JP3483868B2 - Screen gauze for printing - Google Patents
Screen gauze for printingInfo
- Publication number
- JP3483868B2 JP3483868B2 JP2001208782A JP2001208782A JP3483868B2 JP 3483868 B2 JP3483868 B2 JP 3483868B2 JP 2001208782 A JP2001208782 A JP 2001208782A JP 2001208782 A JP2001208782 A JP 2001208782A JP 3483868 B2 JP3483868 B2 JP 3483868B2
- Authority
- JP
- Japan
- Prior art keywords
- printing
- warp
- screen
- weft
- antireflection film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000004744 fabric Substances 0.000 claims description 28
- 239000000835 fiber Substances 0.000 claims description 13
- 238000005240 physical vapour deposition Methods 0.000 claims description 10
- 229920002994 synthetic fiber Polymers 0.000 claims description 9
- 239000012209 synthetic fiber Substances 0.000 claims description 9
- 238000002834 transmittance Methods 0.000 claims description 6
- 150000004767 nitrides Chemical class 0.000 claims description 5
- 229910044991 metal oxide Inorganic materials 0.000 claims description 2
- 150000004706 metal oxides Chemical class 0.000 claims description 2
- 239000010410 layer Substances 0.000 description 19
- 239000007789 gas Substances 0.000 description 17
- 238000001816 cooling Methods 0.000 description 16
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 12
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 10
- 229910001882 dioxygen Inorganic materials 0.000 description 10
- 239000010936 titanium Substances 0.000 description 10
- 229910052719 titanium Inorganic materials 0.000 description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 9
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 8
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 8
- 238000004544 sputter deposition Methods 0.000 description 8
- 239000010935 stainless steel Substances 0.000 description 7
- 229910001220 stainless steel Inorganic materials 0.000 description 7
- 238000007740 vapor deposition Methods 0.000 description 7
- 238000004804 winding Methods 0.000 description 7
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 6
- 229910052786 argon Inorganic materials 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 6
- 238000000576 coating method Methods 0.000 description 6
- 239000013067 intermediate product Substances 0.000 description 6
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 6
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 239000011347 resin Substances 0.000 description 5
- 229920005989 resin Polymers 0.000 description 5
- 239000011701 zinc Substances 0.000 description 5
- 229910052725 zinc Inorganic materials 0.000 description 5
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 4
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 4
- 239000000839 emulsion Substances 0.000 description 4
- 229910052759 nickel Inorganic materials 0.000 description 4
- 229920000728 polyester Polymers 0.000 description 4
- 239000000047 product Substances 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 3
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 3
- 238000007600 charging Methods 0.000 description 3
- 238000013461 design Methods 0.000 description 3
- 238000011161 development Methods 0.000 description 3
- 229910001873 dinitrogen Inorganic materials 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- -1 polyparaphenylene benzobisoxazole Polymers 0.000 description 3
- 229910052718 tin Inorganic materials 0.000 description 3
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 229910052738 indium Inorganic materials 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 229920001230 polyarylate Polymers 0.000 description 2
- 238000002310 reflectometry Methods 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 238000009941 weaving Methods 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910000846 In alloy Inorganic materials 0.000 description 1
- 229920000265 Polyparaphenylene Polymers 0.000 description 1
- 229910001128 Sn alloy Inorganic materials 0.000 description 1
- 229910006854 SnOx Inorganic materials 0.000 description 1
- 229910003087 TiOx Inorganic materials 0.000 description 1
- 239000004699 Ultra-high molecular weight polyethylene Substances 0.000 description 1
- 229920000508 Vectran Polymers 0.000 description 1
- 239000004979 Vectran Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 239000006117 anti-reflective coating Substances 0.000 description 1
- 229920006231 aramid fiber Polymers 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- SDIXRDNYIMOKSG-UHFFFAOYSA-L disodium methyl arsenate Chemical compound [Na+].[Na+].C[As]([O-])([O-])=O SDIXRDNYIMOKSG-UHFFFAOYSA-L 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000007786 electrostatic charging Methods 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 150000001247 metal acetylides Chemical class 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 238000001579 optical reflectometry Methods 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- HLLICFJUWSZHRJ-UHFFFAOYSA-N tioxidazole Chemical compound CCCOC1=CC=C2N=C(NC(=O)OC)SC2=C1 HLLICFJUWSZHRJ-UHFFFAOYSA-N 0.000 description 1
- 150000003608 titanium Chemical class 0.000 description 1
- 229920000785 ultra high molecular weight polyethylene Polymers 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Landscapes
- Printing Plates And Materials Therefor (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Chemical Or Physical Treatment Of Fibers (AREA)
- Woven Fabrics (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Screen Printers (AREA)
Description
【0001】[0001]
【産業上の利用分野】この発明は、写真製版が可能な合
成繊維製の印刷用スクリーン紗に関し、特にプリント配
線等の精密印刷を可能にするものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a printing screen cloth made of synthetic fiber capable of being photoengraved, and more particularly to enabling precise printing of printed wiring and the like.
【0002】[0002]
【従来の技術】印刷用スクリーン紗として、ステンレス
鋼からなる直径10〜50μmの細い線材を経糸および
緯糸に用いて100〜800メッシュの原反織物を製織
し、その表裏両面にステンレス鋼をスパッタ蒸着して上
記の経糸および緯糸をステンレス鋼からなるアモルファ
ス構造の厚み10〜1000nmの蒸着膜で被覆したも
のが知られている(特開平8−118835号公報参
照)。この印刷用スクリーン紗は、上記の蒸着膜を有し
ないものに比べ、印刷インキやトナー、捺染糊に対する
濡れ性が優れており、精密印刷が可能である。2. Description of the Related Art As a screen cloth for printing, a fine wire material made of stainless steel and having a diameter of 10 to 50 μm is used as a warp and a weft to weave a 100 to 800 mesh raw fabric, and stainless steel is sputter-deposited on both sides of the fabric. It is known that the above warp and weft are coated with a vapor deposition film of stainless steel having an amorphous structure and a thickness of 10 to 1000 nm (see Japanese Patent Laid-Open No. 8-118835). This printing screen gauze is superior in wettability to printing ink, toner, and printing paste, as compared with the above-mentioned screen screen having no vapor deposition film, and enables precision printing.
【0003】しかしながら、上記の印刷用スクリーン紗
は、経糸および緯糸の表面がステンレス鋼で形成されて
いて光反射性を有するため、写真製版に際し、紫外線硬
化性樹脂からなる水溶性乳剤を塗布、乾燥して感光層を
形成し、得られたスクリーンの片面に原板マスクを介し
て紫外線を照射し露光したとき、感光層に入った紫外線
の一部が経糸または緯糸の表面で反射し、この反射光が
本来露光の不要な部分の感光層を感光させて硬化し、そ
のため硬化部分の面積が設計よりも広くなり、印刷で得
られる線の幅が設計よりも細くなるという問題があっ
た。However, since the surface of the warp and the weft of the above printing screen gauze is made of stainless steel and has light reflectivity, a water-soluble emulsion composed of an ultraviolet curable resin is applied and dried at the time of photolithography. Then, a photosensitive layer is formed, and when one side of the resulting screen is exposed to ultraviolet light through a mask for the original plate, part of the ultraviolet light that has entered the photosensitive layer is reflected on the surface of the warp or weft, and this reflected light However, there is a problem in that the area of the cured portion becomes larger than designed, and the width of the line obtained by printing becomes narrower than designed, because the photosensitive layer of the portion which is not originally exposed is exposed and cured.
【0004】一方、合成繊維製の印刷用スクリーン紗と
して、ポリエステルからなるモノフィラメント糸を経糸
および緯糸に用いて100〜300メッシュの紗状に製
織したものが知られている。図1は、従来のポリエステ
ルからなる印刷用スクリーン紗10に感光層11を形成
した状態の断面図を示し、スクリーン紗10は、ポリエ
ステルの経糸10aと緯糸(図示されていない)とで製
織され、感光層11は前記の紫外線硬化性樹脂からなる
水溶性乳剤を塗布、乾燥して形成されている。On the other hand, as a screen cloth for printing made of synthetic fiber, there is known a cloth made by weaving a monofilament thread made of polyester for warp and weft into a mesh of 100 to 300 mesh. FIG. 1 is a cross-sectional view showing a state in which a photosensitive layer 11 is formed on a conventional printing screen mesh 10 made of polyester. The screen mesh 10 is woven with polyester warps 10a and wefts (not shown), The photosensitive layer 11 is formed by coating and drying a water-soluble emulsion made of the above ultraviolet curable resin.
【0005】12は原板マスクであり、透明部12aと
シャドー部12bとからなり、この原板マスク12を感
光層11の表面に重ね、紫外線Lを照射すると、その一
部はシャドー部12bによって感光層11への入射を遮
られるが、残りは透明部12aを経て感光層11へ入射
し、感光、硬化させる。そして、感光層11に入射した
紫外線Lは、経糸10aまたは緯糸に当たって反射する
ものと、当たっても経糸、緯糸を貫通するもの、および
当たらずに感光層11を貫通するものとに分かれ、当た
って反射したものの一部Laは、シャドー部12bの下
の感光層11に入射し、この部分を感光、硬化させる。Reference numeral 12 denotes an original mask, which comprises a transparent portion 12a and a shadow portion 12b. When this original mask 12 is superposed on the surface of the photosensitive layer 11 and ultraviolet rays L are irradiated, a part of the original mask 12 is exposed by the shadow portion 12b. Although it is blocked from entering the photosensitive layer 11, the rest enters the photosensitive layer 11 through the transparent portion 12a and is exposed and cured. Then, the ultraviolet rays L that have entered the photosensitive layer 11 are divided into those that are reflected by hitting the warp threads 10a or wefts, those that penetrate the warp threads and the weft threads even if they hit, and those that penetrate the photosensitive layer 11 without hitting them. A portion La of the reflected light is incident on the photosensitive layer 11 below the shadow portion 12b, and this portion is exposed and cured.
【0006】上記の露光が終わると、原板マスク12を
外したスクリーン紗10が現像に付され、感光層11の
感光部分を残して非感光部分が除去され、印刷インキや
塗料の通過可能な孔が形成され、印刷版(スクリーン
型)13(図2参照)が得られる。したがって、上記シ
ャドー部12bの下方部分に入射する紫外線Laが存在
しない場合は、図2(a)に示すように、印刷版13に
は、シャドー部12bと等しい形の孔13aが形成され
るが、実際には上記シャドー部12bの下方に入射する
紫外線Laが存在するため、図2(b)に示すように、
印刷版13に形成される孔13aは、上部がシャドー部
12bとほぼ等しく、下部が狭い台形断面となる。After the above exposure, the screen cloth 10 from which the original mask 12 has been removed is subjected to development, and the non-exposed areas of the photosensitive layer 11 are removed except the exposed areas, and holes through which printing ink or paint can pass. Are formed, and a printing plate (screen type) 13 (see FIG. 2) is obtained. Therefore, when there is no ultraviolet ray La incident on the lower portion of the shadow portion 12b, a hole 13a having the same shape as the shadow portion 12b is formed in the printing plate 13 as shown in FIG. 2 (a). Actually, since the ultraviolet ray La that is incident below the shadow portion 12b exists, as shown in FIG.
The hole 13a formed in the printing plate 13 has a trapezoidal cross section in which the upper portion is substantially equal to the shadow portion 12b and the lower portion is narrow.
【0007】このポリエステル製印刷用スクリーン紗1
0は、ステンレス鋼製印刷用スクリーン紗に比べ、透明
性に優れ、経糸10aや緯糸の表面での反射光が少ない
ため、原板マスク12の型模様が比較的正確に再現さ
れ、かつ伸縮弾性に富むため、印刷時のスケージで生じ
た伸びが戻り易い半面、トナーや印刷インキ、捺染糊お
よびペースト(UVペースト、ガラスペースト、銀ペー
スト、金ペースト等)等の濡れ性が悪いため、特に高速
印刷の際に気泡を巻き込み易くて精密印刷が困難であっ
た。また、導電性が低いため、帯電による静電気障害が
生じていた。This polyester screen mesh 1 for printing
0 is more transparent than the stainless steel printing screen gauze, and the reflected light on the surface of the warp 10a and the weft is less, so the pattern of the original mask 12 is reproduced relatively accurately, and it has elastic elasticity. Since it is rich, the expansion that occurs due to the cage during printing tends to return, but the wettability of toner, printing ink, printing paste and paste (UV paste, glass paste, silver paste, gold paste, etc.) is poor, especially high-speed printing. At that time, it was difficult to carry out precision printing because air bubbles were easily entrained. Further, since the conductivity is low, electrostatic damage due to charging has occurred.
【0008】そこで、上記のスクリーン紗10に表裏両
側から物理蒸着を施し、経糸および緯糸をステンレス鋼
からなる導電性蒸着膜で全面被覆することが試みられた
が、この場合は、経糸や緯糸の透明性が低下し、その表
面で反射する紫外線Laが増大し、そのため硬化部分の
面積が設計よりも広くなり、図2(b)のように、印刷
版13に形成される孔13aが設計よりも小さくなり、
精密印刷が不可能になるという問題があった。Therefore, it has been attempted to perform physical vapor deposition on both sides of the screen mesh 10 so as to cover the entire warp and weft with a conductive vapor deposition film made of stainless steel. The transparency decreases, and the amount of ultraviolet rays La reflected on the surface increases, so that the area of the cured portion becomes larger than the design, and as shown in FIG. 2B, the holes 13a formed in the printing plate 13 are larger than the design. Becomes smaller,
There was a problem that precision printing became impossible.
【0009】[0009]
【発明が解決しようとする課題】この発明は、合成繊維
のモノフィラメント糸を経糸、緯糸とする印刷用スクリ
ーン紗において、写真製版の際にシャドー層の下の感光
層に紫外線が入射するのを防いで感光層に原板マスクと
等しい形の孔を形成し、しかも印刷インキ等に対する経
糸および緯糸の濡れ性を良好にし、かつ帯電による静電
気障害を防止し、もってプリント回路等で要求される精
密印刷を可能にするものである。DISCLOSURE OF THE INVENTION The present invention prevents the incidence of ultraviolet rays on the photosensitive layer below the shadow layer during photoengraving in a screen mesh for printing, which uses monofilament yarn of synthetic fiber as warp and weft. To form holes of the same shape as the original mask on the photosensitive layer, and to improve the wettability of the warp and weft to the printing ink, and to prevent electrostatic damage due to electrification. It makes it possible.
【0010】[0010]
【課題を解決するための手段】この発明に係る印刷用ス
クリーン紗は、合成繊維の細いモノフィラメント糸を経
糸および緯糸に用いて製織された紗状の原反織物の経糸
および緯糸が金属の酸化物、窒化物もしくは炭化物から
なる導電性の紫外線反射防止膜で全面にわたって被覆さ
れており、この紫外線反射防止膜が厚み3〜250nm
の物理蒸着膜で、その波長350〜450nmの紫外線
に対する反射率が15%以下、透過率が45%以上であ
ることを特徴とする。A printing screen gauze according to the present invention is a mesh-like raw fabric woven by using thin monofilament yarns of synthetic fibers as warp and weft, and the warp and weft are metal oxides. Is entirely covered with a conductive ultraviolet antireflection film made of a nitride or a carbide, and the ultraviolet antireflection film has a thickness of 3 to 250 nm.
The physical vapor deposition film of, the ultraviolet ray of which wavelength is 350-450 nm
The reflectance is 15% or less and the transmittance is 45% or more .
【0011】上記の印刷用スクリーン紗は、写真製版の
際、常法にしたがって紫外線硬化性樹脂からなる感光層
と一体化した後、その表面に原板マスクを重ねて紫外線
を照射し、次いで現像、水洗により非露光部分を洗い流
して印刷版(スクリーン型)とされるが、経糸および緯
糸を構成する合成繊維の細いモノフィラメント糸が紫外
線の反射防止膜で被覆されているので、紫外線照射の
際、反射防止膜からの反射光が大幅に減少する。The above-mentioned printing screen gauze is integrated with a photosensitive layer made of an ultraviolet curable resin by a conventional method at the time of photoengraving, and then an original mask is overlaid on the surface of the photosensitive layer to irradiate it with ultraviolet rays, followed by development, The unexposed areas are washed away with water to form a printing plate (screen type), but the thin monofilament yarns of the synthetic fibers that make up the warp and weft are covered with an anti-reflective coating for ultraviolet light, so they are reflected when exposed to ultraviolet light. The light reflected from the prevention film is greatly reduced.
【0012】したがって、原板マスクのシャドー部下方
の感光剤に紫外線が入射して該部が硬化することはな
く、そのため現像、水洗によってシャドー部とほぼ等し
い形状の孔が正確に形成され、原板マスクと型模様が等
しい印刷版(スクリーン型)が得られる。Therefore, the ultraviolet rays do not enter the photosensitive agent below the shadow portion of the original mask and the area is not cured. Therefore, by developing and rinsing, holes having substantially the same shape as the shadow portion are accurately formed, and the original mask is removed. A printing plate (screen type) having the same pattern is obtained.
【0013】しかも、上記の反射防止膜は、印刷イン
キ、トナー、捺染糊およびペースト等に対する濡れ性に
優れるので、印刷時に印刷インキ等が経糸や緯糸の表面
から裏面に向かって円滑に流れ、いわゆる裏回りが良好
になり、高速印刷を行っても気泡の混入がなく、そのた
め一層精密な印刷が可能になる。また、上記の反射防止
膜は、導電性を備えているので、帯電による静電気障害
も発生しない。Moreover, since the above antireflection film has excellent wettability with respect to printing ink, toner, printing paste, paste and the like, the printing ink or the like smoothly flows from the front surface to the back surface of the warp or weft during printing, The backing is good, and bubbles are not mixed in even when high-speed printing is performed, so that more precise printing is possible. Further, since the antireflection film has conductivity, it does not cause electrostatic trouble due to charging.
【0014】この発明の反射防止膜は、Ti 、Zn 、N
i 、Cr 、Sn 、In 等の金属の酸化物、窒化物または
炭化物で形成されるが、特にIn Sn Ox 、Ti Ox 、
Ti N、Ti C、Zn Sn Ox 等からなる物理蒸着膜が
好ましい。そして、これらの物理蒸着膜は、酸化のレベ
ルを低く抑え、かつ物理蒸着の際に処理時間を調整して
蒸着膜の厚さを適当な大きさに設定することにより、経
糸や緯糸における反射光を入射光と相殺することができ
る。The antireflection film of the present invention comprises Ti, Zn, N
It is formed of oxides, nitrides or carbides of metals such as i, Cr, Sn and In, but in particular In SnOx, TiOx,
A physical vapor deposition film made of TiN, TiC, ZnSnOx or the like is preferable. These physical vapor deposition films suppress the level of oxidation to a low level, and by adjusting the processing time during physical vapor deposition to set the thickness of the vapor deposition film to an appropriate size, the reflected light from the warp and weft yarns can be adjusted. Can be canceled with the incident light.
【0015】上記の反射防止膜を備えた印刷用スクリー
ン紗の反射率は、特に波長350〜450nmの紫外線
に対して15%以下が好ましく、15%を超えた場合
は、設計通りの製版が困難になる。そして、紫外線とし
て上記波長のものを選択することにより、紫外線硬化性
樹脂の選択や取扱が容易になる。上記の反射率を得るた
めには、前記の物理蒸着を行う際の蒸着時間等を制御す
ることにより、上記反射防止膜の厚みを3〜250nm
に設定することが好ましい。また、透過率は、上記の紫
外線に対して45%以上が好ましい。なお、上記の反射
防止膜は、単層でもよいが、屈折率を異にする2種以上
の反射防止膜からなる多層構造として反射率を一層小さ
くすることもできる。The reflectance of the printing screen gauze provided with the above-mentioned antireflection film is preferably 15% or less with respect to ultraviolet rays having a wavelength of 350 to 450 nm, and if it exceeds 15%, plate making as designed is difficult. become. By selecting the ultraviolet ray having the above wavelength, it becomes easy to select and handle the ultraviolet curable resin. In order to obtain the above reflectance, the thickness of the antireflection film is adjusted to 3 to 250 nm by controlling the vapor deposition time when performing the physical vapor deposition.
It is preferable to set to. Further, the transmittance is preferably 45% or more with respect to the above ultraviolet rays. The above antireflection film may be a single layer, but it is also possible to further reduce the reflectance as a multilayer structure composed of two or more kinds of antireflection films having different refractive indexes.
【0016】上記の反射防止膜は、導電性を備えたもの
であるが、その導電性の程度は、表面抵抗率で103 〜
1011Ω/cm2 が好ましく、103 Ω/cm2 未満ではコ
ストアップとなり、反対に1011Ω/cm2 を超えると、
印刷時に帯電し、印刷模様の縁にひげが発生する等の静
電気障害が起き易くなる。The above antireflection film has conductivity, and the degree of conductivity is from 10 3 to 10 3 in terms of surface resistivity.
10 11 Ω / cm 2 is preferable, and if it is less than 10 3 Ω / cm 2 , the cost increases, while if it exceeds 10 11 Ω / cm 2 ,
Electrostatic charges such as whiskers on the edges of the printed pattern are likely to occur during charging.
【0017】この発明において、反射防止膜が蒸着され
る前のスクリーン紗、すなわち紗状の原反織物の経糸お
よび緯糸を構成する合成繊維は、強度が20g/d以
上、弾性率が500g/d以上の高強力のスーパー繊維
が好ましく、アラミド繊維、ポリアリレート繊維、超高
分子量ポリエチレン繊維およびポリパラフェニレンベン
ゾビスオキサゾール(PBO)繊維やポリパラフェニレ
ンベンゾビスチアゾール(PBT)繊維、ポリパラフェ
ニレンベンゾビスイミダゾール(PBI)繊維等のポリ
ベンザゾール繊維が例示される。そして、これらの繊維
からなるモノフィラメント糸の好ましい径は15〜30
μmであり、15μm未満では切断し易くなり、反対に
30μmを超えると、細い線の印刷が困難になる。In the present invention, the screen gauze before the antireflection film is vapor-deposited, that is, the synthetic fibers constituting the warp and weft of the gauze-like raw fabric, has a strength of 20 g / d or more and an elastic modulus of 500 g / d. The above high-strength superfibers are preferable, and aramid fiber, polyarylate fiber, ultrahigh molecular weight polyethylene fiber, polyparaphenylene benzobisoxazole (PBO) fiber, polyparaphenylene benzobisthiazole (PBT) fiber, and polyparaphenylene benzobis. Examples are polybenzazole fibers such as imidazole (PBI) fibers. And, the preferable diameter of the monofilament yarn composed of these fibers is 15 to 30.
If it is less than 15 μm, it becomes easy to cut, and if it exceeds 30 μm, it becomes difficult to print fine lines.
【0018】上記原反織物の密度は、経緯共100〜8
00メッシュ、特に250〜700メッシュが好まし
い。この密度が100メッシュ未満では細い線からなる
精密な図柄の印刷、捺染が不可能になり、反対に800
メッシュを超えた場合は、製造が困難になる。なお、上
記原反織物の織り組織は、平組織等の目ずれの生じ難
い、縦横均一な開口面を有する組織が好ましい。The density of the above-mentioned raw fabric is 100 to 8 in the history.
00 mesh, especially 250 to 700 mesh is preferred. If this density is less than 100 mesh, it is impossible to print and print precise patterns consisting of fine lines, and on the contrary, 800
If it exceeds the mesh, manufacturing becomes difficult. In addition, the weave structure of the above-mentioned raw fabric is preferably a structure such as a flat structure, which is less likely to cause misalignment and has an opening surface that is uniform in length and width.
【0019】[0019]
【発明の実施の形態】実施形態1
図3は、この発明に係るスクリーン紗15の断面を示
し、スーパー繊維と呼ばれる高強力合成繊維の線径が1
5〜30μmのモノフィラメント糸を経糸16および緯
糸17に用い、平織組織で250〜700メッシュの原
反織物を製織した後、その表裏両面からスパッタリング
することにより、上記の経糸16および緯糸17をそれ
ぞれ導電性と濡れ性を有する反射防止膜16aおよび1
7aで全面にわたって被覆して作られる。BEST MODE FOR CARRYING OUT THE INVENTION Embodiment 1 FIG. 3 shows a cross section of a screen mesh 15 according to the present invention, in which a high-strength synthetic fiber called super fiber has a wire diameter of 1
A monofilament yarn of 5 to 30 μm is used as the warp yarn 16 and the weft yarn 17, and after weaving a raw fabric having a plain weave structure of 250 to 700 mesh, the warp yarn 16 and the weft yarn 17 are electrically conductive by sputtering from both front and back surfaces thereof. Antireflection films 16a and 1 having wettability and wettability
It is made by covering the entire surface with 7a.
【0020】上記のスクリーン紗に紫外線硬化性樹脂か
らなる水溶性乳剤を塗布、乾燥して感光層を形成し、そ
の表面に原板マスクを重ねて紫外線を照射し、次いで現
像、水洗すると、原板マスクと同じ型模様を備えた印刷
版(スクリーン型)が得られる。そして、この印刷版
は、濡れ性および導電性を兼備しているため、印刷時の
裏回りも良好で、かつ静電気の帯電による障害もなく、
極めて精密な印刷が可能である。A water-soluble emulsion made of an ultraviolet-curable resin is applied to the above screen gauze and dried to form a photosensitive layer, and a master mask is placed on the surface of the screen to irradiate it with ultraviolet rays, followed by development and washing with water. A printing plate (screen type) having the same pattern as in (1) is obtained. And since this printing plate has both wettability and conductivity, the backing during printing is also good, and there is no obstacle due to electrostatic charging,
Extremely precise printing is possible.
【0021】図4は、物理蒸着装置としてのスパッタリ
ング装置の一例を示し、密閉可能なチャンバ20の下部
にチタンからなる平板状のターゲット21が表面を上に
して中空のターゲットソース22上に固定され、このタ
ーゲットソース22に通される冷水で上記ターゲット2
1が下面から冷却される。このターゲット21の上方左
右にアノード23が水平に設置され、このアノード23
およびターゲット21間に直流電源Eによって500〜
1000Vの直流電圧が印加される。FIG. 4 shows an example of a sputtering apparatus as a physical vapor deposition apparatus, in which a flat plate-like target 21 made of titanium is fixed to a lower part of a chamber 20 which can be sealed and a surface of the target 21 is fixed on a hollow target source 22. , The target 2 with cold water that is passed through the target source 22
1 is cooled from the lower surface. Anodes 23 are horizontally installed above and below the target 21.
Between the target 21 and the target 21 by the DC power supply E
A DC voltage of 1000 V is applied.
【0022】上記アノード23の上方に水冷シリンダ2
4が水平に、かつ回転自在に設置され、その左上方に前
記スーパー繊維のモノフィラメント糸からなる原反織物
Fの送出し軸25が、また右上方にスクリーン紗の中間
製品Faの巻取り軸26がそれぞれ水平に、かつ回転自
在に設置される。そして、送出し軸25に巻かれた原反
織物Fが引出され、左上部のガイドローラ27aを経て
上記水冷シリンダ24に巻回され、右上部のガイドロー
ラ27bを経て巻取り軸26に巻き取られる。また、チ
ャンバ20に真空ポンプ28、アルゴンガス供給用ガス
ボンベ29aおよび酸素ガス供給用ガスボンベ29bが
それぞれ接続される。A water cooling cylinder 2 is provided above the anode 23.
4 is horizontally and rotatably installed, and a feed shaft 25 for the raw fabric F made of the monofilament yarn of the super fiber is provided on the upper left side thereof, and a take-up shaft 26 for the intermediate product Fa of the screen gauze is provided on the upper right side. Are installed horizontally and rotatably. Then, the original fabric F wound on the delivery shaft 25 is drawn out, wound on the water cooling cylinder 24 via the upper left guide roller 27a, and wound on the winding shaft 26 via the upper right guide roller 27b. To be A vacuum pump 28, an argon gas supply gas cylinder 29a, and an oxygen gas supply gas cylinder 29b are connected to the chamber 20, respectively.
【0023】上記の装置において、送出し軸25、巻取
り軸26および水冷シリンダ24を回転し、原反織物F
を反時計方向に所定の速度で送りながら水冷シリンダ2
4を冷却し、上記原反織物Fの表面温度を60℃以下に
維持する。一方、真空ポンプ28を駆動してチャンバ2
0内圧力を1.3×10-3Pa程度に減圧し、次いでアル
ゴンガス供給用ガスボンベ29aからアルゴンガスを導
入してチャンバ20内圧力を6.6×10-2Pa程度に調
整し、続いて酸素ガス供給用ガスボンベ29bから酸素
ガスを導入してチャンバ20内圧力を1.3×10-1Pa
程度に調整し、しかるのち上記のアノード23およびタ
ーゲット21間に500〜1000Vの直流電圧を印加
してターゲット21からチタンを飛び出させ、このチタ
ンを酸素ガスと反応させて酸化率の低い酸化チタンと
し、この酸化チタンを上記原反織物Fの経糸および緯糸
上に付着させ、経糸および緯糸の半周以上を酸化チタン
の蒸着膜で被覆する。このとき、原反織物Fの送り速度
を調整して蒸着膜の厚さを3〜250nmに制御して反
射防止膜とし、片面に反射防止膜を有する中間製品Fa
を得る。In the above apparatus, the feed shaft 25, the take-up shaft 26 and the water-cooling cylinder 24 are rotated to produce the original fabric F.
Water-cooling cylinder 2 while feeding counterclockwise at a predetermined speed
4 is cooled, and the surface temperature of the said original fabric W is maintained below 60 degreeC. Meanwhile, the vacuum pump 28 is driven to drive the chamber 2
0 internal pressure is reduced to about 1.3 × 10 −3 Pa, and then argon gas is introduced from the argon gas supply gas cylinder 29a to adjust the internal pressure of the chamber 20 to about 6.6 × 10 −2 Pa. Oxygen gas is introduced from the oxygen gas supply gas cylinder 29b to adjust the pressure inside the chamber 20 to 1.3 × 10 -1 Pa.
After adjusting to a certain degree, a DC voltage of 500 to 1000 V is applied between the anode 23 and the target 21 to eject titanium from the target 21, and this titanium is reacted with oxygen gas to obtain titanium oxide having a low oxidation rate. This titanium oxide is adhered onto the warp and weft of the above-mentioned raw fabric F, and a half or more circumference of the warp and weft is coated with a titanium oxide vapor deposition film. At this time, the feed rate of the raw fabric W is adjusted to control the thickness of the vapor deposition film to 3 to 250 nm to form an antireflection film, and the intermediate product Fa has an antireflection film on one surface.
To get
【0024】次いで、上記の中間製品Faを取り外し、
これを裏返して前記の送出し軸25に取付けて2度目の
スパッタリングを裏側から行うことにより、経糸および
緯糸の残りの半周部分に反射防止膜を形成し、製品のス
クリーン紗を得る。Then, the above intermediate product Fa is removed,
This is turned over and attached to the above-mentioned delivery shaft 25, and the second sputtering is performed from the back side, whereby an antireflection film is formed on the remaining half circumferences of the warp and the weft, and a screen gauze of the product is obtained.
【0025】なお、ターゲット21のチタンに代えて亜
鉛、ニッケル、クローム、錫、インジウム等の単体金
属、またはインジウムと錫等の合金を使用した場合は、
上記単体金属または合金の酸化物からなる反射防止膜が
得られる。When a single metal such as zinc, nickel, chrome, tin or indium or an alloy of indium and tin is used instead of titanium of the target 21,
An antireflection film made of the oxide of the elemental metal or alloy is obtained.
【0026】実施形態2
上記の実施形態1において、酸素ガスに代えて窒素ガス
を用い、その他は実施形態1と同様にしてチタン、亜
鉛、ニッケル、クローム等の金属を窒素ガスと反応さ
せ、これによって窒化物からなる反射防止膜を形成す
る。Embodiment 2 In Embodiment 1 described above, nitrogen gas is used in place of oxygen gas, and the same as in Embodiment 1 except that metals such as titanium, zinc, nickel and chrome are reacted with nitrogen gas. Thereby forming an antireflection film made of nitride.
【0027】実施形態3
上記の実施形態1において、酸素ガスに代えてメタンガ
スを用い、その他は実施形態1と同様にしてチタン、亜
鉛、ニッケル、クローム等の金属を、メタンガスから分
離した炭素ガスと反応させ、これによって炭化物からな
る反射防止膜を形成する。Embodiment 3 In Embodiment 1 described above, methane gas is used instead of oxygen gas, and in the same manner as in Embodiment 1 except for the above, metals such as titanium, zinc, nickel and chrome are used as carbon gas separated from methane gas. The reaction is carried out, whereby an antireflection film made of carbide is formed.
【0028】実施形態4
図5に示すように、チャンバ内に2組のスパッタリング
装置を設置すると、表裏のスパッタリングを連続して行
うことができる。図5において、30は密閉チャンバで
あり、その中央部左右に第1水冷シリンダー31および
第2水冷シリンダー32が並設され、左側の第1水冷シ
リンダー31が反時計方向に、また右側の第2水冷シリ
ンダー32が時計方向にそれぞれ駆動により回転する。Embodiment 4 As shown in FIG. 5, when two sets of sputtering devices are installed in the chamber, front and back sputtering can be continuously performed. In FIG. 5, reference numeral 30 denotes a closed chamber, a first water-cooling cylinder 31 and a second water-cooling cylinder 32 are juxtaposed on the left and right of the central part thereof, the first water-cooling cylinder 31 on the left side is counterclockwise, and the second water-cooling cylinder 31 on the right side is second. The water-cooled cylinders 32 are driven to rotate in the clockwise direction.
【0029】上記第1水冷シリンダー31の上方に原反
織物Fの送出し軸33が、また上記第2水冷シリンダー
32の上方にスクリーン紗Fbの巻取り軸34がそれぞ
れ回転自在に設置される。そして、送出し軸33から引
出された上記原反織物Fは、第1ガイドローラ35aを
経て第1水冷シリンダー31に裏面が接するように巻回
され、この第1水冷シリンダー31から第2ガイドロー
ラ35bを経て離脱し、上方の第3ガイドローラ35
c、第4ガイドローラ35dに導かれて上記巻取り軸3
4の上を通り、下方の第5ガイドローラ35eを経て第
2水冷シリンダー32に表面が接するように巻回され、
この第2水冷シリンダー32から第6ガイドローラ35
fを経て離脱し、巻取り軸34に引取られる。A delivery shaft 33 for the original fabric F is rotatably installed above the first water-cooling cylinder 31, and a winding shaft 34 for the screen cloth Fb is rotatably installed above the second water-cooling cylinder 32. The original fabric F drawn from the delivery shaft 33 is wound around the first water-cooling cylinder 31 via the first guide roller 35a so that the back surface is in contact with the first water-cooling cylinder 31. 35b to be separated, and the upper third guide roller 35
c, the winding shaft 3 is guided by the fourth guide roller 35d.
4, passed through the lower fifth guide roller 35e, and wound so that the surface is in contact with the second water-cooled cylinder 32,
From the second water cooling cylinder 32 to the sixth guide roller 35.
It separates after passing through f and is taken up by the winding shaft 34.
【0030】上記の第1水冷シリンダー31および第2
水冷シリンダー32の下方には、それぞれ左右一対の第
1アノード37および第2アノード38が設置される。
そして、第1アノード37および第2アノード38の下
方にそれぞれ水冷式の第1ターゲットソース39および
第2ターゲットソース40が設置され、これら第1ター
ゲットソース39および第2ターゲットソース40の上
にそれぞれチタンからなる平板状ターゲット31がそれ
ぞれ固定され、第1アノード37と第1ターゲットソー
ス39の間および第2アノード38と第2ターゲットソ
ース40の間にそれぞれ電圧500〜1000Vの直流
電源Eが介設される。The above-mentioned first water-cooled cylinder 31 and second
Below the water cooling cylinder 32, a pair of left and right first anodes 37 and second anodes 38 are installed.
Then, a water-cooled first target source 39 and a second target source 40 are installed below the first anode 37 and the second anode 38, respectively, and titanium is placed on the first target source 39 and the second target source 40, respectively. The flat plate-shaped targets 31 each made up of are fixed, and a DC power source E having a voltage of 500 to 1000 V is provided between the first anode 37 and the first target source 39 and between the second anode 38 and the second target source 40, respectively. It
【0031】上記の構造において、送出し軸33、巻取
り軸34および水冷シリンダー31、32を回転し、送
出し軸33から原反織物Fを所定の速度で送出し、第1
水冷シリンダー31および第2水冷シリンダー32に順
に接触させて巻取り軸34で引取りながら、第1水冷シ
リンダー31では上記の原反織物Fを裏側から冷却し、
また第2水冷シリンダー32では表側から冷却する。一
方、密閉チャンバ30に接続されている真空ポンプ(図
示されていない)を駆動して密閉チャンバ30の内部圧
力を1.3×10-3Pa程度に減圧し、次いでアルゴンガ
ス供給用ガスボンベ(図示されていない)からアルゴン
ガスを導入して上記密閉チャンバ30の内部圧力を6.
6×10-2Pa程度に調整し、更に酸素ガス供給用ガスボ
ンベ(図示されていない)から酸素ガスを導入してチャ
ンバ30内圧力を1.3×10-1Pa程度に調整する。In the above structure, the delivery shaft 33, the winding shaft 34, and the water-cooled cylinders 31, 32 are rotated to deliver the original fabric F from the delivery shaft 33 at a predetermined speed.
While being brought into contact with the water-cooled cylinder 31 and the second water-cooled cylinder 32 in order and taken up by the winding shaft 34, the above-mentioned raw fabric F is cooled from the back side in the first water-cooled cylinder 31.
Further, the second water cooling cylinder 32 is cooled from the front side. Meanwhile, a vacuum pump (not shown) connected to the closed chamber 30 is driven to reduce the internal pressure of the closed chamber 30 to about 1.3 × 10 −3 Pa, and then a gas cylinder for supplying an argon gas (shown in the drawing). Argon gas is introduced into the closed chamber 30 to adjust the internal pressure to 6.
The pressure inside the chamber 30 is adjusted to about 1.3 × 10 -1 Pa by adjusting the pressure to about 6 × 10 -2 Pa and further introducing oxygen gas from a gas cylinder for supplying oxygen gas (not shown).
【0032】しかるのち上記の第1アノード37・第1
ターゲットソース39間および第2アノード38・第2
ターゲットソース40間にそれぞれ直流電圧を印加して
平板状ターゲット41からチタンを飛び出させ、酸素と
反応させて酸化チタンとし、これを第1水冷シリンダー
31上の原反織物Fの表面に付着させ、急冷してアモル
ファス構造の厚み3〜250nmの反射防止膜を形成し
て中間製品Faを得、次いで第2水冷シリンダー32上
で中間製品Faの裏面に上記の酸化チタンを付着させ、
同様にして反射防止膜を形成し、製品のスクリーン紗F
bを得る。Then, the above-mentioned first anode 37 and first
Between target source 39 and second anode 38 / second
A direct current voltage is applied between the target sources 40 to eject titanium from the flat target 41 and react with oxygen to form titanium oxide, which is attached to the surface of the raw fabric F on the first water-cooled cylinder 31 and rapidly cooled. To form an antireflection film having an amorphous structure and a thickness of 3 to 250 nm to obtain an intermediate product Fa, and then deposit the above titanium oxide on the back surface of the intermediate product Fa on the second water cooling cylinder 32,
An antireflection film is formed in the same manner, and the product screen F
get b.
【0033】なお、左右のターゲット41のチタンに代
えて亜鉛、ニッケル、クローム等を使用した場合は、そ
の酸化物からなる反射防止膜が得られる。また、酸素ガ
スに代えて窒素ガスを用いた場合は、窒化物の反射防止
膜が得られる。また、酸素ガスに代えてメタンガスを用
いた場合は、炭化物の反射防止膜が得られる。When zinc, nickel, chrome or the like is used instead of titanium of the left and right targets 41, an antireflection film made of the oxide is obtained. When nitrogen gas is used instead of oxygen gas, a nitride antireflection film is obtained. When methane gas is used instead of oxygen gas, a carbide antireflection film is obtained.
【0034】[0034]
【実施例】スーパー繊維としてポリアリレート系繊維
(株式会社クラレ製「ベクトラン」)を用い、その線径
23μmのモノフィラメント糸を経糸および緯糸とする
600メッシュの平織物を製織し、これを原反織物と
し、下記の表1に示す試料番号1〜3の印刷用スクリー
ン紗を製造した。ただし、試料番号1は原反織物のまま
でスクリーン紗とした。また、試料番号2は実施形態1
のターゲットにステンレス鋼を用い、スパッタリングを
アルゴンガス雰囲気下で行った。また、試料番号3は前
記実施形態1の方法で製造した。[Example] Using a polyarylate fiber (“Vectran” manufactured by Kuraray Co., Ltd.) as a super fiber, a 600-mesh plain weave having monofilament yarn having a wire diameter of 23 μm as warp and weft is woven, and this is a raw fabric The screen meshes for printing of Sample Nos. 1 to 3 shown in Table 1 below were manufactured. However, Sample No. 1 was used as a screen gauze as it was as the raw fabric. The sample number 2 is the first embodiment.
The target was made of stainless steel, and sputtering was performed in an argon gas atmosphere. Sample No. 3 was manufactured by the method of the first embodiment.
【0035】[0035]
【表1】 [Table 1]
【0036】上記の試料番号1〜3のスクリーン紗をそ
れぞれスクリーン枠(サイズ320×320mm)に張
り、感光乳剤を塗布し、その中央部(サイズ100×1
00mm)に原板マスクを密着した。次いで、波長200
〜450nmの紫外線を照射し、現像して製版し、UV
ペースト(ソマール社製「ER−70B」)、ガラスペ
ースト(奥野製薬社製「ELD−520」)および銀ペ
ースト(アサヒ化学社製「LS−504HC」)を用い
て印刷テストを行い、印刷前と印刷後の被印刷物(コー
ト紙)の重量を測定し、その差からペーストの塗布量を
算出し、この塗布量で性能を比較した。The screen gauze of each of the above sample numbers 1 to 3 is attached to a screen frame (size 320 × 320 mm), a photosensitive emulsion is applied, and the central portion (size 100 × 1) is applied.
The original mask was tightly attached to (00 mm). Then wavelength 200
Irradiate with ultraviolet rays of ~ 450nm, develop and plate-making, UV
A printing test was performed using a paste (“ER-70B” manufactured by Somar), a glass paste (“ELD-520” manufactured by Okuno Pharmaceutical Co., Ltd.) and a silver paste (“LS-504HC” manufactured by Asahi Chemical Co., Ltd.), and before printing. The weight of the printed material (coated paper) after printing was measured, the coating amount of the paste was calculated from the difference, and the performance was compared with this coating amount.
【0037】印刷機には小型印刷機(ニューロング精密
工業株式会社製、商品名「LS15GX」)を使用し、
スキージ圧力を3.5kg/cm2 に、押込み量(被印刷物
にスキージゴムの先端を接触させ、この位置を基準にし
て印圧を加えた際のスキージヘッドの下降距離)を0.
3 mm に、オフコンタクト(刷版の印刷面と被印刷物間
のギャップ)を1.0mmに、スキージ硬度を70度に、
スキージ角度を75度に、印刷速度を100mm/秒 に
それぞれ設定した。ただし、試料番号1〜3のそれぞれ
で10回ずつペースト塗布量を試験し、その算術平均を
算出した。その結果を下記の表2に示す。A small printing machine (trade name "LS15GX" manufactured by New Long Precision Co., Ltd.) is used as the printing machine.
The squeegee pressure is 3.5 kg / cm 2 , and the pushing amount (the squeegee head descending distance when the tip of the squeegee rubber is brought into contact with the printing object and printing pressure is applied with this position as a reference) is set to 0.
3 mm, off-contact (gap between printing surface of printing plate and substrate) 1.0 mm, squeegee hardness 70 degrees,
The squeegee angle was set to 75 degrees and the printing speed was set to 100 mm / sec. However, the paste application amount was tested 10 times for each of the sample numbers 1 to 3, and the arithmetic average thereof was calculated. The results are shown in Table 2 below.
【0038】[0038]
【表2】 [Table 2]
【0039】上記の表1および表2に示すとおり、試料
番号1は、反射光が最も少ない反面、ペーストに対する
濡れ性に乏しく、導電性が低いため、平均塗布量が最低
となり、静電気障害も発生し、精密印刷に不適であっ
た。また、試料番号2は、試料番号1よりも濡れ性が改
善され、導電性に優れる反面、表面の物理蒸着膜が反射
性を有せず、紫外線の反射率が大きく、透過率が小さい
ため、平均塗布量の改善は不十分であった。そして、こ
の発明の実施例に相当する試料番号3は、試料番号2の
紫外線反射性と透過性を改善し、特に可視光領域に近い
波長410nmの紫外線に対する反射率が小さく、透過
率が大きく、かつ導電性を備えた酸化チタン膜のペース
トに対する濡れ性が優れるため、平均塗布量が最大とな
り、印刷画像の再現性に優れ、精密印刷が可能であっ
た。As shown in Tables 1 and 2 above, Sample No. 1 has the least reflected light, but has poor wettability to the paste and has low conductivity, so that the average coating amount becomes the minimum and electrostatic damage occurs. However, it was not suitable for precision printing. In addition, Sample No. 2 has improved wettability and is superior in conductivity to Sample No. 1, but the physical vapor deposition film on the surface does not have reflectivity, the reflectance of ultraviolet rays is large, and the transmittance is small, The improvement of the average coating amount was insufficient. The sample No. 3 corresponding to the example of the present invention improves the ultraviolet reflectivity and transmissivity of the sample No. 2, and particularly has a low reflectance and a high transmittance for ultraviolet rays having a wavelength of 410 nm near the visible light region, Moreover, since the wettability of the titanium oxide film having conductivity to the paste was excellent, the average coating amount was maximized, the reproducibility of the printed image was excellent, and precision printing was possible.
【0040】[0040]
【発明の効果】上記のとおり、この発明に係る印刷用ス
クリーン紗は、写真製版に際し、反射防止膜を有しない
ものに比べて再現性に優れ、原板マスクと等しい型模様
の印刷版(スクリーン型)が得られ、精密印刷や精密捺
染が可能になる。しかも、反射防止膜を物理蒸着膜に限
定したものであるから、製造が容易で、耐久性に優れ
る。かつ、反射防止膜の反射率および透過率を比較的長
い波長領域の紫外線に対するものに限定したので、設計
通りの製版が一層容易になる。特に請求項2に係る発明
は、経糸および緯糸に高強力のスーパー繊維を用いたの
で、一層の精密印刷が可能になる。INDUSTRIAL APPLICABILITY As described above, the screen mesh for printing according to the present invention is excellent in reproducibility in photolithography as compared with one having no antireflection film and has a pattern similar to that of the original mask (screen type). ) Is obtained, and precise printing and precise printing become possible. Moreover, the antireflection film is limited to the physical vapor deposition film.
Since it is a fixed product, it is easy to manufacture and has excellent durability.
It In addition, the reflectance and transmittance of the antireflection film are relatively long.
Since it was limited to ultraviolet rays in a certain wavelength range, design
Street plate making becomes easier. In particular, the invention according to claim 2 uses high-strength super fiber for the warp and the weft, so that further precise printing becomes possible.
【図面の簡単な説明】[Brief description of drawings]
【図1】印刷用スクリーンの写真製版時における断面図
である。FIG. 1 is a cross-sectional view of a printing screen during photoengraving.
【図2】原板マスクと印刷版の関係を示す断面図であ
る。FIG. 2 is a cross-sectional view showing a relationship between an original mask and a printing plate.
【図3】実施形態の断面図である。FIG. 3 is a sectional view of the embodiment.
【図4】スパッタリング装置の一例を示す断面図であ
る。FIG. 4 is a cross-sectional view showing an example of a sputtering apparatus.
【図5】スパッタリング装置の他の例を示す断面図であ
る。FIG. 5 is a cross-sectional view showing another example of the sputtering apparatus.
L、La:紫外線
10:スクリーン紗、10a:経糸
11:感光層
12:原板マスク、12a:透明部、12b:シャドー
部
13:印刷版(スクリーン型)、13a:孔
15:実施形態のスクリーン紗
16:経糸
17:緯糸
16a、17a:反射防止膜
F:原反織物
Fa:スクリーン紗の中間製品
Fb:スクリーン紗の製品
20、30:チャンバ
21、41:ターゲット
22、39、40:ターゲットソース
23、37、38:アノード
24、31、32:水冷シリンダ
25、33:送出し軸
26、34:巻取り軸
27a、27b、35a〜35f:ガイドローラ
28:真空ポンプ
29a、29b:ガスボンベ
E:直流電源L, La: ultraviolet rays 10: screen gauze, 10a: warp 11: photosensitive layer 12: original plate mask, 12a: transparent part, 12b: shadow part 13: printing plate (screen type), 13a: hole 15: screen gauze of embodiment 16: Warp 17: Wefts 16a, 17a: Antireflection film F: Original fabric Fa: Intermediate product of screen gauze Fb: Product of screen gauze 20, 30: Chamber 21, 41: Target 22, 39, 40: Target source 23 , 37, 38: Anodes 24, 31, 32: Water-cooled cylinders 25, 33: Delivery shafts 26, 34: Winding shafts 27a, 27b, 35a to 35f: Guide rollers 28: Vacuum pumps 29a, 29b: Gas cylinder E: DC Power supply
───────────────────────────────────────────────────── フロントページの続き (72)発明者 中嶋 英吾 愛知県蒲郡市浜町36番地 株式会社鈴寅 内 (72)発明者 鈴木 敏和 愛知県蒲郡市浜町36番地 株式会社鈴寅 内 (72)発明者 鈴木 隆啓 愛知県蒲郡市浜町36番地 株式会社鈴寅 内 (72)発明者 横溝 徹 東京都日野市豊田2丁目50番地の3 エ ヌ・ビー・シー工業株式会社内 (72)発明者 大高 浩 東京都日野市豊田2丁目50番地の3 エ ヌ・ビー・シー工業株式会社内 (56)参考文献 特開 昭63−15795(JP,A) 特開 平10−331048(JP,A) (58)調査した分野(Int.Cl.7,DB名) B41N 1/24 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Eigo Nakajima 36 Hamacho, Gamagori-shi, Aichi Prefecture, Suzura Co., Ltd. (72) Inventor Toshikazu 36, Hamacho, Gamagori-shi, Aichi Prefecture, Suzutora Co., Ltd. (72) Inventor Takahiro Suzuki 36 Hama-cho, Gamagori-shi, Aichi Prefecture Suzu-Tora Co., Ltd. (72) Inventor Toru Yokomizo 3-50-50 Toyota, Hino-shi, Tokyo NBC Industrial Co., Ltd. (72) Inventor Hiroshi Otaka 3-50-2 Toyota, Hino City, Tokyo NBC Industry Co., Ltd. (56) References JP-A-63-15795 (JP, A) JP-A-10-331048 (JP, A) (58) ) Fields surveyed (Int.Cl. 7 , DB name) B41N 1/24
Claims (2)
糸および緯糸に用いて製織された紗状の原反織物の経糸
および緯糸が金属の酸化物、窒化物もしくは炭化物から
なる導電性の紫外線反射防止膜で全面にわたって被覆さ
れており、この紫外線反射防止膜が厚み3〜250nm
の物理蒸着膜で、その波長350〜450nmの紫外線
に対する反射率が15%以下、透過率が45%以上であ
ることを特徴とする印刷用スクリーン紗。1. A conductive ultraviolet antireflection film in which a warp and a weft of a gauze-like raw fabric woven using thin monofilament yarn of synthetic fiber as a warp and a weft are made of metal oxide, nitride or carbide. The entire surface is covered with, and this UV antireflection film has a thickness of 3 to 250 nm.
The physical vapor deposition film of, the ultraviolet ray of which wavelength is 350-450 nm
A printing screen gauze having a reflectance of 15% or less and a transmittance of 45% or more .
り、モノフィラメント糸の径が15〜30μmである請
求項1に記載の印刷用スクリーン紗。2. The printing screen gauze according to claim 1, wherein the synthetic fiber is a high-strength super fiber, and the monofilament yarn has a diameter of 15 to 30 μm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001208782A JP3483868B2 (en) | 2001-07-10 | 2001-07-10 | Screen gauze for printing |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001208782A JP3483868B2 (en) | 2001-07-10 | 2001-07-10 | Screen gauze for printing |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2003019875A JP2003019875A (en) | 2003-01-21 |
| JP3483868B2 true JP3483868B2 (en) | 2004-01-06 |
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ID=19044538
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001208782A Expired - Lifetime JP3483868B2 (en) | 2001-07-10 | 2001-07-10 | Screen gauze for printing |
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Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2005118927A1 (en) | 2004-06-03 | 2005-12-15 | Kb Seiren, Ltd. | Monofilament for screen gauze and screen gauze therefrom |
| WO2005118926A1 (en) * | 2004-06-03 | 2005-12-15 | Kanebo, Ltd. | Monofilament for screen silk gauze and screen silk gauze therefrom |
| EP2743092A4 (en) * | 2011-08-10 | 2015-04-01 | Taiyo Chemical Industry Co Ltd | Structure including thin primer film, and process for producing said structure |
| CN103668066A (en) * | 2012-09-11 | 2014-03-26 | 太阳化学工业株式会社 | Net structural body capable of accommodating workpiece |
| JP6148604B2 (en) * | 2013-11-07 | 2017-06-14 | 株式会社Nbcメッシュテック | Metal mesh fabric for printing and screen plate for printing |
| JPWO2020067224A1 (en) * | 2018-09-27 | 2021-08-30 | 東レ株式会社 | Polyester monofilament for screen gauze and mesh fabric for direct digital plate making |
| JP7473324B2 (en) * | 2019-11-05 | 2024-04-23 | 株式会社Nbcメッシュテック | Combination Screen Version |
-
2001
- 2001-07-10 JP JP2001208782A patent/JP3483868B2/en not_active Expired - Lifetime
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|---|---|
| JP2003019875A (en) | 2003-01-21 |
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