JP3538951B2 - Position control device and automatic buffing device equipped with this position control device - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a rotary drum constituting a rotary magnetic head device mounted on a magnetic recording / reproducing apparatus such as a video tape recorder as an object;
The present invention relates to a position control device for performing position control of a buff for polishing the rotary drum and an automatic buff polishing device including a position control device suitable for buffing the rotary drum.

[0002]

2. Description of the Related Art In general, a buff polishing apparatus generally includes a buff for polishing an object to be polished, a spindle on which the buff is supported, and a drive motor for rotating the spindle. . The buff is formed in a disk shape, and a center portion is supported and fixed by a support shaft. The support shaft supports a buff at a distal end, and a base end is connected to a rotation shaft of a drive motor. The driving motor rotates the buff via the support shaft by driving the rotation shaft to rotate. Then, the buff polishing apparatus performs buff polishing by applying an abrasive to an outer peripheral portion of the buff and abutting an outer peripheral portion of the rotated buff on a portion to be polished of the object to be polished.

In a rotary drum constituting a rotary magnetic head device mounted on a magnetic recording / reproducing apparatus, a buffing device has a head window hole in which a magnetic head is provided, buff-polished.

A magnetic recording / reproducing apparatus such as a video tape recorder is equipped with a rotary magnetic head device for magnetic recording / reproducing. This rotary magnetic head device 3 is similar to that shown in FIG.
0, the magnetic head 3A and the magnetic head 3A
A provided with a rotating drum 3B, and the rotating drum 3B
And a support shaft 3D that supports the rotating drum 3B and the fixed drum 3C.

The magnetic head 3A is wound around a magnetic core (not shown) formed by combining a pair of magnetic core halves constituting a closed magnetic path, and a winding guide groove (not shown) formed in the magnetic core. And a coil (not shown). A magnetic gap (not shown), which is a minute gap, is formed in the magnetic core.

[0006] The rotary drum 3B is formed in a cylindrical shape with a bottom by a metal material, and has a shaft hole (not shown) in the center of the bottom surface. In the rotating drum 3B, substantially rectangular head window holes 3E opened in the outer peripheral portion are respectively recessed at a plurality of positions on the opening edge. On the rotating drum 3B,
The magnetic gap of the magnetic head 3A is joined and fixed in the head window hole 3E with the magnetic gap slightly projecting from the outer peripheral portion.

The fixed drum 3C is formed in a cylindrical shape with a bottom, and has a shaft hole (not shown) at the center of the bottom surface. The support shaft 3D is inserted into each shaft hole of the rotating drum 3B and the fixed drum 3C. One end of the support shaft 3D is supported by the fixed drum 3C, and rotatably supports the rotary drum 3B at an intermediate portion.

When recording and reproducing information signals on the magnetic tape T, the rotary magnetic head device 3 rotates the rotary drum 3B.
A magnetic tape T is wound substantially spirally along the outer peripheral portion of the rotary drum 3B, and a magnetic gap of a magnetic head 3A slightly projecting from the outer peripheral portion of the rotary drum 3B is brought into contact with the magnetic tape T. The rotary magnetic head device 3 rotates the rotary drum 3 </ b> B so that the signal recording area of the magnetic tape T
The magnetic head 3A sliding on the magnetic tape T records and reproduces information signals.

In the rotary magnetic head device 3 described above, when recording and reproducing the magnetic tape T, the magnetic tape T abuts on the outer peripheral side edge of the head window hole 3E of the rotary drum 3B. It is necessary to form a curved surface. Therefore, the rotating drum 3B has a curved surface formed by buffing the edge portion on the outer peripheral side of the head window hole 3E by the buffing device.

The head window hole 3E of the rotary drum 3B is
As shown in FIG. 31, it is formed by grinding by milling. Next, as shown in FIG. 32, the rotating drum 3B is subjected to buff polishing by bringing the rotated buff into contact with the head window hole 3E, thereby obtaining a head window hole 3E.
Is formed with a smooth polished portion 3F.

The rotary drum 3B has a head window hole 3E.
The shape required for the polished portion 3F will be described with reference to FIG. Polishing portion 3 of head window hole 3E of rotating drum 3B
F is an upper end side curved surface 3H formed at an opening end on the upper surface 3G side, a side surface curved surface 3I formed in a direction orthogonal to the running direction of the magnetic tape T, and a running direction of the magnetic tape T. It has a bottom curved surface 3J formed in a parallel direction, and a lower curved surface 3K formed at a position where the side curved surface 3I and the bottom curved surface 3J are continuous. The curvature of each of the upper curved surface 3H, the side curved surface 3I, the bottom curved surface 3J, and the lower curved surface 3K needs to be managed.

[0012]

As described above, in the rotating drum 3B, each curved surface of the head window hole 3E is formed by performing complicated three-dimensional polishing using a buff polishing apparatus. In addition, since there are many types of rotary drums 3B having different diameters, numbers, positions, and widths of the head window holes 3E, buffing is performed manually.

The head window 3E of the rotary drum 3B
Is a work that requires the skill of an operator because buffing is performed manually. In addition, in this manual operation, it is difficult to ensure a favorable working environment because abrasives and the like are scattered to the operator when buffing. Therefore,
It has been difficult for the buff polishing apparatus to achieve sufficient processing accuracy on each curved surface of the head window hole 3E of the rotating drum 3B.

Further, when buffing the head window hole 3E of the rotary drum 3B, the buff polishing apparatus wears the outer periphery of the buff along with the polishing. Becomes smaller. For this reason,
The buffing device changes the angle at which the buff is pressed against the head window 3E of the rotating drum 3B, and cannot buff the edge of the head window 3E sufficiently. Therefore, the buffed rotary head 3B
Cannot obtain the required curvature of the bottom surface side curved surface 3J and the side surface curved surface 3I formed in the head window hole 3E.

In the rotary drum 3B, the polished portion 3F also spreads around the head window 3E. Therefore, when the buffing apparatus forms a curved surface on the outer peripheral side edge of the head window hole 3E of the rotating drum 3B,
There is a problem that it is difficult to keep the curvature of the formed curved surface constant.

Further, the buffing apparatus uses the buffed rotary drum 3B because the abrasive applied to the outer peripheral portion of the buff is scattered with the buff and gradually decreases with the buffing.
Changes the shape and surface roughness of the polished portion 3F. For this reason, the processing quality of the rotary drum 3B, such as the shape of the head window hole 3E, is not constant and deteriorates significantly.

Therefore, in the rotating drum 3B, the distance between the magnetic head 3A and the magnetic tape T is not sufficiently controlled. For this reason, in the rotating drum 3B, when a tape running operation is performed for reproducing the magnetic tape T or the like, the magnetic material of the magnetic tape T is peeled off due to vibration of the magnetic tape T.

In addition, the rotary drum 3B breaks the magnetic tape T because the pressing force between the magnetic head 3A and the magnetic tape T does not fall within a predetermined range.
Further, the rotary drum 3B has a problem that the magnetic tape T is wound when the tape running operation is performed.

The head window 3E of the rotary drum 3B
The automatic buffing apparatus, which is automated so that the curvature of each curved surface to be formed can be managed, performs buffing by pressing force control for pressing the buff against the head window hole 3E of the rotary drum 3B with a predetermined pressing force. Then, it is necessary to release the buff pressure contact state with respect to the head window 3E to the non-pressure contact state, and to retreat the buff to a predetermined position and stop it by position control.

However, this automatic buffing apparatus is
Since the pressure control is switched to the position control in the press-contact state, the press-contact force by the press-contact force control is instantaneously released, which has a problem that the shape such as the curvature of each curved surface of the head window 3E is adversely affected.

Therefore, the present invention relates to a first pressure contact state.
The present invention provides a position control device capable of switching one of the object and the second object to a predetermined position while controlling the pressing force with respect to the other, and switching from the pressing force control to the position control. The purpose is to:

Further, according to the present invention, it is possible to retreat one of the head window hole and the buff of the rotary drum in the pressure contact state to a predetermined position while controlling the pressure contact force with respect to the other, so that the processing quality is stabilized. An object of the present invention is to provide an automatic buff polishing apparatus that enables highly accurate buff polishing to be automated.

[0023]

In order to achieve the above-mentioned object, a position control device according to the present invention comprises a first object and a second object which are moved toward and away from each other from a pressed state to a non-pressed state. Moving means for moving the first object and the second object toward and away from each other;
A position detection unit that detects a relative position between the first target object and the second target object;
A moving unit based on a pressing force detecting unit for detecting a pressing force with the target object and a position detecting signal detected by the position detecting unit and a pressing force detecting signal detected by the pressing force detecting unit;
A control unit for performing position control and pressure contact force control between the target object and the second target object, wherein the control unit is configured to control one of the first target object and the second target object in the pressed state. On the other hand, by making the damping coefficient for calculating the acceleration of the moving means smaller than a predetermined value in the pressing force control while continuing the pressing force control, the first object and the second
When the pressure contact state with the object is released and one of them is retracted to a predetermined position with respect to the other, a pressure contact force is applied in a direction toward zero or the other object and the damping coefficient is set to a predetermined value. By increasing the speed, the moving speed of the one target object is reduced, and when the moving speed of the one target object with respect to the other target object becomes smaller than a predetermined value, switching from the pressing force control to the position control is performed. The one of the objects may be stopped.

Further, the automatic buff polishing apparatus provided with the position control device according to the present invention has a buff provided on an outer peripheral portion of a rotary drum of a rotary magnetic head device for polishing a head window in which a magnetic head is disposed. In an automatic buffing machine,
Moving means for moving the head window hole and the buff of the rotary drum toward and away from each other in a pressed state, a position detection unit for detecting a relative position between the buff and the head window hole of the rotary drum, and a head window hole of the rotary drum A pressing force detecting unit for detecting a pressing force of the buff pressed against the unit, and a moving unit based on a position detecting signal detected by the position detecting unit and a pressing force detecting signal detected by the pressing force detecting unit. A position control device comprising a control unit for performing position control and pressure contact force control between the head window hole of the rotary drum and the buff, and the control unit includes a head window hole and a buff of the rotary drum in a pressed state. The pressure contact between the head window hole and the buff is reduced by making the damping coefficient for calculating the acceleration of the moving means smaller than a predetermined value in the pressure contact force control while continuing the pressure contact force control. State is released, and when one of them is retracted to a predetermined position with respect to the other, the pressing force is applied in a direction toward zero or the other and the damping coefficient is made larger than a predetermined value, so that the one moving speed is increased. Is decelerated, and when the moving speed of the one relative to the other becomes lower than a predetermined value, the control is switched from the pressing force control to the position control and the one is stopped.

[0025]

The position control apparatus according to the present invention, constructed as described above, performs the press-contact control while continuing the press-contact force control on one of the first object and the second object in the press-contact state. By reducing the damping coefficient of
The pressure contact state between the first object and the second object is released.
Next, when one of the first object and the second object is retracted to a predetermined position with respect to the other, the position control device reduces the pressure contact force to zero or the direction toward the other object. At the same time, the moving speed of one target object is reduced by increasing the damping coefficient of the pressing force control.

When the moving speed of one object with respect to the other object becomes sufficiently low, the position control device switches from the pressing force control to the position control and stops the one object. In other words, the position control device retreats one of the first object and the second object in the pressure contact state to a predetermined position while controlling the pressure with respect to the other, and switches from the pressure control to the position control.

Further, the automatic buffing apparatus provided with the position control device according to the present invention is capable of controlling the pressure contact with either the head window hole of the rotary drum or the buff in the pressure contact state while continuing the pressure control. By reducing the damping coefficient, the pressure contact state between the head window hole of the rotating drum and the buff is released. Next, the automatic buffing device equipped with the position control device, when one of the head window hole and the buff of the rotary drum is retracted to a predetermined position with respect to the other, the pressure contact force is zero or the other object. The moving speed of one of them is reduced by increasing the damping coefficient of the pressing force control while giving the moving direction.

Then, the automatic buffing apparatus provided with the position control device switches from the pressing force control to the position control and stops one when the moving speed of the one relative to the other becomes sufficiently low. In other words, the automatic buff polishing apparatus including the position control device is configured to retreat one of the head window hole of the rotary drum and the buff in the pressure contact state to a predetermined position while controlling the pressure force against the other, and perform position control from the pressure force control to the position control. Switch to

[0029]

DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, a specific embodiment of the present invention will be described with reference to FIGS. 1 to 29. The automatic buffing apparatus 1 includes a position control device for controlling the position of a head window 3E of a rotating drum 3B constituting a rotary magnetic head device 3 as an object and a buff 21 for polishing the head window 3E. This is an example applied to an automatic buffing apparatus.

Hereinafter, [1] Configuration of rotary magnetic head device and rotary drum [2] Configuration of the entire device [3] Configuration of buff section [4] Configuration of buff positioning mechanism and drum transport mechanism [5] Configuration of chucking unit and table moving mechanism [6] Configuration of dressing unit [7] Configuration of abrasive application section [8] Structure of pressure contact sensor [9] Configuration of position sensor unit [10] Configuration of control unit Will be described in this order.

[1] Configurations of Rotary Magnetic Head Device and Rotary Drum Although detailed description is omitted, a conventional rotary magnetic head device 3 has a magnetic head 3A and a magnetic head 3A as shown in FIG. , A fixed drum 3C superimposed on the rotary drum 3B, and a support shaft 3D supporting the rotary drum 3B and the fixed drum 3C, respectively.

A magnetic gap (not shown), which is a minute gap, is formed at the tip of the magnetic head 3A. The rotating drum 3B is formed in a cylindrical shape with a bottom by a metal material, and a shaft hole (not shown) is provided at the center of the bottom surface. In the rotating drum 3B, substantially rectangular head window holes 3E opened in the outer peripheral portion are respectively recessed at a plurality of positions on the opening edge. The magnetic gap of the magnetic head 3A is fixed to the rotary drum 3B in the head window hole 3E in a state that the magnetic gap slightly protrudes from the outer peripheral portion. The fixed drum 3C is formed in a bottomed cylindrical shape, and is provided with a shaft hole (not shown) at the center of the bottom surface. The support shaft 3D is inserted into each shaft hole of the rotating drum 3B and the fixed drum 3C. One end of the support shaft 3D is supported by the fixed drum 3C, and rotatably supports the rotary drum 3B at an intermediate portion.

As shown in FIG. 32, a polishing portion 3F is formed around the head window 3E of the rotating drum 3B. The shape of the polished portion 3F of the head window hole 3E is, as shown in FIG. 33, in the direction perpendicular to the running direction of the magnetic tape T with the upper end side curved surface 3H formed at the opening end on the upper surface 3G side. The side surface curved surface 3I formed and the bottom surface curved surface 3 formed in a direction parallel to the running direction of the magnetic tape T.
J, and a lower end side curved surface 3K formed at a position where the side surface side curved surface 3I and the bottom surface side curved surface 3J are continuous.

When the information signal of the magnetic tape T is recorded / reproduced, the rotary magnetic head device 3 described above rotates the rotary drum 3B.
A magnetic tape T is spirally wound along the outer peripheral portion of the rotary drum 3B, and a magnetic gap of a magnetic head 3A slightly projecting from the outer peripheral portion of the rotary drum 3B is brought into contact with the magnetic tape T. The rotary magnetic head device 3 rotates the rotary drum 3 </ b> B so that the signal recording area of the magnetic tape T
The magnetic head 3A sliding on the magnetic tape T records and reproduces information signals.

[2] Configuration of the Entire Apparatus As shown in FIG. 1, the automatic buff polishing apparatus 1 has a buff section 5 having a buff 21 for polishing the rotary drum 3B, and a chucking section for holding the rotary drum 3B. 6, a buff positioning mechanism 7 for moving the buff unit 5 with respect to the chucking unit 6, a table moving mechanism 8 for moving the chucking unit 6 with respect to the buff unit 5, and a rotating drum for the chucking unit 6. And a drum transfer mechanism 9 for transferring 3B.

The automatic buffing apparatus 1 also includes a pressing force sensor 15 for detecting the pressing force of the buff 21 pressed against the rotating drum 3B, and a relative position between the buff 21 and the rotating drum 3B. A position sensor unit 16 for detecting, a dressing unit 12 for shaping the worn buff 21, and a buff 21
And a controller 18 for controlling the buff positioning mechanism 7 and the table moving mechanism 8 based on the detection signals output from the pressing force sensor 15 and the position sensor 16, respectively. And

The position control device according to the embodiment of the present invention is different from the automatic buff polishing device 1 according to the embodiment in that the buff positioning mechanism 7, the table moving mechanism 8, the pressing force sensor 15, the position sensor 16 and the controller 18 It is composed of

[3] Configuration of Buff Section As shown in FIG. 2, the buff section 5 includes a buff 21 for polishing the rotating drum 3B and a rotating shaft 22 for supporting the buff 21.
A buff drive motor 23 that rotationally drives the buff 21;
And a mounting member 24 to which the buff drive motor 23 is mounted.

The buff 21 is formed in a disk shape using felt as a material, and is impregnated with the abrasive supplied by the abrasive application section 14. The buff 21 has a central portion attached to the rotating shaft 22 via a holder member 26. The rotating shaft 22 supports the buff 21 at the tip,
It is rotationally driven by a buff drive motor 23.

The buff drive motor 23 is a direct current (DC) motor, and is supported by the mounting member 24. The mounting member 24 has one side surface supported by a support shaft 30 described later, which constitutes the buff positioning mechanism 7. Also, the support shaft 30
Has a base end rotatably supported by the buff positioning mechanism 7. That is, the above-described buff section 5 is rotatably supported by the buff positioning mechanism 7 via the support shaft 30.

In the buff unit 5 configured as described above, the buff 21 is rotationally driven via the rotating shaft 22 when the buff driving motor 23 is rotationally driven. Note that a DC motor is employed as the buff drive motor 23 described above. For example, the buff drive motor 23 is driven to rotate at a rotation speed in the range of 1500 to 3000 rpm, and rotates in accordance with the amount of change in the diameter of the buff 21 due to wear. Other motors may be used as long as the number can be changed.

As shown in FIGS. 1 and 2, the buff portion 5 is provided with a head window hole detection sensor 27 on the mounting member 24. The head window hole detecting sensor 27 is a reflected light type photo sensor, and includes a light emitting unit 27A that emits detection light to the rotating drum 3B and a light receiving unit that receives reflected light of the detection light emitted from the light emitting unit. Part 27
B.

The head window hole detecting sensor 27 is a rotary drum 3 held by the chucking section 6 and driven to rotate.
B is disposed at a position corresponding to the outer peripheral portion. The head window hole detecting sensor 27 irradiates the outer peripheral portion of the rotating drum 3B with detection light in a state where the rotating drum 3B is driven to rotate, thereby detecting the position of the head window hole 3E and the head window hole 3E.
Detects the width dimension of

The operation of detecting the position and width of the head window hole 3E of the rotating drum 3B will be described with reference to FIG. First, in the head window hole detection sensor 27, the light emitting unit 27A emits detection light toward the outer peripheral portion of the rotating drum 3B.

When the detection light is applied to the outer peripheral portion of the rotary drum 3B without the head window hole 3E, the detection light is reflected by the outer peripheral portion of the rotary drum 3B.
The light receiving unit 27B receives the reflected light that has been reflected. That is, the head window detection sensor 27 detects that there is no head window 3E in the detection area of the rotating drum 3B irradiated with the detection light.

When the head window 3E of the rotating drum 3B is irradiated with the detection light, the detection light is not reflected by the head window 3E. No light is received. That is, the sensor 27 for detecting the head window hole detects the rotation of the rotating drum 3 irradiated with the detection light.
It is detected that the head window hole 3E exists in the detection area B.
The sensor 27 for detecting the head window hole is provided on the rotating drum 3.
By rotating B about the Z axis shown in FIG.
The position of the head window 3E and the width of the head window 3E are detected.

Further, as shown in FIG. 1, a dust collecting device 31 is provided adjacent to the buff section 5 described above. The dust collecting device 31 includes a dust collecting pipe 31A, and an opening at one end of the dust collecting pipe 31A is disposed at a position facing the buff 21 and the dressing unit 12.

The dust collecting device 31 sucks the swarf and abrasives of the rotating drum 3B and the buff 21 which are scattered when performing the buffing of the rotating drum 3B and the dressing of the buff 21. Further, this dust collecting device 31 prevents the head window hole detecting sensor 27 from attaching shavings or abrasives.
An opening of the dust collecting pipe 31A is provided at a position where the shavings and the abrasive are sufficiently sucked.

[4] Configuration of Buff Positioning Mechanism and Drum Conveying Mechanism As shown in FIG. 1, the buff positioning mechanism 7 generally includes a support base 28 and a support member 29 slidably supported by the support base 28. And a support shaft 30 whose base end is rotatably supported by the support member 29 and which supports the buff portion 5 at the distal end.

The support base 28 is provided with a slide guide groove (not shown), and a support member 29 is slidably supported in the slide guide groove in the direction M1 shown in FIG. The support member 29 is slidably supported in a direction M2 shown in FIG. 1 via a slide member (not shown). The support shaft 30 has a base end portion supported on one side surface of the support member 29, and a mounting member 24 constituting the buff portion 5 is supported on a distal end portion.

The buff positioning mechanism 7 configured as described above moves the support base 28 and the support member 29 in the M1 direction and the M2 direction, respectively. Therefore, the buff positioning mechanism 7 moves the buff unit 5 to any position in the M1 direction and the M2 direction. In addition, the buff positioning mechanism 7 rotates the support shaft 30 to rotate the buff unit 5 supported by the tip of the support shaft 30.

The buff positioning mechanism 7 includes a buff section 5.
There is provided a finish polishing unit 10 for finish polishing the rotary drum 3B buffed by the above. As shown in FIG. 4, the finish polishing unit 10 includes a support base 32 slidably supported by a support member 29 constituting the buff positioning mechanism 7, and a support shaft 33 supported by the support base 32.
And a wheel driving motor 34 supported on the tip of the support shaft 33 and a polishing wheel 36 supported on the rotating shaft of the wheel driving motor 34.

The support member 29 is provided with guide portions 29A and 29B parallel to each other on one side surface.
The support base 32 is slidably supported by the guide portions 29A and 29B. On one side surface of the support base 32, a support shaft 33 is supported in parallel with the guide portions 29A and 29B. The support shaft 33 has a base end supported by the support base 32 and a wheel drive motor 34 supported at the distal end.

The wheel drive motor 34 includes a support shaft 33.
Has a rotating shaft 34A in a direction orthogonal to the axis of rotation, and a polishing wheel 36 is supported at the tip of the rotating shaft 34A. The polishing wheel 36 is formed, for example, in a disk shape using felt as a material, and has a central portion supported by a tip portion of a rotation shaft 34A of the wheel driving motor 34.

The finish polishing section 19 configured as described above
The head window hole 3E of the rotary drum 3B is
After buffing, the grinding wheel 36 is
Finish and polish the head window hole 3E of B. Therefore, the head window hole 3E of the rotary drum 3B is finish-polished by the polishing wheel 36, so that polishing dust and the remainder of the abrasive are reliably removed.

Although a detailed description is omitted, the drum transport mechanism 9 is, as shown in FIG.
B, a pallet 9A on which each is mounted, a holding member 9B for holding the rotating drum 3B on the pallet 9A, a support arm 9C for supporting the holding member 9B, and a swingable support for the support arm 9C. And a support base 9D.

The drum transport mechanism 9 holds the rotary drum 3B placed on the pallet 9A by a holding member 9B and transports the rotary drum 3B to the chucking section 6, and also transfers the rotary drum 3B held by the chucking section 6 to a holding member. 9B and transported to the pallet 9A. In the drum transport mechanism 9, a photo sensor (not shown) is provided on the holding member 9B, and the photo sensor detects whether the rotating drum 3B is held.

[5] Configuration of Chucking Unit and Table Moving Mechanism As shown in FIGS. 5 and 6, the chucking unit 6 rotates the chucking member 38 for holding the rotary drum 3B and the rotary drum 3B. Drum drive motor 40, chucking member 38 and drum drive motor 40
And a table moving mechanism 8 configured to move the table 43 provided with.

As shown in FIG. 5, the chucking member 38 is formed in a disk shape and has a holding claw 38A. A supply pipe of an air supply device (not shown) is connected to the chucking member 38, and the holding claw 38A is opened and closed by the air pressure supplied from the air supply pipe to hold the inner peripheral portion of the rotary drum 3B.

The chucking member 38 is provided with a photo sensor (not shown), and detects whether the rotating drum 3B is held by the photo sensor. The chucking member 38 has a base end supported by the pressure contact sensor 15.

The drum driving motor 40 is disposed so as to be superimposed on the pressure sensor 15. The drum drive motor 40 employs a direct drive method suitable for press force control, thereby improving drive accuracy. The drum driving motor 40 is connected to a first encoder 41, which will be described later, that constitutes the position sensor unit 16, and the first encoder 41 measures a rotation angle.

The table moving mechanism 8 includes the chucking section 6
, A base plate 44 movably supporting the table 43, a table driving motor 45 disposed on the base plate 44 to move the table 43, and a table driving motor 45
And a driving shaft 46 connected to the driving shaft 46.

The table 43 is formed in a substantially rectangular plate shape, and the chucking section 6 is placed at the center on the main surface. The table 43 is provided with a first guide portion 43A to a fourth guide portion 43D each having a substantially rectangular block shape at a corner portion on the back side. In the first to fourth guide portions 43A to 43D, guide grooves 43E are recessed in parallel with each other on the side facing the base plate 44.

The base plate 44 is provided with a first guide rail 44A and a second guide rail 44B parallel to each other on the main surface. The first guide rail 44A and the second guide rail 44B include:
Guide grooves 43E of the first to fourth guide portions 43A to 43D provided on the table 43 are placed. Therefore, the table 43 includes the base plate 44
First guide rail 44A and second guide rail 4
4B, first to fourth guide portions 43A to 43A.
D is slidably supported.

The table driving motor 45 is, for example,
The C servomotor is disposed on the base plate 44 so as to face between the first guide rail 44A and the second guide rail 44B of the base plate 44. The table driving motor 45 is connected to the first guide rail 4.
A rotary shaft 45A whose axis is parallel to the 4A and the second guide rail 44B is provided, and one end of a drive shaft 46 is connected to the tip of the rotary shaft 45A.

The driving shaft 46 is provided with a table driving motor 45.
One end is connected to the distal end of the rotary shaft 45A via a connecting member 46A, and the other end is supported by a shaft support member (not shown) erected on the base plate 44.
The drive shaft 46 is provided with a screw portion 46B on the outer periphery. The table 43 has a base plate 44.
A nut (not shown) is provided at a substantially central portion on the rear surface facing the, and the nut is screwed into a screw portion 46B of the drive shaft 46.

The table driving motor 45 has a second encoder 4 (described later) constituting the position sensor section 16.
7 is connected, and the rotation angle is measured by the second encoder 47. The table moving mechanism 8
May be driven by a linear mechanism having a linear motor.

The chucking unit 6 configured as described above
The operation of the drum driving motor 40 to rotate the rotary drum 3B and the operation of the table moving mechanism 8
3 will be described. First, the rotating drum 3B held by the chucking member 38 is rotated by the rotation of the drum driving motor 40. Further, the rotating drum 3B is rotated in the R1 direction and the R2 direction with respect to the Z axis shown in FIG. 5 by the rotation of the drum driving motor 40 in the normal rotation direction and the reverse rotation direction.

Next, the table 43 on which the chucking member 38 is supported rotates the drive shaft 46 via the connecting member 46A when the rotary shaft 45A of the table drive motor 45 is driven to rotate. The drive shaft 46 is slidably driven to slide the table 43 along a first guide rail 44A and a second guide rail 44B of the base plate 44 via a nut provided on the table 43.

The table 43 is moved along the first guide rail 44A and the second guide rail 44B in the F1 direction shown in FIG. 5 by the table driving motor 45 being driven to rotate in the normal direction or the reverse direction. And slide in the F2 direction.

[6] Configuration of Dressing Section The dressing section 12 has a file-like dresser 12 A for grinding and shaping the buff 21, and is disposed on a base plate 44 constituting the table moving mechanism 8. .

The above-mentioned dressing section 12 moves the buff section 5 by the buff positioning mechanism 7 and
Buff 21 is pressed against 2A. And the dressing part 12 grinds and shapes the worn buff 21 by pressing the outer peripheral part of the buff 21 rotated by the dresser 12A.

[7] Configuration of Abrasive Application Section As shown in FIG.
A support base 49 provided thereon, a support member 50 swingably supported by the support base 49, and a support member 50
And a coating drum 51 which is rotatably supported on the substrate. The support base 49 has a base end fixed to the table 43, and has support protrusions 49A and 49B integrally provided at the front end thereof.

The main surface of the support member 50 is formed in a substantially H shape using, for example, chromium oxide as a material. The support member 50 is provided on support protrusions 49A and 49B of the support base 49.
The base end is swingably supported via a support shaft 50A. The application drum 51 is formed, for example, in a cylindrical shape using chromium oxide as a material, and has an outer peripheral portion coated with an abrasive. The coating drum 51 is provided with a shaft hole at a substantially central portion, and is rotatably supported at the tip of the support member 50 via a support shaft 50B inserted through the shaft hole.

The abrasive application section 14 configured as described above
The buff position 5 is moved by the buff positioning mechanism 7 so that the outer peripheral portion of the buff 21 is pressed against the coating drum 51. The abrasive application unit 14 applies the abrasive to the buff 21 by pressing the outer peripheral portion of the buff 21 rotated by the application drum 51 against the buff 21. Further, in the abrasive application section 14, the support member 50 is swingably supported by the support base 49 so that the amount of the abrasive applied to the buff 21 is made uniform.

[8] Configuration of Pressure Contact Sensor Unit The pressure contact sensor unit 15 is, as shown in FIGS.
A pressing force sensor substrate 53 displaced in accordance with the pressing force, and a pressing force sensor substrate 5 disposed on the pressing force sensor substrate 53;
The first LVDT (Linear Variable D) that generates an electric signal proportional to the amount of mechanical displacement generated in
and a second LVDT 55.

As shown in FIG. 8, the pressure-contact sensor substrate 53 has an integral structure made of an aluminum alloy and processed into a disk shape by, for example, wire electric discharge machining. The pressing force sensor substrate 53 includes an annular base 53A and a substantially rectangular annular intermediate base 53 located on the inner peripheral side of the base 53A.
B and a shaft support 53C located on the inner peripheral side of the intermediate base 53B.

The base 53A is formed in an annular shape.
It is fixed to one end of a drum driving motor 40. The intermediate base portion 53B is formed in a substantially rectangular annular shape, and a pair of a first connecting portion 53D and a second connecting portion 5 which are parallel to each other.
3E is formed.

The intermediate base 53B is provided on the inner periphery of the base 53A with a first intermediate base support piece 53F and a second intermediate base support 53F whose outer periphery of the first connecting portion 53D is parallel to each other. It is supported by the intermediate base support piece 53G. In addition, the intermediate base portion 53B includes a third intermediate base support piece 53H and a fourth intermediate base portion 53E each having a substantially linear outer peripheral portion parallel to each other on the inner peripheral portion of the base portion 53A. It is supported by the intermediate base support piece 53I.

The first to fourth intermediate base support pieces 53F to 53I are formed to have flexible widths which can be elastically displaced in a direction parallel to the X-axis direction shown in FIG. The rigidity is large in the direction parallel to the Y-axis direction shown in FIG.

The shaft support 53C is formed in a substantially rectangular shape, and one end of the chucking member 38 is fixed to the center. The shaft support 53C is provided with an intermediate base 53.
B, on the inner peripheral portion, a first intermediate base support piece 5
The first shaft support base 53J, the second shaft support base 53K, and the third shaft support base 53J, the second shaft support base 53K, and the substantially linear first shaft support base 53J and the third shaft support base 53K which are orthogonal to and parallel to the third to fourth intermediate base support parts 53I. 53L and a fourth shaft support base support piece 53M.

The first to fourth shaft support base support pieces 53J to 53M are formed to have flexible widths which can be elastically displaced in a direction parallel to the Y-axis direction shown in FIG. The rigidity is large in the direction parallel to the X-axis direction shown in FIG.

Further, a first detecting portion 53P is formed on the pressing force sensor substrate 53 between the inner peripheral portion of the base portion 53A and the outer peripheral portion of the intermediate base portion 53B. Part 5
The second portion between the inner peripheral portion of the shaft 3B and the outer peripheral portion of the shaft support 53C.
Is formed.

The first detecting section 53P is located between the first intermediate base support piece 53F and the second intermediate base support piece 53G, and projects integrally with the inner periphery of the base section 53A. It comprises a first detection piece 53R having a substantially rectangular shape and a second detection piece 53S having a substantially rectangular shape integrally formed on the outer periphery of the intermediate base 53B.

In the first detector 53P, as shown in FIG. 8, a minute gap is formed between the first detection piece 53R and the second detection piece 53S.
The first LVDT 54 is provided so as to straddle the detection piece 53R and the second detection piece 53S.

The second detecting portion 53Q is located between the first shaft support base support piece 53J and the second shaft support base support piece 53K, and is integrated with the inner peripheral portion of the intermediate base 53B. A first detection piece 53 </ b> T having a substantially rectangular shape formed so as to protrude;
And a second detection piece 53U of a substantially rectangular shape integrally formed so as to protrude from an outer peripheral portion of C.

In the second detecting section 53Q, a minute gap is formed between the first detecting piece 53T and the second detecting piece 53U, and the first detecting piece 53T is formed.
T and the second LVDT 55 across the second detection piece 53U.
Are arranged.

The first LVDT 54 and the second LVDT 5
5 are cores 54A, 55 as shown in FIGS.
A and a core supporting member 54 supporting the cores 54A and 55A
B, 55B, supporting bases 54C, 55C supporting the core supporting members 54B, 55B, and cores 54A,
Coil 54D, 55D into which 55A is inserted, and coil 5
Coil holding members 54G, 55G supporting 4D, 55D
It is composed of

The cores 54A and 55A are formed of a magnetic material into a substantially cylindrical shape.
B is supported. The core supporting members 54B and 55B
The core 54 is formed of a nonmagnetic material in a rod shape.
A, a core 54A penetrated through the inner peripheral portion of 55A and a central portion,
It supports 55A. The core supporting members 54B, 55
B has both ends supported by the support bases 54C and 55C, respectively.

The support bases 54C and 55C have their main surfaces formed in a substantially U-shape, and their base ends have the pressing force sensor substrate 53.
Are fixed with screws. Further, the supporting base 5
4C and 55C have core support members 54B and 55
B is supported.

As shown in FIG. 10, the coils 54D and 55D are located at both ends of the core supporting members 54B and 55B, and are wound around the primary coils 54E and 55E, respectively, and the cores 54A and 55A. Secondary coils 54F, 5
5F.

The coil holding members 54G and 55G are formed in a substantially rectangular block shape, and the base ends thereof are fixed to the press-contact force sensor substrate 53 by screws. The coil holding members 54G and 55G have coil holding grooves 5 having a substantially semicircular cross section.
4H and 55H are recessed.
H, 55H hold coils 54D, 55D.

Then, the first LVDT 54 and the second LDT
The VDT 55 includes primary coils 54E and 55E and secondary coils 54F and 55F, and core support members 54B and 55F.
A magnetic path including the cores 54A and 55A supported by B is formed. The first LVDT 54 is provided on the first detection piece 53R of the first detection unit 53P of the pressure contact sensor substrate 53,
The base end of the support base 54C is screwed and fixed, and the base end of the coil holding member 54G is screwed and fixed to the second detection piece 53S of the first detection unit 53R.

In the second LVDT 55, the base end of the support base 55C is fixed to the first detection piece 53T of the second detection portion 53Q of the pressure contact sensor substrate 53 by screwing.
The base end of the coil holding member 55G is screwed and fixed to the second detection piece 53U of the detection section 53Q.

The pressing force sensor 1 constructed as described above
The principle of detecting the pressing force when the buff 21 of the buff unit 5 is pressed against the head window hole 3E of the rotary drum 3B will be described with reference to FIGS. Note that the shaft support table 53C of the pressure sensor substrate 53 is
And the rotary drum 3B is regarded as an integral structure, and the pressing force applied to the rotary drum 3B by the pressed buff 21 acts on the center of the shaft support base 53C.

First, as shown in FIG. 11, the pressure contact sensor substrate 53 has the center of the shaft support 53C as a center point O2, and when a pressure contact force in a direction parallel to the X-axis direction is applied to the center point O2. The shaft support 53C is moved in a direction parallel to the X-axis direction. The press-contact force sensor substrate 53 includes a shaft support base 53.
As C is moved, the intermediate base 53B is moved in a direction parallel to the X-axis direction.

The press-contact force sensor substrate 53 includes an intermediate base 53
B is moved, the first intermediate base support piece 5
The 3F to fourth intermediate base support pieces 53I bend, respectively, and a relative displacement occurs between the first detection piece 53R and the second detection piece 53S of the first detection portion 53P.

That is, the pressure-contact force sensor substrate 53 is configured so that the first contact portion of the first detection portion 53P is proportional to the pressure-contact force applied to the center point O2 of the shaft support base 53C in a direction parallel to the X-axis direction.
A relative displacement amount N is generated between the point A of the detection piece 53R and the point B of the second detection piece 53S. Then, the first detection unit 53P
The first LVDT 54 disposed on the first detection piece 53
The relative displacement amount N generated between R and the second detection piece 53S is detected.

As shown in FIG. 12, when the pressing force in the direction parallel to the Y-axis direction is applied to the center point O2 of the shaft support 53C, the pressure support 53C It is moved in a direction parallel to the axial direction. The press-contact force sensor substrate 53 moves with the movement of the shaft support base 53C.
The intermediate base 53B is moved in a direction parallel to the Y-axis direction.

The pressing force sensor substrate 53 is
B is moved so that the first shaft support base support piece 5
The 3J to fourth shaft support base support pieces 53M bend, respectively, and a relative displacement occurs between the first detection piece 53T and the second detection piece 53U of the second detection unit 53Q.

That is, the pressure-contact sensor substrate 53 is configured such that the first contact portion of the second detection portion 53Q is proportional to the pressure-contact force applied to the center point O2 of the shaft support base 53C in a direction parallel to the Y-axis direction.
A relative displacement amount N is generated between the point C of the detection piece 53T and the point D of the second detection piece 53U. Then, the second detection unit 53Q
The second LVDT 55 disposed on the first detection piece 53
The relative displacement N generated between T and the second detection piece 53U is detected.

Next, the first LVDT 54 and the second LVDT
The VDT 55 is configured such that an AC voltage is applied to the primary side coils 54E and 55E, so that the secondary side coils 54F and 55
A voltage is induced at F. The output voltage of the first LVDT 54 and the second LVDT 55 is zero when the cores 54A and 55A are located at the center point O1, which is the reference position.

Then, the first LVDT 54 and the second L
The VDT 55 moves the cores 54A, 55A in the direction of the arrow (+) shown in FIG.
The output voltage increases in the (+) direction in proportion to the amount of movement of A,
When the cores 54A and 55A move in the direction of the arrow (-) shown in FIG. 10, the output voltage increases in the (-) direction in proportion to the amount of movement of the cores 54A and 55A.

Therefore, the first LVDT 54 and the second LVDT 54
The LVDT 55 detects relative displacement in the direction of the arrow shown in FIG. 10 based on the output voltage induced in the secondary coils 54F and 55F. That is, the pressing force sensor unit 15 is configured such that the points A and B of the first detecting unit 53P of the pressing force sensor substrate 53 are
The first LVDT 54 detects the relative displacement amount N generated at the second LVDT 54, and the second LVDT 54 detects the relative displacement amount N generated at the points C and D of the second detecting portion 53Q of the press-contact force sensor substrate 53.
55 detects.

Hereinafter, the first LVDT 54 and the second LVDT
The principle of detecting the pressing force applied to the rotary drum 3B by the buff 21 with respect to the DT 55 will be described with reference to FIGS. When actually performing the polishing process, the pressing force sensor substrate 53 is provided with the center point O2 of the shaft support base 53C,
As described above, not only a simple pressing force in a direction parallel to the X-axis direction or a simple pressing force in a direction parallel to the Y-axis direction is applied.

As shown in FIG. 13, the rotating drum 3B has a pressing force in the center direction of the rotating drum 3B acting on the bottom curved surface 3J of the head window hole 3E and a rotating force acting on the side curved surface 3I of the head window hole 3E. And the circumferential pressure of the drum 3B.

Further, since all the predetermined number of head window holes 3E formed in the outer peripheral portion of the rotary drum 3B are buffed, the rotation at an arbitrary point P (center angle θ) on the circumference of the rotary drum 3B is performed. It is necessary to detect the pressing force in the center direction of the drum 3B and the pressing force in the circumferential direction of the rotating drum 3B, respectively.

As shown in FIG. 14, the application of a pressing force F _C in the center direction of the rotating drum 3B to an arbitrary point P (center angle θ) on the circumference of the rotating drum 3B corresponds to all center angles θ. , The output voltage OU of the first LVDT 54
T _1C and the output voltage OUT _2C of the second LVDT 55 are a,
The b as coefficients, represented by OUT _1C = acosθF _C ··· Formula 1 OUT _2C = bsinθF _C ··· Equation 2.

Further, as shown in FIG.
At an arbitrary position P on the circumference of the B (center angle theta), it is performed applying a pressing force F _t in the circumferential direction of the rotary drum 3B for all angles theta, output voltage O of the first LVDT54
UT _1t and the output voltage OUT _2t of the second LVDT 55 are
When c and e are constants, and d and f are coefficients, OUT _1t = − (c + dcos θ) F _t Expression 3 OUT _2t = − (e + f cos θ) F _t Expression 4

Therefore, the rotary drum 3B shown in FIG.
A pressure contact force F _C center of the rotary drum 3 shown in FIG. 15
If B in the circumferential direction and a pressing force F _t were added simultaneously, first
Output voltage OUT ₁ of LVDT54 the second LVDT5
The output voltage OUT ₂ of _{5, OUT 1 = OUT 1C + OUT} 1t = acosθF C - (c + dsinθ) F t ··· Equation _{5 OUT 2 = OUT 2C + OUT} 2t = -bsinθF C - (e + fcosθ) F t ··· formula 6

Then, the rotary drum 3B is obtained from the equations 5 and 6.
Pressing force F _C center of the pressure contact force F _t in the circumferential direction of the rotary drum. _{3B, F C = {(e +} fcosθ) OUT 1 - (c + dsinθ) OUT 2} / (bcsinθ-aecosθ + bdsin 2 θ + afcos 2 θ) · a ... equation _{7 F C = (bsinθOUT 1 +} acosθOUT 2) / (bcsinθ + aecosθ + bdsin 2 θ + afcos 2 θ) ··· equation 8.

Therefore, the pressing force sensor 15 is expressed by the following equation (7).
As shown in Expression 8, the output voltage OUT _1C of the first LVDT 54 and the output voltage OUT _2C of the second LVDT 55 are used to calculate the rotation drum at an arbitrary point P (center angle θ) on the circumference of the rotation drum 3B. It is possible to detect a pressing force F _{C in} the center direction of the rotating drum 3B and a pressing force F _{t in} the circumferential direction of the rotating drum 3B.

The above-described pressing force sensor unit 15 is provided to the first LVDT 54 and the second LVDT 54 by the first detecting unit 53P and the second detecting unit 53Q provided on the pressing force sensor substrate 53.
The LVDTs 55 are respectively arranged. However, if necessary, the detection unit and the LVDTs
Pressure contact sensor substrate 7 configured to change the number of
3, 74, 75, and 76 will be described with reference to FIGS.

As shown in FIG. 16, the pressing force sensor substrate 73 includes an annular base 73A and a substantially rectangular shaft support base 73B located on the inner peripheral side of the base 73A. ing. The shaft support base 73B includes a first shaft support base support piece 73F and a second shaft support base support piece 73G, each of which has a substantially linear outer peripheral part, which are parallel to each other. Are supported by the shaft support base support piece 73H and the fourth shaft support base support piece 73I.

Further, the pressure contact sensor substrate 73 has a detecting portion 73P formed between the inner peripheral portion of the base portion 73A and the outer peripheral portion of the shaft support base portion 73B. The detecting portion 73P includes a first detecting piece 73R integrally formed on an inner peripheral portion of the base portion 73A and a second substantially rectangular second portion integrally formed on an outer peripheral portion of the shaft support base 73B. And a detection piece 73S. The first detection unit 73P is provided with a first LVDT (not shown).

According to the pressing force sensor substrate 73, the pressing force in the X-axis direction and the pressing force in the Y-axis direction acting on one point of action and the moment about the Z axis acting on an arbitrary point of action can be detected. .

As shown in FIG. 17, the pressure contact sensor substrate 74 includes an annular base 74A and the base 74A.
And a substantially rectangular shaft support base 74B located on the inner peripheral side of the shaft support base 74B. The shaft support base 74B includes a first shaft support base support piece 74F and a second shaft support base support piece 74G, each of which has an outer periphery parallel to each other, in the inner circumference of the base 74A. Shaft support base support piece 74H and fourth shaft support base support piece 7
4I.

Further, the pressing force sensor board 74 is provided between the inner peripheral portion of the base portion 74A and the outer peripheral portion of the shaft support base portion 74B.
The first detection unit 74P and the second detection unit 74Q are formed so that their center lines are aligned. First detector 74
P is a first detection piece 74R integrally formed on the inner peripheral portion of the base portion 74A and a substantially rectangular second detection piece 74S integrally formed on the outer peripheral portion of the shaft support base 74B. It is composed of The second detection unit 74Q includes a base 74A.
Detecting piece 74T formed integrally with the inner peripheral portion of
And a second detection piece 74U of a substantially rectangular shape which is integrally formed on the outer periphery of the shaft support base 74B.
Then, the first detector 74P and the second detector 7
4Q includes a first LVDT and a second LVD (not shown).
T are provided respectively.

According to the pressure contact sensor substrate 74, the pressure contact force in the X-axis direction and the Y-axis direction acting on one point of action and the moment about the Z axis acting on an arbitrary point of action can be detected. . The pressure contact sensor substrate 74 is provided with the first LV
DT and the second LVDT are output voltages OUT ₁ , OUT ₂
Are output, the pressing force in the X-axis direction is (OUT ₁ −OUT ₂ ) / 2. The pressing force in the Y-axis direction is (OUT ₁ + OUT ₂ ) / 2. Further, the moment about the Z axis is (OUT ₁ + OUT ₂ ) / 2. For this reason, the pressing force sensor substrate 74 reduces noise of the pressing force detection signal as compared with the pressing force sensor substrate 73, and the detection accuracy is improved.

Further, the pressing force sensor substrate 75 is
As shown in the figure, an annular base 75A and this base 75
A substantially rectangular annular intermediate base portion 75B located on the inner peripheral side of A
And a substantially rectangular shaft support portion 75C located on the inner peripheral side of the intermediate base portion 75B. The intermediate base portion 75B is provided on the inner peripheral portion of the base portion 75A with a first intermediate base support piece 75F, a second intermediate base support piece 75G, and a third intermediate base which are substantially linear and parallel to each other. It is supported by the support piece 75H and the fourth intermediate base support piece 75I. The shaft support base portion 75C is such that, at the inner peripheral portion of the intermediate base portion 75B, each corner portion is orthogonal to and parallel to the first intermediate base portion support piece 75F to the fourth intermediate base support piece 75I. It is supported by a substantially linear first shaft support base support piece 75J and second shaft support base support piece 75K, a third shaft support base support piece 75L, and a fourth shaft support base support piece 75M.

In the pressing force sensor substrate 75, a first detecting portion 75P and a second detecting portion 75Q are respectively provided between the inner peripheral portion of the base portion 75A and the outer peripheral portion of the intermediate base portion 75B. The third detecting portion 75R is formed between the inner peripheral portion of the intermediate base portion 75B and the outer peripheral portion of the shaft support base portion 75C. First detector 75P and second detector 7
5Q is a substantially rectangular first detection piece 75R, 75T integrally formed on the inner periphery of the base end portion 75A, and a substantially rectangular shape formed integrally on the outer periphery of the intermediate base portion 75B. Second
And the detection pieces 75S and 75U. The third detection unit 75N is formed so as to protrude integrally with the substantially rectangular first detection piece 75V integrally formed on the inner periphery of the intermediate base 75B, and is formed integrally with the outer periphery of the shaft support base 75C. And a substantially rectangular second detection piece 75W. The first to third detection units 75P to 75N include:
First to third LVDTs (not shown) are provided.

According to the press contact force sensor board 75, the press contact force in the X-axis direction, the press contact force in the Y-axis direction, and the moment around the Z axis can be detected. The pressing force sensor substrate 75 detects the pressing force in the X-axis direction and the pressing force in the Y-axis direction by the first LVDT 54 and the second LDT.
The VDT 55 and the VDT 55 are almost the same as the press-contact force sensor substrate 53 disposed at a position where the center lines are perpendicular to each other, but there are two combinations of LVDTs disposed at positions where the center lines are perpendicular to each other. The moment about the Z axis is the first L
VDT to the third LVDT are output voltages OUT ₁ and OUT
Assuming that ₂ and OUT ₃ are to be output, respectively, (OUT ₁ + OUT ₂ + OUT ₃ ) / 3. Therefore, the pressing force sensor substrate 75 can reduce noise of the pressing force detection signal and further improve the detection accuracy.

Further, as shown in FIG. 19, the pressure contact sensor substrate 76 has an annular base 76A and a substantially rectangular annular intermediate base 76 located on the inner peripheral side of the base 76A.
B and a substantially rectangular shaft support base 76C located on the inner peripheral side of the intermediate base 76B. The intermediate base portion 76B is provided on the inner peripheral portion of the base portion 76A with a first intermediate base support piece 76D, a second intermediate base support piece 76E, and a third intermediate base, which are substantially linear and parallel to each other. It is supported by the support piece 76F and the fourth intermediate base support piece 76G. The shaft support base portion 76C is such that, at the inner peripheral portion of the intermediate base portion 76B, each corner portion is orthogonal to the first intermediate base portion support piece 76D to the fourth intermediate base support piece 76G and parallel to each other. It is supported by a substantially linear first shaft support base support piece 76H, second shaft support base support piece 76I, third shaft support base support piece 76J, and fourth shaft support base support piece 76K.

[0124] The pressing force sensor substrate 76 has a first detecting portion 76L and a second detecting portion 76M between the inner peripheral portion of the base portion 76A and the outer peripheral portion of the intermediate base portion 76B. The third detection unit 76N and the fourth detection unit 76O are formed between the inner peripheral portion of the intermediate base 76B and the outer peripheral portion of the shaft support base 76C. The first detection unit 76L and the second detection unit 76M include a base end 76A.
The first detection pieces 76P and 76R of a substantially rectangular shape integrally formed on the inner periphery of the first base plate and the second detection piece 76Q of a substantially rectangular shape integrally formed on the outer periphery of the intermediate base 76B. , 76
S. The third detector 76N and the fourth detector
Are substantially rectangular first detecting pieces 76T and 76V formed integrally with the inner peripheral portion of the intermediate base 76B.
And second detection pieces 76U and 76W having a substantially rectangular shape and formed integrally with the outer periphery of the shaft support base 76C. The first to fourth detection units 76L to 76O include first to fourth LVDTs to
Of LVDTs are provided respectively.

According to the pressing force sensor substrate 76, the pressing force in the X-axis direction, the pressing force in the Y-axis direction, and the moment around the Z-axis acting on an arbitrary point of action can be detected. The pressing force sensor board 76 detects the pressing force in the X-axis direction and the pressing force in the Y-axis direction by the first LVDT 54 and the second LDT.
The VDT 55 and the VDT 55 are almost the same as the pressure-contact force sensor substrate 53 arranged at positions where the center lines are orthogonal to each other, but there are four combinations of LVDTs arranged at positions where the center lines are orthogonal to each other. The moment about the Z axis is the first L
VDT to the fourth LVDT are output voltages OUT ₁ and OUT
₂ , OUT ₃ and OUT ₄ are respectively output as (OUT ₁ + OUT ₂ + OUT ₃ + OUT ₄ ) / 4. For this reason, the pressing force sensor substrate 76 can reduce noise of the pressing force detection signal and further improve the detection accuracy.

[9] Position Sensor Unit The position sensor unit 16 includes a first encoder 41 connected to the drum driving motor 40, a second encoder 47 connected to the table driving motor 45, and a buffer. Third encoder 4 connected and wired to drive motor 23
8 is provided.

In the position sensor section 16, the first encoder 41 and the second encoder 47 measure the rotation angles of the drum driving motor 40 and the table driving motor 45, respectively. Each is output as a signal. Further, the third encoder 48 outputs the rotation speed (rpm) of the buff drive motor 23 to the control unit 18 as a rotation speed detection signal.

[10] Configuration of the Control Unit As shown in FIG.
7, a drum driving motor driver 58 for driving the drum driving motor 40, a table driving motor driver 59 for driving the table driving motor 45, and a pressing force sensor amplifier for amplifying a signal from the pressing force sensor unit 15. 60, a buff positioning mechanism controller 61 for controlling the buff positioning mechanism 7, and a drum transport mechanism controller 62 for controlling the drum transport mechanism 9.

The control device 57 is, for example, various computers such as a personal computer, and is connected and connected to the pressure contact force sensor unit 15 and the position sensor unit 16, respectively. In addition, in the control device 57, external dimension data of a plurality of types of rotary drums 3B to be subjected to the buffing process are recorded in advance.

The drum driving motor driver 58 is connected to the control device 57 and the drum driving motor 40, respectively. The table driving motor driver 59 is
The control device 57 and the table driving motor 45 are connected to each other. The drum driving motor driver 58 and the table driving motor driver 59
, Command voltages V1 and V2 output from the control device 57 are input.

The drum driving motor driver 58 and the table driving motor driver 59 operate such that the drum driving motor 40 and the table driving motor 45 generate torques corresponding to the command voltages V1 and V2, respectively. Of electric power E1, E2 to the motors 45, 40, respectively.

The pressing force sensor amplifier 60 includes a controller 57
And the pressure contact force sensor unit 15. This pressure contact force sensor amplifier 60
5 is amplified and output to the control device 57 as a pressing force information signal H1.

The positioning mechanism controller 61 is connected and connected to the control device 57 and the buff positioning mechanism 7, respectively. The positioning mechanism controller 61 outputs the power E3 and the command signal H4 based on the command signal H2 input from the control device 57 to operate the buff positioning mechanism 7.

The transport mechanism controller 62 includes the control device 5
7 and the drum transport mechanism 9. The transport mechanism controller 62 outputs the electric power E4 and the command signal H5 based on the command signal H3 input from the control device 57 to operate the drum transport mechanism 9.

Therefore, the control unit 18 controls the control device 57
Are connected to the buff positioning mechanism 7, the table moving mechanism 8 and the drum transport mechanism 9, respectively, and control the buff positioning mechanism 7, the table moving mechanism 8 and the drum transport mechanism 9, respectively.

With respect to the control unit 18 configured as described above, a specific control method for the drum driving motor 40 of the chucking unit 6 and the table driving motor 45 of the table moving mechanism 8 will be described with reference to FIGS. Will be explained.

This control method is, as shown in FIG. 21, a control for the drum driving motor 40 and the table driving motor 45. The target pressing force is applied to the drum driving motor 40 and the table driving motor 45. The pressing force control to be applied and the position control for positioning the target position are appropriately switched.

The pressing force sensor section 15 outputs a pressing force detection signal F to the pressing force control arithmetic circuit 64 according to the amount of displacement of the pressing force sensor substrate 53. The pressing force control calculation circuit 64
As shown in FIG. 22, the head window hole 3E of the rotary drum 3B
In order to _{apply the} target pressure force _Fcmd to the pressure control signal F, a control operation is performed by feeding back the pressure force detection signal F output from the pressure force sensor unit 15.

[0139] That is, pressing force control calculation circuit 64, a value obtained by integrating the deviation proportional gain K _FP and outputted contact pressure detection signal F and the target pressing force F _cmd from contact pressure sensor 15, drum drive A first and a second encoder 41 connected and wired to the motor 40 and the table driving motor 45;
The target acceleration q ″ _{cmd is calculated} by adding the damping coefficient K _Fd to the speed q ′ obtained from the encoder signal of No. 47.
Is calculated.

The first and second encoders 41 and 47 of the position sensor section 16 detect the relative position between the rotary drum 3B and the buff 21 and output a position detection signal q to the position control arithmetic circuit 65. I do. The position control arithmetic circuit 65
As shown in FIG. 23, the rotary drum 3B is moved to the target position q _cmd.
The first and second encoders 4
The control calculation is performed by feeding back the position detection signal q from 1, 47.

That is, the position control arithmetic circuit 65 is provided with a position detection signal q obtained from the encoder signals of the first and second encoders 41 and 47 connected and wired to the drum driving motor 40 and the table driving motor 45. Target position q
_The target acceleration q ″ is obtained by the acceleration of the target value and the value obtained by adding the proportional gain K _Pd and the differential gain K _Pp to the deviation from _{cmd.
Operate cmd} . Then, the pressing force control calculation circuit 64 and the position control calculation circuit 65 output the calculated target acceleration q ″ _cmd to the control mode switching circuit 66, respectively.

The control mode switching circuit 66 selects one of the target acceleration q ″ _cmd obtained by the pressing force control arithmetic circuit 64 or the position control arithmetic circuit 65 according to the control method determined according to the operation purpose. Thus, the target accelerations of the drum driving motor 40 and the table driving motor 45 are set.

The torque compensation calculation circuit 67 is a so-called disturbance estimator, and removes the influence of disturbance and the influence of modeling errors. That is, the torque compensation calculation circuit 67
As shown in FIG. 24, acceleration q ″ obtained from encoder signals output from the first and second encoders 41 and 47 connected and wired to the drum driving motor 40 and the table driving motor 45 and the commanded acceleration q ″ _ref , the disturbance acceleration q ″ _dis is estimated using the secondary filter 70,
In addition to the target acceleration q ″ _cmd , a command acceleration q ″ _ref is obtained through the limiter 71 in order to prevent saturation of the motor output. The transfer function of the secondary filter 70 is g ² / (S ² + 2ζgS, where the attenuation coefficient ζ and the natural frequency g are g.
+ G ² ).

Further, the torque compensation calculation circuit 67 calculates the current command value I _ref from the nominal value K _tn of the torque constant and the nominal value J _n of the load inertia of the drum driving motor 40 and the table driving motor 45. .

The above-described drum driving motor driver 58 and table driving motor driver 59 include a torque generating circuit 68. This torque generating circuit 68
Is the command voltage V output from the torque compensation operation circuit 67.
1, electric powers E1 and E2 are supplied to the drum driving motor 40 and the table driving motor 45 based on V2.

Accordingly, the chucking section 6 rotates the rotating drum 3B by rotating the drum driving motor 40 with the electric power E1 supplied from the torque generating circuit 68. The table moving mechanism 8 moves the table 43 by rotating the table driving motor 45 with the electric power E2 supplied from the torque generating circuit 68.

[0147] In the automatic buffing apparatus 1 configured as described above, the buff 21 is attached to the head window hole 3 of the rotary drum 3B.
FIG. 25 shows a polishing procedure for buffing E and a polishing operation.
29 will be described with reference to FIG.

First, the automatic buffing apparatus 1 performs step S
As shown in T1, by specifying the type of the rotary drum 3B for performing the buffing process on the control device 57 of the control unit 18, the rotary drum 3B for performing the buffing process on the head window 3E is selected and determined. That is, the automatic buffing device 1
Can perform the buffing process based on the shape data of the rotating drum 3B recorded in the control device 57 in advance.

[0149] As shown in step ST2, the automatic buffing apparatus 1 rotates the rotary drum 3B on which the buffing is performed.
Is transported from the pallet 9A to the chucking section 6 by the drum transport mechanism 9. The automatic buff polishing apparatus 1 moves the rotary drum 3B to a position facing the head window detection sensor 27 by moving the table 43 of the chucking unit 6 by the table moving mechanism 8 as shown in step ST3.

In addition, the automatic buff polishing apparatus 1 performs step S
As shown at T4, based on the shape data of the rotating drum 3B recorded in the control device 57, the head window detecting sensor 2 is located at a position where the head window 3E of the rotating drum 3B is detected.
7 is moved. Therefore, as shown in FIG. 3, the head window detection sensor 27 is moved to a position facing the head window 3E of the rotating drum 3B.

Then, as shown in step ST5, the automatic buffing apparatus 1 rotates the rotary drum 3B once along the outer peripheral portion, thereby detecting the head window hole detecting sensor 27 corresponding to the rotational position of the rotary drum 3B. The number, position, and width of the head window holes 3E are detected from the detection results of the detection light.

The automatic buff polishing apparatus 1 moves the buff section 5 toward the polishing position by moving the buff positioning mechanism 7 as shown in step ST6.
Therefore, the buff portion 5 is moved to a position facing the head window 3E of the rotating drum 3B as shown in FIG.

Then, as shown in step ST7, the automatic buffing apparatus 1 sets the head window hole 3E of the rotating drum 3B.
When polishing the position of the table 43 of the chucking unit 6
To move. The automatic buff polishing apparatus 1 slides the rotary drum 3B in the direction T shown in FIG. 26 by moving the table 43 and presses the rotary drum 3B against the buff 21 of the buff section 5. In addition, the automatic buffing apparatus 1 includes a rotating drum 3
When B is moved in the T direction, the buff portion 5 has a head window hole 3E.
The rotary drum 3B is rotationally moved so as to abut.

Next, as shown in step ST8, the automatic buffing apparatus 1 sets the head window hole 3E of the rotary drum 3B.
Buffing is performed by the buff 21 pressed against the baffle. After buffing the head window 3E of the rotating drum 3B, the automatic buffing apparatus 1 determines whether to buff another head window 3E of the same rotating drum 3B as shown in step ST9.

The automatic buffing apparatus 1 has another head window hole 3
When buffing E, the process returns to step ST7. Also,
The automatic buffing apparatus 1 determines whether or not to buff the other head window hole 3E or to terminate the buffing process, in step S.
The process moves to T10. The automatic buffing apparatus 1 performs step S
As shown at T10, the drum transport mechanism 9 transports the buffed rotary drum 3B from the chucking section 6 to the pallet 9A.

In the automatic buffing apparatus 1, the outer peripheral portion of the buff 21 is gradually worn and its shape is lost in accordance with the buffing of the head window 3E of the rotary drum 3B. For this reason, as shown in step ST11, the automatic buffing apparatus 1 performs a dressing process for adjusting the shape of the buff 21 as necessary, for example, once for each buffing of the rotary drum 3B.

That is, the automatic buffing apparatus 1 rotates the buff 21 by the buff driving motor 23,
The buff positioning mechanism 7 moves the buff section 5 to the dressing section 12. Then, the automatic buff polishing apparatus 1
Is brought into pressure contact with the dresser 12A of the dressing portion 12, whereby the outer peripheral portion of the buff 21 is ground and shaped.

The automatic buffing apparatus 1 needs to detect the radius of the buff 21 in order to perform dressing, but it is calculated from the contact position between the rotary drum 3B and the buff 21, which will be described later. Further, as shown in step ST11, the automatic buff polishing apparatus 1 presses the buff 21 against the abrasive contained in the abrasive
1 is coated with an abrasive.

Then, as shown in step ST12, the automatic buffing apparatus 1 determines whether the next rotating drum 3B should be continuously buffed. If the automatic buffing apparatus 1 continuously buffs the next rotating drum 3B, the automatic buffing apparatus 1 performs step S
Return to T2. In addition, the automatic buffing apparatus 1 uses the rotating drum 3B when the next rotating drum 3B is not continuously buffed.
Buffing is completed.

In the automatic buffing apparatus 1, the buff 21 wears as the buffing is performed, so that the diameter of the buff 21 gradually decreases, and the contact angle between the rotary drum 3B and the buff 21 changes. Resulting in. The buff 21 finally has a smaller diameter dimension,
There is an inconvenience of passing without being pressed against the rotating drum 3B.

For this reason, after detecting the position of the head window hole 3E of the rotary drum 3B for performing the buffing process, the automatic buffing device 1 performs the following steps ST7 onward as shown in FIGS. For example, one rotating drum 3B
The position of the buff 21 is corrected as needed, such as once before buffing.

The automatic buffing apparatus 1 starts the process in step ST21.
It is determined whether the position of the buff 21 is to be corrected as shown in FIG. When the position of the buff 21 does not need to be corrected, the automatic buff polishing apparatus 1 proceeds to step ST27 to be described later and performs the buff polishing.

In the automatic buffing apparatus 1, the rotation direction is controlled by the drum driving motor 40 to fix the rotating drum 3B at the polishing position. In addition, the automatic buff polishing apparatus 1 controls the pressing force in a direction (hereinafter, referred to as a translation direction) in which the table driving motor 45 comes in contact with and separates from the buff 21, and for example, a target pressing force F of about 100 g.
_cmd is set and the rotary drum 3B is pressed.

[0164] First, the rotating drum 3B is not in contact with buff 21, as shown in step ST22, in order to obtain the target pressing force F _cmd that is set, is moved toward the buff 21. When the rotating drum 3B is pressed against the buff 21, the automatic buffing apparatus 1 prevents the rotating drum 3B and the buff 21 from colliding with each other due to a high moving speed of the rotating drum 3B. The coefficient K _Fd is set to an appropriate value.

[0165] The automatic buff polishing apparatus 1 executes the process in step ST23.
As shown in FIG. 5, the rotating drum 3B and the buff 21
Is determined.

Then, when the rotary drum 3B and the buff 21 contact each other, the automatic buffing apparatus 1 records the contact position between the rotary drum 3B and the buff 21 in the control device 57 of the control unit 18. After recording the contact position between the rotary drum 3B and the buff 21, the automatic buff polishing apparatus 1 reduces the damping coefficient K _Fd by applying a pressing force in the reverse direction. Therefore, the automatic buffing apparatus 1 sets the pressing force in the reverse direction, thereby moving the rotary drum 3B backward in a direction away from the buff 21 as shown in step ST24, and moving the rotary drum 3B Pull away from quickly.

Further, the automatic buffing apparatus 1 performs step S
At T24, as shown in FIG.
From the buff 21. First, as shown in step ST24A, the automatic buff polishing apparatus 1 determines whether or not there is a command to move the rotary drum 3B away from the buff 21 to operate.

When there is a command to move the rotary drum 3B away from the buff 21, the automatic buff polishing apparatus 1 sets the damping coefficient K _Fd to K _Fd = 0 as shown in step ST24B. Then, the automatic buffing apparatus 1 resets the value of the target pressing force _Fcmd for controlling the pressing force in the opposite direction. That is, the target pressing force _Fcmd is set to _Fcmd <0.

The automatic buffing apparatus 1 starts the process in step ST24.
As shown in C, it is determined whether the rotating drum 3B has been moved to a predetermined position. When the rotating drum 3B has been moved to the predetermined position, the automatic buffing apparatus 1 proceeds to step ST24.
As shown in D, the damping coefficient K _Fd is increased. Then, the automatic buffing apparatus 1 sets the value of the target pressing force _Fcmd for controlling the pressing force in the reverse direction again. That is,
The target pressing force F _cmd is: F _cmd ≧ 0 The automatic buffing apparatus 1 determines whether the moving speed of the rotary drum 3B has reached a predetermined value as shown in step ST24E. Then, the automatic buffing apparatus 1 includes the rotating drum 3
If B has reached the predetermined moving speed, step ST24F
It is confirmed that the rotary drum 3B has been stopped by the position control as shown in FIG.

That is, the automatic buff polishing apparatus 1 moves the rotary drum 3B backward from the buff 21 at a relatively high speed, and after the rotary drum 3B is separated from the buff 21 by a predetermined distance, The damping coefficient K _Fd is increased by applying a pressing force in the direction of pressing the 3B. Then, when the moving speed of the rotating drum 3B becomes sufficiently low, the automatic buffing apparatus 1 switches from the pressing force control to the position control and fixes the position of the rotating drum 3B.

On the other hand, the automatic buff polishing apparatus 1
As shown in T25, the diameter of the buff 21 is calculated based on the contact position between the rotary drum 3B and the buff 21 recorded in the control device 57 of the control unit 18.

Further, the automatic buff polishing apparatus 1 has a buff 21
By controlling the number of revolutions of the buff drive motor 23 in accordance with the amount of change in the diameter of the buff 21, the peripheral speed of the outer peripheral portion of the buff 21 that changes with the change in the diameter of the buff 21 can be kept constant. It is possible.

The automatic buffing apparatus 1 is based on the diameter of the buff 21 determined in step ST25 so that the rotating drum 3B and the buff 21 are brought into contact with each other at a contact angle recorded in the control device 57 in advance. Then, the buff positioning mechanism 7 is moved. That is, the automatic buff polishing apparatus 1 corrects the position of the buff 21 by moving the buff positioning mechanism 7 to move the buff unit 5 as shown in step ST26.

Next, the automatic buffing apparatus 1 performs a buffing process on the head window 3E of the rotary drum 3B. In addition,
When the position of the buff 21 is not corrected, the automatic buff polishing apparatus 1 performs the buff polishing of the head window hole 3E after the positioning of the head window hole 3E of the rotary drum 3B is completed in Step ST7.

The automatic buffing apparatus 1 starts the process in step ST27.
As shown in step ST28 and in step ST28, the rotating drum 3B
Head window hole 3E and buff 21 are brought into contact with each other.

The control device 57 of the control section 18 records the position P1 at which the buff 21 abuts on the head window 3E of the rotary drum 3B. After the buff 21 comes into contact with the head window hole 3E, the automatic buff polishing apparatus 1
Pressing force control for applying a predetermined pressing force of, for example, about 30 to 50 gf is performed in the rotation direction in which the position with respect to the angle is fixed by the position control.

Thus, the rotary drum 3B is rotated with the buff 21 pressed against the bottom of the head window 3E. The automatic buffing apparatus 1 adjusts the rotation speed of the rotating drum 3B by setting the damping coefficient K _Fd to a predetermined value. Further, the automatic buffing apparatus 1 detects the circumferential pressing force detection signal F acting on the outer peripheral portion of the rotary drum 3B, and, based on the amount of change of the pressing force detection signal F, as shown in step ST30, The contact state between the side surface of the head window hole 3E of the rotating drum 3B and the buff 21 is determined.

After the buff 21 comes into contact with the side surface of the head window hole 3E of the rotary drum 3B, the automatic buff polishing apparatus 1 sets the pressure contact force in the rotation direction to the reverse direction as shown in step ST31. Rotate 3B in the opposite direction. Then, as shown in step ST32, the automatic buffing apparatus 1 rotates the rotating drum 3 in the same manner as in step ST28 described above.
The contact state between the side surface of the head window hole 3E of B and the buff 21 is determined.

Further, as shown in step ST33, the automatic buffing apparatus 1 moves the head window hole 3 of the rotary drum 3B.
If the bottom of E is to be continuously buffed, the rotating drum 3
B and the side surface of the head window hole 3E, and then the step S
Return to T31. In addition, when the automatic buffing device 1 ends the buffing process on the bottom portion of the head window hole 3E of the rotating drum 3B, the process proceeds to step ST34. That is, the rotation drum 3B shown in FIG.
The bottom surface side curved surface 3J of the head window hole 3E of B is formed.

Then, as shown in step ST34, the automatic buffing apparatus 1 sets the position P2 to the position P2 slightly retreated in the translation direction with respect to the position P1, and controls the position in both the translation direction and the rotation direction. To move the rotary drum 3B to the position P2.

[0181] The automatic buffing apparatus 1 starts the process in step ST35.
As shown in step ST29, as in step ST29 described above, with the translation direction of the rotating drum 3B fixed by position control, the rotating drum 3B is controlled by pressing force control only in the rotating direction.
To rotate. That is, when the rotating drum 3B is rotated by the pressing force control, the translation direction control remains the position control, and the buff 21 and the bottom side curved surface 3E of the head window hole 3E.
Since there is almost no contact with J, the bottom surface side curved surface 3J of the head window hole 3E is not polished after step ST35.

Then, the automatic buffing apparatus 1 determines the contact state between the buff 21 and the side surface of the head window hole 3E of the rotary drum 3B from the pressing force detection signal F, as shown in step ST36. After the buff 21 and the side surface of the head window hole 3E of the rotating drum 3B abut on each other, the automatic buff polishing apparatus 1 contacts the buff 21 with the side surface of the head window hole 3E for several seconds as shown in step ST37. Keep state. For this reason, as shown in FIG. 33, the rotary drum 3B has a head window hole 3E.
Upper surface 3H, lower surface 3K, and side surface 3I
Are respectively formed.

Next, as shown in step ST38, the automatic buffing apparatus 1 sets the pressure contact force in the rotating direction to the reverse direction and rotates the rotating drum 3B in the reverse direction, as in step ST31 described above. For this reason, the rotating drum 3B
Is rotated in the opposite direction so that the buff 21 comes into contact with the side surface of the head window hole 3E.

[0184] The automatic buffing apparatus 1 starts the process in step ST39.
As shown in (1), the contact state between the buff 21 and the side surface of the head window hole 3E of the rotating drum 3B is determined from the pressing force detection signal F. The automatic buffing apparatus 1 includes a buff 21 and a rotating drum 3B.
After contact with the side surface of the head window hole 3E of step ST
As shown in FIG. 40, the buff 21 is moved through the head window hole 3E for several seconds.
And keep it in contact with the side. For this reason, the rotating drum 3
In B, the side surface opposite to the side surface buffed in step ST37 described above is buffed.

[0185] The automatic buff polishing apparatus 1 executes the process in step ST40.
, The buffing is once ended, and as shown in step ST41, the position in the rotation direction is fixed, and the rotating drum 3B is moved backward as in step ST24. Then, the automatic buff polishing apparatus 1 proceeds to step ST9. That is, the automatic buffing apparatus 1 controls the drum driving motor 40 and the table driving motor 45 while appropriately switching between the pressing force control and the position control.

As described above, the automatic buff polishing apparatus 1 according to the embodiment, after the polishing of the head window hole 3E of the rotating drum 3B is completed,
The head window hole 3E of the rotary drum 3B in the pressure contact state with the buff 21 can be retracted to a predetermined position while controlling the pressure contact force. Therefore, the automatic buffing device 1
After the polishing, the head window hole 3E of the rotary drum 3B is retracted to a predetermined position with respect to the buff 21 to switch from the pressing force control to the position control, so that the pressing force is not instantaneously released. Stabilization is achieved and highly accurate buff polishing can be automated.

Further, in the automatic buffing apparatus 1 of the embodiment, the control unit 18 controls the head window hole 3E of the rotary drum 3B and the buff 21 based on the amount of change in the pressing force detection signal F detected by the pressing force sensor unit 15. The diameter of the buff 21 is calculated from the position where the abutment is made. Then, the automatic buff polishing apparatus 1 corrects the buff position by moving the buff 21 by the buff positioning mechanism 7 so that the head window hole 3E of the rotary drum 3B and the buff 21 come into contact with each other at a preset angle. Do. Therefore, even if the buff 21 is worn due to the buffing and the diameter is reduced, the automatic buffing device 1
The buff 21 can be pressed against the head window hole 3E of B at a fixed angle. That is, the automatic buffing device 1
Buff 21 with respect to the head window hole 3E of the rotating drum 3B.
Is pressed at a fixed angle, stabilization of processing quality is achieved, and highly accurate buff polishing can be automated.

Further, in the automatic buffing apparatus 1 of the embodiment, when the buffing is performed on the head window hole 3E of the rotary drum 3B, the abrasive application section 14 can automatically supply the abrasive to the buff 21. Therefore, the automatic buffing apparatus 1 automatically stabilizes the processing quality and automatically automates the buffing with high accuracy by automatically managing the amount of the abrasive applied to the buff 21.

Example Automatic Buffing Apparatus 1
The controller 18 controls the drum driving motor 40 and the table driving motor 45 by appropriately switching between the pressing force control and the position control. For this reason, when buffing the head window hole 3E of the rotary drum 3B, the automatic buff polishing apparatus 1 can always keep the relative position between the head window hole 3E and the buff 21 and the pressure contact force constant.

The automatic buffing apparatus 1 has a control unit 18
The control mode switching circuit 66 of FIG.
0 and the table drive motor 45, the position control and the pressing force control according to the upper end curved surface 3H, the side curved surface 3I, the bottom curved surface 3J, and the lower curved surface 3K of the head window hole 3E of the rotary drum 3B. Are controlled as appropriate. Therefore, the automatic buff polishing apparatus 1 is capable of performing high-precision buff polishing on the head window hole 3E of the rotary drum 3B, and stabilizes processing quality.

Further, since the automatic buffing apparatus 1 includes the head window detection sensor 27, only the shape data such as the diameter and height of the rotary drum 3B is required. It is not necessary to previously record window hole data such as the number, position, and width of 3E.
Furthermore, in the automatic buffing apparatus 1, since the head window detection sensor 27 detects the position of the head window 3E of the rotary drum 3B, it is not necessary to position the rotary drum 3B with high precision, and the positioning is easy. can do.

The automatic buffing apparatus 1 according to the present embodiment
After the polishing of the head window hole 3E of the rotary drum 3B is completed, the control unit 18 retreats the head window hole 3E of the rotary drum 3B with respect to the buff 21 while controlling the pressing force to a predetermined position. Buff 21 against head window hole 3E
May be moved backward while controlling the pressing force to a predetermined position.

Further, the automatic buffing apparatus 1 of the embodiment uses a buff drive motor 23 to calculate the diameter of the buff 21.
Although the configuration provided with the third encoder 48 for measuring the rotation speed of the buff 21 may be employed, for example, by arranging a displacement sensor at a position facing the buff 21 to directly obtain the diameter dimension of the buff 21. In this displacement sensor, for example,
It is preferable to employ a non-contact type displacement sensor using laser light or ultrasonic waves.

Furthermore, even if the head window hole 3E of the rotary drum 3B is formed in another window hole shape such as an elliptical shape, the automatic buff polishing apparatus 1 according to the present embodiment can determine the shape of the buff 21 and the conditions such as the operation program. It can be easily handled by changing.

Example Automatic Buffing Apparatus 1
Although a rotary drum was used as an object to be polished, the present invention is not limited to a rotary drum, and is suitable for use in buffing a cylindrical mold or the like.

[0196]

As described above, the position control apparatus according to the present invention comprises a moving means for moving the first object and the second object toward and away from each other, and the first object and the second object. A position detecting section for detecting a relative position of the first object, a pressing force detecting section for detecting a pressing force between the first object and the second object in a pressing state, and a position detecting signal detected by the position detecting section. And a control unit that drives the moving unit based on the pressing force detection signal detected by the pressing force detection unit and performs position control and pressing force control of the first target object and the second target object, The control unit is configured to calculate a damping coefficient for calculating an acceleration of the moving means in the pressing force control while continuing the pressing force control on one of the first object and the second object in the pressing state. The first object and the second object by making When the pressure contact state is released and one of them is retracted to a predetermined position with respect to the other, a pressure contact force is applied in a direction toward zero or toward the other object and the damping coefficient is made larger than a predetermined value. By reducing the moving speed of the one target object, and further, when the moving speed of the one target object with respect to the other target object becomes smaller than a predetermined value, switching from the pressing force control to the position control, the one of the one object By stopping the object, one of the first object and the second object can be retreated to a predetermined position while controlling the pressing force against the other. Therefore, the position control device is configured to be able to switch from the press-contact force control to the position control by retreating one object with respect to the other object.

Further, according to the automatic buff polishing apparatus provided with the position control device according to the present invention, the moving means for moving the head window hole and the buff of the rotary drum into and out of contact with each other from the pressed state, and the head of the buff and the rotary drum. A position detecting unit that detects a relative position with respect to the window hole, and a pressing force detecting unit that detects the pressing force of the buff pressed against the head window hole of the rotating drum,
The moving unit is driven based on the position detection signal detected by the position detection unit and the pressure detection signal detected by the pressure detection unit to perform position control and pressure control of the head window hole of the rotary drum and the buff. And a position control device comprising a control unit, wherein the control unit controls the pressing force control while continuing the pressing force control on one of the head window hole and the buff of the rotating drum in the pressing state. When the pressure contact state between the head window hole and the buff is released by making the damping coefficient for calculating the acceleration of the moving means smaller than a predetermined value, and when one of the head window holes and the other is retracted to the predetermined position, the pressure contact A force is applied in a direction toward zero or the other and the damping coefficient is made larger than a predetermined value to reduce the moving speed of the one, and further, the one of the one with respect to the other. At the time when the dynamic speed becomes lower than the predetermined value, the pressure contact force control is switched to the position control to stop the one, so that after the polishing of the head window hole of the rotary drum is completed, the head of the rotary drum in the pressed state is finished. One of the window hole and the buff can be retracted to a predetermined position while controlling the pressing force against the other. Therefore, an automatic buffing device equipped with a position control device,
After the polishing is completed, one of the other is retracted to a predetermined position to switch from the pressing force control to the position control, thereby stabilizing the processing quality and enabling high-precision buff polishing automation.

[Brief description of the drawings]

FIG. 1 is a schematic plan view illustrating an automatic buffing apparatus according to an embodiment of the present invention.

FIG. 2 is a perspective view showing a buff section provided in the automatic buff polishing apparatus.

FIG. 3 is a perspective view for explaining a head window hole detection sensor provided in the automatic buffing apparatus.

FIG. 4 is a perspective view showing a finish polishing section provided in the automatic buff polishing apparatus.

FIG. 5 is a perspective view showing a chucking section provided in the automatic buffing apparatus.

FIG. 6 is a side view showing a chucking section provided in the automatic buffing apparatus.

FIG. 7 is a perspective view showing an abrasive application section provided in the automatic buffing apparatus.

FIG. 8 is a plan view showing a pressure contact sensor substrate constituting a pressure contact force sensor unit provided in the automatic buff polishing apparatus.

FIG. 9 is a perspective view of an essential part showing an LVDT constituting a press-contact force sensor unit provided in the automatic buffing apparatus.

FIG. 10 is a schematic diagram of an essential part showing an LVDT constituting a pressure contact force sensor unit provided in the automatic buffing apparatus.

FIG. 11 is a plan view showing a pressure contact sensor substrate that constitutes a pressure force sensor unit provided in the automatic buff polishing apparatus.

FIG. 12 is a plan view showing a pressure contact sensor substrate constituting a pressure contact sensor unit provided in the automatic buff polishing apparatus.

FIG. 13 is a perspective view illustrating a principle of detecting a pressing force by a pressing force sensor unit included in the automatic buffing apparatus.

FIG. 14 is a perspective view illustrating a principle of detecting a pressing force by a pressing force sensor unit included in the automatic buffing apparatus.

FIG. 15 is a perspective view illustrating a principle of detecting a pressing force by a pressing force sensor unit included in the automatic buffing apparatus.

FIG. 16 is a plan view showing an example of a pressure contact sensor substrate constituting a pressure contact force sensor unit provided in the automatic buff polishing apparatus.

FIG. 17 is a plan view showing an example of a pressure contact sensor substrate that constitutes a pressure force sensor unit provided in the automatic buff polishing apparatus.

FIG. 18 is a plan view showing an example of a pressing force sensor substrate constituting a pressing force sensor unit provided in the automatic buff polishing apparatus.

FIG. 19 is a plan view showing an example of a pressure contact sensor substrate that constitutes a pressure contact sensor unit provided in the automatic buff polishing apparatus.

FIG. 20 is a block diagram shown for explaining signal processing of a control unit provided in the automatic buff polishing apparatus.

FIG. 21 is a block diagram for explaining signal processing of a control unit provided in the automatic buff polishing apparatus.

FIG. 22 is a block diagram shown for explaining signal processing of a control unit provided in the automatic buff polishing apparatus.

FIG. 23 is a block diagram shown for explaining signal processing of a control unit provided in the automatic buff polishing apparatus.

FIG. 24 is a block diagram shown for explaining signal processing of a control unit provided in the automatic buff polishing apparatus.

FIG. 25 is a flowchart illustrating the operation of the automatic buff polishing apparatus for polishing a rotary drum.

FIG. 26 is a perspective view illustrating the operation of the automatic buff polishing apparatus for polishing a rotary drum.

FIG. 27 is a flowchart illustrating the operation of the automatic buff polishing apparatus for polishing a rotary drum.

FIG. 28 is a flowchart illustrating the operation of the automatic buff polishing apparatus for polishing a rotary drum.

FIG. 29 is a flowchart illustrating the operation of the automatic buff polishing apparatus for polishing a rotary drum.

FIG. 30 is a schematic front view showing a conventional rotary magnetic head device.

FIG. 31 is a perspective view of a main part showing a head window hole of a rotary drum constituting a conventional rotary magnetic head device.

FIG. 32 is a perspective view of a main part showing a head window hole of a rotary drum constituting a conventional rotary magnetic head device.

FIG. 33 is a perspective view of a main part showing a head window hole of a rotary drum constituting a conventional rotary magnetic head device.

[Explanation of symbols]

1 Automatic buffing machine 3 Rotary magnetic head device 3B rotating drum 3E Head window (target object) 7 Buff positioning mechanism (moving means) 8 Table moving mechanism (moving means) 15 Pressure contact sensor (pressure contact detection unit) 16 Position sensor unit (position detection unit) 18 Control unit 21 Buff (object)

────────────────────────────────────────────────── ─── Continuation of the front page (56) References JP-A-4-30942 (JP, A) JP-A-7-37301 (JP, A) (58) Fields investigated (Int. Cl. ⁷ , DB name) G05D 3/00-3/20 B24B 41/00-51/00

Claims (3)

(57) [Claims] 1. A position control device for controlling a position of a first target object and a second target object which are moved toward and away from a pressure-contact state to a non-pressure-contact state, wherein the first target object and the second target are controlled. Moving means for moving the body toward and away from the body, a position detecting unit for detecting a relative position between the first object and the second object, and a first object and a second object in a pressure contact state A pressing force detecting unit for detecting a pressing force between the first object and a position detecting signal detected by the position detecting unit and a pressing force detecting signal detected by the pressing force detecting unit; A control unit configured to perform position control and pressure contact force control with the second target object, wherein the control unit is configured to control the first target object and the second target object in the pressed state.
Continue to control the crimping force with either the target
Calculation of the acceleration of the moving means in the pressing force control
The damping coefficient for output should be smaller than the specified value.
The state of the pressure contact between the first object and the second object
Release, and when one is retracted to a predetermined position with respect to the other,
When the pressing force is applied in the direction toward zero or the other object,
In both cases, the damping coefficient is made larger than a predetermined value.
Therefore, the moving speed of the one target object is reduced, and the movement of the one target object with respect to the other target object is further reduced.
When the dynamic speed becomes lower than the specified value, the pressure
And switch to position control to stop the one object
A position control device characterized in that: 2. An automatic buff polishing apparatus having a buff provided on an outer peripheral portion of a rotary drum of a rotary magnetic head device and polishing a head window in which a magnetic head is disposed, wherein the head window and buff of the rotary drum are provided. Moving means for moving the buffs from the pressed state to each other, a position detecting unit for detecting a relative position between the buff and the head window hole of the rotary drum, and a pressure contact of the buff pressed against the head window hole of the rotary drum. A pressing force detecting unit for detecting a force, a position detecting signal detected by the position detecting unit and a pressing force detecting signal detected by the pressing force detecting unit to drive the moving unit to drive the head window hole and the buff of the rotary drum. And a control unit configured to perform position control and pressing force control of the rotary drum. The control unit includes a head window of the rotating drum in a pressed state.
Pressing force control continues for either hole or buff
While controlling the acceleration of the moving means in the pressing force control.
Make the damping coefficient for calculation smaller than the specified value
When the pressure contact state between the head window hole and the buff is released by this, and one of them is retracted to a predetermined position with respect to the other,
Applying a pressing force in a direction toward zero or the other side, and
By setting the damping coefficient larger than the specified value,
The one moving speed is reduced, and the one moving speed with respect to the other is lower than a predetermined value.
When the pressure becomes smaller, switch from pressure control to position control.
Characterized in that said one is stopped.
Automatic buffing apparatus that. Wherein said moving means being composed of a first moving means for contact and separation operation of the buff against the rotating drum, and a second moving means for contact and separation operation of the rotary drum with respect to buff 3. The automatic buffing device according to claim 2, wherein
Place.