JP3450101B2 - Cleaning method and cleaning device - Google Patents
Cleaning method and cleaning deviceInfo
- Publication number
- JP3450101B2 JP3450101B2 JP24728695A JP24728695A JP3450101B2 JP 3450101 B2 JP3450101 B2 JP 3450101B2 JP 24728695 A JP24728695 A JP 24728695A JP 24728695 A JP24728695 A JP 24728695A JP 3450101 B2 JP3450101 B2 JP 3450101B2
- Authority
- JP
- Japan
- Prior art keywords
- cleaning
- cleaned
- basket
- jig
- state
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000004140 cleaning Methods 0.000 title claims description 428
- 238000000034 method Methods 0.000 title claims description 30
- 239000012459 cleaning agent Substances 0.000 claims description 154
- 230000007246 mechanism Effects 0.000 claims description 25
- 239000002904 solvent Substances 0.000 description 56
- 238000013020 steam cleaning Methods 0.000 description 48
- 238000001035 drying Methods 0.000 description 27
- 238000006073 displacement reaction Methods 0.000 description 22
- 239000007788 liquid Substances 0.000 description 18
- 239000003921 oil Substances 0.000 description 18
- 230000000694 effects Effects 0.000 description 17
- 238000005406 washing Methods 0.000 description 17
- 239000004973 liquid crystal related substance Substances 0.000 description 13
- 239000000460 chlorine Substances 0.000 description 11
- 229920001296 polysiloxane Polymers 0.000 description 11
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 10
- 229910052801 chlorine Inorganic materials 0.000 description 10
- 150000002430 hydrocarbons Chemical class 0.000 description 10
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 9
- 230000015572 biosynthetic process Effects 0.000 description 9
- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical compound FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 description 9
- 210000002858 crystal cell Anatomy 0.000 description 8
- 238000007872 degassing Methods 0.000 description 8
- 230000008929 regeneration Effects 0.000 description 8
- 238000011069 regeneration method Methods 0.000 description 8
- 239000004215 Carbon black (E152) Substances 0.000 description 7
- 229930195733 hydrocarbon Natural products 0.000 description 7
- 235000014593 oils and fats Nutrition 0.000 description 7
- 239000000126 substance Substances 0.000 description 7
- 238000004506 ultrasonic cleaning Methods 0.000 description 7
- 230000008569 process Effects 0.000 description 6
- 230000001172 regenerating effect Effects 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- 239000003599 detergent Substances 0.000 description 5
- 230000007613 environmental effect Effects 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- 230000035515 penetration Effects 0.000 description 5
- 230000007723 transport mechanism Effects 0.000 description 5
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 4
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 4
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 4
- 238000009835 boiling Methods 0.000 description 4
- 230000006378 damage Effects 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 238000004821 distillation Methods 0.000 description 4
- 239000012466 permeate Substances 0.000 description 4
- UOCLXMDMGBRAIB-UHFFFAOYSA-N 1,1,1-trichloroethane Chemical compound CC(Cl)(Cl)Cl UOCLXMDMGBRAIB-UHFFFAOYSA-N 0.000 description 3
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 238000007654 immersion Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000003960 organic solvent Substances 0.000 description 3
- 238000000926 separation method Methods 0.000 description 3
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 2
- 230000002411 adverse Effects 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 239000000356 contaminant Substances 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 239000000428 dust Substances 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 230000004907 flux Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 238000009434 installation Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 230000001737 promoting effect Effects 0.000 description 2
- 239000004094 surface-active agent Substances 0.000 description 2
- 150000003505 terpenes Chemical class 0.000 description 2
- 235000007586 terpenes Nutrition 0.000 description 2
- 238000009834 vaporization Methods 0.000 description 2
- 230000008016 vaporization Effects 0.000 description 2
- AJDIZQLSFPQPEY-UHFFFAOYSA-N 1,1,2-Trichlorotrifluoroethane Chemical compound FC(F)(Cl)C(F)(Cl)Cl AJDIZQLSFPQPEY-UHFFFAOYSA-N 0.000 description 1
- OHMHBGPWCHTMQE-UHFFFAOYSA-N 2,2-dichloro-1,1,1-trifluoroethane Chemical compound FC(F)(F)C(Cl)Cl OHMHBGPWCHTMQE-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 101150000971 SUS3 gene Proteins 0.000 description 1
- 239000004480 active ingredient Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 238000003915 air pollution Methods 0.000 description 1
- 239000005456 alcohol based solvent Substances 0.000 description 1
- 150000003973 alkyl amines Chemical class 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 239000003183 carcinogenic agent Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 230000007123 defense Effects 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000005555 metalworking Methods 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 229920000151 polyglycol Polymers 0.000 description 1
- 239000010695 polyglycol Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000004080 punching Methods 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 238000009751 slip forming Methods 0.000 description 1
- 239000002689 soil Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- 238000003911 water pollution Methods 0.000 description 1
Landscapes
- Cleaning In General (AREA)
- Cleaning By Liquid Or Steam (AREA)
Description
【0001】[0001]
【発明の属する技術分野】本発明は、少なくとも一部が
密着するように積層された洗浄対象物の洗浄方法および
洗浄装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method and apparatus for cleaning objects to be cleaned, which are laminated so that at least a part thereof is in close contact with each other.
【0002】[0002]
【従来の技術】リードフレームのような油膜を介して互
いに密着した部品を洗浄する場合、通常数百枚のレベル
で洗浄カゴに入れ、その洗浄カゴを洗浄剤中に浸漬する
ことにより洗浄を行っている。洗浄剤としては、従来、
特定フロンであるフロン113 や1,1,1-トリクロロエタン
等の塩素系溶剤が主として使用されてきた。塩素系溶剤
は、一般に加工油や油脂等の有機物に対する溶解性が大
きいというような特徴を有している。洗浄工程として
は、浸漬洗浄を行った後に蒸気洗浄を行い、最終的に部
品に乾燥性を付与している。また、浸漬洗浄中に必要に
応じて超音波を照射して、有機物の溶解除去を効果的に
行うこともある。2. Description of the Related Art When cleaning parts that are in close contact with each other through an oil film such as a lead frame, the parts are usually put in a cleaning basket at a level of several hundreds, and the cleaning basket is immersed in a cleaning agent for cleaning. ing. As a cleaning agent,
Chlorinated solvents such as CFC 113 and 1,1,1-trichloroethane which are specific CFCs have been mainly used. Chlorine-based solvents are generally characterized by high solubility in organic materials such as processing oils and fats. As the cleaning step, steam cleaning is performed after immersion cleaning, and finally the parts are given dryness. Further, during immersion cleaning, ultrasonic waves may be irradiated as necessary to effectively remove organic substances by dissolution.
【0003】上述した塩素系溶剤は、表面張力が小さ
い、粘度が小さい、KB値が大きい、引火点がない、蒸
気洗浄が実施できる等、洗浄剤に必要とされる各種の要
素を有する優れた溶剤であるが、近年のオゾン層の破壊
に伴う環境問題によって、特定フロンと同様に、1,1,1-
トリクロロエタンは1996年以降の使用禁止が決定されて
いる。このようなことから、1,1,1-トリクロロエタンに
代わる塩素系有機溶剤として、例えば塩化メチレンやト
リクレン等の使用が検討され、一部で実用化されてい
る。The above-mentioned chlorine-based solvent is excellent in that it has various elements required for cleaning agents, such as low surface tension, low viscosity, high KB value, no flash point, and steam cleaning. Although it is a solvent, due to the environmental problems associated with the recent destruction of the ozone layer, 1,1,1-
Trichloroethane has been banned since 1996. For this reason, use of methylene chloride, trichlene, or the like as a chlorine-based organic solvent in place of 1,1,1-trichloroethane has been studied and partially put to practical use.
【0004】しかし、塩化メチレンは発癌性物質の疑い
があり、また環境規制(水質基準、大気汚染、土壌環境
基準)が強化されることが予想され、一方トリクレンは
化審法第2種特定化学物質に指定され、水質汚濁防止法
等による種々の規制強化が行われることが予想される。
さらに、これらの溶剤は分子中に塩素を含有しているた
め、オゾン層破壊の原因物質として、将来使用規制の対
象となることも考えられる。However, methylene chloride is suspected to be a carcinogenic substance, and it is expected that environmental regulations (water quality standards, air pollution, soil environmental standards) will be strengthened, while trichlene is categorized in the Chemical Substances Control Law, Class 2 Specified Chemistry. It is expected that the substance will be designated and various regulations will be strengthened under the Water Pollution Control Law.
Furthermore, since these solvents contain chlorine in the molecule, they may be subject to future use regulations as substances causing ozone layer depletion.
【0005】上述したように、塩化メチレンやトリクレ
ン等の代替溶剤を含めて塩素系溶剤は、使用量の削減な
いしは全廃が求められている。そこで、塩素系溶剤に代
わる洗浄剤として、比較的揮発性の高いアルコール類や
アセトン、エーテル等の有機溶剤、第2世代フロンや第
3世代フロンのような代替フロン、シリコーン系溶剤や
イソパラフィンのような炭化水素系溶剤等が種々提案さ
れている。しかしながら、有機物を溶解し、比較的揮発
性の高いアルコール類やアセトン、エーテル等の有機溶
剤は、人体に対して毒性があるだけでなく、引火点が低
く消防法上の取扱いが要求されることから実用性に難点
を有している。また、第2世代フロン(HCFC)は分子内に
塩素を含有しており、2020年頃には使用規制の対象とな
ることが報告され、塩素を含有しない第3世代フロン(H
FC) は製造やコスト等の点で難点を有している。As described above, the use of chlorine-based solvents including alternative solvents such as methylene chloride and trichlene is required to be reduced or eliminated altogether. Therefore, as cleaning agents to replace chlorine-based solvents, organic solvents such as relatively volatile alcohols, acetone, and ether, alternative CFCs such as second-generation CFCs and third-generation CFCs, silicone-based solvents and isoparaffins can be used. Various hydrocarbon solvents have been proposed. However, organic solvents such as alcohols, acetone, and ether, which dissolve organic substances and are relatively highly volatile, are not only toxic to the human body, but also have a low flash point and require handling under the Fire Defense Law. Therefore, it has a difficulty in practicality. Second-generation CFC (HCFC) contains chlorine in the molecule, and it was reported that it will be subject to usage restrictions around 2020.
FC) has drawbacks in terms of manufacturing and cost.
【0006】これらに対して、シリコーン系溶剤やイソ
パラフィンのような炭化水素系溶剤等を主成分とする洗
浄剤は、オゾン層の破壊等の環境破壊を引起すことがな
く、また電子部品に付着するフラックスや金属加工部品
に付着する切削油やプレス油等、各種の汚れに対して優
れた洗浄性を示すものである。また、洗浄は汚れ対象物
質を部品表面から除去することが第一の使命であるが、
同時に洗浄仕上り性を損わずに乾燥まで実施することが
重要である。そのためには、洗浄あるいは洗浄とすすぎ
を終了した後に、蒸気洗浄を行って乾燥させる方法が最
良と考えられる。シリコーン系溶剤や炭化水素系溶剤等
を主成分とする洗浄剤によれば、このような洗浄形態を
実施できる等の利点も有している。On the other hand, a cleaning agent containing a silicone-based solvent or a hydrocarbon-based solvent such as isoparaffin as a main component does not cause environmental damage such as ozone layer destruction and adheres to electronic parts. It exhibits excellent cleaning performance against various stains such as cutting flux and press oil adhering to the flux and metal working parts. In addition, the first mission of cleaning is to remove the contaminants from the surface of the parts,
At the same time, it is important to carry out the drying without impairing the cleaning finish. For that purpose, it is considered that the best method is to perform steam cleaning and then dry after finishing cleaning or cleaning and rinsing. The cleaning agent containing a silicone-based solvent or a hydrocarbon-based solvent as a main component also has an advantage that such a cleaning mode can be carried out.
【0007】上述したシリコーン系溶剤や炭化水素系溶
剤等を主成分とする洗浄剤は、ほとんどの工業部品に対
して使用可能であるものの、例えばリードフレームのよ
うに互いに密着した積層物の状態で洗浄を行うものに対
しては、積層物の隙間に洗浄剤(蒸気洗浄剤を含む)が
入りづらく、さらに一旦侵入した洗浄剤が出にくい等の
問題があり、洗浄後の仕上り性が低下しやすいという難
点があった。Although the above-mentioned cleaning agent containing a silicone-based solvent or a hydrocarbon-based solvent as a main component can be used for most industrial parts, for example, in the state of a laminated layer closely adhered to each other such as a lead frame. For cleaning products, there is a problem that the cleaning agent (including steam cleaning agent) is difficult to enter in the gaps of the laminate, and the cleaning agent that has once invaded is difficult to come out, resulting in poor finish after cleaning. There was a difficulty that it was easy.
【0008】このような現象はシリコーン系溶剤や炭化
水素系溶剤等を主成分とする洗浄剤に限らず、フロン/
エタン代替洗浄剤の全てに当てはまる現象である。すな
わち、リードフレームやフープ材のような金属薄板等
は、油膜の厚さで相互に密着した部分を有しているもの
が多く、この部分の油膜を取り除くことは極めて困難で
ある。例えば、打ち抜き後のいわゆる「定尺物」のリー
ドフレーム等は、製造工程中の工作油でリードフレーム
同士が互いに密着している。このため、洗浄に当たって
は油膜で密着した間隙に洗浄剤を浸透させた上で、工作
油を溶解除去しなければならない。塩素を分子中に含ま
ないフロン/エタン代替洗浄剤のほとんどはその溶解力
だけでは対応が難しく、他に超音波照射、洗浄剤の液循
環、洗浄カゴの揺動(上下運動)等を併用して洗浄を行
っているが、これらの洗浄方法を駆使しても洗浄後の仕
上り性を十分に満足させるまでには至っていない。Such a phenomenon is not limited to a cleaning agent containing a silicone solvent or a hydrocarbon solvent as a main component,
It is a phenomenon that applies to all ethane alternative cleaning agents. That is, many thin metal plates such as lead frames and hoop materials have portions that are in close contact with each other due to the thickness of the oil film, and it is extremely difficult to remove the oil film in this portion. For example, in a so-called “standard size” lead frame or the like after punching, the lead frames are in close contact with each other due to the working oil in the manufacturing process. For this reason, in cleaning, the cleaning agent must be dissolved and removed after the cleaning agent has penetrated into the gaps closely adhered by the oil film. Most of the CFC / ethane alternative cleaning agents that do not contain chlorine in the molecule are difficult to handle only by their dissolving power. In addition, ultrasonic irradiation, cleaning agent liquid circulation, cleaning basket swing (up and down movement), etc. are used together. However, even if these cleaning methods are used, the finishability after cleaning is not sufficiently satisfied.
【0009】一方、上記したような互いに密着した状態
で積層された板状部品等を洗浄する方法(ないしは洗浄
装置)として、例えば開口部に近付くにつれてその幅を
広くした保持凹部内に、積層された板状部品を配置する
と共に、この板状部品を保持する治具を所定の角度に反
復して傾けることによって、洗浄中に密着した板状部品
間を分離(剥離)しつつ洗浄(および乾燥)を行うこと
が提案されている(特開平6-114352号公報および実開平
6- 31884号公報参照)。On the other hand, as a method (or a cleaning device) for cleaning the plate-like parts and the like which are stacked in close contact with each other as described above, for example, they are stacked in a holding recess whose width is widened toward the opening. The plate-shaped parts are placed, and the jig that holds the plate-shaped parts is repeatedly tilted at a predetermined angle to clean (and dry) while separating (peeling) the plate-shaped parts that are in close contact during cleaning. ) Has been proposed (Japanese Patent Laid-Open No. 6-114352 and Japanese Utility Model Publication No.
6-31884 gazette).
【0010】しかしながら、上述した洗浄方法では、基
本的に保持凹部の形成角度に応じて板状部品を傾かせる
ことによって、板状部品間のずれによる分離を行ってい
るため、ずれ幅を大きく設定することが困難であった。
また、大きなずれ量を得るためには、保持凹部の形成角
度と治具の反復傾斜角度を大きくしなければならなず、
従って板状部品の治具からの落下等の危険が生じると共
に、治具を傾斜させるための駆動手段にも負荷が生じ
る。そもそも、被洗浄部品を保持する治具を洗浄槽内で
傾斜されること自体に難点があり、装置の複雑化等を招
いてしまう。However, in the above-described cleaning method, since the plate-like parts are basically tilted in accordance with the forming angle of the holding recesses to separate the plate-like parts by the deviation, the deviation width is set to be large. It was difficult to do.
Further, in order to obtain a large amount of deviation, the forming angle of the holding concave portion and the repeating inclination angle of the jig must be increased,
Therefore, there is a risk that the plate-shaped component will fall from the jig, and also a load will be applied to the driving means for inclining the jig. In the first place, there is a problem in that the jig for holding the part to be cleaned is tilted in the cleaning tank, which causes the apparatus to be complicated.
【0011】なお、特公昭 57-6982号公報には、リード
フレーム等の板状洗浄物の洗浄用装置として、切欠きを
有する 2枚の板を使用した治具が記載されている。しか
し、これは従来のパレット治具において、平坦載置にお
ける治具との接触面積が大きいことによる水切り性が悪
いことに基く洗浄性への影響を解決しようとするもので
あって、凹凸を有する 2枚の板はその凹部に洗浄物を羅
列、保持するのに利用されているのみであり、洗浄工程
においてブロック状の洗浄物をずらすようなものではな
い。また、実開平2-121726号公報には、液晶パネルを縦
方向に並べて充填する容器に、パネルの厚さに合せた波
状の凹凸を有する板を上下に配置し、この波板でパネル
を上下から適度に固定すると共に、底板を横にスライド
させることによって、パネルの表裏に隙間を開けて洗浄
性を向上させる液晶パネル洗浄治具が記載されている。
しかし、この治具における波状の凹凸を有する板は、上
下からパネルを一枚ずつ固定すると共に、斜めにずらし
たときに隙間が開いた状態でパネルを固定するのに利用
されているものであり、リードフレームのような薄板に
は到底適用することができない。In Japanese Patent Publication No. 57-6982, there is described a jig using two plates having notches as a device for cleaning a plate-like cleaning object such as a lead frame. However, in this conventional pallet jig, an attempt is made to solve the influence on the washability due to the poor drainage property due to the large contact area with the jig in flat mounting, and it has unevenness. The two plates are used only for arranging and holding the wash items in the recesses, and do not shift the block-like wash items in the washing process. Further, in Japanese Utility Model Laid-Open No. 221-2726, a container having liquid crystal panels arranged in a vertical direction and filled therein is provided with a plate having corrugated unevenness corresponding to the thickness of the panel, and the corrugated plate is used to move the panel up and down. There is described a liquid crystal panel cleaning jig which is fixed appropriately and slides the bottom plate laterally to open a gap between the front and back surfaces of the panel to improve the cleaning property.
However, the plate having wavy unevenness in this jig is used to fix the panels one by one from the top and bottom and also to fix the panels with a gap open when they are slanted. However, it cannot be applied to thin plates such as lead frames.
【0012】[0012]
【発明が解決しようとする課題】上述したように、環境
破壊等を引起すフロンや塩素系溶剤の代替洗浄剤が種々
検討されているが、これらはいずれも塩素を分子中に含
まないために、油膜等を介して密着するように積層され
た洗浄対象物に対しては、洗浄剤の溶解力だけでは対応
が困難であり、さらに超音波照射、洗浄剤の液循環、洗
浄カゴの揺動等を併用しても十分な洗浄仕上り性は得ら
れていないのが現状である。As mentioned above, various alternative cleaning agents for CFCs and chlorine-based solvents that cause environmental damage have been investigated, but none of them contain chlorine in the molecule. However, it is difficult to deal with the objects to be cleaned that are laminated so as to be in intimate contact with each other through the oil film, etc., only by the dissolving power of the cleaning agent, ultrasonic irradiation, liquid circulation of the cleaning agent, and shaking of the cleaning basket. The current situation is that sufficient cleaning finish has not been obtained even when these are used together.
【0013】一方、前述した積層された洗浄対象物の積
層状態をずらしつつ行う従来の洗浄方法では、ずれ幅を
大きく設定することが困難で、ずらすことによる効果を
十分満足し得る程には得ることができず、さらに洗浄対
象物が収納される治具を洗浄槽内で傾斜させる必要があ
るために、装置の複雑化等を招いていた。On the other hand, in the conventional cleaning method in which the stacked state of the stacked objects to be cleaned is shifted, it is difficult to set the deviation width to a large extent, and the effect of the displacement can be obtained sufficiently. However, the jig for accommodating the object to be cleaned needs to be tilted in the cleaning tank, which complicates the apparatus.
【0014】本発明は、このような課題に対処するため
になされたもので、油膜等を介して密着するように積層
された洗浄対象物に良好な洗浄仕上り性を安定して付与
することを可能にした洗浄方法、ならびにそのような洗
浄仕上り性を簡易な装置構成で実現することを可能にし
た洗浄装置を提供することを目的としている。The present invention has been made in order to solve such a problem, and it is possible to stably impart a good cleaning finish to an object to be cleaned that is laminated so as to be in intimate contact via an oil film or the like. It is an object of the present invention to provide a cleaning method that is made possible, and a cleaning device that can realize such a cleaning finish with a simple device configuration.
【0015】[0015]
【課題を解決するための手段】本発明の洗浄方法は、請
求項1に記載したように、少なくとも一部が密着した状
態で積層された洗浄対象物を洗浄するにあたり、上方に
向けて形成された凹凸部を有する治具に、前記積層状態
の洗浄対象物をその積層面の方向に沿って当てることに
よって、前記凹凸部の形状に合せて前記洗浄対象物の積
層状態を初期状態から前記積層面方向に沿ってずらしつ
つ、前記洗浄対象物を洗浄することを特徴としている。According to the cleaning method of the present invention, as described in claim 1, when cleaning the objects to be cleaned that are laminated in a state where at least a part thereof is in close contact, the cleaning method is formed upward. By applying the object to be cleaned in the laminated state along the direction of the laminating surface thereof to a jig having an uneven portion, the laminated state of the object to be cleaned is changed from the initial state to the laminated state in accordance with the shape of the uneven portion. It is characterized in that the object to be cleaned is cleaned while being displaced along the surface direction.
【0016】また、本発明の洗浄方法は、特に請求項2
に記載したように、上記した洗浄方法において、前記凹
凸部を有する治具を洗浄槽の底部付近に設置する共に、
前記積層状態の洗浄対象物を前記積層面方向が上下方向
となるように洗浄カゴに収納し、前記洗浄カゴの下降途
中で前記治具の凹凸部に前記積層状態の洗浄対象物の底
部が当たり、前記積層状態の洗浄対象物が前記凹凸部の
形状に合せてずれるように、前記洗浄カゴを前記洗浄槽
内で上下に揺動させること、あるいは請求項3に記載し
たように、底部に前記凹凸部を有する治具が設置された
洗浄カゴに、前記積層状態の洗浄対象物を前記積層面方
向を上下方向として前記治具の凹凸部に支持されるよう
に収納することによって、前記積層状態の洗浄対象物を
前記凹凸部の形状に合せてずらすことを特徴としてい
る。Further, the cleaning method of the present invention is particularly preferably defined in claim 2.
As described above, in the above-described cleaning method, a jig having the uneven portion is installed near the bottom of the cleaning tank,
The object to be cleaned in the stacked state is stored in a cleaning basket such that the stacking surface direction is the vertical direction, and the bottom of the object to be cleaned in the stacked state hits the uneven portion of the jig while the cleaning basket is descending. , Swinging the cleaning basket up and down in the cleaning tank so that the stacked objects to be cleaned are displaced according to the shape of the uneven portion, or as described in claim 3, By stacking the objects to be cleaned in the stacked state in a cleaning basket in which a jig having an uneven portion is installed so as to be supported by the uneven portions of the jig with the stacking surface direction being the vertical direction, the stacked state is obtained. The object to be cleaned is shifted according to the shape of the uneven portion.
【0017】本発明における第1の洗浄装置は、請求項
4に記載したように、少なくとも一部が密着した状態で
積層された洗浄対象物が収納される洗浄カゴと、上方に
向けて形成された凹凸部を有する治具が底部付近に設置
され、前記洗浄カゴに収納された洗浄対象物が浸漬また
は晒される洗浄剤および/またはその蒸気が収容された
洗浄槽と、前記洗浄カゴの下降途中で前記治具の凹凸部
に、前記積層状態の洗浄対象物の底部がその積層面の方
向に沿って当たるように、前記洗浄カゴを前記洗浄槽内
で上下に揺動させる洗浄カゴ揺動機構とを具備すること
を特徴としている。According to a fourth aspect of the present invention, as described in claim 4, the first cleaning device is formed with a cleaning basket for accommodating the objects to be cleaned, which are stacked in a state where at least a portion thereof is in close contact, and an upward direction. A jig having a concavo-convex portion is installed near the bottom, and a cleaning tank in which a cleaning agent and / or its vapor into which the cleaning object stored in the cleaning basket is dipped or exposed and a descending direction of the cleaning basket are provided. The swinging mechanism for swinging the washing basket up and down in the washing tank so that the bottom of the objects to be washed in the stacked state hits the uneven portion of the jig along the direction of the stacking surface. It is characterized by having and.
【0018】また、第2の洗浄装置は、請求項5に記載
したように、上方に向けて形成された凹凸部を有する治
具が底部に設置され、少なくとも一部が密着した状態で
積層された洗浄対象物がその積層面の方向に沿って前記
凹凸部に支持されるように収納される洗浄カゴと、前記
洗浄カゴに収納された前記洗浄対象物が浸漬または晒さ
れる洗浄剤および/またはその蒸気が収容された洗浄槽
とを具備することを特徴としている。Further, in the second cleaning device, as described in claim 5, a jig having an uneven portion formed upward is installed on the bottom portion, and at least a part of the jig is laminated in close contact. And a cleaning basket in which the cleaning target is housed so as to be supported by the concave-convex portion along the direction of the laminated surface, and a cleaning agent in which the cleaning target housed in the cleaning basket is immersed or exposed and / or It is characterized by comprising a cleaning tank containing the vapor.
【0019】本発明の洗浄装置は、特に請求項6に記載
したように、上記した第1または第2の洗浄装置におい
て、さらに前記洗浄剤が収容された洗浄槽の底部に設置
された超音波発振手段と、前記洗浄剤中の溶存ガスを取
り除く脱気手段とを具備することを特徴としている。According to a sixth aspect of the present invention, there is provided the cleaning device according to the first or second cleaning device, wherein the ultrasonic wave is installed at the bottom of the cleaning tank containing the cleaning agent. It is characterized by comprising an oscillating means and a degassing means for removing the dissolved gas in the cleaning agent.
【0020】ここで、本発明における洗浄とは、少なく
とも一部が油膜等を介して密着した積層物を洗浄対象物
とする工程であれば特に限定されるものではなく、油脂
類のような液体汚れや固形汚れ等の各種汚れ成分を主と
して除去する汚れ除去洗浄工程、洗浄工程により付着し
た洗浄剤成分を主として除去するすすぎ洗浄工程、およ
び蒸気洗浄剤を用いて洗浄対象物の乾燥(場合によって
は洗浄も含む)を行う蒸気洗浄(乾燥)工程のいずれに
も適用することができる。また、上記したような各洗浄
工程の 1つに適用してもよいし、さらに汚れ除去洗浄工
程から蒸気洗浄(乾燥)工程までを連続させた洗浄工程
それぞれに適用することも可能である。さらに、具体的
な洗浄手段としては、超音波照射、洗浄カゴの揺動、洗
浄剤の循環や噴射(液中または液外)等の各種の物理的
洗浄補助手段を併用することができる。Here, the washing in the present invention is not particularly limited as long as it is a step of treating a laminate, at least a portion of which is in close contact with an oil film or the like, as an object to be washed, and liquids such as oils and fats. A stain removal cleaning step for mainly removing various dirt components such as dirt and solid dirt, a rinsing cleaning step for mainly removing cleaning agent components adhering to the cleaning step, and drying of an object to be cleaned using a steam cleaning agent (in some cases, It can be applied to any of the steam cleaning (drying) steps of performing cleaning (including cleaning). Further, it may be applied to one of the respective cleaning steps as described above, or may be applied to each of the cleaning steps in which the dirt removal cleaning step to the steam cleaning (drying) step are continued. Further, as a specific cleaning means, various physical cleaning auxiliary means such as ultrasonic irradiation, swinging of a cleaning basket, circulation and injection of a cleaning agent (in liquid or out of liquid) can be used in combination.
【0021】本発明の洗浄方法においては、積層状態の
洗浄対象物をその積層面方向に沿って凹凸部を有する治
具に当てることによって、凹凸部の形状に合せて洗浄対
象物の積層状態を初期状態から積層面方向に沿ってずら
しつつ洗浄を実施するために、積層状態の洗浄対象物の
ずれ量に応じて、洗浄対象物の密着部への洗浄剤やその
蒸気の浸透が促進される。従って、洗浄対象物の密着部
に介在する油脂類等の濃度を短時間で減少させることが
できるため、少なくとも一部が密着した状態で積層され
た洗浄対象物にその密着面を含めて良好な洗浄仕上り性
を安定して付与することができる。In the cleaning method of the present invention, the object to be cleaned in a stacked state is applied to a jig having an uneven portion along the direction of the stacking surface thereof so that the stacked state of the object to be cleaned is adjusted according to the shape of the uneven portion. Since the cleaning is carried out while shifting along the stacking surface direction from the initial state, the penetration of the cleaning agent and its vapor into the contact portion of the cleaning target is promoted in accordance with the amount of deviation of the cleaning target in the stacked state. . Therefore, it is possible to reduce the concentration of oils and fats and the like that are present in the close contact portion of the object to be cleaned in a short time. The cleaning finish can be stably imparted.
【0022】そして、凹凸部の 1つ当たり凸部の幅を積
層状態の洗浄対象物を形成する個々の被洗浄物の厚さに
対して十分幅広く形成しておくことによって、ずれ量は
凸部の形成角度によって決定することができる。従っ
て、複雑な機構を用いることなく、積層状態の洗浄対象
物のずれに基く洗浄剤やその蒸気の浸透促進効果を十分
に得ることができる。By forming the width of each convex portion of the concave-convex portion to be sufficiently wider than the thickness of each of the objects to be cleaned which form the object to be cleaned in the laminated state, the deviation amount can be reduced. Can be determined by the formation angle of. Therefore, it is possible to sufficiently obtain the effect of promoting the permeation of the cleaning agent and its vapor based on the displacement of the objects to be cleaned in the stacked state without using a complicated mechanism.
【0023】特に、請求項2に記載した洗浄方法におい
ては、洗浄対象物を収容した洗浄カゴを上下に揺動する
ことによって、洗浄対象物が凹凸部を有する治具に当た
ってずれた状態と初期の積層状態とが繰り返される。積
層状態の洗浄対象物がずれた状態では、洗浄対象物の密
着部に洗浄剤やその蒸気が強制的に浸透し、また元の積
層状態に戻る際に、浸透した洗浄剤やその蒸気が排除さ
れる。このような状態を繰り返すことによって、たえず
新規な洗浄剤やその蒸気が洗浄対象物の密着部に浸透す
ることになるため、確実にかつ短時間で洗浄対象物の密
着部に介在する油脂類等の濃度を減少させることができ
る。In particular, in the cleaning method according to the second aspect, the cleaning basket containing the object to be cleaned is vertically swung, so that the object to be cleaned hits the jig having the uneven portion and is displaced from the initial state. The stacked state is repeated. When the objects to be cleaned in the stacked state are displaced, the cleaning agent and its vapor are forcibly infiltrated into the contact area of the objects to be cleaned, and when the original layered state is restored, the infiltrated cleaning agent and its vapor are removed. To be done. By repeating such a state, the new cleaning agent and its vapor will permeate into the close contact part of the object to be cleaned, so that the oils and fats etc. intervening in the close part of the object to be cleaned surely and in a short time. The concentration of can be reduced.
【0024】また、請求項3に記載した洗浄方法におい
ては、底部に凹凸部を有する治具が設置された洗浄カゴ
に積層状態の洗浄対象物を収納して洗浄を実施する。こ
のような場合、洗浄の初期段階では洗浄対象物は互いに
ずれることなく、積層状態を維持しているが、洗浄時間
の経過に伴って次第に密着部に洗浄剤やその蒸気が浸透
し、自然に洗浄対象物は互いに滑り現象を発現する。凹
凸部の 1つ当たり凸部の幅を、積層状態の洗浄対象物を
形成する個々の被洗浄物の厚さに対して十分幅広く、か
つ十分な傾斜を形成しておくことによって、 1つの凸部
で考えた場合に隣り合う被洗浄物は少しずつずれること
になる。 1か所のずれ量は小さくても、密着面全体で積
算すると残存面積に対して数% から数10% になり、洗浄
剤やその蒸気の浸透に大きく貢献することになる。その
結果、確実に洗浄対象物の密着部に介在する油脂類等の
濃度を減少させることができる。Further, in the cleaning method according to the third aspect, cleaning is carried out by accommodating the objects to be cleaned in a stacked state in a cleaning basket having a jig having an uneven portion on the bottom thereof. In such a case, the objects to be cleaned do not shift from each other in the initial stage of cleaning and the stacked state is maintained, but as the cleaning time elapses, the cleaning agent and its vapor permeate gradually into the adhered parts and naturally The objects to be cleaned exhibit a slip phenomenon with each other. The width of each convex part of the uneven part is wide enough for the thickness of the individual objects to be cleaned that form the stacked objects to be cleaned, and a sufficient inclination is formed so that one convex part is formed. When considered in terms of parts, the objects to be cleaned adjacent to each other will be slightly displaced. Even if the amount of displacement at one location is small, it will be several percent to several tens of percent of the remaining area when integrated over the entire contact surface, which will greatly contribute to the penetration of the cleaning agent and its vapor. As a result, it is possible to reliably reduce the concentration of oils and fats or the like that are present in the close contact portion of the cleaning target.
【0025】本発明の第1の洗浄装置は、洗浄カゴの下
降途中で洗浄槽の底部付近に設置された治具の凹凸部
に、積層状態の洗浄対象物の底部が当たるように洗浄カ
ゴを上下に揺動させる洗浄カゴ揺動機構を有しているた
め、洗浄カゴの揺動に応じて洗浄対象物が凹凸部を有す
る治具に当たってずれた状態と初期の積層状態とが繰り
返される。従って、請求項2記載の洗浄法方と同様に、
確実にかつ短時間で洗浄対象物の密着部に介在する油脂
類等の濃度を減少させることができるため、少なくとも
一部が密着した状態で積層された洗浄対象物にその密着
面を含めて良好な洗浄仕上り性を付与することができ
る。In the first cleaning device of the present invention, the cleaning basket is placed so that the bottom of the stacked objects to be cleaned hits the uneven portion of the jig installed near the bottom of the cleaning tank while the cleaning basket is descending. Since the cleaning basket swinging mechanism for swinging the cleaning basket up and down is provided, the state in which the object to be cleaned hits the jig having the uneven portion and is displaced according to the swinging of the cleaning basket and the initial stacked state are repeated. Therefore, like the cleaning method according to claim 2,
Since it is possible to reduce the concentration of oils and fats, etc. existing in the close contact part of the object to be cleaned reliably and in a short time, it is good to include the contact surface in the object to be cleaned stacked at least in part. It is possible to impart a good cleaning finish.
【0026】また第2の洗浄装置においては、上方に向
けて形成された凹凸部を有する治具が底部に設置され洗
浄カゴを用いているため、洗浄時間の経過に伴って積層
状態の洗浄対象物を形成する個々の被洗浄物は少しずつ
ずれることになる。従って、請求項3記載の洗浄法方と
同様に、確実に洗浄対象物の密着部に介在する油脂類等
の濃度を減少させることができるため、少なくとも一部
が密着した状態で積層された洗浄対象物にその密着面を
含めて良好な洗浄仕上り性を付与することができる。Further, in the second cleaning apparatus, since the jig having the concave and convex portion formed upward is installed at the bottom and the cleaning basket is used, the cleaning target in the stacked state becomes longer as the cleaning time elapses. The individual objects to be cleaned that form the objects will be slightly displaced. Therefore, as in the cleaning method according to claim 3, the concentration of oils and fats and the like present in the close contact portion of the object to be cleaned can be surely reduced, and therefore, cleaning in which at least a part of them are stacked in close contact It is possible to give a good cleaning finish to the object including its contact surface.
【0027】そして、本発明の第1および第2の洗浄装
置においては、いずれもずれ量を凸部の形成角度によっ
て決定することができるため、簡易な装置構成によっ
て、積層状態の洗浄対象物のずれに基く洗浄剤やその蒸
気の浸透促進効果を十分に得ることができる。In each of the first and second cleaning devices of the present invention, the amount of deviation can be determined by the formation angle of the convex portion, so that the cleaning target objects in the stacked state can be formed with a simple device configuration. It is possible to sufficiently obtain the effect of promoting permeation of the cleaning agent and its vapor based on the deviation.
【0028】本発明の洗浄装置においては、特に超音波
発振手段と洗浄剤中の溶存ガスを取り除く脱気手段とを
設置することによって、積層状態の洗浄対象物の洗浄仕
上り性を向上させることができる。これは、通常の超音
波洗浄による物理的な洗浄補助効果だけでなく、洗浄剤
中の溶存ガスを取り除くことによって、超音波エネルギ
ーによるキャビティションの発生を増大させることがで
きるためである。脱気手段としては、洗浄剤を加熱する
もの、気液分離膜を利用するもの、真空ポンプを利用す
るもの等が広く利用されており、本発明における脱気手
段は特にその具体的手段に限定されるものではない。た
だし、洗浄剤中の気体の溶解度は飽和溶解度の 80%以下
に設定することが好ましく、より好ましくは 65%以下で
ある。In the cleaning apparatus of the present invention, the ultrasonic finishing means and the degassing means for removing the dissolved gas in the cleaning agent are installed to improve the cleaning finish of the cleaning object in the laminated state. it can. This is because not only the physical cleaning assistance effect of ordinary ultrasonic cleaning but also the generation of cavitation due to ultrasonic energy can be increased by removing the dissolved gas in the cleaning agent. As the degassing means, one that heats the cleaning agent, one that uses a gas-liquid separation membrane, one that uses a vacuum pump, etc. are widely used, and the degassing means in the present invention is particularly limited to that specific means. It is not something that will be done. However, the solubility of the gas in the detergent is preferably set to 80% or less of the saturated solubility, and more preferably 65% or less.
【0029】[0029]
【発明の実施の形態】以下、本発明を実施するための形
態について説明する。BEST MODE FOR CARRYING OUT THE INVENTION Modes for carrying out the present invention will be described below.
【0030】図1は、本発明の一実施形態による洗浄装
置の概略構成を示す図である。同図に示す洗浄装置は、
大別して汚れ除去洗浄工程Aとすすぎ洗浄工程Bと蒸気
洗浄工程Cとから主要部が構成されており、これら各工
程A、B、Cに洗浄対象物が収納された洗浄カゴ1を順
に搬送すると共に、洗浄カゴ1の揺動機構が付設された
搬送機構Dを有している。そのほか、洗浄剤再生機構E
および蒸気洗浄剤再生機構Fが併設されている。FIG. 1 is a diagram showing a schematic configuration of a cleaning apparatus according to an embodiment of the present invention. The cleaning device shown in FIG.
The main part is roughly divided into a dirt removal cleaning step A, a rinse cleaning step B, and a steam cleaning step C, and the cleaning basket 1 in which an object to be cleaned is stored is sequentially transferred to each of these steps A, B, and C. At the same time, it has a transport mechanism D to which a swinging mechanism of the cleaning basket 1 is attached. In addition, cleaning agent regeneration mechanism E
Also, a steam cleaner regenerating mechanism F is provided side by side.
【0031】汚れ除去洗浄工程Aは第1の洗浄槽11と
第2の洗浄槽12とを有している。これら各洗浄槽1
1、12には、洗浄剤13がそれぞれ所定量充填されて
おり、洗浄剤13中に洗浄カゴ1に収納された洗浄対象
物を浸漬させることによって、洗浄対象物に付着する汚
れ成分が除去される。なお、汚れ除去洗浄工程Aにおけ
る洗浄槽の数は特に限定されるものではなく、洗浄対象
物の形状や汚れの種類および量、さらには洗浄時間や洗
浄品質等に応じて設定されるものであり、単槽であって
もよいし、またこの実施形態のように多槽としてもよ
い。The stain removing and cleaning step A has a first cleaning tank 11 and a second cleaning tank 12. Each of these washing tanks 1
1 and 12 are each filled with a predetermined amount of cleaning agent 13. By immersing the cleaning object stored in the cleaning basket 1 in the cleaning agent 13, the dirt components attached to the cleaning object are removed. It The number of cleaning tanks in the stain removal / cleaning step A is not particularly limited, and is set according to the shape of the object to be cleaned, the type and amount of dirt, the cleaning time, the cleaning quality, and the like. A single tank may be used, or multiple tanks may be used as in this embodiment.
【0032】ここで、各洗浄槽11、12に収容される
洗浄剤13は、汚れ成分や洗浄対象物の種類等に応じて
設定されるものであり、水系洗浄剤、溶剤系洗浄剤等、
各種の洗浄剤を使用することができるが、本発明に対し
ては特に溶剤系洗浄剤が好適である。溶剤系洗浄剤とし
ては、シリコーン系溶剤、炭化水素系溶剤、ペルフルオ
ロカーボン系溶剤、テルペン系溶剤、これらの混合溶剤
等、もしくはこれらにアルコール等の洗浄有効成分や各
種添加剤を加えたものが挙げられる。また、アルキルア
ミンオキサイド系溶剤、ポリグリコール系溶剤、テルペ
ン系溶剤、アルコール系溶剤、およびこれらと界面活性
剤とを含む洗浄剤のように、溶剤を主成分とする洗浄組
成物で洗浄した後、その洗浄組成物を水によりすすぐこ
とが可能な準水系洗浄剤と呼ばれる溶剤系洗浄剤の一種
を用いることもできる。水系洗浄剤としては、無機酸、
有機酸、アルカリ等の水溶液、界面活性剤を主成分とす
る洗剤およびこれらの水溶液、さらにはこれらに各種添
加剤を加えたもの等が挙げられる。Here, the cleaning agent 13 contained in each of the cleaning tanks 11 and 12 is set in accordance with the dirt component, the type of the object to be cleaned, etc., and the water-based cleaning agent, the solvent-based cleaning agent, etc.
Various cleaning agents can be used, but solvent-based cleaning agents are particularly suitable for the present invention. Examples of the solvent-based cleaning agent include silicone-based solvents, hydrocarbon-based solvents, perfluorocarbon-based solvents, terpene-based solvents, mixed solvents thereof, or those obtained by adding cleaning active ingredients such as alcohol and various additives to them. To be Also, after washing with a cleaning composition containing a solvent as a main component, such as an alkylamine oxide-based solvent, a polyglycol-based solvent, a terpene-based solvent, an alcohol-based solvent, and a cleaning agent containing these and a surfactant, It is also possible to use one type of solvent-based cleaning agent called a semi-aqueous cleaning agent capable of rinsing the cleaning composition with water. As an aqueous cleaning agent, an inorganic acid,
Examples thereof include aqueous solutions of organic acids and alkalis, detergents containing a surfactant as a main component, these aqueous solutions, and those obtained by adding various additives thereto.
【0033】例えば、溶剤系洗浄剤の一種であるシリコ
ーン系溶剤としては、For example, as a silicone-based solvent which is a kind of solvent-based cleaning agent,
【化1】 で表される直鎖状ポリジオルガノシロキサン、および[Chemical 1] A linear polydiorganosiloxane represented by
【化2】
で表される環状ポリジオルガノシロキサンから選ばれる
少なくとも 1種の低分子量ポリオルガノシロキサンが、
また炭化水素系溶剤としては炭素数 6〜20の分枝状また
は直鎖状の脂肪族炭化水素が例示される。[Chemical 2] At least one low molecular weight polyorganosiloxane selected from cyclic polydiorganosiloxanes represented by
Examples of the hydrocarbon solvent include branched or straight chain aliphatic hydrocarbons having 6 to 20 carbon atoms.
【0034】なお、上記 (1)式および (2)式中の Rは、
置換または非置換の 1価の炭化水素基であり、例えばメ
チル基、エチル基、プロピル基、ブチル基等のアルキル
基、フェニル基等の 1価の非置換炭化水素基や、トリフ
ルオロメチル基等の 1価の置換炭化水素基等が例示され
るが、系の安定性、揮発性の維持等からメチル基が最も
好ましい。R in the above formulas (1) and (2) is
A substituted or unsubstituted monovalent hydrocarbon group such as an alkyl group such as a methyl group, an ethyl group, a propyl group, a butyl group, a monovalent unsubstituted hydrocarbon group such as a phenyl group, a trifluoromethyl group, etc. The monovalent substituted hydrocarbon group and the like are exemplified, but the methyl group is most preferable from the viewpoint of stability of the system, maintenance of volatility and the like.
【0035】上述した各洗浄槽11、12は、それらの
底部に設置された超音波発生手段としての超音波発生装
置(超音波振動子)14をそれぞれ有しており、超音波
洗浄の併用が可能とされている。また、各洗浄槽11、
12の底部付近には、後に詳述する上方に向けて凹凸部
が形成されたずらし治具15が、搬送機構Dに付設され
た揺動機構による洗浄カゴ1の揺動範囲に応じた位置に
それぞれ設置されている。さらに、各洗浄槽11、12
はそれぞれ洗浄液循環系16を有しており、これら洗浄
液循環系16には脱気装置17がそれぞれ介挿されてい
る。一般的に洗浄剤中に超音波を照射すると、キャビテ
ーション効果により洗浄力が向上する。また、超音波は
洗浄剤中の溶存ガスが少ないとより効果的である。従っ
て、脱気装置17を超音波洗浄と併用することで、洗浄
対象物の超音波洗浄を効果的に行うことができる。この
ような脱気の併用は各種の洗浄剤に対して効果を示す。Each of the above-mentioned cleaning tanks 11 and 12 has an ultrasonic wave generator (ultrasonic vibrator) 14 as an ultrasonic wave generator installed at the bottom thereof, so that ultrasonic cleaning can be used in combination. It is possible. In addition, each cleaning tank 11,
Near the bottom of 12, a shifting jig 15 having an uneven portion formed upwardly, which will be described in detail later, is provided at a position corresponding to the swing range of the cleaning basket 1 by the swing mechanism attached to the transport mechanism D. Each is installed. Furthermore, each cleaning tank 11, 12
Each have a cleaning liquid circulation system 16, and a deaerator 17 is inserted in each of these cleaning liquid circulation systems 16. Generally, when a cleaning agent is irradiated with ultrasonic waves, the cleaning power is improved due to the cavitation effect. Also, ultrasonic waves are more effective when the dissolved gas in the cleaning agent is small. Therefore, the ultrasonic cleaning of the cleaning target can be effectively performed by using the degassing device 17 together with the ultrasonic cleaning. The combined use of such deaeration is effective for various cleaning agents.
【0036】具体的な脱気装置17としては、真空ある
いは減圧雰囲気中でノズルから洗浄剤を放出する簡易的
な方式を採用することが好ましい。特開昭 63-221878号
公報や特開平 1-27680号公報等に記載されている洗浄剤
を沸騰させる方式を採用することも可能であるが、洗浄
剤13が引火点を有している場合に不都合が生じるおそ
れがある。As a concrete deaerator 17, it is preferable to adopt a simple method of discharging the cleaning agent from the nozzle in a vacuum or reduced pressure atmosphere. It is also possible to employ the method of boiling the cleaning agent described in JP-A-63-221878 or JP-A-1-27680, but when the cleaning agent 13 has a flash point. May cause inconvenience.
【0037】汚れ除去洗浄工程Aは、上述したように各
洗浄槽11、12内に設置された超音波発生装置14に
よる超音波洗浄と搬送機構Dに付設された揺動機構によ
る揺動洗浄とを併用して汚れ除去を行うものであるが、
さらに洗浄剤の循環や噴射等の他の物理的洗浄補助手段
を併用することも可能である。The dirt removing cleaning step A includes ultrasonic cleaning by the ultrasonic generator 14 installed in each cleaning tank 11 and 12 and rocking cleaning by the rocking mechanism attached to the transport mechanism D as described above. Is used together to remove dirt,
Further, other physical cleaning auxiliary means such as circulation and injection of the cleaning agent can be used together.
【0038】すすぎ洗浄工程Bは、第1のすすぎ洗浄槽
21と第2のすすぎ洗浄槽22とを有している。これら
各すすぎ洗浄槽21、22には、すすぎ洗浄剤23がそ
れぞれ所定量充填されており、すすぎ洗浄剤23中に洗
浄カゴ1に収納された洗浄対象物を浸漬させることによ
って、洗浄対象物に付着する洗浄剤成分や残留する汚れ
成分が除去される。なお、すすぎ洗浄工程Bにおけるす
すぎ洗浄槽の数は特に限定されるものではなく、洗浄品
質や洗浄時間等に応じて設定され、単槽であってもよい
し、またこの実施形態のように多槽としてもよい。The rinsing / cleaning step B has a first rinsing / cleaning tank 21 and a second rinsing / cleaning tank 22. Each of these rinsing cleaning tanks 21 and 22 is filled with a predetermined amount of rinsing cleaning agent 23, and by immersing the cleaning object stored in the cleaning basket 1 in the rinsing cleaning agent 23, The cleaning agent components that adhere and residual stain components are removed. The number of rinsing / cleaning tanks in the rinsing / cleaning step B is not particularly limited, and is set according to the cleaning quality, cleaning time, etc., and may be a single tank, or as in this embodiment. It may be a tank.
【0039】各すすぎ洗浄槽21、22に収容されるす
すぎ洗浄剤23は、洗浄剤13として溶剤系洗浄剤を用
いた場合にはその主成分となる溶剤単独の洗浄剤、もし
くはそれに少量の添加剤を加えたもの等が用いられる。
また、一液で洗浄からすすぎまで、さらには乾燥(蒸気
洗浄)まで実施することが可能な洗浄剤であれば、洗浄
剤13と同一組成の洗浄剤をすすぎ洗浄剤23として用
いることができる。さらに、水系洗浄剤や準水系洗浄剤
を洗浄剤13として用いる場合には、すすぎ洗浄剤23
として水が用いられる。When the solvent-based cleaning agent is used as the cleaning agent 13, the rinsing cleaning agent 23 accommodated in each of the rinsing cleaning tanks 21 and 22 is a cleaning agent containing only the solvent as the main component, or a small amount thereof. The thing etc. which added the agent are used.
In addition, as long as it is a cleaning agent that can perform cleaning, rinsing, and further drying (steam cleaning) with one liquid, a cleaning agent having the same composition as the cleaning agent 13 can be used as the rinsing cleaning agent 23. Furthermore, when using a water-based cleaning agent or a semi-water-based cleaning agent as the cleaning agent 13, a rinse cleaning agent 23
Is used as water.
【0040】また、各すすぎ洗浄槽21、22には、洗
浄槽11、12と同様に、超音波発生装置14、ずらし
治具15および脱気装置17が介挿され洗浄剤循環系1
6が設置されており、汚れ除去洗浄工程Aと同様にすす
ぎ洗浄効率の向上が図られている。Further, as in the cleaning tanks 11 and 12, an ultrasonic generator 14, a shift jig 15 and a deaerator 17 are inserted in the rinse cleaning tanks 21 and 22, respectively, and the cleaning agent circulation system 1 is provided.
6 is installed, and the rinsing and cleaning efficiency is improved similarly to the stain removing and cleaning step A.
【0041】上述した汚れ除去洗浄工程Aおよびすすぎ
洗浄工程Bには、洗浄剤再生機構Eが付設されている。
ここで、洗浄を繰り返した場合、洗浄剤13やすすぎ洗
浄剤23中には汚れ成分が混入し、次第にその濃度が大
きくなる。ここで、第1の洗浄槽11(もしくは第1の
すすぎ洗浄槽21)から洗浄対象物や洗浄カゴ1に付着
した状態で持ち出した量に相当する新液を補充すると、
汚れ濃度はある一定濃度に近付いてくる。この濃度が管
理値以下であれば洗浄剤の液交換はしなくてもすむが、
管理値を超える場合には液交換が必要になる。洗浄剤廃
液の処理量の減少およびランニングコストの低減を図る
ためには、汚れた洗浄剤を例えば蒸留再生して再使用す
ることが重要となる。そこで、この実施形態の洗浄装置
は、汚れ除去洗浄工程Aおよびすすぎ洗浄工程Bに洗浄
剤再生機構Eを付設している。A cleaning agent regenerating mechanism E is additionally provided in the above-mentioned stain removal cleaning step A and rinse cleaning step B.
Here, when the cleaning is repeated, the dirt component is mixed in the cleaning agent 13 and the rinsing agent 23, and the concentration thereof gradually increases. Here, when a new liquid equivalent to the amount taken out from the first cleaning tank 11 (or the first rinse cleaning tank 21) while being attached to the cleaning object or the cleaning basket 1 is replenished,
The dirt density approaches a certain level. If this concentration is below the control value, it is not necessary to replace the cleaning liquid,
If the control value is exceeded, liquid replacement is required. In order to reduce the treatment amount of the cleaning agent waste liquid and the running cost, it is important to reuse the contaminated cleaning agent by, for example, regenerating it by distillation. Therefore, in the cleaning apparatus of this embodiment, a cleaning agent regenerating mechanism E is attached to the dirt removal cleaning step A and the rinse cleaning step B.
【0042】洗浄剤再生機構Eとしては例えば蒸留装置
が用いられ、蒸留再生された洗浄剤が再利用される。す
なわち、例えば第1の洗浄槽11から洗浄剤再生機構E
に送られた洗浄剤13は、洗浄剤再生機構Eの蒸留装置
により沸点差を利用して汚れ成分と分離される。この蒸
留精製された洗浄剤は再生洗浄剤として第2の洗浄槽1
2に再送される。また、第1の洗浄槽11と第2の洗浄
槽12とはオーバーフロー管18を介して接続されてい
るため、第1の洗浄槽11および第2の洗浄槽12に収
容された洗浄剤13は洗浄剤再生機構Eを介して、清浄
化されつつ循環するように構成されている。すすぎ洗浄
剤23についても同様である。As the cleaning agent regenerating mechanism E, for example, a distillation apparatus is used, and the cleaning agent regenerated by distillation is reused. That is, for example, the cleaning agent regeneration mechanism E from the first cleaning tank 11
The cleaning agent 13 sent to is separated by the distillation device of the cleaning agent regeneration mechanism E from the dirt component by utilizing the boiling point difference. This distilled and purified cleaning agent is used as a regenerated cleaning agent in the second cleaning tank 1
It is retransmitted to 2. Further, since the first cleaning tank 11 and the second cleaning tank 12 are connected via the overflow pipe 18, the cleaning agent 13 contained in the first cleaning tank 11 and the second cleaning tank 12 is The cleaning agent regeneration mechanism E is configured to circulate while being cleaned. The same applies to the rinse detergent 23.
【0043】ここで、洗浄剤13とすすぎ洗浄剤23と
は、洗浄剤再生機構Eにおいて基本的には別系統として
処理されるが、同組成の洗浄剤や主成分が同一の洗浄剤
を用いる場合には、洗浄剤13とすすぎ洗浄剤23を同
系統で処理することも可能である。Here, the cleaning agent 13 and the rinse cleaning agent 23 are basically treated as separate systems in the cleaning agent regenerating mechanism E, but a cleaning agent having the same composition or a cleaning agent having the same main component is used. In this case, the cleaning agent 13 and the rinse cleaning agent 23 can be treated in the same system.
【0044】蒸気洗浄(乾燥)工程Cは、蒸気洗浄(乾
燥)槽31を有しており、この蒸気洗浄(乾燥)槽31
には蒸気洗浄剤32が充填されている。蒸気洗浄剤32
中にはヒータ等の加熱装置33が投入されており、蒸気
洗浄剤32を加熱して発生させた蒸気32aに洗浄対象
物を晒すことによって、洗浄対象物の蒸気洗浄ならびに
乾燥が行われる。また、蒸気洗浄(乾燥)槽31の上部
には、蒸気32aの揮散を防止する冷却部34が設けら
れている。なお、蒸気洗浄(乾燥)槽31は、一旦蒸気
洗浄剤32中に洗浄対象物を浸漬し、その引上げ過程で
洗浄対象物を蒸気32aに晒すような構成とすることも
できる。The steam cleaning (drying) step C has a steam cleaning (drying) tank 31, and this steam cleaning (drying) tank 31.
Is filled with a steam cleaning agent 32. Steam cleaner 32
A heating device 33 such as a heater is placed therein, and the cleaning target is exposed to the steam 32a generated by heating the steam cleaning agent 32, whereby the cleaning cleaning and drying of the cleaning target are performed. Further, a cooling unit 34 is provided above the steam cleaning (drying) tank 31 to prevent vaporization of the steam 32a. The steam cleaning (drying) tank 31 may be configured such that the object to be cleaned is once immersed in the steam cleaning agent 32, and the object to be cleaned is exposed to the steam 32a in the pulling process.
【0045】ここで、一般に洗浄とは汚れ物質を洗浄対
象物の表面から除去することを意味するが、広い意味で
は除去後に部品を乾燥する工程までを含んでいる。すな
わち、いかに洗浄工程で汚れを取り除いたとしても、乾
燥に手間取ると乾燥工程での汚れの再付着やチリ、ゴミ
等の吸着を招き、最終的に仕上り性が損われることにな
る。このことは、洗浄剤で濡れている洗浄対象物をいか
に素早く乾燥しなければならないかを物語っている。こ
のために、この実施形態の洗浄装置は、乾燥に蒸気洗浄
(乾燥)工程Cを適用している。Here, in general, cleaning means removing the contaminants from the surface of the object to be cleaned, but in a broad sense, it includes the step of drying the parts after the removal. That is, no matter how much the dirt is removed in the washing step, if it takes time to dry it, redeposition of dirt in the drying step and adsorption of dust, dust and the like will be caused, and finally the finishability will be impaired. This shows how quickly the object to be cleaned, which is wet with the cleaning agent, must be dried. For this reason, the cleaning apparatus of this embodiment applies the steam cleaning (drying) step C to the drying.
【0046】上述した蒸気洗浄剤32としては、例えば
ペルフルオロカーボン系溶剤、ハイドロフルオロカーボ
ン系溶剤、ハイドロクロロフルオロカーボン系溶剤、ハ
イドロフルオロエーテル系溶剤、シリコーン系溶剤等の
単独溶剤あるいは混合物、もしくはそれに前述した各種
洗浄溶剤や添加剤等を加えたもの等が用いられる。この
ようなペルフルオロカーボン系溶剤等を主とする蒸気洗
浄剤32で蒸気洗浄または浸漬洗浄を行うことによっ
て、洗浄対象物は蒸発潜熱の小さいペルフルオロカーボ
ン系溶剤等で液置換され、装置から取り出した時点で乾
燥される。特にペルフルオロカーボン系溶剤からなる蒸
気洗浄剤32を用いる場合には、洗浄剤13およびすす
ぎ洗浄剤23として、特に前述したシリコーン系溶剤や
脂肪族炭化水素系溶剤を使用することが好ましい。その
理由は加熱状態でペルフルオロカーボン系溶剤との溶解
性が大きく、洗浄対象物表面に存在する洗浄剤の液置換
が容易にできるためである。通常、蒸気洗浄により洗浄
剤成分は液置換されるが、さらに効果的に液置換を行う
ためには加熱状態の蒸気洗浄剤32に浸漬した後に引き
上げることが好ましい。この加熱温度は、蒸気洗浄剤3
2の沸点より 40K程度低い温度から沸点までの温度とす
ることが好ましい。As the above-mentioned vapor cleaner 32, for example, a single solvent or a mixture of perfluorocarbon type solvent, hydrofluorocarbon type solvent, hydrochlorofluorocarbon type solvent, hydrofluoroether type solvent, silicone type solvent, etc., or various types thereof described above. A cleaning solvent, an additive, etc. are used. By performing steam cleaning or immersion cleaning with the steam cleaning agent 32 mainly containing such a perfluorocarbon-based solvent, the cleaning target is liquid-replaced with a perfluorocarbon-based solvent or the like having a small latent heat of vaporization, and when it is taken out from the apparatus. To be dried. In particular, when the vapor cleaning agent 32 made of a perfluorocarbon solvent is used, it is preferable to use the above-mentioned silicone solvent or aliphatic hydrocarbon solvent as the cleaning agent 13 and the rinse cleaning agent 23. The reason is that the solubility with the perfluorocarbon-based solvent is large in the heated state, and the liquid replacement of the cleaning agent existing on the surface of the cleaning object can be easily performed. Normally, the cleaning agent component is liquid-replaced by steam cleaning, but in order to perform liquid replacement more effectively, it is preferable to immerse the cleaning agent component in the heated steam cleaning agent 32 and then pull it up. This heating temperature is 3
It is preferable that the temperature is lower than the boiling point of 2 by about 40 K to the boiling point.
【0047】上述した蒸気洗浄(乾燥)工程Cには、蒸
気洗浄剤再生機構Fが付設されている。ここで、蒸気洗
浄槽31に混入した洗浄剤成分の濃度が大きくなると、
蒸気洗浄性(乾燥性)が低下するだけでなく、洗浄剤1
3、23の種類によっては火災の危険が生じる。そこ
で、洗浄剤13、23と蒸気洗浄剤32との混合液から
蒸気洗浄剤32を分離し、蒸気洗浄剤32だけを蒸気洗
浄槽31に戻す蒸気洗浄剤再生機構Fが設けられてい
る。液分離する手段としては、例えばそれらの比重差に
基く分離手段等が用いられ、さらに分離を容易にするた
めに冷却等を併用することも可能である。In the above-mentioned steam cleaning (drying) step C, a steam cleaning agent regeneration mechanism F is attached. Here, when the concentration of the cleaning agent component mixed in the steam cleaning tank 31 increases,
Not only is the steam cleaning property (drying property) reduced, but cleaning agent 1
There is a risk of fire depending on the type of 3 or 23. Therefore, a steam cleaning agent regeneration mechanism F is provided which separates the steam cleaning agent 32 from the mixed liquid of the cleaning agents 13 and 23 and the steam cleaning agent 32 and returns only the steam cleaning agent 32 to the steam cleaning tank 31. As the liquid separating means, for example, a separating means or the like based on the difference in specific gravities thereof is used, and it is also possible to use cooling or the like together to facilitate the separation.
【0048】なお、例えばペルフルオロカーボン系溶剤
には、室温で約 5重量% のシリコーン系溶剤や脂肪族炭
化水素系溶剤が溶解している。この濃度は蒸気洗浄性に
特に悪影響を及ぼすものではない。通常、約20重量% の
シリコーン系溶剤や脂肪族炭化水素系溶剤が蒸気洗浄槽
31に混入しても、蒸気洗浄性や洗浄仕上り性に悪影響
を及ぼすことはない。For example, in the perfluorocarbon type solvent, about 5% by weight of a silicone type solvent or an aliphatic hydrocarbon type solvent is dissolved at room temperature. This concentration has no particular adverse effect on the steam detergency. Usually, even if about 20% by weight of a silicone solvent or an aliphatic hydrocarbon solvent is mixed in the steam cleaning tank 31, it does not adversely affect the steam cleaning property and the cleaning finish property.
【0049】次に、上記洗浄装置の特徴部分である積層
状態の洗浄対象物のずらし機構について、図2〜図4を
参照して説明しながら各工程A、B、Cについて詳述す
る。なお、図2は洗浄カゴ1を洗浄槽11(12)内に
収容した状態を一部断面で示す図(aは正面図、bは側
面図)であり、図3は洗浄カゴ1を図示を省略した洗浄
槽内に収容した状態を示す斜視図、図4は洗浄対象物の
ずらし機構を説明するための図である。ここでは、洗浄
対象物のずらし機構について洗浄槽11、12内に洗浄
カゴ1を収容した場合で説明するが、すすぎ洗浄槽2
1、22内においても同様である。Next, the steps A, B, and C will be described in detail with reference to FIGS. 2 to 4 for explaining the mechanism for shifting the stacked objects to be cleaned, which is a characteristic part of the cleaning device. 2 is a partial cross-sectional view (a is a front view and b is a side view) showing a state in which the cleaning basket 1 is housed in the cleaning tank 11 (12), and FIG. FIG. 4 is a perspective view showing a state of being housed in the omitted cleaning tank, and FIG. 4 is a view for explaining the mechanism for shifting the cleaning object. Here, the mechanism for shifting the object to be cleaned will be described in the case where the cleaning basket 1 is housed in the cleaning tanks 11 and 12.
The same applies to the areas 1 and 22.
【0050】洗浄カゴ1は、図2および図3に示すよう
に、積層状態の洗浄対象物2の底部を部分的に支持する
複数の底板1aを有する枠体からなり、洗浄カゴ1の底
部には洗浄対象物2がずらし治具15と当たるように開
口部が設けられている。また洗浄カゴ1の側面部には、
洗浄対象物2の倒壊や落下等を防止する側面支持板1b
がそれぞれ設けられている。As shown in FIGS. 2 and 3, the cleaning basket 1 is composed of a frame body having a plurality of bottom plates 1a for partially supporting the bottom part of the objects to be cleaned 2 in the stacked state. Has an opening so that the object to be cleaned 2 contacts the shifting jig 15. Also, on the side surface of the cleaning basket 1,
Side support plate 1b that prevents the cleaning target 2 from collapsing or dropping
Are provided respectively.
【0051】洗浄対象物2はその積層面方向が上下方向
となるように、上述したような洗浄カゴ1内に収納され
る。この収納段階では、洗浄対象物2は複数の底板1a
に支持されており、積層状態のままである。ここで洗浄
対象物2は、リードフレームやフープ材のような整列可
能な板状部品、あるいは同様に整列可能な液晶セルのよ
うな部品等が、少なくとも一部が密着した状態で積層さ
れたものであり、その積層面が油膜や液晶等を介して密
着した状態で積層されているものに対して特に有効であ
る。なお、洗浄対象物2は、リードフレームや液晶セル
等に限定されるものではなく、同様に少なくとも一部が
密着した状態で積層されているものであれば種々の機械
部品や電子部品等を洗浄対象物とすることができる。The object 2 to be cleaned is housed in the cleaning basket 1 as described above such that the stacking surface direction is the vertical direction. At this stage of storage, the cleaning object 2 has a plurality of bottom plates 1a.
It is supported by and remains laminated. Here, the cleaning target 2 is formed by stacking alignable plate-like parts such as a lead frame and a hoop material, or similarly alignable parts such as a liquid crystal cell, in a state where at least a part thereof is in close contact with each other. It is particularly effective for those in which the laminated surfaces are laminated in close contact with each other via an oil film or liquid crystal. The cleaning object 2 is not limited to a lead frame, a liquid crystal cell, or the like, and similarly various kinds of mechanical parts, electronic parts, etc. can be cleaned as long as they are laminated in a state where at least a part of them are in close contact It can be an object.
【0052】一方、ずらし治具15は、上方に向けて形
成された凹凸部15aを有し、この凹凸部15aは基本
的に鋸刃形状、すなわち頂部角度(傾斜角度)θの山形
凸部が連続的に形成された形状を有するものである。た
だし、頂部に関しては部品の厚さに応じて一部平坦部を
有していてもよく、これによって特に洗浄効果は変わら
ない。このようなずらし治具15は、上部の凹凸部15
aにより洗浄対象物2を支持し得るように、洗浄槽1
1、12内にそれぞれ 2個ずつ平行に設置されており、
その設置方向は凹凸部15aの形成方向が洗浄対象物2
の積層方向と平行となるように設定されている。また、
ずらし治具15の設置位置は、搬送機構Dに付設された
揺動駆動機構により洗浄カゴ1を揺動させた際に、洗浄
カゴ1の下降途中で洗浄対象物2の底部が凹凸部15a
に当たる位置とされている。On the other hand, the shifting jig 15 has an uneven portion 15a formed upward, and the uneven portion 15a basically has a saw-tooth shape, that is, a mountain-shaped convex portion having a top angle (tilt angle) θ. It has a continuously formed shape. However, the top portion may have a flat portion depending on the thickness of the component, and this does not particularly affect the cleaning effect. Such a shifting jig 15 is provided with the uneven portion 15 on the upper side.
The cleaning tank 1 so that the cleaning target 2 can be supported by a.
Two are installed in parallel in each of 1 and 12,
As for the installation direction, the direction in which the uneven portion 15a is formed is the cleaning target 2
Is set so as to be parallel to the stacking direction of. Also,
When the cleaning basket 1 is swung by the swinging drive mechanism attached to the transport mechanism D, the bottom of the cleaning object 2 is uneven when the cleaning basket 1 descends.
It is supposed to hit.
【0053】上述した凹凸部15aの各山形凸部の形成
ピッチpは、積層状態の洗浄対象物2を構成する個々の
被洗浄部品(21 、22 、……2n )の厚さ(積層方向
の幅)より十分に広くなるよう設定されている。山形凸
部の形成ピッチpが各被洗浄部品の厚さに対して十分に
広く設定されていないと、被洗浄部品を十分にずらすこ
とができないおそれがある。このため、山形凸部の形成
ピッチpは各被洗浄部品の厚さの 2倍以上とすることが
好ましい。また、山形凸部の頂部角度θは、積層状態の
洗浄対象物2のずらし幅を決定するものであり、要求さ
れる洗浄品質や洗浄対象物2の状態(密着状態や密着部
の介在物等)に応じて適宜設定される。具体的な洗浄対
象物2のずらし幅は、被洗浄部品2のずらし方向の幅
(部品の縦方向の幅)に対して0.1%以上とすることが好
ましい。より好ましくは0.3%以上、さらに好ましくは0.
5%以上である。このずらし幅は、被洗浄部品2のずらし
方向の幅によって異なるため、上記0.1%以上のずらし幅
が得られるように、被洗浄部品2の厚さに応じて山形凸
部の頂部角度θ、さらには形成ピッチpを設定する。ず
らし幅が0.1%未満であると、洗浄剤13の浸透ならびに
排出を十分に促進することができないおそれがある。ず
らし幅は0.5%以上とすることがより好ましいが、あまり
ずらし幅を大きく設定しすぎると、被洗浄部品2によっ
ては変形等が生じるおそれがあるため、 10%以下とする
ことが実用的には好ましい。The formation pitch p of each chevron projection of the concavo-convex portion 15a is determined by the thickness of each of the parts to be cleaned (2 1 , 2 2 , ... 2 n ) constituting the object to be cleaned 2 in the stacked state ( It is set to be sufficiently wider than the width in the stacking direction). If the formation pitch p of the chevron convex portions is not set sufficiently wide with respect to the thickness of each of the parts to be cleaned, the parts to be cleaned may not be sufficiently displaced. For this reason, it is preferable that the formation pitch p of the chevron protrusions is twice or more the thickness of each part to be cleaned. In addition, the top angle θ of the chevron convex portion determines the shift width of the cleaning target object 2 in the stacked state, and the required cleaning quality and the condition of the cleaning target object 2 (contact state, inclusions in the contact portion, etc.). ) Is set appropriately. It is preferable that the specific shift width of the object to be cleaned 2 is 0.1% or more with respect to the width in the shift direction of the component to be cleaned 2 (width in the vertical direction of the component). More preferably 0.3% or more, more preferably 0.
5% or more. Since this shift width depends on the width of the component to be cleaned 2 in the displacement direction, the top angle θ of the chevron convex portion is further changed according to the thickness of the component 2 to be cleaned so that the above-described displacement width of 0.1% or more can be obtained. Sets the formation pitch p. If the shift width is less than 0.1%, the penetration and discharge of the cleaning agent 13 may not be sufficiently promoted. The shift width is more preferably 0.5% or more, but if the shift width is set too large, deformation may occur depending on the part 2 to be cleaned. Therefore, it is practically set to 10% or less. preferable.
【0054】洗浄対象物2が収納された洗浄カゴ1は、
上述したずらし治具15が設置された洗浄槽11、12
に充填された洗浄剤13中に浸漬され、この洗浄剤13
中で上下に揺動される。洗浄カゴ1を上下に揺動させ、
その下降途中で洗浄対象物2の底部がずらし治具15の
凹凸部15aに当たると、洗浄対象物2は凹凸部15a
の山形形状に合せてずらされる。積層状態の洗浄対象物
2がずらし治具15によりずらされる状態について、図
4を参照して説明する。The cleaning basket 1 containing the object to be cleaned 2 is
Cleaning tanks 11 and 12 in which the above-mentioned shifting jig 15 is installed
Is immersed in the cleaning agent 13 filled in the
It is rocked up and down. Swing the cleaning basket 1 up and down,
If the bottom portion of the cleaning object 2 hits the uneven portion 15a of the shifting jig 15 during the descending operation, the cleaning object 2 becomes uneven.
It is shifted according to the chevron shape. A state in which the cleaning target 2 in the stacked state is displaced by the displacement jig 15 will be described with reference to FIG.
【0055】すなわち、ずらし治具15の凹凸部15a
に当たる以前の洗浄対象物2は、図4(a)に示すよう
に、初期の積層状態を維持している。洗浄カゴ1の揺動
を開始して洗浄対象物2の底部が凹凸部15aに当たる
と、図4(b)に示すように、隣接する各被洗浄部品2
n 間がその積層面方向に沿って、ずらし治具15の凹凸
部15aの山形形状に応じた形状に強制的にずらされ
る。この積層状態がずらされた洗浄対象物2の各積層面
間には洗浄剤13が強制的に浸透するため、洗浄対象物
2の密着部への洗浄剤13の浸透が促進される。That is, the uneven portion 15a of the shifting jig 15
The object to be cleaned 2 before hitting is kept in the initial stacked state as shown in FIG. When the cleaning basket 1 starts to swing and the bottom portion of the cleaning object 2 hits the uneven portion 15a, as shown in FIG.
The space between n is forcibly displaced along the stacking surface direction to a shape corresponding to the mountain shape of the uneven portion 15a of the displacement jig 15. Since the cleaning agent 13 is forced to permeate between the respective laminated surfaces of the cleaning target object 2 with the stacked state shifted, the permeation of the cleaning agent 13 into the close contact portion of the cleaning target object 2 is promoted.
【0056】なお、ずらし治具15の設置位置は、図4
(b)に示した最大ずらし幅となる状態が、洗浄カゴ1
の上下揺動時の下端部に到達した際に実現するように設
定することが好ましく、このような状態が安定して得ら
れるように洗浄カゴ1のストッパを洗浄槽11、12に
設置してもよい。図4(b)に示した最大ずらし幅とな
った後にも洗浄カゴ1が下降すると、洗浄対象物Xの倒
壊や落下等を招くおそれがある。The installation position of the shifting jig 15 is shown in FIG.
The state where the maximum shift width shown in (b) is reached is the cleaning basket 1.
It is preferable to set so as to be realized when the lower end portion of the vertical swing of the cleaning basket is reached, and the stopper of the cleaning basket 1 is installed in the cleaning tanks 11 and 12 so that such a state can be stably obtained. Good. If the cleaning basket 1 descends even after reaching the maximum shift width shown in FIG. 4B, the cleaning target X may be collapsed or dropped.
【0057】洗浄カゴ1は連続的に上下に揺動されるた
め、洗浄カゴ1が上昇して洗浄対象物2が凹凸部15a
から離れ、洗浄カゴ1の底板1aにより再び支持される
と、洗浄対象物2は初期の積層状態に戻る。この際、浸
透した洗浄剤13は排出される。そして、洗浄時間内に
洗浄カゴ1の上下運動を何度も繰り返すことで、ずらし
治具15による洗浄対象物2のずれの発生と、一旦ずれ
た洗浄対象物2が元の状態(初期状態)に戻る現象とが
連続して起こるため、たえず新規な洗浄剤13を洗浄対
象物2の密着部に浸透させることができる。この際、洗
浄剤13として溶剤系洗浄剤を用いた場合には、密着部
に連続的に浸透した洗浄剤13に油分等が端部側から順
に溶解していくため、確実にかつ短時間で洗浄対象物2
の密着部に介在する油分等の濃度を減少させることがで
きる。Since the cleaning basket 1 is continuously swung up and down, the cleaning basket 1 is raised and the cleaning object 2 is covered with the uneven portion 15a.
When the cleaning target 2 is supported by the bottom plate 1a of the cleaning basket 1 again, the cleaning target 2 returns to the initial stacked state. At this time, the permeated cleaning agent 13 is discharged. Then, by repeating the vertical movement of the cleaning basket 1 many times within the cleaning time, the displacement of the cleaning target 2 caused by the shifting jig 15 and the once displaced cleaning target 2 are in the original state (initial state). Since the phenomenon of returning to step 1 occurs continuously, the new cleaning agent 13 can be constantly permeated into the contact portion of the cleaning object 2. At this time, when a solvent-based cleaning agent is used as the cleaning agent 13, the oil and the like are sequentially dissolved from the end side into the cleaning agent 13 that has continuously penetrated into the close contact portion, so that it can be performed reliably and in a short time. Cleaning object 2
It is possible to reduce the concentration of oil or the like that is present in the close contact part.
【0058】また、上述したように積層状態の洗浄対象
物2をずらし治具15と洗浄カゴ1の上下の揺動のみに
よって大きくずらすことができるため、機構的に負荷を
及ぼすようなこともなく、極めて簡易な装置構成で洗浄
対象物2のずれによる密着部の良好な洗浄効果が得られ
る。さらに、ずらし幅は基本的にはずらし治具15の凹
凸部15aの頂部角度θにより決定することができるた
め、ずらし治具15を取換えるだけで洗浄条件に応じた
ずらし幅を容易に得ることができる。Further, as described above, the objects to be cleaned 2 in the stacked state can be largely displaced only by vertically moving the jig 15 and the cleaning basket 1, so that no mechanical load is applied. With a very simple device configuration, it is possible to obtain a good cleaning effect on the contact portion due to the displacement of the cleaning object 2. Further, since the shift width can be basically determined by the apex angle θ of the uneven portion 15a of the shift jig 15, it is possible to easily obtain the shift width according to the cleaning condition only by replacing the shift jig 15. You can
【0059】上述したような揺動とそれに伴う洗浄対象
物2のずらし機構を適用した洗浄を行う際に、超音波発
生装置14から洗浄対象物2に対して超音波を照射する
ことによって、洗浄効果をさらに高めることができる。
またさらに、超音波照射を行う際に洗浄剤13の脱気を
実施することによって、前述したように超音波洗浄効果
をより一層高めることができる。When the above-described swinging and accompanying cleaning of the object to be cleaned 2 are applied to the object to be cleaned, ultrasonic waves are emitted from the ultrasonic generator 14 to the object to be cleaned 2 The effect can be further enhanced.
Furthermore, by performing degassing of the cleaning agent 13 when performing ultrasonic irradiation, the ultrasonic cleaning effect can be further enhanced as described above.
【0060】上述したような汚れ除去洗浄工程Aを経た
洗浄対象物2は、次いですすぎ洗浄工程Bに送られ、汚
れ除去洗浄工程Aと同様に、揺動洗浄とそれに伴う洗浄
対象物2のずらし効果、さらには超音波照射による洗浄
補助効果によって、積層面間を含めて洗浄対象物2に付
着する洗浄剤13成分および残留する汚れ成分が確実に
除去される。The object 2 to be cleaned which has been subjected to the dirt removing and cleaning step A as described above is then sent to the rinsing cleaning step B, and similarly to the dirt removing and cleaning step A, the swing cleaning and the accompanying displacement of the object to be cleaned 2 are carried out. Due to the effect and further the cleaning assisting effect by the ultrasonic irradiation, the cleaning agent 13 component and the remaining stain component attached to the cleaning target 2 including the space between the laminated surfaces are surely removed.
【0061】上述したすすぎ洗浄工程Bを経た後、洗浄
対象物2は蒸気洗浄(乾燥)工程Cに送られ、直接蒸気
洗浄剤32の蒸気32aに晒され、あるいは加熱された
蒸気洗浄剤32中に浸漬された後に蒸気32aに晒され
る。そして、所定時間後に蒸気洗浄槽31から引上げら
れた洗浄対象物2は、乾燥状態とされて洗浄工程が終了
する。洗浄対象物2は汚れ除去洗浄工程Aおよびすすぎ
洗浄工程Bにおいて、密着部を含めて十分に汚れ成分が
除去されているため、乾燥後の洗浄対象物2には良好な
洗浄仕上り性が付与されている。After passing through the above-described rinse cleaning step B, the cleaning object 2 is sent to the steam cleaning (drying) step C and directly exposed to the steam 32a of the steam cleaning agent 32, or in the heated steam cleaning agent 32. And then exposed to the steam 32a. Then, the cleaning target 2 pulled up from the steam cleaning tank 31 after a predetermined time is brought to a dry state, and the cleaning process is completed. In the dirt removal washing step A and the rinsing washing step B, the cleaning object 2 is sufficiently removed of the dirt components including the contact portion, so that the cleaning object 2 after drying is provided with good cleaning finish. ing.
【0062】なお、蒸気洗浄槽31内にもずらし治具1
5を設置することによって、蒸気洗浄(乾燥)工程Cに
おいて積層状態の洗浄対象物2をずらしつつ蒸気洗浄剤
32の蒸気32aに晒らすことも有効である。これによ
って、洗浄対象物2の積層面間への蒸気32aの侵入が
促進され、より一層洗浄仕上り性を高めることが可能と
なる。It should be noted that the shifting jig 1 is also placed in the steam cleaning tank 31.
It is also effective to dispose the cleaning object 2 in the stacked state in the steam cleaning (drying) step C by displacing the cleaning object 5 while exposing it to the steam 32a of the steam cleaning agent 32. As a result, the penetration of the vapor 32a between the stacked surfaces of the cleaning object 2 is promoted, and the cleaning finish can be further improved.
【0063】上述したように、この実施形態の洗浄装置
においては、汚れ除去洗浄工程Aやすすぎ洗浄工程Bで
ずらし治具15と洗浄カゴ1の揺動とによって、積層状
態の洗浄対象物2を十分大きくずらしつつ洗浄している
ため、密着部を含めて洗浄対象物2の汚れ成分を十分に
除去することができる。従って、乾燥後の洗浄対象物2
に良好な洗浄仕上り性を安定して付与することが可能と
なる。そして、このような良好な洗浄仕上り性は、前述
したように複雑な機構を用いることなく得ることができ
るため、装置構成の簡素化等を図ることが可能となる。
また、洗浄槽11、12やすすぎ洗浄槽21、22内に
ずらし治具15を設置することによって、ずらす必要の
ない洗浄対象物の場合には、ずらし治具15を取り外し
たり、あるいは洗浄カゴ1の下側を洗浄対象物がずらし
治具15に当たらないように保護することによって、通
常の洗浄工程を容易に実施することができる。As described above, in the cleaning apparatus of this embodiment, the cleaning object 2 in the laminated state is moved by the shifting jig 15 and the swinging of the cleaning basket 1 in the dirt removing cleaning step A and the rinsing cleaning step B. Since the cleaning is performed with a large shift, it is possible to sufficiently remove the dirt component of the cleaning target 2 including the contact portion. Therefore, the object to be cleaned 2 after drying
It is possible to stably provide excellent cleaning finish. Since such a good cleaning finish can be obtained without using a complicated mechanism as described above, it is possible to simplify the device configuration and the like.
Further, by installing the shifting jig 15 in the cleaning tanks 11 and 12 and the rinsing cleaning tanks 21 and 22, if the object to be cleaned does not need to be displaced, the shifting jig 15 can be removed or the cleaning basket 1 By protecting the lower side of the cleaning object so that it does not hit the shifting jig 15, a normal cleaning process can be easily performed.
【0064】なお、上記実施形態においては、洗浄カゴ
を揺動した際にずらし治具15と洗浄対象物2とが当た
るような構成としたが、揺動を行うことなく、洗浄カゴ
1を洗浄剤13、23中に浸漬した際にずらし治具15
と洗浄対象物2とが当たるような構成とすることもでき
る。この場合には、後述する実施形態と同様な効果が得
られる。In the above embodiment, the displacement jig 15 and the cleaning object 2 contact each other when the cleaning basket is swung, but the cleaning basket 1 is cleaned without swinging. Displacement jig 15 when immersed in agents 13 and 23
It is also possible to adopt a configuration in which the cleaning target 2 hits. In this case, the same effect as that of the embodiment described later can be obtained.
【0065】次に、他の本発明の実施形態について、図
5〜図7を参照して説明する。Next, another embodiment of the present invention will be described with reference to FIGS.
【0066】図5はこの実施形態の洗浄装置の概略構成
を示す図である。図5に示す洗浄装置は、概略構成的に
は洗浄槽11、12およびすすぎ洗浄槽21、22内に
ずらし治具が設置されていない以外は図1に示すした洗
浄装置と同一構成とされている。また、洗浄剤13、す
すぎ洗浄剤23および蒸気洗浄剤32、さらには洗浄対
象物についても、前述した実施形態と同様である。FIG. 5 is a view showing the schematic arrangement of the cleaning apparatus of this embodiment. The cleaning apparatus shown in FIG. 5 has the same configuration as that of the cleaning apparatus shown in FIG. 1 except that the displacement jigs are not installed in the cleaning tanks 11 and 12 and the rinse cleaning tanks 21 and 22. There is. Further, the cleaning agent 13, the rinse cleaning agent 23, the steam cleaning agent 32, and the object to be cleaned are the same as those in the above-described embodiment.
【0067】図6および図7に示すように、この実施形
態の洗浄装置は洗浄カゴ1にずらし治具15が設置され
ていることを特徴とするものである。すなわち、この実
施形態による洗浄カゴ1は、図6に示すように、積層状
態の洗浄対象物2を支持し得るように、少なくとも 2個
のずらし治具15が底部に平行に設置された枠体からな
り、また側面部には洗浄対象物2の倒壊や落下等を防止
する側面支持板1bがそれぞれ設けられている。上記ず
らし治具15の凹凸部15aは、前述した実施形態と同
様な形状を有するものである。なお、洗浄カゴ1に設置
するずらし治具は、図6に示したような分割型のものに
限らず、洗浄対象物2の長手方向に一体となったずらし
治具を用いることもできる。As shown in FIGS. 6 and 7, the cleaning apparatus of this embodiment is characterized in that the cleaning basket 1 is provided with a shifting jig 15. That is, as shown in FIG. 6, the cleaning basket 1 according to this embodiment is a frame body in which at least two shifting jigs 15 are installed parallel to the bottom so as to support the stacked cleaning objects 2. Further, the side surface support plates 1b for preventing the cleaning target 2 from collapsing or dropping are provided on the side surfaces. The uneven portion 15a of the shifting jig 15 has the same shape as that of the above-described embodiment. The displacement jig installed in the cleaning basket 1 is not limited to the split type as shown in FIG. 6, and a displacement jig integrated in the longitudinal direction of the cleaning object 2 may be used.
【0068】洗浄対象物2はその積層面方向が上下方向
となると共に、積層方向がずらし治具15の凹凸部15
aの形成方向と平行となるように、上記ずらし治具15
が設置された洗浄カゴ1に収納され、この状態で汚れ除
去洗浄工程A、すすぎ洗浄工程Bおよび蒸気洗浄(乾
燥)工程Cに順に送られる。そして、各工程A、B、C
において、以下のように積層状態の洗浄対象物2のずれ
が発生する。The object to be cleaned 2 has a stacking surface direction which is the vertical direction and a stacking direction which is the uneven portion 15 of the jig 15.
The shifting jig 15 is arranged so as to be parallel to the forming direction of a.
Is stored in the cleaning basket 1 in which is installed, and in this state, the dirt removal cleaning step A, the rinse cleaning step B, and the steam cleaning (drying) step C are sequentially sent. And each process A, B, C
In, the displacement of the cleaning object 2 in the stacked state occurs as follows.
【0069】すなわち、洗浄の初期段階では洗浄対象物
2は互いにずれることはなく積層状態(ブロック状態)
を維持しているが、洗浄時間の経過に伴って次第に密着
部に洗浄剤13が浸透し、自然に洗浄対象物2は互いに
滑り現象を発現する。ずらし治具15の凹凸部15a
は、各山形凸部の形成ピッチpが被洗浄部品の厚さに対
して十分幅広く設定されているため、図7に示すよう
に、隣り合う被洗浄部品は凹凸部15aの形状に合せて
少しずつずれることになり、洗浄対象物2の密着部への
洗浄剤13の浸透がさらに促進される。その結果、洗浄
剤13として溶剤系洗浄剤を用いた場合には、密着部に
浸透した洗浄剤13に油分等が端部側から順に溶解して
いくため、確実に洗浄対象物2の密着部に介在する油分
等の濃度を減少させることができる。また、この際に洗
浄カゴ1の揺動を併用することによって、洗浄対象物2
のずれが促進される。That is, in the initial stage of cleaning, the objects to be cleaned 2 are not displaced from each other and are in a laminated state (block state).
However, as the cleaning time elapses, the cleaning agent 13 gradually permeates into the contact portion, and the cleaning objects 2 naturally exhibit the sliding phenomenon. Uneven portion 15a of the shifting jig 15
7, the formation pitch p of each chevron-shaped convex portion is set to be sufficiently wide with respect to the thickness of the component to be cleaned. Therefore, as shown in FIG. Since the cleaning agent 13 is displaced from each other, the penetration of the cleaning agent 13 into the contact portion of the cleaning object 2 is further promoted. As a result, when a solvent-based cleaning agent is used as the cleaning agent 13, the oil and the like are dissolved in the cleaning agent 13 that has permeated into the contacting area in order from the end side, so that the contacting area of the cleaning object 2 can be reliably performed. It is possible to reduce the concentration of oil and the like present in the. Further, at this time, the swinging of the cleaning basket 1 is also used, so that the cleaning target 2
Displacement is promoted.
【0070】上述したようにして洗浄対象物2はずらさ
れた状態で、汚れ除去洗浄工程Aからすすぎ洗浄工程B
および蒸気洗浄(乾燥)工程Cへと順に送られ、密着部
を含めて洗浄対象物2に付着する汚れ成分が確実に除去
されると共に、乾燥後には良好な洗浄仕上り性が付与さ
れる。なお、汚れ除去洗浄工程Aおよびすすぎ洗浄工程
Bにおける超音波照射および洗浄剤の脱気の効果につい
ては、前述した実施形態と同様である。As described above, in the state where the cleaning object 2 is displaced, the dirt removing cleaning step A to the rinsing cleaning step B are performed.
Then, the steam cleaning (drying) step C is sequentially carried out to reliably remove the dirt components adhering to the cleaning target 2 including the contact portion, and also give good cleaning finish after drying. The effects of ultrasonic irradiation and deaeration of the cleaning agent in the stain removal cleaning step A and the rinse cleaning step B are the same as in the above-described embodiment.
【0071】このように、この実施形態の洗浄装置にお
いては、各工程A、B、Cでずらし治具15により積層
状態の洗浄対象物2を十分大きくずらしつつ洗浄してい
るため、密着部を含めて洗浄対象物2の汚れ成分を十分
に除去することができる。従って、乾燥後の洗浄対象物
2に良好な洗浄仕上り性を安定して付与することが可能
となる。また、積層状態の洗浄対象物2を洗浄カゴ1に
設置したずらし治具15のみで大きくずらすことができ
るため、機構的に負荷を及ぼすようなこともなく、極め
て簡易な装置構成で洗浄対象物2のずれによる密着部の
良好な洗浄効果が得られる。さらに、ずらし幅は基本的
にはずらし治具15の凹凸部15aの頂部角度θにより
決定することができるため、ずらし治具15を取換える
だけで洗浄条件に応じたずらし幅を容易に得ることがで
きる。As described above, in the cleaning apparatus of this embodiment, the objects to be cleaned 2 in the stacked state are cleaned while being displaced by the displacement jig 15 in each of the steps A, B, and C, so that the close contact portion is cleaned. It is possible to sufficiently remove the dirt component of the cleaning target 2. Therefore, it is possible to stably impart good cleaning finish to the cleaning target 2 after drying. In addition, since the object to be cleaned 2 in the stacked state can be largely displaced only by the displacement jig 15 installed in the cleaning basket 1, there is no mechanical load, and the object to be cleaned has an extremely simple device configuration. A good cleaning effect for the contact portion due to the deviation of 2 can be obtained. Further, since the shift width can be basically determined by the apex angle θ of the uneven portion 15a of the shift jig 15, it is possible to easily obtain the shift width according to the cleaning condition only by replacing the shift jig 15. You can
【0072】[0072]
【実施例】次に、本発明の具体的な実施例について説明
する。EXAMPLES Next, specific examples of the present invention will be described.
【0073】まず、図1〜図4に示した実施形態の洗浄
装置を用いた洗浄の具体例およびその評価結果について
述べる。First, a specific example of cleaning using the cleaning apparatus of the embodiment shown in FIGS. 1 to 4 and the evaluation results thereof will be described.
【0074】実施例1
まず、洗浄対象物として 200枚のCu製リードフレーム
(長さ:144mm,幅:50mm,板厚:0.25mm)が互いにプレス油
G-6050(日本工作油(株)製)で密着して積層された積
層物を用意し、これを図1に示した洗浄装置(洗浄槽 2
槽+すすぎ洗浄槽2槽+蒸気洗浄 1槽)を使用すると共
に表1に示す各洗浄剤を用いて、以下に示す条件でそれ
ぞれ洗浄した。なお、蒸気洗浄剤にはペルフルオロカー
ボン系蒸気洗浄剤FRV-100(商品名、(株)東芝製)を使
用した。タクトタイムは 5分(洗浄4分)とし、各洗浄
槽およびすぎ洗浄槽では洗浄カゴを揺動すると共に、28
kHz/600Wの超音波(W密度= 1.08W/cm2 )を照射した。
また、各洗浄槽およびすぎ洗浄槽には、頂部角度θが90
度、形成ピッチpが10mmの凹凸部を有するずらし治具
(SUS304製、板厚3mm)を設置した。なお、このずらし治
具による上記リードフレームの積層物のずらし幅は最小
で0.5%となる。Example 1 First, 200 Cu lead frames (length: 144 mm, width: 50 mm, plate thickness: 0.25 mm) as the objects to be cleaned were pressed with each other.
Prepare a laminate in which G-6050 (manufactured by Nippon Machine Oil Co., Ltd.) is intimately laminated, and this is the cleaning device (cleaning tank 2 shown in FIG.
(Tank + Rinsing washing tank + Steam washing 1 tank), and each of the cleaning agents shown in Table 1 was used for cleaning under the following conditions. As the steam cleaner, a perfluorocarbon-based steam cleaner FRV-100 (trade name, manufactured by Toshiba Corporation) was used. The takt time is set to 5 minutes (4 minutes for cleaning), and the cleaning basket is swung in each cleaning tank and rinsing cleaning tank.
Ultrasonic waves (W density = 1.08 W / cm 2 ) of kHz / 600 W were irradiated.
Also, the top angle θ is 90
Then, a shifting jig (made of SUS304, plate thickness 3 mm) having a concavo-convex portion having a formation pitch p of 10 mm was installed. The minimum shift width of the lead frame laminate by this shift jig is 0.5%.
【0075】[0075]
【表1】
上述したような条件下で、それぞれリードフレームの積
層物を洗浄ならびに乾燥した後に、リードフレームが 1
枚ずつに剥離した割合(洗浄効率)を調べると共に、無
作為に20枚のリードフレームを取出してその表面に残留
する油分量を測定して、洗浄状態および洗浄仕上り性を
評価した。それらの結果を表2に示す。なお、表中の比
較例はずらし治具を用いない以外は実施例と同様に洗浄
を行い、その結果を同様に評価したものである。また、
残留油分量の測定は堀場製作所製油分濃度計OCMA-200を
用いて行い、抽出液にはフロンS-316 を使用した。[Table 1] After cleaning and drying each leadframe stack under the conditions described above,
In addition to examining the rate of separation (cleaning efficiency) for each sheet, 20 lead frames were randomly taken out and the amount of oil remaining on the surface thereof was measured to evaluate the cleaning state and cleaning finish. The results are shown in Table 2. Note that cleaning was performed in the same manner as in Example except that the comparative example shifting jig in the table was not used, and the results were evaluated in the same manner. Also,
The residual oil content was measured using an oil concentration meter OCMA-200 manufactured by HORIBA, Ltd., and Freon S-316 was used as the extraction liquid.
【0076】[0076]
【表2】
表2から明らかなように、ずらし治具を使用することに
よって、各種の洗浄剤を用いた際に、積層状態の洗浄対
象物の洗浄状態および洗浄仕上り性が大幅に向上するこ
とが分かる。[Table 2] As is clear from Table 2, it can be seen that the use of the shifting jig significantly improves the cleaning state and the cleaning finish of the cleaning object in the laminated state when various cleaning agents are used.
【0077】実施例2
実施例1における洗浄剤bを使用した洗浄例において、
頂部角度θが60度(ずらし幅=0.9%)、頂部角度θが90度
(ずらし幅=0.5%)、頂部角度θが 120度(ずらし幅=0.3
%)、頂部角度θが 150度(ずらし幅=0.13%) 、頂部角度
θが 170度(ずらし幅=0.07%) の各ずらし治具(SUS 304
製、板厚=3mm)をそれぞれ用いる以外は同様に洗浄を行
った後、実施例1と同様にして洗浄状態および洗浄仕上
り性を評価した。また、上記ずらし治具を用いた洗浄の
際に、洗浄剤の脱気を行うことによって、脱気の有無に
よる洗浄状態および洗浄仕上り性を評価した。その結果
を表3に示す。Example 2 In a cleaning example using the cleaning agent b in Example 1,
Top angle θ is 60 degrees (shift width = 0.9%), top angle θ is 90 degrees (shift width = 0.5%), top angle θ is 120 degrees (shift width = 0.3
%), The top angle θ is 150 degrees (shift width = 0.13%), and the top angle θ is 170 degrees (shift width = 0.07%).
After cleaning was performed in the same manner except that the manufacturing method and the plate thickness = 3 mm) were used, the cleaning state and the cleaning finish were evaluated in the same manner as in Example 1. In addition, during the cleaning using the above-mentioned shift jig, the cleaning agent was deaerated to evaluate the cleaning state and the cleaning finish depending on the presence or absence of deaeration. The results are shown in Table 3.
【0078】[0078]
【表3】
表3から明らかなように、ずらし幅は0.1%以上とするこ
とがより効果的であることが分かる。[Table 3] As is clear from Table 3, it is more effective to set the shift width to 0.1% or more.
【0079】実施例3
実施例1における洗浄剤bを使用した洗浄例において、
W密度が0.76W/cm2 (28kHz/600W)の超音波とW密度が
1.08W/cm2 (40kHz/1200W)の超音波をそれぞれ使用する
以外は同様に洗浄を行った後、実施例1と同様にして洗
浄状態および洗浄仕上り性を評価した。また、上記各超
音波を使用した洗浄の際に、洗浄剤の脱気を行うことに
よって、脱気の有無による洗浄状態および洗浄仕上り性
を評価した。その結果を表4に示す。Example 3 In a cleaning example using the cleaning agent b in Example 1,
Ultrasonic waves with W density of 0.76 W / cm 2 (28 kHz / 600 W) and W density
After washing was performed in the same manner except that ultrasonic waves of 1.08 W / cm 2 (40 kHz / 1200 W) were used, the washing state and the washing finish were evaluated in the same manner as in Example 1. Further, during cleaning using the above ultrasonic waves, the cleaning agent was deaerated to evaluate the cleaning state and the cleaning finish depending on the presence or absence of deaeration. The results are shown in Table 4.
【0080】[0080]
【表4】
表4から明らかなように、洗浄剤を脱気することによっ
て、超音波洗浄効果が向上することが分かる。なお、他
の洗浄剤でも同様な傾向を示した。[Table 4] As is clear from Table 4, the ultrasonic cleaning effect is improved by degassing the cleaning agent. In addition, other detergents showed the same tendency.
【0081】次に、図5〜図7に示した洗浄装置を用い
た洗浄の具体例およびその評価結果について述べる。Next, a specific example of cleaning using the cleaning apparatus shown in FIGS. 5 to 7 and its evaluation result will be described.
【0082】実施例4
洗浄対象物として20個の液晶セル(充填液晶:CM-130(商
品名、メルクジャパン(株)製)が互いに密着して積層
された積層物を用意し、これを図5に示した洗浄装置
(洗浄槽 2槽+すすぎ洗浄槽 2槽+蒸気洗浄 1槽)およ
び図6に示した洗浄カゴを使用すると共に、表1に示し
た洗浄剤を用いて、以下に示す条件で洗浄した。なお、
蒸気洗浄剤にはペルフルオロカーボン系蒸気洗浄剤 FRV
-100(商品名、(株)東芝製)を使用した。タクトタイ
ムは 5分(洗浄 4分)とし、各洗浄槽およびすぎ洗浄槽
では洗浄カゴを揺動すると共に、28kHz/600Wの超音波を
照射した。また、洗浄カゴには、頂部角度θが90度、形
成ピッチpが30mmの凹凸部を有するずらし治具(SUS304
製、板厚3mm)を設置した。なお、このずらし治具による
上記液晶セルの積層物のずらし幅は最小で2.5%となる。Example 4 As a cleaning object, a liquid crystal cell was prepared in which 20 liquid crystal cells (filled liquid crystal: CM-130 (trade name, manufactured by Merck Japan Co., Ltd.) were laminated in close contact with each other. Using the cleaning device shown in FIG. 5 (2 cleaning tanks + 2 rinse cleaning tanks + 1 steam cleaning tank) and the cleaning basket shown in FIG. 6, and using the cleaning agents shown in Table 1, It was washed under the conditions.
Perfluorocarbon steam cleaner FRV for steam cleaner
-100 (trade name, manufactured by Toshiba Corporation) was used. The takt time was 5 minutes (4 minutes for cleaning), and the cleaning basket was rocked in each cleaning tank and the rinse tank, and ultrasonic waves of 28 kHz / 600 W were irradiated. In addition, the cleaning basket has a rugged jig (SUS304) with a top angle θ of 90 degrees and a pitch p of 30 mm.
Made, plate thickness 3 mm) was installed. The shift width of the liquid crystal cell stack by the shift jig is 2.5% at the minimum.
【0083】上述したような条件下で、それぞれ液晶セ
ルの積層物を洗浄ならびに乾燥した後に、液晶セルのガ
ラス表面の液晶残渣およびしみの有無を目視(偏光板使
用)により検査することによって、洗浄状態および洗浄
仕上り性を評価した。それらの結果を表5に示す。な
お、表中の比較例はずらし治具を用いない以外は実施例
と同様に洗浄を行い、その結果を同様に評価したもので
ある。Under the conditions as described above, after washing and drying the liquid crystal cell laminate, the liquid crystal cell glass surface is visually inspected (with a polarizing plate) for the presence or absence of liquid crystal residues and stains to clean the liquid crystal cell glass surface. The state and the cleaning finish were evaluated. The results are shown in Table 5. Note that cleaning was performed in the same manner as in Example except that the comparative example shifting jig in the table was not used, and the results were evaluated in the same manner.
【0084】[0084]
【表5】
表5から明らかなように、ずらし治具を使用することに
よって、各種の洗浄剤を用いた際に、積層状態の洗浄対
象物の洗浄状態および洗浄仕上り性が大幅に向上するこ
とが分かる。[Table 5] As is clear from Table 5, it can be seen that the use of the shifting jig significantly improves the cleaning condition and the cleaning finish of the cleaning object in the laminated state when various cleaning agents are used.
【0085】実施例5
実施例4の洗浄例において、頂部角度θが60度(ずらし
幅=4.3%)、頂部角度θが 120度(ずらし幅=1.4%)、頂部
角度θが 150度(ずらし幅=0.6%)の各ずらし治具(SUS3
04製、板厚=3mm、形成ピッチp=50mm)をそれぞれ用いる
以外は、同様に洗浄を行った後、実施例4と同様にして
洗浄状態および洗浄仕上り性を評価した。その結果を6
に示す。Example 5 In the cleaning example of Example 4, the top angle θ was 60 degrees (shift width = 4.3%), the top angle θ was 120 degrees (shift width = 1.4%), and the top angle θ was 150 degrees (shift). Width = 0.6%) each jig (SUS3
After the cleaning was performed in the same manner as in Example 4, except that each of 04-made, plate thickness = 3 mm, and formation pitch p = 50 mm) was used, the cleaning state and the cleaning finish were evaluated in the same manner as in Example 4. The result is 6
Shown in.
【0086】[0086]
【表6】
なお、上記各実施例では汚れ除去洗浄工程、すすぎ洗浄
工程および蒸気洗浄工程が順に設置された洗浄装置に本
発明を適用した例について説明したが、本発明はこれに
限定されるものではなく、例えば 1槽式の洗浄装置や単
工程の洗浄装置等に対しても適用可能であり、同様な効
果を得ることができる。[Table 6] Incidentally, in each of the above-mentioned embodiments, an example in which the present invention is applied to a cleaning device in which a stain removal cleaning step, a rinse cleaning step and a steam cleaning step are sequentially installed has been described, but the present invention is not limited to this. For example, it can be applied to a one-tank type cleaning device or a single-step cleaning device, and the same effect can be obtained.
【0087】また、特開平6-142629号公報には、部品
(小物部品)を洗浄あるいは蒸気洗浄する際に洗浄剤と
の接触面積を増大させて洗浄時間の短縮を図るために、
部品を保持する面に凹凸が形成された洗浄治具が記載さ
れているが、上記凹凸は本発明のように板状等の洗浄対
象物を支持するものではなく、単に部品の載置面を凹凸
面としているだけであって、本発明とは明らかに区別さ
れるものである。Further, in Japanese Patent Laid-Open No. 61-242629, in order to shorten the cleaning time by increasing the contact area with a cleaning agent when cleaning or steam cleaning a component (small component),
Although a cleaning jig in which irregularities are formed on the surface for holding a component is described, the irregularity does not support a plate-like object to be cleaned as in the present invention, and the mounting surface of the component is simply It is merely an uneven surface and is clearly distinguished from the present invention.
【0088】[0088]
【発明の効果】以上説明したように、本発明によれば凹
凸部を有するずらし治具によって、油膜等を介して少な
くとも一部が密着した積層状態の洗浄対象物を十分大き
くずらしつつ洗浄することが可能であるため、極めて簡
易な装置構成で、密着部を含めて積層状態の洗浄対象物
の汚れ成分を十分に除去することができる。従って、積
層状態の洗浄対象物に良好な洗浄仕上り性を安定して付
与することができる。As described above, according to the present invention, the object to be cleaned in a laminated state in which at least a part thereof is in close contact with the oil film or the like is displaced by the displacement jig having the uneven portion while being cleaned sufficiently. Therefore, it is possible to sufficiently remove the dirt components of the objects to be cleaned in the stacked state including the contact portion with an extremely simple device configuration. Therefore, a good cleaning finish can be stably imparted to the stacked objects to be cleaned.
【図1】 本発明の一実施形態による洗浄装置の概略構
成を示す図である。FIG. 1 is a diagram showing a schematic configuration of a cleaning apparatus according to an embodiment of the present invention.
【図2】 図1に示す洗浄装置の洗浄槽内に洗浄対象物
を収納した洗浄カゴが収容された状態を一部断面で示す
図である。FIG. 2 is a partial cross-sectional view showing a state where a cleaning basket containing an object to be cleaned is housed in a cleaning tank of the cleaning apparatus shown in FIG.
【図3】 図1に示す洗浄装置の洗浄槽内に洗浄対象物
を収納した洗浄カゴが収容された状態を示す要部斜視図
である。3 is a perspective view of essential parts showing a state in which a cleaning basket accommodating an object to be cleaned is housed in a cleaning tank of the cleaning apparatus shown in FIG.
【図4】 図1に示す洗浄装置における洗浄対象物のず
らし治具によるずらし状態を示す図である。FIG. 4 is a diagram showing a state in which an object to be cleaned in the cleaning apparatus shown in FIG. 1 is displaced by a displacement jig.
【図5】 他の本発明の実施形態による洗浄装置の概略
構成を示す図である。FIG. 5 is a diagram showing a schematic configuration of a cleaning apparatus according to another embodiment of the present invention.
【図6】 図5に示す洗浄装置で用いる洗浄カゴの一構
造例を示す斜視図である。6 is a perspective view showing a structural example of a cleaning basket used in the cleaning apparatus shown in FIG.
【図7】 図5に示す洗浄装置の洗浄槽内に洗浄対象物
を収納した洗浄カゴが収容された状態および洗浄対象物
のずらし治具によるずらし状態を一部断面で示す図であ
る。7 is a partial cross-sectional view showing a state in which a cleaning basket containing an object to be cleaned is accommodated in a cleaning tank of the cleaning apparatus shown in FIG. 5 and a state in which the object to be cleaned is displaced by a displacement jig.
【符号の説明】 A……除去洗浄工程 B……すすぎ洗浄工程 C……蒸気洗浄工程 D……搬送機構 E……洗浄剤再生機構 F……蒸気洗浄剤再生機構 1……洗浄カゴ 2……積層状態の洗浄対象物 11、12……洗浄槽 13……洗浄剤 14……超音波発生装置 15……ずらし治具 15a…凹凸部 17……脱気装置 21、22……すすぎ洗浄槽 23……すすぎ洗浄剤 31……蒸気洗浄槽 32……蒸気洗浄剤[Explanation of symbols] A: Removal and cleaning process B: Rinse washing process C: Steam cleaning process D: Transport mechanism E: Cleaning agent regeneration mechanism F: Steam cleaner regeneration mechanism 1 ... Cleaning basket 2 ... Laminated objects to be cleaned 11, 12 ... Cleaning tank 13 ... cleaning agent 14 ... Ultrasonic generator 15 …… Sliding jig 15a ... uneven portion 17 ... Degassing device 21, 22 ... Rinse washing tank 23 ... Rinse detergent 31 ... Steam cleaning tank 32 ... Steam cleaner
───────────────────────────────────────────────────── フロントページの続き (58)調査した分野(Int.Cl.7,DB名) B08B 3/04 B08B 3/10 B08B 11/02 ─────────────────────────────────────────────────── ─── Continuation of the front page (58) Fields surveyed (Int.Cl. 7 , DB name) B08B 3/04 B08B 3/10 B08B 11/02
Claims (6)
れた洗浄対象物を洗浄するにあたり、 上方に向けて形成された凹凸部を有する治具に、前記積
層状態の洗浄対象物をその積層面の方向に沿って当てる
ことによって、前記凹凸部の形状に合せて前記洗浄対象
物の積層状態を初期状態から前記積層面方向に沿ってず
らしつつ、前記洗浄対象物を洗浄することを特徴とする
洗浄方法。1. When cleaning an object to be cleaned laminated in a state where at least a part thereof is in close contact, a jig having an uneven portion formed upward is used to clean the object to be cleaned in the laminated state. By applying along the direction of, the cleaning object is cleaned while shifting the stacked state of the cleaning object from the initial state along the stacking surface direction in accordance with the shape of the uneven portion. Cleaning method.
と共に、前記積層状態の洗浄対象物を前記積層面方向が
上下方向となるように洗浄カゴに収納し、前記洗浄カゴ
の下降途中で前記治具の凹凸部に前記積層状態の洗浄対
象物の底部が当たり、前記積層状態の洗浄対象物が前記
凹凸部の形状に合せてずれるように、前記洗浄カゴを前
記洗浄槽内で上下に揺動させることを特徴とする洗浄方
法。2. The cleaning method according to claim 1, wherein the jig having the uneven portion is installed near the bottom of the cleaning tank, and the objects to be cleaned in the stacked state are arranged such that the stacking surface direction is the vertical direction. Stored in a cleaning basket, the bottom of the stacked cleaning object hits the uneven portion of the jig while the cleaning basket is descending, and the stacked cleaning object shifts according to the shape of the uneven portion. As described above, the cleaning method is characterized by rocking the cleaning basket up and down in the cleaning tank.
に、前記積層状態の洗浄対象物を前記積層面方向を上下
方向として前記治具の凹凸部に支持されるように収納す
ることによって、前記積層状態の洗浄対象物を前記凹凸
部の形状に合せてずらすことを特徴とする洗浄方法。3. The cleaning method according to claim 1, wherein a cleaning basket having a jig having the concave-convex portion on a bottom thereof is mounted on the cleaning basket, and the cleaning object in the stacked state is arranged with the stacking surface direction being the vertical direction. The cleaning method is characterized in that the object to be cleaned in the stacked state is shifted according to the shape of the concavo-convex portion by being housed so as to be supported by the concavo-convex portion.
れた洗浄対象物が収納される洗浄カゴと、 上方に向けて形成された凹凸部を有する治具が底部付近
に設置され、前記洗浄カゴに収納された洗浄対象物が浸
漬または晒される洗浄剤および/またはその蒸気が収容
された洗浄槽と、 前記洗浄カゴの下降途中で、前記治具の凹凸部に前記積
層状態の洗浄対象物の底部がその積層面の方向に沿って
当たるように、前記洗浄カゴを前記洗浄槽内で上下に揺
動させる洗浄カゴ揺動機構とを具備することを特徴とす
る洗浄装置。4. A cleaning basket for accommodating objects to be cleaned stacked at least partially in close contact with each other and a jig having an uneven portion formed upward are installed near the bottom, and the cleaning basket is provided. A cleaning tank in which the cleaning object stored in is immersed or exposed, and / or a vapor thereof, and a cleaning object in the stacked state on the uneven portion of the jig while the cleaning basket is descending. A cleaning device including a cleaning basket swinging mechanism for vertically swinging the cleaning basket in the cleaning tank so that the bottom portion of the cleaning basket hits the stacking surface.
治具が底部に設置され、少なくとも一部が密着した状態
で積層された洗浄対象物がその積層面の方向に沿って前
記凹凸部に支持されるように収納される洗浄カゴと、 前記洗浄カゴに収納された前記洗浄対象物が浸漬または
晒される洗浄剤および/またはその蒸気が収容された洗
浄槽とを具備することを特徴とする洗浄装置。5. A jig having an uneven portion formed upward is installed at the bottom, and at least a portion of the objects to be cleaned stacked in a state of being in close contact with each other has the uneven surface along the direction of the stacked surface. A cleaning basket that is stored so as to be supported by the cleaning basket; and a cleaning tank that stores the cleaning agent and / or the vapor in which the cleaning target stored in the cleaning basket is immersed or exposed. Cleaning equipment.
において、 さらに、前記洗浄剤が収容された洗浄槽の底部に設置さ
れた超音波発振手段と、前記洗浄剤中の溶存ガスを取り
除く脱気手段とを具備することを特徴とする洗浄装置。6. The cleaning apparatus according to claim 4 or 5, further comprising ultrasonic wave oscillating means installed at the bottom of the cleaning tank accommodating the cleaning agent and dissolved gas in the cleaning agent. A cleaning device comprising: a deaeration means.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24728695A JP3450101B2 (en) | 1995-09-26 | 1995-09-26 | Cleaning method and cleaning device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24728695A JP3450101B2 (en) | 1995-09-26 | 1995-09-26 | Cleaning method and cleaning device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0985196A JPH0985196A (en) | 1997-03-31 |
| JP3450101B2 true JP3450101B2 (en) | 2003-09-22 |
Family
ID=17161192
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP24728695A Expired - Fee Related JP3450101B2 (en) | 1995-09-26 | 1995-09-26 | Cleaning method and cleaning device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3450101B2 (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111318506B (en) * | 2018-12-14 | 2024-07-30 | 上海佐仞精密刀具有限公司 | Cutter cleaning device |
| CN116387238B (en) * | 2023-06-05 | 2023-08-11 | 盛奕半导体科技(无锡)有限公司 | A kind of ozone cleaning equipment and its application in semiconductor wet cleaning process |
| CN116422639B (en) * | 2023-06-14 | 2023-08-08 | 诸城泰盛化工股份有限公司 | Chemical raw material rinsing device |
-
1995
- 1995-09-26 JP JP24728695A patent/JP3450101B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0985196A (en) | 1997-03-31 |
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