene, 1,3-bis (4-
Aminophenoxy) benzene, 1,4-bis (4-aminophenyl) benzene, bis [4- (4-aminophenoxy) phenyl] ether, 4,4′-diaminodiphenylmethane,
Bis (3-ethyl-4-aminophenyl) methane, bis (3-
Methyl-4-aminophenyl) methane, bis (3-chloro-4)
-Aminophenyl) methane, 4,4'-diaminobiphenyl, 4,4'-diaminooctafluorobiphenyl, 3,
3'-dimethoxy-4,4'-diaminobiphenyl, 3,3'-
Dimethyl-4,4'-diaminobiphenyl, 3,3'-dichloro-4,4'-diaminobiphenyl, 2,2 ', 5,5'-tetrachloro-4,4'-diaminobiphenyl, 3,3'-Dicarboxy-4,4'-diaminobiphenyl,3,3'-dihydroxy-4,4'-diaminobiphenyl, 2,4-diaminotoluene, 1,3-diaminobenzene, 1,4-diaminobenzene,
2,2'-bis [4- (4-aminophenoxy) phenyl] propane, 2,2'-bis [4- (4-aminophenoxy) phenyl] hexafluoropropane, 2,2'-bis (4-amino Phenyl) propane, 2,2'-bis (4-aminophenyl) hexafluoropropane, 2,2'-bis (3-hydroxy-4-aminophenyl) propane, 2,2'-bis (3-
Hydroxy-4-aminophenyl) hexafluoropropane, 9,9'-bis (4-aminophenyl) -10-hydroanthracene, 9,9'-bis (4-aminophenyl) fluorene, ortho-tolidine sulfone; 1,3- Bis (3-aminopropyl) tetramethyldisiloxane, 1,5-bis (3-aminopropyl) hexamethyltrisiloxane,
【0026】[0026]
【化11】 Embedded image
【0027】(式中、R5 、lは前記と同じ)で表わさ
れるアミノ基末端ポリシロキサンなどのシロキサンジア
ミンからアミノ基を除いた残基などがあげられる。これ
らは単独で用いてもよく、2種以上を併用してもよい。(Wherein R 5 and l are the same as those described above), and a residue obtained by removing an amino group from a siloxane diamine such as an amino group-terminated polysiloxane. These may be used alone or in combination of two or more.
【0028】R3 は炭素数1〜20個の2価の有機基であ
るが、このような基の具体例としては、たとえばメチレ
ン基、エチレン基、プロピレン基、ブチレン基、ヘキシ
レン基、オクチレン基、イソプロピレン基、イソブチレ
ン基、フェニレン基、ナフチレン基、ベンジレン基、フ
ェネチレン基などがあげられる。R 3 is a divalent organic group having 1 to 20 carbon atoms. Specific examples of such a group include, for example, a methylene group, an ethylene group, a propylene group, a butylene group, a hexylene group and an octylene group. , An isopropylene group, an isobutylene group, a phenylene group, a naphthylene group, a benzylene group and a phenethylene group.
【0029】また、一般式(II)において、R4 は炭
素数1〜20個の2価の有機基であり、具体例としては、
たとえばメチレン基、エチレン基、プロピレン基、ブチ
レン基、ヘキシレン基、オクチレン基、イソプロピレン
基、イソブチレン基、フェニレン基、ナフチレン基、ベ
ンジレン基、フェネチレン基などがあげられる。In the general formula (II), R 4 is a divalent organic group having 1 to 20 carbon atoms.
Examples include methylene, ethylene, propylene, butylene, hexylene, octylene, isopropylene, isobutylene, phenylene, naphthylene, benzylene, phenethylene and the like.
【0030】一般式(I)におけるYは少なくとも1つ
のヒドロシリル基を含む基であるが、このような基の具
体例としては、たとえばY in the general formula (I) is a group containing at least one hydrosilyl group. Specific examples of such a group include, for example,
【0031】[0031]
【化12】 Embedded image
【0032】などのケイ素原子を1個有するヒドロシリ
ル基(なお、−SiH3 のばあい、ヒドロシリル基を3
個含むことになる)、A hydrosilyl group having one silicon atom (in the case of --SiH 3 ,
Will be included),
【0033】[0033]
【化13】 Embedded image
【0034】などのケイ素原子を2個または3個含む
基、A group containing two or three silicon atoms, such as
【0035】[0035]
【化14】 Embedded image
【0036】(式中、R7 は、H、OSi(CH3 )3
および炭素数が1〜10の有機基より選ばれる基であり、
複数個あるR7 は同一であってもよく、異なっていても
よい、m、nは正の整数で、かつ、2<m+n<50を満
たす)、Wherein R 7 is H, OSi (CH 3 ) 3
And a group selected from organic groups having 1 to 10 carbon atoms,
A plurality of R 7 s may be the same or different; m and n are positive integers and satisfy 2 <m + n <50);
【0037】[0037]
【化15】 Embedded image
【0038】(式中、R7は前記と同じ、pは正の整数
qは0または正の整数で、かつ2≦p+q≦4、kは正
の整数、rは0または正の整数で、かつ、2≦k+r<
50)で示される鎖状、枝分かれ状、環状の各種の多価ハ
イドロジェンシロキサンより誘導された基などがあげら
れる。(Where R 7 is the same as above, p is a positive integer q is 0 or a positive integer, 2 ≦ p + q ≦ 4, k is a positive integer, r is 0 or a positive integer, And 2 ≦ k + r <
And groups derived from various polyvalent hydrogensiloxanes having a chain, a branch, or a ring shown in 50).
【0039】同一分子中にヒドロシリル基含有基が2個
以上存在するばあいには、それらは同一であってもよ
く、異なっていてもよい。When two or more hydrosilyl group-containing groups are present in the same molecule, they may be the same or different.
【0040】また、一般式(III)において、R6 は
少なくとも1つのヒドロシリル基を含む炭素数1〜20個
の2価の有機基で、好ましくは環を構成する炭素原子に
直接結合したヒドロシリル基を有する基が結合した構造
を有する2価の有機基である。このような基の好ましい
具体例としては、構造式:In the general formula (III), R 6 is a divalent organic group having 1 to 20 carbon atoms containing at least one hydrosilyl group, preferably a hydrosilyl group directly bonded to a ring-forming carbon atom. Is a divalent organic group having a structure in which a group having is bonded. Preferred specific examples of such groups include structural formulas:
【0041】[0041]
【化16】 Embedded image
【0042】(Yは前記に同じ)などで表わされる基が
あげられる。一般式(III)で表わされるイミド化合
物に存在する2つのR6 は同一であってもよく、また異
なっていてもよい。(Y is the same as described above). Two R 6 present in the imide compound represented by the general formula (III) may be the same or different.
【0043】つぎに、本発明に使用する(A)成分のう
ちの1種である一般式(I)で表わされるヒドロシリル
基含有イミド化合物の製法について説明する。Next, a method for producing the hydrosilyl group-containing imide compound represented by the general formula (I), which is one of the components (A) used in the present invention, will be described.
【0044】一般式(I)で表わされるヒドロシリル基
含有イミド化合物の製法にはとくに制限はなく、任意の
方法により製造しうる。The method for producing the hydrosilyl group-containing imide compound represented by the general formula (I) is not particularly limited, and it can be produced by any method.
【0045】たとえば、分子内にSi−Cl基をもつ
イミド化合物をLiAlH4 、NaBH4 などの還元剤
で処理して該化合物中のSi−Cl基をSi−H基に還
元する方法、分子内にある官能基Zを有するイミド化
合物と分子内に上記官能基と反応する官能基Y´および
ヒドロシリル基を同時に有する化合物とを反応させる方
法、炭素−炭素2重結合を有するイミド化合物に対し
て少なくとも2個のヒドロシリル基を有するポリヒドロ
シラン化合物を選択ヒドロシリル化することにより、反
応後もヒドロシリル基を該化合物の分子中に残存させる
方法などが考えられる。これらのうち、原料の入手のし
やすさ、反応の簡便さ、収率のよさなどの点からの方
法がとくに好ましい。For example, a method in which an imide compound having a Si—Cl group in the molecule is treated with a reducing agent such as LiAlH 4 or NaBH 4 to reduce the Si—Cl group in the compound to a Si—H group, A method of reacting an imide compound having a functional group Z and a compound having a functional group Y ′ and a hydrosilyl group simultaneously reacting with the above functional group in a molecule, at least for an imide compound having a carbon-carbon double bond. A method of selectively hydrosilylating a polyhydrosilane compound having two hydrosilyl groups so that the hydrosilyl group remains in the molecule of the compound after the reaction can be considered. Among them, the method is particularly preferable in terms of easy availability of raw materials, simple reaction, and high yield.
【0046】前記の方法によるばあい、反応成分であ
る炭素−炭素2重結合(たとえばアルケニル基)を有す
るイミド化合物を製造する方法としては、たとえばまず
芳香族テトラカルボン酸2無水物とジアミンとを有機極
性溶媒中で反応させ、続いて炭素−炭素2重結合含有1
級アミン化合物を反応させてポリアミド酸の溶液をえ、
ついで(i) 前記ポリアミド酸の溶液を加熱することによ
り熱的にイミド化する方法、もしくは(ii)前記ポリアミ
ド酸の溶液に無水酢酸などの脱水剤を作用させ、化学的
にイミド化する方法、もしくは(iii) 前記ポリアミド酸
の溶液を水、炭化水素のようなアミド酸に対する貧溶媒
と接触させてアミド酸を沈澱として析出させ、これを加
熱する方法などの方法があげられる。In the above-mentioned method, as a method for producing an imide compound having a carbon-carbon double bond (for example, an alkenyl group) as a reaction component, for example, first, an aromatic tetracarboxylic dianhydride and a diamine are used. Reaction in an organic polar solvent followed by a carbon-carbon double bond containing 1
Reacting a secondary amine compound to obtain a polyamic acid solution,
Then, (i) a method of thermally imidizing by heating the polyamic acid solution, or (ii) a method of chemically imidizing by reacting a dehydrating agent such as acetic anhydride on the polyamic acid solution, Alternatively, (iii) a method of contacting a solution of the polyamic acid with a poor solvent for amic acid such as water or hydrocarbon to precipitate amic acid as a precipitate and heating the precipitate.
【0047】これらのいずれの方法によっても炭素−炭
素2重結合を有するイミド化合物を製造することがで
き、とくに制約を受けるものではないが、製造装置や製
造工程がより簡便あるいは容易であることや、使用する
原料の入手が容易であることから、(i) の方法、すなわ
ち芳香族テトラカルボン酸2無水物とジアミンとを有機
極性溶媒中で反応させ、続いて炭素−炭素2重結合含有
1級アミンを反応させてポリアミド酸の溶液をえ、つい
で加熱してイミド化合物をうる方法が好ましい。An imide compound having a carbon-carbon double bond can be produced by any of these methods, and is not particularly limited. However, the production apparatus and production steps are simpler or easier. Since the raw materials to be used are easily available, the method (i), that is, the reaction of the aromatic tetracarboxylic dianhydride with the diamine in an organic polar solvent, followed by the carbon-carbon double bond-containing 1 It is preferable to obtain a polyamic acid solution by reacting a secondary amine and then obtain a imide compound by heating.
【0048】反応はテトラカルボン酸2無水物、ジアミ
ンおよび炭素−炭素2重結合含有1級アミン化合物を前
記のように溶媒中で80℃以下の温度で反応させてアミド
酸の溶液をえ、ついでこれを100 〜250 ℃に加熱する方
法が好ましい。The reaction is carried out by reacting tetracarboxylic dianhydride, diamine and a primary amine compound containing a carbon-carbon double bond in a solvent at a temperature of 80 ° C. or less as described above to obtain a solution of amic acid. It is preferable to heat this to 100 to 250 ° C.
【0049】使用する炭素−炭素2重結合含有1級アミ
ン化合物は、前記テトラカルボン酸2無水物とジアンと
の反応により新たに生成した酸無水物に対して2〜5倍
量(モル比、以下同様)、好ましくは2〜3倍量、より
好ましくは2〜2.5 倍量用いて反応させるのが好まし
い。炭素−炭素2重結合含有1級アミン化合物の量が2
倍量より少ないと、当然、未反応の酸無水物が残存し、
目的のイミド化合物の収率は低下するので好ましくな
い。また、5倍量をこえて用いると、残存する未反応の
ジアミンの量は減少するが、過剰に用いた炭素−炭素2
重結合含有1級アミン化合物の除去が困難になるので好
ましくない。The carbon-carbon double bond-containing primary amine compound to be used is 2 to 5 times (molar ratio) the acid anhydride newly formed by the reaction between the tetracarboxylic dianhydride and the dian. The same applies hereinafter), preferably 2 to 3 times, more preferably 2 to 2.5 times the amount. When the amount of the carbon-carbon double bond-containing primary amine compound is 2
If less than twice the amount, unreacted acid anhydride remains,
The yield of the desired imide compound is undesirably reduced. When used in an amount exceeding 5 times, the amount of remaining unreacted diamine decreases, but the excess carbon-carbon 2
It is not preferable because it becomes difficult to remove the primary amine compound containing a heavy bond.
【0050】好ましいテトラカルボン酸2無水物として
は、前記R1 の具体例としてあげた基のもとになったテ
トラカルボン酸2無水物が好ましい。使用されるジアミ
ンとしては、前記R2 の具体例としてあげた基のもとに
なったジアミンが好ましい。Preferred tetracarboxylic dianhydrides are tetracarboxylic dianhydrides based on the groups mentioned as specific examples of R 1 . As the diamine to be used, a diamine based on the group mentioned as a specific example of R 2 is preferable.
【0051】好ましい炭素−炭素2重結合含有1級アミ
ン化合物としては、たとえばアリルアミン、ブテニルア
ミン、o−アミノスチレン、m−アミノスチレン、p−
アミノスチレン、o−アリロキシアニリン、m−アリロ
キシアニリン、p−アリロキシアニリンなどがあげられ
る。Preferred primary amine compounds containing a carbon-carbon double bond include, for example, allylamine, butenylamine, o-aminostyrene, m-aminostyrene and p-aminostyrene.
Examples include aminostyrene, o-allyloxyaniline, m-allyloxyaniline, and p-allyloxyaniline.
【0052】前記有機極性溶媒としては、たとえばジメ
チルスルホキシド、ジエチルスルホキシドなどのスルホ
キシド系溶媒、N,N−ジメチルホルムアミド、N,N
−ジエチルホルムアミドなどのホルムアミド系溶媒、
N,N−ジメチルアセトアミド、N,N−ジエチルアセ
トアミドなどのアセトアミド系溶媒、N−メチル−2−
ピロリドン、N−アセチル−2−ピロリドン、N−ビニ
ル−2−ピロリドンなどのピロリドン系溶媒、フェノー
ル、o−クレゾール、m−クレゾール、p−クレゾー
ル、キシレノール、ハロゲン化フェノール、カテコール
などのフェノール系溶媒、ピリジン、ヘキサメチルホス
ホルアミド、γ−ブチロラクトン、これら2種以上の混
合物などがあげられる。Examples of the organic polar solvent include sulfoxide solvents such as dimethylsulfoxide and diethylsulfoxide, N, N-dimethylformamide, N, N
-Formamide solvents such as diethylformamide,
Acetamide solvents such as N, N-dimethylacetamide, N, N-diethylacetamide, N-methyl-2-
Pyrrolidone, N-acetyl-2-pyrrolidone, pyrrolidone-based solvents such as N-vinyl-2-pyrrolidone, phenol, o-cresol, m-cresol, p-cresol, xylenol, halogenated phenol, phenol-based solvents such as catechol, Examples include pyridine, hexamethylphosphoramide, γ-butyrolactone, and a mixture of two or more of these.
【0053】このようにして製造されたイミド化合物に
は炭素−炭素2重結合が存在するため、前述のごとき方
法によりヒドロシリル基を導入し、本発明に用いられる
ヒドロシリル基含有イミド化合物をうることができる。Since the imide compound thus produced has a carbon-carbon double bond, a hydrosilyl group can be introduced by the method described above to obtain the hydrosilyl group-containing imide compound used in the present invention. it can.
【0054】なお、前記炭素−炭素2重結合を有するイ
ミド化合物は、通常250 ℃以下の融点を有する。The imide compound having a carbon-carbon double bond usually has a melting point of 250 ° C. or less.
【0055】つぎに、一般式(III)で表わされるヒ
ドロシリル基含有イミド化合物の製法について説明す
る。Next, the method for producing the hydrosilyl group-containing imide compound represented by the general formula (III) will be described.
【0056】一般式(III)で表わされるヒドロシリ
ル基含有イミド化合物の製法にもとくに制限はなく、一
般式(I)で表わされるヒドロシリル基含有イミド化合
物のばあいと同様にして製造しうる。The method for producing the hydrosilyl group-containing imide compound represented by the general formula (III) is not particularly limited, and it can be produced in the same manner as in the case of the hydrosilyl group-containing imide compound represented by the general formula (I).
【0057】なお、一般式(III)で表わされるヒド
ロシリル基含有イミド化合物の製法においては、一般式
(I)で表わされるヒドロシリル基含有イミド化合物の
製造で用いた炭素−炭素2重結合含有1級アミン化合物
のかわりに環状オレフィン含有酸無水物が使用される。In the production of the hydrosilyl group-containing imide compound represented by the general formula (III), the carbon-carbon double bond-containing primary compound used in the production of the hydrosilyl group-containing imide compound represented by the general formula (I) is used. A cyclic olefin-containing acid anhydride is used in place of the amine compound.
【0058】使用する環状オレフィン含有酸無水物は、
前記テトラカルボン酸2無水物とジアンとの反応により
新たに生成したジアミンに対して、一般式(I)で表わ
されるヒドロシリル基含有イミド化合物のばあいと同様
に、2〜5倍量(モル比、以下同様)、好ましくは2〜
3倍量、より好ましくは2〜2.5 倍量用いて反応させる
のが好ましい。The cyclic olefin-containing acid anhydride used is:
As in the case of the hydrosilyl group-containing imide compound represented by the general formula (I), the diamine newly formed by the reaction between the tetracarboxylic dianhydride and the dian is 2 to 5 times (molar ratio) The same applies hereinafter), preferably 2 to
The reaction is preferably carried out using a 3-fold amount, more preferably 2-2.5-fold amount.
【0059】また、好ましいテトラカルボン酸2無水物
およびジアミンも一般式(I)で表わされるヒドロシリ
ル基含有イミド化合物のばあいと同様である。Preferred tetracarboxylic dianhydrides and diamines are the same as those for the hydrosilyl group-containing imide compound represented by the general formula (I).
【0060】一方、好ましい環状オレフィン含有酸無水
物としては、On the other hand, preferred cyclic olefin-containing acid anhydrides include:
【0061】[0061]
【化17】 Embedded image
【0062】などがあげられる。And the like.
【0063】前記環状オレフィン含有酸無水物、ジアミ
ンおよびテトラカルボン酸2無水物の反応生成物である
イミド化合物は、一般に250 ℃以下の融点を有する。The imide compound which is a reaction product of the cyclic olefin-containing acid anhydride, diamine and tetracarboxylic dianhydride generally has a melting point of 250 ° C. or less.
【0064】このようにして製造されたイミド化合物に
は炭素−炭素2重結合が存在するため、前述のごとき方
法によりヒドロシリル基を導入し、本発明に用いられる
ヒドロシリル基含有イミド化合物にしうる。Since the imide compound thus produced has a carbon-carbon double bond, a hydrosilyl group can be introduced by the above-described method to give the hydrosilyl group-containing imide compound used in the present invention.
【0065】本発明に用いられるヒドロシリル基含有イ
ミド化合物(A)は、一般に250 ℃以下の融点を有し、
ヘキサン、ヘプタン、ベンゼン、トルエン、キシレンな
どの炭化水素系溶媒、メタノール、エタノール、プロパ
ノール、エチレングリコール、1,4−ブタンジオール
などのアルコール系溶媒、ジエチルエーテル、テトラヒ
ドロフラン、1,4−ジオキサン、エチレングリコール
ジメチルエーテル、エチレングリコールジエチルエーテ
ル、アニソールなどのエーテル系溶媒、酢酸メチル、酢
酸エチル、酢酸プロピル、酢酸ブチル、安息香酸メチ
ル、安息香酸エチルなどのエステル系溶媒、塩化メチレ
ン、クロロホルム、塩化エチレン、クロロベンゼンなど
のハロゲン化炭化水素系溶媒、ジメチルスルホキシド、
ジエチルスルホキシドなどのスルホキシド系溶媒、N,
N−ジメチルホルムアミド、N,N−ジエチルホルムア
ミドなどのホルムアミド系溶媒、N,N−ジメチルアセ
トアミド、N,N−ジエチルアセトアミドなどのアセト
アミド系溶媒、N−メチル−2−ピロリドン、N−アセ
チル−2−ピロリドン、N−ビニル−2−ピロリドンな
どのピロリドン系溶媒、フェノール、o−クレゾール、
m−クレゾール、p−クレゾール、キシレノール、ハロ
ゲン化フェノール、カテコールなどのフェノール系溶
媒、ピリジン、ヘキサメチルホスホルアミド、γ−ブチ
ロラクトン、これら2種以上の混合物などに可溶であ
り、水には不溶である。また、分子内にヒドロシリル基
を有するために、ヒドロシリル化触媒の存在下、0〜30
0 ℃の温度で容易にアルケニル基などの炭素−炭素2重
結合と反応する。The hydrosilyl group-containing imide compound (A) used in the present invention generally has a melting point of 250 ° C. or less,
Hydrocarbon solvents such as hexane, heptane, benzene, toluene and xylene, alcohol solvents such as methanol, ethanol, propanol, ethylene glycol and 1,4-butanediol, diethyl ether, tetrahydrofuran, 1,4-dioxane, ethylene glycol Ether solvents such as dimethyl ether, ethylene glycol diethyl ether and anisole; ester solvents such as methyl acetate, ethyl acetate, propyl acetate, butyl acetate, methyl benzoate and ethyl benzoate; methylene chloride, chloroform, ethylene chloride, chlorobenzene and the like Halogenated hydrocarbon solvents, dimethyl sulfoxide,
Sulfoxide-based solvents such as diethylsulfoxide, N,
Formamide solvents such as N-dimethylformamide and N, N-diethylformamide; acetamido solvents such as N, N-dimethylacetamide and N, N-diethylacetamide; N-methyl-2-pyrrolidone; N-acetyl-2- Pyrrolidone, pyrrolidone-based solvents such as N-vinyl-2-pyrrolidone, phenol, o-cresol,
Soluble in phenolic solvents such as m-cresol, p-cresol, xylenol, halogenated phenol, catechol, pyridine, hexamethylphosphoramide, γ-butyrolactone, a mixture of two or more of these, and insoluble in water It is. Further, since it has a hydrosilyl group in the molecule, 0 to 30 in the presence of a hydrosilylation catalyst.
Reacts readily with carbon-carbon double bonds such as alkenyl groups at a temperature of 0 ° C.
【0066】本発明に用いられるヒドロシリル基含有イ
ミド化合物(A)はヒドロシリル基を有しており、湿分
が混入したりして粘度増大やゲル化などが起こりうる。
これを防止するために、ヒドロシリル基含有イミド化合
物(A)に脂肪族不飽和結合を含有する化合物、有機リ
ン化合物、有機硫黄化合物、チッ素含有化合物、スズ系
化合物、有機過酸化物などの貯蔵安定性改良剤を含有さ
せてもよい。貯蔵安定性改良剤の使用量は、均一に分散
する限りほぼ任意に選ぶことができるが、該ヒドロシリ
ル基含有イミド化合物(A)1mol に対し、10-6〜10-1
mol の範囲で用いるのが好ましい。これは、10-6mol 未
満だと該イミド化合物の貯蔵安定性が充分改良されず、
10-1mol をこえると硬化時に妨げとなるからである。貯
蔵安定性改良剤は単独で用いてもよく、また2種以上を
併用してもよい。The hydrosilyl group-containing imide compound (A) used in the present invention has a hydrosilyl group, and may increase in viscosity or gelation due to the incorporation of moisture.
To prevent this, the hydrosilyl group-containing imide compound (A) may be used to store an aliphatic unsaturated bond-containing compound, an organic phosphorus compound, an organic sulfur compound, a nitrogen-containing compound, a tin compound, an organic peroxide, or the like. A stability improver may be contained. The amount of the storage stability improver can be selected almost arbitrarily as long as it is uniformly dispersed, but is preferably 10 -6 to 10 -1 based on 1 mol of the hydrosilyl group-containing imide compound (A).
It is preferably used in the mol range. If the amount is less than 10 -6 mol, the storage stability of the imide compound is not sufficiently improved,
If it exceeds 10 -1 mol, it will hinder the curing. The storage stability improver may be used alone, or two or more kinds may be used in combination.
【0067】本発明においては、前記ヒドロシリル基含
有イミド化合物(A)と反応する成分((B)成分)と
して分子内に少なくとも2個の炭素−炭素2重結合を有
する化合物(以下、アルケニル化合物(B)ともいう)
が使用される。In the present invention, a compound having at least two carbon-carbon double bonds in a molecule (hereinafter referred to as an alkenyl compound (hereinafter referred to as an alkenyl compound) is used as a component (component (B)) that reacts with the hydrosilyl group-containing imide compound (A). B)
Is used.
【0068】アルケニル化合物(B)は分子内に少なく
とも2個の炭素−炭素2重結合を有し、イミド基を含ま
ない化合物であり、その具体例としては、たとえば下記
一般式(IV)〜一般式(VII)で表わされる化合物
があげられる。[0068] alkenyl compound (B) is at least 2 carbons in the molecule - has a carbon double bond, Ri compound der containing no imide group, specific examples thereof are, for example, the following
Compounds represented by general formulas (IV) to (VII)
Is raised .
【0069】[0069]
【0070】すなわち、一般式(IV):That is, the general formula (IV):
【0071】[0071]
【化18】 Embedded image
【0072】(式中、R8 は水素原子またはメチル基で
あり、R9 は炭素数2〜20個の2価の有機基であり、1
個以上のエーテル結合を有していてもよい、R10は炭素
数1〜30個の芳香族または脂肪族系の2〜4価の有機
基、aは2〜4の整数を表わす)で表わされるエーテル
結合を有する化合物、一般式(V):Wherein R 8 is a hydrogen atom or a methyl group; R 9 is a divalent organic group having 2 to 20 carbon atoms;
R 10 may have an aromatic bond or an aliphatic di- or tetra-valent organic group having 1 to 30 carbon atoms, and a represents an integer of 2 to 4). A compound having an ether bond represented by the general formula (V):
【0073】[0073]
【化19】 Embedded image
【0074】(式中、R8 、R9 は前記に同じであり、
R11は炭素数1〜30個の1〜4価の有機基、bは1〜4
の整数を表わす)で表わされるエステル結合を有する化
合物、一般式(VI):(Wherein R 8 and R 9 are the same as described above;
R 11 is a C 1-30 organic group having 1 to 4 valences, b is 1 to 4
A compound having an ester bond represented by the general formula (VI):
【0075】[0075]
【化20】 Embedded image
【0076】(式中、R8、aは前記に同じであり、R
12は炭素数2〜50個の2〜4価の有機基を表わす)で表
わされる炭化水素系の化合物、および、一般式(VI
I):(Wherein R 8 and a are the same as described above;
And 12 is a hydrocarbon compound represented by a divalent to tetravalent organic group having 2 to 50 carbon atoms, and a compound represented by the general formula (VI
I):
【0077】[0077]
【化21】 Embedded image
【0078】(式中、R8、R9、aは前記に同じであ
り、R13は炭素数1〜30個の2〜4価の有機基を表わ
す)で表わされるカーボネート結合を有する化合物であ
る。Wherein R 8 , R 9 and a are as defined above, and R 13 represents a divalent to tetravalent organic group having 1 to 30 carbon atoms and having a carbonate bond . in Oh <br/> Ru.
【0079】一般式(IV)、(V)、(VII)にお
けるR9 は、炭素数2〜20個の2価の有機基であり、1
個以上のエーテル結合を有していてもよい基であるが、
具体例としては、たとえばR 9 in the general formulas (IV), (V) and (VII) is a divalent organic group having 2 to 20 carbon atoms.
Is a group which may have more than one ether bond,
As a specific example,
【0080】[0080]
【化22】 Embedded image
【0081】などがあげられる。And the like.
【0082】一般式(IV)におけるR10は、炭素数1
〜30個の芳香族または脂肪族系の2〜4価の有機基であ
るが、具体例としては、たとえばIn the general formula (IV), R 10 has 1 carbon atom
It is an aromatic or aliphatic divalent to tetravalent organic group of up to 30. Specific examples include, for example,
【0083】[0083]
【化23】 Embedded image
【0084】[0084]
【化24】 Embedded image
【0085】などがあげられる。And the like.
【0086】また、一般式(V)における、R11は、炭
素数1〜30個の1〜4価の有機基であるが、その具体例
としては、たとえばIn the general formula (V), R 11 is a monovalent to tetravalent organic group having 1 to 30 carbon atoms.
【0087】[0087]
【化25】 Embedded image
【0088】[0088]
【化26】 Embedded image
【0089】などがあげられる。And the like.
【0090】また、一般式(VI)におけるR12は、炭
素数2〜50個の2〜4価の有機基であるが、その具体例
としては、たとえばR 12 in the general formula (VI) is a divalent to tetravalent organic group having 2 to 50 carbon atoms.
【0091】[0091]
【化27】 Embedded image
【0092】[0092]
【化28】 Embedded image
【0093】また、一般式(VII)におけるR13は、
炭素数1〜30個の2〜4価の有機基であるが、その具体
例としては、たとえばR 13 in the general formula (VII) is
Although it is a divalent or tetravalent organic group having 1 to 30 carbon atoms, specific examples thereof include, for example,
【0094】[0094]
【化29】 Embedded image
【0095】[0095]
【化30】 Embedded image
【0096】[0096]
【化31】 Embedded image
【0097】などがあげられる。And the like.
【0098】アルケニル化合物(B)の他の具体例とし
ては、1,3-ブタジエン、ビスフェノールAジアリルエー
テル、ビスフェノールPジアリルエーテル、ジアリルテ
レフタレート、ジアリルイソフタレート、ジアリルカー
ボネートがあげられる。1,5-ヘキサジエン、1,9-デカジ
エン、o−ジビニルベンゼン、m−ジビニルベンゼン、
p−ジビニルベンゼンなどは一般式(VI)で表わされ
る炭化水素系化合物の具体例である。[0098] Other specific examples of the alkenyl compound (B), 1, 3-butadiene, bisphenol A Jiarirue
Ter, bisphenol P diallyl ether, diallylte
Lephthalate, diallyl isophthalate, diallyl car
Bonate. 1,5-hexadiene, 1,9-decadiene, o-divinylbenzene, m-divinylbenzene,
p-Divinylbenzene and the like are represented by the general formula (VI)
Ru Examples der hydrocarbon compound that.
【0099】本発明においては、前記イミド化合物
(A)とアルケニル化合物(B)とを反応させるための
触媒として、(C)成分であるヒドロシリル化触媒
(C)が使用される。In the present invention, a hydrosilylation catalyst (C) as a component (C) is used as a catalyst for reacting the imide compound (A) with the alkenyl compound (B).
【0100】ヒドロシリル化触媒(C)の具体例として
は、たとえば白金の単体、アルミナ、シリカ、カーボン
ブラックなどの単体に固体白金を担持させたもの、塩化
白金酸、塩化白金酸とアルコール、アルデヒド、ケトン
などとの錯体、白金−オレフィン錯体(たとえば、Pt
(CH2 =CH2 )2 (PPh3 )2 、Pt(CH2=
CH2 )2 Cl2 );白金−ビニルシロキサン錯体(た
とえば、Ptn (ViMe2 SiOSiMe2 V
i)m 、Pt[(MeViSiO)4 ]m )、白金−ホ
スフィン錯体(たとえば、Pt(PPh3 )4 、Pt
(PBu)4 )、白金−ホスファイト錯体(たとえば、
Pt[P(OPh)3 ]4 )(式中、Meはメチル基、
Buはブチル基、Viはビニル基、Phはフェニル基を
表わし、m,nは整数を表わす)、ジカルボニルジクロ
ロ白金、また、アシュビー(Ashby )の米国特許第3159
601 号明細書および同3159662 号明細書中に記載された
白金−炭化水素複合体、ラモロー(Lamoreaux )の米国
特許第3220972 号明細書中に記載された白金アルコラー
ト触媒などがあげられる。さらに、モディック(Modic
)の米国特許第3516946 号明細書中に記載された塩化
白金−オレフィン複合体も本発明において有用である。Specific examples of the hydrosilylation catalyst (C) include, for example, a substance in which solid platinum is supported on a simple substance of platinum, alumina, silica, carbon black, etc., chloroplatinic acid, chloroplatinic acid and alcohol, aldehyde, Complexes with ketones and the like, platinum-olefin complexes (for example, Pt
(CH 2 = CH 2 ) 2 (PPh 3 ) 2 , Pt (CH 2 =
CH 2 ) 2 Cl 2 ); a platinum-vinylsiloxane complex (eg, Pt n (ViMe 2 SiOSiMe 2 V)
i) m , Pt [(MeViSiO) 4 ] m ), platinum-phosphine complex (for example, Pt (PPh 3 ) 4 , Pt
(PBu) 4 ), a platinum-phosphite complex (for example,
Pt [P (OPh) 3 ] 4 ) (where Me is a methyl group,
Bu is a butyl group, Vi is a vinyl group, Ph is a phenyl group, m and n are integers), dicarbonyldichloroplatinum, and Ashby U.S. Pat.
Platinum-hydrocarbon composites described in U.S. Pat. Nos. 601 and 3159662; and platinum alcoholate catalysts described in Lamoreaux U.S. Pat. No. 3,209,972. In addition, Modic
Platinum chloride-olefin complexes described in U.S. Pat. No. 3,516,946 are also useful in the present invention.
【0101】また、白金化合物以外の触媒の例として
は、たとえばRhCl(PPh3 )3、RhCl 3、R
hAl2 O3 、RuCl3 、IrCl3 、FeCl3 、
AlCl3 、PdCl2 ・2H2 O、NiCl2 、Ti
Cl4 などがあげられる。Examples of catalysts other than platinum compounds include, for example, RhCl (PPh 3 ) 3 , RhCl 3 , R
hAl 2 O 3 , RuCl 3 , IrCl 3 , FeCl 3 ,
AlCl 3 , PdCl 2 .2H 2 O, NiCl 2 , Ti
Cl 4 and the like.
【0102】これらの触媒は単独で使用してもよく、ま
た2種以上を併用しても構わない。触媒活性の点から、
塩化白金酸、白金−オレフィン錯体、白金ビニルシロキ
サン錯体が好ましい。These catalysts may be used alone or in combination of two or more. In terms of catalytic activity,
Preference is given to chloroplatinic acid, platinum-olefin complexes and platinum vinylsiloxane complexes.
【0103】前記硬化性組成物における(A)成分と
(B)成分の割合はヒドロシリル(Si−H)基が炭素
−炭素2重結合に対してモル比で0.5 〜10倍量、より好
ましくは0.5 〜5倍量となるように配合することが好ま
しい。0.5 倍量よりも少ないと硬化が充分に進行せず、
良好な硬化物がえられにくくなる。また、10倍量より多
くなると、(A)成分の安定性がわるくなり、そのう
え、硬化後も多量のヒドロシリル基が硬化物中に残存
し、ボイドやクラックの原因となりやすい。The ratio of the component (A) to the component (B) in the curable composition is preferably 0.5 to 10 times, more preferably, a molar ratio of the hydrosilyl (Si—H) group to the carbon-carbon double bond. It is preferable to mix them in an amount of 0.5 to 5 times. If the amount is less than 0.5 times, curing does not proceed sufficiently,
It becomes difficult to obtain a good cured product. On the other hand, if the amount is more than 10 times, the stability of the component (A) becomes poor, and furthermore, a large amount of hydrosilyl groups remains in the cured product even after curing, which tends to cause voids and cracks.
【0104】また、ヒドロシリル化触媒(C)の使用量
としては、(B)成分のアルケニル基などの炭素−炭素
2重結合1mol に対して、10-1〜10-8mol 、好ましくは
10-3〜10-6mol の範囲で用いるのが好ましい。ヒドロシ
リル化触媒の使用量が10-8mol より少ないと硬化が充分
に進行しにくくなり、またヒドロシリル化触媒は一般に
高価で腐食性である。また、水素ガスが大量に発生して
硬化物が発泡してしまうばあいがあるので、10-1mol を
こえて用いない方が好ましい。The amount of the hydrosilylation catalyst (C) used
Is preferably 10 -1 to 10 -8 mol, and more preferably 1 -1 to 10 -8 mol, per mol of a carbon-carbon double bond such as an alkenyl group of the component ( B )
It is preferably used in the range of 10 -3 to 10 -6 mol. If the amount of the hydrosilylation catalyst used is less than 10 -8 mol, curing will not sufficiently proceed, and the hydrosilylation catalyst is generally expensive and corrosive. Further, since a large amount of hydrogen gas may be generated to cause foaming of the cured product, it is preferable not to use more than 10 -1 mol.
【0105】本発明の組成物に用いられる(A)成分お
よび(B)成分が固体であるばあいには、(A)成分、
(B)成分および(C)成分を適当な有機溶媒、たとえ
ばヘキサン、ヘプタン、ベンゼン、トルエン、キシレン
などの炭化水素系溶媒、メタノール、エタノール、プロ
パノール、エチレングリコール、1,4-ブタンジオールな
どのアルコール系溶媒、ジエチルエーテル、テトラヒド
ロフラン、1,4-ジオキサン、エチレングリコールジメチ
ルエーテル、エチレングリコールジエチルエーテル、ア
ニソールなどのエーテル系溶媒、酢酸メチル、酢酸エチ
ル、酢酸プロピル、酢酸ブチル、安息香酸メチル、安息
香酸エチルなどのエステル系溶媒、塩化メチレン、クロ
ロホルム、塩化エチレン、クロロベンゼンなどのハロゲ
ン化炭化水素系溶媒、ジメチルスルホキシド、ジエチル
スルホキシドなどのスルホキシド系溶媒、N,N−ジメ
チルホルムアミド、N,N−ジエチルホルムアミドなど
のホルムアミド系溶媒、N,N−ジメチルアセトアミ
ド、N,N−ジエチルアセトアミドなどのアセトアミド
系溶媒、N−メチル-2- ピロリドン、N−アセチル−2
−ピロリドン、N−ビニル−2−ピロリドンなどのピロ
リドン系溶媒、フェノール、o−クレゾール、m−クレ
ゾール、p−クレゾール、キシレノール、ハロゲン化フ
ェノール、カテコールなどのフェノール系溶媒、ピリジ
ン、ヘキサメチルホスホルアミド、γ−ブチロラクトン
などの単独もしくは2種以上の混合物などに溶解した溶
液を組成物として使用してもよい。When component (A) and component (B) used in the composition of the present invention are solid, component (A),
Component (B) and component (C) are converted to a suitable organic solvent, for example, a hydrocarbon solvent such as hexane, heptane, benzene, toluene and xylene, and an alcohol such as methanol, ethanol, propanol, ethylene glycol and 1,4-butanediol. System solvents, diethyl ether, tetrahydrofuran, 1,4-dioxane, ethylene glycol dimethyl ether, ethylene glycol diethyl ether, ether solvents such as anisole, methyl acetate, ethyl acetate, propyl acetate, butyl acetate, methyl benzoate, ethyl benzoate, etc. Ester solvents, halogenated hydrocarbon solvents such as methylene chloride, chloroform, ethylene chloride and chlorobenzene, sulfoxide solvents such as dimethyl sulfoxide and diethyl sulfoxide, N, N-dimethylformamide, , N- formamide solvents such as dimethylformamide, N, N- dimethylacetamide, N, acetamide solvents such as N- diethylacetamide, N- methyl-2-pyrrolidone, N- acetyl -2
-Pyrrolidone solvents such as pyrrolidone, N-vinyl-2-pyrrolidone, phenol solvents such as phenol, o-cresol, m-cresol, p-cresol, xylenol, halogenated phenol, catechol, pyridine, hexamethylphosphoramide , Γ-butyrolactone, etc., alone or in a mixture of two or more thereof may be used as the composition.
【0106】本発明の組成物には、さらに必要に応じて
接着性改良剤、物性調整剤、保存安定性改良剤、可塑
剤、充填剤、老化防止剤、紫外線吸収剤、金属不活性化
剤、オゾン劣化防止剤、光安定剤、アミン系ラジカル連
鎖禁止剤、リン系過酸化物分解剤、滑剤、顔料、発泡剤
などの各種添加剤を適宜添加してもよい。添加剤の総量
は硬化物の諸特性を著しく低下させない範囲ならばとく
に制限はないが、好ましくは前記ヒドロシリル基含有イ
ミド化合物(A)100 部に対して1〜300 部である。The composition of the present invention may further contain, if necessary, an adhesion improver, a physical property modifier, a storage stability improver, a plasticizer, a filler, an antioxidant, an ultraviolet absorber, and a metal deactivator. Various additives such as an ozone deterioration inhibitor, a light stabilizer, an amine-based radical chain inhibitor, a phosphorus-based peroxide decomposer, a lubricant, a pigment, and a foaming agent may be appropriately added. The total amount of the additives is not particularly limited as long as the properties of the cured product are not significantly reduced, but is preferably 1 to 300 parts with respect to 100 parts of the hydrosilyl group-containing imide compound (A).
【0107】本発明の組成物を硬化させるには、50℃〜
(A)成分または(B)成分の分解温度以下の温度範
囲、好ましくは50〜350 ℃、より好ましくは50〜300 ℃
の温度範囲で1分〜30時間処理するだけでよい。処理温
度が高すぎるばあいには硬化時に局部的な発熱や発泡が
生じ、良好な硬化物がえられにくくなるので、好ましく
ない。また、組成物が有機溶剤溶液のばあいには、この
組成物の硬化前または硬化中の任意の段階で有機溶媒を
留去または揮発し、前記の硬化条件にいたらしめること
により、硬化物をうることができる。For curing the composition of the present invention, the temperature is preferably from 50 ° C.
Temperature range below the decomposition temperature of component (A) or component (B), preferably 50-350 ° C, more preferably 50-300 ° C.
It only needs to be processed in the temperature range of 1 minute to 30 hours. If the treatment temperature is too high, local heat generation or foaming occurs during curing, and it becomes difficult to obtain a good cured product, which is not preferable. When the composition is an organic solvent solution, the organic solvent is distilled off or volatilized at any stage before or during the curing of the composition, and the cured product is obtained by allowing the composition to reach the above-described curing conditions. You can get.
【0108】本発明の組成物を硬化させてえられる硬化
物は優れた耐熱性、耐薬品性、機械的特性を有し、種々
の用途、たとえば樹脂改質剤、高温に曝され易い部位へ
のコーティング材などに好適に用いられる。The cured product obtained by curing the composition of the present invention has excellent heat resistance, chemical resistance, and mechanical properties, and can be used in various applications such as resin modifiers and sites that are easily exposed to high temperatures. It is suitably used for a coating material of the like.
【0109】つぎに、本発明の組成物を実施例に基づい
て説明する。Next, the composition of the present invention will be described based on examples.
【0110】合成例1(ヒドロシリル基含有イミド化合
物の合成) チッ素気流下、メカニカルスターラー、玉型冷却管、温
度計つきの1000cc4つ口フラスコに 3,3′,4,4′- ジフ
ェニルスルホンテトラカルボン酸2無水物35.8g(0.10
mol)、N−メチル−2−ピロリドン(NMP)270 gを入
れ、均一な溶液を調製した。この溶液に1,3-ビス(3-ア
ミノフェノキシ)ベンゼン14.6g(0.050mol) をNMP
60.0gに溶解させた溶液を室温でロートを用いて添加
し、室温で1時間攪拌を続けた。ついでこの反応溶液
に、室温でアリルアミン5.7 g(0.10mol)を滴下し、さ
らに30分間攪拌を続けたのち、200 ℃のオイルバスで内
温が165〜170 ℃になるまで加熱した。この温度でさら
に5時間加熱を続けた。放冷後、反応溶液の全量を1900
mlのメタノールにそそぎ込んだ。生成した沈澱を濾過
し、メタノールで洗浄したのち、80℃で減圧乾燥して、
炭素−炭素2重結合を有するイミド化合物41.4gをえ
た。Synthesis Example 1 (Synthesis of Hydrosilyl Group-Containing Imide Compound) Under a nitrogen stream, a 3,3 ', 4,4'-diphenylsulfonetetracarboxylic acid was placed in a 1000 cc four-necked flask equipped with a mechanical stirrer, a ball condenser, and a thermometer. 35.8 g of acid 2 anhydride (0.10
mol) and 270 g of N-methyl-2-pyrrolidone (NMP) were added to prepare a uniform solution. To this solution, 14.6 g (0.050 mol) of 1,3-bis (3-aminophenoxy) benzene was added with NMP.
A solution dissolved in 60.0 g was added using a funnel at room temperature, and stirring was continued at room temperature for 1 hour. Then, 5.7 g (0.10 mol) of allylamine was added dropwise to the reaction solution at room temperature, and the mixture was further stirred for 30 minutes, and then heated in an oil bath at 200 ° C. until the internal temperature reached 165 to 170 ° C. Heating was continued at this temperature for a further 5 hours. After cooling, the total amount of the reaction solution was reduced to 1900
Pour into ml of methanol. The resulting precipitate was filtered, washed with methanol, and dried at 80 ° C. under reduced pressure.
41.4 g of an imide compound having a carbon-carbon double bond was obtained.
【0111】1,3,5,7-テトラメチルシクロテトラシロキ
サン5.0 gを200ml の4つ口フラスコに仕込み、そこに
H2 PtCl6 ・6H2 Oの10%エタノール溶液を1.00
ml加えた。室温において、えられた炭素−炭素2重結合
含有イミド化合物10gをクロロホルム90g に溶解させた
溶液を、約30分かけてゆっくり滴下した。滴下終了後、
60℃で10時間反応させた。反応後、クロロホルムおよび
未反応の1,3,5,7-テトラメチルシクロテトラシロキサン
をエバポレートしたのち、室温で数時間減圧乾燥し、目
的とするヒドロシリル基含有イミド化合物(VIII)
14.9gをえた。[0111] 1,3,5,7-tetramethylcyclotetrasiloxane 5.0 g was charged into a four-necked flask 200 ml, there H 2 PtCl 6 · 6H 2 O 10% ethanol solution 1.00
ml was added. At room temperature, a solution prepared by dissolving 10 g of the obtained carbon-carbon double bond-containing imide compound in 90 g of chloroform was slowly dropped over about 30 minutes. After dropping,
The reaction was performed at 60 ° C. for 10 hours. After the reaction, chloroform and unreacted 1,3,5,7-tetramethylcyclotetrasiloxane are evaporated and then dried under reduced pressure at room temperature for several hours to obtain the desired hydrosilyl group-containing imide compound (VIII)
14.9g was obtained.
【0112】[0112]
【化32】 Embedded image
【0113】合成例2(ヒドロシリル基含有イミド化合
物の合成) チッ素気流下、メカニカルスターラー、玉型冷却管、温
度計つきの1000cc4つ口フラスコに1,3-ビス(3-アミノ
フェノキシ)ベンゼン(APB)29.2g(0.10mol)、NMP120
gを入れ、均一な溶液を調製した。この溶液に 3,3′,
4,4′- ベンゾフェノンテトラカルボン酸2無水物16.1
g(0.050mol) をNMP145.0gに溶解させた溶液を室温で
添加し、室温で1時間攪拌を続けた。ついでこの反応溶
液に、室温で2,3-ジカルボキシル- ビシクロ[2.2.1] ヘ
プタ-5- エン2無水物16.4g(0.10mol) をNMP140gに溶
解した溶液を滴下し、さらに30分間攪拌を続けたのち、
200℃のオイルバスで内温が165 〜170 ℃になるまで加
熱した。この温度でさらに5時間加熱を続けた。Synthesis Example 2 (Synthesis of Hydrosilyl Group-Containing Imide Compound) 1,3-bis (3-aminophenoxy) benzene (APB) was placed in a 1000 cc four-necked flask equipped with a mechanical stirrer, a lens cooling tube, and a thermometer under a nitrogen stream. ) 29.2 g (0.10 mol), NMP120
g was added to prepare a homogeneous solution. 3,3 ′,
4,4'-benzophenonetetracarboxylic dianhydride 16.1
g (0.050 mol) in 145.0 g of NMP was added at room temperature, and stirring was continued at room temperature for 1 hour. Next, a solution of 16.4 g (0.10 mol) of 2,3-dicarboxyl-bicyclo [2.2.1] hept-5-ene dianhydride in 140 g of NMP was added dropwise to the reaction solution at room temperature, and the mixture was further stirred for 30 minutes. After continuing,
The mixture was heated in an oil bath at 200 ° C until the internal temperature reached 165 to 170 ° C. Heating was continued at this temperature for a further 5 hours.
【0114】そののち、合成例1と同様にして炭素−炭
素2重結合含有イミド化合物46.8gをえた。Thereafter, 46.8 g of a carbon-carbon double bond-containing imide compound was obtained in the same manner as in Synthesis Example 1.
【0115】1,3,5,7-テトラメチルシクロテトラシロキ
サン4.4 gを500ml の4つ口フラスコに仕込み、そこに
H2 PtCl6 ・6H2 Oの10%エタノール溶液を0.91
ml加えた。室温において、えられた炭素−炭素2重結合
を有するイミド化合物10gをクロロベンゼン90gに溶解
させた溶液を約30分かけてゆっくり滴下した。滴下終了
後、100 ℃で40時間反応させた。反応後、クロロベンゼ
ンおよび未反応の1,3,5,7-テトラメチルシクロテトラシ
ロキサンをエバポレートしたのち、室温で数時間減圧乾
燥し、目的とするヒドロシリル基含有イミド化合物(I
X)14.2gをえた。[0115] 1,3,5,7-tetramethylcyclotetrasiloxane 4.4 g was charged into a four-necked flask 500 ml, there H 2 PtCl 6 · 6H 2 O 10% ethanol solution 0.91
ml was added. At room temperature, a solution obtained by dissolving 10 g of the obtained imide compound having a carbon-carbon double bond in 90 g of chlorobenzene was slowly dropped over about 30 minutes. After the completion of the dropwise addition, the reaction was carried out at 100 ° C. for 40 hours. After the reaction, chlorobenzene and unreacted 1,3,5,7-tetramethylcyclotetrasiloxane are evaporated and then dried under reduced pressure at room temperature for several hours to obtain the desired hydrosilyl group-containing imide compound (I
X) 14.2 g was obtained.
【0116】[0116]
【化33】 Embedded image
【0117】合成例3(ヒドロシリル基含有イミド化合
物の合成) チッ素気流下、メカニカルスターラー、玉型冷却管、温
度計つきの1000cc4つ口フラスコに1,3-ビス(3-アミノ
プロピル)テトラメチルジシロキサン24.8g(0.10mo
l)、NMP120gを入れ、均一な溶液を調製した。ここに
3,3′,4,4′- ジフェニルスルホンテトラカルボン酸2
無水物29.7g(0.083mol) をNMP270.0gに溶解させた溶
液を室温で添加し、室温で1時間攪拌を続けた。ついで
この反応溶液に、室温で2,3-ジカルボキシル-7- オキサ
ビシクロ[2.2.1] ヘプタ-5- エン2無水物5.5 g(0.033
mol)をNMP 50gに溶解した溶液を滴下し、さらに30分間
攪拌を続けたのち、200 ℃のオイルバスで内温が165 〜
170 ℃になるまで加熱した。この温度でさらに5時間加
熱を続けた。そののち、合成例1と同様に処理して炭素
−炭素2重結合を有するイミド化合物49.4gをえた。Synthesis Example 3 (Synthesis of Hydrosilyl Group-Containing Imide Compound) 1,3-Bis (3-aminopropyl) tetramethyldimethylamine was placed in a 1000 cc four-necked flask equipped with a mechanical stirrer, a lens cooling tube, and a thermometer under a stream of nitrogen. Siloxane 24.8g (0.10mo
l), 120 g of NMP was added to prepare a uniform solution. here
3,3 ', 4,4'-diphenylsulfonetetracarboxylic acid 2
A solution of 29.7 g (0.083 mol) of an anhydride dissolved in 270.0 g of NMP was added at room temperature, and stirring was continued at room temperature for 1 hour. Next, 5.5 g (0.033 g) of 2,3-dicarboxyl-7-oxabicyclo [2.2.1] hept-5-ene dianhydride was added to the reaction solution at room temperature.
mol) dissolved in 50 g of NMP was added dropwise, and stirring was continued for another 30 minutes.
Heated to 170 ° C. Heating was continued at this temperature for a further 5 hours. Thereafter, the same treatment as in Synthesis Example 1 was carried out to obtain 49.4 g of an imide compound having a carbon-carbon double bond.
【0118】1,3,5-トリメチルシクロトリシロキサン1.
1 gを500ml の4つ口フラスコに仕込み、そこにH2 P
tCl6 ・6H2 Oの10%エタノール溶液を0.33ml加え
た。室温において、えられた炭素−炭素2重結合を有す
るイミド化合物10gをクロロベンゼン90gに溶解させた
溶液を、約30分かけてゆっくり滴下した。滴下終了後、
100 ℃で40時間反応させた。反応後、クロロベンゼンお
よび未反応の1,3,5-トリメチルシクロトリシロキサンを
エバポレートしたのち、室温で数時間減圧乾燥し、目的
とするヒドロシリル基含有イミド化合物(X)10.8gを
えた。1,3,5-trimethylcyclotrisiloxane 1.
1 g was charged into a 500 ml four-necked flask, and H 2 P
tCl 6 · 6H 2 O 10% ethanol was added 0.33ml of. At room temperature, a solution in which 10 g of the obtained imide compound having a carbon-carbon double bond was dissolved in 90 g of chlorobenzene was slowly dropped over about 30 minutes. After dropping,
The reaction was performed at 100 ° C. for 40 hours. After the reaction, chlorobenzene and unreacted 1,3,5-trimethylcyclotrisiloxane were evaporated, and then dried under reduced pressure at room temperature for several hours to obtain 10.8 g of the desired hydrosilyl group-containing imide compound (X).
【0119】[0119]
【化34】 Embedded image
【0120】実施例1 合成例1で合成したヒドロシリル基含有イミド化合物
(VIII)2.0 gおよび式(XI):Example 1 2.0 g of the hydrosilyl group-containing imide compound (VIII) synthesized in Synthesis Example 1 and a compound of the formula (XI):
【0121】[0121]
【化35】 Embedded image
【0122】で表わされるアリル基含有化合物1.1 gを
クロロホルム18gに溶解し、そこにH2 PtCl6 ・6
H2 Oの10%エタノール溶液35.0μLを配合して熱硬化
性組成物をえた。該組成物を25℃/10mmHgの条件下で1
日間保存し、このあと150 ℃で1時間処理して硬化物を
作製した。[0122] The allyl group-containing compound 1.1 g represented by dissolving in chloroform 18 g, there H 2 PtCl 6 · 6
A thermosetting composition was obtained by mixing 35.0 μL of a 10% ethanol solution of H 2 O. The composition was heated at 25 ° C / 10 mmHg for 1 hour.
After storage for 1 day, the mixture was treated at 150 ° C. for 1 hour to prepare a cured product.
【0123】えられた硬化物に対して理学電気(株)製
の示差熱天秤TG−DTAを用いて、チッ素気流下、T
GA測定を行なった。そこでえられた5%および10%重
量損失温度を表1に示す。また、硬化物をN,N-ジメチル
ホルムアミド、10%塩酸に室温で10日間浸漬したのちの
外観評価の結果を表2に示す。Using a differential thermal balance TG-DTA manufactured by Rigaku Denki Co., Ltd., the cured product was subjected to T
GA measurements were performed. Table 1 shows the obtained 5% and 10% weight loss temperatures. Table 2 shows the results of the appearance evaluation after the cured product was immersed in N, N-dimethylformamide and 10% hydrochloric acid at room temperature for 10 days.
【0124】実施例2 合成例1で合成したヒドロシリル基含有イミド化合物
(VIII) 2.0gおよび式(XII):Example 2 2.0 g of the hydrosilyl group-containing imide compound (VIII) synthesized in Synthesis Example 1 and a compound of the formula (XII):
【0125】[0125]
【化36】 Embedded image
【0126】で表わされるアリル基含有化合物0.87gを
クロロホルム18gに溶解し、そこにH2 PtCl6 ・6
H2 Oの10%エタノール溶液35.0μLを配合して熱硬化
性組成物をえた。該組成物を25℃/10mmHgの条件下で1
日間保存し、このあと150 ℃で1時間処理して硬化物を
作製した。[0126] The allyl group-containing compound 0.87g represented by dissolving in chloroform 18 g, there H 2 PtCl 6 · 6
A thermosetting composition was obtained by mixing 35.0 μL of a 10% ethanol solution of H 2 O. The composition was heated at 25 ° C / 10 mmHg for 1 hour.
After storage for 1 day, the mixture was treated at 150 ° C. for 1 hour to prepare a cured product.
【0127】えられた硬化物に対して理学電気(株)製
の示差熱天秤TG−DTAを用いて、チッ素気流下、T
GA測定を行なった。そこでえられた5%および10%重
量損失温度を表1に示す。また、硬化物をN,N-ジメチル
ホルムアミド、10%塩酸に室温で10日間浸漬したのちの
外観評価の結果を表2に示す。Using a differential thermal balance TG-DTA manufactured by Rigaku Electric Co.,
GA measurements were performed. Table 1 shows the obtained 5% and 10% weight loss temperatures. Table 2 shows the results of the appearance evaluation after the cured product was immersed in N, N-dimethylformamide and 10% hydrochloric acid at room temperature for 10 days.
【0128】実施例3 合成例2で合成したヒドロシリル基含有イミド化合物
(IX) 2.0gおよび式(XIII):Example 3 2.0 g of the hydrosilyl group-containing imide compound (IX) synthesized in Synthesis Example 2 and a compound of the formula (XIII):
【0129】[0129]
【化37】 Embedded image
【0130】で表わされるアリル基含有化合物0.39gを
クロロホルム18gに溶解し、そこにH2 PtCl6 ・6
H2 Oの10%エタノール溶液30.0μLを配合して熱硬化
性組成物をえた。該組成物を25℃/10mmHgの条件下で1
日間保存し、このあと150 ℃で1時間処理して硬化物を
作製した。[0130] The allyl group-containing compound 0.39g represented by dissolving in chloroform 18 g, there H 2 PtCl 6 · 6
A thermosetting composition was obtained by mixing 30.0 μL of a 10% ethanol solution of H 2 O. The composition was heated at 25 ° C / 10 mmHg for 1 hour.
After storage for 1 day, the mixture was treated at 150 ° C. for 1 hour to prepare a cured product.
【0131】えられた硬化物に対して理学電気(株)製
の示差熱天秤TG−DTAを用いて、チッ素気流下、T
GA測定を行なった。そこでえられた5%および10%重
量損失温度を表1に示す。また、硬化物をN,N-ジメチル
ホルムアミド、10%塩酸に室温で10日間浸漬したのちの
外観評価の結果を表2に示す。Using a differential thermal balance TG-DTA manufactured by Rigaku Electric Co.,
GA measurements were performed. Table 1 shows the obtained 5% and 10% weight loss temperatures. Table 2 shows the results of the appearance evaluation after the cured product was immersed in N, N-dimethylformamide and 10% hydrochloric acid at room temperature for 10 days.
【0132】実施例4 合成例3で合成したヒドロシリル基含有イミド化合物
(X) 4.0gおよび式(XIV):Example 4 4.0 g of the hydrosilyl group-containing imide compound (X) synthesized in Synthesis Example 3 and a compound of the formula (XIV):
【0133】[0133]
【化38】 Embedded image
【0134】で表わされるアリル基含有化合物0.23gを
クロロホルム18gに溶解し、そこにH2 PtCl6 ・6
H2 Oの10%エタノール溶液16.0μLを配合して熱硬化
性組成物をえた。該組成物を25℃/10mmHgの条件下で1
日間保存し、このあと150 ℃で1時間処理して硬化物を
作製した。[0134] The allyl group-containing compound 0.23g represented by dissolving in chloroform 18 g, there H 2 PtCl 6 · 6
16.0 μL of a 10% ethanol solution of H 2 O was blended to obtain a thermosetting composition. The composition was heated at 25 ° C / 10 mmHg for 1 hour.
After storage for 1 day, the mixture was treated at 150 ° C. for 1 hour to prepare a cured product.
【0135】えられた硬化物に対して理学電気(株)製
の示差熱天秤TG−DTAを用いて、チッ素気流下、T
GA測定を行なった。そこでえられた5%および10%重
量損失温度を表1に示す。また、硬化物をN,N-ジメチル
ホルムアミド、10%塩酸に室温で10日間浸漬したのちの
外観評価の結果を表2に示す。Using a differential thermal balance TG-DTA manufactured by Rigaku Electric Co.,
GA measurements were performed. Table 1 shows the obtained 5% and 10% weight loss temperatures. Table 2 shows the results of the appearance evaluation after the cured product was immersed in N, N-dimethylformamide and 10% hydrochloric acid at room temperature for 10 days.
【0136】比較例1 両末端にアリル基を有するポリプロピレングリコール
(分子量約8000)3gと、両末端に1,3,5,7-テトラメチ
ルシクロテトラシロキシ基を有するポリプロピレングリ
コール(分子量約8000)1gとを混合し、そこにH2 P
tCl6 ・6H2Oの10%エタノール溶液4μLを配合
して硬化性組成物を調製した。該組成物を100 ℃に保っ
たオーブン内に1時間保存して硬化物を作製した。Comparative Example 1 3 g of polypropylene glycol having an allyl group at both ends (molecular weight of about 8000) and 1 g of polypropylene glycol having a 1,3,5,7-tetramethylcyclotetrasiloxy group at both ends (molecular weight of about 8000) Mixed with H 2 P
to prepare a curable composition by blending 10% ethanol solution 4μL of tCl 6 · 6H 2 O. The composition was stored in an oven maintained at 100 ° C. for 1 hour to prepare a cured product.
【0137】えられた硬化物に対して理学電機(株)製
の示差熱天秤TG−DTAを用いて、チッ素気流下、T
GA測定を行なった。そこでえられた5%および10%重
量損失温度を表1に示す。また、硬化物をN,N-ジメチル
ホルムアミド、10%塩酸に室温で10日間浸漬したのちの
外観評価の結果を表2に示す。Using a differential thermal balance TG-DTA manufactured by Rigaku Denki Co., Ltd., the obtained cured product was exposed to nitrogen under a stream of nitrogen.
GA measurements were performed. Table 1 shows the obtained 5% and 10% weight loss temperatures. Table 2 shows the results of the appearance evaluation after the cured product was immersed in N, N-dimethylformamide and 10% hydrochloric acid at room temperature for 10 days.
【0138】[0138]
【表1】 [Table 1]
【0139】[0139]
【表2】 [Table 2]
【0140】表1から本発明の組成物の硬化物は耐熱性
に優れたものであることがわかる。また、表2から本発
明の組成物の硬化物は耐薬品性に優れたものであること
がわかる。From Table 1, it can be seen that the cured product of the composition of the present invention has excellent heat resistance. Table 2 shows that the cured product of the composition of the present invention has excellent chemical resistance.
【0141】[0141]
【発明の効果】ヒドロシリル基含有イミド化合物(A)
とアルケニル化合物(B)とヒドロシリル化触媒(C)
とを含有する本発明の硬化性組成物は、容易に様々な形
状の硬化物にすることができ、えられる硬化物は極めて
優れた耐熱性、耐薬品性を有するものである。The imide compound containing a hydrosilyl group (A)
And alkenyl compound (B) and hydrosilylation catalyst (C)
The curable composition of the present invention containing (1) and (2) can be easily formed into cured products of various shapes, and the obtained cured product has extremely excellent heat resistance and chemical resistance.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 米沢 和弥 兵庫県神戸市垂水区つつじが丘五丁目12 −11 (56)参考文献 特開 平1−318037(JP,A) 特開 平2−75644(JP,A) 特開 平4−261467(JP,A) 特開 平5−320515(JP,A) 特開 平5−320516(JP,A) (58)調査した分野(Int.Cl.7,DB名) C08G 77/455 C08G 73/10 C08L 83/05 C08L 83/08 ──────────────────────────────────────────────────続 き Continued on the front page (72) Inventor Kazuya Yonezawa 5-12-11 Tsutsujigaoka, Tarumizu-ku, Kobe City, Hyogo Prefecture (56) References JP-A 1-318037 (JP, A) JP-A 2-75644 (JP) JP-A-4-261467 (JP, A) JP-A-5-320515 (JP, A) JP-A-5-320516 (JP, A) (58) Fields studied (Int. Cl. 7 , DB Name) C08G 77/455 C08G 73/10 C08L 83/05 C08L 83/08
Claims (1)
価の有機基、R2は炭素数6〜30個の芳香族基を含有す
る2価の有機基、または一般式(II): 【化2】 (R4は炭素数1〜20個の2価の有機基、R5は炭素数1
〜20個の1価の有機基を表わし、複数のR4、R5は同一
であってもよく、また異なっていてもよい、lは1〜20
の正の整数を表わす)で表わされる2価の有機基、R3
は炭素数1〜20の2価の有機基、Yは少なくとも1つの
ヒドロシリル基を含む炭素数1〜20の有機基を表わし、
2つのR3およびYは同一であってもよく、また異なっ
ていてもよい、nは1〜100 の整数を表わす)で表わさ
れるイミド化合物および一般式(III): 【化3】 (式中、R1、R2、nは前記と同じであり、R6は少な
くとも1つのヒドロシリル基を含む炭素数1〜20個の2
価の有機基であって、2つのR6は同一であってもよ
く、また異なっていてもよい)で表わされるイミド化合
物から選ばれた少なくとも1種のイミド化合物、 (B)一般式(IV): 【化4】 (式中、R 8 は水素原子またはメチル基であり、R 9 は炭
素数2〜20個の2価の有機基であり、1個以上のエーテ
ル結合を有していてもよい、R 10 は炭素数1〜30個の芳
香族または脂肪族系の2〜4価の有機基、aは2〜4の
整数を表わす)で表わされるエーテル結合を有する化合
物、一般式(V): 【化5】 (式中、R 8 、R 9 は前記に同じであり、R 11 は炭素数1
〜30個の1〜4価の有機基、bは1〜4の整数を表わ
す)で表わされるエステル結合を有する化合物、一般式
(VI): 【化6】 (式中、R 8 、aは前記に同じであり、R 12 は炭素数2
〜50個の2〜4価の有機基を表わす)で表わされる炭化
水素系の化合物、一般式(VII): 【化7】 (式中、R 8 、R 9 、aは前記に同じであり、R 13 は炭素
数1〜30個の2〜4価の有機基を表わす)で表わされる
カーボネート結合を有する化合物、1,3−ブタジエ
ン、ビスフェノールAジアリルエーテル、ビスフェノー
ルPジアリルエーテル、ジアリルテレフタレート、ジア
リルイソフタレートまたはジアリルカーボネートであ
る、分子内に少なくとも2個の炭素−炭素2重結合を有
し、イミド基を含まない化合物、および (C)ヒドロシリル化触媒 を含有し、(A)成分中のヒドロシリル(Si−H)基
が(B)成分中の炭素−炭素2重結合に対してモル比で
0.5〜10倍量、(C)成分の使用量が、(B)成分中の
炭素−炭素2重結合1モルに対して10 -1 〜10 -8 モルであ
る硬化性組成物。(A) General formula (I): (Wherein R 1 is a group containing an aromatic group having 6 to 30 carbon atoms)
A bivalent organic group, R 2 is a divalent organic group containing an aromatic group having 6 to 30 carbon atoms, or a general formula (II): (R 4 is a divalent organic group having 1 to 20 carbon atoms, R 5 is
Represents up to 20 monovalent organic groups, and a plurality of R 4 and R 5 may be the same or different; l is 1 to 20
A divalent organic group represented by R 3
Represents a divalent organic group having 1 to 20 carbon atoms, Y represents an organic group having 1 to 20 carbon atoms including at least one hydrosilyl group,
Two R 3 and Y may be the same or different
And n represents an integer of 1 to 100) and an imide compound represented by the general formula (III): (Wherein, R 1 , R 2 , and n are the same as those described above, and R 6 is a C 1 to C 2 containing at least one hydrosilyl group)
A valent organic group, at least one imide compound selected from represented by the imide compound in the two R 6 may be the same or may be or different), (B) the general formula (IV ): (Wherein, R 8 is a hydrogen atom or a methyl group, and R 9 is
A divalent organic group having a prime number of 2 to 20;
R 10 may have 1 to 30 carbon atoms.
An aromatic or aliphatic divalent to tetravalent organic group, a is 2 to 4
A compound having an ether bond represented by
Compound, general formula (V): (Wherein, R 8 and R 9 are the same as described above, and R 11 has 1 carbon atom)
~ 30 monovalent to tetravalent organic groups, b represents an integer of 1 to 4
Compound having an ester bond represented by the general formula
(VI): (Wherein R 8 and a are the same as described above, and R 12 has 2 carbon atoms.
Represents up to 50 divalent to tetravalent organic groups)
Hydrogen compound, general formula (VII): (Wherein R 8 , R 9 and a are the same as above, and R 13 is a carbon atom
Represents an organic group having 1 to 30 divalent to tetravalent organic groups)
Compound having a carbonate bond, 1,3-butadiene
, Bisphenol A diallyl ether, bisphenol
P diallyl ether, diallyl terephthalate, dia
Ryl isophthalate or diallyl carbonate
Have at least two carbon-carbon double bonds in the molecule
And a compound containing no imide group , and (C) a hydrosilylation catalyst, and a hydrosilyl (Si—H) group in the component (A).
Is a molar ratio with respect to the carbon-carbon double bond in the component (B).
0.5 to 10 times the amount of component (C) used in component (B)
A curable composition having an amount of 10 < -1 > to 10 < -8> mol per mol of carbon-carbon double bond .
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP23106692A JP3359360B2 (en) | 1992-08-31 | 1992-08-31 | Curable composition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP23106692A JP3359360B2 (en) | 1992-08-31 | 1992-08-31 | Curable composition |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0680784A JPH0680784A (en) | 1994-03-22 |
| JP3359360B2 true JP3359360B2 (en) | 2002-12-24 |
Family
ID=16917756
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|---|---|---|---|
| JP23106692A Expired - Fee Related JP3359360B2 (en) | 1992-08-31 | 1992-08-31 | Curable composition |
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| Country | Link |
|---|---|
| JP (1) | JP3359360B2 (en) |
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|---|---|---|---|---|
| US11535715B2 (en) * | 2020-12-23 | 2022-12-27 | Momentive Performance Materials Inc. | Siloxane-imide copolymer and addition curable composition comprising same |
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| Publication number | Publication date |
|---|---|
| JPH0680784A (en) | 1994-03-22 |
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