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JP3361276B2 - Power semiconductor module - Google Patents
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JP3361276B2 - Power semiconductor module - Google Patents

Power semiconductor module

Info

Publication number
JP3361276B2
JP3361276B2 JP20866498A JP20866498A JP3361276B2 JP 3361276 B2 JP3361276 B2 JP 3361276B2 JP 20866498 A JP20866498 A JP 20866498A JP 20866498 A JP20866498 A JP 20866498A JP 3361276 B2 JP3361276 B2 JP 3361276B2
Authority
JP
Japan
Prior art keywords
power semiconductor
metal base
wiring pattern
insulating plate
semiconductor chip
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP20866498A
Other languages
Japanese (ja)
Other versions
JP2000031357A (en
Inventor
雅洋 青山
純夫 藤田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sansha Electric Manufacturing Co Ltd
Original Assignee
Sansha Electric Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sansha Electric Manufacturing Co Ltd filed Critical Sansha Electric Manufacturing Co Ltd
Priority to JP20866498A priority Critical patent/JP3361276B2/en
Publication of JP2000031357A publication Critical patent/JP2000031357A/en
Application granted granted Critical
Publication of JP3361276B2 publication Critical patent/JP3361276B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/50Bond wires
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/071Connecting or disconnecting
    • H10W72/075Connecting or disconnecting of bond wires
    • H10W72/07551Connecting or disconnecting of bond wires characterised by changes in properties of the bond wires during the connecting
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/20Bump connectors, e.g. solder bumps or copper pillars; Dummy bumps; Thermal bumps
    • H10W72/251Materials
    • H10W72/252Materials comprising solid metals or solid metalloids, e.g. PbSn, Ag or Cu
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/20Bump connectors, e.g. solder bumps or copper pillars; Dummy bumps; Thermal bumps
    • H10W72/29Bond pads specially adapted therefor
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/50Bond wires
    • H10W72/531Shapes of wire connectors
    • H10W72/5363Shapes of wire connectors the connected ends being wedge-shaped
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/851Dispositions of multiple connectors or interconnections
    • H10W72/874On different surfaces
    • H10W72/884Die-attach connectors and bond wires
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/90Bond pads, in general
    • H10W72/951Materials of bond pads
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00Package configurations
    • H10W90/701Package configurations characterised by the relative positions of pads or connectors relative to package parts
    • H10W90/731Package configurations characterised by the relative positions of pads or connectors relative to package parts of die-attach connectors
    • H10W90/734Package configurations characterised by the relative positions of pads or connectors relative to package parts of die-attach connectors between a chip and a stacked insulating package substrate, interposer or RDL
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00Package configurations
    • H10W90/701Package configurations characterised by the relative positions of pads or connectors relative to package parts
    • H10W90/751Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires
    • H10W90/754Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires between a chip and a stacked insulating package substrate, interposer or RDL

Landscapes

  • Wire Bonding (AREA)
  • Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は,ダイオード,サイ
リスタ,トランジスタ等の電力用半導体チップが複数
個,1つの金属ベースに搭載される電力用半導体モジュ
ールに関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a power semiconductor module in which a plurality of power semiconductor chips such as diodes, thyristors and transistors are mounted on one metal base.

【0002】[0002]

【従来の技術】溶接機,無停電電源装置,通信用電源,
充電器,めっき用電源,モータコントロール等の電源装
置は,交流電源をダイオード又はサイリスタを用いて整
流し,この整流した直流をバイポーラトランジスタ,M
OSFET,IGBT等のトランジスタを制御素子とす
るインバータにより高周波交流に変換している。さら
に,出力に直流を得る場合には,この高周波交流を変圧
器により変圧し,この変圧された交流をダイオードを用
いて再度整流して直流を得ている。これにより電源装置
は小型化されるという特長を有している。
2. Description of the Related Art Welding machines, uninterruptible power supplies, communication power supplies,
A power supply device such as a charger, a power supply for plating, and a motor control rectifies an AC power supply using a diode or a thyristor, and rectifies the rectified DC power into a bipolar transistor or
High frequency AC is converted by an inverter using a transistor such as OSFET or IGBT as a control element. Furthermore, when obtaining a direct current at the output, this high-frequency alternating current is transformed by a transformer, and this transformed alternating current is rectified again using a diode to obtain a direct current. As a result, the power supply device has the feature of being downsized.

【0003】これらの電源装置には,ダイオード,サイ
リスタ,トランジスタ等の半導体素子が複数個,チップ
の状態で1つのモジュール内に収納され,電力用半導体
モジュールとして用いられている。この電力用半導体モ
ジュールの概略平面図を図3に示す。4はセラミック等
の絶縁板で,この絶縁板4には予め一方の面には銅箔に
よる配線パターンが形成され,他方の面には全面に銅箔
が形成されている。2は金属ベースで,この金属ベース
2の上に半田チップが搭載され,この半田チップの上に
絶縁板4が搭載される。さらに,この絶縁板4の配線パ
ターンの必要個所に半田チップが搭載され,この半田の
上に電力用半導体チップ26a〜26d,28a〜28
d,30a,30bが搭載され,リフロー炉により半田
付けを行われている。
In these power supply devices, a plurality of semiconductor elements such as diodes, thyristors, transistors, etc. are housed in the form of a chip in one module and used as a power semiconductor module. A schematic plan view of this power semiconductor module is shown in FIG. Reference numeral 4 denotes an insulating plate made of ceramic or the like, and a wiring pattern made of copper foil is formed on one surface of the insulating plate 4 in advance, and a copper foil is formed on the entire other surface of the insulating plate 4. A metal base 2 has a solder chip mounted on the metal base 2 and an insulating plate 4 mounted on the solder chip. Further, a solder chip is mounted on a required portion of the wiring pattern of the insulating plate 4, and power semiconductor chips 26a to 26d and 28a to 28 are mounted on the solder.
d, 30a, 30b are mounted and soldering is performed by a reflow furnace.

【0004】[0004]

【発明が解決しようとする課題】ところが,複数の電力
用半導体チップ26a〜26d,28a〜28d,30
a,30bが搭載される絶縁板4の面積は大きなものに
なる。このため,絶縁板4と金属ベース2との半田付け
時に,空気又はガスが絶縁板4と金属ベース2との間か
ら抜けずに,絶縁板4と金属ベース2とが半田付けされ
ないボイド32a,32bが発生する。
However, a plurality of power semiconductor chips 26a to 26d, 28a to 28d, 30 are used.
The area of the insulating plate 4 on which the a and 30b are mounted becomes large. Therefore, at the time of soldering the insulating plate 4 and the metal base 2, the voids 32a in which air or gas does not escape from between the insulating plate 4 and the metal base 2 and the insulating plate 4 and the metal base 2 are not soldered, 32b occurs.

【0005】図3の破線に示すように,ボイド32a,
32bの上部に電力用半導体チップ26a,26b,2
8dがある場合,電力用半導体モジュールの実装時に,
半導体チップ26a,26b,28dが発生する熱がボ
イドによって金属ベース2を介して放出できない。この
ため,半導体チップ26a,26b,28dが損傷する
という問題が発生する。
As shown by the broken line in FIG. 3, the voids 32a,
Power semiconductor chips 26a, 26b, 2 are provided on the upper side of 32b.
If there is 8d, when mounting the power semiconductor module,
The heat generated by the semiconductor chips 26a, 26b, 28d cannot be radiated through the metal base 2 due to the void. Therefore, there is a problem that the semiconductor chips 26a, 26b, 28d are damaged.

【0006】[0006]

【課題を解決するための手段】請求項1記載の発明は,
金属ベースと,金属ベース上に設けられ,一方の面に配
線パターンが形成され,他方の面に銅箔が形成された絶
縁板と,上記配線パターンの1つに半田付けされる電力
用半導体チップと, 上記絶縁板の他方の面と上記金属
ベースとを接着する高熱伝導接着剤とを備えた電力用半
導体モジュールで,上記電力用半導体チップの下部の絶
縁板の他方の面に,上記電力用半導体チップの大きさと
同等又はやや大きい半田の第1のバンプが設けられる。
The invention according to claim 1 is
A metal base, an insulating plate provided on the metal base, having a wiring pattern formed on one surface, and a copper foil formed on the other surface, and a power semiconductor chip soldered to one of the wiring patterns And a high thermal conductive adhesive for adhering the other surface of the insulating plate to the metal base, wherein the other surface of the insulating plate under the semiconductor chip for power has A first bump of solder, which is equal to or slightly larger than the size of the semiconductor chip, is provided.

【0007】すなわち,第1のバンプが電力用半導体チ
ップの下部に配置され,その大きさが電力用半導体チッ
プと同等又はやや大きいため,第1のバンプと絶縁板の
他方の面との間にボイドの発生が抑制される。もし,ボ
イドが発生しても第1のバンプが小さいため,そのボイ
ドも小さい。さらに,第1のバンプと金属ベースとの間
の接着剤は薄く,接着時に第1のバンプの下部の接着剤
は,第1のバンプの外側に押し出されるため,この間の
ボイドの発生も抑制される。
That is, since the first bump is arranged below the power semiconductor chip and its size is the same as or slightly larger than that of the power semiconductor chip, it is between the first bump and the other surface of the insulating plate. Generation of voids is suppressed. Even if a void is generated, the void is also small because the first bump is small. Further, the adhesive between the first bump and the metal base is thin, and the adhesive under the first bump is pushed out to the outside of the first bump at the time of bonding, so that the generation of voids during this time is also suppressed. It

【0008】請求項2記載の発明は,上記電力用半導体
チップと他の配線パターン間をボンディングされるワイ
ヤを備え,上記他の配線パターンの下部の絶縁板の他方
の面に,上記配線パターンの大きさと同等又はやや大き
い半田の第2のバンプが設けられる。
According to a second aspect of the present invention, there is provided a wire for bonding between the power semiconductor chip and another wiring pattern, and the wiring pattern is formed on the other surface of the insulating plate below the other wiring pattern. A second bump of solder equal to or slightly larger than the size is provided.

【0009】ワイヤボンディングされる他の配線パター
ンと,金属ベースとの間には硬い半田の第2のバンプの
厚い層と,高熱伝導接着剤の薄い層が形成されるため,
ワイヤボンディングするワイヤボンダーが押さえる力
は,他の配線のパターンから金属ベースに伝わり,他の
配線パターンにワイヤを確実にワイヤボンディングする
ことができる。
A thick layer of the second bump of hard solder and a thin layer of high thermal conductive adhesive are formed between the other wiring pattern to be wire-bonded and the metal base.
The force held by the wire bonder for wire bonding is transmitted from the other wiring pattern to the metal base, and the wire can be reliably wire bonded to the other wiring pattern.

【0010】[0010]

【発明の実施の形態】本発明を,その実施の形態を示し
た図1及び図2に基づき説明する。まず,図2におい
て,4は絶縁板である。絶縁板4には予め一方の面に銅
箔による配線パターン8a,8bが形成され,他方の面
には全面に銅箔8cが形成されている。電力用半導体チ
ップが半田付けされる配線パターン8aの下部の絶縁板
4の他方の面と,ワイヤボンディングされる配線パター
ン8bの下部の他方の面に,電力用半導体チップの面積
よりやや大きい半田が半田付けされたバンプ16a′
と,配線パターン8aの面積よりやや大きい半田が半田
付けされたバンプ16b′が形成されている。
BEST MODE FOR CARRYING OUT THE INVENTION The present invention will be described with reference to FIGS. 1 and 2 showing an embodiment thereof. First, in FIG. 2, 4 is an insulating plate. On the insulating plate 4, wiring patterns 8a and 8b made of copper foil are formed on one surface in advance, and a copper foil 8c is formed on the entire other surface. On the other surface of the insulating plate 4 below the wiring pattern 8a to which the power semiconductor chip is soldered, and on the other surface below the wiring pattern 8b to be wire-bonded, solder slightly larger than the area of the power semiconductor chip is provided. Soldered bump 16a '
Then, bumps 16b 'to which solder slightly larger than the area of the wiring pattern 8a is soldered are formed.

【0011】次に実施の形態の電力用半導体モジュール
の形成工程を説明する。図1において,2は金属ベース
で,この金属ベース2の一方の面に,シリコン系の高熱
伝導接着剤を塗布する。この高熱伝導接着剤の上にバン
プ16a,16b側を向けて絶縁板4を搭載し,左右に
スライドさせて押し付ける。この後第1の配線パターン
8aに半田チップを搭載又は半田クリームを塗布し,そ
の半田の上に電力用半導体チップ6を搭載する。さら
に,図示しない外部引き出し用端子も配線パターンに搭
載させる。その後,リフロー炉により金属ベース2と絶
縁板4と半導体チップ6を半田付し,金属ベース2と絶
縁板4との間のバンプ8a,8bを除く部分は接着剤で
接着する。さらに,図示しないが,ワイヤボンダーを用
いて電力用半導体チップ6の表面と,配線パターン8b
とがワイヤ12によりワイヤボンディングされる。その
後,図示しない樹脂ケースが金属ベースの端部に接着さ
れ,この樹脂ケース内にシリコンゲル等の封止剤を注入
し,電力用半導体チップ6を封止して電力用半導体モジ
ュールを形成する。
Next, a process of forming the power semiconductor module of the embodiment will be described. In FIG. 1, reference numeral 2 is a metal base, and one surface of the metal base 2 is coated with a silicon-based high thermal conductive adhesive. The insulating plate 4 is mounted on the high thermal conductive adhesive with the bumps 16a and 16b side facing, and is slid right and left and pressed. After that, a solder chip is mounted or solder cream is applied on the first wiring pattern 8a, and the power semiconductor chip 6 is mounted on the solder. Further, an external drawing terminal (not shown) is also mounted on the wiring pattern. Then, the metal base 2, the insulating plate 4, and the semiconductor chip 6 are soldered by a reflow furnace, and the portions between the metal base 2 and the insulating plate 4 except the bumps 8a and 8b are bonded with an adhesive. Further, although not shown, the surface of the power semiconductor chip 6 and the wiring pattern 8b are formed using a wire bonder.
And are wire-bonded by the wire 12. Thereafter, a resin case (not shown) is bonded to the end of the metal base, and a sealing agent such as silicon gel is injected into the resin case to seal the power semiconductor chip 6 to form a power semiconductor module.

【0012】この工程で,形成される電力用半導体モジ
ュールは,第1のバンプ16aが電力用半導体チップ6
の下部に配置され,その大きさもチップ6より若干大き
いため,バンプ16aと他方の面の銅箔8cとの間のボ
イド発生は抑制される。もし,ボイドが発生しても,そ
のボイドは小さいものとなる。また,バンプ16aと金
属ベース2との間は半田付けされるが,半田付けされな
い部分は熱伝導接着剤により接着される。このときの半
田バンプ下の接着剤は薄く,接着時にバンプ16aの下
部の接着剤はバンプ16aの外側に押し出されて,ボイ
ドの発生は抑制される。また,バンプ16aと金属ベー
ス2との間の接着剤に,ボイドが発生してもボイドが小
さい。このため,電力用半導体モジュールの実装時のボ
イドによる熱損失は小さく,電力用半導体チップ6が発
生する熱は金属ベースから確実に放出される。
In the power semiconductor module formed in this step, the first bumps 16a have the power semiconductor chip 6
Since it is arranged at the lower part of the chip and its size is slightly larger than the chip 6, generation of voids between the bump 16a and the copper foil 8c on the other surface is suppressed. If a void occurs, the void will be small. Further, although the bump 16a and the metal base 2 are soldered, the non-soldered portion is bonded by a heat conductive adhesive. At this time, the adhesive under the solder bumps is thin, and the adhesive under the bumps 16a is pushed out to the outside of the bumps 16a at the time of bonding, so that the generation of voids is suppressed. Further, even if a void is generated in the adhesive between the bump 16a and the metal base 2, the void is small. Therefore, the heat loss due to the void when the power semiconductor module is mounted is small, and the heat generated by the power semiconductor chip 6 is surely released from the metal base.

【0013】また,他の配線パターン8bの下には,第
2のバンプ16bが配置されている。そして,電力用半
導体チップ6の表面と配線パターン8bとがワイヤ12
によりワイヤボンディングされても,図示しないワイヤ
ボンダーの押さえる力は,第2のバンプから金属ベース
2に伝わるので,確実に電力用半導体チップ6の表面と
配線パターン8bとをワイヤボンディングされる。
A second bump 16b is arranged below the other wiring pattern 8b. The surface of the power semiconductor chip 6 and the wiring pattern 8b are connected to the wire 12
Even if the wire bonding is performed, the pressing force of the wire bonder (not shown) is transmitted from the second bump to the metal base 2, so that the surface of the power semiconductor chip 6 and the wiring pattern 8b are reliably wire bonded.

【0014】[0014]

【発明の効果】請求項1記載の発明は,第1のバンプが
電力用半導体チップの下部に配線され,その大きさも電
力用半導体チップと同等又はやや大きいため,第1のバ
ンプと絶縁板の他方の面との間にボイドの発生が抑制さ
れる。もし,ボイドが発生しても,第1のバンプが小さ
いため,そのボイドが小さい。さらに,第1のバンプと
金属ベースとの間の接着は薄く,接着時に第1のバンプ
の下部の接着剤は第1のバンプの外側に押し出されて,
この間のボイドの発生も抑制される。従って,電力用半
導体モジュールを実装したとき,電力用半導体チップの
熱は,金属ベースから確実に放出され,電力用半導体モ
ジュールの損傷は回避される。
According to the first aspect of the present invention, the first bump is wired below the power semiconductor chip, and the size thereof is the same as or slightly larger than that of the power semiconductor chip. Generation of voids between the other surface is suppressed. Even if a void occurs, the void is small because the first bump is small. Furthermore, the adhesion between the first bump and the metal base is thin, and the adhesive under the first bump is pushed out of the first bump during the adhesion,
Generation of voids during this time is also suppressed. Therefore, when the power semiconductor module is mounted, the heat of the power semiconductor chip is surely released from the metal base, and damage to the power semiconductor module is avoided.

【0015】また,請求項2記載の発明では,ワイヤボ
ンディングされる他の配線パターンと金属との間には,
硬い半田の第2のバンプの厚い層が形成されるため,ワ
イヤボンダーの押さえる力は,他の配線パターンから金
属ベースに伝わり,他の配線パターンにワイヤを確実に
ワイヤボンディングすることができる。
Further, in the invention according to claim 2, between another wiring pattern to be wire-bonded and the metal,
Since the thick layer of the second bump of hard solder is formed, the pressing force of the wire bonder is transmitted from the other wiring pattern to the metal base, and the wire can be reliably wire-bonded to the other wiring pattern.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の電力用半導体モジュールの一実施の形
態を示す概略断面図である。
FIG. 1 is a schematic sectional view showing an embodiment of a power semiconductor module of the present invention.

【図2】従来の電力用半導体モジュールの説明図を記
す。
FIG. 2 is an explanatory diagram of a conventional power semiconductor module.

【図3】電力用半導体モジュールの内部構造の概略断面
図を示す。
FIG. 3 shows a schematic cross-sectional view of the internal structure of a power semiconductor module.

【符号の説明】[Explanation of symbols]

2 金属ベース 4 絶縁板 6 電力用半導体チップ 8a,8b 配線パターン 8c 銅箔 12 ワイヤ 16a (第1の)バンプ 16b (第2の)バンプ 2 metal base 4 insulating plate 6 Power semiconductor chips 8a, 8b wiring pattern 8c copper foil 12 wires 16a (first) bump 16b (second) bump

Claims (2)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 金属ベースと,金属ベース上に設けら
れ,一方の面に配線パターンが形成され,他方の面に銅
箔が形成された絶縁板と,上記配線パターンの1つに半
田付けされる電力用半導体チップと, 上記絶縁板の他
方の面と上記金属ベースとを接着する高熱伝導接着剤と
を備えた電力用半導体モジュールにおいて,上記電力用
半導体チップの下部の絶縁板の他方の面に,上記電力用
半導体チップの大きさと同等又はやや大きい半田の第1
のバンプが設けられることを特徴とする電力用半導体モ
ジュール。
1. A metal base, an insulating plate provided on the metal base and having a wiring pattern formed on one surface and a copper foil formed on the other surface, and soldered to one of the wiring patterns. In a power semiconductor module including a power semiconductor chip and a high thermal conductive adhesive that bonds the other surface of the insulating plate to the metal base, the other surface of the insulating plate below the power semiconductor chip is provided. In addition, the first solder of the same size as or slightly larger than the size of the power semiconductor chip is used.
The semiconductor module for electric power is characterized in that bumps are provided.
【請求項2】 上記電力用半導体チップと他の配線パタ
ーン間をボンディングされるワイヤを備え,上記他の配
線パターンの下部の絶縁板の他方の面に,上記配線パタ
ーンの大きさと同等又はやや大きい半田の第2のバンプ
が設けられた請求項1記載の電力用半導体モジュール。
2. A wire for bonding between the power semiconductor chip and another wiring pattern is provided, and the same size as or slightly larger than the size of the wiring pattern is provided on the other surface of the insulating plate below the other wiring pattern. The power semiconductor module according to claim 1, wherein a second bump of solder is provided.
JP20866498A 1998-07-08 1998-07-08 Power semiconductor module Expired - Fee Related JP3361276B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP20866498A JP3361276B2 (en) 1998-07-08 1998-07-08 Power semiconductor module

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20866498A JP3361276B2 (en) 1998-07-08 1998-07-08 Power semiconductor module

Publications (2)

Publication Number Publication Date
JP2000031357A JP2000031357A (en) 2000-01-28
JP3361276B2 true JP3361276B2 (en) 2003-01-07

Family

ID=16560015

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20866498A Expired - Fee Related JP3361276B2 (en) 1998-07-08 1998-07-08 Power semiconductor module

Country Status (1)

Country Link
JP (1) JP3361276B2 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5195282B2 (en) * 2008-10-28 2013-05-08 富士電機株式会社 Semiconductor device and manufacturing method thereof
JP5210935B2 (en) * 2009-03-26 2013-06-12 本田技研工業株式会社 Semiconductor device
JP5268994B2 (en) * 2010-05-31 2013-08-21 三菱電機株式会社 Semiconductor module and manufacturing method thereof

Also Published As

Publication number Publication date
JP2000031357A (en) 2000-01-28

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