JP3554696B2 - Article processing equipment with liquid - Google Patents

Description

なお、液槽でのメッキ処理やあけ換えろ過処理において、オーバーフローボックスＢ２’（Ｂ３’）内の液量の減少が生じて該ボックス内が渇液状態になってくると、ポンプＰでの空気吸い込みを防止するため、弁ｖ１’（ｖ１”）を閉じる。
【００７４】
このように従来では図１６に例示するように、オーバーフローボックスＢ２’又はＢ３’から液を吸引するとき、オーバーフローボックス底の通液口Ｌｂ、Ｌｂ’から吸液していたので、該通液口やそれへの配管接続部位で液内不純物が詰まり易く、ろ過作業に著しい支障を引き起こす原因となっていたが、ここでの第２吸引ヘッド１０６の吸液管は、該ボックス底部から上方へ吸液できるので、ヘッド１０６やそれに接続される吸液管の不純物による詰まりは十分抑制される。
【００７５】
再びもとに戻って説明する。
【００７６】
第１吸引ヘッド１０４の各吸液孔１０４ｂ、第２吸引ヘッド１０６の各吸液孔１０６ｂ、第３吸引ヘッド１０８の各吸液口のいずれもその口径は、該吸引ヘッドが後述する多岐管等を介して接続される、液ろ過のための液循環用の遠心ポンプにおけるインペラーの羽根高さと同等に、又はそれより小さく設定される。
【００７７】
このように口径を小さくしておくことで、液槽中に脱落することがある被メッキ物品の一部や部品及びその他外部から持ち込まれた雑品類等が遠心ポンプに吸い込まれてインペラー羽根に噛み込むなどして該ポンプが故障することを抑制することができる。
【００７８】
なお、第２吸引ヘッド１０６に代えて他の形態の吸引ヘッドを採用してもよい。例えば図８に示す吸引ヘッド１０７を採用してもよい。
【００７９】
吸引ヘッド１０７は、除塵ストレーナとも呼べるもので、小ボックス形態をしており、上部に管接続口部１０７ａを有し、側周壁及び底壁に複数の吸液孔１０７ｂを分散形成したものである。足１０７ｃが付いており、これでオーバーフローボックスＢ２の底に立つ。各吸液孔１０７ｂも、その口径は液循環用の遠心ポンプにおけるインペラーの羽根高さと同等、又はそれより小さく設定しておくとよい。
【００８０】
以上説明した第１吸引ヘッド１０４、第２吸引ヘッド１０６（又は１０７）、或いはさらに第３吸引ヘッド１０８は次に説明する循環ろ過装置の構成部品となる。
【００８１】
前述の一つの液槽１１を含む第１グループ、二つの液槽１２、１３を含む第２グループ、液槽１４、１５を含む第３グループのそれぞれについて循環ろ過装置が設けられている。さらに、液槽１１から液槽１５までの全液槽を含む第４グループについての循環ろ過装置も設けられている。
【００８２】
図１中、液槽１１に対する循環ろ過装置は符号３で、液槽１２、１３に対する循環ろ過装置は符号４Ａで、液槽１４、１５に対する循環ろ過装置は符号４Ｂで、全液槽１１〜１５に対する循環ろ過装置は符号６で示す。
【００８３】
なお以下に説明する各循環ろ過装置やあけ換えろ過装置で採用している手動開閉弁は電動弁等として自動制御できるようにしてもよい。
【００８４】
循環ろ過装置において、第１グループの循環ろ過装置３は液循環ポンプ（ここでは遠心ポンプ）１台による１液槽の単独循環ろ過装置であり、第２グループの循環ろ過装置４Ａ及び第３グループの循環ろ過装置４Ｂは、各々処理液槽二つについて液循環ポンプ（ここでは遠心ポンプ）１台による循環ろ過装置である。さらに第４グループとなる循環過装置６は全処理液槽五つについて液循環ポンプ（ここでは遠心ポンプ）１台による循環ろ過装置である。
【００８５】
第２グループのろ過装置４Ａ及び第３グループのろ過装置４Ｂはそれぞれ液循環ポンプ１台による２液槽の循環ろ過装置であり、各グループにおける二つの液槽内の処理液は循環ろ過の過程において、循環回路の液流量に僅かながらも強弱が生じ、時間の経過にともない、二つの液槽のうち一方では液面位が降下し、これに反して他方の液槽では液面位降下の液槽における液減量相当分の液量の増加流入が生じ、遂には該他方の液槽から処理液が溢れ、一方の液槽内処理液の液面位が降下し過ぎて、両液槽ともに処理液によるメッキ作業ができなくなることがある。
【００８６】
そこでここでは全液槽５槽について、液循環ポンプ１台によって、同時に循環ろ過を行う循環ろ過装置６を設置運転し、これによって液槽間における液面位の上下差を抑制するように液面位を制御するとともに液混合を行って、各液槽における液の組成及び液温度を均一化しつつ循環ろ過を行うようにしている。すなわち、循環ろ過装置６は循環ろ過装置であるとともに液混合用及び液面位置制御のための装置でもある。
【００８７】
また、この液混合用及び液面位置制御のための装置は、各液槽の容量が異なる場合でも液混合及び各液槽における液面位置制御を行いつつ循環ろ過を行える。
【００８８】
液槽１１に対する循環ろ過装置３は、ろ過器３１及び液循環用の循環ポンプ３２（本例では遠心ポンプを採用）を含んでいる。液槽１１は吸液回路を介して循環ポンプ３２の吸液口に連通できる。ろ過器３１は送液回路を介して液槽１１に連通できる。
【００８９】
該吸液回路は図１に示すように、
液槽１１における第１吸引ヘッド１０４及び第２吸引ヘッド１０６（図１では省略、図２、図６、７等参照）と、
液合流用の多岐管３３と、
吸引ヘッド１０４、１０６の管接続口部１０４ａ（図６参照）、１０６ａ（図６、図７参照）をそれぞれ手動開閉弁ｖ１１、ｖ１２を介して多岐管３３の分岐管へ接続する配管と、
多岐管３３の主開口部を手動開閉弁ｖ１３を介し循環ポンプ３２の吸液口に接続する配管とを含んでいる。
【００９０】
第３吸引ヘッド１０８を採用するときは、これによって吸引される液が最終的には、前記の弁ｖ１１、ｖ１２を介して吸引される液に混合、合流されてポンプ３２へ流入するように弁、多岐管等を介してポンプ３２に配管接続される。
【００９１】
送液回路は、ろ過器３１の送液口を手動開閉弁ｖ１４及び温度制御回路４５、さらに二つの手動開閉弁ｖ１５を介して液槽１１の２箇所に分岐連通させる配管を含んでいる。なお液槽１１への連通はこのように２箇所でなく、一箇所でも、３箇所以上でもよい。
【００９２】
循環ポンプ３２の吐出口は逆止弁ｖ１６を介してろ過器３１の液供給口に配管接続されている。
【００９３】
ろ過器３１は、液種、ろ過液量に適応する種々のタイプのものを採用できるが、ここでは、ろ過器に圧入される液が、適当なろ過助剤によるプレコート層を有するろ過床を通過することで不純物がろ過され、浄化されるタイプのろ過器である。後述する循環ろ過装置４Ａ、４Ｂ、さらに液混合及び液面位置制御のための装置６におけるろ過器も同タイプのものである。
【００９４】
また、送液回路には一つの液槽内メッキ液の劣化、消耗等に伴い変化する液組織を復元し、更には蓄積不純物の除去ろ過を行うためのあけ換え装置５１（図１、図３参照）が付設されている。
【００９５】
循環ろ過装置３における前記温度制御回路４５及びあけ換え装置５１は、次に説明する循環ろ過装置４Ａ、４Ｂにおける温度制御回路４５及びあけ換え装置５１とそれぞれ基本構造は同一であるから後ほどろ過装置４Ａにおいて回路４５及び装置５１を説明することとし、ここでの温度制御回路４５、装置５１の説明は省略する。
【００９６】
循環ろ過装置４Ａと循環ろ過装置４Ｂとは全く同じ構造、作用のものであるから、装置４Ａのみ説明し、装置４Ｂの説明は省略する。装置４Ａと４Ｂにおいて同じ部品については図中同じ符号を付す。
【００９７】
循環ろ過装置４Ａは図１に示すように、ろ過器４１及び液循環用の循環ポンプ４２（本例では遠心ポンプ）を含んでいる。液槽１２、１３は吸液回路を介して循環ポンプ４２の吸液口に連通できる。ろ過器４１は送液回路を介して液槽１２、１３に連通できる。
【００９８】
該吸液回路は、
液槽１２、１３のそれぞれにおける第１吸引ヘッド１０４及び第２吸引ヘッド１０６（図１では省略、図２等参照）と、
液合流用の多岐管４３１、４３２、４３０と、
一方の液槽１２の吸引ヘッド１０４、１０６の管接続口部１０４ａ（図６参照）、１０６ａ（図６、図７参照）をそれぞれ手動開閉弁ｖ４１、ｖ４２を介して一方の多岐管４３１の分岐管へ接続する配管と、
他方の液槽１３の吸引ヘッド１０４、１０６の管接続口部１０４ａ、１０６ａをそれぞれ液槽１２におけると同様の手動開閉弁ｖ４１、ｖ４２を介して他方の多岐管４３２の分岐管へ接続する配管と、
多岐管４３１、４３２の主開口部を多岐管４３０の分岐管へ接続する配管と、
多岐管４３０の主開口部を手動開閉弁ｖ４３を介して循環ポンプ４２の吸液口に接続する配管とを含んでいる。
【００９９】
液槽１２、１３において第３吸引ヘッド１０８を採用するときは、これによって吸引される液が最終的には、前記の弁ｖ４１、ｖ４２を介して吸引される液に混合、合流されてポンプ４２へ流入するように弁、多岐管等を介してポンプ４２に配管接続される。
【０１００】
送液回路は、
ろ過器４１の送液口を手動開閉弁ｖ４４及び温度制御回路４５を介して液分配用の多岐管４３３の主開口部に接続する配管と、
多岐管４３３の一方の分岐管を二つの手動開閉弁ｖ４５を介して液槽１２の２箇所に分岐連通させる配管と、
多岐管４３３の他方の分岐管を液槽１２の場合と同様の二つの手動開閉弁ｖ４５を介して液槽１３の２箇所に分岐連通させる配管とを含んでいる。
【０１０１】
ポンプ４２の吐出口は逆止弁ｖ４６を介してろ過器４１の液供給口に配管接続されている。
【０１０２】
ろ過器４１は循環ろ過装置３におけるろ過器３１と同タイプのものである。なお異なるタイプのものであってもよい。
【０１０３】
また、送液回路には二つの液槽１２、１３から一つの液槽を選択してその液槽内のメッキ液の劣化、消耗等に伴い変化する液組織を復元し、更には蓄積不純物の除去ろ過を行うためのあけ換え装置５１（図３参照）が付設されいる。
【０１０４】
温度制御回路４５は、図３に示すように、手動開閉弁ｖａ’、熱交換器４５１、手動開閉弁ｖｂ’を直列接続した回路に流量調整弁Ｖを並列接続したもので、熱交換器入口側の弁ｖａ’の入口及び流量調整弁Ｖの入口は液分配用の多岐管４５２を介して前記の弁ｖ４４（ろ過器出口側の弁）に配管接続され、弁ｖｂ’の出口及び流量調整弁Ｖの出口は液槽へ通じる前記の液分配用多岐管４３３に配管接続されている。
【０１０５】
循環ろ過装置３における温度制御回路４５はこの循環ろ過装置４Ａの温度制御回路４５と基本的に同構造である。但し、循環ろ過装置３における温度制御回路４５では、弁ｖｂ’に相当する弁及び流量調整弁Ｖに相当する弁の出口は多岐管を介することなく一本の配管に集められ、さらに二つの手動開閉弁ｖ１５を介して液槽１１の２箇所に分岐連通されている。なおかかる液槽１１への連通箇所は１箇所でも３箇所以上でもよい。
【０１０６】
あけ換え装置５１は、図３に示すように、ろ過器４１の送液口を手動開閉弁ｖ５１を介してあけ換え槽５１１に連通させ得るように配管するとともに、ポンプ４２の吸液口を手動開閉弁ｖ５２を介してあけ換え槽５１１の底部に設置した従来型のフート弁（ｆｏｏｔ ｖａｌｖｅ） ｖ５３に配管接続したものである。
【０１０７】
循環ろ過装置３におけるあけ換え装置５１もこのあけ換え装置５１と基本的に同構造である。
ここで前述及び後述の「多岐管」について述べると、該多岐管は一端が閉鎖された閉鎖筒体の形態の多岐管本体と、これに接続された複数の分岐管とを含んでいる。そして循環ポンプによる液槽からの吸液回路及びろ過器から液槽への送液回路に該多岐管を用いる循環ろ過装置において、該多岐管の本体に設ける複数の各々同一又は異なる断面積を持つ分岐管のそれぞれからの吸液又は送液における通液量がその分岐管の断面積によって決まるものである。
【０１０８】
さらに説明すると、該複数分岐管のそれぞれにおいて単位断面積あたりの通液量は、例えばろ過器のろ過助剤のプレコート層が不純物除去の許容範囲を超えて著しく目詰まりし、プレコート層前後の圧力差、換言すればろ過器内原液室とろ過室との圧力差が著しく変動するなどの不都合がない限り、実質上同量であり、各分岐管は該単位断面積あたり等量の通液量に基づいて必要とされる所定の通液量を得る断面積を有する。多岐管本体はこれを構成している筒体内の略全長にわたり同一断面積で、且つ、複数多岐管の合計断面積より若干大きい断面積を有する。多岐管本体内圧力は、筒体内の略全長にわたり同一断面積のもとに同一の負圧力又は正圧力下におかれ、各分岐管ごとの所定の通液量を過不足無く得られる。
【０１０９】
もとに戻って説明を続けると、以上説明した循環ろ過装置３における液合流用多岐管３３及び温度制御回路４５の図示省略の多岐管、並びに循環ろ過装置４Ａ、４Ｂにける液合流用多岐管４３１、４３２、、４３０、液分配用多岐管４３３及び温度制御回路４５の多岐管４５２はいずれも基本的に図９に示す多岐管と同じ構造のものであり、製作材質は塩化ビニル樹脂（ＰＶＣ）によるもので、後述の図１０に示す多岐管も材質は同様である。なおこれら多岐管は他の材料製、例えば他の合成樹脂製や金属製でもよい。
【０１１０】
すなわち、循環ろ過装置３における液合流用多岐管３３、温度制御回路４５の図示省略の多岐管、並びに循環ろ過装置４Ａ、４Ｂにける液合流用多岐管４３１、４３２、４３０、液分配用多岐管４３３及び温度制御回路４５の多岐管４５２はいずれも、構造的には図９に示すように、それとは限定されないがここでは断面円形の多岐管本体４０１とこれに接続された２本の、それとは限定されないがここでは断面円形の分岐管４０２、４０３とからなるものである。多岐管本体４０１は一端に他の管を接続するための主開口部４０１ａを有し、他端４０１ｂが閉鎖された内径略均一な（液流通断面積が略均一な）閉鎖筒体である。
【０１１１】
そして分岐管４０２、４０３に対する正又は負の同一圧力下における多岐管本体４０１の開口部４０１ａの断面積は、それぞれ必要とする所定の通液量を与える分岐管４０２、４０３の合計断面積に相当する断面積を有している。
【０１１２】
また多岐管本体４０１の断面積は該複数分岐管の合計断面積に対して余裕のある断面積として該開口部４０１ａよりは若干大きい断面積を有している。
【０１１３】
分岐管４０２、４０３は多岐管本体４０１の長手方向における２箇所において、多岐管本体の長手方向に直交する方向から該多岐管本体内へ突出挿入され、各分岐管４０２、４０３の多岐管本体への突出度（突出挿入高さ）αは本体４０１の内径Ｒの略１／２以上３／５以下の範囲内にある。
【０１１４】
該分岐管４０２、４０３の多岐管本体４０１内への突出挿入高さは、該多岐管本体におよぶポンプの吸液圧力（負圧力）又は送液圧力（正圧力）下において、該多岐管本体内の圧力（負又は正圧力）を均一圧力下におくものである。
【０１１５】
多岐管本体４０１は該二つの分岐管４０２、４０３に対して液密に接着剤、溶接等によって接続されている。
【０１１６】
なお後述する図１０に示す多岐管、さらにはその多岐管本体６００及び分岐管６０１〜６０５についても、その基本構成は以上説明した多岐管と同様である。
【０１１７】
また、いずれの多岐管においても、分岐管の多岐管本体に対する接続部位は特に限定されず、液回路構成に応じて多岐管本体周囲の任意の部位に接続できる。また、その接続にあたっての分岐管の角度は、必ずしも多岐管本体の長手方向に直交する方向でなくてもよい。
【０１１８】
かかる構造の多岐管によると、多岐管本体４０１の主開口部４０１ａに液循環用ポンプの吸液口を連通させて液合流用の多岐管として用いた場合、ポンプの吸引圧力（負圧力）、すなわち多岐管本体内の液圧（吸引圧）が多岐管本体内各部で均一化され、従って各分岐管４０２、４０３から多岐管本体４０１内への吸液量は各分岐管の液流通断面積に応じたものとなる。
【０１１９】
また、多岐管本体４０１の主開口部４０１ａにポンプの吐出口を連通させて液分配用の多岐管として用いた場合、ポンプの吐出圧力（正圧力）、すなわち多岐管本体内の液圧（正圧力）が多岐管本体内各部で均一化され、従って各分岐管４０２、４０３からの吐出液量は該分岐管の液流通断面積に応じたものとなる。
【０１２０】
ここではこのような構造の多岐管を、循環ろ過装置３における多岐管３３及び温度制御回路４５の図示省略の多岐管、並びに循環ろ過装置４Ａ、４Ｂにける液合流用多岐管４３１、４３２、４３０、液分配用多岐管４３３及び温度制御回路４５の多岐管４５２として採用しているから、液槽の内底溝１０２及びオーバーフローボックスＢ２から所定量ずつ液を吸引し、循環ろ過装置３においては液槽１１へ所定量のろ過後の液を戻すことができ、また、複数の液槽に対して設けられた循環ろ過装置４Ａ、４Ｂについては該複数の液槽に所定量ずつろ過後の液を戻すことができ、さらに各温度制御回路４５においては、図３に示すように多岐管４５２を設け、流量調整弁Ｖによって設定された任意の熱交換流量でもって容易に熱交換器に送液できるのである。
【０１２１】
なお、従来採用されている多岐管９は、概ね図１５に示すように、一か所に液流通用の主開口部９１ａを有し、該主開口部９１ａの位置を除く複数箇所に分岐管９２を接続したものである。分岐管９２の接続は、分岐管の一端を多岐管本体９１の壁に設けた孔９１ｂに合わせ接続することでなされている。
【０１２２】
ところがこのような従来型多岐管では、多岐管本体内の全長における各部で液圧が均一に作用せず、特にろ過器におけるろ過圧力が不純物除去に伴って上昇してきたときには、たとえそのろ過圧力がろ過器自体では許容範囲にあるときでも各部で液圧が均一に作用せず、例えばポンプによって主開口部９１ａから正圧力下に多岐管本体９１内に液体を導入したとすると、主開口部９１ａに近い分岐管には多くの液が流出し、主開口部９１ａから順次遠くなる各位置では、それより前の位置での分岐管への液流出により液圧が低下して、その位置での分岐管にはより少ない量の液しか流出しない。
【０１２３】
一方、ポンプによる吸液圧力（負圧力）下において分岐管９２に外部から液を流入させ、これを主開口部９１ａから吸引する場合は、主開口部９１ａに近い分岐管からは多くの液を吸引できるが、主開口部９１ａから順次遠くなるに従ってポンプの液吸引作用が低下してその位置での分岐管９２からはより少ない量の液しか吸引できない。
【０１２４】
このような多岐管を処理液のろ過のための液体回路、後述する複数の液槽における処理液を均質に維持するための液体回路、各液槽における液面位置を制御するための液体回路等に採用すると、所望のろ過処理、処理液質の維持、液面制御に支障をきたすことになる。
【０１２５】
このような問題を解決するには、各分岐管に流量調整弁９０を設けなければならないが、それではコスト高となるうえに、不純物のろ過除去量に応じて日時の経過とともに減量していくろ過量、さらに配管抵抗による各吸、送液管毎の通液量の減少等を均一化するについて、流量調整弁９０の開き度乃至絞り度の調整に著しく手間を要する。
【０１２６】
この点、図９に示す構造の多岐管によると、各分岐管において、図１６に示すような流量調整のための流量調整弁９０を設ける必要はなく、その液流通断面積に応じた通液量を簡単、容易に、安価に得ることができる。
【０１２７】
次に以上説明したろ過装置等について、説明の都合上、ろ過装置４Ａから説明する。
【０１２８】
循環ろ過装置４Ａによると、通常の循環ろ過においては、
前記の弁ｖ４１〜ｖ４５が開けられ、
温度制御回路４５における弁ｖａ’、ｖｂ’、Ｖはそれぞれ任意の所定の開度に設定され（常に開いたままでもよい）、
あけ換え装置５１へ通じる手動開閉弁ｖ５１、ｖ５２は閉じられる。
【０１２９】
そして循環ポンプ（本例では遠心ポンプ）４２を運転することで、弁ｖ４３を介して液槽１２、１３の各内底溝１０２から第１吸引ヘッド１０４にて主として沈殿性不純物を含むメッキ液を吸引し、また図３に鎖線で示すように液槽内底の他の部位に第３吸引ヘッド１０８も設置してあるときは該第３吸引ヘッドからも液槽内底部及びその近傍の不純物を含むメッキ液を吸引し、一方、液槽１２、１３のそれぞれにおけるオーバーフローボックスＢ１、Ｂ２へ堰部２１、２２を越えてメッキ液とともに流れ込み、該ボックスＢ２へ集まる浮遊性不純物をボックスＢ２内のメッキ液とともに第２吸引ヘッド１０６にて吸引し、これら不純物をろ過器４１でろ過し、ろ過後のメッキ液を再び各液槽１２、１３の２箇所へ還流することができる。このようにろ過後の液を各液槽の１箇所ではなく複数箇所に戻すので、それだけ該液槽の各部において液の清浄度が向上する。
【０１３０】
この循環ろ過中、メッキ液は温度制御回路４５における熱交換器４５１にて所定温度に制御される。
【０１３１】
連休や休日あけ等においてメッキ処理装置を運転開始する際、メッキ液の温度が所定の温度から大きく外れているようなときには、所定の温度又はそれに近くなるまで、温度制御回路４５における流量調整弁Ｖを絞るか閉じて、メッキ液を熱交換器４５１に集中的に流すことで、速やかに所定のメッキ液作業温度を得ることができる。
【０１３２】
ところで、一般に物品処理液槽の場合、処理液中には、被処理物に当初から付着していて持ち込まれる不純物、被処理物の前処理工程中に発生する不純物であって被処理物に付着して持ち込まれる不純物、そして処理液内での被処理物の処理過程において電解、劣化等により発生する不純物等が相乗して不純物が日々積増していき、このためにコスト高を招くろ過器のろ過床の頻繁な洗浄復元及び液槽あけ換えろ過を行わなければならない。
【０１３３】
物品メッキ処理液槽を例にとると、メッキ処理液中には、被処理物に当初から付着していて持ち込まれる不純物、被処理物の前処理工程中に発生する不純物であって被処理物に付着して持ち込まれる不純物、そしてメッキ処理液槽内での被処理物の処理過程におけるアノードの電解、処理液の劣化等により発生する不純物、外部から液槽内へ落下することがある不純物等が相乗して不純物が日々積増していき、このためにろ過器内のろ過床の頻繁な洗浄復元作業、そして液槽あけ換えろ過を行わなければならない。さらにこれら作業のために、メッキ製品の生産中断、残業の増加、これらに伴う人件費の増加、高価なメッキ液の損失、諸薬品や排液の管理費の増加、電気等のエネルギーの過大な消耗を招き、ひいてはメッキ製品の高騰を招く。
【０１３４】
あけ換えろ過を例にとると、あけ換えろ過実施の周期は液質、生産品種等によって大きく左右されるが、概ね１ケ月から３ケ月の間である。あけ換えろ過によって無機、有機不純物の除去のための活性炭処理及びろ過等の処理を行って液組成を再生復元し、その復元液を再び元の液槽に還流させる。
【０１３５】
いま説明しているメッキ処理液槽１１〜１５においては次のようにあけ換えろ過処理を行う。
【０１３６】
すなわち、液槽１２内メッキ液のあけ換えろ過を行うときは循環ろ過装置４Ａにおける、
液槽１２側の弁ｖ４２、液槽１３側の弁ｖ４１、ｖ４２及び温度制御回路４５の入口へ通じる弁ｖ４４、あけ換え装置５１の弁ｖ５２を閉じ、
液槽１２側の弁ｖ４１、ポンプ４２の吸液口に通じる弁ｖ４３と共にあけ換え装置５１における弁ｖ５１を開き、
ポンプ４２を運転する。
【０１３７】
これにより、液槽１２側の弁ｖ４１、多岐管４３１、多岐管４３０、ポンプ吸液側の弁ｖ４３、ポンプ４２、逆止弁ｖ４６、ろ過器４１、弁ｖ５１を経由して液槽１２内のメッキ液をあけ換え槽５１１へ回収することができる。あけ換え槽５１１に回収した液には活性炭ろ過処理、液組成復元処理等を施す。
【０１３８】
処理済液のあけ換え槽５１１から液槽１２への還流には、
あけ換え装置５１の弁ｖ５１、ポンプ４２の吸液口に通じる弁ｖ４３、液槽１３側の弁ｖ４５を閉じ、
あけ換え装置の弁ｖ５２、温度制御回路４５へ通じる弁ｖ４４、温度制御回路４５の弁Ｖ、液槽１２側の弁ｖ４５を開き、
ポンプ４２を運転する。
【０１３９】
これによりあけ換え槽５１１の底部にあるフート弁ｖ５３から復元されたメッキ液は吸入されて、あけ換え装置の弁ｖ５２、ポンプ４２、逆止弁ｖ４６、ろ過器４１、弁ｖ４４、温度制御回路４５の多岐管４５２、弁Ｖ、多岐管４３３を経由して液槽１２側の弁ｖ４５から液槽１２へ還流する。
【０１４０】
一方、液槽１３内のメッキ液のあけ換えろ過を行うときは、循環ろ過装置４Ａにおける、
液槽１３側の弁ｖ４２、液槽１２側の弁ｖ４１、ｖ４２及び温度制御回路４５へ通じる弁ｖ４４、あけ換え装置５１の弁ｖ５２を閉じ、
液槽１３側の弁ｖ４１、ポンプ４２の吸液口に通じる弁ｖ４３と共にあけ換え装置５１における弁ｖ５１を開き、
ポンプ４２を運転する。
【０１４１】
これにより、液槽１３側の弁ｖ４１、多岐管４３２、多岐管４３０、ポンプ吸液側の弁ｖ４３、ポンプ４２、逆止弁ｖ４６、ろ過器４１、弁ｖ５１を経由して液槽１３内のメッキ液をあけ換え槽５１１へ回収することができる。あけ換え槽５１１に回収した液にはろ過処理等を施す。
【０１４２】
あけ換え槽５１１から液槽１３への液還流には、
あけ換え装置５１の弁ｖ５１、ポンプ４２の吸液口に通じる弁ｖ４３、液槽１２側の弁ｖ４５を閉じ、
あけ換え装置の弁ｖ５２、温度制御回路４５へ通じる弁ｖ４４、温度制御回路４５の弁Ｖ、液槽１３側の弁ｖ４５を開き、
ポンプ４２を運転する。
【０１４３】
これにより、あけ換え槽５１１の底部にあるフード弁ｖ５３から復元されたメッキ液が吸入されて、あけ換え装置５１の弁ｖ５２、ポンプ４２、逆止弁ｖ４６、ろ過器４１、弁ｖ４４、温度制御回路４５の多岐管４５２、弁Ｖ、多岐管４３３を経由して液槽１３側の弁ｖ４５から液槽１３へ還流する。
【０１４４】
このようにここでは液槽１２、１３のメッキ液のあけ換えろ過は、各槽のメッキ液をそれぞれ個別に全量あけ換えろ過ができる。
【０１４５】
液槽１２、１３のメッキ液を個別にあけ換えろ過処理できるようにしたのは、２槽一緒に液交換するとなればあけ換え槽５１１をそれだけ容量を大きくしなければならず、それではあけ換え槽５１１の設置スペースが大きくなってしまうし、コスト高につくからであり、さらに、あけ換えろ過が要求される原因は、各槽毎に生じることが多いからである。
【０１４６】
なお、大容量のあけ換え槽５１１の設置スペースがある等の場合は２槽について一度にあけ換えろ過作業を行ってもよい。
【０１４７】
循環ろ過装置４Ｂにおいても、ろ過装置４Ａの場合と同様に液槽１４、１５のメッキ液を循環ろ過できる。また、メッキ液の温度制御もできる。さらに液槽１４、１５のメッキ液をそれぞれ個別に全量あけ換えろ過ができる。
【０１４８】
循環ろ過装置３によると、通常の循環ろ過においては前記の弁ｖ１１〜ｖ１５が開けられ、温度制御回路４５における開閉弁及び流量調整弁はそれぞれ所定の開度に設定され、あけ換え装置５１へ通じる開閉弁は閉じられる。そして循環ポンプ３２を運転することで、液槽１１の内底溝１０２から第２吸引ヘッド１０４にて主として沈殿性不純物をメッキ液とともに吸引し、また図３に鎖線で示すように液槽内底の他の部位に第３吸引ヘッド１０８も設置してあるときは該第３吸引ヘッドからも液槽内底部及びその近傍の不純物を含むメッキ液を吸引する。
【０１４９】
一方、液槽１１に付設されたオーバーフローボックスＢ１、Ｂ２へ堰部２１、２２を越えてメッキ液とともに流れ込み、ボックスＢ２へ集まる浮遊性不純物をボックスＢ２内の第２吸引ヘッド１０６にてメッキ液とともに吸引して、これら不純物をろ過器３１でろ過し、ろ過後のメッキ液を再び液槽１１の２箇所へ還流することができる。このようにろ過後の液を液槽１１の１箇所ではなく複数箇所に戻すので、それだけ液槽１１の各部において液の清浄度が向上する。
【０１５０】
この循環ろ過中、メッキ液は温度制御装置４５において所定温度に制御することもできる。
【０１５１】
連休及び休日あけ等においてメッキ処理装置を運転開始する際、メッキ液の温度が所定の温度から大きく外れているようなときには、所定の温度又はそれに近くなるまで、温度制御回路４５における流量調整弁Ｖを絞るか閉じて、メッキ液を熱交換器に集中的に流すことで、速やかに所定のメッキ液温度を得ることができる。
【０１５２】
液槽１１内メッキ液のあけ換えろ過を行うときは、ろ過装置３において前述の液槽１２、１３のあけ換え装置５１と同様に液槽１１側の弁ｖ１１を開いてｖ１２を閉じ、さらに温度制御回路４５へ通じる弁ｖ４４と装置５１の弁ｖ５２を閉じ、あけ換え槽５１１への送液用開閉弁ｖ５１を開き、ポンプ３２の運転によって液槽１１内のメッキ液を該あけ換え槽へ回収することができる。
【０１５３】
そして回収されて再生し復元されたメッキ液は、あけ換え装置５１によって前述の液槽１２、１３と同様にして液槽１１に還流することができる。
【０１５４】
以上説明したメッキ処理装置には、さらに、液槽１１〜１５のそれぞれからメッキ液を回収して混合し再び各液槽に戻しつつ各液槽内の液面位置を所定位置に制御するための液混合及び液面位置制御のための装置６が設けられている。以下これについて説明する。
【０１５５】
前記液混合及び液面位置制御のための装置６は図１に示すように、
液循環ポンプ６１（ここでは遠心ポンプ）と、
液槽１１〜１５のそれぞれのオーバーフローボックスＢ２から手動開閉弁ｖ７１、液合流用の第１多岐管Ｊ１及び液合流用の第２多岐管Ｊ２、さらに手動開閉弁ｖ６２を介してポンプ６１の吸液口へ液を導く回路と、
液槽１１〜１５のそれぞれのオーバーフローボックスＢ２から手動開閉弁ｖ６１及び各液槽に対応する液排出用電動弁Ｖａ（合計５個ある）を介して液合流用の第３多岐管Ｊ３へ、さらに該第３多岐管Ｊ３から前記第２多岐管Ｊ２及び手動開閉弁弁ｖ６２を介してポンプ６１の吸液口へ液を導くことができる回路と、
ポンプ６１の吐出口から逆止弁Ｖｏ及びろ過器６０を介して、さらに手動開閉弁ｖ６３、液分配用の第４多岐管Ｊ４及び液分配用の第５多岐管Ｊ５を介して各液槽１１、１２、１３、１４、１５へ液を導く回路と、
ポンプ６１の吐出口から前記の逆止弁Ｖｏ及びろ過器６０を介して、さらに弁ｖ６３、前記第４多岐管Ｊ４、液分配用の第６多岐管Ｊ６及び各液槽に対応する液供給用電動弁Ｖｂ（合計５箇ある）、さらに手動開閉弁ｖ６４を介して各液槽１１、１２、１３、１４、１５へ液を導くことができる回路とを備えている。 液混合及び液面位置制御のための装置６はさらに各液槽のオーバーフローボックスＢ２に設置された液面位置検出装置６２を含んでいる。
【０１５６】
液排出用電動弁Ｖａ、液供給用電動弁Ｖｂはここではいずれも弁開閉駆動モータを備えた弁である。
【０１５７】
なお、図示のメッキ処理装置は、図１１（Ａ）に示すように装置全体の動作を制御する制御部７を備えており、制御部７の一部は、いま説明している液混合及び液面位置制御のための装置６の一部を構成している。
【０１５８】
制御部７には操作盤７１が接続されており、それには各ポンプを始動したり、停止したりするスイッチ等が搭載されている。
【０１５９】
そして、図１１（Ａ）に示すように、各ポンプ３２、４２、４２、６１は該制御部に接続されていて、該制御部からの指示に基づいて動作するようになっているとともに、液混合及び液面位置制御のための装置６における各液槽に対応する液排出用電動弁Ｖａ、液供給用電動弁Ｖｂ及び液面位置検出装置６２も該制御部に接続されている。
【０１６０】
各液面位置検出装置６２はいずれも同構造のものであり、そのうち一つについて図１１（Ｂ）に概略構成を示すように、オーバーフローボックスＢ２内に上方から吊り下げ挿入される合計５本の電極棒６２１〜６２５を含んでいる。
【０１６１】
これら電極棒は電極棒６２１、６２２、６２３、６２４の順に長く、この長い順に深くボックスＢ２内に挿入されている。電極棒６２５はアース電極棒であり、電極棒６２４と略同じかより深くボックスＢ２内に挿入されている。
【０１６２】
各液槽のオーバーフローボックスＢ２内において、電極棒６２１は異常な液面の上限を検出するための電極棒であり、電極棒６２２は液面位置が許容範囲の上限に達するとこれを検出するための電極棒であり、電極棒６２３は液面位置が許容範囲の下限に達するとこれを検出する電極棒であり、電極棒６２４はそのオーバーフローボックス内が渇液状態にあることを検出する電極棒である。
【０１６３】
液槽１１〜１５のいずれの液槽においても、該液槽における堰部２１、２２を越えてオーバーフローボックス内に収容されている液の液面高さが所定の上限と下限の範囲内にあるときは、即ちボックスＢ２内の液面位置が電極棒６２２の下端より下方に、且つ、電極棒６２３の下端より上方に位置している場合には、該液槽に対応する液排出用電動弁Ｖａ、液供給用電動弁Ｖｂはいずれも制御部７の指示のもとに開かれたままで、該液槽について液の排出及び供給が続けられる。
【０１６４】
しかしいずれかの液槽において、堰部２１、２２を越えてボックスＢ２内に収容されている液の液面高さが所定の範囲を超えて高くなって電極棒６２２の下端に接触すると、制御部７の指示のもとに、該液槽に弁ｖ６４（通常、開けてある）を介して連通している液供給用電動弁Ｖｂは閉じて該液槽への給液は停止される一方、液排出用電動弁Ｖａは開かれ、弁ｖ６１（通常、開けてある）を介して該液槽から液が排出される。
【０１６５】
このとき、電動弁Ｖａを介しての排出回路とは別に、弁ｖ７１（通常開けてある）、多岐管Ｊ１を介して排出される液が、多岐管Ｊ２内において、電動弁Ｖａ及び多岐管Ｊ３からの排出液と合流し、これら合流液が弁ｖ６２を介してポンプ６１に吸引される。
【０１６６】
またいずれかの液槽において、該液槽内の液面位置が降下して電極棒６２３の下端を離れると、制御部７の指示のもとに、該液槽に対応する液排出用電動弁Ｖａが閉じられる一方、液供給用電動弁Ｖｂは開かれ、弁ｖ６４を介して該液槽へ送液される。このとき、ポンプ６１からの送液は、逆止弁Ｖｏ、ろ過器６０を経て、多岐管Ｊ４の二つの分岐管のうち一方の分岐管により前記の多岐管Ｊ６、電動弁Ｖｂ、弁ｖ６４を経て液槽へ還流すると同時に、多岐管Ｊ４の他方の分岐管から多岐管Ｊ５へ、さらに液槽への液流出口６３へと還流する。
【０１６７】
そして（１）該循環ろ過装置６において、ポンプ６１の吸液回路における弁ｖ６１から電動弁Ｖａを経由する排出液量と、電動弁Ｖａを経由しないで弁ｖ７１から多岐管Ｊ１、Ｊ２を経て排出される液量との合計排出液量と、（２）該ポンプの送液回路における電動弁Ｖｂ、弁ｖ６４を経由して液槽へ還流する送液量と、電動弁Ｖｂを経由しないで多岐管Ｊ４、Ｊ５を経て液流出口６３から液槽へ還流する液量との合計送液量とが略等量となるように当初において設定されている。
【０１６８】
液槽１１〜１５に係るろ過装置３、４Ａ、４Ｂ、６によるろ過運転中に、いずれかの液槽の液面位置が上下に変動したときには、このように装置６の液合流用の多岐管Ｊ３に連通する液排出用電動弁Ｖａ及び液分配用の多岐管Ｊ６に連通する液供給用電動弁Ｖｂの交互作動によって、正常なメッキ作業を中断することなく継続することができる。
【０１６９】
オーバーフローボックスＢ２内において、不測の事態等により処理液の液面高さが所定の高さより低くなって、該液面が電極棒６２４を離れると、或いは処理液の液面高さが所定の高さより高くなって該液面が電極棒６２１に接触すると、制御部７の指示のもとに前後者ともにポンプ６１のみならず全ポンプが非常停止される。安全管理のためにこの場合に警報を発する警報装置を設けておいてもよい。
【０１７０】
前記の液合流用の多岐管Ｊ１〜Ｊ３、は、吸液のための吸液空間を有するとともに該吸液空間に連通する液流通主開口部を一か所に有する多岐管本体と、該多岐管管本体の前記主開口部位置を除く複数の所定箇所のそれぞれに連設された分岐管とを備えており、液が各分岐管に流入し、多岐管本体内で合流し主開口部から流出するものである。
【０１７１】
また、前記の液分配用の多岐管Ｊ４〜Ｊ６は、送液のための送液空間を有するとともに該送液空間に連通する液流通主開口部を一か所に有する多岐管本体と、前記多岐管本体の前記主開口部位置を除く複数の所定箇所のそれぞれに連設された分岐管とを備えており、液が主開口部に流入し、各分岐管から別れて流出するものである。
【０１７２】
第１多岐管Ｊ１及び第３多岐管Ｊ３、さらに第５多岐管Ｊ５及び第６多岐管Ｊ６のそれぞれには、液槽の数と同数（ここでは５本）の分岐管が設けられており、第２多岐管Ｊ２及び第４多岐管Ｊ４については２本の分岐管が設けられている。 装置６で採用されている液合流用の多岐管Ｊ２及び液分配用の多岐管Ｊ４は、循環ろ過装置で採用した図９に示す構造の多岐管と基本構造を同じくするもので、各分岐管にその液流通断面積に応じた通液量を得ることができるものである。 また、装置６で採用される液合流用多岐管Ｊ１及びＪ３並びに液分配用の多岐管Ｊ５及びＪ６はいずれも図１０に示す多岐管と同構造を有するものであり、製作材質は塩化ビニル樹脂（ＰＶＣ）によるものである。なおこれら多岐管は処理液質等に応じて他の材料製、例えば他の合成樹脂製や金属製でもよい
すなわち、多岐管Ｊ１、Ｊ３、Ｊ５、Ｊ６のそれぞれは、図１０に示すように、それとは限定されないがここでは断面円形の多岐管本体６００とこれに接続された５本の、それとは限定されないがここでは断面円形の分岐管６０１、６０２、６０３、６０４、６０５とからなるものである。
【０１７３】
多岐管本体６００は一端に他の管を接続するための主開口部６００ａを有し、他端６００ｂが閉鎖された内径略均一な（液流通断面積が略均一な）閉鎖筒体である。
【０１７４】
そして分岐管６０１〜６０５に対する正又は負の同一圧力下における多岐管本体６００の開口部６００ａの断面積は、それぞれ必要とする所定の通液量を与える分岐管６０１〜６０５の合計断面積に相当する断面積を有している。各分岐管の液流通断面積はここでは同一である。また多岐管本体６００の断面積は該複数分岐管の合計断面積に対して余裕のある断面積として該開口部６００ａよりは若干大きい断面積を有している。
【０１７５】
分岐管６０１〜６０５はそれぞれ多岐管本体６００の長手方向における５箇所において、多岐管本体の長手方向に直交する方向から該多岐管本体内へ突出挿入され、各分岐管の多岐管本体への突出度（突出挿入高さ）βは本体６００の内径Ｒ’の略１／２以上３／５以下の範囲内にある。
【０１７６】
分岐管６０１〜６０５のそれぞれの多岐管本体６００内への突出挿入高さは、該多岐管本体におよぶポンプ６１の吸液圧力（負圧力）又は送液圧力（正圧力）下において、該多岐管本体内の圧力（負又は正圧力）を均一圧力下におくものである。
【０１７７】
多岐管本体６００は分岐管６０１〜６０５に対して液密に接着剤、溶接等によって接続されている。
【０１７８】
この構造の多岐管においても、多岐管本体６００の主開口部６００ａにポンプ６１の吸液口を連通させて液合流用の多岐管として用いた場合、多岐管本体内の液圧（負圧力）が多岐管本体内各部で均一化され、従って各分岐管６０１〜６０５から多岐管本体６００内への吸液量は該分岐管の液流通断面積に応じたものとなる。ここでは同じ吸液量となる。
【０１７９】
また、多岐管本体６００の主開口部６００ａにポンプ６１の吐出口を連通させて液分配用の多岐管として用いた場合、多岐管本体内の液圧（正圧力）が多岐管本体内各部で均一化され、従って各分岐管６０１〜６０５からの吐出液量は該分岐管の液流通断面積に応じたものとなる。ここでは同じ吐出液量となる。
【０１８０】
以上説明したように、ここでは、多岐管Ｊ１〜Ｊ６（図１参照）として、各分岐管にその液流通断面積に応じた通液量を得ることができる多岐管を採用しており、それにより、各液槽の相互液混合を継続しつつ行う各液槽１１〜１５における液面位置の制御を、各液槽における液面高さに見合った状態で適切に行うことができ、また、それにより液面位置制御のための各弁Ｖａ、Ｖｂ（図１参照）の開閉回数を低減させることができ、その開閉サイクルをそれだけ長びかせると共に電動弁Ｖａ、Ｖｂの耐久性をも長びかせることができる。
【０１８１】
以上説明した液混合及び液面位置制御のための装置６によると、各液槽のオーバーフローボックスＢ２における液面が正常位置にあるときは、各弁Ｖａ、Ｖｂが開かれ、液循環ポンプ６１が運転されることで、複数の液槽１１〜１５のそれぞれのオーバーフローボックスＢ２から弁ｖ６１、ｖ７１を介して液が吸引され、各槽の液は液合流用の第１多岐管Ｊ１及び第３多岐管Ｊ３の各分岐管に至り、それら分岐管から該多岐管の本体内へ流入し、合流し、さらに該多岐管本体から液合流用の第２多岐管Ｊ２の分岐管へ流れ、該多岐管Ｊ２の本体を経て、各槽の液が混合された状態で液循環ポンプ６１へ吸い込まれる。
【０１８２】
そして、液循環ポンプ６１に吸い込まれた液体は該ポンプから吐き出され、ろ過器６０でろ過されたのち、液分配用の第４多岐管Ｊ４の本体へ流入し、さらに該多岐管から液分配用の第５多岐管Ｊ５及び第６多岐管Ｊ６の本体へ流入し、該多岐管の各分岐管を経て各液槽１１〜１５へ還流する。
【０１８３】
このように各液槽から吸引されたメッキ液が多岐管Ｊ１、Ｊ３で合流し、さらに多岐管Ｊ２で合流し、液循環ポンプ６１に吸い込まれて吐き出され、さらにろ過器６０を通過し、第４多岐管Ｊ４で分配され、さらに第５多岐管Ｊ５及び第６多岐管Ｊ６で分配される過程で、複数の液槽１１〜１５からのメッキ液が混合され、これが連続的に実施されることで各液槽のメッキ液組成は、均質に維持される。
【０１８４】
また、前記のとおり各液槽の液面位置が制御される。
【０１８５】
このようにして各液槽内の処理液を混合して、均一な液組成のもとに生産作業を継続的に実施できる。しかもこれら液混合と液面制御は一つの液循環ポンプ６１により達成される。
【０１８６】
かくして、装置構造の複雑化、大形化、高価格化を抑制しつつ、液槽間において処理液を均質に維持することができるとともに各液槽における液面位置の所定液面位置に対する変動を抑制できる。
【０１８７】
なお、以上説明した液混合及び液面位置制御のための装置６のように、少なくとも液循環ポンプ６１へ液を導くための各回路及び液面位置検出装置６２をオーバーフローボックスＢ２に対して設けることで、液槽の堰部を越える前の液を収容している部分で邪魔もの少なくメッキ処理を行える。また、液槽全体における液量の変動に対して液面の上下変動を大きくとれるオーバーフローボックスにおいて液槽における液面位置の変動をより決め細かく検出して、適切な液面位置制御を行える。
【０１８８】
ろ過器６０はオーバーフローボックスに流入する液量に対応できる本来の循環ろ過のためのろ過器３１、４１よりも小型でよい。しかもろ過器６０は既に述べたように１台でも足りる。
【０１８９】
図１に示すメッキ処理装置におけるメッキ液の循環ろ過装置３、４Ａ、４Ｂによる循環ろ過は、各液槽についてみると、それには限定されないが、通例に従い例えば、１時間当たり１液槽の液収容量に対し約３回循環ろ過することができる。すなわちろ過量は該容量の約３倍を標準とすることができる。
【０１９０】
また、循環ろ過装置６による液混合及び液面制御のための液処理量は、例えば１液槽の液収容量に対し１時間あたり約０．５回循環ろ過する量とできる。すなわちろ過量は該容量の約０．５倍を標準とすることができる。
【０１９１】
例えば図１に示す五つの液槽のそれぞれにおける正規の液収容量を５ｍ^３ とすると、１分間あたりのろ過量は次表のように設定できる。
【０１９２】

次に各液槽１１〜１５においてオーバーフローボックスＢ１、Ｂ２に臨む堰部２１、２２（図４も参照）について説明する。
【０１９３】
堰部２１、２２はいずれの液槽のものについても同じであるから、ここでは液槽１２に設けられているものに代表させて説明する。他の液槽についても堰部の点については以下の説明が当てはまる。
【０１９４】
堰部２１は液槽１２とオーバーフローボックスＢ１との間の仕切り壁ｗ１（図４参照）の上端縁部にオーバーフロー用ノッチ２０を形成して設けられている。堰部２２は液槽１２とオーバーフローボックスＢ２との間の仕切り壁ｗ２（図４参照）の上端縁部にオーバーフロー用ノッチ（切欠部）２０を形成して設けられている。ここでは堰部２１、２２における各オーバーフロー用ノッチ２０は同じ形状、サイズである。
【０１９５】
各ノッチ２０はここでは逆三角形状であり、堰部２１、２２のいずれについても複数形成されている。
【０１９６】
このように液オーバーフロー用ノッチ２０を形成した堰部２１、２２を採用して該ノッチ２０からオーバーフローボックスＢ１、Ｂ２へ液がオーバーフローするようにしたので、該堰部２１、２２から液を浮遊性不純物とともにオーバーフローボックスＢ１、Ｂ２へ流入させて、それらを前述のとおり該ボックスからポンプで吸引でき、これら吸引した液をろ過に供することができる。
【０１９７】
そして液オーバーフロー用ノッチ２０を形成した堰部２１、２２を採用して該ノッチ２０からオーバーフローボックスＢ１、Ｂ２へ液がオーバーフローするようにしたので、液槽１２内の液面が望ましい液オーバーフローのための液面位置より少しぐらい上昇しても、その上昇液面位置がノッチ２０に臨んでいる限り、従来の矩形堰のように堰の上端縁の全長にわたり一斉にオーバーフロー量が急激に増加し、そのために全体のオーバーフロー量が著しく増加してしまうということはなく、該ノッチ２０における液面の上昇による液流通断面積の増加分だけオーバーフロー量が増加するだけである。
【０１９８】
また、液槽１２内の液面が下降しても、その下降液面位置がノッチ２０に臨んでいる限り、従来の矩形堰のように堰部上端縁の全長にわたり一斉にオーバーフロー量が減少し、そのため全体のオーバーフロー量が著しく減少してしまうということはなく、該ノッチ２０における液面の下降による液流通断面積の減少分だけオーバーフロー量が減少するだけである。
【０１９９】
従って、液槽１２における液面の上下変動があっても、従来の矩形堰に比べると、オーバーフロー量はごく緩やかに増大又は減少する。換言すれば、液槽１２における液面の上下変動があっても、従来の矩形堰に比べると、オーバーフロー量の変動はごく小さく抑制される。
【０２００】
かくして液の適切なろ過のために、ろ過用ポンプ能力に見合った循環ろ過の液量に応じて設定される液槽１２底部からの吸液量（例えば循環ろ過液量の略７０％）とオーバーフローボックスからの吸液量（例えば循環ろ過液量の略３０％）を維持して、液の適切なろ過が達成される。
【０２０１】
また、液オーバーフロー用ノッチ２０を形成した堰部２１、２２を採用して、該ノッチ２０からオーバーフローボックスＢ１、Ｂ２へ液がオーバーフローするようにしてあり、該ノッチ２０は堰部２１、２２を越える前の液の深さ方向に延びているから、液槽１２内の液面に浮上し易い浮上性不純物だけでなく、それより下層に浮遊し易い不純物も該ノッチ２０からオーバーフローボックスＢ１、Ｂ２へ流入しやすく、かかる液面より下層に浮遊する不純物についても回収してろ過することができる。
【０２０２】
さらに、ノッチ２０の形状（ここでは特にノッチの逆三角形状の下端頂角の角度とノッチの深さ）や数を選んで、オーバーフロー量をたやすく設定できるという利点もある。なお、図示のノッチ２０は逆三角形状であるが、矩形状、Ｕ字形状など他の形状であってもよい。
【０２０３】
図示のように逆三角形状ノッチを採用するばあい、その逆三角形状の下端頂角として、それには限定されないが、４０°〜９０°、より好ましくは５０°〜６０°程度を例示できる。
【０２０４】
図１２（Ａ）に示すように、幅５００ｍｍの従来矩形堰２００があり、液槽の標準液位が該矩形堰２００の上端よりｈ＝１０ｍｍ上昇した位置にあり、このとき堰２００を越えてオーバーフローする標準液量（所定液量）は略５５．２リットル／分であり、液槽の液面がｈ＝１５ｍｍ、２０ｍｍ、２５ｍｍとそれぞれ上昇したとすると、矩形堰２００をオーバーフローする液量は次表に示すように、１０１．４リットル／分、１５６．１リットル／分、２１８．２リットル／分となる。
【０２０５】
ここで矩形堰２００に代えて、図１２の（Ｂ）、（Ｃ）、（Ｄ）に示すような幅４０ｍｍの矩形ノッチＮ１、逆三角形状の下端頂角９０度のノッチＮ２、逆三角形状の下端頂角６０度のノッチＮ３をそれぞれ有する堰部２０１、２０２、２０３を採用した場合、矩形堰２００と同じ標準オーバーフロー液量５５．２リットル／分を得ようとすると、次表に示すように、
堰部２０１については、ノッチＮ１の個数Ｐを５個とすると、各ノッチＮ１の液流通断面の高さｈ１を１８．４ｍｍとすればよい。
【０２０６】
堰部２０２については、ノッチＮ２の個数Ｐを５個とすると、各ノッチＮ２の液流通断面の高さｈ２を２８ｍｍとすればよい。
【０２０７】
堰部２０３については、ノッチＮ３の個数Ｐを４個とすると、各ノッチＮ３の液流通断面の高さｈ３を３８．１ｍｍとすればよい。
【０２０８】
すなわち、液オーバーフロー用のノッチを有するいずれの堰部２０１、２０２、２０３においても該ノッチは液の深さ方向へ延びているから、矩形堰２００の上端より液面までの高さｈ＝１０ｍｍより深く切れ込んでいる。これにより液面に浮上し易い浮上性不純物だけでなく、それより下層に浮遊し易い不純物も該ノッチからオーバーフローさせ得ることがわかる。
【０２０９】
また、液槽の液面が前記のように矩形堰２００の上端よりｈ＝１５ｍｍ、２０ｍｍ、２５ｍｍとそれぞれ上昇したときの該堰２００を越えるオーバーフロー液量と同じオーバーフロー液量を得ようとすると、各ノッチ付き堰部２０１、２０２、２０３におけるノッチの個数Ｐとノッチにおける液流通断面の高さｈ１、ｈ２、ｈ３は次表のようになる。すなわち次表より、液面の高さが通常液面位置（高さ１０ｍｍの位置）より５ｍｍ（ｈ＝１５ｍｍの場合）、１０ｍｍ（ｈ＝２０ｍｍの場合）、１５ｍｍ（ｈ＝２５ｍｍの場合）と変動しても、ノッチ付き堰部２０１、２０２、２０３においては、オーバーフロー液量の変動を矩形堰２００より小さく抑制できることがわかる。
【０２１０】
次表においてＭは矩形堰２００におけるオーバーフロー液量リットル／分を示し、ｍは各ノッチにおけるオーバーフロー液量リットル／分を示し、Ｐはノッチの数を示す。ｈ、ｈ１、ｈ２、 ｈ３ の単位は〔ｍｍ〕である。

さて、従来の上端縁が水平一直線に延びる所謂矩形堰によると、液槽の底部から吸液する量とオーバーフローボックスから吸液する量とをろ過用ポンプの能力に応じて所定の割合に設定してあっても、液槽内液面の僅かの上昇によってもオーバーフロー量が大きく増し、それによりオーバーフローボックス内液量が、ポンプ能力のうちオーバーフローボックスからの吸液能力を超えて多くなりすぎ、次第に液槽内の液面とオーバーフローボックス内の液面とが同位置近くになって落差が小さくなり、遂には浮遊性不純物をオーバーフローボックスに充分回収できなくなることがあることは、既に述べた。この点についてもう少し説明する。
【０２１１】
例えば物品の電気メッキ液処理において、メッキ処理液槽内のメッキ液の循環ろ過量は、被メッキ物によって異なるが、概ね１時間当たり液槽内処理液量の３倍のろ過量を標準とみている。そこで、従来の所謂矩形堰からメッキ処理液をオーバーフローさせる前記のようなオーバーフローボックスＢ１、Ｂ２を備える液槽の循環ろ過量を例にとると次のようになる。
【０２１２】

上記液量１１．８ｍ^３ についての１時間当たりの循環総ろ過量は、
１１．８ｍ^３ ×３倍＝３５．４ｍ^３ ／ｈｒ となる。
【０２１３】
そして液槽内及びオーバーフローボックス内の処理液のろ過量をそれぞれ全ろ過量の７０％、３０％に設定すると、次のようになる。
【０２１４】

然るに従来の矩形堰によるオーバーフロー量は、堰上端から液面までの高さｈ（図１２（Ａ）参照）を一般平均的なｈ＝１０ｍｍとすると、つぎのようになる。
【０２１５】
ｈ＝１０ｍｍのとき、堰幅を前記のように５００ｍｍとすると、オーバーフロー量は既述のとおり概ね５５．２リットル／分となり、堰幅がボックスＢ１の長さ１０ｍとボックスＢ２の長さ１ｍの合計１１ｍであるから、
５５．２リットル／分÷５００ｍｍ×１１ｍ×６０分＝７２．８６ｍ^３ ／ｈｒとなり、前記のオーバーフローボックスについて設定された循環ろ過液量１０．６ｍ^３ ／ｈｒを大幅に上回ってしまう。
【０２１６】
このことは、オーバーフローボックス内液量が、ポンプ能力のうちオーバーフローボックスからの吸液能力を超えて多くなりすぎ、急速に液槽内の液面とオーバーフローボックス内の液面とが同位置近くになって落差が無くなり、浮遊性不純物をオーバーフローボックスに充分回収できなくなることを意味する。その結果、液ろ過が不充分となり、被メッキ物表面に不純物が付着してザラ付き等が発生するなど、不良品が多発するという重大問題が生じる。
【０２１７】
そして、液槽内液面位置は、被処理物の前処理工程での被処理物による汲み上げ液及び（又は）被処理物への付着液の持ち込み、次工程への被処理物による処理液の汲み出し、前記熱交換器による液加温に際しての水分の蒸発等によって、時々刻々変動するので、各液槽内液面位置の調節、オーバーフローボックス内への液流入量の調節は頻繁にして、厄介、且つ、重要な作業となっていた。
【０２１８】
この点、前記のような液オローバーフロー用ノッチを設けた堰部を採用することで、液槽内液面の上下変動があっても、従来の矩形堰に比べると、オーバーフロー量の変動は小さく抑制され、それによりろ過用ポンプ能力に見合った循環ろ過の液量に応じて設定される液槽底部からの吸液量とオーバーフローボックスからの吸液量を維持して、液の適切なろ過が達成され、ひいては不良品の発生を大幅に低減させることができる。
【０２１９】
前記の堰部２１、２２は液槽とオーバーフローボックスＢ１、Ｂ２との間の仕切り壁ｗ１、ｗ２の上端縁部にノッチ２０を形成して固定的に設けられたものであるが、液の適切なろ過をより一層簡単容易に行うために、堰部として、液槽とオーバーフローボックスとの間の仕切り壁の上端縁部に取り外し可能に設置できる堰部材を採用することもできる。図１３はそのような着脱可能の堰部材の１例を示しており、図１４は同じく着脱式の堰部材の他の例を示している。
【０２２０】
図１３（Ａ）は堰部材８の斜視図である。図１３（Ｂ）は該堰部材の使用状態を示しており、図１３（Ａ）のＸ−Ｘ線に沿う断面で示している。堰部材８は、液オーバーフロー用の矩形ノッチ８０を四つ形成した板体８１に断面門形状（乃至Ｕ字形状）の壁差し込み部分８００を一体的に形成し、ノッチ８０を避けて補強リブ８３も一体的に形成したものである。
【０２２１】
それには限定されないが、ここでの壁差し込み部分８００は凹所の形態のもので、板体８１の片面の途中部分に倒立Ｌ字形状の屈曲板部８２を一体的に設けて形成してある。屈曲板部８２とそれに重なる位置にある板体８１の下部には、上下方向に長いボルト貫通用の長孔８２ａをそれぞれ設けてある。この堰部材８は、それには限定されないが、ここでは液槽内処理液に対し耐蝕性の合成樹脂（処理液が電気メッキ液の場合は例えば塩化ビニル樹脂）で全体を一体的に形成してある。
【０２２２】
この堰部材８は、液槽１１（１２、１３、１４、１５）とオーバーフローボックスＢ１、Ｂ２との仕切り壁に上方から差し込まれる。図１３（Ｂ）は堰部材８を液槽１１とオーバーフローボックスＢ２との間の仕切り壁ｗ２に、前記の壁差し込み部分８００で、上方から差し込んだ状態を示している。堰部材８は、液槽内の液量、ノッチ８０の大きさ等の兼ね合いで、１又は２以上が使用される。２以上を使用する場合、隣り合う堰部材８は互いに接触させて仕切り壁ｗ２に差し込む。図示を省略しているが、堰部材８と同様の堰部材が液槽とオーバーフローボックスＢ１との間の仕切り壁ｗ１にも差し込み配置される。
【０２２３】
図１３（Ａ）に示すように、堰部材８を仕切り壁ｗ２に差し込み配置するとき、必要に応じ、前記の壁差し込み部分８００の上端奥に高さ調節用のライナーＬＮを配置することができ、堰部材８は直接或いはこのライナーＬＮを介して仕切り壁ｗ２の上端に載置される。
【０２２４】
そしてこのように仕切り壁ｗ２に差し込まれた堰部材８には、例えば前記の倒立Ｌ字形状の屈曲板部分８２側から、そこのボルト貫通用長孔８２ａ、予め壁ｗ２に設けたボルト８４が丁度貫通できる内径のボルト孔及び板体８１のボルト貫通用長孔８２ａにボルト８４が通され、ナットで緊締される。このとき必要に応じ、ボルト８４に嵌合させた液シール材８４０を屈曲板部分８２及び板体８１のそれぞれの外面に当てがい、これによりボルト貫通用長孔８２ａの開いた部分を液密に閉じる。
【０２２５】
かくして堰部材８は液槽とオーバーフローボックスとの間の仕切り壁に所定高さで、換言すれば、ノッチ８０の高さ位置を、所定の液オーバーフロー量を得る高さ位置に設定して取り付けられる。
【０２２６】
この堰部材８によると、液オーバーフロー用ノッチ８０を形成してあるから、先に説明した、ノッチ２０を形成した堰部２１や２２と同様の利点がある。
【０２２７】
さらにこの堰部材８によると、オーバーフロー量を各種に設定した堰部材８のうちから適切な堰部材を選択採用して容易にオーバーフロー量を設定でき、また、前記ライナーＬＮを高さの異なるものに変更する等して堰部材８の取付け高さを変更したり、堰部材８を交換することにより、オーバーフロー量を容易に変更することもできる。
【０２２８】
仕切り壁ｗ２やｗ１が処理液に対し耐蝕性に劣る、例えば金属材からなるもので、その表面に耐蝕性合成樹脂等がコーティングしてあるときは、前記ボルト８４を通すための孔を設けるとき露出する金属材等の部分は、該ボルト孔に耐蝕性のシール剤を入れる等して保護すればよい。
【０２２９】
図１４（Ａ）は堰部材８’の斜視図である。図１４（Ｂ）は該堰部材の使用状態を示しており、図１４（Ａ）のＹ−Ｙ線に沿う断面で示している。堰部材８’は前記の堰部材８の変形例であり、次の点が堰部材８と異なる。その他の点は堰部材８と同様であり、堰部材８と同じ部分には同じ参照符号を付してある。
【０２３０】
この堰部材８’では、液オーバーフロー用の矩形ノッチ８０を形成した板体８１の上部にもボルト貫通用の長孔８２ａが形成してある。かかる長孔８２ａはここでは板体８１の両端部の上部に形成してある。そして、倒立Ｌ字形状の屈曲板部８２は板体８１の両端部にある補強リブ８３の外側位置で上部の水平部分が削除されている。
【０２３１】
この堰部材８’も堰部材８と同様に、図１４（Ｂ）に示すように壁差し込み部８００で仕切り壁ｗ２に差し込まれる。但しそのとき、倒立Ｌ字形状の屈曲板部８２の前記上部水平部分の削除部位に、それに対応して予め仕切り壁ｗ２の上端から上方へ一体的に延ばした立ち上がり壁Ｗ’が貫通し、板体８１両端部の上部に重なる。図示を省略しているが、堰部材８’と同様の堰部材が液槽とオーバーフローボックスＢ１との間の仕切り壁ｗ１にも差し込み配置される。
【０２３２】
そして堰部材８’は、堰部材８の場合と同様に板体下部において仕切り壁ｗ２にボルトナット留めされるだけでなく、板体８１の上部においても立ち上がり壁Ｗ’にボルトナット留めされる。すなわち、立ち上がり壁Ｗ’に予め設けた、ボルト８４’が丁度貫通できる内径のボルト孔及び板体８１上部のボルト貫通用長孔８２ａにボルト８４’が通され、ナットで緊締される。このときも必要に応じ、ボルト８４’に嵌合させた液シール材８４０を板体８１に当てがい、これによりボルト貫通用長孔８２ａの開いた部分を液密に閉じる。かくして堰部材８’は液槽とオーバーフローボックスとの間の仕切り壁に所定高さで、換言すれば、ノッチ８０の高さ位置を、所定の液オーバーフロー量を得る高さ位置に設定して取り付けられる。
【０２３３】
この堰部材８’においても堰部材８と同様の利点がある。さらに、堰部材８’では、その一部に仕切り壁ｗ２の一部に相当する壁Ｗ’が重ね固定されるから、堰部材８ならば液槽内の大きい液圧が加わって破損する恐れのあるときでも、堰部材８’ではその恐れがない。
【０２３４】
図１３、図１４を参照して説明した堰部材８、８’では液オーバーフローのためのノッチ８０は矩形ノッチであるが、堰部材８、８’においても液オーバーフローのためのノッチは、既述の堰部２１、２２における逆三角形状ノッチでもよく、或いはさらに他の形状のノッチでもよい。
【０２３５】
また堰部材８、８’を仕切り壁ｗ１、ｗ２に固定するのに前記の貫通ボルト８４に代えて、堰部材８、８’に螺合して仕切り壁ｗ１、ｗ２の壁面に当接することで該堰部材を仕切り壁に固定するものを採用してもよい。
【０２３６】
【発明の効果】
以上説明したように本発明によると、複数の処理液槽を有し、それぞれの処理液槽に処理液を収容し、各処理液槽において物品に目的とする処理を施す液体による物品処理装置であって、装置構造の複雑化、大形化、高価格化を抑制しつつ、液槽間において処理液を均質化することができるとともに各液槽における液面位置の所定液面位置に対する変動を抑制できる液体による物品処理装置を提供することができる。
【０２３７】
また本発明によると、液槽間において処理液を均質化することができるとともに各液槽における液面位置の所定液面位置に対する変動を抑制できる前記の液体による物品処理装置であって、さらに液循環ろ過も同時になし得る液体による物品処理装置を提供することができる。
【図面の簡単な説明】
【図１】本発明に係る循環ろ過装置を兼ねる液混合及び液面位置制御のための装置を備えた、液体による物品処理装置の１例であるメッキ処理装置の概略平面図である。
【図２】一部の液槽とその周辺部分の拡大平面図である。
【図３】図２に示す液槽のうち一つの液槽とその周辺部分の拡大側面図である。
【図４】液槽の一部の斜視図である。
【図５】図（Ａ）はアノードケース等の斜視図、図（Ｂ）はアノードバッグの斜視図、図（Ｃ）は陰極ブスバー、ハンガー及び引っ掛け部材等の斜視図である。
【図６】図（Ａ）は第１吸引ヘッドの平面図、図（Ｂ）は第１吸引ヘッドの側面図、図（Ｃ）は液槽内底溝及びオーバーフローボックス底部とそれらに関連する部品の断面図である。
【図７】第２吸引ヘッドの側面図である。
【図８】第２吸引ヘッドの他の例の斜視図である。
【図９】分岐管を２本有する多岐管の、一部を断面で示す側面図である。
【図１０】分岐管を５本有する多岐管の、一部を断面で示す側面図である。
【図１１】図（Ａ）は図１に示すメッキ処理装置の制御回路のブロック図、図（Ｂ）は液面位置検出装置の概略構成を示す図である。
【図１２】図（Ａ）は従来型の矩形堰部材の例を示す図、図（Ｂ）は液オーバーフロー用の矩形ノッチを有する堰部材例を示す図、図（Ｃ）及び（Ｄ）はそれぞれ液オーバーフロー用の逆三角形状ノッチを有する堰部材例を示す図である。
【図１３】図（Ａ）は着脱式堰部材の１例の斜視図であり、図（Ｂ）は同堰部材の使用状態を示す図（Ａ）のＸ−Ｘ線に沿う断面図である。
【図１４】図（Ａ）は着脱式堰部材の他の例の斜視図であり、図（Ｂ）は同堰部材の使用状態を示す図（Ａ）のＹ−Ｙ線に沿う断面図である。
【図１５】従来の多岐管例を一部断面で示す側面図である。
【図１６】従来の液槽とその周辺部分の概略斜視図である。
【符号の説明】
１１、１２、１３、１４、１５ メッキ処理液槽（物品処理液槽の例）
１６ 前処理水洗槽
Ｌ メッキ液
Ｗ 洗浄水
Ｄ１、Ｄ２、Ｄ３、Ｄ３、Ｄ４ 作業デッキ
１０１ 液槽の内底
１０２ 液槽に設けた内底溝
１０３ エアレーション装置
１０３ａ 気泡
１０４ 第１吸引ヘッド
１０４ａ 管接続口部
１０４ｂ 吸液孔
１０５ 空気遮断壁板
１０５ａ 支持片
１０５ｂ 支持板
１０６ 第２吸引ヘッド
１０６ａ 管接続口部
１０６ｂ 吸液孔
１０６ｃ 支持片
１０６ｄ 支持板
１０７ 吸引ヘッド
１０７ａ 管接続口部
１０７ｂ 吸液孔
１０７ｃ 足
１０８ 第３吸引ヘッド
Ｂ１、Ｂ２ オーバーフローボックス
ｗ１、ｗ２ 液槽とオーバーフローボックスとの間の仕切り壁
２１、２２ 堰部
２０ 堰部のノッチ
Ａ 陽極ブスバー
Ｃ 陰極ブスバー
Ｈ ハンガー
Ｓ 引っ掛け部材
ｍ’ アノード材
ＣＳ アノードケース
ＣＳｂ アノードバッグ
ａ１、ａ２ 被メッキ物品
３ 循環ろ過装置
３１ ろ過器
３２ 循環ポンプ（本例では遠心ポンプ）
３３ 液合流用の多岐管
ｖ１１〜ｖ１５ 手動開閉弁
ｖ１６ 逆止弁
４Ａ、４Ｂ 循環ろ過装置
４１ ろ過器
４２ 循環ポンプ（本例では遠心ポンプ）
４３０、４３１、４３２ 液合流用の多岐管
４３３ 液分配用の多岐管
ｖ４１〜ｖ４５ 手動開閉弁
ｖ４６ 逆止弁
４５ 温度制御回路
４５１ 熱交換器
ｖａ’、ｖｂ’ 手動開閉弁
Ｖ 流量調整弁
４５２ 液分配用の多岐管
５１ あけ換え装置
ｖ５１、ｖ５２、ｖ６１〜ｖ６４、ｖ７１ 手動開閉弁
５１１ あけ換え槽
ｖ５３ フート弁
４０１ 多岐管本体
４０２、４０３ 分岐管
４０１ａ 多岐管本体４０１の主開口部
４０１ｂ 多岐管本体４０１の他端
９ 従来の多岐管
９１ 多岐管本体
９１ａ 主開口部
９１ｂ 孔
９２ 分岐管
９０ 流量調整弁
６ 液混合及び液面位置制御のための装置
６０ ろ過器
６１ 循環ポンプ（本例では遠心ポンプ）
６２ 液面位置検出装置
６２１〜６２５ 電極棒
６３ 液流出口
Ｖｏ 逆止弁
Ｊ１、Ｊ２、Ｊ３ 液合流用の多岐管
Ｊ４、Ｊ５、Ｊ６ 液分配用の多岐管
Ｖａ 液排出用電動弁
Ｖｂ 液供給用電動弁
７ 制御部
７１ 操作盤
６００ 多岐管本体
６０１〜６０５ 分岐管
６００ａ 多岐管本体６００の主開口部
６００ｂ 多岐管本体６００の他端
２００ 従来の矩形堰
２０１〜２０３ 堰部
Ｎ１、Ｎ２、Ｎ３ ノッチ
８、８’ 堰部材
８０ 液オーバーフロー用の矩形ノッチ
８１ 板体
８２ 倒立Ｌ字形状の屈曲板部
８２ａ ボルト貫通用長孔
８３ 補強リブ
８４、８４’ボルト
８００ 壁差し込み部分
８４０ 液シール材
ＬＮ ライナー
Ｗ’立ち上がり壁
１０ｘ 液槽
Ａｘ 液槽内底溝
Ｂｘ オーバーフローボックス
１０’液槽
Ｌ’ 液
Ｂ１’、Ｂ２’、Ｂ３’ オーバーフローボックス
２１’、２２’、２３’ 矩形堰
ｖ１’〜ｖ７’、ｖ１”、ｖ７”、ｖ８’、ｖ９’手動開閉弁
Ｖ’ フート弁
Ｌｂ、Ｌｂ’通液口
Ｆ ろ過器
Ｐ 循環ポンプ
Ｈ 熱交換器
１００’液戻し口
５１１ｖ フート弁
５１１’ 液吐出口[0001]
TECHNICAL FIELD OF THE INVENTION
The present invention relates to an article processing apparatus that performs liquid processing such as plating, photographic development, and dyeing.
[0002]
[Prior art]
Processing an article with a processing solution is performed in various fields as is known in plating of an article with a plating solution, development of a photograph with a developing solution, dyeing of a cloth or the like with a dyeing solution, and the like. .
[0003]
In addition, the article processing with such a processing liquid is performed by various methods, such as spraying the liquid on the article, causing the liquid to contact and flow down the article, and as one of typical examples, storing the processing liquid in a liquid tank, A case where the object to be processed is immersed in the processing liquid in the liquid tank while performing the target processing while controlling the liquid quality or liquid composition of the liquid, the amount of the processing liquid in the liquid tank, the temperature, etc. as necessary. Can be mentioned. The above-described plating, photographic development, dyeing, and the like are usually performed by this method.
[0004]
Such a treatment involving immersion may be performed using only one liquid tank, but in many cases, a plurality of liquid tanks are often employed to process a large number of articles or to process a variety of articles.
[0005]
For example, in a plating process for a mass-produced component, a plurality of liquid tanks are employed for mass production of plated components, and the same plating process is simultaneously performed in each liquid tank.
[0006]
Further, in the plating process of various types of articles having different sizes, shapes, etc., a plurality of liquid tanks are employed for grouping and plating each type of article. May be subjected to a similar plating process.
[0007]
[Problems to be solved by the invention]
However, when immersion processing such as plating is performed using a plurality of liquid tanks as described above, even if the processing liquid is initially homogeneous between the liquid tanks, the processing liquid is repeatedly used in each liquid tank. In addition, the liquid composition of the processing liquid gradually changes between the liquid tanks. As a result, there is a difference in the processing state of the articles between the liquid tanks, and it becomes difficult to perform uniform article processing in each liquid tank.
[0008]
In each of the liquid tanks, the liquid is pumped out by the article and / or the liquid is taken out by adhering the liquid to the article at the time of removing the article after the treatment, and the article is put into a certain liquid tank (for example, a washing tank as a pretreatment tank). In the case where the liquid is moved to the liquid tank for the original treatment after the treatment, the liquid is pumped out by the article and / or the liquid is brought into the article by adhering to the article. The liquid level position in the tank fluctuates with respect to a predetermined liquid level position. And, in many cases, the article to be processed is supported by a suitable support device and is put into the liquid tank to a predetermined depth, so that the processing liquid amount in the liquid tank at that time differs between the liquid tanks, In one liquid tank, the entire article is immersed in the processing liquid, whereby the article is subjected to a desired treatment. However, in another liquid tank, the liquid volume is small, and the upper part of the article cannot be completely immersed in the liquid. There is an inconvenience that predetermined processing is not performed on the portion. Also, in any liquid tank, even if the article is immersed in the processing liquid, good processing may not be performed unless there is an appropriate liquid amount according to the article amount or the like.
[0009]
Therefore, the present invention is a liquid-based article processing apparatus that has a plurality of processing liquid tanks, stores processing liquid in each processing liquid tank, and can perform desired processing on an article in each processing liquid tank. Therefore, it is possible to homogenize the processing liquid between the liquid tanks and to suppress the fluctuation of the liquid level in each liquid tank with respect to the predetermined liquid level, while suppressing the complexity, size, and price increase of the equipment structure. It is an object to provide an article processing apparatus using a liquid that can be used.
[0010]
Further, the present invention is the above-described article processing apparatus using liquid, which can homogenize the processing liquid between the liquid tanks and can suppress fluctuation of the liquid surface position in each liquid tank with respect to a predetermined liquid surface position. An object of the present invention is to provide a liquid-based article processing apparatus that can simultaneously perform filtration.
[0011]
[Means for Solving the Problems]
In order to solve the above-mentioned problems, the present invention provides an article processing apparatus using a liquid that has a plurality of processing liquid tanks, stores a processing liquid in each processing liquid tank, and performs a target processing on an article in each processing liquid tank. A liquid mixture and liquid for controlling the liquid surface position in each of the processing liquid tanks to a predetermined position while collecting and mixing the liquids from each of the plurality of processing liquid tanks and returning the liquids to the respective processing liquid tanks again. Provided is a liquid-based article processing apparatus including an apparatus for controlling a surface position.
[0012]
The device for liquid mixing and liquid surface position control includes:
A liquid circulation pump,
A circuit for guiding the liquid from each of the plurality of processing liquid tanks to a first manifold for liquid merging, and for guiding the liquid merged in the first manifold to a second manifold for liquid merging;
The liquid from each of the plurality of processing liquid tanks is guided to a third manifold for liquid merging via a liquid discharge electric valve corresponding to each processing liquid tank, and the liquid merged at the third manifold is discharged to the second manifold. A circuit leading to the manifold,
A circuit for guiding the liquid merged in the second manifold to the liquid circulation pump;
A circuit for guiding the liquid from the liquid circulation pump to a fourth manifold for liquid distribution and for guiding one of the divided liquids diverted by the fourth manifold to each of the treatment liquid tanks via a fifth manifold for liquid distribution; When,
A circuit for guiding the other divided liquid divided by the fourth manifold to the respective processing liquid tanks via a sixth manifold for liquid distribution and a liquid supply motorized valve corresponding to each processing liquid tank;
A liquid surface position detection device installed for each of the processing liquid tanks,
Opening and closing of each of the liquid discharge electric valve and each liquid supply electric valve so that the liquid surface position in each of the processing liquid tanks is set to a predetermined position based on the liquid surface position detected by the liquid surface position detection device. And a motor-operated valve control unit for controlling the
[0013]
Each of the first to third manifolds for liquid merging has an internal space for liquid circulation, and a manifold main body having a liquid circulation main opening in one place communicating with the internal space; and A branch pipe connected to each of a plurality of predetermined locations except for the main opening position of the manifold main body, wherein the liquid flows into each branch pipe, merges in the manifold main body, and from the main opening. It will be leaked.
[0014]
Each of the fourth to sixth manifolds for distributing liquid has an internal space for liquid circulation and a manifold main body having a liquid circulation main opening communicating with the internal space in one place. A branch pipe connected to each of a plurality of predetermined locations except for the position of the main opening of the manifold body, wherein the liquid flows into the main opening and flows out of each branch pipe separately. It is.
[0015]
In each of the first manifold, the third manifold, the fifth manifold, and the sixth manifold, at least the same number of branch pipes as the number of processing liquid tanks may be provided. As for the second manifold and the fourth manifold, at least two branch pipes may be provided.
[0016]
According to this article processing apparatus, when the liquid surface position in each liquid tank detected by the liquid surface position detecting device provided for each liquid tank is normal, each liquid discharge motorized valve and each liquid supply motor The valve is opened based on an instruction from the motor-operated valve control unit.
[0017]
Then, by operating the liquid circulation pump, the processing liquid is sucked from each of the plurality of processing liquid tanks, and on the other hand, the liquid reaches the respective branch pipes of the first manifold for liquid confluence, and the liquid flows from the branch pipes. The liquid flows into the main body of the manifold, merges, and further flows from the main body of the manifold to one branch pipe of the second manifold for liquid merging. On the other hand, the liquid flows through the electric valve for liquid discharge for liquid merging. To the respective branch pipes of the third manifold, flows into the main bodies of the manifolds from these branch pipes, merges, and further branches another branch pipe of the second manifold for liquid merging from the main body of the manifold. Flows to The liquids thus flowing into the second manifold from different circuits join at the main body of the second manifold and are subsequently sucked into the liquid circulation pump.
[0018]
The liquid sucked into the liquid circulation pump is discharged from the pump, flows into the main body of the fourth manifold for liquid distribution, and, on the other hand, passes through one branch pipe of the fourth manifold for the liquid distribution. 5 The main body of the sixth manifold for liquid distribution flows into the main body of the manifold and returns to each processing liquid tank through each branch pipe of the manifold, while passing through the other branch pipe of the fourth manifold. And flows back from each branch pipe of the manifold to each processing liquid tank via a liquid supply electric valve.
[0019]
The processing liquid sucked from each processing liquid tank in this way merges in the first manifold and the third manifold, and also merges in the second manifold, is sucked and discharged by the liquid circulation pump, and is further discharged in the fourth manifold. In the process of being distributed by the pipes and further distributed to each of the fifth manifold and the sixth manifold, the processing liquids in the plurality of processing liquid tanks are mixed, and the processing liquids are continuously carried out so that each processing liquid tank is mixed. Is maintained homogeneous.
[0020]
In addition, during operation of the liquid circulation pump, in one or more processing liquid tanks, when the liquid level position detection device there detects a rise in liquid level to an allowable upper limit or a rise exceeding the upper limit, the electric valve control unit The electric valve for liquid supply corresponding to the liquid tank is closed based on the instruction, whereby the amount of liquid reflux to the liquid tank decreases, and the liquid level in the liquid tank drops to a normal liquid level. Go. Further, when the liquid level position detecting device detects the drop of the liquid level to the allowable lower limit or lower than the lower limit, the liquid discharge electric valve corresponding to the liquid tank is closed based on an instruction of the electric valve control unit, As a result, the liquid level in the liquid tank rises to a normal liquid level.
[0021]
Even when one of the electric valves is closed in this way, the liquid is continuously absorbed from each processing liquid tank to the liquid circulation pump via the first manifold and the second manifold, and the fourth manifold is connected to the processing manifold. And the liquid is sent to each processing liquid tank via the fifth manifold, whereby the liquid mixing processing is continued without being stopped.
[0022]
In any case, when the liquid level returns to the normal position, the closed valves Va and Vb are opened again.
[0023]
These liquid mixing and liquid surface position control can be achieved by one liquid circulation pump.
[0024]
Thus, the processing liquid can be kept uniform between the liquid tanks while suppressing the complexity, size, and cost increase of the apparatus structure, and the fluctuation of the liquid surface position in each liquid tank with respect to the predetermined liquid surface position can be suppressed. Can be suppressed.
[0025]
As the electric valve used for the liquid discharge and the liquid supply, an electromagnetic valve may be employed.However, an operation failure is likely to occur due to an impurity in the processing liquid being caught or the like. Motorized valves, including driven valves, are recommended.
[0026]
In any case, since it is preferable that the liquid sent to the liquid tank is filtered, the device for mixing and controlling the liquid level is connected between the liquid circulation pump and the fourth manifold. And a liquid circulation filtration device.
[0027]
Further, the apparatus for liquid mixing and liquid surface position control may be provided in an area where a large amount of the processing liquid is present and where the article processing is performed using the liquid. However, when the processing solution tank is provided with an overflow box installed via a weir, each circuit for guiding the liquid to the liquid circulation pump and the liquid level position detection device are provided for the overflow box. Is also good. In this way, it is possible to carry out article processing in the area of the liquid tank containing the liquid before passing over the weir portion with little obstruction, and to reduce the fluctuation of the liquid amount in the article processing area containing a large amount of the processing liquid. On the other hand, in an overflow box in which the vertical fluctuation of the liquid surface can be made large, the fluctuation of the liquid surface position in the liquid tank can be determined more finely, and appropriate liquid surface position control can be performed.
[0028]
By the way, in the liquid mixing processing for equalizing the liquid quality in each processing liquid tank, when the liquid is sucked into the liquid circulation pump through the first to third manifolds for liquid merging, the liquid circulation pump When the liquid is supplied back to the respective processing liquid tanks through the above-described fourth to sixth manifolds for liquid distribution, the amount of liquid flowing into each branch pipe and the manifold for liquid distribution in the manifold for liquid merging The amount of liquid flowing out from each branch pipe of the pipe may be random, but in such a case, the liquid level position in each processing liquid tank fluctuates greatly, and the motor-operated valve must be frequently opened and closed. If a flow control valve is provided in each branch pipe as conventionally performed in order to avoid such a problem, the cost increases accordingly, and it takes time to adjust the degree of opening or throttling of the flow control valve.
[0029]
Therefore, in order to avoid such inconvenience and minimize fluctuations in the liquid level in each processing liquid tank as much as possible, and to operate the motor-operated valve normally for a long period of time, each of the manifolds has the following structure. Is also good.
[0030]
That is, a manifold body having an internal space having the same cross-sectional area over substantially the entire length and having a liquid flow main opening portion communicating with the internal space at one location for liquid flow, and the main opening of the manifold body. A plurality of branch pipes connected to each of a plurality of predetermined locations excluding the part positions, wherein each of the branch pipes has a predetermined liquid flow cross-sectional area, and the same shape of the manifold main body. A manifold pipe is inserted into each branch pipe so as to obtain a flow rate corresponding to the liquid flow cross-sectional area in each of the branch pipes under the hydraulic pressure equalized in the section into the internal space of the cross-sectional area. It is.
[0031]
As a further specific example of this type of manifold, the manifold body has the main opening at one end, the other end is closed, and the internal space has the same cross-sectional area over the entire length between the both ends. For example, a closed cylindrical body having a circular cross section), and the branch pipe is continuously provided at each of a plurality of predetermined locations in a portion between the both ends of the closed cylindrical body, and is a direction crossing the longitudinal direction of the closed cylindrical body. To the closed cylinder body, the protruding insertion amount in the direction orthogonal to the longitudinal direction of the closed cylinder body is set to a protruding insertion amount. An example in which the protrusion is inserted within a range of 5 or less can be exemplified.
[0032]
In any case, in one manifold, the liquid flow cross-sectional areas of the branch pipes may be different or may be equal in view of other conditions. Further, the first manifold for liquid merging for liquid mixing and the fifth manifold for liquid distribution may be the same. The third manifold for liquid merging for liquid level control and the sixth manifold for liquid distribution may be the same. The second manifold and the fourth manifold may be the same.
[0033]
Since the processing liquid in each processing liquid tank is mixed with impurities during repeated use, in order to sufficiently filter this, a circulation filtration device is provided separately from the liquid mixing and liquid surface position control device. Is also good.
[0034]
For example, a circulating filtration device installed for a liquid tank group including the plurality of processing liquid tanks, or a circulating filtration apparatus installed for each of a plurality of liquid tank groups each including one or more processing liquid tanks An apparatus can be provided.
[0035]
In any case, each circulation filtration device includes a filter and a liquid circulation pump, and the liquid circulation pump absorbs liquid from a treatment liquid tank corresponding to the filtration device via a liquid absorption circuit, and is supplied to the filtration device. An example is that in which the liquid is fed and returned from the filter to the processing liquid tank via the liquid feeding circuit to feed the liquid.
[0036]
The present invention can be applied to an article processing apparatus using various liquids, for example, a plating apparatus using an article plating solution, a dyeing apparatus using a staining liquid, a developing apparatus using a photographic developer, and the like.
[0037]
BEST MODE FOR CARRYING OUT THE INVENTION
Hereinafter, embodiments of the present invention will be described with reference to the drawings.
[0038]
FIG. 1 shows a plating apparatus, which is an example of a liquid-based article processing apparatus, provided with an apparatus for liquid mixing and liquid level control which also serves as a circulation filtration apparatus according to the present invention.
[0039]
The plating apparatus shown in FIG. 1 includes five article processing liquid tanks 11, 12, 13, 14, and 15. Here, each of the liquid tanks is a plating liquid tank for plating an article. Each liquid tank may contain a different amount of plating solution, for example, a different amount of plating solution in each tank of the same liquid quality, but each liquid tank here has a capacity to contain the same amount of plating solution. Have.
[0040]
These five tanks are divided into three groups. That is, a first group including one liquid tank 11, a second group including two liquid tanks 12 and 13, and a third group including liquid tanks 14 and 15. Each liquid tank stores a predetermined plating solution L.
[0041]
In the figure, a pre-treatment water washing tank 16 is provided on the left side of the liquid tank 11, and contains washing water W so that an article to be plated can be washed as required before plating. On the left side of the liquid tank 16, a work deck D1 is provided.
[0042]
A work deck D2 is provided between the liquid tanks 11 and 12, a work deck D3 is provided between the liquid tanks 13 and 14, and a work deck D4 is provided outside the liquid tank 15.
[0043]
Each liquid tank has substantially the same structure. The structure of the liquid tank will be described with reference to FIGS. 1 to 4 taking the liquid tanks 12 and 13 as examples. FIG. 2 is an enlarged plan view of the liquid tanks 12 and 13 and its peripheral portion, and FIG. 3 is an enlarged side view of the liquid tank 12 and its peripheral portion. Note that FIG. 3 also shows an exchange device 51, which will be described later. FIG. 4 is a perspective view of a part of the liquid tank 12.
[0044]
Each liquid tank is rectangular in a plan view (when viewed from the plane), and has a liquid overflow box B1 along one long side of the rectangle and a liquid overflow box B2 along one short side of the rectangle. ing.
[0045]
Box B1 is formed shallower than box B2, and box B2 is formed deeper than box B1. The box B1 communicates with the upper part of the box B2 so that the liquid overflowing here flows into the box B2, and the bottom of the box B1 is inclined downward toward the box B2. Note that the bottom of the box B1 does not necessarily need to be inclined in this manner.
[0046]
The box B1 is installed via a weir 21 provided along the long side direction of the liquid tank, and the box B2 is installed via a weir 22 provided along the short side direction of the liquid tank. I have. The weir portions 21 and 22 will be described later in detail.
[0047]
As shown in FIG. 2, FIG. 3 and FIG. 6 (C), an inner bottom groove 102 is integrally formed at one portion of the peripheral portion of the inner bottom 101 of the liquid tank. The inner bottom groove 102 here extends along the short side direction of one side of the liquid tank over the length of the short side.
[0048]
Above each longitudinal side of the tank, anode busbars A are provided in parallel with each other, and above the center of the tank, cathode busbars C are provided in parallel with the anode busbars. .
[0049]
In plating the article, for example, as shown in FIGS. 2, 3 and 5, one or more conductive hangers H (see FIG. 5C) are hung on the cathode bus bar C at a predetermined interval. A conductive anode case CS (see FIG. 5A) containing an anode material m ′ is hung at a predetermined position of each anode bus bar A, immersed in the plating solution L, and the articles a1, a2 to be plated are hooked. S (see FIG. 5 (C)) so as to be hooked and supported, and this hooking member S may be hung on a hanger H and dipped into the plating solution L together with the articles a1 and a2. Note that CSb shown in FIG. 5B is an anode bag made of a filter cloth, and is attached to the anode case CS to prevent impurities generated on the anode side from leaking into the plating solution.
[0050]
There are many plating processes for plating an object to be processed, such as plating of copper, nickel, zinc, tin, and alloys thereof. In the case of performing nickel plating, for example, the plating solution L is changed to nickel. The case where the plating solution is used, the anode case CS is a corrosion-resistant titanium cage, and a nickel chip is accommodated in the cage as the anode material m 'can be exemplified.
[0051]
An aeration device 103 is installed on the inner bottom 101 of each liquid tank. This is formed by connecting a perforated pipe for air ejection, is connected to a compressed air supply device (not shown), and ejects bubbles 103a to each part in the processing liquid L to perform so-called aeration. The processing liquid L is agitated by this aeration, so that the liquid quality is uniform in each part in terms of the liquid composition and the liquid temperature is also uniform. Further, the impurities in the liquid are appropriately moved so as to be smoothly sucked from each part of the processing liquid in the circulating filtration described below. Further, adhesion of impurities in the liquid to the articles a1 and a2 is suppressed by aeration.
[0052]
A first suction head 104 shown in FIG. 6 is installed in the inner bottom groove 102 of each liquid layer so as to extend in the longitudinal direction of the inner bottom groove 102. The suction head 104 has a pipe connection port 104a at one end and is a cylindrical body with the other end closed, and has a plurality of liquid suction holes 104b.
[0053]
An air blocking wall plate 105 is provided between the first suction head 104 and the aeration device 103. The air blocking wall plate 105 is slightly lifted from the bottom of the inner bottom groove 102 by the support piece 105a, so that the liquid can flow under the wall plate 105. A support plate 105b is provided across the support piece 105a and the air blocking wall plate 105, and supports the first suction head 104.
[0054]
The first suction head 104 is also slightly lifted from the bottom of the inner bottom groove 102 by the support piece 105a, so that the liquid can flow under the suction head 104.
[0055]
The liquid suction hole 104b of the first suction head 104 has an angle range θ1 of 90 degrees or less from the lower end of the suction head to the side opposite to the air blocking wall plate 105 around the central axis in the longitudinal direction of the suction head, and the lower end of the head. Is formed in a range of a central angle θ (θ1 + θ2) = 135 ° within an angle range θ2 of 45 ° or less toward the blocking wall plate 105 side. The angle θ is an angle range for orienting the liquid-absorbing hole so that the precipitated impurities accumulated in the inner bottom groove 102 can be smoothly sucked and the air from the aeration device 103 is hardly sucked. Is about 135 degrees.
[0056]
Further, the liquid suction holes 104b of the first suction head 104 are formed in a dispersed manner so that a uniform amount of liquid can be sucked at each part extending in the longitudinal direction of the suction head.
[0057]
In order to allow a uniform amount of liquid to be sucked in each part of the suction head, the total cross-sectional area of the liquid suction hole in a portion near the pipe connection port of the suction head is smaller than the total cross-sectional area of the liquid suction hole in a portion farther away. The number and / or diameter of the liquid absorbing holes may be adjusted to form the liquid absorbing holes in a dispersed manner. Here, the diameter of each of the liquid suction holes is the same, and in a portion close to the pipe connection port portion 104a and a portion farther from the pipe connection port portion 104a, the liquid suction holes 104b are sparser in the near portion than in the far portion, and more in the far portion. It is densely dispersed and formed.
[0058]
According to the first suction head 104, impurities that easily precipitate on the bottom of the inner bottom groove 102 can be uniformly and smoothly sucked from the entire inner bottom groove as much as possible.
[0059]
Since the inner bottom groove 102 formed by dropping into the inner bottom 101 of the liquid tank is provided here, the first suction head 104 is installed therein, and the air blocking wall plate 105 is further installed therein. It is difficult for the head 104 to suck in the air ejected from the aeration device 103. In addition, impurities that easily accumulate in the inner bottom 101 of the liquid tank and impurities floating near the bottom of the liquid tank are collected in the inner bottom groove 102 and can be smoothly and easily sucked by the first suction head 104. Furthermore, as described later, when the liquid in the liquid tank is drained and filtered, the sedimentation that still remains when cleaning the liquid tank that has been emptied or almost emptied due to the drainage filtration processing. The impurities and the liquid containing the same are easily collected in the inner bottom groove 102 together with the cleaning liquid (usually cleaning water) for discharging (usually water) into the liquid tank for cleaning, and smoothly collected by the first suction head 104. Can be easily sucked. Further, it is possible to prevent the object to be plated from dropping due to contact between the object to be plated and the suction head 104 and the like without the necessity of expensive measures such as increasing the depth of the entire liquid tank. it can.
[0060]
As a result, the filtering treatment of the liquid in the liquid tank can be performed more smoothly than in the past, and without causing a remarkable increase in cost.
[0061]
In addition, in order to more efficiently suck impurities that easily accumulate in the bottom of the liquid tank, in addition to the first suction head 104, a portion of the inner bottom 101 of the liquid tank other than the inner bottom groove 102, for example, a peripheral portion of the inner bottom 101. One or more third suction heads may be provided in a part or the like. FIG. 3 shows an example in which the third suction head 108 is installed at a peripheral portion along the longitudinal direction of the liquid tank bottom 101 by a chain line.
[0062]
The third suction head 108 also has a structure similar to that of the first suction head 104, and the liquid suction holes may be formed in a dispersed manner so that a uniform amount of liquid can be sucked in each portion of the suction head in the longitudinal direction. Further, an air blocking wall plate 109 may be provided between the third suction head 108 and the aeration device 103.
[0063]
Further, the liquid suction ports of the third suction head 108 also have an angle range θ1 of 90 degrees or less from the lower end of the suction head to the side opposite to the air blocking wall plate 109 around the central axis in the longitudinal direction of the suction head, and It is preferable that the central angle θ (θ1 + θ2) = 135 ° in an angle range θ2 of 45 ° or less from the lower end of the head to the blocking wall plate 109 side.
[0064]
At the inner bottom of the deeper overflow box B2, a second suction head 106 (not shown in FIGS. 1 and 4) shown in FIGS.
[0065]
The second suction head 106 is supported via a support piece 106c and a support plate 106d erected on the support piece 106c, and the liquid can flow below the suction head 106. The suction head 106 extends substantially parallel to the short side of the liquid tank, has a pipe connection port 106a at one end, is a closed cylinder at the other end, and has a plurality of liquid suction holes 106b. are doing. The liquid suction holes 106b are formed in a dispersed manner so as to be able to absorb a uniform amount of liquid in each part extending in the longitudinal direction of the suction head 106.
[0066]
Regarding the second suction head installed in the overflow box B2 as well, in order to allow a uniform amount of liquid to be sucked in each part of the suction head, the total cross-sectional area of the liquid suction holes in a portion close to the pipe connection port of the suction head is required. The number and / or diameter of the liquid-absorbing holes may be adjusted so as to be smaller than the total cross-sectional area of the liquid-absorbing holes in a farther part, and the liquid-absorbing holes may be dispersedly formed. Here, the diameter of each of the liquid suction holes 106b is the same, and in a portion near the pipe connection port portion 106a and in a portion farther from the port connection portion 106a, the liquid suction holes are sparser in the near portion than in the far portion, and more in the far portion. It is densely dispersed and formed.
[0067]
According to the second suction head 106, the liquid and impurities can be sucked uniformly and smoothly from the entirety of the overflow box B2 as much as possible.
[0068]
Conventionally, when sucking a liquid from the overflow box, a liquid outlet to the outside is provided at the bottom of the overflow box, a liquid suction pipe is connected to the liquid inlet, and the liquid is sucked downward by the liquid suction pipe. Therefore, impurities in the liquid were easily clogged at the liquid inlet and the connection portion thereof, which caused a remarkable trouble in the filtering operation. However, here, the liquid suction pipe of the second suction head 106 is connected from the bottom of the box. Since the liquid can be absorbed upward, clogging of the head 106 and the liquid suction pipe connected thereto with impurities is sufficiently suppressed.
[0069]
This will be further described. FIG. 16 shows a conventional example (an example of a plating apparatus). 16A and 16B, 10 'is a liquid tank, B1', B2 ', and B3' are overflow boxes attached to the liquid tank, and 21 ', 22', and 23 'are rectangular weirs facing the overflow box. , V 'are foot valves installed at the bottom of the liquid tank.
[0070]
In FIG. 16A, an overflow box B1 'is a groove-shaped box, and the processing liquid L' flowing therein flows into a box B2 '. A liquid inlet Lb is provided at the bottom of the overflow box B2 'shown in FIG. 16A, and is connected to the liquid inlet of the liquid filter F via valves v1' and v2 'and a pump P. Have been. The in-liquid foot valve V 'is connected to the liquid inlet of the liquid filter F via valves v7' and v2 'and a pump P. The liquid discharge port of the filter F is returned to the heat exchanger H for liquid heating or liquid cooling via valves v3 ', v4' and v5 ', and further returned to the liquid tank 10' via valve v6 '. While the pipe is connected to the port 100 ′, the pipe is connected to the liquid discharge port 511 ′ from the space between the valves v 3 ′ and v 4 ′ to the replacement tank 511 via the valve V 8 ′. At the bottom of the refilling tank 511, a liquid suction foot valve 511v is provided, which is connected to the liquid suction port of the pump P via a valve v9 '.
[0071]
The bottom of the overflow box B3 'shown in FIG. 16 (B) is provided with a liquid passage port Lb' via a valve v1 ", and a foot valve V 'in the liquid tank via a valve v7". Each is connected to the same valve v2 'as shown in FIG. The other points are the same as those of the liquid circuit of FIG.
[0072]
The circuit for pre-coating the filter aid in the filter is not shown.
[0073]
The opening and closing of each valve is as follows.

In the plating process and the replacement filtration process in the liquid tank, when the amount of the liquid in the overflow box B2 ′ (B3 ′) decreases and the inside of the overflow box becomes dry, the air in the pump P Valve v1 '(v1 ") is closed to prevent suction.
[0074]
Thus, conventionally, as illustrated in FIG. 16, when the liquid is sucked from the overflow box B2 ′ or B3 ′, the liquid is sucked from the liquid passage ports Lb and Lb ′ at the bottom of the overflow box. The liquid suction pipe of the second suction head 106 here sucks upward from the bottom of the box. Since the liquid can be formed, clogging of the head 106 and the liquid suction tube connected thereto with impurities is sufficiently suppressed.
[0075]
Let's go back and explain again.
[0076]
The diameter of each of the liquid suction holes 104b of the first suction head 104, each of the liquid suction holes 106b of the second suction head 106, and each of the liquid suction ports of the third suction head 108 is the same as that of the manifold described later. Is set to be equal to or smaller than the impeller blade height in the centrifugal pump for liquid circulation for liquid filtration, which is connected through a.
[0077]
By reducing the diameter in this way, a part or part of the article to be plated that may fall into the liquid tank and other miscellaneous goods brought in from outside are sucked into the centrifugal pump and bitten by the impeller blades. For example, the pump can be prevented from breaking down due to the insertion.
[0078]
It should be noted that another form of suction head may be employed instead of the second suction head 106. For example, a suction head 107 shown in FIG. 8 may be employed.
[0079]
The suction head 107 can also be called a dust removal strainer, has a small box shape, has a pipe connection port 107a at the top, and has a plurality of liquid suction holes 107b formed on the side peripheral wall and the bottom wall in a dispersed manner. . The foot 107c is attached, and it stands at the bottom of the overflow box B2. The diameter of each of the liquid suction holes 107b may be set to be equal to or smaller than the impeller blade height of the centrifugal pump for liquid circulation.
[0080]
The first suction head 104, the second suction head 106 (or 107), or the third suction head 108 described above is a component of the circulating filtration device described below.
[0081]
A circulating filtration device is provided for each of the first group including the one liquid tank 11 described above, the second group including the two liquid tanks 12 and 13, and the third group including the liquid tanks 14 and 15. Further, a circulating filtration device for a fourth group including all the liquid tanks from the liquid tank 11 to the liquid tank 15 is provided.
[0082]
In FIG. 1, reference numeral 3 denotes a circulating filtration device for the liquid tank 11, reference numeral 4A denotes a circulating filtration device for the liquid tanks 12, 13, reference numeral 4B denotes a circulating filtration device for the liquid tanks 14, 15, and all liquid tanks 11 to 15 are provided. The reference numeral 6 indicates a circulating filtration device for.
[0083]
Note that the manual on-off valve employed in each of the circulating filtration devices and the replacement filtration device described below may be automatically controlled as an electric valve or the like.
[0084]
In the circulating filtration device, the circulating filtration device 3 of the first group is a single circulating filtration device of one liquid tank by one liquid circulating pump (here, a centrifugal pump), and the circulating filtration device 4A of the second group and the circulating filtration device 4 of the third group. The circulation filtration device 4B is a circulation filtration device using one liquid circulation pump (here, a centrifugal pump) for each of two treatment liquid tanks. Further, the circulation filtration device 6, which is a fourth group, is a circulation filtration device using one liquid circulation pump (here, a centrifugal pump) for all five treatment liquid tanks.
[0085]
Each of the second group filtration device 4A and the third group filtration device 4B is a two-liquid tank circulating filtration device using one liquid circulating pump, and the processing liquid in the two liquid tanks in each group is processed in the circulating filtration process. However, the liquid flow rate in the circulation circuit slightly increased or decreased, and as time passed, the liquid level of one of the two liquid tanks decreased, and the liquid level of the other liquid tank decreased. An increase and inflow of the liquid amount corresponding to the reduced amount of liquid in the tank occurs, and finally the processing liquid overflows from the other liquid tank, and the liquid level of the processing liquid in one of the liquid tanks drops too much, so that both liquid tanks are processed. In some cases, plating with a solution may not be possible.
[0086]
Therefore, here, a circulation filtration device 6 for simultaneously performing circulation filtration by one liquid circulation pump is installed and operated for all five liquid tanks, thereby controlling the liquid level between the liquid tanks so as to suppress the vertical difference. The liquid is mixed while controlling the position, so that the circulating filtration is performed while the composition and temperature of the liquid in each liquid tank are made uniform. That is, the circulation filtration device 6 is not only a circulation filtration device but also a device for liquid mixing and liquid level position control.
[0087]
In addition, the apparatus for liquid mixing and liquid level position control can perform circulating filtration while performing liquid mixing and liquid level position control in each liquid tank even when the capacity of each liquid tank is different.
[0088]
The circulating filtration device 3 for the liquid tank 11 includes a filter 31 and a circulating pump 32 for liquid circulation (in this example, a centrifugal pump is employed). The liquid tank 11 can communicate with the liquid suction port of the circulation pump 32 via a liquid suction circuit. The filter 31 can communicate with the liquid tank 11 via a liquid sending circuit.
[0089]
As shown in FIG.
A first suction head 104 and a second suction head 106 in the liquid tank 11 (omitted in FIG. 1, see FIGS. 2, 6, 7 and the like);
A manifold 33 for liquid joining;
Piping for connecting the pipe connection ports 104a (see FIG. 6) and 106a (see FIGS. 6 and 7) of the suction heads 104 and 106 to the branch pipe of the manifold 33 via the manual on-off valves v11 and v12, respectively;
And a pipe connecting the main opening of the manifold 33 to the liquid suction port of the circulation pump 32 via the manual opening / closing valve v13.
[0090]
When the third suction head 108 is employed, the liquid sucked by the third suction head 108 is finally mixed and merged with the liquid sucked through the valves v11 and v12 to flow into the pump 32. , Is connected to the pump 32 via a manifold or the like.
[0091]
The liquid sending circuit includes a pipe for connecting the liquid sending port of the filter 31 to two locations of the liquid tank 11 via a manual opening / closing valve v14, a temperature control circuit 45, and two manual opening / closing valves v15. The communication with the liquid tank 11 is not limited to two places as described above, but may be one place or three or more places.
[0092]
The discharge port of the circulation pump 32 is connected to the liquid supply port of the filter 31 via a check valve v16.
[0093]
The filter 31 can be of various types adapted to the type of liquid and the amount of filtrate, but in this case, the liquid to be injected into the filter passes through a filtration bed having a precoat layer with a suitable filter aid. This is a type of filter where impurities are filtered and purified. The filters in the circulation filtration devices 4A and 4B, which will be described later, and in the device 6 for liquid mixing and liquid level control are also of the same type.
[0094]
In addition, the liquid supply circuit restores a liquid structure that changes due to deterioration, consumption, etc. of the plating liquid in one liquid tank, and further, removes and filters accumulated impurities (see FIGS. 1 and 3). Reference).
[0095]
The basic structure of the temperature control circuit 45 and the replacement device 51 in the circulation filtration device 3 is the same as that of the temperature control circuit 45 and the replacement device 51 in the circulation filtration devices 4A and 4B described below. In the following, the circuit 45 and the device 51 will be described, and the description of the temperature control circuit 45 and the device 51 will be omitted.
[0096]
Since the circulating filtration devices 4A and 4B have exactly the same structure and operation, only the device 4A will be described, and the description of the device 4B will be omitted. The same components in the devices 4A and 4B are denoted by the same reference numerals in the drawings.
[0097]
As shown in FIG. 1, the circulating filtration device 4A includes a filter 41 and a circulating pump 42 for liquid circulation (a centrifugal pump in this example). The liquid tanks 12 and 13 can communicate with the liquid suction port of the circulation pump 42 via a liquid suction circuit. The filter 41 can communicate with the liquid tanks 12 and 13 via a liquid sending circuit.
[0098]
The liquid suction circuit is
A first suction head 104 and a second suction head 106 in each of the liquid tanks 12 and 13 (omitted in FIG. 1, see FIG. 2 and the like);
Manifolds 431, 432, and 430 for liquid merging;
The connection ports 104a (see FIG. 6) and 106a (see FIGS. 6 and 7) of the suction heads 104 and 106 of one of the liquid tanks 12 are connected to one manifold 431 via manual on-off valves v41 and v42, respectively. A pipe connected to the pipe,
A pipe connecting the pipe connection ports 104a and 106a of the suction heads 104 and 106 of the other liquid tank 13 to the branch pipe of the other manifold 432 via the same manual opening / closing valves v41 and v42 as in the liquid tank 12, respectively; ,
A pipe connecting the main openings of the manifolds 431 and 432 to the branch pipe of the manifold 430;
And a pipe for connecting the main opening of the manifold 430 to the liquid suction port of the circulation pump 42 via the manual opening / closing valve v43.
[0099]
When the third suction head 108 is employed in the liquid tanks 12 and 13, the liquid sucked by the third suction head 108 is finally mixed with the liquid sucked through the valves v41 and v42, joined together, and Is connected to the pump 42 via a valve, a manifold or the like so as to flow into the pump 42.
[0100]
The liquid sending circuit is
A pipe connecting the liquid supply port of the filter 41 to the main opening of the manifold 433 for liquid distribution via the manual open / close valve v44 and the temperature control circuit 45;
A pipe for connecting one branch pipe of the manifold 433 to two places of the liquid tank 12 via two manual on-off valves v45,
A pipe for connecting the other branch pipe of the manifold 433 to two places of the liquid tank 13 via two manual opening / closing valves v45 similar to the case of the liquid tank 12 is included.
[0101]
The discharge port of the pump 42 is connected to the liquid supply port of the filter 41 via a check valve v46.
[0102]
The filter 41 is the same type as the filter 31 in the circulating filter 3. Note that different types may be used.
[0103]
In addition, one liquid tank is selected from the two liquid tanks 12 and 13 in the liquid sending circuit to restore the liquid structure that changes due to the deterioration and consumption of the plating solution in the liquid tank, and further, to reduce accumulated impurities. A replacement device 51 (see FIG. 3) for performing removal filtration is additionally provided.
[0104]
As shown in FIG. 3, the temperature control circuit 45 has a flow control valve V connected in parallel to a circuit in which a manual open / close valve va ′, a heat exchanger 451, and a manual open / close valve vb ′ are connected in series. The inlet of the valve va 'on the side and the inlet of the flow control valve V are connected to the valve v44 (the valve on the outlet side of the filter) via a manifold 452 for liquid distribution, and the outlet of the valve vb' and the flow control. The outlet of the valve V is connected to the liquid distribution manifold 433 that leads to the liquid tank.
[0105]
The temperature control circuit 45 in the circulation filtration device 3 has basically the same structure as the temperature control circuit 45 in the circulation filtration device 4A. However, in the temperature control circuit 45 in the circulating filtration device 3, the outlets of the valve corresponding to the valve vb 'and the valve corresponding to the flow regulating valve V are collected in one pipe without passing through the manifold, and two manual It is branched and communicated to two places of the liquid tank 11 via the on-off valve v15. The number of communication points with the liquid tank 11 may be one or three or more.
[0106]
As shown in FIG. 3, the refilling device 51 pipes the liquid supply port of the filter 41 so as to be able to communicate with the refilling tank 511 via the manual opening / closing valve v51, and also manually connects the liquid suction port of the pump 42. The pipe is connected to a conventional foot valve v53 installed at the bottom of the refilling tank 511 via an on-off valve v52.
[0107]
The replacement device 51 in the circulation filtration device 3 has basically the same structure as the replacement device 51.
Here, the "manifold" described above and below will be described. The manifold includes a manifold body in the form of a closed cylinder having one end closed, and a plurality of branch pipes connected thereto. And in a circulating filtration device using the manifold in a liquid suction circuit from a liquid tank by a circulation pump and a liquid sending circuit from a filter to a liquid tank, a plurality of the same or different cross-sectional areas provided in the main body of the manifold are provided. The flow rate of liquid absorption or liquid transfer from each of the branch pipes is determined by the cross-sectional area of the branch pipe.
[0108]
More specifically, in each of the plurality of branch pipes, the flow rate per unit cross-sectional area is, for example, the precoat layer of the filter aid of the filter is significantly clogged beyond the allowable range of impurity removal, and the pressure before and after the precoat layer is reduced. As long as there is no inconvenience, such as a significant difference in the pressure difference between the undiluted liquid chamber and the filtration chamber in the filter, etc., the amount of liquid flowing through each branch pipe is equal to the unit cross-sectional area. Has a cross-sectional area to obtain a required predetermined liquid flow rate based on The manifold body has the same cross-sectional area over substantially the entire length of the cylinder constituting the manifold body, and has a cross-sectional area slightly larger than the total cross-sectional area of the plurality of manifolds. The pressure in the manifold body is set under the same negative pressure or the same positive pressure under the same cross-sectional area over substantially the entire length of the cylindrical body, and a predetermined flow rate of each branch pipe can be obtained without excess or shortage.
[0109]
Returning to the original description, the manifold for liquid junction 33 and the manifold (not shown) of the temperature control circuit 45 in the circulation filtration device 3 described above, and the manifold for liquid junction in the circulation filtration devices 4A and 4B are described. 431, 432, 430, the manifold 433 for liquid distribution and the manifold 452 of the temperature control circuit 45 are all basically the same in structure as the manifold shown in FIG. 9, and are made of vinyl chloride resin (PVC). ), And the material of the manifold shown in FIG. 10 described later is the same. These manifolds may be made of another material, for example, another synthetic resin or metal.
[0110]
That is, the manifold 33 for the liquid junction in the circulation filtration device 3, the manifold not shown of the temperature control circuit 45, the manifolds 431, 432, 430 for the liquid junction in the circulation filtration devices 4A and 4B, the manifold for the liquid distribution. As shown in FIG. 9, the manifold 433 and the manifold 452 of the temperature control circuit 45 are not limited thereto, but here are a manifold main body 401 having a circular cross section and two connected thereto. Although it is not limited, here, it comprises branch pipes 402 and 403 having a circular cross section. The manifold main body 401 is a closed cylinder having a substantially uniform inner diameter (substantially uniform liquid flow cross-sectional area) having a main opening 401a at one end for connecting another pipe and closing the other end 401b.
[0111]
The cross-sectional area of the opening 401a of the manifold main body 401 under the same positive or negative pressure with respect to the branch pipes 402 and 403 corresponds to the total cross-sectional area of the branch pipes 402 and 403 that respectively provide a required predetermined flow rate. It has the following cross-sectional area.
[0112]
Further, the cross-sectional area of the manifold body 401 has a cross-sectional area slightly larger than the opening 401a as a cross-sectional area having a margin with respect to the total cross-sectional area of the plurality of branch pipes.
[0113]
The branch pipes 402 and 403 are inserted into the manifold body at two locations in the longitudinal direction of the manifold body 401 from a direction perpendicular to the longitudinal direction of the manifold body, and are inserted into the manifold bodies of the branch pipes 402 and 403. (Projection insertion height) α is within a range of approximately 以上 to ／ of the inner diameter R of the main body 401.
[0114]
The height of the branch pipes 402 and 403 protruding into the manifold body 401 is determined by the pump body suction pressure (negative pressure) or the liquid sending pressure (positive pressure) applied to the manifold body. The internal pressure (negative or positive pressure) is kept under uniform pressure.
[0115]
The manifold main body 401 is liquid-tightly connected to the two branch pipes 402 and 403 by an adhesive, welding, or the like.
[0116]
The basic configuration of the manifold shown in FIG. 10 to be described later, the manifold main body 600, and the branch pipes 601 to 605 are the same as those of the manifold described above.
[0117]
In any manifold, the connection site of the branch tube to the manifold main body is not particularly limited, and can be connected to an arbitrary site around the manifold main body according to the liquid circuit configuration. In addition, the angle of the branch pipe at the time of the connection does not necessarily have to be in the direction orthogonal to the longitudinal direction of the manifold body.
[0118]
According to the manifold having such a structure, when the suction port of the liquid circulation pump is connected to the main opening 401a of the manifold main body 401 and used as a manifold for liquid merging, the suction pressure (negative pressure) of the pump, That is, the liquid pressure (suction pressure) in the manifold main body is equalized in each part in the manifold main body. Therefore, the amount of liquid absorbed from each branch pipe 402, 403 into the manifold main body 401 is determined by the liquid flow cross-sectional area of each branch pipe. It will be according to.
[0119]
Further, when a discharge port of a pump is connected to the main opening 401a of the manifold body 401 and used as a manifold for liquid distribution, the discharge pressure (positive pressure) of the pump, that is, the liquid pressure (positive pressure) in the manifold body is used. Pressure) is equalized in each part in the manifold main body, so that the amount of liquid discharged from each of the branch pipes 402 and 403 is in accordance with the liquid flow cross-sectional area of the branch pipe.
[0120]
Here, the manifold having such a structure is used as a manifold (not shown) of the manifold 33 and the temperature control circuit 45 in the circulating filtration device 3 and the manifolds 431, 432, and 430 for liquid merging in the circulating filtration devices 4A and 4B. , The liquid distribution manifold 433 and the manifold 452 of the temperature control circuit 45, a predetermined amount of liquid is sucked from the inner bottom groove 102 of the liquid tank and the overflow box B2, and the liquid is A predetermined amount of the filtered liquid can be returned to the tank 11, and the circulating filtration devices 4A and 4B provided for the plurality of liquid tanks each have a predetermined amount of the filtered liquid in the plurality of liquid tanks. In each temperature control circuit 45, a manifold 452 is provided as shown in FIG. 3 to easily send the liquid to the heat exchanger at an arbitrary heat exchange flow rate set by the flow control valve V. It's that.
[0121]
The conventional manifold 9 has a main opening 91a for liquid circulation in one place as shown in FIG. 15, and branch pipes in a plurality of places except for the position of the main opening 91a. 92 are connected. The connection of the branch pipe 92 is made by connecting one end of the branch pipe to a hole 91 b provided in the wall of the manifold main body 91.
[0122]
However, in such a conventional manifold, the fluid pressure does not act uniformly at each part of the entire length of the manifold body, and particularly when the filtration pressure in the filter increases with the removal of impurities, even if the filtration pressure is increased. Even if the filter itself is within the allowable range, the liquid pressure does not act uniformly at each part. For example, if the liquid is introduced into the manifold body 91 from the main opening 91a under a positive pressure by a pump, the main opening 91a A large amount of liquid flows out to the branch pipe close to the main opening 91a, and at each position sequentially away from the main opening 91a, the liquid pressure drops due to the liquid flowing out to the branch pipe at a position before that, and the liquid pressure at that position is reduced. Only a smaller amount of liquid flows into the branch pipe.
[0123]
On the other hand, when the liquid flows from the outside into the branch pipe 92 under the liquid suction pressure (negative pressure) of the pump and is sucked through the main opening 91a, a large amount of liquid flows from the branch pipe near the main opening 91a. Although the liquid can be sucked, the liquid suction effect of the pump decreases as the distance from the main opening 91a increases, so that a smaller amount of liquid can be sucked from the branch pipe 92 at that position.
[0124]
A liquid circuit for filtering the processing liquid through such a manifold, a liquid circuit for maintaining the processing liquid in a plurality of liquid tanks described later uniformly, a liquid circuit for controlling the liquid surface position in each liquid tank, and the like. If this is adopted, the desired filtration treatment, maintenance of the treatment liquid quality, and liquid level control will be hindered.
[0125]
In order to solve such a problem, it is necessary to provide a flow control valve 90 in each branch pipe. However, this increases the cost, and furthermore, the filtration amount that decreases with the passage of time according to the amount of impurities removed by filtration. Further, in order to make the suction and the decrease in the flow rate of each liquid feed pipe uniform due to the pipe resistance, it is extremely troublesome to adjust the degree of opening or the degree of restriction of the flow rate control valve 90.
[0126]
In this regard, according to the manifold having the structure shown in FIG. 9, it is not necessary to provide a flow control valve 90 for flow control as shown in FIG. The quantity can be obtained simply, easily and inexpensively.
[0127]
Next, the filtering device and the like described above will be described from the filtering device 4A for convenience of description.
[0128]
According to the circulation filtration device 4A, in normal circulation filtration,
The valves v41 to v45 are opened,
The valves va ′, vb ′, and V in the temperature control circuit 45 are each set to an arbitrary predetermined degree of opening (always open),
The manual on-off valves v51 and v52 leading to the refilling device 51 are closed.
[0129]
By operating the circulation pump (centrifugal pump in this example) 42, the plating solution mainly containing the sedimentary impurities is removed from the inner bottom grooves 102 of the liquid tanks 12 and 13 by the first suction head 104 via the valve v 43. When the third suction head 108 is also installed at another portion of the bottom of the liquid tank as shown by a dashed line in FIG. 3, impurities from the bottom of the liquid tank and its vicinity are also removed from the third suction head. The plating solution containing the plating solution is sucked, and on the other hand, the floating impurities flowing into the overflow boxes B1 and B2 of the solution tanks 12 and 13 together with the plating solution over the weir portions 21 and 22 are collected into the box B2. The liquid is sucked together with the liquid by the second suction head 106, the impurities are filtered by the filter 41, and the plating solution after the filtration can be returned to the liquid tanks 12 and 13 again. Since the filtered liquid is returned to a plurality of locations instead of one location in each liquid tank, the degree of cleanliness of the liquid in each part of the liquid tank is improved accordingly.
[0130]
During this circulating filtration, the plating solution is controlled to a predetermined temperature by the heat exchanger 451 in the temperature control circuit 45.
[0131]
When the plating apparatus is started to operate during a long holiday or a holiday, when the temperature of the plating solution is greatly deviated from a predetermined temperature, the flow rate adjusting valve V in the temperature control circuit 45 is maintained until the temperature reaches or approaches the predetermined temperature. By squeezing or closing the plating solution and intensively flowing the plating solution into the heat exchanger 451, a predetermined plating solution working temperature can be promptly obtained.
[0132]
By the way, in the case of an article processing liquid tank, generally, the processing liquid contains impurities that are originally attached to the object to be processed and are brought in, and impurities generated during the pre-processing step of the object to be processed and adhere to the object to be processed. The impurities brought in as well as the impurities generated by electrolysis, deterioration, etc. in the process of processing the object to be processed in the processing solution are synergistically accumulated, and the impurities accumulate on a daily basis, thereby increasing the cost of the filter. Frequent washing and restoration of the filtration bed and refilling of the liquid tank must be performed.
[0133]
Taking an article plating solution tank as an example, the plating solution contains impurities that are originally attached to the object to be processed and are brought in, and impurities generated during the pretreatment process of the object to be processed, Impurities that adhere to the surface and are brought in, as well as impurities that are generated due to anode electrolysis and deterioration of the processing solution during the processing of the processing object in the plating solution bath, and impurities that may fall into the solution bath from outside. As a result, impurities accumulate every day, which necessitates frequent washing and restoration of the filter bed in the filter, and replacement of the liquid in the tank. Furthermore, due to these operations, the production of plating products is interrupted, overtime is increased, labor costs are increased, expensive plating solutions are lost, chemicals and drainage management costs are increased, and energy such as electricity is excessive. This leads to wear and, consequently, soaring of plated products.
[0134]
In the case of replacement filtration, the cycle of replacement filtration is greatly affected by the liquid quality, product type, and the like, but is generally between one month and three months. Activated carbon treatment for removing inorganic and organic impurities, filtration and the like are performed by replacement filtration to recover and restore the liquid composition, and the recovered liquid is returned to the original liquid tank again.
[0135]
In the plating solution baths 11 to 15 that have just been described, replacement filtration is performed as follows.
[0136]
That is, when performing the replacement filtration of the plating solution in the liquid tank 12, the circulation filtration device 4A
Close the valve v42 on the liquid tank 12 side, the valves v41 and v42 on the liquid tank 13 side, the valve v44 leading to the inlet of the temperature control circuit 45, and the valve v52 of the replacement device 51,
The valve v41 in the refilling device 51 is opened together with the valve v41 on the liquid tank 12 side and the valve v43 communicating with the liquid suction port of the pump 42,
The pump 42 is operated.
[0137]
As a result, the liquid in the liquid tank 12 via the valve v41 on the liquid tank 12, the manifold 431, the manifold 430, the valve v43 on the pump suction side, the pump 42, the check valve v46, the filter 41, and the valve v51. The plating solution can be collected in the replacement tank 511. The liquid collected in the replacement tank 511 is subjected to activated carbon filtration, liquid composition restoration, and the like.
[0138]
For the recirculation of the treated liquid from the drainage tank 511 to the liquid tank 12,
The valve v51 of the refilling device 51, the valve v43 communicating with the liquid suction port of the pump 42, and the valve v45 on the liquid tank 13 side are closed,
Open the valve v52 of the refilling device, the valve v44 leading to the temperature control circuit 45, the valve V of the temperature control circuit 45, and the valve v45 on the liquid tank 12 side,
The pump 42 is operated.
[0139]
As a result, the plating solution restored from the foot valve v53 at the bottom of the replacement tank 511 is sucked, and the valve v52, the pump 42, the check valve v46, the filter 41, the valve v44, and the temperature control circuit 45 of the replacement apparatus. Is returned from the valve v45 on the liquid tank 12 side to the liquid tank 12 via the manifold 452, the valve V, and the manifold 433.
[0140]
On the other hand, when performing the replacement filtration of the plating solution in the liquid tank 13,
Close the valve v42 on the liquid tank 13 side, the valves v41 and v42 on the liquid tank 12 side, the valve v44 leading to the temperature control circuit 45, and the valve v52 of the replacement device 51,
The valve v51 of the refilling device 51 is opened together with the valve v41 on the liquid tank 13 side and the valve v43 communicating with the liquid suction port of the pump 42,
The pump 42 is operated.
[0141]
As a result, the liquid in the liquid tank 13 via the valve v41, the manifold 432, the manifold 430, the pump suction side valve v43, the pump 42, the check valve v46, the filter 41, and the valve v51 on the liquid tank 13 side. The plating solution can be collected in the replacement tank 511. The liquid collected in the replacement tank 511 is subjected to a filtration treatment or the like.
[0142]
For the liquid reflux from the replacement tank 511 to the liquid tank 13,
The valve v51 of the replacement device 51, the valve v43 communicating with the liquid suction port of the pump 42, and the valve v45 on the liquid tank 12 side are closed,
Open the valve v52 of the refilling device, the valve v44 leading to the temperature control circuit 45, the valve V of the temperature control circuit 45, and the valve v45 on the liquid tank 13 side,
The pump 42 is operated.
[0143]
Thereby, the restored plating solution is sucked from the hood valve v53 at the bottom of the refilling tank 511, and the valve v52, the pump 42, the check valve v46, the filter 41, the valve v44 of the refilling device 51, and the temperature control are performed. The liquid is returned from the valve v45 on the liquid tank 13 side to the liquid tank 13 via the manifold 452, the valve V, and the manifold 433 of the circuit 45.
[0144]
As described above, the replacement filtration of the plating solution in the solution tanks 12 and 13 can be performed by separately replacing the entire amount of the plating solution in each tank.
[0145]
The reason that the plating solutions in the liquid tanks 12 and 13 are individually changed and the filtration process is performed is that if the two tanks are to be liquid-changed together, the capacity of the replacement tank 511 must be increased accordingly. This is because the installation space of the 511 becomes large and the cost is high, and the cause of the necessity of the replacement filtration often occurs in each tank.
[0146]
In addition, when there is a space for installing a large-capacity refilling tank 511, for example, two tanks may be replaced and filtered at once.
[0147]
Also in the circulating filtration device 4B, the plating solution in the liquid tanks 14 and 15 can be circulated and filtered in the same manner as in the case of the filtration device 4A. Also, the temperature of the plating solution can be controlled. Further, the plating liquids in the liquid tanks 14 and 15 can be individually drained and completely filtered.
[0148]
According to the circulating filtration device 3, in normal circulating filtration, the valves v11 to v15 are opened, and the on-off valve and the flow control valve in the temperature control circuit 45 are set to predetermined opening degrees, respectively, and communicate with the replacement device 51. The on-off valve is closed. By operating the circulating pump 32, the precipitating impurities are mainly sucked together with the plating solution from the inner bottom groove 102 of the liquid tank 11 by the second suction head 104, and the inner bottom of the liquid tank is indicated by a chain line in FIG. When the third suction head 108 is also installed at another position, the plating solution containing impurities at the bottom of the liquid tank and the vicinity thereof is also sucked from the third suction head.
[0149]
On the other hand, it flows into the overflow boxes B1 and B2 attached to the liquid tank 11 together with the plating solution over the weirs 21 and 22, and the floating impurities collected in the box B2 are removed together with the plating solution by the second suction head 106 in the box B2. By suction, these impurities are filtered by the filter 31, and the filtered plating solution can be returned to two places of the liquid tank 11 again. Since the filtered liquid is returned to a plurality of locations instead of one location in the liquid tank 11, the cleanliness of the liquid in each part of the liquid tank 11 is improved accordingly.
[0150]
During this circulating filtration, the plating solution can be controlled to a predetermined temperature by the temperature controller 45.
[0151]
When operating the plating apparatus during consecutive holidays and holidays, when the temperature of the plating solution greatly deviates from a predetermined temperature, the flow rate adjusting valve V in the temperature control circuit 45 is kept until the temperature reaches or approaches the predetermined temperature. By squeezing or closing the plating solution and intensively flowing the plating solution into the heat exchanger, a predetermined plating solution temperature can be promptly obtained.
[0152]
When performing the replacement filtration of the plating solution in the solution tank 11, the valve v11 on the solution tank 11 side is opened and the v12 is closed in the filtration device 3 in the same manner as the replacement device 51 of the solution tanks 12 and 13 described above, and the temperature is further increased. The valve v44 leading to the control circuit 45 and the valve v52 of the device 51 are closed, the opening / closing valve v51 for feeding the liquid to the replacement tank 511 is opened, and the plating liquid in the liquid tank 11 is recovered to the replacement tank by operating the pump 32. can do.
[0153]
Then, the recovered, regenerated and restored plating solution can be returned to the solution tank 11 by the replacement device 51 in the same manner as the solution tanks 12 and 13 described above.
[0154]
The plating apparatus described above further has a function of controlling the liquid surface position in each liquid tank to a predetermined position while collecting, mixing, and returning the plating liquid from each of the liquid tanks 11 to 15 again to each liquid tank. An apparatus 6 for liquid mixing and liquid level control is provided. This will be described below.
[0155]
The device 6 for liquid mixing and liquid level control, as shown in FIG.
A liquid circulation pump 61 (here, a centrifugal pump);
The liquid suction of the pump 61 from the respective overflow boxes B2 of the liquid tanks 11 to 15 via the manual opening / closing valve v71, the first manifold J1 for liquid merging, the second manifold J2 for liquid merging, and the manual opening / closing valve v62. A circuit for guiding the liquid to the mouth,
From the overflow boxes B2 of the liquid tanks 11 to 15 to the third manifold J3 for liquid merging via the manual opening / closing valve v61 and the liquid discharge electric valves Va corresponding to each liquid tank (there are five in total), A circuit that can guide liquid from the third manifold J3 to the suction port of the pump 61 via the second manifold J2 and the manual on-off valve v62;
Each of the liquid tanks 11 from the discharge port of the pump 61 via a check valve Vo and a filter 60, further through a manual on-off valve v63, a fourth manifold J4 for liquid distribution and a fifth manifold J5 for liquid distribution. , 12, 13, 14, 15 for guiding the liquid;
From the discharge port of the pump 61, through the check valve Vo and the filter 60, a valve v63, the fourth manifold J4, a sixth manifold J6 for liquid distribution, and a liquid supply corresponding to each liquid tank. A circuit that can guide the liquid to each of the liquid tanks 11, 12, 13, 14, and 15 via the motor-operated valve Vb (a total of five valves) and a manual open / close valve v64 is provided. The apparatus 6 for liquid mixing and liquid level control further includes a liquid level detecting device 62 installed in the overflow box B2 of each liquid tank.
[0156]
Each of the liquid discharge electric valve Va and the liquid supply electric valve Vb is a valve provided with a valve opening / closing drive motor.
[0157]
The illustrated plating apparatus includes a control unit 7 for controlling the operation of the entire apparatus as shown in FIG. 11A, and a part of the control unit 7 includes a liquid mixing and liquid It constitutes a part of a device 6 for surface position control.
[0158]
An operation panel 71 is connected to the control unit 7, and a switch and the like for starting and stopping each pump are mounted on the operation panel 71.
[0159]
As shown in FIG. 11A, the pumps 32, 42, 42, and 61 are connected to the control unit and operate based on instructions from the control unit. The liquid discharge electric valve Va, the liquid supply electric valve Vb, and the liquid surface position detecting device 62 corresponding to each liquid tank in the device 6 for mixing and liquid surface position control are also connected to the control unit.
[0160]
Each of the liquid surface position detecting devices 62 has the same structure, and as shown in FIG. 11B, one of them has a total of five liquid surface position detecting devices 62 suspended from above in the overflow box B2. Electrode bars 621 to 625 are included.
[0161]
These electrode rods are longer in the order of the electrode rods 621, 622, 623, and 624, and are inserted deeper into the box B2 in this order. The electrode rod 625 is a ground electrode rod, and is inserted into the box B2 substantially the same as or deeper than the electrode rod 624.
[0162]
In the overflow box B2 of each liquid tank, the electrode rod 621 is an electrode rod for detecting an abnormal upper limit of the liquid level, and the electrode rod 622 is for detecting the liquid level when the liquid level reaches the upper limit of the allowable range. The electrode rod 623 is an electrode rod that detects when the liquid level reaches the lower limit of the allowable range, and the electrode rod 624 is an electrode rod that detects that the overflow box is in a dry state. It is.
[0163]
In any one of the liquid tanks 11 to 15, the liquid level of the liquid contained in the overflow box beyond the weirs 21 and 22 in the liquid tank is within the range of predetermined upper and lower limits. In other words, when the liquid surface position in the box B2 is located below the lower end of the electrode rod 622 and above the lower end of the electrode rod 623, the electric valve for discharging liquid corresponding to the liquid tank is provided. The discharge and supply of the liquid to the liquid tank are continued while both Va and the liquid supply electric valve Vb are opened under the instruction of the control unit 7.
[0164]
However, in any one of the liquid tanks, when the liquid level of the liquid contained in the box B2 over the weirs 21 and 22 rises beyond a predetermined range and comes into contact with the lower end of the electrode rod 622, the control is performed. Under the instruction of the unit 7, the liquid supply motor-operated valve Vb communicating with the liquid tank via a valve v64 (usually opened) is closed and the liquid supply to the liquid tank is stopped. Then, the liquid discharge electric valve Va is opened, and the liquid is discharged from the liquid tank via the valve v61 (normally opened).
[0165]
At this time, separately from the discharge circuit via the motor-operated valve Va, the liquid discharged via the valve v71 (which is normally open) and the manifold J1 is supplied to the motor-operated valve Va and the manifold J3 in the manifold J2. And the combined liquid is sucked into the pump 61 via the valve v62.
[0166]
Further, in any one of the liquid tanks, when the liquid level in the liquid tank drops and leaves the lower end of the electrode rod 623, the electric valve for discharging liquid corresponding to the liquid tank under the instruction of the control unit 7. While Va is closed, the electric valve Vb for supplying liquid is opened and the liquid is supplied to the liquid tank via the valve v64. At this time, the liquid sent from the pump 61 passes through the check valve Vo and the filter 60, and the manifold J6, the electric valve Vb, and the valve v64 are passed through one of the two branch pipes of the manifold J4. At the same time, the liquid is refluxed to the liquid tank from the other branch pipe of the manifold J4 to the manifold J5, and further to the liquid outlet 63 to the liquid tank.
[0167]
(1) In the circulating filtration device 6, the discharged liquid amount from the valve v61 in the liquid suction circuit of the pump 61 via the electric valve Va and the discharge from the valve v71 via the manifolds J1 and J2 without passing through the electric valve Va. (2) the amount of liquid to be returned to the liquid tank via the electric valves Vb and v64 in the liquid supply circuit of the pump and the amount of liquid discharged without passing through the electric valve Vb. It is initially set so that the total amount of liquid sent to the liquid flowing back from the liquid outlet 63 to the liquid tank via the pipes J4 and J5 is substantially equal.
[0168]
When the liquid surface position of any of the liquid tanks fluctuates up and down during the filtration operation by the filtration devices 3, 4 </ b> A, 4 </ b> B, 6 related to the liquid tanks 11 to 15, the manifold for liquid confluence of the device 6 is thus provided By alternately operating the liquid discharge electric valve Va communicating with J3 and the liquid supply electric valve Vb communicating with the liquid distribution manifold J6, normal plating operation can be continued without interruption.
[0169]
In the overflow box B2, the liquid level of the processing liquid becomes lower than a predetermined level due to an unexpected situation or the like, and the liquid level leaves the electrode rod 624, or the liquid level of the processing liquid becomes a predetermined level. When the liquid level comes higher than the above and the liquid surface comes into contact with the electrode rod 621, not only the pump 61 but also all the pumps are emergency-stopped under the instruction of the control unit 7. An alarm device for issuing an alarm in this case may be provided for safety management.
[0170]
The manifolds J1 to J3 for liquid merging have a liquid absorbing space for liquid absorption, and a manifold main body having a liquid flow main opening communicating with the liquid absorbing space in one place; A branch pipe connected to each of a plurality of predetermined locations except for the main opening position of the pipe main body, and the liquid flows into each branch pipe, merges in the manifold main body, and flows from the main opening. It will be leaked.
[0171]
In addition, the manifolds J4 to J6 for liquid distribution have a liquid sending space for liquid sending and a manifold main body having a liquid flow main opening communicating with the liquid sending space in one place, A branch pipe connected to each of a plurality of predetermined locations except for the position of the main opening of the manifold body, wherein the liquid flows into the main opening and separates from each branch pipe to flow out. .
[0172]
Each of the first manifold J1 and the third manifold J3, and the fifth manifold J5 and the sixth manifold J6 is provided with the same number (in this case, five) of branch pipes as the number of liquid tanks. Two branch pipes are provided for the second manifold J2 and the fourth manifold J4. The manifold J2 for liquid merging and the manifold J4 for liquid distribution employed in the apparatus 6 have the same basic structure as the manifold shown in FIG. 9 employed in the circulating filtration apparatus. The amount of liquid passing according to the liquid cross-sectional area can be obtained. The manifolds J1 and J3 for liquid merging and the manifolds J5 and J6 for liquid distribution employed in the apparatus 6 have the same structure as the manifold shown in FIG. 10, and are made of vinyl chloride resin. (PVC). Note that these manifolds may be made of other materials, for example, other synthetic resins or metals depending on the quality of the processing liquid.
That is, as shown in FIG. 10, each of the manifolds J1, J3, J5, and J6 is not limited thereto, but is not limited to the manifold main body 600 having a circular cross section and the five connected thereto here. Here, there are branch pipes 601, 602, 603, 604, 605 having a circular cross section.
[0173]
The manifold main body 600 is a closed cylinder having a substantially uniform inner diameter (substantially uniform liquid flow cross-sectional area) having a main opening 600a at one end for connecting another pipe and closing the other end 600b.
[0174]
The cross-sectional area of the opening 600a of the manifold main body 600 under the same positive or negative pressure with respect to the branch pipes 601 to 605 corresponds to the total cross-sectional area of the branch pipes 601 to 605 that respectively provide a required predetermined flow rate. It has the following cross-sectional area. The liquid flow cross-sectional area of each branch pipe is the same here. Further, the cross-sectional area of the manifold body 600 has a cross-sectional area slightly larger than the opening 600a as a cross-sectional area having a margin with respect to the total cross-sectional area of the plurality of branch pipes.
[0175]
Each of the branch pipes 601 to 605 is inserted into the manifold main body at five points in the longitudinal direction of the manifold main body 600 from a direction orthogonal to the longitudinal direction of the manifold main body, and each branch pipe projects into the manifold main body. The degree (projection insertion height) β is in the range of about 以上 to ／ of the inner diameter R ′ of the main body 600.
[0176]
The protruding insertion height of each of the branch pipes 601 to 605 into the manifold body 600 is determined by the suction pressure (negative pressure) or the liquid sending pressure (positive pressure) of the pump 61 extending over the manifold body. The pressure (negative or positive pressure) in the pipe body is kept under a uniform pressure.
[0177]
The manifold main body 600 is liquid-tightly connected to the branch pipes 601 to 605 by an adhesive, welding, or the like.
[0178]
Also in the manifold having this structure, when the suction port of the pump 61 is communicated with the main opening portion 600a of the manifold body 600 and used as a manifold for liquid merging, the liquid pressure (negative pressure) in the manifold body is used. Is made uniform at each part in the manifold main body, so that the amount of liquid absorbed from each branch pipe 601 to 605 into the manifold main body 600 depends on the liquid flow cross-sectional area of the branch pipe. Here, the liquid absorption amounts are the same.
[0179]
When the outlet of the pump 61 is connected to the main opening 600a of the manifold main body 600 and used as a manifold for liquid distribution, the liquid pressure (positive pressure) in the manifold main body is changed at each part in the manifold main body. Therefore, the amount of liquid discharged from each of the branch pipes 601 to 605 is determined according to the liquid flow sectional area of the branch pipe. Here, the same amount of liquid is discharged.
[0180]
As described above, here, as the manifolds J1 to J6 (see FIG. 1), manifolds capable of obtaining a flow rate corresponding to the liquid flow sectional area of each branch pipe are employed. Thereby, control of the liquid surface position in each of the liquid tanks 11 to 15 performed while continuing the mutual liquid mixing of each liquid tank can be appropriately performed in a state corresponding to the liquid level in each liquid tank. As a result, the number of times of opening and closing each of the valves Va and Vb (see FIG. 1) for controlling the liquid level can be reduced, and the opening and closing cycle can be lengthened accordingly, and the durability of the electric valves Va and Vb can also be lengthened. You can make it.
[0181]
According to the apparatus 6 for liquid mixing and liquid level position control described above, when the liquid level in the overflow box B2 of each liquid tank is at a normal position, the valves Va and Vb are opened, and the liquid circulation pump 61 is turned on. By being operated, the liquid is sucked from the respective overflow boxes B2 of the plurality of liquid tanks 11 to 15 via the valves v61 and v71, and the liquid in each tank is supplied to the first manifold J1 for liquid merging and the third manifold. It reaches each branch pipe of the pipe J3, flows into the main body of the manifold from the branch pipes, merges, and further flows from the main body of the manifold to the branch pipe of the second manifold J2 for liquid confluence, and Through the body of J2, the liquid in each tank is sucked into the liquid circulation pump 61 in a mixed state.
[0182]
Then, the liquid sucked into the liquid circulation pump 61 is discharged from the pump, filtered by the filter 60, flows into the main body of the fourth manifold J4 for liquid distribution, and further flows from the manifold for liquid distribution. Flows into the main body of the fifth manifold J5 and the sixth manifold J6, and returns to each of the liquid tanks 11 to 15 via each branch pipe of the manifold.
[0183]
The plating liquids thus sucked from the respective liquid tanks join at manifolds J1 and J3, further join at manifold J2, are sucked and discharged by the liquid circulation pump 61, further pass through the filter 60, and In the process of being distributed by the fourth manifold J4 and further distributed by the fifth manifold J5 and the sixth manifold J6, the plating liquids from the plurality of liquid tanks 11 to 15 are mixed and continuously performed. Thus, the composition of the plating solution in each solution tank is maintained homogeneous.
[0184]
Further, the liquid surface position of each liquid tank is controlled as described above.
[0185]
In this way, the processing liquid in each liquid tank is mixed, and the production operation can be continuously performed under a uniform liquid composition. Moreover, these liquid mixing and liquid level control are achieved by one liquid circulation pump 61.
[0186]
Thus, the processing liquid can be kept uniform between the liquid tanks while suppressing the complexity, size, and cost increase of the apparatus structure, and the fluctuation of the liquid surface position in each liquid tank with respect to the predetermined liquid surface position can be suppressed. Can be suppressed.
[0187]
In addition, as in the device 6 for liquid mixing and liquid surface position control described above, at least each circuit for guiding the liquid to the liquid circulation pump 61 and the liquid surface position detection device 62 are provided for the overflow box B2. Thus, the plating treatment can be performed with little obstruction in the portion containing the liquid before passing over the weir portion of the liquid tank. In addition, in an overflow box in which the vertical fluctuation of the liquid level can be made large with respect to the fluctuation of the liquid amount in the entire liquid tank, the fluctuation of the liquid surface position in the liquid tank can be determined more finely, and appropriate liquid surface position control can be performed.
[0188]
The filter 60 may be smaller than the original filters 31 and 41 for circulating filtration that can cope with the amount of liquid flowing into the overflow box. Moreover, one filter 60 is sufficient as described above.
[0189]
The circulating filtration of the plating solution by the circulating filtration devices 3, 4A and 4B in the plating apparatus shown in FIG. 1 is not limited to each of the liquid tanks. It can be circulated and filtered about three times based on the volume. That is, the filtration amount can be about three times the volume as a standard.
[0190]
Further, the amount of liquid treatment for liquid mixing and liquid level control by the circulating filtration device 6 can be, for example, the amount of circulating filtration about 0.5 times per hour with respect to the liquid capacity of one liquid tank. That is, the filtration amount can be about 0.5 times the volume as a standard.
[0191]
For example, in each of the five liquid tanks shown in FIG. ³ Then, the filtration amount per minute can be set as shown in the following table.
[0192]

Next, weirs 21 and 22 (see also FIG. 4) facing overflow boxes B1 and B2 in each of liquid tanks 11 to 15 will be described.
[0193]
Since the dams 21 and 22 are the same for any of the liquid tanks, the description will be made exemplifying the dam provided in the liquid tank 12. Regarding other liquid tanks, the following description applies to the point of the weir.
[0194]
The weir 21 is provided by forming an overflow notch 20 at the upper end edge of a partition wall w1 (see FIG. 4) between the liquid tank 12 and the overflow box B1. The weir portion 22 is formed by forming a notch (notch portion) 20 for overflow at an upper edge of a partition wall w2 (see FIG. 4) between the liquid tank 12 and the overflow box B2. Here, the overflow notches 20 in the dams 21 and 22 have the same shape and size.
[0195]
Here, each notch 20 has an inverted triangular shape, and a plurality of notches 20 and 22 are formed.
[0196]
As described above, the liquid overflows from the notches 20 to the overflow boxes B1 and B2 by adopting the dams 21 and 22 formed with the notches 20 for liquid overflow. The impurities are allowed to flow into the overflow boxes B1 and B2 together with the impurities, and can be suctioned from the boxes by the pump as described above, and the sucked liquid can be subjected to filtration.
[0197]
Since weirs 21 and 22 having notches 20 for liquid overflow are adopted so that the liquid overflows from the notches 20 to the overflow boxes B1 and B2, the liquid level in the liquid tank 12 is reduced to a desired level. Even if it rises a little from the liquid level position, as long as the rising liquid level position faces the notch 20, the overflow amount suddenly increases at the same time over the entire length of the upper end edge of the weir as in a conventional rectangular weir, For this reason, the overall overflow amount does not significantly increase, and the overflow amount increases only by the increase in the liquid flow cross-sectional area due to the rise in the liquid level at the notch 20.
[0198]
Further, even if the liquid level in the liquid tank 12 is lowered, as long as the lowered liquid level position faces the notch 20, the overflow amount decreases simultaneously over the entire length of the upper end edge of the weir portion as in a conventional rectangular weir. Therefore, the overall overflow amount does not significantly decrease, and the overflow amount decreases only by the decrease in the liquid flow cross-sectional area due to the lowering of the liquid level at the notch 20.
[0199]
Therefore, even if the liquid level in the liquid tank 12 fluctuates, the overflow amount increases or decreases very slowly as compared with the conventional rectangular weir. In other words, even if the liquid level in the liquid tank 12 fluctuates up and down, the fluctuation in the overflow amount is suppressed to be very small as compared with the conventional rectangular weir.
[0200]
Thus, for proper filtration of the liquid, the amount of liquid absorbed from the bottom of the liquid tank 12 (for example, approximately 70% of the amount of circulating filtrate) and overflow are set according to the amount of circulating filtration corresponding to the capacity of the pump for filtration. Maintaining the amount of liquid absorbed from the box (for example, approximately 30% of the amount of circulating filtrate), proper filtration of the liquid is achieved.
[0201]
Also, weirs 21 and 22 formed with notches 20 for liquid overflow are adopted so that the liquid overflows from the notches 20 to the overflow boxes B1 and B2, and the notches 20 exceed the weirs 21 and 22. Since the liquid extends in the depth direction of the previous liquid, not only floating impurities that easily float on the liquid surface in the liquid tank 12 but also impurities that easily float in the lower layer from the notch 20 to the overflow boxes B1 and B2. Impurities that flow easily and float below the liquid level can also be collected and filtered.
[0202]
Further, there is an advantage that the overflow amount can be easily set by selecting the shape of the notch 20 (in particular, the angle of the apex angle of the lower end of the notch and the depth of the notch) and the number thereof. Although the notch 20 is illustrated as having an inverted triangular shape, it may have another shape such as a rectangular shape or a U-shape.
[0203]
When an inverted triangular notch is employed as shown in the figure, the lower triangular apex angle of the inverted triangular shape is not limited, but may be, for example, about 40 ° to 90 °, more preferably about 50 ° to 60 °.
[0204]
As shown in FIG. 12 (A), there is a conventional rectangular weir 200 having a width of 500 mm, and the standard liquid level in the liquid tank is h = 10 mm higher than the upper end of the rectangular weir 200. The standard liquid amount (predetermined liquid amount) that overflows is approximately 55.2 liters / minute, and if the liquid surface of the liquid tank rises to h = 15 mm, 20 mm, and 25 mm, the liquid amount that overflows the rectangular weir 200 is: As shown in the following table, it becomes 101.4 l / min, 156.1 l / min, and 218.2 l / min.
[0205]
Here, instead of the rectangular weir 200, a rectangular notch N1 having a width of 40 mm, a notch N2 having an inverted triangular shape having a lower apex angle of 90 degrees, and an inverted triangular shape as shown in FIGS. 12B, 12C, and 12D When the weirs 201, 202, and 203 each having a notch N3 having a 60-degree apex angle at the lower end are employed, the same standard overflow liquid amount of 55.2 liters / minute as that of the rectangular weir 200 is obtained as shown in the following table. To
As for the weir section 201, assuming that the number P of the notches N1 is 5, the height h1 of the liquid flow cross section of each notch N1 may be 18.4 mm.
[0206]
As for the weir portion 202, assuming that the number P of the notches N2 is 5, the height h2 of the liquid flow cross section of each notch N2 may be set to 28 mm.
[0207]
As for the weir portion 203, assuming that the number P of the notches N3 is four, the height h3 of the liquid flow section of each notch N3 may be 38.1 mm.
[0208]
That is, since the notch extends in the depth direction of the liquid in any of the weir portions 201, 202, and 203 having the notch for liquid overflow, the height h from the upper end of the rectangular weir 200 to the liquid surface is h = 10 mm. It is deeply cut. This indicates that not only the floating impurities that easily float on the liquid surface but also the impurities that easily float in the lower layer can overflow from the notch.
[0209]
Further, when the liquid level of the liquid tank rises from the upper end of the rectangular weir 200 as described above to h = 15 mm, 20 mm, and 25 mm, respectively, the same overflow liquid amount as the overflow liquid amount exceeding the weir 200 is obtained. The number P of the notches in each of the notched dams 201, 202, and 203 and the heights h1, h2, and h3 of the liquid flow cross sections at the notches are as shown in the following table. That is, according to the following table, the liquid level is 5 mm (when h = 15 mm), 10 mm (when h = 20 mm), and 15 mm (when h = 25 mm) from the normal liquid level position (position at a height of 10 mm). It can be seen that even with the fluctuation, the fluctuation of the overflow liquid amount can be suppressed to be smaller in the notched weir portions 201, 202, and 203 than in the rectangular weir 200.
[0210]
In the following table, M indicates the overflow liquid amount liter / minute in the rectangular weir 200, m indicates the overflow liquid amount liter / minute in each notch, and P indicates the number of notches. The unit of h, h1, h2, and h3 is [mm].

Now, according to a so-called rectangular weir whose conventional upper edge extends horizontally and straight, the amount of liquid absorbed from the bottom of the liquid tank and the amount of liquid absorbed from the overflow box are set to a predetermined ratio according to the capacity of the filtration pump. However, even if the liquid level in the liquid tank rises slightly, the amount of overflow increases greatly, and as a result, the amount of liquid in the overflow box becomes too large, exceeding the capacity of the pump box to absorb liquid from the overflow box. As described above, the liquid level in the liquid tank and the liquid level in the overflow box are close to the same position, so that the head becomes small, and eventually the floating impurities may not be sufficiently collected in the overflow box. This point will be explained a little more.
[0211]
For example, in the electroplating solution treatment of articles, the amount of circulating filtration of the plating solution in the plating solution tank varies depending on the material to be plated. I have. The following is an example of the amount of circulating filtration of a liquid tank provided with the overflow boxes B1 and B2 for overflowing the plating solution from a conventional so-called rectangular weir.
[0212]

The above liquid amount 11.8m ³ The total amount of circulated filtration per hour for
11.8m ³ × 3 times = 35.4m ³ / Hr.
[0213]
When the filtration amounts of the processing liquid in the liquid tank and the overflow box are set to 70% and 30% of the total filtration amount, respectively, the following results are obtained.
[0214]

However, the overflow amount of the conventional rectangular weir is as follows, assuming that the height h from the upper end of the weir to the liquid level (see FIG. 12A) is a general average h = 10 mm.
[0215]
When h = 10 mm and the weir width is 500 mm as described above, the overflow amount is approximately 55.2 liter / min as described above, and the weir width is 10 m of the length of the box B1 and 1 m of the length of the box B2. Because it is 11m in total
55.2 liters / minute ÷ 500 mm × 11 m × 60 minutes = 72.86 m ³ / Hr, and the circulating filtrate amount 10.6 m set for the overflow box. ³ / Hr.
[0216]
This means that the amount of liquid in the overflow box becomes too large, out of the pump capacity, exceeding the liquid absorption capacity from the overflow box, and the liquid level in the liquid tank and the liquid level in the overflow box rapidly approach the same position. This means that the head is eliminated and the floating impurities cannot be sufficiently collected in the overflow box. As a result, liquid filtration becomes insufficient, and a serious problem occurs in that defective products occur frequently, such as impurities adhering to the surface of the object to be plated and causing roughness.
[0219]
The position of the liquid surface in the liquid tank is determined by the pumping liquid and / or the adhering liquid to the processing object in the preprocessing step of the processing object, and the processing liquid by the processing object to the next process. Since it fluctuates momentarily due to pumping and evaporation of water when the liquid is heated by the heat exchanger, adjustment of the liquid surface position in each liquid tank and adjustment of the amount of liquid flowing into the overflow box are frequent and troublesome. And it was an important task.
[0218]
In this regard, by adopting a weir provided with a notch for liquid orverover flow as described above, even if there is a vertical fluctuation of the liquid level in the liquid tank, the fluctuation of the overflow amount is smaller than that of the conventional rectangular weir. Proper filtration of the liquid by maintaining the amount of liquid absorbed from the bottom of the liquid tank and the amount of liquid absorbed from the overflow box set according to the amount of circulating filtration appropriate for the capacity of the pump for filtration Is achieved, and the occurrence of defective products can be greatly reduced.
[0219]
The weirs 21 and 22 are fixedly provided by forming notches 20 at upper end edges of partition walls w1 and w2 between the liquid tank and the overflow boxes B1 and B2. In order to more easily and easily perform the filtration, a weir member that can be detachably installed at the upper edge of the partition wall between the liquid tank and the overflow box may be employed as the weir part. FIG. 13 shows an example of such a detachable weir member, and FIG. 14 shows another example of the detachable weir member.
[0220]
FIG. 13A is a perspective view of the weir member 8. FIG. 13B shows a use state of the weir member, and is shown by a cross section taken along line XX of FIG. 13A. The weir member 8 is formed integrally with a plate body 81 having four rectangular notches 80 for liquid overflow formed therein with a wall-inserted portion 800 having a gate-shaped cross section (or a U-shape). Are also integrally formed.
[0221]
Although not limited to this, the wall insertion portion 800 here is in the form of a recess, and is formed by integrally providing an inverted L-shaped bent plate portion 82 in the middle of one surface of the plate body 81. . In the lower portion of the bent plate portion 82 and the plate body 81 located at a position overlapping with the bent plate portion 82, elongated holes 82a for vertically extending bolts are provided. The weir member 8 is not limited to this, but here is integrally formed of a synthetic resin (for example, vinyl chloride resin when the processing liquid is an electroplating liquid) that is resistant to the processing liquid in the liquid tank. is there.
[0222]
The dam member 8 is inserted from above into a partition wall between the liquid tank 11 (12, 13, 14, 15) and the overflow boxes B1, B2. FIG. 13B shows a state in which the weir member 8 is inserted into the partition wall w2 between the liquid tank 11 and the overflow box B2 from above at the wall insertion portion 800. One or more weir members 8 are used depending on the amount of liquid in the liquid tank, the size of the notch 80, and the like. When two or more dam members are used, the adjacent dam members 8 are brought into contact with each other and inserted into the partition wall w2. Although not shown, a weir member similar to the weir member 8 is also inserted into the partition wall w1 between the liquid tank and the overflow box B1.
[0223]
As shown in FIG. 13 (A), when the weir member 8 is inserted into the partition wall w2 and arranged, a liner LN for height adjustment can be arranged at the back of the upper end of the wall insertion part 800, if necessary. The dam member 8 is placed directly or via the liner LN on the upper end of the partition wall w2.
[0224]
The weir member 8 inserted into the partition wall w2 in this manner is provided with, for example, a long hole 82a for bolt penetration therethrough and a bolt 84 previously provided on the wall w2 from the inverted L-shaped bent plate portion 82 side. A bolt 84 is passed through a bolt hole having an inside diameter that can be exactly penetrated and a long hole 82a for bolt penetration of the plate body 81, and tightened with a nut. At this time, if necessary, the liquid sealing material 840 fitted to the bolt 84 is applied to the respective outer surfaces of the bent plate portion 82 and the plate body 81, whereby the open portion of the elongated bolt hole 82a is made liquid-tight. close.
[0225]
Thus, the weir member 8 is attached to the partition wall between the liquid tank and the overflow box at a predetermined height, in other words, the height position of the notch 80 is set to a height position at which a predetermined liquid overflow amount is obtained. .
[0226]
According to this weir member 8, since the notch 80 for liquid overflow is formed, there is an advantage similar to the weir parts 21 and 22 having the notch 20 described above.
[0227]
Further, according to this weir member 8, the overflow amount can be easily set by selecting and adopting an appropriate weir member from among the weir members 8 in which the overflow amount is variously set, and the liner LN can be made different in height. By changing the mounting height of the weir member 8 by changing it, or by replacing the weir member 8, the overflow amount can be easily changed.
[0228]
When the partition walls w2 and w1 are inferior in corrosion resistance to the processing liquid, for example, made of a metal material, and when the surface thereof is coated with a corrosion-resistant synthetic resin or the like, a hole for passing the bolt 84 is provided. The exposed portion of the metal material or the like may be protected by putting a corrosion-resistant sealant into the bolt hole.
[0229]
FIG. 14A is a perspective view of the weir member 8 ′. FIG. 14B shows a use state of the weir member, and is shown by a cross section taken along line YY of FIG. 14A. The weir member 8 ′ is a modified example of the aforementioned weir member 8, and differs from the weir member 8 in the following points. Other points are the same as those of the weir member 8, and the same parts as those of the weir member 8 are denoted by the same reference numerals.
[0230]
In the weir member 8 ', a long hole 82a for bolt penetration is also formed on an upper portion of a plate body 81 on which a rectangular notch 80 for liquid overflow is formed. Here, the long holes 82a are formed at the upper portions of both ends of the plate body 81. The upper horizontal portion of the inverted L-shaped bent plate portion 82 is removed at positions outside the reinforcing ribs 83 at both ends of the plate body 81.
[0231]
Similarly to the weir member 8, this weir member 8 'is inserted into the partition wall w2 at the wall insertion part 800 as shown in FIG. However, at this time, a rising wall W 'which is integrally extended in advance from the upper end of the partition wall w2 in advance and penetrates through the deleted portion of the upper horizontal portion of the inverted L-shaped bent plate portion 82, and It overlaps the upper part of both ends of the body 81. Although not shown, a weir member similar to the weir member 8 'is also inserted into the partition wall w1 between the liquid tank and the overflow box B1.
[0232]
The weir member 8 ′ is not only bolted and fastened to the partition wall w 2 at the lower part of the plate body as in the case of the weir member 8, but also bolted to the rising wall W ′ at the upper part of the plate body 81. That is, the bolt 84 ′ is passed through a bolt hole having an inner diameter through which the bolt 84 ′ is provided in advance on the rising wall W ′ and a long hole for bolt penetration 82 a at the top of the plate body 81, and tightened with a nut. Also at this time, if necessary, the liquid sealing material 840 fitted to the bolt 84 ′ is applied to the plate body 81, thereby closing the open portion of the bolt through-hole 82 a in a liquid-tight manner. Thus, the weir member 8 'is attached to the partition wall between the liquid tank and the overflow box at a predetermined height, in other words, the height position of the notch 80 is set to a height position at which a predetermined liquid overflow amount is obtained. Can be
[0233]
This dam member 8 ′ has the same advantages as the dam member 8. Further, in the weir member 8 ', a wall W' corresponding to a part of the partition wall w2 is fixed on a part thereof so that the dam member 8 may be damaged by a large hydraulic pressure in the liquid tank. Even at one time, there is no fear in the weir member 8 '.
[0234]
The notch 80 for liquid overflow is a rectangular notch in the weir members 8 and 8 'described with reference to FIGS. 13 and 14, but the notch for liquid overflow is also described in the weir members 8 and 8'. Inverted triangular notches in the weir portions 21 and 22 may be used, or notches of other shapes may be used.
[0235]
Further, in order to fix the weir members 8 and 8 'to the partition walls w1 and w2, instead of the through bolts 84, the dam members 8 and 8' are screwed to the weir members 8 and 8 'to abut against the wall surfaces of the partition walls w1 and w2. What fixes the weir member to the partition wall may be adopted.
[0236]
【The invention's effect】
As described above, according to the present invention, there is provided an article processing apparatus using a liquid having a plurality of processing liquid tanks, storing the processing liquid in each processing liquid tank, and performing a target processing on an article in each processing liquid tank. In addition, the processing liquid can be homogenized between the liquid tanks while suppressing the complexity, size, and price increase of the apparatus structure, and the fluctuation of the liquid surface position in each liquid tank with respect to a predetermined liquid surface position can be suppressed. An article processing apparatus using a liquid that can be suppressed can be provided.
[0237]
Further, according to the present invention, there is provided the article processing apparatus using the liquid, which can homogenize the processing liquid between the liquid tanks and suppress a fluctuation of the liquid level in each liquid tank with respect to a predetermined liquid level. It is possible to provide a liquid-based article processing apparatus that can perform circulation filtration at the same time.
[Brief description of the drawings]
FIG. 1 is a schematic plan view of a plating apparatus, which is an example of an article processing apparatus using a liquid, provided with an apparatus for liquid mixing and liquid surface position control which also serves as a circulating filtration apparatus according to the present invention.
FIG. 2 is an enlarged plan view of a part of a liquid tank and a peripheral part thereof.
FIG. 3 is an enlarged side view of one of the liquid tanks shown in FIG. 2 and a peripheral portion thereof.
FIG. 4 is a perspective view of a part of the liquid tank.
5A is a perspective view of an anode case and the like, FIG. 5B is a perspective view of an anode bag, and FIG. 5C is a perspective view of a cathode bus bar, a hanger, a hook member, and the like.
6 (A) is a plan view of a first suction head, FIG. 6 (B) is a side view of the first suction head, and FIG. 6 (C) is a bottom groove in a liquid tank and a bottom of an overflow box and related parts. FIG.
FIG. 7 is a side view of the second suction head.
FIG. 8 is a perspective view of another example of the second suction head.
FIG. 9 is a side view, partially in section, of a manifold having two branch pipes.
FIG. 10 is a side view showing a cross section of a part of a manifold having five branch pipes.
FIG. 11A is a block diagram of a control circuit of the plating apparatus shown in FIG. 1, and FIG. 11B is a view showing a schematic configuration of a liquid level detection device.
12A is a diagram showing an example of a conventional rectangular weir member, FIG. 12B is a diagram showing an example of a weir member having a rectangular notch for liquid overflow, and FIGS. It is a figure which shows the weir member example which has the inverted triangular notch for each liquid overflow.
FIG. 13A is a perspective view of an example of a detachable weir member, and FIG. 13B is a cross-sectional view taken along line XX of FIG. .
14A is a perspective view of another example of a detachable weir member, and FIG. 14B is a cross-sectional view taken along line YY of FIG. is there.
FIG. 15 is a side view showing a partial example of a conventional manifold.
FIG. 16 is a schematic perspective view of a conventional liquid tank and its peripheral portion.
[Explanation of symbols]
11, 12, 13, 14, 15 Plating solution tank (example of article processing solution tank)
16 pretreatment washing tank
L plating solution
W Wash water
D1, D2, D3, D3, D4 work deck
101 Inner bottom of liquid tank
102 Inner bottom groove provided in liquid tank
103 Aeration device
103a bubbles
104 First suction head
104a Port connection
104b suction hole
105 Air barrier wall plate
105a support strip
105b support plate
106 Second suction head
106a Port connection
106b Suction hole
106c support piece
106d support plate
107 suction head
107a Port connection
107b suction hole
107c feet
108 Third suction head
B1, B2 overflow box
w1, w2 Partition wall between liquid tank and overflow box
21, 22 Weir
20 Notch of weir
A anode busbar
C Cathode bus bar
H hanger
S hook member
m 'anode material
CS anode case
CSb anode bag
a1, a2 Article to be plated
3 Circulation filtration device
31 Filter
32 Circulation pump (centrifugal pump in this example)
33 Manifold for liquid junction
v11-v15 Manual open / close valve
v16 check valve
4A, 4B circulation filtration device
41 Filter
42 Circulation pump (centrifugal pump in this example)
430,431,432 Manifold for liquid merging
433 Manifold for liquid distribution
v41-v45 Manual on-off valve
v46 check valve
45 Temperature control circuit
451 heat exchanger
va ', vb' Manual open / close valve
V Flow control valve
452 manifold for liquid distribution
51 Replacement device
v51, v52, v61-v64, v71 Manual open / close valve
511 Replacement tank
v53 foot valve
401 Manifold body
402, 403 Branch pipe
401a Main opening of manifold body 401
401b The other end of the manifold body 401
9 Conventional manifolds
91 Manifold body
91a Main opening
91b hole
92 Branch pipe
90 Flow control valve
6 Equipment for liquid mixing and liquid surface position control
60 filter
61 Circulation pump (centrifugal pump in this example)
62 Liquid level detection device
621-625 electrode rod
63 Liquid outlet
Vo check valve
J1, J2, J3 Manifold for liquid junction
J4, J5, J6 Manifold for liquid distribution
Vacuum valve for discharging liquid
Electric valve for Vb liquid supply
7 control section
71 Operation panel
600 Manifold body
601 to 605 Branch pipe
600a Main opening of manifold body 600
600b The other end of the manifold body 600
200 Conventional rectangular weir
201-203 Weir
N1, N2, N3 notch
8, 8 'dam member
80 Rectangular notch for liquid overflow
81 plate
82 Inverted L-shaped bent plate
82a Slot for bolt penetration
83 Reinforcement rib
84, 84 'bolt
800 Wall insertion part
840 Liquid sealing material
LN liner
W 'rising wall
10x liquid tank
Ax Liquid tank bottom groove
Bx overflow box
10 'liquid tank
L 'liquid
B1 ', B2', B3 'overflow box
21 ', 22', 23 'rectangular weir
v1'-v7 ', v1 ", v7", v8', v9 'manual open / close valve
V 'foot valve
Lb, Lb 'liquid inlet
F filter
P circulation pump
H heat exchanger
100 'liquid return port
511v foot valve
511 'liquid outlet

Claims (4)

An article processing apparatus having a plurality of processing liquid tanks, a processing liquid stored in each of the processing liquid tanks, and a liquid for performing a target processing on an article in each processing liquid tank. A liquid mixing and liquid level control device for controlling the liquid level in each of the processing liquid tanks to a predetermined position while collecting and mixing the liquids from the processing liquid tanks and returning the liquids to the processing liquid tanks again. ,
The device for liquid mixing and liquid surface position control includes:
A liquid circulation pump,
A circuit for guiding the liquid from each of the plurality of processing liquid tanks to a first manifold for liquid merging, and for guiding the liquid merged in the first manifold to a second manifold for liquid merging;
The liquid from each of the plurality of processing liquid tanks is guided to a third manifold for liquid merging via a liquid discharge electric valve corresponding to each processing liquid tank, and the liquid merged at the third manifold is discharged to the second manifold. A circuit leading to the manifold,
A circuit for guiding the liquid merged in the second manifold to the liquid circulation pump;
A circuit for guiding the liquid from the liquid circulation pump to a fourth manifold for liquid distribution and for guiding one of the divided liquids diverted by the fourth manifold to each of the treatment liquid tanks via a fifth manifold for liquid distribution; When,
A circuit for guiding the other divided liquid divided by the fourth manifold to the respective processing liquid tanks via a sixth manifold for liquid distribution and a liquid supply motorized valve corresponding to each processing liquid tank;
A liquid surface position detection device installed for each of the processing liquid tanks,
Opening and closing of each of the liquid discharge electric valves and each liquid supply electric valve so that the liquid surface position in each of the processing liquid tanks is set to a predetermined position based on the liquid surface position detected by the liquid surface position detection device. And a motor-operated valve control unit for controlling the pressure. Each of the processing liquid tanks has an overflow box installed through a weir portion, and each circuit for guiding liquid to the liquid circulation pump in the liquid mixing and liquid surface position control device and the liquid are provided. 2. The liquid-based article processing apparatus according to claim 1, wherein the surface position detection device is provided for the overflow box. The device for liquid mixing and liquid level position control includes a filter connected between the liquid circulation pump and the fourth manifold, and also serves as a liquid circulation filtration device. An article processing apparatus using the liquid according to 2. Separately from the apparatus for liquid mixing and liquid surface position control, a circulating filtration device installed for a liquid tank group comprising the plurality of processing liquid tanks, or each including one or two or more processing liquid tanks And a circulating filtration device installed for each of the plurality of liquid tank groups comprising: The liquid according to any one of claims 1 to 3, wherein the liquid is absorbed from the liquid tank via a liquid absorption circuit, sent to the filter, and returned from the filter to the treatment liquid tank via the liquid supply circuit. Article processing equipment.

Images